Class / Patent application number | Description | Number of patent applications / Date published |
356400000 | With light detector (e.g., photocell) | 70 |
20080212097 | Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell - Each target used in a method of measuring overlay using a scatterometer includes a first portion and a second portion, the first portion has features varying only in a first direction and the second portion has features only varying in a second direction. The first and second directions are orthogonal, thus eliminating cross talk between the directions, and improving the accuracy of overlay error calculations. | 09-04-2008 |
20080212098 | METHOD AND APPARATUS FOR DETECTING FEATURE - A method includes detecting a feature of an input pattern using a plurality of feature detectors, selecting at least one of the feature detectors based on their output values, and calculating a feature quantity of the input pattern based on an output value from at least one selected feature detector. | 09-04-2008 |
20080239320 | LIGHT-EMITTING MODULE AND METHODS FOR OPTICALLY ALIGNING AND ASSEMBLING THE SAME - An optical alignment method is for a light-emitting module that includes a housing unit, a light-emitting unit disposed in the housing unit, and a lens unit. The optical alignment method includes: (a) through image-capturing techniques, finding a light-emitting point of the light-emitting unit and a predetermined reference point, and determining a total optical path length between the light-emitting point and an imaging plane; (b) finding a first center line that divides the total optical path length in half; (c) through image-capturing techniques, finding opposite first and second edges of the lens unit, and determining a lens length between the first and second edges; (d) finding a second center line that divides the lens length in half; and (e) assembling the lens unit to the housing unit so that the first and second center lines overlap. A light-emitting module and an assembly method therefor are also disclosed. | 10-02-2008 |
20080291448 | METHODS AND APPARATUS FOR FINDING A SUBSTRATE NOTCH CENTER - Methods and apparatus are provided for locating a notch and/or a center of the notch of a substrate. An exemplary method includes rotating a substrate; illuminating an edge of the substrate with a light beam as the substrate rotates; detecting a change in light intensity of the light beam as the substrate rotates; determining a rough location of a notch in the edge of the substrate based on a position of the substrate when the change in light intensity of the light beam is detected; and reversing a rotational direction of the substrate to determine a fine location of the notch in the edge of the substrate. Numerous other aspects are provided. | 11-27-2008 |
20080304065 | Rail Sensing Apparatus Method - A rail sensing and analysis system utilizes a laser sensor | 12-11-2008 |
20090009765 | FLOW PATH UNIT, INSPECTION APPARATUS, AND INSPECTION METHOD - A flow path unit of one aspect of the invention includes: a plurality of plates, each of the plurality of plates having a hole, the plurality of plates being laminated in a lamination direction with a predetermined positional relationship such that a flow path is formed by mutual communication of the holes provided at the plurality of plates. Each of the plurality of plates having a side surface, and a slit portion formed at the side surface, and the slit portions of the plurality of plates are connected to one another in the lamination direction of the plurality of plates. Each of widths of the slit portions of the plurality of plates is equal to or below an allowable error of a positional deviation of the plurality of plates so as to allow a formation of the flow path by the plurality of holes. | 01-08-2009 |
20090015836 | ADJUSTMENT METHOD FOR POSITION DETECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides an adjustment method for a position detection apparatus which comprises an optical system including first and second optical members whose positions can be changed, and detects a position of an object, comprising the steps of calculating a value representing an asymmetry of a detection signal of a light which enters a photoelectric conversion device via the optical system, for each of a plurality of positions of the first optical member in a direction perpendicular to an optical axis of the optical system, specifying a position of the object in the direction of the optical axis, at which the value is insensitive, for each of the plurality of positions, and adjusting a position of the second optical member in the direction perpendicular to the optical axis based on the value at the position of the object specified in the specifying step. | 01-15-2009 |
20090086207 | ALIGNMENT SYSTEM FOR OPTICAL LITHOGRAPHY - An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography. | 04-02-2009 |
20090097027 | System and method for image analysis pointing-error correction - The disclosure relates to a system and a method for light beam interrogation of an optical biosensor and for monitoring a biological event on the biosensor for use, for example, in microplate image analysis. The system and method correct pointing-errors that can be encountered, for example, in scanning label-independent-detection biosensor applications. | 04-16-2009 |
20090141275 | ALIGNMENT INSPECTION METHOD AND ALIGNMENT INSPECTION APPARATUS - A method of inspecting the alignment of a second structure with respect to a first structure, including emitting light from a first plane of a first structure to a second plane of a second structure in a first direction perpendicular to the first plane of the first structure, the first plane and the second plane facing each other. The incident light can be reflected from the second plane toward the first plane in a second direction parallel with the first direction. The position of the reflected light can be detected to inspect the alignment of the second structure with respect to the first structure. | 06-04-2009 |
