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With temperature or foreign particle control

Subclass of:

355 - Photocopying

355018000 - PROJECTION PRINTING AND COPYING CAMERAS

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DocumentTitleDate
20090073399EXPOSURE APPARATUS - An exposure apparatus of the present invention is configured to flow liquid in an area between an optical element 03-19-2009
20110205507DEVICE FOR DAMPING VIBRATIONS IN PROJECTION EXPOSURE APPARATUSES FOR SEMICONDUCTOR LITHOGRAPHY - A changeable assembly for a projection exposure apparatus for semiconductor lithography contains at least one damping element. Projection exposure apparatus for semiconductor lithography and measuring assemblies for a projection exposure apparatus for semiconductor lithography can include at least one sensor for detecting parameters and vibrations of the projection exposure apparatus, wherein the measuring assembly is embodied in such a way that it can be inserted into an exchange opening, provided for an optical element, in the projection exposure apparatus.08-25-2011
20100020297METHOD FOR IMPROVING SURFACE ROUGHNESS OF PROCESSED FILM OF SUBSTRATE AND APPARATUS FOR PROCESSING SUBSTRATE - A treatment apparatus for treating a substrate on a surface of which a treatment film has been formed and subjected to exposure processing and developing treatment. The treatment apparatus includes a nozzle for supplying a solvent gas of the treatment film to the surface of the treatment film on the substrate, and a moving mechanism for moving the nozzle which is supplying the solvent gas, relative to the substrate. The nozzle has an elongated discharge portion at least longer than a diameter of the substrate and partition plates at a front and a rear in the moving direction of the nozzle.01-28-2010
20090195762Cleanup method for optics in immersion lithography - An immersion lithography apparatus and a cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied from a liquid supply member to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided such that the surface of the object and the optical element are opposite to each other. During a cleanup process, a cleaning liquid is supplied from the liquid supply member onto the surface of the object.08-06-2009
20090195761Lithographic apparatus and in-line cleaning apparatus - An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.08-06-2009
20110188015LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.08-04-2011
20110188013LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD - An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).08-04-2011
20110188011PARTICLE CLEANING OF OPTICAL ELEMENTS FOR MICROLITHOGRAPHY - An optical assembly is mounted in a projection exposure apparatus (08-04-2011
20080259294Lithographic apparatus and device manufacturing method - In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.10-23-2008
20080259293EXPOSURE APPARATUS, TEMPERATURE REGULATING SYSTEM, AND DEVICE MANUFACTURING METHOD - An exposure apparatus which includes a plurality of units to be temperature-regulated, and transfers a pattern of a reticle onto a substrate while activating the plurality of units is disclosed. The exposure apparatus comprising a plurality of flow passages which run parallel to each other and through which a fluid to temperature-regulate the plurality of units flows, a bypass line which runs parallel to the plurality of flow passages so as to bypass the plurality of flow passages, and a flow rate controller configured to control a flow rate of fluid flowing through the bypass line, so that a total flow rate of the fluid flowing through the plurality of flow passages and the bypass line becomes a target flow rate.10-23-2008
20080259292Lithographic apparatus and device manufacturing method - A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.10-23-2008
20110194085Lithographic Apparatus, and Motor Cooling Device - A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling device further has a cooling duct assembly with a supply duct to supply a cooling fluid to the cooling element, and a discharge duct to discharge the cooling fluid from the cooling element. A pump causes the cooling fluid to flow through at least part of the cooling duct assembly. A flow control device controls a flow rate of the cooling fluid through at least part of the cooling duct assembly, to maintain a predetermined average temperature of the cooling fluid in the cooling element.08-11-2011
20110194084FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.08-11-2011
20130077065CLEANING SUBSTRATE FOR A LITHOGRAPHY APPARATUS, A CLEANING METHOD FOR A LITHOGRAPHY APPARATUS AND A LITHOGRAPHY APPARATUS - A method and apparatus to clean a cover to seal a gap between an object located in a recess of a table and the upper surface of the table outside of the recess. In-line and off-line arrangements are disclosed. Cleaning can be carried out using abrasion, UV radiation or flushing with a cleaning fluid for example.03-28-2013
20130077064ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY HAVING A REFLECTIVE OPTICAL ELEMENT - An arrangement for use in a projection exposure tool (03-28-2013
20090122282Exposure apparatus, liquid immersion system, exposing method, and device fabricating method - An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a first surface, which is disposed around an optical path of the exposure light; a second surface, which is disposed adjacent to an outer edge of the first surface, that includes a first area, which is inclined with respect to the first surface; and a liquid recovery surface, which is disposed at an outer side of the second surface with respect to the optical path of the exposure light; wherein, when an object is disposed at a position at which it opposes at least part of the first surface and at least part of the liquid recovery surface, a spacing between the second surface and the object is larger than a spacing between the first surface and the object, and a spacing between the object and at least part of the liquid recovery surface is larger than the spacing between the first surface and the object in a prescribed direction that is substantially perpendicular to a front surface of the object.05-14-2009
20110310367LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.12-22-2011
20110310366EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD - An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.12-22-2011
20110310365CHAMBER APPARATUS AND METHOD OF MAINTAINING TARGET SUPPLY UNIT - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.12-22-2011
20100073650LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.03-25-2010
20100073649Exposure Apparatus Having An Element To Be Cooled - An exposure apparatus having an element to be cooled and that exposes a substrate to patterned radiation by using the element. A reservoir houses a liquid coolant therein. A first pump, disposed between the reservoir and the element, supplies the coolant from the reservoir to the element. A heater, disposed between the first pump and the element, heats the coolant supplied from the first pump. A jacket receives the coolant from the heater and cools the element. A second pump, disposed between the jacket and the reservoir, reduces a pressure of the jacket and supplies the coolant from the jacket to reservoir. A cooler, disposed between the second pump and the reservoir, cools the coolant supplied from the second pump.03-25-2010
20100073648Masks and Methods of Manufacture Thereof - Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment includes a method of generating an assist feature of a lithography mask. The method includes providing a layout for a material layer of a semiconductor device, the layout including a pattern for at least one feature of the semiconductor device. The method includes forming an assist feature in the pattern for the at least one feature, wherein the assist feature extends completely through the pattern for the at least one feature.03-25-2010
20100073647COATING FILM FORMING APPARATUS AND COATING FILM FORMING METHOD FOR IMMERSION LIGHT EXPOSURE - A coating film forming apparatus for immersion light exposure, for forming a coating film including a resist film or a resist film and an additional film on a substrate to be fed to an immersion light exposure apparatus configured to perform a light exposure process through a liquid, includes: one or more coating units configured to apply the resist film or the resist film and the additional film onto the substrate; one or more thermally processing units configured to perform a thermal process necessary for forming the coating film on the substrate; a checking unit configured to check a state of the coating film at an edge portion of the substrate before the immersion light exposure; and a control section configured to use a check result obtained by the checking unit to make a judgment of whether or not the state of the coating film at the edge portion of the substrate is within an acceptable range, and to permit transfer of the substrate to the light exposure apparatus when the state of the coating film is within the acceptable range.03-25-2010
20130033687Method for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus - A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.02-07-2013
20130033686Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus - A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.02-07-2013
20100045951LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A temperature sensor is provided to measure the temperature of immersion liquid at a position where the immersion liquid is supplied. The reading of this temperature sensor is used to control the magnitude of heat input to the immersion liquid using a heater and/or cooler. A controller is used to calculate the calibration error of the temperature sensor relative to a temperature sensor that is provided upstream. The controller uses readings of the temperature difference between the two temperature sensors at one or more mass flow rates in order to estimate the temperature difference between the two temperature sensors at an infinite mass flow rate. The temperature difference at this infinite mass flow rate is estimated to be the temperature calibration error of the temperature sensor to measure the temperature of immersion liquid at a position where the immersion liquid is supplied relative to the upstream temperature sensor.02-25-2010
20100045949Exposure apparatus, maintaining method and device fabricating method - An exposure apparatus exposes a substrate with exposure light that passes through a liquid. The exposure apparatus comprises: a porous member that has a first surface, which is capable of opposing an object disposed at an irradiation position of the exposure light, and a second surface, which is opposite the first surface, and forms a first space that is capable of holding the liquid between the first surface and the object; a supply port, which is capable of supplying the liquid to the first space; a prescribed member, which forms a second space that faces the second surface; an adjusting apparatus, which is capable of decreasing a pressure in the second space such that the liquid in the first space moves to the second space via holes in the porous member; and a control apparatus, which controls an operation of supplying the liquid via the supply ports and a pressure adjustment operation performed by the adjusting apparatus. The control apparatus repetitively executes a first operation, which supplies the liquid to the first space, and a second operation, which stops the supply of the liquid to the first space and negatively pressurizes the second space such that the liquid is substantially eliminated from the first space, to clean the porous member.02-25-2010
20100045948EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINATION STATUS OF AN EUV-REFLECTIVE OPTICAL SURFACE - The invention relates to an EUV lithography apparatus with at least one EUV-reflective optical surface and a cavity ringdown reflectometer adapted to determine the contamination status of the EUV-reflective optical surface for at least one contaminating substance by determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm). The invention further relates to a method for determining the contamination status of at least one EUV-reflective optical surface arranged in an EUV lithography apparatus for at least one contaminating substance comprising determining the reflectivity of the EUV-reflective optical surface for radiation at a measuring wavelength (λm) using a cavity ringdown reflectometer.02-25-2010
20130033688System for Direct Application of Dampening Fluid for a Variable Data Lithographic Apparatus - A system and corresponding methods are disclosed for applying a dampening fluid to a reimageable surface of an imaging member in a variable data lithography system, without a form roller. In one embodiment, the system includes subsystems for converting a dampening fluid from a liquid phase to a dispersed fluid phase, and for directing flow of a dispersed fluid comprising the dampening fluid in dispersed fluid phase to the reimageable surface. The dampening fluid reverts to the liquid phase directly on the reimageable surface. In another embodiment a continuous ribbon of dampening fluid may be applied directly to the reimageable surface. This embodiment includes a body structure having a port for delivering dampening fluid in a continuous fluid ribbon directly to the reimageable surface, and a mechanism, associated with the body structure, for stripping an entrained air layer over the reimageable surface when the reimageable surface is in motion.02-07-2013
20090021705Debris prevention system, radiation system, and lithographic apparatus - A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.01-22-2009
20130070220FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus has, at a boundary of a space configured to contain immersion fluid to a region external to the fluid handling structure, a gas supply opening radially outward of the space, a fluid recovery opening radially outward of the gas supply opening, and a damper surface extending at least 0.5 mm radially outwards from the fluid recovery opening along the undersurface of the fluid handling structure.03-21-2013
20130070221MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus includes a projection light source, a heating light source, a catoptric projection lens and a reflecting switching element, which can be arranged outside of the projection lens and can be displaced between a first position and a second position via a drive. Only the projection light can enter the projection lens in the first position of the switching element, and only the heating light can enter the projection lens in the second position of the switching element.03-21-2013
20130070219LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.03-21-2013
20130070218SYSTEM FOR REMOVING CONTAMINANT PARTICLES, LITHOGRAPHIC APPARATUS, METHOD FOR REMOVING CONTAMINANT PARTICLES AND METHOD FOR MANUFACTURING A DEVICE - A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.03-21-2013
20130088694LITHOGRAPHIC APPARATUS AND METHOD OF COOLING A COMPONENT IN A LITHOGRAPHIC APPARATUS - A lithographic apparatus includes a component and a local cooler to apply a local cooling load to the component. The local cooler has a gas passageway including a flow restriction upstream of the component and configured to direct a flow of gas exiting the flow restriction to cool a surface of the component.04-11-2013
20130088695DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT - A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.04-11-2013
20090303450Particle Detection on Patterning Devices with Arbitrary Patterns - A detection system for detecting particle contamination in a lithographic apparatus includes an illumination system that directs a radiation beam onto a section of a surface of a patterning device to generate at least first and second components of patterned radiation. A first detector is configured to detect the first component. A filter is configured to adaptively change the second component based on the detected first component, and a second detector is configured to detect the filtered second component. An imaging device generates an image corresponding to the detected second filtered component, and the image indicates an approximate location of a particle on the surface of the patterning device.12-10-2009
20120218532GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFATURING METHOD - A gas manifold to direct a gas flow between two parallel plates of an optical component of a lithographic apparatus, the gas manifold having an inlet to provide a gas flow to the gas manifold, a lattice comprising a plurality of through holes to homogenize the gas flow, a contractor downstream of the lattice to reduce the cross sectional area through which the gas flow flows, and an outlet downstream of the contractor to provide the gas flow to the two parallel plates.08-30-2012
20090040481EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus that exposes a substrate via liquid includes a substrate stage configured to hold the substrate and to move. The substrate stage includes a top plate, a substrate holder disposed on the top plate and configured to hold the substrate, and a support-plate holder disposed on the top plate as a separate body from the substrate holder and configured to hold a support plate while surrounding the substrate held by the substrate holder. The substrate holder includes an extension having a surface facing a back surface of the support plate held by the support-plate holder. The support-plate holder is provided with a collecting port therein through which liquid that has entered a gap between the back surface of the support plate and the surface of the extension is collected.02-12-2009
20130114056METHOD FOR IMPROVING AN OPTICAL IMAGING PROPERTY OF A PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A method is disclosed for improving an optical imaging property, for example spherical aberration or the focal length, of a projection objective of a microlithographic projection exposure apparatus. First, an immersion liquid is introduced into an interspace between a photosensitive surface and an end face of the projection objective. Then an imaging property of the projection objective is determined, for example using an interferometer or a CCD sensor arranged in an image plane of the projection objective. This imaging property is compared with a target imaging property. Finally, the temperature of the immersion liquid is changed until the determined imaging property is as close as possible to the target imaging property.05-09-2013
20090091719Exposure system and pattern formation method - An exposure system includes an exposure section provided within a chamber for irradiating a resist film formed on a wafer with exposing light through a mask with an immersion liquid provided on the resist film. It further includes a drying section for drying the surface of the resist film after the irradiation.04-09-2009
20090091718IMAGE PROJECTION DEVICE, IMAGE PROJECTION SCREEN AND IMAGE DISPLAY SYSTEM - An image projector according to the present invention includes a first light source that emits visible light and a second light source that emits invisible light and projects the visible light and the invisible light onto a screen. The screen includes a material, at least one of the visible light reflectance, transmittance and absorbance of which changes when irradiated with the invisible light projected. The image projector further includes a modulating section for modulating the intensities of the visible light and invisible light based on an image signal and a control section for controlling the modulating section.04-09-2009
20090091717IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion exposure apparatus which projects a pattern of an original onto a substrate to expose the substrate, comprises a substrate stage mechanism including a substrate stage configured to hold the substrate, an immersion unit configured to supply the liquid into a space between the substrate or the substrate stage and the projection optical system, and recover the liquid from above the substrate or the substrate stage, and a control unit configured to control the immersion unit to recover the liquid from above the substrate or the substrate stage, and then control the substrate stage mechanism to move the substrate stage to a retreat position, in response to a shutoff request for requesting shutoff of electric power supply to the substrate stage mechanism.04-09-2009
20090091716Lithographic apparatus and method of cleaning a lithographic apparatus - An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.04-09-2009
20090091715EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus configured to expose a substrate through a liquid includes a projection optical system configured to project an image of a pattern formed on an original plate onto a substrate and a stage configured to move while supporting the substrate. Further, the exposure apparatus includes a member including a supply port and a recovery port of the liquid that is arranged between the stage and the projection optical system such that a space is formed between the projection optical system and the member, and a supply unit configured to supply inactive gas through an outlet port into a space between the projection optical system and the member. The outlet port is directed to the space.04-09-2009
20110058149Stage drive method and stage unit, exposure apparatus, and device manufacturing method - When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.03-10-2011
20130057838EXPOSURE APPARATUS, EXPOSURE METHOD, METHOD OF MANUFACTURING DEVICE, PROGRAM, AND STORAGE MEDIUM - An exposure apparatus exposing a substrate with exposure light through liquid, including: an optical member having an emitting surface from which exposure light is emitted; a substrate holding apparatus that includes: a first holding portion holding a lower surface of substrate so that lower surface of substrate can be released, and a first member that defines an opening where substrate can be arranged, and that has an upper surface which is arranged at a vicinity of an upper surface of the substrate in a state which the substrate is held by the first holding portion; and a porous member of which at least a part is arranged at a gap between the substrate and the first member, and which has an upper surface liquid-repellent with respect to the liquid, wherein at least a part of the liquid which flows into the gap is recovered through the porous member.03-07-2013
20130057837EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE-MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus capable of suppressing the occurrence of exposure defects is provided. The exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical member having an emission surface from which exposure light is emitted; a substrate holding apparatus including a first holding portion that releasably holds the lower surface of the substrate, a first surface that defines an aperture in which the substrate can be disposed and that is disposed around the upper surface of the substrate in a state where the substrate is held on the first holding portion, and a first space portion that is in communication with a gap between the upper surface of the substrate and the first surface; a drive apparatus that moves the substrate holding apparatus in a state where an immersion space is formed with the liquid between the optical member and at least one of the upper surface of the substrate and the first surface; a suction port through which fluid in the first space portion is suctioned; and a control apparatus that sets a suction force of the suction port in at least a part of a first period in which exposure of the substrate is executed so as to be smaller than a suction force of the suction port in a second period in which exposure of the substrate is not executed.03-07-2013
20110013161Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a space between the projection optical system and the substrate. The exposure apparatus has a liquid supply system having a supply path that supplies liquid to the space between the projection optical system and the substrate. A liquid recovery system having a recovery path recovers the liquid from the space during the exposure. The apparatus also includes a suction path with which at least part of the supply path of the liquid supply system is connected when the exposure apparatus functions abnormally.01-20-2011
20110013160Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice - An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.01-20-2011
20110013159LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO PHASE FLOW - A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.01-20-2011
20110013158FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. A first portion of an undersurface of the fluid handling structure, in use, is a different distance from the facing surface than a second portion of the undersurface. Further, the first portion has defined in it a supply opening configured to supply liquid toward the facing surface, and an extraction opening configured to remove fluid from between the fluid handling structure and the facing surface.01-20-2011
20090268176IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion exposure apparatus including an optical element 10-29-2009
20090268175EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus that exposes a substrate through liquid includes a projection optical system that projects a pattern of an original onto the substrate; a supply port that supplies the liquid; a recovery port that recovers the liquid; and a plurality of pressure resistance portions arranged at a passage of at least one of the supply port and the recovery port, to apply pressure resistances to the liquid passing through the passage. The pressure resistance portions surround a final surface of the projection optical system and are distant from each other in a direction in which the liquid flows through the passage. One the plurality of pressure resistance portions, which is nearest to the substrate, faces the substrate.10-29-2009
20090268174Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method - An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes: an optical member which has an emission surface from which the exposure light is emitted; a movable object which is able to move in a predetermined surface including a position facing the emission surface; and a predetermined component which is able to move between, the optical member and the movable object and which is able to form a space between which and the optical member a liquid is held.10-29-2009
20120224154EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.09-06-2012
20120224153OPTICAL ARRANGEMENT, IN PARTICULAR IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY - An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing (09-06-2012
20090237632IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.09-24-2009
20090237631Apparatus and methods for recovering fluid in immersion lithography - An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.09-24-2009
20090046261Lithographic apparatus and device manufacturing method - A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.02-19-2009
20090009734Lithographic apparatus and device manufacturing method - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.01-08-2009
20090009733EXPOSURE APPARATUS - An exposure apparatus has a projection optical system configured to project light from a reticle onto a wafer and exposes the wafer to the light in a state where a gap between the projection optical system and the wafer is filled with liquid. In the exposure apparatus, a chuck for holding the wafer has a contact portion that is contactable with the wafer. At least this contact portion of the chuck has a hydrophilic surface having a contact angle of 90° or less with respect to the liquid.01-08-2009
20120113402LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.05-10-2012
20080309896Exposure method, exposure apparatus, and method for producing device - An exposure method forms an immersion area in at least a part of a substrate including a projection area of a projection optical system and projects an image of a mask pattern onto the substrate through liquid between the projection optical system and the substrate. Distribution of the mask pattern is measured and adjustment is made so that a desired image of the pattern is projected onto the substrate according to distribution of the exposure light incident into the liquid between the projection optical system and the substrate when exposing the substrate. It is possible to expose the substrate with the pattern accurately regardless of the distribution of the mask pattern.12-18-2008
20120236276Immersion Lithography System Using Direction-Controlling Fluid Inlets - Immersion lithography system and method using direction-controlling fluid inlets are described. According to one embodiment of the present disclosure, an immersion lithography apparatus includes a lens assembly having an imaging lens disposed therein and a wafer stage configured to retain a wafer beneath the lens assembly. The apparatus also includes a plurality of direction-controlling fluid inlets disposed adjacent to the lens assembly, each direction-controlling fluid inlet in the plurality of direction-controlling fluid inlets being configured to direct a flow of fluid beneath the lens assembly and being independently controllable with respect to the other fluid inlets in the plurality of direction-controlling fluid inlets.09-20-2012
20120236275PROJECTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Various configurations of a projection system, of a lithographic apparatus, and of a device manufacturing method are disclosed. According to a disclosed configuration, the projection system is configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes an optical element having a first face and a second face. The first face is configured to be exposed to an external gaseous environment connected to the outside of the lithographic apparatus. The second face is configured to be exposed to an internal gaseous environment, the internal gaseous environment being substantially isolated from the external gaseous environment. The projection system further includes a pressure compensation system configured to adjust the pressure in the internal gaseous environment in response to a change in pressure in the external gaseous environment or a pressure differential between the internal gaseous environment or the external gaseous environment.09-20-2012
20120236274LIQUID CRYSTAL PANEL MANUFACTURING APPARATUS AND METHOD FOR MANUFACTURING THE LIQUID CRYSTAL PANEL - According to one embodiment, a liquid crystal panel manufacturing apparatus includes a treatment bath, a light transmissive window, a liquid flowing unit, and a light irradiation unit. The treatment bath is configured to contain a liquid and to treat a panel in the liquid, wherein the panel includes a liquid crystal layer having a photo-polymerizable material and a liquid crystal composition. The light transmissive window is provided in the treatment bath. The liquid flowing unit is configured to cause the liquid to flow along a major surface of the panel. A light irradiation unit is configured to irradiate the panel with a light to polymerize the photo-polymerizable material via the light transmissive window.09-20-2012
20120236273TARGET SUPPLY UNIT - A target supply unit may include: a reservoir for storing a target material; a heater provided inside the reservoir for heating the target material stored in the reservoir; a heater power supply for supplying current to the heater; and a target outlet for outputting the target material stored inside the reservoir.09-20-2012
20110026000Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine - An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative to the substrate table. The substrate table and the pad member are moved together during a transition from a first state to a second state, the first state being a state in which an immersion liquid is maintained in a space between the optical member and the substrate table, the second state being a state in which the immersion liquid is maintained in a space between the optical member and the pad member. The optical member is kept in contact with the immersion liquid during the transition.02-03-2011
20110025999Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine - An immersion exposure apparatus exposes a substrate with a light beam. The apparatus includes an optical member through which the light beam is irradiated onto the substrate, a substrate table which holds the substrate and is movable relative to the optical member, and a pad member which is movable relative to the substrate table and is positionable opposite to the optical member in place of the substrate table to substantially maintain an immersion liquid in a space under the optical member when the substrate table is moved away from under the optical member. The substrate table and the pad member are relatively tilted and/or moved in a vertical direction before the substrate table is moved away from under the optical member.02-03-2011
