Class / Patent application number | Description | Number of patent applications / Date published |
365184000 | Variable threshold | 46 |
20090010056 | Method and apparatus for capacitorless double-gate storage - A method and/or system and/or apparatus for a dual gate, capacitor less circuit that can act as a state storage device. Further embodiments describe fabrication methods and methods of operation of such a device. | 01-08-2009 |
20090016101 | Reading Technique for Memory Cell With Electrically Floating Body Transistor - A semiconductor device along with circuits including the same and methods of operating the same are described. The device comprises a memory cell consisting essentially of one transistor. The transistor comprises a gate, an electrically floating body region, and a source region and a drain region adjacent the body region. The device includes data sense circuitry coupled to the memory cell. The data sense circuitry comprises a word line coupled to the gate region and a bit output coupled to the source region or the drain region. | 01-15-2009 |
20090021978 | Multi-bit flash memory and reading method thereof - A multi-bit flash memory and a reading method thereof. Multiple reference memory cells for saving reserved data are provided to operate together with multiple data memory cells. Before the data memory cells are read, data stored in the reference memory cell is sensed based on a present reference current. Then, a value of a new reference current for reading the data memory cells is determined according to a difference between the sensed data and the reserved data. | 01-22-2009 |
20090021979 | Gate stack, capacitorless dynamic random access memory including the gate stack and methods of manufacturing and operating the same - Provided are a gate stack, a capacitorless dynamic random access memory (DRAM) including the gate stack and methods of manufacturing and operating the same. The gate stack for a capacitorless DRAM may include a tunnel insulating layer on a substrate, a first charge trapping layer on the tunnel insulating layer, an interlayer insulating layer on the first charge trapping layer, a second charge trapping layer on the interlayer insulating layer, a blocking insulating layer on the second charge trapping layer, and a gate electrode on the blocking insulating layer. The capacitorless DRAM may include the gate stack on the substrate, and a source and a drain in the substrate on both sides of the gate stack. | 01-22-2009 |
20090097309 | NONVOLATILE SEMICONDUCTOR STORAGE DEVICE, AND METHOD FOR CONTROLLING NONVOLATILE SEMICONDUCTOR STORAGE DEVICE - According to an aspect of the present invention, there is provided, a nonvolatile semiconductor storage device including: a substrate; a stacked portion that includes a plurality of conductor layers and a plurality of insulation layers alternately stacked on the substrate, at least one layer of the plurality of conductor layers and the plurality of insulation layers forming a marker layer; a charge accumulation film that is formed on an inner surface of a memory plug hole that is formed in the stacked portion from a top surface to a bottom surface thereof; and a semiconductor pillar that is formed inside the memory plug hole through the charge accumulation film. | 04-16-2009 |
20090103355 | Nonvolatile semiconductor memory and data programming/erasing method - A nonvolatile semiconductor memory comprises: a semiconductor substrate; a first gate electrode formed on a surface of the semiconductor substrate through a first gate insulating film; a second gate electrode formed on the surface of the semiconductor substrate through a second gate insulating film and being adjacent to the first gate electrode through an insulating film; a charge trapping film formed at least in a trap region surrounded by the semiconductor substrate, the first gate electrode and the second gate electrode; and a tunnel insulating film formed between the charge trapping film and the second gate electrode. In one of programming and erasing, electrons are injected into the charge trapping film from the second gate electrode through the tunnel insulating film by Fowler-Nordheim tunneling. | 04-23-2009 |
20090147568 | Memory Elements and Methods of Using the Same - In a first aspect, a first apparatus is provided. The first apparatus is a memory element that includes (1) one or more MOSFETs each including a dielectric material having a dielectric constant of about 3.9 to about 25; and (2) control logic coupled to at least one of the one or more MOSFETs. The control logic is adapted to (a) cause the memory element to operate in a first mode to store data; and (b) cause the memory element to operate in a second mode to change a threshold voltage of at least one of the one or more MOSFETs from an original threshold voltage to a changed threshold voltage such that the changed threshold voltage affects data stored by the memory element when operated in the first mode. Numerous other aspects are provided. | 06-11-2009 |
20090213649 | Semiconductor processing device and IC card - A semiconductor processing device according to the invention includes a first non-volatile memory ( | 08-27-2009 |
