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Plasma generating

Subclass of:

315 - Electric lamp and discharge devices: systems

315111010 - DISCHARGE DEVICE LOAD WITH FLUENT MATERIAL SUPPLY TO THE DISCHARGE SPACE

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Class / Patent application numberDescriptionNumber of patent applications / Date published
315111410 With magnetic field 68
315111310 With extraction electrode 2
20110068691METHOD FOR PRODUCING A PLASMA BEAM AND PLASMA SOURCE - A method for generating a plasma beam and a plasma source for carrying out the method, where the plasma beam is extracted from a plasma generated by electric and magnetic fields by means of a radiofrequency voltage being applied to an extraction electrode and an RF electrode device having an excitation electrode having an excitation area, where a plasma space is arranged between extraction electrode and excitation area and the plasma, relative to the extraction electrode, on average over time, is at a higher potential which accelerates positive plasma ions, and03-24-2011
20130015765Methods and Structures for Rapid Switching Between Different Process Gases in an Inductively-Coupled Plasma (ICP) Ion SourceAANM Graupera; AnthonyAACI HillsboroAAST ORAACO USAAGP Graupera; Anthony Hillsboro OR USAANM Kellogg; SeanAACI PortlandAAST ORAACO USAAGP Kellogg; Sean Portland OR USAANM Utlaut; Mark W.AACI ScappooseAAST ORAACO USAAGP Utlaut; Mark W. Scappoose OR USAANM Parker; N. WilliamAACI HillsboroAAST ORAACO USAAGP Parker; N. William Hillsboro OR US - An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.01-17-2013
Entries
DocumentTitleDate
20100026186POWER SUPPLY IGNITION SYSTEM AND METHOD - One embodiment comprises a plasma processing system having a plasma chamber, a generator, a feedback component, and a controller. The feedback component is adapted to receive at least one first signal having a level dependent upon the power signal supplied from the generator to the chamber. A feedback output is adapted to emit a second signal to the controller, which is adapted to supply a third signal to the power generator. The third signal is configured to control the power generator to supply the power signal at a power level for a particular processing application. The power generator is further controlled by the controller to one of reduce and remove power from the plasma processing chamber and subsequently increase the voltage level until the power level reaches a threshold level. The power generator is further controlled to subsequently modulate the voltage until the voltage returns to a first voltage level.02-04-2010
20090295296METHOD OF PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF AN UNMATCHED LOW POWER RF GENERATOR - A workpiece is processed in a plasma reactor chamber using stabilization RF power delivered into the chamber, by determining changes in load impedance from RF parameters sensed at an RF source or bias power generator and resolving the changes in load impedance into first and second components thereof, and changing the power level of the stabilization RF power as a function one of the components of changes in load impedance.12-03-2009
20130026918Self-Igniting Long Arc Plasma Torch - A plasma torch is formed from a hollow electrode forming a first gap to an isolated plasma tube, the isolated plasma tube forming a second gap with a plasma outlet tube having electrically common plasma tubes which terminate into a plasma outlet. The first gap and second gap of the isolated plasma tubes are fed by a source of plasma gas such that when a voltage is applied across the electrodes, plasmas initially form across the first plasma gap and second plasma gap. The formed plasmas spread laterally until the plasmas are formed entirely from electrode to electrode and self-sustaining. Plasma gasses which are fed to the plasma torch can be metered on both sides of the electrodes to steer the plasma arc attachment axially over the extent of the hollow electrodes, thereby reducing surface wear and increasing electrode life.01-31-2013
20100039036INITIATION METHOD FOR ABNORMAL GLOW PLASMA DISCHARGE IN A LIQUID-PHASE MEDIUM AND APPARATUS FOR ITS IMPLEMENTATION - A method and apparatus for initiating and maintaining an abnormal glow volumetric sonoplasma discharge (VSPD). With certain parameters of the electrical discharge and of the intensity of elastic vibrations, it is possible to initiate VSPD within a cavitating liquid medium. The mechanism for the initiation of VSPD is related to the breakdown of gas phase microchannels formed by growth cavitation bubbles. The method for continuous processing uses elastic vibrations in the frequency range 1-100 kHz with enough intensity for the development of cavitation phenomena; these vibrations are introduced into the liquid phase working medium, and a source of direct, alternating, high frequency and ultrahigh frequency electric field in liquid provides the initiation and stable glow of VSPD. Resulting VSPD is characterized by volumetric glow in the frequency range of visible light and ultraviolet radiation in the entire cavitational-electric field and has a rising volt-ampere characteristic curve.02-18-2010
20090009090Device for Plasma Treatment at Atmospheric Pressure01-08-2009
20090121637Plasma Generator - A plasma generator, comprising a dielectric tube having a first end and a second end, wherein the first end is sealed, but for a gas inlet; at least one first dielectric disk located within the dielectric tube, wherein the first dielectric disk includes at least one first dielectric aperture formed therein; a first ring electrode that at least partially surrounds the at least one first dielectric aperture and is electrically coupled to a power supply; at least one second dielectric disk located proximate the second end of the dielectric tube, wherein the second dielectric disk includes at least one second dielectric aperture formed therein; and a second ring electrode that at least partially surrounds the at least one second dielectric aperture and is electrically coupled to the power supply. During use, the plasma generator produces at least one plasma plume that is launched into open air.05-14-2009
20090121638Cold air atmospheric pressure micro plasma jet application nethod and device - A microhollow cathode discharge assembly capable of generating a low temperature, atmospheric pressure plasma micro jet is disclosed. The microhollow assembly has at two electrodes: an anode and a cathode separated by a dielectric. A microhollow gas passage is disposed through the three layers, preferably in a taper such that the area at the anode is larger than the area at the cathode. When a potential is placed across the electrodes and a gas is directed through the gas passage into the anode and out the cathode, along the tapered direction, then a low temperature micro plasma jet can be created at atmospheric pressure. Selection of gas microhollow geometry and operational characteristics enable the application of the assembly to low temperature treatments, including the treatment of living tissue.05-14-2009
20100033096Atmospheric pressure plasma apparatus - Disclosed is an atmospheric pressure plasma apparatus for enhancing and or controlling the dissociation of a secondary gas by converting a source gas into a plasma state at atmospheric pressure and controlling the interaction between that plasma and the secondary gas using porous metal, and ceramic tubes to create a path having controllable isolation from the region where plasma is generated.02-11-2010
20090284156METHOD AND APPARATUS FOR PULSED PLASMA PROCESSING USING A TIME RESOLVED TUNING SCHEME FOR RF POWER DELIVERY - Embodiments of the present invention generally provide methods and apparatus for pulsed plasma processing over a wide process window. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply. In some embodiments, an apparatus may include an RF power supply having frequency tuning and a matching network coupled to the RF power supply that share a common sensor for reading reflected RF power reflected back to the RF power supply and a common controller for tuning each of the RF power supply and the matching network.11-19-2009
20130134877RF POWER DISTRIBUTION DEVICE AND RF POWER DISTRIBUTION METHOD - Provided are an RF power distribution device and an RF power distribution method. The RF power distribution device includes an impedance matching network for transferring power from an RF power source and a power distribution unit for distributing the output power from the impedance matching network to at least one electrode generating capacitively-coupled plasma. The power distribution unit includes a first reactive element connected in series to a first electrode, a variable capacitor having one end connected in parallel to the first reactive element and the first electrode and the other end grounded, and a second reactive element having one end connected to a first node where the one end of the variable capacitor and one end of the first reactance device are in contact with each other and the other end connected to a second node where a second electrode and an output terminal of the impedance matching network are connected.05-30-2013
20090045749PLASMA GENERATING APPARATUS AND PLASMA TREATMENT APPARATUS - A plasma generating apparatus according to the invention includes coaxial conversion means for coaxial-converting a microwave, a generally annular ring slot for passing the coaxial-converted microwave, and a dielectric window for propagating the microwave passed through the ring slot, wherein a plasma can be produced by the microwave propagated through the dielectric window. This enables stable formation of a plasma having a uniform distribution over a large area.02-19-2009
20100327749Controlled Plasma Power Supply - A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.12-30-2010
20130069530Harmonic Cold Plasma Devices and Associated Methods - A gas cartridge is described that is configured to provide sufficient gas to support cold plasma generation for a specific medical process. The gas cartridge has a seal that is pierced upon connection of the gas cartridge to the cold plasma delivery system. Different embodiments are described that use different connection locations between the gas cartridge and the cold plasma delivery system. A shroud is also described that shields the user if the cold plasma delivery system is dropped and the gas cartridge ruptures. Use of an ID system assists in ensuring that the correct gas mixture, correct gas cartridge and correct power supply settings are used for the particular medical treatment process.03-21-2013
20120217875COMPLEX PLASMA GENERATING DEVICE - Provided is a complex plasma generating device which makes it possible to enhance an explosion power in such a way that electromagnetic waves are guided to intensively emit to the gas ionized by means of corona discharge by designing a waveguide with electromagnetic waves flowing therein in a spiral curve shape depending on Fibonacci sequence and in such a way that vapor obtained by vaporizing sea water is sprayed.08-30-2012
