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Thickness or uniformity of thickness determined

Subclass of:

427 - Coating processes

427008000 - MEASURING, TESTING, OR INDICATING

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
427009000 Thickness or uniformity of thickness determined 89
20090191326THIN FILM FORMING METHOD AND COLOR FILTER MANUFACTURING METHOD - A method for forming a thin film by discharging a liquid including a material for forming the thin film, the material being dissolved or dispersed in a solvent, from a plurality of nozzles so as to dispose the liquid into a plurality of predetermined areas included in an effective area set on a substrate to form the thin film while the plurality of nozzles and the substrate are relatively scanned, includes: (a) forming a plurality of reception parts surrounded by a plurality of partitions and bottoms of the predetermined areas, the partitions being provided around the predetermined areas; and (b) forming a plurality of thin films by disposing the liquid from the nozzles into the reception parts. In step (a), a plan view area of at least one of the reception parts in a peripheral area of the effective area is made smaller than a plan view area of the reception part in a central area of the effective area.07-30-2009
20100075021METHOD, APPARATUS AND PROGRAM FOR FILLING LIQUID MATERIAL - Provided are a method, an apparatus and a computer program for filling a liquid material, which do not require complicated parameter calculation and which do not affect the moving speed of a discharge unit. In the method for filling a gap between a substrate and a work placed thereon with the liquid material discharged from the discharge unit by utilizing a capillary action, the method is characterized in forming an application pattern made up of an application region and a non-application region along an outer periphery of the work, and correcting a discharge amount of the liquid material by extending and contracting the application region and the non-application region. The apparatus and the program for carrying out the method are also provided.03-25-2010
20130078364METHOD AND APPARATUS FOR MONITORING AND CONTROLLING THE APPLICATION OF PERFORMANCE ENHANCING MATERIALS TO CREPING CYLINDERS - A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined.03-28-2013
20110014355METHOD AND SYSTEM FOR LAYERWISE PRODUCTION OF A TANGIBLE OBJECT - A method for layerwise production of a tangible object comprises repeatedly performing method cycles. Each method cycle comprises the steps of solidifying a predetermined area of an uppermost liquid layer (01-20-2011
20120114839VACUUM VAPOR DEPOSITION SYSTEM - Provided is a vacuum vapor deposition system, which enables a vapor deposition rate to be measured accurately and a film thickness to be controlled with higher accuracy. The vacuum vapor deposition system includes: a vacuum chamber; a substrate holding mechanism; a vapor depositing source; a film thickness sensor for monitoring; a control system including a temperature controller and a film thickness controller; and a film thickness sensor for calibration, in which a distance from one film thickness sensor whose measurement accuracy is to be enhanced, out of the film thickness sensor for monitoring and the film thickness sensor for calibration, to a center of the opening of the vapor depositing source, is smaller than a distance from another film thickness sensor to the center of the opening of the vapor depositing source.05-10-2012
20100086673HEATING FOR BUFFER LAYER DEPOSITION - Improved methods and apparatus for forming thin film buffer layers of chalcogenide on a substrate web through the chemical combination of a metal and chalcogen in solution form. The web and/or the solutions may be heated by one or a plurality of heating elements that may be disposed out of physical contact with the web, allowing enhanced control over the reaction speed through fine temperature control. One or more properties of the chalcogenide layer may be measured, and the temperature of the system may be adjusted in response.04-08-2010
20120237667PRINTED LAYER FORMATION PROCESSING DEVICE AND PRINTED LAYER FORMATION PROCESSING METHOD - A printed layer formation processing device performs a part of a process for forming a printed layer on a part of the print medium by a first colorant in a molded object formation process. The printed layer formation processing device includes: a formation amount correspondence relationship storage part that stores a formation amount correspondence relationship, which is a correspondence relationship between a degree of deformation of the print medium and a formation amount of the first colorant, which are correlated so that the thickness of the printed layer is substantially the same in respective regions of the molded object, a deformation degree acquisition part that acquires the degree of deformation in the respective regions of the print medium; and a formation amount determining part that determines the formation amount of the first colorant in the respective regions based on the degree of the deformation and the formation amount correspondence relationship.09-20-2012
20120288616MEASUREMENT METHOD AND DEVICE FOR MEASURING LAYER THICKNESSES AS WELL AS PRODUCTION METHOD AND COATING SYSTEM - A method for measuring the thickness of a coating on a component section of a rotating component, wherein a heat expansion of the component section is determined by detecting a component core temperature and an actual coating thickness is produced, a device for conducting a method of this type having a temperature detecting system and having an evaluating device, as well as a production process and a coating system, are disclosed.11-15-2012
20120288615APPARATUS AND METHOD FOR TREATING SUBSTRATE - Provided are an apparatus and method for depositing a thin film on a substrate. The substrate is supported by a substrate holder. The substrate holder is seated on each of a plurality of holder seating grooves defined in a top surface of the susceptor. An injection hole for injecting a gas is defined in a top surface of each of the holder seating grooves. When a process is performed, the susceptor is rotated with respect to a central axis thereof, and the substrate holder is rotated with respect to a central axis of the substrate holder by the gas injected from the injection hole. A flow rate of the gas supplied onto an under surface of the substrate holder is adjusted according to a state of the substrate.11-15-2012
20090004364Method For Protecting New/Used Engine Parts - New and used parts of gas and steam turbine engines are protected by imparting a controlled residual compressive stress to given portions of the part and then coated by a CVD or PVD process at low temperatures with layers of TiN or alloys thereof at alternate selective hard and less hardened levels. The protective treatment is particularly efficacious for airfoils of compressor blades/vanes of gas turbine engines and airfoils of airfoils and certain components of steam turbine engines. This method is targeted to reduce erosion, corrosion and stress-corrosion cracking in these parts.01-01-2009
