| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 365103000 | Semiconductive | 66 |
| 20080316790 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME AND SEMICONDUCTOR MANUFACTURING DEVICE - The present invention is a manufacturing method for a semiconductor device having steps of; aligning a program head | 12-25-2008 |
| 20090116275 | CONVENTIONALLY PRINTABLE NON-VOLATILE PASSIVE MEMORY ELEMENT AND METHOD OF MAKING THEREOF - A non-volatile passive memory element comprising on a single surface a first electrode system and a second electrode system together with an insulating system, unless the insulating system is the surface, wherein the first electrode system is insulated from the second electrode system, the first and the second electrode systems are pattern systems and at least one conductive or semi-conducting bridge is present between the first and second electrode systems, and wherein the non-volatile passive memory device is exclusive of metallic silicon and the systems and the conductive or semiconducting bridges are printable using conventional printing processes with the optional exception of the insulating system if the insulating system is the surface. A non-volatile passive memory device comprising a support and on at least one side of the support the above-mentioned non-volatile passive memory element. A process for providing the above-mentioned non-volatile passive memory device, comprising the realization on a single surface of the support of the steps of: providing a first electrode system pattern, optionally providing an insulating pattern, providing a second electrode system pattern, and providing at least one conductive or semiconducting bridge between the first electrode system pattern and the second electrode system pattern at predesignated points, wherein at least one of the steps is realized with a conventional printing process and two of said steps are optionally performed simultaneously. | 05-07-2009 |
| 20100214817 | SEMICONDUCTOR STORAGE DEVICE AND STORAGE SYSTEM - A pn junction type solar cell is formed in a predetermined region on a substrate made of glass. Light emitted from a light emitting unit reaches an n-type semiconductor layer after it passed through substrate. The solar cell generates electromotive force corresponding to a quantity of the emitted light. A control circuit, a mask ROM, a transmitting circuit and an antenna are formed on an upper side of the solar cell. A surface of a semiconductor storage device is entirely covered with an insulating film to block entry of outside air. The insulating film is typically formed of physicochemically stable glass or silicon dioxide. | 08-26-2010 |
| 20120039106 | Programmable Memory Cell with Shiftable Threshold Voltage Transistor - According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts. | 02-16-2012 |
| 20120147653 | CIRCUIT AND SYSTEM OF A HIGH DENSITY ANTI-FUSE - A high density anti-fuse cell can be built at the cross points of two perpendicular interconnect lines, such as active region lines, active and polysilicon lines, active and metal lines, or polysilicon and metal lines. The cell size can be very small. At least one of the anti-fuse cells have a thin oxide fabricated before, after, or between a diode in at least one contact holes at the cross points of the interconnect lines. The thin oxide of the anti-fuse cells at the cross points can be selected for rupture by applying supply voltages in the two perpendicular lines. In some embodiments, a diode can be created after thin oxide is ruptured so that explicitly fabricating a diode or opening a contact hole at the cross-point may not be necessary. | 06-14-2012 |
| 20120044741 | Semiconductor device having memory unit, method of writing to or reading from memory unit, and semiconductor device manufacturing method - A first semiconductor device is formed over a substrate and includes a first insulation film, a first electrode, and a first diffusion layer. A second semiconductor device is formed over a substrate and includes a second insulation film, a second electrode, and a second diffusion layer. The second electrode is coupled to the first electrode. A control transistor allows one of a source and a drain to be coupled to the first electrode and the second electrode, allows the other one of the source and the drain to be coupled to a bit line, and allows a gate electrode to be coupled to a word line. A first potential control line is coupled to the first diffusion layer and controls a potential of the first diffusion layer. A second potential control line is coupled to the second diffusion layer and controls a potential of the second diffusion layer. | 02-23-2012 |
| 20120008364 | ONE TIME PROGRAMMABLE MEMORY AND THE MANUFACTURING METHOD AND OPERATION METHOD THEREOF - A one time programmable memory having a memory cell formed on a substrate is provided. The memory cell has a transistor and an anti-fuse structure. The anti-fuse structure is consisted of a doping region, and a dielectric layer and a conductive layer is formed in the top edge corner region of an isolation structure. The upper surface of the isolation structure is lower than the surface of the substrate so as to expose the top edge corner region. The conductive layer is formed on the isolation structure and covers the top edge corner region. The dielectric layer is formed on the top edge corner region and between the doping region and the conductive layer. The memory cell stores the digital data depending on whether the dielectric layer breaks down or not. | 01-12-2012 |
| 20120314474 | NON-VOLATILE MEMORY CELL STRUCTURE AND METHOD FOR PROGRAMMING AND READING THE SAME - The present invention provides a non-volatile memory cell structure. A first isolation structure is disposed on a substrate and a semiconductor layer is disposed on the first isolation structure to form a silicon on insulator device. A first doping region is made of a portion of the semiconductor layer. A gate is disposed on the first doping region. A gate oxide layer is sandwiched between the first doping region and the gate. A second doping region is disposed within the semiconductor layer and outside the first doping region. A second doping region is in direct contact with the first doping region. A second isolation structure is disposed on the first isolation structure. Further, the second isolation structure surrounds the first doping region and the second doping region. The second isolation structure is also in direct contact with the first doping region and the second doping region. | 12-13-2012 |