20110032497CONDUIT SYSTEM FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, PUMP, AND METHOD FOR SUBSTANTIALLY REDUCING VIBRATIONS IN A CONDUIT SYSTEM - A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.02-10-2011
20080291408Projection optical system, exposing method, exposure apparatus, and device fabricating method - A projection optical system projects an image of a first surface to a second surface through a liquid. The projection optical system comprises an optical element, wherein the first surface side contacts a gas and the second surface side contacts the liquid. The optical element has an incident surface, which is convex toward the first surface, an emergent surface, an outer circumferential surface between an outer circumference of the incident surface and an outer circumference of the emergent surface, and holding parts, which are formed at a circumferential edge part of the outer circumferential surface so that they project toward the second surface.11-27-2008
20090213343RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY - A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.08-27-2009
20120307217SYSTEM AND METHOD FOR TREATING SUBSTRATE - A method and system for treating a substrate are provided. The system includes a coating unit, a pre/post-exposure treatment unit, and a developing unit. Each of the units includes a load port and an index module. The pre/post-exposure treatment unit includes first and second modules that are arranged in different layers. The first module performs a process for coating a protective layer on the wafer before an exposure process. The second module performs a process for cleaning the wafer and a post-exposure bake process after the exposure process.12-06-2012
20100171940Projection exposure apparatus, projection exposure method, and method for producing device - A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.07-08-2010
20100171939LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.07-08-2010
20110279796LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.11-17-2011
20110279795LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.11-17-2011
20110279794Exposure apparatus and device manufacturing method - An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage, a supply mechanism, a recovery mechanism and an auxiliary recovery mechanism. The substrate stage mounts the substrate and moves within a two-dimensional plane while holding the substrate. The supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. The recovery mechanism recovers the liquid, and the auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.11-17-2011
20090027639EUV Reticle Handling System and Method - An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.01-29-2009
20100201959PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY - A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.08-12-2010
20100201958OPTICAL CORRECTION DEVICE - The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.08-12-2010
20120008111Exposure apparatus, and device manufacturing method - A support structure of a lithographic projection apparatus is configured to hold a patterning device, the patterning device being configured to pattern a beam of radiation according to a desired pattern. A substrate table is configured to hold a substrate. A projection system is configured to project the patterned beam onto a target portion of the substrate. A liquid supply system includes a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, the aperture having an area smaller than an area of the substrate, the patterned beam capable of being projected through liquid in the space and the aperture onto the substrate. A closure is configured to selectively close and open the aperture, and the closure is separable from the remainder of the apparatus.01-12-2012
20110285977LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.11-24-2011
20110285976LITHOGRAPHIC APPARATUS, FLUID HANDLING STRUCTURE FOR USE IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.11-24-2011
20110299051FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD - A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.12-08-2011
20090201471VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY - A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.08-13-2009
20090296055LENS HEATING COMPENSATION SYSTEMS AND METHODS - Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.12-03-2009
20110292360PATTERNING NON-PLANAR SURFACES - A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.12-01-2011
20120013862LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprises: a first member, which has a first surface, a second surface that faces a direction other than that faced by the first surface, and a plurality of holes that connects the first surface and the second surface, that recovers at least some of the liquid from the space above the object opposing the first surface via the holes; a recovery passageway, wherethrough the liquid recovered via the holes of the first member flows; and a discharge part, which separately discharges a liquid and a gas from the recovery passageway. The first member comprises a first portion and a second portion. The second portion hinders a gas flowing from a space between the object and the first surface into the recovery passageway via the holes more than the first portion does.01-19-2012
20110292358LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.12-01-2011
20110292357FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.12-01-2011
20090279064LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, a closing plate is used to contain liquid in a liquid confinement structure while, for example, substrates are swapped on a substrate table. A closing plate displacement mechanism using, for example, a combination of one or more leaf springs and one or more electromagnets or a combination of one or more linear actuators and one more pins, is used to move the closing plate toward or from the liquid confinement structure. In an embodiment, an adjustment plate is used to compensate for closing plates of varying thickness in closing plate receptacles of varying depth on different substrate tables.11-12-2009
20110285975METHOD OF MANAGING EUV EXPOSURE MASK AND EXPOSURE METHOD - According to one embodiment, there is provided a method of managing an EUV exposure mask to manage a cleaning period of the EUV exposure mask set in an exposure apparatus, including obtaining mark profile signals corresponding to two different directions of an alignment mark provided on the mask by irradiating the mark with EUV light and detecting light reflected by the mask, measuring dimensions of the mark in the two different directions from the obtained mark profile signals, calculating a difference between the measured dimensions in the two different directions, and determining the cleaning period of the mask based on the calculated difference.11-24-2011
20090002647HYDROCARBON GETTER FOR LITHOGRAPHIC EXPOSURE TOOLS - Carbon contamination of optical elements in an exposure tool is minimized by incorporating a hydrocarbon getter. Embodiments include EUV lithography tools provided with at least one hydrocarbon getter comprising a substrate and a high energy source, such as an electron gun or separate EUV source, positioned to direct an energy beam, having sufficient energy to crack heavy hydrocarbons and form carbon, on the substrate. Embodiments also include exposure tools equipped with a hydrocarbon getter comprising an energy source positioned to impinge a beam of energy on a quartz crystal thickness monitor, a residual gas analyzer, and a controller to control the electron-current and maintain the amount of hydrocarbons in the system at a predetermined low level.01-01-2009
20090002655Exposure apparatus, exposure method, and method for producing device - A liquid immersion exposure apparatus includes an optical member through which a substrate is exposed with an exposure beam, and a liquid supply system having a supply port from which a liquid is supplied. The liquid supply system supplies the liquid from the supply port to a space between the optical member and the substrate during the exposure. The optical member has a lyophobic surface which is lyophobic for the liquid.01-01-2009
20090002654Immersion Lithography Apparatus and Method of Performing Immersion Lithography - An immersion lithography apparatus comprises an optical system having a liquid delivery unit. The liquid delivery unit is arranged to deliver a layer of an immersion liquid onto a surface of a wafer as well as an annulus of a barrier liquid adjacent an exterior wall of the immersion liquid. The presence of the barrier liquid prevents ingress to the immersion liquid of a gas external to the immersion liquid.01-01-2009
20090002653Lithographic apparatus having encoder type position sensor system - A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.01-01-2009
20090002652Lithographic apparatus and device manufacturing method - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.01-01-2009
20090002651EXPOSURE APPARATUS AND METHOD - An apparatus projects a pattern formed on an original plate onto a substrate through a projection optical system and liquid in a state where a gap between the substrate and a face of the projection optical system is filled with liquid. The apparatus includes a movable substrate stage to hold the substrate and including at least a mark unit or a measurement unit having a light-receiving unit, a determination device to determine whether the liquid is attached to the mark unit or the measurement unit, and a liquid supply device to attach liquid to at least the mark unit or the measurement unit before the attached liquid is air-dried if liquid is determined to be attached to the mark unit or the measurement unit.01-01-2009
20090002648Gas curtain type immersion lithography tool using porous material for fluid removal - A gas curtain type immersion lithography apparatus has a fluid removing porous region adjacent the gas inlet to prevent evaporative cooling. The apparatus includes a substrate holder which holds a substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through an immersion fluid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. Gas is provided through an inlet into the gap. A porous region is provided adjacent the gas inlet. Immersion fluid that collects near the gas inlet is removed by the porous region.01-01-2009
20080212046Lithographic apparatus and device manufacturing method - A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.09-04-2008
20110267592LITHOGRAPHIC APPARATUS AND SUBSTRATE EDGE SEAL - A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.11-03-2011
20110007287LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.01-13-2011
20110007286LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS - An immersion lithographic apparatus is disclosed that includes a substrate table configured to support a substrate, a projection system configured to direct a patterned beam of radiation onto a substrate, a liquid handling system configured to supply and confine immersion liquid to a space defined between a projection system and a substrate, or substrate table, or both, and a controller to control speed of motion of the substrate table relative to the liquid handling system during movement of the substrate table through a path under the liquid handling system based on a distance between turns in the path.01-13-2011
20100033695LITHOGRAPHY APPARATUS AND MANUFACTURING METHOD USING THE SAME - An lithography apparatus for manufacturing an organic transistor that is capable of aligning accurately in self-alignment fashion relative positions of a gate electrode and a pair of source and drain electrodes and has high productivity. In an lithography apparatus for radiating a light to a photosensitive self-assembled film and exposing the same in self-aligning fashion using a gate electrode as a mask, by transporting a flexible translucent substrate from roller to roller and forming a gate electrode, an insulating layer, and the photosensitive self-assembled film on the flexible substrate when an organic transistor is formed on the flexible substrate, a reflection preventing film is provided on an inner wall of the apparatus that is on the opposite side of the flexible substrate as seen from an exposure light source.02-11-2010
20100033694Exposure method, exposure apparatus and device manufacturing method - An exposure apparatus which exposes a wafer with an illumination light via a reticle includes a vortex tube which generates a cool gas and a warm gas from a compressed gas injected from a compressed gas supply tube; a flow rate control valve and a Y-shaped joint which mix the cool gas and the warm gas generated from the vortex tube at a variable mixing ratio to output a temperature-controlled gas; and a gas supply duct which supplies the temperature-controlled gas to a heat source or a vicinity thereof. It is possible to perform the local temperature control or the local cooling by the simple mechanism without using any refrigerant or any cooling medium.02-11-2010
20090296052LITHOGRAPHIC APPARATUS AND METHODS - A system for cleaning a limited area of a top surface of a substrate table or an object positioned on a top surface of a substrate table is disclosed. The optical system used during normal imaging is adjusted to limit the cross-sectional area of a radiation beam to form a cleaning radiation beam which impinges on the limited area.12-03-2009
20090190105LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Contaminants may build up on surfaces of an immersion lithographic apparatus that come into contact with an immersion liquid from during exposure of a substrate. A solution containing a cleaning agent may be used to clean such surfaces. The cleaning properties of such a cleaning solution may be improved by activating it with ultraviolet radiation. This means that a solution of a lower concentration may be used, thereby reducing the risk of damaging the surfaces to which the cleaning solution is provided. An embodiment of the present invention allows ultraviolet radiation to be provided to surfaces being cleaned without having to take the apparatus off-line. In an embodiment, a guide member is used to transfer ultraviolet radiation from a remote radiation source to an outlet located at a position where it is desired for a cleaning operation.07-30-2009
20090002650EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus which exposes a pattern of an original onto a substrate via projection optical system in a state where a gap between the projection optical system and the substrate is filled with a liquid, comprising a liquid supply unit which supplies liquid to the gap, a front side degassing unit provided so as to perform a degassing using nitrogen gas to the liquid prior to being supplied to the gap, a dissolved gas measurement unit provided downstream side of the front side degassing unit, and a rear side degassing unit provided downstream side of the dissolved gas measurement unit, wherein the front side degassing unit has a dissolved oxygen control unit which controls supply amount of nitrogen gas so as to be the amount of dissolved oxygen, measured by the dissolved gas measurement unit, at a predetermined value.01-01-2009
20110261334Apparatus for Method for Immersion Lithography - An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.10-27-2011
20120188521CLEANING METHOD, LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, PROGRAM AND STORAGE MEDIUM - A liquid immersion member includes: a first liquid immersion member, which is disposed at least partly around an optical path, that forms a first immersion space of a first liquid at an emergent surface side of an optical member such that the optical path of exposure light between the optical member and a substrate is filled with the first liquid; and a second liquid immersion member, which is disposed at the outer side of the first liquid immersion member, that forms a second immersion space of a second liquid partly around the first immersion space and adjacent to a first guide space. A cleaning method includes: supplying a cleaning liquid such that it contacts at least part of the first liquid immersion member; and recovering at least some of the cleaning liquid from the first liquid immersion member via an opening belonging to the second liquid immersion member.07-26-2012
20100002206EXPOSURE CONDITION DETERMINATION METHOD, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based on the detection results.01-07-2010
20100007862EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus that projects a pattern of an original, onto a substrate held by a substrate stage having a top plate, to expose the substrate, comprises a cleaning unit, the cleaning unit including a discharge nozzle configured to discharge a fluid toward the top plate, and a recovery nozzle configured to recover the fluid discharged from the discharge nozzle, wherein an opening of the recovery nozzle has a shape which surrounds a path of the fluid discharged from the discharge nozzle.01-14-2010
20090153814SELF-CLEANING SCAN HEAD ASSEMBLY - A scan head assembly for use in an imaging device for scanning media that uses fluid particles from the atmosphere for cooling an optical system, cleaning existing contamination particles in the scan head assembly and preventing contamination particles from accruing in the scan head assembly. The scan head assembly is enclosed in a chamber housing having an inlet in fluid communication with the scan head assembly and atmosphere. The scan head assembly has an optical system and a cooling mechanism located adjacent to the inlet. During use, the cooling mechanism directs fluid particles from the atmosphere through the inlet across the scan head assembly to provide cooling and cleaning to the scan head assembly, including the optical system. A negative pressure system is created within the scan head assembly to prevent contamination particles from accruing in the optical system.06-18-2009
20110170079RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS - A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.07-14-2011
20110261329METHOD AND SYSTEM FOR DETERMINING A SUPPRESSION FACTOR OF A SUPPRESSION SYSTEM AND A LITHOGRAPHIC APPARATUS - The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.10-27-2011
20080284990Cleaning device, a lithographic apparatus and a lithographic cleaning method - An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.11-20-2008
20100208220Aligner and self-cleaning method for aligner - When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays are reflected by the reflecting plate, diffused, and emitted onto the surface of a condenser lens, thereby breaking down and removing contaminants that are adhered to the surface of the condenser lens. The light rays also enter the interior of the condenser lens to clean away contaminants that are adhered to locations other than a normal exposure path. When a concave mirror and/or a reflecting plate having 50% transmittance is used as the reflecting plate, the emission range of the light rays (i.e., the locations that are cleaned) can be changed.08-19-2010
20110007289DEVICE CONSTRUCTED AND ARRANGED TO GENERATE RADIATION, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A device is constructed and arranged to generate radiation by using an electrical discharge through a gaseous medium. The device includes a first electrode and a second electrode, and a liquid supply arranged to provide a liquid to a location in the device. The device is arranged to be electrically supplied with a voltage and to supply the voltage at least partially to the first electrode and the second electrode in order to allow the electrical discharge to be generated in an electrical field created by the voltage. The electrical discharge produces a radiating plasma. The device also includes a shield arranged between the discharge location and a conducting part connected to the first electrode and/or the second electrode.01-13-2011
20080266533Exposure Apparatus, Exposure Method, and Method for Producing Device - Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.10-30-2008
20080266534PHOTOMASK HAZE REDUCTION VIA VENTILATION - Where a framed pellicle is mounted on a photomask, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second apertures each communicating a first space surrounded by the photomask and the framed pellicle with a second space outside of the framed pellicle, exposing a photoresist layer formed on a substrate by flowing gas from within the first space to outside the framed pellicle through the first aperture while simultaneously exposing the photoresist layer to ultraviolet light through the pellicle membrane and the photomask.10-30-2008
20090161084Cleanup method for optics in immersion lithography - A lithographic apparatus includes a substrate table on which a substrate is held, a projection system including a final optical element, the projection system projecting a patterned beam of radiation through an immersion liquid onto the substrate adjacent the final optical element to expose the substrate during an immersion lithography process, and a liquid supply system including an inlet. The liquid supply system supplies the immersion liquid during the immersion lithography process and supplies a cleaning liquid, which is different from the immersion liquid, during a cleanup process. The cleanup process and the immersion lithography process are performed at different times.06-25-2009
20090161083Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.06-25-2009
20110149258LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.06-23-2011
20100118285EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, AND DEVICE MANUFACTURING METHOD - An exposure apparatus for exposing a substrate to radiant energy, the substrate being conveyed from a processing apparatus including a coater that coats the substrate with a photoresist and an auxiliary regulator that regulates a temperature of the substrate, the exposure apparatus comprising a measurement device configured to measure the temperature of the substrate, a main regulator configured to regulate a temperature of the substrate prior to exposure of the substrate based on an output from the measurement device, and a controller configured to determine temperature control information used to control regulation of the temperature of the substrate in the auxiliary regulator based on an output from the measurement device, and to transmit the determined temperature control information to the processing apparatus.05-13-2010
20100128235LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.05-27-2010
20090268173METHOD FOR MEASURING LIQUID IMMERSION LITHOGRAPHY SOLUBLE FRACTION IN ORGANIC FILM - A method for measuring a liquid immersion lithography soluble fraction in an organic film including a mounting step of mounting a droplet of a liquid immersion medium for liquid immersion lithography on a surface of an organic film formed on a substrate and a transfer step of transferring a component in the organic film into the droplet.10-29-2009
20100283979Exposure apparatus, exposing method, and device fabricating method - An exposure apparatus successively exposes each substrate of a plurality of substrates included in a lot with exposure light through a liquid. The exposure apparatus comprises: a movable substrate holding member that holds the substrate at a position whereto the exposure light can be radiated; and a liquid immersion member that is capable of forming an immersion space such that the liquid is held between the liquid immersion member and the substrate held by the substrate holding member and an optical path of the exposure light is filled with the liquid; wherein, before the start of exposure of a first substrate in the lot, the immersion space is formed between the liquid immersion member and a movable member, which is different from the first substrate, and at least one of the liquid immersion member and the movable member is cleaned.11-11-2010
20100118286EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate to light via an immersion liquid and includes a stage configured to hold the substrate and to be moved. The stage includes a chuck configured to hold the substrate, a support member arranged around the chuck and configured to support the immersion liquid, a recovery path configured to recover the immersion liquid having entered a gap between the substrate and the support member, and a temperature-regulating path through which the temperature-regulated liquid flows. The temperature-regulating path is connected with the recovery path.05-13-2010
20110149257LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.06-23-2011
20100085546LITHOGRAPHIC APPARATUS AND HUMIDITY MEASUREMENT SYSTEM - A humidity measurement system for use in, for example, a lithographic apparatus. The humidity measurement system includes a tunable laser diode configured to emit a measurement radiation beam having a wavelength in a wavelength range. The wavelength range includes a first wavelength associated with an absorption peak of water molecules. A signal processing unit is connected to a radiation detector. The signal processing unit is configured to measure an intensity of the measurement radiation beam of the tunable laser diode subjected to absorption. The signal processing unit is also connected to the tunable laser diode for obtaining wavelength information. The signal processing unit is arranged to detect an extreme value in a measured intensity as function of the wavelength and to calculate a humidity value from the detected extreme value.04-08-2010
20090207391EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus 08-20-2009
20090015806Environmental control apparatus, stage apparatus, exposure apparatus and device manufacturing method - An environment control apparatus comprises a first member, which has a first opening, which forms a first space and is formed at least a part and a first surface provided in the vicinity of the first opening, and a movable member, which has a second surface, which is arranged so as to cover the first opening and opposes the first surface, and is capable of relative movement with respect to the first opening while being guided by the first surface, and a gas seal mechanism is formed between the first surface and the second surface, and it is capable of setting the first space to a prescribed status.01-15-2009
20090273765IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR AN IMMERSION LITHOGRAPHY MACHINE - The present invention provides an immersion flow field maintenance system for an immersion lithography machine, the lithography machine including a projection objective lens, at least a wafer stage for supporting the wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under the projection objective lens. The immersion maintenance system includes a horizontal guideway, a flat board connected with the horizontal guideway through the cantilever, and plural drivers for driving the flat board to move. When the wafer is unloading and the wafer stage is moving out of the exposure area under the projection objective lens, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the wafer stage to above the flat board. When the wafer is loaded and the wafer stage is moving into the exposure area, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the flat board to above the wafer stage. The system of the present invention eliminates the removing and establishing processes of the flow field when the wafer stage leaves and enters the exposal position, thus saving much time and improving the throughput of the lithography machine.11-05-2009
20110199594Exposure apparatus and method for producing device - An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.08-18-2011
20110199593LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A meniscus pinning device has a plurality of openings through which liquid and gas from the environment are extracted. The openings are of an intermediate size, having a maximum cross-sectional dimension (e.g., diameter) in the range of from about 75 μm to about 150 μm.08-18-2011
20110199592LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD - A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.08-18-2011
20090046260Lithographic apparatus and thermal optical manipulator control method - A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.02-19-2009
20090279063IMMERSION LITHOGRAPHIC APPARATUS, DRYING DEVICE, IMMERSION METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.11-12-2009
20090279060FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.11-12-2009
20090279059Exposure apparatus adjusting method, exposure apparatus, and device fabricating method - An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.11-12-2009
20110170080Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method - A projection exposure apparatus that exposes a substrate with a liquid interposed between a surface of the substrate and an optical element on the substrate side of a projection optical system; includes liquid supply and discharge mechanisms, which supply the liquid via a liquid supply tube as they recover the liquid via a liquid recovery tube, and an adhesion preventing mechanism that prevents an adhesion of impurities on member forming a flow path for the liquid.07-14-2011
20090201472LIQUID IMMERSION EXPOSURE APPARATUS AND METHOD OF LIQUID IMMERSION EXPOSURE - A liquid immersion exposure apparatus has a stage on which a substrate to be processed is disposed and that moves based on a position control signal, a projection unit that projects a beam onto the substrate to be processed, a liquid supply unit that supplies liquid between the substrate to be processed and the projection unit, a liquid discharge unit that discharges the liquid held between the substrate to be processed and the projection unit, a gas ejection unit includes a first ejection unit and a second ejection unit disposed so as to surround at least a part of the projection unit and each ejecting gas onto the substrate to be processed, and a control unit that controls an amount of gas flow at the first ejection unit and an amount of the gas flow at the second ejection unit based on a moving speed of the stage while the stage is being moved.08-13-2009
20080284992EXPOSURES SYSTEM INCLUDING CHEMICAL AND PARTICULATE FILTERS CONTAINING CHEMICALLY MODIFIED CARBON NANOTUBE STRUCTURES - An exposure system for exposing a photoresist layer on a top surface of a wafer to light. The exposure system including: an environment chamber containing a light source, one or more focusing lenses, a mask holder, a slit and a wafer stage, the light source, all aligned to an optical axis, the wafer stage moveable in two different orthogonal directions orthogonal to the optical axis, the mask holder and the slit moveable in one of the two orthogonal directions; a filter in a sidewall of the environment chamber, the filter including: a filter housing containing chemically active carbon nanotubes, the chemically active carbon nanotubes comprising a chemically active layer formed on carbon nanotubes or comprising chemically reactive groups on sidewalls of the carbon nanotubes; and means for forcing air or inert gas first through the filter then into the environment chamber and then out of the environment chamber.11-20-2008
20090284718Liquid Immersion Optical Tool, Method for Cleaning Liquid Immersion Optical Tool, Liquid Immersion Exposure Method and Method for Manufacturing Semiconductor Device - There is disclosed is a liquid immersion optical tool, which comprises a light source, an optical lens system, a stage which moves an object base on which an object is to be placed, a head comprising a liquid immersion medium fluid supply device and a liquid immersion medium fluid discharge device to provide a layer of liquid immersion medium fluid between the optical lens system and the object, a fence which limits a region of the layer of liquid immersion medium fluid, and a cleaning device which cleans a portion having been contacted with the liquid immersion medium fluid by means of a cleaning solution.11-19-2009
20090273766APPARATUS AND METHOD FOR EXPOSURE AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus includes a projection optical system that projects light from an original to a substrate, and a supply device that supplies liquid containing a hydrocarbon compound to a gap between the final surface of the projection optical system and the substrate. The exposure apparatus exposes the substrate to light via the liquid filling the gap. The exposure apparatus further includes an adding device that adds water to the liquid to be supplied by the supply device.11-05-2009
20090279058EXPOSURE APPARATUS - An exposure apparatus for immersing, in liquid, a space between a final lens of a projection optical system and a plate, and for exposing the plate via the liquid includes a leak reducer for reducing or preventing a leak of the liquid from an area in which the liquid is to be filled between the final lens of the projection optical system and the plate, and a pressure maintainer provided to the leak reducer or provided closer to an optical axis of the projection optical system than the leak reducer, the pressure maintainer restraining a pressure fluctuation of gas in or near the area, wherein both a liquid recovery port for recovering the liquid from the area and a liquid supply port for supplying the liquid to the area are closer to the optical axis of the projection optical system than the leak reducer and the pressure maintainer.11-12-2009
