Entries |
Document | Title | Date |
20080203513 | Semiconductor Integrated Device Having Solid-State Image Sensor Packaged Within and Production Method for Same - A semiconductor integrated device comprises: a light-shielding film which shields at least some part of a transfer section of the semiconductor integrated device from light; a first wiring formed in the same layer as the light-shielding film, with one end connected to a pad electrode and an other end extended to a side edge of the semiconductor substrate; a second wiring arranged to go around a side face of the semiconductor substrate, and connected to the first wiring; and a sealing member which seals the solid-state image sensor. | 08-28-2008 |
20080230861 | CMOS front end process compatible low stress light shield - An improved imaging device having a pixel arrangement featuring a multilayer light shield. The multilayer light shield includes stacked layers of light-shielding and light-transparent material. The light-transparent material, such as a dielectric, is selected to have a stress, such as a tensile stress, that offsets the stress, such as a compressive stress, of the light shielding material. Without the stress offset, the high compressive stress of the refractory metal could damage the integrity of the nearby silicon. The refractory metal is capable of withstanding the high temperatures associated with front end CMOS processing. The laminate structure allows the light shield to be placed close to the pixel surface. The light-transparent material has a thickness equal to about one-quarter wavelength of the light to be blocked, to act as an anti-reflective coating. An aperture in the light shield exposes the active region of the pixel's photoconversion device. | 09-25-2008 |
20080237769 | SEMICONDUCTOR OPTICAL SENSOR - A sensor includes a substrate provided with a circuit element forming region and a photodiode forming region, the substrate having a silicon substrate, an insulating layer on the silicon substrate, and a silicon layer on the insulating layer; a photodiode in the silicon layer; a circuit element in the silicon layer; a first interlayer insulating film formed over the silicon layer; a first light-shielding film on the first interlayer film and having an opening in the photodiode forming region; and a first inter-region light-shielding plug arranged between the two regions, for connecting the silicon substrate and the first light-shielding film. | 10-02-2008 |
20090001496 | PHOTODIODE, SOLID STATE IMAGE SENSOR, AND METHOD OF MANUFACTURING THE SAME - A photodiode formed over a silicon substrate is disclosed. The photodiode includes a light-receiving region formed of a diffusion region of a first conduction type at the surface of the silicon substrate and forming a pn junction; an intermediate region formed of a diffusion region of the first conduction type at the surface of the silicon substrate so as to be included in the light-receiving region; a contact region formed of a diffusion region of the first conduction type at the surface of the silicon substrate so as to be included in the intermediate region; a shield layer formed of a diffusion region of a second conduction type in a part of the surface of the silicon substrate outside the intermediate region; and an electrode in contact with the contact region. The shield layer faces the side end part of the diffusion region forming the intermediate region. | 01-01-2009 |
20090001497 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A semiconductor integrated circuit device includes a substrate having a PROM formed thereon in which the data memory state of the PROM is changed by the irradiation of light, and a multilayer wiring structure formed on the same side of the substrate as the PROM is formed. The multilayer wiring structure includes a transparent area, a shield area, and a PAD portion. The transparent area is formed from transparent material at a position opposite to the PROM area where the PROM is formed, and used as a light guiding path from the outside of the multilayer wiring structure to the PROM. The shield area is formed continuously from shielding materials arranged in several layers in the periphery of the transparent area. The PAD portion is formed on the outside of the shield area in regard to the transparent area, and controls the memory state of the PROM. | 01-01-2009 |
20090008733 | Electric field steering cap, steering electrode, and modular configurations for a radiation detector - A cap for a radiation detection device of the type that utilizes a semiconductor medium includes a bias connection pad, a steering electrode, and a shielding layer. The steering electrode may be a grid steering electrode positioned parallel to the bias connection pad opposite a medium, or may be an electrode disposed perpendicular to the bias connection pad along the edge of a medium. The bias connection pad may be electrically connected or equipotent to the steering electrode. The cap may be formed of flexible circuit board, which may also connect the semiconductor detector to bias, detection or processing circuitry. The bias connection pad and the shielding layer can be maintained with fixed spacing to prevent vibration. A mezzanine card may be used to connect multiple detectors in a modular fashion. | 01-08-2009 |
20090008734 | SEMICONDUCTOR LIGHT RECEIVING DEVICE AND PHOTOSEMICONDUCTOR MODULE - A semiconductor light receiving device includes: a light receiving section made of a semiconductor provided on a substrate; a mask layer provided above the light receiving section and having an opening configured to limit an irradiation area of the light receiving section; and a light scattering section provided in at least part of a light incident path in the opening and including a transparent material and light scattering particles dispersed in the transparent material. Light incident on the light receiving section passes through the light scattering section before being incident on the light receiving section. | 01-08-2009 |
20090065884 | SOLID-STATE IMAGING DEVICE - A solid-state imaging device is provided and includes: a semiconductor substrate; a plurality of photoelectric conversion elements arranged in a two-dimensional array in a surface portion of the semiconductor substrate; a conductive light shielding film above the surface portion, the conductive light shielding film having openings at a light-incident side of the respective photoelectric conversion elements; a connection pad formed in the semiconductor substrate and to be applied with a voltage from outside the solid-state imaging device; and a wiring that connects the connection pad and the conductive light shielding film, wherein the wiring has a wiring structure having a time constant smaller than that of one linear wiring. | 03-12-2009 |
20090065885 | Image Sensor and Method for Manufacturing the Same - Provided is an image sensor and method for manufacturing the same. In the image sensor, a first substrate has a lower metal line and a circuitry thereon. A crystalline semiconductor layer contacts the lower metal line and is bonded to the first substrate. A photodiode is provided in the crystalline semiconductor layer and electrically connected with the lower metal line. A light shielding layer is formed in regions of the photodiode. | 03-12-2009 |
20090072336 | Solid-state imaging device and method for manufacturing thereof as well as driving method of solid-state imaging device - A solid-state imaging device having an electrode for reading a signal charge is provided on one side of a light-receiving sensor portion constituting a pixel; a predetermined voltage signal applied to a light-shielding film formed to cover an image pickup area except the light-receiving sensor portion; a second-conductivity-type semiconductor area formed in the center on the surface of a first-conductivity-type semiconductor area constituting a photo-electric conversion area of the light-receiving sensor portion; and areas containing a lower impurity concentration than that of the second-conductivity-type semiconductor area formed on the surface of the first-conductivity-type semiconductor area at the end on the side of the electrode and at the opposite end on the side of a pixel-separation area. | 03-19-2009 |
20090096051 | SOLID STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME, AND SOLID STATE IMAGING MODULE - A solid state imaging device includes: an imaging device substrate with an imaging device section formed on a first major surface side thereof; a backside interconnect electrode provided on a second major surface side of the imaging device substrate and electrically connected to the imaging device section, the second major surface being on the opposite side of the first major surface; a circuit substrate provided with a circuit substrate electrode opposed to the second major surface; a connecting portion electrically connecting the backside interconnect electrode to the circuit substrate electrode; and a light shielding layer provided coplanar with the backside interconnect electrode or on the circuit substrate side of the backside interconnect electrode. | 04-16-2009 |
20090096052 | SEMICONDUCTOR DEVICE FOR RADIATION DETECTION - The invention provides a semiconductor device ( | 04-16-2009 |
20090108389 | IMAGING DEVICE COMPRISING SHIELDING UNIT WHICH SHIELDS LIGHT INCIDENT FROM IMAGING AREA TO OPTICAL BLACK AREA AND METHOD OF MANUFACTURING THE SAME - An imaging device according to an example of the invention comprises a first photoelectric conversion unit which is formed at an imaging area of a substrate, a second photoelectric conversion unit for black reference observation which is formed at an optical black area between the imaging area of the substrate and a peripheral circuit area where a peripheral circuit is formed, an insulating film which is formed on the imaging area and the optical black area of the substrate, and a shielding unit which is formed by connecting a contact and a interconnect in an accumulating direction of the insulating film from the substrate surface to the insulating film surface. | 04-30-2009 |
20090184386 | SOLID-STATE IMAGE PICKUP DEVICE AND FABRICATION METHOD THEREFOR - Disclosed herein is a solid-state image pickup device, including, a light receiving pixel section, a black level reference pixel section, a multi-layer wiring line section, a first light blocking film, a second light blocking film, a third light blocking film, and a fourth light blocking layer. | 07-23-2009 |
