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Plasma (e.g., cold plasma, corona, glow discharge, etc.)

Subclass of:

427 - Coating processes

427457000 - DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY

427532000 - Pretreatment of substrate or post-treatment of coated substrate

427533000 - Ionized gas utilized (e.g., electrically powered source, corona discharge, plasma, glow discharge, etc.)

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
427539000 Oxygen containing atmosphere 17
427536000 Organic substrate 10
Entries
DocumentTitleDate
20090191356Method for forming a thin layer of particulate on a substrate - The invention is a method for forming a thin layer of particulate on a substrate by applying a layer of a composition comprising the particulate and a dispersing agent on the substrate, treating the layer with charged gas to remove the dispersing agent from the layer; and induction heating to form operative connection of the particulate.07-30-2009
20090191355Methods for forming a thin layer of particulate on a substrate - The invention is a method for forming a thin layer of particulate on a substrate by applying a layer of a composition comprising the particulate and a dispersing agent on the substrate, treating the layer with charged gas to remove the dispersing agent from the layer; and induction heating to form operative connection of the particulate.07-30-2009
20100119729METHOD FOR FABRICATING CARBON-ENRICHED FILM - A method for fabricating a carbon-enriched film includes the following steps. First, a substrate is provided. Next, a CF05-13-2010
20100112234METHOD FOR THE CREATION OF PLANAR VARIATIONS IN SIZE OR DISTANCE IN NANOSTRUCTURE PATTERNS ON SURFACES - A method for creating extensive variations in size or distance in nanostructure patterns on surfaces preferably includes: a) contacting a substrate with a liquid phase containing organic two-block or multi-block copolymer micelles, which are charged with an inorganic metal compound, by immersion into this liquid phase, during which chemically different polymer domains including inorganic metal compounds enclosed in micelles are deposited on the substrate; b) withdrawing the substrate from the liquid phase at a predetermined withdrawing speed, which is varied continuously or gradually, so that a gradient of the lateral separation length of the polymer domains is produced on the substrate surface; c) converting the deposited inorganic metal compounds by an oxidation- or reduction treatment into inorganic nanoparticles and optionally complete or partial removal of the organic polymer by a plasma treatment, wherein positions and lateral separation length of the nanoparticles obtained are determined by those of deposited polymer domains.05-06-2010
20100104767PRODUCTION METHOD FOR NANOCOMPOSITE MAGNET - A nanocomposite magnet having a core-shell structure that includes a hard magnetic phase of an Nd04-29-2010
20130089675CPP Device with Improved Current Confining Structure and Process - Plasma nitridation, in place of plasma oxidation, is used for the formation of a CCP layer. Al, Mg, Hf, etc. all form insulating nitrides under these conditions. Maintaining the structure at a temperature of at least 150° C. during plasma nitridation and/or performing post annealing at a temperature of 220° C. or higher, ensures that no copper nitride can form. Additionally, unintended oxidation by molecular oxygen of the exposed magnetic layers (mainly the pinned and free layers) is also avoided04-11-2013
20130071580Activated Silicon Precursors For Low Temperature Deposition - Provided are processes for the low temperature deposition of silicon-containing films using activated SiH-containing precursors. The SiH-containing precursors may have reactive functionality such as halogen or cyano moieties. Described are processes in which halogenated or cyanated silanes are used to deposit SiN films. Plasma processing conditions can be used to adjust the carbon, hydrogen and/or nitrogen content of the films.03-21-2013
20130164456THERMALLY STABLE VOLATILE PRECURSORS - A method of forming a thin film on a substrate which includes a step of contacting a surface with a precursor compound having a transition metal and one or more alkyl-1,3-diazabutadiene ligands is provided. The resulting modified surface is then contacted with an activating compound.06-27-2013
20110014389LYOPHILIC/LYOPHOBIC PATTERN-FORMING METHOD AND ORGANIC ELECTROLUMINESCENT ELEMENT MANUFACTURING METHOD - Disclosed is a lyophilic/lyophobic pattern-forming method comprising a first lyophilization step for lyophilizing the surface of a first member and a second member provided on the first member and having through-holes formed down to the surface of the first member, a lyophobic layer-forming step for forming a lyophobic layer on the surfaces of the first and second members, and a second lyophilization step that lyophilizes said lyophobic layer to form a lyophilic/lyophobic pattern, wherein said first and second members are made of different materials, and the lyophobic layer comprises material, wherein locations formed on the first member are lyophilized more than locations formed on the surface of the second member during the second lyophilization step.01-20-2011
20090297726METHOD OF MANUFACTURING COMPOSITE MATERIAL - A method of manufacturing a composite sheet, the method comprising: 12-03-2009
20090269508Method of manufacturing a magnetic recording medium - A method for manufacturing a magnetic recording medium, which includes providing a substrate for the magnetic recording medium, electrically charging the substrate with a positive voltage, and then forming the thin film layers on the substrate. The thin film layers includes at least a metallic underlayer, a magnetic recording layer, a protective layer composed of at least carbon, and a lubricant layer, formed in this order on the substrate. The method enables manufacture of a magnetic recording medium that exhibits high reliability and good read/write performance.10-29-2009
20120225215SOL-GEL BASED ANTIREFLECTIVE (AR) COATINGS WITH CONTROLLABLE PORE SIZE USING ORGANIC NANOCRYSTALS AND DENDRIMERS - Embodiments of the invention relate generally to methods and compositions for forming porous low refractive index coatings on substrates. In one embodiment, a method for forming a porous coating on a substrate is provided. The method comprises coating a substrate with a sol-gel composition, comprising at least one porosity forming agent, wherein the porosity forming agent is selected from at least one of dendrimers and organic nanocrystals and removing the at least one porosity forming agent to form the porous coating. Use of at least one of the dendrimers and organic nanocrystals leads to the formation of stable pores with larger volume fraction in the film. Further, the size and interconnectivity of the pores may be controlled via selection of the organic nanocrystal or dendrimer structure, the total organic nanocrystal or dendrimer molecule fraction, polarity of the organic nanocrystal or dendrimer molecule and solvent, and other physiochemical properties of the gel phase.09-06-2012
20130064990Systems and Methods for Super-Hydrophobic and Super-Oleophobic Surface Treatments - The field of the invention relates to systems and methods for surface treatments, and more particularly to systems and methods for surface treatments, modifications or coatings using micro- and nano-structure particles for both super-hydrophobic and super-oleophobic properties. In one embodiment, a method of treating surfaces to impart both super-hydrophobic and super-oleophobic properties includes the steps of pre-treating a substrate surface; assembling dual-scale nanoparticles onto the surface of the substrate; and treating the dual-scale nanoparticle coated surface with SiCl03-14-2013
