Class / Patent application number | Description | Number of patent applications / Date published |
430014000 | Multilayer | 13 |
20120214094 | METHOD OF FORMING PATTERN - According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively. | 08-23-2012 |
20120264040 | CLEAR OVERCOAT COMPOSITIONS AND METHODS FOR STABILIZING THE SAME - Present embodiments generally relate to a novel clear or colorless overcoat composition that may be used for overcoating, for example, ink based images and xerographic images. The overcoat composition, which may be used as a base for a clear solid ink, comprises one or more waxes. Also included in the present embodiments is methods for using and stabilizing the overcoat composition as a solid ink. | 10-18-2012 |
20120270143 | RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME - A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1: | 10-25-2012 |
20150125787 | ELECTROLESS PLATING METHOD USING BLEACHING - A conductive pattern can be formed a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation, (c) a crosslinking agent that is capable of reacting in the presence of the acid, and (d) optionally, a photosensitizer. The polymeric layer is patternwise exposed to provide non-exposed regions and exposed regions comprising a polymer comprising carboxylic acid groups. Both the non-exposed regions and the exposed regions of the polymeric layer are contacted with a reducing agent, bleached to remove surface amounts of the reducing agent in both non-exposed and exposed regions of the polymeric layer, and contacted with electroless seed metal ions to oxidize the reducing agent and to form corresponding electroless seed metal nuclei in the exposed regions. The corresponding electroless seed metal nuclei are then electrolessly plated with a conductive metal. | 05-07-2015 |
20150316848 | CONDUCTIVE ELEMENT PRECURSOR AND CONDUCTIVE PATTERN FORMATION - A black-and-white silver halide conductive film element precursor has at least one first non-color hydrophilic photosensitive layer comprising a silver halide and a first hydrophilic overcoat disposed over the first non-color hydrophilic photosensitive layer. This first hydrophilic overcoat is the outermost layer and contains one or more immobilized radiation absorbers such as immobilized ultraviolet radiation absorbers, in a total amount of at least 5 mg/m | 11-05-2015 |
430015000 | Plural image layers | 8 |
20120178020 | METHOD AND COMPOSITION FOR REDUCING WASTE IN PHOTO-IMAGING APPLICATIONS - Waste reduction, including hazardous waste reduction in photoimaging processes can be accomplished by improving diffusional resolution of cationic curable compositions. The addition of fluorinated polymers including fluorinated surfactants provides improved diffusional resolution in cationic and/or radical based photoimaging formulations allowing for image accuracy improvements, and reduced product and process waste quantity and disposal cost. These fluorinated surfactants also allow for increased cure speed, and non-hazardous constituent formulations that result in less wasted material and time. | 07-12-2012 |
20140113223 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern. | 04-24-2014 |
20140134524 | METHODS AND MATERIALS FOR LITHOGRAPHY OF A HIGH RESOLUTION HSQ RESIST - A method of fabricating a substrate-HSQ resist material in which the substrate is selected from germanium (Ge) or gallium arsenide (GaAs) comprises the steps of pretreating a surface of the substrate to provide halogen termination of the substrate surface such that surface oxide is removed, and applying a HSQ resist to the surface. Removal of surface oxide allows the use of aqueous HSQ developers without causing damage to the surface. Also disclosed is a substrate-HSQ resist material, in which the substrate is selected from germanium or gallium arsenide, suitable for use in nanodevice fabrication and comprising a germanium or gallium arsenide substrate having a surface bearing a high resolution HSQ resist film or layer, in which the substrate has a halogen terminated surface. | 05-15-2014 |
20140162179 | METHOD FOR MANUFACTURING ELECTRODE FOR DISPLAY APPARATUS, ELECTRODE FOR DISPLAY APPARATUS MANUFACTURED USING THE SAME, AND DISPLAY APPARATUS INCLUDING THE SAME - A method for manufacturing an electrode for a display apparatus includes printing and drying a conductive paste on a substrate, and printing a glass paste on the dried conductive paste, followed by patterning. | 06-12-2014 |
20140234761 | PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, RESIST COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE - A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern. | 08-21-2014 |
20150140482 | PATTERN FORMING METHOD, AND, ELECTRONIC DEVICE PRODUCING METHOD AND ELECTRONIC DEVICE, EACH USING THE SAME - A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order. | 05-21-2015 |
20160062238 | CONDUCTIVE ELEMENT PRECURSOR AND CONDUCTIVE PATTERN FORMATION - Black-and-white silver halide conductive film element precursors have, on one or both sides and in order, a UV filter layer, non-color hydrophilic photosensitive layer comprising a silver halide, and a hydrophilic overcoat as an outer layer. The one or two UV filter layers individually contains one or more UV absorbing agents in an amount of up 0.5 mmol/m | 03-03-2016 |
20160375714 | Method for Producing a Film Element - The invention concerns a process for producing a film element having mutually registered metallic layers ( | 12-29-2016 |