20090200631 | BACKSIDE ILLUMINATED IMAGING SENSOR WITH LIGHT ATTENUATING LAYER - A backside illuminated imaging sensor includes a semiconductor substrate, a metal interconnect layer and a light attenuating layer. The semiconductor substrate has a front surface, a back surface, and includes at least one imaging pixel formed on the front surface of the semiconductor substrate. The metal interconnect layer is electrically coupled to the imaging pixel and the light attenuating layer is coupled between the metal interconnect layer and the front surface of the semiconductor substrate. In operation, the imaging pixel receives light from the back surface of the semiconductor substrate, where a portion of the received light propagates through the imaging pixel to the light attenuating layer. The light attenuating layer is configured to substantially attenuate the portion of light received from the imaging pixel. | 08-13-2009 |
20090218648 | NEAR-FIELD OPTICAL PROBE BASED ON SOI SUBSTRATE AND FABRICATION METHOD THEREOF - Provided is near-field optical probe including: a cantilever arm support portion that is formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support portion having a through hole formed therein at a side of the lower silicon layer; and a cantilever arm forming of a junction oxidation layer pattern and an upper silicon layer pattern on the SOI substrate that are supported on an upper surface of the lower silicon layer and each have a smaller hole than the through hole, a silicon oxidation layer pattern having a tip including an aperture at a vertical end, corresponding with the hole on the upper silicon layer pattern, and an optical transmission prevention layer that is formed on the silicon oxidation layer pattern and does not cover the aperture. | 09-03-2009 |
20090230494 | Solid-state imaging device, manufacturing method for the same, and imaging apparatus - A solid-state imaging device includes: a pixel section including, in a semiconductor substrate, plural photoelectric conversion sections that photoelectrically convert incident light to generate signal charges; metal wirings formed, on a first insulating film formed on the semiconductor substrate, above regions among the photoelectric conversion sections and above the periphery of the pixel section; a second insulating film formed on the first insulating film to cover the metal wirings; a first light shielding film formed on the second insulating film and having an opening above the pixel section; and a second light shielding film formed above the metal wirings above the pixel section and having thickness smaller than that of the first light shielding film. | 09-17-2009 |
20090230495 | INPUT DISPLAY - An input display is provided in the present invention. The input display includes a thin film transistor (TFT) and a light blocking layer. The TFT includes a low-field electrode, a high-field electrode connected to the low-field electrode with a connecting section, and a field-effect area positioned on the connecting section and connected to the high-field electrode, wherein a PN junction field is formed in the field-effect area when the TFT is switched off. The light blocking layer corresponds to the high-field electrode and hides the field-effect area from all incident light from the TFT. | 09-17-2009 |
20090243016 | SEMICONDUCTOR DEVICE - An apparatus is provided. The apparatus generally comprises a photoreceptive region and a circuit region formed in a substrate. A multilayer wiring region is then formed on the substrate over at least a portion of the circuit region. The multilayer wiring region includes a wiring layer and a light-blocking layer. The wiring layer is coupled to the circuit region, and the light-blocking wall has a metal layer that is arranged along at least a portion of the perimeter of the photoreceptive region and that is formed in the same process step as the wiring layer. | 10-01-2009 |
20090243017 | METHOD OF MANUFACTURING SOLID STATE IMAGING DEVICE, SOLID STATE IMAGING DEVICE, AND CAMERA USING SOLID STATE IMAGING DEVICE - A method of manufacturing a solid state imaging device having a photo-electric conversion portion array and a transfer electrode array, these arrays being provided in parallel to each other, upper surfaces and side wall surfaces of the transfer electrode array being covered with a light-shielding layer, and a transparent layer showing an oxidizing property at the time of film formation, the transparent layer being formed on the photo-electric conversion parts and the light-shielding layer. | 10-01-2009 |
20090256230 | PHOTOELECTRIC CONVERSION APPARATUS AND IMAGING SYSTEM USING THE PHOTOELECTRIC CONVERSION APPARATUS - In a photoelectric conversion apparatus including a charge holding portion, a part of an element isolation region contacting with a semiconductor region constituting the charge holding portion extends from a reference surface including the light receiving surface of a photoelectric conversion element into a semiconductor substrate at a level equal to or deeper than the depth of the semiconductor region in comparison with the semiconductor region. | 10-15-2009 |
20090294888 | METHOD FOR FABRICATING AN IMAGE SENSOR - A method for fabricating an image sensor is disclosed. First, a semiconductor substrate is provided, in which a photosensitive region is defined on the semiconductor substrate. At least one photosensitive material is then formed on the semiconductor substrate, and a first exposure process is performed to form a tapered pattern in the photosensitive material. A second exposure process is performed to form a straight foot pattern in the photosensitive material, and a developing process is performed to remove the tapered pattern and straight foot pattern to form the photosensitive material into a plurality of photosensitive blocks. A reflow process is conducted thereafter to form the photosensitive blocks into a plurality of microlenses. | 12-03-2009 |
20090294889 | Semiconductor device - A semiconductor device according to the present invention includes a semiconductor substrate: a photodiode responsive to a light, which is formed in the semiconductor substrate; at least an interlayer insulating layer formed over the semiconductor substrate, the at least an interlayer insulating layer comprising an upper most insulating layer; at least a conductive wiring layer, comprising an upper most conductive wiring layer formed on the upper most insulating layer; and a first passivation layer formed over the upper-most conductive wiring layer. The upper-most wiring layer is not formed directly above the photodiode. The first passivation layer is made of a permeability-resist material and is not formed directly above the photodiode. | 12-03-2009 |
20090309180 | SURFACE PROFILE SENSOR AND METHOD FOR MANUFACTURING THE SAME - A surface profile sensor includes an interlayer insulating film provided with a planarized upper surface formed above a semiconductor substrate, a detection electrode film formed on the interlayer insulating film, an upper insulating film formed on the detection electrode film and the interlayer insulating film and including the surface on which a silicon nitride film is exposed, and a protection insulating film deposited on the upper insulating film and made of a tetrahedral amorphous carbon (ta-C) film including a window formed on the detection electrode film. | 12-17-2009 |
20100038739 | SEMICONDUCTOR DEVICE AND FABRICATION PROCESS THEREOF - A semiconductor device that includes a circuit portion, a first light-shielding film and plural second light-shielding films. In the circuit portion, a plurality of wiring layers that include circuit elements are laminated. The first light-shielding film covers an uppermost layer of the wiring layers and light-shields light that is illuminated at the circuit portion. The second light-shielding films are covered by the first light shielding film and formed so as to respectively encircle the wiring layers in ring forms. Outer peripheries of the plural second light-shielding films are formed to be successively smaller from an upper to a lower layer, so as to be at the inner side relative to the outer periphery of the second light-shielding film of the upper layer. | 02-18-2010 |
20100044821 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - This invention offers a semiconductor device to measure a luminance for the visible wavelength range of light components and its manufacturing method which reduce its manufacturing cost. A first light-receiving element and a second light-receiving element are formed in a semiconductor substrate. Then, there is formed an arithmetic circuit that calculates a difference between a value of an electric current corresponding to an amount of light detected by the first light-receiving element (that is, a value of an electric current representing a relative sensitivity against the light) and a value of an electric current corresponding to an amount of light detected by the second light-receiving element (that is, a value of an electric current representing a relative sensitivity against the light). Next, a first green pass filter permeable only to light in a green wavelength range and an infrared wavelength range is formed to cover the first light-receiving element, while a second green pass filter similar to the first green filter is formed to cover the second light-receiving element. In addition, a red pass filter permeable only to light in a red wavelength range and the infrared wavelength range is formed to cover the second light-receiving element. | 02-25-2010 |
20100078747 | Image sensing device and packaging method thereof - An image sensing device and a packaging method thereof is disclosed. The packaging method includes the steps of providing an adhesive layer; placing a substrate, having an opening, on the adhesive layer; disposing an image sensor within the opening on the adhesive layer; adding a filler between the image sensor and the substrate; connecting the image sensor and the substrate via a plurality of bonding wires; and removing the adhesive layer. | 04-01-2010 |
20100078748 | SOLID-STATE IMAGE PICKUP DEVICE AND MANUFACTURING METHOD THEREOF - A solid-state image pickup device relating to the present invention has a specific gap in a part of a lattice-shaped light blocking film pattern or wiring pattern having an opening enclosing a light reception region. Peripheral circuits and wiring layers on a pixel may be used as the light blocking film. In such a case, when multiple wiring layers are used as the light blocking film, layouts of a second and subsequent wiring layers is determined according to the layout of the first wiring layer above the light reception region. The specific gap is created in a part of the wiring enclosing the light reception region. | 04-01-2010 |
20100102410 | LIGHT SENSOR - A light sensor includes an element forming region having a light detection region. The element forming region excluding the light detection region is covered with a conductive film having a light shielding property, and the light detection region is covered with a conductive film having a light transmissive property. A method for preventing electromagnetic noise from entering a light sensor includes applying an electromagnetic shield conductive film to the light sensor and removing the electromagnetic shield conductive film at a region of the light sensor facing a light detection region. | 04-29-2010 |