20090147258 | Light amount detector, misalignment amount detector, and image density detector - A light amount detector includes a light emitter, a light receiver, and a light amount detection unit. The light emitter emits light on a detection pattern formed on a detection surface of an image carrier. The light receiver detects diffused light reflected from the detection pattern. The light amount detection unit detects an amount of light received by the light receiver based on detection output of the light receiver. One of the light emitter and the light receiver is provided at a position directly opposite to the detection surface, such that a distribution of sensitivity of the light receiver detecting the diffused light is substantially symmetrical with respect to a detection output peak when the detection surface is substantially parallel to a hypothetical line connecting the light emitter with the light receiver. | 06-11-2009 |
20090190131 | Methods and system for aligning optical packages - A method for aligning a beam spot with a waveguide portion of a wavelength conversion device includes scanning a beam spot over the input face of the wavelength conversion device while measuring the output intensity of the device such that an output intensity for each of a plurality of fast scan lines is generated. A first alignment set point is then determined based on the output intensity of each fast scan line. A second scan of the beam spot is then performed over the fast scan line containing the first alignment set point while measuring the output intensity for each point along the fast scan line. A second alignment set point is then determined based on the output intensities measured during the second scan. The beam spot is then aligned with the waveguide portion using the first alignment set point and the second alignment set point. | 07-30-2009 |
20090207411 | Aligning Multiple Image Frames in an LCoS Projector - In one embodiment, a system for aligning multiple image frames in an LCoS projector is provided. The system includes a plurality of detectors aligned with a desired projection image of a projector. The plurality of detectors is coupled to the projector. Each detector of the plurality of detectors is aligned with an edge of the desired projection image. The plurality of detectors may be coupled to a screen distant from the projector, or part of a calibration unit associated more directly with the projector. The system may further include calibration logic in the projector. The calibration logic is to receive data from the plurality of detectors and to adjust an image of the projectors responsive to the data from the plurality of detectors. | 08-20-2009 |
20090251697 | LASER EMITTER MODULES AND METHODS OF ASSEMBLY - Embodiments are directed to laser emitter modules and methods and devices for making the modules. Some module embodiments are configured to provide hermetically sealed enclosures that are convenient and cost effective to assemble and provide for active alignment of optical elements of the module. | 10-08-2009 |
20090303482 | Enhanced Ovl dummy field enabling "on-the-fly" ovl measurement methods - A semiconductor wafer may include a dummy field configured to enable overlay measurements. The enhanced dummy field may include a plurality of encoding blocs that enable OVL measurements to be made throughout the enhanced dummy field. | 12-10-2009 |
20100007885 | Pre-Aligned Metrology System and Modules - A Pre-Aligned Metrology System comprising a number of Pre-Aligned Metrology Assemblies and Pre-Aligned Metrology Modules for measuring a target on a wafer. The Pre-Aligned Metrology Assemblies and Pre-Aligned Metrology Modules can reduce the maintenance down time and decrease the cost of ownership (COO). | 01-14-2010 |
20100091283 | OPTICAL ALIGNMENT TOOL AND METHOD OF ALIGNMENT - An alignment tool for use in calibrating an optical bench and/or alignment of an optical system such as a collector optical system for EUV and X-ray applications is disclosed. The optical system includes multiple nested mirrors attached to a mechanical support. The tool includes a mechanical interface plate, a lower reference ring, an upper reference ring and a pinhole member disposed spaced apart axially in sequence; a first positioning device attached to the mechanical interface plate and to the lower reference ring; the first positioning device being adapted for precisely adjusting the position of the lower reference ring in two dimensions; a second positioning device attached to the mechanical interface plate and to the upper reference ring and adapted for precisely adjusting the position of the upper reference ring in two dimensions; a third positioning device attached to the upper reference plate and to the pinhole member and adapted for precisely adjusting the position of the pinhole member in three dimensions; a mechanical interface mounted on or integral with the mechanical interface plate and being substantially identical in form to that of the mechanical support of the optical system. | 04-15-2010 |
20100123899 | DETECTOR SYSTEM WITH AN OPTICAL FUNCTION AND METHOD FOR MAKING SUCH A SYSTEM - The invention relates to a system and method for positioning and passively aligning at least one optical component as close as possible to an electromagnetic radiation detector. This system comprises supporting wedges ( | 05-20-2010 |
