Class / Patent application number | Description | Number of patent applications / Date published |
427240000 | CENTRIFUGAL FORCE UTILIZED | 83 |
20080254215 | PLANARIZING COATING METHOD - A planarizing coating method for filling a step between patterns formed on a board surface, includes the steps of: preparing at least two types of coating liquids different in non-volatile matter densities, first coating one of the coating liquids higher in density on the board surface, rotating the board so as to leave the one coating liquid inside the step and such that, at the same time, substantially none of the one coating liquid is left on a pattern crest of the patterns, subsequently coating another of the coating liquids lower in non-volatile matter density on the board surface, and rotating the board so that the coating liquid lower in density is left on a coating film comprising the one coating liquid higher in density and such that, at the same time, substantially none of the other coating liquid lower in density left on the pattern crest. | 10-16-2008 |
20090011126 | Process for Producing Laminate - The invention intends to provide a method for preventing deterioration in quality of the primer layer resulting from spinning-off and reattachment of a primer liquid on forming a polyurethane primer layer on a substrate for an eyeglass lens or the like using a coating composition containing a moisture-curing polyurethane resin. | 01-08-2009 |
20090087559 | COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM - The present invention includes: a first step of discharging a coating solution from a nozzle to a center portion of the substrate to apply the coating solution on a surface of the substrate while rotating the substrate; a second step of decelerating, after the first step, the rotation of the substrate and continuously rotating the substrate; and a third step of accelerating, after the second step, the rotation of the substrate to dry the coating solution on the substrate, wherein: the substrate is rotated at a fixed speed of a first speed immediately before the first step; and in the first step, the rotation of the substrate which is at the first speed before start of the first step is gradually accelerated after the start of the first step so as to make the speed continuously change, and the acceleration of the rotation of the substrate is gradually decreased so as to make the speed of the rotation of the substrate converge in a second speed higher than the first speed at end of the first step. | 04-02-2009 |
20090123647 | TRANSPARENT AQUA-BASED NANO SOL-GEL COMPOSITION AND METHOD OF APPLYING THE SAME - The present invention relates to a transparent aqua-based nano sol-gel composition and method of applying the same to transparent substrates without decreasing the visible light and sunlight transmittance thereof. The transparent aqua-based nano sol-gel can be applied to a surface of a transparent substrate to form a porous film which will not reduce the visible light and sunlight transmittance of the transparent substrate and will impart a self-cleaning function to the transparent substrate. The transparent aqua-based nano sol-gel composition contains a transparent aqua-based zeolite sol-gel having a particle size of less than 100 nm, a polysiloxane derivate, a surfactant, a transparent aqua-based photocatalytic sol-gel of titanium dioxide having a particle size of less than 100 nm, and deionized water. | 05-14-2009 |
20090136662 | Friction material and its manufacturing method - A friction material has a resin amount distribution that is the largest at a portion near a non-friction surface, that becomes lower toward an inside and that is the lowest at a portion near a friction surface. For example, such friction material is manufacture as follows. First, two friction materials are overlapped while the friction surfaces faced with each other. Then, the friction materials are dried at a room temperature. At this time, the resin has such a characteristic as to move while dragged by a solvent that dries from the non-friction surface located outside. Using such characteristic, the resin amount at the portion near the friction surface is lessened. Then, a temperature at the friction surface is made low and a temperature at the non-friction surface is made high in a drying step of the friction material. Thereby, the resin amount at the portion near the friction surface is lessened. | 05-28-2009 |
20090162547 | Coating Apparatus and Coating Method - The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate in order to spread out the chemical on a surface of the substrate by a centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate. | 06-25-2009 |
20090169740 | Method for Preventing Crystallization at Nozzle Tips When Loading Different Kinds of SOG Material - The objective of the invention is to prevent unwanted dripping of SOG from nozzles and coating of crystallized or solidified particles in an SOG coater that utilizes different kinds of SOG material. The SOG supply method includes a step in which, when executing processing for supplying a first spin-on glass to a lot from a first nozzle, a prescribed amount of second spin-on glass is discharged from a second nozzle at the beginning or the end of the processing of said lot. Furthermore, the SOG supply method includes a step in which the second nozzle is cleaned at the beginning of processing of the substrates contained in a lot. | 07-02-2009 |
20090214776 | COATING SOLUTION FOR FORMING HIGH DIELECTRIC CONSTANT THIN FILM AND METHOD FOR FORMING DIELECRIC THIN FILM USING THE SAME - Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a β-diketone or its derivative, and a benzoic acid derivative having an electron donating group. The method comprises spin coating the coating solution on a substrate to form a thin film and drying the thin film at a low temperature to crystallize the thin film. The titanium-containing coating solution is highly stable. In addition, the coating solution enables formation of a thin film, regardless of the kind of substrates, and can be used to form dielectric thin films in an in-line mode in the production processes of PCBs. | 08-27-2009 |