20100148294 | OPTICAL DEVICE AND ELECTRONIC DEVICES USING THE SAME - An optical device such as an image sensor alleviates reduction in image quality caused by light reaching a peripheral circuit section other than a light receiving section. A semiconductor substrate includes an interconnect layer, a light receiving section provided with a plurality of light receiving elements on the interconnect layer, and a peripheral circuit section provided in a same layer as the light receiving section, and surrounding the light receiving section. Light entry elements are provided on a surface of the semiconductor substrate. A light shielding film is formed of a metal layer, and covers at least one part of a region corresponding to the peripheral circuit section. A first electrode is formed in the region corresponding to the peripheral circuit section, and in an opening of the light shielding film to be electrically isolated from the light shielding film. | 06-17-2010 |
20100164041 | BACK SIDE ILLUMINATON IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME - A back side illumination image sensor according to an embodiment includes: a photosensitive device and a readout circuit on the front side of a first substrate; an interlayer dielectric layer on the front side of the first substrate; a metal line on the interlayer dielectric layer; a pad having a step on the interlayer dielectric layer; and a second substrate bonded with the front side of the first substrate over the interlayer dielectric layer, metal line, and pad. | 07-01-2010 |
20100213564 | SENSOR CHIP AND METHOD OF MANUFACTURING THE SAME - A sensor chip includes: a semiconductor substrate that is provided with a light receiving portion on a main surface; a light transmissive member that is provided on the main surface of the semiconductor substrate, enclosing a hollow portion above the light receiving portion, to surround upper and periphery of the light receiving portion; and a light transmissive protective member that is provided on the light transmissive member. | 08-26-2010 |
20100244172 | SEMICONDUCTOR DEVICES AND METHODS FOR FORMING PATTERNED RADIATION BLOCKING ON A SEMICONDUCTOR DEVICE - Several embodiments for semiconductor devices and methods for forming semiconductor devices are disclosed herein. One embodiment is directed to a method for manufacturing a microelectronic imager having a die including an image sensor, an integrated circuit electrically coupled to the image sensor, and electrical connectors electrically coupled to the integrated circuit. The method can comprise covering the electrical connectors with a radiation blocking layer and forming apertures aligned with the electrical connectors through a layer of photo-resist on the radiation blocking layer. The radiation blocking layer is not photoreactive such that it cannot be patterned using radiation. The method further includes etching openings in the radiation blocking layer through the apertures of the photo-resist layer. | 09-30-2010 |
20100244173 | IMAGE SENSOR AND METHOD OF FABRICATING SAME - Provided is a method of fabricating an image sensor device. The method includes providing a device substrate having a front side and a back side. The method includes forming first and second radiation-sensing regions in the device substrate, the first and second radiation-sensing regions being separated by an isolation structure. The method also includes forming a transparent layer over the back side of the device substrate. The method further includes forming an opening in the transparent layer, the opening being aligned with the isolation structure. The method also includes filling the opening with an opaque material. | 09-30-2010 |
20100295143 | TWO-DIMENSIONAL SOLID-STATE IMAGING DEVICE - A two-dimensional solid-state imaging device includes: pixel regions arranged in a two-dimensional matrix, wherein each pixel region has a plurality of subpixel regions, a metal layer with an opening of an opening size smaller than the wavelength of an incoming electromagnetic wave and a photoelectric conversion element are arranged with an insulating film interposed therebetween, at least one photoelectric conversion element is arranged in the opening provided at a portion of the metal layer in each subpixel region, a projection image of the opening is included in a light receiving region of the photoelectric conversion element, the opening is arrayed so as to cause a resonance state based on surface plasmon polariton excited by the incoming electromagnetic wave, and near-field light generated near the opening in the resonance state is converted to an electrical signal by the photoelectric conversion element. | 11-25-2010 |
20110084351 | BACK-ILLUMINATED TYPE SOLID-STATE IMAGING DEVICE - A back-illuminated type solid-state imaging device including (a) a semiconductor layer on a front surface side of a semiconductor substrate with an insulation film between them; (b) a photoelectric conversion element that constitutes a pixel in the semiconductor substrate; (c) at least part of transistors that constitute the pixel in the semiconductor film; and (d) a rear surface electrode to which a voltage is applied on the rear surface side of the semiconductor substrate, wherein, (1) a semiconductor layer of an opposite conduction type to a charge accumulation portion of the photoelectric conversion element is formed in the semiconductor substrate under the insulation film, and (2) the same voltage as the voltage applied to the rear surface electrode is applied to the semiconductor layer. | 04-14-2011 |
20110140223 | LIGHT DETECTING APPARATUS AND METHOD OF MANUFACTURING SAME - A light detecting apparatus includes an SOI substrate. In the SOI substrate, a semiconductor layer and a silicon substrate are laminated via an insulating layer. The semiconductor layer has a light receiving unit and a circuit unit formed therein. The light detecting apparatus also includes an interlayer insulating film formed on a first main surface of the SOI substrate. The light detecting apparatus also includes a front surface circuit wiring embedded in the interlayer insulating film. The light detecting apparatus also includes a front surface pseudo-wiring having a grid unit. The grid unit has at least one opening allowing passage of a light of a predetermined wavelength range to the light receiving unit. The light detecting apparatus also includes a rear surface circuit wiring and a rear surface pseudo-wiring formed on a second main surface of the SOI substrate. The light detecting apparatus also includes a penetration circuit wiring that connects the front surface circuit wiring to the rear surface circuit wiring. The light detecting apparatus also includes a penetration pseudo-wiring that electrically connects the front surface pseudo-wiring to the rear surface pseudo-wiring. The light receiving unit is surrounded by the front surface pseudo-wiring, the rear surface pseudo-wiring, and the penetration pseudo-wiring. | 06-16-2011 |
20110156193 | SEMICONDUCTOR COMPONENT AND METHOD OF FABRICATING SEMICONDUCTOR COMPONENT - There is provided a semiconductor component including: a semiconductor substrate of a first conduction type; a semiconductor layer of a second conduction type that is formed on the semiconductor substrate and is PN-joined with the semiconductor substrate; an insulator layer laminated on the semiconductor layer; a metal layer laminated on the insulator layer at a pre-specified region; a semiconductor of the second conduction type at a side of the semiconductor layer at which the insulating layer is laminated, the semiconductor being formed directly under the metal layer such that incident light that is incident from the metal layer side is not illuminated onto the semiconductor layer, and the semiconductor containing more impurities than the semiconductor layer; and a conduction portion that conducts between the metal layer and the semiconductor. | 06-30-2011 |
20110175186 | SOLID-STATE IMAGE PICKUP DEVICE - A solid-state image pickup device | 07-21-2011 |
20110221023 | SEMICONDUCTOR DEVICES AND METHODS FOR FORMING PATTERNED RADIATION BLOCKING ON A SEMICONDUCTOR DEVICE - Several embodiments for semiconductor devices and methods for forming semiconductor devices are disclosed herein. One embodiment is directed to a method for manufacturing a microelectronic imager having a die including an image sensor, an integrated circuit electrically coupled to the image sensor, and electrical connectors electrically coupled to the integrated circuit. The method can comprise covering the electrical connectors with a radiation blocking layer and forming apertures aligned with the electrical connectors through a layer of photo-resist on the radiation blocking layer. The radiation blocking layer is not photoreactive such that it cannot be patterned using radiation. The method further includes etching openings in the radiation blocking layer through the apertures of the photo-resist layer. | 09-15-2011 |
20110227182 | SOLID-STATE IMAGE SENSOR - A solid-state image sensor including an effective pixel portion in which a plurality of pixels including photodiodes formed on a semiconductor substrate are arranged, and a peripheral portion arranged around the effective pixel portion, includes a plurality of metal wiring layers arranged above the semiconductor substrate, and a planarizing film covering a patterned metal wiring layer that is a top layer among the plurality of metal wiring layers, wherein in the effective pixel portion, the plurality of metal wiring layers have openings configured to guide light to the photodiodes, and in the peripheral portion, an opening is provided in the top layer, and at least one metal wiring layer between the top layer and the semiconductor substrate has a pattern which blocks light incident on the photodiodes via the opening in the top layer. | 09-22-2011 |
20110227183 | PHOTODIODE ARRAY - A photodiode array | 09-22-2011 |
20110233707 | SOLID-STATE IMAGE PICKUP ELEMENT, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS - A solid-state image pickup element includes: a photoelectric conversion region formed in a semiconductor substrate; an electric charge holding region formed in the semiconductor substrate for holding electric charges accumulated in the photoelectric conversion region until the electric charges are read out; a transfer gate formed on the semiconductor substrate for transferring electric charges generated by photoelectric conversion in the photoelectric conversion region to the electric charge holding region, and a light blocking film formed on an upper surface of the transfer gate. In this case, a portion between the semiconductor substrate and the light blocking film is thinly formed as a light made incident to the photoelectric conversion region has a longer wavelength in a wavelength region. | 09-29-2011 |