| 20120212991 | SEMICONDUCTOR DEVICE AND OPERATION METHOD THEREOF - An operation method of a semiconductor device, includes providing one or more memory elements each including a first semiconductor layer of a first conductivity type, second and third semiconductor layers of a second conductivity type, which are disposed to be separated from each other in the first semiconductor layer, a first electrode electrically connected to the second semiconductor layer, and a second electrode electrically connected to the third semiconductor layer, and performing operation of writing information on a memory element to be driven of the one or more memory elements. The operation of writing is performed by forming a filament in a region between the second and third semiconductor layers, which is a conductive path electrically linking these semiconductor layers, through application of a voltage equal to or higher than a predetermined threshold between the first electrode and the second electrode. | 08-23-2012 |
| 20120212992 | SEMICONDUCTOR DEVICE AND OPERATION METHOD THEREOF - An operation method of a semiconductor device, includes providing one or more memory elements each including a first semiconductor layer, second and third semiconductor layers, a dielectric film and a conductive film, a first electrode, a second electrode, and a third electrode, and performing operation of writing information on a memory element to be driven of the one or more memory elements. The operation of writing is performed by forming a filament in a region between the second and third semiconductor layers, which is a conductive path electrically linking these semiconductor layers, the filament being formed by causing a dielectric breakdown of at least a part of the dielectric film, through application of a voltage equal to or higher than a predetermined threshold between the second and third electrodes, thereby causing an electric current to flow between the conductive film and the third semiconductor layer. | 08-23-2012 |
| 365104000 | Transistors | 47 |
| 20100073985 | METHOD FOR OPERATING ONE-TIME PROGRAMMABLE READ-ONLY MEMORY - A method for operating a one-time programmable read-only memory (OTP-ROM) is provided. The OTP-ROM comprises a first gate and a second gate respectively disposed on a gate dielectric layer between a first doped region and a second doped region on a substrate, wherein the first gate is adjacent to the first doped region and coupled to the first doped region, the second gate is adjacent to the second doped region, the first gate is electrically coupled grounded, and the OTP-ROM is programmed through a breakdown effect. The method comprises a step of programming the OTP-ROM under the conditions that a voltage of the second doped region is higher than a voltage of the first doped region, the voltage of the second gate is higher than a threshold voltage to pass the voltage of the second doped region, and the first doped region and the substrate are at a reference voltage. | 03-25-2010 |
| 20130077376 | SEMICONDUCTOR DEVICE WITH OTP MEMORY CELL - A semiconductor device with OTP memory cell includes a first switching unit for transferring a first bias voltage, a first MOS transistor having a first gate coupled to a first gate signal and a first terminal coupled to the first bias voltage by the first switching unit, and a second switching unit for coupling a second terminal of the first MOS transistor to a first bit line. | 03-28-2013 |
| 20130077377 | SEMICONDUCTOR DEVICE WITH OTP MEMORY CELL - A semiconductor device includes a one-time programmable (OTP) memory cell includes a first MOS transistor having a gate coupled to a bit line, a first switching device, coupled to one side of a source/drain of the first MOS transistor, configured to provide a current path for a current supplied to the gate of the first MOS transistor, and a second switching device configured to provide a bias voltage at the other side of the source/drain of the first MOS transistor. | 03-28-2013 |
| 20130028002 | DIFFERENTIAL ROM - A differential read only memory array includes a differential sense amplifier coupled to first and second bit lines. A first bit cell is coupled to a first word line and to the first and second bit lines. The at least one bit cell includes a first transistor having a gate coupled to the first word line, a drain coupled to the first bit line, and a source coupled to a first power supply line. A second transistor has a gate coupled to the first word line. A source and a drain of the second transistor are either both connected to the second bit line or both unconnected to the second bit line. | 01-31-2013 |
| 20130063999 | ELECTRONIC DEVICE INCLUDING A NONVOLATILE MEMORY STRUCTURE HAVING AN ANTIFUSE COMPONENT AND A PROCESS OF USING THE SAME - An electronic device can include a nonvolatile memory cell, wherein the nonvolatile memory cell can include an antifuse component, a switch, and a read transistor having a control electrode. Within the nonvolatile memory cell, the switch can be coupled to the antifuse component, and the control electrode of the read transistor can be coupled to the antifuse component. The nonvolatile memory cell can be programmed by flowing current through the antifuse component and the switch and bypassing the current away the read transistor. Thus, programming can be performed without flowing current through the read transistor decreasing the likelihood of the read transistor sustaining damage during programming. Further, the antifuse component may not be connected in series with the current electrodes of the read transistor, and thus, during read operations, read current differences between programmed and unprogrammed nonvolatile memory cells can be more readily determined. | 03-14-2013 |