20120114871Method And Apparatus For Producing An Ionized Vapor Deposition Coating - A vapor deposition coating system including a metal vapor source, a power supply coupled to the metal vapor source, at least one thermionic ionizing grid including one or more thermionic filaments, wherein the ionizing grid is at least partially located within a region having a metal atom flow density in the range of 1E14m05-10-2012
20130115381HYDROPHOBIC SURFACE COATING - Forming a hydrophobic layer on a surface can involve a mixture of a micropowder and a binder. The micropowder includes micrometer scale particles having diameters in a range of about 100 nm to about 50 μm. The mixture is applied to the surface and is cured. A majority or at least some of the micrometer scale particles have nanometer scale features having a feature size greater than about 25 nm and less than about 100 nm.05-09-2013
20090311437PROCESS - The invention relates to a process of preparing flakes, the process comprising the steps of: (i) applying a masking agent to a portion of a collecting substrate to provide a masked portion and an unmasked portion of the collecting substrate; (ii) applying a flake precursor to the unmasked portion of the collecting substrate to provide a plurality of flakes attached to the collecting substrate; and (iii) recovering the flakes. The invention also relates to: flakes obtained by said process; a pigment comprising said flakes; a surface coating comprising said flakes; and a use of said flakes as a pigment.12-17-2009
20110293849METHOD FOR PRODUCING A BRAKE DISC - The invention relates to a method for producing a brake disc (BS) for a vehicle, comprising a main body (G) of a metal material, in particular gray cast iron, which has friction surfaces (R).12-01-2011
20110293848Method and System for Treating Flexible Films - A system and method for treating films. The method comprises steps of: providing a flexible film having a first side and a second side; flame treating the first side of the flexible film; subsequently treating the first side with plasma. the treated film may subsequently have a coating applied and cured to the first side. The system for treating a flexible film comprises: an unwind element adapted to unwind a wound roll of flexible film, the flexible film having a first side and a second side; a flame treatment element disposed to receive unwound film proceeding from the unwind element and adapted to flame treat the first side of the flexible film; and a plasma treatment element disposed to receive film proceeding from the flame treatment element and adapted to treat the first side of the flexible film with plasma.12-01-2011
20110293850TRANSPARENT CARBON NANOTUBE ELECTRODE WITH NET-LIKE CARBON NANOTUBE FILM AND PREPARATION METHOD THEREOF - Provided is a transparent carbon nanotube (CNT) electrode comprising a net-like (i.e., net-shaped) CNT thin film and a method for preparing the same. More specifically, a transparent CNT electrode comprises a transparent substrate and a net-shaped CNT thin film formed on the transparent substrate, and a method for preparing a transparent CNT electrode, comprising forming a thin film using particulate materials and CNTs, and then removing the particulate materials to form a net-shaped CNT thin film. The transparent CNT electrode exhibits excellent electrical conductivity while maintaining high light transmittance. Therefore, the transparent CNT electrode can be widely used to fabricate a variety of electronic devices, including image sensors, solar cells, liquid crystal displays, organic electroluminescence (EL) displays, and touch screen panels, that have need of electrodes possessing both light transmission properties and conductive properties.12-01-2011
20090169767METHOD FOR INCREASING THE REMOVAL RATE OF PHOTORESIST LAYER - A method for increasing the removal rate of a photoresist layer is provided. The method includes performing a pre-treatment of a substrate, such as a plasma process, before forming the photoresist layer. The method can be applied to the fabrication of semiconductor devices for increasing the removal rate of the photoresist layer.07-02-2009
20110262656OPTICAL THIN-FILM VAPOR DEPOSITION APPARATUS AND OPTICAL THIN-FILM PRODUCTION METHOD - A method of vapor depositing a vapor deposition substance onto substrates within a vacuum vessel includes holding the substrates with a dome shaped holder disposed within the vacuum vessel, rotating the dome shaped holder, vapor depositing a substance from a vapor deposition source disposed oppositely to the substrates, supplying ions from an ion source to the substrates, and supplying neutralizing electrons from a neutralizer to the substrates.10-27-2011
20100247798Conductive Inks and Manufacturing Method Thereof - The present invention relates to a variety of conductive ink compositions comprising a metal complex compound having a special structure and an additive and a method for preparing the same, more particularly to conductive ink compositions comprising a metal complex compound obtained by reacting a metal or metal compound with an ammonium carbamate- or ammonium carbonate-based compound and an additive and a method for preparing the same.09-30-2010
20100098876Plasma treatment of substrates prior to the formation a self-assembled monolayer - An improved method for forming a self-assembled monolayer on a substrate is disclosed. The method comprises plasma treatment of the substrate prior to formation of the self-assembled monolayer.04-22-2010
20100080929SYSTEM AND METHOD FOR APPLYING A CONFORMAL BARRIER COATING - An improvement of a baseline method for depositing a coating on a device having a surface where the surface includes a first portion and a second portion, where the second portion is in a shadow zone, and where the coating is deposited using a first predetermined set of process parameters having a first ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion. In the improved method, the coating is deposited using a second predetermined set of process parameters such that the coating substantially conforms to a profile of the device and a second ratio of a thickness of the coating on the second portion to a thickness of the coating on the first portion is greater than the first ratio. The method is a single, commercially advantageous deposition process, enabling increased product throughput and low process tact time.04-01-2010
20100124618Method of Forming Insulation Film Using Plasma Treatment Cycles - A film forming cycle based on pulse CVD or ALD is repeated multiple times to form a single layer of insulation film, while a reforming cycle is implemented in the aforementioned process, either once or multiple times per each film forming cycle, by treating the surface of formed film using a treating gas that has been activated by a plasma.05-20-2010
20100272918METHOD AND SYSTEM FOR GALVANIZING BY PLASMA EVAPORATION - The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.10-28-2010
20120269986PEARLESCENT PIGMENT, PROCESS FOR PRODUCING THE SAME, COATING COMPOSITION AND MULTILAYERED COAT - This invention relates to a pearlescent pigment, which is composed of flaky alumina substrate particles produced by a hydrothermal process and coat layers formed on the flaky substrate particles and composed of at least one metal oxide including at least a titanium oxide. The metal oxide has an average particle size of from 1 to 500 nm. According to this invention, it is possible to provide a pearlescent pigment, which has wholly uniform photoluminescence and an elegant and silky feel in combination and can fully satisfy artistry as desired.10-25-2012
