| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 430273100 | Identified overlayer on radiation-sensitive layer | 30 |
| 20090197199 | MATERIAL FOR FORMING RESIST PROTECTIVE FILM AND METHOD FOR FORMING RESIST PATTERN USING SAME - In the liquid immersion lithography process, by simultaneously preventing deterioration of a resist film and deterioration of an immersion liquid employed during liquid immersion lithography which uses various immersion liquids, including water, resistance to post exposure delay of the resist film can be improved without increasing the number of processes, thereby making it possible to form a high resolution resist pattern using liquid immersion lithography. Using an alkaline soluble polymer, a crosslinking agent, and a solvent capable of dissolving them as at least constituent component, a composition is prepared and a protective film is formed on the surface of the resist film to be used, using the composition. | 08-06-2009 |
| 20090087778 | METHOD FOR MANUFACTURING ORIGINAL PLATE OF PLANOGRAPHIC PRINTING PLATE AND ORIGINAL PLATE OF PLANOGRAPHIC PRINTING PLATE - An aspect of the present invention provides a method for manufacturing an original plate of a planographic printing plate, comprising: a process of forming a photosensitive layer on a substrate; a process of coating an overcoat layer over the photosensitive layer; a first drying process of supplying hot air toward the overcoat layer; and a second drying process of supplying hot air and superheated vapor toward the overcoat layer after the first drying process, wherein the original plate of a planographic printing plate is photopolymerizable. | 04-02-2009 |
| 20100040974 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN - An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect. | 02-18-2010 |
| 20100040973 | COMPOSITION FOR FORMATION OF RESIST PROTECTION FILM, AND METHOD FOR FORMATION OF RESIST PATTERN USING THE SAME - Disclosed are: a composition for forming a resist protection film, which shows less damage to a resist film, can form a good, rectangular resist pattern, and can be used regardless of the structure of a resin used in a resist composition; and a method for forming a resist pattern by using the composition. Specifically, disclosed are: a composition for forming a resist protection film, which comprises (a) an alkali-soluble polymer and (b) an ether-based solvent; and a method for forming a resist pattern by using the composition. | 02-18-2010 |
| 20130071786 | COATING COMPOSITION AND IMAGE-FORMING MATERIAL, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND OXYGEN-BLOCKING FILM INCLUDING THE COATING COMPOSITION - The invention is directed to a coating composition containing a polymer having a structural unit represented by the following formula (1), an image-forming material including, in the following order: a support; a photosensitive layer containing a radical polymerizable compound and a photo initiator; and a protective layer containing the coating composition, a lithographic printing plate precursor including, in the following order: a support; a photosensitive layer containing a radical polymerizable compound and a photo initiator; and a protective layer containing the coating composition, and an oxygen-blocking film including a layer containing the coating composition: | 03-21-2013 |
| 20090233224 | Compositions and processes for photolithography - Overcoating layer compositions are provided that are applied above a photoresist composition including for immersion lithography processing as well as non-immersion imaging. | 09-17-2009 |
| 20130115553 | TOPCOAT COMPOSITIONS AND PHOTOLITHOGRAPHIC METHODS - Topcoat compositions are provided that can be used in immersion lithography to form photoresist patterns. The topcoat compositions include a polymer system that includes a matrix polymer and a surface active polymer. The matrix polymer is present in the composition in a larger proportion by weight than the surface active polymer, and the surface active polymer has a lower surface energy than a surface energy of the matrix polymer. A solvent system includes a first organic solvent chosen from gamma-butyrolactone and/or gamma-valerolactone, and a second organic solvent. The first organic solvent has a higher surface energy than a surface energy of the surface active polymer, and a higher boiling point than a boiling point of the second organic solvent. | 05-09-2013 |
| 20080311509 | Photopolymer Printing Plate Precursor - A photopolymer printing plate precursor includes a photosensitive coating on a support, wherein the photosensitive coating includes a composition that is photopolymerizable upon absorption of light, and the composition includes at least one binder, a polymerizable compound, a sensitizer, and a photoinitiator. The binder is a copolymer that has a Tg of less than 70° C., and wherein 1 mol-% to 50 mol-% of the monomeric units of the copolymer are substituted by at least one acidic group, has a very high sensitivity and resistance of the exposed image portions against alkaline developers, when exposed with a laser, even if no pre-heat step is performed. | 12-18-2008 |
