Entries |
Document | Title | Date |
20080211035 | Semiconductor memory device and method of manufacturing the same - A contact connected to a word line is formed on a gate electrode of an access transistor of an SRAM cell. The contact passes through an element isolation insulating film to reach an SOI layer. A body region of a driver transistor and that of the access transistor are electrically connected with each other through the SOI layer located under the element isolation insulating film. Therefore, the access transistor is in a DTMOS structure having the gate electrode connected with the body region through the contact, which in turn is also electrically connected to the body region of the driver transistor. Thus, operations can be stabilized while suppressing increase of an area for forming the SRAM cell. | 09-04-2008 |
20080211036 | Bipolar Resistive Memory Device Having Tunneling Layer - A nonvolatile memory device includes a semiconductor substrate, a first electrode on the semiconductor substrate, a resistive layer on the first electrode, a second electrode on the resistive layer and at least one tunneling layer interposed between the resistive layer and the first electrode and/or the second electrode. The resistive layer and the tunneling layer may support transition between first and second resistance states responsive to first and second voltages applied across the first and second electrodes. The first and second voltages may have opposite polarities. | 09-04-2008 |
20080224228 | CAPACITOR TOP PLATE OVER SOURCE/DRAIN TO FORM A 1T MEMORY DEVICE - A method and structure for a memory device, such as a 1T-SRAM, having a capacitor top plate directly over a doped bottom plate region. An example device comprises the following. An isolation film formed as to surround an active area on a substrate. A gate dielectric and gate electrode formed over a portion of the active area. A source element and a drain element in the substrate adjacent to the gate electrode. The drain element is comprised of a drain region and a bottom plate region. The drain region is between the bottom plate region and the gate structure. A capacitor dielectric and a capacitor top plate are over at least portions of the bottom plate region. | 09-18-2008 |
20080224229 | Semiconductor device and manufacturing method thereof - An object is to provide an antifuse with little power consumption at the time of writing. The antifuse is used for a memory element in a read-only memory device. The antifuse includes a first conductive layer, a multilayer film of two or more layers in which an amorphous silicon film and an insulating film are alternately stacked over the first conductive layer, and a second conductive layer over the multilayer film. Voltage is applied between the first and second conductive layers and resistance of the multilayer film is decreased, whereby data is written to the memory element. When an insulating film having higher resistance than amorphous silicon is formed between the first and second conductive layers, current flowing through the antifuse at the time of writing is reduced. | 09-18-2008 |
20080237736 | SEMICONDUCTOR DEVICE - A technique capable of promoting miniaturization of an RF power module used in a mobile phone etc. is provided. A directional coupler is formed inside a semiconductor chip in which an amplification part of the RF power module is formed. A sub-line of the directional coupler is formed in the same layer as a drain wire coupled to the drain region of an LDMOSFET, which will serve as the amplification part of the semiconductor chip. Due to this, the predetermined drain wire is used as a main line and the directional coupler is configured by a sub-line arranged in parallel to the main line via an insulating film, together with the main line. | 10-02-2008 |
20080258232 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING THE SAME - A semiconductor device includes a substrate, an insulating film disposed on the substrate, a resistor groove disposed in the insulating film, and a resistor disposed in the resistor groove. The resistor is separated from all side surfaces of the resistor groove by a predetermined distance. | 10-23-2008 |
20080283931 | OTP memory cell, OTP memory, and method of manufacturing OTP memory cell - An OTP memory cell according to the present invention includes: a semiconductor substrate including a lower electrode forming region having a lower electrode formed therein, a diffusion layer forming region having a source and a drain formed therein, a first trench-type insulating region, and a second trench-type insulating region; an upper electrode being in contact with the first trench-type insulating region and formed on the lower electrode with the first insulating film interposed therebetween; and a gate electrode being in contact with the second trench-type insulating region and formed on a channel region with the second insulating film interposed therebetween, in which a shape of at least a part of an end of the lower electrode forming region in contact with the first insulating film is sharper than a shape of an end of the channel region in contact with the second insulating film. | 11-20-2008 |
20080296697 | Programmable semiconductor interposer for electronic package and method of forming - Various structures of a programmable semiconductor interposer for electronic packaging are described. An array of semiconductor devices having various values is formed in said interposer. A user can program said interposer and form a “virtual” device having a desired value by selectively connecting various one of the array of devices to contact pads formed on the surface of said interposer. An inventive electronic package structure includes a standard interposer having an array of unconnected devices of various values and a device selection unit, which selectively connects various one of the array of devices in said standard interposer to an integrated circuit die encapsulated in said electronic package. Methods of forming said programmable semiconductor interposer and said electronic package are also illustrated. | 12-04-2008 |
20080315320 | Semiconductor Device with both I/O and Core Components and Method of Fabricating Same - A semiconductor device having a core device with a high-k gate dielectric and an I/O device with a silicon dioxide or other non-high-k gate dielectric, and a method of fabricating such a device. A core well and an I/O well are created in a semiconductor substrate and separated by an isolation structure. An I/O device is formed over the I/O well and has a silicon dioxide or a low-k gate dielectric. A resistor may be formed on an isolation structure adjacent to the core well. A core-well device such as a transistor is formed over the core well, and has a high-k gate dielectric. In some embodiments, a p-type I/O well and an n-type I/O well are created. In a preferred embodiment, the I/O device or devices are formed prior to forming the core device and protected with a sacrificial layer until the core device is fabricated. | 12-25-2008 |
20090020828 | SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD - A first MIS transistor includes a first source/drain region formed outside a first sidewall spacer in a first active region, a first silicide film formed on the first source/drain region, and a stressor insulating film formed on a first gate electrode, the first sidewall spacer, and the first silicide film. A second MIS transistor includes a second source/drain region formed outside a second sidewall spacer in a second active region, a first protection film formed, extending over a second gate electrode, the second sidewall spacer, and a portion of the second source/drain region, and including a first protection insulating film and a second protection insulating film, a second silicide film formed outside the first protection film on the second source/drain region, and the stressor insulating film formed on the first protection film and the second silicide film. | 01-22-2009 |
20090079009 | MEMORY DEVICE, MEMORY CIRCUIT AND SEMICONDUCTOR INTEGRATED CIRCUIT HAVING VARIABLE RESISTANCE - A first variable resistor ( | 03-26-2009 |
20090090977 | RESISTOR AND FET FORMED FROM THE METAL PORTION OF A MOSFET METAL GATE STACK - An integrated semiconductor device includes a resistor and an FET device formed from a stack of layers. The stack of layers includes a dielectric layer formed on a substrate; a metal conductor layer having lower electrical resistance formed on the dielectric layer; and a polysilicon layer formed on the metal conductor layer. A resistor stack is formed by patterning a portion of the original stack of layers into a resistor. An FET stack is formed from another portion of the original stack of layers. The FET stack is doped to form a gate electrode and the resistor stack is doped aside from the resistor portion thereof. Then terminals are formed at distal ends of the resistor in a doped portion of the polysilicon layer. Alternatively, the polysilicon layer is etched away from the resistor stack followed by forming terminals at distal ends of the metal conductor in the resistor stack. | 04-09-2009 |
20090101989 | METAL GATE COMPATIBLE ELECTRICAL FUSE - A dielectric material layer is formed on a metal gate layer for a metal gate electrode, and then lithographically patterned to form a dielectric material portion, followed by formation of a polycrystalline semiconductor layer thereupon. A semiconductor device employing a metal gate electrode is formed in a region of the semiconductor substrate containing a vertically abutting stack of the metal gate layer and the polycrystalline semiconductor layer. A material stack in the shape of an electrical fuse is formed in another region of the semiconductor substrate containing a vertical stack of the metal gate layer, the dielectric material portion, and the polycrystalline semiconductor layer. After metallization of the polycrystalline semiconductor layer, an electrical fuse containing a polycrystalline semiconductor portion and a metal semiconductor alloy portion is formed over the dielectric material portion that separates the electrical fuse from the metal gate layer. | 04-23-2009 |
20090101990 | Simiconductor integrated circuit device and method of manufacturing the same - A semiconductor integrated circuit device includes a first dopant region in a semiconductor substrate, an isolation region on the semiconductor substrate, the isolation region surrounding the first dopant region, a gate wire surrounding at least a portion of the isolation region, and a plurality of second dopant regions arranged along at least a portion of the gate wire, the plurality of second dopant regions being spaced apart from each other, and the portion of the gate wire being between the first dopant region and a respective second dopant region. | 04-23-2009 |
20090108371 | SEMICONDUCTOR DEVICE AND MANUFACTURING THE SAME - A semiconductor device including a MISFET formed in a well at a main surface of a substrate, a second MISFET formed at a main surface of the substrate, and a passive element formed over the main surface of the substrate and having two terminals. A conductive film is formed at a rear face of the semiconductor substrate. The conductive film is connected with a fixed potential and also electrically connected with the conductive film. | 04-30-2009 |
20090152644 | SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A technology is provided where a high performance Schottky-barrier diode and other semiconductor elements can be formed in the same chip controlling the increase in the number of steps. After a silicon oxide film is deposited over a substrate where an n-channel type MISFET is formed and the silicon oxide film over a gate electrode and n | 06-18-2009 |
20090189226 | ELECTRICAL FUSE CIRCUIT - An electrical fuse circuit includes, in addition to an independent power supply switch circuit, a plurality of fuse bit cells, each including a fuse element one end of which is connected to an output of the power supply switch circuit, and a first MOS transistor connected to the other end of the fuse element, wherein a diode is connected between the ground potential and the power supply switch circuit as an ESD countermeasure. The gate oxide film thickness of transistors of the fuse bit cells is equal to that of a low-voltage logic-type transistor, not that of a high-voltage I/O-type transistor. | 07-30-2009 |
20090206419 | Monolithically integrated semiconductor assembly having a power component and method for producing a monolithically intergrated semiconductor assembly - A monolithically integrated semiconductor assembly having a power component, and a method for manufacturing a semiconductor assembly, are proposed, a monolithically integrated resistor element being provided between a first terminal and the second region, and a comparatively low-impedance electrical connection through the first region being provided between the resistor element and the second region. | 08-20-2009 |
20090212374 | SPACE EFFICIENT INTEGRATRED CIRCUIT WITH PASSIVE DEVICES - A multimodal integrated circuit (IC) is provided, comprising, first ( | 08-27-2009 |
20090242997 | METHOD FOR FABRICATING SEMICONDUCTOR STRUCTURE AND STRUCTURE OF STATIC RANDOM ACCESS MEMORY - A method for fabricating a semiconductor structure is disclosed. A substrate with a first transistor having a first dummy gate and a second transistor having a second dummy gate is provided. The conductive types of the first transistor and the second transistor are different. The first and second dummy gates are simultaneously removed to form respective first and second openings. A high-k dielectric layer, a second type conductive layer and a first low resistance conductive layer are formed on the substrate and fill in the first and second openings, with the first low resistance conductive layer filling up the second opening. The first low resistance conductive layer and the second type conductive layer in the first opening are removed. A first type conductive layer and a second low resistance conductive layer are then formed in the first opening, with the second low resistance conductive layer filling up the first opening. | 10-01-2009 |