20110143018Methods and systems for making battery electrodes and devices arising therefrom - The invention provides, in preferred embodiments, methods, systems, and devices arising therefrom for making battery electrodes, in particular, for lithium-ion batteries. Unlike conventional slurry coating methods that use mechanical means to coat thick pastes of active material, other materials, and solvent(s) onto a substrate, the invention provides for a method to produce electrode coatings onto support in a multi-layer approach to provide highly uniform distribution of materials within the electrode. Problems of differential sedimentation of particles in slurries found in conventional methods are minimized with the methods of the present invention. Also included are systems for producing in large-scale the battery electrodes of the invention. Further included are electrodes produced by the methods and systems described herein.06-16-2011
20110189379METHOD FOR THE THERMOGRAPHIC INSPECTION OF NONMETALLIC MATERIALS, PARTICULARLY COATED NONMETALLIC MATERIALS, AS WELL AS METHOD FOR THE PRODUCTION THEREOF AND AN OBJECT PRODUCED ACCORDING TO THE METHOD - A method for the thermographic inspection of nonmetallic materials, particularly coated nonmetallic materials, is provided. The method includes heating at least one part of the surface of the nonmetallic material, preferably a part of the surface furnished with a nonmetallic coating, by a short energy pulse, preferably a light pulse, or by periodic input of heat, and recording the temporal and spatial temperature profile at least at a plurality of successive time points.08-04-2011
20100112190COMPOSITE LAMINATE THICKNESS COMPENSATION - A method is provided for the non-contact measurement of variations in thickness of composite materials and structures prepared from composite parts. Metrologic methods are employed to provide a 3D image of the structure or part. Variations that are greater than an acceptable amount can be corrected by adding a compensation layer to the surface of the structure or part.05-06-2010
20100086672METHOD AND APPARATUS FOR MONITORING AND CONTROLLING THE APPLICATION OF PERFORMANCE ENHANCING MATERIALS TO CREPING CYLINDERS - A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined.04-08-2010
20100080889METHOD AND EQUIPMENT FOR THE CONTINUOUS DEPOSITION OF A COATING ON A STRIP TYPE SUBSTRATE - In the continuous deposition of a coating on strip-type substrate, a thickness of the coating depends on the condition of various actuators. A first preliminary phase of the process includes developing a pre-setting model, a second preliminary phase includes developing an adjustment model, an intermediate pre-setting step during which the actuators are set statically, a step of measuring the thickness of the coating, and an adjustment step during which the actuators are dynamically controlled by a predictive control based on the adjustment model in order to reduce any potential difference between the coating measured thickness and a target value of the thickness.04-01-2010
20090092742Method for intermittently applying thin-film coatings - A method for intermittently applying thin-film coatings is realized, by which a coating of extremely thin film reduced to 20 μm or less in thickness is deposited intermittently with high productivity and at the same time, the trailing coating edge of the thin film is formed in a highly accurate shape having good linearity. This is achieved as follows. A band-shaped substrate (04-09-2009
20090104343SYSTEMS AND METHODS FOR APPLYING A LIQUID COATING MATERIAL TO A SUBSTRATE - Systems and methods for applying liquid coating materials to a substrate, such as an electronic component or circuit board. A control system (04-23-2009
20080305244MONITORING A COATING APPLIED TO A METAL SURFACE - A method of monitoring a coating applied to a metal surface is disclosed. Specifically, the method comprises the following: applying a sol composition to a metal surface, wherein said composition contains one or more alkoxysilyl group containing compounds, a fluorophore, and a solvent; forming a gelled coating on said surface from said composition; measuring the fluorescence of said coating with a fluorometer, wherein said fluorometer is capable of measuring reflective fluorescence emission measurements; correlating the fluorescence of said coating with the thickness or weight of said coating, and/or with the concentration of alkoxysilyl group containing compound in the coating composition; and optionally applying an additional coating to said metal surface when the thickness of the coating is less than a desired amount or adjusting the concentration of the alkoxysilyl group containing compound applied to said surface.12-11-2008
20120295014INJECTOR FOR A VACUUM VAPOUR DEPOSITION SYSTEM - An injector for a vacuum vapour deposition system, includes an injection duct suitable for receiving vaporized materials from a vacuum evaporation source and a diffuser having a plurality of nozzles for diffusing the vaporized materials into a vacuum deposition chamber, each nozzle including a channel suitable for connecting the injection duct to the deposition chamber. The diffuser has a spatially varying nozzle distribution. A process for calibrating an injector and a process for manufacturing a diffuser for an injector are also described.11-22-2012
20090181162METHOD AND APPARATUS FOR THIN FILM/LAYER FABRICATION AND DEPOSITION - A method and apparatus for controlling the thickness of a thin film or thin layer of discrete particles or of a heterogeneous mixture characterized in that the interfacial tension forces between the solution or suspension and its environment are used as the driving forces to evenly spread the solution, suspension or mixture while the solvent evaporates and/or dilutes.07-16-2009
20090117259Processing system, processing method, and computer program - The present invention provides a processing system, a processing method and a program, which can readily control a gas flow rate. A vertical-type heating apparatus 05-07-2009
20090047417METHOD AND SYSTEM FOR VAPOR PHASE APPLICATION OF LUBRICANT IN DISK MEDIA MANUFACTURING PROCESS - Lubricant coatings are applied as vapor to magnetic disks. The method and apparatus include applying vaporizing heat to a pre-determined amount of liquid to form a vapor. Precision delivery of lubricant vapor allows close-loop lube thickness control. The flow of the liquid to the heater is controlled such that only a pre-determined amount from the reservoir flows to the heater at a time, the pre-determined amount is vaporized. According to an aspect, the pre-determined amount of liquid is transferred from the reservoir for the application of vaporizing heat; isolating the reservoir from the vacuum of the vacuum chamber. The method enables multiple types of lubricants to be applied to the disk. Another heater is included for applying vaporizing heat to a second liquid to form a second vapor to supply to the disk. According to an aspect, pulsed lubricant vapor delivery is provided, conserving lubricant and minimizing thermal decomposition.02-19-2009
20100239743DROPLET DISCHARGE DEVICE, METHOD FOR DISCHARGING DROPLETS, AND METHOD FOR MANUFACTURING COLOR FILTER - A droplet discharge device includes a droplet discharge head, a feed reel, a drying chamber, a drying-gas-introducing device, a take-up reel, an imaging device, an analyzing unit and a control unit. The imaging device captures an image of functional liquid discharged from nozzles of the droplet discharge head onto a sheet member between the feed reel and the take-up reel with the sheet member having been dried in the drying chamber filled with a drying gas to achieve a predetermined humidity. The analyzing unit measures an area over which the functional liquid is deposited on the sheet member from each of the nozzles, and calculates a distribution of a discharge amount of the functional liquid. The control unit adjusts a voltage applied to the drive elements so that the discharge amount of the functional liquid from each of the nozzles approximates a predetermined optimum amount.09-23-2010
