| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 355044000 | With focusing or projection screen | 10 |
| 20090021708 | Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system - A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated. | 01-22-2009 |
| 20080304029 | Method and System for Adjusting an Optical Model - In a method of adjusting an optical parameter of an exposure apparatus, a photolithographic projection is performed using an exposure apparatus and using a layout pattern so as to provide measured layout data with different focus settings of the exposure apparatus. An optical model is provided including at least one optical parameter and a simulated image is created by using the optical model and the layout pattern. The optical model is optimized by modifying the optical parameter. | 12-11-2008 |
| 20080309897 | MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION - The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout. | 12-18-2008 |
| 20080278698 | Lithographic apparatus and method - A lithographic method is provided and comprises using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates. | 11-13-2008 |
| 20090051889 | Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method - An outer ring ( | 02-26-2009 |
| 20090190107 | MASKLESS PHOTOPOLYMER EXPOSURE PROCESS AND APPARATUS - A process for curing photopolymer which comprises exposing the photopolymer to an image produced by a mask-free imaging apparatus. The image may be generated by a monochromatic display screen, e.g. a liquid crystal display, light emitting diodes, a cathode ray tube or plasma screen. | 07-30-2009 |
| 355045000 | Reflector in optical path | 4 |
| 20080239262 | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation - A radiation source for generating electromagnetic radiation includes an anode, a cathode, and a discharge space. The anode and the cathode are configured to create a discharge in a substance in the discharge space to form a plasma so as to generate the electromagnetic radiation. The radiation source also includes a fuel supply constructed and arranged to supply at least a component of the substance to a location near the discharge space. The fuel supply is located at a distance from the anode and the cathode. The radiation source also includes a further supply constructed and arranged to create and/or maintain a cooling and/or protective layer on or near the anode and/or cathode. | 10-02-2008 |
| 20120154772 | OPTICAL ARRANGEMENT IN AN OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical arrangement in an optical system, such as a microlithographic projection exposure apparatus, includes: at least one heat-emitting subsystem which emits heat during the operation of the optical system; a first heat shield which is arranged such that it at least partly absorbs the heat emitted by the heat-emitting subsystem; a first cooling device which is in mechanical contact with the first heat shield and is designed to dissipate heat from the first heat shield; and a second heat shield which at least partly absorbs heat emitted by the first heat shield. The second heat shield is in mechanical contact with a cooling device that dissipates heat from the second heat shield. | 06-21-2012 |
| 20110122381 | Imaging Assembly - A imaging assembly for generating a light beam suitable for sintering comprises a lamp housing and a lamp mounted in the lamp housing comprising a filament and a lamp base, wherein the lamp is oriented with the lamp base to the side of the filament. The imaging assembly further comprises a reflector, an aperture, and at least one condenser lens configured to focus light emitted by the filament through the aperture. The imaging assembly further comprises a set of achromatic doublet lenses, each achromatic doublet lens comprising three surfaces optimized to focus light at three wavelengths, wherein the set of achromatic doublet lenses focuses light over a range including the three wavelengths. The imaging assembly further comprises an outer lens, wherein the focused light beam exits the imaging assembly through the outer lens. | 05-26-2011 |
| 20130021588 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A measurement apparatus includes a beam splitter that splits light from a light source into measurement light to be directed to an object to be measured and reference light to be directed to a reference surface, a beam combiner that combines the measurement light reflected by the object and the reference light reflected by the reference surface to generate combined light, and obtains physical information of the object based on the combined light. The measurement apparatus further includes a coherence controller which changes spatial coherences of the measurement light and the reference light. | 01-24-2013 |