| 20100157649 | TRANSISTOR BIT CELL ROM ARCHITECTURE - An apparatus and method for providing a read-only memory (ROM) bit cell having one each of a PMOS transistor and an NMOS transistor, which has reduced static and dynamic electric power losses, are described. In particular, the bit cell does not require a pre-charge transistor. The sense amplifier for determining the voltages on ROM bit lines may be a digital inverter, address decoding may be simplified since there are no timing requirements with respect to transistor pre-charge, and chips containing a plurality of ROM bit cell may be readily programmed. In one embodiment of the invention, each bit cell includes one PMOS transistor having its source in electrical connection with a voltage source, its drain connected or unconnected to a bit line, and its gate connected to an inverted version of the word line signal; and one NMOS transistor having its source connected to a lower voltage source, its drain connected or disconnected to the bit line, and its gate connected to the word line. The bit cell is programmed during the ROM generation by connecting the drain of either the PMOS (logic level 1) or the NMOS (logic level 0) to the bit line. | 06-24-2010 |
| 20090323389 | MASKED MEMORY CELLS - An array of masked memory cells including a first memory cell in a first column and a second memory cell in a second different column, wherein the first memory cell is capable of being accessed, so as to output, dependent on a first binary mask signal, a first binary value at a first output and a second binary value at a second output or vice versa, wherein the second memory cell is capable of being accessed, so as to output, dependent on a second binary mask signal, a first binary value at a third output and a second binary value at a fourth output or vice versa, and wherein the second and the third outputs of the memory cells are connected to an identical bit line of the memory array. | 12-31-2009 |
| 20100097836 | Memory Bitcell and Method of Using the Same - A memory bitcell comprises first ( | 04-22-2010 |
| 20120014158 | MEMORY DEVICES - A memory device includes an array of transistors, a plurality of bit lines, and a plurality of source lines. The transistors include gate, drain and source terminals. The gate terminals are electrically coupled to word lines. The plurality of bit lines connect a power source to the drain terminals of the array of transistors and the plurality of source lines connect the power source to the source terminals of the array of transistors. The connections are made active during a standby mode, thereby limiting leakage current without entailing drawbacks associated with degraded memory access/cycle time. | 01-19-2012 |
| 20100315856 | HIGH-DENSITY NON-VOLATILE READ-ONLY MEMORY ARRAYS AND RELATED METHODS - In an embodiment, a read-only memory array includes a plurality of word lines, a plurality of bit-lines including first and second bit-lines, and a plurality of memory cells configured to represent data values. Each memory cell can include a transistor having a control terminal coupled to one of the plurality of word lines, a drain terminal, and a source terminal. Connections associated with the drain and source terminals of a particular memory cell can determine a data value represented by the memory cell. The memory cells of the plurality of memory cells that are coupled to less than two bit-lines are configured to represent one values. | 12-16-2010 |
| 20100080035 | SRAM BASED ONE-TIME-PROGRAMMABLE MEMORY - Disclosed is a method and device for providing fast-response One-Time-Programmable (OTP) memory based on SRAM memory technology and the inherent breakdown characteristics of a MOS transistor. Each memory cell of an SRAM memory cell circuit is connected to a programming circuit. The programming circuit is comprised of two groups of MOS transistors connected to the storage nodes (SN and SNB, where SNB is the complementary value of SN) of the two cross-coupled inverters of the SRAM memory circuit. A desired data set is loaded into the circuit and then is burned-in by applying and repeatedly cycling a “burn-in” voltage across the source and drain of the MOS transistors of the programming circuit that approaches the ON STATE trigger voltage of the characteristic bipolar junction transistor contained within the MOS transistors. Upon repeated cycling of the source-to-drain voltage, the targeted MOS transistor within the programming circuit breaks down and shorts across the gate, drain, and/or source of the transistor. When the system is returned to normal operation, the programming circuits will be connected to ground, Vdd or Vss and one of the two nodes of the SRAM cell circuit will be shorted through the programming circuit to ground, Vdd or Vss, thus, forcing a retention of the programmed data state. | 04-01-2010 |
| 20080212356 | Random Access Memory Featuring Reduced Leakage Current, and Method for Writing the Same - The invention relates to a ROM memory cell comprising a first terminal connected to a word line, comprising a second terminal and comprising a third terminal, the second terminal being connected to a bit line and/or the third terminal being connected to a supply line for precharging the third terminal. The ROM memory cell according to the invention is distinguished by the fact that the same reference potential is in each case applied to the first terminal, the second terminal and/or the third terminal in a standby operating mode. The invention furthermore relates to a ROM memory component comprising such ROM memory cells, and to a method for reading from the ROM memory cell. | 09-04-2008 |
| 20090003029 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In a semiconductor integrated circuit device having a volatile memory therein, high-speed operation is enabled and the density of the memory can be enhanced. The volatile memory includes a word line, a complementary bit line having bit lines, a plurality of common source lines, and a memory cell that is coupled with the word line and the complementary bit lines. The memory cell includes transistors. The gate electrodes of the transistors are coupled with the word line, and the drain electrode of one of the transistors is coupled with one of the bit lines. The drain electrode of the other transistor is coupled with the other bit line. The respective source electrodes of the transistors are coupled with any one of the common source lines, or brought in a floating state, thereby storing storage information in the memory cell. | 01-01-2009 |
