Entries |
Document | Title | Date |
20080213698 | Novel Colorant Compound and Method of Manufacturing the Same as Well as Blue Resist Composition for Use in Color Filter Containing the Same - The present invention provides (I) a method of manufacturing a triphenylmethane colorant that can suppress the sub-reactions in conversion to a sulfonamide and is industrially advantageous, (II) a colorant compound that has both excellent spectral characteristics and a high solubility relative to organic solvents or polymers as a coloring agent to be used in color filters and (III) a blue resist composition for use in a color filter that shows a high lightness and an excellent hue particularly for blue color and can be used to display an image that is excellent in terms of spectral characteristics and contrast. | 09-04-2008 |
20080233516 | NEGATIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD USING THE SAME - A negative lithographic printing plate precursor includes a support; and a photo-polymerization layer containing a polymer compound having at least one of a sulfonamido group and a cyclic structure derived from maleimide, and further having a hydrophilic group in a molecule thereof | 09-25-2008 |
20080248424 | Photopolymer Composition Suitable for Lithographic Printing Plates - Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X | 10-09-2008 |
20080318159 | POSITIVE PHOTOSENSITIVE COMPOSITION - A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid to increase solubility in an alkali developing solution, and (C) a specific basic compound. | 12-25-2008 |
20090068587 | (Meth) acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method - The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R | 03-12-2009 |
20090075201 | PLANOGRAPHIC PRINTING PLATE MATERIAL, AND CYCLIC UREIDE MOIETY-CONTAINING PHENOLIC RESIN AND ITS SYNTHETIC PROCESS - Disclosed is a planographic printing plate material comprising an aluminum support and provided thereon, an image formation layer containing a cyclic ureide moiety-containing phenolic resin in which a phenolic resin has a cyclic ureide moiety through a linkage group, the cyclic ureide moiety being derived from a cyclic ureide and the linkage group being derived from a linkage compound having both a monohalogenated alkyl group and one selected from a vinyl group, a carbonyl group, an ester group and a sulfonic acid ester group. | 03-19-2009 |
20090087783 | Original plate for lithography, and resin composition for photosensitive layer in original plate for lithography - The present invention provides a precursor that may provide a lithographic printing plate having an excellent image forming capability and having not only good hydrophilicity in a non-image part but also excellent printing resistance. Specifically, the present invention provides a lithographic printing plate precursor having a photosensitive layer containing a hydrophilic polymer, a crosslinking agent, hydrophobic polymer particles and a photo-thermal converter, wherein the hydrophilic polymer does not substantially contain, in its polymer chain, any of alcoholic hydroxyl groups and carboxyl groups (for example, 1.5% or less by mol of the repeating units of the hydrophilic polymer contain an alcoholic hydroxyl or carboxyl group). | 04-02-2009 |
20090087784 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - A positive resist composition includes: (A) a resin containing a repeating unit represented by formula (I) or (I′) as defined in the specification, of which solubility in an alkali developer increases under an action of an acid; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: | 04-02-2009 |
20090111050 | Novel Photosensitive Resin Compositions - This disclosure relates to compositions that include (a) at least one polybenzoxazole precursor polymer; and (b) at least one silicon-containing polymer comprising a moiety of Structure (V): | 04-30-2009 |
20090155718 | PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS - A method and a resist composition. The resist composition includes a polymer having repeating units having a lactone moiety, a thermal base generator capable of generating a base and a photosensitive acid generator. The polymer has the properties of being substantially soluble in a first solvent and becoming substantially insoluble after heating the polymer. The method includes forming a film of a photoresist including a polymer, a thermal base generator capable of releasing a base, a photosensitive acid generator, and a solvent. The film is patternwise imaged. The imaging includes exposing the film to radiation, resulting in producing an acid catalyst. The film is developed in an aqueous base, resulting in removing base-soluble regions and forming a patterned layer. The patterned layer is baked above the temperature, resulting in the thermal base generator releasing a base within the patterned layer and the patterned layer becoming insoluble in the solvent. | 06-18-2009 |
20090170028 | HEAT-SENSITIVE POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR - A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resins and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II, wherein at least one of the aromatic groups Ar | 07-02-2009 |
20090191480 | THERMOPLASTIC MATERIAL COMPRISING POLYCHROMIC SUBSTANCES - The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: | 07-30-2009 |
