Class / Patent application number | Description | Number of patent applications / Date published |
356512000 | By wavefront detection | 58 |
20080259349 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus, which equipped with a projection optical system that is configured to project a pattern of an original onto a substrate, includes an interferometer configured to measure a wavefront in a first direction and a wavefront in a second direction of light passed through the projection optical system; a focus detecting unit configured to detect focus positions in the first and second directions of the projection optical system; and a calculating unit configured to calculate wavefront aberration of the projection optical system on the basis of the measurement result of the interferometer and the detection result of the focus detecting unit. | 10-23-2008 |
20090147269 | Interferometric nanoimaging system - The invention is a means of providing focusing and the use of focal methods to improve the imaging and meteorological performance of an interferometric, non-image forming system for use in metrology and nanoscale imaging. | 06-11-2009 |
20090168076 | LIGHT WAVE INTERFEROMETER APPARATUS - The light wave interferometer apparatus is provided and includes: a luminous flux, which is sent from the light source and divided into two portions by the luminous flux separation and composition unit, are combined with each other again under the condition that the divided luminous fluxes hold wavefront information corresponding to the surface shapes of the aspherical lens to be inspected and the reference aspherical lens by the respectively corresponding basis spherical lenses. Therefore, a wavefront difference of the aspherical lens to be inspected with respect to the reference aspherical lens is made to be interference fringe information and formed on an image pickup plane of the interferometer CCD camera. The basis spherical lenses have the basis spherical surfaces, the curvatures of which are equal to each other. | 07-02-2009 |
20090257068 | WAVEFRONT MEASURING METHOD AND WAVEFRONT MEASURING APPARATUS USING THE WAVEFRONT MEASURING METHOD - A wavefront measuring method includes steps of:
| 10-15-2009 |
20090279101 | Electrostatic Chuck With Anti-Reflective Coating, Measuring Method and Use of Said Chuck - The embodiments disclosed herein relate to an electrostatic chuck, or an optically structured element or an optical mask that comprise a metal film as well as a transparent cover applied on a substrate. At least two anti-reflective films are inserted between the metal film and the cover that reduce the reflectance of the metal film, as viewed from the surface, to almost zero. As a result, a direct interferometer measurement of the surface structure of the transparent cover is possible. Methods measurement and of use are also disclosed. | 11-12-2009 |
20090284753 | SYSTEM AND METHOD OF MEASURING AND MAPPING THREE DIMENSIONAL STRUCTURES - A system for mapping a three-dimensional structure includes a projecting optical system adapted to project light onto an object, a correction system adapted to compensate the light for at least one aberration in the object, an imaging system adapted to collect light scattered by the object and a wavefront sensor adapted to receive the light collected by the imaging system and to sense a wavefront of the received light. For highly aberrated structures, a number of wavefront measurements are made which are valid over different portions of the structure, and the valid wavefront data is stitched together to yield a characterization of the total structure. | 11-19-2009 |
20090296101 | MEASUREMENT METHOD - A measurement method of the present invention is a measurement method for measuring a shape of a target T from an interference pattern generated by interference between a reflected light of the target and a reference spherical surface. The measurement method includes a first measurement step which positions the target T in a first region | 12-03-2009 |
20090296102 | COHERENCE TOMOGRAPHY DEVICE - An optical coherence tomography device includes: a light source | 12-03-2009 |
20100014098 | Oblique incidence interferometer - An oblique incidence interferometer enlarges a measurement range without increasing a size of the apparatus. The oblique incidence interferometer includes a light source for emitting coherent light in an oblique direction to a measurement object; a light collimating unit for collimating the coherent light from the light source; a beam dividing unit for dividing the collimated beam from the light collimating unit into a measurement beam and a reference beam; a beam combining unit for combining the measurement beam reflected by the measurement object with the reference beam; and an image pickup device for picking up images of interference fringes representing a surface shape of the measurement object. The oblique incidence interferometer also includes a measurement range expanding device for enlarging a light measurement range on the measurement object in a lateral direction of the measurement range. | 01-21-2010 |