20090262318LITHOGRAPHIC APPARATUS - An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.10-22-2009
20090262317TEST METHOD FOR DETERMINING RETICLE TRANSMISSION STABILITY - Methods, systems and apparatus for monitoring the state of a reticle by providing a reticle having a device exposure region in an imaging tool, defining one or more image fields across the device exposure region, and transmitting energy through the device exposure region. A detector detects the energy in the image field(s) at one or more testing intervals and a system control generates a transmission profile of average energy transmissions for each image field. Using this transmission profile, the state of the reticle is then determined at each testing interval followed by taking action based on the reticle state. The state of the reticle identifies whether the device exposure region has been deleteriously degraded, and as such, the reticle is no longer suitable for use. This is accomplished by determining if any average energy transmission of any image field across the reticle exceeds an allowable energy transmission threshold.10-22-2009
20090262316EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - An exposure apparatus EX includes a recovery port which recovers a liquid, a blow port which is provided outside the recovery port with respect to an optical path space and which blows a gas therefrom, and a gas discharge port which is provided between the recovery port and blow port and which discharges at least a part of the gas blown from the blow port. An exposure apparatus which makes it possible to avoid the leakage of the liquid with which the optical path space of the exposure light between a projection optical system and a substrate is filled is provided.10-22-2009
20090284716EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - In an exposure apparatus of a liquid immersion exposure method, there is a case when a wafer table holding a wafer moves, a liquid immersion area formed by liquid supplied in a space between a wafer table and a projection optical system passes over a head mounted on the wafer table. Therefore, for a head over which the liquid immersion area has passed, the residual presence of the liquid is detected based on an amount of light of a reflected light received by the light receiving element which receives the reflected light from the wafer table surface. And, of a plurality of heads, positional information of the wafer table is measured, based on measurement values of a head that had no liquid remaining in the detection.11-19-2009
20090284717EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - In an exposure apparatus of a liquid immersion exposure method, a liquid immersion area is formed on the upper surface of a wafer by liquid supplied in a space formed with a projection optical system, and on a moving table holding the wafer, a plurality of encoder heads is placed. Of the plurality of encoder heads, a controller measures positional information of the moving table within an XY plane using an encoder head which is outside a liquid immersion area. This allows a highly precise and stable measurement of positional information of the moving table.11-19-2009
20110170076IMMERSION LITHOGRAPHY APPARATUS AND METHOD FOR CLEANING IMMERSION LITHOGRAPHY APPARATUS - In one embodiment, an immersion lithography apparatus has a substrate stage that holds a workpiece and is configured to be possible to take an exposure position under a light projection unit and to keep away from the position. A cleaning stage has a reservoir of a cleaning or immersion liquid, and is configured to be possible to take the exposure position by replacing the substrate stage. An immersion liquid supply system supplies the immersion liquid between the light projection unit and the workpiece or in the reservoir, and an immersion liquid recovery system recovers the immersion liquid. A cleaning liquid supply system supplies the cleaning liquid in the reservoir to include contact regions to the immersion liquid, and a cleaning liquid recovery system recovers the cleaning liquid. A concentration measuring instrument is installed on the immersion or cleaning liquid recovery system, and measures a concentration of the cleaning liquid.07-14-2011
20110170078Projection System and Lithographic Apparatus - A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (07-14-2011
20110170077LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.07-14-2011
20090296056SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.12-03-2009
20110205506Stress-decoupling devices and methods for cooled mirror systems - A stress-decoupling device and methods of using same in a cooled grazing-incidence collector (GIC) mirror system are disclosed. A method includes providing a cooled GIC shell, providing input and output primary cooling-fluid manifolds, and fluidly connecting the cooled GIC shell to the input and output primary cooling-fluid manifolds through respective stress-decoupling devices. An exemplary stress-decoupling device includes inner and outer bellows that define a sealed cavity filled with a gas. An expansion-limiting member within the sealed cavity limits the expansion of the inner bellows due to the pressure of the cooling fluid flowing therethrough. The stress-decoupling device reduces or prevents the communication of stress from parts of the GIC mirror system to the GIC shells. Stress-decoupling systems and methods for a cooled spider as used in a GIC mirror system are also disclosed.08-25-2011
20090168033MANUFACTURING METHOD OF PATTERN FORMED BODY AND PATTERN FORMED BODY MANUFACTURING APPARATUS - A main object of the invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a target pattern form with high precision; and a pattern formed body manufacturing apparatus used in the manufacturing method. To achieve the object, the invention provides a manufacturing method of a plurality of pattern formed bodies comprising a pattern forming step and a foreign matter removing step, wherein the pattern forming step is a step of radiating vacuum-ultraviolet light through a photomask to a pattern forming substrate, varying a surface property by the vacuum-ultraviolet light, and forming a property varied pattern with the property varied on a surface of the pattern forming substrate to form a pattern formed body; the pattern forming step is repeated plural times to manufacture a plurality of the pattern formed bodies; and the foreign matter removing step is a step of removing a foreign matter deposited to the photomask performed between the repeated pattern forming steps.07-02-2009
20080212052OPTICAL ARRANGEMENT AND PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH PASSIVE THERMAL COMPENSATION - An optical arrangement with a light source includes an optical element that is fastened in a mount. The light source emits radiation and the optical element is acted on thereby such that the heat that results lacks symmetry corresponding to the shape of the optical element. A connecting structure is provided between the optical element and the mount and has a symmetry that does not correspond to the shape of the optical element and effects an at least partial homogenization of the temperature distribution in the optical element.09-04-2008
20080212051Lithographic apparatus and device manufacturing method - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.09-04-2008
20080212050Apparatus and methods for removing immersion liquid from substrates using temperature gradient - Apparatus and methods assist in the removal of immersion liquid from a surface of a substrate. In particular, the apparatus/method removes immersion liquid from a surface of a substrate that has been subjected to immersion lithographic exposure. A temperature control unit controls a temperature of the substrate to create a temperature gradient across at least a portion of the surface of the substrate such that a first portion of the surface of the substrate has a first temperature that is higher than a second temperature of a second portion of the surface of the substrate. The temperature gradient induces the immersion liquid remaining on the substrate to move from the higher temperature portion(s) toward the lower temperature portion(s).09-04-2008
20080212049SUBSTRATE PROCESSING APPARATUS WITH HIGH THROUGHPUT DEVELOPMENT UNITS - A substrate processing apparatus is arranged adjacent to an exposure device and includes a processing section, a transfer section configured to carry the substrate into and out of the processing section, and an interface configured to receive and transfer the substrate between the processing section and the exposure device. The processing section includes a first processing unit having a photosensitive film formation region, a thermal processing region having a first thermal processing unit, and a first transport region having a first transport unit. The photosensitive film formation region is arranged opposite the thermal processing region with the first transport region interposed therebetween. The processing section also includes a second processing unit having a first development region, a second development region, and a second transport region having a second transport unit. The first development region is arranged opposite to the second development region with the second transport region interposed therebetween.09-04-2008
20080212044Debris Mitigation System with Improved Gas Distribution - The present invention relates to a debris mitigation system, in particular for use in a radiation unit for EUV radiation and/or X-rays. The debris mitigation system comprises a foil trap (09-04-2008
20080212048SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM - A substrate processing method and a substrate processing system exclude wafers W provided with a protective film having surface defects that will cause components of a resist to dissolve in an immersion liquid during an immersion exposure process, and rated abnormal from those to be processed by the immersion exposure process. The substrate processing system is provided with a protective film forming module for forming a protective film on a resist film formed on a surface of a wafer W, an exposure system 09-04-2008
20080212047Exposure apparatus, exposing method, and device fabricating method - An exposure apparatus comprises: a first optical member for acquiring positional information about the substrate through a first liquid that is for measurement; a second optical member that emits the exposure beam; a first movable member that holds the substrate and is capable of moving within a prescribed area that includes a first position, which opposes the first optical member, and a second position, which opposes the second optical member; and a first liquid holding member that can be positioned at the first position; wherein, by disposing at least one of the first movable member and the first liquid holding member at the first position, a first space, which is capable of holding the first liquid, continues to be formed between the first optical member and at least one of the first movable member, the substrate, which is held by the first movable member, and the first liquid holding member.09-04-2008
20080212043Exposure Apparatus, Exposure Method, And Method For Producing Device - An exposure apparatus fills an optical path space of an exposure light beam with a liquid, and exposes a substrate by irradiating the substrate with the exposure light beam via a projection optical system and the liquid. A first optical element of the projection optical system is provided with a removing device for removing foreign matters in a space inside of the concave surface portion. Immersion exposure is performed by permitting the exposure light beam to excellently reach an image plane via the projection optical system and the liquid.09-04-2008
20120293780CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH INTERMEDIATE CHAMBER - A charged particle lithography system for transferring a pattern onto the surface of a target, comprising a main vacuum chamber, a source chamber and an intermediate chamber, both located in the main vacuum chamber, a beam generator for generating a charged particle beam, the beam generator located in the source chamber, and a first aperture array element for generating a plurality of charged particle beamlets from the beam, the first aperture array element located in the intermediate chamber. The system is adapted for maintaining a first pressure in the main vacuum chamber, a second pressure in the intermediate chamber, and a third pressure in the source chamber, and wherein the first pressure is lower than an ambient pressure, the second pressure is lower than the first pressure, and the third pressure is lower than the second pressure.11-22-2012
20120293781EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus which includes a projection optical system and exposes a substrate to radiant energy via the projection optical system, includes a temperature measuring device configured to perform measurement of a temperature of a temperature measurement portion of the projection optical system, and a controller configured to perform prediction of a change in an optical characteristic of the projection optical system based on a change in temperature measured by the temperature measuring device, and to perform processing of reduction, based on the prediction, of a change in a state of an image formed on the substrate by the projection optical system, wherein the controller is configured to perform the prediction in accordance with a second-order lag response function to the change in temperature of the temperature measurement portion.11-22-2012
20100103391FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.04-29-2010
20100103392Immersion exposure device cleaning method, dummy wafer, and immersion exposure device - The immersion exposure device cleaning method according to the invention includes: placing a dummy wafer onto a stage of the immersion exposure device; and moving the stage while maintaining an immersion solution between the dummy wafer and a projector lens. The dummy wafer includes a substrate and an adsorption area that is formed on the substrate and has higher adsorption power for particles suspended in the supplied immersion solution than the substrate has for the particles.04-29-2010
20100103390LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus arranged to project a pattern from a patterning device onto a substrate. The apparatus is provided with a clamp, including a support part configured to support the patterning device or the substrate and a temperature control part configured to control the temperature of the patterning device or the substrate. The clamp is constructed to mechanically isolate the temperature control part from the support part with a flexible connector so that vibrations, shrink and expansion of the temperature control part will not influence the patterning device and/or the substrate.04-29-2010
20110222034LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS CLEANING METHOD - An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves to clean a surface of an immersion lithographic projection apparatus are disclosed.09-15-2011
20100157260LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.06-24-2010
20080239259HEAT TREATMENT APPARATUS AND METHODS FOR THERMALLY PROCESSING A SUBSTRATE USING A PRESSURIZED GASEOUS ENVIRONMENT - Apparatus and methods for heating a substrate in a pressurized environment inside of a thermal processing system. The substrate is placed in a gaseous environment inside a processing chamber of the thermal processing system. The substrate is supported in the gaseous environment. The gas pressure inside the processing chamber is increased above atmospheric pressure, which increases the temperature of the gaseous environment. Heat is transferred from the pressurized gaseous environment to the substrate for thermally processing a layer on the substrate.10-02-2008
20080239261Run-off path to collect liquid for an immersion lithography apparatus - An exposure apparatus for transferring an image to a device includes an optical assembly, an immersion fluid system, and a device stage assembly. The optical assembly is positioned so that there is a gap above the device. The immersion fluid system fills the gap with an immersion fluid. The device stage assembly includes a sloped region that facilitates movement of the immersion fluid that exits the gap away from the device. The device stage assembly can include a collection region and a recovery system that recovers immersion fluid from the collection region.10-02-2008
20080239260EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR10-02-2008
20110199591EXPOSURE APPARATUS, EXPOSING METHOD, MAINTENANCE METHOD AND DEVICE FABRICATING METHOD - An exposure apparatus exposes a substrate with exposure light, which transits a first liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a liquid immersion member, which at least partly surrounds an optical path of the exposure light emerging from the emergent surface, has a lower surface that the substrate opposes during an exposure of the substrate, and holds the first liquid between the substrate and at least part of the lower surface; and a plate member, which has a first surface and a second surface that faces the opposite direction to the first surface and which is capable of moving to a position at which it opposes the lower surface; wherein, cleaning is performed in a state wherein the first surface opposes the lower surface.08-18-2011
20090033891Lithographic apparatus and device manufacturing method - An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.02-05-2009
20090168032Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed.07-02-2009
20080273182Lithographic apparatus and device manufacturing method - A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.11-06-2008
20080273181Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method - An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.11-06-2008
20080278697Lithographic apparatus and device manufacturing method - A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.11-13-2008
20080278695Exposing method, exposure apparatus, and device fabricating method - An exposure apparatus comprises: a first detection apparatus, which detects the temperature of a liquid after the liquid contacts a prescribed object; and a processing apparatus that detects the relationship between the temperature of the liquid and the temperature of the object based on the detection result of the first detection apparatus.11-13-2008
20080291410Exposure apparatus and method for manufacturing device - An immersion exposure apparatus includes an optical member, a supply outlet that supplies a liquid to a space between an upper surface of the optical member and a movable object, and an annular member at least a portion of which is arranged around the optical member, the space between the upper surface of the optical member and the object being filled with the liquid.11-27-2008
20080291406Assembly comprising a radiation source, a reflector and a contaminant barrier - An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.11-27-2008
20080291407Lithographic apparatus and device manufacturing method - A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.11-27-2008
20080304025APPARATUS AND METHOD FOR IMMERSION LITHOGRAPHY - An immersion lithography apparatus includes a lens assembly having an imaging lens, a wafer stage for securing a wafer beneath the lens assembly, a fluid module for providing a fluid into a space between the lens assembly and the wafer, and a plurality of extraction units positioned proximate to an edge of the wafer. The extraction units are configured to operate independently to remove a portion of the fluid provided into the space between the lens assembly and the wafer.12-11-2008
20080304026IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion exposure apparatus includes a projection optical system, a first supply unit, and a second supply unit. The projection optical system projects exposure light from an original onto a substrate. The first supply unit forms a first liquid film in a space formed between the projection optical system and the substrate by supplying first liquid. The space includes a light path of the exposure light. The second supply unit forms a second liquid film around the first liquid film by supplying second liquid that is different from the first liquid.12-11-2008
20080304028Lithographic apparatus and radiation system - A lithographic apparatus includes a radiation system configured to form a projection beam of radiation. The radiation system includes a radiation source that emits radiation, a filter system for filtering debris particles out of the radiation beam, and an illumination system configured to condition a radiation beam. A projection system is configured to project the projection beam of radiation onto a substrate. The filter system includes a plurality of foils for trapping the debris particles. At least one foil includes at least two parts that have a mutually different orientation and that are connected to each other along a substantially straight connection line. Each of the two parts substantially coincide with a virtual plane that extends through a predetermined position that substantially coincides with the radiation source. The straight connection substantially line coincides with a virtual straight line that also extends through the predetermined position.12-11-2008
20080309895Dynamic fluid control system for immersion lithography - An apparatus includes a stage that supports a substrate, an optical system having a last optical element, that projects an image onto the substrate that is positioned spaced apart from the last optical element by a gap at least partly filled with an immersion liquid, and a pressure control system having an actuator, that controls pressure of the immersion liquid in the gap using the actuator.12-18-2008
20080309894MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.12-18-2008
20080309893Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device - A contamination prevention system is constructed and arranged to prevent material from propagating with radiation into a lithographic apparatus. The contamination prevention system includes a rotatable carrier provided with a plurality of generally radially outwardly extending blades. The blades are constructed and arranged to absorb or deflect the material. The system also includes a stationary shaft, and a bearing constructed and arranged to rotate the rotatable carrier and the blades around the shaft. The rotatable carrier is provided with a space for at least partially receiving a portion of the shaft.12-18-2008
20080309891APPARATUS AND METHOD FOR IMMERSION LITHOGRAPHY - Immersion lithography apparatus and method using a shield module are provided. An immersion lithography apparatus including a lens module having an imaging lens, a substrate table positioned beneath the lens module and configured for holding a substrate for processing, a fluid module for providing an immersion fluid to a space between the lens module and the substrate on the substrate table, and a shield module for covering an edge of the substrate during processing.12-18-2008
20080273180Lithographic apparatus - A projection system suitable for use in a lithographic apparatus, the projection system including a transmissive optical element and a thermal profile corrector configured to change a thermal profile of the transmissive optical element, the thermal profile corrector including a transfer member and a thermal profile conditioner, the transfer member being moveable into and out of proximity with the transmissive optical element to transfer a desired thermal profile from the thermal profile conditioner into the transmissive optical element.11-06-2008
20080278696Lithographic apparatus - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.11-13-2008
20080212042Circuit Breaker Arrangement in an Indicating Arrangement in an Electrically Powered Stapler - A linear motor with high heat recovery efficiency that inhibits the rise in surface temperature is offered. The linear motor is disposed in a surrounding member (09-04-2008
20080291409IMMERSION EXPOSURE TECHNIQUE - It is an object of this invention to provide an exposure technique which uses immersion method and is highly practical. For example, an exposure apparatus includes a substrate stage which holds and moves a substrate, and a supply unit which has a supply nozzle and supplies a liquid to the surface of the substrate. The opening of the supply nozzle is arranged at a side of a projection optical system so as to oppose the substrate, and the supply unit supplies the liquid in accordance with movement of the substrate by the substrate stage.11-27-2008
20100321650LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.12-23-2010
20080204680PURGE SYSTEM FOR A SUBSTRATE CONTAINER - A purging station with a substrate container receiving zone having at least one upwardly extending purging nozzle. The nozzle has a circular engaging lip. The substrate container has support means for at least one substrate and a purge port assembly that includes an externally facing sealing flange facing downward from the container. The sealing flange has a central aperture and a cantilevered flange portion that engages with the circular engaging lip of the nozzle. The weight of the substrate container on the nozzle carried by the canilevered portion of the flange causes bending of the flange for a resilient soft seal.08-28-2008
20100265477SEMICONDUCTOR MANUFACTURING APPARATUS AND PATTERN FORMATION METHOD - In a pattern formation method employing immersion lithography, after a resist film is formed on a wafer, pattern exposure is performed by selectively irradiating the resist film with exposing light with a liquid including an unsaturated aliphatic acid, such as sunflower oil or olive oil including oleic acid, provided on the resist film. After the pattern exposure, the resist film is developed so as to form a resist pattern made of the resist film.10-21-2010
20100265476LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.10-21-2010
20080239257Stage Apparatus and Exposure Apparatus - A stage apparatus which can highly accurately measure the position of a stage, while achieving a high throughput, and an exposure apparatus provided with the stage apparatus. A stage apparatus is provided with: air-conditioning apparatuses (10-02-2008
20080284994REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY - A method for reducing contamination in immersion lithography includes retaining a semiconductor wafer on a support surface of a wafer chuck, the wafer chuck having a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein; and providing a fluid circulation path within the wafer chuck so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.11-20-2008
20080284995Lithographic apparatus and substrate edge seal - A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.11-20-2008
20080284993REDUCING CONTAMINATION IN IMMERSION LITHOGRAPHY - A wafer chuck assembly includes a first chuck section configured to hold a semiconductor wafer on a support surface thereof, and a second chuck section removably attached to the first chuck section. The first chuck section has a gap therein, the gap located adjacent an outer edge of the wafer, and the gap containing a volume of immersion lithography fluid therein. A fluid circulation path is configured within the first chuck section so as to facilitate the radial outward movement of the immersion lithography fluid in the gap, thereby maintaining a meniscus of the immersion lithography fluid at a selected height with respect to a top surface of the semiconductor wafer.11-20-2008
20080284991Exposure apparatus, immersion system, exposing method, and device fabricating method - An exposure apparatus exposes a substrate with exposure light through a liquid. The exposure apparatus comprises: a liquid immersion member, which has a liquid contact surface that includes a liquid recovery area; and a porous member, which are disposed at a first side of the liquid contact surface; wherein, the liquid on an object, which is disposed at the first side of the liquid contact surface, is recovered from the liquid recovery area.11-20-2008
20110007288HEAT TRANSFER ASSEMBLY, LITHOGRAPHIC APPARATUS AND MANUFACTURING METHOD - A lithographic apparatus includes a heat transfer assembly configured to temperature control at least a portion of the lithographic apparatus. The heat transfer assembly includes a printed circuit board, and a plurality of heat transfer elements. The printed circuit board and the plurality of heat transfer elements are configured to be attached to the portion of the lithographic apparatus. The plurality of heat transfer elements are separate from and are electrically coupled to the printed circuit board.01-13-2011
20110007285LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.01-13-2011
20120092631GAS MANIFOLD, MODULE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.04-19-2012
20090190106IMMERSION LITHOGRAPHY APPARATUS - An immersion lithographic apparatus is disclosed having a projection system, a liquid supply system, and a recycling system. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, wherein a substrate table is configured to support the substrate. The liquid supply system is configured to provide an immersion liquid to a space between the projection system and the substrate or the substrate table. The recycling system is configured to collect the immersion liquid from the liquid supply system and to supply the immersion liquid to the liquid supply system. The recycling system includes a fiber configured to remove organic contaminants from the immersion liquid.07-30-2009
20100271605Side Seal for Wet Lens Elements - A method for protecting a wet lens element from liquid degradation is provided. The method includes applying a thin coating of an organoxy-metallic compound to the side portions of a wet lens element to leave behind an optically inert, light absorbing metal oxide film. A liquid shield coating is applied on top of the metal oxide coating. The two coating layers protect the wet lens element from liquid degradation when the side portion of the wet lens element is submerged into a liquid. In an embodiment, the wet lens element is an immersion lithography wet lens element and the liquid is an immersion lithography liquid.10-28-2010
20090153813Exposure Method, Exposure Apparatus and Method for Fabricating Device - An exposure condition is determined in accordance with a moving condition of a substrate (P) relative to a projection optical system so that a pattern image is projected on the substrate (P) in a desired projection state, and the substrate (P) is exposed in the determined exposure condition.06-18-2009
20100141910MEMBER WITH A CLEANING SURFACE AND A METHOD OF REMOVING CONTAMINATION - A member with a cleaning surface for use in capturing particles in a lithographic apparatus is disclosed. The particles are captured by a plurality of projections which are arranged in a pattern. A sensor can be used to detect contaminant particles in the pattern.06-10-2010
20100141912EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.06-10-2010
20090128787SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pair of leakage preventing portions are disposed opposite to each other across the nozzle head. Each of the leakage preventing portions has an opening via which the solvent vapor discharged out of the discharge opening can be sucked, or a solvent vapor blocking gas can be discharged selectively. A solvent vapor supply source and a gas supply source are switchably connected to the supply opening of the nozzle head via a first switching valve. An exhaust pump and a solvent-vapor-blocking gas supply source are switchably connected to the openings of the leakage preventing portions via a second switching valve.05-21-2009
20090185149IMMERSION LITHOGRAPHIC APPARATUS WITH IMMERSION FLUID RE-CIRCULATING SYSTEM - A lithographic apparatus includes a projection system, a fluid handling structure, a metrology device, and a recycling control device. The projection system is configured to project a patterned radiation beam onto a target portion of a substrate, the substrate being supported on a substrate table. The fluid handling structure is configured to provide an immersion fluid to a space between the projection system and the substrate and/or substrate table. The metrology device is configured to monitor a parameter of the immersion fluid. The recycling control device regulates a routing of the immersion fluid either to be reused by the fluid handling structure or to be reconditioned based on the quality of immersion fluid indicated by the metrology device.07-23-2009
20090027638Lithographic appararus and method - A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.01-29-2009
