Entries |
Document | Title | Date |
20090016947 | RECYCLING OF HIGH-BOILING COMPOUNDS WITHIN AN INTEGRATED CHLOROSILANE SYSTEM - Trichlorosilane production is increased while simultaneously lowering environmental burden due to destruction and disposition of high boilers by feeding high boilers from trichlorosilane production or from polycrystalline silicon production into a fluidized bed for production of trichlorosilane from metallic silicon and hydrogen chloride. | 01-15-2009 |
20090035205 | PROCESS FOR PREPARING HSiCI3 BY CATALYTIC HYDRODEHALOGENATION OF SiCl4 - The invention relates to a process for the catalytic hydrodehalogenation of SiCl | 02-05-2009 |
20090060817 | METHOD FOR PRODUCING TRICHLOROSILANE - A by-product mixture produced in a process for producing polycrystalline silicon is made to react with chlorine to form tetrachlorosilane (STC) distillate in a chlorination reaction vessel, and the tetrachlorosilane (STC) distillate is made to react with hydrogen in a hydrogenation reaction vessel to be converted into trichlorosilane (TCS). In the chlorination step, methyl chlorosilanes having boiling points close to TCS are hyper-chlorinated to be converted into hyper-chlorinated methyl chlorosilanes having higher boiling points, which facilitates the hyper-chlorinated methyl chlorosilanes to be separated into high concentration, and inhibits carbon from contaminating the polycrystalline silicon. A donor/acceptor eliminator is provided in the circulation cycle for producing TCS, and accordingly there is no need to take out a by-product produced in the process for producing TCS to the outside of the system, which can highly purify the TCS. | 03-05-2009 |
20090060818 | SILICON AND CATALYST MATERIAL PREPARATION IN A PROCESS FOR PRODUCING TRICHLOROSILANE - A process for preparing trichlorosilane by reacting silicon with hydrogen chloride, or silicon tetrachloride with hydrogen in the presence of silicon, and catalysts where the silicon and catalysts are laminated together and reduced in particle size prior to reaction. | 03-05-2009 |
20090060819 | PROCESS FOR PRODUCING TRICHLOROSILANE - A process for preparing high purity trichlorosilane (TCS) utilizing contaminated by-products of primary reaction products hydrogen chloride, metallurgical or chemical grade silicon stock, and/or by-products of the improved Siemens process, including “dirty” TCS containing low boiling impurities such as dichlorosilane (DCS) and “dirty” STC containing high boiling impurities. The “dirty” STC is first purified and a portion is reacted with “dirty” TCS containing DCS to produce additional TCS feedstock for the TCS purification process. Another portion of the purified STC is hydrogenated and converted back to TCS providing another feedstock to the TCS purification process. Overall net yield of high purity TCS produced is increased over established practice. | 03-05-2009 |
20090060820 | METHOD FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING POLYCRYSTALLINE SILICON - The present invention includes a step of separating an effluent produced in a hydrogenation step of making tetrachlorosilane (STC) react with hydrogen into trichlorosilane (TCS), into a chlorosilane fraction containing a hydrocarbon and a TCS fraction, and a chlorination step of making the chlorosilane fraction containing the hydrocarbon react with chlorine to form STC and a substance containing a chlorinated hydrocarbon, wherein the effluent containing STC produced in the chlorination step is circulated to the hydrogenation step. In the chlorination step, the chlorosilane fraction containing a hydrocarbon (capable of containing hyper-hydrogenated chlorosilanes) having a boiling point close to TCS is hyper-chlorinated to be converted and acquire a higher boiling point, which facilitates the hyper-chlorinated chlorosilanes and the hyper-chlorinated hydrocarbons to be separated into high concentration, and increases the purity of TCS to be finally obtained. | 03-05-2009 |
20090068081 | METHOD FOR PURIFYING CHLOROSILANES - This method for purifying chlorosilanes includes: introducing oxygen (O | 03-12-2009 |
20090104104 | Apparatus for producing trichlorosilane and method for producing trichlorosilane - In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction. | 04-23-2009 |
20090123359 | Reaction apparatus for producing trichlorosilane and method for producing trichlorosilane - A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port. | 05-14-2009 |
20090142246 | Method for separating and recovering conversion reaction gas - Provided is a method for separating and recovering conversion reaction gas, wherein after a conversion reaction process for producing trichlorosilane from hydrogen gas and silicon tetrachloride comprising; condensing step of cooling discharged gas, separating step of silicon tetrachloride from the condensed liquid, and recovering disilicon hexachloride. For example, the method includes a first distillation process for distilling trichlorosilane from the condensed liquid, a second distillation process for distilling silicon tetrachloride from residual liquid of the first distillation process, and a third distillation process for distilling disilicon hexachloride from residual liquid of the second distillation process. | 06-04-2009 |
20090169457 | POLYSILANE PROCESSING AND USE - The invention relates to a method for the final product-related manufacture of low-molecular, medium-molecular, and high-molecular halogenated polysilanes, the distillation thereof into selected fractions, the direct deposition of silicon from the gas phase or a liquid phase of polysilane mixtures or polysilanes, the hydrogenation or derivation of halogenated polysilanes, and the processing into final products in an adequate system. | 07-02-2009 |
20090220403 | Method and apparatus for manufacturing trichlorosilane - A method and an apparatus for manufacturing trichlorosilane are disclosed. A polymer containing high boiling chlorosilane compounds that are generated in a polycrystalline silicon manufacturing process are mixed with hydrogen chloride and introduced into a decomposition furnace. The polymer and the hydrogen chloride are reacted at a temperature of 450° C., and preferably of 450° C. or more and 700° C. or less. Preferably a mixture containing the polymer and hydrogen chloride of 10 to 30 mass % with respect to the weight of the polymer is introduced into the decomposition furnace. | 09-03-2009 |
20090238748 | Chlorosilanes purifying apparatus and chlorosilanes manufacturing method - Aluminum chloride from a gas containing chlorosilanes produced in a chlorination reactor is effectively removed. A container | 09-24-2009 |
20090285743 | METHOD FOR PRODUCING TRICHLOROSILANE AND APPARATUS FOR PRODUCING TRICHLOROSILANE - A method and an apparatus for producing trichlorosilane comprising: producing reaction product gas containing trichlorosilane and hydrogen chloride by initiating a reaction of silicon tetrachloride and hydrogen at 900° C. to 1900° C.; preventing a reverse reaction to silicon tetrachloride and by-production of a polymer by cooling the reaction product gas discharged from the reaction chamber to 300° C. to 800° C., thereby optimizing the cooling rate of the reaction gas; preheating at least one of the silicon tetrachloride and the hydrogen introduced into the reaction chamber | 11-19-2009 |
20090324477 | METHOD FOR PRODUCING TRICHLOROSILANE AND APPARATUS FOR PRODUCING TRICHLOROSILANE - An apparatus comprising: a reaction chamber | 12-31-2009 |
20100008842 | METHOD FOR THE PRODUCTION OF TRICHLOROSILANE - High yields of trichlorosilane are achieved in the reaction of tetrachlorosilane and hydrogen at a temperature in the range of 900° C. to 1300° C. and a pressure above the critical pressure of the reactants. | 01-14-2010 |
20100034721 | Method and apparatus for manufacturing trichlorosilane - An apparatus | 02-11-2010 |
20100034722 | Apparatus for producing trichlorosilane and method for producing trichlorosilane - An apparatus for producing trichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace. | 02-11-2010 |
20100061912 | Apparatus for high temperature hydrolysis of water reactive halosilanes and halides and process for making same - A process for high temperature hydrolysis of halosilanes and halides with the steps of: providing a bed of fluidized particulate material heated to at least 300° C., injecting steam and an excess of reactants into the reactor, removing solid waste from a bottom outlet, removing the effluent gases through a solids removal device such as a cyclone, condensing and separating some of the unreacted waste from the effluent gas in a distillation column and sending the effluent gases containing hydrogen and hydrogen chloride to a compressor. In a preferred embodiment the reactants contain at least one water reactive halide, selected from the group halosilane, organohalosilane, aluminum halide, titanium halide, boron halide, manganese halide, copper halide, iron halide, chromium halide, nickel halide, indium halide, gallium halide and phosphorus halide and where the halide content is selected from chlorine, bromine and iodine. | 03-11-2010 |
