Entries |
Document | Title | Date |
20080197779 | VARIOUS METHODS, APPARATUSES, AND SYSTEMS THAT USE IONIC WIND TO AFFECT HEAT TRANSFER - A method, apparatus, and system are described for an ionic wind generator. The ionic wind generator may have a first electrode that is elevated off a surface of a device that the ionic wind generator is intended to cool. A first surface of the first electrode is in contact with a first surface of a first post that elevates the first electrode off the surface of the device that the ionic wind generator is intended to cool. The ionic wind generator causes a generation of ions that are then drawn through an interstitial atmosphere from the first electrode to a second electrode to affect a velocity of local flow over the surface of the device between the first electrode and the second electrode. The flow from a forced flow device also affects the velocity of local flow over the surface of the device between the first electrode and the second electrode, | 08-21-2008 |
20090058303 | High Frequency Generator for Ion and Electron Sources - A device for coupling ionization energy into an ion or electron source, which is excited inductively or inductively-capacitively is provided. The device includes: a discharge vessel for a gas, which is to be ionized; a coupling coil, which is wound around the discharge vessel and feeds in a high frequency energy, which is required for plasma excitation; a coupling capacitor, which is electrically coupled to the coupling coil; a high frequency generator, which is electrically coupled to the coupling coil. The high frequency generator forms, together with the at least one coupling capacitor, a resonant circuit. The high frequency generator includes a PLL controller for automatic impedance matching of the resonant circuit, so that the resonant circuit can be driven at a resonant frequency. | 03-05-2009 |
20100134013 | METHOD AND SYSTEM FOR ADJUSTING THE FREQUENCY OF A RESONATOR ASSEMBLY FOR A PLASMA LAMP - A plasma electrodeless lamp comprises a substantially hollow metallic body, closely receiving two coupling elements, the first coupling element connected to the output of an RF amplifier, and the second coupling element connected to the input of an RF amplifier. The first coupling element is conductively connected (grounded) to metallic lamp body at its top surface, while the second coupling element is not. The lamp further comprises a vertical metallic post, the post being grounded to the metallic lamp body at the post's bottom surface. The lamp further comprises a dielectric sleeve which closely receives the metallic post, and which is in turn closely supported by the lamp body or alternatively or in combination a tuning stub. The lamp further comprises a bulb that is closely received by the metallic post, and that encloses a gas-fill which forms a radiant plasma when excited. | 06-03-2010 |
20100207527 | Multi-functional power supply for a hall thruster - A multi-functional power supply system for a Hall thruster including a thruster assembly for providing a plasma discharge and a cathode assembly for providing electrons. The cathode assembly includes an emitter, a keeper with a current limiting device, and a heater. A magnetic field source is operatively associated with the cathode assembly for generating a magnetic field to control the discharge. A plasma discharge circuit creates a plasma and accelerates the plasma to produce thrust. A power supply is connected to the keeper and the plasma discharge circuit and is connected to the heater through a switching device responsive to a predetermined condition for interrupting the power to the heater and simultaneously enabling the power supply to deliver power to the keeper and the plasma discharge circuit to initiate production of thrust. | 08-19-2010 |
20110156590 | Plasma Temperature Control Apparatus and Plasma Temperature Control Method - The plasma temperature control apparatus includes a plasma generating section | 06-30-2011 |
20120146507 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT, AND LASER APPARATUS - An extreme ultraviolet light generation system used with a laser apparatus may be provided, and the extreme ultraviolet light generation system may include: a chamber including at least one window for at least one laser beam and a target supply unit for supplying a target material into the chamber; and at least one polarization control unit, provided on a laser beam path, for controlling a polarization state of the at least one laser beam. | 06-14-2012 |
20120286664 | METHOD AND SYSTEM FOR SELECTIVELY TUNING THE FREQUENCY OF A RESONATOR ASSEMBLY FOR A PLASMA LAMP - A plasma lamp system is described with the capability to tune the resonant frequency of the resonator of the plasma lamp system after the manufacturing process has been completed. The tuning method developed allows a simple low-cost approach to continuously tune the resonant frequency and set the desired frequency to an ISM (Industrial Scientific Medical) band or set the resonant frequency to optimize the performance of the system. The tuning ability of the resonator relaxes the tolerance required for the dimensions of the resonator reducing the manufacturing cost and improving the manufacturing yield of the plasma lamp. | 11-15-2012 |
20150015144 | HIGH EFFICIENCY CERAMIC LAMP - Embodiments provide a ceramic metal halide (CMH) lamp and methods for making the same that provide or achieve, during lamp operation, a correlated color temperature (CCT) greater than 5000 K, a color rendering index (CRI) of 85 or greater, a lumen maintenance percentage (LM %) greater than 90%, and a life of at least 15,000 hours. | 01-15-2015 |
20150084508 | STRUCTURAL BODY AND ELECTRODE STRUCTURE - A structural body is provided in fluid, perpendicular to a typical flow direction of the fluid. The structural body includes a cylindrical insulating body having at least one hollow portion and at least one conducting body positioned in the hollow portion of the insulating body. In a cross section of the insulating body having a normal line in an axial direction of the insulating body, the following relationship is satisfied: | 03-26-2015 |
20150145414 | MICROWAVE PULSE GENERATOR WITH VARIABLE FREQUENCY EMISSION - A variable frequency microwave pulse generator that includes a high voltage charger for charging with a high voltage, a high pressure gas tank for supplying insulation gas, and an electrode discharge unit. The electrode discharge unit includes a case, an accommodation section defined inside the case, and a pair of electrode sections disposed at one side and the other side of the accommodation section so as to face each other. The pair of electrode sections is spaced apart from each other to define a spark gap therebetween where the insulation gas supplied from the high pressure gas tank is loaded. An annular resonance recess is defined at the central portion of one electrode section of the pair of electrode sections, the depth of the resonance recess being variable in response to an adjustment knob disposed on the case being manipulated. | 05-28-2015 |
20160379796 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus includes a processing chamber, a first electrode and a second electrode disposed to face each other, a high frequency power supply unit for applying a high frequency power to either the first electrode or the second electrode, a processing gas supply unit for supplying a processing gas to a processing space, and a main dielectric member provided at a substrate mounting portion on a main surface of the first electrode. A focus ring is attached to the first electrode to cover a peripheral portion of the main surface of the first electrode and a peripheral dielectric member is provided in a peripheral portion on the main surface of the first electrode so that an electrostatic capacitance per unit area applied between the first electrode and the focus ring is smaller than that applied between the first electrode and the substrate by the main dielectric member. | 12-29-2016 |