20080286444In Situ Substrate Holder Leveling Method and Apparatus - Embodiments of the present invention are directed to adjusting the spacing between the substrate support and the faceplate of the gas distribution member to achieve improved uniformity of the layer formed on the substrate. One embodiment of the present invention is directed to a method of adjusting a spacing between a gas distribution member and a substrate support disposed generally opposite from the gas distribution member, wherein the substrate support is configured to support a substrate on which to form a layer with improved thickness uniformity. The method comprises forming a layer on the substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations. The spacing adjustment amount is positive to increase the spacing between the substrate support at the location and the gas distribution member if the thickness is greater at the location than at the reference location. The spacing adjustment amount is negative to decrease the spacing between the substrate support at the location if the thickness is smaller at the location than at the reference location.11-20-2008
20090232967THERMAL PROCESSING APPARATUS, METHOD FOR REGULATING TEMPERATURE OF THERMAL PROCESSING APPARATUS, AND PROGRAM - There are provided a thermal processing apparatus, a method for regulating a temperature of a thermal processing apparatus, and a program, by which a temperature can be easily regulated. A control part 09-17-2009
20110244115Extrusion Application System - A machine and a method of applying a non-Newtonian liquid composition onto a surface in a controlled manner. The composition is held in a chamber at a controlled variable pressure and is dispensed through a slit die nozzle as controlled by a valve. Characteristics of the composition are empirically developed and provided to a logic control circuit to assure that the composition is dispensed on either the entire surface or in one or more precise locations.10-06-2011
20090291199Apparatus and methods of control for coolant recycling - A system and method for cooling and coating optical fiber includes the capability to control the amount of coolant gas that is fed to and recycled through a heat exchanger for cooling the optical fiber. The capability to control the amount of fed and recycled coolant gas includes measuring at least one parameter selected from the thermal conductivity of the coolant gas, the viscosity of the coolant gas, the diameter of the primary coating on the optical fiber, and the power usage of a coating applicator for applying primary coating on the optical fiber.11-26-2009
20120201954METHOD OF DETERMINING MULTILAYER THIN FILM DEPOSITION ON A PIEZOELECTRIC CRYSTAL - A method for accurately calculating the thickness of deposited thin film layers onto a piezoelectric crystal blank in which dissimilar materials can be utilized, enabling determinations for various applications employing exotic materials. Additionally, the specific acoustic impedance (or equivalent z-ratio) of an unknown deposited material can be determined. The exact analytical solution nearly eliminates thickness errors when several layers of different materials are sequentially deposited on the same monitor quartz crystal.08-09-2012
20090136655Film Thickness Sensor Having a Porous Blower - The invention describes a sensor system (05-28-2009
20110027458CONTINUOUS ANALYTE SENSORS AND METHODS OF MAKING SAME - Described here are embodiments of processes and systems for the continuous manufacturing of implantable continuous analyte sensors. In some embodiments, a method is provided for sequentially advancing an elongated conductive body through a plurality of stations, each configured to treat the elongated conductive body. In some of these embodiments, one or more of the stations is configured to coat the elongated conductive body using a meniscus coating process, whereby a solution formed of a polymer and a solvent is prepared, the solution is continuously circulated to provide a meniscus on a top portion of a vessel holding the solution, and the elongated conductive body is advanced through the meniscus. The method may also comprise the step of removing excess coating material from the elongated conductive body by advancing the elongated conductive body through a die orifice. For example, a provided elongated conductive body 02-03-2011
20110189378Apparatus and method for coating a functional layer - An apparatus and method for coating a functional layer on a current collector with an active material layer thereon, the apparatus including a first roll and a second roll, the first roll and second roll being for advancing the current collector; a gravure roll, the gravure roll being configured to coat the functional layer on the active material layer; a thickness measurer, the thickness measurer being configured to measure at least one of a thickness of the active material layer and a sum thickness of the active material layer and the functional layer; and a controller, the controller being in communication with the thickness measurer and being configured to control a rotation speed of the gravure roll.08-04-2011
20110135807MULTI-LAYER, SUBSTANTIALLY POLYVINYL CHLORIDE- AND POLYOLEFIN-FREE COMPOSITE FILM - The invention relates to a multilayer composite film which is substantially free from polyvinyl chloride and polyolefins. In particular, the layers of the film may include an ABS material, a polystyrene material, and/or a polyester material. The material composition and thickness of composite film are such that the maximum tensile force generated when a test body including the composite film is subjected to a specified single-axis tensile testing procedure ranges between 30 Newtons and 280 Newtons.06-09-2011
20120148727Coating Apparatus and Method for Coating Using the Same - A coating apparatus to apply a coating solution onto a base material, including a first body portion, a second body portion spaced-apart by a gap from the first body portion, a coating solution inlet arranged in one region of the second body portion, a coating solution passage connecting the coating solution inlet to said gap, a coating solution outlet arranged at one end of the gap to discharge the coating solution supplied to the coating solution inlet and a gap adjusting arrangement including a plurality of gap adjusting portions arranged on the first body portion to adjust a size of the coating solution outlet, the plurality of gap adjusting portions being arranged in a width direction of the base material.06-14-2012