20090202942 | PROCESS FOR PRODUCING PATTERNED FILM AND PHOTOSENSITIVE RESIN COMPOSITION - A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of photosensitive resin composition at unexposed regions or exposed regions by, for example, development; and a photosensitive resin composition for use in the above process for producing a film pattern. There is provided a process for producing a patterned film, comprising the steps of preparing a photosensitive resin composition that upon light irradiation, generates an acid or a base and is hardened; coating substrate ( | 08-13-2009 |
20090208869 | LITHOGRAPHIC-PRINTING PLATE PRECURSOR AND IMAGE FORMING METHOD USING THE SAME - To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties capable of preventing the formation of deposits during the development. In an infrared-sensitive or heat-sensitive lithographic printing plate precursor, comprising a substrate, a first image recording layer formed on the substrate, and a second image recording layer formed on the first image recording layer, the first image recording layer contains a resin which is soluble or dispersible in an aqueous alkali solution, and the second image recording layer contains a polyurethane which has a substituent having an acidic hydrogen atom. | 08-20-2009 |
20090246692 | LITHOGRAPHIC PRINTING PLATE PRECURSOR - A lithographic printing plate precursor includes, in the following order: a support; an intermediate layer; and an image-forming layer, and the intermediate layer contains a polymer (A) comprising a repeating unit (a | 10-01-2009 |
20090246693 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF LITHOGRAPHIC PRINTING USING SAME - A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. Also disclosed are a negative-working lithographic printing plate precursor that can be developed by a water-soluble resin-containing aqueous solution and a method of lithographic printing that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits an excellent fine line reproducibility in nonimage areas even when printing is performed using ultraviolet-curing ink (UV ink). Also provided is a negative-working lithographic printing plate precursor that exhibits an excellent combination of fine line reproducibility and printing durability and that resists the production of scum during on-press development. The negative-working lithographic printing plate precursor has a hydrophilic support and has thereon a photopolymerizable layer that contains a polymer compound that has the urea bond in the side chain position and a hydrophilic group. The method of lithographic printing uses this negative-working lithographic printing plate precursor. | 10-01-2009 |
20100028806 | METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATES - A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution having a pH of from about 3 to 11. The precursor has a primary polymeric binder that comprises recurring units derived from one or more N-alkoxymethyl(meth)acrylamides, provided that such recurring units are present in the primary polymeric binder in an amount of at least 10% based on the total dry primary polymeric binder weight. In addition, the primary polymeric binder is present in an amount of from about 12 to about 70% based on total imageable layer dry weight. The imaged precursor can be processed off-press or on-press. | 02-04-2010 |
20100035183 | MATERIALS FOR LITHOGRAPHIC PLATES COATINGS, LITHOGRAPHIC PLATES AND COATINGS CONTAINING SAME, METHODS OF PREPARATION AND USE - This invention relates to iodonium salts, acetal copolymers and polymer binders comprising functional groups capable of undergoing cationic or radical polymerization, their method of preparation and their use in the preparation of coating solutions and coatings. This invention also relates to coatings containing the iodonium salts, acetal copolymers and/or polymer binders and to negative working lithographic printing plates comprising these coatings. | 02-11-2010 |
20100040976 | HEAT-SENSITIVE IMAGING ELEMENT - A heat-sensitive imaging element includes an IR dye, and more particularly a heat-sensitive lithographic printing plate precursor includes the IR dye. A method for making the lithographic printing plate produces a print-out image of high contrast upon exposure to IR-radiation or heating. | 02-18-2010 |
20100062367 | PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR FOR INFRARED LASER - A photosensitive lithographic printing plate precursor for infrared laser includes in the following order: a support having a hydrophilic surface; a lower layer containing a polymer compound having at least a unit derived from a polymerizable monomer represented by the following formula (I); and an upper layer containing a polymer compound having a group represented by the following formula (II) in a side chain, | 03-11-2010 |
20100099043 | Positive Photosensitive Resin Composition - Disclosed is a positive photosensitive resin composition that includes (A) a first polybenzoxazole precursor that includes: a repeating unit of Chemical Formula 1 and a thermally polymerizable functional group at least one terminal end; (B) a second polybenzoxazole precursor that includes a repeating unit of Chemical Formula 3; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent. | 04-22-2010 |
