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Deforming the surface only

Subclass of:

264 - Plastic and nonmetallic article shaping or treating: processes

264239000 - MECHANICAL SHAPING OR MOLDING TO FORM OR REFORM SHAPED ARTICLE

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DocumentTitleDate
20110193263NANO IMPRINT APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME - A nano imprint apparatus comprising: a nano imprint template; and a deformation correction unit arranged on the nano imprint template to correct deformation of the nano imprint template.08-11-2011
20110193262Method for forming a microstructure on a polymeric substrate - A method for forming a microstructure on a polymeric substrate includes: providing a master mold formed with a micro-feature thereon, the micro-feature having a base portion and a plurality of protrusion portions protruding from the base portion, each of the protrusion portions having a tapered anisotropic shape, including a free end distal from the base portion, and being spaced apart from an adjacent one of the protrusion portions, a distance between the free ends of two adjacent ones of the protrusion portions being not greater than 40 nm; and impressing the free end of each of the protrusion portions of the micro-feature into the polymeric substrate at an elevated temperature T08-11-2011
20100072665THERMAL IMPRINTING DEVICE AND THERMAL IMPRINTING METHOD - A thermal imprinting device, including: a mold on the surface of which is formed a concavity and convexity pattern to be formed in a transfer layer; a pressing mechanism which brings the mold into close contact with the transfer layer and performs pressing; and a pair of heating mechanisms arranged at positions enclosing the mold and the transfer substrate to heat the mold and the transfer substrate. At least one of the heating mechanisms has a plurality of heating regions comprising a central heating region and at least one peripheral heating region surrounding the central heating region, and has different heating abilities for each of the heating regions.03-25-2010
20100072664IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - An imprint apparatus for pressing resin and a mold to each other in a Z-axis direction to form a resin pattern on a shot region includes: a mold chuck; an X-Y stage; a reference mark formed on the stage; a first scope configured to measure a positional deviation in an x-y plane between a mold mark and the reference mark; a second scope configured to measure a position of a substrate mark in the plane not via the mold mark; and a dispenser configured to dispense resin. In the plane, the dispenser center is deviated in position from the mold chuck center by a first distance in a first direction, and the second scope center is deviated in position from the dispenser center by a distance smaller than twice the first distance in the first direction or a second direction opposite thereto.03-25-2010
20130032971METHOD FOR FORMING PATTERNS AND METHOD FOR PRODUCING PATTERNED SUBSTRATES - A resist layer constituted by a resist composition (which may include unavoidable impurities) including a polymerizable compound that includes polyfunctional monomers that become polymers having three dimensional structures by cross linking when polymerized and a polymerization initiating agent which is activated by one of light and an electron beam is formed on a substrate. A surface of a mold having a predetermined pattern of protrusions and recesses is pressed against the resist layer. Light is irradiated onto the resist layer to cure the resist layer. The mold is separated from the resist layer under conditions that the temperature of the resist layer is 40° C. or greater.02-07-2013
20100032867Method and apparatus for embossing non woven webs - A method of embossing an air-laid or double recrepe absorbent fabric including: providing a web of fabric; moving the web material along a web material path; providing a rotary embossing roller and a cooperating backing roller, the rotary embossing roller having a hard rubber embossing surface having a laser engraved embossing pattern with a depth of from about 0.010 inches to about 0.040 inches; providing a nip between the rotary embossing roller and backing roller; moving the web material through the nip between the rotary embossing roller and backing roller whereby a predetermined pattern is embossed on the web material. The embossing roller surface is biased toward the surface of the smooth backing roller. The surface of the backing roller being composed of a soft rubber compound having a durometer hardness of between 20 to 60.02-11-2010
20100044917IMPRINT LITHOGRAPHY - An imprint lithography apparatus is disclosed that has a first support structure arranged to support an imprint template, and a first actuator attached to the first support structure, and arranged in use to be located between the first support structure and the imprint template. The first actuator is configured to apply a force to the imprint template. The imprint lithography apparatus further includes a second support structure and a second actuator located between the second support structure and the first support structure. The second actuator is configured to apply a force to the second support structure, wherein a range of movement of the second actuator is greater than a range of movement of the first actuator.02-25-2010
20100096775MOLD IMPRINTING - A method of patterning an article is disclosed. The method includes providing an article and providing a mold with first and second surfaces. The first surface includes a pattern. The method also includes providing a transfer medium between the mold and a surface of the article. The mold is pressed against the surface of the article with air pressure. A thickness of the mold enables the air pressure to cause the mold to contact the surface to produce an even pattern.04-22-2010
20090160090Panel for indicating instrument, method of manufacturing the panel, and indicating instrument having the panel - A panel for an indicating instrument has a base plate. The base plate has a line pattern with lines. The line pattern is defined by projections and grooves. A desired metal-like appearance is converted into a glossiness ratio Gp/Gv. The projections and grooves are formed at intervals and have at least one dimension in a direction perpendicular to the surface such that the surface has a predetermined glossiness ratio Gp/Gv. Gp is a glossiness measured in a direction parallel to an axis of at least one line. Gv is a glossiness measured in a direction perpendicular to an axis of at least one line.06-25-2009
20100109195RELEASE AGENT PARTITION CONTROL IN IMPRINT LITHOGRAPHY - Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.05-06-2010
20100109194Master Template Replication - Systems and methods for providing multiple replicas from a master template are described. Replicas may be formed having a mesa. In one embodiment, a dummy fill region may be included on master template and/or replicas.05-06-2010
20130134628Apparatus for Fabricating Parts and Method of Forming the Apparatus - An apparatus for receiving a plurality of mold assemblies having a first mold portion and a second mold portion operably connected together for forming parts. The apparatus includes a mold holding member and a pair of spaced apart support members extending from the mold holding member to a manufacturing floor. A carriage device is cooperable with the mold holding member for engaging and moving the mold assembly. A lifting mechanism is used for moving the carriage device relative the mold holding member to move the mold assembly to be engaged with mold holding member. A turn table adjacent to the mold holding member holds the mold assemblies and is movable relative the mold holding member thereby replacing the mold assemblies. A controller is operably connected to the mold holding member and the turn table thereby moving the turn table relative the mold holding member to interchange the mold assemblies.05-30-2013
20110001264PRODUCTION METHOD AND PRODUCTION DEVICE OF FILM HAVING FINE IRREGULAR PATTERN ON SURFACE - A method for producing a film having a fine irregular pattern intermittently includes feeding a film to be processed intermittently from upstream side to the vicinity of the surface of a die having a fine irregular pattern, transferring the pattern to the surface of the film by pressing the film against the surface of a die, stripping the processed film on which a pattern is formed from the surface of a die, and then feeding a new film to be processed to the die, wherein the processed film is stripped from the surface of a die by gripping and moving the processed film to the upstream side, and then the processed film is fed by a length of intermittent feed to the surface of a die while preventing the processed film from creasing.01-06-2011
20100001434Stamping Methods and Devices - A method of forming a stamped feature (P) on a substrate (S) includes: applying a plurality of stamping tool segments (01-07-2010
20120217676FLUORINATED SILAZANE RELEASE AGENTS IN NANOIMPRINT LITHOGRAPHY - An imprint lithography release agent having general formula (1):08-30-2012
20130069276FOIL EMBOSSING DEVICE - The foil embossing device comprises an embossing roller and two counter-rollers, one of the rollers being driven by a drive and the rollers having a configuration where the teeth, rings, or ridges project from the base cylinder, at least the embossing roller having teeth that project from the base cylinder and at least partly also serve for driving the counter-roller. To increase the uniformity of the embossing of the foil, the embossing roller has a diameter that is reduced by 0.02 to 0.20 mm over a certain length that is at least the same as the width of the foil. The length of the reduced diameter is preferably chosen so as to exceed the width of the foil being printed. Due to this depression, such a device allows a perfectly uniform embossing of foils of any kind independently of the design of the embossing rollers.03-21-2013
20130069275PRINTING TRANSFERABLE COMPONENTS USING MICROSTRUCTURED ELASTOMERIC SURFACES WITH PRESSURE MODULATED REVERSIBLE ADHESION - In a method of printing a transferable component, a stamp including an elastomeric post having three-dimensional relief features protruding from a surface thereof is pressed against a component on a donor substrate with a first pressure that is sufficient to mechanically deform the relief features and a region of the post between the relief features to contact the component over a first contact area. The stamp is retracted from the donor substrate such that the component is adhered to the stamp. The stamp including the component adhered thereto is pressed against a receiving substrate with a second pressure that is less than the first pressure to contact the component over a second contact area that is smaller than the first contact area. The stamp is then retracted from the receiving substrate to delaminate the component from the stamp and print the component onto the receiving substrate. Related apparatus and stamps are also discussed.03-21-2013
20130056906RESIN FOR THERMAL IMPRINT - A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.03-07-2013
20130056904IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.03-07-2013
20130056905IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.03-07-2013
20130056903IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate, the apparatus including a controller configured to control the imprint process to form a predetermined layer on the substrate with a target layer, which is formed on the substrate, used as an alignment reference, wherein the controller is configured to select a mold from a plurality of molds prepared for the predetermined layer, such that an overlay error between the target layer and the predetermined layer falls within a tolerance.03-07-2013
20120112385PATTERNING OF NON-CONVEX SHAPED NANOSTRUCTURES - Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.05-10-2012
20130161869METHOD OF MANUFACTURING FINE STRUCTURE BODY AND FINE STRUCTURE MOLD - The present invention is a method of manufacturing a fine structure body which manufactures the fine structure body by repeating a basic fine structure body forming step that forms a basic fine structure body by pressing a fine structure mold against a curable resin (photocurable resin film) on a surface of a base material and a release and moving step that releases the fine structure mold from the base material and moves the fine structure mold, wherein the fine structure mold includes at least a first mold depression pattern which is disposed at center area of it, and a second mold depression pattern which is disposed in at least one side part in circumference area of it, and a size of the second mold depression pattern is smaller than a size of the first mold depression pattern.06-27-2013
