Class / Patent application number | Description | Number of patent applications / Date published |
356632000 | Of light permeable material | 17 |
20080316506 | VISUAL INSPECTION APPARATUS FOR A WAFER - Provided is a visual inspection apparatus for a semiconductor wafer, by which a threshold value optimal for inspection can be determined and visual inspection of each chip can be performed based on the threshold value, by obtaining in advance a table indicating a relation between a film thickness of a thin film in specific positions in the wafer and a gradation value for each sample area in the chip, measuring the film thickness of the thin film in the specific positions of the wafer to be inspected before inspecting the chip, and comparing the measured film thickness with the gradation value in the table. | 12-25-2008 |
20100033735 | WAVELENGTH SELECTION METHOD, FILM THICKNESS MEASUREMENT METHOD, FILM THICKNESS MEASUREMENT APPARATUS, AND SYSTEM FOR PRODUCING THIN FILM SILICON DEVICE - An object is to reduce film thickness measurement error. Illumination light having different wavelengths is radiated onto a plurality of samples in which thin films having different film qualities and film thicknesses are provided on substrates, evaluation values related to the amounts of transmitted light when the illumination light of each wavelength is radiated are measured, film thickness characteristics, showing the relationship between the evaluation values and the film thicknesses for each film quality, are formed at each wavelength based on the measurement results, and among the film thickness characteristics, a wavelength at which a measurement difference between the evaluation values caused by the film qualities is in a predetermined range is selected. | 02-11-2010 |
20100177326 | FILM-THICKNESS MEASUREMENT METHOD AND APPARATUS THEREFOR, AND THIN-FILM DEVICE FABRICATION SYSTEM - Objects are to reduce the burden on an operator and to improve fabrication efficiency. A transparent conductive film or a transparent optical film formed on a substrate W is irradiated with line illumination light by means of a line illumination device 3, line reflected light reflected at the transparent conductive film or the transparent optical film is detected with a camera, a color evaluation value of the detected reflected light is measured, and a film thickness corresponding to the measured color evaluation value is obtained using a film-thickness characteristic in which the color evaluation value is associated with the film thickness. | 07-15-2010 |
20110102812 | METHOD AND DEVICE FOR MEASURING THICKNESS OF MULTILAYER FILM - There is provided a method of measuring a physical thickness of each of layers of a multilayer film, based on an optical thickness thereof. The method includes: (a) setting refractive indexes of the layers; (b) calculating a coefficient matrix using the refractive indexes; (c) providing light to the multilayer film so as to measure the optical thickness based on the light reflected by the multilayer film; and (d) calculating the physical thickness, based on the optical thickness and the coefficient matrix. | 05-05-2011 |
20110299098 | Method and device for measuring coating amount, method and device for determining coating amount, coating device and method for manufacturing coating product - One embodiment of the present invention is a method for measuring a coating amount in the case where a microcapsule coating liquid including a microcapsule in which a pigment is encapsulated and dispersed is coated on a microcapsule coating substrate, the method including steps of: detecting a transmission light intensity in the case where the microcapsule coating substrate on which the microcapsule coating liquid is in a wet state is irradiated with illuminating light; and calculating a thickness of a microcapsule display layer from the transmission light intensity, the microcapsule display layer formed by drying the microcapsule coating liquid. | 12-08-2011 |
20120127487 | METHODS AND APPARATUSES FOR MEASURING THE THICKNESS OF GLASS SUBSTRATES - Methods and apparatuses for determining a thickness of a glass substrate are disclosed. The method includes conveying the glass substrate past an optical measurement head and determining a measurement separation distance d | 05-24-2012 |
20120133958 | LASER CONFOCAL SENSOR METROLOGY SYSTEM - The present invention provides apparatus for a non-contact method of obtaining accurate three-dimensional measurements of a dry contact lens, more specifically, using dry lens metrology to know the exact thickness of a contact lens. | 05-31-2012 |