20090256210 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD OF THE SEMICONDUCTOR DEVICE - A semiconductor device, which can prevent an element breakdown by alleviating of electric field concentrations, and can also prevent reduction of gain is provided. | 10-15-2009 |
20090283840 | METAL GATE INTEGRATION STRUCTURE AND METHOD INCLUDING METAL FUSE, ANTI-FUSE AND/OR RESISTOR - A semiconductor structure and a method for fabricating the semiconductor structure provide a field effect device located and formed upon an active region of a semiconductor substrate and at least one of a fuse structure, an anti-fuse structure and a resistor structure located and formed at least in part simultaneously upon an isolation region laterally separated from the active region within the semiconductor substrate. The field effect device includes a gate dielectric comprising a high dielectric constant dielectric material and a gate electrode comprising a metal material. The at least one of the fuse structure, anti-fuse structure and resistor structure includes a pad dielectric comprising the same material as the gate dielectric, and optionally, also a fuse, anti-fuse or resistor that may comprise the same metal material as the gate electrode. | 11-19-2009 |
20090302397 | Field-Effect Transistor - A field-effect transistor, having a source electrode, a drain electrode and a gate electrode, which has a connection between the gate electrode and the source electrode or between the gate electrode and the drain electrode or between the gate electrode and the substrate which carries a leakage current. | 12-10-2009 |
20100013026 | INTEGRATED CIRCUITS COMPRISING RESISTORS HAVING DIFFERENT SHEET RESISTANCES AND METHODS OF FABRICATING THE SAME - The fabrication of integrated circuits comprising resistors having the same structure but different sheet resistances is disclosed herein. In one embodiment, a method of fabricating an integrated circuit comprises: concurrently forming a first resistor laterally spaced from a second resistor above or within a semiconductor substrate, the first and second resistors comprising a doped semiconductive material; depositing a dopant receiving material across the first and second resistors and the semiconductor substrate; removing the dopant receiving material from upon the first resistor while retaining the dopant receiving material upon the second resistor; and annealing the first and second resistors to cause a first sheet resistance of the first resistor to be different from a second sheet resistance of the second resistor. | 01-21-2010 |
20100025772 | SEMICONDUCTOR DEVICE COMPRISING A SILICON/GERMANIUM RESISTOR - In integrated circuits, resistors may be formed on the basis of a silicon/germanium material, thereby providing a reduced specific resistance which may allow reduced dimensions of the resistor elements. Furthermore, a reduced dopant concentration may be used which may allow an increased process window for adjusting resistance values while also reducing overall cycle times. | 02-04-2010 |
20100032770 | IC RESISTOR FORMED WITH INTEGRAL HEATSINKING STRUCTURE - A resistor is formed on field oxide with a portion of the resistor body configured to overlap an active region in an integrated circuit (IC) substrate to provide heatsinking for the resistor body. In one embodiment, cooling fingers extend from the resistor body beyond the field oxide to overlap the active region. In another embodiment, minor areas of the resistor body overlap the active region. The resistor body may be formed of polycrystalline silicon (polysilicon), silicided polysilicon, or metal. An oxide having greater thermal conductance than the field oxide is formed between the overlapping parts of the resistor body and the active region. | 02-11-2010 |
20100072558 | METHOD FOR MANUFACTURING HIGH-STABILITY RESISTORS, SUCH AS HIGH OHMIC POLY RESISTORS, INTEGRATED ON A SEMICONDUCTOR SUBSTRATE - A method for protecting a circuit component on a semiconductor substrate from a plasma etching or other removal process includes forming a screening layer over an auxiliary layer to conceal at least an area of the auxiliary layer that overlays at least a portion of the circuit component, such as for example a high-ohmic poly resistor. The method transfers a pattern defined by a mask onto the screening layer by selectively removing portions of the screening layer in accordance with the pattern. Portions of the auxiliary layer that are not protected by the screening layer are removed using a plasma gas selective to the auxiliary layer material, without removing the area of the auxiliary layer that overlays the portion of the circuit component, thereby protecting the circuit component from the plasma gas via the screening layer and auxiliary layer. | 03-25-2010 |
20100078732 | SEMICONDUCTOR DEVICE - A high frequency/high output semiconductor device, which is excellent in heat resistance and by which an uneven operation is suppressed, is provided. A semiconductor device, include a semiconductor substrate, a plurality of unit cells connected in parallel with each other, each of the unit cells include a plurality of electric field effect transistors formed on the semiconductor substrate, a plurality of gate bus wiring each configured to connect each of the gate electrodes of the transistors constituting the unit cell, a plurality of gate pad electrodes having multi-layered structure of conductive layers, each of the gate pad electrodes connected to the gate bus wiring, and a resistive element configured to connect the adjacent gate pad electrodes having formed along at least one side of outer peripheral portion of the gate pad electrode, and formed of at least one conductive layer of the conductive layers constituting the gate pad electrode. | 04-01-2010 |
20100109092 | MONOLITHICALLY INTEGRATED CIRCUIT - A monolithically integrated circuit, particularly an integrated circuit for radio frequency power applications, may include a transistor and a spiral inductor. The spiral inductor is arranged above the transistor. An electromagnetic coupling is created between the transistor and the inductor. The transistor may have a finger type layout to prevent any significant eddy currents caused by the electromagnetic coupling from occurring. The chip area needed for the circuit may be reduced by such arrangement. | 05-06-2010 |
20100109093 | Semiconductor memory devices and methods of fabricating the same - Semiconductor memory devices and methods of fabricating the semiconductor memory devices are provided, the semiconductor memory devices may include a one-time-programmable (OTP) cell and an electrically erasable programmable read-only memory (EEPROM). The OTP cell includes a memory transistor and a program transistor. The program transistor may include a fuse electrode and may be spaced apart from the memory transistor. The EEPROM cell includes a memory transistor including a first gate and a selection transistor including a second gate. The OTP cell includes a first high-density impurity region which overlaps with the fuse electrode. | 05-06-2010 |
20100117160 | POLARITY DEPENDENT SWITCH FOR RESISTIVE SENSE MEMORY - Polarity dependent switches for resistive sense memory are described. A memory unit includes a resistive sense memory cell configured to switch between a high resistance state and a low resistance state upon passing a current through the resistive sense memory cell and a semiconductor transistor in electrical connection with the resistive sense memory cell. The semiconductor transistor includes a gate element formed on a substrate. The semiconductor transistor includes a source contact and a bit contact. The gate element electrically connects the source contact and the bit contact. The resistive sense memory cell electrically connects to the bit contact. The source contact and the bit contact are asymmetrically implanted with dopant material. | 05-13-2010 |
20100117161 | SEMICONDUCTOR DEVICE THAT DEGRADES LEAK CURRENT OF A TRANSISTOR - A semiconductor device, has a main transistor that is a first-conductivity-type MOS transistor and has the drain connected to a first potential; a first switch circuit that is connected between the source of said main transistor and a second potential; a dummy transistor that is a first-conductivity-type MOS transistor whose source serves also as the source of said main transistor; and a second switch circuit that is connected between the drain of said dummy transistor and said first potential or said second potential. | 05-13-2010 |
20100123199 | Semiconductor device - Provided is a semiconductor device including: a semiconductor substrate; a multi-layered wiring structure which is formed over the semiconductor substrate and in which a plurality of wiring layers, each of which is formed by a wiring and an insulating layer, are laminated; and a capacitive element having a lower electrode, a capacitor insulating layer, and an upper electrode which is embedded in the multi-layered wiring structure, wherein at least two or more of the wiring layers are provided between a lower capacitor wiring connected to the lower electrode and an upper capacitor wiring connected to the upper electrode. | 05-20-2010 |
20100133626 | SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A method of fabricating a semiconductor device according to one embodiment includes: laying out a first region, a second region, a third region and a fourth region on a semiconductor substrate by forming an element isolation region in the semiconductor substrate; forming a first insulating film on the first region and the second region; forming a first semiconductor film on the first insulating film; forming a second insulating film and an aluminum oxide film thereon on the fourth region after forming of the first semiconductor film; forming a third insulating film and a lanthanum oxide film thereon on the third region after forming of the first semiconductor film; forming a high dielectric constant film on the aluminum oxide film and the lanthanum oxide film; forming a metal film on the high dielectric constant film; forming a second semiconductor film on the first semiconductor film and the metal film; and patterning the first insulating film, the first semiconductor film, the second insulating film, the aluminum oxide film, the third insulating film, the lanthanum oxide film, the high dielectric constant film, the metal film and the second semiconductor film. | 06-03-2010 |
20100140719 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a substrate which includes an element region and an isolation region, a transistor portion which includes a gate insulating film formed on the element region, and a gate electrode having a metal film formed on the gate insulating film and a first semiconductor film formed on the metal film, and a resistance element portion which includes a second semiconductor film formed above the substrate and formed of the same material as that of the first semiconductor film, and a cavity formed between the substrate and the second semiconductor film. | 06-10-2010 |
20100148277 | ISOLATED METAL PLUG PROCESS FOR USE IN FABRICATING CARBON NANOTUBE MEMORY CELLS - The present invention is directed to structures and methods of fabricating electromechanical memory cells having nanotube crossbar elements. Such memory cells include a substrate having transistor with a contact that electrically contacts with the transistor. A first support layer is formed over the substrate with an opening that defines a lower chamber above the electrical contact. A nanotube crossbar element is arranged to span the lower chamber. A second support layer is formed with an opening that defines a top chamber above the lower chamber, the top chamber including an extension region that extends beyond an edge of the lower chamber to expose a portion of the top surface of the first support layer. A roof layer covers the top of the top chamber and includes an aperture that exposes a portion of the extension region of the top chamber and includes a plug that extends into the aperture in the roof layer to seal the top and bottom chambers. The memory cell further includes an electrode that overlies the crossbar element such that electrical signals can activate the electrode to attract or repel the crossbar element to set a memory state for the transistor. | 06-17-2010 |
20100176458 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A gate insulating film is formed on a main surface of a substrate in which an element isolation region is formed. A metal film is formed on the gate insulating film. A silicon film is formed on the metal film. A gate electrode of a MIS transistor composed of a stacked structure of the silicon film and metal film is formed on an element region and a high-resistance element composed of a stacked structure of the silicon film and metal film is formed on the element isolation region by patterning the silicon film and metal film. An acid-resistant insulating film is formed on the side of the gate electrode. The metal film of the high-resistance element is oxidized. A diffused layer of the MIS transistor is formed in the substrate. | 07-15-2010 |
20100181627 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A semiconductor device and method for manufacturing. One embodiment provides a semiconductor device including an active cell region and a gate pad region. A conductive gate layer is arranged in the active cell region and a conductive resistor layer is arranged in the gate pad region. The resistor layer includes a resistor region which includes a grid-like pattern of openings formed in the resistor layer. A gate pad metallization is arranged at least partially above the resistor layer and in electrical contact with the resistor layer. An electrical connection is formed between the gate layer and the gate pad metallization, wherein the electrical connection includes the resistor region. | 07-22-2010 |