20100060901 | REMOTE SENSING OF UNDERWATER ACOUSTIC FIELDS - An acoustic field in a body of water is monitored using a coherent light field emitter applying a distributed light field across the surface of the water to be reflected, and a sensor is used to sense reflected components of the light field above the surface and to provide a signal representing information in the reflected light and related to movements in the water and caused by the acoustic field. The signal is provided from an interferometry technique and useable to derive information on the underwater acoustic field in a useful form. | 03-11-2010 |
20100110446 | Scanning Interferometric Methods and Apparatus for Measuring Aspheric Surfaces and Wavefronts - Interferometric scanning method(s) and apparatus for measuring test optics having aspherical surfaces including those with large departures from spherical. A reference wavefront is generated from a known origin along a scanning axis. A test optic is aligned on the scanning axis and selectively moved along it relative to the known origin so that the reference wavefront intersects the test optic at the apex of the aspherical surface and at one or more radial positions where the reference wavefront and the aspheric surface intersect at points of common tangency (“zones”) to generate interferograms containing phase information about the differences in optical path length between the center of the test optic and the one or more radial positions. The interferograms are imaged onto a detector to provide an electronic signal carrying the phase information. The axial distance, ν, by which the test optic is moved with respect to the origin is interferometrically measured, and the detector pixel height corresponding to where the reference wavefront and test surface slopes match for each scan position is determined. The angles, α, of the actual normal to the surface of points Q at each “zone” are determined against the scan or z-axis. Using the angles, α, the coordinates z and h of the aspheric surface are determined at common points of tangency and at their vicinity with α | 05-06-2010 |
20100177320 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE - A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element. | 07-15-2010 |
20100177321 | OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE - Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm. | 07-15-2010 |
20100177322 | MEASUREMENT METHOD AND MEASUREMENT APPARATUS - The present invention provides a measurement apparatus that illuminates a surface to be tested having an aspheric surface using light beams that form spherical waves to measure a figure of the surface to be tested, including a detection unit configured to detect interference patterns between light beams from the surface to be tested and light beams from a reference surface, and a controller configured to control processing for obtaining a figure of the surface to be tested based on the interference patterns detected by the detection unit. | 07-15-2010 |
20100238455 | ERROR COMPENSATION IN PHASE SHIFTING INTERFEROMETRY - In certain aspects, disclosed methods include combining reference light reflected from a reference surface with test light reflected from a test surface to form combined light, the test and reference light being derived from a common source, sinusoidally varying a phase between the test light and reference light, where the sinusoidal phase variation has an amplitude u, recording at least one interference signal related to changes in an intensity of the combined light in response to the sinusoidal variation of the phase, determining information related to the phase using a phase shifting algorithm that has a sensitivity that varies as a function of the sinusoidal phase shift amplitude, where the sensitivity of the algorithm at 2 u is 10% or less of the sensitivity of the algorithm at u. | 09-23-2010 |
20100259763 | SYSTEMS FOR AND METHODS OF FACILITATING FOCUSING AN OPTICAL SCANNER - Systems and methods for facilitating focusing of an image scanner, such as a confocal microscope, are disclosed. Measurement of optical characteristics in certain areas of a test sample are compared to stored or baseline optical characteristic profiles to determine an appropriate correction to properly focus the scanner. In one aspect, the method includes obtaining a dynamic profile at a current detection region of a test sample and associating the dynamic profile to a profile selected from a set of stored baseline profiles. Each of the stored baseline profiles is associated with a correction. | 10-14-2010 |
20110032536 | GRAZING INCIDENCE INTERFEROMETER - A grazing incidence interferometer includes: a beam splitting section configured to split a beam from a beam source section into a measuring beam emergent to a measurement surface and a reference beam serving as a measurement reference, and configured to cause the measuring beam to emerge obliquely to the measurement surface; a beam combining part configured to combine the reference beam and the measuring beam reflected at the measurement surface, to obtain a combined beam; a detecting section configured to detect a profile of the measurement surface based on an interference fringe formed by the combined beam; and an image inverting part configured to invert an orientation of a wave front of the measuring beam or the reference beam, the image inverting part being provided in an optical path of the measuring beam or the reference beam leading from the beam splitting section to the beam combining section. | 02-10-2011 |