20090027637Debris prevention system and lithographic apparatus - A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.01-29-2009
20090027636Lithographic Apparatus, Reflective Member And A Method of Irradiating The Underside Of A Liquid Supply System - A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system for use in cleaning.01-29-2009
20090027635Lithographic Apparatus and Contamination Removal or Prevention Method - An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).01-29-2009
20090284715LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.11-19-2009
20120069309FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid.03-22-2012
20090015807Exposure apparatus and device manufacturing method - An immersion lithographic system for patterning a work piece arranged at an image plane and covered at least partly with a layer sensitive to electromagnetic radiation, includes: a source emitting electromagnetic radiation onto an object plane; a mask arranged at the object plane to relay the electromagnetic radiation toward the work piece; and an immersion medium contacting at least a portion of an immersion optics of the lithographic system and a portion of the work piece. The immersion medium is supplied through at least one orifice arranged in the immersion optics.01-15-2009
20080316441Lithographic apparatus having parts with a coated film adhered thereto - A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.12-25-2008
20090251673TRANSMITTING OPTICAL ELEMENT WITH LOW FOREIGN-ELEMENT CONTAMINATION - A transmitting optical element of polycrystalline material that includes crystallites of magnesium spinel MgAl10-08-2009
20090015804Cleaning device and a lithographic apparatus cleaning method - A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.01-15-2009
20090015808Exposure method, substrate stage, exposure apparatus, and device manufacturing method - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.01-15-2009
20090015805Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method - A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.01-15-2009
20110222036LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.09-15-2011
20110222032LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.09-15-2011
20130215403EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus and method exposes a substrate via a projection optical system and liquid. A liquid immersion member having a lower surface and a recovery port at its lower surface side supplies liquid to form a liquid immersion region below the projection optical system and recovers the liquid via the recovery port. First and second tables, on which a substrate is mountable, are positionable opposite to the lower surface of the liquid immersion member. A drive system moves the first and second tables below the projection optical system relative to the liquid immersion member to replace one of the tables positioned opposite to the lower surface of the liquid immersion member with the other of the tables, whereby the liquid immersion region is transferred from the one to the other of the tables while the liquid immersion region is maintained below and in contact with the projection optical system.08-22-2013
20090086175METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS - A method of operating a fluid confinement system of an immersion lithographic apparatus is disclosed. The performance of the liquid confinement system is measured in several different ways. On the basis of the result of the measurement of performance, a signal indicating, for example, that a remedial action may need to be taken is generated.04-02-2009
20090051888Liquid jet and recovery system for immersion lithography - A liquid immersion lithography apparatus includes a projection system having a last element. The projection system projects an image onto a workpiece to expose the workpiece through a liquid filled in a space between the last element and the workpiece. A liquid supply device includes a supply inlet that supplies the liquid from the supply inlet to the space between the workpiece and the last element during the exposure. The last element includes an optical element and a plate. The plate prevents the degradation of the optical element that may be affected by contact with the liquid.02-26-2009
20090079949Lithographic apparatus and device manufacturing method - In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.03-26-2009
20110228240Stage apparatus and exposure apparatus - A stage apparatus includes: a moving stage, which moves along a movement plane; a first moving table, which holds a specimen while being able to move with respect to the moving stage; and a second moving table, which is provided on the moving stage and, when the first moving table has moved from a first position to a second position, is positioned at the first position.09-22-2011
20120069310SEMICONDUCTOR MICROLITHOGRAPHY PROJECTION EXPOSURE APPARATUS - The disclosure relates to an optical correction arrangement including at least one optical element and at least one irradiation mechanism for the targeted local irradiation of the optical element with electromagnetic heating radiation for the targeted local heating of the optical element. The optical correction arrangement also includes a mechanism for dissipating the thermal energy introduced into the optical element by the at least one irradiation mechanism. The disclosure furthermore relates to a projection exposure apparatus for semiconductor lithography including an optical correction arrangement according to the disclosure.03-22-2012
20110222033LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.09-15-2011
20090231560Immersion lithography apparatus and method having movable liquid diverter between immersion liquid confinement member and substrate - An immersion lithography apparatus includes a projection system having a final optical element and a stage that is movable to a position below the projection system such that a gap exists between the final optical element and a surface of the stage. An immersion liquid fills the gap between the surface and the final optical element. A liquid confinement member maintains the immersion liquid in the gap. The immersion liquid has a meniscus where the liquid contacts ambient gas, the meniscus defining a footprint of an immersion area. A movable liquid diverter is positioned between the liquid confinement member and the stage. The movable liquid diverter moves relative to the liquid confinement member in a direction parallel to the surface of the stage, and includes an opening that surrounds the immersion area, the opening contacting or being slightly spaced from the immersion area when the stage is stationary.09-17-2009
20110228238LITHOGRAPHIC APPARATUS, COVER FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD FOR DESIGNING A COVER FOR USE IN A LITHOGRAPHIC APPARATUS - A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.09-22-2011
20090213344Lithographic Apparatus with Temperature Sensor and Device Manufacturing Method - In an embodiment, a lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus includes an air shower and a temperature sensor positioned near the air shower for measuring the temperature of an air stream in the air shower. The temperature sensor is a thermocouple sensor, e.g., of a thermopile arrangement type. The thermocouple sensor includes a plurality of thermocouples in series, wherein a cold junction and a hot junction are provided, the cold junction being connected to a heat sink, and the hot junction being positioned into the air stream of the air shower.08-27-2009
20090002649IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion exposure apparatus which exposes a substrate through a liquid includes an illumination optical system, a projection optical system, a chuck, a liquid support plate, a stage, and a liquid repellency recovery unit. The illumination optical system illuminates an original with exposure light from exposure light sources. The projection optical system projects a pattern of the original onto the substrate. The chuck holds the substrate. The liquid support plate supports a liquid together with the substrate held by the chuck. A surface of the liquid support plate includes a surface of a metal oxide. The stage is provided with a chuck and the liquid support plate and is movable. The liquid repellency recovery unit is configured to recover the liquid repellency of the surface of the metal oxide with regard to the liquid.01-01-2009
20090103064Maintenance method, exposure method and apparatus and device manufacturing method - There is provided a maintenance method capable of efficiently maintaining an exposure apparatus performing exposure by the liquid immersion method. The method for maintaining the exposure apparatus which exposes a substrate with an exposure light via a projection optical system and a liquid of an liquid immersion area includes: a moving step of arranging a measuring table to be opposite to a nozzle member forming the liquid immersion area; an accumulating step of supplying the liquid onto the measuring table by using the nozzle member, and accumulating the supplied liquid in a cylinder portion; and a cleaning step of jetting the liquid accumulated in the accumulating step from a jet nozzle portion to an area including at least a part of a liquid contact portion, which has a possibility of coming into contact with the liquid, during liquid immersion exposure.04-23-2009
20090103063COOLING APPARATUS FOR OPTICAL MEMBER, BARREL, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An optical member cooling apparatus for cooling an optical member such as a mirror. The optical member cooling apparatus includes a cooling member fixed to the rear surface of the mirror by an engagement mechanisms. The rear surface of the mirror and the contact surface of the cooling mirror have a high flatness. A locking portion including a groove and an extended portion is formed in the rear surface of the mirror. A shaft of the engagement mechanism is hooked to the extended portion of the locking portion. The engagement member is urged toward the cooling member by a spring.04-23-2009
20090103062LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.04-23-2009
20090244503Exposure apparatus, device manufacturing method, maintenance method, and exposure method - An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring device which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped.10-01-2009
20090244502Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask - Embodiments relate to compensating for lens heating, lithographic projection system and photo mask. Accordingly, lens heating is compensated by providing a layout pattern including a regular pattern being arranged substantially symmetrical in a first region and a sub-resolution pattern including a plurality of sub-resolution structural elements, wherein the sub-resolution pattern in a second region, so as to minimize non-homogenous lens heating of a projection apparatus in case of a lithographic projection.10-01-2009
20090244501APPARATUS FOR REAL-TIME CONTAMINATION, ENVIRONMENTAL, OR PHYSICAL MONITORING OF A PHOTOMASK - An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photomask. The sensor is configured to monitor an attribute related to the photomask. Attributes monitored by the sensor may include chemical contamination, temperature changes, humidity changes, acceleration, shock, vibration, optical flux through the photomask, electrostatic discharge environment of the photomask, particulates, and pressure.10-01-2009
20090213342PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY - The invention relates to a projection exposure apparatus with a projection objective that serves to project a structure onto a substrate coated with a light-sensitive resist, wherein an immersion liquid is arranged between an optical element of the projection objective and the resist-coated substrate. As an immersion liquid saturated cyclic or polycyclic hydrocarbons can be used, such as for example cyclo-alkanes comprising up to 12 carbon atoms, saturated polycyclic hydrocarbons with 2 to 6 rings, bridged polycyclic hydrocarbons, cyclic ethers and derivatives of these substances.08-27-2009
20130182232EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.07-18-2013
20090251672Exposure apparatus, device production method, cleaning apparatus, cleaning method, and exposure method - An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination.10-08-2009
20090207392LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is configured to transfer a pattern from a patterning structure, held by a patterning structure holder, onto a substrate that is held by a substrate holder. The apparatus includes a first object holder configured to hold an object, and an object temperature conditioner configured to condition a temperature of the object prior to and/or during transfer of the object to the first object holder. The object temperature conditioner includes a second object holder having a fluid duct system and an electrical temperature conditioner.08-20-2009
20120170007EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING A DEVICE - The present invention provides an exposure apparatus including a projection optical system, and configured to expose a substrate to light via the projection optical system and a liquid, the apparatus including a plurality of recovery ports configured to recover the liquid supplied between the projection optical system and the substrate, a chamber connected to the plurality of recovery ports, and a pump configured to attract the liquid via the plurality of recovery ports and the chamber, wherein the plurality of recovery ports are discretely arranged between vertices on each side of a polygon and at each of vertices of the polygon, and a pressure difference between the pump and each of the recovery ports positioned at the vertices among the plurality of recovery ports is less than a pressure difference between the pump and each of the recovery ports positioned between the vertices among the plurality of recovery ports.07-05-2012
20120194790LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.08-02-2012
20080259296Lithographic apparatus and device manufacturing method - In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.10-23-2008
20080259295Lithographic apparatus and device manufacturing method - An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.10-23-2008
20080259291Pellicle, lithographic apparatus and device manufacturing method - A pellicle for integrated circuit equipment operating in an EUV range includes a multi-layered structure of alternating layers. The pellicle is constructed and arranged to reflect or absorb undesired radiation and to intercept debris to enhance the spectral purity of a radiation beam.10-23-2008
20090257032OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.10-15-2009
20090316119Apparatus and method for conditioning an immersion fluid - The present invention includes apparatus and methods for producing a conditioned immersion fluid for use in an immersion lithography process. The conditioned immersion fluid protects the immersion system lens and reduces or eliminates deposition of contaminants onto the lens that can adversely affect the lens transmission and durability of an immersion lithography system.12-24-2009
20090316122LITHOGRAPHIC APPARATUS - A substrate stage for an immersion type lithographic apparatus is arranged to project a patterned radiation beam from a patterning device onto a substrate, the substrate stage being constructed to hold the substrate and including at least a sensor for sensing the patterned radiation beam, the sensor including an at least partially transmissive layer having a front side facing the incoming radiation beam and a back side opposite the front side, wherein the back side is provided with at least a sensor mark to be subjected to the radiation beam transmitted through the layer.12-24-2009
20090316120Exposure apparatus, cleaning method, and device fabricating method - An exposure apparatus exposes a substrate with exposure light that passes through an exposure liquid. The exposure apparatus comprises: an optical member, which has an emergent surface wherefrom the exposure light emerges; a first supply port, which supplies the exposure liquid; a liquid immersion member, which is capable of forming an immersion space so that an optical path of the exposure light that emerges from the optical member is filled with the exposure liquid; a second supply port, which supplies a cleaning liquid so that it contacts the liquid immersion member; and a preventive apparatus, which prevents the cleaning liquid and the optical member from contacting one another.12-24-2009
20100271602PROTECTIVE APPARATUS, MASK, MASK FORMING APPARATUS, MASK FORMING METHOD, EXPOSURE APPARATUS, DEVICE FABRICATING METHOD, AND FOREIGN MATTER DETECTING APPARATUS - A protective apparatus protects a predetermined area on a surface of a substrate. The protective apparatus includes: a frame portion that includes a pair of flexible portions which are disposed along a first direction and oppose each other, and is connected to the surface of the substrate to surround the predetermined area; and a thin film portion that is stretched across the frame portion to oppose the predetermined area and closes an opening portion formed by the frame portion. An end surface of the flexible portion on the thin film portion side has a curved shape which is concave toward a connecting portion with the substrate.10-28-2010
20100165309Deformation measuring apparatus, exposure apparatus, jig for the deformation measuring apparatus, position measuring method and device fabricating method - A piezoelectric device is provided at a base member. Regulating apparatus is provided that regulate, of deformations transmitted via the base member to the piezoelectric device, the transmission of a deformation in second directions, which intersect first directions.07-01-2010
20100149500PROJECTION LENS FOR MICROLITHOGRAPHY AND CORRESPONDING TERMINAL ELEMENT - The invention relates to a projection lens (06-17-2010
20100157259AUTOMATIC DUST-REMOVING FILMSCANNER - An automatic dust-removing filmscanner comprises a scanner body, a film holder and a dust-removing element. The scanner body has a film-scanning platform and an image-capture module thereinside and has a slot on the surface thereof. The dust-removing element is installed in the film holder. When the film holder is inserted into the slot to locate the film over the film-scanning platform and enable the image-capture module to retrieve the image data recorded on the films, the dust-removing elements on the film holder simultaneously cleans the film-scanning platform. Therefore, the automatic dust-removing filmscanner not only retrieves image data but also automatically cleans the film-scanning platform at the same time without dismantling the scanner body to maintain the scanning quality.06-24-2010
20100157261Substrate Treating Apparatus - A photolithography process facility comprising a substrate treating apparatus, the substrate treating apparatus includes a temperature control plate controlling a temperature a substrate, a central supporter having a pin shape vertically penetrating the temperature control plate and supporting a central region of substrate, and a collision preventer preventing a collision between the substrate and the temperature control plate.06-24-2010
20100157262Exposure apparatus and device manufacturing method - An exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid; a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the supply pipe flows to the recovery pipe via the connection pipe. The apparatus may further include a temperature regulation apparatus connected to the supply pipe, which performs temperature regulation of the liquid supplied to the supply pipe, and has a rough temperature regulator which roughly regulates the temperature of the liquid, and a fine temperature regulator which is arranged between the rough temperature regulator and the supply pipe and performs fine regulation of this temperature.06-24-2010
20110128514Optical element and projection exposure apparatus based on use of the optical element - A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system and includes a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid. An element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid.06-02-2011
20100259735FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.10-14-2010
20100014060LITHOGRAPHIC APPARATUS, A METROLOGY APPARATUS AND A METHOD OF USING THE APPARATUS - A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.01-21-2010
20100182576LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.07-22-2010
20100259733Apparatus comprising a rotating contaminant trap - A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).10-14-2010
20100214544FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling device for an immersion lithographic apparatus, the fluid handling device comprising: at least one body with a surface facing a space for fluid; a plurality of openings for the flow of fluid therethrough defined in the surface; at least one barrier moveable relative to the plurality of openings for selectively allowing or preventing the flow of fluid through selected openings of the plurality of openings.08-26-2010
20100020296LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and, an actuator arranged to exert a force on an object, wherein the apparatus includes a thermal expansion error compensator configured to avoid an error caused by thermal expansion of the object by any heat dissipated by the actuator or another heat source.01-28-2010
20100177289Immersion Fluid for Immersion Lithography, and Method of Performing Immersion Lithography - An immersion lithographic system 07-15-2010
20110058148LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.03-10-2011
20110058147CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE - A cleaning module for an EUV lithography device with a supply (03-10-2011
20100208221FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD - A fluid supply system for a lithographic apparatus, includes a controller configured to vary fluid flow rate to a first component from a fluid source while maintaining total flow resistance to fluid downstream of the fluid source substantially constant.08-19-2010
20100141911EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus, exposing a substrate via liquid so as to transfer a pattern of a mask onto the substrate, includes a stage configured to move while holding the substrate. The stage includes a substrate supporting portion on which the substrate is disposed, a supporting surface disposed outside the substrate supporting portion configured to support the liquid together with the substrate, and a frame portion formed so as to surround the supporting surface. The frame portion includes a depression and a member whose top surface is located in a plane including the supporting surface.06-10-2010
20100141909RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS - A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.06-10-2010
20120140192LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.06-07-2012
20100060870LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiO03-11-2010
20100060868FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD - A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.03-11-2010
20090279061LITHOGRAPHIC APPARATUS AND METHOD - A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.11-12-2009
20090115978METHOD FOR TREATING SUBSTRATE, METHOD FOR CONVEYING SUBSTRATE, AND APPARATUS FOR CONVEYING SUBSTRATE - A method for treating a substrate before exposing the substrate to which a resist is applied, includes, rinsing the substrate to which a resist is applied, and holding the rinsed substrate in an atmosphere. The atmosphere substantially contains no moisture until conveying the substrate to an exposure apparatus.05-07-2009
20100195067Exposure apparatus, exposure method, and method for producing device - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined in a space adjacent the substrate. The apparatus includes a structure substantially parallel to a surface of a substrate table configured to hold the substrate, to divide the space into two parts. The structure has an aperture to allow transmission of the pattern and a recess at the bottom side of the structure to extract a fluid from the space.08-05-2010
20090040482EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus projects a pattern of an original onto a substrate through a projection optical system and a liquid. The exposure apparatus includes a supply unit adapted to supply liquid to a space between the projection optical system and a substrate, a suction unit adapted to suck a fluid in the space, and a fluid sensor that detects a change in the kind of fluid being sucked by the suction unit, and a controller configured to control the operating state of the suction unit in response to the detection by the fluid sensor of the change in kind of the fluid being sucked by the suction unit.02-12-2009
20090115980Illumination system and filter system - A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.05-07-2009
20090115979Immersion lithography apparatus - A sampler, sample holder and an immersion lithographic apparatus comprising a sampler is disclosed. In an embodiment, a sampler is provided to collect particles in an immersion system of a lithographic apparatus. The sampler comprises a holder base having a collector surface. The collector surface is configured to collect and store contaminants. The sampler may be located on a surface of the immersion system so as to collect sample particles by contact of the collector surface with a liquid or with a surface of the immersion system. The sampler may be removable from the immersion lithographic apparatus for inspection.05-07-2009
20090115977Exposure Apparatus, Exposure Method, and Device Manufacturing Method - An exposure apparatus includes an immersion space forming member (05-07-2009
20090073397Laminar Flow Gas Curtains for Lithographic Applications - Laminar flow gas curtains can be used in a lithographic apparatus to maintain a gaseous purity level within one or more components of the lithographic apparatus such as, for example, a wafer stage and a wafer handler system. In an embodiment, a method to design a flow conditioning channel for use in such gas curtains can include selecting a kinetic purge power (KPP) factor based on a predefined throw distance (L′) to a channel length (L) ratio (L′L), selecting the channel length (L) to a channel diameter (D) ratio (L/D) based on the KPP factor, determining the channel length for the predefined throw distance based on the (L′/L) ratio, and determining the channel diameter D based on the channel length to the channel diameter (L/D) ratio and the channel length L The channel length L and channel length D can be designed based on a predetermined nozzle exit Reynold's number.03-19-2009
20090073398MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.03-19-2009
20090073395Lithographic apparatus and device manufacturing method - An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.03-19-2009
20100220302PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY COMPRISING A COOLING DEVICE - A projection exposure apparatus for semiconductor lithography includes a cooling device for cooling components of the projection exposure apparatus. The cooling device contains a liquid cooling medium having a thermal conductivity of greater than 5W/mK.09-02-2010
20100220301APPARATUS AND METHOD TO CONTROL LIQUID STAGNATION IN IMMERSION LIQUID RECOVERY - An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and a liquid-permeable member. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a chamber. The confinement member includes at least one liquid inlet within the chamber through which a liquid is introduced into the chamber to reduce liquid from becoming stagnated within the chamber.09-02-2010
20110032498Exposure apparatus, exposure method, and method for producing device - An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding, for example, the outflow of the liquid to the surroundings.02-10-2011
20090153815Exposure apparatus, exposure method, method for manufacturing device - An exposure apparatus that: projects pattern images onto a substrate via liquid and a projection optical system, the liquid forming a liquid immersion region between the projection optical system and the substrate; and exposes the substrate. The apparatus has: a liquid-supplying-section that supplies the liquid onto the substrate; a first pipe section that introduces the liquid to the liquid-supplying-section; and a second pipe section, connected to the first pipe section, that collects the liquid not being supplied to the liquid-supplying-section from the first pipe section. By doing this, it is possible to provide a liquid-immersion exposure apparatus having a liquid-supplying-mechanism, exposure method, and a method for manufacturing devices so as to: restrict the temperature of the liquid, supplied between the projection optical system and the substrate, from varying; and prevent contaminants from invading into the liquid.06-18-2009
20090109413Maintenance method, exposure method and apparatus, and device manufacturing method - A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space between an optical member and a substrate; a liquid supply mechanism which supplies the liquid to the liquid-immersion space; a substrate stage which moves the substrate; and a measuring stage on which a reference mark is formed. To clean the liquid-immersion space-forming member, a cleaning liquid is supplied to a space between the measuring stage and the liquid-immersion space-forming member. The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member. The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus.04-30-2009
20090109414LITHOGRAPHY APPARATUS, METHOD OF FORMING PATTERN AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A lithography apparatus includes a resist processing apparatus to perform a process of applying a resist on a substrate, a process of heating a resist film on the substrate, and a process of developing the resist film on the substrate, an immersion exposure apparatus including a projection optical system which projects an image of a pattern on a photomask onto the resist film and configured to perform exposure through liquid located on an optical path between the projection optical system and resist film, a trans-porting apparatus connected to the resist processing and immersion exposure apparatuses to perform transportation of the substrate between the resist processing and immersion exposure apparatuses, and a temperature/humidity control apparatus configured to control at least one of temperature and humidity in at least one of the resist processing and transporting apparatuses based on temperature and humidity or the in humidity the immersion exposure apparatus.04-30-2009
20090109411Systems and Methods for Insitu Lens Cleaning Using Ozone in Immersion Lithography - An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes an ozone generation unit produces a flow of ozone into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.04-30-2009
20090109412Lithographic apparatus and device manufacturing method - A lithographic apparatus comprises an immersion fluid system and an interferometric temperature detection system. The immersion fluid system is configured to provide immersion fluid to an exposure system. The interferometric temperature detection system is configured to measure a temperature of the immersion fluid.04-30-2009
20090103061Reticle Protection Member, Reticle Carrying Device, Exposure Device and Method for Carrying Reticle - A position measurement device 04-23-2009
20080212045 OPTICAL SYSTEM WITH AT LEAST A SEMICONDUCTOR LIGHT SOURCE AND A METHOD FOR REMOVING CONTAMINATIONS AND/OR HEATING THE SYSTEMS - A method for removing contaminations from optical elements or parts thereof, especially from at least one surface of at least one optical element, with UV light. At least one semiconductor light source is used for removing the contaminations, wherein the semiconductor light source is arranged in and/or on a support of the optical element and/or close to the optical element such that a light of the semiconductor light source impinges onto the surface of the optical element.09-04-2008
20100296068EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes an object with exposure light. The exposure apparatus includes: a moving body which holds the object and is movable in a predetermined plane, and in which a scale member including a grating is disposed; a measurement system which measures positional information of the moving body in the predetermined plane using the scale member; a detection system which detects information regarding foreign matter on a surface of the scale member and the size of the foreign matter; and a cleaning apparatus which can clean the scale member. A cleaning operation is performed on the scale member according to a detection result of the detection system.11-25-2010
20100296067LITHOGRAPHIC APPARATUS AND METHOD OF OPERATING THE APPARATUS - A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.11-25-2010
