Class / Patent application number | Description | Number of patent applications / Date published |
356121000 | LAMP BEAM DIRECTION OR PATTERN | 60 |
20080198371 | SYSTEMS AND METHODS FOR CHARACTERIZING LASER BEAM QUALITY - A measure of the quality of a laser beam is obtained by comparing the power of a theoretical Gaussian beam through a (certain sized area) pinhole to the power of a test beam through a same sized (area) pinhole. The theoretical surrogate Gaussian beam with the same second moment of intensity as the test beam is used to determine the “bucket size” used in “power-in-the-bucket” techniques. The bucket size is an interaction area determined by the wavelength of the laser light, the focusing distance, and the 1/e | 08-21-2008 |
20080198372 | VEHICLE HEADLIGHT WITH IMAGE DISPLAY - A vehicle includes a headlight comprising a light source configured to emit light and a device to produce an image pixel in a display image in front of the vehicle. The image projected by the headlight can provide the driver with information, such as onto a roadway on which the vehicle is traveling. | 08-21-2008 |
20080239297 | MULTIPLE HEAD LASER PROJECTOR AND METHOD - A multiple laser head projector includes a sensor that senses the presence or absence of a laser beam from a first of the laser heads and signals a switching device to switch to a second laser head when a laser beam is not detected by the sensor from the first laser head. Thus, the multiple laser head projector may be utilized to provide continuous operation of the multiple head laser projector when one of the lasers fails. The multiple head laser projector may also be utilized for diagnostic testing of the laser heads, such as during start-up. Further, the multiple head laser projector may be utilized to signal the power output of the laser heads and thus the expected remaining life of the laser heads. | 10-02-2008 |
20080239298 | ADAPTIVE LIGHT-PATH SURFACE TILT SENSOR FOR MACHINE VISION INSPECTION - An adaptive light-path surface tilt sensing configuration is provided that identifies when a ray bundle is projected along a direction normal to a workpiece surface. As a result, the tilt of the workpiece surface may be determined. The surface tilt sensor may comprise an illumination and detector portion and an objective lens. The illumination and detector portion may comprise a light source, a collimating lens, a beamsplitter, a controllable ray bundle position control portion, and a photodetector configuration. These elements are configured to provide a ray bundle alignment sensing arrangement that provides a signal indicating when a projected ray bundle and a reflected ray bundle have the best degree of alignment, in addition to other functions. The best degree of alignment corresponds to a ray bundle that is projected along the direction normal to the workpiece surface provides. | 10-02-2008 |
20080285018 | DEVICE AND METHOD FOR RANGE-RESOLVED DETERMINATION OF SCATTERED LIGHT, AND AN ILLUMINATION MASK - An illumination mask ( | 11-20-2008 |
20080309926 | SYSTEMS AND METHODS FOR REDUCING DETECTED INTENSITY NON UNIFORMITY IN A LASER BEAM - A method of increasing the spatial uniformity of the detected intensity of a beam of light from a laser in a system including the laser and a light detector. In one embodiment the method includes the steps of generating a beam of light with the laser; and moving the beam of light and the light detector relative to each other, such that the detector averages the spatial intensity of the beam of light over time. In another embodiment the invention relates to a system for increasing the detected spatial uniformity of the intensity of a beam of light. In one embodiment the system comprises a light detector; a laser source for generating the beam of light; and a means for moving the beam of light and the detector relative to one another such that the detector averages the intensity of the light beam over time. | 12-18-2008 |
20090009751 | ABERRATION MEASUREMENT APPARATUS AND ABERRATION MEASUREMENT METHOD - An aberration measurement apparatus measures the aberration of an imaging optical system. The apparatus includes an illumination system, a separation member, and a measurement unit. The illumination system supplies the imaging optical system with measurement light used to measure an aberration of the imaging optical system and background light different from the measurement light. The separation member separates the measurement light and the background light which have passed through the imaging optical system. The measurement unit measures the aberration of the imaging optical system on the basis of the measurement light separated by the separation member. | 01-08-2009 |
20090027660 | OPTICAL SPOT GEOMETRIC PARAMETER DETERMINATION USING CALIBRATION TARGETS - A method, system and computer program product for determining a geometric parameter of an optical spot of a light beam are disclosed. A method comprises: providing a calibration target, the calibration target including a systematic variation in a parameter; measuring the calibration target with respect to the systematic variation using the light beam to obtain a plurality of measurements; and analyzing the measurements and the systematic variation to determine the geometric parameter of the optical spot. | 01-29-2009 |