20100190109 | ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING METHOD - The acid transfer composition of the invention comprises a radiation-sensitive acid generator, a polymer having a nitrogen-containing group and a ketone-based solvent. The composition may comprise further a sensitizer. The pattern forming method of the invention comprises a second resin film formation process in which the acid transfer composition is used to form a second resin film (acid transfer film) on a first resin film containing an acid-dissociable group-containing resin, but not containing a radiation-sensitive acid generator, an exposure process for exposing the second resin film to a light through a mask to generate an acid in the second resin film, an acid transfer process for transferring the acid generated in the second resin film to the first resin film, and a second resin film removing process. | 07-29-2010 |
20100233622 | METHOD FOR FORMING FINE PATTERN IN SEMICONDUCTOR DEVICE - Disclosed is a method for manufacturing fine patterns of semiconductor devices using a double exposure patterning process for manufacturing the second photoresist patterns by simply exposing without an exposure mask. The method comprises the steps of: forming a first photoresist pattern on a semiconductor substrate on which a layer to be etched is formed; coating a composition for a mirror interlayer on the first photoresist pattern to form a mirror interlayer; forming a photoresist layer on the resultant; and forming a second photoresist pattern which is made by a scattered reflection of the mirror-interlayer and positioned between the first photoresist patterns, by exposing the photoresist layer to a light having energy which is lower than a threshold energy (E | 09-16-2010 |
20110076619 | METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR - A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid generated by the second film is transferred to the first film. The second film is removed | 03-31-2011 |
20110281217 | NEGATIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND METHOD FOR PATTERNING USING THE SAME - This invention relates to a negative photosensitive insulating resin composition characterized in that the composition comprises an alkali-soluble polymer having at least one repeating constitutional unit represented by the following general formula (1), a cross-linker and a photo-acid generator. The negative photosensitive insulating resin composition provides a film having excellent properties such as heat resistance, mechanical properties and electric properties, and can be alkali-developed to achieve high resolution. | 11-17-2011 |
20110281218 | POLYIMIDE PRECURSOR, RESIN COMPOSITION COMPRISING THE POLYIMIDE PRECURSOR, PATTERN FORMING METHOD USING THE RESIN COMPOSITION, AND ARTICLES PRODUCED BY USING THE RESIN COMPOSITION - It is a main object of the present invention to provide a polyimide precursor and a polyimide precursor resin composition, which precursor being easy to synthesize, available at low cost, excellent in storage and capable of giving polyimide that is low in impurities after imidization, irrespective of the chemical structure of the finally-obtained polyimide. | 11-17-2011 |
20110294069 | PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS - Provided are photoresist compositions useful in forming photolithographic patterns by a negative tone development process. Also provided are methods of forming photolithographic patterns by a negative tone development process and substrates coated with the photoresist compositions. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices. | 12-01-2011 |
20120003583 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION - An actinic ray-sensitive or radiation-sensitive resin composition comprising (A) a guanidine compound having a logP value of 1.2 or more, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. | 01-05-2012 |
20120009522 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided. | 01-12-2012 |
20120015297 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR - A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R | 01-19-2012 |
20120015298 | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM - Disclosed is a photosensitive resin composition capable of displaying satisfactory patterning performance against an alkaline developer and yielding a cured film of a sufficiently low coefficient of linear thermal expansion. The photosensitive resin composition contains a photopolymerization initiator and a polyimide precursor obtained by the reaction of an ester-containing diamine such as 4-aminophenyl 4′-aminobenzoate, a biphenyl-based diamine such as 4,4′-diamino-2,2′-dimethylbiphenyl, and an unsaturated group-containing diamine such as 4,4′-diamino-2,2′-divinylbiphenyl with an acid anhydride such as pyromellitic dianhydride. The content of the structural unit derived from the unsaturated group-containing diamine in the polyimide precursor is 5-60 mol %. | 01-19-2012 |
20120021357 | POSITIVE-TYPE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, AND PATTERN FORMING METHOD USING SAME - A photosensitive insulating resin composition, comprising a polymer, a photosensitizer, and an amide derivative that is expressed by the following general formula (1); | 01-26-2012 |
20120045719 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND - A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). | 02-23-2012 |