20120114837FILM FORMATION APPARATUS AND FILM FORMATION METHOD - Provided are a film formation apparatus and a film formation method which may control with accuracy the thickness of a thin film formed on the film formation object. A film formation apparatus includes a moving part (film formation source unit) for moving a film formation source between a predetermined film formation waiting position and a predetermined film forming position is provided, and the moving part holds a quartz oscillator for measurement and a quartz oscillator for calibration so that their relative positions with respect to the film formation source are maintained. And a calibration step for calibrating a monitored value of the quartz oscillator for measurement, using a monitored value of the quartz oscillator for calibration, is performed in a middle of the film forming step of forming the film on the film formation object.05-10-2012
20120114840VACUUM VAPOR DEPOSITION SYSTEM - Provided is a vacuum vapor deposition system including: a vapor depositing source; a film thickness sensor for monitoring; and a film thickness sensor for calibration, in which a distance L05-10-2012
20120114838FILM FORMATION APPARATUS - A film formation apparatus includes a film formation source, a quartz oscillator for measurement, and a quartz oscillator for calibration. When a thin film of a film forming material is formed on a film formation object, the film forming material is heated in the film formation source to release vapors thereof. The quartz oscillator for measurement measures the amount of the film forming material formed on the film formation object, while the quartz oscillator for calibration calibrates the quartz oscillator for measurement. In the film formation apparatus, there are further provided a moving part for moving the film formation source between a predetermined film formation waiting position and a predetermined film forming position with respect to the film formation object and a temperature control part for controlling a temperature of the quartz oscillator for measurement and a temperature of the quartz oscillator for calibration to be substantially the same.05-10-2012
20120156362METHOD AND DEVICE FOR COATING PATH GENERATION - A method for generating a motion path for a spray gun for coating a component is disclosed. Path templates for surface segments of the component are defined, the surface is analyzed, a first motion path is generated, a model of the spray profile is simulated, the coating thickness is simulated for the motion path based on the simulated model of the spray profile and the generated first motion path. The simulated coating thickness is compared with tolerances and when the simulated coating thickness does not achieve the tolerances, an adapted motion path is generated. The coating thickness is simulated for the motion path based on the simulated model of the spray profile and the generated adapted motion path. Repeating the comparing, the motion path generation, and the simulation of the coating thickness based on the generated adapted motion path until the simulated coating thickness achieves the tolerances.06-21-2012
20130171336WAFER PROCESSING METHOD AND SYSTEM USING MULTI-ZONE CHUCK - In a wafer processing method and a wafer processing system, a first property on a back side of a wafer is measured. The back side of the wafer is supported on a multi-zone chuck having a plurality of zones with controllable clamping forces. The wafer is secured to the multi-zone chuck by controlling the clamping forces in the corresponding zones in accordance with measured values of the first property in the zones.07-04-2013
20090130294Method and device for coating a series of support bodies - The accuracy of the coating concentration when applying a catalytically active coating to suitable carrier bodies can be increased if, following raw coating with a relatively wide fluctuation range in the coating concentration, excessive or insufficient coating applied is if appropriate corrected iteratively. Excessive coating suspension applied is removed, for example by subsequent suction, while the coating is still in the wet state, whereas insufficient coating suspension applied is topped up, for example by spraying on additional coating suspension.05-21-2009
20100247745METHOD FOR MANUFACTURING A COMPOUND FILM - A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.09-30-2010
20110183065Methods and apparatus for roll-coating sheet articles using metering roll of variable profile - Methods and apparatus for coating a major surface of a strip article advancing past and in contact with an applicator roll by supplying coating material to the applicator roll for transfer to the strip surface while urging a metering roll against the applicator roll to impart a coating profile to the coating material on the applicator roll before the coating material having that profile is transferred to the strip surface, wherein the metering roll is subjected to a force for bending the axis of the metering roll convexly toward the applicator roll, thereby to compensate for deflection of the metering roll that would otherwise tend to cause nonuniformity of applied coating weight across the width of the strip.07-28-2011
20120213913Method and Device for Regenerating the Interior Surfaces of Conduits by Means of Thermal Spraying of Metals - A method for regeneration of internal conduit surfaces by thermal projection of metals, includes inserting a device including a vehicle having a rolling assembly to permit rolling of the vehicle and carrying a thermal projection system, through a manhole in a conduit installation, including the steps of inserting the device in a conduit with the rolling assembly in a retracted position, and expanding the rolling assembly inside the conduit until the device is centered in the conduit; inserting electrical, pneumatic and/or hydraulic conduits and conduits for supplying metal to be thermally projected, through the manhole, such that the conduits are connected with the vehicle; positioning a regeneration device including the thermal projection system connected with the vehicle by a remote-control pulling system in a particular position to be regenerated; thermally projecting metal from the regeneration device; advancing the vehicle and connected regeneration device to a new regeneration position.08-23-2012
20120076923WET PAINT COATING THICKNESS MEASUREMENT AND INSTRUMENT - An instrument is described for measuring the thickness of a paint coating on a rotating roll of a roll coating applicator roll for determination of the thickness of a paint coating to be applied to a moving substrate comprising: sensor means arranged for emitting and detecting signals reflected from the surface of the paint coating on at least one roll of the roll coating applicator to generate data indicative of the position of the surface of the paint on the roll, the sensor means being distanced from the paint coating for the emission and detection of the signals; and processing means for processing the data generated by the sensor means to determine the thickness of the paint coating to be applied to the substrate.03-29-2012
20120177811METHOD FOR MANUFACTURING A CORROSION SENSOR - A method for manufacturing a corrosion sensor includes spraying a non-conductive material on a substrate and spraying a conductive material at discrete locations on the substrate or on the non-conductive material. The method further includes spraying the non-conductive material around the discrete locations of the conductive material.07-12-2012
20120263865DUAL LANE COATING - The present invention relates to methods and apparatuses for forming an active-containing film product, while significantly reducing the amount of wasted active material. The resulting product is an active-containing film product that meets the user's predetermined criteria of physical properties and is suitable for use.10-18-2012