20100177315 | ALIGNMENT DEVICE AND METHOD FOR OPTICAL SYSTEM - An alignment device is provided for aligning a primary mirror with a secondary mirror in an optical system having the primary mirror and the secondary mirror arranged so as to face each other along the optical axis. The alignment device has a dichroic film formed on a surface on the front side of the secondary mirror and configured to reflect light used in the optical system and to transmit alignment light, a back reflecting surface formed on the back side of the secondary mirror and configured to reflect the alignment light, and a detection system which detects a positional deviation between the primary mirror and the secondary mirror, based on the alignment light having traveled via the dichroic film, the back reflecting surface, and a reflecting surface of the primary mirror. | 07-15-2010 |
20100214565 | IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE - An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor. | 08-26-2010 |
20100220325 | METHOD FOR ORIENTING AN OPTICAL ELEMENT ON A SCREEN - The invention relates to a method for orienting an optical element (e. g. a parallax barrier screen or lenticular screen) on a screen comprising pixels x(i, j) in a raster composed of lines (i) and columns (j) in order to produce a screen for three-dimensional representation. In said method, especially a test pattern is presented which consists of various views A(k), wherein k=n, and n>1. The test pattern comprises at least two first straight lines that are located in different horizontal positions in the n>1 views A(k) as well as at least two second straight lines which each extend parallel to one of the first straight lines and are located in at least the same horizontal positions in the n>1 views A(k). The method according to the invention can be carried out quickly and with high accuracy and is therefore suitable for industrial use to produce screens for three-dimensional representation. | 09-02-2010 |
20100245824 | METHOD FOR ORIENTING A PARALLAX BARRIER SCREEN ON A DISPLAY SCREEN - A method for orienting a parallax barrier screen on a display screen with picture elements x(i,j) in a grid comprising rows i and columns j for the purpose of producing a display screen for three-dimensional representation. This method includes the steps of: temporary application of a positioning marker, observation of the positioning marker by means of a camera, relative orientation of the display screen, removal of the positioning marker, positioning of the parallax barrier screen in front of the picture area of the display screen display of a test picture, which comprises various views, where k=1, . . . , n and n=6 or n=7, on the picture elements x(i,j) with rows i and columns j, observation of the displayed test picture through the parallax barrier screen by the camera, orientation of the parallax barrier screen in front of the display screen. The method according to the invention can be carried out quickly and is therefore suitable for industrial use for the manufacture of display screens for three-dimensional representation. | 09-30-2010 |
20100277735 | APPARATUS FOR MANUFACTURING CARBON NANOTUBES - An apparatus for manufacturing carbon nanotubes includes an observation device, a work stage, a laser device, and a lighting device. The observation device includes an observation tube, an observation window arranged on the top of the observation tube, a first half-reflecting, pellicle mirror installed with an angle 45° in the observation tube, and a second half-reflecting, pellicle mirror installed parallel to the first half-reflecting, pellicle mirror. The work stage is disposed under and separated from the observation tube with a certain distance. The laser device is arranged perpendicular to the observation device and corresponding to the first half-reflecting, pellicle mirror. The lighting device is arranged perpendicular to the observation device and corresponding to the second half-reflecting, pellicle mirror. The observation device, the laser device and the lighting device are optically conjugated/linked with one another. | 11-04-2010 |
20100302542 | SOLID STATE FLEXURE FOR POINTING DEVICE - A system for achieving multi-axis angular alignment of devices includes a monolithic mount. The mount includes three sections arranged along a longitudinal axis. The first two sections are connected by two flexures that constrain the second section to rotate in relation to the first section in a first rotational degree of freedom. The second and third sections are connected by flexures that constrain the third section to rotate in relation to the second section in a second rotational degree of freedom. The first and second rotational degrees of freedom are different. Actuating screws contact bearing surfaces on the mount to actuate the rotations. | 12-02-2010 |
20100302543 | METHOD OF MANUFACTURING OPTICAL RECEIVER MODULE AND APPARATUS FOR MANUFACTURING THE SAME - The core adjusting process includes a procedure of searching for the position in which the photocurrent of the light-receiving element reaches its peak in each of the X-, Y-, and Z-directions. In the searching procedure, the light emitted from a multimode fiber of a MCP is gathered by a lens and is transmitted to the light-receiving element. A check is then made to determine whether, at in both directions of the search direction, there exist a first and second attenuation positions in which the photocurrent shows a predetermined attenuation relative to a peak value in a search range. If there exist the attenuation positions, a peak position is determined to be a position located within a second predetermined range from the middle point between the attenuation positions, and the relative positions of the receptacle and the CAN package are adjusted to the peak position. | 12-02-2010 |
20110013187 | METHOD AND APPARATUS FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT - A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light. | 01-20-2011 |