20090291228METHOD AND APPARATUS FOR FORMING COLLOIDAL PHOTONIC CRYSTALS - A method for forming colloidal photonic crystals comprises; surrounding an outer circumference of a cylinder with a flexible substrate, spacing the cylinder a predetermined distance from a panel coated with a colloidal solution, and rotating the cylinder to form colloidal photonic crystals on the flexible panel.11-26-2009
20110200762Surface Preparation for Thin Film Growth by Enhanced Nucleation - Various processes and related systems are provided for making structures on substrate surfaces. Disclosed are methods of making a structure supported by a substrate by providing a substrate having a receiving surface and exposing at least a portion of the receiving surface to output from a remote plasma of an inert gas. The remote plasma has an energy low enough to substantially avoid etching or sputtering of the receiving surface but sufficient to generate a treated receiving surface. The treated surface is contacted with a deposition gas, thereby making the structure supported by the substrate.08-18-2011
20120295036MACHINE AND METHOD FOR ATMOSPHERIC PLASMA TREATMENT OF CONTINUOUS SUBSTRATES - A machine for atmospheric plasma treatment of continuous material substrates comprises means for feeding a substrate for moving it along a feed path; at least two electrodes each positioned at one face of the substrate, each electrode facing a respective face of the substrate, a difference in electric potential being applicable across the electrodes for generating an electric discharge; the feed means comprising at least one first roller and one second roller, the first roller and the second roller coinciding with respective electrodes and each acting on a respective face of the substrate.11-22-2012
20090123660Method for manufacturing magnetic recording medium - Embodiments of the present invention provide a manufacturing method that can form a track guide separation area of a magnetic disk substrate constituting a patterned medium represented by a discrete track medium or bit patterned medium suitable for high recording density, uniformly on the whole surface of the magnetic disk substrate, and accurately according to the mask. According to one embodiment, a soft magnetic film, an under coating film, and a magnetic film are formed on a substrate. A mask having an arbitrary pattern shape provided for forming the track guide separation area in the magnetic film is formed on the magnetic film, and the track guide separation area is formed by irradiating ions and electrons onto the surface of the magnetic film and applying an intermittent voltage to the substrate, thereby non-magnetizing the area irradiated.05-14-2009
20090297725Duplex Surface Treatment of Metal Objects - The specification discloses a method and apparatus enabling the formation of a diffusion surface layer on a surface of a metal substrate, typically a ferrous based metal substrate, wherein in a first stage in a first fluidized bed furnace, a diffusion zone is formed extending inwardly from the surface of the metal substrate in which nitrogen has been diffused to form a nitride or carbo nitride inner zone and an outer white layer that is substantially free of porosity, treating the substrate formed in the first stage to prevent formation of or remove any surface oxide on the surface of the substrate, and in a second stage separate from the first stage, holding the thus treated substrate in a fluidized bed furnace operated under an inert atmosphere and fluidized by a flow of inert gas or gases, the substrate in the fluidized bed furnace being treated in the presence of a halide gas and a particulate metal or metal alloy.12-03-2009
20090208664APPARATUS AND METHOD FOR PRODUCING A REFLECTOR - Provided is a deposition apparatus that has a metal evaporation source for depositing a reflective layer, a pigment evaporation source for depositing a coloring layer, and a plasma polymerization source (electrode) for depositing a protective layer disposed inside a single vacuum processing room. By carrying out a step of depositing the reflective layer, a step of depositing the coloring layer, and a step of depositing the protective layer in the common vacuum processing room, processes can be simplified and an operation time can be reduced.08-20-2009
20110223350METHOD FOR PRODUCING THERMOELECTRIC MATERIAL - A method for producing a thermoelectric material is provided. A semiconductor material powder is provided. An electroless plating process is preformed to deposit metal nano-particles on the surface of semiconductor material powder. An electrical current activated sintering process is performed to form a thermoelectric material having one and plurality grain boundaries.09-15-2011
20100209617METHOD OF FORMING A METAL PATTERN - A method of forming a metal pattern comprises: (a) providing a substrate; (b) depositing at least one patterned metal layer which includes a metal selected from an inert metal, an inert metal alloy, and combinations thereof; (c) disposing the substrate and the patterned metal layer in a vacuum chamber, vacuuming the vacuum chamber, and introducing a gas into the vacuum chamber; and (d) applying microwave energy to the gas to produce a microwave plasma of the gas within the vacuum chamber so that the patterned metal layer is acted by the microwave plasma and formed into a plurality of spaced apart metal nanoparticles on the substrate.08-19-2010
20120196050APPARATUS AND METHOD FOR ATOMIC LAYER DEPOSITION - Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed. A support part arranged opposite the injector head, the support part constructed to provide a gas bearing pressure arrangement that balances the injector head gas-bearing in the conveying plane, so that the substrate is held supportless by said gas bearing pressure arrangement in between the injector head and the support part.08-02-2012
20120196049MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM - A manufacturing method of a magnetic recording medium provided with a protective layer excellent in corrosion resistance, mechanical durability, adhesion with a lubrication layer, and floating stability of a head even if the film thickness is reduced is provided. This is a manufacturing method of a magnetic recording medium in which at least a magnetic layer, a carbon protective layer, and a lubrication layer are sequentially provided on a substrate, and said carbon protective layer is provided with a lower layer formed on the magnetic layer side and an upper layer formed on the lubrication layer side. The lower layer is formed by a chemical vapor deposition (CVD) method using hydrocarbon gas and then, the upper layer is formed by using mixed gas of hydrocarbon gas and nitrogen gas and then, treatment which nitridizes the surface of the upper layer is applied.08-02-2012
20100227078FORMING METHOD OF METALLIC PATTERN AND METALLIC PATTERN - A method for forming a metallic pattern, which is provided with a printing process to print a pattern portion on a substrate by means of an inkjet method utilizing ink containing a precursor of a nonelectric plating catalyst and a plating process to form a metallic pattern by nonelectric plating on said pattern portion, wherein the surface of said substrate is constituted of ink non-absorptive resin and has been subjected to a plasma treatment, and said ink has a pH value at 25° C. of not less than 9.0.09-09-2010
20090130331Method of Forming Thin Film and Method of Manufacturing Semiconductor Device - A thin film is deposited on a substrate to be processed by continuously performing: forming an amorphous thin film composed of Ti, N, C, and H as principal components; oxidizing a surface of the thin film; removing C and H, which are impurities in the thin film, by a plasma treatment, and increasing the density of the thin film; and removing a TiO thin film from a surface of the thin film.05-21-2009