20110241148 | SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC EQUIPMENT - A solid state imaging device including a semiconductor layer comprising a plurality of photodiodes, a first antireflection film located over a first surface of the semiconductor layer, a second antireflection film located over the first antireflection film, a light shielding layer having side surfaces which are adjacent to at least one of first and the second antireflection film. | 10-06-2011 |
20110248369 | Photodiode and Photodiode Array with Improved Performance Characteristics - The present invention is a photodiode and/or photodiode array, having a p+ diffused area that is smaller than the area of a mounted scintillator crystal, designed and manufactured with improved device characteristics, and more particularly, has relatively low dark current, low capacitance and improved signal-to-noise ratio characteristics. More specifically, the present invention is a photodiode and/or photodiode array that includes a metal shield for reflecting light back into a scintillator crystal, thus allowing for a relatively small p+ diffused area. | 10-13-2011 |
20110291216 | IMAGE SENSOR - In an image sensor | 12-01-2011 |
20110316108 | PHOTOELECTRIC CONVERSION DEVICE, PACKAGE STRUCTURE THEREFOR, AND METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE - The present disclosure provides a method of manufacturing a photoelectric conversion device, including, a first step of forming a plurality of photoelectric conversion regions on a surface on one side of a semiconductor wafer, a second step of preparing a light-blocking wafer having insertion openings, a third step of bonding the one-side surface of the semiconductor wafer and a surface on the opposite side to a surface on the one side of the light-blocking wafer to each other to form a bonded wafer body, and a fourth step of dividing the bonded wafer body in peripheries of the photoelectric conversion regions, to obtain bonded-body chips each having the photoelectric conversion region. | 12-29-2011 |
20110316109 | SOLID STATE IMAGING DEVICE - A solid-state imaging device includes photoelectric conversion units, vertical transfer units including vertical transfer electrodes, a horizontal transfer unit, a distribution transfer unit including distribution transfer electrodes, and first light-shield layers and second light-shield layers provided on the vertical transfer units and the distribution transfer unit. The first light-shield layers and the second light-shield layers are conductive. The first light-shield layers are provided in a layer different from a layer in which the second light-shield layers are provided. At least one of the first light-shield layers serves as an interconnect electrically connected to the vertical transfer electrodes included in the same row, and at least one of the first light-shield layers on the distribution transfer unit serves as an interconnect electrically connected the distribution transfer electrodes. The first light-shield layers are disposed so as not to overlap with the horizontal transfer unit. | 12-29-2011 |
20120007203 | SOLID-STATE IMAGING APPARATUS AND IMAGING SYSTEM - A solid-state imaging apparatus including pixels each including a photoelectric conversion element, and a light shielding layer covering the photoelectric conversion element is provided. For each of the photoelectric conversion elements, the light shielding layer includes a light shielding portion which shields a portion of incident light to the photoelectric conversion element, and an aperture which passes another portion of the incident light. The pixels include first and second pixels which have different areas on a planar view of the photoelectric conversion element. The area of the photoelectric conversion element in the first pixel is larger than the area of the photoelectric conversion element in the second pixel on the planar view. An area of the light shielding portion included in the first pixel is larger than an area of the light shielding portion included in the second pixel. | 01-12-2012 |
20120012964 | IMAGE SENSOR AND MANUFACTURING METHOD THEREOF - An image sensor includes: a photoelectric conversion pixel having a photoelectric conversion element that performs photoelectric conversion, and a light guide formed of a first material in an interlayer insulation film above the photoelectric conversion element; and a light-shielded pixel having a photoelectric conversion element that performs photoelectric conversion, a light guide formed of a second material that is different from the first material in an interlayer insulation film above the photoelectric conversion element, and a light-shielding layer formed above the light guide. | 01-19-2012 |
20120012965 | BACKSIDE ILLUMINATION SOLID-STATE IMAGING DEVICE - According to one embodiment, a backside illumination solid-state imaging device includes a semiconductor layer, a first light-receiving unit and a second light-receiving unit, a circuit unit, an impurity isolation layer, and a light-shielding film. A first light-receiving unit and a second light-receiving unit are formed adjacent to each other in the semiconductor layer, convert light applied from a lower surface side of the semiconductor layer into a signal, and store electric charges. A circuit unit is formed on an upper surface of the semiconductor layer. An impurity isolation layer is formed to reach to the upper surface from the lower surface in the semiconductor layer and isolates the first light-receiving unit from the second light-receiving unit. A light-shielding film is formed on part of the lower surface side in the impurity isolation layer so as to extend from the lower surface to the upper surface. | 01-19-2012 |
20120043636 | SOLID-STATE IMAGE SENSING APPARATUS - This invention provides a solid-state image sensing apparatus in which a sensor portion that performs photo-electric conversion and plural layers of wiring lines including a signal line for the sensor portion are formed on a semiconductor substrate; which includes an effective pixel portion configured such that light enters the sensor portion, and an optical black portion shielded so that the light does not enter the sensor portion; and which has a light-receiving surface on the back surface side of the semiconductor substrate. The optical black portion includes the sensor portion, a first light-shielding film formed closer to the back surface side of the semiconductor substrate than the sensor portion, and a second light-shielding film formed closer to the front surface side of the semiconductor substrate than the sensor portion. | 02-23-2012 |
20120068294 | Image Sensor with Decreased Optical Interference Between Adjacent Pixels - An image sensor with decreased optical interference between adjacent pixels is provided. An image sensor, which is divided into a pixel region and a peripheral region, the image sensor including a photodiode formed in a substrate in the pixel region, first to Mth metal lines formed over the substrate in the pixel region, where M is a natural number greater than approximately 1, first to Nth metal lines formed over a substrate in the peripheral region, where N is a natural number greater than M, at least one layer of dummy metal lines formed over the Mth metal lines but formed not to overlap with the photodiode, and a microlens formed over the one layer of the dummy metal lines to overlap with the photodiode. | 03-22-2012 |
20120153422 | Imaging Device with Filtering of the Infrared Radiation - An imaging device includes at least one photosite formed in a semiconducting substrate and fitted with a filtering device for filtering at least one undesired radiation. The filtering device is buried in the semiconducting substrate at a depth depending on the wavelength of the undesired radiation. | 06-21-2012 |
20120168890 | IMAGE SENSOR STRUCTURE - An image sensor structure, which comprises: a pixel; a first metal line; a second metal line, located under the first metal line; a conductive region, located under the second metal line; and at least one dummy contact, provided between the second metal line and the conductive region, wherein the second metal line and the conductive region are not electrically connected to each other via the dummy contact | 07-05-2012 |
20120193743 | SEMICONDUCTOR ELEMENT AND SOLID-STATE IMAGING DEVICE - A solid-state imaging device includes a semiconductor region of p-type; a buried region of n-type, configured to serve as a photodiode together with the semiconductor region; a extraction region of n-type, configured to extract charges generated by the photodiode from the buried region, having higher impurity concentration than the buried region; a read-out region of n-type, configured to accumulate charges, which are transferred from the buried region having higher impurity concentration than the buried region; and a potential gradient changing mechanism, configured to control a potential of the channel, and to change a potential gradient of a potential profile from the buried region to the read-out region and a potential gradient of a potential profile from the buried region to the extraction region, so as to control the transferring/extraction of charges. | 08-02-2012 |
20120199930 | SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS - Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device. | 08-09-2012 |
20120199931 | SOLID-STATE IMAGING DEVICE, ELECTRONIC APPARATUS, AND METHOD FOR MANUFACTURING THE SAME - A solid-state imaging device includes photoelectric conversion elements on an imaging surface of a substrate, receiving light incident on a light receiving surface and performing photoelectric conversion to produce a signal charge. Electrodes are interposed between the photoelectric conversion elements and light blocking portions are provided above the electrodes and interposed between the photoelectric conversion elements. The light blocking portions include an electrode light blocking portion formed to cover the corresponding electrode, and a pixel isolation and light blocking portion protruding convexly from the upper surface of the electrode light blocking portion. The photoelectric conversion elements are arranged at first pitches on the imaging surface. The electrode light blocking portions and the pixel isolation and light blocking portions are arranged at second and third pitches on the imaging surface. At least the third pitch increases with distance from the center toward the periphery of the imaging surface. | 08-09-2012 |
20120211852 | SOLID-STATE IMAGING APPARATUS - A solid-state imaging apparatus includes: a solid-state imaging device photoelectrically converting light taken by a lens; and a light shielding member shielding part of light incident on the solid-state imaging device from the lens, wherein an angle made between an edge surface of the light shielding member and an optical axis direction of the lens is larger than an incident angle of light to be incident on an edge portion of the light shielding member. | 08-23-2012 |