20100309445Gas Gauge Compatible With Vacuum Environments - A gas gauge (12-09-2010
20130135595LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.05-30-2013
20130135596LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A liquid immersion exposure apparatus that exposes a substrate via a projection optical system and liquid includes a movable member having an upper surface, a part of which holds the substrate. A liquid immersion system that has a supply port and a recovery port supplies the liquid to a space between the projection optical system and the upper surface via the supply port of a supply path and recovers the liquid of a liquid immersion region formed in the space via the recovery port of a recovery path. A flow path is connected to the supply path between the supply port and a source of the liquid, the flow path permitting flow therethrough to remove liquid that remains in the supply path, the liquid that remains in the supply path having been supplied from the source of the liquid without being discharged from the supply port.05-30-2013
20100302518LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.12-02-2010
20100302519LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.12-02-2010
20110122380IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING INVERTED WAFER-PROJECTION OPTICS INTERFACE - A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation, and also includes an optical system that images the electromagnetic radiation on the substrate. A liquid is between the optical system and the substrate. The projection optical system is positioned below the substrate.05-26-2011
20110122379FILTER HOLDING APPARATUS, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - A filter holding apparatus holding a first chemical filter and a second chemical filter, includes a first frame which holds the first chemical filter and which has a first guide groove provided on a side surface of the first frame; a second frame which holds the second chemical filter and which has a second guide groove provided on a side surface of the second frame and which is arranged while being overlapped with the first frame; and each of the first and second guide grooves has a first groove which is communicated with a back surface of one of the first and second frames, and a second groove which is communicated with the first groove and which extends toward an upper end of one of the first and second frames; wherein a distance between the second groove and the back surface in the first frame is different from a distance between the second groove and the back surface in the second frame. A plurality of filters can be installed or exchanged efficiently and in such a manner that the filters are positioned easily.05-26-2011
20110122378FILTER APPARATUS, FILTER ACCOMMODATING METHOD, EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - A filter apparatus which holds a chemical filter includes a frame which holds the chemical filter and which has a guide groove provided on a side surface of the frame; and a casing which accommodates the frame. The guide groove has a first groove which is communicated with a back surface of the frame, and a second groove which is communicated with the first groove and which extends from a front surface of the frame toward an upper end thereof. The casing has a shaft member which is engageable with the first groove to support the frame and which is engageable with the second groove to release the frame from being supported. It is possible to install the filter efficiently so that the filter can be positioned with ease, and to unload the filter efficiently.05-26-2011
20110122376LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.05-26-2011
20100315609Maintenance method, maintenance device, exposure apparatus, and device manufacturing method - An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.12-16-2010
20130141702APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE - A lithographic projection apparatus includes a projection optical assembly having a final optical element, a stage assembly including a substrate table on which a substrate is supported, the substrate supported by the substrate table being exposed with an exposure beam from the final optical element of the projection optical assembly through an immersion liquid, a confinement member which encircles a portion of a path of the exposure beam, and a movable member which is movable in a space between the confinement member and the substrate, the substrate table, or both, the space being divided by the movable member into a first portion between the confinement member and the movable member and a second portion between the movable member and the substrate, the substrate table, or both. The movable member has a recovery outlet from which the immersion liquid in the second portion is removed.06-06-2013
20100321651LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.12-23-2010
20110001944LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.01-06-2011
20110001943EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - Of a measurement stage that has a plate on which liquid is supplied, and performs measurement related to exposure via a projection optical system and a liquid, at least a part of the measurement stage including the plate can be exchanged. Therefore, by exchanging at least a part of the measurement stage including the plate before the surface of the plate deteriorates due to contact with the liquid, measurement related to exposure can be performed constantly with high precision, which makes it possible to maintain exposure with high precision. Further, in the case at least one edge surface of the plate is mirror-polished, when at least a part of the measurement section including the plate is exchanged to a new component, the position of the plate can be accurately measured, for instance, by an interferometer or the like via the edge surface of the plate that has been mirror-polished, even if the position of the component that has been exchanged is roughly set.01-06-2011
20110001942LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.01-06-2011
20100231876Apparatus and method for recovering fluid for immersion lithography - Apparatus and methods recover a fluid from an immersion area formed in a gap between a projection system and an object of exposure in an immersion lithography system. Liquid is supplied through a supply inlet. A porous member is disposed adjacent to a space. The porous member includes a first portion and a second portion. A recovery capability to remove the supplied liquid from the space through the first portion is different from a recovery capability to remove the supplied liquid from the space through the second portion.09-16-2010
20110025994LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.02-03-2011
20110025992OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT - An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s).02-03-2011
20090066924Lithographic apparatus, device manufacturing method, and use of a radiation collector - A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.03-12-2009
20090066923Exposure apparatus and device manufacturing method - An exposure apparatus which prevents damages due to leaked out liquid from expanding and can maintain exposure accuracy and measuring accuracy. The exposure apparatus includes a first stage which is movable relative to the projection optical system, a second stage which is movable relative to the projection optical system, and a liquid immersion system that is capable of forming a liquid immersion region of a liquid under the projection optical system. The first and second stages are moved in a state in which a first overhang portion provided at the first stage and a second overhang portion provided at the second stage are brought close to or in contact with each other, such that the liquid immersion region is moved from one of upper surfaces of the first and second overhang portions to the other of the upper surfaces of the first and second overhang portions.03-12-2009
20090066922Exposure method and apparatus, maintenance method and device manufacturing method - An exposure method includes holding a substrate held by a substrate holder on a substrate stage moving on an image plane side of a projection optical system; forming an immersion area the image plane side of the projection optical system by using a liquid supplied from a liquid supplying mechanism; and exposing a substrate by exposure light via the projection optical system and the immersion area. During a period when exposure of the substrate is not performed, an upper portion of the substrate holder is cleaned by moving the substrate stage relative to the immersion area, and an upper portion of a measuring stage is cleaned by moving the measuring stage relative to the immersion area. A cleaning liquid can be used as a liquid for forming the immersion area during cleaning. High-resolution immersion exposure is performed at a high throughput by suppressing entering of foreign materials into the liquid.03-12-2009
20090066921METHOD FOR PRODUCING A MARKER ON A SUBSTRATE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method of producing a marker on a substrate includes projecting a patterned beam on a layer of resist disposed on a substrate in a lithographic apparatus to create a latent marker; and locally heating the substrate at the marker location in the lithographic apparatus to transform the latent marker into a detectable marker.03-12-2009
20110109887LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.05-12-2011
20110128516LITHOGRAPHIC APPARATUS AND SURFACE CLEANING METHOD - An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.06-02-2011
20110025993LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.02-03-2011
20110025995LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND A CONTROL SYSTEM - A capillary passage is formed between a substrate holder and an edge structure. Along the capillary passage are arranged a plurality of electrodes which, when charged, become liquidphilic. The electrodes may be used to split droplets of liquid and pump the liquid along the capillary passage.02-03-2011
20110025996Exposure apparatus, and device manufacturing method - An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the substrate at an opposite position to the projection system while the liquid is maintained in contact with the projection system so as to transit from a first state to a second state, the first state in which the liquid is maintained between the projection system and the liquid retaining member, the second state in which the liquid is maintained between the projection system and the table member.02-03-2011
20110025998Stage drive method and stage unit, exposure apparatus, and device manufacturing method - A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.02-03-2011
20110128513Cooling systems and methods for grazing incidence EUV lightography collectors - A cooling system (06-02-2011
20110032495EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A purge cover is equipped whose upper end is connected to an illumination unit and the lower end has a pair of plate sections facing an upper surface of a reticle stage and a reticle via a predetermined clearance. Therefore, gaseous circulation can be substantially blocked via the clearance between reticle stage RST and the plate sections. This allows a space which is almost airtight surrounded by the purge cover, the reticle stage and/or the reticle to be formed on the optical path of the illumination light that reaches the projection optical system from the illumination unit. Further, the space above which is almost airtight serves as a purge space that is purged with CDA and the like.02-10-2011
20110032496MOVABLE BODY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - One pair each of a Y linear motor (a total of four) on the +X side and the −X side that drive a reticle stage include one pair each of a stator section (a total of four) and three each of a mover section (a total of six) on the +X side and the −X side. In this case, the three each of the mover sections on the +X side and the −X side configure one each of a mover. The mover section located in the center in the Z-axis direction of each of the movers is used in common by each pair of the Y linear motors. Therefore, the weight of the mover section (reticle stage) of the reticle stage device is reduced, which allows a higher acceleration. Further, the mover section located in the center in the Z-axis direction of each of the movers coincides with a neutral plane of the reticle stage.02-10-2011
20110116061LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.05-19-2011
20110116060LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD - A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.05-19-2011
20110116059FILTER BOX, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE - A filter box which holds a chemical filter includes a box-shaped frame which holds the chemical filter and a guide groove which is provided on a side surface of the frame. The guide groove includes a first recess which is arranged between an upper end and a lower end of the side surface of the frame and which is communicated with a side end of the side surface; and a second recess which is communicated with the first recess and which extends toward the upper end of the frame. With the guide grooves, it is possible to exchange the filter efficiently and with high positioning precision.05-19-2011
20090033890Exposure apparatus, substrate processing method, and device producing method - An exposure apparatus includes a detector which detects a defect in a thin film formed on a substrates. When the detector is provided for liquid immersion exposure in which the substrate is exposed through liquid, outflow of the liquid due to by any defect in the thin film is detected before the liquid outflows, thereby suppressing reduction in throughput in producing device and preventing any problem or inconvenience from occurring in the exposure apparatus.02-05-2009
20090033889Lithographic apparatus and device manufacturing method - A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.02-05-2009
20090231559Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system - A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configured to pattern a projection beam according to a desired pattern. The apparatus has a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge pas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.09-17-2009
20110075119Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof - In immersion exposure, a resist pattern forming method suppressing resist pattern defects comprises mounting a substrate formed a resist film thereon and a reticle formed a pattern thereon onto an exposure apparatus, supplying a first chemical solution onto the resist film to selectively form a first liquid film in a local area on the resist film and draining the solution, the first liquid film having a flow and being formed between the resist film and a projection optical system, transferring the pattern of the reticle to the resist film through the first liquid film to form a latent image, supplying a second chemical solution onto the resist film to clean the resist film, heating the resist film, and developing the resist film to form a resist pattern from the resist film.03-31-2011
20110128515LITHOGRAPHIC APPARATUS AND SEALING DEVICE FOR A LITHOGRAPHIC APPARATUS - An apparatus includes a first body; a second body that is moveable relative to the first body; a seal arranged between the first and the second body such that a first space is separated from a second space by the first body, the second body and the seal, wherein the seal is located at a distance from the first body; a fluid supply arranged to create a fluid flow between the first body and the seal to create a non-contact seal between the first and the second space so as to enable movement between the first and the second body, and a controller configured to control the distance during movement of the first and the second body relative to each other.06-02-2011
20110128517LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.06-02-2011
20110242512LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.10-06-2011
20110242511Apparatus and methods for inhibiting immersion liquid from flowing below a sustrate - A substrate stage is provided with an immersion liquid collection member that surrounds at least an alignment feature of the substrate stage used to align the substrate on the stage by engaging alignment structure of the substrate. The collection member is located at least partly below the periphery of the substrate held by the substrate holding member of the substrate stage. The collection member has an uppermost liquid-receiving surface that preferably is spaced below a lowermost surface of the substrate when the substrate is held by the substrate holding member. The collection member collects liquid that flows along the alignment feature so as to prevent that immersion liquid from flowing along the under-surface of the substrate.10-06-2011
20100014061LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.01-21-2010
20100002208EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - At least one exemplary embodiment is directed to a method of exposing a substrate to light, including a measurement step of measuring position of a mark arranged on one of a substrate and a stage configured to hold the substrate and to move; a detection step of detecting a foreign particle on the mark based on a process performed in the measurement step; a removing step of removing the foreign particle on the mark in accordance with detection of the foreign particle in the detection step; a moving step of moving the stage based on the position of the mark measured in the measurement step; and an exposure step of exposing the substrate moved in the moving step to light.01-07-2010
20100014059Lithographic Apparatus and Device Manufacturing Method - A lithographic apparatus and method in which a system is used to emit a patterned beam. The patterned beam is projected onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.01-21-2010
20100039628Cleaning tool, cleaning method, and device fabricating method - A cleaning tool is loaded onto an exposure apparatus, which exposes a substrate with exposure light, and cleans a member inside the exposure apparatus. The cleaning tool comprises: a base member; and a cleaning member that is disposed on the base member and permeated with a cleaning liquid.02-18-2010
20100053574Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate - A liquid immersion lithography system includes projection optics (PL) and a showerhead (03-04-2010
20100045950LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.02-25-2010
20100053575Thermal Control For EUV Lithography - A method of patterning an integrated circuit including generating a thermal profile of a reticle is provided. The thermal profile of the reticle may illustrate heat accumulation (e.g., a temperature) in a EUV reticle due an incident EUV radiation beam. The thermal profile may be determined using the pattern density of the reticle. The reticle is irradiated with a radiation beam having an extreme ultraviolet (EUV) wavelength. A thermal control profile may be generated using the thermal profile, which may define a parameter of the lithography process such as, a temperature gradient of a thermal control chuck. The thermal control profile may be downloaded to the EUV lithography tool (e.g., scanner or stepper) for use in a process. A separate thermal control profile may be provided for different reticles.03-04-2010
20100053576RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.03-04-2010
20100060869LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD - An alignment method for a substrate or a patterning device is disclosed along with a corresponding apparatus. The method includes using a part of an alignment arrangement of a lithographic apparatus to undertake a part of an alignment procedure on a part of a substrate or on a part of a patterning device, until the substrate or a part of or in the lithographic apparatus, has become thermally stabilized within a limit.03-11-2010
20110176121LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND COMPUTER READABLE MEDIUM - In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.07-21-2011
20100066988LITHOGRAPHIC APPARATUS AND METHOD OF GENERATING THE APPARATUS - A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.03-18-2010
20100134773APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS - An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.06-03-2010
20100134772Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.06-03-2010
20100134771Coupling apparatus, exposure apparatus, and device fabricating method - A lithographic projection apparatus includes an illumination system arranged to condition a radiation beam, a support structure configured to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table configured to hold a substrate, a projection system arranged to project the patterned radiation beam onto a target portion of the substrate, and a liquid supply system configured to at least partly fill a space between the projection system and the substrate, with a liquid. The projection system includes a first part and a second part that are two separate physical parts that are substantially isolated from each other such that vibrations in the second part are substantially prevented from being transferred to the first part. Each part includes an optical element of the projection system and the first and second parts are not attached to and movable with the substrate.06-03-2010
20100134770EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE - An exposure apparatus projects a pattern of an original plate onto a substrate through a projection optical system to expose the substrate to the pattern. The exposure apparatus includes a supporting member configured to support an optical element of the projection optical system along the direction of gravitational force, and position adjustment mechanisms disposed at least two different positions on the supporting member and configured to press the optical element to displace the optical element relative to the supporting member. The pressing force of the position adjustment mechanisms against the optical element is changed to move contact positions between the position adjustment mechanisms and the optical element to displace the optical element relative to the supporting member. Thus, optical performance adjustment of the optical element is performed, and then all the position adjustment mechanisms are made in non-contact state with the optical element.06-03-2010
20100134768PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY - The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.06-03-2010
20080231824Liquid recovery member, exposure apparatus, exposing method, and device fabricating method - An exposure apparatus comprises a recovery member that recover a liquid. The recovery ability with which the recovery member recovers the liquid differs in accordance with the region of the recovery member.09-25-2008
20110249246LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.10-13-2011
20110069290CLEANING DEVICE, A LITHOGRAPHIC APPARATUS AND A LITHOGRAPHIC APPARATUS CLEANING METHOD - A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.03-24-2011
20110069288Reticle Transport Apparatus, Exposure Apparatus, Reticle Transport Method, and Reticle Processing Method - A reticle transport apparatus transports a reticle to and from a processing atmosphere. A reticle loader loads the reticle into the processing atmosphere, with at least a portion of the reticle being covered by a cover. A cover manipulator, in the processing atmosphere, removes the reticle from the cover and transfers the cover, without the removed reticle, to the reticle loader, and the reticle loader unloads the cover from the processing atmosphere. A cover cleaner, outside of the processing atmosphere, cleans the cover. When processing involving the reticle is completed, the reticle is returned to the cleaned cover or is placed in a different cover.03-24-2011
20120120376FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening.05-17-2012
20120120377LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.05-17-2012
20110075118HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.03-31-2011
20110069289LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.03-24-2011
20120200837EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern, a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.08-09-2012
20120200836EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by forming a liquid immersion region on the substrate, and projecting a pattern image onto the substrate via a projection optical system and a liquid that forms the liquid immersion region. The exposure apparatus includes a projection optical system having a plurality of optical elements, by which a pattern image is projected onto a substrate via a liquid to expose the substrate and a liquid recovery system that recovers the liquid along with a gas and has a separator that separates the recovered liquid and the recovered gas.08-09-2012
20110043774CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING THEREOF - In order to clean optical components (02-24-2011
20110025997Exposure apparatus, and device manufacturing method - An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second tables are moved together so as to transit from a first state to a second state, the first state in which the liquid immersion is maintained between the projection system and one of the first and second tables, the second state in which the liquid immersion is maintained between the projection system and the other one of the first and second tables. During the transition, the liquid immersion is maintained just below the projection system.02-03-2011
20110019168LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or by compensating for the differing amounts of time each relevant part of the substrate is covered by liquid by varying exposure intensity or duration based on the amount of time the substrate is covered by liquid.01-27-2011
20110019170PROJECTION EXPOSURE APPARATUS AND STAGE UNIT, AND EXPOSURE METHOD - A projection exposure apparatus has a substrate table on which a substrate is mounted that can be moved holding the substrate, a position measuring system that measures positional information of the substrate table, and a correction unit that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.01-27-2011
20110211178TEMPERATURE-CONTROLLED HOLDING DEVICES FOR PLANAR ARTICLES - An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.09-01-2011
20100271604SYSTEM AND METHOD TO INCREASE SURFACE TENSION AND CONTACT ANGLE IN IMMERSION LITHOGRAPHY - A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment, when using an organic immersion fluid in a space between the last optic and the substrate.10-28-2010
20110037960LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, CLEANING SYSTEM AND METHOD FOR CLEANING A PATTERNING DEVICE - A lithographic apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device is configured to impart a pattern to the beam of radiation. The apparatus includes a patterning device cleaning system configured to provide an electrostatic force to contaminant particles that are on the patterning device and that are electrically charged by the beam of radiation, in order to remove the contaminant particles from the patterning device.02-17-2011
20110037959Environmental system including vacuum scavenge for an immersion lithography apparatus - A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table, the space having a cross-sectional area smaller than the area of the substrate. The liquid confinement structure includes a first inlet to supply liquid, through which the patterned beam is projected, to the space, a first outlet to remove liquid after the liquid has passed under the projection system, a second inlet formed in a face of the structure, the face arranged to oppose a surface of the substrate, and located radially outward, with respect to an optical axis of the projection system, of the space to supply gas, and a second outlet formed in the face and located radially outward, with respect to an optical axis of the projection system, of the second inlet to remove gas.02-17-2011
20110037958LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.02-17-2011
20100315610LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.12-16-2010
20100259734Cooling Device, Cooling Arrangement and Lithographic Apparatus Comprising a Cooling Arrangement - A cooling arrangement is described and includes a heat sink having a first thermal contact surface, an object having a second thermal contact surface and a resilient wall. The first thermal contact surface and the second thermal contact surface face each other and define a gap. The resilient wall is part of an enclosure that surrounds a space at least comprising the gap, and the cooling arrangement includes a facility to maintain a pressure difference between the space and an environment of the cooling arrangement. Additionally, a lithographic apparatus comprising such a cooling arrangement is described.10-14-2010
20100245791LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.09-30-2010
20100245790METHOD AND SYSTEM FOR DETECTING PARTICLE CONTAMINATION IN AN IMMERSION LITHOGRAPHY TOOL - In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.09-30-2010
20100271603STAGE FOR SUBSTRATE TEMPERATURE CONTROL APPARATUS - A stage for substrate temperature control apparatus in which an extent of a transient temperature distribution that occurs when a substrate is heated or cooled can be reduced in comparison with the conventional one. The stage for substrate temperature control apparatus is a stage to be used for mounting a substrate having a predetermined diameter in a predetermined position in a substrate temperature control apparatus for controlling a temperature of the substrate, and includes: a plate formed with a step part, which is lower than a center part, on a first surface facing the substrate in a region including a position corresponding to an edge of the substrate; and a temperature control unit provided on a second surface opposite to the first surface of the plate.10-28-2010
20110249245METHOD OF COOLING AN OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS AND METHOD FOR MANUFACTURING A DEVICE - A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.10-13-2011
20100097585APPARATUS AND METHOD TO CONTROL VACUUM AT POROUS MATERIAL USING MULTIPLE POROUS MATERIALS - An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes a confinement member and first and second liquid-permeable members. The confinement member includes an outlet and an aperture through which a patterned image is projected onto the object. The first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. The second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber.04-22-2010
20100097584EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - An exposure apparatus which exposes a substrate via a liquid supplied between a projection optical system and the substrate, the apparatus comprises a gas supply-recovery mechanism configured to blow a gas around the liquid, wherein the gas supply-recovery mechanism includes a nozzle unit in which a supply port configured to supply the gas, and a recovery port which is arranged nearer to an optical axis of the projection optical system than the supply port and is configured to recover the gas are formed, and wherein the nozzle unit is configured such that a first portion which is adjacent to the supply port and is nearer to the optical axis than the supply port is closer to an image plane of the projection optical system than a second portion which is adjacent to the supply port and is farther from the optical axis than the supply port.04-22-2010
20100097586LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.04-22-2010
20090316121LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.12-24-2009
20090290134EXPOSURE METHOD - A method for exposure is provided to avoid a rise in temperature of a lens set. First, a light beam passes through a first light-receiving region of the lens set to expose a pattern on a substrate, and the first light-receiving region has a rise in temperature. Thereafter, the first light-receiving region is moved away. Afterwards, the light beam passes through a second light-receiving region of the lens set so that the first light-receiving region has a drop in temperature.11-26-2009
20090279062FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.11-12-2009
20090296053Apparatus and method for providing fluid for immersion lithography - A lithographic projection apparatus projects a pattern from a patterning device onto a substrate using a projection system. The apparatus has a liquid supply system to supply a liquid to a space between the projection system and the substrate. The apparatus also has a fluid removal system including a chamber to hold liquid and having an open end adjacent to a volume in which fluid will be present. The open end removes, through a pressure differential across-the open end when liquid is present in the chamber, substantially only liquid from the volume when liquid in the volume is adjacent to the open end but not gas from the volume when gas in the volume is adjacent to the open end.12-03-2009
