Class / Patent application number | Description | Number of patent applications / Date published |
355075000 | Detailed holder for original | 50 |
20080204694 | Controlling shape of a reticle with low friction film coating at backside - In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the reticle to form a global convex shape and to reduce friction when sliding on a chuck, and the chuck having a topside to which the backside of the reticle conforms. | 08-28-2008 |
20080204695 | EUV Lithography System and Chuck for Releasing Reticle in a Vacuum Isolated Environment - A method for providing a vacuum isolated environment in a lithography system is disclosed. The method for dechucking a reticle includes providing a mask chamber having one or more vacuum valves for isolating the mask chamber from the lithography system. The one or more vacuum valves are closed to isolate the mask chamber from the rest of the lithography system. After the mask chamber is isolated, an inert gas is provided to the mask chamber to dechuck the reticle. | 08-28-2008 |
20080212062 | EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus which comprises a reticle stage configured to hold a reticle, and executes multiple exposure of a substrate in a lot to light using a plurality of reticles. The apparatus comprises a calculator configured to calculate a conveyance times taken to convey each of the plurality of reticles to the reticle stage, based on arrangements of the plurality of reticles before start of a process of the lot and a controller configured to determine a sequence in which the plurality of reticles are used, based on the conveyance times of the plurality of reticles calculated by the calculator. | 09-04-2008 |
20080239276 | Stage apparatus, fixation method, exposure apparatus, exposure method, and device-producing method - A stage apparatus including: a movement member movable with a plate member placed on a placement surface; and a fixing apparatus that fixes said plate member to said placement surface in parallel with said movement member passing through a prescribed first region. | 10-02-2008 |
20080259309 | STAGE APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - This invention discloses a stage apparatus which has a stage ( | 10-23-2008 |
20090015817 | EXPOSURE APPARTUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting members configured to support the structure; and a second supporting member configured to support the structure outside an area formed by connecting the three first supporting members. The second supporting member includes a unit configured to dampen vibration of the structure. | 01-15-2009 |
20090033907 | DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES - Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap. | 02-05-2009 |
20090033908 | JIG FOR DETECTING POSTION - A position alignment of a transfer point of a transfer arm is performed by using a position detecting wafer capable of being loaded into an apparatus having a thin transfer port. The position detecting wafer S includes an electrostatic capacitance detecting sensor | 02-05-2009 |
20090073415 | Apparatus and method for mounting pellicle - An apparatus and a method for mounting a pellicle includes a pellicle compression plate formed to apply a plurality of particular pressures to a plurality of points or areas of a region of the reticle where a pellicle frame of the pellicle contacts a reticle. | 03-19-2009 |
20090128795 | EXPOSURE APPARATUS - An exposure apparatus is configured to expose a pattern formed on an original onto a substrate using extreme ultraviolet light. The exposure apparatus includes a stage configured to move at the time of exposure, an electrostatic chuck which is provided on the stage and is configured to hold the original, an electrode which is provided outside the electrostatic chuck on the stage via an insulator, and an electric field forming member which is provided so that an absolute value of an electric potential difference with respect to the electrode is greater than an absolute value of an electric potential difference with respect to the original at a position facing the electrode. The particle adherence to the original can be effectively avoided. | 05-21-2009 |
20090135400 | METHOD AND APPARATUS FOR LITHOGRAPHIC IMAGING USING ASYMMETRIC ILLUMINATION - According to one aspect of the present invention, a method and apparatus for processing a substrate may be provided. A reticle may be positioned relative to a substrate. The reticle may have a plurality of features with dimensions extending in a first and a second direction and being asymmetric in the first direction. Electromagnetic radiation may be directed onto the reticle. The electromagnetic radiation may have a first portion propagating onto the reticle in substantially the first direction and being incident on the reticle at a first angle and a second portion propagating onto the reticle in substantially the second direction and being incident on the reticle at a second angle. The second angle being greater than the first angle. | 05-28-2009 |