20120269958MATERIAL BUILDUP SIMULATIONS BY APPLICATION OF POWDER JET MASS CONSERVATION PRICIPLES - A method for simulating of the thickness of a coating which is placed onto a substrate surface is disclosed. The thickness is simulated using mass conservation principles. In a preferred embodiment at least one reference spray trial is performed, the correlation of a single spray profile to at least one spray process parameter is determined, the single spray profile is simulated using mass conservation principles to an incoming powder jet stream.10-25-2012
20120088026FILM THICKNESS MEASUREMENT - A method for determining the thickness of a film on a substrate is described. The substrate has a first major surface opposite a second major surface, and the film covers a portion of the first major surface. During a first measurement step, a first measuring beam is used to determine the distance from a first reference point to a portion of the first major surface of the substrate that is not covered with the film, and a second measuring beam is used to determine the distance from a second reference point to a portion of the second major surface of the substrate that is not covered with film. During a second measurement step the first measuring beam is used to determine the distance from the first reference point to the film, and the second measuring beam is used to determine the distance from the second reference point to a portion of the second major surface of the substrate that is not covered with film. The thickness of the film so determined may be used as a control parameter in a method of applying an ink to an automotive glazing pane.04-12-2012
20080233269APPARATUS AND METHODS FOR APPLYING A LAYER OF A SPIN-ON MATERIAL ON A SERIES OF SUBSTRATES - An apparatus and method for applying a fluid spin-on material on a surface of first and second substrates. A spin coating device is configured to dispense the fluid spin-on material to form a first layer on the surface of the first substrate. A metrology tool is configured to measure a first thickness profile of the first layer and generate data representing the first thickness profile. A processing unit is electrically coupled with the metrology tool and is configured to analyze the data received from the metrology unit and to determine a variation in the first thickness profile. The processing unit then determines an adjustment to an operational parameter of the spin coating device predicted to reduce a variation in a second thickness profile of a second layer subsequently formed by the spin coating device on a second substrate.09-25-2008
20100233354Device for Creating a Printing Plate and Development Process - The invention concerns a device forcreating a printing plate including a support (09-16-2010
20130115366APPARATUS AND METHOD FOR FORMING THIN FILM - Apparatus and a method for forming a thin film including a vacuum chamber, a substrate holder located on the inner upper side of the vacuum chamber to secure a substrate, an evaporation source located on the inner lower side of the vacuum chamber to evaporate a deposition material, an evaporation source shutter substantially confining the deposition material evaporated to the evaporation source, a sensor located within the vacuum chamber to detect the thickness of the deposition material deposited on itself, and a calculation portion calculating the thickness of the deposition material deposited on the evaporation source shutter using data detected by the sensor.05-09-2013
20120276282TOOLING CARRIER FOR INLINE COATING MACHINE, METHOD OF OPERATING THEREOF AND PROCESS OF COATING A SUBSTRATE - A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 11-01-2012
20130156940ADJUSTABLE NOZZLE FOR PLASMA DEPOSITION AND A METHOD OF CONTROLLING THE ADJUSTABLE NOZZLE - The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.06-20-2013
20100203231METHOD AND APPARATUS FOR PRODUCING INSULATED WIRE - Disclosed is a method of producing an insulated electric wire, in which a primary coating layer including at least an enamel-baking layer is formed on a metallic conductor to form a primary coated electric wire, and a secondary coating layer is extrusion-formed on the primary coating layer of the primary coated electric wire. The method includes an electric wire pre-heating process where a surface of the primary coating layer is pre-heated using an electric wire pre-heating unit, and a resin extrusion process where a secondary coating layer is extrusion-formed on the pre-heated primary coating layer using a resin extrusion unit. Further disclosed is an apparatus for producing an insulated electric wire.08-12-2010
20120027916ARRANGEMENT AND METHOD FOR MEASUREMENT OF THE TEMPERATURE AND OF THE THICKNESS GROWTH OF SILICON RODS IN A SILICON DEPOSITION REACTOR - An arrangement for measurement of temperature and thickness growth of silicon rods in a silicon deposition reactor employs a temperature measurement device located outside the reactor. Continuous temperature measurement and measurement of the thickness growth throughout the entire deposition process is achieved with a contactlessly operating temperature measurement device arranged outside the silicon deposition reactor in front of a viewing window. The temperature measurement device can be pivoted horizontally about a rotation axis by a rotating drive. The pivoting axis runs parallel to a longitudinal axis of the silicon rod, and the central axis of the temperature measurement device runs through the pivoting axis.02-02-2012
20130101730MICROWAVE PLASMA REACTORS - New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.04-25-2013
20130260016Sealant Analysis System - A method and apparatus for inspecting sealant on an object. First data is generated for a first geometry of a first surface of the object prior to sealing the object. Second data is generated for a second geometry of a second surface of the object after the sealant has been applied to the object. A difference is identified between the first data and the second data. The difference indicates a thickness of the sealant on the object.10-03-2013
20100136216GAS DISTRIBUTION BLOCKER APPARATUS - Embodiments of the present invention generally provide apparatus and methods for altering the flow and pressure differential of process gases supplied across a showerhead of a processing chamber to provide improved deposition uniformity across the surface of a substrate disposed therein. In one embodiment, a blocker plate is disposed between a backing plate and a showerhead. In one embodiment, the distance between the blocker plate and the showerhead is adjustable. In another embodiment, the blocker plate has a non-planar surface contour. In another embodiment, a regional blocker plate is disposed between a backing plate and a showerhead. In another embodiment, a central blocker plate and a peripheral blocker plate are disposed between a backing plate and a showerhead.06-03-2010