20090185173 | APPARATUS AND METHOD FOR DETERMINING CHARACTERISTICS OF A LIGHT SOURCE - The invention provides an apparatus for sampling and determining characteristics of a light source. The apparatus comprises a sensor system configured to sample the spatial and spectral radiation characteristics of the light source and a goniometer that is configured to desirably control and adjust the relative position between the sensor system and the light source. The goniometer is configured to position the sensor system relative to the light source using two or more degrees of freedom. The apparatus additionally includes a control system configured to control the operation of the sensor system and the sampling of the spatial and spectral radiation characteristics of the light source. The control system is further configured to control operation of the goniometer for the relative positioning of the sensor system and the light source. | 07-23-2009 |
20100309457 | Wavefront Imaging Sensor - Embodiments of the present invention relate to a wavefront imaging sensor (WIS) comprising an aperture layer having an aperture, a light detector having a surface and a transparent layer between the aperture layer and the light detector. The light detector can receive a light projection at the surface from light passing through the aperture. The light detector can also separately measure amplitude and phase information of a wavefront at the aperture based on the received light projection. The transparent layer has a thickness designed to locate the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection. | 12-09-2010 |
20110001960 | Wavefront Sensor - The present invention relates to a wavefront sensor using a pair of screens, each having a two-dimensional array of circular apertures, to achieve Moiré effects, and its use to measure the slope of a wavefront. | 01-06-2011 |
20110013177 | LASER DIODE TESTING METHOD - An apparatus and method for verifying a laser etch on a rubber sample. In one embodiment, the apparatus includes a tire production line, a sample holding device, a laser having a diode, and a servo-assembly. The laser of the apparatus is configured to etch indicia on a sidewall of a tire on the tire production line and is further configured to etch at least one line in a rubber sample on the sample holding device. In one embodiment, the method includes etching a production tire with a laser, interrupting the laser, moving the laser to a laser diode testing location, loading a rubber sample in a holding device, etching at least one line into the rubber sample with the laser, manually or automatically measuring a depth of the at least one line, and comparing the depth of the at least one line to an acceptable line depth range. | 01-20-2011 |
20110013178 | SHACK HARTMAN SENSOR WITH REMOVABLE LENSLET ARRAY - A Shack Hartmann (“SH”) wavefront sensor comprising an optical device, such as a wave front dissector including a lenslet array, for transmitting, dissecting and focusing an incoming optical wave, an optical system, including, for example, an optical sensor, for receiving the transmitted incoming optical wave, and a removable kinematic mount for repeatable precision mounting of the optical device to the optical system. | 01-20-2011 |
20110069303 | Method for Detecting Misalignment of a Vehicle Headlight Using a Camera - A method for detecting misalignment of a vehicle headlight using a camera system is specified. For this purpose, the headlight is in a predefined position and the camera system is arranged on or in the vehicle and is oriented in such a manner that the light distribution pattern of the headlight in front of the motor vehicle is detected. With a predefined headlight position, an actual light distribution pattern of the headlight is recorded using the camera system and is compared with a desired light distribution pattern for the predefined headlight position. If the actual light distribution pattern differs from the desired light distribution pattern, misalignment of the headlight is detected. | 03-24-2011 |
20110134415 | METHOD FOR CORRECTING A WAVE FRONT ANALYSER AND ANALYSER IMPLEMENTING SAID METHOD - A method for correcting a wave front analyzer, in which the analyzer detects a signal from an incident wave front to be analyzed (FO), the detected signal providing phase and intensity local information. The method includes correcting the phase computation according to intensity space variations. A wave front analyzer for implementing the method is also described. | 06-09-2011 |
20110211190 | MIRROR STRUCTURE - A mirror structure is provided in which at least a portion of a wavefront sensor is integrated with a mirror. In particular, a mirror structure is provided in which a Hartmann mask or a microlens array of a Shack-Hartmann wavefront sensor is integrated with a mirror to provide a very compact wavefront detector/corrector in a single device. Such a mirror structure may be used with a tip-tilt stage in a laser cavity to provide much simplified adaptive optics in the cavity. Furthermore, a Hartmann Mask may be integrated with self deforming mirror comprising an active PZT layer bonded to a passive mirror substrate, wherein the Hartmann Mask comprises an array of apertures formed through the active PZT layer. | 09-01-2011 |
20110242526 | LIGHT DIRECTIONALITY SENSOR - The present invention relates to light sensors for measuring light characteristics. In particular, the present invention relates to a light directionality sensor that is capable of measuring light characteristics such as the light direction, light collimation, and light distribution. According to a first aspect of the present invention there is provided a light directionality sensor comprising a photo-sensor ( | 10-06-2011 |
