Class / Patent application number | Description | Number of patent applications / Date published |
356500000 | X-Y and/or Z table | 23 |
20080285051 | Multiple-degree of freedom interferometer with compensation for gas effects - The disclosure features multiple degree-of-freedom interferometers (e.g., non-dispersive interferometers) for monitoring linear and angular (e.g., pitch and/or yaw) displacements of a measurement object with compensation for variations in the optical properties of a gas in the interferometer measurement (and/or reference) beam paths. The disclosure also features interferometry systems that feature an array of interferometers (e.g., including one or more multiple degree-of-freedom interferometer), each configured to provide different information about variations in the optical properties of the gas in the system. Multiple degree-of-freedom interferometers are also referred to as multi-axis interferometers. | 11-20-2008 |
20080291464 | INTERFEROMETRIC POSITION-MEASURING DEVICES AND METHODS - Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool. | 11-27-2008 |
20080297807 | High Precision Code Plates and Geophones - An apparatus and method are disclosed for imaging a diffraction grating with a very high depth of focus, using a highly accurate code plate position measurement system. Positions may be measured to an accuracy of 1 nm or even smaller. The system may be used in fields such as manufacturing integrated circuits, and low- and very-low-frequency geophones, and other low- and very-low-frequency acoustic detectors. | 12-04-2008 |
20090002715 | Coordinate measuring machine with vibration decoupling and method for vibration decoupling of a coordinate measuring machine - A coordinate measuring machine ( | 01-01-2009 |
20090040530 | COORDINATE MEASURING MACHINE AND A METHOD FOR CORRECTING NON-LINEARITIES OF THE INTERFEROMETERS OF A COORDINATE MEASURING MACHINE - A method and a coordinate measuring machine ( | 02-12-2009 |
20090073458 | MEANS AND METHOD FOR DETERMINING THE SPATIAL POSITION OF MOVING ELEMENTS OF A COORDINATE MEASURING MACHINE - A means and a method for determining the spatial position of at least one moving element ( | 03-19-2009 |
20090109443 | Method for determining positions of structures on a substrate - A system for determining positions of structures on a substrate is disclosed. The system includes a plurality of stations enclosed by a housing. At least one of the stations inside the housing is designed to be movable. The housing is provided with a filter fan unit generating an air flow in the housing. Air-directing elements are provided in the housing so that an invariable flow may be achieved irrespective of the at least one movable station. | 04-30-2009 |
20090231594 | COMPONENT MOUNTING IN MOVEMENT-SENSITIVE EQUIPMENT - Movement-sensitive equipment ( | 09-17-2009 |
20090237674 | Method for estimating distance between tracking type laser interferometer and target, and tracking type laser interferometer - In the tracking type laser interferometer including: a laser interferometer; an optical axis deviation detection sensor for detecting a deviation of an optical axis of the laser interferometer; a two-axis turning mechanism for turning the laser interferometer to any optional direction; an angle sensor for detecting a turning angle of the two-axis turning mechanism; a retroreflector for reflecting its reflected light to a direction parallel to the incident light; and a controller for driving the two-axis turning mechanism so as to track the retroreflector based on signals of the optical axis deviation detection sensor and the angle sensor, stop of the retroreflector is detected, and a target distance is calculated from the turning center of the laser interferometer to the center of the retroreflector based on the total sum of deviation of an optical axis during movement, which is obtained by the optical axis deviation detection sensor, and a turning angle during movement, which is obtained by the angle sensor. | 09-24-2009 |
20090323078 | METHOD AND SYSTEM FOR STEP-AND-ALIGN INTERFERENCE LITHOGRAPHY - A method for step-and-align interference lithography is provided in the present invention, by which a displacement error relating to the moving of an interference light beam as the source of the interference light beam is being carried to move by a carrier is measured before interference lithography, and then the displacement error is used as a reference to compensate a positioning error between adjacent interference patterns during step-and-align interference lithography. Besides, the present invention further provides a system for step-and-align interference lithography, which is capable of compensating the positioning error caused by a stepping movement control used for moving a substrate or the light beams in a stepwise manner to form interference-patterned regions by interference lithography and thus the so-generated interference-patterned regions are accurate aligned with one another on a two-dimensional plane for preparing the same to be stitched together to form a two-dimensional large-area periodic structure. | 12-31-2009 |
20100020331 | Laser interferometer systems and methods with suppressed error and pattern generators having the same - An interferometer system for tracking a position of a movable object in a pattern generator is provided. The interferometer system includes an interferometer configured to generate an interference signal indicative of at least one instantaneous position of an object, and a control system. The control system generates raw position data based on the generated interference signal, selects a subset of position data from the raw position data, and extrapolates at least a third position of the object based on the selected subset of position data. | 01-28-2010 |
20100020332 | Interferometric device for position measurement and coordinate measuring machine - An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers. | 01-28-2010 |
20100073684 | XY STAGE APPARATUS - An XY stage apparatus capable of reducing a measurement error due to air fluctuations is provided. The XY stage apparatus includes a stage that moves in the XY directions, a laser interferometer to measure a position of the stage, and a measuring optical path barrel mechanism having a fixed barrel that covers at least a portion of a measuring optical path between the stage and the laser interferometer, is provided on a side of the laser interferometer of the measuring optical path, and is fixed to the laser interferometer and a movable barrel that covers at least a potion of the measuring optical path, is provided on the side of the stage of the measuring optical path, and moves together with movement of the stage, wherein an end of one of the fixed barrel and the movable barrel is inserted into that of the other. | 03-25-2010 |
20100220335 | LITHOGRAPHIC APPARATUS AND METHOD FOR CALIBRATING THE SAME - A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer. | 09-02-2010 |
