Class / Patent application number | Description | Number of patent applications / Date published |
427534000 | Cleaning or removing part of substrate (e.g., etching with plasma, glow discharge, etc.) | 63 |
20080248214 | METHOD OF FORMING AN OXIDE COATING WITH DIMPLES ON ITS SURFACE - This invention involves a process of forming an oxide coating with dimples on Al, Mg and Ti alloys. The oxide coating with dimples on its surface is produced by the process consisting of an electrochemical etching on the surface of those alloys followed by plasma oxidation in an alkaline electrolytic solution using a high voltage power supply. The as-prepared coating has smooth surface finish and improved properties being suitable for wear and corrosion protection of materials which have contacts with each other. The present invention can also be applied onto Al—Si and Mg alloys for wear and corrosion-wear prevention of sleeveless aluminium and magnesium engines. | 10-09-2008 |
20080248215 | DEVICE AND A PROCESS FOR DEPOSITING A METAL LAYER ON A PLASTIC SUBSTRATE - The invention relates to a process and to a web deposition machine for coating a plastic substrate with at least one metal layer, in particular plastic foil for flexible, printed circuit boards, wherein before depositing a first layer onto a surface of the plastic substrate to be deposited, a non depositing pretreatment of this surface is performed. It is the object of the invention to provide a process as described above through which the adhesion of metal layers on a plastic substrate is improved. Furthermore, a web deposition machine shall be provided through which such process can be performed. The object is accomplished through a process so that the non depositing pretreatment is performed in two steps, thus in a first step in which the surface of the plastic substrate ( | 10-09-2008 |
20080260963 | APPARATUS AND METHOD FOR PRE AND POST TREATMENT OF ATOMIC LAYER DEPOSITION - The embodiments fill the needs of systems and processes that perform substrate surface treatment to provide homogenous, clean, and sometimes activated surface in order to provide good adhesion between layers to improve metal migration and void propagation. In an exemplary embodiment, a proximity head for treating a substrate surface is provided. The proximity head is configured to dispense a treatment gas to treat an active process region of a substrate surface under the proximity head. The proximity head covers the action process region of the substrate surface and the proximity head includes at least one vacuum channel to pull excess treatment gas from a reaction volume between the proximity head and the substrate. The proximity head has an excitation chamber to excite the treatment gas before the treatment gas being dispensed on the active process region portion of the substrate surface. | 10-23-2008 |
20080311310 | DLC Coating System and Process and Apparatus for Making Coating System - A process and an arrangement by means of which it is possible to generate a layer system for the protection against wear, for the protection against corrosion and for improving the sliding properties or the like, which has an adhesive layer for the arrangement on a substrate, a transition layer for the arrangement on the adhesive layer and a cover layer of an adamantine carbon, the adhesive layer including at least one element from the Group which contains the elements of the 4 | 12-18-2008 |
20090011141 | ARTICLE WITH PHEMA LIFT-OFF LAYER AND METHOD THEREFOR - A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers. | 01-08-2009 |
20090053425 | Assembly of nano-particles using DNA-mediated charge trapping - A method for producing single-dimensioned gold-nano-particle patterns having a single-particle resolution in which the line-width is only limited by the particle size. Initially, a focused electron beam is used to generate a positive charge layer on an SiO | 02-26-2009 |
20090081378 | LAYERED LENSES AND METHOD OF LAYERING LENSES - A method for layering lenses includes: plasma treating a lens surface; applying a removable ink layer onto the lens surface; applying a base ink layer over the removable ink layer; applying at least one colored ink layer over the base ink layer; and removing the removable ink layer. Additional steps may include drying the lens, sealing the sides of the lens, and applying liquid to the lens before removing the removable ink layer. | 03-26-2009 |
