Entries |
Document | Title | Date |
20080203437 | Semiconductor integrated circuit device with reduced leakage current - The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data. | 08-28-2008 |
20080203438 | DEMULTIPLEXERS USING TRANSISTORS FOR ACCESSING MEMORY CELL ARRAYS - A demultiplexer using transistors for accessing memory cell arrays. The demultiplexer includes (a) a substrate; (b) 2 | 08-28-2008 |
20080210980 | Isolated CMOS transistors - Isolated CMOS transistors formed in a P-type semiconductor substrate include an N-type submerged floor isolation region and a filled trench extending downward from the surface of the substrate to the floor isolation region. Together the floor isolation region and the filled trench form an isolated pocket of the substrate which contains a P-channel MOSFET in an N-well and an N-channel MOSFET in a P-well. The substrate does not contain an epitaxial layer, thereby overcoming the many problems associated with fabricating the same. | 09-04-2008 |
20080217657 | Power Semiconductor Device and Method of Manufacturing a Power Semiconductor Device - A semiconductor power switch having an array of basic cells in which peripheral regions in the active drain region extend beside the perimeter of the base-drain junction, the peripheral regions being of higher dopant density than the rest of the second drain layer. Intermediate regions in the centre of the active drain region are provided of lighter dopant density than the rest of the second drain layer. This provides an improved compromise between the on-state resistance and the breakdown voltage by enlarging the current conduction path at in its active drain region. On the outer side of each edge cell of the array, the gate electrode extends over and beyond at least part of the perimeters of the base-source junction and the base-drain junction towards the adjacent edge of the die. Moreover, on the outer side of each edge cell, the second drain layer includes a region of reduced dopant density that extends beyond the gate electrode right to the adjacent edge of the die | 09-11-2008 |
20080237646 | Semiconductor integrated circuit device and method of producing the same - A semiconductor integrated circuit device has a plurality of CMOS-type base cells arranged on a semiconductor substrate and m wiring layers, and gate array type logic cells are composed of the base cells and the wiring layers. Wiring within and between the logic cells is constituted by using only upper n (n10-02-2008 | |
20080283871 | SEMICONDUCTOR INTEGRATED CIRCUIT - A semiconductor integrated circuit having a substantially rectangular standard cell divided by first borderlines opposed to other standard cells longitudinally adjacent to the standard cell and second borderlines opposed to other standard cells laterally adjacent to the standard cell, the standard cell has: a p-type MOS transistor having first diffused regions and a first gate electrode; an n-type MOS transistor having second diffused regions and a second gate electrode with STI disposed for device isolation between the n-type MOS transistor and the p-type MOS transistor substantially in parallel with the first borderlines; dummy p-type MOS transistors having third gate electrodes disposed on the second borderlines so as to be adjacent to the first diffused regions of the p-type MOS transistor, the third gate electrodes being connected to power supply wiring so as to turn off the dummy p-type MOS transistors; and dummy n-type MOS transistors having fourth gate electrodes disposed on the second borderlines so as to be adjacent to the second diffused regions of the n-type MOS transistor, the fourth gate electrodes being connected to ground wiring so as to turn off the dummy n-type MOS transistors. | 11-20-2008 |
20090072274 | INTEGRATED CIRCUIT INCLUDING A FIRST GATE STACK AND A SECOND GATE STACK AND A METHOD OF MANUFACTURING - An integrated circuit including a first gate stack and a second gate stack and a method of manufacturing is disclosed. One embodiment provides non-volatile memory cells including a first gate stack and a gate dielectric on a first surface section of a main surface of a semiconductor substrate, and a second gate stack including a memory layer stack on a second surface section. A first pattern is transferred into the first gate stack and a second pattern into the second gate stack. | 03-19-2009 |
20090101940 | DUAL GATE FET STRUCTURES FOR FLEXIBLE GATE ARRAY DESIGN METHODOLOGIES - A gate array cell adapted for standard cell design methodology or programmable gate array that incorporates a dual gate FET device to offer a range of performance options within the same unit cell area. The conductivity and drive strength of the dual gate device may be selectively tuned through independent processing of manufacturing parameters to provide an asymmetric circuit response for the device or a symmetric response as dictated by the circuit application. | 04-23-2009 |
20090146190 | SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR FABRICATING SEMICONDUCTOR MEMORY DEVICE - According to an aspect of the present invention, there is provided a nonvolatile semiconductor memory device, comprising a plurality of memory strings, each of the memory strings being constituted with a plurality of electrically erasable memory cells being serially connected each other, the memory strings comprising:
| 06-11-2009 |