20090238969 | ORGANIC DYE FOR RECORDING LAYER AND HIGH DENSITY OPTICAL RECORDING MEDIUM USING THE SAME - A preparation method of a dye incorporated in a recording layer for a high density optical recording medium, having the following general chemical structural formula (I): | 09-24-2009 |
20090246369 | DEVICE FOR FORMING FIBER FELTS | 10-01-2009 |
20090258139 | COATING PROCESS APPARATUS AND COATING FILM FORMING METHOD - The resist coating unit (COT) has a spin chuck ( | 10-15-2009 |
20090263577 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit. | 10-22-2009 |
20090269490 | COATING APPARATUS AND COATING METHOD - An object of the present invention is to provide a coating apparatus in which the substrate can be reliably rotated at high speed. Another object of the invention is to provide a coating method of forming a coating on a substrate while reliably rotating it at high speed. A coating apparatus includes a susceptor for supporting a silicon wafer, and a rotating portion for rotating the susceptor. The rotating portion is covered on top with the susceptor to form a P | 10-29-2009 |
20090285984 | COATING APPARATUS AND METHOD - A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port. | 11-19-2009 |
20090285985 | Resin composition and coating method using the same - To provide a resin composition capable of forming a thin film layer so as to cause tenting over concave portions by conventional coating processes without depending on dry films, and also a coating method so as to cause tenting of the resin composition. A resin composition, which, by spin coating, causes tenting over concave portions formed on a substrate, the resin composition including a resin component (a) and a solvent (b) and has a viscosity of at least 200 cP, and tenting can be achieved by using the resin composition, allowing the resin composition to fall drop wise onto a substrate on which concave portions are formed, and spin coating the substrate at a rotating speed of 300 to 4000 rpm. | 11-19-2009 |
20090297705 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND PROGRAM STORAGE MEDIUM - is provided a substrate processing apparatus capable of stably holding a substrate and properly processing the substrate. The substrate processing apparatus is an apparatus that processes a substrate while rotating the substrate, with a place surface of the substrate being oriented in a horizontal direction. The substrate processing apparatus comprises a table including a rotatable base plate having a plurality of projecting members projected outward, and a rotation driving mechanism that rotates the base plate. The table can rotatably hold the substrate such that the projecting members contact the substrate from below with a gap formed between the substrate and the table. The substrate processing apparatus further comprises a pressure adjusting apparatus including a suction duct line having one end thereof being opened to the gap, and a suction mechanism connected to the other end of the suction duct line. | 12-03-2009 |
20090317546 | METHOD AND SYSTEM FOR DISPENSING RESIST SOLUTION - An apparatus and method for dispensing a solution on a substrate is described in which the solution is dispensed through a solution nozzle assembly while the substrate is rotated. As the solution is dispensed, the solution on the substrate forms a wave front that radially spreads from the substrate center to the substrate edge. The dispensing of the solution is performed in such a way that the solution is dispensed at a radial location substantially equivalent to or less than the radial location of the wave front at any instant in time. | 12-24-2009 |
20100003403 | PHOTORESIST COATING PROCESS - A photoresist coating process including a first step and a second step is provided. In the first step, a wafer is accelerated by a first average acceleration. In the second step, the wafer is accelerated by a second average acceleration. The first acceleration and the second acceleration are both larger than zero, and photoresist material is provided to the wafer only in the second step. | 01-07-2010 |
20100034969 | COATING AND PROCESSING APPARATUS AND METHOD - There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached. | 02-11-2010 |
20100040779 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM - Disclosed is a liquid processing apparatus capable of increasing the number of arranged substrate retainers without increasing the total exhaust amount of the liquid processing apparatus. A N-number (N is an integer identical to or greater than three) of cup bodies are inhaled and exhausted in total exhaust amount E through a plurality of separate exhaustion passage each having a first damper, and through a common exhaustion passage connected in common downstream of the separate exhaustion passages. The first dampers are configured such that an external air is received from the cup body in a first intake amount of external air E | 02-18-2010 |
20100047446 | ARRANGING MATERIALS ON A SUBSTRATE - Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate. | 02-25-2010 |
20100062155 | SPIN COATER, TEMPERATURE CONTROLLING METHOD OF THE SAME, OPTICAL DISC PRODUCTION APPARATUS, AND OPTICAL DISC PRODUCTION METHOD - The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes. | 03-11-2010 |
20100080899 | PARTICLE-ROD NANO STRUCTURES AND METHOD OF FORMING SAME BY SPIN COATING - A method of forming a particle-rod nanostructure is disclosed. The method comprises preparing a mixture comprising an inorganic nanoparticle and an organic molecule in a solvent. The method further comprises spin-coating the mixture to nucleate a crystal growth of the organic molecule on the inorganic nanoparticle deposited on a substrate, yielding the particle-rod nanostructure. | 04-01-2010 |