20110051138 | PROCESS TO OPTICALLY ALIGN A PHOTORECEIVER WITH A LASER TRANSMITTER SOURCE IN A LASER RANGEFINDER SYSTEM - A process for optically aligning a laser rangefinder that includes the steps of providing a laser rangefinder having a laser source, a photodetector lens and a photodetector, providing a fiber optic travel path, aligning the laser source to the fiber optic travel path, illuminating the photodetector with a light source, focusing the photodetector lens, coupling the fiber optic travel path to an optical light source, and aligning the fiber optic light relative to the photodetector. | 03-03-2011 |
20110075145 | ALIGNMENT SYSTEM FOR OPTICAL LITHOGRAPHY - An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography. | 03-31-2011 |
20110085168 | Luminescence Reference Standards - The present teachings provide for systems, and components thereof, for detecting and/or analyzing light. These systems can include, among others, optical reference standards utilizing luminophores, such as nanocrystals, for calibrating, validating, and/or monitoring light-detection systems, before, during, and/or after sample analysis. | 04-14-2011 |
20110102794 | Method and Apparatus for Pipe Alignment Tool - A method and apparatus for a pipe alignment tool have been described. A laser is inserted into the end of a pipe and projects a laser beam indicative of the longitudinal axis of the pipe. | 05-05-2011 |
20110109906 | Fast sample height, AOI and POI alignment in mapping ellipsometer or the like - A sample investigation system (ES) in functional combination with an alignment system (AS), and methodology of enabling calibration and very fast, (eg. seconds), sample height, angle-of-incidence and plane-of-incidence adjustments, with application in mapping ellipsometer or the like systems. | 05-12-2011 |
20110255089 | Methods for Aligning Wavelength Converted Light Sources - A method for aligning a semiconductor laser to a wavelength conversion device in a wavelength converted light source includes positioning a beam spot of the semiconductor laser on an input facet of the wavelength conversion device. The beam spot is stepped in a scanning direction by a succession of steps. A wavelength control signal of the semiconductor laser is swept over an alignment signal range at the end point of individual steps of the succession of steps. The peak output power of a wavelength converted output beam emitted from the wavelength conversion device during the sweep is determined at the end point of individual steps of the succession of steps. The peak output power is compared to a threshold output power to determine if the beam spot is aligned with the waveguide of the wavelength conversion device. | 10-20-2011 |
20120019826 | ALIGNMENT OF LIGHT SOURCE FOCUS - An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam. | 01-26-2012 |
20120099107 | Workpiece Alignment Device - An example embodiment relates to an alignment device including an optical aligner system including a plurality of aligners configured to measure a position of a workpiece having a plurality of alignment marks, and an optical member. The optical member is configured to diverge alignment beams reflected from neighboring alignment marks of the plurality of alignment marks and transmit the beams to neighboring aligners of the plurality of aligners respectively if a distance between the neighboring aligners is greater than a distance between the neighboring alignment marks. | 04-26-2012 |
20120147371 | Overlay Measurement Apparatus and Method - An overlay measurement apparatus includes a stage on which a wafer comprising first and second overlay measurement keys, which are separated from each other, is placed. A nonlinear medium receives a reference beam and first and second diffracted beams respectively generated by the first and second overlay measurement keys. A detector detects a synthesized beam emitted from the nonlinear medium. | 06-14-2012 |
20120154808 | METHOD FOR DETECTING THE OPTIMUM VIEWING DISTANCE OF THREE-DIMENSIONAL DISPLAY - A method for detecting the optimum viewing distance of three-dimensional display is provided, which includes: providing a three-dimensional display having a display screen to display at least a testing pattern thereon; providing a platform with an included angle towards the display screen at a side of the three-dimensional display, wherein the testing pattern on the display screen is suitable to be projected onto the platform; providing an image sensing element over the platform to capture the testing pattern projected on the platform for producing an image frame. The image frame includes at least a first color area and at least a second color area. The first color area partially overlaps the second color area. The non-overlapping areas of the first color area and the second color area are defined as an optimum viewing distance. | 06-21-2012 |
20120170038 | Alignment Method for Inspecting a Mirror - An alignment method for controlling a mirror ( | 07-05-2012 |
20130088715 | AUTOMATIC OPTIMAL POSITIONING OF SPECTROPHOTOMETER WHILE MEASURING MOVING MEDIA - A system and method for computer automated optimal lateral alignment of a spectrophotometer over a region of consistent color on a moving media or web for maintaining consistent color and or tonal qualities of a color application production process. The system consisting of a computer operated lateral traverse mechanism affixed to the press or color application equipment that is able to move the sensor laterally in small increments across the band of the color patches on the moving web or media, marking the lateral position each time it makes a light measurement, and therefrom calculating the optimal lateral alignment or position of the sensor for maintaining consistent color or density control during the color application process. | 04-11-2013 |
20130135618 | ANALYSIS - Analysis methods and apparatus are provided for inspecting a channel, such as a capillary electrophoresis channel, in a device. Configuration and alignment systems are provided, together with optical systems and temperature control. | 05-30-2013 |