20120217874Plasma Source with Vertical Gradient - A plasma source includes upper and lower portions. In a first aspect, an electrical power source supplies greater power to the upper portion than to the lower portion. In a second aspect, the plasma source includes three or more power couplers that are spaced apart vertically, wherein the number of plasma power couplers in the upper portion is greater than the number of plasma power couplers in the lower portion. The upper and lower portions of the plasma source can be defined as respectively above and below a horizontal geometric plane that bisects the vertical height of the plasma source. Alternatively, the upper and lower portions can be defined as respectively above and below a horizontal geometric plane that bisects the combined area of first and second workpiece positions.08-30-2012
20130057151SYSTEMS AND METHODS TO GENERATE A SELF-CONFINED HIGH DENSITY AIR PLASMA - This disclosure relates to methods and devices for generating electron dense air plasmas at atmospheric pressures. In particular, this disclosure relate to self-contained toroidal air plasmas. Methods and apparatuses have been developed for generating atmospheric toroidal air plasmas. The air plasmas are self-confining, can be projected, and do not require additional support equipment once formed.03-07-2013
20130069531MICROWAVE PLASMA REACTORS - New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.03-21-2013
20090026963SURFACE WAVE EXCITATION PLASMA GENERATOR AND SURFACE WAVE EXCITATION PLASMA PROCESSING APPARATUS - The present invention provides a surface wave excitation plasma generator in which surface wave excitation plasma is efficiently generated. A surface wave excitation plasma generator including an annular waveguide and a dielectric tube is provided. The annular waveguide 01-29-2009
20130063028SURFACE FEED-IN ELECTRODES FOR DEPOSITION OF THIN FILM SOLAR CELL AND SIGNAL FEED-IN METHOD THEREOF - The present invention discloses a surface feed-in electrode structure for thin film solar cell deposition, relating to solar cell technologies. The surface feed-in electrode structure uses a signal feed-in component with a flat waist and a semicircular feed-in end to connect the signal feed-in port by surface contact. The signal feed-in port is located in a hallowed circular area of a center of the backside of a cathode plate, and feeds in an RF/VHF power supply signal. An anode plate is grounded. The cathode plate is insulated with a shielding cover, and a through-hole is configured on the shielding cover. The effects include that, by using the surface feed-in at the center of the electrode plate, the feeding line loss of single-point or multi-point feed-in configurations can be overcome. Uniform large area and stable discharge driven by the RF/VHF power supply signal can be achieved, and the standing wave and the skin effect can be effectively removed. The production efficiency can be improved and the cost can be reduced.03-14-2013
20120229029PLASMA GENERATING APPARATUS AND PLASMA GENERATING METHOD - Generated amount of active species is increased, and dew formation or moisture attachment hardly occurs on a dielectric layer. A plasma generating apparatus including a pair of electrodes, wherein a dielectric layer is arranged on at least one of surfaces of the electrodes facing each other, plasma discharge occurs as a predetermined voltage is applied to the electrodes, and a coating film is arranged on a surface of the dielectric layer.09-13-2012
20130162142PLASMA PROCESSING APPARATUS AND METHOD - A plasma processing apparatus includes a processing chamber; a lower electrode serving as a mounting table for mounting thereon a target object; and an upper electrode or an antenna electrode provided to be opposite to the lower electrode. The apparatus further includes a gas supply source for introducing a gas including a halogen-containing gas and an oxygen gas into the processing chamber and a high frequency power supply for applying a high frequency power for generating plasma to at least one of the upper electrode, the antenna electrode, or the lower electrode. Among inner surfaces of the processing chamber which are exposed to the plasma, at least a part of or all of the surfaces between a mounting position of the target object and the upper electrode, or the antenna electrode; or at least a part of or all of the surfaces of the upper electrode or the antenna electrode are coated with a fluorinated compound.06-27-2013
20110031886PLASMA APPARATUS USING A VALVE - Provided is a plasma apparatus using a valve, which comprises a discharge device with an electrode exposed to the combustion chamber installed in a cylinder head, an antenna installed on the valve face of a valve head, an electromagnetic wave transmission line installed in a valve stem with one end connected to the antenna and the other end covered with an insulator or dielectric and extending to a power-receiving portion positioned at a location fitting into the guide hole in the valve stem, and an electromagnetic wave generator for feeding an electromagnetic waves to the power-receiving portion. At the compression stroke when the combustion chamber side opening of an intake port or an exhaust port is closed with the valve head, discharge is generated with the electrode of the discharge device and the electromagnetic waves fed from the electromagnetic wave generator through the electromagnetic wave transmission line are radiated from the antenna.02-10-2011
20110109227Target Exchange Type Plasma Generating Apparatus - The objective of the present invention is to provide a target exchange type plasma generating apparatus in which the positions of two targets can be adjusted independent of each other. A target exchanging mechanism (05-12-2011
20110121735TISSUE RESURFACING - In an electonic key associated with a device for skin treatment there is a housing and an integrated circuit, the integrated circuit is positioned within the housing, wherein the device for treating human tissue comprises a surgical instrument having a gas conduit terminating in a plasma exit nozzle, and an electrode associated with the conduit, and a radio frequency power generator coupled to the instrument electrode and arranged to deliver radio frequency power to the electrode in single or series of treatment pulses for creating a plasma from gas fed through the conduit, the pulses having durations in the range of from 2 ms to 100 ms.05-26-2011
20100171427Protecting High-Frequency Amplifers - In one aspect, protecting high frequency (HF) amplifiers of a plasma supply device configured to deliver >500 W at a substantially constant fundamental frequency >3 MHz is accomplished by: driving two HF amplifiers with two drive signals having a common frequency and a predetermined phase shift with respect to one another; generating two HF source signals using the HF amplifiers, the HF source signals coupled in a coupler to form a HF output signal; transmitting the HF output signal to the plasma load; measuring electrical variables related to the load impedances seen by the two HF amplifiers; determining whether the load impedance seen by one of the HF amplifiers lies outside a predetermined range; and adjusting the phase shift of the two drive signals, wherein neither of the load impedances seen by the HF amplifiers lies outside the predetermined range.07-08-2010
20120187840TUNING A DIELECTRIC BARRIER DISCHARGE CLEANING SYSTEM - Apparatus and methods for generating and optimizing a plasma discharge are provided. The device includes a plasma generating device, one or more sensors, and at least one controller for adjusting the plasma in light of the sensed characteristics. Methods for optimizing a plasma, particularly a spatially disoriented plasma discharge include generating a plasma, sensing one or more plasma characteristics, modifying one or more plasma generating properties to optimize the plasma.07-26-2012
20090206757PLASMA REACTOR AND PLASMA REACTION APPARATUS - A plasma reactor includes a honeycomb electrode in which a plurality of cells that function as gas passages are partitioned by a partition wall, and a discharge electrode. The honeycomb electrode includes a first gas circulation section that allows a first gas to pass through, and a second gas circulation section that allows a second gas to pass through. The plasma reactor causes the first gas introduced into the first gas circulation section of the honeycomb electrode through the space between the electrodes to undergo a reaction while causing a plasma discharge between the honeycomb electrode and the discharge electrode, and allows the second gas to be introduced into the second gas circulation section of the honeycomb electrode to transfer heat of the second gas to the first gas circulation section to promote the reaction of the first gas.08-20-2009
20110291566Multi-Wavelength Pumping to Sustain Hot Plasma - A method of sustaining a plasma, by focusing a first wavelength of electromagnetic radiation into a gas within a volume, where the first wavelength is substantially absorbed by a first species of the gas and delivers energy into a first region of a plasma having a first size and a first temperature. A second wavelength of electromagnetic radiation is focused into the first region of the plasma, where the second wavelength is different than the first wavelength and is substantially absorbed by a second species of the gas and delivers energy into a second region of the plasma region within the first region of the plasma having a second size that is smaller than the first size and a second temperature that is greater than the first temperature.12-01-2011
20120187841DEVICE FOR GENERATING A NON-THERMAL ATMOSPHERIC PRESSURE PLASMA - A device for generating a cold, HF-excited plasma under atmospheric pressure conditions can be used advantageously for plasma treatment of materials for cosmetic and medical purposes. The device contains a metal housing functioning as a grounded electrode in the region of the emergent plasma, wherein an HF generator, an HF resonance coil having a closed ferrite core suitable for the high frequency, an insulating body acting as a gas nozzle, and a high-voltage electrode mounted in the insulating body are disposed in such a manner that they are permeated or circulated around by process gas. By integrating the plasma nozzle and required control electronics in a miniaturized handheld device, or by using a short high-voltage cable, the invention allows compliance with the electromagnetic compatibility directives and allows the power loss to be minimized and thus a mobile application to be implemented.07-26-2012