20090098309 | In-Situ Etching Of Shadow Masks Of A Continuous In-Line Shadow Mask Vapor Deposition System - In a method of using and cleaning one or more shadow masks of a shadow mask vapor deposition system used to form an electronic device, a substrate is advanced through series connected deposition vacuum vessels. As the substrate advances through each deposition vacuum vessel, material from a material deposition source positioned in the deposition vacuum vessel is deposited on the substrate through a shadow mask positioned therein. The material is also deposited on a surface of the shadow mask that faces the one material deposition source. Following the deposit of material on the surface of the shadow mask in at least one deposition vacuum vessel, a reactive gas is introduced into the deposition vacuum vessel absent the substrate therein. The reactive gas is then ionized to remove the material deposited on the shadow mask. | 04-16-2009 |
20090130330 | Method for producing Functional Fluorocarbon Polymer Layers by Means of Plasma Polymerization of Perfluorocycloalkanes - The present invention relates to a method for producing fluorocarbon layers on a substrate, e.g., a metal, polymer, ceramic material and/or textiles by means of a low-pressure plasma method and products produced in this way. | 05-21-2009 |
20090155486 | METHODS OF MAKING CRYSTALLINE TANTALUM PENTOXIDE - There is disclosed a method of forming crystalline tantalum pentoxide on a ruthenium-containing material having an oxygen-containing surface wherein the oxygen-containing surface is contacted with a treating composition, such as water, to remove at least some oxygen. Crystalline tantalum pentoxide is formed on at least a portion of the surface having reduced oxygen content. | 06-18-2009 |
20090197012 | PLASMA CVD APPARATUS - In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber | 08-06-2009 |
20090214798 | APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING - Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region. | 08-27-2009 |
20090246402 | Layer forming method and layer forming apparatus, and method of manufacturing radiation detector - A layer-forming apparatus coats a solution containing a layer component and a flammable solvent on a surface of a base material, and forms a layer on the surface of the base material. In the layer-forming apparatus, a coating chamber in which the solution is coated on the surface of the base material is closed substantially hermetically, and a clean air is supplied from a clean-air supplier to the coating chamber. Then, ions that are produced by a corona discharger are sprayed to the surface of the base material in a state that a vapor concentration of the solvent in the coating chamber is below a burning lower limit, and dusts are removed from the base material. Then, the solution is coated on the surface of the base material from which the dusts are removed. | 10-01-2009 |
20090258159 | NOVEL TREATMENT FOR MASK SURFACE CHEMICAL REDUCTION - A method includes forming an absorption material layer on a mask; applying a plasma treatment to the mask to reduce chemical contaminants after the forming of the absorption material layer; performing a chemical cleaning process of the mask; and performing a gas injection to the mask. | 10-15-2009 |
20090269506 | Method and apparatus for cleaning of a CVD reactor - The present invention provides a process and an apparatus for remote plasma cleaning of a process chamber of a chemical vapor deposition (CVD) reactor. The reactive species are generated in a remote plasma unit and are introduced into the process chamber through a plurality of inlet holes. The reactive species are free radicals such as oxygen radicals, fluorine radicals, and the like. These reactive species react with the unwanted residues in the process chamber and generate volatile products. The invention also provides a method for controlling the flow rate of the reactive species. | 10-29-2009 |
20090317562 | PROCESSING SYSTEM AND METHOD FOR PROCESSING A SUBSTRATE - A processing system for processing a substrate includes a process chamber for receiving the substrate, a patterning device installed within the process chamber, and a mechanism for transferring the substrate into the process chamber and for aligning the substrate relative to the patterning device. | 12-24-2009 |
20100021650 | METHOD OF MANUFACTURING MICRO STRUCTURE, AND METHOD OF MANUFACTURING MOLD MATERIAL - Disclosed herein are a method of producing microstructure and a method of producing mold, the methods permitting production of much smaller pores than before in an atmosphere where impurities are negligible and also permitting production of microstructures having a smaller size and a higher crystallinity than before with the help of the pores. The method of producing microstructure comprises a step of making pores ( | 01-28-2010 |