20100187638 | ANTI-FUSE CELL AND ITS MANUFACTURING PROCESS - An anti-fuse cell includes a standard MOS transistor of an integrated circuit, with source ( | 07-29-2010 |
20100213550 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE - The memory cell is located at respective intersections between the first wirings and the second wirings. Each of the memory cells has a rectifier element and a variable resistance element connected in series. The rectifier element includes a p type first semiconductor region, and a n type second semiconductor region. The first semiconductor region is formed of, at least in part, silicon-germanium mixture (Si | 08-26-2010 |
20100213551 | E-Fuse and Associated Control Circuit - An e-fuse and an e-fuse control circuit are provided. The e-fuse includes a polysilicon layer and a metal silicide layer stacked on the polysilicon layer. The e-fuse operates in an open state when the silicide layer is broken by burning while one portion of the polysilicon layer is exposed. | 08-26-2010 |
20100237434 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SUCH A DEVICE - The invention relates to a semiconductor device ( | 09-23-2010 |
20100244144 | ELECTRICAL FUSE AND RELATED APPLICATIONS - In various embodiments, the fuse is formed from silicide and on top of a fin of a fin structure. Because the fuse is formed on top of a fin, its width takes the width of the fin, which is very thin. Depending on implementations, the fuse is also formed using planar technology and includes a thin width. Because the width of the fuse is relatively thin, a predetermined current can reliably cause the fuse to be opened. Further, the fuse can be used with a transistor to form a memory cell used in memory arrays, and the transistor utilizes FinFET technology. | 09-30-2010 |
20100252894 | Memory devices having diodes and methods of fabricating the same - A non-volatile memory devices includes: a substrate including a circuit device and a metal line electrically connected with the circuit device; a diode connected with the metal line in a vertical direction with respect to a surface of the substrate, and including a metal layer disposed on a lower part of the diode facing the surface of the substrate; and a resistor electrically connected with the diode in series. | 10-07-2010 |
20100252895 | APPARATUS OF MEMORY ARRAY USING FINFETS - A memory cell includes a FinFET select device and a memory element. In some embodiments a memory cell has a contact element coupled between a surface of the fin and the memory element. | 10-07-2010 |
20100295132 | PROGRAMMABLE PN ANTI-FUSE - Structure and method for providing a programmable anti-fuse in a FET structure. A method of forming the programmable anti-fuse includes: providing a p− substrate with an n+ gate stack; implanting an n+ source region and an n+ drain region in the p− substrate; forming a resist mask over the n+ drain region, while leaving the n+ source region exposed; etching the n+ source region to form a recess in the n+ source region; and growing a p+ epitaxial silicon germanium layer in the recess in the n+ source region to form a pn junction that acts as a programmable diode or anti-fuse. | 11-25-2010 |
20100301423 | SEMICONDUCTOR DEVICES WITH IMPROVED LOCAL MATCHING AND END RESISTANCE OF RX BASED RESISTORS - Semiconductor devices are formed with reduced variability between close proximity resistors, improved end resistances, and reduced random dopant mismatch. Embodiments include ion implanting a dopant, such as B, at a relatively high dosage, e.g. about 4 to about 6 keV, and at a relatively low implant energy, e.g., about 1.5 to about 2E15/cm | 12-02-2010 |
20100320543 | SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD - A semiconductor device manufacturing method includes, forming isolation region having an aspect ratio of 1 or more in a semiconductor substrate, forming a gate insulating film, forming a silicon gate electrode and a silicon resistive element, forming side wall spacers on the gate electrode, heavily doping a first active region with phosphorus and a second active region and the resistive element with p-type impurities by ion implantation, forming salicide block at 500° C. or lower, depositing a metal layer covering the salicide block, and selectively forming metal silicide layers. The method may further includes, forming a thick and a thin gate insulating films, and performing implantation of ions of a first conductivity type not penetrating the thick gate insulating film and oblique implantation of ions of the opposite conductivity type penetrating also the thick gate insulating film before the formation of side wall spacers. | 12-23-2010 |
20110006377 | Patterning Embedded Control Lines for Vertically Stacked Semiconductor Elements - Various embodiments of the present invention are generally directed to an apparatus with embedded (bottom side) control lines for vertically stacked semiconductor elements, and a method for forming the same. In accordance with various embodiments, a first semiconductor wafer is provided with a first facing surface on which a first conductive layer is formed. The first semiconductor wafer is attached to a second semiconductor wafer to form a multi-wafer structure, the second semiconductor wafer having a second facing surface on which a second conductive wafer is formed. The first conductive layer is contactingly bonded to the second conductive layer to form an embedded combined conductive layer within said structure. Portions of the combined conductive layer are removed to form a plurality of spaced apart control lines that extend in a selected length or width dimension through said structure. | 01-13-2011 |
20110031558 | GATE STRUCTURE OF SEMICONDUCTOR DEVICE - A gate structure of a semiconductor device includes a first low resistance conductive layer, a second low resistance conductive layer, and a first type conductive layer disposed between and directly contacting sidewalls of the first low resistance conductive layer and the second low resistance conductive layer. | 02-10-2011 |
20110037128 | METHOD AND STRUCTURE FOR IMPROVING UNIFORMITY OF PASSIVE DEVICES IN METAL GATE TECHNOLOGY - Method of forming a semiconductor device which includes the steps of obtaining a semiconductor substrate having a logic region and an STI region; sequentially depositing layers of high K material, metal gate, first silicon and hardmask; removing the hardmask and first silicon layers from the logic region; applying a second layer of silicon on the semiconductor substrate such that the logic region has layers of high K material, metal gate and second silicon and the STI region has layers of high K material, metal gate, first silicon, hardmask and second silicon. There may also be a second hardmask layer between the metal gate layer and the first silicon layer in the STI region. There may also be a hardmask layer between the metal gate layer and the first silicon layer in the STI region but no hardmask layer between the first and second layers of silicon in the STI region. | 02-17-2011 |
20110062529 | SEMICONDUCTOR MEMORY DEVICE - In a static memory cell configured using four MOS transistors and two load resistance elements, the MOS transistors are formed on diffusion layers formed on a substrate. The diffusion layers serve as memory nodes. The drain, gate and source of the MOS transistors are arranged in the direction orthogonal to the substrate, and the gate surrounds a columnar semiconductor layer. In addition, the load resistance elements are formed by contact plugs. In this way, it is possible to form a SRAM cell with a small area. | 03-17-2011 |
20110068409 | RESISTIVE MEMORY DEVICES INCLUDING VERTICAL TRANSISTOR ARRAYS AND RELATED FABRICATION METHODS - A resistive memory device includes a vertical transistor and a variable resistance layer. The vertical transistor includes a gate electrode on a surface of a substrate, a gate insulation layer extending along a sidewall of the gate electrode, and a single crystalline silicon layer on the surface of the substrate adjacent to the gate insulation layer. At least a portion of the single crystalline silicon layer defines a channel region that extends in a direction substantially perpendicular to the surface of the substrate. The variable resistance layer is provided on the single crystalline silicon layer. The variable resistance layer is electrically insulated from the gate electrode. Related devices and fabrication methods are also discussed. | 03-24-2011 |
20110068410 | SILICON DIE FLOORPLAN WITH APPLICATION TO HIGH-VOLTAGE FIELD EFFECT TRANSISTORS - A floorplan for a die having three high-voltage transistors for power applications is described. The three high-voltage transistors are specifically placed in relation to each other to optimize operation. | 03-24-2011 |
20110073956 | FORMING SEMICONDUCTOR RESISTORS IN A SEMICONDUCTOR DEVICE COMPRISING METAL GATES BY INCREASING ETCH RESISTIVITY OF THE RESISTORS - In a replacement gate approach, the polysilicon material may be efficiently removed during a wet chemical etch process, while the semiconductor material in the resistive structures may be substantially preserved. For this purpose, a species such as xenon may be incorporated into the semiconductor material of the resistive structure, thereby imparting a significantly increased etch resistivity to the semiconductor material. The xenon may be incorporated at any appropriate manufacturing stage. | 03-31-2011 |
20110108926 | Gated anti-fuse in CMOS process - In a gated anti-fuse, an anode is separated from a cathode by an oxide layer and the anode or cathode voltage is controlled by the control gate of a transistor like structure connected to the anode or cathode. | 05-12-2011 |
20110147853 | Method of Forming an Electrical Fuse and a Metal Gate Transistor and the Related Electrical Fuse - The present invention provides a method of integrating an electrical fuse process into a high-k/metal gate process. The method simultaneously forms a dummy gate stack of a transistor and a dummy gate stack of an e-fuse; and simultaneously removes the polysilicon of the dummy gate stack in the transistor region and the polysilicon of the dummy gate stack in the e-fuse region. Thereafter, the work function metal layer disposed in the opening of the e-fuse region is removed; and the opening in the transistor region and the opening in the e-fuse region with metal conductive structures are filled to form an e-fuse and a metal gate of a transistor. | 06-23-2011 |
20110156161 | SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME - A semiconductor device including a substrate, a first device, a second device and an interlayer dielectric layer is provided. The substrate has a first area and a second area. The first device is disposed in the first area of the substrate and includes a first dielectric layer on the substrate and a metal gate on the first dielectric layer. The second device is in the second area of the substrate and includes a second dielectric layer on the substrate and, a polysilicon layer on the second dielectric layer. It is noted that the height of the polysilicon layer is less than that of the metal gate of the first device. The interlayer dielectric layer covers the second device. | 06-30-2011 |
20110156162 | SEMICONDUCTOR RESISTORS FORMED AT A LOWER HEIGHT LEVEL IN A SEMICONDUCTOR DEVICE COMPRISING METAL GATES - In sophisticated semiconductor devices comprising high-k metal gate electrode structures formed on the basis of a replacement gate approach, semiconductor-based resistors may be provided without contributing to undue process complexity in that the resistor region is recessed prior to depositing the semiconductor material of the gate electrode structure. Due to the difference in height level, a reliable protective dielectric material layer is preserved above the resistor structure upon exposing the semiconductor material of the gate electrode structure and removing the same on the basis of selective etch recipes. Consequently, well-established semiconductor materials, such as polysilicon, may be used for the resistive structures in complex semiconductor devices, substantially without affecting the overall process sequence for forming the sophisticated replacement gate electrode structures. | 06-30-2011 |
20110175174 | Methods of Manufacturing Resistors and Structures Thereof - A semiconductor device includes a semiconductor body of a first semiconductive material. A transistor is disposed in the semiconductor body. The transistor includes source and drain regions of a second semiconductive material embedded in the semiconductor body. A resistor overlies a top surface of the semiconductor body and is laterally spaced from the transistor. The resistor is formed from the second semiconductive material. | 07-21-2011 |
20110198704 | POWER SWITCH WITH ACTIVE SNUBBER - A power switch with active snubber. In accordance with a first embodiment, an electronic circuit includes a first power semiconductor device and a second power semiconductor device coupled to the first power semiconductor device. The second power semiconductor device is configured to oppose ringing of the first power semiconductor device. | 08-18-2011 |
20110227167 | REDUCED SUBSTRATE COUPLING FOR INDUCTORS IN SEMICONDUCTOR DEVICES - The present disclosure provides reduced substrate coupling for inductors in semiconductor devices. A method of fabricating a semiconductor device having reduced substrate coupling includes providing a substrate having a first region and a second region. The method also includes forming a first gate structure over the first region and a second gate structure over the second region, wherein the first and second gate structures each include a dummy gate. The method next includes forming an inter layer dielectric (ILD) over the substrate and forming a photoresist (PR) layer over the second gate structure. Then, the method includes removing the dummy gate from the first gate structure, thereby forming a trench and forming a metal gate in the trench so that a transistor may be formed in the first region, which includes a metal gate, and an inductor component may be formed over the second region, which does not include a metal gate. | 09-22-2011 |