20090153060RF plasma source with quasi-closed solenoidal inductor - The present invention pertains to RF (radio frequency) inductive coupling plasma (ICP) sources exciting and maintaining plasma within a closed and vacuum sealed discharge chamber filled with a gaseous medium at a controllable pressure in the range from 1 mTorr to atmospheric pressure. The inductively couple plasma source of the present invention includes a radio frequency source, a quasi-closed O-type solenoidal inductor comprised of two equal section U-shaped solenoid coil halves separated from one another to form two operating gaps between aligned spaced ends of the solenoid coil halves. Each of the U-shaped halves of the solenoid coil is sectioned to have an electrical midpoint connected to the radio frequency source and the distal outer ends of the solenoid coils, which correspond to the aforesaid aligned spaced ends of the quasi-closed solenoidal inductor, are connected to ground. A metallic housing having a discharge chamber therein is provided with two opposed walls having symmetrically opposed bone shaped ports. The ports are closed and vacuum sealed with insulating material and the ports each include two through side openings dimensionally respectively fitted to and engaging with the spaced ends of the quasi-closed solenoidal inductor. The bone shaped ports further include a through slot connecting the side openings along their center line for inductive excitation and maintenance of plasma in the operating gaps situated within the discharge chamber.06-18-2009
20110193483Methods for Inductively-Coupled RF Power Source - A method for tracking a variable resonance condition in a plasma coil during creation of plasma from a gas flowing in a plasma torch adjacent to the plasma coil comprises: providing a radio-frequency (RF) power source comprising a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency; providing a high-voltage ignition charge from said RF power source to the gas in plasma torch so as to create an electrical discharge through said gas so as to create a test sample comprising a partial plasma state within said plasma torch; and applying an RF power signal from said plasma coil to said test sample in said plasma torch, wherein said adjustable operating frequency of said power amplifier tracks said variable resonance condition of said plasma coil such that said test sample in the plasma torch achieves a full plasma state.08-11-2011
20090309499OPTIMIZATION OF THE EXCITATION FREQUENCY OF A RESONATOR - A radio frequency plasma generator power supply, including: an interface that receives a request to determine an optimal control frequency; an output interface configured to be connected to a plasma generation resonator; a power supply module configured to apply a voltage at a set point frequency to the output interface, the voltage, depending on its frequency, selectively unable to allow generation of plasma of the resonator on receipt of a request during a phase optimizing power supply frequency of the generator and able to allow generation of plasma of the resonator during an operating phase; an interface that receives an electrical measurement of power supply of the resonator; a module that determines optimal control frequency, successively provides various set point frequencies to the power supply module on receipt of a request, and determines an optimal control frequency depending on electrical measurements received by the reception interface.12-17-2009
20100194279CONTROL OF A PLURALITY OF PLUG COILS VIA A SINGLE POWER STAGE - A radiofrequency plasma generating device including: a supply circuit including a switch controlled by a control signal for applying a voltage on an output of the control circuit at a control frequency; at least two plasma-generating circuits connected in parallel at the output of the supply circuits, each circuit having its own resonance frequency and being capable of generating plasma when a high voltage level is applied to the output of the supply circuit at a frequency substantially equal to the resonance frequency of the plasma generation circuit; and a supply control device determining the control frequency from the resonance frequencies of the plasma generation circuits to selectively control each circuit according to the control frequency used.08-05-2010
20110140607SYSTEM, METHOD AND APPARATUS FOR GENERATING PLASMA - A plasma generating system, related method and device are disclosed. The plasma generation system includes a plasma generation device, a source of ionizable gas and a driver network. The plasma generation device includes a housing, an electrode, and a resonant circuit. The housing includes a passage defined therein and directs a flow of ionizable gas therethrough. The electrode is coupled to the ionizable gas flowing through the passage of the housing. The resonant circuit includes a capacitor and an inductor connected together in series. The resonant circuit has a resonance frequency and is coupled to the electrode. The resonant circuit receives an AC signal. The driver network provides the AC signal such that the AC signal has a frequency and excites the ionizable gas flowing through the passage of the housing to a plasma.06-16-2011
20120293070PLASMA ATTENUATION FOR UNIFORMITY CONTROL - A plasma processing apparatus and method are disclosed which create a uniform plasma within an enclosure. In one embodiment, a conductive or ferrite material is used to influence a section of the antenna, where a section is made up of portions of multiple coiled segments. In another embodiment, a ferrite material is used to influence a portion of the antenna. In another embodiment, plasma uniformity is improved by modifying the internal shape and volume of the enclosure.11-22-2012
20100079073Pulsed dielectric barrier discharge - A method of generating a glow discharge plasma involves providing a pair of electrodes spaced apart by an electrode gap, and having a dielectric disposed in the electrode gap between the electrodes; placing the electrodes within an environment, wherein the electrode gap can be provided with a gas or gas mixture containing carbon at a specified pressure; and applying a rapid rise time voltage pulse across the electrodes to cause an extreme overvoltage condition, wherein the rapid rise time is less than a plasma generation time so that the extreme overvoltage condition occurs prior to current flow across the electrode gap. This abstract is not to be considered limiting, since other embodiments may deviate from the features described in this abstract.04-01-2010
20120194074PLASMA CHOKING METHOD AND PLASMA CHOKE COIL - A plasma choking method and a plasma choke coil. The plasma choking method includes steps of installing at least one conductive coil set in a closed space and filling a reaction fluid into the closed space. When a circuit is interfered with by external surge or the surge in the circuit, the surge applies an electric field or a magnetic field to the conductive coil. At this time, the conductive coil in the closed space generates an inductive reactance corresponding to the surge and carries out plasma reaction, whereby the surface particles of the conductive coil are ionized by the magnetic field or electric field into high-energy electrons, high-energy ions and high-energy neutral atoms so as to effectively eliminate or absorb the surge.08-02-2012
20090295295PLASMA REACTOR WITH HIGH SPEED PLASMA LOAD IMPEDANCE TUNING BY MODULATION OF DIFFERENT UNMATCHED FREQUENCY SOURCES - Fluctuations in a plasma characteristic such as load impedance are compensated by a controller that modulates a stabilization RF generator coupled to the plasma having a frequency suitable for stabilizing the plasma characteristic, the controller being responsive to the fluctuations in the plasma characteristic.12-03-2009
20100102728PLASMA JET IGNITION PLUG AND IGNITION DEVICE FOR THE SAME - The cavity of a plasma jet ignition plug is configured in a stepped shape; i.e., composed of a constricted portion and a diameter-increased portion (04-29-2010
20080246405POWER SUPPLY APPARATUS - A power supply apparatus for controlling an ion accelerator includes a controller configured to adjust magnitude of ion acceleration in the ion accelerator. The controller controls an anode voltage applied to an anode electrode of the ion accelerator, a gas flow rate of gas flowing through a gas flow rate regulator of the ion accelerator, and magnetic flux density at an ion exit of the ion accelerator to satisfy a formula given as follows:10-09-2008
20080272700PLASMA GENERATING DEVICE - In the present invention, a plasma generating device is provided for generating a plasma with a uniform intensity. The plasma generating device comprises at least a first antenna to transmit the first electromagnetic wave, at least a second antenna to transmit the second electromagnetic wave, and an insulator defining an isolated space for containing therein the first antenna and the second antenna, wherein the first antenna has an opposite orientation with respect to the second antenna, so that the first electromagnetic wave and the second electromagnetic wave are transmitted in opposite directions. The first and the second electromagnetic waves can be coupled with each other to produce a uniform standing wave pattern. Consequently, a large size uniform plasma can be generated.11-06-2008
20100201272Plasma generating system having nozzle with electrical biasing - The present invention provides a plasma generating system that includes: a microwave generator for generating microwave energy; a power supply connected to the microwave generator for providing power thereto; a microwave cavity; a waveguide operatively connected to the microwave cavity for transmitting microwave energy thereto; an isolator for dissipating microwave energy reflected from the microwave cavity; and at least one nozzle coupled to the microwave cavity. The nozzle includes: a housing having a generally cylindrical space formed therein, the space forming a gas flow passageway; a rod-shaped conductor disposed in the space and operative to transmit microwave energy along a surface thereof so that the microwave energy excites gas flowing through the space; and a biasing device for providing a bias potential between the rod-shaped conductor and a bias electrode structure wherein the bias electrode structure is offset in potential from ground.08-12-2010
20100201271DC ARC PLASMATRON AND METHOD OF USING THE SAME - The present invention concerns a DC arc plasmatron which is a plasma generator at the atmospheric pressure having a structure suitable for improving chemical activity of plasma.08-12-2010
20080265779ARRANGEMENT FOR SWITCHING HIGH ELECTRIC CURRENTS BY A GAS DISCHARGE - The present invention is directed to an arrangement for switching high electric currents by way of a gas discharge at high voltages or for generating gas discharge plasma emitting EUV radiation. It is the object of the invention to find a novel possibility for generating a hollow cathode plasma that permits a longer life of the cathodes of short wavelength-emitting gas discharge radiation sources and pseudospark switches, also in high-power operation. This object is met in that the metal wall between the hollow cathode space and the discharge space has a thickness on the order of the centimeter range so that the openings of the metal wall change into relatively long channels and in that substantially radially extending cooling channels are introduced in the metal wall to reduce the ion erosion of the metal wall of the hollow cathode through efficient cooling.10-30-2008
20130119863SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a high frequency power supply configured to generate a high frequency power; a plasma generation electrode configured to generate the plasma by the high frequency power supplied from the high frequency power supply; a single matching unit provided between the high frequency power supply and the plasma generation electrode, and configured to match an impedance of a transmission path and an impedance of a load;05-16-2013