20090236772PATTERN TRANSFER MOLD AND PATTERN TRANSFER METHOD - A pattern transfer mold is suitable for transferring at least one decorative pattern of a film to at least one workpiece. The pattern transfer mold includes a mold base and a mold core. The mold base has a mold cavity and an air vent associated with the mold cavity. The mold core is inserted in the mold cavity of the mold base and has an upper surface and a plurality of upper air grooves on the upper surface. The mold cavity and the mold core have a plurality of mold air channels located between the mold cavity and the mold core. The upper air grooves are associated with the air vent via the mold air channels.09-24-2009
20080308971Solvent-Assisted Layer Formation for Imprint Lithography - A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.12-18-2008
20130161868IMPRINT LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD THEREFOR - An imprint lithography apparatus uses a mold having a pattern formed thereon and transfers the pattern to an imprint material fed to a substrate. The apparatus includes a light-receiving element; a detection system that irradiates a mark formed on the substrate and a mark formed on the mold with light which is reflected therefrom, and guides the light reflected from the mark formed on the substrate and from the mark formed on the mold to the light-receiving element; a relay optical system that causes the light reflected to focus between the mold and the detection system; an illumination system that emits illumination light for curing the imprint material; an optical element having a surface that transmits one of the illumination light and the light from the detection system and reflects the other; and a plate-shaped optical member that corrects aberration of the relay optical system.06-27-2013
20110018168IMPRINT LITHOGRAPHY TEMPLATE - An imprint lithography template is disclosed. In an embodiment, the template includes a patterned region to imprint a layer of imprintable medium, and an alignment mark for use in aligning the imprint template, the alignment mark configured such that imprintable medium is prevented from filling the alignment mark when the imprint template imprints the imprintable medium.01-27-2011
20110018167IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography apparatus is disclosed. The apparatus includes an imprint template arrangement for use in imprinting a pattern into a substrate provided with an amount of imprintable medium, a substrate holder configured to hold the substrate, and a chamber having an inlet to allow gas to flow into the chamber and an outlet to allow gas to flow out of the chamber, wherein the imprint template arrangement and the substrate holder are located within the chamber, the chamber, in use, being arranged to contain a gaseous atmosphere. The chamber may be part of a gas circulation system, the inlet and outlet of the chamber being connected to further components of the gas circulation system, the further components of the gas circulation system including: a gas circulation driver configured to drive gas around the gas circulation system; and/or a gas purification unit configured to purify the gas as it circulates around the gas circulation system.01-27-2011
20120267826MOLD FOR PRODUCING MICROPRODUCT AND METHOD OF PRODUCING MICROPRODUCT - A mold for producing a microproduct includes a first mold on which a stamper member is disposed, and a second mold that relatively moves with respect to the first mold. The first mold includes a frame and a base mold. The base mold includes a back side section that supports the back side of the stamper member. The frame includes a front side restriction section that is positioned opposite to the front side edge area of the stamper member, and a sidewall that is positioned opposite to the side of the stamper member. A given clearance is provided between the front side edge area of the stamper member and the front side restriction section of the frame and/or between the side of the stamper member and the sidewall of the frame.10-25-2012
20120217675IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus comprises: a first scope configured to measure a position deviation amount between a shot region and an original; and a controller. The controller brings the original into contact with the resin coated on each of not less than two shot regions of plural shot regions, which is aligned based on preobtained layout data, and measures a position deviation amount between each of the not less than two shot regions and the original using the first scope, calculates a position deviation amount between each of the plural shot regions and the original statistically processing the measured position deviation amounts, and corrects the layout data of the plural shot regions using the calculated position deviation amounts, and executes the imprint process while aligning each shot region other than the not less than two shot regions with the original based on the corrected layout data.08-30-2012
20100078855METHODS FOR FABRICATING LARGE AREA NANOIMPRINT MOLDS - This invention relates to the fabrication of large area nanoimprint molds having complex patterns with minimal or no use of direct-writing, such as electron beam lithography, ion, laser beam, or mechanical beam lithography. This can be accomplished by forming a pattern of simple nanoscale features and converting the simple features into more complex nanoscale features by a process comprising shadow deposition. The process may also include steps of uniform deposition, etching and smoothing depending on the shape of the complex features.04-01-2010
20090200707METHOD OF FABRICATING GRAPHENE STRUCTURES ON SUBSTRATES - The present invention relates to fabrication of graphene structures having a predefined pattern. The invention provides a new method that comprises obtaining a body of highly oriented graphite (08-13-2009
20110140305METHOD OF LOW TEMPERATURE IMPRINTING PROCESS WITH HIGH PATTERN TRANSFER YIELD - The present invention is directed to novel methods of imprinting substrate-supported or freestanding structures at low cost, with high pattern transfer yield, and using low processing temperature. Such methods overcome many of the above-described limitations of the prior art. Generally, such methods of the present invention employ a sacrificial layer of film.06-16-2011
20110147989DEVICE AND METHOD FOR FABRICATING FLAT DISPLAY DEVICE - Disclosed are a device and method for fabricating a flat display device which can minimize an error of alignment of an imprinting mold and a substrate. The device for fabricating a flat display device includes a stage for seating a substrate; an imprinting mold bonded with the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves; and a mold holder for holding sides of the imprinting mold when the substrate and the imprinting mold are bonded with each other.06-23-2011
20100078856Method and Apparatus for Debossing a Silicone Bracelet - A method and apparatus for debossing a silicone bracelet. The method utilizes an apparatus that includes two opposing press members, with each press member including one or more ridges that form a groove for receiving printing blocks bearing symbols, such as letters of the alphabet, insignia or punctuation to form a customized message for debossing onto a silicone bracelet.04-01-2010
20100078854Nanotemplate arbitrary-imprint lithography - In a method for imprinting a layer of material, a nanotemplate is impressed into a material layer, and the nanotemplate is maintained impressed in the material layer until a geometric trench corresponding to geometry of the nanotemplate is formed in the layer, and the nanotemplate is then removed from the material layer. A nanotemplate geometric trench is repeatedly formed in the material layer by nanotemplate impressions in the layer, until a final desired imprint pattern is produced in the layer. Each nanotemplate geometric trench is characterized by an extent that is a fraction of an extent of the final desired imprint pattern. The material layer is maintained in a condition for accepting nanotemplate impressions continuously throughout the nanotemplate impression repetition.04-01-2010
20100123268Printing Semiconductor Elements by Shear-Assisted Elastomeric Stamp Transfer - Provided are methods and devices for transfer printing of semiconductor elements to a receiving surface. In an aspect, the printing is by conformal contact between an elastomeric stamp inked with the semiconductor elements and a receiving surface, and during stamp removal, a shear offset is applied between the stamp and the receiving surface. The shear-offset printing process achieves high printing transfer yields with good placement accuracy. Process parameter selection during transfer printing, including time varying stamp-backing pressure application and vertical displacement, yields substantially constant delamination rates with attendant transfer printing improvement.05-20-2010
20090273119Imprint Method and Imprint Apparatus - [Problems] In an imprint method, any displacement of a pattern shape due to thermal deformation of a mold is prevented and the pattern shape is formed accurately on a substrate.11-05-2009
20090267267IMPRINT METHOD - An imprint method includes contacting a template on a substrate, the template including a pattern to be transferred on the substrate, separating the template from the substrate, and removing particle adhered on the template before contacting the template on the substrate, the removing the particle including pressing the template on an adhesive member and separating the pressed template from the adhesive member, wherein adhesiveness of the adhesive member to the template is higher than adhesiveness of the adhesive member to the substrate.10-29-2009
20090261504IMPRINTING METHOD AND APPARATUS THEREFOR - An imprinting method includes the steps of setting a room-temperature imprint resist-coated substrate and a mold having a transfer surface having a pattern of projections and recesses therein in an assembling jig, pressing the patterned surface of the mold against the resist surface of the substrate, and releasing the mold from the substrate to separate the substrate, the mold and the assembling jig from one another. The steps are performed in plural independent units in each of which one step is executed, and the mold and the substrate are paired with each other by the assembling jig and conveyed between the units in a range of from the alignment step to the separation step. An imprinting apparatus includes an alignment unit which performs the alignment step, a press unit performing the press step, and a separation unit performing the separation step, wherein conveyance devices are provided to convey the mold and substrate between units.10-22-2009
20120292821DEVICE FOR EMBOSSING WRAPPING FOILS - The device for embossing wrapping foils comprises an embossing roller and two counter-rollers, one of which is driven via a drive, the embossing and the counter-rollers being designed in a pinup-pinup configuration, at least the embossing roller having teeth that project from the roller cylinder in the so-called pinup-pinup configuration and the teeth being pyramidal or conical and at least partly also serving for driving the counter-rollers, whereby the embossing roller and counter-rollers are designed for embossing logos on a foil strip and, for being utilizable in an online process, comprise means to avoid a pitching movement of the embossing roller independently of the number and length of gaps in or between logos and of the width of the foil strip.11-22-2012
20120032372METHOD AND APPARATUS FOR ARTIFICIALLY AGING PRE-CAST BLOCKS - A method and apparatus for modifying the surface texture of pre-cast building blocks including a pressure-applying device so positioned as to selectively engage blocks and being adapted to apply a pressure on the surface of blocks so as to modify their texture thereof prior to the curing of the blocks. Also disclosed is an apparatus for modifying the surface texture of pre-cast building blocks including mechanisms and structures adapted to provide a plurality of longitudinal movements and a plurality of rotational movements to adjust the direction of the wearing tool in respect to the alignment of the blocks when modifying the surface texture of these blocks as well as a block-stabilizing device for stabilizing blocks during surface-texture modification operations.02-09-2012