20120058428 | PATTERNING PROCESS AND RESIST COMPOSITION - A pattern is formed by coating a first positive resist composition comprising a base resin, a photoacid generator, and a base generator having both a 9-fluorenylmethyloxycarbonyl-substituted amino group and a carboxyl group onto a substrate to form a first resist film, patternwise exposure, PEB, and development to form a first resist pattern, heating the first resist pattern for causing the base generator to generate a base for inactivating the pattern to acid, coating a second positive resist composition comprising an alcohol and an optional ether onto the first resist pattern-bearing substrate to form a second resist film, patternwise exposure, PEB, and development to form a second resist pattern. | 03-08-2012 |
20120058429 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). | 03-08-2012 |
20120077123 | Organic pigments for colour filters - Use of pigments of the formula (I) | 03-29-2012 |
20120088191 | lithographic printing plate precursor - A positive-working lithographic printing plate precursor is disclosed which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer a heat and/or light-sensitive coating including an infrared absorbing agent and a compound including a benzoxazine group. | 04-12-2012 |
20120100481 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME - An actinic ray-sensitive or radiation-sensitive composition, including: (1) a low molecular compound having a molecular weight of 500 to 5,000 and containing (G) an acid-decomposable group; and (2) a compound capable of generating an acid of 305 Å | 04-26-2012 |
20120107744 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND AND ACID GENERATOR - A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) having a group represented by general formula (b1-1) shown below in the cation moiety. | 05-03-2012 |
20120115085 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME - A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid. | 05-10-2012 |
20120122033 | POLYMER PRECURSOR, HIGH TRANSPARENCY POLYIMIDE PRECURSOR, POLYMER COMPOUND, RESIN COMPOSITION AND ARTICLE USING THEREOF - A polymer precursor including a part which sequences an unsaturated bond having a π electron orbit and a single bond alternately is disclosed. The polymer precursor has a first functional group and a second functional group which form a repeating unit constituting a polymer skeleton of an end product by an intramolecular reaction. At least a part of a conjugated state formed by the π electron orbit in the molecule is disconnected or weakened due to a three-dimensional structure of the molecule and a transmittance with respect to an electromagnetic wave of at least one wavelength selected from the group consisting of 436 nm, 405 nm, 365 nm, 248 nm and 193 nm is improved. | 05-17-2012 |
20120129101 | Self-Imageable Film Forming Polymer, Compositions Thereof and Devices and Structures Made Therefrom - Polymers and compositions for forming self-imageable films encompassing such polymers that encompass norbornene-type repeating unit having at least one phenolic functionality and maleic anhydride-type repeating unit, which can be formulated to be either positive tone imaging or negative tone imaging. The films formed thereby are useful as self-imageable layers in the manufacture of microelectronic, such as semiconductor, and optoelectronic devices. | 05-24-2012 |
20120135349 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure. | 05-31-2012 |
20120141938 | BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS - A chemically amplified resist composition comprising a base polymer, an acid generator, and an amine quencher in the form of a β-alanine, γ-aminobutyric acid or 5-aminovaleric acid derivative having an acid labile group-substituted carboxyl group has a high contrast of alkaline dissolution rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide focus margin. | 06-07-2012 |
20120148954 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION - Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. | 06-14-2012 |
20120156616 | Positive Photosensitive Resin Composition - Disclosed is a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound; and (E) a solvent. | 06-21-2012 |
20120156617 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes any of the compounds of general formula (I) below, a compound that when exposed to actinic rays or radiation, generates an acid and a hydrophobic resin. (The characters used in general formula (I) have the meanings mentioned in the description.) | 06-21-2012 |
20120156618 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.) | 06-21-2012 |
20120164577 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition includes at least: (A) a polymer containing a repeating unit (a1) and an acid labile repeating unit (a2), wherein the repeating unit (a1) generates an acid of a structure represented by general formula (1) as a result that the repeating unit (a1) is sensed to a high-energy radiation, the polymer being changed in solubility in alkali by the acid; and (B) an onium sulfonate represented by general formula (2). Also, a positive resist composition, which simultaneously establishes a lower acid diffusing characteristic and a higher dissolution contrast, and which suppresses volatilization of components originated from the resist composition such as a generated acid, a quencher, and the like, to suppress a chemical flare, thereby improving a DOF, a circularity, an LWR, and the like of a hole pattern, trench pattern, and the like; and a patterning process using the positive resist composition. | 06-28-2012 |