20130119864METHOD FOR OBTAINING HIGH-ENERGY REPETITIVELY PULSED PLASMA FLOWS IN GASES AT ATMOSPHERIC AND HIGH PRESSURE - Method for obtaining high-energy repetitively pulsed plasma flows in gases at atmospheric and high pressure.05-16-2013
20130214682FREQUENCY ENHANCED IMPEDANCE DEPENDENT POWER CONTROL FOR MULTI-FREQUENCY RF PULSING - Methods for processing a substrate in a plasma processing, chamber employing a plurality of RF power supplies. The method includes pulsing at a first pulsing frequency a first RF power supply to deliver a first RF signal between a high power state and a low power state. The method further includes switching the RF frequency of a second RF signal output by a second RF power supply between a first predefined RF frequency and a second RF frequency responsive to values of a measurable chamber parameter. The first RF frequency and the second RF frequencies and the thresholds for switching were learned in advance during a learning phase while the first RF signal pulses between the high power state and low power state at a second RF frequency lower than the first RF frequency and while the second RF power supply operates in different modes.08-22-2013
20100141147CAPACITIVELY COUPLED PLASMA (CCP) GENERATOR WITH TWO INPUT PORTS - A capacitively coupled plasma (CCP) generator with two input ports, which is especially used as a large-area capacitively coupled plasma (CCP) generator. In the inventive CCP generator, only a RF power supply is required to provide the two input ports with RF power. The input impedance at each of the input ports is adjustable so that the standing wave between two rectangular electrodes can be eliminated to achieve plasma uniformity.06-10-2010
20120104950METHODS FOR CALIBRATING RF POWER APPLIED TO A PLURALITY OF RF COILS IN A PLASMA PROCESSING SYSTEM - Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.05-03-2012
20120068602ELECTRODE AND PLASMA GUN CONFIGURATION FOR USE WITH A CIRCUIT PROTECTION DEVICE - A circuit protection device includes a plasma gun configured to emit an ablative plasma along an axis, and a plurality of electrodes, wherein each electrode is electrically coupled to a respective conductor of a circuit and is arranged substantially along a plane that is substantially perpendicular to the axis such that each electrode is positioned substantially equidistant from the axis.03-22-2012
20130214683Impedance-Based Adjustment of Power and Frequency - Systems and methods for impedance-based adjustment of power and frequency are described. A system includes a plasma chamber for containing plasma. The plasma chamber includes an electrode. The system includes a driver and amplifier coupled to the plasma chamber for providing a radio frequency (RF) signal to the electrode. The driver and amplifier is coupled to the plasma chamber via a transmission line. The system further includes a selector coupled to the driver and amplifier, a first auto frequency control (AFC) coupled to the selector, and a second AFC coupled to the selector. The selector is configured to select the first AFC or the second AFC based on values of current and voltage sensed on the transmission line.08-22-2013
20090001889METHOD AND APPARATUS FOR REMOTELY MONITORING PROPERTIES OF GASES AND PLASMAS - A method and apparatus for remotely monitoring properties of gases and plasmas is disclosed. A laser beam is focused at a desired region within a gas or plasma to be analyzed, generating an ionized sample region in the gas or plasma. A beam of microwave radiation is directed toward the ionized sample region, and a portion of the microwave radiation is scattered by the ionized sample region and Doppler-shifted in frequency. The scattered, frequency-shifted microwave radiation is received by a microwave receiver, and is processed by a microwave detection system to determine properties of the gas or plasma, including velocities, temperatures, concentrations of molecular species, and other properties of the gas or plasma.01-01-2009
20090001890Apparatus for Plasma Processing a Substrate and a Method Thereof - An apparatus for processing a substrate includes a pulsed power supply that generates a waveform having a first period with a first power level and a second period with a second power level. A plasma source generates a first plasma during the first period and a second plasma during the second period. The first plasma may have higher plasma density than the second plasma. A bias voltage power supply generates a bias voltage waveform at an output that is electrically connected to a platen which supports a substrate. The bias voltage waveform having a first voltage and a second voltage may be coupled to the substrate. The first voltage may have more negative potential than the second voltage.01-01-2009
20100171428DRIVING SWITCHES OF A PLASMA LOAD POWER SUUPLY - Operation of a plasma supply device having at least one switching bridge with at least two switching elements, and configured to deliver a high frequency output signal having a power of >500 W and a substantially constant fundamental frequency>3 MHz to a plasma load is accomplished by determining at least one operating parameter, at least one environmental parameter of at least one switching element and/or a switching bridge parameter, determining individual drive signals for the switching elements taking into account the at least one operating parameter, the at least one environmental parameter and/or the switching bridge parameter, and individually driving the switching elements with a respective drive signal.07-08-2010
20100187998ABNORMAL DISCHARGE SUPPRESSING DEVICE FOR VACUUM APPARATUS - The present invention is directed to an apparatus for suppressing abnormal electrical discharge used for vacuum equipment which supplies power from a high-frequency power source to a plasma reaction chamber and executes a film formation process, provided with a power controller for controlling the high-frequency power source based on a deviation between a power command value and a power feedback value, and a cutoff controller for cutting off the power supply from the high-frequency power source to the plasma reaction chamber, based on a detection of the abnormal electrical discharge within the plasma reaction chamber. The cutoff controller exercises a first handling cutoff control and a second handling cutoff control, each having a different cutoff time. The first handling cutoff allows ions to remain in the plasma reaction chamber, and exercises the cutoff control over the high-frequency power source within a time duration which allows an arcing element to disappear. On the other hand, the second handling cutoff control exercises cutoff control over the high-frequency power source within a time range which allows abnormal arc ions to disappear. Accordingly, it is possible to supply power to plasma stably.07-29-2010
20100225234Hollow-cathode plasma generator - A hollow-cathode plasma generator includes a plurality of hollow cathodes joined together and connected to a power supply for generating plasma in vacuum. Each of the hollow cathodes includes at least one fillister defined therein, a fin formed on a side of the fillister, an air-circulating tunnel in communication with the fillister and a coolant-circulating tunnel defined therein. The fillister is used to contain working gas. The fin receives negative voltage from the power supply for ionizing the working gas to generate the plasma and spread the plasma in a single direction. The working gas travels into the fillister from the air-circulating tunnel. The coolant-circulating tunnel is used to circulate coolant for cooling the hollow cathode.09-09-2010
20100127624Method and Apparatus for Multibarrier Plasma Actuated High Performance Flow Control - Embodiments of the invention relate to a method and apparatus for plasma actuated high performance flow control. A specific embodiment of a plasma actuator can incorporate a power source; a first electrode in contact with a first dielectric layer and connected to the power source; a second electrode in contact with a second dielectric layer and connected to the power source; and a ground electrode. The power source drives the first electrode with a first ac voltage pattern with respect to the ground electrode and drives the second electrode with a second ac voltage pattern with respect to the ground electrode such that application of the first voltage pattern produces a first plasma discharge in a flow region, and a first electric field pattern in the flow region, and application of the second voltage pattern produces a second plasma discharge in the flow region and a second electric field pattern in the flow region. The first and second electrodes are offset along the direction of flow in the flow region and the first voltage pattern and the second voltage pattern have a phase difference such that the first and second electric fields drive flow in the flow region in different portions of the flow region at different times.05-27-2010
20090039789Cathode assembly and method for pulsed plasma generation - A cathode assembly and a method for generation of pulsed plasma are disclosed. The cathode assembly comprises a cathode holder connected to multiple longitudinally aligned cathodes, preferably of the same diameter, and different lengths. The method is characterized by forming an electric arc between the cathodes in the assembly and an anode by passing DC current of a predetermined magnitude. Once the arc is established the current is reduced to the magnitude sufficient to sustain an electric arc, or a slightly larger magnitude, thereby reducing the area of arc attachment to a single cathode. Once the area of attachment has been reduced, the current is raised to the operational level of the pulse, while the area of attachment does not increase significantly.02-12-2009
20090128041Microwave Plasma Generation Method and Microwave Plasma Generator - A microwave plasma generator in which the generating amount of radicals can be regulated easily with higher reaction efficiency while reducing gas consumption. The microwave plasma generator comprises an outer conductor (05-21-2009
20120032596PLASMA SOURCE FOR LARGE SIZE SUBSTRATE - A plasma source for a substrate is provided. The plasma source may include a source electrode and an impedance box. The source electrode receives a source Radio Frequency (RF) from the external and generates plasma based on capacitive coupling within a vacuum chamber. The impedance box connects at one end to an outer circumference surface of the source electrode, and is grounded at the other end to the vacuum chamber, and controls an electric current flowing from the source electrode to the vacuum chamber by the source RF.02-09-2012
20100301753APPLICATOR OF MICROWAVE PLASMA GENERATOR AND MICROWAVE PLASMA GENERATOR INCLUDING THIS APPLICATOR - The microwave plasma generator is applied to transmission of electromagnetic field into plasma. The invention consists of the fact that the guiding part (12-02-2010