20100080900 | PROCESS FOR PRODUCING COMPOSITE ELEMENTS BASED ON FOAMS BASED ON ISOCYANATE - The invention relates to a process for producing composite bodies comprising at least one covering layer a) and a rigid foam based on isocyanate b), in which the covering layer a) is moved continuously and the starting material for the rigid foam based on isocyanate b) is applied to the covering layer, wherein the application of the liquid starting material for the rigid foam based on isocyanate b) is effected by means of a fixed tube which is provided with orifices and is arranged parallel to the covering layer a) and at right angles to the direction of movement of the covering layer a). | 04-01-2010 |
20100112209 | COATING TREATMENT METHOD, COATING TREATMENT APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM - In a coating step, a substrate is rotated at a high speed, and in that state a resist solution is discharged from a first nozzle to a central portion of the substrate to apply the resist solution over the substrate. Subsequently, in a flattening step, the rotation of the substrate is decelerated and the substrate is rotated at a low speed to flatten the resist solution on the substrate. In this event, the discharge of the resist solution by the first nozzle in the coating step is performed until a middle of the flattening step, and when the discharge of the resist solution is finished in the flattening step, the first nozzle is moved to move a discharge position of the resist solution from the central portion of the substrate. According to the present invention, the resist solution can be applied uniformly within the substrate. | 05-06-2010 |
20100112210 | Spin coating method and a spin-coating apparatus - Spin coating method for a recording medium having a hole in the center, including moving a tip of a feeding nozzle to an initial position at a distance X above a recording surface and a distance A radially apart from a periphery of the hole, feeding a coating liquid onto the recording surface for a predetermined period of time while rotating the recording medium at a predetermined speed, and moving the tip from the initial position along a radial direction towards an outer periphery of the recording medium while keeping the tip above the recording surface at the distance X. X satisfies X≦2 [3 r γ/(2 g C)] | 05-06-2010 |
20100129546 | PROTECTIVE FILM FORMING METHOD AND APPARATUS - A protective film forming method for forming a protective film of resin on a work surface of a wafer. The protective film forming method includes a wafer holding step of holding the wafer on a spinner table in the condition where the work surface is oriented upward, a spray coating step of spraying first liquid resin onto the work surface of the wafer as rotating the spinner table at a first rotational speed after performing the wafer holding step, a liquid resin supplying step of dropping a predetermined amount of second liquid resin onto a central area of the work surface of the wafer as rotating the spinner table at a second rotational speed lower than the first rotational speed after performing the spray coating step, and a spin coating step of rotating the spinner table at a third rotational speed higher than the first rotational speed after performing the liquid resin supplying step to thereby spread the second liquid resin dropped onto the central area of the work surface of the wafer, thus forming the protective film on the work surface of the wafer. | 05-27-2010 |
20100143586 | Spin coating apparatus, spin coating method, and method for manufacturing information recording medium - The spin coating apparatus includes: a collet including a tubular portion disposed coaxially with a predetermined rotation axis, the tubular portion having a slit that extends from a top portion of the tubular portion in a direction of the rotation axis to a midway part in the direction of the rotation axis; and a diameter-expanding member for urging the tubular portion of the collet radially outwardly to expand the outer diameter of the tubular portion. With the spin coating apparatus, a plate-like workpiece having a center hole is held at the center hole by the tubular portion of the collet with both sides of the workpiece exposed, and a flowable material can be applied to both the sides of the workpiece. | 06-10-2010 |
20100151126 | SUBSTRATE COATING METHOD AND SUBSTRATE COATING APPARATUS - There are provided a substrate coating method and a substrate coating apparatus to achieve the uniformity of a coating-liquid film and the improvement of the yield by inhibiting the bubbles generated during the application of a coating liquid. Also, there are provided a substrate coating method and a substrate coating apparatus to achieve the effective availability of the coating liquid and the uniformity of the coating-liquid film. | 06-17-2010 |
20100209607 | COATING METHOD - There is provided a coating method which can efficiently apply a coating liquid, such as a liquid resist, to the entire surface of a wafer even when the coating liquid is supplied in a smaller amount than a conventional one, and can therefore reduce the consumption of the coating liquid. The coating method includes: a first step of rotating the substrate at a first rotating speed while supplying the coating liquid onto approximately the center of the rotating substrate; a second step of rotating the substrate at a second rotating speed which is lower than the first rotating speed; a third step of rotating the substrate at a third rotating speed which is higher than the second rotating speed; and a fourth step of rotating the substrate at a fourth rotating speed which is higher than the second rotating speed and lower than the third rotating speed. | 08-19-2010 |