20110080593 | SURFACE SHAPE MEASUREMENT APPARATUS - An apparatus for measuring a shape of a surface, comprises a measurement head which measures at least one of a distance between a reference point and the surface and a direction of a normal from the surface to the reference point, a scanning mechanism which scans the measurement head, and a processor which calculates the shape of the surface based on a measurement result measured using the measurement head and coordinates of the reference point, wherein the coordinates of the reference point are calibrated using a measurement result measured by scanning the measurement head along a scanning path in association with a first surface to be measured, and a shape of a second surface to be measured is calculated based on a measurement result measured by scanning the measurement head along the same scanning path in association with the second surface, and the calibrated coordinates of the reference point. | 04-07-2011 |
20110134436 | METHOD FOR DEPTH RESOLVED WAVEFRONT SENSING, DEPTH RESOLVED WAVEFRONT SENSORS AND METHOD AND APPARATUS FOR OPTICAL IMAGING - Methods and devices are disclosed for acquiring depth resolved aberration information using principles of low coherence interferometry and perform coherence gated wavefront sensing (CG-WFS). The wavefront aberrations is collected using spectral domain low coherence interferometry (SD-LCI) or time domain low coherence interferometry (TD-LCI) principles. When using SD-LCI, chromatic aberrations can also be evaluated. Methods and devices are disclosed in using a wavefront corrector to compensate for the aberration information provided by CG-WFS, in a combined imaging system, that can use one or more channels from the class of (i) optical coherence tomography (OCT), (ii) scanning laser ophthalmoscopy, (iii) microscopy, such as confocal or phase microscopy, (iv) multiphoton microscopy, such as harmonic generation and multiphoton absorption. In particular, a swept source (SS) is used that drives both an OCT channel and a coherence gated wavefront sensor, where:
| 06-09-2011 |
20110134437 | FIZEAU INTERFEROMETER AND MEASUREMENT METHOD USING FIZEAU INTERFEROMETER - A Fizeau interferometer includes: a reference spherical surface; and a measuring apparatus including an intensity obtaining section and a form calculating section, wherein: a focal point of the reference spherical surface is aligned with a center of curvature of the spherical surface in order to set the center of curvature as a center position, and two positions equidistant from the center position are set as a start position and an end position, the intensity obtaining section obtains the intensity maps of the interferograms at n positions at equal intervals; and the form calculating section measures the form of the spherical surface using a phase analysis method in which a coefficient of the intensity maps of the interferograms at an i-th position and a coefficient of the intensity maps of the interferograms at an (n−i+1)th position have a same value. | 06-09-2011 |
20110141484 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE - A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element. | 06-16-2011 |
20120105863 | Wavefront measurement apparatus - A wavefront measurement apparatus includes a light source that emits a light beam; a light splitting unit that splits the light beam emitted from the light source into an object light beam and a reference light beam; an objective lens that converges the object light beam at a predetermined position of a test object; a light combining unit that superimposes the object light beam returning from the test object and the reference light beam; a light deflecting unit that guides the object light beam returning from the test object towards the light combining unit; an imaging unit that captures an image of an interference pattern formed by combined wavefronts; and a light quantity adjusting filter that adjusts a light quantity, and that is arranged in a optical path between the light deflecting unit and the light combining unit that allows only the transmission of the object light beam from the test object. | 05-03-2012 |
20120127481 | METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE - An optical element having an optical surface ( | 05-24-2012 |
20120229814 | METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETRIC MEASURING DEVICE - Measuring a shape of an optical surface ( | 09-13-2012 |
20120236316 | METHOD AND APPARATUS FOR DETERMINING A SHAPE OF AN OPTICAL TEST SURFACE - A method of determining a shape of an optical test surface ( | 09-20-2012 |
20120274945 | METHOD AND SYSTEM FOR STRUCTURAL ANALYSIS OF AN OBJECT BY MEASURING THE WAVE FRONT THEREOF - A system for structural analysis of an object, including a device for generating an input light beam arranged so as to cause the input beam generated to interact with at least one portion of the object, and a device for receiving the output light beam resulting from the interaction between the input beam and the object. In this system, the receiving device include a wavefront analyzer arranged so as to measure the electromagnetic field of the wave of the output beam received, and the generating device has a spatial coherence adapted to that of the receiving device. A structural analysis method implementing such a system is presented. | 11-01-2012 |