20100098875 | PRE-COATING AND WAFER-LESS AUTO-CLEANING SYSTEM AND METHOD - In a wafer processing system having an electrode, an electrostatic chuck (ESC) and a confinement chamber portion, the ESC is established to be RF-floating, whereas a confinement chamber portion is grounded during a pre-coating process. Accordingly, the confinement chamber portion and the upper electrode are selectively targeted for pre-coating material deposition. As such, the amount of pre-coating material that is deposited onto the ESC is greatly reduced over that of conventional systems. Therefore, less time, energy and material are needed to remove pre-coating material from the ESC during a wafer auto clean (WAC) process. Further, the upper electrode is established to be RF-floating, whereas the confinement chamber portion is grounded during a WAC process. As such, the cleaning material is selectively targeted toward the confinement hardware portion of the chamber. Therefore, the upper electrode is subjected to less wear during a WAC process. | 04-22-2010 |
20100129564 | Method for deposition of electrochemically active thin films and layered coatings - The present invention involves a method for deposition of thin film and electrochemically active layered coatings for use as components including electrodes and solid electrolytes for electrochemical generation and storage devices including batteries, supercapacitors, fuel cell, solar cell and the like. According to the present invention, evaporation of the starting materials in a reactive gaseous medium is accomplished by means of a gas discharge electron gun with a cold cathode. The electron beam has a given specific power corresponding to the evaporation temperature of the starting material. Deposition of the evaporated starting material onto the substrate in a pressure controlled reactive gaseous medium is carried out at a controlled temperature and rate of condensate formation. This temperature is dependant on the partial pressure of the reactive gas. High condensation rates can be achieved, and the resulting condensed coating materials can have high density, making them ideal for use as electrodes in electrochemical generation and storage devices. | 05-27-2010 |
20100136254 | COATING SYSTEM AND METHOD FOR VIBRATIONAL DAMPING OF GAS TURBINE ENGINE AIRFOILS - A coating system and coating method for damping vibration in an airfoil of a rotating component of a turbomachine. The coating system includes a metallic coating on a surface of the airfoil, and a ceramic coating overlying the metallic coating. The metallic coating contains metallic particles dispersed in a matrix having a metallic and/or intermetallic composition. The metallic particles are more ductile than the matrix, and have a composition containing silver and optionally tin. The method involves ion plasma cleaning the surface of the airfoil before depositing the metallic coating and then the ceramic coating. | 06-03-2010 |
20100136255 | ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS - Charged particle sources, systems and methods are disclosed. | 06-03-2010 |
20100215866 | Method for coating an electrode on a wafer - There is disclosed a method for coating an electrode on a wafer. Firstly, there is provided a wafer. Secondly, a metal area is defined in an upper surface of the wafer. Thirdly, the metal area is roughened via etching. Finally, an electrode is coated on the metal area via deposition. | 08-26-2010 |
20100279027 | System And Method For Applying Abrasion-Resistant Coatings - A method for applying an abrasion-resistant coating to a substrate including the steps of generating an atmospheric plasma, introducing a precursor to the atmospheric plasma, the precursor being selected to form the abrasion-resistant coating, and positioning the substrate relative to the atmospheric plasma such that the atmospheric plasma deposits the abrasion-resistant coating onto the substrate. | 11-04-2010 |
20110052833 | GAS DISTRIBUTION SHOWERHEAD AND METHOD OF CLEANING - During a deposition process, material may deposit not only on the substrate, but also on other chamber components. In a MOCVD chamber, one of those components is the gas distribution showerhead. The showerhead may be cleaned by bombarding the showerhead with radicals generated by a plasma that includes an inert gas and chlorine. In order to generate the plasma, the showerhead may be negatively biased or floating relative to the substrate support. The showerhead may comprise stainless steel and be coated with a ceramic coating. | 03-03-2011 |