20120202153 | RESIST COMPOSITION AND PATTERNING PROCESS - A resist composition comprising a polymer having recurring units having an acid labile group and recurring units of a magnesium, copper, zinc or cesium salt of (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid copolymerized together exhibits a high resolution, high sensitivity, and minimal LER. The resist composition is best suited as the patterning material for VLSIs and photomasks. | 08-09-2012 |
20120208127 | RESIST COMPOSITION AND PATTERNING PROCESS - A resist composition comprising a salt of a mono- to tetrafunctional carboxylic acid with a metal selected from magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, cadmium, indium, tin, antimony, cesium, zirconium, and hafnium, and a solvent is improved in film uniformity when coated, and exhibits a high resolution, high sensitivity, and minimal LER when processed by the EB or EUV lithography. | 08-16-2012 |
20120214099 | PHOTORESIST COMPOSITIONS - A composition. The composition includes a polymer and a photosensitive acid generator capable of generating a first amount of acid upon exposure to a first dose of radiation and a second amount of acid upon exposure to a second dose of radiation. The second amount of acid is greater than the first amount of acid. The second dose is greater than the first dose. The composition includes a photosensitive base generator capable of generating a first amount of base upon exposure to the first dose and a second amount of base upon exposure to the second dose, where the first amount of base is greater than the first amount of acid and the second amount of base is less than the second amount of acid. The photosensitive base generator may include benzoin carbamates, O-carbamoylhydroxylamines, O-carbamoyloximes, aromatic sulfonamides, α-lactones, N-(2-Arylethenyl)amides, azides, amides, oximines, quaternary ammonium salts, or amineimides. | 08-23-2012 |
20120219911 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF - A lithographic printing plate precursor includes, in the following order: a support; an image-recording layer which is capable of forming an image by removing an unexposed area of the image-recording layer with at least one of printing ink and dampening water on a printing machine after exposure and contains an infrared absorbing dye, a polymerization initiator, a polymerizable compound and a binder polymer having an alkylene oxide group; and a protective layer containing a hydrophilic polymer which contains at least a repeating unit represented by the formula (1) as defined herein, a repeating unit represented by the formula (2) as defined herein, and a repeating unit represented by the formula (4) as defined herein, and in which a content of the repeating unit represented by the formula (4) is from 0.3 to 5.0% by mole based on total repeating units of the hydrophilic polymer. | 08-30-2012 |
20120237875 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND POLYMERIZABLE COMPOUND - A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R | 09-20-2012 |
20120251948 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION - The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a log P value of not less than 0 and less than 2.8. | 10-04-2012 |
20120251949 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION - Disclosed is a positive-type photosensitive resin composition which has excellent storage stability, particularly excellent sensitivity stability, and can be formed into a cured film having excellent adhesion onto a substrate when heated at 350° C. or higher or heated in the air. The positive-type photosensitive resin composition comprises (a) a polymer having, as the main component, at least one structure selected from the group consisting of a polyimide precursor structure, a polybenzoxazole precursor structure, and a polyimide structure, (b) a quinonediazide compound, (c) a silane coupling agent having a styryl group, (d) a silane coupling agent having an epoxy group, an oxetanyl group, a methacryloxy group, an acryloxy group, an amino group, an amide group or mercapto group and an alkoxysilyl group, and (e) a solvent. | 10-04-2012 |
20120251950 | COMPOSITION FOR FORMING PHOTOSENSITIVE RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film to be used in a lithography process, that includes: a polymer containing unit structures of Formula (1), Formula (2), and Formula (3): | 10-04-2012 |
20120282547 | PHOTOSENSITIVE ADHESIVE - A photosensitive adhesive capable of alkali development, the photosensitive adhesive exhibiting adhesion property for an adherend after it has been patterned by light exposure and development, the photosensitive adhesive being used in a method for producing a semiconductor device | 11-08-2012 |
20120301826 | POLYIMIDE-BASED POLYMERS, COPOLYMERS THEREOF AND POSITIVE TYPE PHOTORESIST COMPOSITIONS COMPRISING THE SAME - Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings. | 11-29-2012 |
20120301827 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND LYOPHOBIC FILM - A positive photosensitive resin composition that forms an image for a liquid crystal display device and an organic EL display device, for example. The resin is made of a cured film that is highly water repellent and highly oleophobic on the surface. The resin has insulating properties, retains an excellent image and causes no reflow, for example, when being cured to form a film having excellent reworkability. A positive photosensitive resin composition comprising component (A), component (B), component (C) and component (D); Component (A) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, and an N-substituted maleimide group; Component (B) is an acrylic polymer containing an acid dissociable group and a blocked isocyanate group; Component (C) is an acrylic polymer containing an acid dissociable group, an aliphatic hydroxy group, a C | 11-29-2012 |