20130273237Method to Determine the Thickness of a Thin Film During Plasma Deposition - The present invention provides a method to determine the thickness of a thin film during deposition. A target film thickness is set. A substrate is placed within a deposition system. The thin film is deposited onto the substrate within the deposition system. Radiation reflected from the substrate is monitored at multiple wavelengths during the deposition of the thin film using standard OEI techniques. A value derived from the reflected radiation is monitored. A time is detected at which the derived value is at a target value. A film thickness is calculated at the detected times to generate data. A mathematical analysis is performed on the generated data to determine an equation for deposited film thickness versus time. The calculated equation for deposited film thickness versus time is used to achieve the target film thickness.10-17-2013
427010000 Electrical or optical 31
20090155453Manufacturing Method and Apparatus of Optical Goods - A manufacturing method of optical goods, including: injecting a material composition stored in a tank into a cavity provided inside a mold; and polymerizing and curing the injected material composition, in which a viscosity of the material composition stored in the tank is measured.06-18-2009
20090269484Method of measuring coating quantity and method of predicting dissolution behavior - Evaluation methods that employ the near infrared spectrum have generally had a low specificity and in particular have encountered difficulty in the evaluation of trace components, and the accurate measurement of coating quantity by methods using the near infrared spectrum has been quite problematic. The quantity of coating applied to a coating target, such as granules or uncoated tablets, is measured based on the absorption or scattering of light in the 800 to 1100 nm wavelength region by an additive coated on the coating target. The use of polyethylene glycol or a long-chain hydrocarbyl-containing compound as the additive is preferred.10-29-2009
20090047419FILM-FORMING METHOD AND FILM-FORMING DEVICE - A film-forming method includes: a) discharging a liquid including a film material on an object so as to form a liquid film made of the liquid; b) irradiating the liquid film with light and thus detecting light from the liquid film so as to measure distribution of an optical constant, which is related to a film thickness of a thin film, with respect to the liquid film; and c) drying the liquid film on the object so as to form the thin film by converting the distribution of the optical constant into distribution of a temperature of the liquid film based on converting information that relates the optical constant of the liquid film to the temperature of the liquid film and thus forming the distribution of the temperature on the liquid film.02-19-2009
20090324805Optical monitor for thin film deposition using base stack admittance - A method is provided for the determination of the time to terminate the deposition of an optical thin film using an exact model for the reflectance. This model is used to fit the reflectance measurements to determine the deposition rate, from which the time to deposit the entire layer is determined, as well as finding the admittance of the base stack at the beginning of the current layer. The layer deposition is terminated at the calculated time resulting in precise thickness control. This ability to fit the base admittance enables the determination of the reflection model parameters for each layer being deposited so that the accuracy of each layer is independent of previously deposited layers. This means that there is no build up of errors from layer to layer as the deposition progresses, enabling the deposition of coating designs with higher precision, including non periodic and non quarter wave designs.12-31-2009
20100266749METHOD OF USING IMAGE DATA IN THE PRODUCTION OF THIN WALL EXTRUSIONS - A method of coating metal wire with extrudate using an extrusion system. The method includes the steps of advancing the metal wire through an extrusion die of the extrusion system and extruding molten extrudate over the metal wire as the metal wire is advanced through the extrusion die. Image data is generated, using one or several electronic cameras, concurrently with the advancing, and extruding to provide visual feedback indicative of the concentricity or non-concentricity of extrudate surrounding the metal wire as the metal wire exits the extrusion die.10-21-2010
20110300290Device for fabricating electrode by roll to roll process and method for fabricating electrode - There are provided a device for fabricating an electrode by a roll-to-roll process and a method for fabricating an electrode. The device for fabricating an electrode includes an unwinding roll and a winding roll travelling an electrode material; a film forming roll disposed between the unwinding roll and the winding roll allowing the electrode material to travel along a cylindrical surface of the film forming roll and having a cooling unit cooling the electrode material; and an evaporation unit receiving a lithium source and mounted for the received lithium source to form a thin film in the electrode material positioned on the film forming roll. Thereby, the lithium is deposited in a vacuum atmosphere such that the process is simple and the deposition rate and the deposition uniformity of lithium can be improved.12-08-2011
20110212256DEPOSITION RATE CONTROL - An vapor deposition control system includes a multi-level control scheme.09-01-2011
20110206830REVERSE INTERFEROMETRIC METHOD AND APPARATUS FOR MEASURING LAYER THICKNESS - A reverse interferometric method for the determination of the thickness of a layer of material employs a multi-wavelength light source which generates a light beam which comprises a time-variant series of different monochromatic wavelengths. The beam is reflected from the body of material being measured and is detected by a broad spectrum wavelength detector which produces a signal comprising a series of data points indicating the reflectivity of the sample as a function of the time-variant series of monochromatic wavelengths. A signal processor processes these data points to fit them to a model waveform, and the frequency of the model waveform is used to calculate the thickness of the body of material. Further disclosed are apparatus for carrying out the method and use of the method in a continuous process for the fabrication of thin film materials.08-25-2011
20100136217SAMPLE ANALYZING METHOD, SAMPLE ANALYZING APPARATUS, MANUFACTURING METHOD OF ORGANIC EL ELEMENT, MANUFACTURING EQUIPMENT, AND RECORDING MEDIUM - Light is irradiated onto a glass substrate of an organic EL element, and the characteristics of an organic film are analyzed. In the sample analyzing apparatus, in such a way that the glass substrate is located on the upper side, the organic EL element is placed on a stage. The light is irradiated towards the glass substrate, and an amplitude ratio and a phase difference which are related to the organic EL element are measured. Also, the sample analyzing apparatus selects a model of a structure corresponding to reflected lights K06-03-2010
20080311283Method of Inspecting and Manufacturing an Integrated Circuit - An auxiliary layer is provided over a main surface of a sample, wherein the sample may be a semiconductor substrate. The auxiliary layer may have an essentially plane surface and is transparent or semi-transparent to an inspection radiation with a wave length between, for example, 193 and 800 nm. The sample coated with the auxiliary layer is inspected for defects in the sample via an imaging method that may use coherent radiation. After inspection, the auxiliary layer is removed. Dependent on the defect count, a process of manufacturing integrated circuits may be continued or the sample may be reworked or discarded.12-18-2008