20110244141METHOD OF PROCESSING MULTILAYER FILM - A method of processing a multilayer film is provided. The method includes providing a substrate film having a substrate film first surface and a substrate film second surface. The method also includes providing a barrier layer adjacent to the substrate film second surface. The barrier layer has at least one opening allowing fluid communication between the substrate film and an outer surface of the barrier layer. Further, the method includes contacting the substrate film first surface with a first reactant and finally contacting the outer surface of the barrier layer with a second reactant, said second reactant being reactive with said first reactant. The method of contacting the substrate film first surface to the first reactant and contacting the outer surface of the barrier layer to the second reactant is carried out under conditions under which reaction between said first reactant and the second reactant results in a formation of a reaction layer.10-06-2011
20120189782ELECTRONIC DEVICE MANUFACTURE USING LOW-k DIELECTRIC MATERIALS - Materials and methods for manufacturing electronic devices and semiconductor components using low dielectric materials comprising polyimide based aerogels are described. Additional methods for manipulating the properties of the dielectric materials and affecting the overall dielectric property of the system are also provided.07-26-2012
20100062176Boundary layer disruptive preconditioning in atmospheric-plasma process - The boundary layer of a substrate is exposed to a low-energy inert-gas atmospheric plasma that disrupts the layer's bonds, thereby permitting the removal of most oxygen from the surface of the substrate. The substrate is then passed through an exhaust section to remove the disrupted boundary layer prior to conventional plasma treatment. The subsequent plasma treatment is carried out in conventional manner in a substantially oxygen-free environment. As a result of the invention, the high surface-energy levels provided by plasma treatment are more lasting and plasma applications requiring a substantially oxygen-free environment are more efficient.03-11-2010
20100055342MODULATED ION-INDUCED ATOMIC LAYER DEPOSITION (MII-ALD) - The present invention relates to a cyclic deposition process suitable for depositing an elemental film. The process employs an enhanced atomic layer deposition technique.03-04-2010
20110076418Liquid crystal display device and method of fabricating the same - A method of fabricating a liquid crystal display device, includes applying an alignment film to a substrate surface, provisionally drying the alignment film, baking the alignment film; rubbing; and rubbing washing, which are performed in this sequence, wherein, in applying the alignment film, the alignment film is formed so as to cover at least a display region, and a portion of the alignment film which extends in a region outside the display region is imparted with an adsorptive property by modification during a process from the provisional drying to the rubbing washing.03-31-2011
20120201971METHOD OF COALESCING TRANSPARENT SUBSTRATE AND DISPLAY DEVICE AND DAM PATTERN FORMING APPARATUS - Provided is a method of coalescing a transparent substrate and a display device. The method includes a first step of applying light curing-type dam material on a surface of the display device and forming dam patterns, a second step of applying adhering material inside the dam patterns, and a third step of coalescing the transparent substrate on the adhering material.08-09-2012
20100285235PROCESS FOR THE PREPARATION OF PHOTO LUMINESCENT NANOSTRUCTURED SILICON THIN FILMS - The present invention provides a process for the preparation of nano structured silicon thin film using radio frequency (rf) plasma discharge useful for light emitting devices such as light emitting diode, laser etc. The present invention shows the possibility of precise control of the nanocrystal size of silicon and its uniform distribution without doping using plasma processing for obtaining efficient photoluminescence at room temperature. Process developed to deposit the photo luminescent nano structured silicon thin films using plasma enhanced chemical vapour deposition technique can find use in electroluminescence devices like light emitting diodes (LEDs), LASER etc. This could also be advantageous for integration of silicon photonic devices with the existing silicon microelectronic technology.11-11-2010
20110052834METHOD AND COMPOSITIONS FOR CREATING AN ATOMIC COMPOSITE OF CERAMICS COATED WITH TITANIUM MAKING USE OF COATING METHODOLOGY - The invention relates to a method for the coating of a surface of a ceramic basic body with a titanium compound, comprising the steps of (i) providing a preformed ceramic material; (ii) at least one step of surface activation of said ceramic material using a plasma for plasma-chemical surface preparation wherein the plasma comprises high-energy ions; (iii) at least one step of applying a titanium compound bonding layer to said ceramic material by plasma-supported coating wherein the plasma-supported coating is performed in pulsed and/or non-pulsed fashion; (iv) at least one step of applying a functional titanium compound layer by pulsed plasma-supported coating. The invention also relates to novel compositions as well as uses of the novel compositions.03-03-2011
20100215867METHOD OF TREATING RUBBER COMPOSITION WITH CURE INHIBITOR TO CREATE SOFT SKIN IN GOLF BALL CORE - A method of making a golf ball including the steps of providing a preform including an uncured polybutadiene composition; coating the preform with a cure-altering material including a hydroquinone compound, a benzoquinone compound, a resorcinol compound, or a quinhydrone compound; curing the coated preform at a predetermined temperature to form a crosslinked golf ball core having an outer surface having a first hardness and a geometric center having a second hardness greater than the first to define a negative hardness gradient; and forming a cover layer about the core to form the golf ball.08-26-2010
20100189918HIGHLY TRANSPARENT ELECTROCHROMIC COATING MATERIAL, METHOD FOR PRODUCING THE SAME AND USE OF THE MATERIAL - The present invention relates to a method for the preparation of a novel hybrid electrochromic coating material with superior performance in terms of transparency, electrochromic contrast, colouration efficiency, and adhesion, for a use in electrochromic devices for applications where a high transparency is required in the bleached state.07-29-2010
20110135838Liquid Precursor for Depositing Group 4 Metal Containing Films - The present invention is related to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR06-09-2011
20100028557RADIATION DETECTING APPARATUS AND METHOD FOR MANUFACTURING THE SAME - An underlayer of a phosphor layer is disposed on a sensor panel including two-dimensionally arranged photoelectric conversion devices. The surface of the underlayer is subjected to atmospheric pressure plasma treatment. The phosphor layer is formed on the surface-treated underlayer. Then, the phosphor layer is covered with a moisture-resistant protective layer, a reflection layer, and another protective layer. Thus, the phosphor layer is prevented from peeling due to adhesion failure, and is constituted of uniformly shaped crystals by vapor deposition. A resulting radiation detecting apparatus exhibits high sensitivity and high definition, producing a uniform photoelectric conversion efficiency.02-04-2010