20090153833 | ORIGINAL COVER CLOSER - An original cover closer of which the energy absorption capability can be freely adjusted by a damper is described. The development period for the original cover closer is therefore shortened. The original cover closer comprises: an attachment member to be mounted on the main body of a device; a support member pivotally connected to the attachment member and operable to support an original cover; a first and a second slider slidably installed in the support member; a compression coil spring interposed between the first and second sliders and operable to urge the original cover to open; and a fluid damper located in the compression coil spring. Particularly, the fluid damper comprises: a cylinder having a base end fixed to the first slider; a piston slidably installed in the cylinder; an abutment stem integrally provided on the piston and located in order that a tip portion of the abutment stem can come in contact with the second slider; a first fluid chamber formed on one side of the piston; a second fluid chamber formed on the other side of the piston; a viscous fluid with which the first fluid second fluid chambers are filled; a fluid conduit formed through the piston in order that the viscous fluid can move through the fluid conduit from the first fluid chamber to the second fluid chamber and vice versa; and a flow rate regulating needle valve formed in the fluid conduit and operable to adjust the speed of the viscous fluid passing through the fluid conduit when the piston slides in the cylinder. | 06-18-2009 |
20090219504 | SUBSTRATE CONVEYOR APPARATUS, SUBSTRATE CONVEYANCE METHOD AND EXPOSURE APPARATUS - A substrate conveyor apparatus carries a substrate on which patterns are formed, carries the substrate in a state protected by a protective cover when the substrate is not used, and carries a cover protection means that covers the inner surface of the protective cover when the substrate is used. The substrate conveyor apparatus has a grounding means that grounds the substrate or the protective cover. | 09-03-2009 |
20090219505 | PROJECTOR - A projector includes a projection optical device that magnifies and projects image light and a projection position adjusting device that moves the projection optical device in a plane orthogonal to a projecting direction and adjusts a projection position of the projection optical device. The projection position adjusting device includes a fixed member fixed in the projector, a first moving plate that supports the projection optical device and moves in a first axial direction and a second axial direction orthogonal to each other in the plane orthogonal to the projecting direction, a second moving plate that is interposed between the fixed member and the first moving plate, engages with the first moving plate, and moves in the second axial direction together with the first moving plate, adjusting and driving units that move the first moving plate and the second moving plate, and plural coupling members that movably couple the first moving plate to the fixed member. A coupling through hole of a stepped shape, which has a diameter dimension on a side close to the first moving plate smaller than that on a side separated from the first moving plate and has a step, is formed in the fixed member. Each of the coupling members includes a connecting member that is formed in a stepped shape, which has a sectional area on the other end side smaller than that on the one end side and has steps, and the other end of which is connected to the first moving plate in a state in which the connecting member is inserted in the coupling through hole and an interposed member that is arranged between the step of the connecting member and the step of the coupling through hole, urges the step of the connecting member and the step of the coupling through hole in directions away from each other, and brings the first moving plate into contact with the fixed member. | 09-03-2009 |
20090244511 | Electroactive polymers for lithography - Systems and methods for lithography include actuating an electroactive polymer member to position mask and/or substrate. | 10-01-2009 |
20090262327 | MASK TRANSPORT SYSTEM CONFIGURED TO TRANSPORT A MASK INTO AND OUT OF A LITHOGRAPHIC APPARATUS - A mask transport system is configured to transport a mask into and out of a lithographic apparatus. The mask transport system includes a first container configured to shield a top side and a bottom side of the mask. At least a portion of the container is at least partially translucent for radiation having a predetermined wavelength used to detect contamination on the top side or the bottom side of the mask when the mask is shielded by the first container. The mask transport system also includes a second container configured to enclose the first container. The second container includes a first part defining a first opening and an openable cover that covers the first opening. The cover is configured to open and release the first container within the lithographic apparatus or at an interface with the lithographic apparatus. | 10-22-2009 |
20100007869 | Reticle Handler - The present invention provides an apparatus and method for handling a reticle during manufacturing processes of semiconductor devices in the fabrication line. The apparatus includes a holder for the reticle, the holder is configured to securely hold the reticle and a level indicator attached to and operative with the holder to indicate leveling condition of the holder. The apparatus further includes a shaft connected to the holder for holding and a switch connected to the shaft. The method includes providing a reticle and clamping the reticle with a reticle holder including a switch and a leveling indicator operative with the holder to indicate leveling condition of the holder. The method further includes loading the reticle into a reticle pod while maintaining the leveling condition of the holder. | 01-14-2010 |