20080246931Substrate processing method, exposure apparatus, and method for producing device - An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.10-09-2008
20120033192Exposure apparatus, exposure method, and device producing method - An exposure apparatus (EX) exposes a substrate (P) by irradiating exposure light (EL) on the substrate (P) via a projection optical system (PL) and a liquid (LQ) supplied from a liquid supply mechanism (02-09-2012
20120200835RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE AND METHOD FOR CARRYING RETICLE - A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.08-09-2012
20120170009FILTER BOX, FILTER APPARATUS, AND EXPOSURE APPARATUS - A plurality of filter boxes which hold chemical filters include: a first filter box having a frame which holds a chemical filter and which has a guide groove provided on a side surface of the frame; and a second filter box having a frame which holds a chemical filter and which has a guide groove provided on a side surface of the frame; wherein the guide groove of the first filter box and the guide groove of the second filter box are different from each other at least in one of a width and a depth thereof. A plurality of filters can be installed or exchanged efficiently or in such a manner that the filters are positioned easily.07-05-2012
20120170008EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - A scanning exposure apparatus exposes a plurality of shot regions on a substrate to light while scanning an original and the substrate. The apparatus includes: a stage which holds the substrate and moves; and a controller which controls movement of the stage based on a driving profile that defines the movement of the stage. A portion in the driving profile, which defines the movement of the stage during exposure of at least one shot region, is formed by a sine wave having a frequency lower than a resonance frequency in a stage controller.07-05-2012
20110255062FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. An undersurface of the fluid handling structure has a supply opening configured to supply fluid toward the facing surface, a plurality of extraction openings configured to remove fluid from between the fluid handling structure and the facing surface, and a protrusion between the supply opening and the extraction openings.10-20-2011
20100321653LITHOGRAPHIC APPARATUS - A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.12-23-2010
20100321652LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus and device manufacturing method is provided in which exposure is carried out by projecting through a liquid having a pH of less than 7, the liquid being in contact with a substrate to be exposed. The liquid advantageously comprises an anti-reflective topcoat.12-23-2010
20080252866Lithographic apparatus and device manufacturing method - A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a substrate supported by a substrate table; a liquid supply system configured to supply a space between the projection system and the substrate with a liquid; a closing surface configured to provide a confining surface for liquid supplied by the liquid supply system in place of the substrate; and a closing surface positioning device configured to create and maintain a gap between the liquid supply system and the closing surface so that the liquid flows in the gap when the closing surface is used to confine the liquid supplied by the liquid supply system.10-16-2008
20080252865Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device - An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.10-16-2008
20080204679Lithographic apparatus and device manufacturing method - Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.08-28-2008
20080204678Temperature effects on overlay accuracy - A method for reducing overlay error in a photolithographic process, by providing a substrate having a permanent layer with a first pattern disposed therein, coating the substrate with photoresist, exposing the photoresist to a second pattern, while measuring temperatures at a plurality of different first positions across the substrate, developing the second pattern in the photoresist, measuring overlay errors between the first and second patterns at a plurality of different second positions across the substrate, correlating the overlay errors with temperatures by position on the substrate, determining any relationship indicated between the correlated overlay errors and temperatures, and adjusting at least one temperature controlling aspect of the photolithographic process in response to any relationship determined.08-28-2008
20100283980LIQUID IMMERSION MEMBER - A liquid immersion member is disposed around an optical member having an emergent surface from at least part of which exposure light is emitted and which holds a liquid between itself and an object opposing the emergent surface so that an optical path of exposure light between the emergent surface and the object is filled with a liquid to form an immersion space. The liquid immersion member comprises: an opening that recovers a liquid on the object with a gas; a space into which the liquid and the gas from the opening are entered; a recovery passageway into which only a liquid in the space is entered; an inner side surface that opposes at least part of a side surface of the optical member with a gap therebetween; and a recovery port that recovers at least part of a liquid in the gap.11-11-2010
20110261333EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD USING SAME, AND GAS SUPPLY DEVICE - The exposure apparatus includes a purge member that includes a humidifier that humidifies supplied gas; a first regulator that regulates a flow rate of first gas which passes through the humidifier; a second regulator that regulates a flow rate of second gas which does not pass through the humidifier; a variable instrument that varies a humidifying performance of the humidifier; a sensor; and a controller. Here, the controller controls the first and the second regulators to adjust a flow rate ratio of the first gas and the second gas on the basis of the humidity of the humidified gas detected by the sensor and a pre-set target humidity, and controls the variable instrument to keep the flow rate of the first gas constant on the basis of an amount of operation of the first regulator and an amount of pre-set target operation.10-27-2011
20110019169PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.01-27-2011
20110134401LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×1006-09-2011
20110134402LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.06-09-2011
20110134400EXPOSURE APPARATUS, LIQUID IMMERSION MEMBER, AND DEVICE MANUFACTURING METHOD - Liquid is held between a tip lens of a projection optical system and a wafer on a wafer stage, using a nozzle member which has shape enclosing an optical path of an illumination light, and a bottom surface to which wafer W is placed facing via a predetermined clearance that has an annular recess section formed having multiple projecting sections. This prevents adhesion of contamination and liquid from remaining that become factors of defects of a pattern formed on a wafer. The nozzle member preferably has an annular shaped inclined surface whose gap with the wafer surface becomes smaller from the inner side to the outer side, formed on an inner bottom surface facing the wafer of an outer recess section formed on the bottom surface of the nozzle member.06-09-2011
20110134399Lithographic Projection Apparatus - A lithographic apparatus arranged to transfer a pattern onto a substrate is disclosed. The lithographic apparatus comprises a power supply and an electrical connector. The electrical connector electrically connects the power supply to another component of the lithographic apparatus. The electrical connector comprises a laminate that comprises, in order, a first conducting layer, a first flexible insulating layer, a conductor configured to carry an electrical current, a second flexible insulating layer and a second conducting layer.06-09-2011
20110051107LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.03-03-2011
20110051106Exposure apparatus and device manufacturing method - An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted that moves within a two-dimensional plane holding the substrate. In addition, a supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. In addition, at least one bubble recovery mechanism recovers bubbles in the liquid in an upstream side of the liquid flow with respect to the projection optical system.03-03-2011
20110051105Stage drive method and stage unit, exposure apparatus, and device manufacturing method - A lithographic projection apparatus includes a substrate table to hold a substrate, a projection system to project a patterned beam of radiation onto the substrate and a liquid confinement structure to confine a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.03-03-2011
20110051104Stage drive method and stage unit, exposure apparatus, and device manufacturing method - When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.03-03-2011
20110096308APPARATUS COMPRISING A ROTATING CONTAMINANT TRAP - A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).04-28-2011
20110096307LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.04-28-2011
20110096305SHUTTER MEMBER, A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus that includes a substrate table, a fluid handling structure and a swap table. The substrate table is configured to support a substrate. The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and the substrate table, the substrate, or both. The swap table has a shutter surface configured to be under the fluid handling structure during, for example, swap of the substrate on the substrate table. In use, a transfer surface between a surface of the substrate table and a surface of the swap table is moved under the fluid handling structure to help stop escaping immersion liquid. A shutter member and a method are also disclosed.04-28-2011
20110080568Immersion exposure apparatus and immersion exposure method, and device manufacturing method - An immersion type exposure apparatus comprises: an optical member from which an exposure beam is emitted; a first movable member that is movable while holding a substrate, in a predetermined region including a first region including a position facing the optical member and a second region different from the first region; a second movable member that is movable while holding the substrate independently from a first movable member, in a predetermined region including the first region and the second region; a first connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves one movable member in the first region; a second connection member that is releasably and alternately connected with the first movable member and the second movable member, and moves the other movable member in the second region; and a third movable member that is provided on the first connection member and is movable to a position facing the optical member; and at least one of the first movable member, the second movable member, and the third movable member is moved to the position facing the optical member so that a beam path on the emitting side of the optical member is kept filled with a liquid.04-07-2011
20110080567LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.04-07-2011
20100110397High Heat Load Optics with a Liquid Metal Interface for Use in an Extreme Ultraviolet Lithography System - Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The mirror assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first mirror block to the heat exchanger.05-06-2010
20100110398METHODS RELATING TO IMMERSION LITHOGRAPHY AND AN IMMERSION LITHOGRAPHIC APPARATUS - A method of detecting particles in an immersion fluid of or from a lithographic apparatus. The method includes extracting a sample, using a vacuum system, from a single phase flow of the immersion fluid of or from a fluid handling structure in the lithographic apparatus. The method includes detecting particles in the sample, and initiating a signal if the detected particles are above a certain threshold.05-06-2010
20100214543LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD - A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.08-26-2010
20080218712Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus - An immersion lithographic apparatus includes a cleaning system for cleaning a component in the immersion lithographic apparatus in situ. The cleaning system is arranged to provide a cleaning environment in proximity of a predetermined position on a component to be cleaned. The system is also arranged to provide the cleaning environment substantially independent of a type of contamination present at the predetermined position.09-11-2008
20100066987LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.03-18-2010
20110261331Exposure apparatus and device manufacturing method - A lithographic apparatus includes a substrate table which holds a substrate, a projection optical system which projects a patterned beam of radiation onto the substrate, a liquid supply member which supplies a liquid to a space between the projection optical system and the substrate, and a liquid detector which detects a liquid remaining on a surface of an exposed substrate before the exposed substrate is unloaded from the substrate table.10-27-2011
20100195068CLEANING MEMBER, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD - A cleaning member is smaller than a substrate for exposure where exposure light is irradiated, and at least part of a substrate-holding member that holds a rear face of the substrate for exposure is held by the substrate-holding member in order to clean.08-05-2010
20090185150IMMERSION EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion exposure apparatus which includes an original stage which moves with holding an original; a substrate stage which includes a liquid supporting plate which has a liquid repellent surface and is located around a substrate holding region which holds a substrate; and a projection optical system, and scan-exposes the substrate while a gap between the substrate and the projection optical system is filled with a liquid, the apparatus comprising a movable blind configured to move in a direction different from a scanning direction of the scanning exposure and limit an irradiated region of exposure light, and a controller configured to control the movement of the movable blind in synchronism with the scanning exposure so as to reduce an amount of the exposure light which the liquid supporting plate.07-23-2009
20110261335SYSTEMS AND METHODS FOR THERMALLY-INDUCED ABERRATION CORRECTION IN IMMERSION LITHOGRAPHY - Immersion lithography aberration control systems and methods that compensate for a heating effect of exposure energy in an immersion fluid across an exposure zone are provided. An aberration control system includes actuators that adjust optical elements within the immersion lithography system and a fluid heating compensation module coupled to the actuators. The fluid heating adjustment module determines actuator commands to make aberration adjustments to optical elements within the immersion lithography system based on changes in one or more of a flow rate of the immersion liquid, an exposure dose and a reticle pattern image. In an embodiment, the aberration control system includes an interferometric sensor that pre-calibrates aberrations based on changes in operating characteristics related to the immersion fluid. Methods are provided that calibrate aberrations, determine actuator adjustments and implement actuator adjustments upon changes in operating characteristics to control aberration effects.10-27-2011
20110261330Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure apparatus and exposure method, device manufacturing method - A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system arranged to project a patterned beam of radiation onto the substrate, a liquid supply system configured to supply liquid to a space between the projection system and the substrate, and a residual liquid detector configured to detect liquid remaining on the substrate and/or the substrate table after an exposure is completed. A device manufacturing method includes projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate, the substrate being held by a substrate table, and, after the projecting is complete, detecting residual liquid on the substrate and/or the substrate table.10-27-2011
20110261332FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.10-27-2011
20110188014RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a radiation source configured to produce extreme ultraviolet radiation, the radiation source including a chamber in which a plasma is generated; a collector mirror configured to reflect radiation emitted by the plasma; and a debris mitigation system including a gas supply system configured to supply a first gas flow toward the plasma, the first gas flow being selected to thermalize debris generated by the plasma, and a plurality of gas manifolds arranged at a location proximate the collector mirror, the gas manifolds configured to supply a second gas flow in the chamber, the second gas flow being directed toward the plasma to prevent thermalized debris from depositing on the collector mirror.08-04-2011
20110188012LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - In a liquid confinement structure of an immersion lithographic apparatus an elongate continuous opening forms an outlet for supplying liquid to a space beneath the projection system. The elongate slit forms a region of high shear and pressure gradient that deflects bubbles away from the image field.08-04-2011
20110149256OBJECT WITH AN IMPROVED SUITABILITY FOR A PLASMA CLEANING TREATMENT - An object suitable for a plasma cleaning treatment in a plasma cleaning device, the object including a first outer surface area; a second outer surface area, wherein the object is constructed and arranged to cooperate with a removable cover such that the cover is connectable to the object to cover the second outer surface area, and wherein the object connected with the removable cover is adapted to be cleaned in the plasma cleaning device such that the plasma cleaning device is not exposed to particles of the second outer surface area and wherein the first outer surface area is cleaned in the plasma cleaning device.06-23-2011
20090174872Cleanup method for optics in immersion lithography - An immersion lithography apparatus and cleanup method used for the immersion lithography apparatus in which an immersion liquid is supplied to a gap between an optical element of a projection optics and a workpiece during an immersion lithography process. A surface of an object, which is different from the workpiece, is provided below the optical element, a supply port and a recovery port. During a cleanup process, a cleaning liquid is supplied onto the object such that the cleaning liquid covers only a portion of the surface of the object.07-09-2009
20090174870Cleaning apparatus and immersion lithographic apparatus - A cleaning apparatus to clean a substrate or component of an immersion lithographic apparatus is disclosed. The cleaning apparatus may comprise a plasma radical source, a conduit and a radical confinement system. The plasma radical source may provide a flow of radicals. The conduit may supply radicals from the plasma radical source to the surface to be cleaned. The radical confinement system may direct the radicals to clean a localized portion of the surface. The cleaning apparatus may comprise a rotator and may be configured to clean a substrate edge. An immersion lithographic apparatus comprising the cleaning apparatus to clean a surface is also disclosed. The immersion lithographic apparatus may comprise a substrate table to support a substrate and a fluid confinement structure to at least partly confine immersion fluid between a projection system and a substrate table and/or substrate.07-09-2009
20090174871Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus - A method of cleaning a lithography apparatus using an aerosol spray is described. The spray from the aerosol is contained in a space.07-09-2009
20100026974Cooling of Actuator Coils - In order to effectively transfer heat from inner layers of an actuator coil to an area external to the coil, heat transfer elements, located proximate to the actuator coil, can be used. In an embodiment, a heat transfer apparatus for the actuator coil can include one or more heat transfer elements located proximate to one or more layers or one or more windings of the actuator coil and a cooling surface located proximate to the one or more heat transfer elements and to the actuator coil. In this configuration, the heat transfer apparatus can transfer heat from inner layers of the actuator coil to the cooling surface, which in turn transfers the heat to an area external to the actuator coil.02-04-2010
20110080569OPTICAL ELEMENT AND METHOD - The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.04-07-2011
20100002207LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.01-07-2010
20120307215Flow Through MEMS Package - A flow through Micro-Electromechanical Systems (MEMS) package and methods of operating a MEMS packaged using the same are provided. Generally, the package includes a cavity in which the MEMS is enclosed, an inlet through which a fluid is introduced to the cavity during operation of the MEMS and an outlet through which the fluid is removed during operation of the MEMS. In certain embodiments, the fluid includes an gas, such as nitrogen, and the inlet and outlet are adapted to provide a flow of gas of from 0.01 Standard Cubic Centimeters per Minute (sccm) to 10000 sccm during operation of the MEMS. The package and method are particularly useful in packaging spatial light modulators including a reflective surface and adapted to reflect and modulate a light beam incident thereon. Other embodiments are also provided.12-06-2012
20120307216TEMPERATURE SENSING PROBE, BURL PLATE, LITHOGRAPHIC APPARATUS AND METHOD - A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.12-06-2012
20110149259LITHOGRAPHIC APPARATUS - A container is provided for use within a lithographic apparatus. The container is configured to house at least one component of the lithographic apparatus within an internal space which is at least partially filled with a packing material that includes a plurality of gas cells.06-23-2011
20110149255Lithographic Apparatus and Method - A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.06-23-2011
20110096306STAGE APPARATUS, EXPOSURE APPARATUS, DRIVING METHOD, EXPOSING METHOD, AND DEVICE FABRICATING METHOD - A stage apparatus includes a guide member that extends in first directions, that moves in second directions, which are substantially orthogonal to the first directions; two second moving bodies, which are provided along the guide member such that they are independently moveable in the first directions, that move in the second directions together with the guide member by the movement of the first moving body; and a holding member that holds an object and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first directions and the second directions.04-28-2011
20100321649Optical element - An optical element embodied as a front surface mirror or as a lens wherein the optical element has at least one partial region composed of a material which has the property that the material is cooled upon irradiation with suitable excitation light.12-23-2010
20120038894Lens Cleaning Module - A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is disclosed. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.02-16-2012
20100149501FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.06-17-2010
20120099088HIGH HEAT LOAD OPTICS WITH A LIQUID METAL INTERFACE FOR USE IN AN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEM - Methods and apparatus for cooling mirrors in an extreme ultraviolet (EUV) lithography system using a liquid metal interface are described. According to one aspect of the present invention, an apparatus which may be used in an EUV lithography system includes a heat exchanger, a mirror assembly, and a first liquid metal interface. The heat exchanger including at least a first surface. The minor assembly includes a first mirror block having a first mirrored surface, as well as at least a first well. Finally, the first liquid metal interface includes liquid metal which is contained in the first well. The first surface is in contact with the liquid metal such that heat may be transferred form the first minor block to the heat exchanger.04-26-2012
20080309892IN-LINE PARTICLE DETECTION FOR IMMERSION LITHOGRAPHY - An immersion lithography system, comprising a lens unit configured to project a pattern from an end thereof and onto a wafer, a hood unit configured to confine an immersion fluid to a region of the wafer surrounding the end of the lens unit, a wafer stage configured to position the wafer proximate the end of the lens unit, and at least one of an image capturing apparatus and a scattering light detection apparatus, wherein the image capturing apparatus is coupled to the wafer stage and is configured to capture an image of a surface of the hood unit proximate the wafer stage, and wherein the scattering light detection apparatus is proximate the end of the lens unit and the hood unit and is configured to detect particles on a surface of the wafer stage.12-18-2008
20110063589Exposure apparatus and method for manufacturing device - An exposure apparatus which exposes a substrate by projecting an image of a pattern, via an projection optical system and a liquid of a liquid immersion area formed on the substrate, onto the substrate, includes a liquid supply mechanism having supply ports for supplying the liquid on both sides of a projection area respectively and capable of simultaneously supplying the liquid from the supply ports, the image of the pattern being projected onto the projection area. The liquid supply mechanism supplies the liquid from only one of the supply ports disposed on the both sides when the mechanism starts to supply the liquid. The liquid may be supplied while moving an object such as a substrate placed to face the projection optical system. Accordingly, an optical path space on the image side of the projection optical system can be filled with the liquid quickly while suppressing formation of air bubbles.03-17-2011
20110063590OPTICAL ELEMENT MODULE - An optical element module comprising a plurality of module components is provided. The module components comprise an optical element, an optical element holder and a contact element. The optical element has a first coefficient of thermal expansion. The optical element holder holds the optical element via the first contact element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being different from the first coefficient of thermal expansion. At least one of the module components is adapted to provide at least a reduction of forces introduced into the optical element upon a thermally induced position change in the relative position between the optical element and the optical element holder, the position change resulting from a temperature situation variation in a temperature situation of the plurality of module components.03-17-2011
20110317137LITHOGRAPHIC APPARATUS AND LITHOGRAPHIC APPARATUS COOLING METHOD - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a cooling system to cool a part of the lithographic apparatus with increased cooling capabilities to reduce the heat transfer from the part to other parts of the apparatus.12-29-2011
20110317136Inspection Apparatus Employing Wide Angle Objective Lens With Optical Window - An optical window is used to facilitate best performance for imaging an object placed in a separate ambiance. The window can be in a particle detection system, comprising a separator between first and second environments. The separator comprises an opening and an optical element located within the opening. An object is located in the second environment. An objective lens is located in the first environment and a detector is located in the second environment and is configured to detect particles on a surface of the object.12-29-2011
20110317139EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance mixed into the liquid in the supply passage is set to be not greater than a predetermined value.12-29-2011
20110317138LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.12-29-2011
20120044468LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.02-23-2012
20120057139Cleaning method, device manufacturing method, cleaning substrate, liquid immersion member, liquid immersion exposure apparatus, and dummy substrate - A cleaning substrate and a liquid immersion member face each other in order to clean the liquid immersion member. The cleaning substrate has a first liquid-repellent portion which is liquid-repellent to a first cleaning liquid for cleaning and a lyophilic portion which is disposed in at least a part of the periphery of the first liquid-repellent portion and is more lyophilic than the first liquid-repellent portion.03-08-2012
20120002181EXPOSURE CONTROL SYSTEM AND EXPOSURE CONTROL METHOD - According to one embodiment, an exposure control system includes an overlap judgment unit that judges whether a position of a foreign matter that adheres to a back surface of a photomask overlaps a position of a chuck that holds the photomask when the photomask is held by the chuck, and an exposure decision unit that decides to hold the photomask by the chuck and perform exposure, when it has been determined that the position of the foreign matter does not overlap the position of the chuck.01-05-2012
20090073396Lithographic apparatus and device manufacturing method - A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.03-19-2009
20120008118LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.01-12-2012
20120008114LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.01-12-2012
20120008117LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.01-12-2012
20120008116LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.01-12-2012
20120008115LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed wherein a liquid supply system is configured to at least partly fill a region between a substrate and a projection system of the lithographic apparatus with a liquid and having a liquid confinement structure fixed in a plane substantially perpendicular to an optical axis of the projection system and configured to cooperate with a substrate table configured to hold the substrate in order to restrict the liquid to a region above an upper surface of the substrate table so that a side of the substrate to be exposed is substantially covered in the liquid during exposure.01-12-2012
20120008113LITHOGRAPHIC APPARATUS, CONTROL SYSTEM AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.01-12-2012
20120008112Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid - An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.01-12-2012
20120013865LITHOGRAPHIC APPARATUS AND METHOD - A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.01-19-2012
20120013872LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.01-19-2012
20120013874LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.01-19-2012
20120013873LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.01-19-2012
20120013870LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.01-19-2012
20120013868LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF01-19-2012
20120013866LITHOGRAPHIC APPARATUS, FLUID COMBINING UNIT AND DEVICE MANUFACTURING METHOD - A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.01-19-2012
20120013861Apparatus and method for providing fluid for immersion lithography - An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.01-19-2012
20120013860Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.01-19-2012
20120013871LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.01-19-2012
20120013864LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and around an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprising: a first member, which has a recovery port that recovers at least some of the liquid from a space above the object; a recovery passageway, wherein the liquid recovered via the recovery port flows; a second member, which faces the recovery passageway and has a first discharge port that is for discharging the liquid from the recovery passageway; and a third member, which faces the recovery passageway and has a second discharge port that is for discharging a gas from the recovery passageway. The second member comprises a first portion and a second portion, which is disposed at a position higher than the first portion is and is capable of discharging a greater amount of the liquid than the first portion is.01-19-2012