20100021651Method of producing processed rolled materials and system therefor - A method of continuously transferring a web of material from a large roll to a smaller roll involves the performance of at least one processing step including printing during the continuous transfer of the web of material from the large roll to the smaller roll. A system for performing the method continuously transfers a web of material from a large roll to a smaller roll while performing at least one processing step on the web of material during the continuous transfer thereof.01-28-2010
20100119728Methods of making multilayered, hydrogen-containing thermite structures - Methods of making multi-layered, hydrogen-containing thermite structures including at least one metal layer and at least one metal oxide layer adjacent to the metal layer are disclosed. At least one of the metal layers contains hydrogen, which can be introduced by plasma hydrogenation. The thermite structures can have high hydrogen contents and small dimensions, such as micrometer-sized and nanometer-sized dimensions.05-13-2010
20090269507SELECTIVE COBALT DEPOSITION ON COPPER SURFACES - Embodiments of the invention provide processes to selectively form a cobalt layer on a copper surface over exposed dielectric surfaces. In one embodiment, a method for capping a copper surface on a substrate is provided which includes positioning a substrate within a processing chamber, wherein the substrate contains a contaminated copper surface and a dielectric surface, exposing the contaminated copper surface to a reducing agent while forming a copper surface during a pre-treatment process, exposing the substrate to a cobalt precursor gas to selectively form a cobalt capping layer over the copper surface while leaving exposed the dielectric surface during a vapor deposition process, and depositing a dielectric barrier layer over the cobalt capping layer and the dielectric surface. In another embodiment, a deposition-treatment cycle includes performing the vapor deposition process and subsequently a post-treatment process, which deposition-treatment cycle may be repeated to form multiple cobalt capping layers.10-29-2009
20120177841Low Temperature Silicon Carbide Deposition Process - Methods for formation of silicon carbide on substrate are provided. Atomic layer deposition methods of forming silicon carbide are described in which a first reactant gas of the formula Si07-12-2012
20120177840Process for Forming an Improved Durability Thick Ceramic Coating - A process for forming a ceramic coating on a substrate, such as a turbine engine component includes the steps of providing a substrate, creating a plasma which preheats the substrate, and forming a ceramic coating by injecting a powder feedstock into the plasma. The ceramic coating forming step comprises depositing ceramic particles having a mean size in the range of from 100 to 150 microns at constant particle morphology.07-12-2012
20100196620PROCESS FOR COATING A BELT, IN PARTICULAR THE FABRIC OF A PAPER MACHINE - The present invention relates to a method of coating a technical textile belt or fabric for a machine to produce a fibrous web of material, for example paper, cardboard, or tissue, which includes the step of i) providing a belt, whereby a coating is applied onto one side of belt; ii) providing of an applicator device, with which a liquid medium can be applied onto one side of belt without actually coming in contact with the belt; iii) applying the liquid medium onto one side of the belt; and iv) causing the liquid medium to bond and develop in order to allow the formation of a solid coating covering on the side of the belt and/or the inner structure covering at least a portion of the side of the belt. The method according to the present further provides that in invention step iii), the applicator device, follows a previously established raster in applying pre-determined quantities of the coating medium onto a plurality of locations, located within at least one region on the side of the belt. The coating medium and the material and/or the structure of the belt are further selected in such a way that the coating medium will spread out on the surface of the side of the belt and/or from the surface of the side into the interior of the structure of the belt.08-05-2010
20110318503PLASMA ENHANCED MATERIALS DEPOSITION SYSTEM - A system and method for combined material deposition and plasma and/or controlled atmosphere treatment processing of substrates. In one variation, plasma and/or controlled atmosphere treatment and deposition are performed using a single processing system with multiple processing areas. In another variation, plasma and/or controlled atmosphere treatment and deposition are performed using a single processing system with a single processing area. Variations of deposition include printing or direct-write techniques. Processing areas may be atmospherically controlled or selectively sealable.12-29-2011
20110318502METHODS OF DEPOSITING SIO2 FILMS - This invention relates to a method of depositing an inorganic SiO12-29-2011
20120114872METHOD FOR PATTERNING A PHOTOSENSITIVE LAYER - The method of patterning a photosensitive layer includes providing a substrate including a first layer formed thereon, treating the substrate including the first layer with cations, forming a first photosensitive layer over the first layer, patterning the first photosensitive layer to form a first pattern, treating the first pattern with cations, forming a second photosensitive layer over the treated first pattern, patterning the second photosensitive layer to form a second pattern, and processing the first layer using the first and second patterns as a mask.05-10-2012
20120015111DYED PLASTIC LENS FABRICATION METHOD - Provided is a process for producing a dyed plastic lens in accordance with which in accordance with which deformation and change in the color of the plastic lens can be suppressed and a plastic lens having a refractive index of 1.7 or greater and, in particular, a refractive index of 1.7 to 1.8, can be preferably dyed uniformly to a great density without unevenness. Specifically, the process for producing a dyed plastic lens comprises: Step (1) of coating a substrate comprising glass with a sublimation dye; Step (2) of, after placing a plastic lens in a manner such that a face for dyeing of the plastic lens and a face of the substrate coated with the sublimation dye face each other, sublimating the sublimation dye coating the substrate obtained in Step (1) by heating the substrate under a degree of vacuum of 1×1001-19-2012
20090162566METHOD FOR THE SELECTIVE COATING OF A SURFACE WITH LIQUID - The present invention relates to a method for the selective coating of a surface of a substrate with liquid, wherein the surface to be selectively coated with liquid comprises regions exhibiting different surface energies, and wherein prior to wetting a fluorine-containing plasma gas is directly acting on the regions exhibiting different surface energies.06-25-2009
20110165341BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY - In accordance with an embodiment of the disclosure, a method for forming submicron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1 μm.07-07-2011
20110165342PROCESS FOR PRODUCING COMPOSITE OF METAL AND RESIN - The metal part is one where a carboxyl group or an amino group, or a hydroxyl group is imparted onto the surface. On the other hand, the resin part is one into which an adhesiveness modifier containing an epoxy group is blended. A process for producing a composite of metal and resin, wherein the metal part and the resin part are bonded by interaction of the carboxyl group or the amino group, or the hydroxyl group with the epoxy group.07-07-2011