20100053587 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus for exposing a substrate to radiant energy includes: a stage including a chuck, and configured to hold the substrate on the chuck with vacuum and to be moved; a recovery device configured to recover the substrate from the stage; a first detector configured to detect an error of holding of the substrate on the chuck; a measuring device configured to measure an amount of positional deviation of the substrate relative to the chuck; and a controller configured to cause the measuring device to measure the amount of positional deviation in a case where the first detector detects the error, and to control an operation of the stage such that the amount of positional deviation falls within a tolerance based on the measured amount. | 03-04-2010 |
20100085554 | ADAPTOR OF AN ALIGNER SYSTEM - An adapter is disclosed, comprising a frame including an inner edge with a first side, a second side, a third side and a fourth side, wherein the first side and the fourth side are opposite and the second side and the third side are opposite. At least two fixed hold elements are connected to the first side of the inner edge of the frame. A plurality of first flexible clip elements are connected to the second and third sides of the inner edge of the frame. At least two second flexible clip elements are connected to the fourth side of the inner edge of the frame. | 04-08-2010 |
20100123891 | SCANNING EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus including an original stage that holds an original, a substrate stage that holds a substrate, and a projection optical system that projects a pattern of the original onto the substrate, and being configured to scan and expose the substrate during a period in which the speeds of the original stage and the substrate stage change, comprises a controller configured to correct, a distortion generated in an image transferred onto the substrate due to at least one of deformation of the original stage in response to a change in speed of the original stage and deformation of the substrate stage in response to a change in speed of the substrate stage, based on a correction value determined by an acceleration of the substrate stage. | 05-20-2010 |
20100214552 | MULTI-TABLE LITHOGRAPHIC SYSTEMS, LITHOGRAPHY PROCESSING TOOLS AND METHODS FOR PROCESSING WORKPIECES - A lithographic workpiece processing tool includes a loading area for loading a workpiece; and a processing area for processing a workpiece. The workpiece processing tool further includes a multi-table system arranged between the loading area and the processing area. The multi-table system includes at least two tables configured to pass each other while moving between the loading area and the processing area. Each of the at least two tables is configured to hold a workpiece. | 08-26-2010 |
20100328641 | PELLICLE FRAME AND LITHOGRAPHIC PELLICLE - A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm | 12-30-2010 |
20110063599 | FILM HOLDER - A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and a leveling portion. The input portion has an entrance, a channel and an exit, the channel disposed between the entrance and the exit. During scanning of the to-be-scanned object, the to-be-scanned object passes through the channel. The guiding portion connects to the input portion for guiding the to-be-scanned object. The leveling portion is disposed on one side of the channel. During scanning of the to-be-scanned object, the leveling portion leans against the to-be-scanned object. The sensing unit stably senses the to-be-scanned object. The to-be-scanned object inside the film holder is kept from being scratched and the to-be-scanned object is in smooth move during scanning. | 03-17-2011 |
20110063600 | FILM HOLDER - A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and an information window. The input portion has an entrance, a channel and an exit, the channel disposed between the entrance and the exit. During scanning of the to-be-scanned object, the to-be-scanned object passes through the channel. The guiding portion connects to the input portion for guiding the to-be-scanned object. The information window is formed at and through the guiding portion. During scanning of the to-be-scanned object, the side regions of the to-be-scanned object pass through the information window. Functions of the scanning device are effectively augmented; the film is kept from being scratched; the quality of image scanning is kept from being deteriorated; and it is convenient to use the scanning device. | 03-17-2011 |
20110063601 | PELLICLE FRAME, PELLICLE, LITHOGRAPHY APPARATUS, AND METHOD OF FABRICATING THE PELLICLE FRAME - A pellicle frame, including aluminum, aluminum oxide, and a transition metal. | 03-17-2011 |
20110128523 | STAGE APPARATUS, EXPOSURE APPARATUS, DRIVING METHOD, EXPOSING METHOD, AND DEVICE FABRICATING METHOD - A drive system drives the moving body based on: measurement results of a first measuring system that measures the position of the moving body within an plane by radiating a measurement beam from an arm member to a grating disposed in one surface of a moving body that is parallel to an XY plane; and measurement results of a second measuring system that uses laser interferometers to measure a change in the shape of the arm member. The drive system uses the measurement results of the second measuring system to correct measurement error, owing to a change in the shape of the arm member, included in the measurement results of the first measuring system. | 06-02-2011 |
20110141450 | Method and Apparatus for Overlay Measurement - A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function. | 06-16-2011 |