20100061913 | METHOD TO CONVERT WASTE SILICON TO HIGH PURITY SILICON - A process for the recovery of silicon includes providing silicon-containing solids recovered from a silicon manufacturing process, said recovered silicon-containing solids being substantially free of semiconductor dopants; converting the recovered silicon-containing solids into gaseous silicon forms; subjecting to purification by minimal distillation; collecting the gaseous silicon forms as a condensed liquid of silicon-containing compounds; and utilizing the silicon-containing compounds for silicon deposition. | 03-11-2010 |
20100074823 | Apparatus for producing trichlorosilane and method for producing trichlorosilane - In the apparatus for producing trichlorosilane in which metal silicon powder supplied into the reactor is reacted with hydrogen chloride gas while being fluidized by the gas, thereby taking out trichlorosilane generated by the reaction from the upper part of the reactor, and a plurality of gas flow controlling members are installed at the internal space of the reactor along the vertical direction. | 03-25-2010 |
20100111804 | Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane - A reactor for hydrogenation of a silicon tetrahalide and metallurgical grade silicon to trihalosilane includes a bed of metallurgical silicon particles, one or more gas entry ports, one or more solids entry ports, one or more solids drains and one or more ports for removing the trihalosilane from the reactor. Fresh surfaces are generated on the bed particles by internal grinding and abrasion as a result of entraining feed silicon particles in a silicon tetrahalide/hydrogen feed stream entering the reactor and impinging that stream on the bed of silicon particles. This has the advantages of higher yield of the trihalosilane, higher burnup rate of the MGS, removal of spent MGS as a fine dust carryover in the trihalosilane effluent leaving the reactor and longer times between shutdowns for bed removal. | 05-06-2010 |
20100124525 | ZERO-HEAT-BURDEN FLUIDIZED BED REACTOR FOR HYDRO-CHLORINATION OF SiCl4 and M.G.-Si - The present invention is a process of producing chlorosilanes from a reaction of silicon tetrachloride in the presence of metallurgical grade silicon in a fluidized bed reactor, such that the fluidized bed reactor does not have an internal heat exchanger. | 05-20-2010 |
20100150809 | ENHANCEMENTS FOR A CHLOROSILANE REDISTRIBUTION REACTOR - The present invention includes a process and means for using two isolated by-products from the reaction of at least one of metallurgical silicon and silicon tetrachloride with at least one of anhydrous hydrogen chloride and hydrogen to produce trichlorosilane. The two isolated by-products are dichlorosilane and silicon tetrachloride. The present process reduces chlorosilane waste and improves efficiency of overall process for production of trichlorosilane for use in chemical vapor deposition of polysilicon for electronic and solar applications. The present invention further includes a chemical reactor for the reacting dichlorosilane with silicon tetrachloride to produce additional trichlorosilane. | 06-17-2010 |
20100178230 | Apparatus And Method For Manufacturing Trichlorosilane And Method For Manufacturing Polycrystalline Silicon - A method of manufacturing trichlorosilane includes a conversion reaction process (first reaction process) for producing a first reaction product gas, which contains trichlorosilane, dichlorosilylene, hydrogen chloride, and high-order silane compounds, by performing a conversion reaction of silicon tetrachloride and hydrogen, which are raw materials, in a first temperature range that is equal to or higher than 1000° C. and equal to or lower than 1900° C.; a first cooling process for cooling the first reaction product gas to a temperature of 950° C. or lower within 1 sec (except that the first reaction product gas is cooled to a temperature lower than 600° C. within 0.01 sec); a second reaction process for maintaining the temperature of the first reaction product gas in a second temperature range, which is equal to or higher than 600° C. and equal to or lower than 950° C., during the time that is equal to or more than 0.01 sec and equal to or less than 5 sec; and a second cooling process for cooling a second reaction product gas, which has been subjected to the second reaction process, to a temperature lower than 600° C. | 07-15-2010 |
20100183496 | Apparatus for producing trichlorosilane and method for producing trichlorosilane - An apparatus for producing trichlorosilane in which metallurgical grade silicon powder supplied to a reactor is reacted with hydrogen chloride gas while being fluidized by the hydrogen chloride gas, thereby discharging trichlorosilane generated by the reaction from the reactor, includes: a plurality of gas flow controlling members which are installed along a vertical direction in an annular shape R from an inner peripheral wall of the reactor in an internal space of the reactor; and a heat transfer tube which is installed along the vertical direction in the annular space R and through which a heating medium passes. | 07-22-2010 |
20100221169 | PROCESS FOR PREPARING HIGH-PURITY HEXACHLORODISILANE - Ultra high purity hexachlorodisilane is prepared from hexachlorodisilane-containing mixtures from numerous sources by distillation wherein water is present at less than 10 ppbw. | 09-02-2010 |
20100233062 | Apparatus and method for producing trichlorosilane - An apparatus and a method for producing trichlorosilane are provided, which effectively suppresses the reaction converting trichlorosilane to tetrachlorosilane and the formation of polymers, thereby achieving a high recovery ratio of trichlorosilane. The apparatus for producing trichlorosilane includes: a converter reactor for converting a raw material gas containing tetrachlorosilane and hydrogen into a reaction product gas; a cooler for cooling the reaction product gas fed from the converter reactor; and a plurality of provided in the cooler for spraying cooling liquids. Average droplet diameters of the cooling liquids sprayed from a plurality of the nozzles are different from each other, and a cooling liquids volume sprayed from each of the plurality of nozzles is able to be individually adjusted. | 09-16-2010 |
20100278706 | METHOD FOR REDUCING THE CONTENT IN ELEMENTS, SUCH AS BORON, IN HALOSILANES AND INSTALLATION FOR CARRYING OUT SAID METHOD - The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron- and/or aluminum-containing compounds of technically pure halosilanes for producing purified halosilanes, especially high-purity chlorosilanes. The invention further relates to an installation for carrying out said method. | 11-04-2010 |
20100290970 | FLUIDIZED BED PROCESS FOR SYNTHESIZING TRICHLOROSILANE AND A TRICHLOROSILANE SYNTHESIZER - A multi-stage fluidized bed synthesizer and process for synthesizing trichlorosilane wherein silicon particles can be fed into one of multiple intercommunicating fluidizing zones in a fluidized bed reactor supplied with fluidizing gas comprising hydrogen chloride. The fluidizing zones can be disposed laterally adjacent one to another, for example side-by-side, or in a horizontal line. Useful embodiments include: feeding the fluidizing gas at different rates and/or compositions to the different fluidizing zones; filtration apparatus to filter the gaseous product and return silicon particles to the reactor and cooling systems for cooling the fluidized bed and the gas volumes above the fluidized beds, if present. | 11-18-2010 |
20100296994 | CATALYST AND METHOD FOR DISMUTATION OF HALOSILANES CONTAINING HYDROGEN - The invention relates to a catalyst, the use thereof, and a method for dismutation of halosilanes containing hydrogen, in particular chlorosilanes containing hydrogen. | 11-25-2010 |
20110008235 | METHOD FOR MODERATE TEMPERATURE REUTILIZATION OF IONIC HALIDES - In one embodiment, the present invention relates generally to a method for reutilizing ionic halides in a production of an elemental material. In one embodiment, the method includes reacting a mixture of an ionic halide, at least one of: an oxide, suboxide or an oxyhalide of an element to be produced and an aqueous acid solution at moderate temperature to form a complex precursor salt and a salt, forming a precursor halide from the complex precursor salt, reducing the precursor halide into the element to be produced and the ionic halide and returning the ionic halide into the mixture of the reacting step. | 01-13-2011 |
20110008236 | High Purity Silicon-Containing Products and Method of Manufacture - Silicon-containing products, such as silicon, silicon carbide and silicon nitride, containing less than 0.01 weight percent total mineral impurities and selectively determined carbon-to-silicon ratios. The products are derived from plant matter, such as rice hulls and rice straw, containing at least three weight percent silica. Methods are provided for making such high purity silicon-containing products by leaching silica-containing plant matter with aqueous sulfuric acid under controlled temperatures, pressures and reaction times to remove minerals and metals while adjusting the mole ratio of fixed carbon to silica, and then thermally treating under controlled conditions to produce the desired product. | 01-13-2011 |
20110038778 | SILICON TETRAFLUORIDE BYPRODUCT SEPARATION PROCESS - Embodiments of the invention provide a system and process for recovering useful compounds from a byproduct composition produced in a silicon tetrafluoride production process. | 02-17-2011 |