20080277826Compositions and processes for nanoimprinting - The invention is directed to new nanoimprint resist and thin-film compositions for use in nanoimprinting lithography. The compositions permit economical high-throughput mass production, using nanoimprint processes, of patterns having sub-200 nm, and even sub-50 nm features.11-13-2008
20080211138Method and Apparatus For Artificially Aging Pre-Cast Blocks - A method and apparatus for modifying the surface texture of pre-cast building blocks including a pressure-applying device so positioned as to selectively engage blocks and being adapted to apply a pressure on the surface of blocks so as to modify their texture thereof prior to the curing of the blocks. Also disclosed is an apparatus for modifying the surface texture of pre-cast building blocks including mechanisms and structures adapted to provide a plurality of longitudinal movements and a plurality of rotational movements to adjust the direction of the wearing tool in respect to the alignment of the blocks when modifying the surface texture of these blocks as well as a block-stabilizing device for stabilizing blocks during surface-texture modification operations.09-04-2008
20120292820METHOD AND DEVICE FOR NANOIMPRINT LITHOGRAPHY - The invention relates to an imprinting device for imprinting nano/micro structures. The imprinting device comprises a second expandable cavity constituted in part by a membrane of the stamp. The membrane is flexible and formed in such a way so that when fluid is pumped into the expandable cavity then the membrane expands towards the imprintable substrate and imprints the substrate. The imprinting device is further provided with a force provider, alternatively a first expandable cavity, for forcing a contact part of the substrate to make contact with a matching contact part of the stamp.11-22-2012
20080303187Imprint Fluid Control - An imprint lithography template with an active area arranged to receive imprinting material during an imprint lithography process and a non-active area adjacent the active area is described. At least a portion of the non-active area is treated to inhibit flow of the imprinting material from the active area to the non-active area during the imprint lithography process.12-11-2008
20080258339Method for the Production of a Substrate Having a Holographic Appearance - A means of digitizing the topography of an art work is disclosed. A means of reproducing said art work and the related apparatus are also disclosed. The art reproduction process disclosed employs a thin sheet of thermoformable plastic onto which a permanent image of an art work has been created and which is heated prior to either a dot matrix print head, a daisy wheel print head, or both being employed to apply mechanical force to said thin sheet of thermoformable plastic sheet so as to create an accurate three-dimensional relief reproduction of an original artwork. An alternative embodiment is also disclosed wherein the art reproduction process employs a thin sheet of paper or cardboard onto which a permanent image of an art work has been created and which is heated and humidified with steam prior to either a dot matrix print head, a daisy wheel print head, or both being employed to apply mechanical force to said thin paper or cardboard sheet so as to create an accurate three-dimensional relief reproduction of an original artwork.10-23-2008
20130214452LARGE AREA IMPRINT LITHOGRAPHY - Methods and systems are provided for patterning polymerizable material dispensed on flexible substrates or flat substrates using imprint lithography techniques. Template replication methods and systems are also presented where patterns from a master are transferred to flexible substrates to form flexible film templates. Such flexible film templates are then used to pattern large area flat substrates. Contact between the imprint template and substrate can be initiated and propagated by relative translation between the template and the substrate.08-22-2013
20110221095Step and Repeat Imprint Lithography Process - The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.09-15-2011
20090026657Alignment System and Method for a Substrate in a Nano-Imprint Process - A transparent imprint template mold is configured with gratings surrounding the active imprint area. The gratings are fabricated at the same time as the active area and thus accurately define the active area with respect to the gratings. The substrate is positioned in tool coordinates under the template mold. A sensor system generates a beam of optical energy and receives reflected energy only at a specific angular window and is used to locate the template mold. The sensor system is scanned to locate the substrate and the gratings in tool coordinates. In this manner, the relative position of the template mold is determined with respect to the substrate in tool coordinates. The substrate is then accurately positioned with respect to the template mold. The system may be used to track imprinted pattern position relative to the substrate and to determine concentricity of patterns to substrates.01-29-2009
20090140458POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHY - An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.06-04-2009
20120104653METHOD OF EMBOSSING A SURFACE - A method of embossing a sheet of polyethylene foam with a pattern comprises the steps of providing a sheet of polyethylene foam having a surface, providing a heat source positioned to apply heat to the surface of the foam sheet, providing a roller having a surface pattern thereon positioned to contact the surface of the foam sheet, moving the foam sheet past the heat source to apply heat to the surface of the foam sheet, and moving the foam sheet past the roller to emboss the roller surface pattern on the softened surface of the foam sheet.05-03-2012
20090014911STAMPING APPARATUS AND STAMPING METHOD - There are provided with a first supporting unit 01-15-2009
20090243153Large Area Roll-To-Roll Imprint Lithography - Droplets of polymerizable material may be patterned on a film sheet. The droplets of polymerizable material may be dispensed on the film sheet. A pre-determined force may be applied to an imprint lithography template such that localized trapping of the droplets of the polymerizable material on the film sheet is minimized and the droplets coalesce to form a continuous layer. The polymerizable material may be solidified to form a patterned layer having a residual layer and at least one feature.10-01-2009
20120193832HOLDING APPARATUS, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - A holding apparatus of the present invention for holding a mold, includes a chuck configured to attract the mold to hold the mold, including a plurality of holding units each of which is configured to hold the attracted mold, and including a support configured to support the plurality of holding units; and an actuator supported by the support and deforms the mold by applying a force. At least one of the holding units is supported by the support unit so as to be displaceable in the direction of the force applied by the actuator.08-02-2012
20110140306Composition for an Etching Mask Comprising a Silicon-Containing Material - The present invention includes a composition for a silicon-containing material used as an etch mask for underlying layers. More specifically, the silicon-containing material may be used as an etch mask for a patterned imprinted layer comprising protrusions and recessions. To that end, in one embodiment of the present invention, the composition includes a hydroxyl-functional silicone component, a cross-linking component, a catalyst component, and a solvent. This composition allows the silicon-containing material to selectively etch the protrusions and the segments of the patterned imprinting layer in superimposition therewith, while minimizing the etching of the segments in superposition with the recessions, and therefore allowing an in-situ hardened mask to be created by the silicon-containing material, with the hardened mask and the patterned imprinting layer forming a substantially planarized profile.06-16-2011
20110140304IMPRINT LITHOGRAPHY TEMPLATE - Nano imprint lithography templates for purging of fluid during nano imprint lithography processes are described. The templates may include an inner channel and an outer channel. The inner channel constructed to provide fluid communication with a process gas supply to a region between the template and a substrate during the nano imprint lithography process. The outer channel constructed to evacuate fluid and/or confine fluid between the active area of template and the substrate.06-16-2011
20110140303METHODS OF FABRICATING IMPRINT MOLD AND OF FORMING PATTERN USING THE IMPRINT MOLD - A method of fabricating an imprint mold is disclosed. The method includes: forming a first photo resist pattern on a substrate; etching the substrate using the first photo resist pattern as an etch mask to form a first pattern in the substrate; ashing the first photo resist pattern to form a second photo resist pattern; and etching the substrate using the second photo resist pattern to form a second pattern derived from the substrate and a third pattern derived from the first pattern.06-16-2011
20100148397IMPRINTING MACHINE AND DEVICE MANUFACTURING METHOD - An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.06-17-2010
20090283934Imprinting of Partial Fields at the Edge of the Wafer - Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.11-19-2009
20130214453PHOTO-CURABLE NANOIMPRINT COMPOSITION, METHOD FOR FORMATING PATTERN USING THE COMPOSITION, AND NANOIMPRINT REPLICA MOLD COMRISING CURED PRODUCT OF THE COMPOSITION - Provided is a photo-curable nanoimprint composition that has excellent properties in terms of etching resistance, dispersibility, and productivity. In addition, the photo-curable nanoimprint composition enables easy transcription of patterns even when a mold is pressed with a relatively low pressure. The photo-curable nanoimprint composition includes: (A) partial hydrolysate obtained by hydrolyzing a mixture of an organic silicon compound and a silicon compound containing (meth)acrylic groups with water in the molar amount of not less than 0.1 times but less than 1.0 times with respect to the number of moles of all alkoxy groups present in the mixture; (B) polymerizable monomer containing (meth)aclyic groups; and (C) pothopolymerization initiator. In addition, the mixture of partial hydrolysate (A) may include further partial hydrolysate of fluorinated silicone compound and/or metal oxide.08-22-2013
20100193993METHOD OF MAKING A SECONDARY IMPRINT ON AN IMPRINTED POLYMER - There is disclosed a method of making an imprint on a polymer structure comprising the step of pressing a mold having a defined surface pattern against the surface of a primary imprint of a polymer structure to form a secondary imprint thereon.08-05-2010
20100237540METHOD OF DESIGNING A TEMPLATE PATTERN, METHOD OF MANUFACTURING A TEMPLATE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A method of designing a template pattern used for imprint lithography, includes generating data of a dummy template pattern to be formed in a third area between first and second areas of a template based on data of a design pattern of the template, the data of the dummy template pattern being generated so that a third surface area ratio showing a ratio of a surface area of the third area to an area of the third area is set smaller than a first surface area ratio showing a ratio of a surface area of the first area to an area of the first area and larger than a second surface area ratio showing a ratio of a surface area of the second area to an area of the second area.09-23-2010
20100230858PROCESS FOR MAKING AN EMBOSSED WEB - A process for making an embossed web. A precursor web is provided between a forming structure and a compliant substrate. The forming structure has a plurality of discrete protruded elements and lands completely surrounding them. Pressure is provided between the compliant substrate and the forming structure to conform the precursor web to the forming structure to form the embossed web. The resulting embossed web has a plurality of discrete extended elements completely surrounded by land areas.09-16-2010
20100213637MACHINE HEAD FOR PRODUCTION OF A SURFACE RELIEF - A machine head for producing a surface relief on a substrate, the machine head comprising a flexible stamping element having a curved profile and an inverse of the surface relief on its convex side; and the flexibility of the element being such that the inverse of the surface relief can be pressed to become flat and in planar contact with the substrate being pressed.08-26-2010