| 20110205778 | CURRENT DETECTION CIRCUIT FOR DETECTING READ CURRENT FROM A MEMORY CELL - A current detection circuit that can normally perform a current detection operation to detect a current in a memory cell of a memory device even if an applied power supply voltage is a low voltage, includes a current detection means which comprises first and second MOS transistors of a same channel type and third to sixth MOS transistors of a channel type different from the channel type of the first and second MOS transistors, and a MOS gate control means which supplies, to a control electrode of each of the first and second MOS transistors, a voltage which is obtained by subtracting an absolute value of a threshold voltage of each of the first and second MOS transistors from the power supply voltage when the power supply voltage is equal to or lower than the absolute value of the threshold voltage. | 08-25-2011 |
| 20100208506 | READ ONLY MEMORY AND METHOD OF READING SAME - A Read Only Memory (ROM) device includes a ROM array, a row address decoder, a column address decoder, a column multiplexer, and a control circuit. Data is stored in bit cells in the ROM array. The control circuit generates control signals for reading the ROM. The row address decoder selects a word line. The column address decoder enables a bit line. The data is sensed from a bit cell corresponding to the selected word line and the enabled bit line by a corresponding sense amplifier and delivered on a data output pin of the ROM. The control signals for enabling the bit line and the sense amplifier operate at a higher voltage than supply voltage of the ROM. This reduces the ROM read time. | 08-19-2010 |
| 20080239786 | LOGIC CODING IN AN INTEGRATED CIRCUIT - The programming of a read-only memory formed of MOS transistors, the programming being set by a mask for forming an insulating layer prior to the forming of contacts of active regions of the transistors. An interconnection structure and a read-only memory. | 10-02-2008 |
| 20110013444 | LOW LEAKAGE ROM ARCHITECURE - A Read only memory (ROM) with minimum leakage includes a ROM array including a first transistor, wherein a drain, a source, a gate, and a bulk of the first transistor is electrically connected to a logic zero in the idle state for ensuring zero junction and sub-threshold leakage current. The drain of the first transistor is electrically connected to a main bit line through a second transistor. The second transistor includes a gate, electrically connected to a first decoding circuit, a drain, electrically connected to the main bit line. A first reference bit line is electrically connected to a drain of a third transistor, wherein gate of the third transistor is electrically connected to a second decoding circuit for generating a stop read signal. A second reference bit line, electrically connected to the first decoding circuit through a first sensing unit for generating a stop pre-charge signal. | 01-20-2011 |
| 20080316791 | OPERATING METHOD OF ONE-TIME PROGRAMMABLE READ ONLY MEMORY - The present invention provides a method of operating a one-time programmable read only memory (OTPROM). The OTPROM includes at least a select transistor, an electrode and a dielectric layer disposed on a substrate, wherein the electrode is set up on the source region of the select transistor and the dielectric layer is set up between the electrode and the source region. The method of operating the one-time programmable read only memory includes performing a programming operation to write a digital data value of ‘1’ into the memory and performing a programming operation to write a digital data value of ‘0’ into the memory. | 12-25-2008 |
| 20120092917 | ROM MEMORY DEVICE - A memory device includes a plurality of read only memory cells, a precharge circuit, and a sense amplifier. A read only memory (ROM) cell of the plurality of ROM cells is coupled to a word line and a bit line. The ROM cell comprises a transistor having a first current electrode coupled to receive a reference voltage, a second current electrode selectively coupled to the bit line based on the programmed state of the ROM cell, and a control electrode coupled to the word line. The precharge circuit is coupled to the bit line. The precharge circuit precharges the bit line to a precharge voltage, wherein the precharge voltage is less than the reference voltage. The sense amplifier is coupled to the bit line and to a power supply voltage terminal for receiving a power supply voltage, wherein the reference voltage is less than the power supply voltage. | 04-19-2012 |
| 20090027942 | SEMICONDUCTOR MEMORY UNIT AND ARRAY - A memory unit comprising a gate electrode, a gate dielectric under said gate electrode, an active area and a metal-semiconductor compound layer is provided. The active area comprises a first source/drain region, a second source/drain region, a normal field channel region formed under said gate electrode, a fringing field channel region formed between said first source/drain region and said normal field channel region, a pocket implantation region formed under the fringing or normal field channel regions and an extension doping region formed between said second source/drain region and said normal field channel region. The metal-semiconductor compound layer is formed over said gate electrode, first source/drain region and second source/drain region. | 01-29-2009 |
| 20120195092 | ROM GENERATOR - According to one embodiment, a ROM generator includes a ROM-data acquiring unit that acquires ROM data; a cell-data storing unit that stores a plurality of cell data respectively having different connection places of a connection path with respect to same ROM data; a cell-data selecting unit that selects the cell data stored in the cell data storing unit with respect to the same ROM data acquired by the ROM-data acquiring unit; and a cell-data arranging unit that arranges the cell data selected by the cell-data selecting unit to correspond to cell regions. | 08-02-2012 |