20090152593 | STRUCTURE FOR A LATCHUP ROBUST GATE ARRAY USING THROUGH WAFER VIA - A structure, method and a design structure for preventing latchup in a gate array. The design structure including: a NFET gate array and a PFET gate array in a substrate; an electrically conductive through via extending from a bottom surface of the substrate toward a top surface of the substrate the NFET gate array and PFET gate array, the through via electrically contacting the P-well. | 06-18-2009 |
20090166680 | Unity beta ratio tri-gate transistor static radom access memory (SRAM) - In general, in one aspect, a method includes forming N-diffusion and P-diffusion fins in a semiconductor substrate. A P-diffusion gate layer is formed over the semiconductor substrate and removed from the N-diffusion fins. A pass-gate N-diffusion gate layer is formed over the semiconductor substrate and removed from the P-diffusion fins and pull-down N-diffusion fins. A pull-down N-diffusion layer is formed over the semiconductor substrate. | 07-02-2009 |
20090173971 | MEMORY CELL LAYOUT STRUCTURE WITH OUTER BITLINE - An integrated circuit (IC) includes a memory cell having source/drain regions for defining source/drains of a first pull-up or pull-down (PU/PD) transistor for a first storage node, a second PU/PD transistor for a second storage node, and driver, cell pass, and buffer pass transistors. The memory cell includes a first gate electrode region for the first PU/PD and driver transistors, a second gate electrode region for the cell pass and buffer pass transistors, and a third gate electrode region for the second PU/PD transistor. The third gate electrode region and the cell pass transistor are coupled to the first storage node and the first gate electrode region is coupled to the second storage node. The buffer pass and driver transistors are coupled to a source/drain path of the cell pass transistor and the buffer pass transistor is coupled between a bitline (BL) node and the driver transistor. | 07-09-2009 |
20090309136 | SEA-OF-FINS STRUCTURE OF A SEMICONDUCTOR SUBSTRATE AND METHOD OF FABRICATION - A semiconductor device and a method of fabricating a semiconductor device, wherein the method comprises forming, on a substrate, a plurality of planarized fin bodies to be used for customized fin field effect transistor (FinFET) device formation; forming a nitride spacer around each of the plurality of fin bodies; forming an isolation region in between each of the fin bodies; and coating the plurality of fin bodies, the nitride spacers, and the isolation regions with a protective film. The fabricated semiconductor device is adapted to be used in customized applications as a customized semiconductor device. | 12-17-2009 |
20090321790 | SEMICONDUCTOR DEVICE INCLUDING MEMORY CELL AND ANTI-FUSE ELEMENT - A semiconductor device includes an anti-fuse portion and a memory cell portion each including a MOSFET structure having a gate insulating film formed on a semiconductor substrate and a gate electrode formed on the gate insulating film; wherein a depletion ratio in the gate electrode of the anti-fuse portion is different from the depletion ratio in the gate electrode of the memory cell portion, and the depletion ratio in the gate electrode of the anti-fuse portion is lower than the depletion ratio in the gate electrode of the memory cell portion. | 12-31-2009 |
20100001320 | THIN FILM TRANSISTOR ARRAY DEVICES - A transistor circuit for an array device comprises a plurality of thin film transistors electrically connected in parallel and provided on a common substrate. The transistors are arranged on the substrate as at least two rows ( | 01-07-2010 |
20100038683 | INTEGRATED CIRCUIT MODELING, DESIGN, AND FABRICATION BASED ON DEGRADATION MECHANISMS - An integrated circuit (IC) includes at least a first complementary MOS (CMOS) circuit, the first CMOS circuit comprising one or more first n-channel MOS (NMOS) transistors and one or more first p-channel MOS (PMOS) transistors, where the first NMOS transistors and the first PMOS transistors are arranged in the first CMOS circuit to drive at least a first common node of the first CMOS circuit. An average of the effective gate channel lengths of the first NMOS transistors (first NMOS average length) is at least 2% greater than an average of the effective gate channel lengths of the first PMOS transistors (first PMOS average length). | 02-18-2010 |
20100102361 | VERTICAL TRANSISTOR AND FABRICATING METHOD THEREOF AND VERTICAL TRANSISTOR ARRAY - A vertical transistor including a substrate, a gate, a base line and a gate dielectric layer is provided. The substrate includes a pillar protruding out of a surface of the substrate. The pillar includes a first doped region, a channel region and a second doped region from bottom to top. The gate is disposed on a sidewall at one side of the channel region. The base line is disposed on a sidewall at the other side of the channel region and not contacted with the gate. The gate dielectric layer is disposed between the gate and the channel region. | 04-29-2010 |
20100127308 | NON-VOLATILE MEMORY CELL WITH SELF ALIGNED FLOATING AND ERASE GATES, AND METHOD OF MAKING SAME - A memory device, and method of making the same, in which a trench is formed into a substrate of semiconductor material. The source region is formed under the trench, and the channel region between the source and drain regions includes a first portion that extends substantially along a sidewall of the trench and a second portion that extends substantially along the surface of the substrate. The floating gate is disposed in the trench, and is insulated from the channel region first portion for controlling its conductivity. The control gate is disposed over and insulated from the channel region second portion, for controlling its conductivity. The erase gate is disposed at least partially over and insulated from the floating gate. The erase gate includes a notch, and the floating gate includes an edge that directly faces and is insulated from the notch. | 05-27-2010 |