20120235269 | OPTICAL SENSOR AND ELECTRONIC APPARATUS - An optical sensor includes an impurity region for a photodiode and an angle limiting filter limiting the incidence angle of incidence light incident to a light receiving area of the photodiode, which are formed on a semiconductor substrate. The angle limiting filter is formed by at least a first plug corresponding to a first insulating layer and a second plug corresponding to a second insulating layer located in an upper layer of the first insulating layer. Between the first plug and the second plug, there is a gap area having a gap space that is equal to or less than λ/2. | 09-20-2012 |
20120280348 | BACK SIDE ILLUMINATED IMAGE SENSOR WITH IMPROVED STRESS IMMUNITY - Provided is an image sensor device. The image sensor device includes a substrate having a front side and a back side opposite the first side. The substrate has a pixel region and a periphery region. The image sensor device includes a plurality of radiation-sensing regions disposed in the pixel region of the substrate. Each of the radiation-sensing regions is operable to sense radiation projected toward the radiation-sensing region through the back side. The image sensor device includes a reference pixel disposed in the periphery region. The image sensor device includes an interconnect structure that is coupled to the front side of the substrate. The interconnect structure includes a plurality of interconnect layers. The image sensor device includes a film formed over the back side of the substrate. The film causes the substrate to experience a tensile stress. The image sensor device includes a radiation-blocking device disposed over the film. | 11-08-2012 |
20120286388 | SOLID STATE IMAGE PICKUP DEVICE AND METHOD OF PRODUCING SOLID STATE IMAGE PICKUP DEVICE - Forming a back-illuminated type CMOS image sensor, includes process for formation of a registration mark on the wiring side of a silicon substrate during formation of an active region or a gate electrode. A silicide film using an active region may also be used for the registration mark. Thereafter, the registration mark is read from the back side by use of red light or near infrared rays, and registration of the stepper is accomplished. It is also possible to form a registration mark in a silicon oxide film on the back side (illuminated side) in registry with the registration mark on the wiring side, and to achieve the desired registration by use of the registration mark thus formed. | 11-15-2012 |
20120292728 | Semiconductor Device Having a Bonding Pad and Shield Structure and Method of Manufacturing the Same - A semiconductor device includes a device substrate having a front side and a back side corresponding to a front side and a back side of the semiconductor device, a metal feature formed on the front side of the device substrate, a bonding pad disposed on the back side of the semiconductor device and in electrical communication with the metal feature, and a shield structure disposed on the back side of the device substrate in which the shield structure and the bonding pad have different thicknesses relative to each other. | 11-22-2012 |
20120313208 | IMAGE SENSOR AND METHOD OF FORMING THE SAME - An image sensor and a method of forming the same, where the image sensor may include a substrate including a pixel region and a pad region, a through via configured to penetrate the substrate in the pad region, a plurality of unit pixels in the pixel region, and a light shielding pattern between the plurality of unit pixels. The through via and the light shielding pattern include a same material. | 12-13-2012 |
20130001728 | BACKSIDE ILLUMINATED IMAGE SENSORS WITH VERTICAL LIGHT SHIELDS - Methods for forming backside illuminated (BSI) image sensors having vertical light shields are provided. Vertical light shields may be configured such that incoming light is blocked from reaching a portion of a pixel array formed on the backside illuminated image sensor. Vertical light shields may include horizontal portions that block direct illumination of dark pixels in the pixel array and vertical portions that block illumination of the dark pixels by reflected light. Vertical light shields may be formed from a dielectric layer, a layer of patterned light shield material formed over the dielectric layer and a passivation layer formed over the patterned light shield material. Vertical light shields may be formed by first etching a vertical trench in a device wafer layer over a portion of the pixel array and filling the vertical trench with light shield material to form the vertical light shield. | 01-03-2013 |
20130032916 | Pad Structures in BSI Image Sensor Chips - An integrated circuit structure includes a semiconductor substrate, and a dielectric pad extending from a bottom surface of the semiconductor substrate up into the semiconductor substrate. A low-k dielectric layer is disposed underlying the semiconductor substrate. A first non-low-k dielectric layer is underlying the low-k dielectric layer. A metal pad is underlying the first non-low-k dielectric layer. A second non-low-k dielectric layer is underlying the metal pad. An opening extends from a top surface of the semiconductor substrate down to penetrate through the semiconductor substrate, the dielectric pad, and the low-k dielectric layer, wherein the opening lands on a top surface of the metal pad. A passivation layer includes a portion on a sidewall of the opening, wherein a portion of the passivation layer at a bottom of the opening is removed. | 02-07-2013 |
20130032917 | SOLID-STATE IMAGE SENSING APPARATUS - This invention provides a solid-state image sensing apparatus in which a sensor portion that performs photo-electric conversion and plural layers of wiring lines including a signal line for the sensor portion are formed on a semiconductor substrate; which includes an effective pixel portion configured such that light enters the sensor portion, and an optical black portion shielded so that the light does not enter the sensor portion; and which has a light-receiving surface on the back surface side of the semiconductor substrate. The optical black portion includes the sensor portion, a first light-shielding film formed closer to the back surface side of the semiconductor substrate than the sensor portion, and a second light-shielding film formed closer to the front surface side of the semiconductor substrate than the sensor portion. | 02-07-2013 |
20130037903 | DISPLAY DEVICE - Disclosed is a display device that is configured such that light that is emitted from a backlight or the like and that illuminates a display panel is prevented from being transmitted through a light-shielding layer that is provided between a light sensor element and a substrate. A liquid crystal display device | 02-14-2013 |
20130093037 | INFARED SENSOR - The infrared sensor includes: an infrared sensor chip in which a plurality of pixel portions each including a temperature-sensitive portion formed of a thermopile is disposed in an array on one surface side of a semiconductor substrate; and an IC chip that processes an output signal of the infrared sensor chip. A package includes a package main body on which the infrared sensor chip and the IC chip are mounted to be arranged side-by-side, and a package cover that has a lens transmitting infrared rays and is hermetically bonded to the package main body. The package is provided therein with a cover member that includes a window hole through which infrared rays pass into the infrared sensor chip and equalizes amounts of temperature change of hot junctions and cold junctions among the pixel portions, the temperature change resulting from heating of the IC chip. | 04-18-2013 |
20130119500 | IMAGE SENSOR WITH IMPROVED DARK CURRENT PERFORMANCE - Provided is a semiconductor image sensor device. The image sensor device includes a semiconductor substrate that includes an array region and a black level correction region. The array region contains a plurality of radiation-sensitive pixels. The black level correction region contains one or more reference pixels. The substrate has a front side and a back side. The image sensor device includes a first compressively-stressed layer formed on the back side of the substrate. The first compressively-stressed layer contains silicon nitride. The image sensor device includes a metal shield formed on the compressively-stressed layer. The metal shield is formed over at least a portion of the black level correction region. The image sensor device includes a second compressively-stressed layer formed on the metal shield and the first compressively-stressed layer. The second compressively-stressed layer contains silicon oxide. A sidewall of the metal shield is protected by the second compressively-stressed layer. | 05-16-2013 |
20130119501 | IMAGE PICKUP APPARATUS AND IMAGE PICKUP APPARATUS MANUFACTURING METHOD - An image pickup apparatus includes: an image pickup device disposed in a first principal surface of a silicon substrate, the image pickup device sensing infrared light; an electrode pad disposed on the first principal surface; a front-face wiring connecting the image pickup device and the electrode pad; an external connection terminal disposed on a second principal surface of the silicon substrate; a back-face wiring connecting the electrode pad and the external connection terminal via a substrate through-hole extending from the second principal surface side through the silicon substrate to a back face of the electrode pad; and a light blocking layer disposed on the second principal surface, the light blocking layer covering a trench portion surrounding the image pickup device and a region surrounded by the trench portion. | 05-16-2013 |
20130127003 | SOLID-STATE IMAGING ELEMENT AND MANUFACTURING METHOD OF THE SAME AND ELECTRONIC EQUIPMENT - Disclosed herein is a solid-state imaging element including: a transfer section configured to transfer charge generated simultaneously by a photoelectric conversion section in all pixels to a memory section and have a metal gate; and a light-shielding section formed by filling a metal into a groove portion formed by digging an interlayer insulating film around the transfer section. | 05-23-2013 |
20130134541 | Metal Shielding Layer in Backside Illumination Image Sensor Chips and Methods for Forming the Same - A device includes a semiconductor substrate having a front side and a backside. A photo-sensitive device is disposed at a surface of the semiconductor substrate, wherein the photo-sensitive device is configured to receive a light signal from the backside of the semiconductor substrate, and convert the light signal to an electrical signal. An amorphous-like adhesion layer is disposed on the backside of the semiconductor substrate. The amorphous-like adhesion layer includes a compound of nitrogen and a metal. A metal shielding layer is disposed on the backside of the semiconductor substrate and contacting the amorphous-like adhesion layer. | 05-30-2013 |