20100227056 | Solution treatment apparatus, solution treatment method and resist coating method - The invention includes a lower guide unit which obliquely extends downward to an outside from a position closely opposed to a peripheral edge portion of a rear surface of the substrate held on the substrate holding unit, and is formed in an annular shape in a circumferential direction of the substrate; and an upper guide unit which has an upper end surface located at a substantially same height as a front surface of the substrate held on the substrate holding unit, forms a lower annular flow path between the upper guide unit and the lower guide unit for guiding downward together with a gas flow a treatment solution scattering from the substrate, is formed in an annular shape opposed to the lower guide unit to surround an outside lower region of the substrate, and has an inner peripheral surface having a longitudinal-sectional shape curved to bulge outward and extending downward. | 09-09-2010 |
20100247761 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a substrate rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; a treatment liquid supplying unit which supplies a treatment liquid to an upper surface of the substrate held by the substrate holding unit; an opposing member to be located in opposed spaced relation to the upper surface of the substrate held by the substrate holding unit in contact with a film of the treatment liquid formed on the upper surface of the substrate so as to receive a lift force from the liquid film; a support member which supports the opposing member; and an opposing member holding mechanism which causes the support member to hold the opposing member in a vertically relatively movable manner. | 09-30-2010 |
20100323107 | Method for preparing and forming a thick coating of PZT using sol-gel process - A method for preparing and forming a thick coating of lead-zirconate-titanate (PZT) on a substrate, includes preparing a first solution by dissolving a lead precursor in a mixed solvent of acid and diol and stirring the resultant, preparing a second solution by dissolving a zirconium precursor and a titanium precursor in a mixed solvent of acid and diol and stirring the same, mixing the first and second solutions to prepare a PZT stock solution, spin-coating the PZT solution on the substrate to form a coated assembly, and heat-treating the coated assembly. | 12-23-2010 |
20100330277 | NANOCOMPOSITE MATERIAL USEFUL FOR THE PREPARATION SUPERHYDROPHOBIC COATING AND A PROCESS FOR THE PREPARATION THEREOF - The present invention provides nanocomposite materials comprising carbon nanotubes and oligo(p-phenylenevinylene) (OPV). Dispersion of CNT in the solution of solution of oligo(p-phenylenevinylene) (OPV) in organic solvent results in the formation of nanocomposite material. The π-π interaction between CNT and OPV molecule were shown by spectroscopic and microscopic techniques. The nanocomposite solution can be drop casted over glass or metallic surface for the preparation of superhydrophobic coating. The resultant composite surface shows superhydrophobic nature even with corrosive liquids and its contact angle is almost constant even after prolonged contact with water. | 12-30-2010 |
20110008538 | APPARATUS AND METHOD OF FORMING AN APPLIED FILM - There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port. | 01-13-2011 |
20110052807 | COATING TREATMENT METHOD, COMPUTER STORAGE MEDIUM, AND COATING TREATMENT APPARATUS - A substrate is rotated at a first rotation number (first step). The rotation of the substrate is decelerated to 1500 rpm that is a second rotation number and the substrate is rotated at the second rotation number for 0.5 seconds (second step). The rotation of the substrate is further decelerated to a third rotation number and the substrate is rotated at the third rotation number (third step). The rotation of the substrate is accelerated to a fourth rotation number and the substrate is rotated at the fourth rotation number (fourth step). A resist solution is continuously supplied to a center portion of the substrate from a middle of the first step to a middle of the third step. | 03-03-2011 |
20110059242 | DEVICE AND METHOD FOR WET TREATING PLATE-LIKE-ARTICLES - A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm. | 03-10-2011 |
20110129601 | POLYBENZIMIDAZOLE/POLYACRYLATE MIXTURES - PBI compositions include solutions comprising PBI and acrylate monomer and coatings comprising PBI and polyacrylate. The solutions may also include polymerization initiator, solvent, co-polymers. The coatings are thermally resistant, electrically insulating (dielectric), and adhesive. The PBI compositions are used in the manufacture of microelectronics and related products. Methods for applying the PBI compositions are also discussed. | 06-02-2011 |
20110135820 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - After a solvent is discharged onto a substrate in a period from a time point t | 06-09-2011 |
20110195183 | SPIN COATER AND METHOD FOR SPIN COATING - There is provided a method for spin coating, by which a resist is coated on a surface of a circular disc with a hole formed in its center. A method for spin coating coats a film-forming material discharged from a nozzle to an upper surface of a circular disc substrate with a through hole formed in a center while rotating the substrate. At an initial discharging stage where a discharge amount fluctuates, an inner diameter center of the nozzle is located at an initial discharge radius position apart from a position corresponding to a coat boundary of the disc substrate at an outer radial side. At a subsequent stage of stabilized discharging amount, the inner diameter center of the nozzle is moved from the initial discharge radius position to a stabilized discharge radius position around the coat boundary to further discharge the film-forming material. | 08-11-2011 |
20110223329 | Films and method of production thereof - A method of producing a film coated onto a substrate by dissolving a metal or metalloid containing compound having hydrolysable groups in a solvent to form a precursor solution. The precursor solution is coated onto the substrate as a continuous liquid phase. The precursor solution is then cured to produce a continuous, interconnected, nano-porous network. | 09-15-2011 |
20110244126 | METHOD FOR SELECTIVELY REMOVING HYDROGEN FROM MOLECULES - Methods for removing hydrogen from molecules are disclosed. In one embodiment, hydrogen-containing molecules are deposited on a solid substrate and are bombarded with hydrogen projectile particles. The particles may have energies of | 10-06-2011 |