20120327425 | GRAZING INCIDENCE INTERFEROMETER - A grazing incidence interferometer includes a light source, a light beam divider configured to divide original light coming from the light source, an illuminator configured to apply measurement light to a measurement subject, a light beam combining module configured to combine the measurement light reflected from the measurement subject with reference light, and a photodetector configure to detect a combined light beam. The grazing incidence interferometer includes an interferometer main body, a stage configured to hold the measurement subject, a moving mechanism capable of moving the interferometer main body along the measurement subject, and an auxiliary reflector disposed on an extension of an axis of movement of the interferometer main body, an auxiliary light beam separator configured to separate auxiliary light from the original light and to apply the auxiliary light to the auxiliary reflector, and an auxiliary photodetector configured to detect the auxiliary light reflected by the auxiliary reflector. | 12-27-2012 |
20130044332 | SURFACE PROFILE MEASUREMENT APPARATUS AND ALIGNMENT METHOD THEREOF AND AN IMPROVED SUB-APERTURE MEASUREMENT DATA ACQUISITION METHOD - A surface profile measurement apparatus, which measures a surface profile of an object, includes a wavefront measurement unit, a driving unit and a rotation unit. The wavefront measurement unit has an image sensor and emits a detecting light. The driving unit has a plurality of stages for moving the object or the wavefront measurement unit. The rotation unit has a rotation axis, is disposed on one of the stages of the driving unit, and holds the object. When measuring the object, the rotation unit rotates the object and the image sensor simultaneously exposes and acquires a measurement data, formed by the detecting light reflected from the object. An alignment method of the surface profile measurement apparatus and an improved sub-aperture measurement data acquisition method are also disclosed. | 02-21-2013 |
20130107277 | OPTICAL TOMOGRAPHIC IMAGING APPARATUS AND IMAGING METHOD THEREFOR | 05-02-2013 |
20130182263 | Apparatus And Method Of Measuring Roughness And Other Parameters Of A Structure - Systems and methods are presented to enhance and isolate residual signals indicative of the speckle field based on measurements taken by optically based metrology systems. Structural irregularities such as roughness and topographical errors give rise to light scattered outside of the specularly reflected component of the diffracted light. The scattered light interferes constructively or destructively with the specular component in a high numerical aperture illumination and detection system to form a speckle field. Various methods of determining residual signals indicative of the speckle field are presented. Furthermore, various methods of determining structural irregularities based on analysis of the residual signals are presented. In various embodiments, illumination with a high degree of spatial coherence is provided over any of a wide range of angles of incidence, multiple polarization channels, and multiple wavelength channels. In addition, diffracted light is collected over a wide range of angles of detection. | 07-18-2013 |
20140078513 | METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE - Measuring a shape of an optical surface ( | 03-20-2014 |
20140152999 | INTEGRATED WAVEFRONT SENSOR AND PROFILOMETER - An instrument for measuring aspheric optical surfaces includes both an optical wavefront sensor and a single-point optical profilometer. The optical wavefront sensor measures surface height variations throughout one or more areas of an aspheric test surface. The single-point profilometer measures surface height variations along one or more traces on the aspheric test surface. At least one of the traces intersects at least one of the areas, and respective spatial frames of reference for the traces and areas are relatively adapted to each other by minimizing differences between points of nominal coincidence between the areas and traces. | 06-05-2014 |
20140218750 | WAVELENGTH SCANNING INTERFEROMETER AND METHOD FOR ASPHERIC SURFACE MEASUREMENT - The present invention discloses a wavelength scanning interferometer and a method for an aspheric surface measurement. The wavelength scanning interferometer comprises a set of tunable lasers ( | 08-07-2014 |
20150029514 | METHOD AND SYSTEM FOR ON-LINE REAL-TIME MEASURING THE SURFACE TOPOGRAPHY AND OUT-OF-PLANE DEFORMATION BY USING PHASE-SHIFTING SHADOW MOIRE METHOD - The present invention is directed to a system and method for on-line real-time measuring the surface topography and out-of-plane deformation by using phase-shifting shadow moiré method. Digital Phase-Shifting Shadow Moiré Method is applied to a system, which receives the reflected images from the surface of transparent or non-transparent plate projected under a light beam passing through a grating. Next, by image correction program, the skewed interference fringe pattern is recovered to the image as if the image acquisition equipment is placed normal to the surface. Furthermore, the received images are processed with Phase-Shifting to show the surface topography of the plate. | 01-29-2015 |