20090213650 | MIS-TRANSISTOR-BASED NONVOLATILE MEMORY - A nonvolatile semiconductor memory device includes a latch circuit including a first inverter and a second inverter cross-coupled to each other, a source node of a MIS transistor of the first inverter and a source node of a MIS transistor of the second inverter being both coupled to a plate line, and a control circuit configured to apply a first potential to the plate line in a store mode to cause a change in threshold voltage to one of the MIS transistors, and configured to apply a second potential to the plate line in a power-on mode to cause the latch circuit to latch data responsive to the change in threshold voltage generated in the store mode, such that the data latched by the latch circuit in the power-on mode is automatically output to outside the nonvolatile semiconductor memory device upon power-on thereof. | 08-27-2009 |
20090303787 | NONVOLATILE MEMORIES WITH TUNNEL DIELECTRIC WITH CHLORINE - In a nonvolatile memory cell with charge trapping dielectric ( | 12-10-2009 |
20090323411 | METHOD INCLUDING SELECTIVE TREATMENT OF STORAGE LAYER - Method including selective treatment of storage layer. One embodiment includes the formation of a material layer on a topology with protruding portions, which may be assigned to active areas, and with recessed portions, which may be assigned to isolation structures. A mask material is deposited that grows selectively above the protruding portions and that forms a mask which covers first portions of the material layer wrapping around at least portions of the protruding portions. Openings in the mask are formed above second portions of the material layer above the recessed portions. Then the material layer is treated in the second portions in a self-aligned manner. | 12-31-2009 |
20100208518 | MIS-TRANSISTOR-BASED NONVOLATILE MEMORY CIRCUIT WITH STABLE AND ENHANCED PERFORMANCE - A memory circuit includes a latch having a first node and a second node, a MIS transistor having a gate node, a first source/drain node coupled to the first node of the latch, and a second source/drain node, and a control circuit configured to control the gate node and second source/drain node to make a lingering change in a threshold voltage of the MIS transistor in a first operation and to cause the latch in a second operation to store data responsive to whether a lingering change in the threshold voltage is present, wherein the MIS transistor includes diffusion regions, a gate electrode, and sidewalls, wherein a metallurgical junction of each of the diffusion regions is positioned under the gate electrode, and a lateral boundary of a depletion layer in the diffusion region serving as a drain is positioned under a corresponding one of the sidewalls in the first operation. | 08-19-2010 |
20110085377 | NONVOLATILE SEMICONDUCTOR STORAGE DEVICE, AND METHOD FOR CONTROLLING NONVOLATILE SEMICONDUCTOR STORAGE DEVICE - According to an aspect of the present invention, there is provided, a nonvolatile semiconductor storage device including: a substrate; a stacked portion that includes a plurality of conductor layers and a plurality of insulation layers alternately stacked on the substrate, at least one layer of the plurality of conductor layers and the plurality of insulation layers forming a marker layer; a charge accumulation film that is formed on an inner surface of a memory plug hole that is formed in the stacked portion from a top surface to a bottom surface thereof; and a semiconductor pillar that is formed inside the memory plug hole through the charge accumulation film. | 04-14-2011 |
20110134690 | METHOD OF CONTROLLING A DRAM MEMORY CELL ON THE SeOI HAVING A SECOND CONTROL GATE BURIED UNDER THE INSULATING LAYER - The invention relates to a method of controlling a DRAM memory cell of an FET transistor on a semiconductor-on-insulator substrate that includes a thin film of semiconductor material separated from a base substrate by an insulating layer or BOX layer, the transistor having a channel and two control gates, a front control gate being arranged on top of the channel and separated from the latter by a gate dielectric and a back control gate being arranged in the base substrate and separated from the channel by the insulating layer (BOX). In a cell programming operation, the front control gate and the back control gate are operated jointly by applying a first voltage to the front control gate and a second voltage to the back control gate, with the first voltage being lower in amplitude than the voltage needed to program the cell when no voltage is applied to the back control gate. | 06-09-2011 |
20110134691 | SCALABLE MULTI-FUNCTION AND MULTI-LEVEL NANO-CRYSTAL NON-VOLATILE MEMORY DEVICE - A multi-functional and multi-level memory cell comprises a tunnel layer formed over a substrate. In one embodiment, the tunnel layer comprises two layers such as HfO | 06-09-2011 |
20110170345 | METHODS, DEVICES, AND SYSTEMS RELATING TO MEMORY CELLS HAVING A FLOATING BODY - Methods, devices, and systems are disclosed relating to a memory cell having a floating body. A memory cell includes a transistor comprising a drain and a source each formed in silicon and a gate positioned between the drain and the source. The memory cell may further include a bias gate recessed into the silicon and positioned between an isolation region and the transistor. In addition, the bias gate may be configured to be operably coupled to a bias voltage. The memory cell may also include a floating body within the silicon. The floating body may include a first portion adjacent the source and the drain and vertically offset from the bias gate and a second portion coupled to the first portion. Moreover, the bias gate may be formed adjacent to the second portion. | 07-14-2011 |