20110241124 | SEMICONDUCTOR DEVICE COMPRISING HIGH-K METAL GATE ELECTRODE STRUCTURES AND eFUSES FORMED IN THE SEMICONDUCTOR MATERIAL - A semiconductor-based electronic fuse may be provided in a sophisticated semiconductor device having a bulk configuration by appropriately embedding the electronic fuse into a semiconductor material of reduced heat conductivity. For example, a silicon/germanium fuse region may be provided in the silicon base material. Consequently, sophisticated gate electrode structures may be formed on the basis of replacement gate approaches on bulk devices substantially without affecting the electronic characteristics of the electronic fuses. | 10-06-2011 |
20110266633 | Semiconductor Device Comprising Metal Gates and Semiconductor Resistors Formed on the Basis of a Replacement Gate Approach - In a replacement gate approach, the semiconductor material or at least a significant portion thereof in a non-transistor structure, such as a precision resistor, an electronic fuse and the like, may be preserved upon replacing the semiconductor material in the gate electrode structures. To this end, an appropriate dielectric material may be provided at least prior to the removal of the semiconductor material in the gate electrode structures, without requiring significant modifications of established replacement gate approaches. | 11-03-2011 |
20110303988 | Semiconductor device and level shift circuit using the same - A level shift circuit includes: a pair of first and second P-channel transistors which are connected in a flip-flop manner and whose sources connected to a first power supply line; a pair of first and second N-channel transistors with the first N-channel transistor provided between the first P-channel transistor and a second power supply line and the second N-channel transistor provided between the second P-channel transistor and the second power supply line, in which input signals complementary to each other are inputted to their gates; and a current supply circuit provided between the first power supply line and a drain of the first N-channel transistor and between the first power supply line and a drain of the second N-channel transistor, respectively. The current supply circuit includes third and fourth N-channel transistors with their sources connected to drains of the first and second N-channel transistors and third and fourth P-channel transistors serving as current limiting elements with their one ends connected to the first power supply line and the other ends connected to drains of the third and fourth P-channel transistors. | 12-15-2011 |
20110316090 | BOOST CONVERTER WITH INTEGRATED HIGH POWER DISCRETE FET AND LOW VOLTAGE CONTROLLER - A boost converter for high power and high output voltage applications includes a low voltage controller integrated circuit and a high voltage, vertical, discrete field effect transistor, both of which are packed in a single package on separate electrically isolated die pads. | 12-29-2011 |
20120001269 | Semiconductor Device - According to one embodiment, a semiconductor device including a field-effect transistor, and a resistance element connected between a gate electrode of the field effect transistor and a connection point connected between a back gate electrode of the field effect transistor and one of source-drain regions of the field effect transistor, a voltage being applied between the other of the source-drain regions and the gate electrode. | 01-05-2012 |
20120012943 | ANTI-FUSE OF SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention provides an anti-fuse of a semiconductor device and a method of manufacturing the same, which has a stable current level and a stable operation. According to the present invention, in order for the anti-fuse to be stably operated, a region in which a gate and an active region partially overlap with each other is formed, and the overlapped region is destroyed when voltage is supplied. Accordingly, a current level can be stabilized, and stable operation is possible. | 01-19-2012 |
20120043619 | SYSTEM AND CIRCUIT FOR SIMULATING GATE-TO-DRAIN BREAKDOWN - A system and circuit for simulating gate-to-drain breakdown in an N-channel field effect transistor (NFET). In one embodiment, a simulation circuit includes a primary field effect transistor (FET), a first depletion mode FET and a second depletion mode FET. The first depletion mode FET and the second depletion mode FET are connected between a gate and a drain of the primary FET. A gate and a drain of the first depletion mode FET are connected to the gate of the primary FET. A gate and a drain of the second depletion mode FET are connected to the drain of the primary FET. | 02-23-2012 |
20120074506 | Semiconductor Package for Higher Power Transistors - A semiconductor package for mounting multiple field effect transistors (FETs) is disclosed. The package includes a drain conductor between each FET's drain connection point and a drain terminal connector on the semiconductor package; a source conductor between each FET's source connection point and a source terminal connector of the source conductor on the semiconductor package, the source conductor containing the common inductance; a dielectric substantially overlaying said source conductor; a gate conductor on the dielectric substantially overlaying the source conductor; and said gate conductor, said dielectric and said source conductor forming a transformer, the transformer creating voltage in the gate conductor which almost exactly cancels voltage in said source conductor. | 03-29-2012 |
20120074507 | INTEGRATION OF AN AMORPHOUS SILICON RESISTIVE SWITCHING DEVICE - An integrated circuit device. The integrated circuit device includes a semiconductor substrate having a surface region. A gate dielectric layer overlies the surface region of the substrate. The device includes a MOS device having a p+ active region. The p+ active region forms a first electrode for a resistive switching device. The resistive switching device includes an amorphous silicon switching material overlying the p+ active region and a metal electrode overlies the first metal conductor structure. The metal electrode includes a metal material, upon application of a positive bias to the metal electrode, forms a metal region in the amorphous silicon switching material. The MOS device provides for a select transistor for the integrated circuit device. | 03-29-2012 |
20120146156 | SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING SAME - A semiconductor device includes an MIS transistor and an electric fuse. The MIS transistor includes a gate insulating film formed on the semiconductor substrate, and a gate electrode including a first polysilicon layer, a first silicide layer, and a first metal containing layer made of a metal or a conductive metallic compound. The electric fuse includes an insulating film formed on the semiconductor substrate, a second polysilicon layer formed over the insulating film, and a second silicide layer formed on the second polysilicon layer. | 06-14-2012 |
20120181621 | Field effect devices controlled via a nanotube switching element - Field effect devices having a drain controlled via a nanotube switching element. Under one embodiment, a field effect device includes a source region and a drain region of a first semiconductor type and a channel region disposed therebetween of a second semiconductor type. The source region is connected to a corresponding terminal. A gate structure is disposed over the channel region and connected to a corresponding terminal. A nanotube switching element is responsive to a first control terminal and a second control terminal and is electrically positioned in series between the drain region and a terminal corresponding to the drain region. The nanotube switching element is electromechanically operable to one of an open and closed state to thereby open or close an electrical communication path between the drain region and its corresponding terminal. When the nanotube switching element is in the closed state, the channel conductivity and operation of the device is responsive to electrical stimulus at the terminals corresponding to the source and drain regions and the gate structure. | 07-19-2012 |
20120187503 | SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided are a semiconductor memory device and a method of manufacturing the semiconductor memory device. The semiconductor memory device includes a semiconductor substrate including a first active region and a second active region, a gate electrode including a silicide layer formed on the first active region and a resistor pattern formed on the second active region. A distance from a top surface of the semiconductor substrate to a top surface of the resistor pattern is smaller than a distance from a top surface of the semiconductor substrate to a top surface of the gate electrode. | 07-26-2012 |
20120199915 | Patterning Embedded Control Lines for Vertically Stacked Semiconductor Elements - The present invention is generally directed to an apparatus with embedded (bottom side) control lines for vertically stacked semiconductor elements. In accordance with various embodiments, a first semiconductor wafer is provided with a first facing surface on which a first conductive layer is formed. The first semiconductor wafer is attached to a second semiconductor wafer to form a multi-wafer structure, the second semiconductor wafer having a second facing surface on which a second conductive wafer is formed. The first conductive layer is contactingly bonded to the second conductive layer to form an embedded combined conductive layer within said structure. Portions of the combined conductive layer are removed to form a plurality of spaced apart control lines that extend in a selected length or width dimension through said structure. | 08-09-2012 |
20120205750 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method of manufacturing a semiconductor device, the method includes forming first and second cores on a processed material, forming a covering material having a stacked layer includes first and second layers, the covering material covering an upper surface and a side surface of the first and second cores, removing the second layer covering the first core, forming a first sidewall mask having the first layer on the side surface of the first core and a second sidewall mask having the first and second layers on the side surface of the second core by etching the covering material, removing the first and second cores, and forming first and second patterns having different width in parallel by etching the processed material in condition of using the first and second sidewall masks. | 08-16-2012 |
20120228718 | METHOD OF FORMING AN ELECTRICAL FUSE AND A METAL GATE TRANSISTOR AND THE RELATED ELECTRICAL FUSE - The present invention provides a method of integrating an electrical fuse process into a high-k/metal gate process. The method simultaneously forms a dummy gate stack of a transistor and a dummy gate stack of an e-fuse; and simultaneously removes the polysilicon of the dummy gate stack in the transistor region and the polysilicon of the dummy gate stack in the e-fuse region. Thereafter, the work function metal layer disposed in the opening of the e-fuse region is removed; and the opening in the transistor region and the opening in the e-fuse region with metal conductive structures are filled to form an e-fuse and a metal gate of a transistor. | 09-13-2012 |
20120248546 | METHODS OF FORMING SECURED METAL GATE ANTIFUSE STRUCTURES - Methods of forming and using a microelectronic structure are described. Embodiments include forming a diode between a metal fuse gate and a PMOS device, wherein the diode is disposed between a contact of the metal fuse gate and a contact of the PMOS device, and wherein the diode couples the contact of the metal fuse gate to the contact of the PMOS device. | 10-04-2012 |
20120256271 | Method and Apparatus for Modeling Multi-terminal MOS Device for LVS and PDK - An apparatus comprises two n-type metal oxide semiconductor (MOS) devices formed next to each other. Each n-type MOS device further includes a pair of face-to-face diodes formed in an isolation ring. A method of modeling the apparatus comprises reusing four-terminal MOS device models in standard cell libraries and combining the four-terminal MOS device model and the isolation ring model into a 4T MOS plus isolation ring model. The method of modeling the apparatus further comprises adding a dummy device between a body contact of the first n-type MOS device and a body contact of the second n-type MOS device. | 10-11-2012 |
20120273897 | Semiconductor Device and Electric Power Conversion Device Using Same - The trench IGBT is provided with a plurality of trench gates disposed in a manner so as to form wide and narrow of gaps; has a MOS structure that has a channel of a first conductivity type and that is between the trench gate pair that is disposed with a narrow gap therebetween; and is provided with a floating semiconductor layer of the first conductivity type and that is separated from the trench gates by interposing a portion of a third semiconductor layer of a second conductivity type between the trench gate pair that is disposed with a wide gap therebetween. Also, this floating semiconductor layer is disposed parallel to and at a position corresponding to an emitter electrode and a first semiconductor layer having the same electric potential, with a insulating film therebetween. | 11-01-2012 |
