Class / Patent application number | Description | Number of patent applications / Date published |
427249170 | Metal carbide containing coating | 8 |
20080280038 | Methods of using thin metal layers to make carbon nanotube films, layers, fabrics, ribbons, elements and articles - Methods of using thin metal layers to make Carbon Nanotube Films, Layers, Fabrics, Ribbons, Elements and Articles are disclosed. Carbon nanotube growth catalyst is applied on to a surface of a substrate, including one or more thin layers of metal. The substrate is subjected to a chemical vapor deposition of a carbon-containing gas to grow a non-woven fabric of carbon nanotubes. Portions of the non-woven fabric are selectively removed according to a defined pattern to create the article. A non-woven fabric of carbon nanotubes may be made by applying carbon nanotube growth catalyst on to a surface of a wafer substrate to create a dispersed monolayer of catalyst. The substrate is subjected to a chemical vapor deposition of a carbon-containing gas to grow a non-woven fabric of carbon nanotubes in contact and covering the surface of the wafer and in which the fabric is substantially uniform density. | 11-13-2008 |
20100291298 | Methods of Preparing Metal Carbides - The present embodiments relate methods of preparing metal carbides, for example some embodiments relate to methods of preparing metal carbides that do not contain the formation of an intermediate oxide compound. Some embodiments relate to methods that do not employ hydrocarbons in the reaction. Some embodiments relate to a method of preparing metal carbides that involves citrate gel precursors and a non-hydrocarbon gas but does not use a hydrocarbon gas, does not form an oxide intermediate species and does not produce carbon monoxide. In some embodiments, the metal carbides are transition metal carbides. | 11-18-2010 |
20110003075 | PROCESS AND APPARATUS FOR DEPOSITING A CERAMIC COATING - A process and apparatus for depositing a ceramic coating, such as a thermal barrier coating (TBC) for a gas turbine engine component. The process deposits a coating whose composition includes multiple oxide compounds and a carbon-based constituent, e.g., elemental carbon, carbides, and carbon-based gases. The process uses at least one evaporation source to provide multiple different oxide compounds and at least one carbide compound comprising carbon and an element. The evaporation source is evaporated to produce a vapor cloud that contacts and condenses on the component surface to form the ceramic coating, and particularly so that the coating comprises the oxide compounds, an oxide of the element of the carbide compound, and the carbide compound and/or a carbon-containing gas. The process is carried out with an apparatus comprising a coating chamber in which the evaporation source is present, and a device for evaporating the evaporation source. | 01-06-2011 |
20110086167 | APPARATUS FOR ATOMIC LAYER DEPOSITION - An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Z | 04-14-2011 |
20130183445 | ENHANCED THIN FILM DEPOSITION - Methods of producing metal-containing thin films with low impurity contents on a substrate by atomic layer deposition (ALD) are provided. The methods preferably comprise contacting a substrate with alternating and sequential pulses of a metal source chemical, a second source chemical and a deposition enhancing agent. The deposition enhancing agent is preferably selected from the group consisting of hydrocarbons, hydrogen, hydrogen plasma, hydrogen radicals, silanes, germanium compounds, nitrogen compounds, and boron compounds. In some embodiments, the deposition-enhancing agent reacts with halide contaminants in the growing thin film, improving film properties. | 07-18-2013 |
20140127405 | ATOMIC LAYER DEPOSITION OF METAL CARBIDE FILMS USING ALUMINUM HYDROCARBON COMPOUNDS - Methods of forming metal carbide films are provided. In some embodiments, a substrate is exposed to alternating pulses of a transition metal species and an aluminum hydrocarbon compound, such as TMA, DMAH, or TEA. The aluminum hydrocarbon compound is selected to achieve the desired properties of the metal carbide film, such as aluminum concentration, resistivity, adhesion and oxidation resistance. In some embodiments, the methods are used to form a metal carbide layer that determines the work function of a control gate in a flash memory. | 05-08-2014 |
427249180 | Chromium (Cr), molybdenum (Mo), or tungsten (W) metal carbide containing coating | 1 |
20130136861 | METHOD FOR COATING AT LEAST THE INNER FACE OF A PISTON RING AND PISTON RING - In a method for coating at least part of the inner face of a piston ring, said ring preferably consisting of cast iron or steel, a PVD and/or DLC coating is applied by means of at least one of the following methods: PA-CVD, glow discharge and/or HIPIMS. A piston ring has a coating that is formed at least on part of the inner face of said ring, said coating being a PVD and/or DLC coating that preferably has been applied by means of PA-CVD, glow discharge and/or HIPIMS. | 05-30-2013 |
427249190 | Titanium (Ti), zirconnium (Zr), or hafnium (Hf) metal carbide containing coating | 1 |
20080286462 | Coated insert - The present invention relates to a cutting insert particularly for turning of stainless steel comprising a cemented carbide substrate and a post-treated coating with | 11-20-2008 |