| 20120189959 | LITHOGRAPHIC PRINTING ORIGINAL PLATE - A presensitized plate having a long press life and excellent resistance to scum and corrosive micro-stains and capable of on-press development is provided. The presensitized plate includes a photosensitive layer containing (A) a sensitizing dye, (B) a polymerization initiator, (C) a polymerizable compound, and (D) a binder polymer; and a protective layer which are formed on a support in this order. The support is prepared from an aluminum alloy plate containing intermetallic compound particles with a circle equivalent diameter of 0.2 μm or more at a surface density of 35,000 pcs/mm | 07-26-2012 |
| 20090136871 | TOPCOAT COMPOSITION - A topcoat composition. The topcoat composition includes a fluorine-containing polymer and a casting solvent that includes an alcohol. | 05-28-2009 |
| 20090311625 | Method for forming photoresist pattern and photoresist laminate - A method for forming a photoresist pattern involves the steps of: depositing a photoresist film on a substrate, the photoresist film containing an acid-generating agent capable of generating an acid upon exposure to light; overlaying an antireflective film over the photoresist film, the antireflective film containing a fluorine-based acidic compound; selectively exposing the photoresist; and developing the photoresist. The novel method is characterized in that the acid-generating agent and the fluorine-based acidic compound are selected so that the acid that the acid-generating agent generates in the photoresist film upon exposure to light has a higher acidity than the fluorine-based acidic compound in the antireflective film. | 12-17-2009 |
| 20090053648 | LIGHT SENSITIVE PLANOGRAPHIC PRINTING PLATE MATERIAL - The present invention provides a light sensitive planographic printing plate material which is adapted to exposure employing a laser emitting light with an emission wavelength of from 350 to 450 nm, and which exhibits high sensitivity and excellent safelight property, and a light sensitive planographic printing plate material comprising a support and provided thereon, a light sensitive layer and a protective layer (E), the light sensitive layer containing a photopolymerization initiator (A), a polymerizable ethylenically unsaturated compound (B), a dye (C) having absorption maximum in the wavelength regions of from 350 to 450 nm and a polymeric binder (D), and the light sensitive planographic printing plate material being characterized in that the protective layer contains a dye precursor (F) capable of changing to a dye absorbing light with a wavelength of from 350 to 450 nm by heating. | 02-26-2009 |
| 20090246689 | PROCESSLESS LITHOGRAPHIC PRINTING PLATE PRECURSOR - A radiation-sensitive medium comprises hydrophilic polymer particles, the particles comprising a thermally softenable hydrophobic polymer, a hydrophilic polymer and a bonding compound capable of chemically bonding to the hydrophobic polymer and to the hydrophilic polymer. The radiation-sensitive medium further may comprise a substance capable of converting radiation into heat. The radiation-sensitive medium is aqueous-ineluable when coated and dried, and becomes hydrophobic under the action of heat. The polymer particles are made by polymerization of at least one hydrophobic monomer and at least one bonding compound in the presence of the hydrophilic polymer. The radiation-sensitive medium may be provided as a coatable composition to be applied to substrates to form a processless radiation-imageable lithographic printing precursor, which may further be provided with an aqueous eluable hydrophilic overcoat. The processless radiation-imageable lithographic printing precursor so created may be imaged using absorbed radiation that is imagewise converted to heat, resulting in areas of hydrophobic property, while unimaged areas retain their hydrophilic property. This allows the latent image so formed to be employed in creating a negative-working lithographic printing master. The negative-working lithographic printing master so created is irreversible, does not require a substrate of controlled hydrophilicity and provides great toughness in the exposed areas. The radiation-sensitive medium may be coated on-platesetter or on-press onto a suitable substrate, including the drum of the press. It may also be coated off-press on a suitable substrate to create a precoated processless radiation-imageable lithographic printing precursor. | 10-01-2009 |
| 20100151385 | STACK OF NEGATIVE-WORKING IMAGEABLE ELEMENTS - A plurality of negative-working lithographic printing plate precursors is provided in a stack. Each precursor comprises an aluminum-containing substrate having thereon a single imageable layer and an outermost topcoat that has a dry coating weight equal to or less than 1 g/m | 06-17-2010 |
| 20090035695 | POSITIVE WORKING LITHOGRAPHIC PRINTING PLATES - A positive-working lithographic printing plate precursor is disclosed comprising on a grained and anodized aluminum support having a hydrophilic surface or which is provided with hydrophilic layer, a coating comprising:
| 02-05-2009 |
| 20110143281 | COATING COMPOSITIONS FOR PHOTORESISTS - In one aspect, the present invention relates to coating compositions that comprise a resin component, wherein the predominant portion of the resin component comprising one or more resins that are at least substantially free of fluorine. Coating compositions of the invention are useful as photoresist overcoat layers, including in immersion lithography processing. | 06-16-2011 |