20120013863LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member is disposed inside an immersion exposure apparatus and at least partly around an optical member and an optical path of exposure light that passes through a liquid between the optical member and an object. The liquid immersion member comprises: a first member, which has a recovery port that recovers at least some of the liquid from the space above the object; a recovery passageway, wherethrough the liquid recovered via the recovery port flows; a discharge part, which has a first discharge port for discharging the liquid from the recovery passageway and a second discharge port for discharging a gas from the recovery passageway, that separately discharges the liquid and the gas from the recovery passageway; and a hindering part, which hinders the liquid in the recovery passageway from contacting the second discharge port.01-19-2012
20120154771IMMERSION MULTIPLE-EXPOSURE METHOD AND IMMERSION EXPOSURE SYSTEM FOR SEPARATELY PERFORMING MULTIPLE EXPOSURE OF MICROPATTERNS AND NON-MICROPATTERNS - This invention discloses an immersion multiple-exposure method including a first exposure step of performing, using a first mask, immersion exposure of a photoresist film formed on a substrate, a cleaning step of clearing the surface of the substrate, and a second exposure step of performing immersion exposure of the photoresist film using a second mask. No heating process is performed between the first exposure step and the second exposure step.06-21-2012
20120026474Reticle Cooling in a Lithographic Apparatus - An apparatus and method reduce temperature variation across a reticle so as to reduce the expansion variation of the reticle. One method for realizing reduced temperature variation is to fill an inner space with backfill gas under pressure, using distribution trenches and walls (e.g., flow restriction dams), rather than providing uniform backfill gas pressure across the entire reticle. In another method, the perimeter of inner space can be chosen to reduce the expansion variation across the reticle based on the functional relationship between expansion and temperature for the reticle material. In an optional or alternative approach, reduced temperature variation across the reticle can be obtained by selectively filling cavities in the interior of the fluid cooled chuck with backfill gas.02-02-2012
20120026475Exposure apparatus, exposure method, and device producing method - An exposure apparatus EX is provided with a measuring unit 02-02-2012
20130010271APPARATUS AND METHODS FOR RECOVERING FLUID IN IMMERSION LITHOGRAPHY - An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.01-10-2013
20130010270LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.01-10-2013
20120062861EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes an immersion space forming member (03-15-2012
20120062860EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate with exposure light via a liquid. The exposure apparatus includes an optical system including an emission surface from which the exposure light is emitted; a liquid supply port that supplies the liquid in order to fill an optical path of the exposure light emitted from the emission surface with the liquid; and a fluid supply port that supplies a fluid including a material capable of changing the specific resistance of the liquid to at least a part of a space around a liquid immersion space that is formed by the liquid.03-15-2012
20120062859POLISHING DEVICE, POLISHING METHOD, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes a projection optical system and a liquid supply device. The projection optical system includes an image plane side optical member, which is arranged in an optical path of exposure light, and a lens barrel, which supports the image plane side optical member. The liquid supply device polishes the image plane side optical member in a state supported by the lens barrel to change the shape of the image plane side optical member.03-15-2012
20120062858CLEANING METHOD, DEVICE MANUFACTURING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING SYSTEM - A cleaning method comprises: cleaning the liquid contact member by supplying a first liquid for cleaning to the liquid contact member; recovering the first liquid supplied to the liquid contact member; supplying a second liquid different from the first liquid to the liquid contact member after the liquid contact member is cleaned with the first liquid; recovering the second liquid supplied to the liquid contact member; and performing a process in which a concentration of the first liquid comprised in the recovered second liquid is set to a predetermined concentration or less.03-15-2012
20110090473LITHOGRAPHIC APPARATUS - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.04-21-2011
20090135384SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a substrate holding stage to hold a substrate having a surface facing up, the substrate having an exposed and developed resist pattern over the surface, a rotation driving mechanism to rotate the substrate holding stage around a vertical axis, a solvent vapor discharge nozzle having a discharge hole capable of discharging solvent vapor to swell the resist pattern onto the surface of the substrate and a vacuum opening capable of absorbing the solvent vapor discharged from the discharge hole, and a moving mechanism to move the solvent vapor discharge nozzle from an edge to a center of the substrate. The substrate is rotated around the vertical axis while moving the solvent vapor discharge nozzle from the edge to the center of the substrate, discharging the solvent vapor from the discharge hole, to supply the solvent vapor over the substrate in a spiral manner.05-28-2009
20090135386Illumination optical apparatus, exposure apparatus, and method for producing device - An illumination optical apparatus which illuminates an illumination objective surface with an exposure light includes: an illumination optical system having a curved mirror and a concave mirror and defining a position substantially conjugate with the illumination objective surface between the curved and concave mirrors; and a second aperture plate separating a space in which the curved mirror is arranged and a space in which the concave mirror is arranged into mutually different vacuum environments or pressure-reduced environments, and having an aperture through which the exposure light passes, the aperture being arranged at a position at which a cross-sectional area of the exposure light is smallest, or in the vicinity of the position. It is possible to decrease the amount of passage of minute particles such as debris in relation to any downstream-side optical system.05-28-2009
20090135385OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION - An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.05-28-2009
20090135383EXPOSURE APPARATUS - An exposure apparatus including a moving member movable with a substrate, an interferometer configured to measure a position of the moving member, a blower device for blowing temperature-conditioned air, a plurality of supply openings communicating with the blower device, and a flow rate adjusting device configured to adjust a gas flow rate blown through the plurality of supply openings based on an operation of the moving member.05-28-2009
20090135382Exposure method, exposure apparatus, and method for producing device - An exposure method includes a first step filling a liquid in a predetermined optical path space for exposure light (EL) in an optical system (PL), or for exchanging the liquid (LQ) filled in the space; a second step for successively exposing a predetermined number of substrates (P) through the liquid (LQ) filled in the optical path space or through the exchanged liquid; and a third step for judging, after the completion of the second step and based on an elapsed time elapsed after the first step, whether or not to exchange the liquid (LQ) filled in the optical path space. Exposure processing and measurement processing can be satisfactorily performed by making the liquid filled in the optical path space held in a desired state.05-28-2009
20110090474LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.04-21-2011
20110090472FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.04-21-2011
20120120378COMPONENT OF AN EUV OR UV LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING IT - To improve the bonding of two parts (05-17-2012
20120162621LITHOGRAPHIC APPARATUS AND REMOVABLE MEMBER - A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus having a first object and a planar member mounted on the first object to improve thermal transfer to/from a second object.06-28-2012
20120162620Lithographic Apparatus and Method of Modifying a Beam of Radiation Within a Lithographic Apparatus - A lithographic apparatus comprises a beam modifying apparatus mounted in the path of a beam of radiation. The beam modifying apparatus comprises a conduit configured to allow the flow of a fluid through it, the conduit being arranged such that, in use, the beam of radiation passes through the conduit and the fluid flowing through it. The beam modifying apparatus further comprises a heat exchanger in thermal communication with a portion of the conduit located upstream, having regard to the direction of the fluid flow, of the location at which the beam of radiation passes through the conduit.06-28-2012
20100290015EX-SITU REMOVAL OF DEPOSITION ON AN OPTICAL ELEMENT - A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.11-18-2010
20100290014Supporting plate, stage device, exposure apparatus, and exposure method - An exposure apparatus and method exposes, using an optical member, a pattern of a mask onto a substrate that is located on a substrate stage which is movable over a supporting plate. A liquid is provided between the optical member and the substrate, Fluid is sprayed toward the supporting plate to remove liquid from the supporting plate.11-18-2010
20100290013Immersion Lithographic Apparatus and a Device Manufacturing Method - An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.11-18-2010
20120127441LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.05-24-2012
20120127440OPTICAL ASSEMBLY FOR PROJECTION LITHOGRAPHY - An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent component. An excitation light source is used to produce fluorescence excitation light. An excitation optical system is used to guide the fluorescence excitation light to the fluorescent component of the substrate. The optical assembly also has a fluorescent light detector and a fluorescence optical system for guiding fluorescent light to the fluorescent light detector. The fluorescent light is produced via fluorescence of the fluorescent component upon irradiation with fluorescence excitation light. The optical assembly can detect a temperature or temperature distribution of the substrate of the optical component with a high degree of precision.05-24-2012
20110181852MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible to modify the alignment of the respective mirror relative to the base body. Mutually opposing surfaces of the mirror and of the base body, or of a mirror support body connected to it, are designed as corresponding glide surfaces of a sliding bearing.07-28-2011
20110181851TEMPERATURE-CONTROL DEVICE FOR AN OPTICAL ASSEMBLY - A temperature-control device is used for controlling the temperature of an optical assembly with at least one optical body, the temperature of which is to be controlled, with at least one optical surface which can be acted upon by a heat flow. The temperature-control device has a heat sink to receive a heat flow, which is emitted by the optical body or a transmission body which is in thermal connection with the optical body. The heat sink is arranged adjacent to a peripheral region of the optical surface. The temperature-control device has a heating mechanism with at least one heating body, which is arranged adjacent to the optical body. The heating body is connected via a physical heat bridge to the heat sink.07-28-2011
20110181850ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An illumination system of a microlithographic projection exposure apparatus includes a primary light source, a system pupil surface and a mirror array. The mirror array is arranged between the primary light source and the system pupil surface. The mirror array includes a plurality of adaptive mirror elements. Each mirror element includes a mirror support and a reflective coating. Each mirror element is configured to direct light produced by the primary light source towards the system pupil surface. The mirror elements can be tiltably mounted with respect to a support structure. The mirror elements include structures having a different coefficient of thermal expansion and being fixedly attached to one another. A temperature control device is configured to variably modify the temperature distribution within the structures to change the shape of the mirror elements.07-28-2011
20110181849 LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.07-28-2011
20110181848EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CONTAMINATION CAPTOR - The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.07-28-2011
20120133913ADJUSTMENT METHOD, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS, EXPOSURE APPARATUS, INSPECTION APPARATUS, MEASUREMENT AND/OR INSPECTION SYSTEM, PROCESSING APPARATUS, COMPUTER SYSTEM, PROGRAM AND INFORMATION RECORDING MEDIUM - When a host issues an analysis order that specifically instructs the analytical contents to an analytical apparatus (step 05-31-2012
20120133912LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD - A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.05-31-2012
20090059192Lithographic apparatus and device manufacturing method - A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.03-05-2009
20090059189PELLICLE FOR USE IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS - A pellicle for use in microlithographic exposure apparatus (03-05-2009
20090059191SUPPORT PLATE, EXPOSURE APPARATUS HAVING THE SUPPORT PLATE, AND A DEVICE MANUFACTURING METHOD USING THE EXPOSURE APPARATUS - An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.03-05-2009
20090059190MOVABLE BODY APPARATUS, EXPOSURE APPARATUS AND OPTICAL SYSTEM UNIT, AND DEVICE MANUFACTURING METHOD - The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.03-05-2009
20120212713LITHOGRAPHIC APPARATUS AND METHOD HAVING SUBSTRATE AND SENSOR TABLES - A lithographic apparatus includes a substrate table capable of holding a substrate, a projection system that projects a patterned beam of radiation onto the substrate held by the substrate table, and a sensor table that is not capable of holding a substrate but that includes a sensor capable of sensing a property of the patterned beam of radiation. In addition, a first positioning system is connected to the substrate table and displaces the substrate table into and out of a path of the patterned beam of radiation, and a second positioning system is capable of positioning the sensor table into the path of the patterned beam of radiation when the substrate table is displaced out of the path of the patterned beam of radiation.08-23-2012
20120176589EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus is provided with a projection optical system, and the projection optical system includes a first optical element disposed most closely to an image plane of the projection optical system. The exposure apparatus includes a first liquid immersion mechanism which forms a first liquid immersion area of a first liquid between the first optical element and an upper surface of a transparent member provided on a side of the image plane of the projection optical system, and an observation unit which observes a state of the first liquid immersion area. It is possible to grasp the state of the liquid immersion area of the liquid, thereby executing optimum liquid immersion exposure.07-12-2012
20120176588Immersion Lithography Apparatus and Tank Thereof - A tank for an immersion lithography apparatus provided. The tank has a container with a bottom plate and side plates connected to each, wherein the side plates surround and connect all edges of the bottom plate. The container is filled in at least a liquid having a refractive index thereof from about 1.4 to about 1.8. A platform is located in the container and immersed in the liquid. The platform has an axle fastened on a side thereof parallel to the bottom plate, wherein the axle passes through a bearing hole penetrated through one of the side plates. A roller disposed outside the container connects to the axle to rotate the axle, and furthermore, to incline the platform accordingly.07-12-2012
20120314193EXPOSURE APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS ADJUSTMENT METHOD AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.12-13-2012
20120257181SUBSTRATE TREATMENT DEVICE - A single-wafer substrate processing device is provided which does not spill a processing liquid and the vapors thereof to an exterior when directly supplying the process liquid to a surface of a substrate to process the substrate and which prevents the process liquid and the vapors, etc., thereof to adhere a ceiling, etc., of a housing. The device includes a housing 10-11-2012
20090021706Immersion fluid containment system and method for immersion lithogtraphy - A ferrofluid is provided adjacent to the immersion area between a projection optical system (PL) and substrate and receives a magnetic force so as to form a ferrofluidic seal (01-22-2009
20090021707Lithographic apparatus and device manufacturing method - An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.01-22-2009
20120257180METHOD OF CLEANING PIPE OF IMMERSION EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - A method of cleaning a supply pipe of an immersion exposure apparatus includes a cycle including a step of increasing a flow rate of a cleaning liquid via a supply pipe, which supplies a liquid to a gap between a substrate and a final surface of a projection optical system, and a step of decreasing the flow rate, wherein the cycle is executed a plurality of times after one of completion of one of setting and maintenance of the immersion exposure apparatus and completion of exposure of at least one substrate, and before exposure of a first shot region on a new substrate using the immersion exposure apparatus.10-11-2012
20120257179APPARATUS AND METHODS TO RECOVER LIQUID IN IMMERSION LITHOGRAPHY - Methods and apparatus remove liquid from a surface of a substrate, a substrate table, or both, by applying a vacuum to a passage having first and second opposite ends while the first end is in contact with or close to the liquid. This causes the liquid to flow into the first end of the passage as part of a gas/liquid mixture. At least part of the passage between the first and second ends contacts a porous member. The liquid of the gas/liquid mixture is absorbed into the porous member such that substantially only gas is present at the second end of the passage. Thus, substantially only gas flows towards a vacuum source of the vacuum. A second vacuum may be applied to a collection chamber that contacts the porous member to draw the liquid of the gas/liquid mixture from the passage through the porous member and into the collection chamber.10-11-2012
20120257178LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.10-11-2012
20120257177ILLUMINATION DESIGN FOR LENS HEATING MITIGATION - A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design, obtaining a lens response characterization according to the heat load locations, and utilizing the heat load locations and the lens response characterization to generate a lens heating sensitivity map.10-11-2012
20120262684ENVIRONMENTAL SYSTEM INCLUDING VACUUM SCAVENGE FOR AN IMMERSION LITHOGRAPHY APPARATUS - A liquid immersion lithography apparatus exposes a wafer through a liquid in a space under a lens. The apparatus includes a containment member provided such that the containment member surrounds the space under the lens, and a seal member provided between the lens and the containment member. The containment member has a first fluid inlet. The first fluid inlet removes fluid from a gap between the containment member and the wafer during the exposure.10-18-2012
20120262683EXPOSING METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD - An exposure apparatus comprises: a first detection apparatus, which detects the temperature of a liquid after the liquid contacts a prescribed object; and a processing apparatus that detects the relationship between the temperature of the liquid and the temperature of the object based on the detection result of the first detection apparatus.10-18-2012
20120229783LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.09-13-2012
20120229782LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.09-13-2012
20080304027Cooling apparatus and substrate treating apparatus - The object of the present invention is to provide a cooling apparatus which makes it possible to cool a substrate uniformly in a short period of time even if the substrate has a large area. The cooling apparatus 12-11-2008
20110122377Projection exposure apparatus, projection exposure method, and method for producing device - A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.05-26-2011
20100328635Pellicle - There is provided a pellicle having a rectangular pellicle frame formed of four side bars, having a through hole made through at least one of the frame bars for adjusting a pressure of a space formed within the pellicle frame equal to a pressure outside the pellicle frame; and a filter member disposed to cover up an external opening of the through hole for preventing entrance of particles into the space, wherein the through hole is formed with: 12-30-2010
20100328634LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.12-30-2010
20080297744Lithographic apparatus and device manufacturing method - An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.12-04-2008
20080297746Exposure method, exposure apparatus, and method for producing device - A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.12-04-2008
20080297745PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY - In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.12-04-2008
20120320350EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD - An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.12-20-2012
20120320351IMMERSION LITHOGRAPHY SYSTEM USING A SEALED WAFER BATH - Immersion lithography system and method using a sealed wafer bottom are described. One embodiment is an immersion lithography apparatus comprising a lens assembly comprising an imaging lens and a wafer stage for retaining a wafer beneath the lens assembly, the wafer stage comprising a seal ring disposed on a seal ring frame along a top edge of the wafer retained on the wafer stage, the seal ring for sealing a gap between an edge of the wafer and the wafer stage. The embodiment further includes a fluid tank for retaining immersion fluid, the fluid tank situated with respect to the wafer stage for enabling full immersion of the wafer retained on the wafer stage in the immersion fluid and a cover disposed over at least a portion of the fluid tank for providing a temperature-controlled, fluid-rich environment within the fluid tank; and12-20-2012
20110222030IMMERSION LITHOGRAPHIC APPARATUSES - Apparatuses for specially designed gradient immersion lithography are presented. The gradient immersion lithographic apparatus includes a radiation system providing a patterned beam of radiation, a substrate table with a substrate structure held thereon, a projection system with an optical lens element arranged to project the patterned beam of radiation onto the substrate structure, multiple layers of media of gases, liquids, or liquid crystals partitioned by moveable plates arranged in sequence between the projection system and the substrate structure, and a controller for displacement of the moveable plates to adjust relative thicknesses of the multiple layers of media.09-15-2011
20100245789EXPOSURE APPARATUS - An exposure apparatus (09-30-2010
20110235008LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate.09-29-2011
20110235007Environmental system including a transport region for an immersion lithography apparatus - A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.09-29-2011
20110235006Exposure apparatus, exposure method, method for manufacturing device - An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.09-29-2011
20120086925METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM - A method for preventing contaminating gaseous substances (04-12-2012
20100097587LITHOGRAPHIC APPARATUS AND A METHOD OF REMOVING CONTAMINATION - A lithographic apparatus includes a fluid supply system configured to provide a cleaning fluid to a surface to be cleaned. The cleaning fluid includes from 25 to 98.99 wt % water; from 1 to 74.99 wt % solvent selected from one or more glycol ethers, esters, alcohols and ketones; and from 0.01 to 5 wt % surfactant.04-22-2010
20120327381Radiation Source, Lithographic Apparatus and Device Manufacturing Method - A radiation source for generating extreme ultraviolet radiation for a lithographic apparatus has a debris mitigation device comprising a nozzle arranged at or near an intermediate focus (IF) of the beam of radiation. The nozzle serves to direct a flow of gas (12-27-2012
20110292359CLEANING DEVICE AND A LITHOGRAPHIC APPARATUS CLEANING METHOD - A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.12-01-2011
20100134769LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.06-03-2010
20130016328DISPERSING IMMERSION LIQUID FOR HIGH RESOLUTION IMAGING AND LITHOGRAPHY - Methods and apparatus are described for delivering index-matching immersion liquid in high numerical-aperture optical microscopy and lithography. An array of immersion liquid droplets is delivered to a specimen substrate or specimen substrate cover by an immersion liquid printing apparatus. An immersion liquid reservoir provides immersion liquid to the printer by a precision pump. The printer delivers immersion liquid to the substrate or substrate cover in arrays of immersion liquid droplets of defined volumes and array patterns. The volumes and patterns of array droplets delivered to the substrate or substrate cover are optimized to maintain adequate immersion liquid between the substrate or substrate cover and an immersion objective while avoiding the formation of air bubbles in the immersion liquid and the accumulation of excess volumes of immersion liquid.01-17-2013
20110157568LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A manifold is provided between an outlet of a fluid supply system for an immersion lithographic apparatus and a separator. The manifold is provided with a pressure sensor which passes the measured pressure in the manifold to a mass flow controller. The mass flow controller controls a leak flow into the manifold based on the measured pressure in the manifold so as to maintain a desired pressure in the manifold.06-30-2011
20110157567LIQUID IMMERSION SCANNING EXPOSURE SYSTEM USING AN IMMERSION LIQUID CONFINED WITHIN A LENS HOOD - A liquid immersion scanning exposure system utilizes an immersion liquid confined within a watertight lens hood having a base portion formed from a solid optical element. During operation, a bottom portion of a lens assembly is disposed within the immersion liquid and the solid optical element is placed upon a photoresist material or layer (to be patterned). The lens assembly moves laterally through the immersion liquid parallel to the photoresist material. Because the solid optical element separates the immersion liquid from the photoresist material and does not move relative to the photoresist material, the photoresist material does not contact with the immersion liquid and the solid optical element and is not susceptible to damage or scratching by the solid optical element.06-30-2011
20080252864IMMERSION EXPOSURE TECHNIQUE - An exposure apparatus which has a projection optical system and exposes a substrate to a pattern of an original via the projection optical system with a gap between the projection optical system and the substrate filled with liquid. The apparatus includes a supply nozzle having a supply port to supply the liquid to the gap through the supply port, the supply port arranged on a first opposite surface to an exposed surface of the substrate, a recovery nozzle having a recovery port to recover the liquid through the recovery port, arranged more distant than the supply port from a final surface of the projection optical system, the recovery port arranged so as to oppose the exposed surface of the substrate, and a stepped portion having a second opposite surface to the exposed surface of the substrate. A distance between the second opposite surface and the exposed surface of the substrate is different from a distance between the first opposite surface and the exposured surface of the substrate.10-16-2008
20080246930Exposure Apparatus and Device Manufacturing Method - An exposure apparatus for exposing a substrate through a reticle. The apparatus includes a chamber in which an exposure process is to be carried out, a circulation system configured to circulate a gas through the chamber, a supplying system configured to supply water, supplied from a facility, to a heat source inside the exposure apparatus, and a heat exchanger configured to perform heat exchange between a gas discharged out of the chamber by the circulation system and the water to be supplied to the heat source by the supplying system.10-09-2008
20100091255LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.04-15-2010
20080239258Residual Pupil Asymmetry Compensator for a Lithography Scanner - A uniformity correction system may be used as an actuator for the correction of asymmetry scan-integrated illumination pupil fill that varies in the non-scanning direction of a lithography system. Instead of minimizing asymmetric opaque element insertion, opaque elements are inserted into an illumination beam to introduce an additional pupil asymmetry into the illumination beam. The compensating pupil asymmetry substantially nulls the original pupil asymmetry. To introduce the pupil asymmetry, a first opaque element can be moved into or out of the illumination beam in tandem with a second, opposing opaque element. Iterative feedback of both uniformity and pupil asymmetry ensure that both are substantially simultaneously optimized.10-02-2008
20080231825Exposure Apparatus and method for producing device - An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.09-25-2008
20080231823Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus - A stage assembly includes a workpiece table that supports the workpiece adjacent to an optical assembly. An environmental system supplies and removes immersion liquid to and from a space between the workpiece and the optical assembly to form an immersion area. The environmental system has a lower surface disposed opposite from an upper surface of the workpiece and/or the workpiece table. The lower surface is spaced a first distance from the workpiece and/or the workpiece table to form a meniscus at a periphery of the immersion area. An edge member is provided on the environmental system and extends past the lower surface of the environmental system so that a lower portion of the edge member is spaced a second distance, smaller than the first distance, from the upper surface of the workpiece and/or the workpiece table at a position beyond the periphery of the immersion area.09-25-2008
20080231822Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool - An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.09-25-2008
20080231821Exposure Method Of A Semiconductor Device - An exposure method of a semiconductor device includes the steps of: providing a wafer on which a photoresist is coated; rotating and aligning a reticle and the wafer so that a swing direction of a light source passing through the reticle is identical to a direction of a word line formed on the wafer; and performing an exposure process employing a polarized light source of an X direction, the polarized light source being generated by passing the light source through a dipole X-illumination system09-25-2008
20080231820Contamination prevention system, a lithographic apparatus, a radiation source and a method for manufacturing a device - A contamination prevention system constructed and arranged to prevent material emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The contamination prevention system includes a channel barrier constructed and arranged to traverse the radiation from the radiation source. The channel barrier includes a plurality of elongated channel members constructed and arranged to absorb or deflect the material. The channel members are rotatable around an axis of rotation by a drive connected to the channel barrier. The contamination prevention system also includes a cooling system provided on an outer surface of the channel barrier.09-25-2008
20080225251Immersion optical lithography system having protective optical coating - An immersion lithography system is provided which includes an optical source operable to produce light having a nominal wavelength and an optical imaging system. The optical imaging system has an optical element in an optical path from the optical source to an article to be patterned thereby. The optical element has a face which is adapted to contact a liquid occupying a space between the face and the article. The optical element includes a material which is degradable by the liquid and a protective coating which covers the degradable material at the face for protecting the face from the liquid, the protective coating being transparent to the light, stable when exposed to the light and stable when exposed to the liquid.09-18-2008