20130141723 | Alignment Mark Deformation Estimating Method, Substrate Position Predicting Method, Alignment System and Lithographic Apparatus - A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation. | 06-06-2013 |
20130169967 | Alignment Registration Feature For Analyte Sensor Optical Reader - An optical reader for interrogating an optical analyte sensor includes a housing, comprising in its interior: at least one light source, a detector, and a programmable logic device. The housing has a registration feature configured to align the optical reader with an optical analyte sensor. Methods for confirming alignment of such optical readers are also disclosed. | 07-04-2013 |
20130194574 | SUBSTRATE POSITIONING DEVICE - A substrate positioning device includes: a supporting unit for supporting a substrate in place; a light emitting unit and a light receiving unit respectively arranged at major surface sides of the substrate to face each other; a light emission control unit configured to control a light emission quantity of the light emitting unit pursuant to a control value; and a detecting unit for detecting a light reception quantity received by the light receiving unit. The substrate positioning device further includes an adjusting unit for controlling the control value pursuant to the light reception quantity while the substrate is not supported by the supporting unit. | 08-01-2013 |
20130208278 | ALIGNMENT APPARATUS AND METHOD - An alignment device for conducting single axis alignment of a workpiece is provided. The alignment device has a holder positioned on a worktable. The holder is rotatable about an axis and holds the workpiece. The alignment device also has a light source that emits a beam of light toward the workpiece. Optics positioned at an emitting end of the light source and a slit portion provided between the light source and the optics cooperate to shape the light beam emitted from the light source to be elongated in a direction orthogonal to the worktable. A photodetector is disposed in the vicinity of the light source and in the orthogonal plane with respect to an optical axis of the light source. A circuit portion determines when a workpiece is aligned with the work table based on the photodetector detecting the reflected beam of light and outputs a signal confirming alignment to a user. | 08-15-2013 |
20130229656 | Method and Apparatus for Electric Powered Vehicle Recharging Safety - An apparatus comprising a charging pin in a recharging inlet of an electric powered vehicle (EPV) recharging inlet, a ground pin in the recharging inlet and substantially parallel to the charging pin, a safety pin in the recharging inlet and substantially parallel to the charging pin and the ground pin, an electric power source coupled to the safety pin, and a control circuit coupled to the electric power source and the safety pin, wherein the length of the safety pin extended in the recharging inlet is substantially shorter than the length of the ground pin and longer than the length of the charging pin. | 09-05-2013 |
20130242305 | Imaging Overlay Metrology Target and Complimentary Overlay Metrology Measurement System - An exclusion region of interest imaging overlay target includes a self-symmetric target structure including two or more pattern elements, and an additional target structure including two or more pattern elements, wherein each of pattern elements of the additional target structure is contained within a boundary defined by one of the pattern elements of the self-symmetric target structure, wherein the self-symmetric target structure is characterized by a composite exterior region of interest, wherein the composite exterior region of interest is formed by removing two or more exclusion zones corresponding with the pattern elements of the additional target structure from an exterior region of interest encompassing the self-symmetric target structure, wherein each of the pattern elements of the additional target structure is characterized by an interior region of interest, wherein the self-symmetric target structure and the additional target structure are configured to have a common center of symmetry upon alignment. | 09-19-2013 |
20130250298 | INSPECTION APPARATUS AND INSPECTION METHOD FOR SEMICONDUCTOR DEVICE - An apparatus relating to the manufacture of stacked semiconductor devices includes, for example, a first holding section configured to hold a first semiconductor device and a second holding section configured to hold a second semiconductor device. Additionally, a measuring section including an imaging device for acquiring images of the first and second semiconductor devices and a control section configured to control the holding sections to correct misalignment between the semiconductor devices. The control section is further configured to determine misalignment using the images of the first and second semiconductor devices when the images include a first alignment mark disposed proximate to an edge of the first semiconductor device and a second alignment mark disposed proximate to an edge of the second semiconductor device. | 09-26-2013 |
20130258338 | SENSOR DEVICE, RECORDING APPARATUS, AND POSITION ADJUSTMENT METHOD OF OPTICAL AXIS - A sensor device according to the invention includes a transmission type sensor pair that includes a light emitting unit and a light receiving unit, an optical axis alignment mechanism that aligns optical axes of the light emitting unit and the light receiving unit, and a fixing frame that is adjusted by the optical axis alignment mechanism, and in which the sensor pairs are fixed in a state in which the optical axes of the light emitting unit and the light receiving unit are aligned. | 10-03-2013 |