20100237539MANUFACTURING METHOD AND APPARATUS FOR OPTICAL SHEET - The present invention provides a manufacturing method and an apparatus for an optical sheet placed in a backlight assembly. The optical sheet produced by the manufacturing method and apparatus has pluralities of first microstructures on the surface of the optical sheet. The optical sheet is mainly made of cured photo resin, for instance: ultraviolet glue. The optical sheet has higher performance and lower cost. Furthermore, the manufacturing method and the apparatus can produce the optical sheet more efficiently.09-23-2010
20110057354IMPRINTING METHOD AND IMPRINTING APPARATUS - In an imprinting method for transferring a pattern of a mold to a resin coated on a substrate by using an imprinting apparatus including a mold holding unit and a resin coating unit, the resin is coated in n shot areas arranged in a direction parallel to a direction in which the holding unit and the coating unit are arranged where n is an integer equal to or greater than 2, and the pattern is transferred to the shot areas on a one-by-one basis. A distance D between the coating unit and the mold and a width W of each shot area as seen in the direction parallel to the direction in which the holding unit and the coating unit are arranged are selected so as to satisfy a condition D>(3/2−1/n)W, and the coating and the transferring are performed repeatedly on the substrate.03-10-2011
20100013122Resin for Thermal Imprint - A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260 ° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.01-21-2010
20090243152IMPRINTING METHOD AND STAMPER - According to one embodiment, an imprinting method includes applying a resist to a substrate, imprinting a stamper on which protruded patterns are formed against the resist applied to the substrate, forcing a distal end of a peeling wedge into a part between the substrate and the stamper, and introducing a gas between the substrate and the stamper to peel off the stamper from the substrate, in which a gap between the substrate and the stamper is made larger than a thickness of the resist at a part into which the distal end of the peeling wedge is forced.10-01-2009
20090039554Imprint lithography - An imprint lithography apparatus is disclosed which has a needle, and a substrate table arranged to hold a substrate to be imprinted, wherein the needle is moveable between a first position and a second position, the first position being such that in use the needle penetrates a layer of imprintable material on the substrate, and the second position being such that in use the needle is disengaged from the imprintable material on the substrate, the substrate table and the needle arranged such that one may be scanned relative to the other.02-12-2009
20110109011FINE STRUCTURE FORMATION APPARATUS - A fine structure formation apparatus includes a preheating heater to heat up the surface of belt-like mold alone, right before contacting the belt-like mold to heating and pressurizing rollers, the temperature of the surface of the belt-like mold is made equal to that of the heating and pressurizing rollers, enabling to reliably obtain a predetermined temperature, and cooling rollers or a cooling blower are arranged right after the heating and pressurizing rollers, enabling cooling by a forced cooling and pressure holding, and to transfer a pattern.05-12-2011
20110031650Adjacent Field Alignment - Methods for imprinting on abutted fields of a substrate are described. Generally, a first field of a substrate may be imprinted using an imprint lithography template. The template may then be placed such that a portion of the template overlaps the first field of the substrate while imprinting a second field of the substrate.02-10-2011
20100295214HIGH PRESSURE EMBOSSING PROCESS - A process for manufacturing a multi-ply paper product is disclosed. The process includes the steps of: 1. Providing a web substrate; 2. Providing a pattern roll; 3. Providing an anvil roll having a hardness of less than about 40 P&J; 4. Providing an embossing roll having a hardness of greater than about 40 P&J; 5. Juxtaposing the anvil roll and the pattern roll in an axially parallel relationship to form a first nip therebetween; 6. Juxtaposing the embossing roll and the pattern roll in an axially parallel relationship to form a second nip therebetween; 7. Forwarding the web substrate through the first nip such that portions of the web substrate are embossed at the first nip to provide an embossed first paper web; and, 8. Forwarding the embossed first paper web through the second nip so that the embossed portions of the first paper web are further embossed in registration with the embossed portions of the first paper web.11-25-2010
20120032371SYSTEM AND METHOD FOR MANUFACTURING A ROUGH TEXTURED MOLDED PLASTIC SIDING PRODUCT - A system for manufacturing from heated plastic sheet material a molded siding product having a rough-textured surface, including a rotatable backing roll having a first axis of rotation and an elastically deformable rim defining a circumferential surface, and an embossing element having a moveable embossing surface in compressive engagement with the backing roll, the embossing surface defining a rough-textured pattern. The circumferential surface of the backing roll and the embossing surface define a contact patch therebetween that defines a nip point. The rough-textured pattern is impressed into the circumferential surface of the backing roll, and is capable of being impressed into the circumferential surface of the backing roll in the contact patch through heated plastic sheet material moved through the nip point. A supply of cooling liquid is provided to the nip point, and at least one of the backing roll and the embossing element being cooled thereby. The supply of cooling liquid is sufficient to partially set heated plastic sheet material moved through the nip point and retain therein an impression of the rough-textured pattern and retain sufficient pliability for further plastic forming of the material downstream of the nip point. Also a method for manufacturing from heated plastic sheet material a molded siding product having a rough-textured surface.02-09-2012
20110024948IMPRINTING DEVICE AND IMPRINTING METHOD - The present invention provides an imprinting device and an imprinting method which can uniformly apply pressure between a mold and a molding object and which can increase and decrease a temperature at a fast speed. An imprinting device is for transferring a pattern on a mold to a film molding object, and comprises a stage for holding the mold, a pressurizing-chamber casing which configures a pressurizing-chamber together with the molding object, sealing means which airtightly seals a space between the pressurizing-chamber casing and the molding object, opening and closing means which opens and closes the space between the pressurizing-chamber casing and the molding object, pressurizing means which adjusts atmospheric pressure in the pressurizing-chamber, heating means which heats either one of or both of the mold and the molding object, and degassing means which eliminates any gas present between the mold and the molding object.02-03-2011
20110031651DESIRABLE WETTING AND RELEASE BETWEEN AN IMPRINT LITHOGRAPHY MOLD AND A POLYMERIZABLE COMPOSITION - Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.02-10-2011
20110109012PATTERN FORMING METHOD - According to one embodiment, a pattern forming method for imprinting an imprinting surface having recess and protrusion of a template onto an imprint material provided on a target substrate is disclosed. The method includes filling a recess portion of the recess and protrusion with the imprint material. A photo-deformable layer is interposed between at least one of a location between the imprinting surface and the imprint material and a location between the target substrate and the imprint material during the filling. A configuration of the photo-deformable layer is deformable by light irradiation. The method includes curing the imprint material while the recess portion is filled with the imprint material. The method includes releasing the cured imprint material from the imprinting surface by irradiating the photo-deformable layer with light and by deforming the photo-deformable layer. The light has an intensity varying within a plane parallel to the imprinting surface.05-12-2011
20120200006IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus that includes a holding unit, and performs an imprint process, including molding of an imprint material on a substrate held by the holding unit using a mold, curing of the molded imprint material, and releasing of the cured imprint material from the mold, to form a pattern on the substrate. The apparatus includes a first cure device configured to perform a first cure process for the imprint material molded by the mold prior to the releasing; and a second cure device configured to perform a second cure process for the imprint material on the substrate conveyed out from the holding unit after the releasing.08-09-2012
20120200005MOLD, IMPRINT METHOD, AND METHOD OF MANUFACTURING ARTICLE - A surface of a mold for an imprint apparatus on a side of a substrate includes a central region having the pattern, and a pair of first peripheral regions. The central region includes a pair of boundaries parallel to a first direction. The pair of first peripheral regions are located outside the pair of boundaries parallel to the first direction. The pair of first peripheral regions include first regions in which mold-side marks are formed and second regions in which no mold-side marks are formed. A gap between the first regions and the substrate is not filled with a resin upon an imprint process. A gap between the second regions and the substrate is filled with the resin upon an imprint process. The first regions and the second regions are opposed to each other on opposite sides of the central region.08-09-2012
20110042850Method of manufacturing plastic surface with superhydrophobicity and high transparency - A method of manufacturing a plastic surface with superhydrophobicity and high transparency is disclosed. In this method, a thermal nanoimprinting mold method is used to form a plurality of sub-20 nm nanograss structure on a surface of a cyclic-olefin copolymer (COC) material, so that the surface can have superhydrophobicity and high transparency at the same time.02-24-2011
20090032997Resin pattern formation method - The present invention provides a resin pattern formation method. When a mold 02-05-2009
20110084423IMPRINT APPARATUS AND MANUFACTURING METHOD OF COMMODITIES - The present invention provides an imprint apparatus including a mold and a stage that holds a substrate, the imprint apparatus executing a curing process of curing a resin while the mold and the resin applied to the substrate contact and a demolding process of releasing the mold from the resin cured in the curing process, the imprint apparatus including a structure that holds the mold, a pillar that supports the structure mechanically independently from the stage through an anti-vibration mount that reduces propagation of vibration, and a force providing unit that provides, to the structure, force in an opposite direction from a direction of force generated in the structure by providing demolding force to the mold during the demolding process.04-14-2011
20090250839Method of preparing an object for submerged sonar inspection - Objects which are to be inspected by sonar imaging when they are submerged are coated with or formed with a surface which is a non-specular sonar reflector.10-08-2009
20090250840Template Having Alignment Marks Formed of Contrast Material - Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.10-08-2009
20100038821Tactile Enhancement For Input Devices - Embodiments related to the tactile enhancement of a computer input device are disclosed herein. In one disclosed embodiment, a method of making removable tactile-enhancing grips for a computer input device is disclosed. The method comprises heating a thermoplastic elastomeric sheet to a temperature at which the thermoplastic elastomeric sheet is capable of receiving and retaining an imprinted feature, pressing onto the thermoplastic elastomeric sheet a plate comprising a pattern, thereby embossing the pattern onto the thermoplastic elastomeric sheet, and cooling the thermoplastic elastomeric sheet to a temperature at which the pattern is retained in the thermoplastic elastomeric sheet. An adhesive layer is then formed on an opposite side of the thermoplastic elastomeric sheet as the pattern.02-18-2010