20130175651 | DAMASCENE METAL GATE AND SHIELD STRUCTURE, METHODS OF MANUFACTURE AND DESIGN STRUCTURES - Semiconductor structures with damascene metal gates and pixel sensor cell shields, methods of manufacture and design structures are provided. The method includes forming a dielectric layer over a dummy gate structure. The method further includes forming one or more recesses in the dielectric layer. The method further includes removing the dummy gate structure in the dielectric layer to form a trench. The method further includes forming metal in the trench and the one more recesses in the dielectric layer to form a damascene metal gate structure in the trench and one or more metal components in the one or more recesses. | 07-11-2013 |
20130175652 | SOLID-STATE IMAGING DEVICE - In a solid-state imaging device, a photoelectric conversion unit, a transfer transistor, and at least a part of electric charge holding unit, among pixel constituent elements, are disposed on a first semiconductor substrate. An amplifying transistor, a signal processing circuit other than a reset transistor, and a plurality of common output lines, to which signals are read out from a plurality of pixels, are disposed on a second semiconductor substrate. | 07-11-2013 |
20130181314 | SEMICONDUCTOR PACKAGE AND METHOD FOR FABRICATING THE SAME - A semiconductor package includes a light transmissive cover having a conductive pattern, a substrate having a cavity, a semiconductor chip in the cavity of the substrate and electrically connected to the conductive pattern arranged on the light transmissive cover, and a blocking pattern between the light transmissive cover and the substrate. | 07-18-2013 |
20130200479 | SOLID-STATE IMAGING DEVICE, METHOD OF PRODUCING SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS - There is provided a solid-state imaging device including a pixel array portion in which multiple unit pixels are arranged on a semiconductor substrate, the multiple unit pixels each including a photoelectric conversion portion generating and accumulating a light charge based on a quantity of received light and a charge accumulation portion accumulating the light charge, wherein at least part of an electrode closer to an incidence side on which light enters the unit pixel of the charge accumulation portion, is formed with a metal film functioning as a light blocking film. | 08-08-2013 |
20130234276 | SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC EQUIPMENT - A solid state imaging device including a semiconductor layer comprising a plurality of photodiodes, a first antireflection film located over a first surface of the semiconductor layer, a second antireflection film located over the first antireflection film, a light shielding layer having side surfaces which are adjacent to at least one of first and the second antireflection film. | 09-12-2013 |
20130241021 | INTEGRATED CIRCUIT HAVING A SEMICONDUCTING VIA; AN INTEGRATED CIRCUIT INCLUDING A SENSOR, SUCH AS A PHOTOSENSITIVE DEVICE, AND A METHOD OF MAKING SAID INTEGRATED CIRCUIT - An integrated circuit having an insulated conductor or within a semiconductor substrate and extending perpendicular to a plane of a semiconductor wafer or substrate on which the integrated circuit is fabricated, the conductor comprising a first region of doped semiconductor extending between a first device or a first contact and a second device or a second contact. | 09-19-2013 |
20130249039 | Metal Shield Structures in Backside Illumination Image Sensor Chips and Methods for Forming the Same - A device includes a semiconductor substrate having a front side and a backside. An active image sensor pixel array is disposed on the front side of the semiconductor substrate. A metal shield is disposed on the backside of, and overlying, the semiconductor substrate. The metal shield has an edge facing the active image sensor pixel array. The metal shield has a middle width, and a top width greater than the middle width. | 09-26-2013 |
20130249040 | Structures for Grounding Metal Shields in Backside Illumination Image Sensor Chips - A device includes a semiconductor substrate having a front side and a backside. A photo-sensitive device is disposed on the front side of the semiconductor substrate. A dielectric layer is disposed on the backside of the semiconductor substrate, wherein the dielectric layer is over a back surface of the semiconductor substrate. A metal shield is over the dielectric layer and overlapping the photo-sensitive device. A metal plug penetrates through the dielectric layer, wherein the metal plug electrically couples the metal shield to the semiconductor substrate. | 09-26-2013 |
20130285186 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC APPARATUS - A semiconductor device comprising a first semiconductor section including a first wiring layer at one side thereof, a second semiconductor section including a second wiring layer at one side thereof, the first and second semiconductor sections being secured together with the respective first and second wiring layer sides of the first and second semiconductor sections facing each other, a conductive material extending through the first semiconductor section to the second wiring layer of the second semiconductor section and by means of which the first and second wiring layers are in electrical communication. | 10-31-2013 |
20140061839 | Multiple Metal Film Stack in BSI Chips - A device includes a semiconductor substrate, a black reference circuit in the semiconductor substrate, a metal pad on a front side of, and underlying, the semiconductor substrate, and a first and a second conductive layer. The first conductive layer includes a first portion penetrating through the semiconductor substrate to connect to the metal pad, and a second portion forming a metal shield on a backside of the semiconductor substrate. The metal shield is aligned to the black reference circuit, and the first portion and the second portion are interconnected to form a continuous region. The second conductive layer includes a portion over and contacting the first portion of the first conductive layer, wherein the first portion of the first conductive layer and the portion of the second conductive layer form a first metal pad. A dielectric layer is overlying and contacting the second portion of the first conductive layer. | 03-06-2014 |
20140103479 | Dispensing Systems with Improved Sensing Capabilities - A dispensing system includes a dispenser, at least one sensor, and a shroud including at least one aperture. A virtual shield is provided between the sensor and the shroud to reduce background noise. | 04-17-2014 |
20140110809 | METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE - According to one embodiment, a method of manufacturing a solid-state imaging device includes a trench forming process, a concave portion forming process, a coating process, and a burying process. In the trench forming process, a trench is formed at the position to isolate a plurality of photoelectric conversion elements. In the concave portion forming process, a concave portion is formed at the position to form a light shielding film of shielding at least part of subject light incident on an adjustment photoelectric conversion element used for an image quality adjustment of an imaged image. In the coating process, inner circumferential surfaces of the trench and the concave portion are coated with an insulating film. In the burying process, a light shielding member is buried inside the trench and the concave portion whose inner circumferential surface are coated with the insulating film. | 04-24-2014 |
20140117483 | BLACK LEVEL CORRECTION (BLC) STRUCTURE - One or more techniques or systems for forming a black level correction (BLC) structure are provided herein. In some embodiments, the BLC structure comprises a first region, a second region above at least some of the first region, and a third region above at least some of the second region. For example, the first region comprises silicon and the third region comprises a passivation dielectric. In some embodiments, the second region comprises a first sub-region, a second sub-region above the first sub-region, and a third sub-region above the second sub-region. For example, the first sub-region comprises a metal-silicide, the second sub-region comprises a metal, and the third sub-region comprises a metal-oxide. In this manner, a BLC structure is provided, such that a surface of the BLC structure is flush, at least because the third region is flush, for example. | 05-01-2014 |
20140131826 | SPATIALLY DISTRIBUTED CdS IN THIN FILM PHOTOVOLTAIC DEVICES AND THEIR METHODS OF MANUFACTURE - Thin film photovoltaic devices are provided. The device includes a transparent substrate; a transparent conductive oxide layer on the transparent substrate; an n-type window layer on the transparent conductive oxide layer, an absorber layer on the n-type window layer, and a back contact layer on the absorber layer. The n-type window layer includes a plurality of nanoparticles spatially distributed within a medium, with the nanoparticles comprising cadmium sulfide. In one embodiment, the medium has an optical bandgap that is greater than about | 05-15-2014 |
20140145288 | SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD THEREOF, AND ELECTRONIC APPARATUS - Disclosed herein is a solid-state imaging device including: a laminated semiconductor chip configured to be obtained by bonding two or more semiconductor chip sections to each other and be obtained by bonding at least a first semiconductor chip section in which a pixel array and a multilayer wiring layer are formed and a second semiconductor chip section in which a logic circuit and a multilayer wiring layer are formed to each other in such a manner that the multilayer wiring layers are opposed to each other and are electrically connected to each other; and a light blocking layer configured to be formed by an electrically-conductive film of the same layer as a layer of a connected interconnect of one or both of the first and second semiconductor chip sections near bonding between the first and second semiconductor chip sections. The solid-state imaging device is a back-illuminated solid-state imaging device. | 05-29-2014 |
20140159186 | SEMICONDUCTOR APPARATUS AND ELECTRONIC APPARATUS - A semiconductor apparatus includes a first semiconductor chip, a second semiconductor chip, and a flare prevention plate. On the first semiconductor chip, a photoelectric conversion unit configured to perform photoelectric conversion on light received in a light receiving area is formed. The second semiconductor chip is electrically connected to the first semiconductor chip, the second semiconductor chip being disposed on a surface of the first semiconductor chip on a side of the light receiving area. The flare prevention plate is disposed on the second semiconductor chip, the flare prevention plate being configured to block light, the flare prevention plate being in contact with the second semiconductor chip. | 06-12-2014 |