20110081500Method of providing stable and adhesive interface between fluorine-based low-k material and metal barrier layer - A method of integrating a fluorine-based dielectric with a metallization scheme is described. The method includes forming a fluorine-based dielectric layer on a substrate, forming a metal-containing layer on the substrate, and adding a buffer layer or modifying a composition of the fluorine-based dielectric layer proximate an interface between the fluorine-based dielectric layer and the metal-containing layer.04-07-2011
20120207946METHOD OF FORMING A PROTECTIVE FILM FOR A MAGNETIC RECORDING MEDIUM, A PROTECTIVE FILM FORMED BY THE METHOD AND A MAGNETIC RECORDING MEDIUM HAVING THE PROTECTIVE FILM - A method of forming a protective film of a magnetic recording medium is provided that achieves a good bonding characteristic with a lubricant film and at the same time, suppressing adhesion of contamination gases, to attain a reduced thickness of the magnetic recording medium. The method includes forming a protective film on a lamination including a substrate and a metallic film layer formed on the substrate, by means of a plasma CVD method using a raw material of a hydrocarbon gas, and performing a surface treatment on the protective film. The surface treatment includes a plasma treatment with argon gas, and a plasma treatment with a gas containing at least nitrogen gas.08-16-2012
20110104394PROCESS FOR THE PERMANENT MULTICOLOR PAINTING OF A PRODUCT - A process for the permanent multicolor painting of a product, e.g. a body part, includes defining a first region, a first location within the first region and a second location within the first region but different from the first location, on the surface of the product. The surface is provided with a first release layer, at least in the first region and the first release layer is exposed to electromagnetic radiation, e.g. IR radiation, at the first location but not at the second location. The surface is provided with a first layer of paint at least at the first location. The first layer of paint is fixed, at least at the first location. Alternatively, the first release layer is applied at least at the second location but not at the first location, so that an exposure to electromagnetic energy at the first location can be omitted.05-05-2011
20100092693ADHESIVE COMPOSITION FOR POLARIZER AND THE PREPARATION METHOD OF POLARIZER USING THE SAME - The present invention relates to an adhesive composition for adhesion of a polarizing film and a protecting film, a preparation method of the polarizer using the adhesive composition and a polarizer produced by the method. The adhesive composition of the present invention is a photocurable adhesive composition composed of 30-70 weight part of (metha)acrylate monomer, 25-65 weight part of acrylate oligomer, 4-10 weight part of a photoinitiator, and 0-3 weight part of an additional additive. And, the polarizer prepared by using the same has excellent flexibility, elasticity, impact resistance, adhesive strength and durability, resulting in the increase of strength and reliability as a polarizer. The preparation method of a polarizer of the present invention using the photocurable adhesive composition does not need heating and pressing processes, making the manufacturing line simple and thereby reducing costs for facilities. The method of the invention also simplifies the pretreatment process of a protecting film, resulting in the increase of production efficiency.04-15-2010
20100092692METHOD AND DEVICE FOR COATING SUBSTRATES - The invention relates to a method for coating one or more sides of substrates with catalytically active material, comprising material deposition under vacuum in a vacuum chamber, wherein the following steps are performed: (a) loading the vacuum chamber with at least one substrate, (b) closing and evacuating the vacuum chamber, (c) cleaning the substrate by introducing a gaseous reducing agent into the vacuum chamber, (d) increasing the size of the substrate surface by depositing a vaporous component on the substrate surface, (e) coating by a coating process taken from the group of plasma coating processes, physical gas deposition, sputtering processes or the like, wherein one or more metals and/or alkaline and/or earth alkaline metals or their oxides are applied to the surface of the substrate. This method may be used, for example, for coating electrodes which are used in the chlor-alkali electrolysis.04-15-2010
20120121818COATING SURFACE PROCESSING METHOD AND COATING SURFACE PROCESSING APPARATUS - A coating surface processing method includes forming a coating on the entire surface of a base body that has fine holes or fine grooves formed on the to-be-filmed surface, including the inner wall surfaces and the inner bottom surfaces of the holes or the grooves, and flattening the coating formed on the inner wall surfaces of the holes or the grooves by carrying out a plasma processing on the surface of the coating.05-17-2012
20120121817METHOD FOR PRODUCING DIAMOND-LIKE CARBON FILM BODY - Provided is a method of manufacturing a DLC film formed body in which peeling-off of a DLC film is suppressed. In manufacturing a DLC film formed body having a film hardness of 10 GPa or more, prior to the formation of the DLC film, a surface of a base is pretreated with a discharge plasma and a silicon carbide film being an interlayer is formed on the surface of the base. The surface of the base is pretreated by supplying an inside of the chamber with a gas mixture obtained by mixing 1 part by volume or more and 10 parts by volume or less of argon gas into 100 parts by volume of helium gas while adjusting a pressure inside of the chamber in which the base is housed to 20 hPa or higher and an atmospheric pressure or lower, and generating a discharge plasma in the mixed.05-17-2012
20100209618METHOD FOR PLASMA TREATMENT AND PAINTING OF A SURFACE - A method for plasma treatment and painting of a surface, the surface including a plurality of different materials includes blasting the surface with a carbon dioxide snow so as to activate the surface to improve an adhesive strength; and treating the surface with a plasma treatment using at least one plasma nozzle following the blasting step, the treating including guiding the at least one plasma nozzle at a distance of not more than 15 mm from the surface at a feed rate of not more than 50 m/min.08-19-2010
20120213941ION-ASSISTED PLASMA TREATMENT OF A THREE-DIMENSIONAL STRUCTURE - A boundary between a plasma and a plasma sheath is controlled such that a portion of the shape is not parallel to a plane defined by a front surface of the workpiece facing the plasma. Ions in the plasma are directed toward the workpiece. These ions can either seal pores or clean a material from a structure on the workpiece. This structure may, for example, have multiple sidewalls. A process that both cleans a material and seals pores in the structure may be performed.08-23-2012
20120213940ATOMIC LAYER DEPOSITION OF SILICON NITRIDE USING DUAL-SOURCE PRECURSOR AND INTERLEAVED PLASMA - Atomic layer deposition using a precursor having both nitrogen and silicon components is described. The deposition precursor contains molecules which supply both nitrogen and silicon to a growing film of silicon nitride. Silicon-nitrogen bonds may be present in the precursor molecule, but hydrogen and/or halogens may also be present. The growth substrate may be terminated in a variety of ways and exposure to the deposition precursor displaces species from the outer layer of the growth substrate, replacing them with an atomic-scale silicon-and-nitrogen-containing layer. The silicon-and-nitrogen-containing layer grows until one complete layer is produced and then stops (self-limiting growth kinetics). Subsequent exposure to a plasma excited gas modifies the chemical termination of the surface so the growth step may be repeated. The presence of both silicon and nitrogen in the deposition precursor molecule increases the deposition per cycle thereby reducing the number of precursor exposures to grow a film of the same thickness.08-23-2012