20110249256 | LASER BEAM ANALYSIS APPARATUS - An apparatus that enables real time measurement of the spatial profile, circularity, centroid, astigmatism and M2 values of a laser beam generated by a high power laser beam. The apparatus employs the optics used in a process application, including a focus lens and cover glass. An attenuation module includes a pair of high reflecting mirror plates disposed in parallel, spaced apart relation to one another at a common angle of incidence to the laser beam. A beam dump is positioned out of a path of travel of the laser beam and in receiving relation to light reflected by the first and second mirrors. A camera detects spots of light that pass through the first and second mirrors. A high power attenuator formed by a highly reflective mirror pair is positioned between the source and the attenuation module. A second embodiment includes a single mirror plate having highly reflective surfaces. | 10-13-2011 |
20110317152 | MIRROR STRUCTURE - A mirror structure is provided in which at least a portion of a wavefront sensor is integrated with a mirror. In particular, a mirror structure is provided in which a Hartmann mask or a microlens array of a Shack-Hartmann wavefront sensor is integrated with a mirror to provide a very compact wavefront detector/corrector in a single device. Such a mirror structure may be used in a laser cavity to simplify adaptive optics in the cavity. Furthermore, a Hartmann Mask may be integrated with self deforming mirror comprising an active PZT layer bonded to a passive mirror substrate, wherein the Hartmann Mask comprises an array of apertures formed through the active PZT layer. | 12-29-2011 |
20120002193 | Photoacoustic Joulemeter Utilizing Beam Deflection Technique - A joulemeter is capable of non-destructively measuring multiple characteristics of a laser beam. The joulemeter comprises a series of parallel probe beams, which are directed though a transparent media adjacent to an absorbing media that the tested beams pass through. Arrays of optical sensors or a chirp sensor are used to intercept and measure deflections the probe beams. A control unit renders measurements on selected properties of the laser. | 01-05-2012 |
20120120390 | BEAM DIRECTION SENSOR - A direction sensor ( | 05-17-2012 |
20120224171 | METHOD AND APPARATUS FOR AIMING HEADLIGHTS - A vehicle headlight aiming apparatus and method is provided which includes a housing that is vertically and horizontally adjustable along vertical and horizontal tracks. The housing includes a lens for receiving and focusing a headlight beam of a vehicle and forming an image on an internal screen, and a control unit mounted on the housing that is vertically and horizontally pivotable relative to the housing. The housing and the control unit each emit laser beams to configure and measure an alignment of the apparatus to the vehicle. The control unit compensates for an unlevel supporting surface of the apparatus and/or the vehicle and indicates whether the headlight is properly aimed according to a selected aiming standard based on the image, the configuration of the vehicle and the apparatus, and any compensation of any unlevel supporting surface(s) of the apparatus and/or the vehicle. | 09-06-2012 |
20120314210 | Laser beam profile measurement - A method for characterizing a laser beam profile is provided. The method includes disposing a laser target, moving the surface of the target, directing a laser to emit the beam at the surface, measuring a reflection from the surface as intensities, and averaging the intensities. The target's surface is disposed substantially perpendicular to an incident direction. The surface is reflective at a wavelength corresponding to the laser beam. The travel direction is substantially parallel to the surface. The laser beam travels along said incident direction to the surface. The reflection represents a plurality of intensities having a distribution of positions along the surface and during a temporal interval. The intensities are averaged over the temporal interval for each position of the distribution to produce an analyzed beam profile. Each position corresponds to a speed along the travel direction based on movement of the surface. The surface can be preferably spun along an axis substantially parallel to the incident beam. | 12-13-2012 |
20130027690 | LASER BEAM SPOT SHAPE DETECTING METHOD - The spot shape of a laser beam is detected by moving a table holding a detection substrate having a luminescent substance in an X direction and a Y direction with a laser beam focused by a lens applied to an area of the detection substrate where the luminescent substance is located. The intensity of light emitted from the luminescent substance is detected during the movement of the table, and a light intensity map is prepared indicating the light intensities detected in the light intensity detecting step at all of the X and Y coordinates of the luminescent substance. Spot shape images of the laser beam are formed according to a plurality of light intensity maps obtained by positioning the focusing lens at a plurality of detection positions changed in a Z direction perpendicular to a holding surface of the table. | 01-31-2013 |
20130063719 | APPARATUS AND METHOD FOR LOCATING THE CENTRE OF A BEAM PROFILE - A method for locating the centre of a beam profile, comprises the steps of: providing a beam profile; selecting one or more strips through the beam profile; identifying distinct regions of intensity along the one or more strips and labelling them consistently; calculating a combined average intensity for each labelled region, using data from the one or more strips; plotting the average intensity against the labelled regions and comparing the results with a plot of the actual intensity obtained by taking a cross-section through the centre of at least one of the one or more strips; and optimising the location of the centre of at least one of the one or more strips so as to obtain the best fit between the average intensity plot and the actual intensity plot to thereby identify the centre of the beam profile. | 03-14-2013 |