20120299115 | SEMICONDUCTOR STRUCTURE WITH SUPPRESSED STI DISHING EFFECT AT RESISTOR REGION - A method includes forming a first isolation feature of a first width and a second isolation feature of a second width in a substrate, the first width being substantially greater than the second width; forming an implantation mask on the substrate, wherein the implantation mask covers the first isolation feature and exposes the second isolation feature; performing an ion implantation process to the substrate using the implantation mask; and thereafter performing an etching process to the substrate. | 11-29-2012 |
20120313184 | SWITCHING CIRCUIT - A switching circuit ( | 12-13-2012 |
20120319209 | Semiconductor Device Having Mixedly Mounted Components with Common Film Layers and Method of Manufacturing the Same - A metal gate electrode and a poly-silicon resistance element are mixedly mounted in the same semiconductor substrate. The metal gate electrode is formed on a first gate insulating film and includes a first gate metal film and a first gate silicon film. The poly-silicon resistance element includes a silicon film pattern formed on a laminated pattern which includes a first laminate insulating film, a first laminate metal film, and a second laminate insulating film. The first laminate insulating film and the first gate insulating film are formed from a common insulating film; the first laminate metal film and the first gate metal film are formed from a common metal film, and the silicon firm pattern and the first gate silicon film are formed from a common silicon film. In a planar view, a footprint of the silicon film pattern is included within the second laminate insulating film. | 12-20-2012 |
20130001704 | Resistors Formed Based on Metal-Oxide-Semiconductor Structures - A device includes a metal-oxide-semiconductor (MOS) device, which includes a gate electrode and a source/drain region adjacent the gate electrode. A first and a second contact plug are formed directly over and electrically connected to two portions of a same MOS component, wherein the same MOS component is one of the gate electrode and the source/drain region. The same MOS component is configured to be used as a resistor that is connected between the first and the second contact plugs. | 01-03-2013 |
20130009253 | POWER MOSFET WITH INTEGRATED GATE RESISTOR AND DIODE-CONNECTED MOSFET - A power MOSFET is formed in a semiconductor device with a parallel combination of a shunt resistor and a diode-connected MOSFET between a gate input node of the semiconductor device and a gate of the power MOSFET. A gate of the diode-connected MOSFET is connected to the gate of the power MOSFET. Source and drain nodes of the diode-connected MOSFET are connected to a source node of the power MOSFET through diodes. The drain node of the diode-connected MOSFET is connected to the gate input node of the semiconductor device. The source node of the diode-connected MOSFET is connected to the gate of the power MOSFET. The power MOSFET and the diode-connected MOSFET are integrated into the substrate of the semiconductor device so that the diode-connected MOSFET source and drain nodes are electrically isolated from the power MOSFET source node through a pn junction. | 01-10-2013 |
20130009254 | Electrical Device and Fabrication Method - An electrical device with a fin structure, a first section of the fin structure having a first width and a first height, a second section of the fin structure having a second width and a second height, wherein the first width is smaller than the second width and the first height is lower than the second height. | 01-10-2013 |
20130026581 | SEMICONDUCTOR DEVICE COMPRISING METAL GATES AND A SILICON CONTAINING RESISTOR FORMED ON AN ISOLATION STRUCTURE - In a semiconductor device comprising sophisticated high-k metal gate structures formed in accordance with a replacement gate approach, semiconductor-based resistors may be formed above isolation structures substantially without being influenced by the replacement gate approach. Consequently, enhanced area efficiency may be achieved compared to conventional strategies, in which the resistive structures may have to be provided on the basis of a gate electrode metal, while, nevertheless, a low parasitic capacitance may be accomplished due to providing the resistive structures above the isolation structure. | 01-31-2013 |
20130032893 | SEMICONDUCTOR DEVICE COMPRISING METAL GATE ELECTRODE STRUCTURES AND NON-FETS WITH DIFFERENT HEIGHT BY EARLY ADAPTATION OF GATE STACK TOPOGRAPHY - Gate height scaling in sophisticated semiconductor devices may be implemented without requiring a redesign of non-transistor devices. To this end, the semiconductor electrode material may be adapted in its thickness above active regions and isolation regions that receive the non-transistor devices. Thereafter, the actual patterning of the adapted gate layer stack may be performed so as to obtain gate electrode structures of a desired height for improving, in particular, AC performance without requiring a redesign of the non-transistor devices. | 02-07-2013 |
20130062706 | Electronic Module - An electronic module includes a first semiconductor chip and a passive component, wherein the first semiconductor chip is arranged on a surface of the passive component. | 03-14-2013 |
20130087861 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF - A semiconductor device comprises a metal gate electrode, a passive device and a hard mask layer. The passive device has a poly-silicon element layer. The hard mask layer is disposed on the metal gate electrode and the passive electrode and has a first opening and a second opening substantially coplanar with each other, wherein the metal gate electrode and the poly-silicon element layer are respectively exposed via the first opening and the second opening; and there is a distance between the first opening and the metal gate electrode substantially less than the distance between the second opening and the poly-silicon element layer. | 04-11-2013 |
20130093024 | STRUCTURE AND METHOD FOR INTEGRATING FRONT END SiCr RESISTORS IN HiK METAL GATE TECHNOLOGIES - An integrated circuit having a replacement HiK metal gate transistor and a front end SiCr resistor. The SiCr resistor replaces the conventional polysilicon resistor in front end processing and is integrated into the contact module. The first level of metal interconnect is located above the SiCr resistor. First contacts connect to source/drain regions. Second contacts electrically connect the first level of interconnect to either the SiCr resistor or the metal replacement gate. | 04-18-2013 |
20130105912 | SEMICONDUCTOR DEVICE | 05-02-2013 |
20130113049 | FUSE CIRCUIT FOR FINAL TEST TRIMMING OF INTEGRATED CIRCUIT CHIP - The present invention discloses a fuse circuit for final test trimming of an integrated circuit (IC) chip. The fuse circuit includes at least one electrical fuse, at least one control switch corresponding to the electrical fuse, and a resistant device. The electrical fuse is connected with the control switch in series between a predetermined pin and a grounding pin. The control switch receives a control signal to determine whether a predetermined current flows through the corresponding electrical fuse and breaks the electrical fuse. The resistant device is coupled between a bulk terminal and a source terminal to increase a resistance of a parasitic channel, such that an electrostatic discharge (ESD) protection is enhanced, and errors of final test trimming of an IC chip are avoided. | 05-09-2013 |
20130126979 | INTEGRATED CIRCUITS WITH ELECTRICAL FUSES AND METHODS OF FORMING THE SAME - A method of forming an integrated circuit includes forming at least one transistor over a substrate. Forming the at least one transistor includes forming a gate dielectric structure over a substrate. A work-function metallic layer is formed over the gate dielectric structure. A conductive layer is formed over the work-function metallic layer. A source/drain (S/D) region is formed adjacent to each sidewall of the gate dielectric structure. At least one electrical fuse is formed over the substrate. Forming the at least one electrical fuse includes forming a first semiconductor layer over the substrate. A first silicide layer is formed on the first semiconductor layer. | 05-23-2013 |
20130146989 | INTEGRATED SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - An integrated device includes a field effect transistor formed within and upon an active region of a substrate and a resistor formed on an isolation region of the substrate. The field effect transistor includes a gate stacked structure having respective portions of a dielectric layer, a first conductive layer and a second conductive layer arranged in order from bottom to top. The resistor includes a resistor body being an enclosure portion of the first conductive layer and resistor terminals being portions of the second conductive layer on distal ends of the resistor body. A method for manufacturing a semiconductor device includes forming a gate stacked structure and a resistor stacked structure at the same time by patterning a dielectric layer, a first conductive layer and a second conductive layer. The method also includes forming a resistor having a resistor body by patterning the resistor stacked structure. | 06-13-2013 |
20130154025 | SEMICONDUCTOR DEVICE INCLUDING CAPACITOR STABILIZING VARIATION OF POWER SUPPLY VOLTAGE - Disclosed herein is a semiconductor device that includes a first line supplied with a first voltage, a second line supplied with a second voltage, a first node, at least one first capacitor connected between the first line and the first node, at least one second capacitor connected between the node and the second line, and a protective element connected between the first node and the second line in parallel to the second capacitor. | 06-20-2013 |
20130161761 | ONE-TIME PROGRAMMABLE MEMORY AND METHOD FOR MAKING THE SAME - A one time programmable nonvolatile memory formed from metal-insulator-semiconductor cells. The cells are at the crosspoints of conductive gate lines and intersecting doped semiconductor lines formed in a semiconductor substrate. | 06-27-2013 |
20130175636 | SEMICONDUCTOR DEVICE - A semiconductor device includes a substrate, a transistor formed over the substrate, insulating layers formed over the substrate, a multilayer wiring formed in the insulating layers, a first inductor formed in the insulating layers, and a second inductor formed over the first inductor and overlapping the first inductor. The insulating layers contain a silicon, wherein at least the two insulating layers are formed between the first inductor and the second inductor, and the first inductor and the second inductor are a spiral wiring pattern. | 07-11-2013 |
20130193525 | Semiconductor Arrangement with Active Drift Zone - A semiconductor device arrangement includes a first semiconductor device having a load path and a plurality of second semiconductor devices, each having a load path between a first and a second load terminal and a control terminal. The second semiconductor devices have their load paths connected in series and connected in series to the load path of the first semiconductor device. Each of the second semiconductor devices has its control terminal connected to the load terminal of one of the other second semiconductor devices, and one of the second semiconductor devices has its control terminal connected to one of the load terminals of the first semiconductor device. Each of the second semiconductor devices has at least one device characteristic. At least one device characteristic of at least one of the second semiconductor devices is different from the corresponding device characteristic of others of the second semiconductor devices. | 08-01-2013 |
20130241000 | HIGH-INTEGRATION SEMICONDUCTOR MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor memory device includes a semiconductor substrate, an active region including a plurality of unit active regions and disposed over and spaced from the semiconductor substrate, a pair of word lines formed on a top surface and sides of the unit active region, a dummy word line disposed at a contact of the unit active regions and formed on top surfaces and sides of the unit active regions, a source region in the unit active region between the pair of word lines and electrically connected to the semiconductor substrate, drain regions formed in the unit active region between the pair of word lines and the dummy word line, and first storage layers formed on the drain regions and electrically connected to the drain regions. | 09-19-2013 |
20130249017 | NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME - The nonvolatile memory device includes a memory cell having a transistor in which an insulating isolation layer is formed in a channel region. The nonvolatile memory device includes a metal-oxide-semiconductor (MOS) transistor as a basic component. An insulating isolation layer is formed in at least a channel region, and a gate insulating layer includes an insulating layer or a variable resistor and serves as a data storage. A gate includes a metal layer formed in a lower portion thereof. First source and drain regions are lightly doped with a dopant, and second source and drain regions are heavily doped with a dopant. | 09-26-2013 |
20130256807 | Integrated Dual Power Converter Package Having Internal Driver IC - An integrated dual power converter package is disclosed. The package includes a leadframe having a first control FET paddle configured to support a drain of a first control FET, and a second control FET paddle configured to support a drain of a second control FET. The leadframe further includes a sync FET paddle configured to support a source of a first sync FET and a source of a second sync FET, and a driver integrated circuit (IC) paddle configured to support a driver IC for controlling each of the control FETs and each of the sync FETs. The leadframe may additionally include first and second switched nodes, configured for electrical connection to the first control FET and the first sync FET via a first clip, and to the second control FET and the second sync FET via a second clip, respectively. | 10-03-2013 |