20110001429Three-dimensional display system - A three-dimensional display system is provided which promises to project an image into a volume. The three-dimensional display system produces visible light in a volume at the intersection of two laser beams by forming a plasma at a volume element within the volume and exciting target molecules within the plasma into an excited energy state. The target molecules are characterized by sufficiently sizeable energy state transitions such that visible light is emitted upon transition of the target molecules from an excited energy state to a lower energy state. By rapidly repeating this process according to three-dimensional image data, one or more embodiments of the present invention is able to project a three-dimensional image into a volume without many of the drawbacks of earlier machines.01-06-2011
20110115378PLASMA SOURCE DESIGN - Embodiments of the present invention generally provide a plasma source apparatus, and method of using the same, that is able to generate radicals and/or gas ions in a plasma generation region that is symmetrically positioned around a magnetic core element by use of an electromagnetic energy source. In general, the orientation and shape of the plasma generation region and magnetic core allows for the effective and uniform coupling of the delivered electromagnetic energy to a gas disposed in the plasma generation region. In general, the improved characteristics of the plasma formed in the plasma generation region is able to improve deposition, etching and/or cleaning processes performed on a substrate or a portion of a processing chamber that is disposed downstream of the plasma generation region.05-19-2011
20110001430ELECTRODE DEVICE AND APPARATUS FOR GENERATING PLASMA - Provided are an electrode device and an apparatus for generating plasma. The electrode device for generating plasma includes: a planar member disposed to face a susceptor supporting a substrate and generating plasma between the substrate and the planar member; and a linear member providing a high frequency signal to the planar member via a plurality of feeding points that are electrically connected to the planar member and allowing admittance to be reduced as the linear member is closer to the feeding points on a path from supply points at which the high frequency signal is supplied to the linear member, to each of the feeding points, wherein the linear ember includes a connection unit, the connection unit including: a first member connecting two feeding points from among four feeding points disposed adjacent to one another in a straight line and is disposed to be separated from a plane that includes the straight line in which the feeding points are formed and forms a predetermined angle with the planar member; and a second member connecting two feeding points to which the first member is not connected, from among the four feeding points and is disposed symmetrical with the first member with respect to the plane that includes the straight line in which the feeding points are formed.01-06-2011
20110006687METHOD AND GENERATOR CIRCUIT FOR PRODUCTION OF PLASMA BY MEANS OF RADIO-FREQUENCY EXCITATION - Method and generator circuit for generating plasmas by means of radiofrequency excitation01-13-2011
20110025210PLASMA APPARATUS USING A CYLINDER HEAD - Provided is a plasma apparatus using a cylinder head, which comprises a discharge device installed with an electrode exposed to the combustion chamber and installed in the cylinder head, an antenna installed to protrude from the cylinder head into the combustion chamber, a bulging portion bulging from the cylinder head to the combustion chamber so as to cover the antenna, made from insulator or dielectric, an electromagnetic wave transmission line installed in the cylinder head and with one end connected to the antenna and the other end, covered with insulator or dielectric, penetrating the cylinder head to extend to an outer wall of the cylinder head, and an electromagnetic wave generator for feeding electromagnetic waves to the electromagnetic wave transmission line. At compression stroke, discharge is generated with the electrode of the discharge device and the electromagnetic waves, fed from the electromagnetic wave generator through the electromagnetic wave transmission line, are radiated from the antenna.02-03-2011
20090066256Solid Expellant Plasma Generator - An improved solid expellant plasma generator has been developed. The plasma generator includes a support housing, an electrode rod located in the central portion of the housing, and a mass of solid expellant material that surrounds the electrode rod within the support housing. The electrode rod and the solid expellant material are made of separate materials that are selected so that the electrode and the solid expellant material decompose at the same rate when the plasma generator is ignited. This maintains a point of discharge of the plasma at the interface between the electrode and the solid expellant material.03-12-2009
20110109226MICROPLASMA DEVICE WITH CAVITY FOR VACUUM ULTRAVIOLET IRRADIATION OF GASES AND METHODS OF MAKING AND USING THE SAME - An illumination device provides light to a flowing gaseous sample. The device includes a structure including a cavity configured to have a microplasma disposed therein. The cavity substantially encircles a cross-section of a channel that is configured to pass the flowing gaseous sample therethrough. The cavity is defined in part by an interior wall of the structure separating the cavity from the channel. The interior wall includes at least one orifice passing therethrough configured to provide to the flowing gaseous sample light generated by the microplasma. At least one electrode is configured to supply energy to the microplasma within the cavity.05-12-2011
20110241547PLASMA PROCESSING APPARATUS - A plasma processing device includes a first electrode plate (10-06-2011
20100194278Flow manipulation with micro plasma - The embodiments of the present invention apply the RF or microwave energy on electrically conductive traces and waveguide structures to excite micro plasma, and the micro plasma is manipulated to drive the micro fluid flow. The micro fluid flow is used to cool down electronic device, or used for the applications of gas fluid transportation, gas fluid mixture, and gas fluid reaction.08-05-2010
20090039790Pulsed plasma device and method for generating pulsed plasma - A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a plasma channel expanding toward the anode. The intermediate electrode closest to the cathode may form a plasma chamber around the cathode tip. An extension nozzle forming an extension channel having a tubular insulator along at least a portion of its interior surface is affixed to the anode end of the device.02-12-2009
20110175531PLASMA GENERATION DEVICE WITH SPLIT-RING RESONATOR AND ELECTRODE EXTENSIONS - A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring at the discharge gap; a ground plane disposed on the second surface of the substrate; a gas flow element configured to flow gas between at least one of: (1) the discharge gap, and (2) the pair of electrode extensions; and a structure disposed adjacent the substrate to form an enclosure that substantially encloses at least a region including the discharge gap and the electrode extensions, the enclosure being adapted to contain a plasma.07-21-2011
20110101862System and methods for plasma application - The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.05-05-2011
20110248633METHODS AND APPARATUS FOR APPLYING PERIODIC VOLTAGE USING DIRECT CURRENT - Methods and apparatus for applying pulsed DC power to a plasma processing chamber are disclosed. In some implementations, frequency of the applied power is varied to achieve desired processing effects such as deposition rate, arc rate, and film characteristics. In addition, a method and apparatus are disclosed that utilize a relatively high potential during a reverse-potential portion of a particular cycle to mitigate possible nodule formation on the target. The relative durations of the reverse-potential portion, a sputtering portion, and a recovery portion of the cycle are adjustable to effectuate desired processing effects.10-13-2011
20110068690Plasma jet guard - The system includes a method and means of technological defense against violent atmospheric cyclones: tornadoes, hurricanes, others. The controlled meteorological missiles equipped with rocket servo-motors and magneto-gas-dynamic ionizers are used.03-24-2011
20090026964High Frequency Power Supply - For determining a wave running time between a RF source in a plasma power supply device and a load connected to the plasma power supply device, an RF pulse is transmitted forwards from the RF source to the load. The pulses are reflected by the load and transmitted backwards to the power source. A return time measured on arrival of the pulse(s) at the inverter is used to determine a wave running time.01-29-2009
20110018443PLASMA GENERATING APPARATUS - A plasma generating apparatus includes a chamber, a slow wave antenna and an electromagnetic wave generator. The chamber has an accommodating space. The slow wave antenna has a central conductive tube passing through the accommodating space, and a dielectric tube arranged around the central tube. The electromagnetic wave generator is used for coupling electromagnetic wave into the slow wave antenna. An electromagnetic wave transmitted by the electromagnetic wave generator can pass through the slow wave antenna and radiate into the accommodating space.01-27-2011
20110018444TRANSIENT PLASMA BALL GENERATION SYSTEM AT LONG DISTANCE - The invention concerns a new device based on very short pulsed discharges, generating plasmas balls and plumes over very long distances (up to several meters). These plasma balls are travelling in dielectric guide at the end of which there is generation of an apparent plasma plume like zone (which shape and intensity depend on the discharge repetition rate) wherein secondary mixture plasma can be produced close to a given surface by adding other gas fluxes in the main gas stream. The plasmas balls can be generated in gases at a repetition rate in the range from single shot to multi-kilohertz.01-27-2011
20090200948LARGE AREA, ATMOSPHERIC PRESSURE PLASMA FOR DOWNSTREAM PROCESSING - An arcless, atmospheric-pressure plasma generating apparatus capable of producing a large-area, temperature-controlled, stable discharge at power densities between about 0.1 W/cm08-13-2009
20110254448METHOD AND SYSTEM FOR INCREASING THE LIFESPAN OF A PLASMA - A method and a system for increasing the lifespan of a plasma obtained in the atmosphere. The method includes the following steps: emitting a femtosecond laser pulse, referred to as a first pulse, generating a column of plasma by the filamentation phenomenon, and emitting a second YAG laser pulse, focused by way of an axicon on a line in the plasma column, the energy of the photons of the second laser pulse being greater than the attachment energy of the electrons in the plasma to neutral molecules such as oxygen molecules. The duration of the second pulse is greater than the duration of the first pulse, and the delay between the two pulses is greater than one microsecond.10-20-2011