20130088711 | DYNAMIC HEADLAMP AIM BUY-OFF WINDOW - A method for aiming headlamps on a vehicle achieves a reduced variation in beam heights without making any changes to existing test equipment. A cutoff height of a first headlamp is measured. The first headlamp is adjusted until a first measured cutoff height is within a predetermined range centered on a predetermined fixed height. A cutoff height of a second headlamp is measured. The second headlamp is adjusted until a second measured cutoff height is within the predetermined range centered on the first measured cutoff height. | 04-11-2013 |
20130141714 | METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME - An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns. | 06-06-2013 |
20130155392 | SELECTIVE LIGHT SENSOR AND AUTO-COMMISSIONING - A system and method for commissioning a lighting system is provided in which signals from light sensors are filtered in order to determine whether light is received from light fixtures in the lighting system or from external light sources. Alternatively or in addition, signals from light sensors may be filtered to determine the amount of light from external light sources. By filtering the signals from the light sensors, an identification of which light fixtures are colocated with which light sensors may be made even in the presence of light received from external light sources or light from multiple light fixtures in the lighting system. Physical locations of light fixtures and/or sensors may be determined based on detecting the amount of light received from external light sources. | 06-20-2013 |
20130222792 | METHOD AND DEVICE FOR DETERMINING A RADIATION CHARACTERISTIC FOR AN ILLUMINATION DEVICE OF A VEHICLE - A method for determining a radiation characteristic for a vehicle illumination device to be produced from possible radiation characteristics based on a parameter is provided. The parameter is selected from an illumination geometry that can be generated by the device in a surroundings of the device, a device position, and a person-related type of perception. The method includes determining a first value of a light intensity that can be generated for a first point located within an illuminatable area based on the parameter. A second value of the light intensity that can be generated by the illumination device is determined for second points based on the first value. The second points are arranged in the surroundings of the illumination device. A light distribution that can be generated by the illumination device is determined based on the first and second values and the light distribution is outputted to an interface. | 08-29-2013 |
20130265570 | LIGHT DISTRIBUTION CHARACTERISTIC MEASUREMENT APPARATUS AND LIGHT DISTRIBUTION CHARACTERISTIC MEASUREMENT METHOD - A light distribution characteristic measurement apparatus for measuring the light distribution characteristic of a light source is provided. The apparatus includes a plurality of detectors arranged so that they have a predetermined relative relationship with each other. One detector has a detection range at least partially overlapping a detection range of another detector adjacent to the former detector. The apparatus further includes a drive unit that drives a plurality of detectors as one unit to update a positional relationship of the plurality of detectors relative to the light source, and a calculation unit that calculates the light distribution characteristic of the light source by performing a process depending on at least one of a relative relationship between a plurality of detectors and overlapping of respective detection ranges thereof, based on respective results of detection that have been acquired by the plurality of detectors at the same timing. | 10-10-2013 |
20140043599 | SHACK-HARTMANN SENSOR AND WAVEFRONT MEASURING METHOD UTILIZING THE SAME - A wavefront measuring method using a Shack-Hartmann sensor includes the steps of provisionally determining one of a plurality of light receiving elements as a center-of-gravity position in a spot having a light intensity distribution of light condensed on the light receiving element, calculating a distance between the provisionally determined center-of-gravity position and an adjacent center-of-gravity position, setting an area smaller than and inside of a spot that partially overlaps another spot, and setting a spot that does not overlap another spot to the area, calculating a center-of-gravity position for each area, and calculating the wavefront based upon a shift amount between an ideal center-of-gravity position when parallel light enters the micro lens array and the center-of-gravity position of each area. | 02-13-2014 |
20140055778 | Sensors, Systems and Methods for Position Sensing - Various systems and methods for estimating the position of a radiation source in three-dimensional space, together with sensors for use in such systems are described. In some embodiments, the systems include a plurality of radiation sensors. The three-dimensional position of the radiation source is estimated relative to each sensor using an aperture that casts shadows on a radiation detector as a function of the incident angle of the incoming radiation. In some embodiments, the ratio of a reference radiation intensity to a measured radiation intensity is used to estimate direction of the radiation source relative to the sensor. When the angular position of the radiation source is estimated relative to two sensors, the position of the radiation source in three dimensions can be triangulated based on the known relative positions of the two sensors. | 02-27-2014 |