20140191353 | SOLID-STATE IMAGING DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC EQUIPMENT - A solid state imaging device including a semiconductor layer comprising a plurality of photodiodes, a first antireflection film located over a first surface of the semiconductor layer, a second antireflection film located over the first antireflection film, a light shielding layer having side surfaces which are adjacent to at least one of first and the second antireflection film. | 07-10-2014 |
20140197513 | Image Sensor with Improved Dark Current Performance - Provided is a semiconductor image sensor device. The image sensor device includes a semiconductor substrate that includes an array region and a black level correction region. The array region contains a plurality of radiation-sensitive pixels. The black level correction region contains one or more reference pixels. The substrate has a front side and a back side. The image sensor device includes a first compressively-stressed layer formed on the back side of the substrate. The first compressively-stressed layer contains silicon nitride. The image sensor device includes a metal shield formed on the compressively-stressed layer. The metal shield is formed over at least a portion of the black level correction region. The image sensor device includes a second compressively-stressed layer formed on the metal shield and the first compressively-stressed layer. The second compressively-stressed layer contains silicon oxide. A sidewall of the metal shield is protected by the second compressively-stressed layer. | 07-17-2014 |
20140264700 | MONOLITHIC SUN SENSORS, ASSEMBLIES THEREOF, AND METHODS OF MAKING AND USING SAME - Under one aspect of the present invention, a monolithic sun sensor includes a photosensor; a spacer material disposed over the photosensor; and a patterned mask disposed over the spacer material and defining an aperture over the photosensor. The spacer material has a thickness selected such that the patterned mask casts a shadow onto the photosensor that varies as a function of the monolithic sun sensor's angle relative to the sun. The sun sensor may further include a substrate in which the photosensor is embedded or on which the photosensor is disposed. The spacer material may be transparent, and may include a layer of inorganic oxide, or a plurality of layers of inorganic oxide. The patterned mask may include a conductive material, such as a metal. The aperture may be lithographically defined, and may be square. The sun sensor may further include a transparent overlayer disposed over the patterned mask. | 09-18-2014 |
20140264701 | Image Sensor Device and Method - A system and method for blocking light from regions around a photodiode in a pixel of an image sensor is provided. In an embodiment a first optical block layer is formed on a first glue layer and a second glue layer is formed on the first optical block layer. The formation of the first optical block layer and the second glue layer is repeated one or more times to form multiple optical block layers and multiple glue layers. As such, if voids open up in the optical block layers during further processing, there is another optical block layer to block any light that may have penetrated through the void. | 09-18-2014 |
20140264702 | OPTICAL SENSOR - An integrated circuit device includes an active semiconductor substrate comprising an array of photodiodes. The integrated circuit device also includes a dielectric layer disposed adjacent to the active semiconductor substrate proximate to the array of photodiodes. The dielectric layer has a first side adjacent to the active semiconductor substrate and a second side opposite from the active semiconductor substrate. The dielectric layer includes a layer of at least substantially opaque material. The layer of at least substantially opaque material defines an aperture configured to permit electromagnetic radiation incident upon the second side of the dielectric layer to reach the array of photodiodes. | 09-18-2014 |
20140264703 | SOLID-STATE IMAGE SENSING DEVICE AND SEMICONDUCTOR DISPLAY DEVICE - To provide a solid-state image sensing device or a semiconductor display device, which can easily obtain the positional data of an object without contact. Included are a plurality of first photosensors on which light with a first incident angle is incident from a first incident direction and a plurality of second photosensors on which light with a second incident angle is incident from a second incident direction. The first incident angle of light incident on one of the plurality of first photosensors is larger than that of light incident on one of the other first photosensors. The second incident angle of light incident on one of the plurality of second photosensors is larger than that of light incident on one of the other second photosensors. | 09-18-2014 |
20140291793 | SOLID-STATE IMAGING APPARATUS, SOLID-STATE IMAGING APPARATUS MANUFACTURING METHOD, AND ELECTRONIC APPARATUS - There is provided a solid-state imaging apparatus including a plurality of photoelectric conversion regions which photoelectrically convert light incident from a rear surface side of a semiconductor substrate, element isolation regions formed between the plurality of photoelectric conversion regions arranged in a matrix shape, and shielding members formed on upper surfaces of the element isolation regions. The element isolation regions have high impurity concentration regions of a high impurity concentration connected to at least a part of the shielding members. | 10-02-2014 |
20140346631 | RADIATION DETECTOR SYSTEM AND METHOD OF MANUFACTURE - The present disclosure provides a high electric field radiation detector including a first electrode, a second electrode, a radiation detecting layer, and a soft polymer layer below the radiation detecting layer and in contact with at least the first electrode. The present disclosure provides a method of manufacturing a radiation detector including obtaining a first electrode, depositing a soft polymer layer on the first electrode, depositing a radiation detecting layer above the soft polymer layer, and depositing a second electrode above the amorphous material layer. The present disclosure also provides a method of manufacturing a radiation detector including obtaining a first electrode and a second electrode, depositing a soft polymer layer on the first electrode and the second electrode, and depositing a radiation detecting layer above the soft polymer layer. | 11-27-2014 |
20140374865 | SEMICONDUCTOR DEVICE AND ELECTRONIC EQUIPMENT - The present technology relates to a semiconductor device and electronic equipment in which a semiconductor device that suppresses the occurrence of noise by a leakage of light can be provided. | 12-25-2014 |
20150028442 | SOLID-STATE IMAGING DEVICE AND MANUFACTURING METHOD OF THE SAME, AND ELECTRONIC APPARATUS - The present disclosure relates to a solid-state imaging device and a manufacturing method of the same, and an electronic apparatus, capable of more reliably suppressing occurrence of color mixing. | 01-29-2015 |
20150054110 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - Provided are a semiconductor device in which a solid-state image sensing element having a backside-illuminated structure and capacitor elements storing therein some of the charges supplied from light receiving elements has further improved reliability and a manufacturing method thereof. In the solid-state image sensing element of the semiconductor device, first and second substrates are joined together at a junction surface. The first substrate is formed with photodiodes. The second substrate is formed with the capacitor elements. The photodiodes and the capacitor elements are placed to be opposed to each other. In the first substrate, first coupling portions for coupling to the second substrate are placed. In the second substrate, second coupling portions for coupling to the first substrate are placed. A first gap portion between the first coupling portions and a second gap portion between the second coupling portions are placed to overlap a first light blocking film. | 02-26-2015 |
20150076646 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A backside illumination semiconductor image sensing device includes a semiconductor substrate. The semiconductor substrate includes a radiation sensitive diode and a peripheral region. The peripheral region is proximal to a sidewall of the backside illumination semiconductor image sensing device. The backside illumination semiconductor image sensing device further includes a first anti reflective coating (ARC) on a backside of the semiconductor substrate and a dielectric layer on the first anti reflective coating. Additionally, a radiation shielding layer is disposed on the dielectric layer. Moreover, the backside illumination semiconductor image sensing device has a photon blocking layer on the sidewall of the of the backside illumination semiconductor image sensing device. The at least a portion of a sidewall of the radiation shielding layer is not covered by the photon blocking layer and the photon blocking layer is configured to block photons penetrating into the semiconductor substrate. | 03-19-2015 |
20150137299 | SOLID STATE IMAGING DEVICE AND MANUFACTURING METHOD FOR SOLID STATE IMAGING DEVICE - There is provided a solid state imaging device according to the embodiment. The solid state imaging device includes an imaging area and an element isolation unit having a light shielding effect. In the imaging area, a plurality of photoelectric conversion elements is two-dimensionally arranged in a matrix in a semiconductor layer. The element isolation unit is embedded so as to surround a light-receiving region of each photoelectric conversion element. A center position of an opening region surrounding the light-receiving region is positioned on the center side of the imaging area than a corresponding center position of the light-receiving region. | 05-21-2015 |
20150145090 | SYSTEM AND METHOD FOR REDUCING DARK CURRENT DRIFT IN A PHOTODIODE BASED ELECTRON DETECTOR - A sensing element that may include (a) a PIN diode that may include an anode that is coupled to an anode contact; a cathode that is coupled to a cathode contact; a semiconductor portion that has a sensing region; and an insulator that is positioned between the cathode contact and the anode contact; and (b) a shielding element. The insulator, the cathode contact and the anode contact are positioned between the shielding element and the semiconductor portion. The shielding element is shaped and positioned to facilitate radiation to impinge onto the sensing region of the semiconductor portion while at least partially shielding the insulator from electrons that are emitted from the sensing region. | 05-28-2015 |