20110176124 | ORIGINAL READING DEVICE AND IMAGE FORMING APPARATUS INCLUDING THE SAME - An original reading device is provided with an original cover, an original reading device main body, and a cover attachment portion that attaches the original cover to the original reading device main body in an openable and closeable manner, and the cover attachment portion is constituted by a rod-shaped hinge portion that is attached to the original cover through an open-close mechanism portion, and a hinge guide portion that is provided in the original reading device main body and through which the rod-shaped hinge portion is inserted and supported, and a latch indentation is provided in the hinge guide portion such that a latch protrusion provided at a lower portion of the rod-shaped hinge portion is latched into the latch indentation to maintain a state in which the rod-shaped hinge portion is pulled out a predetermined distance from the hinge guide portion. | 07-21-2011 |
20110235016 | PELLICLE, MOUNTING METHOD THEREFOR, PELLICLE-EQUIPPED MASK, AND MASK - A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive adhesion layer for adhering the pellicle frame to a mask, the pressure-sensitive adhesion layer being provided on an inner peripheral face of the pellicle frame, and the pressure-sensitive adhesion layer being capable of adhering to a side face of a mask having a mask image on a front face. There are also provided a method of mounting a pellicle that includes fixing to a side face of a mask an inner peripheral face of a pellicle frame of a pellicle that includes a pellicle film and a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, a method of mounting a pellicle that includes adhering the pellicle to a side face of the mask that is inclined in going from the reverse face of the mask toward the front face where the mask image is provided, thus adhering the side face of the mask to the pellicle frame inner peripheral face, a pellicle-equipped mask that includes the pellicle adhered to a mask, and a mask that includes a side face that is inclined in going toward the front face where a mask image is provided. | 09-29-2011 |
20120086931 | Stage device including a heat insulating sheet supported by an auxiliary member - A stage device that includes a base. A stage movable portion is movable along a surface of the base. An interferometer measures a position of the stage movable portion using measurement light. At least one of a piping element and a wiring element are connected to the stage movable portion. An auxiliary member, including a plurality of members connected with each other, guides a bend of at least one of the piping element and the wiring element. A heat insulating sheet is supported by the auxiliary member. The heat insulating material is provided between a space through which the measurement light of the interferometer passes, and the at least one of the piping element and the wiring element. | 04-12-2012 |
20120140199 | MECHANICAL FIXTURE OF PELLICLE TO LITHOGRAPHIC PHOTOMASK - A pellicle frame is mechanically attached to a reticle, without use of an adhesive. An embodiment includes mechanically attaching a pellicle frame to a front surface of a reticle, removing the pellicle frame from the reticle, cleaning the reticle, and mechanically reattaching the pellicle frame to the reticle. Embodiments further include using a clamp to mechanically attach the pellicle frame to the reticle. Embodiments further include forming the pellicle frame with a flange having an opening in the center, and forming the clamp with two portions, one portion with a protrusion that fittingly engages the opening in the flange and with a second opening, and the second portion with a segment that extends behind the reticle and with a second protrusion that fittingly engages the second opening. | 06-07-2012 |
20120182538 | Methods and Apparatus for Inspection Of Articles, EUV Lithography Reticles, Lithography Apparatus and Method of Manufacturing Devices - An article such as an EUV lithography reticle is inspected to detect contaminant particles. The method comprises applying a fluorescent dye material to the article, illuminating the article with radiation at wavelengths suitable for exciting the fluorescent dye, monitoring the article for emission of second radiation by the fluorescent dye at a wavelength different from the first radiation, and generating a signal representing contamination in the event of detecting the second radiation. In one example, measures such as low-affinity coatings may be applied to the reticle to reduce affinity for the dye molecules, while the dye molecules will bind by physical or chemical adsorption to the contaminant particles. Dyes may be selected to have fluorescence behavior enhanced by hydrophobicity or hydrophilicity, and contaminant surfaces treated by buffer coatings accordingly. | 07-19-2012 |
20130021594 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - The exposure apparatus of the present invention has an original holding unit including a holding frame that holds an original M by attracting the outer peripheral portion thereof and a drive unit that is capable of moving the holding frame while changing an irradiation area of the light to be irradiated on a pattern. Here, the holding frame has a penetrating portion, which is capable of flowing gas which is present in a space defined by the original and the holding frame into and out from the space, provided at both front and back lateral sides of the holding frame in the direction of movement thereof, and the penetrating portion has a shape or a configuration such that the pressure loss in the flow of the gas in a first direction is less than the pressure loss in the flow of the gas in a second direction. | 01-24-2013 |