20120322006 | Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method - A sulfonate resin according to the present invention has a repeating unit of the following general formula (3): | 12-20-2012 |
20120328984 | PROCESS FOR PRODUCING AZO COMPOUNDS, PIGMENT DISPERSION, COLORING COMPOSITION, INK FOR INKJET RECORDING, COLORING COMPOSITION FOR COLOR FILTER, AND COLOR FILTER - To provide a process for producing an azo pigment showing excellent coloring characteristics such as tinctorial strength and hue and showing excellent fastness such as light fastness and ozone fastness, an azo pigment dispersion, a coloring composition, and an ink for inkjet recording. | 12-27-2012 |
20130022927 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL - Disclosed are a photosensitive composition containing an aqueous dispersion and having excellent storage stability, and a photosensitive lithographic printing plate material using the photosensitive composition and being capable of being developed using water, which is advantageous not only in that the photosensitive lithographic printing plate material exhibits high sensitivity and high image quality as well as excellent storage stability, but also in that even when the printing plate material is repeatedly subjected to developing treatment using water, the generation of sludge derived from the photosensitive composition in the developer repeatedly used is suppressed, achieving excellent developing properties. | 01-24-2013 |
20130029268 | PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING A PLANOGRAPHIC PRINTING PLATE - The invention provides a planographic printing plate precursor that is capable of providing a planographic printing plate in which ablation at the time of infrared laser exposure is inhibited and which has excellent developability of a non-image portion and printing durability of an image portion. The photosensitive planographic printing plate precursor, includes: an image recording layer on a hydrophilic support, the image recording layer including: (A) an infrared absorber; and (B) a copolymer having a repeating unit having a zwitterionic structure in a side chain thereof, and a repeating unit having a heteroalicyclic structure or a repeating unit having a hetero atom and an alicyclic structure in the main chain thereof. | 01-31-2013 |
20130029269 | POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS - A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness. In formula (1), A is —(CR | 01-31-2013 |
20130084527 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS - A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R | 04-04-2013 |
20130095426 | PHOTOSENSITIVE POLYMIDES - The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board. | 04-18-2013 |
20130101938 | ON-PRESS DEVELOPABLE LITHOGRAPHIC PRINTING PLATE PRECURSORS - A negative-working lithographic printing plate precursor is designed for improved printout or contrast between exposed and non-exposed regions in its imageable layer. The imaged precursor can be developed on-press. The improvement in printout is achieved by using a combination of at least two infrared radiation absorbing cyanine dyes. At least one of these cyanine dyes comprises a methine chain substituent that comprises a group represented by Structure (I): | 04-25-2013 |
20130101939 | LITHOGRAPHIC PRINTING PLATE PRECURSORS - Lithographic printing plate precursors can have an imageable layer that includes a polymeric binder having an acid number of at least 30 mg KOH/g of polymer to and including 150 mg KOH/g of polymer, at least 3 weight % of recurring units derived from one or more N-alkoxymethyl (alkyl)acrylamides or alkoxymethyl (alkyl)acrylates, at least 2 weight % of recurring units having pendant 1H-tetrazole groups, and at least 10 weight % of recurring units having pendant cyano groups. The use of such polymeric binders provides good bakeability and chemical solvent resistance, especially for positive-working precursors. | 04-25-2013 |
20130108963 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PREPARING PHOTOSENSITIVE COMPOSITION | 05-02-2013 |
20130115554 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND - A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R | 05-09-2013 |
20130122424 | PHOTORESIST COMPOSITION - The present invention provides a photoresist composition comprising a compound represented by formula (I): | 05-16-2013 |
20130137036 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film - Disclosed are a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and having a thermally polymerizable functional group at at least one of the terminal end; (B) a dissolution controlling agent including a novolac resin including a repeating unit represented by the following Chemical Formula 4; (C) a photosensitive diazoquinone compound; (D) a silane compound; (E) an acid generator; and (F) a solvent, a photosensitive resin film prepared using the same, and a semiconductor device including the photosensitive resin film. | 05-30-2013 |