20130301049 | SYSTEM FOR DETECTING MISALIGNMENT OF AN AERO SURFACE - A system for detecting misalignment of an aero surface relative to other aero surfaces during simultaneous deployment of said aero surfaces is disclosed. It comprises a generator configured to shine a laser through aligned apertures in a series of aero surfaces towards a reflector during deployment of said aero surfaces, a receptor to detect reflection of said laser from said reflector back through said apertures to the generator and, a controller operable to terminate further deployment of said aero surfaces in the event that no reflection is detected by said receptor, or if an actual time taken for the reflected beam of light to be detected by the receptor differs from a predetermined time. In a preferred embodiment the aero sufaces are slats extending from the leading edge of an aircraft wing. | 11-14-2013 |
20130314708 | Method and Apparatus for Maintaining Depth of Focus - A method includes directing a beam of radiation along an optical axis toward a workpiece support, measuring a spectrum of the beam at a first time to obtain a first profile, measuring the spectrum of the beam at a second time to obtain a second profile, determining a spectral difference between the two profiles, and adjusting a position of the workpiece support along the optical axis based on the difference. A different aspect involves an apparatus having a workpiece support, beam directing structure that directs a beam of radiation along an optical axis toward the workpiece support, spectrum measuring structure that measures a spectrum of the beam at first and second times to obtain respective first and second profiles, processing structure that determines a difference between the two profiles, and support adjusting structure that adjusts a position of the workpiece support along the optical axis based on the difference. | 11-28-2013 |
20130321811 | MEASURING METHOD, AND EXPOSURE METHOD AND APPARATUS - A method for measuring a relative position of a first mark and a second mark by using a detection optical system that irradiates a mark formed on the substrate to detect an image of the mark, includes performing a first processing to detect an image of the first mark by using the detection optical system to irradiate the first mark from the first surface side, performing a second processing to detect an image of the second mark by using the detection optical system to irradiate the second mark from the first surface side with light having a wavelength passing through the substrate in a state where the first mark is out of the field of view of the detection optical system, and calculating a relative position of the first mark and the second mark. | 12-05-2013 |
20130342843 | Reflection Shadow Mask Alignment Using Coded Apertures - In a shadow mask-substrate alignment method, a light source, a beam splitter, a first substrate including a first grate, a second substrate including a second grate, and a light receiver are positioned relative to each other to define a light path that includes light output by the light source being reflected a first time by the beam splitter. The light reflected the first time passes through the first or second grate and is at least partially reflected a second time by the second or first grate back through the first or the second grate, respectively. The light reflected the second time passes at least partially through the beam splitter for receipt by the light receiver. The orientation of the first substrate, the second substrate or both is adjusted to position the first grate, the second grate, or both until a predetermined amount is received by the light receiver. | 12-26-2013 |
20140002822 | OVERLAY MARK AND METHOD OF MEASURING THE SAME | 01-02-2014 |
20140176944 | METHODS AND SYSTEMS FOR DETERMINING A PROBE-OFF CONDITION IN A MEDICAL DEVICE - A physiological monitoring system may determine a probe-off condition. A physiological sensor may be used to emit one or more wavelengths of light. A received light signal may be processed to obtain a light signal corresponding to the emitted light and an ambient signal. The signals may be analyzed to identify similar behavior. The system may determine whether the physiological sensor is properly positioned based on the analysis. | 06-26-2014 |
20140176945 | ALIGNING MODULE AND METHOD FOR ASSEMBLING LIGHT-EMITTING DIODE WITH LENS USING THE SAME - An exemplary aligning module for aligning a lens with a light-emitting diode (LED) chip includes a controlling module, a first image sensing module and a second image sensing module controlled by the controlling module, and a gripping module controlled also by the controlling module. The controlling module controls the first image sensing module and the second image sensing module to sense the light center of the LED chip and the geometric center of the lens, respectively. The controlling module controls the gripping module to bring the geometry center of lens to be aligned precisely with the light center of the LED chip according to a coordinate of the light center the LED and a coordinate of the geometric center of the lens. The present disclosure also relates to a method for aligning a lens with a light emitting diode chip. | 06-26-2014 |
20140185045 | ETALON-BASED WAVELEGNTH LOCKING APPARATUS AND ALIGNMENT METHOD - Consistent with the present disclosure, an apparatus for producing a control signal for a laser source is provided, comprising an etalon configured to receive light from the laser source and control circuitry that provides the control signal, wherein the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) the light received by the etalon from the laser source. Alternatively, the control signal is indicative of a comparison of (a) a difference between a forward transmission signal of the etalon and a backward reflection signal of the etalon and (b) a combination of the forward transmission signal of the etalon and the backward reflection signal of the etalon. Also consistent with the present disclosure, a method of aligning an etalon-based wavelength locking apparatus is provided, wherein the etalon of the apparatus is aligned with an optical axis along a direction of propagation of the output of the laser source by monitoring the signals indicative of the forward transmission signal and the backward reflection signal of the etalon. | 07-03-2014 |