20130176549 | Reticle Operation System - A system for operating EUV mask stored in reticle SMIF pod and/or dual pod is provided, wherein the reticle SMIF pod and Dual pod are for storing EUV mask. The system can be a sorter for EUV mask transferred from reticle SMIF pod into dual pod, and vice versa, or an operating system for tools relating to EUV mask, wherein the tools may be EUV lithography, or inspection tool for inspecting EUV mask. | 07-11-2013 |
20130293865 | Linear Stage for Reflective Electron Beam Lithography - A linear stacked stage suitable for REBL may include a first upper fast stage configured to translate a first plurality of wafers in a first direction along a first axis, the first upper fast stage configured to secure a first plurality of wafers; a second upper fast stage configured to translate a second plurality of wafers in a second direction along the first axis, the second upper fast stage configured to secure the second plurality of wafers, the second direction opposite to the first direction, wherein the translation of the first upper fast stage and the translation of the second upper fast stage are configured to substantially eliminate inertial reaction forces generated by motion of the first upper fast stage and the second upper fast stage; and a carrier stage configured to translate the first and second upper fast stages along a second axis. | 11-07-2013 |
20130293866 | MASK PLATE AND EXPOSING METHOD - A mask plate comprises a light transmitting region; a light absorbing region; and a light reflecting region provided in the light absorbing region on one side of the mask plate. An exposing method using the mask plate comprises placing a first substrate coated with a first photosensitive resist layer under and parallel to the mask plate; having first light vertically strike on an upper surface of the mask plate from above, pass through the light transmitting region of the mask plate, and strike on the first photosensitive resist layer; placing a second substrate coated with a second photosensitive resist layer under and parallel to the mask plate; and having second light reflected by the lens device onto the surface of the mask plate where the light reflecting region is provided, then reflected by the light reflecting region and strike on the second photosensitive resist layer. | 11-07-2013 |
20140036250 | MEASURING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD - The measuring apparatus of the present invention is a measuring apparatus that measures a position of an object based on a first phase signal and a second phase signal which are different in phase from each other. The measuring apparatus includes a generator configured to generate a difference signal indicating a difference between a delay time of the first phase signal and a delay time of the second phase signal based on a variation amount of a phase difference between the first phase signal and the second phase signal, which corresponds to a frequency of at least one of the first phase signal and the second phase signal, and the frequency; and a regulator configured to regulate a sampling timing for at least one of the first phase signal and the second phase signal based on the difference signal. | 02-06-2014 |
20140036251 | MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - A measurement apparatus is configured to measure a position of an object based on a first phase signal and a second phase signal whose phases are different from each other and includes a compensator configured to compensate for a fluctuation in a phase difference between the first phase signal and the second phase signal based on a frequency of at least one of the first phase signal and the second phase signal. | 02-06-2014 |
20150049323 | Lithographic Apparatus - A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades. | 02-19-2015 |
20150346611 | MEASUREMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD - A measurement apparatus includes: an imaging unit positioned with fixing with respect to a first member; a first detector configured to detect a position of a stage with reference to a second member; a second detector configured to detect fluctuation of a position of the first member with reference to the second member; and a control unit configured to obtain the position of the mark from an image of the mark sensed by the imaging unit while controlling a relative position of the stage relative to the second member so as to reduce fluctuation of a relative position of the mark relative to the imaging unit due to the fluctuation of the position of the first member based on detection results of the first and second detectors. | 12-03-2015 |
20160070180 | APPARATUS FOR PROTECTING EXTREME ULTRA VIOLET MASK AND EXTREME ULTRA VIOLET EXPOSURE APPARATUS INCLUDING THE SAME - An apparatus for protecting an extreme ultra violet (EUV) mask includes an EUV pellicle that allows EUV light to be radiated through the EUV pellicle onto the EUV mask, the EUV pellicle having a size corresponding to a size of a slit limiting the EUV light to a predetermined portion of the EUV mask, a flexible blocking film at opposite sides of the EUV pellicle in a first direction, the first direction being a scan direction of an exposure apparatus, and a roller unit including a first roller and a second roller, a first portion of the flexible blocking film being wound around the first roller at a first side of the EUV pellicle, and a second portion of the flexible blocking film being wound around the second roller at a second side of the EUV pellicle. | 03-10-2016 |
355076000 | Including vacuum, fluid or spring pressure | 9 |