20080225250Exposure apparatus and method for producing device - A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.09-18-2008
20080225249Exposure apparatus and method for producing device - An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.09-18-2008
20080225248Apparatus, systems and methods for removing liquid from workpiece during workpiece processing - Apparatus, systems and methods remove liquid from a workpiece. A first station subjects a workpiece to processing that leaves a liquid on a surface of the workpiece. A second station is disposed at a location spaced apart from the first station. A porous member is disposed between the first and second stations. The porous member has a liquid-phyllic surface that faces the workpiece and is spaced from a surface of the workpiece by a gap. The porous member has a length in a direction perpendicular to a movement direction in which the workpiece moves from the first station to the second station, the length being at least as large as a dimension of the workpiece in the direction perpendicular to the movement direction.09-18-2008
20080225247OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES - An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.09-18-2008
20080225246Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine - Apparatus and methods keep immersion liquid in a space adjacent to an optical assembly. An optical assembly projects an image onto a substrate supported adjacent to the optical assembly by a substrate table. An insertion member insertable into the space between the optical assembly and the substrate, the substrate table, or both, divides the immersion liquid into a first portion and a second portion, the first portion disposed between the optical assembly and the insertion member, and the second portion disposed between the insertion member and the substrate, the substrate table, or both. The insertion member keeps the optical assembly in contact with the first portion when the substrate is moved away from being disposed adjacent to the optical assembly.09-18-2008
20080225245EUV debris mitigation filter and method for fabricating semiconductor dies using same - According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combination with an EUV debris mitigation module comprising a combination of conventional debris mitigation techniques. The EUV debris mitigation filter protects collector optics from contamination by undesirable debris produced during EUV light emission, while advantageously providing a high level of EUV light transmittance. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a discharge-produced plasma (DPP) light source. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a laser-produced plasma (LPP) light source.09-18-2008
20080225244Lithographic apparatus and method - A lithographic apparatus includes an illumination system constructed and arranged to condition a beam of radiation, and a support structure constructed and arranged to support a patterning device. The patterning device is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table constructed and arranged to hold a substrate. The substrate table includes a substrate support plate that is in thermal contact with a thermal conditioning plate. The apparatus further includes a projection system constructed and arranged to project the patterned beam of radiation onto a target portion of the substrate.09-18-2008
20130176543OPTOFLUIDIC LITHOGRAPHY SYSTEM, METHOD OF MANUFACTURING TWO-LAYERED MICROFLUID CHANNEL, AND METHOD OF MANUFACTURING THREE-DIMENSIONAL MICROSTRUCTURES - An optofluidic lithography system including a membrane, a microfluidic channel, and a pneumatic chamber is provided. The membrane may be positioned between a pneumatic chamber and a microfluidic channel. The microfluidic channel may have a height corresponding to a displacement of the membrane and have a fluid flowing therein, the fluid being cured by light irradiated from the bottom to form a microstructure. The pneumatic chamber may induce the displacement of the membrane depending on an internal atmospheric pressure thereof.07-11-2013
20130176544Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus - The disclosure concerns an arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus. The mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface. The arrangement is designed for mirror temperature measurement and/or thermal actuation of the mirror via electromagnetic radiation which is propagated along the access passage. The electromagnetic radiation is reflected a plurality of times within the access passage.07-11-2013
20080218711Lithographic apparatus and device manufacturing method - An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.09-11-2008
20080218710EXPOSURE APPARATUS, IMAGE FORMING APPARATUS AND HEATING METHOD - The exposure apparatus is provided with: a substrate; plural light emitting elements that are arranged in a line on a first surface of the substrate; and a heating unit that heats the substrate from the first surface side.09-11-2008
20080218709Removal of deposition on an element of a lithographic apparatus - The invention provides a cleaning process for the removal of deposition on an element of a lithographic apparatus. The method includes (ex situ) treating the element with an alkaline cleaning liquid. In this way, Sn may be removed from a contaminant barrier or a collector mirror. Especially beneficial is the application of a voltages to the element to be cleaned and/or by using complexing agents for improving the dissolution of Sn in the cleaning liquid.09-11-2008
20100085545FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.04-08-2010
20120249982FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure configured to supply immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure, wherein the fluid handling structure has a main body with an undersurface, a moveable member moveable relative to the main body, and a self-regulating mechanism to maintain a gap of a certain size between a bottom surface of the moveable member and the facing surface independent of the size of a gap between the undersurface and the facing surface.10-04-2012
20130114057OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION - An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.05-09-2013
20130094007Device and Method for Drying a Photomask - An object of the present invention is a photomask drying device which includes: a sealed chamber containing at least one photomask, a pumping unit to set up and maintain vacuum within said chamber, a support for the photomask placed within said chamber, infrared radiation means placed within said chamber, a system for injecting gas into said chamber characterized in that the infrared radiation means comprise a plurality of infrared radiation sources distributed in a plane parallel to the plane of the photomask in such a way that the distance from the photomask to the infrared radiation means is given by the relationship: D=1.5×d wherein D is the distance between the plane containing the infrared radiation sources and the photomask and d is the distance between the center points of two neighboring infrared radiation sources, and in that the gas injection system comprises a plurality of gas injectors distributed in a plane parallel to the plane of the photomask in such a way that the injectors follow a 90° rotational invariance about the center point of the photomask.04-18-2013
20130094005SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.04-18-2013
20130114055MASK AND OPTICAL FILTER MANUFACTURING APPARATUS INCLUDING THE SAME - A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.05-09-2013
20130094006SUBSTRATE CONVEYANCE DEVICE AND SUBSTRATE CONVEYANCE METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, DEVICE MANUFACTURING METHOD - A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.04-18-2013
20130100425FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure to confine liquid to a space, the fluid handling structure having, on an undersurface surrounding the space, a liquid supply opening to supply liquid onto an undersurface of the fluid handling structure and, radially inward with respect to the space of the liquid supply opening, a two dimensional array of liquid extraction openings to extract a liquid from the space and to extract liquid on the undersurface from the liquid supply opening.04-25-2013
20130100426METHOD FOR PRODUCING FACET MIRRORS AND PROJECTION EXPOSURE APPARATUS - The disclosure relates to methods for producing mirrors, in particular facet mirrors, and projection exposure apparatuses equipped with the mirrors.04-25-2013
20110267591Apparatus for Method for Immersion Lithography - An apparatus for immersion lithography that includes an imaging lens which has a front surface, a fluid-containing wafer stage for supporting a wafer that has a top surface to be exposed positioned spaced-apart and juxtaposed to the front surface of the imaging lens, and a fluid that has a refractive index between about 1.0 and about 2.0 filling a gap formed in-between the front surface of the imaging lens and the top surface of the wafer. A method for immersion lithography can be carried out by flowing a fluid through a gap formed in-between the front surface of an imaging lens and a top surface of a wafer. The flow rate and temperature of the fluid can be controlled while particulate contaminants are filtered out by a filtering device.11-03-2011
20110267590Dual Containment System for Transporting a Fluid Through a "Rolling Loop" Cable Duct - Disclosed are systems and methods for a fluid transportation system having a first flexible tube with an inner wall. The fluid transportation system also has a second flexible tube with an outer wall. The second tube is located inside the first tube and a standoff is located between the inner wall of the first tube and the outer wall of the second tube. The first flexible tube is configured to transport a first fluid and the second flexible tube is configured to transport a second fluid. The first and second flexible tubes are configured such that the first fluid isolates the second fluid from an ambient environment, and the first fluid can be monitored for leakage.11-03-2011
20130169945EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE - There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.07-04-2013
20130169944EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - An exposure apparatus that exposes a substrate with exposure light through a first liquid. The exposure apparatus includes: an optical member that has an emission surface which emits the exposure light; a first member that forms a first liquid immersion space of the first liquid in at least a part of a first space under the first lower surface and an optical path space including an optical path of the exposure light from the emission surface; and a second member that forms a second liquid immersion space of a second liquid, the second member being capable of moving in a state where the second liquid immersion space is formed separated from the first liquid immersion space.07-04-2013
20130120723EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS - A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.05-16-2013
20130128245Exposure Apparatus and Device Manufacturing Method - An exposure apparatus which prevents the damage due to the liquid having flowed out from spreading and enables satisfactory performances of the exposure processes and the measurement processes is provided. An exposure apparatus (EX) includes a movable table (PT), a base member (05-23-2013
20130128244Exposure Apparatus and Device Manufacturing Method Having Lower Scanning Speed to Expose Peripheral Shot Area - An exposure apparatus includes a substrate stage having a substrate holder to hold a substrate, a gap being formed between an edge of the held substrate and a surface surrounding the held substrate, and a controller that controls an exposure operation in which shot areas of the substrate are exposed sequentially and respectively with an image through liquid of a liquid immersion area which covers a portion of an upper surface of the substrate. The controller moves the substrate stage at a first speed to expose one of the shot areas to the image through the liquid, moves the substrate stage at a second speed, that is lower than the first speed, to expose another one of the shot areas to the image through the liquid, and during the exposing of the another one of the shot areas, the liquid immersion area is formed over a portion of the gap.05-23-2013
20130135594LIQUID IMMERSION MEMBER, IMMERSION EXPOSURE APPARATUS, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, PROGRAM, AND RECORDING MEDIUM - A liquid immersion member including: a first member provided in at least a portion of the surrounding of an optical member, including a first lower surface which can face an object facing the emission surface, and that forms a first immersion space of a first liquid in an optical path space on an emission surface side and at least a portion of a first space on a first lower surface side; a second member provided outside the first member with respect to the optical path, including a second lower surface which can face the object, and that forms a second immersion space of a second liquid in at least a portion of a second space on a second lower surface side; and a third member that restricts the movement of the first liquid from the first to the second space.05-30-2013
20130135597EXPOSURE APPARATUS, METHOD FOR PRODUCING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS - A liquid immersion exposure apparatus includes a movable member having a substrate holder and a surface disposed adjacent to the substrate holder, the surface capable of positioning under a projection optical system. A liquid immersion system has a supply path and a recovery path. The liquid immersion system supplies the liquid to a space between the projection optical system and the surface via the supply path and recovers the supplied liquid of a liquid immersion area formed under the projection optical system via the recovery path. A controller stops a supply of the liquid to the space under the projection optical system by the liquid immersion system on receipt of a signal indicating the occurrence of an abnormality. The abnormality causes a possibility of leakage due to at least a part of the supplied liquid not being recovered via the recovery path and outflowing from the liquid immersion area.05-30-2013
20130141701EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.06-06-2013
20130141703EXPOSURE METHOD, SUBSTRATE STAGE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.06-06-2013
20110216292LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS - A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.09-08-2011
20130128243TEMPERATURE BALANCING DEVICE OF PROJECTION OBJECTIVE OF LITHOGRAPHY MACHINE AND METHOD THEREOF - The invention provides a temperature balancing device for a projection objective of a lithography machine. The device comprises at least one temperature sensor, at least one heat-absorbing light-transmitting layer and an objective temperature balancing control unit, wherein the temperature sensor is disposed adjacent to the projection objective for sensing the temperature difference of the projection objective in different areas; the heat-absorbing light-transmitting layer is positioned below the projection objective for absorbing radiation energy in the laser beams transmitted from the lithography machine and transmitting the laser beams; and the objective temperature balancing control unit is used for controlling the absorption degree and light transmission degree of the heat-absorbing light-transmitting layer according to the temperature difference sensed by the temperature sensor. The invention also discloses a method for balancing temperature of a projection objective of a lithography machine.05-23-2013
20110273683LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.11-10-2011
20110273682Lithographic Apparatus and Thermal Optical Manipulator Control Method - A control method is provided for controlling a heating of a thermal optical element, the thermal optical element having a matrix of heater elements. The method includes stabilizing a nominal temperature of the thermal optical element with a feedback loop to control the heating of heater elements; providing a desired temperature profile of the thermal optical element by a set point signal; determining a feedforward control of the heater elements from the set point signal; and forwardly feeding an output of the feedforward control into the feedback loop.11-10-2011
20110273681VACUUM SYSTEM FOR IMMERSION PHOTOLITHOGRAPHY - A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The pumping arrangement comprises a first pump for extracting gas from the tank, and a second pump for extracting liquid from the tank. In order to minimize any pressure fluctuations transmitted from the vacuum system back to the fluid within the tool, a pressure control system maintains a substantially constant pressure in the tank by regulating the amounts of liquid and gas within the tank.11-10-2011
20110273680IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES - A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.11-10-2011
20110273679LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having a table including a target and/or a sensor and a liquid displacing device to displace liquid from the target and/or sensor using a localized gas flow is disclosed. The liquid displacement device may be positioned at various positions, e.g. mounted to a liquid handling device at an exposure station, adjacent or in a transfer path between the exposure station and a measurement station, at a load/unload station or adjacent a sensor.11-10-2011
20110273678LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.11-10-2011
20110273677LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.11-10-2011
20110273676IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES - A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.11-10-2011
20110273675LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.11-10-2011
20110211180OPTICAL COMPONENT HAVING AN IMPROVED TRANSIENT THERMAL BEHAVIOR AND METHOD FOR IMPROVING THE TRANSIENT THERMAL BEHAVIOR OF AN OPTICAL COMPONENT - An optical component includes an optical element, a mount for the optical element, and a temperature control device configured to control a temperature of a part of the mount based on at least one parameter selected from the group consisting of a coefficient of expansion of a substrate of the optical element, and a coefficient of expansion of a material of the mount.09-01-2011
20110211179DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS - An EUV (extreme ultraviolet) lithography apparatus (09-01-2011
20080198348Apparatus and methods for minimizing force variation from immersion liquid in lithography systems - A lithographic projection apparatus includes an optical assembly that projects an image onto a workpiece, and a containment member disposed adjacent to a lower end of the optical assembly. The containment member has an aperture through which an exposure beam passes from the optical assembly to the workpiece. The lithographic projection apparatus also includes a stage assembly including a workpiece table that supports the workpiece adjacent to the containment member. A space between the containment member and the workpiece is filled with an immersion liquid. The lithographic projection apparatus further includes a liquid collection system that has a recess in the workpiece table that receives immersion liquid that overflows the space between the containment member and the workpiece. At least part of the recess is disposed radially outward of the workpiece. The recess is partially filled with a porous material.08-21-2008
20080198347IMMERSION EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An immersion exposure apparatus for exposing a substrate via liquid is disclosed. The apparatus comprises a projection optical system configured to project an image of a pattern of a reticle onto the substrate, a first recovery nozzle arranged at a periphery of a final optical element of the projection optical system and configured to recover liquid from a gap between the final optical element and the substrate, and a detector configured to detect a foreign particle in the liquid recovered via the first recovery nozzle.08-21-2008
20080198346EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE - An exposure apparatus, exposing a substrate via liquid, includes a projection optical system that projects a pattern of an original onto the substrate and a substrate stage that holds and moves the substrate. The substrate stage includes a chuck that holds the substrate, a top plate that surrounds the substrate held by the chuck, and a draining mechanism that drains liquid on the top plate. The top plate has a first area and a second area on the surface of the top plate. At least part of the first area is formed between the substrate held by the chuck and the second area. The contact angle of the first area with the liquid is smaller than the contact angle of the second area with the liquid. The draining mechanism drains liquid on the first area.08-21-2008
20080198345EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE - An exposure apparatus having a stage configured to hold a substrate and to be moved, and a projection optical system configured to project light from a reticle to the substrate held by the stage, and exposing the substrate to light via liquid filled in a gap between the substrate and a final surface of the projection optical system is disclosed. The apparatus comprises a first nozzle configured to supply liquid to the gap; a second nozzle configured to selectively perform recovery of liquid from the gap and supply of liquid to a gap between the stage and the final surface of the projection optical system; and a third nozzle configured to recover liquid supplied via at least the second nozzle.08-21-2008
20080198344Lithographic apparatus and method of removing liquid - A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the-substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.08-21-2008
20080198343Systems and methods for insitu lens cleaning in immersion lithography - An immersion lithography apparatus is provided that includes an energy source, a projection optical system, a stage, a showerhead including an immersion liquid supply device and an immersion liquid discharge device that produces a flow of liquid within an exposure zone, and a cleaning device that cleans a portion of the projection optical system having been contacted with the immersion liquid by means of a cleaning gas. In an embodiment, the cleaning device includes a gas supply device and a gas discharge device that produce a flow of cleaning gas into the exposure zone. In embodiments, the apparatus includes a stage that includes a dose sensor and/or an ultra-violet light source. A method for insitu cleaning of a final lens element within an immersion lithography system having an immersion fluid showerhead that provides immersion fluid to an exposure zone of the immersion lithography system is also provided.08-21-2008
20110222035LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.09-15-2011
20110222031LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, LIQUID RECOVERING METHOD, DEVICE FABRICATING METHOD, PROGRAM, AND STORAGE MEDIUM - A liquid immersion member can form an immersion space such that an optical path of exposure light is filled with a liquid. The liquid immersion member comprises: a recovery port, which recovers at least some of the liquid on an object disposed such that it faces an emergent surface wherefrom the exposure light emerges; a recovery passageway, wherein flows the liquid recovered via the recovery port; a first suction port, which faces the recovery passageway and suctions only a gas from the recovery passageway; and a second suction port, which faces the recovery passageway and suctions the liquid from the recovery passageway09-15-2011
20110228241LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.09-22-2011
20110228239LITHOGRAPHIC APPARATUS, AN ILLUMINATION SYSTEM, A PROJECTION SYSTEM AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS - A gas curtain is provided to separate a component of a lithographic apparatus from contaminated gas. The gas curtain is supplied by an opening. The opening is at a boundary of a protection environment with which a surface of the component comes into contact. The gas curtain may separate the component from a moving part of the apparatus.09-22-2011
20130148090EXPOSURE APPARATUS - An exposure apparatus that can prevent disadvantages due to a leaked liquid is provided. The exposure apparatus includes a substrate holder that includes a peripheral wall portion and supporting portions located on an inside of the peripheral wall portion and that supports a substrate with the supporting portions by negatively pressurizing a space surrounded by the peripheral wall portion, and a recovery mechanism that includes a collection inlets provided on the inside of the peripheral wall portion and a vacuum system connected to the collection inlets, in which a liquid penetrated from an outer periphery of the substrate is sucked and recovered, in the state with an upper surface of the peripheral wall portion and a back surface of the substrate being spaced at a first distance.06-13-2013
20130148089APPARATUS AND METHOD FOR PREPARING RELIEF PRINTING FORM - The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.06-13-2013
20100283981IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.11-11-2010
20120274912LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.11-01-2012
20120274911LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.11-01-2012
20100309446LITHOGRAPHY APPARATUS USING EXTREME UV RADIATION AND HAVING A VOLATILE ORGANIC COMPOUNDS SORBING MEMBER COMPRISING A GETTER MATERIAL - A lithography apparatus (12-09-2010
20120281189Evaporative thermal management of grazing incidence collectors for EUV lithography - Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.11-08-2012
20120281190LITHOGRAPHIC APPARATUS AND IN-LINE CLEANING APPARATUS - A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.11-08-2012
20130155382WORK STAGE OF EXPOSING APPARATUS, EXPOSING METHOD AND METHOD OF MANUFACTURING A STRUCTURE - At a time of aligning a thin plate-shaped work of which both front and rear surfaces are subjected to work, a deflection caused at a central portion of the thin plate-shaped work is corrected and the thin plate-shaped work is controlled to be parallel state with respect to a photomask.06-20-2013
20130182231SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY - A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.07-18-2013
20130182233EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - An exposure apparatus is provided which can supply and collect a liquid in a prescribed state, and that can suppress degradation of a pattern image projected onto a substrate. The exposure apparatus is provided with a nozzle member having a supply outlet that supplies a liquid and a collection inlet that collects a liquid, and a vibration isolating mechanism that supports the nozzle member and vibrationally isolates the nozzle member from a lower side step part of a main column .07-18-2013
20090296054IMMERSION LITHOGRAPHY METHOD - An immersion lithography method includes preparing an exposure tool having an exposure stage, a projection lens having an immersion head movable on the stage and used to form an immersion region and an illumination light source provided on the projection lens via a mask, placing a to-be-exposed substrate on the stage, supplying a liquid by use of the immersion head and forming the immersion region disposed between a surface portion of the substrate and a lower end portion of the projection lens, and relatively moving the stage and projection lens while holding the immersion region and exposing a region of the substrate covered with the immersion region. A first distance between the projection lens and the substrate is kept unchanged and a second distance between the immersion head and substrate is changed according to an exposure sequence.12-03-2009
20130188159LIQUID IMMERSION MEMBER, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - A liquid immersion member forms a liquid immersion space between the member and a movable object such that an optical path of exposure light is filled with liquid. The liquid immersion member includes: a first plate that is disposed at least partially around the optical path; a second plate that is disposed at least partially around the optical path, and has an upper surface, opposed to at least a part of a lower surface of the first plate, and a lower surface which can be opposed to the object; and a collection port that is disposed outside the first plate with respect to the optical path, can be at least partially opposed to the object, and collects at least some of the liquid from a first space, which the upper surface of the second plate faces, and a second space which the lower surface of the second plate faces.07-25-2013
20120008119LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.01-12-2012
20120013869LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.01-19-2012
20120013867LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.01-19-2012
20120019792Liquid jet and recovery system for immersion lithography - A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which the liquid is supplied from above the exposure region. A plurality of recovery openings are arranged to surround the exposure region, via which the liquid is collected from above the exposure region. A part of the supply openings are selected so as to supply the liquid ahead of the exposure region in a direction in which the stage moves.01-26-2012
20120026476DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT - A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.02-02-2012
20120044469Exposure method, exposure apparatus, and device manufacturing method - A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.02-23-2012
20130201460EXPOSURE METHOD, EXPOSURE APPARATUS AND CLEANING METHOD - There is provided an exposure method for exposing a substrate by using an immersion exposure apparatus provided with a water-repellent area which has a water repellent film and which is at least a part of an area configured to make contact with a liquid so as to irradiate an exposure light onto the substrate via the liquid, the exposure method including: a measuring step of performing a measurement via the liquid with respect to at least a part of the water-repellent area having the water repellent film; and an exposure step of irradiating the exposure light onto the substrate via the liquid. In the measuring step and/or the exposure step, oxidation-reduction potential of the liquid is controlled to a predetermined value.08-08-2013
20120086929LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a laser cleaning device. The laser cleaning device is constructed and arranged to clean a surface. The laser cleaning device includes a laser source constructed and arranged to generate radiation, and an optical element constructed and arranged to focus the radiation in a focal point in order to generate a cleaning plasma in a background gas above the surface. The laser cleaning device is further provided with a gas supply constructed and arranged to generate a jet of protection gas at a location near the plasma.04-12-2012
20120086928LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus, includes a support structure configured to hold a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate table; a sensor configured to measure an exposure parameter using a measuring beam projected through the liquid; and a correction system configured to determine an offset based on a change of a physical property impacting a measurement made using the measuring beam to at least partly correct the measured exposure parameter.04-12-2012
20120086927DETECTION DEVICE, MOVABLE BODY APPARATUS, PATTERN FORMATION APPARATUS AND PATTERN FORMATION METHOD, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD - By irradiating a detection beam from an irradiation system of a detection device to a scale used for measuring the position of a wafer stage, and detecting the detection beam via the scale by a photodetection system, a surface state (an existence state of foreign substance) of the scale is detected. With this operation, detection of the surface state can be performed contactlessly with respect to the scale. Moreover, movement control of the wafer stage can be performed with high precision by taking the surface state into consideration.04-12-2012
20120086926LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.04-12-2012

Patent applications in class With temperature or foreign particle control