| 20100081087 | COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM AND PATTERN FORMATION METHOD USING THE SAME - The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating composition comprises a particular naphthalene compound, a polymer, and a solvent. The composition is used for forming a top anti-reflection coating provided on a photoresist layer. From the photoresist layer, a pattern can be formed by use of light in 160 to 260 nm. | 04-01-2010 |
| 20120202152 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND PLATE MAKING METHOD THEREOF - A lithographic printing plate precursor comprising a support, tin image-recording layer which contains (A) an infrared absorbing agent, (B) a radical polymerization initiator and (C) a radical polymerizable compound and in which an unexposed area can be removed by supplying printing ink and dampening water after exposure, and an overcoat layer in this order, wherein the overcoat layer contains at least two kinds of inorganic stratiform compounds having different crystal structures. | 08-09-2012 |
| 20090197200 | Resist top coat composition and patterning process - The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid: | 08-06-2009 |
| 20100021844 | NEGATIVE-WORKING IMAGEABLE ELEMENTS AND METHOD OF USE - Negative-working imageable elements can be imaged and processed with water to provide lithographic printing plates. These imageable elements have imageable layers that contain a particulate polymeric binder having polyetheramine side chains. Rapid processing speeds are also possible using water and optional mechanical rubbing means for processing the imaged element. | 01-28-2010 |
| 20120115083 | Biodegradable Film for Flexographic Printing Plate Manufacture and Method of Using the Same - The use of biodegradable polymer films in the manufacture of photosensitive relief image printing plates is described, including printing plates produced from liquid photopolymer resins and from sheet polymers as well as direct write/laser engravable printing plates. The biodegradable polymer films can be used as substrate layers, oxygen barrier layers, and coverfilms and, once the printing plates have been used and disposed of, the biodegradable polymer films are capable of decomposing in the environment. | 05-10-2012 |
| 20120021355 | COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD - Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/μm or greater with respect to 193-nm incident light. | 01-26-2012 |
| 20120258400 | NOVEL TARC MATERIAL FOR IMMERSION WATERMARK REDUCTION - A coating material for use during a lithography process. In an example, a coating material disposed on a material layer includes a polymer and a quencher catcher chemically bonded to the polymer. The quencher catcher substantially neutralizes any quencher that diffuses into the coating material from the material layer. | 10-11-2012 |
| 20090087779 | PRINTING PLATE MATERIAL - The invention provides a printing plate material having high sensitivity, excellent initial printability, excellent stability under room light, i.e., good workability or storage stability under room light, and reduced contamination of a printing press. The printing plate material comprises a support having a hydrophilic surface, and provided thereon, an on-press developable image formation layer (A) and an on-press developable overcoat layer (B) in that order, wherein the on-press developable image formation layer (A) contains (a1) through (a3) as shown below, and the on-press developable overcoat layer (B) contains (b) as shown below: | 04-02-2009 |
| 20120171613 | UPPER LAYER FILM-FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN - An upper layer film-forming composition includes a resin and a solvent component. The resin is soluble in a developer. The solvent component includes first solvent which has a boiling point of 180 to 280° C. at 101.3 kPa and a vapor pressure of 0.001 to 0.1 kPa at 20° C. The upper layer film-forming composition is used to form an upper layer film on a photoresist film. | 07-05-2012 |
| 20120225384 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 09-06-2012 |
| 20120264053 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 10-18-2012 |
| 20090035694 | POLYMERIC DYES, OVERCOAT COMPOSITIONS AND THERMAL LITHOGRAPHIC PRINTING PLATES - A thermal lithographic printing plate overcoat composition comprising (a) a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm; and (b) micro-particles or nano-particles is provided. A negative-working thermal lithographic printing plate comprising (a) a hydrophilic substrate; (b) a near infrared imaging layer disposed on the hydrophilic substrate; and (c) an overcoat layer disposed on the imaging layer, said overcoat layer comprising a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm; and micro-particles or nano-particles is also provided. Finally, a water-soluble polymeric dye having an absorption band between about 300 and about 600 nm is provided. | 02-05-2009 |
| 20110311916 | THERMALLY ABLATABLE LITHOGRAPHIC PRINTING PLATE PRECURSORS - A lithographic printing plate precursor can be used to prepare a printing plate using thermal ablation. The precursor has a non-thermally ablatable first layer on a substrate. Over the first layer is a thermally ablatable outer layer that includes an IR absorbing compound in an ablatable polymeric binder. The first layer includes a sol gel as a continuous inorganic matrix and a discontinuous inorganic phase (inorganic particles) dispersed therein. | 12-22-2011 |
| 20130017487 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 01-17-2013 |