20110052474 | INSTALLATION AND METHOD FOR REDUCING THE CONTENT IN ELEMENTS, SUCH AS BORON, OF HALOSILANES - The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron- and aluminum-containing compounds of technically pure halosilanes for producing high-purity halosilanes, especially high-purity chlorosilanes. The invention further relates to an installation for carrying out said method. | 03-03-2011 |
20110110839 | SYSTEMS AND METHODS OF PRODUCING TRICHLOROSILANE - The present invention is directed to systems and methods of synthesizing trichlorosilane. The disclosed systems and methods can involve increasing the concentration of the solids in the slurry to recover or separate the volatilized metal salts and reduce the obstructions created by the solidification of the metal salts in downstream operations of the during trichlorosilane synthesis. Rather than heating to raise the temperature to vaporize chlorosilane compounds, and subsequently condensing the volatilized chlorosilane compounds, the present invention can involve increasing the solids concentration in the slurry stream by utilizing a non-condensable gas, such as hydrogen, to volatilize the chlorosilane components, which can consequently promote evaporative conditions that can reduce the slurry temperature. The lower slurry temperature results in a lower volatility of the metal salts, which reduces the likelihood of carryover to downstream unit operations. | 05-12-2011 |
20110129402 | Method of producing trichlorosilane (TCS) rich product stably from hydrogenation of silicon tetra chloride (STC) in fluidized gas phase reactor (FBR) and the structure of the reactor - A fluidized bed reactor (FBR) for producing chlorosilane mixture containing trichlorosilane (TCS) concentration at least 50% from hydrogenation of special metallurgical silicon (MGSI), which has manganese concentration less than 35 ppmw, silicon tetra chloride (STC), and the method of producing high TCS content chlorosilane mixture is disclosed. The FBR according to current application has an expanded over head zone, whose inner diameter is at least twice bigger than that of the inner diameter of the lower straight zone. Temperature of the reaction bed is controlled between 300° C. to 600° C. within the mean temperature deviation of ±5 C. Reaction pressure is maintained between 3 to 10 bar. Retention time of the STC and hydrogen in the reaction bed is controlled to be shorter than 30 seconds. The FBR of the current application enables higher STY (space time yield; production rate/volume of the reactor) of TCS compared to any other current commercial STC cold converter, which hydrogenise STC to TCS. | 06-02-2011 |
20110142742 | METHOD FOR PURIFICATION OF SILICON TETRACHLORIDE - An object of the present invention is to provide a method for purification of silicon tetrachloride which solves the problems of separating and removing organic chlorosilanes by distillation or adsorption. | 06-16-2011 |
20110150740 | Halogenated Polysilane and Plasma-Chemical Process for Producing the Same - The present invention relates to a halogenated polysilane as a pure compound or a mixture of compounds each having at least one direct Si—Si bond, whose substituents consist exclusively of halogen or of halogen and hydrogen and in the composition of which the atomic ratio of substituent to silicon is at least 1:1. | 06-23-2011 |
20110158883 | CATALYTIC HYDROGENATION - The invention relates to a method for the catalytic hydrogenation of halogenated silanes or halogenated germanes, according to which halogenated monosilanes, oligosilanes or polysilanes, or monogermanes, oligogermanes or polygermanes, are hydrogenated or partially hydrogenated with hydrogenated Lewis acid-base pairs, and the partially halogenated Lewis acid base pairs can be rehydrogenated, especially with further addition of H | 06-30-2011 |
20110158884 | Preparation Of Organohalosilanes and Halosilanes - A semi-continuous process for producing organohalosilanes or halosilanes in a fluidised bed reactor, from silicon-containing contact mass, comprising removing silicon-containing contact mass that has been used in said reactor by: (i) elutriation in an unreacted organohalide or hydrogen halide stream and/or an organohalosilane or halosilane product stream and (ii) direct removal using gravitational or pressure differential methods and returning removed silicon-containing contact mass to the fluidised bed reactor and/or fresh silicon-containing contact mass. When used for producing organohalosilanes (e.g. alkylhalosilanes) the silicon-containing contact mass may contain catalysts and promoters in addition to silicon. | 06-30-2011 |
20110158885 | HIGH PURITY CRYSTALLINE SILICON, HIGH PURITY SILICON TETRACHLORIDE AND PROCESSES FOR PRODUCING THE SAME - An object of the present invention is to provide more inexpensive high purity crystalline silicon which can satisfy not only a quality required to a raw material of silicon for a solar cell but also a part of a quality required to silicon for an up-to-date semiconductor and a production process for the same and provide high purity silicon tetrachloride used for production of high purity crystalline silicon and a production process for the same. The high purity crystalline silicon of the present invention has a boron content of 0.015 ppmw or less and a zinc content of 50 to 1000 ppbw. The production process for high purity crystalline silicon according to the present invention is characterized by that a silicon tetrachloride gas and a zinc gas are supplied to a vertical reactor to react them at 800 to 1200° C., whereby crude crystalline silicon is formed at a chip part of a silicon tetrachloride gas-supplying nozzle, and the crude crystalline silicon is grown downward from the chip part of the silicon tetrachloride gas-supplying nozzle; the grown crude crystalline silicon is discharged to an outside of the reactor, and the discharged crude crystalline silicon is subjected to acid treatment. | 06-30-2011 |
20110171098 | METHOD FOR PRODUCING NEOPENTASILANES - The invention relates to a method for producing neopentasilanes of the general formula (1) Si(SiR | 07-14-2011 |
20110182794 | METHOD FOR REMOVING TITANIUM FROM HEXACHLORODISILANE - The invention relates to a method for removing titanium compounds from hexachlorodisilane, wherein hexachloro-disilane is treated with an organic compound (V) which contains the structural units ≡C—S— or ≡C—O—. | 07-28-2011 |
20110200510 | Apparatus for producing trichlorosilane and method for producing trichlorosilane - An apparatus for producing trichlorosilane, including: a reaction vessel that has a substantially cylindrical wall body, a top plate, and a bottom plate, where a reaction product gas is produced from a raw gas supplied to the reaction vessel through a gas introducing passage provided to the lower section of the cylindrical wall body; and a plurality of heaters that are disposed inside the reaction vessel to heat the raw gas, wherein each of the heaters has a heating element that is elongated in a vertical direction and generates heat by electrification, and a mount that is fixed to the bottom plate and supports the heating element; a flange is provided to intermediate height of the heating element such that the flange is arranged upper than the gas introducing passage and is elongated in horizontal direction; and a passage of the raw gas formed between adjacent heaters is narrowed by the flange. | 08-18-2011 |
20110200511 | PROCESS FOR THE HYDROGENATION OF CHLOROSILANES AND CONVERTER FOR CARRYING OUT THE PROCESS - In a process for the hydrogenation of chlorosilanes, a gas mixture of a chlorosilane gas to be hydrogenated and hydrogen gas is heated in a reactor to temperatures in the range between 500° C. and 1800° C. The chlorosilane gas is thereby at least partially hydrogenated. The reactor is heated by way of at least one flame from a fire box surrounding the reactor for the purpose of heating the gas mixture. | 08-18-2011 |
20110200512 | METHOD FOR PRODUCING TRICHLOROSILANE AND METHOD FOR UTILIZING TRICHLOROSILANE - The present invention relates to a method for producing trichlorosilane. In this method for producing trichlorosilane, first, silicon tetrachloride and hydrogen are subjected to a conversion reaction at a temperature of equal to or higher than 1000° C. and equal to or lower than 1900° C., to produce a reaction gas containing trichlorosilane, dichlorosilylene, hydrogen chloride and high-order silane compounds, and then the reaction gas discharged from the conversion furnace is cooled to 600° C. or higher within 0.01 seconds from the initiation of cooling and to 500° C. or lower within 2 seconds. Subsequently, the reaction gas is maintained in a temperature range of equal to or higher than 500° C. and equal to or lower than 950° C. for a time period of equal to or longer than 0.01 seconds and equal to or shorter than 5 seconds. The reaction gas is further cooled to below 500° C. | 08-18-2011 |
20110229398 | FLUIDIZED BED REACTOR, THE USE THEREOF, AND A METHOD FOR THE ENERGY-INDEPENDENT HYDROGENATION OF CHLOROSILANES - The present invention relates to a device, to the use thereof, and to a method for the substantially energy-independent continuous production of chlorosilanes, particularly for the production of trichlorosilane as an intermediate product for yielding high-purity silicon. | 09-22-2011 |