| 20100265755 | ONE TIME PROGRAMMABLE READ ONLY MEMORY AND PROGRAMMING METHOD THEREOF - A one time programmable read only memory disposed on a substrate of a first conductive type is provided. A gate structure is disposed on the substrate. A first doped region and a second doped region are disposed in the substrate at respective sides of the gate structure, and the first doped region and the second doped region are of a second conductive type which is different from the first conductive type. A third doped region of the first conductive type is disposed in the substrate and is adjacent to the second doped region, and a junction is formed between the third doped region and the second doped region. A metal silicide layer is disposed on the substrate. An clearance is formed in the metal silicide layer, and the clearance at least exposes the junction. | 10-21-2010 |
| 20110032742 | One-time programmable memory cell with shiftable threshold voltage transistor - According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts. | 02-10-2011 |
| 20080225568 | DENSE READ-ONLY MEMORY - In one embodiment, a read-only memory (ROM) is provided that includes: a plurality of word lines; a plurality of bit lines; a plurality of memory cell transistors arranged in rows corresponding to the word lines such that if a word line is asserted the corresponding memory cell transistors are conducting, the memory cell transistors also being arranged in columns corresponding to the bit lines; wherein each column of memory cell transistors is arranged into column groups, each column group including an access transistor coupled to the corresponding bit line, the remaining transistors in the column group being coupled in series from the access transistor to a last transistor in the column group, the last transistor in the column group being coupled to a voltage node. | 09-18-2008 |
| 20110019460 | MEMORY CIRCUITS, SYSTEMS, AND FABRICATION METHODS THEREOF - A memory circuit includes a plurality of bit lines. A first memory cell and a second memory cell are coupled in series. Each of the first memory cell and the second memory cell is capable of storing a first type datum. The first memory cell and the second memory cell share a first common source/drain (S/D) region. The first common S/D region is electrically isolated from all of the bit lines. | 01-27-2011 |
| 20090034317 | SEMICONDUCTOR STORAGE DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor storage device includes a memory cell array, a plurality of word lines, a plurality of bit lines, a first gate wiring element | 02-05-2009 |
| 20090034316 | MEMORY - A memory includes a plurality of word lines, a plurality of bit lines so arranged as to intersect with the plurality of word lines, a plurality of memory cells arranged on positions where the word lines and the bit lines intersect with each other respectively and selection circuits connected to the bit lines, wherein the current driving ability of the selection circuits is different depending on positions where the bit lines are arranged. | 02-05-2009 |
| 20120120707 | SEMICONDUCTOR DEVICE WITH OTP MEMORY CELL - A semiconductor device with an OTP memory cell includes a first MOS transistor having a first gate terminal connected to a first line, and a first terminal connected to a first node, a second MOS transistor having a second gate terminal connected to a second line, and a first terminal connected to the first node, and a third MOS transistor having a gate terminal connected to a three line, and a first terminal of the third MOS transistor connected to the first node. | 05-17-2012 |
| 20110069527 | ROM CELL AND ARRAY STRUCTURE - A semiconductor memory cell array includes an elongated continuous active region. First and second pass transistors are formed in the elongated continuous active region and form part of first and second adjacent memory cells, respectively, of a column of memory cells in the array. An isolation transistor is formed in the elongated continuous active region between the first and second pass transistors and biased in an off state. First and second word lines are coupled to the gates of the pass transistors for applying a reading voltage. The array includes a differential bit line pair including first and second bit lines, a first logic value being encoded into the memory cells by connecting the pass transistors to the first bit line and a second logic value being encoded into the memory cells by connecting the pass transistors to the second bit line. | 03-24-2011 |
| 20110013443 | Novel high speed two transistor/two bit NOR read only memory - A mask programmable NOR ROM circuit includes serially connected ROM transistors. A drain of a topmost ROM transistor is connected to a bit line and a source of a bottommost ROM transistor is connected to a source line. A source of one ROM transistor is solely connected with a drain of an immediately adjacent ROM transistor. The ROM transistors are programmed by placing a resist mask having openings for selectively modifying a first threshold voltage level of chosen ROM transistors by implanting a threshold voltage modifying impurity. A selected ROM transistor is read by connecting the source line to a sense amplifier circuit and setting the bit line to a read biasing voltage level. The gate of the selected ROM transistor is set to a moderately high read voltage level. The gates of all unselected ROM transistor is set to a very high read voltage level. | 01-20-2011 |
| 20110211382 | HIGH DENSITY AND LOW VARIABILITY READ ONLY MEMORY - A read-only memory for storing two data values using a single transistor includes a word line, a pair of bit lines, a select line, and a transistor to store data corresponding to each bit lines in the pair of bit lines. The gate terminal of the transistor is connected to the word line, a first diffusion terminal of the transistor is connected to one of the first bit line and the select line based on the first data value and a second diffusion terminal of the transistor is connected to one of the second bit line and the select line based on the second data value. | 09-01-2011 |