20110281028 | Method for double-dip substrate spin optimization of coated micro array supports - Described is a method for preparing a substrate-coated support for use in micro-array devices. The method comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat, and subjecting the coated support to centripetal forces for a second time to produce a substrate-coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface. | 11-17-2011 |
20120058269 | Apparatus, System, and Method for Creating Spin-Art on Fabric - A system, apparatus, and method for creating designs on an underlying material by spinning a platform on which the material is positioned while applying a coloring agent onto the material, and a system and method for lifting and disassembling a spinning platform to remove the painted material. | 03-08-2012 |
20120121806 | Complexes Of Imidazole Ligands - Metal imidazolate complexes are described where imidazoles ligands functionalized with bulky groups and their anionic counterpart, i.e., imidazolates are described. Compounds comprising one or more such polyalkylated imidazolate anions coordinated to a metal or more than one metal, selected from the group consisting of alkali metals, transition metals, lanthanide metals, actinide metals, main group metals, including the chalcogenides, are contemplated. Alternatively, multiple different imidazole anions, in addition to other different anions, can be coordinated to metals to make new complexes. The synthesis of novel compounds and their use to form thin metal containing films is also contemplated. | 05-17-2012 |
20120148740 | RAW MATERIALS AND METHODS OF MANUFACTURING BIO-BASED EPOXY RESINS - Disclosed are methods for manufacturing bio-based epoxy resins. The raw materials of the resins include lignin, polyol, solvent, catalyst, acid anhydride, and multi-epoxy compound. The methods of manufacturing the resins include evenly mixing the lignin, the polyol, the catalyst, and the solvent together to form a mixture. The acid anhydride is added to the mixture to process esterification for forming an intermediate product. The multi-epoxy compound is added to the intermediate product to process epoxidation for forming the bio-based epoxy resins. The bio-based epoxy resin has excellent compatibility with the solvent, such that the solvent can be added to the bio-based epoxy resins to form coatings having a tunable solid content. As a result, the coating can be applied to the surfaces of every type of base material. | 06-14-2012 |
20120189773 | COATING TREATMENT APPARATUS, COATING TREATMENT METHOD, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM - A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed. | 07-26-2012 |
20120213925 | COATING APPARATUS AND METHOD - A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port. | 08-23-2012 |
20120301612 | COATING METHOD - A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed. | 11-29-2012 |
20130011555 | COATING APPARATUS AND COATING METHOD - The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate to thereby spread out the chemical on a surface of the substrate by centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate. | 01-10-2013 |
20130059076 | SUBSTRATE TREATMENT APPARATUS AND METHOD FOR MANUFACTURING THIN FILM - To provide a substrate treatment apparatus capable of suppressing adherence of dust to a film coated on a substrate. As an aspect of the present invention is a substrate treatment apparatus provided with a spin-coating treatment chamber | 03-07-2013 |
20130089664 | COATING METHOD AND COATING APPARATUS - A coating method includes a step of forming a film of a coating solution having a larger thickness in a central region of a substrate than in an edge region of the substrate by discharging droplets of the coating solution from a plurality of nozzles formed on an inkjet head to the substrate, and a step of moving the coating solution in the film from the central region toward the edge region of the substrate by rotating the substrate. This reduces a difference in thickness of the film between the central region and the edge region of the substrate, thereby to make the film thickness substantially uniform. At the same time, the movement of the coating solution in the film can make the surface of the film smoother. | 04-11-2013 |
20130156947 | Track Spin Wafer Chuck - The present disclosure relates to a wafer chuck configured to provide a uniform photoresist layer on a workpiece. In some embodiments, the wafer chuck comprises a plurality of vacuum holes. The plurality of vacuum holes (i.e., more than one) are in fluid communication with a cavity that continuously extends along the top surface between the vacuum holes. A vacuum source, connected to each vacuum hole, is configured to remove gas molecules from the cavity located below the workpiece leaving behind a low pressure vacuum. The use of a plurality of vacuum holes increase the uniformity of the vacuum, thereby preventing the formation of high vacuum areas in close proximity to any specific vacuum hole. The reduction of high vacuum areas reduces wafer bending associated with the high vacuum areas. | 06-20-2013 |
20130156948 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - A substrate processing apparatus includes substrate holding unit that holds wafer W horizontally, rotation driving unit that rotates the substrate holding unit, first chemical liquid nozzle that discharges first chemical liquid toward the peripheral portion of wafer W, second chemical liquid nozzle that discharges second chemical liquid, which is different from the first chemical liquid, toward the peripheral portion of wafer, and first nozzle driving unit and second nozzle driving unit each moves the first chemical liquid nozzle and the second chemical liquid nozzle, respectively. Each chemical liquid nozzle is moved by each nozzle driving unit between processing position disposed when a chemical liquid is discharged toward the peripheral portion of wafer W, and stand-by position disposed when the chemical liquid is not discharged. Each stand-by position is disposed in the center side of wafer W compared to the processing position. | 06-20-2013 |