20110117289 | Deposition Apparatus and Deposition Method - [Object] To provide a deposition apparatus and a deposition method that are capable of reducing an evacuation time in an evacuation system having a large condensing load to improve productivity. | 05-19-2011 |
20110143049 | LUBRICANT REMOVAL TO REUSE DISKS FOR CONDITIONING DEPOSITION TOOLS - A disk that is identified as defective in a manufacturing process is reused for conditioning a deposition tool that deposits a magnetic material onto disks. After the disk has been identified as defective, a surface of the disk is cleaned in a cleaning tool to remove a lubricant material using a dry etch process. The cleaned disk is moved from the cleaning tool into the deposition tool. The deposition tool is conditioned by depositing the magnetic material onto the cleaned surface of the disk. Because the disk has been cleaned, reusing the defective disk to condition the deposition tool does not contaminate the deposition tool. | 06-16-2011 |
20110195199 | PROCESS AND DEVICE FOR SOLDERING IN THE VAPOR PHASE - The invention provides a coating system for coating substrates in a cyclic mode. The process stations of the coating system are disposed in a circular fashion. A handling mechanism is provided for transferring the substrates between the process stations. The process stations comprise a lock for loading and unloading the substrates, at least two coating chambers, each of which comprises a plasma source for stationary coating of the substrate, and preferably a heating station. | 08-11-2011 |
20110195200 | METHOD AND DEVICE FOR DESCALING A METAL STRIP - A method and a device for descaling a metal strip, in which the metal strip is guided in a direction of conveyance through at least one plasma descaling unit in which it is subjected to a plasma descaling. The metal strip is subjected to an automatically controlled cooling process in a cooling unit following the plasma descaling in the one or more plasma descaling units in such a way that it has a well-defined temperature downstream of the cooling unit. | 08-11-2011 |
20110256323 | INHIBITING EXCESS PRECURSOR TRANSPORT BETWEEN SEPARATE PRECURSOR ZONES IN AN ATOMIC LAYER DEPOSITION SYSTEM - Systems and methods for ALD thin film deposition include a mechanism for removing excess non-chemisorbed precursors from the surface of a substrate in a translation-based process involving multiple separate precursor zones. Excess precursor removal mechanisms according to the present disclosure may introduce localized high temperature conditions, high energy conditions, or azeotropes of the excess precursor, to liberate the excess precursor before it reaches a separate precursor zone, thereby inhibiting CVD deposition from occurring without causing heat-induced degradation of the substrate. | 10-20-2011 |
20110305846 | APPARATUS AND METHOD FOR SURFACE PROCESSING - The present disclosure provides a surface processing apparatus, comprising a reaction chamber provided to form a deposition layer on a substrate, a carrying chamber connected to the reaction chamber and comprising a slot, and a plasma generator installed in the slot and providing plasma to process the substrate surface. Whereby the disclosure further provides a surface processing method, which flatten surface of a deposition layer on the substrate when the substrate is carried form the reaction chamber to the carrying chamber after the deposition process in the reaction chamber. | 12-15-2011 |
20120009354 | Method for treating surface of glass substrate and apparatus for performing same - A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well. | 01-12-2012 |
20120100301 | Nucleation of Ultrathin, Continuous, Conformal Metal Films Using Atomic Layer Deposition And Application As Fuel Cell Catalysts - A method to achieve a conformal ultrathin film of platinum or one of its alloys on a substrate that can be economically used as a heterogeneous catalyst, such as automotive polymer electrolyte membrane (PEM) fuel cell catalyst. The method includes using a hydrogen plasma in platinum atomic layer deposition along with tungsten as a substrate or anchoring adhesive layer to assist platinum nucleation and deposition. | 04-26-2012 |
20120100302 | METHOD FOR PRODUCING POLYCRYSTALLINE SILICON RODS - The invention relates to a method for producing polycrystalline silicon rods by deposition of silicon on at least one thin rod in a reactor, wherein, before the silicon deposition, hydrogen halide at a temperature of 400-1000° C. is introduced into the reactor containing at least one thin rod and is irradiated by means of UV light, as a result of which halogen and hydrogen radicals arise and the volatile halides that form are removed from the reactor. | 04-26-2012 |