| 20110255327 | METHOD AND SYSTEM FOR SPLIT THRESHOLD VOLTAGE PROGRAMMABLE BITCELLS - Methods and systems for split threshold voltage programmable bitcells are disclosed and may include selectively programming bitcells in a memory device by applying a high voltage to a gate terminal of the bitcells, where the programming burns a conductive hole in an oxide layer above a higher threshold voltage layer in a memory device. The bitcells may comprise an oxide layer and a doped channel, which may comprise a plurality of different threshold voltage layers. The plurality of different threshold voltage layers may comprise at least one layer with a higher threshold voltage and at least one layer with a lower threshold voltage. The oxide may comprise a gate oxide. The bitcell may comprise an anti-fuse device. The layer with a higher threshold voltage may be separated from an output terminal of the bitcell by the at least one layer with a lower threshold voltage. | 10-20-2011 |
| 20100284210 | One-time programmable memory cell - According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a cell transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The cell transistor has a source, a gate, and a body shorted together. A programming operation causes a punchthrough to occur between the source and a drain of the cell transistor in response to a programming voltage on the bitline and the wordline. A channel length of the cell transistor is substantially less than a channel length of the access transistor. In one embodiment, the access transistor is an NFET while the cell transistor is a PFET. In another embodiment, the access transistor is an NFET and the cell transistor is also an NFET. Various embodiments result in a reduction of the required programming voltage. | 11-11-2010 |
| 20100195367 | NONVOLATILE MEMORY AND WRITING METHOD THEREOF, AND SEMICONDUCTOR DEVICE - A write-once memory can be written only once to each memory cell; therefore, a defective bit cannot be detected by an actual inspection of writing. Accordingly, as described above, the measures, in which a redundant circuit is provided and the defective bit is modified before shipping, cannot be taken; thus, it is difficult to provide a memory with few defects. It is an object of the present invention to provide a write-once memory where the probability of a defect is reduced considerably. A nonvolatile memory that can be written only once includes a redundant memory cell, a first circuit which allocates an address to the redundant memory cell, a second circuit which outputs a determination signal that expresses whether writing is performed normally or not, and a third circuit, to which the determination signal is inputted, which controls the first circuit and the second circuit. | 08-05-2010 |
| 20110134680 | SEMICONDUCTOR MEMORY DEVICE - To provide a semiconductor memory device including an oxide semiconductor that can deal with instability of a threshold characteristic, in which writing is possible by a simple method. The semiconductor memory device functions by utilizing a characteristic that a threshold shifts when a thin film transistor including an oxide semiconductor is irradiated with ultraviolet light. Readout can be performed by setting a readout voltage between the threshold before the ultraviolet light irradiation and the threshold after irradiation. The threshold characteristic of an initial characteristic can be controlled by providing a back gate or by using two thin film transistors. | 06-09-2011 |
| 20100165700 | ONE TIME PROGRAMMABLE MEMORY DEVICE AND MANUFACTURING METHOD OF ONE TIME PROGRAMMABLE MEMORY DEVICE - Embodiments relate to a manufacturing method of a one time programmable (OTP) memory device including: forming a common source in a linear configuration on a semiconductor substrate; forming a gate dielectric layer on the semiconductor substrate at both sides of the source; forming a gate over the gate dielectric layer; forming a spacer between the gates and at both side walls of the gate; and forming a drain on the semiconductor substrate at both sides of the spacer. With embodiments, the OTP memory device can be formed together with the logic part using the logic process and can increase the storage capacity of the OTP memory device by improving density of memory arrays. | 07-01-2010 |
| 20120039108 | One-Time Programmable Memory Cell - According to one exemplary embodiment, a one-time programmable memory cell includes an access transistor coupled to a shiftable threshold voltage transistor between a bitline and a ground, where the access transistor has a gate coupled to a wordline. The shiftable threshold voltage transistor has a drain and a gate shorted together. A programming operation causes a permanent shift in a threshold voltage of the shiftable threshold voltage transistor to occur in response to a programming voltage on the bitline and the wordline. In one embodiment, the access transistor is an NFET while the shiftable threshold voltage transistor is a PFET. In another embodiment, the access transistor is an NFET and the shiftable threshold voltage transistor is also an NFET. The programming voltage can cause an absolute value of the threshold voltage to permanently increase by at least 50.0 millivolts. | 02-16-2012 |
| 20120039107 | Circuit and System of Aggregated Area Anti-Fuse in CMOS Processes - Gate oxide breakdown anti-fuse suffers notorious soft breakdown that reduces yield and reliability. This invention discloses circuit and system to enhance electrical field by blocking LDD so that the electrical field is higher and more focused near the drain junction, to make electrical field in the channel more uniform by creating slight conductive or conductive in part or all of the channel, or to neutralize excess carriers piled up in the oxide by applying alternative polarity pulses. The embodiments can be applied in part, all, or any combinations, depending on needs. This invention can be embodied as a 2 T anti-fuse cell having an access and a program MOS with drain area in the program MOS, or 1.5 T anti-fuse cell without any drain in the program MOS. Similarly this invention can also be embodied as a 1 T anti-fuse cell having a portion of the channel made conductive or slightly conductive to merge the access and program MOS into one device with drain area, or 0.5 T anti-fuse cell without any drain. | 02-16-2012 |