20110069319 | TRACKING TYPE LASER GAUGE INTERFEROMETER - A tracking type laser gauge interferometer includes: a first recursive reflector configured to reflect light parallel to incident light; a second recursive reflector attached to a measurement object; a main body part configured to guide light emitted from a laser light source to the first recursive reflector; a rotating mechanism configured to rotate the main body part; and a control unit configured to control the rotating mechanism based on the light emergent from the main body part and reflected at the second recursive reflector, wherein: the main body part includes a light receiving element configured to receive the light reflected at the first recursive reflector and detect a position of the received light; and the control device includes: an angle acquisition unit configured to acquire a rotational angle of the rotating mechanism; and an correction unit configured to correct a motion error of the rotating mechanism. | 03-24-2011 |
20110149297 | Maskless exposure apparatus and multi-head alignment method thereof - Example embodiments are directed to a mask-less exposure apparatus configured to expose a pattern on a substrate using a light modulation device and a multi-head alignment method thereof. According to example embodiments, a beam measurement device measures positions and focuses of at least three beams from among a plurality of beams emitted from multiple heads, the measurement enabling alignment of a position and an angle of a lens barrel deviated from a reference position according to an error in position and focus of the measured at least three beams. | 06-23-2011 |
20120206732 | COMPONENT-MOUNTING DEVICE, COMPONENT-MOUNTING SYSTEM, AND COMPONENT-MOUNTING METHOD - A challenge to be met by the present invention is to provide a component mounting device, a component mounting system, and a component mounting method that make it possible to correctly position a substrate at a working location and mount components on the substrate even when components mounted on the substrate project outside from an end of the substrate in a direction parallel to a substrate conveyance path. When a front end portion (PbT) of a substrate (Pb) conveyed by a substrate conveyance path ( | 08-16-2012 |
20120320382 | Device for Determining the Position of at Least One Structure on an Object, Use of an Illumination Apparatus with the Device and Use of Protective Gas with the Device - A device for determining the position of a structure on an object in relation to a coordinate system is disclosed. The object is placed on a measuring table which is movable in one plane, wherein a block defines the plane. At least one optical arrangement is provided for transmitted light illumination and/or reflected light illumination. The optical arrangement comprises an illumination apparatus for reflected light illumination and/or transmitted light illumination and at least one first or second optical element, wherein at least part of the at least one optical element extends into the space between the block and an optical system support. At least one encapsulation is provided, encapsulating at least one optical component of at least one optical arrangement and/or at least one optical element. | 12-20-2012 |
20130016361 | STAGE APPARATUSAANM Park; Sang WookAACI Suwon-siAACO KRAAGP Park; Sang Wook Suwon-si KRAANM Jang; In BaeAACI SeoulAACO KRAAGP Jang; In Bae Seoul KRAANM Jang; Sang DonAACI Suwon-siAACO KRAAGP Jang; Sang Don Suwon-si KRAANM Kim; Oui SergAACI Seongnam-siAACO KRAAGP Kim; Oui Serg Seongnam-si KR - The stage apparatus includes a stage having a range of movement on a stage base, an interferometer and a fixed mirror that are installed outside the stage on the stage base, and a first movable mirror disposed on the stage to reflect light, which is introduced from the interferometer, toward the fixed mirror, and to reflect the light, which is received after being reflected by the fixed mirror, to the interferometer. | 01-17-2013 |
20130215433 | HOVER CMM - It is a purpose of this invention to provide a Hover CMM to accurately measure an object. The Hover CMM comprises: a probe, an air vehicle and a localiser. The probe is mounted on the air vehicle. The air vehicle transports the probe around the surface of the object. The localiser tracks the position and orientation of the probe. The air vehicle is capable of hovering, slow and rapid movement. The measurements made by the probe are synchronised with the measurements made by the localiser. In a further embodiment, multiple probes, multiple air vehicles and multiple localisers can be provided in a system. In a further embodiment, the air vehicle has additional propulsion means for reducing wander. In another embodiment, the air vehicle is tethered. In a further embodiment, a gantry is provided for tethering the air vehicle. In another embodiment, a tilting means is provided to incline the probe relative to the air vehicle. Methods are provided for measuring an object and for controlling the wander of the air vehicle. | 08-22-2013 |
20140185057 | Optical Position-Measuring Device - An optical position-measuring device is adapted to detect the position of an object in several spatial degrees of freedom. The object is disposed in a manner allowing it to move at least along a first direction of movement and along a second direction of movement. The position-measuring device includes at least one light source and at least one first and second measuring standard which are located on the object, extend along a first extension direction and a second extension direction and include graduation regions disposed periodically along the first and second extension directions. In addition, a scanning plate is provided, into which at least first and second retroreflector elements are integrated, the first retroreflector element extending parallel to the first extension direction and the second retroreflector element extending parallel to the second extension direction, and via which, sub-beams that fall on them from the first and second measuring standard, are reflected back in the direction of the respective measuring standard. From superposed sub-beams, a detector system is able to generate position signals at least with respect to the movement of the object along the first and second direction of movement. | 07-03-2014 |
20140204392 | STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF - A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage. | 07-24-2014 |
20140268171 | STAGE DEVICE AND DRIVING METHOD THEREOF - A stage device includes a stage configured to move in an X-axis direction and a Y-axis direction, an X-axis interference reflector spaced apart from the stage in the X-axis direction, a first X-axis interferometer disposed on the stage that is configured to measure an X-axis location of the stage using the X-axis interference reflector, and an optical movable element spaced apart from the stage in the Y-axis direction that is configured to shift in the X-axis direction a path of a light beam propagating in the Y-axis direction according to movement of the stage in the X-axis direction. | 09-18-2014 |