20100059904IMPRINT APPARATUS - An imprint apparatus is configured to mold a resin on a substrate by using a mold and to form a pattern of the resin on the substrate. The imprint apparatus includes a holder configured to hold the substrate, the holder having a groove, an exhaust device configured to exhaust a gas in the groove so that the hold can hold the substrate by setting a pressure in the groove to a negative pressure, a supply device configured to supply the gas to the groove, and a controller configured to control the supply device so as to set the pressure in the groove to a positive pressure during molding.03-11-2010
20100065985HOLOGRAPHIC FILM - The present invention provides a film comprising: 03-18-2010
20110074064IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD - An imprint apparatus forms patterns in a plurality of shot regions on a substrate by repeating an imprint cycle in which a pattern is formed in one shot region on the substrate by curing a resin while an original and the resin are in contact with each other. The apparatus comprises a detector configured to detect a mark formed on the substrate, and a controller configured to execute overlay measurement, in which the controller causes the detector to detect the mark, and obtains an overlay error that is a shift between a pattern formed on a given layer on the substrate and a pattern newly formed on a layer on or above the given layer, between successive imprint cycles.03-31-2011
20110024949APPARATUS FOR FABRICATING FLAT PANEL DISPLAY DEVICE METHOD OF FABRICATING THE SAME AND METHOD OF FABRICATING FLAT PANEL DISPLAY DEVICE USING THE SAME - An apparatus for fabricating a flat panel display device includes a device that applies a flowable material on a substrate; a soft mold having a base surface, a groove part recessed in relation to the base surface, and a protruding part protruding from the base surface, the soft mold applying a pressure on the flowable material for forming a multi-stepped profile pattern in the flowable material.02-03-2011
20110147990APPARATUS AND METHOD OF FABRICATING FLAT PLATE DISPLAY - A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate having liquid resin formed thereon is seated, a imprinting mold bonded with the liquid resin of the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, and a planarization layer formed between the stage and the substrate to planarize a surface of the stage.06-23-2011
20110147988APPARATUS AND METHOD OF FABRICATING FLAT PLATE DISPLAY - A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate is seated, an imprinting mold bonded with the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, a supporter configured to support the imprinting mold, and a horizontal compensating part configured to compensate downward-bending of the imprinting mold by pressing the imprinting mold.06-23-2011
20080230951Methods for making microfluidic devices and devices produced thereof - Described herein are methods for making microfluidic devices comprising glass or glass-containing materials, wherein the methods have decreased cost and/or improved dimensional properties over similar formed glass articles produced using current techniques.09-25-2008
20100244319METHOD AND APPARATUS FOR PRODUCING FIGURED VENEER - A method and apparatus for making a piece of figured veneer comprise means for, and the steps of, softening lignin in a sheet of veneer, pressing the sheet of veneer between complementary corrugating press rollers having a pitch and a depth to press the sheet of veneer into a wavy or corrugated configuration, and surfacing the pressed sheet of veneer to remove crests of the corrugations, making the piece of figured veneer. Another method and apparatus for making a piece of figured veneer, comprise means for, and the steps of, softening lignin in a sheet of veneer, placing the sheet of veneer onto a wavy or corrugated surface of a plate, pressing the sheet of veneer using a press roller so that the roller presses the sheet of veneer against the surface to achieve a wavy or corrugated veneer, and surfacing the pressed sheet of veneer to remove peaks of the corrugations, making the piece of figured veneer. Yet another method and apparatus for making a piece of figured veneer, comprise means for, and the steps of, softening lignin in a sheet of veneer, placing the sheet of veneer onto a corrugated surface of a plate having such a wavy or corrugated surface, pressing the sheet of veneer onto the troughs and peaks of the surface using a flexible platen having a corrugated surface so that the corrugated surface of the platen presses the sheet of veneer against the corrugated surface of the plate to achieve a wavy or corrugated veneer, and surfacing the pressed sheet of veneer to remove peaks of the corrugations, making the piece of figured veneer.09-30-2010
20110163477IMPRINT LITHOGRAPHIC APPARATUS AND IMPRINT LITHOGRAPHIC METHOD - An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.07-07-2011
20110260361SAFE DEPARATION FOR NANO IMPRINTING - Control of lateral strain and lateral strain ratio (d10-27-2011
20080217813RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY - The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula:09-11-2008
20080258340System and method for manufacturing concrete blocks - A system and method for manufacturing an uncured concrete block using the dry-cast manufacturing process includes a mold box having a pair of side walls, a pair of side plates, an open top side and an open bottom side defining a mold cavity. One or more end liners are disposed within the mold cavity and are selectively shiftable within the mold cavity with hydraulic cylinders between a first position and a second position. The end liners can be provided with a three-dimensional textured face to impart a decorative face to a side surface of the concrete block formed in the mold or can also provide blocks with a tapered face when disposed in the second position while the mold is filled with concrete. Before the block is stripped from the mold, the end liners are returned to the first position, so that the side surfaces are not damaged as the block is released.10-23-2008
20110215503Reducing Adhesion between a Conformable Region and a Mold - Improved preferential adhesion and release characteristics are described with respect to a substrate and a mold having imprinting material disposed therebetween, in the absence of an a priori release layer on the mold. The imprinting material is a polymerizable material including a fluorinated surfactant and a photoinitiator. The surfactant includes —CH09-08-2011
20100019410Resin for Thermal Imprinting - A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.01-28-2010
20090174115IMPRINT LITHOGRAPHY - An imprinting method is disclosed that involves, in an embodiment, redistributing a volume of imprintable medium in a flowable state over a target portion of a surface of a substrate into regions of differing volume corresponding to regions of differing pattern density of an imprint pattern of a template, contacting the medium while in the flowable state with the template to form the imprint pattern in the medium, subjecting the medium to conditions to change the medium into a substantially non-flowable state, and separating the template from the medium while in the substantially non-flowable state.07-09-2009
20090321990NANO IMPRINTING METHOD AND APPARATUS - The present invention relates to a nano imprint method and to a nano imprint apparatus comprising: a first imprint module, a second imprint module, a storage and a feeder module, wherein; the first imprint module is adapted to imprint a pattern into an intermediate polymer stamp from a template; a second imprint module is adapted to imprint a pattern into a substrate from the intermediate polymer stamp; robot feeder modules are adapted to move the template, intermediate polymer stamp and the substrate from and to storages.12-31-2009
20100320645DUAL ZONE TEMPLATE CHUCK - A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.12-23-2010
20120038084ROLL MOLD, METHOD FOR FABRICATING THE SAME AND METHOD FOR FABRICATING THIN FILM PATTERN USING THE SAME - Discussed are a roll mold, a method for fabricating the same and a method for fabricating a thin film pattern using the same, to prevent dimensional variation of the mold and simplify the overall process. The method for fabricating a roll mold includes providing a substrate provided with a master pattern layer, sequentially forming a mold surface layer and a solid suffer layer on the substrate provided with the master pattern layer to provide a flat panel mold, forming an adhesive resin layer on the base roller aligned on the flat panel mold, and rolling the base roller provided with the adhesive resin layer over the flat panel mold to adhere the flat panel mold to the base roller through the adhesive resin layer.02-16-2012
20120038085DYNAMIC NANO-INSCRIBING FOR CONTINUOUS AND SEAMLESS METAL AND POLYMER NANOGRATINGS - Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays and bio-sensors. A Dynamic Nano-Inscribing (Dynamic Nano-Inscribing) technique is disclosed for directly creating large-area, truly continuous nano-grating patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high speed (10 cm/sec). Dynamic Nano-Inscribing is carried out under either ambient temperature or with a brief heating time on the order of ten microseconds, which minimizes damage on UV or thermo-sensitive functional materials.02-16-2012
20120043697FLUID FLOW FILTER AND METHOD OF MAKING AND USING - A filter well suited for paint arrestor usage having a monolithic high loft manmade fiber body with a convoluted flow contact surface. The filter is preferably formed by a convoluter as in one with a roller set and blade cutter to form mirror image fiber filter sheets from a received fiber batt. Provided is a well mixed proper fiber blend, such as one having a set of fibers made of a majority of course fibers joined by way of thermal bonding fibers which facilitate, during convoluting, formation of a crisp cut and high integrity three dimensional surface, as in one of rows of peaks separated by valleys. The projection/recess arrangement over the flow contact surface as well as the thickness and relative projection-to-base dimensions are arranged to provide a high paint holding capacity without too fast a load up of, for example, paint particles and while avoiding too great of a pressure drop within that load up time.02-23-2012
20110316193TRANSFER APPARATUS AND METHOD OF MANUFACTURING DEVICE - A transfer apparatus, for molding a resin on a substrate using a mold on which a pattern is formed and releasing the mold from the resin to transfer the pattern onto the substrate, includes a charge removing device configured to remove a charge of the mold, and a detector configured to detect an electric potential of the mold. The charge removing device is configured to remove the charge of the mold if the electric potential of the mold detected by the detector is not less than a predetermined value.12-29-2011
20120001366METHOD OF MANUFACTURING A DRESSING - A therapeutic device for promoting the healing of a wound in a mammal is disclosed. An exemplary device comprises a permeable structure having a plurality of depressions formed in a surface thereof. In use, the surface having the depressions is disposed adjacent a surface of the wound. A method of manufacturing a therapeutic device for promoting the healing of a wound in a mammal comprising the steps of providing a permeable substrate, and forming a plurality of depressions into a surface of the permeable substrate to provide the therapeutic device. A method of treating a wound comprises: providing a permeable structure comprising a plurality of randomly disposed fibers and having i) a plurality of wound surface contact elements disposed between end portions of the structure, and ii) a plurality of voids defined by the contact elements; and applying the permeable structure to at least one surface of the wound.01-05-2012
20120001365CLAMPING DEVICE OF MICRO-NANO IMPRINT PROCESS AND THE METHOD THEREOF - The invention discloses a clamping device of the micro/nano imprint process and the method thereof for clamping a substrate. The clamping device comprises a first module, a second module and a locking module. The first module and the second module are used to accommodate and support at least one mold. The mold has a predetermined structure. The locking module is used to lock the first module and the second module. The clamping device drives the mold to imprint the substrate or the material layer of the substrate by a predetermined way.01-05-2012