20090097009 | HOLDING DEVICE AND EXPOSURE APPARATUS - A reticle is supported by flexible reticle holders at its +X and −X end portions, and therefore even if there is unevenness on the supported portions of the reticle, the surfaces of the reticle holders are transformed following the unevenness, which makes it possible to restrain deformation of the reticle as much as possible. Further, with support pins that contact with the reticle holders at three points that are not in a same straight line, the positions of the reticle holders in a height direction (Z-axis direction) at the contacting portions are set, and in addition, with a self-weight cancelling mechanism that includes piston members that contact with the reticle holders at three points that are not in a same straight line, bending due to self weights of the reticle and the reticle holders is restrained. | 04-16-2009 |
20090161089 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a liquid supply system configured to supply an immersion liquid between a downstream optical element of a projection system of the lithographic apparatus and the substrate, and a control system which is arranged to drive the substrate table so as to perform an acceleration profile to accelerate the substrate table from a first velocity in a first direction to a second velocity in a second direction. The acceleration profile is asymmetric in time and is dimensioned so that when the substrate table is accelerated according to the acceleration profile, a force to break a meniscus of the immersion liquid remains lower than a force to maintain the meniscus of the immersion liquid. | 06-25-2009 |
20100085555 | In-Situ Cleaning of an Imprint Lithography Tool - Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate. | 04-08-2010 |
20110007297 | STAGE APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A stage apparatus, which holds a plate member, comprises: a stage; a first positioning member and a second positioning member which are placed on the stage, and are configured to contact a lower surface and an upper surface of the plate member respectively to position the plate member in a direction perpendicular to a plane of the plate member; an elastic, first enclosing member configured to form a first enclosed space around the first positioning member; an elastic, second enclosing member configured to form a second enclosed space around the second positioning member; and a first suction mechanism and a second suction mechanism configured to respectively suck air from the first enclosed space and air from the second enclosed space so as to chuck the plate member to the first enclosed space and the second enclosed space by vacuum absorption. | 01-13-2011 |
20130038855 | LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD OF COMMODITIES - The present invention provides a lithography apparatus which transfers a pattern onto a substrate using an original including a pattern region in which the pattern is formed, the apparatus including a stocker configured to store the original, a processing unit configured to perform a transfer process of transferring the pattern onto the substrate, and a conveyance hand configured to convey the original between the stocker and the processing unit, wherein the conveyance hand includes a protective plate configured to protect the pattern region upon being placed to cover the pattern region, and a holding portion configured to hold the original via a portion other than the pattern region of the original upon being placed on the protective plate. | 02-14-2013 |
20130155385 | VACUUM CHAMBER ASSEMBLY FOR SUPPORTING A WORKPIECE - A chamber assembly ( | 06-20-2013 |
20140285791 | EXPOSURE APPARATUS, STAGE APPARATUS, AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, including a stage configured to place the reticle, a holding mechanism configured to hold the reticle placed on the stage, a driving unit configured to drive the stage, a determination unit configured to determine a feature including at least one of a type or shape of the reticle placed on the stage, and a decision unit configured to decide, based on the feature determined by the determination unit, at least one of a holding state of the reticle held by the holding mechanism, or control regarding driving of the stage. | 09-25-2014 |
20150009483 | MASK CLAMPING APPARATUS AND METHOD OF MANUFACTURING MASK - A manufacturing method of a mask includes aligning a mask sheet including an effective area and a non-effective area, on a mask frame; applying a pressure to the non-effective area of the mask sheet in a direction opposite to a sagging direction of the non-effective area, to prevent sagging of the non-effective area; and moving a clamping unit to the mask sheet along a direction substantially parallel to the mask sheet, to clamp the clamping unit onto the non-effective area of the mask sheet. | 01-08-2015 |
20150131073 | ORIGINAL HOLDING APPARATUS, EXPOSURE APPARATUS, METHOD OF MANUFACTURING ARTICLE AND ORIGINAL HOLDING METHOD - The present invention provides an original holding apparatus which holds an original, comprising a first holding unit configured to hold the original, a second holding unit configured to hold the original, a fixing unit configured to fix the second holding unit, and an adjustment unit configured to perform adjustment of an holding force of at least one of the first holding unit and the second holding unit, wherein the adjustment unit performs the adjustment such that the holding force of the second holding unit before fixing the second holding unit is smaller than the holding force of the first holding unit before fixing the second holding unit, and performs the adjustment such that the holding force of the second holding unit after fixing the second holding unit is larger than that before fixing the second holding unit. | 05-14-2015 |