20130209682 | DURABLE CERAMIC NANOCOMPOSITE THERMAL BARRIER COATINGS FOR METALS AND REFRACTORIES - A coating composition for metal or refractories includes a polysilazane resin; and one or more additives that alter the thermal conductivity and/or the abrasion resistance of the cured polysilazane resin. The coating composition may be applied to a metal or refractory material substrate and heated to form a ceramic layer on the substrate. The ceramic layer exhibits lower thermal conductivity and increased abrasion resistance. | 08-15-2013 |
20130216707 | Materials including semiconductor nanocrystals - A composition includes a layer of nanoparticles and a layer of a second material. | 08-22-2013 |
20130243954 | NANOTUBE SOLUTIONS WITH HIGH CONCENTRATION AND LOW CONTAMINATION AND METHODS FOR PURIFIYING NANOTUBE SOLUTIONS - Solutions of carbon nanotubes and methods for purifying the solutions are provided. The methods include mixing, for example, at least one complexing agents, at least one ionic species, and/or at least one buffer oxide etch (BOE) with a liquid medium containing carbon nanotubes and different types of contaminants, such as metal impurities, amorphous carbon, and/or silica particles, and performing a filtration process to the liquid medium so as to remove or reduce the contaminants in the liquid medium. As a result, carbon nanotube solutions of low contaminants are produced. In some embodiments, the solutions of this disclosure include a high concentration of carbon nanotubes and are substantially free from metal, amorphous carbon, and/or silica impurities. | 09-19-2013 |
20130280425 | LIQUID TREATMENT APPARATUS AND METHOD AND NON-TRANSITORY STORAGE MEDIUM - A liquid treatment method includes: supplying a first organic solvent to a substrate with the substrate being held horizontally by a substrate holder; and thereafter supplying a second organic solvent to a substrate held by the substrate holder, the second solvent having a higher cleanliness than the first solvent. | 10-24-2013 |
20130337168 | METHOD FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM - The invention provides a method for forming a silicon-containing resist underlayer film, the method for coating and forming a silicon-containing resist underlayer film by spin coating method comprising: feeding an aqueous alkaline solution in a pipe of an apparatus for coating and forming a film by spin coating method to clean therein; supplying a silicon-containing resist underlayer film composition via the pipe; and coating the silicon-containing resist underlayer film on a substrate to form a film. There can be provided a method for forming a silicon-containing resist underlayer film capable of reducing coating defects after forming a film by cleaning and removing a precipitate derived from silicon-containing resist underlayer film composition that precipitates and adheres in a pipe of an apparatus for coating and forming a film. | 12-19-2013 |
20130337169 | Heat-Dissipation Unit Coated with Oxidation-Resistant Nano Thin Film and Method of Depositing the Oxidation-Resistant Nano Thin Film Thereof - A heat-dissipation unit coated with oxidation-resistant nano thin film includes a metal main body having a heat-absorbing portion and a heat-dissipating portion, both of which are coated with at least a nano metal compound thin film. To form the nano metal compound thin film on the heat-dissipation unit, first form at least a nano compound coating on an outer surface of the heat-dissipation unit, and then supply a reduction gas into a high-temperature environment to perform a heat treatment and a reduction process on the heat-dissipation unit and the nano compound coating thereof, and finally, a nano metal compound thin film is formed on the surface of the heat-dissipation unit after completion of the heat treatment and the reduction process. With the nano metal compound thin film, the heat-dissipation unit is protected against formation of oxide on its surface and accordingly against occurrence of increased thermal resistance thereof. | 12-19-2013 |
20130344242 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers - The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae perpendicular to the plane of the block copolymer film is required for most applications. The preferred method to achieve orientation is by heating. The present invention involves the use of polarity-switching top coats to control block copolymer thin film orientation by heating. The top coats can be spin coated onto block copolymer thin films from polar casting solvents and they change composition upon thermal annealing to become “neutral”. Top coats allow for the facile orientation control of block copolymers which would otherwise not be possible by heating alone. | 12-26-2013 |
20140017402 | PAPER TISSUE WITH HIGH LOTION TRANSFERABILITY - A paper tissue and products made from paper tissue, such as paper handkerchiefs, facial tissues, bath and cosmetic tissues, paper tissue wipes of any kinds and the like. The invention describes both the process for making a smooth and absorbent lotioned paper tissue, with high transferability of the lotion. The process steps comprises the steps of (a) providing a paper tissue web continuously moving next to a lotion application unit comprising at least one rotating surface, (b) transferring said lotion onto one rotating surface, (c) expulsing said lotion from the said rotating surface into a stream of lotion droplets, by primarily the centrifugal force of the rotation of said rotating surface, (d) intercepting said paper tissue with said stream of lotion droplets. The invention also describes a paper tissue comprising a lotion distributed as discrete deposits on its surface. The deposits have a high local concentration of lotion and cover a relatively small area of the tissue. | 01-16-2014 |