20110236289 | CHLOROSILANE PRODUCTION METHOD - When a disproportionated chlorosilane is to be produced by causing a starting material chlorosilane liquid to flow through a catalyst-packed layer which is packed with a weakly basic anion exchange resin as a disproportionation reaction catalyst to carry out a disproportionation reaction, before the disproportionation reaction is carried out, the disproportionation reaction catalyst is brought into contact with a processing gas obtained by diluting a chlorosilane with an inert gas to prevent the deterioration of the disproportionation reaction catalyst at the start of the reaction so as to carry out the disproportionation of the chlorosilane efficiently. | 09-29-2011 |
20110243825 | TETRAHALOSILANE CONVERTER - A process of converting a tetrahalosilane into a trihalosilane is provided that includes: diluting the tetrahalosilane with hydrogen (H | 10-06-2011 |
20110250116 | Process for Producing Trichlorosilane and Tetrachlorosilane - A process for reducing waste and increasing yield of chlorosilane monomers is performed by cracking polychlorosiloxane and polychlorosilane by-products generated during production of trichlorosilane useful for the manufacture of polycrystalline silicon. | 10-13-2011 |
20110268641 | Process For Recovery Of High Boiling Waste - Waste streams from different chloromonosilane production processes are combined and reacted in a single recovery process. Useful monosilane species may be obtained with a single recovery process. | 11-03-2011 |
20110274608 | Process for purifying silicon source material by high gravity rotating packed beds - A process is disclosed for purification of silicon source material including trichlorosilane. First, the silicon source material in liquid state with impurities vapor and the other chlorosilane or silane are passing a first high gravity rotating packed bed with spongy metal, at a temperature lower than the boiling point of the silicon source material, the impurities vapor and the other chlorosilane or silane are separated from the liquid silicon source material; second, the silicon source material in liquid state is fed to a second high gravity rotating packed bed, oxygen is also fed to the second high gravity rotating packed bed to form impurity containing siloxane complexes with higher boiling point. Finally distilling to remove the impurity containing siloxane complexes from the silicon source material. | 11-10-2011 |
20110305621 | Method Of Continuously Producing Tetrafluorosilane By Using Various Fluorinated Materials, Amorphous Silica And Sulfuric Acid - The present invention relates to a method of continuously producing tetrafluorosilane (SiF | 12-15-2011 |
20120070361 | METHOD FOR COLLECTION OF HEXACHLORODISILANE AND PLANT FOR THE METHOD - Disclosed is a method for collecting hexachlorodisilane which is produced as a by-product in the production of trichlorosilane from tetrachlorosilane and hydrogen. The method has the steps of: reacting a source gas composed of vaporized trichlorosilane and hydrogen at a temperature ranging from 700 to 1400° C. to yield a reaction product gas; cooling the reaction product gas to a temperature ranging from 30 to 60° C. to yield a cooled condensate liquid containing hexachlorodisilane; and concentrating and collecting a high boiling material containing hexachlorodisilane from the cooled condensate liquid. | 03-22-2012 |
20120076714 | Heater and Related Methods Therefor - The invention relates generally to heaters and methods of using the heaters. In certain embodiments, a heater includes a pressure shell having a cylindrical heating cavity, an annular heat shield disposed within the cylindrical heating cavity, and at least one heating element disposed within an interior volume of the annular heat shield. In another embodiment, a method of preparing a trichlorosilane includes introducing a reactant stream comprising silicon tetrachloride into a heater, passing electrical current through a heating element to heat the reactant stream, and introducing the heated reactant stream into a reactor. | 03-29-2012 |
20120082609 | METHOD FOR PRODUCING TRICHLOROSILANE WITH REDUCED BORON COMPOUND IMPURITIES - The present invention relates to a method for producing trichlorosilane having a reduced amount of boron compounds. The method including: (A) reacting metallurgical grade silicon with hydrogen chloride in a fluidized-bed reactor to produce a reaction gas including trichlorosilane; (B) first distilling the reaction gas, for separating first vapor fractions and first residue fractions, by setting a distillation temperature at a top of a distillation column between about a boiling point of trichlorosilane and about a boiling point of tetrachlorosilane and feeding the first vapor fractions to a second distillation column; (C) second distilling, for separating the trichlorosilane and second vapor fractions including boron compounds, by setting a distillation temperature at a top of the distillation column between about a boiling point of dichlorosilane and about a boiling point of trichlorosilane; and (D) feeding back the second vapor fractions to the fluidized-bed reactor. | 04-05-2012 |
20120082610 | Fluorspar/Iodide process for reduction,purificatioin, and crystallization of silicon - Method and apparatus for producing molten purified crystalline silicon from low-grade siliceous fluorspar ore, sulfur trioxide gas, and a metallic iodide salt. Method involves: (1) initially reacting silicon dioxide-bearing fluorspar ore and sulfur trioxide gas in sulfuric acid to create silicon tetrafluoride gas and fluorogypsum; (2) reacting the product gas with a heated iodide salt to form a fluoride salt and silicon tetraiodide; (3) isolating silicon tetraiodide from impurities and purifying it by washing steps and distillation in a series of distillation columns; (4) heating the silicon tetraiodide to its decomposition temperature in a silicon crystal casting machine, producing pure molten silicon metal ready for crystallization; and pure iodine gas, extracted as liquid in a cold-wall chamber. The system is batch process-based, with continuous elements. The system operates largely at atmospheric pressure, requiring limited inert gas purges during batch changes. | 04-05-2012 |
20120100057 | PROCESS FOR THE PREPARATION OF DODECAHALONEOPENTASILANES - The invention relates to a method for producing neopentasilanes of the general formula (1) Si(SiR | 04-26-2012 |
20120107216 | HYDROCHLORINATION HEATER AND RELATED METHODS THEREFOR - The systems and method of the invention involve hydrochlorination by providing feed streams with suitable reaction conditions through reactant stream conditioning systems and components. The conditioning systems facilitate vaporization of silicon tetrachloride in gaseous hydrogen to produce a reactant stream comprising hydrogen that is saturated with silicon tetrachloride. Saturation can be effected without the use of superheated steam or hot oil by utilizing saturated steam that is less than about 15 bar. The saturated reactant stream can be further heated to reaction conditions that effect conversion to trichlorosilane. | 05-03-2012 |
20120107217 | METHOD FOR PRODUCING OLIGOHALOGEN SILANES - The invention relates to a method for producing oligohalogen silanes, selected from oligohalogen silanes of the general formulas (1) and (2): Si | 05-03-2012 |
20120114544 | ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM - Provided is an organic chlorohydrosilane, a useful starting material for preparing silicon polymers and a method for preparing the same. More particularly, the present invention enables the synthesis of various novel organic chlorohydrosilanes in high yield by an exchange reaction between an Si—H bond of a chlorosilane which can be obtained in an inexpensive and easy manner and an Si—Cl bond of an another organic chlorosilane using a quaternary organic phosphonium salt compound as a catalyst. Since the catalyst can be recovered after its use and reused, the present invention is very economical and thus effective for mass-producing silicon raw materials. | 05-10-2012 |
20120128567 | PROCESS FOR WORKUP OF LIQUID RESIDUES OF THE DIRECT SYNTHESIS OF ORGANOCHLOROSILANES - The invention provides a process for thermal cleavage of the high-boiling residues of the direct Müller-Rochow synthesis to give silanes with hydrogen chloride in a fluidized bed of silicon dioxide-containing, aluminum-free particles. | 05-24-2012 |
20120148471 | METHOD FOR PURIFYING CHLOROSILANE - A method for purifying a crude chlorosilane containing a boron compound, which is characterized by comprising a step wherein a chlorosilane containing a boron compound is brought into contact with an ion-exchange resin, and a step wherein the chlorosilane containing a boron compound is brought into contact with a silica adsorbent. It is preferable that the crude chlorosilane is brought into contact with the ion-exchange resin first, and then brought into contact with the silica adsorbent. In this connection, a silica gel is preferable as the silica absorbent, and a resin having a functional group represented by the following general formula: —CH | 06-14-2012 |