20140016139 | OPTICAL FILM THICKNESS MEASURING DEVICE AND THIN FILM FORMING APPARATUS USING THE OPTICAL FILM THICKNESS MEASURING DEVICE - An optical film thickness measuring device, enabling direct measurement of a film thickness of a product in real time accurately without a monitor substrate, includes: a projector, a light receiver, inner beam splitters disposed in a base substrate holder to reflect a measurement beam to a base substrate, an inner optical reflector that totally reflects a measurement beam from the closest inner beam splitter, external beam splitters the measurement beam from the inner beam splitters toward the light receiver, and an outer optical reflector that reflects the measurement beam from the optical reflector toward the light receiver. The measurement beam reflected by the inner beam splitters and the inner optical reflector is passed through the base substrate and then reflected by the external beam splitters and the outer optical reflector to be guided to the light receiver, so that the measurement beam is received by the light receiver. | 01-16-2014 |
20140022564 | FILM THICKNESS MEASURING DEVICE AND FILM THICKNESS MEASURING METHOD - A film thickness measuring device includes a spectroscopic sensor and a data processor, wherein the spectroscopic sensor measures spectroscopic data of a film coated on a substrate and the data processor obtains measured color characteristic variables from the measured spectroscopic data, compares the measured color characteristic variables with plural sets of theoretical color characteristic variables corresponding to plural sets of values, each set including one of plural values of thickness and one of plural values of index of refraction of the film, determines index of refraction of the film using the set of values corresponding to the set of theoretical color characteristic variables which minimizes a difference between the set of theoretical color characteristic variables and the measured color characteristic variables, and determines thickness of the film using the index of refraction of the film. | 01-23-2014 |
20140029019 | METHOD AND DEVICE FOR DETECTING DEFECTS IN MATERIAL DISTRIBUTION IN TRANSPARENT CONTAINERS - An inspection process for detecting defects of thin type, on transparent containers for a series of inspection points distributed over an inspection region superposed according to a determined height of the container taken according to central axis thereof, and according to the circumference of the container comprising:
| 01-30-2014 |
20140185061 | METHOD AND SYSTEM FOR IN-LINE REAL-TIME CALCULATION OF THICKNESSES OF SEMICONDUCTOR LAYERS OF A PHOTOVOLTAIC DEVICE - A method and system for real-time, in-line measurements of thicknesses of semiconductor layers of photovoltaic devices is provided. The method and system include taking ex-situ optical data measurements after deposition of the semiconductor layers. The measurements are then used to calculate the thicknesses of the layers in real-time using optical modeling software. | 07-03-2014 |
20150138568 | LITHOGRAPHIC MASK, LITHOGRAPHIC APPARATUS AND METHOD - A lithographic mask has a substrate substantially transmissive for radiation of a certain wavelength, the substrate having a radiation absorbing material in an arrangement, the arrangement configured to apply a pattern to a cross-section of a radiation beam of the certain wavelength, wherein the absorbing material has a thickness which is substantially equal to the certain wavelength divided by a refractive index of the absorbing material. | 05-21-2015 |
20150316489 | Systems and Methods Eliminating False Defect Detections - A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not indentified in the second set of defect candidates. | 11-05-2015 |
20160018213 | THICKNESS MEASUREMENT APPARATUS AND THICKNESS MEASUREMENT METHOD - A thickness measurement apparatus includes a light source emitting light; an optical system focusing the light emitted from the light source onto an optical axis; a reflector reflecting light focused by the optical system; a detector detecting intensity of the reflected light according to a position on the optical axis where the light passing through the optical system is in focus; and a calculator calculating thickness of a measured object using a refractive index of the measured object and an amount of displacement between a first focus position and a second focus position. | 01-21-2016 |
20160025481 | IN VITRO DETERMINATION OF SUNSCREEN PROTECTION BASED ON IMAGE ANALYSIS OF SUNSCREENS APPLIED TO SKIN - Described herein are processes, apparati, and substrates for acquiring images of sunscreen films on human skin for in vitro determination of sunscreen protection factors (SPF) incorporating image analyses. | 01-28-2016 |
20160069667 | Apparatus and Method for Measuring Thicknesses of Mediums using a Reflecting a Signal that is Near Normal to the Medium - Methods and apparatuses for measuring the thickness on at least one transparent or translucent medium and detecting the presence and/or location of any conductive coating on a non-conductive medium surface are described. | 03-10-2016 |
20160178352 | METHOD AND SYSTEM FOR MEASURING THE THICKNESS OF ICE ON A SURFACE, NOTABLY OF AN AIRCRAFT, USING A LUMINOUS PATTERN GENERATED BY DIFFUSION IN THE ICE | 06-23-2016 |