20080203925PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a processing chamber encased in a vacuum vessel equipped with an evacuator; a sample stage located in the processing chamber and having an upper surface on which a sample as an object to be processed rests; a gas feeding unit for feeding processing gas into the processing chamber; a plurality of refrigerant ducts which are laid out in the internal of the sample stage and through which liquid refrigerant flows and can be evaporated; a cooling circuit including a compressor, a condenser, an expansion valve and a set of pipelines to connect the compressor, the condenser and the expansion valve in this order; and a selecting unit for selectively feeding the refrigerant through the plural refrigerant ducts in the different steps of the processing. The sample is processed by using plasma while the temperature of the sample stage is being controlled by the cooling circuit.08-28-2008
20100320916Plasma Generator and Discharge Device and Reactor Using Plasma Generator - A plasma generator has a first member 12-23-2010
20100320915Flourescent lighting system - Methods and apparatus for providing a Fluorescent Lighting System are disclosed. In one embodiment, the present invention may be used as a fluorescent lamp ballast which is controlled using a non-resonant circuit that allows the ballast to lower to fifty percent the light output of the lamp while providing a corresponding fifty percent reduction in energy used.12-23-2010
20110163673DEVICE FOR GENERATING RADIOFREQUENCY PLASMA - A device for generating a radiofrequency plasma, that includes a voltage generator, and at least one ignition assembly that includes an ignition plug and a switch provided between a supply terminal of the plug and an output of the generator adapted for electrically connecting the output of the voltage generator to the plug upon reception of a control signal, and an electronic control unit generating the control signal. The electronic control unit measures values representative of evolution in time of the output voltage of the generator. The device further includes a mechanism varying the voltage and/or the frequency of the electric current applied to the supply terminal of the plug based on measured values. The evolution of the generator output voltage is representative of the condition of the plug (new or used).07-07-2011
20110115379CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS - A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.05-19-2011
20110080094RADIO-FREQUENCY ANTENNA UNIT AND PLASMA PROCESSING APPARATUS - The present invention aims at providing a radio-frequency antenna unit capable of generating a high-density discharge plasma in a vacuum chamber. The radio-frequency antenna unit according to the present invention includes: a radio-frequency antenna through which a radio-frequency electric current can flow; a protective tube made of an insulator provided around the portion of the radio-frequency antenna that is in the vacuum chamber; and a buffer area provided between the radio-frequency antenna and the protective tube. The “buffer area” refers to an area where an acceleration of electrons is suppressed, and it can be formed, for example, with a vacuum or an insulator. Such a configuration can suppress an occurrence of an electric discharge between the antenna and the protective tube, enabling the generation of a high-density discharge plasma in the vacuum chamber.04-07-2011
20110080093Apparatus and Method for Regulating the Output of a Plasma Electron Beam Source - An apparatus and method for controlling electron flow within a plasma to produce a controlled electron beam is provided. A plasma is formed between a cathode and an acceleration anode. A control anode is connected to the plasma and to the acceleration anode via a switch. If the switch is open, the ions from the plasma flow to the cathode and plasma electrons flow to the acceleration anode. With the acceleration anode suitably transparent and negatively biased with a DC high voltage source, the electrons flowing from the plasma are accelerated to form an electron beam. If the switch is closed, the ions still flow to the cathode but the electrons flow to the control anode rather than the acceleration anode. Consequently, the electron beam is turned off, but the plasma is unaffected. By controlling the opening and closing of the switch, a controlled pulsed electron beam can be generated.04-07-2011
20080218086PLASMA GENERATING APPARATUS - A plasma generating apparatus is provided with a plasma generating apparatus for ionizing gas by high frequency discharge within a plasma generating container to thereby generate a plasma and for discharging the plasma to the outside through a plasma discharge hole, an antenna disposed within the plasma generating container for radiating a high frequency wave, an antenna cover made of an insulator and covering a whole of the antenna, a DC voltage measuring device for measuring a DC voltage between the antenna and the plasma generating container, and a comparator for comparing the DC voltage with a reference value, and outputting an alarm signal when an absolute value of the DC voltage value is larger than the absolute value of the reference value.09-11-2008
20110148303EFFICIENT ACTIVE SOURCE IMPEDANCE MODIFICATION OF A POWER AMPLIFIER - A system, method, and apparatus for stabilizing interactions between an electrical generator and a nonlinear load are described. One illustrative embodiment includes an impedance element that is coupled to an output of the generator and a power source coupled to the impedance element. The power source applies power to, or across, the impedance element so as to reduce energy loss that would ordinarily occur due to energy dissipation by way of the impedance element. In many variations, the power source operates within a defined bandwidth so that a stabilizing effect is achieved outside of this bandwidth.06-23-2011
20100019677PLASMA PRODUCING APPARATUS AND METHOD OF PLASMA PRODUCTION - For production of plasma from a medium gas mass in an elongated shape, electric field forming elements 01-28-2010
20090108759High effficiency and high bandwidth plasma generator system for flow control and noise reduction - A plasma generation system includes a pulse generator having at least one switch and that is configured to convert a DC voltage to a desired high frequency, high breakdown voltage pulse sufficient to break down a high-breakdown voltage gap, wherein all pulse generator switches are solely low to medium voltage, high frequency switches, and further configured to apply the breakdown voltage to a plasma load for the generation of plasma. In one application, the plasma generation system is useful to manipulate the flow of jets and provide highly efficient acoustic noise reduction.04-30-2009
20120146508MEASURING AND CONTROLLING PARAMETERS OF A PLASMA GENERATOR - Methods, systems, and computer program products are described for measuring and controlling parameters of a plasma generator. A current in a primary winding of a transformer or inductive element that generates a plasma is measured. A voltage across a secondary winding of the transformer or inductive element is measured. Based on the current of the primary winding and the voltage across the secondary winding, a parameter of the plasma is determined. The parameter includes a resistance value associated with the plasma, a power value associated with the plasma, or both.06-14-2012
20120146509GENERATING PLASMAS IN PULSED POWER SYSTEMS - Generating plasmas in pulsed power systems. In one aspect, a system includes a plasma chamber having one or more anodes and cathodes arranged for generating a plasma in the plasma chamber, two or more plasma power supplies each having a pulsed power output suitable for generating the plasma and coupled to respective of the one or more anodes and cathodes of the plasma chamber and a signal generator supplying the input signal coupled to the inputs of the plasma power supplies. The input signal is selected to trigger the pulsing, by the arc management circuitry, of the power output from the plasma power supplies. The plasma power supplies each include arc management circuitry and an input coupled to trigger, in response to an input signal, pulsing, by the arc management circuitry, of the power output from the plasma power supply.06-14-2012
20090102385CAPACITIVELY COUPLED PLASMA REACTOR - A capacitively coupled plasma reactor includes a plasma reactor, a capacitive coupling electrode assembly including a plurality of capacitive coupling electrodes to induce plasma discharge inside the plasma reactor, a main power supply source to supply radio-frequency power, and a distribution circuit to receive the radio-frequency power supplied from the main power supply source and to distribute the received radio-frequency power to the plurality of capacitive coupling electrodes.04-23-2009
20110133650APPARATUS FOR GENERATING PLASMA - An apparatus for generating plasma is provided. The apparatus may include a vacuum chamber and a plasma source part. The plasma source part may include a dielectric part, an upper electrode, and an inductive coil. The dielectric part may be installed to protrude upward along a circumference of a through-hole provided at a top of the vacuum chamber. The upper electrode may be coupled to seal an opened top of the dielectric part. The inductive coil may spirally extend along an outer circumference surface of the dielectric part.06-09-2011
20120306369REACTOR STRUCTURE AND PLASMA TREATMENT APPARATUS - A distance from a negative output terminal of a secondary winding of the transformer to a feeding terminal of the cathode plate is longer than a distance from a positive output terminal of the secondary winding to a feeding terminal of the anode. The anode side feeding path electrically connects the feeding terminal of the anode bar to the positive output terminal of the secondary winding. The cathode side feeding path electrically connects the feeding terminal of the cathode plate to the negative output terminal of the secondary winding. A path length of the cathode side feeding path is longer than a path length of the anode side feeding path. The housing is formed by an electric conductor and is electrically connected to the cathode side feeding path.12-06-2012
20120038277POWER SUPPLY CONTROL DEVICE, PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD - According to one embodiment, a power supply control device of a plasma processing device having a plasma generation unit which generates plasma in a process chamber. The power supply control device includes a radio frequency power supply, a storage unit, and a matching circuit. The radio frequency power supply supplies a power to the plasma generation unit. The storage unit stores matching information including a first matching value, a second process condition, and a third matching value. The first matching value corresponds to process information of a first process condition. The second matching value corresponds to process information of a second process condition. The third matching value corresponds to process information of a transient state where the first process condition is being switched to the second process condition. The matching circuit matches impedances based on the matching information.02-16-2012