20120007279HOLDING DEVICE, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A holding device of the present invention for holding a mold, the device includes a holder configured to attract the mold to hold the mold; an actuator supported by the holder so as to face a side of the mold, and configured to apply a force to the side to deform the mold; and a detector supported by the holder so as to face the side, and configured to detect a position of the side in a direction of the force. Here, the detector is configured to detect, as the position, a position of a first region in the side, the actuator is configured to apply the force to a second region in the side, and the second region is around the first region.01-12-2012
20120007280FINE-STRUCTURE TRANSFER METHOD - A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element.01-12-2012
20110049761Pattern transfer apparatus and pattern forming method - The pattern transfer apparatus includes: a liquid ejection device having liquid ejection ports through which droplets of liquid are ejected and deposited onto a substrate surface while the liquid ejection device relatively moves to scan the substrate surface in a relative scanning direction; and a stamp having a stamp surface on which a pattern is formed, the stamp surface being applied to the droplets of the liquid on the substrate surface in a stamp application direction while the stamp is relatively moved with respect to the substrate, wherein when defining, on the substrate surface, strips which are straight and parallel to the stamp application direction and have widths substantially equal to diameters of the droplets deposited on the substrate surface, at least one of the strips includes the droplets which are ejected respectively from at least different two of the liquid ejection ports of the liquid ejection device.03-03-2011
20110049760NANO PATTERN WRITER - A method for manufacturing a nano pattern writer includes forming one or more grooves on a first layer, depositing a substance on the first layer to form a film on the first layer, polishing the film on the first layer to thereby form a patterned film that fills the one or more grooves on the first layer, placing a second layer over the patterned film to thereby form a layered structure interposing the patterned film between the first layer and the second layer, and removing a part of the first layer and the second layer to thereby expose portions of the patterned film.03-03-2011
20120013042IMPRINT TEMPLATE AND PATTERN FORMING METHOD - Certain embodiments provide an imprint template which has a first member formed with patterns having concavities and convexities on one side thereof, and in the state in which the one side is contacted with a photocuring imprint material coated onto a substrate to be processed, cures the imprint material by light emitted from above the other side of the first member to transfer the patterns onto the imprint material. The template is provided with a second member in an end region thereof. The second member has a larger contact angle with respect to the imprint material than the first member.01-19-2012
20110084424MOLD FOR NANOIMPRINTING, ITS PRODUCTION PROCESS, AND PROCESSES FOR PRODUCING MOLDED RESIN HAVING FINE CONCAVO-CONVEX STRUCTURE ON ITS SURFACE AND WIRE-GRID POLARIZER - To provide a mold for nanoimprinting capable of accurately transcribing a fine concavo-convex structure, available at a low cost and having high durability, its production process, and processes for producing a molded resin having a fine concavo-convex structure on its surface having the fine concavo-convex structure of the mold accurately transcribed, and a wire-grid polarizer, with high productivity.04-14-2011
20120153537LITHOGRAPHY SYSTEM AND LITHOGRAPHY METHOD - A lithography system includes at least two lithography apparatuses disposed on the same fixed base, each of which includes an object, a moving body, and a vibration isolation unit. A control unit configured to control the lithography apparatuses controls a vibration isolation unit included in a first lithography apparatus based on driving instruction information to be given to a moving body included in a second lithography apparatus, and a control indicator regarding vibration directed onto an object to be vibration-isolated included in the first lithography apparatus due to a moving operation of the moving body.06-21-2012
20120025420SHEET PRESS MOLDING METHOD AND METHOD OF MANUFACTURING FUEL CELL SEPARATOR - Provided is a sheet press molding method by which a molded product having a small plate thickness deviation is obtained. Such a sheet press molding method is provided with a process in which a molded product (02-02-2012
20120025419IMPRINTING APPARATUS AND IMPRINT TRANSFER METHOD - The present invention provides an imprinting apparatus or an imprint transfer method in which uniformity of curing quality by UV light is maintained and a uniform application thickness of a UV curable resin is achieved, even if glass is contaminated with dust and/or smudges or has a flaw. A feature of the present invention resides in an imprinting apparatus or an imprint transfer method that, while irradiating an transferred object with energy, transfers a concavo-convex configuration on a stamper's surface onto the transferred object and, subsequently, detaches the stamper from the transferred object, the imprint transfer method including: pressurizing a first reverse surface of at least one of the stamper and the transferred object with a planar pressurizing body having a flat surface configuration; subsequently, pressurizing a second reverse surface of at least one of the stamper and the transferred object with a fluid; and controlling pressurization timing of pressurization by the planar pressurizing body and pressurization by the fluid, thus completing the transfer.02-02-2012
20120061875TEMPLATE CHUCK, IMPRINT APPARATUS, AND PATTERN FORMING METHOD - In one embodiment, a template chuck for an imprint apparatus includes first and second bodies configured to contact an upper surface and a lower surface of a template, respectively, to sandwich the template vertically. The chuck further includes contact members configured to contact side surfaces of the template to sandwich the template laterally. The chuck further includes a deformation controller configured to deform the template by applying a stress to the template through the contact members. In addition, the first body, the second body, and the contact members are configured to be movable individually.03-15-2012
20120153538IMPRINT LITHOGRAPHY - A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.06-21-2012
20100252955Methods of Patterning Substrates Using Microcontact Printed Polymer Resists and Articles Prepared Therefrom - The present invention is directed to methods for patterning substrates using contact printing to form patterns comprising a polymer, using the patterns formed therefrom as resists, and process products formed by the process.10-07-2010
20110068504RELEASE PLATE FOR USE IN IMPRINTING METHOD, MOLD STRUCTURE AND IMPRINTING METHOD - A release plate that is provided on a mold structure for use in an imprinting method in which a concavo-convex pattern is transferred to a resist layer composed of an imprint resist composition on a substrate, and that is used to separate the mold structure from the resist layer, the release plate including at least two metal layers which curve by heating and return to their original shape at normal temperature.03-24-2011
20100096774IMPRINT LITHOGRAPHY APPARATUS AND METHOD - An imprint lithography apparatus and manufacturing method can lead to mechanical stress being formed in a substrate to which an imprint pattern is being applied. This may cause strain within the substrate leading to misalignment of a subsequent pattern with an earlier pattern in a part of the substrate, which is strained. An apparatus and method is disclosed which allows for stress relaxation in the substrate prior to further patterning to reduce, minimize or prevent such misalignment from residual strain. This is achieved by locally unclamping a portion of substrate (including optionally the entire substrate) from a corresponding portion of substrate holder so that mechanical stress leading to local strain may relax prior to further patterning. To overcome residual frictional force between the substrate and substrate holder, the substrate and substrate holder may be physically separated prior to further patterning.04-22-2010
20100096776Reduction of Stress During Template Separation - Separation of an imprint lithography template and a patterned layer in an imprint lithography process may result in stress to features of the template and/or features of the patterned layer. Such stress may be reduced by minimizing open areas on the template, including dummy features within the open areas, and/or selective positioning of features on the template.04-22-2010
20100289184Die Imprint By Double Side Force-Balanced Press For Step-And-Repeat Imprint Lithography - In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.11-18-2010
20100289182 METHOD AND DEVICE FOR MANUFACTURING SHEET HAVING FINE SHAPE TRANSFERRED THEREON - A method for manufacturing a sheet having a fine shape transferred thereon, in which a sheet-like base made of a thermoplastic resin is placed between an imprint mold and an intermediate base and the sheet-like base is then pressed by a pair of pressing plates to imprint the fine shape of surface irregularity of the imprint mold to the sheet-like base. The sheet-like base is pressed such that, when pressing force of the pressing plates is maximum, an imprinting pressure difference is present in an imprinting surface of the imprint mold, a maximum imprinting pressure section is present in the imprinting surface, and a portion where the imprinting pressure is minimum is not present in the imprinting surface. The method achieves uniform and highly accurate shape transfer without trapping of air.11-18-2010
20100289183MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR PATTERNED MEDIA - The present invention includes the steps of: applying resist to a surface of a disk base material mounted on a base; mounting a stamper on the resist, wherein the stamper includes not only an area larger than the disk base material but also a concavo-convex region between chamfered sections for an inner-diameter section and an outer-diameter section of the disk base material; mounting an elastic plate on the stamper, wherein the elastic plate includes an inner-diameter section and an outer-diameter section smaller than chamfered sections of the inner-diameter section and the outer-diameter section of the disk base material and larger than the concavo-convex region of the stamper; mounting a pressing member on the elastic plate and pressing the elastic plate toward the disk base material; exposing the resist and etching the disk base material using the exposed resist as a mask; and removing the remaining resist from the disk base material.11-18-2010
20100052217IMPRINTING APPARATUS AND ARTICLE MANUFACTURING METHOD - The imprint apparatus presses resin disposed on a substrate and a mold to each other to form a resin pattern on the substrate. The apparatus includes a driving device configured to move the mold and the substrate relatively to apply a pressing force between the mold and the resin, a measuring device configured to measure a position of at least one of the mold and the substrate, a detector configured to detect the pressing force, and a controller configured to control the driving device. The controller is configured to control the driving device using the position as a controlled variable in a first period, and to control the driving device using the pressing force as a controlled variable in a second period after the first period.03-04-2010
20120133077Resin Mold for Imprinting and Method for Producing the Same - Provided is a resin mold for imprinting which is free from transfer defects, has excellent releasability from a resin subjected to imprinting, and does not cause any defect by imprinting. The resin mold for imprinting includes a resin layer having a recessed and projected pattern surface, an inorganic material layer formed with a uniform thickness on at least the recessed and projected pattern surface of the resin layer, and a release agent layer formed with a uniform thickness on at least the recessed and projected pattern surface of the inorganic material layer.05-31-2012
20120133076IMPRINT LITHOGRAPHY - An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.05-31-2012
20110180965FAST NANOIMPRINTING APPARATUS USING DEFORMALE MOLD - The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere. The substrate and mold may be pressed further by introducing higher pressure inside the chamber. After consolidating the resist, the substrate is separated from the mold by either direct pull-down enabled by stage movement or deforming the mold enabled by differential pressure between the mold mini-chamber and the bulk volume of the chamber, or mixing of both.07-28-2011
