Class / Patent application number | Description | Number of patent applications / Date published |
427492000 | Multiple applications of identical radiation energy source to polymerize (e.g., pulse, flash, lamp, etc.) | 9 |
20080233305 | Method for manufacturing coating film - A method for manufacturing a coating film having a coating layer on a transparent base material. The method includes a step of forming a coated film by coating a coating liquid having a material for forming a coating layer that is curable by ultraviolet radiation on the transparent base material, and a step of irradiating the coated film composed by the coating liquid and formed on the transparent base material with pulsed ultraviolet radiation to form the coating layer. | 09-25-2008 |
20080286482 | Forming or patterning composite microstructures using microfluidics - Techniques comprising systems and methods for forming or pattering microstructures using microfluidics are described. A target structure can include a microchannel passage with a chamber into which a light hardenable material can be injected and selectively exposed to light to adhere to a desired location of a substrate. Unhardened material can be washed out of the chamber. One or more subsequent cycles can repeat the process using the same or a different material. A variety of composite microstructures can be created, including structures encapsulating viable living cells, such as for cell study or tissue engineering. | 11-20-2008 |
20090176031 | CONTAINER COATING SYSTEM AND PROCESS - A coating system ( | 07-09-2009 |
20100227075 | GLOSS CONTROL OF UV CURABLE FORMULATIONS THROUGH MICRO-PATTERNING - Methods of controlling gloss of an image are disclosed. The methods may include forming an image over a substrate by applying an ink composition and optionally an overcoat composition at least partially over the substrate. The ink composition or overcoat composition may include at least one gellant, at least one curable monomer, optionally at least one curable wax and optionally at least one photoinitiator. The ink composition or overcoat composition may be curable upon exposure to radiation. The methods may further include providing a micro-roughness to one or more portions of the ink composition or overcoat composition by non-uniformly curing the ink composition or overcoat composition, and flood curing the ink composition or overcoat composition to complete a cure. The methods may thereby provide a controlled gloss level to the image. | 09-09-2010 |
20110229651 | RADIATION-CURABLE COATING COMPOSITIONS, COMPOSITE AND PLASTIC MATERIALS COATED WITH SAID COMPOSITIONS AND METHODS FOR THEIR PREPARATION - Curable coating composition suitable for use on composite substrates such as plastic composites, cementitious composites, ceramic composites, and engineered wood, or on plastic materials. The curable coating composition comprises a multifunctional oligomer, a monomer selected from the group consisting of monofunctional monomers, difunctional monomers and mixtures thereof, a photoinitiator, a polyester resin and a polycarboxylic acid. Also disclosed is a method of coating the substrates with the curable coating composition and a coated substrate wherein the cured coating resides on the surface of the substrate. | 09-22-2011 |
20140120268 | METHOD FOR PRODUCING PRESSURE-SENSITIVE ADHESIVE SHEET HAVING ULTRAVIOLET-RAY CURING-TYPE ACRYLIC PRESSURE-SENSITIVE ADHESIVE LAYER - Provided is a method for producing an pressure-sensitive adhesive sheet having an ultraviolet-ray curing-type acrylic pressure-sensitive adhesive layer that can undergo, about one or more monomers therefor, high rate-polymerization to be excellent in productivity, and is also excellent in balance between pressure-sensitive adhesive performances. The method includes: a first radiating substep of using, as an ultraviolet source, an LED lamp having a peak wavelength in the range of 300 nm to 450 nm to expose the adhesive composition to light from the LED lamp; and a second radiating substep of using, as an ultraviolet source, an ultraviolet lamp for emitting light having a peak wavelength in the range from 300 nm to 450 nm and further including a wavelength in the range of 100 nm or more and less than 300 nm after the first radiating step to expose the adhesive composition to the light. | 05-01-2014 |
20140349025 | CONDUCTIVE COMPOSITIONS AND METHODS RELATING THERETO - A conductive composition is disclosed, In one embodiment, the composition comprises 40 to 90 wt % of silver particles having an average particle size in the range of 10 to 450 nm and having an aspect ratio of 3 to 1:1, 2 to 20 wt % of an alkyl carbonyl macromolecule resin having a weight-average molar mass of 4,000 to 200,000 and 10 to 58 wt % of a diluent for the resin. In one embodiment, the resin is ethyl cellulose. | 11-27-2014 |
20150093515 | Method Of Manufacturing Polymer Optical Waveguides And Devices Thereof - A fully additive method for forming optical waveguides and devices, such as thermo-optic polymer switches and electro-optic polymer modulators, is disclosed. A first polymer material of refractive index N1 is coated onto a suitable substrate to form a first cladding layer. The first cladding is then selectively patterned using a mold to form an impression of the waveguide core into the first cladding layer. Next, a core layer is formed by ink-jet printing onto the imprinted first cladding layer with a core material of refractive index N2 (N2>N1). The core layer is subsequently coated by ink jet printing with a second polymer material of refractive index N3 (N304-02-2015 | |
20150099070 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT - There is provided a composition for curing a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation or both of them to form the resist underlayer film. A composition for forming a resist underlayer film used for nanoimprint in a pattern forming process using nanoimprint by performing heat-baking, light-irradiation, or both of them, the composition comprising a silicon atom-containing polymerizable compound (A), a polymerization initiator (B) and a solvent (C). The polymerizable compound (A) may contain silicon atoms in a content of 5 to 45% by mass. The polymerizable compound (A) may be a polymerizable compound having at least one cation polymerizable reactive group, a polymerizable compound having at least one radical polymerizable reactive group, or a combination of them, and the polymerization initiator (B) may be a photopolymerization initiator. | 04-09-2015 |