20120107520 | Removing Residues from Substrate Processing Components - Residues are removed from a surface of a substrate processing component which has a polymer coating below the residues. In one version, the component surfaces are contacted with an organic solvent to remove the residues without damaging or removing the polymer coating. The residues can be process residues or adhesive residues. The cleaning process can be conducted as part of a refurbishment process. In another version, the residues are ablated by scanning a laser across the component surface. In yet another version, the residues are vaporized by scanning a plasma cutter across the surface of the component. | 05-03-2012 |
20120135159 | SYSTEM AND METHOD FOR IMPRINT-GUIDED BLOCK COPOLYMER NANO-PATTERNING - This disclosure describes a method for nano-patterning by incorporating one or more block copolymers and one or more nano-imprinting steps in the fabrication process. The block copolymers may be comprised of organic or organic components, and may be lamellar, spherical or cylindrical. As a result, a patterned medium may be formed having one-dimensional or two-dimensional patterns with a feature pitch of 5-100 nm and/or a bit density of at least 1 Tdpsi. | 05-31-2012 |
20120156390 | MULTI-ANGLE HARD BIAS DEPOSITION FOR OPTIMAL HARD-BIAS DEPOSITION IN A MAGNETIC SENSOR - A method for manufacturing a magnetic sensor that result in improved magnetic bias field to the sensor, improved shield to hard bias spacing and a flatter top shield profile. The method includes a multi-angled deposition of the hard bias structure. After forming the sensor stack a first hard bias layer is deposited at an angle of about 70 degrees relative to horizontal. This is a conformal deposition. Then, a second deposition is performed at an angle of about 90 degrees relative to horizontal. This is a notching deposition, that results in notches being formed adjacent to the sensor stack. Then, a hard bias capping layer is deposited at an angle of about 55 degrees relative to horizontal. This is a leveling deposition that further flattens the surface on which the top shield can be electroplated. | 06-21-2012 |
20120164344 | Activation of Electrode Surfaces by Means of Vacuum Deposition Techniques in a Continuous Process - The invention relates to a method of manufacturing of metal electrodes for electrolytic applications by means of a continuous deposition of a layer of noble metals upon metal substrates by a physical vapour deposition technique. | 06-28-2012 |
20120237693 | IN-SITU CLEAN PROCESS FOR METAL DEPOSITION CHAMBERS - Embodiments of the invention include methods for in-situ chamber dry clean for metal deposition chambers. In one embodiment, a method for in-situ chamber dry clean after a metal deposition process includes placing a substrate in a processing chamber, performing a metal deposition process on the substrate in the processing chamber, removing the substrate from the support pedestal, and performing an in-situ cleaning process by supplying a cleaning gas containing H | 09-20-2012 |
20120269985 | ATMOSPHERIC FILM-COATING METHOD - An atmospheric film-coating method is described, which includes the following steps. A substrate is provided. A gasification step is performed on a film coating solution to form a plurality of film coating vapor molecules. The film coating vapor molecules are deposited on a surface of the substrate to form the film. | 10-25-2012 |
20120276301 | ADHESION IMPROVEMENT OF DIELECTRIC BARRIER TO COPPER BY THE ADDITION OF THIN INTERFACE LAYER - Embodiments described herein provide a method of processing a substrate. The method includes depositing an interface adhesion layer between a conductive material and a dielectric material such that the interface adhesion layer provides increased adhesion between the conductive material and the dielectric material. In one embodiment a method for processing a substrate is provided. The method comprises depositing an interface adhesion layer on a substrate comprising a conductive material, exposing the interface adhesion layer to a nitrogen containing plasma, and depositing a dielectric layer on the interface adhesion layer after exposing the interface adhesion layer to the nitrogen containing plasma. | 11-01-2012 |