20130270650 | RESISTOR AND MANUFACTURING METHOD THEREOF - A manufacturing method for a resistor integrated with a transistor having metal gate includes providing a substrate having a transistor, a transitional structure, and a dielectric layer covering the transistor and the transitional structure formed thereon, forming a recess in between two opposite polysilicon end portions in the transitional structure, forming a U-shaped resistance modulating layer and an insulating layer filling the recess, removing a dummy gate of the transistor and the polysilicon end portions of the transitional structure to form a gate trench and two terminal trenches respectively in the transistor and the transitional structure, and forming a metal gate in the gate trench and conductive terminals in the terminal trenches simultaneously. | 10-17-2013 |
20130277754 | Semiconductor Integrated Structure - The present invention provides a resistor structure including a substrate, an ILD layer, a transistor and a resistor. The substrate includes a resistor region and an active region. The ILD layer is disposed directly on the substrate. The transistor is disposed in the active region in the ILD layer wherein the transistor includes a metal gate. The resistor is disposed in the resistor region above the ILD layer, wherein the resistor directly contacts the ILD layer. | 10-24-2013 |
20130313653 | MOS Transistor with Multi-finger Gate Electrode - A field effect transistor is described. In accordance with the one example, the transistor includes a semiconductor substrate, a gate pad for receiving a gate signal, a number of transistor cells integrated in the substrate, wherein each transistor cell has at least one gate electrode. The transistor further includes a number of gate runners for distributing the gate signal to the gate electrodes of the transistor cells. Each individual gate runner is electrically coupled to the gate pad via a respective gate resistor having a defined resistance. | 11-28-2013 |
20130328131 | Semiconductor Devices, Methods of Manufacture Thereof, and Methods of Forming Resistors - Semiconductor devices, methods of manufacture thereof, and methods of forming resistors are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes forming a first insulating material over a workpiece, and forming a conductive chemical compound material over the first insulating material. The conductive chemical compound material is patterned to form a resistor. A second insulating material is formed over the resistor, and the second insulating material is patterned. The patterned second insulating material is filled with a conductive material to form a first contact coupled to a first end of the resistor and to form a second contact coupled to a second end of the resistor. | 12-12-2013 |
20130334611 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - The semiconductor device of the invention includes a transistor, an insulating layer provided over the transistor, a first conductive layer (corresponding to a source wire or a drain wire) electrically connected to a source region or a drain region of the transistor through an opening portion provided in the insulating layer, a first resin layer provided over the insulating layer and the first conductive layer, a layer containing conductive particles which is electrically connected to the first conductive layer through an opening portion provided in the first resin layer, and a substrate provided with a second resin layer and a second conductive layer serving as an antenna. In the semiconductor device having the above-described structure, the second conductive layer is electrically connected to the first conductive layer with the layer containing conductive particles interposed therebetween. In addition, the second resin layer is provided over the first resin layer. | 12-19-2013 |
20130341730 | Semiconductor Devices and Structures - Devices, semiconductor structures and methods are provided, where a substrate is around a semiconductor device is biased via a resistive element. | 12-26-2013 |
20130341731 | Substrate Resistor and Method of Making Same - A semiconductor structure can include a resistor on a substrate formed simultaneously with other devices, such as transistors. A diffusion barrier layer formed on a substrate is patterned to form a resistor and barrier layers under a transistor gate. A filler material, a first connector, and a second connector are formed on the resistor at the same manner and time as the gate of the transistor. The filler material is removed to form a resistor on a substrate. | 12-26-2013 |
20140001567 | FET TRANSISTOR ON HIGH-RESISTIVITY SUBSTRATE | 01-02-2014 |
20140001568 | INTEGRATED CIRCUIT DEVICE FEATURING AN ANTIFUSE AND METHOD OF MAKING SAME | 01-02-2014 |
20140021559 | SEMICONDUCTOR DEVICE AND A METHOD OF INCREASING A RESISTANCE VALUE OF AN ELECTRIC FUSE - Provided is a semiconductor device having an electric fuse structure which receives the supply of an electric current to be permitted to be cut without damaging portions around the fuse. An electric fuse is electrically connected between an electronic circuit and a redundant circuit as a spare of the electronic circuit. After these circuits are sealed with a resin, the fuse can be cut by receiving the supply of an electric current from the outside. The electric fuse is formed in a fine layer, and is made of a main wiring and a barrier film. The linear expansion coefficient of each of the main wiring and the barrier film is larger than that of each of the insulator layers. The melting point of each of the main wiring and the barrier film is lower than that of each of the insulator layers. | 01-23-2014 |
20140035065 | HIGH-FREQUENCY DEVICE INCLUDING HIGH-FREQUENCY SWITCHING CIRCUIT - A high-frequency device having a switching circuit including a semiconductor substrate; a first high-frequency input/output terminal; a second high-frequency input/output terminal; a control signal input terminal; a power terminal; a ground terminal; an insulating portion disposed on a main surface of the semiconductor substrate; and a voltage-applying electrode for applying a predetermined positive voltage from the power electrode to the semiconductor substrate, wherein the switching circuit includes a field-effect transistor disposed in an active region of the semiconductor substrate. | 02-06-2014 |
20140054718 | Arrays of Vertically-Oriented Transistors, And Memory Arrays Including Vertically-Oriented Transistors - An array includes vertically-oriented transistors. The array includes rows of access lines and columns of data/sense lines. Individual of the rows include an access line interconnecting transistors in that row. Individual of the columns include a data/sense line interconnecting transistors in that column. The array includes a plurality of conductive lines which individually extend longitudinally parallel and laterally between immediately adjacent of the data/sense lines. Additional embodiments are disclosed. | 02-27-2014 |
20140097501 | INTEGRATED POWER MODULE FOR MULTI-DEVICE PARALLEL OPERATION - An integrated power module having a dielectric substrate, a source conductor trace formed on the dielectric substrate, a drain conductor trace formed on the dielectric substrate, a gate conductor trace formed on the dielectric substrate, a transistor chip having a top surface and a bottom surface connected to the drain conductor trace, a back-contact resistor having a flat planar structure with a top surface and a bottom surface connected to the gate conductor trace, and a first wire bond connecting the top surface of the transistor chip to the top surface of the back-contact resistor. | 04-10-2014 |
20140103447 | POWER RF AMPLIFIERS - A power transistor circuit uses first and second power transistors in differential mode. An inductor arrangement of inductors is formed by wire bonds between the drains. The transistors are in a mirrored configuration, and the inductor arrangement comprises wire bonds which extend between the drain connections across the space between the mirrored transistors. | 04-17-2014 |
20140103448 | METHODS OF FORMING SECURED METAL GATE ANTIFUSE STRUCTURES - Methods of forming and using a microelectronic structure are described. Embodiments include forming a diode between a metal fuse gate and a PMOS device, wherein the diode is disposed between a contact of the metal fuse gate and a contact of the PMOS device, and wherein the diode couples the contact of the metal fuse gate to the contact of the PMOS device. | 04-17-2014 |
20140138777 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR MAKING SAME - One feature pertains to an integrated circuit (IC) that includes a metal gate terminal that has a gate metal that is either p-type or n-type. The IC further includes a first semiconductor region having either a p-type doping or an n-type doping, such that if the gate metal is p-type then the first semiconductor region has the n-type doping, and if the gate metal is n-type then the first semiconductor region has the p-type doping. A gate dielectric is interposed between the metal gate terminal and the first semiconductor region. The gate dielectric has a gate breakdown voltage V | 05-22-2014 |
20140167180 | SEMICONDUCTOR DEVICES INCLUDING A RESISTOR STRUCTURE - Semiconductor devices are provided. A semiconductor device may include a transistor area and a resistor area. The transistor area may include a gate structure. The resistor area may include an insulating layer and a resistor structure on the insulating layer. A top surface of the gate structure and a top surface of the resistor structure may be substantially coplanar. | 06-19-2014 |
20140167181 | SEMICONDUCTOR DEVICES INCLUDING A RESISTOR STRUCTURE AND METHODS OF FORMING THE SAME - Semiconductor devices including a resistor structure is provided. The semiconductor device may include a gate structure on an active region, a resistor structure on a field region and a first interlayer insulating layer on the gate structure and the resistor structure. The semiconductor devices may also include a resistor trench plug vertically penetrating through the first interlayer insulating layer and contacting the resistor structure and a second interlayer insulating layer on the first interlayer insulating layer and the resistor trench plug. Further, the semiconductor devices may include a resistor contact plug vertically penetrating through the first and second interlayer insulating layers and contacting the resistor structure. | 06-19-2014 |
20140183656 | Method and System for Split Threshold Voltage Programmable Bitcells - A bitcell may include an insulating region, a first doping proximate to the insulating region, and a second doping surrounding the first doping. The second doping can be characterized by a higher gate voltage breakdown than the first doping. Also, the bitcell may include a gate terminal, and the bitcell may be configured for programming by a voltage on the gate terminal that results in a conductive hole selectively burned in the insulating region between the gate terminal and the first doping. | 07-03-2014 |
20140203375 | Reduced Substrate Coupling for Inductors in Semiconductor Devices - The present disclosure provides reduced substrate coupling for inductors in semiconductor devices. A method of fabricating a semiconductor device having reduced substrate coupling includes providing a substrate having a first region and a second region. The method also includes forming a first gate structure over the first region and a second gate structure over the second region, wherein the first and second gate structures each include a dummy gate. The method next includes forming an inter layer dielectric (ILD) over the substrate and forming a photoresist (PR) layer over the second gate structure. Then, the method includes removing the dummy gate from the first gate structure, thereby forming a trench and forming a metal gate in the trench so that a transistor may be formed in the first region, which includes a metal gate, and an inductor component may be formed over the second region, which does not include a metal gate. | 07-24-2014 |
20140210014 | METHOD AND APPARATUS FOR FORMING AN INTEGRATED CIRCUIT WITH A METALIZED RESISTOR IN A STANDARD CELL CONFIGURATION - An integrated circuit includes a layer of a semiconductor device including a standard cell configuration having a fixed gate electrode pitch between gate electrode lines and a resistor formed of metal between the fixed gate electrode pitch of the standard cell configuration. In one embodiment, the integrated circuit can be charged device model (CDM) electrostatic discharge (ESD) protection circuit for a cross domain standard cell having the resistor formed of metal. A method of manufacturing integrated circuits includes forming a plurality of gate electrode lines separated by a gate electrode pitch to form a core standard cell device, applying at least a first layer of metal within the gate electrode pitch to form a portion of a resistor, and applying at least a second layer of metal to couple to the first layer of metal to form another portion of the resistor. | 07-31-2014 |
20140239409 | NON-VOLATILE ANTI-FUSE WITH CONSISTENT RUPTURE - In an embodiment of the invention, a non-volatile anti-fuse memory cell is disclosed. The memory cell consists of a programmable n-channel diode-connectable transistor. The poly-silicon gate of the transistor has two portions. One portion is doped more highly than a second portion. The transistor also has a source with two portions where one portion of the source is doped more highly than a second portion. The portion of the gate that is physically closer to the source is more lightly doped than the other portion of the poly-silicon gate. The portion of the source that is physically closer to the lightly doped portion of the poly-silicone gate is lightly doped with respect to the other portion of the source. When the transistor is programmed, a rupture in the insulator will most likely occur in the portion of the poly-silicone gate that is heavily doped. | 08-28-2014 |