20110194344 | SEMICONDUCTOR DEVICE - To provide a semiconductor device that can suppress deterioration in transistors and has a small layout area. In a nonvolatile semiconductor memory device according to the present invention, a control voltage (4 V) between a write voltage (10 V) and a reference voltage (0 V) is applied to a gate of a P-channel MOS transistor of a memory gate drive circuit corresponding to a selected memory gate line and also the reference voltage (0 V) is applied to a gate of an N-channel MOS transistor, and the write voltage is applied to the memory gate line. Since the transistors are turned on with a gate-source voltage lower than the conventional one, deterioration in the transistors can be suppressed. | 08-11-2011 |
20110242888 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - The semiconductor device includes the nonvolatile memory cell in the main surface of a semiconductor substrate. The nonvolatile memory cell has a first insulating film over the semiconductor substrate, a conductive film, a second insulating film, the charge storage film capable of storing therein charges, a third insulating film over the charge storage film, a first gate electrode, a fourth insulating film in contact with the set of stacked films from the first insulating film to the foregoing first gate electrode, a fifth insulating film juxtaposed with the first insulating film over the foregoing semiconductor substrate, a second gate electrode formed over the fifth insulating film to be adjacent to the foregoing first gate electrode over the side surface of the fourth insulating film, and source/drain regions with the first and second gate electrodes interposed therebetween. The conductive film and the charge storage film are formed to two-dimensionally overlap. | 10-06-2011 |
20110273931 | METHODS OF OPERATING MEMORY CELL HAVING ASYMMETRIC BAND-GAP TUNNEL INSULATOR USING DIRECT TUNNELING - Methods of operating dual-gate memory cells having asymmetric band-gap tunnel insulators using direct tunneling. The asymmetric band-gap tunnel insulators allow for low voltage direct tunneling programming and efficient erase with holes and/or electrons, while maintaining high charge blocking barriers and deep carrier trapping sites for good charge retention. | 11-10-2011 |
20110280066 | SEMICONDUCTOR DEVICE HAVING A FIELD EFFECT SOURCE/DRAIN REGION - A semiconductor device includes an active region defined in a semiconductor substrate, and gate electrodes crossing over the active region. Source/drain regions are defined in the active region on two sides of the gate electrode. At least one of the source/drain regions is a field effect source/drain region generated by a fringe field of the gate. The other source/drain region is a PN-junction source/drain region having different impurity fields and different conductivity than the substrate. At least one of the source/drain regions is a field effect source/drain region. Accordingly, a short channel effect is reduced or eliminated in the device. | 11-17-2011 |
20120044759 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND DRIVING METHOD THEREOF - A nonvolatile semiconductor memory device has a first select transistor having a gate connected to a first select word line extending in a column direction, a source connected to a first sub bit line, and a drain connected to a first main bit line extending in a row direction, and a second select transistor having a gate connected to a second select word line extending in the column direction, a source connected to a second sub bit line, and a drain connected to a second main bit line extending in the row direction. The second select transistor has a lower breakdown voltage than the first select transistor. | 02-23-2012 |
20120044760 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND DRIVING METHOD THEREOF - A nonvolatile semiconductor memory device has a first select transistor having a gate electrode connected to a first select word line, a source connected to a first sub bit line, and a drain connected to a first main bit line, and a second select transistor having a gate electrode connected to a second select word line, a source connected to a second sub bit line, and a drain connected to a second main bit line. The first sub bit lines are controlled by the first select transistor so as to be electrically isolated from each other between memory cell groups each formed by the memory cells to be erased simultaneously. On the other hand, the second sub bit lines are connected in common to the memory cells of memory cell groups to be erased separately, by the second select transistor. | 02-23-2012 |
20120069650 | SUB-THRESHOLD MEMORY CELL CIRCUIT WITH HIGH DENSITY AND HIGH ROBUSTNESS - A high-density and high-robustness sub-threshold memory cell circuit, having two PMOS transistors P | 03-22-2012 |
20120075928 | SEMICONDUCTOR MEMORY DEVICE - In a semiconductor layer, information is written by applying a first potential to a first electrode, applying a second potential that is lower than the first potential to all of back gate electrodes, applying a third potential that is higher than the first potential to the first to (i−1) | 03-29-2012 |