| 20080253162 | MULTIBIT ROM MEMORY - The invention concerns a ROM comprising a set of memory points arranged in rows and columns, each memory point capable of storing two bits of data and comprising a single switch controllable to connect together first and second terminals of said switch, each of said first and second terminals being connected to one of first, second and third conductive lines, wherein said switch is connected via said first and second terminals between said first and second lines to encode a first data value, between said first and third lines to encode a second data value, between said second and third lines to encode a third data value, and both of said first and second terminals being connected to the same one of said first, second and third lines to encode a fourth data value. | 10-16-2008 |
| 20120250389 | MOSFET FUSE AND ARRAY ELEMENT - An alternative electrical fuse structure, which may be similar to or identical with an insulated gate field effect transistor (“IGFET”) of advanced CMOS technology, can be very area efficient and programmable at relatively low voltages, e.g., programming voltages between 1.5 V and 2.5 V. A method is provided for programming an electrical fuse having the structure of an IGFET to permanently electrically isolate the drain of the IGFET from its source. In this way, the step of programming the IGFET fuse can increase a resistance between the source and the drain of the IGFET from a pre-programming value to a post-programming value by two or more orders of magnitude when any given gate-source voltage value and any given drain-source voltage value within normal operational ranges of the IGFET are applied thereto. | 10-04-2012 |
| 20120163064 | MEMORY DEVICE - A read only memory cell circuit is provided. The memory cell circuit includes at least one memory cell. A pair of bit lines associated with each memory cell is provided which form a complementary output. The at least one memory cell is configured to be coupled to first or second of the bit line pair. | 06-28-2012 |
| 20120163063 | COMPLEMENTARY READ-ONLY MEMORY (ROM) CELL AND METHOD FOR MANUFACTURING THE SAME - A complementary read-only memory (ROM) cell includes a transistor; and a bit line and a complementary bit line adjacent to the transistor; wherein a drain terminal of the transistor is connected to one of the bit line and the complementary bit line based on data programmed in the ROM cell. | 06-28-2012 |
| 20120212993 | ONE TIME PROGRAMMING BIT CELL - A one time programming (OTP) memory cell includes a first transistor and a second transistor. The first transistor has a first drain, a first source, a first gate, and a first normal operational voltage value higher that a second normal operational voltage value of the second transistor. The second transistor has a second drain, a second source, and a second gate. The first source is coupled to the second drain. The second source is configured to detect data stored in the OTP memory cell. | 08-23-2012 |
| 20120314475 | LOW VOLTAGE PROGRAMMABLE MOSFET ANTIFUSE WITH BODY CONTACT FOR DIFFUSION HEATING - An antifuse can include an insulated gate field effect transistor (“IGFET”) having an active semiconductor region including a body and first regions, i.e., at least one source region and at least one drain region separated from one another by the body. A gate may overlie the body and a body contact is electrically connected with the body. The first regions have opposite conductivity (i.e., n-type or p-type) from the body. The IGFET can be configured such that a programming current through at least one of the first regions and the body contact causes heating sufficient to drive dopant diffusion from the at least one first region into the body and cause an edge of the at least one first region to move closer to an adjacent edge of at least one other of the first regions. In such way, the programming current can permanently reduce electrical resistance by one or more orders of magnitude between the at least one first region and the at least one other first region. | 12-13-2012 |
| 20110235389 | SEMICONDUCTOR DEVICE - An object is reduction in power consumption of a semiconductor device including a memory circuit. In the semiconductor device including a memory circuit, the memory circuit includes a memory cell including a semiconductor element and a memory cell that does not include a semiconductor element in a region defined by a word line and a bit line which intersect with each other. A transistor formed using an oxide semiconductor so as to have extremely low off-state current is used as the semiconductor element, so that the reading precision is improved and thus low voltage operation can be performed. The memory cells store data high or data low. The memory cell comprising a semiconductor element stores minor data of high and low, and the memory cell that does not comprise the semiconductor element stores major data of high and low. | 09-29-2011 |
| 20110273919 | Read-Only Memory (ROM) Bitcell, Array, and Architecture - Embodiments provide improved memory bitcells, memory arrays, and memory architectures. In an embodiment, a memory cell comprises a transistor having drain, source, and gate terminals; and a plurality of program nodes, with each of the program nodes charged to a pre-determined voltage and coupled to a respective one of a plurality of bit lines. | 11-10-2011 |
| 20120327700 | LOW VOLTAGE METAL GATE ANTIFUSE WITH DEPLETION MODE MOSFET - An antifuse according to an embodiment of the invention herein can include a depletion mode metal oxide semiconductor field effect transistor (“MOSFET”) having a conduction channel and a metal gate overlying the conduction channel. A cathode and an anode of the antifuse can be electrically coupled to the gate and spaced apart from one another in a direction the gate extends, such that the antifuse is programmable by driving a programming current between the cathode and the anode to cause material of the metal gate to migrate away. The gate may be configured such that, under appropriate biasing conditions, when the antifuse is unprogrammed, the conduction channel is turned on unless a voltage above a first threshold voltage is applied to the gate to turn off the conduction channel. The gate can be configured such that when the antifuse has been programmed, the conduction channel remains turned on even if a voltage above the first threshold voltage is applied between the gate and a source region of the MOSFET. | 12-27-2012 |