20120164053 | APPARATUS FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING TRICHLOROSILANE - An apparatus for producing trichlorosilane in which metallurgical grade silicon powder supplied to a reactor is reacted with hydrogen chloride gas while being fluidized by the hydrogen chloride gas, thereby discharging trichlorosilane generated by the reaction from the reactor, includes: a plurality of gas flow controlling members which are installed along a vertical direction in an annular shape R from an inner peripheral wall of the reactor in an internal space of the reactor; and a heat transfer tube which is installed along the vertical direction in the annular space R and through which a heating medium passes. | 06-28-2012 |
20120171100 | Process for hydrogenation of a silicon tetrahalide and silicon to trihalosilane - A process of hydrogenation of a silicon tetrahalide and silicon to a trihalosilane comprising: providing a vessel with at least one inlet and one outlet with a plurality of silicon particles located in a bed inside the vessel and feeding a mixture of gases consisting primarily of a silicon tetrahalide and hydrogen. A calculational procedure is provided where the flow rate of the gases and the incoming size of the silicon particulates are chosen so that at least 90% of the volume of the bed is free of bubbles after allowance for decrease in particle size due to the reaction and attrition resulting in a higher yield of the trihalosilane. | 07-05-2012 |
20120177557 | PROCESS FOR TREATING CATALYST PRECURSORS - The invention relates to a process for treating a substantially water-containing amino-functional, polymeric catalyst precursor while retaining the inner porous structure thereof and the outer spherical form thereof to form a catalyst, in which the catalyst precursor is treated at mild temperatures and under reduced pressure to prepare a catalyst having a water content below 2.5% by weight. The process is preferably integrated into an industrial scale process for preparing dichlorosilane, monosilane, silane, or solar silicon or semiconductor silicon from silanes. | 07-12-2012 |
20120183464 | PROCESS AND USE OF AMINO-FUNCTIONAL RESINS FOR DISMUTATING HALOSILANES AND FOR REMOVING EXTRANEOUS METALS - The invention relates to a process for dismutating at least one halosilane and reducing the content of extraneous metal and/or a compound containing extraneous metal in the at least one halosilane and in the at least one silane obtained, by contacting at least one halosilane of the general formula I, H | 07-19-2012 |
20120183465 | PLANT AND PROCESS FOR PREPARING MONOSILANE - A plant and a process prepare monosilane (SiH | 07-19-2012 |
20120189526 | PROCESS AND PLANT FOR PREPARING TRICHLOROSILANE - A process for preparing trichlorosilane includes reacting silicon particles with tetrachlorosilane and hydrogen and optionally with hydrogen chloride in a fluidized-bed reactor to form a trichlorosilane-containing product gas stream, where the trichlorosilane-containing product gas stream is discharged from the reactor via an outlet preceded by at least one particle separator which selectively allows only silicon particles up to a particular maximum size to pass through and silicon particles are discharged from the reactor at preferably regular intervals or continuously via at least one further outlet without such a particle separator. | 07-26-2012 |
20120207661 | APPARATUS FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING TRICHLOROSILANE - An apparatus for producing tichlorosilane includes: a decomposing furnace, a heating unit heating the inside of the decomposing furnace, a raw material supplying tube for guiding polymer and hydrogen chloride to be guided to the inner bottom portion of the decomposing furnace, and a gas discharge tube for discharging reaction gas from the top of the reaction chamber provided between the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace, a fin, which guides a fluid mixture of the polymer and the hydrogen chloride supplied from the lower end opening of the raw material supplying tube to be agitated and rise upward in the reaction chamber, and is formed integrally with at least one of the outer peripheral surface of the raw material supplying tube and the inner peripheral surface of the decomposing furnace. | 08-16-2012 |
20120213687 | METHOD FOR MANUFACTURING TRICHLOROSILANE - A method for manufacturing trichlorosilane in which hydrogen chloride and polymers including high-boiling chlorosilanes generated in a polycrystalline silicon manufacture process, a trichlorosilane manufacture process, or a conversion process are introduced into a decomposition furnace and are decomposition reacted at a high temperature, the method including: heating the decomposition furnace and a fin provided in the decomposition furnace; supplying the polymers and the hydrogen chloride to the decomposition furnace from an upper portion thereof so as to react the polymers and the hydrogen chloride by leading to an inner-bottom portion of the decomposition furnace while heating and stirring; and discharging a reacted gas from the inner-bottom portion upwardly above the decomposition furnace through a center of the decomposition furnace. | 08-23-2012 |
20120230901 | PROCESS FOR PRODUCTION OF SILICON TETRACHLORIDE - An aspect of a process for producing silicon tetrachloride comprises chlorinating a silicon-containing substance, preferably a silicon-containing substance that contains a silicic acid biomass, in the presence of a carbon-containing substance that contains ash produced in an industrial process, preferably ash produced in a power-generating facility in which an organic material is combusted and a combustion energy produced is converted into an electric power. | 09-13-2012 |
20120244059 | METHOD FOR MANUFACTURING SILICON TETRACHLORIDE AND METHOD FOR MANUFACTURING SILICON FOR USE IN A SOLAR CELL - In one aspect of a method for producing silicon tetrachloride comprises a step in which a silicon-containing substance that contains zeolite or preferably spent zeolite, is used for chlorination in the presence of a carbon containing substance. | 09-27-2012 |
20120275982 | REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING TRICHLOROSILANE - A reaction apparatus for producing trichlorosilane in which metal silicon powder M is reacted with hydrogen chloride gas, thus generating trichlorosilane, includes: an apparatus body into which the metal silicon powder is supplied; and an ejection port for ejecting the hydrogen chloride gas into the apparatus body from the bottom part of the apparatus body, wherein a plurality of holed pieces having a through hole penetrating in the thickness direction and a plurality of pellets interposed between these holed pieces are stacked in a mixed state on the upper side of the ejection port. | 11-01-2012 |
20120301385 | PROCESS FOR PRODUCING TRICHLOROSILANE - [Problems] To provide a process for efficiently producing trichlorosilane on an industrial scale by efficiently reusing the waste gas of after trichlorosilane is separated by condensation from the gas that is formed by the reaction of metallic silicon with hydrogen chloride. | 11-29-2012 |
20120308464 | METHOD AND DEVICE FOR PRODUCING SHORT-CHAIN HALOGENATED POLYSILANES - A method and a device produce short-chain halogenated polysilanes and/or short-chain halogenated polysilanes and halide-containing silicon by thermolytic decomposition of long-chain halogenated polysilanes. The thermolytic decomposition of long-chain halogenated polysilanes diluted with low-molecular halosilanes is carried out under an atmosphere of halosilanes, thereby ensuring the production of such products at industrial scale in a simple and cost-effective manner. | 12-06-2012 |
20120308465 | METHOD FOR PRODUCING TRICHLOROSILANE BY THERMAL HYDRATION OF TETRACHLOROSILANE - Efficient production of trichorosilane from tetrachlorosilane and hydrogen is effected by reaction at high temperatures over short residence times followed by rapidly cooling the product mixture in a heat exchanger, recovered heat being employed to heat the reactant gases, which are then fed to the reactor in a heated state. | 12-06-2012 |
20120328503 | Apparatus and Methods for Conversion of Silicon Tetrachloride to Trichlorosilane - The invention relates to apparatus and associated methods for conversion of silicon tetrachloride (STC) to trichlorosilane (TCS). The converter features a relatively thin annular heating zone surrounding a reaction chamber. Within the annular heating zone is a heating element that has an annular conformation about the reaction chamber. The design allows high convective heat transfer, which facilitates the use of lower heating element surface temperatures, prolonging the life of the equipment, reducing capital cost by allowing use of a smaller reactor, and greatly improving heating efficiency. A heat exchanger with a plurality of heat exchanger blocks provides further efficiency. | 12-27-2012 |
20130004404 | METHOD FOR MANUFACTURING TRICHLOROSILANE - This method for manufacturing trichlorosilane, includes: reacting metallurgical grade silicon with silicon tetrachloride and hydrogen so as to obtain a reaction gas; condensing the reaction gas so as to obtain a condensate; and distilling the condensate using a distillation system including a first distillation column and a secondary distillation column so as to refine trichlorosilane. While maintaining the condensate in a high temperature state so that a concentration of aluminum chloride in the condensate becomes in a range of a saturation solubility or less, the condensate flows to the first distillation column. A liquid distilled in the first distillation column is distilled by the secondary distillation column so as to refine trichlorosilane. A liquid in which aluminum chloride is concentrated is extracted from a bottom portion of the first distillation column. The extracted liquid is concentrated and dried, and then aluminum chloride is exhausted. | 01-03-2013 |