20140055779 | LIGHT DISTRIBUTION CHARACTERISTIC MEASUREMENT APPARATUS AND LIGHT DISTRIBUTION CHARACTERISTIC MEASUREMENT METHOD - A light distribution characteristic measurement apparatus includes: a detecting unit for detecting light from a light source; a mirror for reflecting the light from the light source to direct the light to the detecting unit; a movement mechanism for moving the detecting unit and the mirror relatively to the light source; a rotation mechanism for rotating the mirror while maintaining an optical path length from the light source to the detecting unit; and a processor adapted to calculate the light distribution characteristic of the light source, based on a plurality of measurement results that are detected by the detecting unit under a condition that the detecting unit and the mirror are arranged at a plurality of measurement positions relative to the light source and the mirror is oriented at different rotational angles for each measurement position. | 02-27-2014 |
20140063490 | WAVE FRONT ABERRATION METROLOGY OF OPTICS OF EUV MASK INSPECTION SYSTEM - Disclosed is test structure for measuring wave-front aberration of an extreme ultraviolet (EUV) inspection system. The test structure includes a substrate formed from a material having substantially no reflectivity for EUV light and a multilayer (ML) stack portion, such as a pillar, formed on the substrate and comprising a plurality of alternating pairs of layers having different refractive indexes so as to reflect EUV light. The pairs have a count equal to or less than 15. | 03-06-2014 |
20140071437 | Monitoring Incident Beam Position in a Wafer Inspection System - Methods, systems, and structures for monitoring incident beam position in a wafer inspection system are provided. One structure includes a feature formed in a chuck configured to support a wafer during inspection by the wafer inspection system. The chuck rotates the wafer in a theta direction and simultaneously translates the wafer in a radial direction during the inspection. An axis through the center of the feature is aligned with a radius of the chuck such that a position of the axis relative to an incident beam of the wafer inspection system indicates changes in the incident beam position in the theta direction. | 03-13-2014 |
20140118724 | Analyseur Spatial de Faisceau Laser a Reglage Automatique - An analyzer of the spatial intensity distribution of a laser beam focused or transmitted by an optical fiber comprises: a shaping lens; a device for taking a partial sample of the beam; a heat sink; a photodiode; an imaging lens to form images of the plane on an image sensor; a motorization of the shaping lens to translate along the optical axis; a motorization of the imaging lens to translate in a plane perpendicular to the optical axis; a motorization of the image sensor to translate along the optical axis; an electronic unit controlling each motorization; an electronic unit synchronizing the image sensor, connected to the photodiode to synchronize image capture with the laser pulses or in the pulses; an electronic unit adjusting the aperture and/or gain of the image sensor; and a software interface parameterizing and piloting the electronic control units, equipped with an image processing unit. | 05-01-2014 |
20140168639 | LASER PATTERNING EXAMINING APPARATUS - A laser patterning examining apparatus includes a fixing plate, a rotating plate configured to move vertically with respect to the fixing plate and to rotate, a housing connected to the rotating plate, a laser emission unit over the fixing plate and emits a laser beam, a prism unit on the housing and refracts a first portion of the laser beam received from the laser emission unit and transmits a second portion of the laser beam, and a beam profiler on the housing and analyzes the pattern of the first portion refracted by the prism unit. | 06-19-2014 |
20140233021 | APPARATUS FOR FOCUS BEAM ANALYSIS OF HIGH POWER LASERS - An in-line laser beam waist analyzer system includes an optical prism that picks off a portion of a second surface reflection from either a laser processing focus lens or a protective debris shield for the processing lens and directs that focused light to a pixelated detector. This provides real time monitoring of the focused laser beam while it is processing material by welding, cutting, drilling, scribing or marking, without disrupting the process. | 08-21-2014 |
20140233022 | APPARATUS FOR FOCUS BEAM ANALYSIS OF HIGH POWER LASERS - An in-line laser beam waist analyzer system includes an optical prism that picks off a portion of a second surface reflection from either a laser processing focus lens or a protective debris shield for the processing lens and directs that focused light to a pixelated detector. This provides real time monitoring of the focused laser beam while it is processing material by welding, cutting, drilling, scribing or marking, without disrupting the process. | 08-21-2014 |
20140240697 | APPARATUSES AND METHODS FOR DETECTING WAVE FRONT ABBERATION OF PROJECTION OBJECTIVE SYSTEM IN PHOTOLIGHOGRAPHY MACHINE - Apparatus and methods for detecting wave front aberration of a projection objective lens in a photolithography machine are disclosed. The apparatus comprises: a light source system configured to generate an illuminating beam; a spatial filter configured to receive the illuminating beam and generate ideal spherical wave; a splitter plate arranged downstream to the spatial filter at a predetermined angle with respect to an optical axis of the spherical wave and having a transflective film being applied on a surface thereof; the projection objective lens configured to receive a beam from the splitter plate and generate an output beam; a spherical mirror configured to reflect the output beam from the projection objective lens to the projection objective lens, light passing through the projection objective lens being reflected by the splitter plate; and an interferometer configured to receive light reflected by the splitter plate and measure the wave front aberration of the projection objective lens. | 08-28-2014 |