20090047418FILM-FORMING METHOD, AND FILM FORMING DEVICE - A film-forming method includes: a) discharging a liquid including a film material on an object so as to form a liquid film made of the liquid; b) measuring distribution of an optical constant related to a film thickness of a thin film by irradiating the liquid film with light from a first light source so as to detect light from the liquid film; and c) modulating light from a second light source corresponding to the optical constant of the liquid film based on converting data indicating a relation between the optical constant and light wave information of the light from the second light source while irradiating the liquid film with the light from the second light source so as to dry the liquid film to form the thin film on the object.02-19-2009
20090191327VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE - A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The coating process is a continuous coating process, during which the first pulley and the second pulley are rotated to move the substrate continuously past a coating tool for depositing coating particles on a surface of the substrate. After having passed the coating section with a speed v, the substrate carrying a coating layer on the surface thereof passes an infrared spectroscopic measurement device for measuring the layer thickness of the coating layer. Feedback controls are provided to control one or more process parameters of the coating tool responsive to the measurement of the thickness of the coating layer detected by the measurement tool. Thus, an in situ online measurement of the thickness of the coating layer may be implemented.07-30-2009
20100189880Method and Apparatus for Extruding a Liquid Onto a Substrate and Inspecting the Same - An extrusion and inspection apparatus is provided. Specifically, the apparatus includes a generally horizontal surface adapted to support a substrate and a coating die that extrudes fluid onto the substrate. A shuttle having a bridge with the coating die mounted thereon moves the coating die generally parallel to the substrate. In addition to lateral motion parallel to the substrate, the apparatus includes a gauging member that positions the die to at least one predetermined position above the substrate. A light source secured to the bridge is also employed to illuminate the substrate before and/or after coating. The apparatus also includes an imager secured to the bridge where the imager obtains images of the substrate during illumination.07-29-2010
20100227046FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER READABLE STORAGE MEDIUM - A disclosed film deposition apparatus includes a transparent window in a ceiling plate of a vacuum chamber. A film thickness of a film deposited on a substrate is measured by emitting light to the substrate through the transparent window by a film thickness measurement system that includes optical units arranged on or above the transparent window, optical fiber cables connected to the corresponding optical units, a measurement unit to which the optical fiber cables are connected, and a control unit electrically connected to the measurement unit in order to control the measurement unit.09-09-2010
20090214760Optical Monitoring System for Coating Processes - The invention concerns an optical monitoring system for the measurement of layer thicknesses of thin coatings applied in a vacuum, particularly on moving substrates, during the coating process, in which the light intensity of the light of a light source injected into a reference light guide and released by a first piezoelectric or electrostrictive or magnetostrictive light chopper is registered by a light detector unit in a reference phase, the light of the light source in a measuring phase is injected into a first measuring light guide and the light released by a second piezoelectric or electrostrictive or magnetostrictive light chopper is directed to the substrate, and the light intensity of the light reflected or transmitted from the substrate is registered by the light detector unit through a second measuring light guide, and a remaining light intensity is registered by the light detector unit in at least one dark phase, wherein the reference phase, the measuring phase, and the dark phase are shifted in time by the light chopper and are digitally adjusted depending on the position of the substrate.08-27-2009
20090035450BASE MATERIAL PROCESSING APPARATUS AND BASE MATERIAL PROCESSING METHOD - A base material processing apparatus comprises a device for irradiating light from a light transmissive film side to a base material during film formation on a surface of the base material or film processing of the film formed on the surface of the base material. The apparatus also comprises film physical characteristic measuring device for receiving reflected light coming from the base material during the film formation or the film processing, detecting interference light formed by first reflected light and second reflected light contained in the reflected light, the first reflected light being reflected from a surface of the film, the second reflected light being reflected from an interface between the film and the base material, and measuring a physical characteristic of the film with a peak valley technique.02-05-2009
20090017190Movable injectors in rotating disc gas reactors - A system and method for uniform deposition of material layers on wafers in a rotating disk chemical vapor deposition reaction system is provided, wherein one or more substrates are rotated on a carrier about an axis while maintaining surfaces of the one or more substrates substantially perpendicular to the axis of rotation and facing in an upstream direction along the axis of rotation. During rotating a first gas is discharged in the downstream direction towards the one or more substrates from a first set of gas inlets. A second gas is discharged in the downstream direction towards the one or more substrates from at least one movable gas injector, and the at least one movable gas inlet is moved with a component of motion in a radial direction towards or away from the axis of rotation.01-15-2009
20090214761REAL TIME IMPRINT PROCESS DIAGNOSTICS FOR DEFECTS - Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.08-27-2009
20110151107Coating apparatus and method for real-timely monitoring thickness change of coating film - A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change.06-23-2011
20110052793Optical monitor with computed compensation - A method is provided for the determination a thickness error in a previously deposited layer using the reflection monitor signal of the currently-depositing layer. This thickness error is then used to compute corrections to the thickness of the currently-depositing layer and the next layer which corrects for the thickness error in the previous layer. The method is stable with respect to noise in the optical monitor signal. The technique is applicable for optical coating designs which are not necessarily quarter wave. The approach avoids the buildup of thickness errors from layer to layer and thus is applicable for very thick designs with many layers. Near the end of a currently depositing layer the monitor signal is used to fit the admittance of the base stack under the current layer. This establishes the parameters in an exact reflectance model used for the rate or thickness monitoring of the current layer.03-03-2011