20130017138 | METHOD FOR PRODUCING HEXACHLORODISILANEAANM Auner; NorbertAACI GlashuettenAACO DEAAGP Auner; Norbert Glashuetten DEAANM Bauch; ChristianAACI MuldensteinAACO DEAAGP Bauch; Christian Muldenstein DEAANM Holl; SvenAACI GueckingenAACO DEAAGP Holl; Sven Gueckingen DEAANM Deltschew; RumenAACI LeipzigAACO DEAAGP Deltschew; Rumen Leipzig DEAANM Mohsseni; JavadAACI Bitterfeld-WolfenAACO DEAAGP Mohsseni; Javad Bitterfeld-Wolfen DEAANM Lippold; GerdAACI LeipzigAACO DEAAGP Lippold; Gerd Leipzig DEAANM Gebel; ThoralfAACI DresdenAACO DEAAGP Gebel; Thoralf Dresden DE - A method produces hexachlorodisilane. Hexachlorodisilane is obtained by oxidative splitting of the chlorinated polysilane of the empirical formula SiClx (x=0,2-0,8) using chlorine gas. The hexachlorodisilane is selectively obtained with a high yield. | 01-17-2013 |
20130039831 | METHOD OF PREPARING A HYDRIDOHALOSILANE COMPOUND - A method of preparing a hydridohalosilane compound comprises treating a preformed metal silicide with a mixture comprising hydrogen gas and a silicon tetrahalide to prepare the hydridohalosilane compound. | 02-14-2013 |
20130078176 | FLOW TUBE REACTOR FOR CONVERSION OF SILICON TETRACHLORIDE TO TRICHLOROSILANE - The invention relates to a method for converting silicon tetrachloride having hydrogen to trichlorosilane in a hydrodechlorination reactor, wherein the hydrodechlorination reactor is operated under pressure and comprises one or more reactor tubes which are made of a ceramic material. The invention further relates to the use of such a hydrodechlorination reactor as an integral component of a system for producing trichlorosilane from metallurgical silicon. | 03-28-2013 |
20130095026 | CLOSED LOOP PROCESS FOR PREPARING TRICHLOROSILANE FROM METALLURGICAL SILICON - The present invention relates to a multistage process for preparing trichlorosilane and silicon tetrachloride from metallurgical silicon, in which trichlorosilane and silicon tetrachloride are prepared from metallurgical silicon in a first step, and the silicon tetrachloride is processed further to the trichlorosilane end product in a second step. The present invention further relates to a plant in which such processes can be performed in an integrated manner. | 04-18-2013 |
20130101489 | FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION - Embodiments of a method for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient trichlorosilane is included in a silicon tetrachloride process stream to minimize hydrogen chloride formation, thereby inhibiting iron (II) chloride formation and reducing iron silicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof. | 04-25-2013 |
20130121907 | Purification of Trichlorosilane - Systems and methods for removing boron-containing contaminants from a composition comprising trichlorosilane to form a purified product comprising trichlorosilane are disclosed. Purification columns and devices, having various locations of inlet and outlet ports, are fluidly connected to each other in order to remove various types of boron species and other impurities present in TCS. | 05-16-2013 |
20130121908 | METHOD FOR PRODUCING TRICHLOROSILANE WITH REDUCED BORON COMPOUND IMPURITIES - The present invention relates to a method for producing trichlorosilane having a reduced amount of boron compounds. The method including: (A) reacting metallurgical grade silicon with hydrogen chloride in a fluidized-bed reactor to produce a reaction gas including trichlorosilane; (B) first distilling the reaction gas, for separating first vapor fractions and first residue fractions, by setting a distillation temperature at a top of a distillation column between about a boiling point of trichlorosilane and about a boiling point of tetrachlorosilane and feeding the first vapor fractions to a second distillation column; (C) second distilling, for separating the trichlorosilane and second vapor fractions including boron compounds, by setting a distillation temperature at a top of the distillation column between about a boiling point of dichlorosilane and about a boiling point of trichlorosilane; and (D) feeding back the second vapor fractions to the fluidized-bed reactor. | 05-16-2013 |
20130142722 | METHOD FOR PRODUCTION OF TRICHLOROSILANE AND SILICON FOR USE IN THE PRODUCTION OF TRICHLOROSILANE - The present invention relates to a method for the production of trichlorosilane by reaction of silicon with HCl gas at a temperature between 250° and 1100° C., and an absolute pressure of 0.5-30 atm in a fluidized bed reactor, in a stirred bed reactor or a solid bed reactor, where the silicon supplied to the reactor contains between 40 and 10.000 ppm by weight barium and optionally 40-10000 ppm by weight copper The invention further relates to silicon for use in the production of trichlorosilane by reaction of silicon with HCl gas, containing between 40 and 10.000 ppm by weight barium and optionally 40-10000 ppm by weight copper, the remaining except for normal impurities being silicon. | 06-06-2013 |
20130156675 | PROCESS FOR PRODUCTION OF SILANE AND HYDROHALOSILANES - Embodiments of a system and process for the production of ultra-high purity silane and hydrohalosilanes of the general formula H | 06-20-2013 |
20130156676 | Method for Preparing a Trihalosilane - A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane. | 06-20-2013 |
20130216464 | CATALYTIC SYSTEMS FOR CONTINUOUS CONVERSION OF SILICON TETRACHLORIDE TO TRICHLOROSILANE - The invention relates to an improved method for converting silicon tetrachloride having hydrogen in a hydrodechlorination reactor comprising a catalyst. The invention further relates to a catalytic system for such a hydrodechlorination reactor. | 08-22-2013 |
20130216465 | POLYSILANES OF MEDIUM CHAIN LENGTH AND A METHOD FOR THE PRODUCTION OF SAME - Polysilanes of medium chain length as pure compounds or a mixture of compounds, each having at least one direct Si—Si bond, the substituents of the polysilanes consisting exclusively of halogen and/or hydrogen, the medium chain length n thereof being greater than 3 and smaller than 50, and the atomic ratio of substituent:silicon in the composition thereof being at least 1:1. | 08-22-2013 |
20130224098 | USE OF A REACTOR WITH INTEGRATED HEAT EXCHANGER IN A PROCESS FOR HYDRODECHLORINATING SILICON TETRACHLORIDE - The invention relates to a method for converting silicon tetrachloride by means of hydrogen to form trichlorosilane in a modified hydrodechlorination reactor. The invention further relates to a the use of such a modified hydrodechlorination reactor as an integrated component of a system for producing trichlorosilane from metallurgical silicon. | 08-29-2013 |
20130251617 | Method of Making a Trihalosilane - A method of making a trihalosilane comprising contacting an organotrihalosilane according to the formula RS1X3 (I), wherein R is C | 09-26-2013 |
20130259790 | PROCESS FOR PREPARING HIGHER HALOSILANES AND HYDRIDOSILANES - The invention relates to a process for preparing higher halosilanes by disproportionation of lower halosilanes. The invention further relates to a process for preparing higher hydridosilanes from the higher halosilanes prepared by disproportionation. The invention further relates to mixtures containing at least one higher halosilane or at least one higher hydridosilane prepared by the process described. Finally, the invention relates to the use of such a mixture containing at least one higher hydridosilane for producing electronic or optoelectronic component layers or for producing silicon-containing layers. | 10-03-2013 |
20130259791 | PROCESS FOR PREPARING HYDRIDOSILANES - The present invention relates to a process for preparing hydridosilanes from halosilanes, in which a) i) at least one halosilane of the generic formula Si | 10-03-2013 |
20130272946 | HYDROGEN CHROLIDE GAS EJECTING NOZZLE, REACTION APPARATUS FOR PRODUCING TRICHLOROSILANE AND METHOD FOR PRODUCING TRICHLOROSILANE - There is provided a hydrogen chrolide gas ejecting nozzle 1 used in a reaction apparatus for producing trichlorosilane in which metal silicon powder is reacted with hydrogen chloride gas to generate trichlorosilane. The member is provided with a shaft portion extending in the longitudinal direction and a head portion that is provided on an end of the shaft portion and extends in a direction intersecting the longitudinal direction of the shaft portion. A supply hole extending in the longitudinal direction is formed in the shaft portion, a plurality of ejection holes are formed in the head portion, and each of the ejection holes is communicatively connected to the supply hole and opened on the outer surface of the head portion toward a direction intersecting the direction to which the supply hole extends. | 10-17-2013 |