20140246730 | EMBEDDED RESISTOR - An embedded resistor including a first interdielectric layer, a cap layer, a resistive layer and a cap film is provided. The first interdielectric layer is located on a substrate. The cap layer is located on the first interdielectric layer, wherein the cap layer has a trench. The resistive layer conformally covers the trench, thereby having a U-shaped cross-sectional profile. The cap film is located in the trench and on the resistive layer, or, an embedded thin film resistor including a first interdielectric layer, a cap layer and a bulk resistive layer is provided. The first interdielectric layer is located on a substrate. The cap layer is located on the first interdielectric layer, wherein the cap layer has a trench. The bulk resistive layer is located in the trench. | 09-04-2014 |
20140252494 | INTEGRATED SNUBBER IN A SINGLE POLY MOSFET - Aspects of the present disclosure describe MOSFET devices that have snubber circuits. The snubber circuits comprise one or more resistors with a dynamically controllable resistance that is controlled by changes to a gate and/or drain potentials of the one or more MOSFET structures during switching events. It is emphasized that this abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. | 09-11-2014 |
20140264624 | Metal Gate Structure and Method - A semiconductor structure comprises a metal gate structure formed in a substrate, wherein the metal gate structure comprises a first film formed of a first material and formed on a bottom and sidewalls of a gate trench, a second film formed of a second material and formed over the first film and a gate electrode formed over the second film. The semiconductor structure further comprises a resistor structure formed in the substrate, where the resistor structure comprises a third film formed of the first material and formed on a bottom and sidewalls of a resistor trench and a fourth film formed of the second material and formed over the third film. | 09-18-2014 |
20140284724 | Method of Semiconductor Integrated Circuit Fabrication - A method of fabricating a semiconductor integrated circuit (IC) is disclosed. The method includes receiving a semiconductor device, patterning a first hard mask to form a first recess in a high-resistor (Hi-R) stack, removing the first hard mask, forming a second recess in the Hi-R stack, forming a second hard mask in the second recess in the Hi-R stack. A HR can then be formed in the semiconductor substrate by the second hard mask and a gate trench etch. | 09-25-2014 |
20140319620 | METHODS FOR FABRICATING INTEGRATED CIRCUITS WITH POLYCRYSTALLINE SILICON RESISTOR STRUCTURES USING A REPLACMENT GATE PROCESS FLOW, AND THE INTEGRATED CIRCUITS FABRICATED THEREBY - Integrated circuits and methods for fabricating integrated circuits are provided. In an embodiment, an integrated circuit includes a first transistor structure that includes an etch-stop material layer, a first workfunction material layer disposed over the etch-stop material layer, a second workfunction material layer disposed over the first workfunction material layer, and a metal fill material disposed over the second workfunction material layer. The integrated circuit further includes a second transistor structure that includes a layer of the etch-stop material, a layer of the second workfunction material disposed over the etch-stop material layer, and a layer of the metal fill material disposed over the second workfunction material layer. Still further, the integrated circuit includes a resistor structure that includes a layer of the etch-stop material, a layer of the metal fill material disposed over the etch-stop material layer, and a silicon material layer disposed over the metal fill material layer. | 10-30-2014 |
20140367793 | INTEGRATED CIRCUITS WITH RESISTORS - An integrated circuit includes a transistor. The transistor includes a first gate dielectric structure over a substrate, a work-function layer over the first gate dielectric structure, a conductive layer over the work-function layer, and a source/drain (S/D) region adjacent to each sidewall of the first gate dielectric structure. Additionally, the integrated circuit includes a resistor structure. The resistor structure further includes a first doped semiconductor layer over the substrate, wherein a top surface of the resistor structure is substantially planar with a top surface of the transistor. | 12-18-2014 |
20150014784 | CASCODE SWITCH DEVICE - A cascode switch device is provided. The cascode switch device includes a high voltage (HV) transistor having a first drain electrode, a first source electrode, and a first gate electrode and a low voltage (LV) transistor cascoded with the HV transistor and having a second drain electrode, a second source electrode, and a second gate electrode. A first ratio of an equivalent capacitance of a second drain-to-source capacitance between the second drain and the second source electrodes, a gate-to-drain capacitance between the second gate and the second drain electrodes and a gate-to-source capacitance between the first gate and the first source electrodes to a first drain-to-source capacitance between the first source and the first drain electrodes being based on a second ratio of a drain voltage of the HV transistor to a break-down voltage of the LV transistor so as to provide voltage protection for the LV transistor. | 01-15-2015 |
20150014785 | Circuit and System of Using Finfet for building Programmable Resistive Devices - Junction diodes or MOS devices fabricated in standard FinFET technologies can be used as program selectors or One-Time Programmable (OTP) element in a programmable resistive device, such as interconnect fuse, contact/via fuse, anti-fuse, or emerging nonvolatile memory such as MRAM, PCRAM, CBRAM, or RRAM. The MOS or diode can be built on at least one fin structure or at least one active region that has at least one first active region and a second active region. The first and the second active regions can be isolated by a dummy MOS gate or silicide block layer (SBL) to construct a diode. | 01-15-2015 |
20150021706 | INTEGRATED CIRCUIT AND METHOD OF FORMING THE INTEGRATED CIRCUIT WITH IMPROVED LOGIC TRANSISTOR PERFORMANCE AND SRAM TRANSISTOR YIELD - In an integrated circuit that includes an NMOS logic transistor, an NMOS SRAM transistor, and a resistor, the gate of the SRAM transistor is doped at the same time that the resistor is doped, thereby allowing the gate of the logic transistor to be separately doped without requiring any additional masking steps. | 01-22-2015 |
20150028425 | THREE DIMENSIONAL SEMICONDUCTOR DEVICE HAVING LATERAL CHANNEL AND METHOD OF MANUFACTURING THE SAME - A 3D semiconductor device and a method of manufacturing the same are provided. The 3D semiconductor device includes a semiconductor substrate, an insulating layer formed on the semiconductor substrate, an active line including a source region and a drain region formed on the insulating layer, a gate electrode located on a portion of the active line, corresponding to a region between the source region and the drain region, and extending to a direction substantially perpendicular to the active line, and a line-shaped common source node formed to be electrically coupled to the source region and extending substantially in parallel to the gate electrode in a space between gate electrodes. | 01-29-2015 |
20150041914 | MATCHING TECHNIQUES FOR WIDE-BANDGAP POWER TRANSISTORS - There are disclosed impedance matching networks and technique for impedance matching to microwave power transistors. Distributed capacitor inductor networks are used so as to provide a high degree of control and accuracy, especially in terms of inductance values, in comparison to existing lumped capacitor arrangements. The use of bond wires is reduced, with inductance being provided primarily by microstrip transmission lines on the capacitors. | 02-12-2015 |
20150041915 | Semiconductor Arrangement with Active Drift Zone - A semiconductor device arrangement includes a first semiconductor device having a load path and a plurality of second semiconductor devices, each having a load path between a first and a second load terminal and a control terminal. The second semiconductor devices have their load paths connected in series and connected in series to the load path of the first semiconductor device. Each of the second semiconductor devices has its control terminal connected to the load terminal of one of the other second semiconductor devices, and one of the second semiconductor devices has its control terminal connected to one of the load terminals of the first semiconductor device. Each of the second semiconductor devices has at least one device characteristic. At least one device characteristic of at least one of the second semiconductor devices is different from the corresponding device characteristic of others of the second semiconductor devices. | 02-12-2015 |
20150069521 | NANOWIRE COMPATIBLE E-FUSE - An e-fuse is provided in one area of a semiconductor substrate. The E-fuse includes a vertical stack of from, bottom to top, base metal semiconductor alloy portion, a first metal semiconductor alloy portion, a second metal semiconductor portion, a third metal semiconductor alloy portion and a fourth metal semiconductor alloy portion, wherein the first metal semiconductor alloy portion and the third metal semiconductor portion have outer edges that are vertically offset and do not extend beyond vertical edges of the second metal semiconductor alloy portion and the fourth metal semiconductor alloy portion. | 03-12-2015 |
20150123208 | Transformer Input Matched Transistor - An RF power transistor package includes an input lead, an output lead, and an RF power transistor having a gate, a drain and a defined gain over an RF frequency range for which the RF power transistor is configured to operate. The RF power transistor package further includes a transformer electrically isolating and inductively coupling the gate of the RF power transistor to the input lead. The transformer is configured to block signals below the RF frequency range of the RF power transistor and pass signals within the RF frequency range of the RF power transistor. The RF power transistor package also includes a DC feed terminal for providing DC bias to the gate of the RF power transistor. | 05-07-2015 |
20150123209 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The inventive concepts provide semiconductor devices and methods of manufacturing the same. One semiconductor device includes a substrate, a device isolation layer disposed on the substrate, a fin-type active pattern defined by the device isolation layer and having a top surface higher than a top surface of the device isolation layer, a first conductive line disposed on an edge portion of the fin-type active pattern and on the device isolation layer adjacent to the edge portion of the fin-type active pattern, and an insulating thin layer disposed between the fin-type active pattern and the first conductive line. The first conductive line forms a gate electrode of an anti-fuse that may be applied with a write voltage. | 05-07-2015 |
20150129975 | MULTI-TIME PROGRAMMABLE DEVICE - Devices and methods for forming a device are presented. The device includes a substrate having a device region and first and second isolation regions surrounding the device region. The device includes a multi-time programmable (MTP) memory cell having a single transistor disposed on the device region. The transistor includes a gate having a gate electrode over a gate dielectric which includes a programmable resistive layer. The gate dielectric is disposed over a channel region having first and second sub-regions in the substrate. The gate dielectric disposed above the first and second sub-regions has different characteristics such that when the memory cell is programmed, a portion of the programmable resistive layer above one of the first or second sub-region is more susceptible for programming relative to portion of the programmable resistive above the other first or second sub-region. | 05-14-2015 |
20150137258 | FORMING A LOW VOTAGE ANTIFUSE DEVICE AND RESULTING DEVICE - Methods for a low voltage antifuse device and the resulting devices are disclosed. Embodiments may include forming a plurality of fins above a substrate, removing a portion of a fin, forming a fin tip, forming a first area of a gate oxide layer above at least the fin tip, forming a second area of the gate oxide layer above a remaining portion of the plurality of fins, wherein the first area is thinner than the second area, and forming a gate over at least the fin tip to form an antifuse one-time programmable device. | 05-21-2015 |
20150145059 | METHODS OF FORMING AN E-FUSE FOR AN INTEGRATED CIRCUIT PRODUCT AND THE RESULTING INTEGRATED CIRCUIT PRODUCT - An integrated circuit product is disclosed that includes a resistor body and an e-fuse body positioned on a contact level dielectric material, wherein the resistor body and the e-fuse body are made of the same conductive material, a first plurality of conductive contact structures are coupled to the resistor body, conductive anode and cathode structures are conductively coupled to the e-fuse body, wherein the first plurality of conductive contact structures and the conductive anode and cathode structures are made of the same materials. | 05-28-2015 |
20150294979 | SEMICONDUCTOR DEVICE HAVING FIN-TYPE ACTIVE PATTERNS AND GATE NODES - A semiconductor device is provided. The semiconductor device includes: a plurality of fin-type active patterns which extend along a first direction, and are arranged with respect to each other along a second direction different from the first direction; a contact which is electrically connected to the plurality of fin-type active patterns; a first gate electrode which extends along the second direction and is formed on at least two of the plurality of fin-type active patterns; and a second gate electrode which extends along the second direction and is formed on at least one of the plurality of fin-type active patterns. The first gate electrode is disposed between the contact and the second gate electrode, and the number of fin-type active patterns intersected by the first gate electrode is greater than the number of fin-type active patterns intersected by the second gate electrode. | 10-15-2015 |