20150377799 | OPTICAL PHASE MEASUREMENT METHOD AND SYSTEM - A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure. | 12-31-2015 |
20160018215 | SPHERICAL SHAPE MEASUREMENT METHOD AND APPARATUS - In a spherical shape measurement method for measuring a surface shape, a sphere to be measured is made freely rotatable. The partial spherical shape of each measurement area, which is established so as to have an area overlapping with another measurement area adjacent to each other, is measured at each rotation position, and the surface shape is measured by joining the partial spherical shapes of the measurement areas by a stitching operation based on the shape of the overlapping area. In the state of detaching the sphere from the sphere hold mechanism to which the sphere is freely attachable and detachable, the sphere support table holds the sphere. The sphere is re-held at a different position, so that the shape of the entire sphere can be measured with high accuracy. | 01-21-2016 |
20160018216 | SPHERICAL SHAPE MEASUREMENT METHOD AND APPARATUS - A partial spherical shape of each measurement area of a sphere to be measured, which is established so as to have an area overlapping with another measurement area adjacent to each other, is measured at each rotation position, and the surface shape is measured by joining the partial spherical shapes of the measurement areas by a stitching operation based on the shape of the overlapping area. The position at which the sphere is measured is changed and re-held. A positional displacement between half parts of the sphere before and after re-holding, which is caused by an effect of an error owing to the re-holding, is separated into three rotational components. Magnitudes of the three rotational components are quantified by image correlation and the positional displacement corrected. Then, the stitching operation is performed to measure the entire part of the sphere surface. | 01-21-2016 |
20160047710 | SHAPE MEASUREMENT METHOD AND SHAPE MEASUREMENT APPARATUS - A reference surface is moved, relative to an optical system, to a plurality of placement positions, and a wavefront of reflected light from the reference surface is measured at the respective placement positions by a detection unit. Based on information on the wavefront measured at the respective placement positions and information on the optical system, a plurality of pieces of shape data of the reference surface are calculated. Thereafter, a wavefront of reflected light from a measurement target surface is measured by the detection unit, and temporary shape data of the measurement target surface is calculated. Error data is calculated based on a relationship between the plurality of placement positions to which the reference surface is moved and the plurality of pieces of shape data at the respective positions, and the error data is removed from the temporary shape data thereby determining shape data of the measurement target surface. | 02-18-2016 |
20190145755 | MEASURING SURFACE ROUGHNESS | 05-16-2019 |
356513000 | Of highly reflective surface (e.g., mirror) | 10 |
20090015845 | OPTICAL SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements. | 01-15-2009 |
20100149547 | MEASUREMENT METHOD AND MEASUREMENT APPARATUS - The present invention provides a measurement apparatus that illuminates a surface to be tested having an aspheric surface using light beams that form spherical waves to measure a figure of the surface to be tested, including a detection unit configured to detect interference patterns between light beams from the surface to be tested and light beams from a reference surface, and a controller configured to control processing for obtaining a figure of the surface to be tested based on the interference patterns detected by the detection unit. | 06-17-2010 |
20100157313 | Test Method for Surface Figure of Large Convex Mirrors - A method of testing a convex mirror surface figure in which an optical quality substrate material is used having a convex front surface and a rear surface polished to a precise optical figure to create a lens. The lens is then tested by a standard interferometric or wavefront lens-testing method and the convex surface coated once a desired curvature is obtained. Null testing may be attained by passing a collimated interferometer beam through a focusing lens shaped to counter the predicted spherical aberration introduced by a perfect convex mirror/lens. | 06-24-2010 |
20100157314 | Test Method For Surface Figure of Large Convex Mirrors - A method of testing a convex mirror surface figure in which an optical quality substrate material is used having a convex front surface and a rear surface polished to a precise optical figure to create a lens. The lens is then tested by a standard interferometric or wavefront lens-testing method and the convex surface coated once a desired curvature is obtained. Null testing may be attained by passing a collimated interferometer beam through a focusing lens shaped to counter the predicted spherical aberration introduced by a perfect convex mirror/lens. A nominal rear surface figure of the mirror/lens may be used if a precisely figured test window is contacted with the rear surface using a refractive index-matching substance with an index of refraction closely matching the index of refraction of the test optic. | 06-24-2010 |