20130287668 | PROCESS AND APPARATUS FOR CONVERSION OF SILICON TETRACHLORIDE TO TRICHLOROSILANE - A process for hydrogenating chlorosilanes in a reactor, wherein at least two reactant gas streams are introduced separately from one another into a reaction zone, wherein the first reactant gas stream comprising silicon tetrachloride is conducted via a first heat exchanger unit in which it is heated and is then conducted through a heating unit which heats it to a first temperature before the first reactant gas stream reaches the reaction zone, and wherein the second reactant gas stream comprising hydrogen is heated by a second heat exchanger unit to a second temperature, wherein the first temperature is greater than the second temperature, and then introduced into the reaction zone, such that the mixing temperature of the two reactant gas streams in the reaction zone is between 850° C. and 1300° C., and said reactant gas streams react to give product gases comprising trichlorosilane and hydrogen chloride, wherein the product gases obtained in the reaction are conducted through said at least two heat exchanger units and preheat the reactant gas streams of the reaction by the countercurrent principle, wherein the flow passes first through the first heat exchanger unit and then through the second heat exchanger unit. A reactor for hydrogenating chlorosilanes, comprising two gas inlet devices through which reactant gases can be introduced separately from one another into the reactor, and at least one gas outlet device through which a product gas stream can be conducted, at least two heat exchanger units which are connected to one another and which are suitable for heating reactant gases separately from one another by means of the product gases conducted through the heat exchanger units, and a heating zone which is arranged between a first heat exchanger unit and a reaction zone and in which there is at least one heating element. | 10-31-2013 |
20130294995 | SELECTIVE SPLITTING OF HIGH ORDER SILANES - The invention relates to a process for preparing monomeric and/or dimeric halogen- and/or hydrogen-containing silicon compounds from oligomeric inorganic silanes having three or more directly covalently interconnected silicon atoms substituted by substituents selected from halogen, hydrogen and/or oxygen by reacting the oligomeric silane over a nitrogen-containing catalyst in the presence of hydrogen halide. | 11-07-2013 |
20130294996 | Method For Treating Substrates With Halosilanes - A method for treating substrates to render them hydrophobic includes penetrating the substrate with a halosilane vapor. | 11-07-2013 |
20130323151 | MONOCHLOROSILANE, PROCESS AND APPARATUS FOR THE PREPARATION THEREOF - The invention relates to a process for preparing monochlorosilane by reaction of monosilane and dichlorosilane in the presence of a catalyst. In the process of the invention, monochlorosilane is formed by comproportionation of monosilane and dichlorosilane. The invention further relates to the use of the monochlorosilane produced and also a plant for carrying out the process. | 12-05-2013 |
20140017155 | PROCESS FOR PREPARING TRICHLOROSILANE - The present invention relates to a process for preparing trichlorosilane and optionally, if required, HCDS and OCTS, by a) in a first step, allowing silicon tetrachloride and silicon to react at a temperature of >800 to 1450° C., b) in a step two, cooling the product stream (PS) thus obtained from step one to obtain a product stream (PG2), c) optionally, in a step three, removing STC and HCDS from the product stream (PG2) to obtain, as a residue or bottom product, a product mixture (PG3), d) optionally, in a step four, removing OCTS from the product stream PG3 from step three, to obtain, as a residue or bottom product, a product mixture (PG4), e) in a step five, reacting the product stream (PG2) originating from step two or the product mixture (PG3) originating from step three or the product mixture (PG4) originating from step four, or a mixture of product streams PG2 and PG3 or a mixture of product streams PG2 and PG4 with hydrogen chloride to obtain a product stream (PHS), and f) in a subsequent step six, removing trichlorosilane from a product stream (PHS) thus obtained, and discharging the remaining STC-containing bottoms or recycling them as a reactant component into step one of the process. | 01-16-2014 |
20140050648 | PREPARATION OF CHLOROSILANES FROM VERY FINELY DIVIDED ULTRA-PURE SILICON - The invention provides a process and apparatus for preparing chlorosilane from the reaction of very finely divided ultra-pure silicon with hydrogen chloride, the very finely divided ultra-pure silicon being fed into a solid bed of metallurgical silicon, the feed line for ultra-pure silicon and the fixed bed having a certain minimum temperature. | 02-20-2014 |
20140086815 | USE OF SILICON CARBIDE TUBES WITH A FLANGED OR FLARED END - The invention relates to the use of a ceramic tube composed of silicon carbide variants in processes for converting chlorosilanes, wherein the tube has a flange or a flare at one end and is closed at the other end. | 03-27-2014 |
20140086816 | USE OF BURNERS WITH A JET TUBE IN REACTORS FOR CONVERSION OF CHLOROSILANES - The invention provides for the use of a particular burner design to heat reactors for conversion of chlorosilanes, wherein the burner has a jet tube and the jet tube surrounds the flame and the flame tube in a gastight manner, as a result of which the combustion air, the gaseous and/or liquid fuels, and also the flue gases cannot get into the reaction furnace space. The advantage is the complete separation of the flue gas from the actual interior of the reaction furnace, which prevents critical interactions between flue gas moisture and chlorosilanes in the case of fracture of the arrangement accommodating the chlorosilanes. This in turn makes it possible to use gaseous or liquid fuels to heat such a reaction furnace. Excessive local input of heat as a result of direct flame contact is prevented; the heat input is homogenized. | 03-27-2014 |
20140105804 | REACTOR AND PROCESS FOR ENDOTHERMIC GAS PHASE REACTION IN A REACTOR - The invention provides a process for endothermic gas phase reaction in a reactor, in which reactant gases are introduced into the reactor via a gas inlet apparatus and distributed homogeneously into a heating zone by means of a gas distribution apparatus, wherein the reactant gases are heated in the heating zone to a mean temperature of 500-1500° C. by means of heating elements and then conducted into a reaction zone, the reactant gases reacting in the reaction zone to give a product gas which is conducted out of the reactor via a gas outlet apparatus. Further subject matter of the invention relates to a process for endothermic gas phase reaction in a reactor, wherein the heating of the heating elements is controlled by temperature measurements in the reaction zone, at least two temperature sensors being present in the reaction zone for this purpose, and reactor for performance of the process. | 04-17-2014 |
20140105805 | PROCESS FOR HYDROGENATING SILICON TETRACHLORIDE TO TRICHLOROSILANE - The invention provides a process for hydrogenating silicon tetrachloride in a reactor, in which reactant gas containing hydrogen and silicon tetrachloride is heated to a temperature of greater than 900° C. at a pressure between 4 and 15 bar, first by means of at least one heat exchanger made from graphite and then by means of at least one heating element made from SiC-coated graphite, the temperature of the heating elements being between 1150° C. and 1250° C., wherein the reactant gas includes at least one boron compound selected from the group consisting of diborane, higher boranes, boron-halogen compounds and boron-silyl compounds, the sum of the concentrations of all boron compounds being greater than 1 ppmv based on the reactant gas stream. | 04-17-2014 |
20140170050 | PROCESS FOR CONVERTING SILICON TETRACHLORIDE TO TRICHLOROSILANE - The invention relates to a process for converting silicon tetrachloride (STC) to trichlorosilane (TCS), by introducing reactant gas containing STC and hydrogen into a reaction zone of a reactor in which the temperature is 1000-1600° C., wherein the reaction zone is heated by a heater located outside the reaction zone and the product gas containing TCS which forms is then cooled, with the proviso that it is cooled to a temperature of 700-900° C. within 0.1-35 ms, wherein the reactant gas is heated by the product gas by means of a heat exchanger working in countercurrent, wherein reactor and heat exchanger form a single, gas-tight component, wherein the component includes one or more ceramic materials selected from the group consisting of silicon carbide, silicon nitride, graphite, SiC-coated graphite and quartz glass. | 06-19-2014 |
20140178283 | HYDROGENATION OF ORGANOCHLOROSILANES AND SILICON TETRACHLORIDE - The invention relates to a process for preparing trichlorosilane, characterized in that hydrogen and at least one organic chlorosilane are reacted in a reactor which is operated under superatmospheric pressure and comprises one or more reactor tubes which consist of a gastight ceramic material. | 06-26-2014 |