20090315463Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.12-24-2009
20120043890PROACTIVE ARC MANAGEMENT OF A PLASMA LOAD - Proactive arc management systems and methods are disclosed. In many implementations, proactive arc management is accomplished by executing an arc handling routine in response to an actual arc occurring in the plasma load and in response to proactive arc handling requests in a sampling interval. The number of proactive arc handling requests in a sampling interval is a function of a proactive arc management count that in turn is a function of actual number of arcs in a preceding sampling interval. Accordingly during a present sampling interval proactive arc management executes arc handling for actual arcs in the present sampling interval and for each count in a proactive arc management count updated as a function of the number of arcs in the immediately preceding sampling interval.02-23-2012
20120001549PLASMA SOURCE ELECTRODE - An electrode tile configuration is disclosed. The tile has contoured edges dimensioned to control any coupling effects. A plurality of tiles in a matrix configuration is also described.01-05-2012
20110095688Apparatus for Producing Plasma - An apparatus for producing plasma, includes a container provided with at least one discharge electrode and a power supply unit that has at least one coupling electrode that can be capacitively coupled to the discharge electrode. The power supply unit is adapted to be removable from the container. The at least one coupling electrode is disposed beneath an insulating layer. In this way, the user can not come into direct contact with a coupling electrode after removing the power supply unit.04-28-2011
20120013253Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator.01-19-2012
20120153829Method and Apparatus for the Generation of Short-Wavelength Radiation by Means of a Gas Discharge-Based High-Frequency, High-Current Discharge - The invention is related to a gas discharge-based radiation source which emits short-wavelength radiation, wherein an emitter is ionized and compressed by pulse-shaped currents between two electrodes arranged in a vacuum chamber and is excited to form an emitting plasma. According to the invention, the plasma is preserved by means of a high-frequency sequence of pulse-shaped currents the pulse repetition period of which is adjusted so as to be shorter than a lifetime of the plasma so that the plasma is kept periodically alternating between a high-energy state of an emitting compressed plasma and a low-energy state of a relaxing plasma. For exciting the relaxing plasma to the compressed plasma, excitation energy is coupled into the relaxing plasma by making use of pulse-shaped currents with repetition frequencies between 50 kHz and 4 MHz and pulse widths equal to the pulse repetition period.06-21-2012
20120119649PLASMA GENERATING APPARATUS - A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N−1) timing generating circuits which are connected between the oscillator and at least (N−1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.05-17-2012
20100207528PORTABLE POWER SUPPLY APPARATUS FOR GENERATING MICROWAVE-EXCITED MICROPLASMAS - Provided is a portable power supply apparatus for generating microwave plasma, capable of minimizing a power reflected from a plasma generation apparatus and improving power consumption of the plasma generation apparatus by generating the plasma by using a microwave having a specific frequency, monitoring the power reflected from the plasma generation apparatus after the generation of the plasma, detecting a changed impedance matching condition, and correcting the frequency.08-19-2010
20090058304Inductively-Coupled RF Power Source - A system and method are disclosed for implementing a power source including a power amplifier that generates a radio-frequency power signal with an adjustable operating frequency. The power amplifier also generates a reference phase signal that is derived from the radio-frequency power signal. An impedance match provides the radio-frequency power signal to a plasma coil that has a variable resonance condition. A phase probe is positioned adjacent to the plasma coil to generate a coil phase signal corresponding to the adjustable operating frequency. A phase-locked loop then generates an RF drive signal that is based upon a phase relationship between the reference phase signal and the coil phase signal. The phase-locked loop provides the RF drive signal to the power amplifier to control the adjustable operating frequency, so that the adjustable operating frequency then tracks the variable resonance condition.03-05-2009
20100052539PORTABLE MICROWAVE PLASMA GENERATOR CAPABLE OF GENERATING PLASMA WITH LOW ELECTRIC POWER - There is provided a small-sized portable microwave plasma generator capable of generating plasma at atmospheric pressure with low electric power including a coaxial cable, an outer conductor, a connection conductor, and a connection member. The coaxial cable includes a first inner conductor and a dielectric material encircling the first inner conductor. The outer conductor encircles the coaxial cable. The connection conductor includes at least one gas inlet tube. The connection conductor electrically connects between the first inner conductor and the outer conductor at one end of the coaxial cable. The connection member includes a second inner conductor passing through the outer conductor and then connecting to the first inner conductor.03-04-2010
20120212135CONTROL APPARATUS, PLASMA PROCESSING APPARATUS, METHOD FOR CONTROLLING CONTROL APPARATUS - According to one embodiment, a control apparatus configured to control a plasma processing apparatus including an electrode on which a substrate is disposed in a process room, a first power supply circuit, a plasma generation unit in the process room, a second power supply circuit, including a detection unit configured to detect parameters output from the first power supply circuit, and a control unit configured to control the first power and the second power supplied from the first power supply circuit and the second power supply circuit such that the parameters correspond to target values.08-23-2012
20120313524MINIATURIZABLE PLASMA SOURCE - The invention relates to a plasma source with an oscillator having an active element and a resonator connected to the active element. The resonator has a hollow body, a gas inlet, a gas outlet arranged at a distal end of the hollow body about a longitudinal axis of the hollow body, and a coil arranged along the longitudinal axis of the hollow body, said coil having an effective length of one quarter of a wavelength at a resonant frequency of the resonator. A distal end of the coil is arranged relative to the gas outlet such that a plasma section can form between the distal end of the coil serving as a first plasma electrode and the gas outlet of the hollow body serving as a second plasma electrode. At a proximal end of the hollow body, the coil is lead out of the interior of the hollow body through an electrically contact-free feed-through, and a proximal end of the coil contacts the hollow body at its external side. At a first contact region located between the proximal end of the coil and the feed-through, the coil is coupled to a first gate of the active element, and at a second contact region located between the proximal end of the coil and the feed-through, the coil is coupled to a second gate of the active element.12-13-2012
20120074844SIGNAL GENERATION SYSTEM - A signal generating system comprises a signal generator (03-29-2012
20100001647Method and Device for Igniting and Generating an Expanding Diffuse Microwave Plasma and Method and Device for Plasma Treating Surfaces and Substances by Using This Plasma - The invention relates to a method for igniting and generating an expanding diffuse microwave plasma and to a device for carrying out such a method. The method is particularly suited for generating microwave plasmas for the purpose of carrying out plasma treatment of surfaces and substances, particularly three-dimensional objects as well as particles under atmospheric pressure. The aim of the invention is to provide a method for igniting and generating these plasmas that is, particularly under normal and high pressure, easy and operationally safe as well as, in principle, carried out without a flow of gas. The invention also relates to a method and device for carrying out plasma treatment of surfaces and substances by means of such a plasma, which makes an effective plasma treatment possible due to its high stability with regard to plasma generation and maintenance, low gas consumption and a high plasma volume. To this end, a plasma ignition ensues inside a wave-bound hollow structure by means of microwave launching over a resonant igniting structure, a simultaneous impelling of the plasma through the resonant igniting structure, however, is not possible. The ignited plasma is supplied with energy via a surrounding microwave field so that an expanding diffuse plasma forms. A particular embodiment in a coaxial arrangement makes it possible to generate a plasma exiting the device for the purpose of carrying out mobile plasma treatment.01-07-2010
20120262064Radio Frequency Power Delivery System - A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.10-18-2012
20090134803Plasma device with low thermal noise - A plasma device having low thermal noise, which results in a high signal-to-noise ratio (SNR) of the plasma device. The plasma device includes devices with a plasma that is responsive to electromagnetic radiation and/or electrical signals. In various configurations, the plasma device has a plasma in which the temperature, resistance, pressure, and/or collision frequency are at a level sufficiently low to produce an acceptable level of noise. In another configuration, the operating frequency of the plasma device is at a level sufficiently high to produce an acceptable level of noise. Decreasing the noise level results in increasing the signal-to-noise ratio and increasing the data rate. The plasma temperature is reduced by operating the plasma device in the afterglow state. The plasma electron temperature is reduced by confining high energy electrons in a potential well and by using an electron emitting filament.05-28-2009
20120081006DEVICE FOR GENERATING PLASMA AND FOR DIRECTING AN FLOW OF ELECTRONS TOWARDS A TARGET - Various embodiments include a device for generating plasma and for directing an flow of electrons towards a specific target; the device comprises a hollow cathode; a main electrode at least partially placed inside the cathode; a resistor, electrically earthing the main electrode; a substantially dielectric tubular element extending through a wall of the cathode; a ring-shaped anode placed around the tubular element and earthed; and an activation group which is electrically connected to the cathode and is able to reduce the electric potential of the cathode of at least 8 kV in about 10 ns.04-05-2012