20140072709 | SPIN COATING APPARATUS AND METHOD - In one embodiment, a spin coating apparatus includes a coating liquid feeding module to drop a coating liquid onto a substrate, and a motor to rotate the substrate. The module drops a first drop amount of the coating liquid onto the substrate at a first discharge rate, while the motor rotates the substrate at a first number of rotations. The module drops a second drop amount of the coating liquid onto the substrate at a second discharge rate larger than the first discharge rate, while the motor rotates the substrate at a second number of rotations smaller than the first number of rotations, after the first drop amount of the coating liquid is dropped. The module discharges the coating liquid onto the substrate at a third discharge rate smaller than the second discharge rate, after the coating liquid is discharged onto the substrate at the second discharge rate. | 03-13-2014 |
20140093644 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - A substrate treatment method includes a rinsing step of supplying a rinse liquid to a front surface of a substrate while rotating the substrate at a first rotation speed, a liquid mixture film forming step of forming a liquid film of a liquid mixture of water and an organic solvent having a smaller surface tension than the water on the front surface after the rinsing step by supplying the water and the organic solvent to the front surface while reducing the rotation speed of the substrate from the first rotation speed to a second rotation speed lower than the first rotation speed, and an organic solvent replacing step of replacing the liquid mixture supplied to the front surface with the organic solvent after the liquid mixture film forming step by supplying the organic solvent to the front surface. | 04-03-2014 |
20140147587 | Combinatorial Spin Deposition - A spin deposition apparatus includes a deposition mask configured to be arranged proximate a target substrate. The deposition mask includes at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the target substrate. | 05-29-2014 |
20140199481 | METHOD FOR FORMING CHEMICAL LAYER AND APPARATUS FOR FORMING CHEMICAL LAYER - A method for forming a chemical layer on a surface of a substrate by rotationally applying a chemical, including spraying a chemical-removing solvent to a region where a filamentously entangled chemical is generated when excess of the chemical discharged to the outside of the substrate during rotational application of the chemical becomes solidified. | 07-17-2014 |
20140308444 | METHODS FOR MAKING POLYUREA AND POLYURETHANE POLYMERS AND GOLF BALLS PREPARED THEREFROM - Methods for making golf balls having a cover made from polyurea and polyurethane compositions are provided. The methods for making the polyurea and polyurethane composition involve preparing an amine-terminated or hydroxyl-terminated first prepolymer by reacting a first isocyanate compound with a stoichiometric excess of polyamine or polyol (depending on the type of prepolymer desired). The first prepolymer is then reacted with a stoichiometric excess of a second isocyanate compound to form an isocyanate-terminated second prepolymer. The second prepolymer is then reacted with a chain extender. | 10-16-2014 |
20140356531 | FILM FORMATION APPARATUS AND FILM FORMATION METHOD - According to one embodiment, a film formation apparatus is configured to coat a processing fluid on a surface of a substrate by supplying the fluid to the surface of the substrate from a nozzle while rotating the substrate and moving the nozzle and configured to form a film from the coated fluid by rotating the substrate. The apparatus includes: a holder configured to hold the substrate; a drive unit configured to rotate the holder; a processing fluid supply unit configured to supply the processing fluid onto the surface of the substrate held by the holder; and a controller configured to control at least the drive unit. The controller is configured to form the film from the coated processing fluid by rotating the holder at a second rotational speed, the second rotational speed being slower than a first rotational speed of the coating of the processing fluid. | 12-04-2014 |
20140356532 | COATING MATERIAL FOR ALUMINUM SUBSTRATE FOR INKJET COMPUTER-TO-PLATE AND PREPARATION AND USE OF SAME - A coating material for an aluminum substrate for inkjet computer-to-plate and preparation method and use of same. The composition of the coating material is: high polymer 5-40 wt %; nano-sized and/or micro-sized oxide particles 5-30 wt %; organic solvent constituting the remainder. The high polymer is at least one selected from the group consisting of MMA-BMA-MA terpolymer resin, phenolic resin, epoxy resin, polyurethane, polyester, urea-formaldehyde resin, polyvinyl formal, polyvinyl butyral and gum arabic. The preparation method for obtaining the coating material is to mix the ingredients together and stir at room temperature. A spin coating method or a roll coating method is used to coat the coating material onto a clean aluminum substrate having not undergone electrolytic graining and anodic oxidation treatment, and then the substrate is baked, resulting in the required roughness. | 12-04-2014 |
20150010703 | Spin on Hard-Mask Material - Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask. | 01-08-2015 |
20150037499 | APPARATUS FOR DUAL SPEED SPIN CHUCK - A spin chuck according to the present invention is provided and is configured to eliminate the wrap of chemical over the wafer edge. The dual speed wafer spin chuck apparatus acts to prevent liquids from affecting the backside of a wafer during processing. An outer ring is placed around the wafer with a narrow gap between the two such that drops of liquid on the surface of the wafer will touch the outer ring as they move to the outermost edge of the wafer. By spinning this outer ring at high speed, centrifugal force causes these drops to be pulled off of the wafer and flung radially outward, thus preventing the liquid from affecting the backside of the wafer, | 02-05-2015 |