20130137037 | Silicon Compound, Condensation Product, Resist Compostion and Pattern Formation Method - A silicon compound according to the present invention is represented by the general formula (1). This silicon compound can be easily synthesized by using a hydrolysable silicon compound such as alkoxysilane and has, in its molecule, a hydrolysable group e.g. alkoxy group and a photoacid generating group capable of being dissociated to generate an acid by irradiation with a high-energy ray. | 05-30-2013 |
20130157196 | COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING - The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent. | 06-20-2013 |
20130164681 | Pigment Dispersion Composition, Photosensitive Resin Composition Including the Same and Color Filter Using the Same - Disclosed are a pigment dispersion composition including a pyridone azo-based compound including a monomer represented by the following Chemical Formula 1, a polymer including a repeating unit represented by the following Chemical Formula 2, or a combination thereof, wherein each substituents of Chemical Formulae 1 and 2 are the same as defined the detailed description, (B) a pigment, (C) a binder resin, (D) a dispersing agent, and (E) a solvent; a photosensitive resin composition including the same; and a color filter including the same. | 06-27-2013 |
20130164682 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film - Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. | 06-27-2013 |
20130171562 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION - An actinic ray- or radiation-sensitive resin composition according to the present invention comprises a sulfonic acid-generating compound that is decomposed by an action of an acid to generate a sulfonic acid having a volume of 240 Å | 07-04-2013 |
20130171563 | Photosensitive Novolac Resin, Positive Photosensitive Resin Composition Including Same, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film - Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R | 07-04-2013 |
20130171564 | Positive Photosensitive Resin Composition, and Display Device and Organic Light Emitting Device Using the Same - Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. | 07-04-2013 |
20130171565 | ORGANIC ANTI REFLECTIVE LAYER COMPOSITION - Disclosed is an organic antireflective film composition which includes a monomer containing two or more thiol groups and a monomer containing two or more vinyl groups, as crosslinking agents. When the organic antireflective film composition is used, an antireflective film formed from the composition can be rapidly etched in an ultrafine pattern forming process, and the curing rate can be increased, while the etching rate is increased, without using an acid generator and a curing agent or by using the agents only in small amounts. | 07-04-2013 |
20130177850 | POSITIVE TYPE RESIST COMPOSITION FOR USE IN LIQUID IMMERSION EXPOSURE AND A METHOD OF FORMING THE PATTERN USING THE SAME - A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent. | 07-11-2013 |
20130244179 | Novel Thermoreversible Network Scaffolds and Methods of Preparing Same - The invention includes a novel light-activated polymerizable composition, wherein reversible crosslinks may be converted into irreversible crosslinks using a fully controllable physical and/or chemical process. The invention further includes methods of photofixing a light sensitive material or patterning an article comprising a light sensitive material. | 09-19-2013 |
20130288179 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND - A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that includes a structural unit having an acid-labile group. R | 10-31-2013 |
20130309607 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION - A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance. | 11-21-2013 |
20140011135 | POLYMER COMPOUND COMPRISING DYE AND CURABLE RESIN COMPOSITION COMPRISING SAME - The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition. | 01-09-2014 |
20140038106 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION - Provided are N-acyl-β-lactam derivatives represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer, | 02-06-2014 |
20140065541 | Method of Stabilizing Fluorine-Containing Acid Amplifier - A method of stabilizing a fluorine-containing acid amplifier. The method is provided to include the step of dissolving a fluorine-containing acid amplifier in an organic solvent thereby producing a solution of the fluorine-containing acid amplifier, the fluorine-containing acid amplifier being represented by general formula (1): | 03-06-2014 |
20140087310 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula. | 03-27-2014 |
20140093823 | STABILIZED ACID AMPLIFIERS - There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. The compositions are of formula I or formula II: | 04-03-2014 |
20140106278 | DRY FILM RESIST SHEET AND METHOD OF MANUFACTURING THE SAME - There is provided a dry film resist sheet, including: a base film; a first dry film resist layer formed on the base film, the first dry film resist layer containing a binder polymer, a multi-functional monomer, and a photoinitiator; and a second dry film resist layer formed on the first dry film resist layer, the second dry film resist layer containing a binder polymer, a multi-functional monomer, a photoinitiator, and a thermal initiator. | 04-17-2014 |