20140293274 | WAVEFRONT MEASURING SYSTEM WITH LARGE DYNAMIC MEASURING RANGE AND MEASURING METHOD - A wavefront measuring system with large dynamic measuring range includes a measuring unit, a control unit, and a processing unit. The measuring unit includes a wavefront dividing component, a focusing component and a photosensor. The wavefront dividing component samples a part of a laser beam (a sampled light beam) in a measuring plane, the focusing component focuses the sampled light beam on a photosensitive surface of the photosensor to form a light spot, the photosensor detects the presence of the light spot, the data processing unit acquires the locational information of the light spot and calculates the direction of the sampled light beam beam. The control unit drives the measuring unit to a different position in the same measuring plane, the wavefront dividing component samples another sampled light beam. The data processing unit calculates the wavefront distribution on the measuring plane based on the direction determined sampled light beams. | 10-02-2014 |
20150146196 | METHOD FOR ADJUSTING COMPENSATING OPTICAL SYSTEM AND COMPENSATING OPTICAL SYSTEM - A positional deviation between a phase distribution in a wavefront sensor and a compensation phase pattern in a wavefront modulator is corrected in a short time and with high accuracy by a method including a first step of causing the wavefront modulator to display a singularity generation pattern, a second step of measuring in the sensor an adjustment wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor, a third step of detecting a position of a singularity in the adjustment wavefront shape from a measurement result in the sensor, and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity. | 05-28-2015 |
20150292941 | MODAL DECOMPOSITION OF A LASER BEAM - A method and apparatus for performing a modal decomposition of a laser beam are disclosed. The method includes the steps of performing a measurement to determine the second moment beam size (w) and beam propagation factor (M2) of the laser beam, and inferring the scale factor (wO) of the optimal basis set of the laser beam from the second moment beam size and the beam propagation factor, from the relationship: wO=w/M2. An optimal decomposition is performing using the scale factor wO to obtain an optimal mode set of adapted size. The apparatus includes a spatial light modulator arranged for complex amplitude modulation of an incident laser beam, and imaging means arranged to direct the incident laser beam onto the spatial light modulator. Fourier transforming lens is arranged to receive a laser beam reflected from the spatial light modulator. A detector is placed a distance of one focal length away from the Fourier transforming lens for monitoring a diffraction pattern of the laser beam reflected from the spatial light modulator and passing through the Fourier transforming lens. The apparatus performs an optical Fourier transform on the laser beam reflected from the spatial light modulator and determines the phases of unknown modes of the laser beam, to perform a modal decomposition of the laser beam. | 10-15-2015 |
20150300946 | DRIFT CALCULATION DEVICE AND LIGHT DETECTION DEVICE PROVIDED WITH THE SAME - There are provided a drift calculation device capable of accurately calculating a drift by using a buffer of smaller capacity, and a light detection device provided with the same. Every time measurement intensity is input according to a predetermined cycle, data in a plurality of sum buffers | 10-22-2015 |
20150319415 | CALIBRATION APPARATUS, PROJECTOR AND CALIBRATION METHOD - A calibration apparatus calibrating a projection unit projecting light-rays includes: an imaging unit taking an image of a surface of an object having a location and an attitude, the light-rays projected onto the surface by the projection unit; a location-and-attitude estimation unit estimating the location and the attitude of the surface based on the image; a reflection-point estimation unit estimating, based on the estimated location and the attitude, a reflection point at which one of the light-rays is reflected by the surface; and an identification unit identifying both a passing point that the one of the light-rays passes and a direction in which the one of the light-rays passes the passing point, or identifying only the direction, based on multiple reflection points obtained by the reflection-point estimation unit with respect to multiple different locations and/or multiple different attitudes of the surface. | 11-05-2015 |
20150355053 | METHOD OF INSPECTING A LIGHT SOURCE MODULE FOR DEFECTS, METHOD OF MANUFACTURING A LIGHT SOURCE MODULE, AND APPARATUS FOR INSPECTING A LIGHT SOURCE MODULE - A method for inspecting a light source module for defects includes preparing a board on which a light emitting device and a lens covering the light emitting device are installed. A current is applied to the light emitting device to turn on the light emitting device. The lens is imaged with the light emitting device turned on. A central symmetry denoting a symmetry of light emission distribution from the center of the lens is calculated based on the obtained image, and the calculated central symmetry is compared with a reference value to determine whether unsymmetrical light emission distribution has occurred. Various other methods and apparatuses for inspecting light source modules are additionally provided. | 12-10-2015 |