20130149461 | ELECTROLESS COPPER DEPOSITION - A method for providing electroless plating is provided. An amorphous carbon barrier layer is formed over the low-k dielectric layer by providing a flow a deposition gas, comprising a hydrocarbon, H | 06-13-2013 |
20130177714 | METHOD FOR MANUFACTURING PRINTED WIRING BOARD - A method for manufacturing a printed wiring board includes forming an interlayer insulation layer on a conductive circuit, applying laser to a portion of the interlayer insulation layer such that an opening reaching to the conductive circuit is formed for a via conductor, subjecting the opening to a plasma treatment using a processing gas which includes a reactive gas including a fluorovinyl ether gas having a double bond of two carbon atoms and a fluoroalkyl ether group, forming an upper conductive circuit on the interlayer insulation layer, and forming a via conductor in the opening such that the via conductor connects the conductive circuit and the upper conductive circuit. | 07-11-2013 |
20130202811 | SURFACE TREATMENT METHOD FOR COATING LAYER - Disclosed is a surface treatment method for producing a coating layer, which improves surface properties (e.g., low friction wear-resistance) of the coating layer at high temperature. The surface treatment method controls a process pressure during the formation of a coating layer to form a fine surface morphology with increased silver (Ag) content. The surface treatment method includes: heating a coated material in a chamber; removing foreign substances from the surface of the heated, coated material; forming a buffer layer on the surface of the coated material; and forming a coating layer on the buffer layer, wherein the process pressure is controlled during the formation of the coating layer to improve the surface properties at high temperatures. | 08-08-2013 |
20130209700 | TEM SAMPLE PREPARATION METHOD - A TEM sample preparation method including: placing a thin sample on a sample holder so that a first side surface of the thin sample which is closer to a desired observation target is opposed to a focused ion beam column; setting a processing region, which is to be subjected to etching processing by a focused ion beam so as to form a thin film portion including the observation target and having a thickness direction substantially parallel to a thickness direction of the thin sample, to a region of the first side surface that is adjacent to the thin film portion; and performing the etching processing to a portion of the thin sample extending from the first side surface thereof to a front surface thereof by irradiating the processing region with the focused ion beam from the focused ion beam column. | 08-15-2013 |
20130209701 | METHOD OF PREPARING SAMPLE FOR TEM OBSERVATION - Provided is a method of preparing a sample for TEM observation, including: supplying deposition gas to a cross-section of a lamellar portion having exposed recesses and irradiating a deposition film forming region of the cross-section including the recesses with an electron beam, thereby forming a deposition film; irradiating the deposition film with an ion beam, thereby removing a deposition film formed on the cross-section; and irradiating the lamellar portion with the ion beam, thereby thinning the lamellar portion. | 08-15-2013 |
20130243967 | FTO THIN FILM PREPARATION USING MAGNETRON SPUTTERING DEPOSITION WITH PURE TIN TARGET - A fluorine-doped tin oxide (FTO) film preparation method includes the step of using a high purity tin ingot in a magnetron sputtering deposition as a target material, the step of applying argon (Ar) as a working gas to generate plasma for removing impurities from the tin target in increasing the purity of the tin target, and the step of applying reactive gases containing F atoms (CF | 09-19-2013 |
20130330481 | Thin Films With High Near-Infrared Reflectivity Deposited on Building Materials - Disclosed are solar-reflective roofing and other building materials having high reflectance of near-infrared radiation and high transmission of radiation in the visible light range and a substantial emissivity so as to reduce the heat island effects experienced by the articles while also maintaining an aesthetically pleasing appearance. Also disclosed are related methods for fabrication of such materials. | 12-12-2013 |
20140044885 | METHOD AND SYSTEM FOR GRAPHENE FORMATION - A method for forming graphene includes providing a substrate and subjecting the substrate to a reduced pressure environment. The method also includes providing a carrier gas and a carbon source and exposing at least a portion of the substrate to the carrier gas and the carbon source. The method further includes performing a surface treatment process on the at least a portion of the substrate and converting a portion of the carbon source to graphene disposed on the at least a portion of the substrate. | 02-13-2014 |