20100133587 | THREE-DIMENSIONAL ARCHITECTURE FOR INTEGRATION OF CMOS CIRCUITS AND NANO-MATERIAL IN HYBRID DIGITAL CIRCUITS - A hybrid CMOL stack enables more efficient design of CMOS logical circuits. The hybrid CMOL structure includes a first substrate having a CMOS device layer on the substrate, a first interconnect layer with interface pins over the CMOS device layer of the first substrate, a first array of nanowires connected to the interface pins of the first interconnect layer, a layer of nanowire junction material over the first array of nanowires, a second array of nanowires over the nanowire junction material, a second interconnect layer having interface pins disposed over the second array of nanowires, the interface pins being connected to the second array of nanowires, and a second substrate, the second substrate including a second CMOS device layer disposed over the second interconnect layer. | 06-03-2010 |
20100133588 | SEMICONDUCTOR DEVICE HAVING DUMMY POWER LINE - A semiconductor device includes a plurality of circuit blocks respectively arranged both in a first direction and in a second direction that intersects the first direction. A plurality of signal lines extend in one direction of the first direction and the second direction to correspond to and extend over the circuit blocks arranged in the one direction among the plurality of circuit blocks, the signal lines being spaced apart in the other direction of the first direction and the second direction. A plurality of power lines are arranged over the circuit blocks, each power line extending along at least one of the signal lines in the one direction. A dummy power line is arranged between one of the power lines and a signal line adjacent to the one of the power lines in the other direction. | 06-03-2010 |
20100140665 | Gallium Nitride Material Devices and Thermal Designs Thereof - Gallium nitride material devices and methods associated with the devices are described. The devices may be designed to provide enhanced thermal conduction and reduced thermal resistance. The increased thermal conduction through and out of the gallium nitride devices enhances operability of the devices, including providing excellent RF operation, reliability, and lifetime. | 06-10-2010 |
20100155782 | SUPER CMOS DEVICES ON A MICROELECTRONICS SYSTEM - A low cost IC solution is disclosed in accordance with an embodiment to provide Super CMOS microelectronics macros. Hereinafter, the Super CMOS or Schottky CMOS all refer to SCMOS. The SCMOS device solutions with a niche circuit element, the complementary low threshold Schottky barrier diode pairs (SBD) made by selected metal barrier contacts (Co/Ti) to P- and N- Si beds of the CMOS transistors. A DTL like new circuit topology and designed wide contents of broad product libraries, which used the integrated SBD and transistors (BJT, CMOS, and Flash versions) as basic components. The macros are composed of diodes that are selectively attached to the diffusion bed of the transistors, configuring them to form generic logic gates, memory cores, and analog functional blocks from simple to the complicated, from discrete components to all grades of VLSI chips. Solar photon voltaic electricity conversion and bio-lab-on-a-chip are two newly extended fields of the SCMOS IC applications. | 06-24-2010 |
20100181600 | Programmable Transistor Array Design Methodology - A method of designing integrated circuits includes providing a first chip and a second chip identical to each other. Each of the first chip and the second chip includes a base layer including a Logic Transistor Unit (LTU) array. The LTU array includes LTUs identical to each other and arranged in rows and columns. The method further includes connecting the base layer of the first chip to form a first application chip; and connecting the base layer of the second chip to form a second application chip different from the first application chip. | 07-22-2010 |
20100187573 | Semiconductor integrated circuit - Disclosed herein is a semiconductor integrated circuit including: a plurality of standard cells including a transistor having a gate electrode and arranged in combination with each other; a metallic wiring layer interconnecting the standard cells to form a desired circuit; and a plurality of reserve cells having a gate electrode, unconnected with the metallic wiring layer and arranged on a periphery of the standard cells, wherein each of the gate electrodes of the standard cells and the reserve cells has a gate pad section and two gate finger sections extending from the gate pad section to sides opposite to each other in a predetermined direction, and length of the gate pad sections of the reserve cells in a direction orthogonal to the predetermined direction is equal to or more than a sum total value of three times a minimum line width in the metallic wiring layer and twice a minimum separation distance. | 07-29-2010 |
20110031536 | LAYOUT STRUCTURE OF STANDARD CELL, STANDARD CELL LIBRARY, AND LAYOUT STRUCTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT - In a layout structure of a standard cell including off transistors | 02-10-2011 |