20120134206 | MULTILEVEL MEMORY DEVICE - A memory device comprising:
| 05-31-2012 |
20120155165 | MEMORY - An embodiment of the invention relates to a memory comprising a strained double-heterostructure having an inner semiconductor layer which is sandwiched between two outer semiconductor layers, wherein the lattice constant of the inner semiconductor layer differs from the lattice constants of the outer semiconductor layers, the resulting lattice strain in the double-heterostructure inducing the formation of at least one quantum dot inside the inner semiconductor layer, said at least one quantum dot being capable of storing charge carriers therein, and wherein, due to the lattice strain, the at least one quantum dot has an emission barrier of 1.15 eV or higher, and provides an energy state density of at least three energy states per 1000 nm | 06-21-2012 |
20120176835 | TEMPERATURE SENSOR, METHOD OF MANUFACTURING THE TEMPERATURE SENSOR, SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE, AND METHOD OF CONTROLLING THE SEMICONDUCTOR DEVICE - A disclosed temperature sensor includes a charge trap structure including a silicon oxide film formed on a substrate; an aluminum oxide film that is formed on the silicon oxide film, wherein oxygen is injected into the aluminum oxide film from an upper surface thereof; and an electrode formed on the aluminum oxide film, wherein a flat band voltage of the charge trap structure is temperature dependent. | 07-12-2012 |
20120206960 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE USING MIS TRANSISTOR - A nonvolatile semiconductor memory device includes an MIS transistor having nodes, a control circuit configured to apply a first set of potentials to the nodes to cause an irreversible change in transistor characteristics, to apply a second set of potentials to the nodes to cause a first current to flow through the MIS transistor in a first direction, and to apply the second set of potentials to the nodes to cause a second current to flow through the MIS transistor in a second direction opposite the first direction, and a sense circuit configured to produce a signal responsive to a difference between the first current and the second current. | 08-16-2012 |
20120262985 | MULIT-BIT CELL - A method for forming a device is disclosed. The method includes providing a substrate prepared with a primary gate and forming a charge storage layer on the substrate over the primary gate. A secondary gate electrode layer is formed on the substrate over the charge storage layer. The charge storage and secondary gate electrode layers are patterned to form first and second secondary gates on first and second sides of the primary gate. | 10-18-2012 |
20130010535 | NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT, NONVOLATILE SEMICONDUCTOR MEMORY, AND METHOD FOR OPERATING NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT - According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory element including: a semiconductor substrate including: a source region; a drain region; and a channel region; a lower insulating film that is formed on the channel region; a charge storage film that is formed on the lower insulating film and that stores data; an upper insulating film that is formed on the charge storage film; and a control gate that is formed on the upper insulating film, wherein the upper insulating film includes: a first insulting film; and a second insulating film that is laminated with the first insulating film, and wherein the first insulating film is formed to have a trap level density larger than that of the second insulating film. | 01-10-2013 |
20130028016 | Memory Cells and Methods of Storing Information - Some embodiments include memory cells which have channel-supporting material, dielectric material over the channel-supporting material, carrier-trapping material over the dielectric material and an electrically conductive electrode material over and directly against the carrier-trapping material; where the carrier-trapping material includes gallium, indium, zinc and oxygen. Some embodiments include methods of storing information. A memory cell to is provided which has a channel-supporting material, a dielectric material over the channel-supporting material, a carrier-trapping material over the dielectric material, and an electrically conductive electrode material over and directly against the carrier-trapping material; where the carrier-trapping material includes gallium, indium, zinc and oxygen. It is determined if carriers are trapped in the carrier-trapping material to thereby ascertain a memory state of the memory cell. | 01-31-2013 |
20130033932 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR DRIVING SAME - According to one embodiment, a nonvolatile semiconductor memory device includes a memory unit and a control unit. The memory unit includes a charge storage film and a memory cell transistor. The transistor is provided for each of storage regions configured to store charge in the film. The control unit sets the transistors to an erase threshold by setting erase information in the regions; subsequently sets the transistors to thresholds corresponding to information having n values by programming the information having the n values to at least one of the regions in which the erase information is set; and controls information of at least one storage region before being programmed adjacent to the regions programmed with the information to have a value providing a threshold of the transistor nearer than the erase threshold to the thresholds corresponding to the information having the n values in the state of the transistors provided in the regions being set to the thresholds corresponding to the information having the n values. | 02-07-2013 |