20140050859 | METHOD FOR MAKING A BEARING HAVING A SELF-LUBRICATING SURFACE COATING - Methods for making a bearing are disclosed, wherein the bearing includes a substratum and a self-lubricating surface coating composition. The self-lubricating surface coating composition further includes at least one cured thermosetting acrylate and at least one phenolic resin. Methods includes the step of disposing the self-lubricating surface coating composition onto the substratum. | 02-20-2014 |
20140186544 | METAL PROCESSING USING HIGH DENSITY PLASMA - Methods of forming dielectric layers using high-density plasma chemical vapor deposition are described. Dielectric layers are formed over metal films. The metal film is present on a substrate prior to entering the high-density plasma processing chamber. The metal film is processed to remove oxidation and optionally to improve adhesion of the dielectric layer on the metal film. | 07-03-2014 |
20140242294 | METHOD OF MANUFACTURING A RESISTIVE TOUCH SENSOR CIRCUIT BY FLEXOGRAPHIC PRINTING - Method of manufacturing a resistive touch sensor circuit using a roll to roll process to print microscopic patterns on a single side of at least one flexible dielectric substrate using a plurality of flexo-masters to print the microscopic patterns which are then plated to form conductive microscopic patterns. | 08-28-2014 |
20140272184 | METHODS FOR MAINTAINING CLEAN ETCH RATE AND REDUCING PARTICULATE CONTAMINATION WITH PECVD OF AMORPHOUS SILICON FILIMS - Methods for maintaining clean etch rate and reducing particulate contamination with PECVD of amorphous silicon films are provided. The method comprises cleaning a processing chamber with a plasma comprising a cleaning gas, exposing at least a portion of the interior surfaces and components of the processing chamber to an oxidation gas and a nitration gas in the presence of a plasma and depositing a bi-layer seasoning layer on the interior surfaces and components of the processing chamber. | 09-18-2014 |
20150017344 | THIN FILM FORMATION - A method of forming a graphene film ( | 01-15-2015 |
20150104584 | METHOD OF INCREASING STRENGTH OF A PANEL EDGE - A method of increasing strength of a panel edge includes providing a panel having a lateral surface treated by plasma. An elastic material is provided, photoinitiator is added therein, and the elastic material is then liquefied by heating. Subsequently, the liquefied elastic material is sprayed on the lateral surface, and is then cured to result in a protective layer bonded on the lateral surface. | 04-16-2015 |
20150125620 | BIPOLAR PLATE FOR A FUEL CELL AND METHOD OF MANUFACTURING THE SAME - The present invention relates to a separator plate for a fuel cell and to a method for producing the same, and relates to an invention wherein a surface-modification layer is formed through the use of low temperature plasma processing such that it is possible to prevent the hydrophobic characteristics which occur during gasket forming and to have outstanding hydrophilic characteristics, and such that it is possible to obtain the advantageous effect of highly outstanding corrosion resistance and electrical conductivity not only initially but also even after long-term use in a fuel-cell operating environment, and also such that it is possible to maintain outstanding durability even when using a normal low-price stainless-steel sheet base material, and it is possible to reduce the unit cost of production of the separator plate for the fuel cell since surface processing can be carried out at low cost. | 05-07-2015 |
20150140231 | METHOD AND APPARATUS FOR DEPOSITION OF THIN FILM MATERIALS FOR ENERGY STORAGE DEVICES - The present invention is a method and apparatus for applying coatings in a rarefied gaseous medium. A cold cathode electron gun is used to generate an electron beam, which is directed to a crucible containing initial solid materials in a vacuum chamber, thus generating an initial solid material vapor. Nitrogen reaction gas is bled into the vacuum chamber, and ionization of the nitrogen gas in high frequency discharge. Subsequent interaction of initial material vapor with nitrogen ions and atoms results in generation of solid product heating of the substrate. Condensation of the vapor on the surface of substrate generates a thin film of solid electrode or electrolyte. The resulting rate of deposition of thin film of vitreous solid electrolyte and LiPon solid electrolyte is substantially higher than can be achieved with a magnetron sputtering process. | 05-21-2015 |