20150295003 | METHOD OF SIMULTANEOUSLY MANUFACTURING PARTIALLY SHIELDED PIXELS - A method of simultaneously manufacturing First and second pixels respectively shielded on a first and on a second side are simultaneously manufactured using a process wherein a first insulator is deposited on an active area. A first metal level is deposited and defined, with a first mask, to form a shield on the first side of the first pixel and on the second side of the second pixel, and a line opposite to the shield. A second insulator is deposited, and via openings therein are defined, with a second mask. An overlying second metal level is deposited and defined, with a third mask, to form two connection areas covering the via openings on each side of the first and second pixels. The second and third masks are identical for the first and second pixels. | 10-15-2015 |
20150325614 | METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE AND SOLID-STATE IMAGING DEVICE - According to one embodiment, a method of manufacturing a solid-state imaging device includes a trench forming process, a concave portion forming process, a coating process, and a burying process. In the trench forming process, a trench is formed at the position to isolate a plurality of photoelectric conversion elements. In the concave portion forming process, a concave portion is formed at the position to form a light shielding film of shielding at least part of subject light incident on an adjustment photoelectric conversion element used for an image quality adjustment of an imaged image. In the coating process, inner circumferential surfaces of the trench and the concave portion are coated with an insulating film. In the burying process, a light shielding member is buried inside the trench and the concave portion whose inner circumferential surface are coated with the insulating film. | 11-12-2015 |
20150348914 | SEMICONDUCTOR SUBSTRATE, IMAGE PICKUP ELEMENT, AND IMAGE PICKUP APPARATUS - A semiconductor substrate includes: an alignment mark being formed of a material that reflects a detection light for detecting positions and having a detection edge portion; a light-shielding layer portion having a larger outer shape than the alignment mark, being formed of a material that shields the detection light, and being disposed at a position on a backside of the alignment mark when seen from an incidence side of the detection light; and one or more light-transmitting layer portions being laminated between the alignment mark and the light-shielding layer portion so as to transmit the detection light and not being patterned at least in a range that overlaps the light-shielding layer portion. | 12-03-2015 |
20160005782 | SOLID STATE IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME - A method of manufacturing a solid state image sensor is provided. The method includes forming electrically conductive layer and an interlayer insulation film above a first region and a second region, performing an annealing process after forming the conductive layer and the interlayer insulation film, and forming a protective film above the interlayer insulation film and the electrically conductive layer. The electrically conductive layer includes a light shielding layer arranged above the second region. The interlayer insulation film includes a first portion located above the first region and a second portion located above the second region and below the light shielding layer. Before performing the annealing process, an average hydrogen concentration of the second portion is higher than an average hydrogen concentration of the first portion. | 01-07-2016 |
20160020339 | LIGHT RECEIVING ELEMENT - A light receiving element includes a substrate of a first conduction type, a light absorbing layer of the first conduction type formed on the substrate, a diffusion layer of a second conduction type formed on a portion of the light absorbing layer, a window layer of the first conduction type formed on the light absorbing layer so as to surround the diffusion layer and having a bandgap larger than that of the light absorbing layer, an anode electrode formed on the diffusion layer, and a cathode electrode provided on the substrate so as to contact the substrate without contacting each of the window layer and the light absorbing layer, wherein a groove is formed which surrounds a boundary between the diffusion layer and the window layer as viewed in plan and extends through the window layer and the light absorbing layer as viewed in section. | 01-21-2016 |
20160035928 | PHOTODIODE - According to one embodiment, a photodiode includes a first semiconductor layer of a first conductivity type, a second semiconductor layer of a second conductivity type, a third semiconductor layer of the first conductivity type, and a film. The second semiconductor layer is provided in the first semiconductor layer. The third semiconductor layer is provided in the first semiconductor layer so as to surround the second semiconductor layer. Each of one ends of the second and third semiconductor layers is located at an upper surface of the first semiconductor layer. The first to third semiconductor layers include first to third impurity concentrations respectively. The second and third impurity concentrations are higher than the first impurity concentration. The film is provided above the third semiconductor layer, and blocks light to enter into a neighborhood of the third semiconductor layer. | 02-04-2016 |
20160064579 | SPAD DEVICE WITH RADIATION BLOCKING RINGS AND VIAS AND RELATED ARRAYS AND METHODS - A Single-Photon Avalanche Diode (SPAD) device an active region configured to detect incident radiation, a first radiation blocking ring surrounding the active region, and a radiation blocking cover configured to shield part of the active region from the incident radiation. The radiation blocking cover is configured to define a second radiation blocking ring vertically spaced apart from the first radiation blocking ring. The SPAD device may include radiation blocking vias extending between the first and second radiation blocking rings. | 03-03-2016 |
20160086992 | SOLID-STATE IMAGE PICKUP DEVICE, IMAGE PICKUP SYSTEM USING SOLID-STATE IMAGE PICKUP DEVICE, AND METHOD OF MANUFACTURING SOLID-STATE IMAGE PICKUP DEVICE - In a solid-state image pickup device including a pixel that includes a photoelectric conversion portion, a carrier holding portion, and a plurality of transistors, the solid-state image pickup device further includes a first insulating film disposed over the photoelectric conversion portion, the carrier holding portion, and the plurality of transistors, a conductor disposed in an opening of the first insulating film and positioned to be connected to a source or a drain of one or more of the plurality of transistors, and a light shielding film disposed in an opening or a recess of the first insulating film and positioned above the carrier holding portion. | 03-24-2016 |
20160099272 | STACKED FILTER AND IMAGE SENSOR CONTAINING THE SAME - A stacked filter for an image sensor including an infrared (IR) pixel is provided. The stacked filter includes a first filter layer disposed at the IR pixel. The first filter layer allows light with wavelengths of a first band to be transmitted through. The stacked filter further includes a second filter layer stacked with the first filter layer. The second filter layer allows light with wavelengths of a second band to be transmitted through. The first band partially overlaps the second band at wavelengths of a third band. The third band is narrower than the first band and the second band. The stacked filter allows light with the wavelengths of the third band to be transmitted through. Furthermore, an image sensor containing a stacked filter is also provided. | 04-07-2016 |
20160126276 | SOLID-STATE IMAGING ELEMENT, METHOD OF MANUFACTURING THE SAME, AND IMAGING DEVICE - In pixels that are two-dimensionally arranged in a matrix fashion in the pixel array unit of a solid-state imaging element, a photoelectric conversion film having a light shielding film buried therein is formed and stacked on the light incident side of the photodiode. The present technique can be applied to a CMOS image sensor compatible with the global shutter system, for example. | 05-05-2016 |
20160155766 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | 06-02-2016 |
20160190191 | CMOS IMAGE SENSOR STRUCTURE WITH CROSSTALK IMPROVEMENT - A semiconductor device includes a substrate, a semiconductor layer, light-sensing devices, a transparent dielectric layer and a grid shielding layer. The semiconductor layer overlies the substrate, and has a first surface and a second surface opposite to the first surface. The semiconductor layer includes microstructures disposed on the second surface of the semiconductor layer. The light-sensing devices are disposed on the first surface of the semiconductor layer. The transparent dielectric layer is disposed on the second surface of the semiconductor layer, and covers the microstructures. The grid shielding layer extends from the first surface of the semiconductor layer toward the second surface of the semiconductor layer, and surrounds each of the light-sensing devices to separate the light-sensing devices from each other, in which a depth of the grid shielding layer is greater than two-thirds of a thickness of the semiconductor layer. | 06-30-2016 |
20160190198 | IMAGE SENSOR - An image sensor includes a pixel array chip, a logic chip, and an interposed layer. The interposed layer is disposed on the pixel array chip. The logic chip is disposed on the interposed layer. The interposed layer includes a connecting part, a shielding part, and a metal-diffusion barrier layer. The connecting part electrically connects a first interconnection wire of the pixel array chip and a second interconnection wire of the logic chip. The connecting part includes a first metallic element. The shielding part is disposed spatially apart from the connecting part and electrically grounded to suppress an electrical coupling between the pixel array chip and the logic chip. The shielding part includes a second metallic element. The metal-diffusion barrier layer is disposed on top and bottom surfaces of the interposed layer to limit diffusion of electrical charges to the pixel array chip and the logic chip. | 06-30-2016 |
20160254300 | SENSOR FOR DUAL-APERTURE CAMERA | 09-01-2016 |
20160254310 | PHOTODETECTOR, METHOD OF MANUFACTURING PHOTODETECTOR, RADIATION DETECTOR, AND RADIATION DETECTION APPARATUS | 09-01-2016 |
20190148432 | IMAGE SENSOR AND METHOD FOR FABRICATING THE SAME | 05-16-2019 |
20190148567 | S/N RATIO IMPROVED PHOTO-DETECTION DEVICE AND ITS MANUFACTURING METHOD | 05-16-2019 |