Class / Patent application number | Description | Number of patent applications / Date published |
427255395 | Inorganic coating | 11 |
20080220166 | Silicon Spout-Fluidized Bed - Polysilicon is formed by pyrolytic decomposition of a silicon-bearing gas and deposition of silicon onto fluidized silicon particles. Multiple submerged spout fluidized bed reactors and reactors having secondary orifices are disclosed. | 09-11-2008 |
20090263581 | METHOD AND APPARATUS TO COAT OBJECTS WITH PARYLENE AND BORON NITRIDE - The present inventions relates to an improved and novel Parylene compositions with has improved heat transfer and durability qualities, as well as a methods and apparatus to coat objects with the novel Parylene compositions, and objects coated with the novel Parylene compositions. The novel Parylene composition of the invention comprises Parylene and boron nitride. The invention also includes objects coated with at least one polymer coat and a boron nitride coat. | 10-22-2009 |
20090324830 | TIN PHOSPHATE BARRIER FILM, METHOD, AND APPARATUS - A method is disclosed for inhibiting oxygen and moisture penetration of a device comprising the steps of depositing a tin phosphate low liquidus temperature (LLT) inorganic material on at least a portion of the device to create a deposited tin phosphate LLT material, and heat treating the deposited LLT material in a substantially oxygen and moisture free environment to form a hermetic seal; wherein the step of depositing the LLT material comprises the use of a resistive heating element comprising tungsten. An organic electronic device is also disclosed comprising a substrate plate, at least one electronic or optoelectronic layer, and a tin phosphate LLT barrier layer, wherein the electronic or optoelectronic layer is hermetically sealed between the tin phosphate LLT barrier layer and the substrate plate. An apparatus is also disclosed having at least a portion thereof sealed with a tin phosphate LLT barrier layer. | 12-31-2009 |
20100080905 | SOLUTE STABILIZATION OF SHEETS FORMED FROM A MELT - Embodiments of this apparatus and method introduce solutes into a sheet formed from a melt. A melt of a material is cooled and a sheet of the material is formed in the melt. A first fluid is introduced around the sheet at least partially while the sheet is formed. A second fluid also may be introduced. In one instance, use of the first fluid and second fluid may form a sheet that has two different solute concentrations. | 04-01-2010 |
20110052810 | FILM FORMING METHOD AND STORAGE MEDIUM - An AxByOz-type oxide film can be produced by introducing a first organic metal compound source material, a second organic metal compound source material and an oxidizer into a processing chamber and forming the AxByOz-type oxide film on a substrate. In the production, a compound which has a low vapor pressure and has an organic ligand capable of being decomposed with an oxidizer to produce CO is used as the first organic metal compound source material, a metal alkoxide is used as the second organic metal compound source material, and gaseous O | 03-03-2011 |
20110281031 | Industrial Vapour Generator For Depositing An Alloy Coating On A Metal Strip - The present invention relates to a vacuum deposition facility for depositing a metal alloy coating on a substrate ( | 11-17-2011 |
20130108789 | METHOD FOR DEPOSITION | 05-02-2013 |
20130337174 | VAPORIZATION SOURCE, VAPORIZATION CHAMBER, COATING METHOD AND NOZZLE PLATE - The invention relates to vaporization source, an evaporation chamber, a coating method and a nozzle plate. The vaporization source according to the invention makes it possible to generate a high, stable melt flow rate having improved layer thickness homogeneity under vacuum conditions in a selenium atmosphere. The direction of the molecular flow of the vaporization source can be adjusted with respect to the substrate support located above the vaporization source. | 12-19-2013 |
20140010958 | DEVICE FOR GENERATING SOLID HYDROGEN- AND/OR DEUTERIUM-BASED TARGETS - The device for performing continuous deposition of a solid hydrogen and/or deuterium film includes a cell provided with a control valve for controlling the flowrate of the gas inlet to the cell, a strip, and means for moving the strip in the cell. The device includes a pumping device placing a volume of the cell, through which the strip passes, at a first pressure, and a heat exchanger arranging the strip in said volume at a first temperature. To adjust the pressure, the device further includes a control circuit of the pumping device and of the control valve, adjusting the first pressure so as to condense a solid hydrogen and/or deuterium film on the strip in movement in said volume. | 01-09-2014 |
20140308445 | CANISTER FOR DEPOSITION APPARATUS, AND DEPOSITION APPARATUS AND METHOD USING THE SAME - A deposition apparatus, and a canister for the deposition apparatus capable of maintaining a predetermined amount of source material contained in a reactive gas supplied to a deposition chamber when the source material is deposited on a substrate by atomic layer deposition includes a main body, a source storage configured to store a source material, a heater disposed outside the main body, and a first feed controller configured to control the source material supplied to the main body from the source storage. | 10-16-2014 |
20160032449 | GYROSCOPE AND DEVICES WITH STRUCTURAL COMPONENTS COMPRISING HfO2-TiO2 MATERIAL - Disclosed are devices, materials, systems, and methods, including a device that includes one or more structural components, at least one of the one or more structural components comprising substantially HfO | 02-04-2016 |