20160018258 | VERIFICATION OF LASER PROJECTOR SAFETY SYSTEM OPERATION - In a general aspect, a method can include receiving a first projection pattern, where the first projection pattern is configured to violate a first parameter of a safety system of a laser projection system. The method can also include displaying the first projection pattern with the laser projection system and verifying proper implementation of the first parameter by the safety system based on visual appearance of the displayed first projection pattern. The method can further include receiving a second projection pattern, where the second projection pattern is configured to violate a second parameter of the safety system of the laser projection system and the second parameter is different than the first parameter. The method can further include displaying the second projection pattern with the laser projection system and verifying proper implementation of the second parameter by the safety system based on visual appearance of the displayed second projection pattern. | 01-21-2016 |
20160018259 | METHOD AND APPARATUS FOR MEASURING THE SHAPE OF A WAVE-FRONT OF AN OPTICAL RADIATION FIELD - Method for measuring shape of wavefront of optical radiation field generated by radiation source, includes: (a) setting diaphragm positions in pinhole diaphragm having diaphragm opening movable transversely to radiation source's optical axis, wherein a partial beam from radiation field passes through diaphragm opening at each diaphragm position and is imaged on optical sensor by imaging optics device; (b) recording lateral positions of partial beam relative to optical axis of imaging optics device, wherein lateral positions each with one of the diaphragm positions of pinhole diaphragm are recorded by optical sensor, and determining the shape of wavefront from recorded lateral positions of partial beam, wherein beam incidence range of the partial beam which is invariable for all diaphragm positions is set on imaging optics device with a pentaprism arrangement including at least first pentaprism and positioned between pinhole diaphragm and imaging optics device. A wavefront shape measuring device is also described. | 01-21-2016 |
20160054176 | HIGH ENERGY LASER TARGET BOARD APPARATUS - A laser target board apparatus is provided for detecting spatial and temporal intensity distribution of high energy laser beams. The laser target board apparatus may include a panel having a plurality of openings and a plurality of optical rods placed therein. The laser target board apparatus may further have an optic fiber array positioned substantially parallel to and behind the panel and separated from the panel by a predetermined distance. At least one lens is configured to receive photons emitted from a second end of each optic fiber unit of the optic fiber array, and at least one camera is configured to detect the photons. A processor is configured to analyze temporal and spatial distribution of intensity of the received high energy laser beam based on data generated by the at least one camera. | 02-25-2016 |
20160069668 | APPARATUS AND METHOD FOR SENSING HIGH PRECISION SIGNAL USING INFRARED LIGHT - A high precision signal sensing system and method using an infrared light is provided. The high precision signal sensing system may receive, from a light emitting device, a plurality of lights including a first light and a second light, may measure intensities of the first light and the second light, and may measure a light emitting intensity of the light emitting device based on an intensity difference between the measured light receiving intensities. | 03-10-2016 |
20160084714 | METHOD FOR DETECTING FOCUS PLANE BASED ON HARTMANN WAVEFRONT DETECTION PRINCIPLE - The present disclosure relates to a method for detecting focus plane based on Hartmann wavefront detection principle, the function of which is to detect the position of a silicon wafer in a photolithograph machine in real time so as to accomplish adjustment of the leveling and focus of the silicon wafer. By utilizing microlens array to detect the wavefront carrying information about the position of the silicon wafer based on the Hartmann wavefront detection principle, the spherical wavefront is divided by the respective subunits of the microlens array and is imaged on the respective focus planes of the subunits. If the silicon wafer is located on the focal plane, the incident wavefront for the microlens array is a planar wavefront so that the diffraction light spots are on the focus of the respective subunits of the microlens array; and if the silicon wafer is defocused, the incident wavefront for the microlens array is a spherical wavefront so that the diffraction light spots are shifted on the focus plane of the microlens array. Based on Hartmann wavefront detection principle, the detection of the spherical wavefront may be implemented by the microlens array shifting the imaged light spots for the plane wavefront and the spherical wavefront, so as to accomplish the defocusing measurement for the silicon wafer. The system for detecting focus plane has a simple configuration, a higher accuracy and efficiency, so it is applied to measurement for detecting the focus plane in various types of photolithography machines in a high accuracy and in real time. | 03-24-2016 |