20130058163 | SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, a semiconductor memory device includes a stacked body, a semiconductor pillar, a charge storage layer, a tunneling layer, a dividing trench and a first heating unit. The stacked body includes a plurality of first insulating films stacked alternately with a plurality of electrode films. The semiconductor pillar pierces the stacked body. The charge storage layer is provided between the electrode films and the semiconductor pillar. The tunneling layer is provided between the charge storage layer and the semiconductor pillar. The dividing trench is provided between the semiconductor pillars in one direction orthogonal to a stacking direction of the stacked body to divide the electrode films. The first heating unit is provided in an interior of the dividing trench. | 03-07-2013 |
20130077397 | SEMICONDUCTOR DEVICE - A semiconductor device according to an embodiment includes: a first transistor including a gate connected to a first interconnection, a first source, and a first drain, one of the first source and the first drain being connected to a second interconnection; and a second transistor including a gate structure, a second source, and a second drain, one of the second source and second drain being connected to a third interconnection and the other of the second source and second drain being connected to a fourth interconnection. The gate structure includes a gate insulation film, a gate electrode, and a threshold-modulating film provided between the gate insulation film and the gate electrode to modulate a threshold voltage, the other of the first source and first drain of the first transistor is connected to the gate electrode. | 03-28-2013 |
20130077398 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND PROGRAMMING METHOD - A nonvolatile semiconductor memory device of the charge trap type is initialized by reading the memory cells in the device to determine which charge traps hold less than a predetermined minimum charge and injecting charge into these charge traps until all of the charge traps in the device hold at least the predetermined minimum charge. The charge traps are then programmed selectively with data. The initialization procedure shortens the programming procedure by narrowing the initial distribution of charge in the charge traps, and leads to more reliable reading of the programmed data. | 03-28-2013 |
20130148422 | Semiconductor Memory Having Both Volatile and Non-Volatile Functionality and Method of Operating - Semiconductor memory having both volatile and non-volatile modes and methods of operation. A semiconductor memory cell includes a substrate having a first conductivity type; a first region embedded in the substrate at a first location of the substrate and having a second conductivity type; a second region embedded in the substrate at a second location the substrate and have the second conductivity type, such that at least a portion of the substrate having the first conductivity type is located between the first and second locations and functions as a floating body to store data in volatile memory; a floating gate or trapping layer positioned in between the first and second locations and above a surface of the substrate and insulated from the surface by an insulating layer; the floating gate or trapping layer being configured to receive transfer of data stored by the volatile memory and store the data as nonvolatile memory in the floating gate or trapping layer upon interruption of power to the memory cell; and a control gate positioned above the floating gate or trapping layer and a second insulating layer between the floating gate or trapping layer and the control gate. | 06-13-2013 |
20130170292 | HIGH VOLTAGE TOLERANT ROW DRIVER - A circuit is configured to supply a first gate voltage (PG | 07-04-2013 |
20130223142 | 3D STACKED NAND FLASH MEMORY ARRAY ENABLING TO OPERATE BY LSM AND OPERATION METHOD THEREOF - This invention provides a 3D stacked NAND flash memory array and operation method thereof enabling to operate by LSM (a layer selection by multi-level operation) and to get rid of the waste of unnecessary areas by minimizing the number of SSLs needed for a layer selection though the number of layers vertically stacked is increased. | 08-29-2013 |
20130301350 | Vertical Structure Nonvolatile Memory Device - A vertical structure nonvolatile memory device can include a channel layer that extends in a vertical direction on a substrate. A memory cell string includes a plurality of transistors that are disposed on the substrate in the vertical direction along a vertical sidewall of the channel layer. At least one of the plurality of transistors includes at least one recess in a gate of the transistor into which at least one protrusion, which includes the channel layer, extends. | 11-14-2013 |