20110180964SYSTEMS AND METHODS FOR SUBSTRATE FORMATION - Templates for patterning large area substrates are provided. Generally, templates include a body and a plurality of molds positioned on the body. Each mold has a first length and each mold may be separated by an open space having a distance therebetween. The length of the mold may be substantially similar to the distance between the open space or the length of the mold may be substantially greater than the distance between the open space. Additionally, purging techniques that incorporate features of the template are described.07-28-2011
20100258978ROLLER NANOIMPRINT APPARATUS, MOLD ROLLER FOR USE IN ROLLER NANOIMPRINT APPARATUS, FIXING ROLLER FOR USE IN ROLLER NANOIMPRINT APPARATUS, AND PRODUCTION METHOD OF NANOIMPRINT SHEET - A roller nanoimprint apparatus is disclosed which is capable of preventing a workpiece film with nanostructures having been transferred from the mold roller from being uneven in thickness and allowing easy replacement of the mold roller. At least one embodiment of the present invention is directed to a roller nanoimprint apparatus including a mold roller and continuously transferring nanosized protrusions to a surface of a workpiece film by rotating the mold roller, wherein the mold roller is a cylindrical body having an outer circumference surface with nanosized recesses formed thereon, the roller nanoimprint apparatus further includes a fluid container having an elastic film inflatable by injecting fluid into the container, the fluid container being arranged in a region defined by an inner circumference surface of the mold roller, the mold roller is mounted or demounted when the elastic film is shrunken, and the mold roller is supported from the inside when the elastic film is inflated.10-14-2010
20120248649PROCESS FOR MAKING AN EMBOSSED WEB - A process for making an embossed web. A precursor web is provided between a forming structure and a compliant substrate. The forming structure has a plurality of discrete protruded elements and lands completely surrounding them. Pressure is provided between the compliant substrate and the forming structure to conform the precursor web to the forming structure to form the embossed web. The resulting embossed web has a plurality of discrete extended elements completely surrounded by land areas.10-04-2012
20120175813Shoe Customization System Having Interchangeable Platens - Heat press platens for a shoe customization/decoration system and a method of using the same are disclosed. The platens may be quickly interchanged to allow the same equipment to be used to dye shoes of different sizes. The platens individually accommodate a pair of assembled shoes and are shaped to: reduce print sizes, maintain symmetry and flatness of the shoe, and accommodate a range of shoe sizes. The size and shape of the platens enable one shoe to be fitted on one side of a platen and another shoe to be fitted on the opposite side. The platens position the shoes so that they are mirror images of each other. This positioning allows a single print, including mirror images of the same design, to be applied to two shoes at the same time.07-12-2012
20100270706POWDER PRESS - A powder press has a lower die having an upper face and forming a cavity open upward at the face, a vertically shiftable lower piston downwardly closing the cavity, an upper piston vertically shiftable downward into the cavity, and filler shiftable between an inner position closely juxtaposed with the cavity and an outer position remote from the cavity for pouring a fluent powder into the cavity in the inner position and forming therein a powder mass. An actuator upwardly shifts the lower piston and thereby pushes up the powder mass such that a portion of it projects above the face. An element carried on the filler and shiftable over the surface scrapes away the portion of the mass projecting above the surface.10-28-2010
20100270705IMPRINT METHOD AND IMPRINT APPARATUS - An imprint method for imprinting an imprint pattern provided to a mold onto a pattern forming layer formed on a substrate is constituted by a first step of effecting alignment between the substrate and the mold with feedback control; a second step of bringing the mold and the pattern forming layer into contact with each other; a third step of curing the pattern forming layer; and a fourth step of increasing a gap between the substrate and the mold. The imprint method further includes a step of stopping the feedback control between the first step and the second step and/or between the second step and the third step.10-28-2010
20120074615IMPRINT DEVICE AND MICROSTRUCTURE TRANSFER METHOD - There is provided an imprint device for transferring a fine pattern to a material to form a patterned material. The device comprises a stamper having the fine pattern thereon, and a pressure distribution mechanism. The stamper is pressed against the material, and the pressure distribution mechanism provides a nonuniform pressure distribution in a patterned region of the patterned material, while the stamper is in contact with the material. There are provided an imprint device and a microstructure transfer method, by which it is possible to sufficiently spread a resin or other material for forming a pattern layer between a stamper and a patterned material with a lower pressure so as not to damage the stamper or the patterned material, and to form a pattern formation layer having the uniform thickness on the patterned material.03-29-2012
20120256346MOLD STRUCTURES, AND METHOD OF TRANSFER OF FINE STRUCTURES - A mold and a pattern transfer method using the same for a nanoprinting technology. The mold can be released from a substrate accurately and easily. The mold, which is used for forming a fine pattern on a substrate using a press machine, comprises a release mechanism.10-11-2012
20100193994IMPRINT LITHOGRAPHY METHOD AND APPARATUS - An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.08-05-2010
20090039553MICROSTRUCTURED SURFACE MOLDING METHOD - This disclosure relates to methods and apparatus for forming a plurality of microstructured sets of cells on a substrate, wherein each set of cells may be formed from a discrete flexible mold. Each mold is independently adjustable in position relative to the substrate. Side-by-side independently adjustable molds are pressed against the substrate by a single lamination roller.02-12-2009
20090032998MOLDING APPARATUS AND MOLDING METHOD - A molding apparatus for patterning a workpiece includes a first support member for supporting the mold, a second support member arranged opposite to the first support member, and a pressing mechanism for pressing the mold and the work together using the support members to pattern the workpiece. In this structure, either the surface of the first support member for supporting the mold or the surface of the second support member for supporting the workpiece is smaller in area than both surfaces of the mold and the workpiece.02-05-2009
20100327485DIFFRACTIVE MICROSTRUCTURE AND A METHOD OF PRODUCING THE SAME - Diffractive microstructure comprising micro-protrusions or microgrooves or a combination thereof and method of producing the same. The microstructure is formed in a layer of a thermoplastic carbohydrate polymer or a polymer derived from a carbohydrate material, said polymer having a glass transition point of less than 210° C. The thermoplastic polymer is preferably selected from the group of native starch, dextrin, native hemicellulose, native cellulose, poly(lactic acid), polylactides, polycaprolactone, starch derivatives, dextrin derivatives, hemicellulose derivatives, cellulose derivatives, and mixtures thereof. The invention provides an inexpensive and reliable way of incorporating into the products safety markings, which allow for visual inspection or detection, such as holograms and barcodes.12-30-2010
20120319326FINE STRUCTURE TRANSFER APPARATUS AND FINE STRUCTURE TRANSFER METHOD - The fine structure transfer apparatus is provided with a pattern transfer mechanism having a resin applying mechanism, a substrate handling mechanism, an aligning mechanism, a pressurizing mechanism, and a peeling mechanism, and the pressurizing mechanism is configured of an upper head section and a lower stage section, the molding die having the fine pattern formed thereon is fixed on the lower surface of the upper head section, and after pressurization and transfer, the lower stage section retracts from a position below the substrate in the state wherein the substrate is adhered to the molding die, then, after the peeling mechanism is moved to a position below the substrate, the substrate adhered to the molding die is peeled.12-20-2012
20120319325CATHETER FOR ANTIMICROBIAL CONTROL AND METHOD OF MANUFACTURING THEREOF - Disclosed herein is a method comprising transporting a conduit and a template through a guide tube; the template being disposed on an outer surface of the conduit between the conduit and the guide tube; and transferring a texture from the template to the conduit as the conduit and the template are transported through the guide tube. Disclosed herein too is an apparatus comprising a guide tube; the guide tube being operative to facilitate a transfer of a pattern from a template to a conduit; a first feed spool and a first take-up spool for feeding the conduit through the guide tube and for taking up the conduit after it has travelled through the guide tube respectively; and a second feed spool and a second take-up spool for feeding the template through the guide tube and for taking up the template after it has travelled through the guide tube respectively.12-20-2012
20120080820IMPRINTING METHOD - Provided is an imprinting method for transferring a pattern formed on a mold to a substrate, the imprinting method including applying a resin to a predetermined shot area on the substrate; moving the shot area from an application position to an imprinting position; supplying gas to the shot area; and imprinting the mold into the shot area, wherein, in the gas supply step, gas is supplied only from a gas supplying unit located above a moving path extending from the application position to the imprinting position, and the supply of the gas is started before the shot area passes beneath the gas supplying unit to thereby supply the gas to the shot area while moving it.04-05-2012
20120080819PATTERNING MOLD AND MANUFACTURING METHOD THEREOF - Disclosed herein is a patterning mold to form a micropattern on a substrate or glass. The disclosed patterning mold includes a body having a patterning part formed at one end of the body. The patterning part may be configured to contact a surface of the substrate, to form a channel. In example embodiments, an ink supply passage communicating with the channel may be formed in the patterning mold, to supply an ink to the channel. In example embodiments, a fixing member is coupled to an exterior of the transfer body, to prevent or reduce deformation of the exterior of the transfer body.04-05-2012
20120091629IMPRINT LITHOGRAPHY - An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.04-19-2012
20120286450METHOD OF FORMING MICROPATTERN, DIE FORMED BY THIS METHOD OF FORMING MICROPATTERN, TRANSFER METHOD AND MICROPATTERN FORMING METHOD USING THIS DIE - A micropattern is joined to a substrate (W11-15-2012
20120242002TEMPLATE, SURFACE PROCESSING METHOD OF TEMPLATE, SURFACE PROCESSING APPARATUS OF TEMPLATE, AND PATTERN FORMATION METHOD - A template includes a transfer surface having an unevenness pattern. The template is configured to form a configuration in a surface of a resin to reflect the unevenness pattern. The resin is formed by filling a photocurable resin liquid into a recess of the unevenness pattern in a state prior to using light to cure the photocurable resin liquid and by using the light to cure the photocurable resin liquid. The template includes a base member and a surface layer. The base member includes a major surface having an unevenness. The surface layer covers the unevenness of the base member, and is used to form the unevenness pattern to reflect a configuration of the unevenness. A contact angle between the surface layer and the photocurable resin liquid in the state prior to using the light to cure the photocurable resin liquid is not more than 30 degrees.09-27-2012