| 365105000 | Diodes | 9 |
| 20130051113 | PROGRAMMABLE NON-VOLATILE MEMORY - A programmable non-volatile memory including a memory cell includes a transistor acting as an anti-fuse and two diodes for access. The memory cell that can store two bits and includes a transistor acting as an anti-fuse and two diodes for access, wherein the cell transistor includes: the source electrode formed by a metal; the first diode as the source region contact structure; the drain electrode formed by a metal; and the second diode as the drain region contact structure wherein the cell transistor, the oxide layer between the source area and the gate is the first anti-fuse the first storage; the oxide layer between the drain area and the gate is the second anti-fuse the second storage; the two diodes are connected in series to access the two anti-fuses. | 02-28-2013 |
| 20100097837 | MEMORY BASED COMPUTATION SYSTEMS AND METHODS OF USING THE SAME - A high performance memory based computation system comprises an array of memory cells. Each memory cell stores a logic data corresponding to a chosen combination of inputs based on a specific logic function. For improved performance, the memory cell array can be divided into sub-blocks; and the sub-blocks can be serially disposed or juxtaposed. The performance of the memory based computation system can further be improved by removing the repeated memory cell rows, column, and/or sub-arrays. | 04-22-2010 |
| 20090237976 | N-ary Three-Dimensional Mask-Programmable Read-Only Memory - N-ary three-dimensional mask-programmable read-only memory (N-3DMPROM) stores multi-bit-per-cell. Its memory cells can have N states (N>2) and data are stored as N-ary codes. N-3DMPROM has a larger storage density than the prior-art binary 3D-MPROM. One advantage of N-3DROM over other N-ary memory (e.g. multi-level-cell flash) is that its array efficiency can be kept high. N-3DMPROM could be geometry-defined, junction-defined, or a combination thereof. | 09-24-2009 |
| 20090316467 | Memory Device Constructions, Memory Cell Forming Methods, and Semiconductor Construction Forming Methods - Memory device constructions include a first column line extending parallel to a second column line, the first column line being above the second column line; a row line above the second column line and extending perpendicular to the first column line and the second column line; memory material disposed to be selectively and reversibly configured in one of two or more different resistive states; a first diode configured to conduct a first current between the first column line and the row line via the memory material; and a second diode configured to conduct a second current between the second column line and the row line via the memory material. In some embodiments, the first diode is a Schottky diode having a semiconductor anode and a metal cathode and the second diode is a Schottky diode having a metal anode and a semiconductor cathode. | 12-24-2009 |
| 20100110752 | Method of making a diode read/write memory cell in a programmed state - A method of making a nonvolatile memory device includes fabricating a diode in a low resistivity, programmed state without an electrical programming step. The memory device includes at least one memory cell. The memory cell is constituted by the diode and electrically conductive electrodes contacting the diode. | 05-06-2010 |
| 20090109726 | NON-LINEAR CONDUCTOR MEMORY - A high-speed, low-power memory device comprises an array of non-linear conductors wherein the storage, address decoding, and output detection are all accomplished with diodes or other non-linear conductors. In various embodiments, the row and column resistors are switchable between a high resistance when connected to a row or column that is non-selected, and a low resistance when connected to the selected row and column. | 04-30-2009 |
| 20090316468 | LARGE ARRAY OF UPWARD POINTING P-I-N DIODES HAVING LARGE AND UNIFORM CURRENT - A first memory level includes a first plurality of memory cells that includes every memory cell in the first memory level. Each memory cell includes a vertically oriented p-i-n diode in the form of a pillar that includes a bottom heavily doped p-type region, a middle intrinsic or lightly doped region, and a top heavily doped n-type region. The first plurality of memory cells includes programmed cells and unprogrammed cells, wherein programmed cells comprise at least half of the first plurality of memory cells. Current flowing through the p-i-n diodes of at least 99 percent of the programmed cells when a voltage between about 1.5 volts and about 3.0 volts is applied between the bottom heavily doped p-type region and the top heavily doped n-type region is at least 1.5 microamps. | 12-24-2009 |
| 20080247213 | Memory Device for Protecting Memory Cells during Programming - Improved circuitry and methods for programming memory cells of a memory device are disclosed. The improved circuitry and methods operate to protect the memory cells from potentially damaging electrical energy that can be imposed during programming of the memory cells. Additionally, the improved circuitry and methods operate to detect when programming of the memory cells has been achieved. The improved circuitry and methods are particularly useful for programming non-volatile memory cells. In one embodiment, the memory device pertains to a semiconductor memory product, such as a semiconductor memory chip or a portable memory card. | 10-09-2008 |
| 20090296448 | DIODE AS VOLTAGE DOWN CONVERTER FOR OTP HIGH PROGRAMMING VOLTAGE APPLICATIONS - A voltage down converter for programming a one-time-programmable (OTP) memory comprising is disclosed, the voltage down converter comprises a bonding pad for coupling to a programming power supply, and at least one forward biased diode coupled between the bonding pad and the OTP memory, wherein a programming voltage received by the OTP memory is lowered from the programming power supply by the voltage drop across the forward biased diode. | 12-03-2009 |