20120258258METHOD OF REUSING A CONSUMABLE PART FOR USE IN A PLASMA PROCESSING APPARATUS - A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.10-11-2012
20110123724DIELECTRIC COMPOSITE AND A METHOD OF MANUFACTURING A DIELECTRIC COMPOSITE - A composite for a transducer facilitates an increased actuation force as compared to similar prior art composites for transducers. The composite facilitates increased compliance of the transducer in one direction, an improved reaction time as compared to similar prior art composites for transducers, and provides an increased lifetime of the transducer in which it is applied.05-26-2011
20120263885METHOD FOR THE MANUFACTURE OF A REFLECTIVE LAYER SYSTEM FOR BACK SURFACE MIRRORS - In method for the manufacture of a reflective layer system on a substrate with at least one metallic reflective layer, a dielectric, transparent layer is deposited on the substrate as a silicon oxide containing layer using a suitable PVD process. The coated substrate subsequently is transferred out of the vacuum and at least one metallic reflective layer is deposited via a wet-chemical process.10-18-2012
20110027497ANISOTROPIC NANOTUBE FABRIC LAYERS AND FILMS AND METHODS OF FORMING SAME - Methods for forming anisotropic nanotube fabrics are disclosed. In one aspect, a nanotube application solution is rendered into a nematic state prior to its application over a substrate. In another aspect, a pump and narrow nozzle assembly are employed to realize a flow induced alignment of a plurality of individual nanotube elements as they are deposited onto a substrate element. In another aspect, nanotube adhesion promoter materials are used to form a patterned nanotube application layer, providing narrow channels over which nanotube elements will self align during an application process. Specific dip coating processes which are well suited for aiding in the creation of anisotropic nanotube fabrics are also disclosed.02-03-2011
20110045203PROCESS FOR INHIBITING OXIDE FORMATION ON COPPER SURFACES - Processes are provided for inhibiting the formation of copper oxides on substantially oxide-free copper surfaces by contacting a substantially oxide-free copper surface with a pyrazoline ligand in an aqueous solution of pH 2-5. A thin layer of the ligand formed by coordination of 2-pyrazoline or 1-methyl-2-pyrazoline to the copper surface can be easily removed by exposure to a reducing plasma to regenerate a substantially oxide-free copper surface.02-24-2011
20120148756METHOD OF PRODUCING COMPOUND NANORODS AND THIN FILMS - A method of producing compound nanorods and thin films under a controlled growth mode is described. The method involves ablating compound targets using an ultrafast pulsed laser and depositing the ablated materials onto a substrate. When producing compound nanorods, external catalysts such as pre-deposited metal nanoparticles are not involved. Instead, at the beginning of deposition, simply by varying the fluence at the focal spot on the target, a self-formed seed layer can be introduced for nanorods growth. This provides a simple method of producing high purity nanorods and controlling the growth mode. Three growth modes are covered by the present invention, including nanorod growth, thin film growth, and nano-porous film growth.06-14-2012
20090017222Plasma enhanced bonding for improving adhesion and corrosion resistance of deposited films - Plasma Enhanced Bonding (PEB) during a coating process is used to improve both adhesion and corrosion resistance of the resulting coating. New interfacial compounds may be formed, offering the increased resistance to corrosion, as well as enhanced bonding to the workpiece being coated and any subsequently formed layer, such as diamond-like carbon. In one embodiment, the PEB processing is employed during coating of at least one interior surface of the workpiece, which may be a pipe. In a first step, a thin film is deposited. Then, the film is exposed to a high energy etch-back plasma. This two-step cycle of depositing a film and then providing bombardment of the film may be repeated a number of times. Typically, the deposition step of the cycle is much shorter than the bombardment step.01-15-2009
20100233384IMMOBILIZATION OF METAL NANOPARTICLES - A solution containing polymer-bound metal nanoparticles is deposited onto a substrate, at least the surface of which is insulating, to form a pattern, the substrate is dried, and then the pattern is subjected to plasma exposure.09-16-2010
20100233383Organic electronic devices and methods - Disclosed are methods of fabricating an organic electronic device, which includes dip coating layers, and the devices made therefrom.09-16-2010
20100203260Method for efficient coating of substrates including plasma cleaning and dehydration - A process for the coating of substrates comprising insertion of a substrate into a process oven, plasma cleaning of the substrate, rehydration of the substrate, dehydration of the substrate, withdrawal of a metered amount of one or more chemicals from one or more chemical reservoirs, vaporizing the withdrawn chemicals in one or more vapor chambers, and transfer of the vaporized chemicals into a process oven, thereby reacting with the substrate. An apparatus for the coating of substrates comprising a process oven, a gas plasma generator, a metered chemical withdrawal subsystem, and a vaporization subsystem.08-12-2010
20100178432Method of Forming Pattern Film, and Pattern Film Forming Apparatus - An objective is to provide a method of forming a pattern film in which a dense conductive pattern with no defect can be formed even in a low temperature treatment, the formed pattern film having the same thickness as in the conventional method exhibits excellent properties of conductivity, film strength, transmittance and so forth together with improved stability at high temperature and humidity, and a pattern film with no lack can be stably formed with an easy-to-use apparatus, and to provide a pattern film forming apparatus thereof. Disclosed is a method of forming a pattern film possessing the steps of forming a thin film in a form of a predetermined geometric pattern on a substrate employing a solution comprising a metal ion, and subsequently treating the thin film via an atmospheric pressure plasma treatment to prepare a pattern film.07-15-2010
20130011574GRAPHENE PRODUCTION METHOD AND GRAPHENE PRODUCTION APPARATUS - Provided is a graphene production method including: contacting a carbon source substance with a surface of a flexible film-forming target having electrical conductivity; and applying a current to the film-forming target and heating the film-forming target at a temperature exceeding a graphene production temperature to produce graphene from the carbon source substance on the surface of the film-forming target.01-10-2013
20130022755UNIVERSAL SOLUTION FOR GROWING THIN FILMS OF ELECTRICALLY CONDUCTIVE NANOSTRUCTURES - A method is described for depositing nanostructures of conducting polymers, nanostructures, particularly carbon nanostructures and combinations thereof. The process comprises placing the nanostructures in a liquid composition comprising an immiscible combination of aqueous phase and an organic phase. The mixture is mixed for a period of time sufficient to form an emulsion and then allowed to stand undisturbed so that the phases are allowed to separate. As a result the nanostructure materials locate at the interface of the forming phases and are uniformly dispersed along that interface. A film of the nanostructure materials will then form on a substrate intersecting the interface, said substrate having been placed in the mixture before the phases are allowed to settle and separate.01-24-2013