20150079281 | Silica Nano/Micro-Sphere Nanolithography Method by Solvent-Controlled Spin-Coating - A method is provided for preparing an etching mask on a substrate. The method includes dispersing a plurality of particles in an aprotic suspending medium to form a suspension and spin-coating the suspension on a substrate to form an etching mask on the substrate. | 03-19-2015 |
20150314328 | Melting and Spinning Device - A device, method, and system for creating a design on a design surface are provided. The device includes a first compartment that includes a receiving and positioning component and a channel configured to receive and position a wax stick at the receiving and positioning component. The device includes a second compartment having a melting component that includes a heating element, a temperature measurement element, and a nozzle. The nozzle includes a nozzle opening configured to receive the wax stick, the nozzle directly aligned with the channel of the receiving and positioning component. The nozzle also includes a nozzle tip configured to transfer melted portions of the wax stick from the nozzle to a design surface on a spinning component in a third compartment of the device. | 11-05-2015 |
20150360255 | IRON PYRITE THIN FILMS FROM MOLECULAR INKS - Systems and methods are provided for fabricating pyrite thin films from molecular inks. A process is provided that comprises dissolving simple iron-bearing and sulfur-bearing molecules in an appropriate solvent and then depositing the solution onto an appropriate substrate using one of several methods (roll-to-roll coating, spraying, spin coating, etc.), resulting in a solid film consisting of the molecules. These molecular precursor films are then heated to 200-600° C. in the presence of sulfur-bearing gases (e.g., S | 12-17-2015 |
20150375254 | METHOD AND APPARATUS FOR TREATING COMPONENTS - A dip tank is fillable with a liquid. An accommodation device accommodates components and is rotatingly drivable around an axis of rotation. The accommodation device and the dip tank are movable relative to each other to dip the components in the dip tank or to lift the components out of the dip tank. A splash guard is provided. A lifting device is arranged to move the splash guard relative to the dip tank. | 12-31-2015 |
20160053378 | PLATING METHOD, PLATING APPARATUS, AND STORAGE MEDIUM - A Plating method includes a first plating process S | 02-25-2016 |
20160090652 | LIQUID PHASE ATOMIC LAYER DEPOSITION - A processing system and method for depositing a film on a substrate by liquid phase ALD is disclosed in various embodiments. The method includes providing the substrate in a process chamber, spinning on the substrate a first reactant in a first liquid to form a self-limiting layer of the first reactant on the substrate, spinning on the substrate a second reactant in a second liquid, where the second reactant reacts with the self-limiting layer of the first reactant on the substrate to form a film on the substrate, and repeating the spinning steps at least once until the film has a desired thickness. Other embodiments of the invention further include rinsing the substrate to remove excess first and second reactants from the substrate, and heat-treating the substrate during and/or following the film deposition. | 03-31-2016 |
20160158795 | SPIN COATING APPARATUS AND METHOD - In one embodiment, a spin coating apparatus includes a coating liquid feeding module to drop a coating liquid onto a substrate, and a motor to rotate the substrate. The module drops a first drop amount of the coating liquid onto the substrate at a first discharge rate, while the motor rotates the substrate at a first number of rotations. The module drops a second drop amount of the coating liquid onto the substrate at a second discharge rate larger than the first discharge rate, while the motor rotates the substrate at a second number of rotations smaller than the first number of rotations, after the first drop amount of the coating liquid is dropped. The module discharges the coating liquid onto the substrate at a third discharge rate smaller than the second discharge rate, after the coating liquid is discharged onto the substrate at the second discharge rate. | 06-09-2016 |
20190146345 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM | 05-16-2019 |
427241000 | Metal coating | 4 |
20090169741 | METHOD OF PROVIDING A MOISTURE VAPOR BARRIER LAYER TO A CORE OF A GOLF BALL - A method of forming a water vapor barrier layer to a core of a golf ball is provided. The method includes placing the core of the golf ball into a vapor barrier composition, withdrawing the lifting device, and spinning and optionally oscillating the core within the composition for a time sufficient for the composition to form a layer on the core. The present invention also provides an apparatus that can be used to form a water vapor barrier layer. | 07-02-2009 |
20090202719 | MICROWAVE-ATTENUATING COMPOSITE MATERIALS, METHODS FOR PREPARING THE SAME, INTERMEDIATES FOR PREPARING THE SAME, DEVICES CONTAINING THE SAME, METHODS OF PREPARING SUCH A DEVICE, AND METHODS OF ATTENTUATING MICROWAVES - The present invention provides microwave attenuating, filled composite materials which contain a polymer or ceramic matrix and metallic tubules and processes for making the same and devices which contain such materials. | 08-13-2009 |
20100104749 | Structures Having Aligned Nanorods And Methods Of Making - Substrates having nanostructures disposed thereon and methods of forming nanostructures on the substrates are disclosed. | 04-29-2010 |
20160158794 | NANO STRUCTURES, DEVICE USING THE SAME, AND METHOD FOR FABRICATING THE NANO STRUCTURES - Provided are a method for fabricating nano structures which includes: preparing a substrate; preparing a polymer including a plurality of metal atoms; applying the polymer to the substrate to attach the metal atoms onto the substrate; and making one or more metallic nano particles from the metal atoms. | 06-09-2016 |