20140204380 | METHOD FOR DETECTING ALIGNMENT BETWEEN OPTICAL FIBERS AND LENSES OF OPTICAL CONNECTOR - In a method for determining alignment between an optical fiber and a converging or diverging lens, light is directed into an optical fiber of an optical connector with a lens element. The lens element has a front surface forming a lens and a back surface defining a recess, the optical fiber is inserted into the recess and points at the lens, to form a light spot on the front surface. An image of the front surface of the lens is captured and a coordinate system is established. Coordinate values of the center of the lens and of the light spot in the coordinate system are measured. The respective coordinate values of the center of the lens and of the center of the light spot are compared for matching or otherwise to determine correct alignment or otherwise. | 07-24-2014 |
20140233032 | METHOD AND APPARATUS FOR MEASURING A PITCH STATIC ATTITUDE OF A HEAD STACK ASSEMBLY - A tester including a laser transmitter, a laser receiver, a zero reference plane located between the laser transmitter and the laser receiver, a tower reference plane located between the laser transmitter and the laser receiver, wherein the tower reference plane defines an aperture, and a controller. The controller is configured to measure a pitch static attitude of a head stack assembly by at least determining a zero axis, determining a first horizontal position of the aperture and a second horizontal position of the aperture, determining a mid-point of a first slider of the head stack assembly, determining a first vertical position of the aperture, determining a first horizontal line, and generating a pitch static attitude reference line corresponding to a pitch static attitude of the first slider based on a least squares approximation using the mid-point of the first slider and the first horizontal line. | 08-21-2014 |
20140375993 | Bicycle Alignment Device - An alignment device for bicycle handlebars that enables them to be accurately aligned relative to the front wheel. The device may include a unitary body and a laser beam emitter. The laser beam emitted may create a visible point of light wherever the beam makes contact with the front wheel, or the bicycle frame, or another component attached to the bicycle frame. The laser beam can be perpendicular to the handlebars. The laser beam emitter is preferably able to be changed by the user. Using the laser beam, and by adjusting the beam's angle of declination or inclination, the user can preferably make fine adjustments to the alignment of the handlebars, relative to the front wheel, and/or another component that is mounted on the bicycle frame, relative to the bicycle frame. | 12-25-2014 |
20150036137 | ALIGNMENT OF OPTICAL COMPONENTS - Alignment of a near field transducer (NFT) optical input coupler and a light emitting device involves providing excitation radiation from an excitation light source through an optical input coupler to the NFT and filtering output radiation from the NFT using a short wavelength pass optical filter. The optical input coupler is scanned through multiple positions while the photoluminescent radiation is detected. A first alignment position between the NFT input coupler and the excitation light source is identified based on the detected photoluminescent radiation. A light emitting device is scanned through multiple positions the light output is detected by a detector. A second alignment position between the light emitting device and the detector is identified. The first and second alignment positions are used to align the light emitting device with the optical input coupler. | 02-05-2015 |
20150049334 | OPTICAL IMAGE CAPTURING MODULE, ALIGNING METHOD, AND OBSERVING METHOD - A method of aligning an upper substrate and a lower substrate is provided. The upper and lower substrates are oppositely arranged, and the aligning method includes the following steps: providing an optical image capturing module; emitting light rays to a third surface of a first prism; filtering the light rays, so that the light rays are divided into light rays at the first wavelength range and light rays at the second wavelength range, wherein the light rays at the first wavelength range irradiate a pattern on the upper substrate, and light rays at the second wavelength range irradiate a pattern on the lower substrate; reflecting a pattern image on the upper substrate to an image capturing apparatus; reflecting a pattern image on the lower substrate to the image capturing apparatus; and determining locations of the patterns of the upper and lower substrate that are on the image capturing apparatus. | 02-19-2015 |
20150124256 | METHOD AND DEVICE FOR ALIGNMENT OF AN OPTICAL IMAGING SYSTEM - An optical imaging system is to be aligned with its optical axis in relation to a given alignment axis. For this, a radiation beam is emitted from one side of the imaging system along the alignment axis. In the direction of beam propagation, there is located behind the imaging system a pair of diaphragm elements, whose apertures are each covered by a piece of material transparent to the radiation, carrying a plurality of sensor elements arranged in a matrix. The sensor elements furnish information about the measured radiation intensity to a signal processing unit, which can graphically illustrate the current alignment status of the imaging system on a monitor and/or produce an automatic adjustment of the imaging system. | 05-07-2015 |
20150316490 | REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY MEASUREMENTS - Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy. | 11-05-2015 |