20150311272 | INTEGRATED CIRCUITS WITH RESISTOR STRUCTURES FORMED FROM GATE METAL AND METHODS FOR FABRICATING SAME - Integrated circuits having resistor structures formed from gate metal and methods for fabricating such integrated circuits are provided. In an embodiment, a method for fabricating an integrated circuit includes providing a semiconductor substrate with a resistor area and a transistor area. The method deposits a gate metal over the resistor area and the transistor area of the semiconductor substrate, and the gate metal forms a gate metal layer in the resistor area. The method includes etching the gate metal to form a resistor structure from the gate metal layer in the resistor area. Further, the method includes forming contacts to the resistor structure in the resistor area. | 10-29-2015 |
20150325626 | NON-VOLATILE MEMORY WITH RESISTIVE ELEMENT AND MANUFACTURING METHOD THEREOF - A non-volatile memory includes a substrate, a fin structure, a gate structure, a transition layer, and a metal layer. The fin structure is protruded from the substrate. A first source/drain region and a second source/drain region are formed in the fin structure. The gate structure covers a top surface and two lateral surfaces of a part of the fin structure. The gate structure is arranged between the first source/drain region and the second source/drain region. The transition layer is in contact with the second source/drain region. The metal layer is in contact with the transition layer. By setting or resetting the transition layer, a resistance value of the transition layer is correspondingly changed. | 11-12-2015 |
20150333057 | MEANDER RESISTOR - The present disclosure relates to a semiconductor structure comprising a resistor, at least part of the resistor forming a meandering shape in a vertical direction with respect to a substrate of the semiconductor structure. The disclosure further relates to a semiconductor manufacturing process comprising a step for realizing at least one first fin, and a step for realizing a resistor comprising a meandering shape in a vertical direction based on the at least one first fin. | 11-19-2015 |
20150340319 | E-FUSE STRUCTURE FOR AN INTEGRATED CIRCUIT PRODUCT - An e-fuse device disclosed herein includes an anode and a cathode that are conductively coupled to the doped region formed in a substrate, wherein the anode includes a first metal silicide region positioned on the doped region and a first conductive metal-containing contact that is positioned above and coupled to the first metal silicide region, and the cathode includes a second metal silicide region positioned on the doped region and a second conductive metal-containing contact that is positioned above and conductively coupled to the second metal silicide region. A method disclosed herein includes forming a doped region in a substrate for an e-fuse device and performing at least one common process operation to form a first conductive structure on the doped region of the e-fuse device and a second conductive structure on a source/drain region of a transistor. | 11-26-2015 |
20150357351 | ARRAY SUBSTRATE AND CURVED DISPLAY DEVICE - The Present disclosure relates to the field of display technology and discloses an array substrate and a curved display device which can solve the technical problem of dark area on both sides of the existing curved display device. The array substrate according to the present disclosure comprises a number of sub pixel units arranged as an array, each sub pixel unit comprising a main sub pixel, a secondary sub pixel and a voltage-dividing capacitor. Said array substrate is divided into a compensation region and a non-compensation region. The capacitance of the voltage-dividing capacitor of the sub pixel unit in the compensation region is smaller than that of the voltage-dividing capacitor of the sub pixel unit in the non-compensation region. The present disclosure is applicable to curved display devices such as curved television and curved display, etc. | 12-10-2015 |
20150371988 | SEMICONDUCTOR DEVICE, RESISTOR AND MANUFACTURING METHOD OF THE SAME - A resistor includes a first conductive layer; a second conductive layer protruding from the first conductive layer; a third conductive layer located above and facing the first conductive layer to face the first conductive layer; and at least two contact plugs electrically coupled to the third conductive layer. | 12-24-2015 |
20150371995 | METHOD FOR PROCESSING A CARRIER, A CARRIER, AND A SPLIT GATE FIELD EFFECT TRANSISTOR STRUCTURE - According to various embodiments, a method for processing a carrier may include: doping a carrier with fluorine such that a first surface region of the carrier is fluorine doped and a second surface region of the carrier is at least one of free from the fluorine doping or less fluorine doped than the first surface region; and oxidizing the carrier to grow a first gate oxide layer from the first surface region of the carrier with a first thickness and simultaneously from the second surface region of the carrier with a second thickness different from the first thickness. | 12-24-2015 |
20150380569 | DIODE HAVING A PLATE-SHAPED SEMICONDUCTOR ELEMENT - A diode is provided having a plate-shaped semiconductor element that includes a first side and a second side, the first side being connected by a first connecting layer to a first metallic contact and the second side being connected by a second connecting layer to a second metallic contact, the first side having a diode element in a middle area and having a further diode element in an edge area of the first side, which has crystal defects as a result of a separating process of the plate-shaped semiconductor element, the first connecting layer only establishing an electrical contact to the diode element and not to the further diode element and, on the first side, the further diode element having an exposed contact, which may be electrically contacted by the first connecting layer. | 12-31-2015 |
20160005860 | INTEGRATED FABRICATION OF SEMICONDUCTOR DEVICES - In a method for manufacturing a semiconductor device, a substrate including a gate structure is provided. A source region and a drain region are formed at opposing sides of the gate structure and an implant region for a resistor device is formed in the substrate. Pocket implant regions are formed in the source region and the drain region. A dielectric layer is formed to cover the gate structure and the substrate. A portion of dopants in the pocket implant regions interact with portions of dopants in the source region and the drain region to form lightly doped drain regions above the pocket implant regions. A resistor region of the resistor device is defined on the implant region. A portion of the dielectric layer is removed to form a spacer on a sidewall of the gate structure and a resistor protection dielectric layer on a portion of the implant region. | 01-07-2016 |
20160013181 | SEMICONDUCTOR STRUCTURE WITH INTEGRATED PASSIVE STRUCTURES | 01-14-2016 |
20160020205 | Semiconductor Devices and Methods of Fabricating the Same - Provided is a semiconductor device including a substrate, first and second gate structures provided on the substrate, a source/drain region provided adjacent to the first gate structure, an interlayered insulating layer provided on the substrate to cover the source/drain region and the first and second gate structures, a source/drain contact hole penetrating the interlayered insulating layer and exposing the source/drain region, a trench formed in the interlayered insulating layer to expose a top surface of the second gate structure, a source/drain contact plug provided in the source/drain contact hole to be in contact with the source/drain region, and a resistor pattern provided in the trench to be in contact with a top surface of the second gate structure. | 01-21-2016 |
20160043071 | INTEGRATED CIRCUITS WITH RESISTORS - An integrated circuit includes transistor and resistor. The transistor includes a gate stack. The gate stack includes a first dielectric layer, a first conductive layer over the first dielectric layer, a second conductive layer over the first conductive layer, and a second dielectric layer over the second conductive layer. The transistor also includes source/drain (S/D) regions adjacent to the gate stack. The resistor adjacent to the transistor, and includes a third dielectric layer. | 02-11-2016 |
20160049411 | METHOD FOR PROCESSING A CARRIER, A CARRIER, AND A SPLIT GATE FIELD EFFECT TRANSISTOR STRUCTURE - According to various embodiments, a method for processing a carrier may include: doping a carrier with fluorine such that a first surface region of the carrier is fluorine doped and a second surface region of the carrier is at least one of free from the fluorine doping or less fluorine doped than the first surface region; and oxidizing the carrier to grow a first gate oxide layer from the first surface region of the carrier with a first thickness and simultaneously from the second surface region of the carrier with a second thickness different from the first thickness. | 02-18-2016 |
20160056162 | CMOS-COMPATIBLE POLYCIDE FUSE STRUCTURE AND METHOD OF FABRICATING SAME - CMOS-compatible polycide fuse structures and methods of fabricating CMOS-compatible polycide fuse structures are described. In an example, a semiconductor structure includes a substrate. A polycide fuse structure is disposed above the substrate and includes silicon and a metal. A metal oxide semiconductor (MOS) transistor structure is disposed above the substrate and includes a metal gate electrode. | 02-25-2016 |
20160087026 | Resistor Formed Using Resistance Patterns and Semiconductor Devices Including the Same - Embodiments of the inventive concepts provide a resistor and a semiconductor device including the same. The resistor includes a substrate, a device isolation layer in the substrate which defines active regions arranged in a first direction a resistance layer including resistance patterns that vertically protrude from the active regions and are connected to each other in the first direction, and contact electrodes on the resistance layer. | 03-24-2016 |
20160099046 | TECHNIQUES FOR DATA RETENTION IN MEMORY CELLS DURING POWER INTERRUPTION - Volatile memory is described, comprising: (i) a first inverter comprising a first p-type field effect transistor (FET) connected to a first n-type FET; (ii) a second inverter comprising a second p-type FET connected to a second n-type FET; (iii) a third p-type FET; (iv) a fourth p-type FET; and (v) a floating line connecting (i) a source of the third p-type FET, and (ii) a source of the fourth p-type FET, wherein: (a) the first data line is connected to: a gate of the second p-type FET, a gate of the second n-type FET, a drain of the third p-type FET, and a gate of the fourth p-type FET, and (b) the second data line is connected to: a gate of the first p-type FET, a gate of the first n-type FET, a drain of the fourth p-type FET, and a gate of the third p-type FET. | 04-07-2016 |
20160118380 | INTEGRATED SNUBBER IN A SINGLE POLY MOSFET - Aspects of the present disclosure describe MOSFET devices that have snubber circuits. The snubber circuits comprise one or more resistors with a dynamically controllable resistance that is controlled by changes to a gate and/or drain potentials of the one or more MOSFET structures during switching events. | 04-28-2016 |
20160155692 | SWITCHED POWER STAGE WITH INTEGRATED PASSIVE COMPONENTS | 06-02-2016 |
20160163815 | METHOD OF FORMING A SEMICONDUCTOR DEVICE STRUCTURE AND SUCH A SEMICONDUCTOR DEVICE STRUCTURE - The present disclosure provides in one aspect for a semiconductor device structure which may be formed by providing source/drain regions within a semiconductor substrate in alignment with a gate structure formed over the semiconductor substrate, wherein the gate structure has a gate electrode structure, a first sidewall spacer and a second sidewall spacer, the first sidewall spacer covering sidewall surfaces of the gate electrode structure and the sidewall spacer being formed on the first sidewall spacer. Furthermore, forming the semiconductor device structure may include removing the second sidewall spacer so as to expose the first sidewall spacer, forming a third sidewall spacer on a portion of the first sidewall spacer such that the first sidewall spacer is partially exposed, and forming silicide regions in alignment with the third sidewall spacer in the source/drain regions. | 06-09-2016 |
20160172280 | POWER FIELD-EFFECT TRANSISTOR (FET), PRE-DRIVER, CONTROLLER, AND SENSE RESISTOR INTEGRATION FOR MULTI-PHASE POWER APPLICATIONS | 06-16-2016 |
20160172356 | INTER-LEVEL DIELECTRIC LAYER IN REPLACEMENT METAL GATES AND RESISTOR FABRICATION | 06-16-2016 |
20160379931 | METHOD FOR FABRICATING SEMICONDUCTOR DEVICE HAVING A PATTERNED METAL LAYER EMBEDDED IN AN INTERLAYER DIELECTRIC LAYER - A method for fabricating semiconductor device is disclosed. First, a substrate is provided, in which the substrate includes a first metal gate and a second metal gate thereon, a first hard mask on the first metal gate and a second hard mask on the second metal gate, and a first interlayer dielectric (ILD) layer around the first metal gate and the second metal gate. Next, the first hard mask and the second hard mask are used as mask to remove part of the first ILD layer for forming a recess, and a patterned metal layer is formed in the recess, in which the top surface of the patterned metal layer is lower than the top surfaces of the first hard mask and the second hard mask. | 12-29-2016 |
20180026031 | Semiconductor Structure with Resistor Layer and Method for Forming the Same | 01-25-2018 |
20190148361 | NOVEL THIN FILM RESISTOR | 05-16-2019 |