20110051147 | Measurement of Changes in Surfaces of Objects - Deformations of a surface of a test object can be measured by attaching mirrors to a surface of a test object, each mirror having a reflective surface with a dimension and a radius of curvature smaller than those of the surface of the test object. Light is directed towards the mirrors and a reference surface, and interference patterns are generated using light reflected from the mirrors and the reference surface. Changes in the surface of the test object are determined based on the interference patterns. | 03-03-2011 |
20110242545 | ASPHERIC SURFACE MEASURING APPARATUS - An aspheric surface measuring apparatus includes a sample holder mechanism and an interferential optical mechanism, and performs optical interferometric measurement while rotating a sample every time a measurement angle is varied. The sample holder mechanism has a first air spindle for rotating the sample about a test surface axis and a first airslide. The first airslide carries the sample orthogonally or parallel to the test surface axis. The interference optical mechanism has an interference optical system, a first imaging system, and a second imaging system, a second air spindle, and a second airslide. The second spindle revolves or turns the interference optical system and the first and second imaging systems integrally to change a measurement angle between the measurement optical axis and the test surface axis. The second airslide carries the second air spindle orthogonally to the moving direction of the first airslide. | 10-06-2011 |
20120154819 | INTERFEROMETER WITH PARABOLOIDAL ILLUMINATION AND IMAGING OPTIC AND TILTED IMAGING PLANE - A Fizeau interferometer incorporates an off-axis paraboloidal reflector that forms virtual images of reference and test surfaces and a camera lens that converts the virtual images into real images on a camera detector surface. The camera detector surface is arranged together with the camera lens to accommodate tilting of the virtual images by the off-axis paraboloidal reflector. | 06-21-2012 |
20120243001 | OPTICAL TESTING APPARATUS AND METHODS - An apparatus and associated method for testing a non-symmetric (e.g., phi-polynomial) surface. The apparatus uses several simple (singlet) optical elements (e.g., an Offner null configuration) and a tilted optic under test in combination with an active optical element (e.g., actuated, deformable membrane mirror, optical phase modulator, etc.) that together form a null or quasi-null that allows for conventional null-based interferometry. This solution solves the problem of exceeding the dynamic range of a conventional interferometer when trying to test non-symmetric optical surfaces. | 09-27-2012 |
20140233038 | SHAPE MEASUREMENT METHOD, SHAPE MEASUREMENT APPARATUS, PROGRAM, AND RECORDING MEDIUM - The present invention is directed to more accurately acquiring shape data than conventional techniques. After an imaging unit images an interference fringe, a calculation unit acquires the captured image from the imaging unit. The calculation unit extracts a ring zone region where the interference fringe is sparse in the captured image from each captured image, and calculates a phase distribution of the interference fringe in each ring zone region. The calculation unit acquires a deviation component having an orientation and an amount both unchangeable along a circumferential direction of a circle centered at the optical axis of the subject light by analyzing the interference fringe contained in each acquired captured image. Further, the calculation unit calculates positions of characteristic points of a calibrator, and calculates a distortion component. Then, the calculation unit calculates the shape data corrected based on the deviation component and the distortion component. | 08-21-2014 |
20140313517 | APPARATUS AND METHODS FOR PERFORMING WAVEFRONT-BASED AND PROFILE-BASED MEASUREMENTS OF AN ASPHERIC SURFACE - Apparatus and methods for performing wavefront-based and profile-based measurements of an aspheric surface are disclosed. The apparatus includes an interferometric wavefront measurement system that collects wavefront-based measurement data of the aspheric surface. The apparatus also includes a profile measurement system that performs at least one non-contact profile-based measurement of the aspheric surface to collect profile-based measurement data of the aspheric surface. The measurements are performed without removing the aspheric element from a rotatable base. The two measurements are then used to form a combined measurement of the aspheric surface. | 10-23-2014 |
356515000 | Of transmission (e.g., lens) | 9 |
20080304080 | ASPHERIC LENS SURFACE-DECENTER MEASURING METHOD AND APPARATUS - A relationship between surface decenter of a lens | 12-11-2008 |