20140178284 | METHOD FOR PRODUCING HIGHER SILANES WITH IMPROVED YIELD - The invention relates to a method for producing hexachlorodisilane or Ge2CI6, which is characterized in that, in a gas containing SiCI4 or GeCI4, a) a non-thermal plasma is generated by means of an alternating voltage of the frequency f, and wherein at least one electromagnetic pulse having the repetition rate g is coupled into the plasma, the voltage component of which pulse has an edge steepness in the rising edge of 10 V ns-1 to 1 kV ns-1 and a pulse width b of 500 ns to 100 μs, wherein a liquid phase is obtained, and b) pure hexachlorodisilane or Ge2Cl6 is obtained from the liquid phase. | 06-26-2014 |
20140193321 | METHOD FOR PRODUCING HIGHER SILANES - The invention relates to a method for producing dimeric and/or trimeric silicon compounds, in particular silicon halogen compounds. The claimed method is also suitable for producing corresponding germanium compounds. The invention also relates to a device for carrying out said method to the use of the produced silicon compounds. | 07-10-2014 |
20140212352 | INTEGRATED PROCESS FOR CONVERSION OF STC-CONTAINING AND OCS-CONTAINING SIDESTREAMS INTO HYDROGEN-CONTAINING CHLOROSILANES - The invention relates to a process for producing a product gas mixture containing hydrogen-containing chlorosilanes within an integrated process by hydrogenating integrated process by-product silicon tetrachloride and organochlorosilane, more particularly methyltrichlorosilane, with hydrogen in a pressurized hydrogenation reactor comprising one or more reaction spaces each consisting of a reactor tube of gastight ceramic material, wherein the product gas mixture is worked up and at least a portion of at least one product of the product gas mixture is used as starting material for the hydrogenation or as starting material for some other process within the integrated process. The invention further relates to an integrated system useful for practising the integrated process. | 07-31-2014 |
20140234197 | METHOD FOR PRODUCING CHLOROPOLYSILANE AND FLUIDIZED-BED REACTOR - Disclosed is a method for producing chloropolysilane by which the yield of a fluid reaction to produce the chloropolysilane is improved while blockage in a reactor caused by attachment of higher-order silicon chloride as a by-product is prevented. In producing the chloropolysilane by reacting fluidized silicon particles or silicon alloy particles with a chlorine gas, an outlet filter is provided, upstream from a product outlet that releases a reaction product, above the area in which the silicon particles or silicon alloy particles are fluidized inside a reaction tank. The outlet filter prevents fine particles blown up by fluidization from flowing out of the reaction tank through the product outlet. A temperature of the outlet filter is set in a range of 210 to 350° C. | 08-21-2014 |
20140286848 | Reactor Design for Reacting Organochlorosilanes and Silicon Tetrachloride to Obtain Hydrogen-Containing Chlorosilanes - The invention relates to a process for producing hydrogen-containing chlorosilanes by reducing Si-based deposits of solid material during the operation of a pressurised reactor comprising one or more reaction spaces, wherein at least one organochlorosilane is reacted with hydrogen in at least one of these reaction spaces for at least some of the time, characterized in that at least one of the optionally two or more reaction spaces in which this reaction takes place is supplied with additional HCl for at least some of the time. The additional HCl is preferably produced by hydrodehalogenation of silicon tetrachloride with hydrogen in at least one of the optionally two or more reaction spaces of the reactor. | 09-25-2014 |
20140314655 | CORROSION AND FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION - Methods for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient hydrogen is added to a silicon tetrachloride process stream to inhibit iron (II) chloride formation and reduce iron suicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof. Trichlorosilane also may be added to the silicon tetrachloride process stream. | 10-23-2014 |
20140322121 | PROCESSES AND SYSTEMS FOR NON-EQUILIBRIUM TRICHLOROSILANE PRODUCTION - A catalytic process for converting silicon tetrachloride (STC) into trichlorosilane (TCS) utilizes a metal catalyst such as metal silicide at a low temperature such as 500C, where the STC is reacted with hydrogen gas in the presence of catalyst and under non-thermal equilibrium conditions, to provide for a product gas stream that includes TCS at levels exceeding those obtained at thermal equilibrium, as well as optionally including HCl and unreacted STC. | 10-30-2014 |
20140335007 | Method for preparing a trihalosilane - A method of preparing a trihalosilane comprising the separate and consecutive steps of (i) contacting a copper catalyst with hydrogen gas and a silicon tetrahalide at a temperature of from 500 to 1400° C. to form a silicon-containing copper catalyst comprising at least 0.1% (w/w) of silicon, wherein the copper catalyst comprises a metal selected from copper and a mixture comprising copper and at least one element selected from gold, magnesium, and platinum; and (ii) contacting the silicon-containing copper catalyst with a hydrogen halide at a temperature of from 100 to 600° C. to form a trihalosilane. | 11-13-2014 |
20150030520 | TRICHLOROSILANE PRODUCTION - A process that includes combining hydrogen chloride, metallurgical grade silicon and a third gas, e.g., tetrachlorosilane, in a reactor, under reaction conditions that include a temperature of 250-400 C. and a pressure of 2-33 barg, for a time sufficient to convert metallurgical grade silicon to an exit gas that includes trichlorosilane. | 01-29-2015 |
20150329367 | METHOD FOR PREPARING TRICHLOROSILANE - The present invention relates to a method for preparing trichlorosilane. According to the method for preparing trichlorosilane of the present invention, trichlorosilane may be obtained with improved yield using silicon where copper silicide is formed. | 11-19-2015 |
20150344314 | METHOD FOR PRODUCING TRICHLOROSILANE - The present invention relates to a method for producing trichlorosilane. The method includes dispersing metal silicon particles in liquid silane-based compounds containing tetrachlorosilane and optionally reacting the metal silicon particles with hydrogen chloride in the presence of hydrogen gas. | 12-03-2015 |
20160002052 | METHOD FOR PRODUCING TRICHLOROSILANE - In order to produce high-purity trichlorosilane by removing methyldichlorosilane from a mixture (S) containing methyldichlorosilane (CH | 01-07-2016 |
20160002053 | RECOVERY OF HYDROHALOSILANES FROM REACTION RESIDUES - Methods of recovering hydrohalosilanes from reaction residues are disclosed. An inorganic halosilane slurry comprising (i) tetrahalosilane, trihalosilane, dihalosilane, or any combination thereof, (ii) silicon particles, and (iii) heavies is passed through a thin-film dryer to remove halosilanes and form a solid residue comprising silicon particles. Heavies also may be removed as the slurry passes through the thin-film dryer. | 01-07-2016 |
20160008784 | TEMPERATURE MANAGEMENT IN CHLORINATION PROCESSES AND SYSTEMS RELATED THERETO | 01-14-2016 |
20160039681 | METHOD AND DEVICE FOR PRODUCING POLYCHLOROSILANES - The invention relates to a process and an apparatus for preparation of polychlorosilanes from monomeric chlorosilanes, by subjecting the chlorosilanes to a thermal plasma. | 02-11-2016 |
20160046494 | PROCESS AND APPARATUS FOR PREPARATION OF OCTACHLOROTRISILANE - The invention relates to a process and an apparatus for controlled preparation of octachlorotrisilane from monomeric chlorosilanes, by subjecting the chlorosilanes to a thermal plasma. | 02-18-2016 |
20160052791 | Method for Producing Trichlorosilane - An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway. | 02-25-2016 |
20160060126 | PROCESS FOR THE PREPARATION OF HEXACHLORODISILANE BY CLEAVAGE OF HIGHER POLYCHLOROSILANES SUCH AS OCTACHLOROTRISILANE - The invention relates to a process for converting polychlorosilanes into hexachlorodisilane, by one or more trimeric polychlorosilanes or a trimeric polychlorosilane in a mixture with higher molecular weight polychlorosilanes being exposed to a gas discharge and hexachlorodisilane being formed and isolated. | 03-03-2016 |
20160101983 | METHOD OF PREPARING TRICHLOROSILANE - This invention relates to a method of preparing trichlorosilane, which enables trichlorosilane to be obtained at improved yield using silicon having copper silicide uniformly formed thereon, by uniformly distributing and applying a copper compound on the surface of silicon and then performing heat treatment. | 04-14-2016 |
20160131584 | Compositional Analysis Of A Gas Or Gas Stream In A Chemical Reactor and Method For Preparing Chlorosilanes In A Fluidized Bed Reactor - The composition of a gas or gas stream containing AlCl | 05-12-2016 |
20160145109 | PROCESS FOR OPERATING A FLUIDIZED BED REACTOR - Yield of products of increased purity from a fluidized bed reactor where silicon is produced or consumed is enhanced by purging with inert gas, purging with hydrogen gas, and purging with a chlorosilane-containing gas. The purging with hydrogen is conducted at an elevated temperature. | 05-26-2016 |
20160152482 | BUBBLE SIZE MINIMIZING INTERNALS FOR FLUIDIZED BED REACTORS | 06-02-2016 |
20160176717 | PREPARATION OF TRICHLOROSILANE | 06-23-2016 |
20180021747 | METHOD FOR FLUIDIZING COPPER SILICIDE AND PROCESS FOR PREPARING A HALOSILANE USING THE METHOD | 01-25-2018 |