20160097927 | Device and Method for Micro-Electro-Mechanical-System Photonic Switch - In one embodiment, a method of controlling a micro-electro-mechanical-system (MEMS) photonic switch includes applying a voltage to an electrode of an initial mirror of a first mirror array of the MEMS photonic switch and illuminating a control beam. The method also includes reflecting the control beam off the initial mirror to form a control beam spot on a second mirror array of the MEMS photonic switch and detecting an initial location of the control beam spot to produce an initial optical response. Additionally, the method includes adjusting the voltage in accordance with the initial optical response while the control beam spot has a nonzero velocity. | 04-07-2016 |
20190146053 | LASER SOURCE LOCATION SYSTEM | 05-16-2019 |
356122000 | With lamp focusing | 7 |
20100253937 | MEASURING DEVICE FOR MEASURING A FOCUSED LASER BEAM - According to an embodiment, a measuring device for measuring a laser beam comprises a magnification lens system with a total of two lenses which are arranged in series in the beam path of the laser beam and whose foci are coinciding, as well as a camera which is arranged behind the two lenses in the focus of the last lens and includes an electronic image sensor which generates an electronic image of the magnified laser beam. The lenses together with the camera are adjustable along the beam path relative to a reference point of the measuring device, for the purpose of locating the beam waist of the laser beam and of determining a diameter profile of the laser beam. The measuring device further comprises an adapter enclosing the beam path for coupling the measuring device to a laser system which provides the laser beam. The adapter forms an abutment surface or the laser system, which is axially directed with respect to a beam axis of the laser beam, and permits the measuring device to be coupled in situ at the installation site of the laser system. | 10-07-2010 |
20110317153 | LASER PEAK ENERGY POINT CALIBRATION METHOD AND APPARATUS - A method and apparatus for determining a focus point of a laser system is described. A reference datum surface is aligned with a laser emitter arranged to emit a laser beam. A portion of the laser beam reflects from the reference datum surface and is captured by a photon detector. Based upon the captured photons, intensity level data is generated each time the laser emitter is moved relative to the reference datum surface. A maximum intensity level is then determined in accordance with the distance moved by the laser emitter associated with the focus point of the laser system. In some cases, an interpolation is performed to provide a more accurate determination of the location of the focus point, the interpolation being in one case a second order polynomial. | 12-29-2011 |
20120086936 | Method And System For Measuring The Propagation Properties Of A Light Beam - A system for obtaining a propagation factor for determining the performance of a light beam ( | 04-12-2012 |
20120206719 | METHOD FOR MEASURING WAVEFRONT ABERRATION AND WAVEFRONT ABERRATION MEASURING APPARATUS - Providing a method for measuring wavefront aberration measured by detecting light that is emanated from a light source, incident on a test lens, and transmitted through the test lens, the method comprising steps of: measuring wavefront aberration in a state where an aperture stop of the test lens is fully opened; measuring a position of the center of a pupil of the test lens in a state where the aperture stop is stopped down; and expanding wavefront aberration by polynomials with making the position of the center of the pupil to be an origin, and a wavefront aberration measuring apparatus. | 08-16-2012 |
20130188178 | METHOD OF AND MATERIAL PROCESSING APPARATUS FOR OPTIMISING THE FOCUS OF A FIBRE LASER; METHOD OF MEASURING CHANGES IN THE FOCUS OF A FIBRE LASER - A method of optimising the focus of a fibre laser is described, which comprises positioning the output of a fibre laser relative to a workpiece; measuring at least a portion of back reflected radiation from the workpiece (step | 07-25-2013 |
20140009753 | WAVEFRONT ABERRATION MEASURING APPARATUS - A wavefront aberration measuring apparatus comprising: an illumination optical system provided to an incident side of a test lens; and a measuring optical system provided to an exit side of the test lens, the illumination optical system including an aperture stop capable of being opened and closed, and the illumination optical system being movable along an optical axis of the illumination optical system so as to adjust positions of the aperture stop and an entrance pupil of the test lens to have an optically conjugate relation with each other. Accordingly, it becomes possible to provide a wavefront aberration measuring apparatus capable of suppressing errors in measured result. | 01-09-2014 |
20160025555 | Systems, Devices, and Methods for Calibration of Beam Profilers - Embodiments generally describe systems, devices, and methods for focusing and calibrating beam profilers. A test object is provided that may include an internal housing rotatable within an external housing. The internal housing may house a light source, a collimator, a filter, and/or a diffuser. A plate may be mounted to the internal housing and may include a plurality of markings. In some embodiments, to focus a beam profiler, the test object may be positioned adjacent the converter plate of a beam profiler. Marker images may be captured and a focus quality may be assessed therefrom. A position of the converter, objective, and/or camera of the beam profiler may be adjusted based on the focus quality. To calibrate, images of the markings in several rotational positions may be captured and used for calibration. The markings may be rotated to several positions by rotating the internal housing relative to the external housing. | 01-28-2016 |