20130181375METHOD OF FORMING A FRONTAL TOOTHING ON AN INNER RING OF A WHEEL HUB - A method including the steps of forming an inner ring of a wheel hub, by joining a spindle and an insert ring fitted onto the spindle, on a side of a first end of the spindle; axially blocking the insert ring on the spindle by plastically deforming the first end of the spindle that forms an upset collar therewith, which axially protrudes from the insert ring; frontally obtaining on the collar, on the side opposite to the insert ring, a frontal toothing by means of a single creator tool, towards the collar, with a toothing complementary to that to be obtained, by axially impressing onto the collar, in sequence, one or more teeth of the complementary toothing by eccentrically pushing the creator tool against the collar while the creator tool is held substantially coaxial to the wheel hub, thus acting peripherally in sequence on the whole creator tool.07-18-2013
20130181376METHOD OF FORMING A FRONTAL TOOTHING ON AN INNER RING OF A WHEEL HUB - A method including the steps of forming an inner ring of a wheel hub, by joining a spindle and an insert ring fitted onto the spindle, on a side of a first end of the spindle; axially blocking the insert ring on the spindle by plastically deforming the first end of the spindle to form an upset collar therewith, which axially protrudes from the insert ring; and after forming the upset collar, frontally obtaining on the collar, on the side opposite to the insert ring a frontal toothing by means of a single creator tool provided, towards the collar, with a toothing which is complementary to that to be obtained, by impressing onto the collar, in sequence, one or more teeth of the complementary toothing, which have ridges with a rounded profile having a curvature radius (R) varying in the direction of an axis of symmetry (A07-18-2013
20110272855Techniques For Patterning Valve Components - Described are techniques for fabricating one or more parts of a valve used in a liquid chromatography system. At least one of a rotor and a stator are provided. The rotor is included in the valve and has a first surface facing a stator. The stator is included in the valve and has a second surface facing the rotor. A pattern is formed in at least one of the first surface and the second surface. Forming the pattern includes compressing the at least one surface by applying pressure thereto causing displacement of material to form at least one groove.11-10-2011
20120248650APPARATUS AND METHOD FOR DEGRADING A WEB IN THE MACHINE DIRECTION WHILE PRESERVING CROSS-MACHINE DIRECTION STRENGTH - An embossing system for embossing at least a portion of a web is provided comprising a first embossing roll having male embossing elements, a second embossing roll having male embossing elements, wherein the first and second embossing rolls define a first nip for receiving the web, and a third embossing roll having male embossing elements, wherein the second and third embossing rolls define a second nip for receiving the web, and wherein at least a substantial portion of the embossing elements of at least one of the first, second, and third embossing rolls are substantially oriented in the cross-machine direction.10-04-2012
20130099417EMBOSSING UNIT AND EMBOSSING METHOD - An embossing unit including at least one embossing roller, provided with embossing protrusions or recesses on a cylindrical surface; at least one pressure roller coated with an elastically yielding material and cooperating with the embossing roller; at least one actuator that presses the pressure roller and the embossing roller against each other; an automatic position adjustment system, to adjust the reciprocal position of the pressure roller and the embossing roller.04-25-2013
20130113136IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process, the apparatus including a holding unit configured to hold a mold, a stage configured to hold a substrate, and a control unit configured to control the imprint process, wherein in the imprint process for an outer peripheral shot region among shot regions on the substrate, the control unit controls at least one of the holding unit and the stage to relatively rotate the mold and the substrate so that an outermost portion, in a radial direction of the substrate, of the imprint material supplied to the outer peripheral shot region at least partially separates from the mold last.05-09-2013
20130127090Resin Mold for Nanoimprinting and Production Method Thereof - A resin mold for nanoimprinting of the has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×1005-23-2013
20130134630IMPRINT APPARATUS, MANUFACTURING METHOD FOR ARTICLE USING THE SAME, AND IMPRINT METHOD - An imprint apparatus includes a holding unit configured to hold the mold by use of a suction unit including a plurality of suction force generating portions; a suction force adjusting unit configured to enable adjustment of a suction force by the plurality of suction force generating portions; and a shape correcting unit configured to align a shape of a pattern region of the mold with a shape of a substrate-side pattern region of the substrate by applying force to the mold. In the case of applying force to the mold by use of the shape correcting unit, the suction force adjusting unit configures a predetermined region of a suction surface applying suction to the mold as a suction region, and adjusts the suction force of the plurality of suction force generating portions so that the suction force on the other region is smaller than the suction force on the suction region.05-30-2013
20130134629EMBOSSING METHOD AND EMBOSSING MOLD - An embossing method is provided. The embossing method includes the following steps. A three-dimensional workpiece and a soft stamp are configured in a chamber. A non-cured material layer is configured on a decoration surface of the three-dimensional workpiece. The decoration surface is not a plane. The soft stamp is configured on the non-cured material layer, and a surface of the soft stamp contacting the non-cured material layer has an embossing pattern. A high pressure gas is injected into the chamber, so as to press the soft stamp and transfer the embossing pattern to the non-cured material layer. The non-cured material layer with the transferred embossing pattern is cured to form a cured material layer. In addition, an embossing mold is also provided.05-30-2013
20110215504TRANSFER METHOD AND TRANSFER APPARATUS - A first mold having an uneven pattern formed thereon and a second mold having an uneven pattern formed thereon are fixed in a state in which reference positions of the first mold and the second mold are aligned with the center axis of support means. An object to which transfer is to be performed is made supported by the support means, and the first mold is made move toward the second mold in a state in which a reference position of the object is aligned with the center axis of the support means so that the first mold is pressed to a first surface of the object and, at the same time, the second mold is pressed to a second surface of the object.09-08-2011
20100090371Method of patterning conductive layers, method of manufacturing polarizers, and polarizers manufactured using the same - Disclosed is a method of patterning a conductive layer, a method of manufacturing a polarizer using the method and a polarizer manufactured using the same, and a display device having the polarizer. The method of patterning the conductive layer includes (a) patterning a resin layer to form grooves and protrusions, and (b) applying a conductive filling material on the resin layer so as to form a pattern using stereoscopic shapes of the grooves and the protrusions on the patterned resin layer.04-15-2010
20130147089TRANSPARENT CONDUCTIVE MATERIAL, DISPERSION LIQUID, TRANSPARENT CONDUCTIVE FILM, AND METHODS FOR MANUFACTURING SAME - According to one embodiment, a transparent conductive material is used for a transparent conductive film. The transparent conductive material includes nanographene having a polar group at a surface of the nanographene.06-13-2013
20100308501APPARATUS AND METHOD FOR FABRICATING FLAT PANEL DISPLAY DEVICE - A method and apparatus for fabricating a flat panel display device is disclosed. A thin film is patterned in a patterning process using a soft mold without using a photo process. A thin film layer and a resist are sequentially formed on a substrate. A designated resist pattern is formed by applying pressure to the resist using a soft mold. The resist has a dipole moment μ value equal to or higher than 2(D), or has a solubility parameter value lower than 6(cal/cm12-09-2010
20120273999METHOD FOR PATTERNING A STACK - The embodiments disclose a method for patterning a stack, including embedding servo patterns within a final template and creating positions of plural cross-tracked shifted position error signal (PES) fields incrementally from the embedded servo patterns on the final template.11-01-2012
20100314799PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS IN WHICH A SUBSTRATE AND A MOLD ARE ALIGNED IN AN IN-PLANE DIRECTION - A pattern forming method for forming an imprinted pattern on a coating material disposed on a substrate with a pattern provided to a mold. The method includes preparing a mold provided with a first surface including a pattern area, a second surface located opposite from the first surface, and an alignment mark provided at a position at which the alignment mark is away from the first surface, contacting the pattern area of the mold with the coating material disposed on the substrate, obtaining information about positions of the mold and the substrate by using the alignment mark and a mark provided to the substrate in a state in which the coating material is disposed on the substrate at a portion where the alignment mark and the substrate are opposite to each other, and effecting alignment of the substrate with the mold in an in-plane direction of the pattern area, on the basis of the information in a state in which the pattern area and the coating material contact each other.12-16-2010
20100314798IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error.12-16-2010
20110309548IMPRINTING METHOD AND IMPRINTING APPARATUS, SAMPLE SHOT EXTRACTION METHOD, AND ARTICLE MANUFACTURING METHOD USING SAME - Provided is an imprinting method that is capable of strictly performing the interpolation of the application distribution of an uncured resin material to be applied to a substrate for each shot as well as efficiently performing the reinterpolation of the application distribution of the uncured resin material for each shot while reducing the workload in a generation step. The imprinting apparatus of the present invention includes a mold 12-22-2011
20110309547DEVICE FOR MAKING A PART OF A COMPOSITE MATERIAL BY RESIN-TRANSFER MOULDING - The invention relates to a device (12-22-2011
20130187309STAMP, METHOD OF FABRICATING THE STAMP, AND IMPRINT METHOD USING THE SAME - A stamp includes a transparent body having an inner chamber containing an inlet/outlet tube configured to have a fluid injected and removed therefrom.07-25-2013
20130093117METHOD FOR EMBOSSING A TIP COVER OF A CIGARETTE TIP04-18-2013
20120086149IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.04-12-2012
20130207309MINUTE CONVEXO-CONCAVE PATTERN FORMING METHOD AND FORMING DEVICE, AND TRANSFER SUBSTRATE PRODUCING METHOD AND TRANSFER SUBSTRATE - A minute convexo-concave pattern forming method includes: transferring a minute convexo-concave pattern of a mold to a resist layer of a transfer substrate where a resist layer is formed on a substrate and curing the transferred minute convexo-concave pattern; and after curing the transferred minute convexo-concave pattern, peeling the transfer substrate and the mold, the peeling step including: pressurizing a substrate back surface side of the transfer substrate with a peripheral part of the transfer substrate being fixed to bend the transfer substrate in a curved shape and starting peeling of the transfer substrate and the mold with a bending of the transfer substrate; and peeling a part of the minute convexo-concave pattern of the transfer substrate not peeled in the first peeling step by gradually decreasing a pressure for a pressurization so as to undo the bending of the transfer substrate.08-15-2013
20130207310NANOIMPRINTING MOLD, METHOD FOR PRODUCING THE NANOIMPRINTING MOLD, AND NANOIMPRINTING METHOD EMPLOYING THE NANOIMPRINTING MOLD - Fluctuations in the thickness of resist films after imprinting are eliminated, in a nanoimprinting method that employs a fine pattern of protrusions and recesses. A nanoimprinting mold is produced by forming a fine pattern of protrusions and recesses on the surface of a substrate. A substrate having a surface shape after a mold release process is administered thereon and before the pattern of protrusions and recesses is formed with a 3σ o value related to a height difference distribution within a range from 1 nm to 3 nm is employed as the substrate.08-15-2013

Patent applications in class Deforming the surface only