20080309947 | MEASUREMENT METHOD AND APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step. | 12-18-2008 |
20090103105 | Method for interferometrically measuring an optical property of a test piece and a device suited for carrying out this method - The invention relates to a method for interferometrically measuring large optics. A combination of a method known as stitching technique, during which the sub-interferograms are determined on partial surfaces of measuring area and are joined in a software-controlled manner and which, as a result, enables the use of small, more cost-effective interferometers, however polished surfaces of the test piece being assumed, together with an immersion method, during which, in fact, lower demands for the surface quality of the test piece exist that, however, is accompanied by edge faults. In order to make this combination possible, a modification of the stitching technique is developed, during which the measuring area (CA) is completely covered by a film consisting of an immersion liquid. A device a suited for carrying out this method is characterized by contact bodies, which are made of transparent material, rest upon the main surfaces of the test piece, and which completely cover the measuring area (CA), a film consisting of an immersion liquid being formed between the contact bodies and the main surfaces of the test piece. | 04-23-2009 |
20090185194 | WAVEFRONT-ABERRATION MEASURING DEVICE AND EXPOSURE APPARATUS INCLUDING THE DEVICE - A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed. | 07-23-2009 |
20090296103 | FIZEAU LENS HAVING ASPHERIC COMPENSATION - An imaging system for obtaining interferometric measurements from a sample spherical surface has a light source for providing an incident light beam, a beamsplitter disposed to direct the incident light beam toward the sample spherical surface and to direct a test light reflected from the sample spherical surface and a reference light reflected from a reference spherical surface toward an interferometric imaging apparatus. There is a lens assembly in the path of the incident light beam, with at least one lens element, wherein one of the at least one lens elements has an aspheric surface and wherein one of the at least one lens elements further provides the reference spherical surface facing the sample spherical surface. A reference plate is temporarily disposed in the path of the incident light beam for measuring the aspheric surface itself and is removable from the path of the incident light beam for obtaining interferometric measurements from the sample spherical surface. | 12-03-2009 |
20100315651 | SYSTEM FOR MEASURING THE IMAGE QUALITY OF AN OPTICAL IMAGING SYSTEM - A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy. | 12-16-2010 |
20110043822 | SHAPE MEASURING APPARATUS AND METHOD THEREOF - Light emitted from a light source is formed into parallel light beams, the parallel light beams are divided into two light beams, and one of the divided light beams is converted by a conical lens to light (beam) having an energy density on an optical axis maximized over a distance, and is applied to a surface of a measuring object, with another one of the divided light beams being applied to a reference mirror, so that, by detecting an interfered light beam between rearward scattered light of the light (beam) applied to the surface of the measuring object and reflected light from the reference mirror, a shape of the measuring object is measured. | 02-24-2011 |
20150036148 | WAVEFRONT MEASUREMENT METHOD, SHAPE MEASUREMENT METHOD, OPTICAL ELEMENT MANUFACTURING METHOD, OPTICAL APPARATUS MANUFACTURING METHOD, PROGRAM, AND WAVEFRONT MEASUREMENT APPARATUS - A wavefront measurement method includes the steps of causing object light to be incident on a Shack-Hartmann sensor, capturing a first spot image under an image pickup condition, calculating data of first spot positions that correspond to the first spot image, calculating second spot positions by simulating a second spot image on the basis of the image pickup condition and information of a travelling direction of diffracted light generated when the object light passes through the microlenses, and reducing detection errors of the spot positions by correcting the data of the first spot positions on the basis of data of the second spot positions including data of a detection error due to the diffracted light. | 02-05-2015 |
20150362403 | MEASUREMENT APPARATUS, MEASUREMENT METHOD, OPTICAL ELEMENT FABRICATION APPARATUS, AND OPTICAL ELEMENT - A measurement apparatus configured to measure a shape or transmitted wavefront of an object surface includes an illumination optical system configured to irradiate the object surface with light from a light source as illumination light, an imaging optical system configured to guide reflected light beams or transmitted light beams from the object surface as detection light, a sensor disposed on an image plane of the imaging optical system and configured to detect the detection light guided by the imaging optical system, and a drive unit configured to change a distance between an entrance pupil of the imaging optical system and a sensor conjugate plane conjugate to the sensor with respect to the imaging optical system. | 12-17-2015 |