20140141374 | NEGATIVE-WORKING LITHOGRAPHIC PRINTING PLATE PRECURSORS - A negative-working lithographic printing plate precursor is used for making lithographic printing plates from infrared radiation imaging. The precursor comprises free radical chemistry and a specific infrared radiation absorber that is a cyanine dye and defined by Formula (1a) described in the disclosure. This particular infrared radiation absorber provides both IR sensitivity and print out after imaging. | 05-22-2014 |
20140193752 | STABILIZED ACID AMPLIFIERS - There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed. | 07-10-2014 |
20140193753 | COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING - The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent. | 07-10-2014 |
20140322652 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN - A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid generator which generates acid upon exposure, the base component containing a polymeric compound containing a structural unit represented by general formula (a0-1) and the acid generator containing a compound represented by general formula (b1). In the formulae, R represents H, an alkyl group of C | 10-30-2014 |
20140349233 | WATER SOLUBLE NORBORNENE-TYPE POLYMERS AND PHOTOIMAGEABLE COMPOSITIONS THEREOF - Embodiments in accordance with the present invention encompass water soluble polycyclic vinyl addition polymers having a norbornene type repeat unit derived from a norbornene type of monomer that encompasses a saccharide functional moiety. Embodiments in accordance with the present invention also encompass low and high molecular weight polymers with low catalyst loading. | 11-27-2014 |
20150044612 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND PROCESSES FOR PREPARING LITHOGRAPHIC PRINTING PLATES - Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L | 02-12-2015 |
20150050594 | Positive Photosensitive Resin Composition, and Photosensitive Resin Film and Display Device Prepared by Using the Same - Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same. | 02-19-2015 |
20150079519 | PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE RESIN, AND PHOTOSENSITIVE COMPOSITION - A photosensitive compound represented by formula (1) or formula (2). (Chemical formula 1) (In formula (1) and formula (2), n is an integer of 1-3; R | 03-19-2015 |
20150111153 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device - Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor including a functional group at a terminal end thereof, wherein the functional group is dissociated by light of about 400 nm to about 550 nm wavelength region and is acidified; (B) a photosensitive diazoquinone compound; and (C) a solvent, and a photosensitive resin film and a display device using the same. | 04-23-2015 |
20150111154 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - There is provided a pattern forming method including: (a) a process of forming a film by resin (P) having a repeating unit (a) having a cyclic structure and a partial structure represented by the following Formula (I), (II-1) or (II-2), and a repeating unit (b) having a group which decomposes by the action of an acid to generates a polar group, and an actinic ray-sensitive or radiation-sensitive resin composition containing compound (B) which generates acid upon irradiation with an actinic ray or radiation; (b) a process of exposing the film; and (c) a process of forming a negative-type pattern by performing development using a developer including an organic solvent, an actinic ray-sensitive or radiation-sensitive resin composition used therefor, a resist film, a method of manufacturing an electronic device, and an electronic device. | 04-23-2015 |
20150147694 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device - Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin, (B) a photosensitive diazoquinone compound, (C) a thermosetting cross-linking agent represented by the following Chemical Formula 1, wherein each substituent of Chemical Formula 1 is the same as defined in the detailed description, and (D) a solvent, a photosensitive resin film using the same, and a display device. | 05-28-2015 |
20150147695 | RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN - A resin comprising:
| 05-28-2015 |
20160018733 | PHOTOSENSITIVE POLYIMIDE COMPOSITION, BASE AGENT THEREOF, METHOD OF MAKING THE BASE AGENT, AND SOLDER-RESISTANT POLYIMIDE THIN FILM MADE FROM THE COMPOSITION - A photosensitive polyimide composition; the composition comprises a base agent and a curing agent comprising a photoinitiator. By applying an aliphatic diamine monomer, which has a long carbon chain, and a grafting monomer, which has a main carbon chain having a double bond and an epoxy group at two ends respectively, to a method of making the base agent, a mixture of the base agent and the curing agent can be screen printed to form a photosensitive polyimide film on a copper foil. Also, the photosensitive polyimide film can be exposed under low exposure energy, and can be developed to a solder-resistant polyimide thin film by a weak alkaline developer after exposed. In addition, the solder-resistant polyimide thin film has low dielectric constant, low dielectric loss, good flame resistance, good solder resistance, and good pencil hardness. Accordingly, the photosensitive polyimide composition is applicable to high density flexible printed circuit boards. | 01-21-2016 |
20160116841 | LITHOGRAPHIC PRINTING PLATE PRECURSOR - A negative-working lithographic printing plate precursor includes a support and a coating containing a photopolymerisable layer including a polymerisable compound including:
| 04-28-2016 |