20130343122 | NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT, NONVOLATILE SEMICONDUCTOR MEMORY, AND METHOD FOR OPERATING NONVOLATILE SEMICONDUCTOR MEMORY ELEMENT - According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory element including: a semiconductor substrate including: a source region; a drain region; and a channel region; a lower insulating film that is formed on the channel region; a charge storage film that is formed on the lower insulating film and that stores data; an upper insulating film that is formed on the charge storage film; and a control gate that is formed on the upper insulating film, wherein the upper insulating film includes: a first insulting film; and a second insulating film that is laminated with the first insulating film, and wherein the first insulating film is formed to have a trap level density larger than that of the second insulating film. | 12-26-2013 |
20140022840 | NON-VOLATILE PROGRAMMABLE SWITCH - According to one embodiment, a non-volatile programmable switch according to this embodiment includes first and second non-volatile memory transistors, and a common node that is connected to the output side terminals of the first and second non-volatile memory transistors, and a logic transistor unit that is connected to the common node. A length of a gate electrode of the first and second non-volatile memory transistors in a channel longitudinal direction is shorter than a length of the charge storage film in the channel longitudinal direction. | 01-23-2014 |
20140036585 | NONVOLATILE MEMORY DEVICE USING A THRESHOLD VOLTAGE SWITCHING MATERIAL AND METHOD FOR MANUFACTURING SAME - The present invention relates to a nonvolatile memory device and to a method for manufacturing same. According to the present invention, the blocking insulation layer of a nonvolatile memory device having a typical SONOS structure is replaced with a threshold voltage switching material, which changes to a low resistance state only while a voltage greater than a threshold voltage is applied while maintaining a high resistance state under normal conditions and returning to the high resistance state when the applied voltage is removed. The present invention performs a program operation by injecting charges from a gate electrode layer into a charge trap layer through an insulation layer formed of the threshold voltage switching material after applying a voltage pulse greater than the threshold voltage to the gate electrode layer. | 02-06-2014 |
20140063935 | SEMICONDUCTOR MEMORY DEVICE HAVING VERTICAL CHANNELS, MEMORY SYSTEM HAVING THE SAME, AND METHOD OF FABRICATING THE SAME - A semiconductor memory device, a memory system having the same, and a method of fabricating the same are provided. The semiconductor memory device includes a vertical channel layer protruding from a surface of a substrate, a tunnel insulating layer and a charge storage layer, which are surrounding the vertical channel layer, a blocking layer surrounding the charge storage layer, interlayer insulating layers stacked along the blocking layer, and conductive layers interposed between the interlayer insulating layers. The blocking layer includes a metal oxide layer. | 03-06-2014 |
20140063936 | THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICE, MEMORY SYSTEM INCLUDING THE SAME, METHOD OF MANUFACTURING THE SAME AND METHOD OF OPERATING THE SAME - A semiconductor memory device, a memory system including the same, a method of manufacturing the same and a method of operating the same are provided. The semiconductor memory device includes a pipe channel layer, vertical channel layers coupled to a top surface of the pipe channel layer, a first pipe gate substantially surrounding a bottom surface and side surfaces of the pipe channel layer, a boosting gate formed over the pipe channel layer, and first insulating layers and conductive layers alternately stacked over the boosting gate and the pipe channel layer. | 03-06-2014 |
20140085975 | CURRENT MONITORING CIRCUIT FOR MEMORY WAKEUP TIME - A microcontroller system is determining to exit a power saving mode and, in response, enable a reference current source to begin providing a reference current for a memory module. The microcontroller system determines that the reference current has reached a substantial fraction of a target reference current, and, in response to determining that the reference current has reached a substantial fraction of the target reference current, enables the memory module to begin performing one or more memory operations. | 03-27-2014 |
20140241054 | SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE - To provide a semiconductor device with such a new structure that the effect of variation in transistor characteristics can be reduced to achieve less variation in the output voltage of a memory cell. A memory cell includes a source follower (common drain) transistor for reading data held in a gate. A voltage applied to a transistor generating a reference current flowing through the memory cell is determined so that a gate-source voltage is approximately equal to the threshold voltage of the transistor. With such a structure, data stored in the memory cell can be read as a voltage that is less influenced by variation of transistors such as the field-effect mobility and the size. | 08-28-2014 |