20150140232 | Ultrahigh Vacuum Process For The Deposition Of Nanotubes And Nanowires - A system and method A method of growing an elongate nanoelement from a growth surface includes: | 05-21-2015 |
20150315707 | REMOTE PLASMA SOURCE BASED CYCLIC CVD PROCESS FOR NANOCRYSTALLINE DIAMOND DEPOSITION - Methods for making a nanocrystalline diamond layer are disclosed herein. A method of forming a layer can include activating a deposition gas comprising an alkane and a hydrogen containing gas at a first pressure, delivering the activated deposition gas to the substrate at a second pressure which is less than the first pressure, forming a nanocrystalline diamond layer, treating the layer with an activated hydrogen containing gas to remove one or more polymers from the surface and repeating the cycle to achieve a desired thickness. | 11-05-2015 |
20150360247 | MACHINE FOR COATING AN OPTICAL ARTICLE WITH A PREDETERMINED COATING COMPOSITION AND METHOD FOR USING THE MACHINE - The machine for coating an optical article with a predetermined coating composition, includes a vacuum chamber ( | 12-17-2015 |
20160040280 | Wear Resistant Vapor Deposited Coating, Method of Coating Deposition and Applications Therefor - A low friction top coat over a multilayer metal/ceramic bondcoat provides a conductive substrate, such as a rotary tool, with wear resistance and corrosion resistance. The top coat further provides low friction and anti-stickiness as well as high compressive stress. The high compressive stress provided by the top coat protects against degradation of the tool due to abrasion and torsional and cyclic fatigue. Substrate temperature is strictly controlled during the coating process to preserve the bulk properties of the substrate and the coating. The described coating process is particularly useful when applied to shape memory alloys. | 02-11-2016 |
20160068957 | CORROSION RESISTANT METAL AND METAL ALLOY COATINGS CONTAINING SUPERSATURATED CONCENTRATIONS OF CORROSION INHIBITING ELEMENTS AND METHODS AND SYSTEMS FOR MAKING THE SAME - A method and apparatus for producing a corrosion inhibiting coating for metal and metal alloy substrates. The coating is comprised of a metal or metal alloy that is similar in composition to the substrate to be coated, further combined with a corrosion inhibiting material. The corrosion inhibiting material may be a refractory metal or metalloid. The method and apparatus for producing the coating allows for the corrosion inhibiting coating to have a supersaturated concentration of the corrosion inhibiting material alloyed with another metal or metal alloy. The method and apparatus allow for the selective vaporization of material sources to make the coating vapor, which are then entrained in a high speed gas flow that directs the coating vapor onto the substrate. Optional plasma assistance and application of a voltage to the substrate may be used. The coating may be customized for a variety of applications. | 03-10-2016 |
20160082474 | STRUCTURAL POLYMER INSERT AND METHOD OF MAKING THE SAME - A structural polymer insert. The insert includes a substrate having a surface and an adhesive with the substrate being an admixture of a polypropylene component and a glass fiber component. The surface has a plurality of oxygen atoms, optionally introduced by air plasma, in an amount of 1 to 60 atomic percent of all the atoms present on the surface. The foam adhesive is attached to the surface through one or more reactive moieties resulted from oxidative action of the oxygen atoms. | 03-24-2016 |
20160376710 | METHOD AND APPARATUS TO ABATE PYROPHORIC BYPRODUCTS FROM ION IMPLANT PROCESS - Embodiments disclosed herein generally relate to plasma abatement processes and apparatuses. A plasma abatement process takes effluent from a foreline of a processing chamber, such as an implant chamber, and reacts the effluent with a reagent. The effluent contains a pyrophoric byproduct. A plasma generator placed within the foreline path may ionize the effluent and the reagent to facilitate a reaction between the effluent and the reagent. The ionized species react to form compounds which remain in a gaseous phase at conditions within the exhaust stream path. In another embodiment, the ionized species may react to form compounds which condense out of the gaseous phase. The condensed particulate matter is then removed from the effluent by a trap. The apparatuses may include an implant chamber, a plasma generator, one or more pumps, and a scrubber. | 12-29-2016 |