20110189380DEVICE AND METHOD FOR FABRICATING DISPLAY DEVICE - A device for manufacturing a display device includes a deposition source; a deposition thickness calculator for calculating a deposition thickness of a deposition material deposited on a substrate; and a controller for controlling a power of a heater which heats the deposition source by comparing the deposition thickness calculated with a reference thickness. The controller controls the power of the heater either at least one time for each substrate on which the thin film is to be deposited or at regular intervals while the deposition material is deposited. Influence of measurement noise that is included in a quartz crystal sensor for measuring a deposition speed may be minimized, and distribution of deposition thickness of an organic light emitting material may be reduced, thereby increasing the yield of the deposition process and producing quality display devices.08-04-2011
20110027459Methods and Devices for Monitoring and Controlling Thin Film Processing - Thin film processing systems and methods are provided having a moving deposition sensor capable of translation and/or rotation in a manner that exposes the sensor to thin film deposition environments in a flux region substantially the same as the deposition environments experienced by one or more moveable substrates during a selected deposition period. In one embodiment, a thin film monitoring and control system is provided wherein one or more moveable substrates and a moveable deposition sensor are moved along substantially coincident trajectories in a flux region of a thin film deposition system for a selected deposition period. Systems and methods of the present invention may include SC-cut quartz crystal microbalance sensors capable of excitation of at least two different resonant modes.02-03-2011
20090087543TEMPLATED GROWTH OF GRAPHENIC MATERIALS - A method is disclosed for producing graphenic materials by templated growth along a preformed graphenic material lattice edge, wherein at least one of the graphenic material or template is translated during growth of the graphenic material. A method for preparing CNTs from preformed CNT substrates in the presence of cylindrical templating structures and a reactive carbon source in a fluid phase is also disclosed, wherein at least one of the CNT substrate or the cylindrical templating structure is translated during addition of carbon atoms to the CNT substrate. A method is also disclosed for preparing CNTs from preformed CNT substrates in the presence of cylindrical templating structures and a carbon source in a fluid phase, wherein non-thermalized excited states are produced on the CNT substrate and at least one of the CNT substrate or the cylindrical templating structure is translated during addition of carbon atoms to the CNT substrate.04-02-2009
20120156363Gas Injection System for Chemical Vapor Deposition Using Sequenced Valves - A gas injection system for a chemical vapor deposition system includes a gas manifold comprising a plurality of valves where each of the plurality of valves has an input that is coupled to a process gas source and an output for providing process gas. Each of a plurality of gas injectors has an input that is coupled to the output of one of the plurality of valves and an output that is positioned in one of a plurality of zones in a chemical vapor deposition reactor. A controller having a plurality of outputs where each of the plurality of outputs is coupled to a control input of one of the plurality of valves. The controller instructs at least some of the plurality of valves to open at predetermined times to provide a desired gas flow to each of the plurality of zones in the chemical vapor deposition reactor.06-21-2012
20100209593Methods For Producing Omni-Directional Multi-Layer Photonic Structures - A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.08-19-2010
20090061075METHOD AND APPARATUS FOR MEASURING COATING THICKNESS WITH A LASER - A method of measuring a coating deposits a layer of coating on an object. A laser beam is projected on the layer of the coating. A reflection of the project laser beam is received by the laser sensor. From this information, the thickness of the layer of the coating on the object is determined. A value related to the thickness of the layer of the coating may then be compared to a desired value.03-05-2009
20120258239EVAPORATION SYSTEM WITH MEASUREMENT UNIT - An evaporator for evaporating a material onto a substrate is described. The evaporator includes a guiding means for guiding the material towards at least one opening nozzle. The guiding means includes a measurement outlet for a portion of the material. The evaporator further includes a first measurement system configured for generating a first signal correlated with a deposition rate of the evaporator and having a first detector positioned for being coated by the material and a second optical measurement system for generating a second signal correlated with the deposition rate of the evaporator and wherein the second signal is based on the portion of the material of the measurement outlet.10-11-2012
20120263866METHOD FOR MEASURING LAYER THICKNESS BY MEANS OF LASER TRIANGULATION, AND DEVICE - A method for determining the layer thickness of a component to be coated is provided. The monitoring of the process is automated by carrying out laser triangulation measurement before and after the coating of the component. At least one reference point on the component is used to determine the distortion of the blade or vane. A device for carrying out the method is also provided.10-18-2012
20100330264COLORED COATING AND METHOD - A method of evaluating a coating applied to a surface comprises the step of applying the coating to the surface. The coating including a conversion gel to chemically bind the surface and an indicator substantially uniformly distributed throughout the coating wherein the indicator modifies an appearance of the coating. The method further comprising the step of determining whether the indicator is present on the surface at a substantially uniform concentration.12-30-2010
20100129525APPARATUS FOR FORMING PHOSPHOR LAYER AND METHOD FOR FORMING PHOSPHOR LAYER USING THE APPARATUS - A phosphor layer forming apparatus (05-27-2010
20100166945Methods of calculating thicknesses of layers and methods of forming layers using the same - A method of calculating a thickness of a layer may include forming the layer on a substrate in a chamber, measuring optical emission spectrum data from the chamber, and calculating the thickness of the layer from the optical emission spectrum data. A method of forming a layer may include depositing the layer on a substrate in a chamber, measuring optical emission spectrum data from the chamber, calculating a thickness of the layer using the optical emission spectrum data, and ending the depositing of the layer when the calculated thickness of the layer is within a target thickness range.07-01-2010

Patent applications in class Thickness or uniformity of thickness determined

Patent applications in all subclasses Thickness or uniformity of thickness determined