20150323317 | Alignment Adjusting Device - An alignment adjusting device is provided for an optical focal plane assembly, wherein the optical focal plane assembly has a detector with a detector plane and is adapted to be mounted to an optics assembly having an optical focal plane. The alignment adjusting device is adapted for allowing an alignment of the detector plane representing an image area and the optical focal plane. The alignment adjusting device includes a detector support for receiving the detector; a plurality of members, wherein a first member of the plurality of the members is connected to the detector support and a second member is connected to a flange that is adapted to be connected to the optics assembly. The first member, the second member and the remaining number of the members are pairwise moveable connected to each other by a number of springs and/or supporting elements. The number of springs and/or supporting elements are adapted to enable a translational movement along axes and/or a rotational movement around the axes of a given coordinate system. | 11-12-2015 |
20160007925 | Positioning a wearable device for data collection | 01-14-2016 |
20160033878 | OVERLAY SAMPLING METHODOLOGY - One embodiment relates to a method for overlay sampling. The method provides a number of fields over a semiconductor wafer surface. An inner subgroup of the number of fields includes fields in a central region of the wafer surface. An outer subgroup of the number of fields includes neighboring fields near a circumferential edge of the wafer surface. The method measures a first number of overlay conditions at a corresponding first number of overlay structures within a field of the inner subgroup. The method also measures a second number of overlay conditions at a corresponding second number of overlay structures within a field of the outer subgroup. The second number is greater than the first number. Based on the measured first number of overlay conditions and the measured second number of overlay conditions, the method determines an alignment condition for two or more layers on the semiconductor wafer surface. | 02-04-2016 |
20160054120 | AUTOMATED UPPER/LOWER HEAD CROSS DIRECTION ALIGNMENT BASED ON MEASUREMENT OF SENSOR SENSITIVITY - A method includes moving a first sensor assembly to a plurality of cross direction positions relative to a second sensor assembly, where the first and second sensor assemblies are configured to move in the cross direction relative to a web of material. The method also includes, for each of the plurality of cross direction positions, determining a sensor value associated with a sensor source disposed at the second sensor assembly as measured by a sensor receiver disposed at the first sensor assembly. The method further includes determining a starting alignment position of the first sensor assembly to be a first cross direction position where a difference between the sensor value at the first cross direction position and a corresponding sensor value at one or more adjacent cross direction positions is a minimum. | 02-25-2016 |
20160109230 | Metrology Of Multiple Patterning Processes - Methods and systems for evaluating the performance of multiple patterning processes are presented. Patterned structures are measured and one or more parameter values characterizing geometric errors induced by the multiple patterning process are determined. In some examples, a primary, multiple patterned target is measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target and an assist target are measured and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. In some other examples, a primary, multiple patterned target is measured at different process steps and a value of a parameter of interest is directly determined from the measured data by a Signal Response Metrology (SRM) measurement model. | 04-21-2016 |
20160377421 | PIPE LOCATING SYSTEM - A method and device for location of pipes is disclosed. The method can comprise mounting one or more centering tools, each having a reflector to a first pipe such that the reflectors are either aligned with, or can be used to determine the location of the center of the first pipe and mounting one or more centering tools, each having a reflector to a second pipe such that the reflectors are either aligned with, or can be used to determine the location of the center of the second pipe. The method can further comprise determining a first distance between the center of the first pipe and a light emitting source at an observation point disposed between the first pipe and the second pipe and determining a second distance between the center of the second pipe and the light emitting source at the observation point. | 12-29-2016 |
20180025949 | METHOD OF MEASURING MISALIGNMENT OF CHIPS, A METHOD OF FABRICATING A FAN-OUT PANEL LEVEL PACKAGE USING THE SAME, AND A FAN-OUT PANEL LEVEL PACKAGE FABRICATED THEREBY | 01-25-2018 |
20220136928 | LEVEL CORRECTION SYSTEM - A level correction system includes a first adjustment device, a chuck device provided on the first adjustment device, a first reflective device provided on the chuck device, a second adjustment device, a carrying table provided on the second adjustment device, a second reflective device provided on the carrying table, a laser emitter configured to emit incident laser light, a laser receiver, and a controller. The first reflective device and the second reflective device are used to reflect the incident laser light to form a reflected laser light. The laser receiver is used to receive the reflected laser light. The controller is used to determine a height of the chuck device or the carrying table and whether a center point of a reflected light spot formed by the reflected laser light is offset from a center point of an incident light spot formed by the incident laser light. | 05-05-2022 |