20100028556CHEMICAL VAPOR DEPOSITION COLORED DIAMOND - Chemical vapor deposition grown diamonds may be provided with one or more layers of doping to form colored diamonds. In one embodiment, layers of pink colored diamond may be formed by doping with nitrogen. In further embodiments, layers of yellow colored diamond may be formed by doping with boron. In some embodiments, the grown diamond has a single crystalline structure with minimal to no grain boundaries.02-04-2010
20130171369METHOD FOR MANUFACTURING ELECTRODE PATTERN OF DISPOSABLE ELECTROCHEMICAL SENSOR STRIP - Disclosed is a method for manufacturing an electrode pattern of a disposable electrochemical sensor strip. The method comprises steps of preparing a nonconductive substrate; forming a mask film with an inverse pattern on at least one side of the nonconductive substrate, said mask film is made of water soluble material or solvent soluble material; forming a metal film both on the mask film and the nonconductive substrate; and washing out, by water, solvent, or water solution, the mask film and the metal film which is on the mask film, so as to form a metal electrode with the electrode pattern on at least one side of the substrate of the disposable electrochemical sensor strip.07-04-2013
20130171370PROCESS AND SYSTEM FOR PRODUCING ELECTROCHEMICAL CELLS FOR ELECTROCHEMICAL STORAGE - A process is described for producing sheet- or plate-type objects, particularly for producing electrodes and/or separators for constructing an electrochemical energy storage, preferably designed for use in a motor vehicle, or for producing parts of such electrodes and/or such separators, wherein the sheet- or plate-type objects have a first object side surface and a second object side surface on the opposite side to the first object side surface. The production process includes the following steps: reducing (S07-04-2013
20130171371PROCESS FOR PRODUCTION OF ADHESIVE OPTICAL FILM - A method for production of an adhesive optical film comprises the step of forming an anchor layer by applying an anchor layer-forming coating liquid to the optical film to form a coating with a thickness of 20 μm or less before drying, wherein the anchor layer-forming coating liquid contains a mixed solvent composed mainly of water and an alcohol, and a binder resin, and by drying the coating under drying conditions satisfying both of the following requirements: 07-04-2013
20090280267PLASMA-ENHANCED PULSED DEPOSITION OF METAL CARBIDE FILMS - Methods of forming a metal carbide film are provided. In some embodiments, a substrate is exposed to alternating pulses of a transition metal species and plasma-excited argon. The transition metal species is reacted with a carbon species to deposit a metal carbide film. The substrate is exposed to the carbon species simultaneously with the transition metal species, or the substrate is exposed to the carbon species in pulses temporally separated from the pulses of the transition metal species. In some embodiments, the carbon species and the transition metal species form parts of the same precursor compound, e.g., a metal organic compound.11-12-2009
20130115383DEPOSITION OF METAL FILMS USING ALANE-BASED PRECURSORS - Provided are methods of depositing pure metal and aluminum alloy metal films. Certain methods comprises contacting a substrate surface with first and second precursors, the first precursor comprising an aluminum precursor selected from dimethylaluminum hydride, alane coordinated to an amine, and a compound having a structure represented by:05-09-2013
20130115382SILANE COPOLYMERS AND USES THEREOF - The invention relates to a method to reduce the electroosmotic flow in a capillary or in a channel and to a method to reduce the attachment of biological species to a surface comprising the step of coating said capillary, channel or surface with a copolymer comprising a surface interacting monomer, a monomer bearing a chemically active group and an ethylenically unsaturated silane monomer.05-09-2013
20110223351LASER CLADDING OF A THERMOPLASTIC POWDER ON PLASTICS - A method applies a coating (09-15-2011
20110236593Treatment Method Using Plasma - The invention is related to a treatment for a base material using plasma. Various particulate substances, porous substances, or film-state substances can be easily formed on the base material. Alternatively, a particulate substance, a porous substance, or a film-state substance, such as ceramic, can be formed even on a base material having low heat resistance. In a treatment method using plasma, in which the plasma is irradiated on a precursor substance 09-29-2011
20130183456ANTI-MICROBIAL AND ANTI-STATIC SURFACE TREATMENT AGENT WITH QUATERNARY AMMONIUM SALT AS ACTIVE INGREDIENT AND METHOD FOR PREVENTING STATIC ELECTRICITY IN POLYMER FIBERS USING SAME - Provided are an anti-static and anti-microbial surface treatment agent including a quaternary ammonium salt compound as an active ingredient and a method of preventing a polymer fiber from developing static electricity by using the surface treatment agent. The quaternary ammonium salt compound has excellent anti-static and anti-microbial effects for the prevention or improvement of static electricity in a polymer fiber. Accordingly, the quaternary ammonium salt compound is suitable for use as a fabric softener, or an anti-static agent, and also, provides anti-microbial effects to a polymer fiber.07-18-2013
20120027949ADHESIVE RESIN COMPOSITION AND BONDING METHOD - The present invention relates to an inexpensive adhesive resin composition which is applicable even to a base material having a poor bonding property. The adhesive resin composition comprises (A) a polymer having no radical-polymerizable double bond and (B) a radical generating agent in which the radical generating agent (B) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). In the preferred embodiment of the present invention, the adhesive resin composition further comprises (C) a radical-polymerizable monomer wherein the monomer (C) is present in an amount of 0.1 to 10 parts by weight on the basis of 100 parts by weight of the polymer (A). The radical-polymerizable monomer (C) is a glycidyl group-containing monomer, and the glycidyl group-containing monomer is 4-hydroxybutyl acrylate glycidyl ether.02-02-2012
20130196078Multi-Chamber Substrate Processing System - A substrate processing system for processing multiple substrates is provided and generally includes at least one substrate processing platform and at least one substrate staging platform. The substrate processing platform includes a rotary track system capable of supporting multiple substrate support assemblies and continuously rotating the substrate support assemblies, each carrying a substrate thereon. Each substrate is positioned on a substrates support assembly disposed on the rotary track system and being processed through at least one shower head station and at least one buffer station, which are positioned atop the rotary track system of the substrate processing platform. Multiple substrates disposed on the substrate support assemblies are processed in and out the substrate processing platform. The substrate staging platform includes at least one dual-substrate processing station, each dual-substrate processing station includes two substrate support assemblies for supporting two substrates thereon.08-01-2013

Patent applications in class Plasma (e.g., cold plasma, corona, glow discharge, etc.)

Patent applications in all subclasses Plasma (e.g., cold plasma, corona, glow discharge, etc.)