20120319584METHOD OF CONTROLLING THE SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM - Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.12-20-2012
20130009545SYNCHRONIZED AND SHORTENED MASTER-SLAVE RF PULSING IN A PLASMA PROCESSING CHAMBER - Plasma processing apparatuses and techniques for processing substrates, which include the use of synchronized RF pulsing of a first RF signal and a delayed-and-shortened second RF signal. The first RF signal may be the primary plasma-generating RF signal and the second RF signal may be the RF bias signal or vice versa. Alternatively or additionally, the first RF signal may be the high frequency RF signal and the second RF signal may be the lower frequency RF signal. Either the first RF signal or the second RF signal may act as the master, with the other acting as the slave signal. Alternatively, an external circuit may be employed as a master to control both the first RF signal and the second RF signal as slave signals. Track-and-hold techniques and circuits are provided to ensure accurate measurement for process control and other purposes.01-10-2013
20110273094PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a vacuum chamber, a plasma processing execution portion, a discharge state detecting unit, a window portion, a camera, a first storing portion, a second storing portion and an image data extracting unit. When an abnormal discharge is detected, the image data extracting unit extracts at least moving image data showing a generation state of the abnormal discharge from the first storing portion and stores the extracted moving image data in the second storing portion. When plasma processing is ended without the detection of the abnormal discharge, the image data extracting unit extracts, from the first storing portion, moving image data of a predetermined specific period or still image data of a specific period derived from the moving image data of the first storing portion and stores the extracted moving image data or the extracted still image data in the second storing portion.11-10-2011
20130134878LARGE AREA, ATMOSPHERIC PRESSURE PLASMA FOR DOWNSTREAM PROCESSING - An arcless, atmospheric-pressure plasma generating apparatus capable of producing a large-area, temperature-controlled, stable discharge at power densities between about 0.1 W/cm05-30-2013
20130134876MOVABLE GROUNDING ARRANGEMENTS IN A PLASMA PROCESSING CHAMBER AND METHODS THEREFOR - A plasma processing systems having at least one plasma processing chamber, comprising a movable grounding component, an RF contact component configured to receive RF energy from an RF source when the RF source provides the RF energy to the RF contact component, and a ground contact component coupled to ground. The plasma processing system further includes an actuator operatively coupled to the movable grounding component for disposing the movable grounding component in a first position and a second position. The first position represents a position whereby the movable grounding component is not in contact with at least one of the RF contact component and the ground contact component. The second position represents a position whereby the movable grounding component is in contact with both the RF contact component and the ground contact component.05-30-2013
20080197780PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a first high frequency power for outputting a first high frequency, electrically connected to a first electrode disposed inside a depressurizable processing chamber; a heater power supply electrically connected to a heating element provided in the first electrode via filter circuits for reducing noise of the first high frequency. The plasma processing apparatus further includes air core primary inductors provided in primary stages of the filter circuits when seen from the heating element; and a grounded conductive case for surrounding or accommodating the primary inductors.08-21-2008
20100308730Method and device for creating a micro plasma jet - A microhollow cathode discharge assembly capable of generating a low temperature, atmospheric pressure plasma micro jet is disclosed. The microhollow assembly has two electrodes: an anode and a cathode separated by a dielectric. A microhollow gas passage is disposed through the three layers. In some embodiments, the passage is tapered such that the area at the first electrode is larger than the area at the second electrode. When a potential is placed across the electrodes and a gas is directed through the gas passage, then a low temperature micro plasma jet can be created at atmospheric pressure or above.12-09-2010
20110234102APPARATUS FOR NORMAL PRESSURE PLASMA IGNITION AND METHOD FOR NORMAL PRESSURE PLASMA IGNITION USING SAME - Provided are an apparatus for normal pressure plasma ignition and a method for normal pressure plasma ignition using the same. The apparatus for normal pressure plasma ignition of the present invention comprises a wave guide tube wherein microwaves are applied, a dielectric tube that penetrates said wave guide tube and introduces a reactant gas, and an ignition apparatus for normal pressure plasma wherein microwaves are applied in said dielectric tube to turn said reactant gas into plasma, wherein said ignition apparatus penetrates said dielectric tube and includes an ignition rod that emits thermal electrons as said microwaves are applied in said dielectric tube. The apparatus for normal pressure plasma ignition according to the present invention enables ignition to be accomplished without power, so that the problems with the prior art that requires high voltage (excessive power, stability issues) may be avoided at the same time. In addition, the normal pressure plasma ignition apparatus according to the present invention enables movement of the ignition rod inside and outside its dielectric tube so that physical damage to the ignition apparatus due to plasma heat may be prevented, and also affords the effect that the scope of metallic materials used in the ignition apparatus is significantly wider than that of the prior art.09-29-2011
20110234101Induction switch - The invention relates to an induction switch comprising a discharge container filled with gas and a coaxially interleaved electrode device, and to a corresponding method for commutating high voltages. The inductive production of a dense plasma and the subsequent flooding of an electrode gap with the plasma ions produced enables the commutation of high currents in the kiloamp range when there are blocking voltages of over 500 kV. Such an induction switch only requires a single discharge gap, can be used over a very wide voltage range, and avoids the problem of electrode erosion as a result of the electrode-free energy coupling.09-29-2011
20110234100SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A processing speed may be easily controlled over the wide range within the impedance variation range. A substrate processing apparatus includes: a processing chamber configured to process a substrate; a substrate support unit configured to support the substrate in the processing chamber; a processing gas supply unit configured to supply a processing gas into the processing chamber; a plasma generation electrode configured to convert the processing gas supplied into the processing chamber to be in a plasma state; a radio frequency power source configured to apply a radio frequency power to the plasma generation electrode; a variable impedance electrode installed at the substrate support unit and configured to control an electric potential of the substrate; a variable impedance mechanism connected to the variable impedance electrode and configured to vary an impedance according to a reciprocal of a peak-to-peak voltage of the plasma generation electrode; an exhaust unit configured to exhaust an atmosphere in the processing chamber; and a controller configured to control at least the variable impedance mechanism.09-29-2011
20110234099PLASMA GENERATION APPARATUS - Provided is an apparatus, such as an arc mitigating device, which can include a first plasma generation device and a second plasma generation device. The second plasma generation device can include a pair of opposing and spaced apart electrodes and a low voltage, high current energy source connected therebetween. A conduit can be configured to direct plasma between the first and second plasma generation devices, such that the second plasma generation device receives plasma generated by the first plasma generation. The plasma from the first plasma generation device can act to reduce the impedance of an area between the pair of opposing electrodes sufficiently to allow an arc to be established therebetween due to the low voltage, high current energy source.09-29-2011
20110309749METHOD AND APPARATUS FOR OPERATING TRAVELING SPARK IGNITER AT HIGH PRESSURE - An ignition circuit and a method of operating an igniter (preferably a traveling spark igniter) in an internal combustion engine, including a high pressure engine. A high voltage is applied to electrodes of the igniter, sufficient to cause breakdown to occur between the electrodes, resulting in a high current electrical discharge in the igniter, over a surface of an isolator between the electrodes, and formation of a plasma kernel in a fuel-air mixture adjacent said surface. Following breakdown, a sequence of one or more lower voltage and lower current pulses is applied to said electrodes, with a low “simmer” current being sustained through the plasma between pulses, preventing total plasma recombination and allowing the plasma kernel to move toward a free end of the electrodes with each pulse.12-22-2011
20110309748RF MATCHING NETWORK OF A VACUUM PROCESSING CHAMBER AND CORRESPONDING CONFIGURATION METHODS - A RF matching network is described, and which includes a 112-22-2011
20130187544METHOD AND APPARATUS FOR GENERATING PLASMA PULSES - A method for generating plasma pulses in which at least two sources are furnished with at least one time function, wherein each of the at least two sources radiates an electromagnetic field generated by one of the time functions, and the at least one time function and the at least two sources cooperate in such a manner that at least one predetermined field strength is realized sequentially in a temporal succession in at least two predetermined space-time points. An alternative method provides at least one source and at least one reflection element for realizing the predetermined field strength. The apparatus for generating plasma pulses comprises at least two sources and at least one data processing device or at least one source, at least one reflection element and at least one data processing device and is configured in such a manner that a method for generating plasma pulses can be executed.07-25-2013
20130187545Ignition Circuit for Igniting a Plasma fed with Alternating Power - In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.07-25-2013
20120019143Plasma Generator and Method for Controlling a Plasma Generator - A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.01-26-2012
20120086339GAS DELIVERY DEVICES AND METHODS04-12-2012

Patent applications in class Plasma generating

Patent applications in all subclasses Plasma generating