20110079823 | VERTICAL TRANSISTOR AND ARRAY OF VERTICAL TRANSISTOR - A vertical transistor includes a substrate, a gate, a source region, a drain region, a channel region and a gate dielectric layer. A trench is formed in the substrate, and the gate is disposed in the trench. The source region is disposed in the substrate beneath the gate. The drain region is disposed above the gate. The channel region is disposed at two sides of the gate and located between the source region and the drain region. The gate dielectric layer is located between the gate and the channel region. | 04-07-2011 |
20110084313 | Methods for Manufacturing Dense Integrated Circuits - One inventive aspect relates to a method for forming integrated circuits and circuits obtained therewith. The method of forming a circuit pattern in a device layer of a semiconductor substrate comprises decomposing the circuit pattern in two constituent orthogonal subpatterns. The method further comprises transferring the pattern of a first subpattern to a hard mask layer overlying the device layer. The method further comprises transferring the pattern of the other subpattern to a photosensitive layer overlying the patterned hard mask layer. The method further comprises patterning the device layer using the patterned hard mask layer and the patterned photosensitive layer as a mask. The method further comprises removing the patterned hard mask layer and the patterned photosensitive layer. Furthermore memory or logic circuits obtained using the above technique are described. | 04-14-2011 |
20110108888 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A semiconductor device includes a first mono-crystallized layer including first transistors, and a first metal layer forming at least a portion of connections between the first transistors; and a second layer including second transistors, the second transistors including mono-crystalline material, the second layer overlying the first metal layer, wherein the first metal layer includes aluminum or copper, and wherein the second layer is less than one micron in thickness and includes logic cells. | 05-12-2011 |
20110121366 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A semiconductor device includes a first single crystal silicon layer including first transistors, a first alignment mark, and at least one metal layer overlying the first single crystal silicon layer for interconnecting the first transistors; a second layer overlying the at least one metal layer, wherein the second layer includes a plurality of second transistors; and a connection path connecting the first transistors and the second transistors and including at least a first strip, a second strip, and a through via connecting the first strip and the second strip, wherein the second strip is substantially orthogonal to the first strip and wherein the through via is substantially away from both ends of the first strip and both ends of the second strip. | 05-26-2011 |
20110133253 | SEMICONDUCTOR DEVICE - A layout of a semiconductor device is capable of reliably reducing a variation in gate length due to the optical proximity effect, and enables flexible layout design to be implemented. Gate patterns (G | 06-09-2011 |
20110204419 | INTEGRATED CIRCUITS INCLUDING MULTI-GATE TRANSISTORS LOCALLY INTERCONNECTED BY CONTINUOUS FIN STRUCTURE AND METHODS FOR THE FABRICATION THEREOF - Embodiments of an integrated circuit are provided. In one embodiment, the integrated circuit includes a substrate and a plurality of locally interconnected multi-gate transistors. The plurality of locally interconnected multi-gate transistors includes a continuous fin structure formed on the substrate and first and second multi-gate transistors formed on the substrate and including first and second fin segments of the continuous fin structure, respectively. The continuous fin structure electrically interconnects the first and second multi-gate transistors. | 08-25-2011 |
20110227133 | SEMICONDUCTOR DEVICE AND STANDARD CELL - According to the embodiments, standard cells are arranged in an array in a semiconductor device. In the standard cell, a first diffusion area with a plurality of transistors formed in a main surface region of a semiconductor substrate is formed in a region sandwiched between two power supply lines arranged on the semiconductor substrate. Further, the standard cell includes a potential supplying unit. The potential supplying unit is formed in the main surface region of the semiconductor substrate by a diffusion layer of the same conductive type as that of the first diffusion area and is electrically connected directly to the diffusion area through a contact from the lower portion of the power supply line, to supply a potential from the power supply line to the first diffusion area. | 09-22-2011 |
20110272745 | SEMICONDUCTOR MEMORY AND METHOD OF MANUFACTURING THE SAME - A semiconductor memory includes a plurality of stripe-like active areas formed by stacking, in a direction perpendicular to a substrate, a plurality of layers extending parallel to the substrate, a first gate electrode formed on first side surfaces of the active areas, the first side surfaces being perpendicular to the substrate, a second gate electrode formed on second side surfaces of the active areas, the second side surfaces being perpendicular to the substrate. The layers are patterned in self-alignment with each other, intersections of the active areas and the first gate electrode form a plurality of memory cells, and the plurality of memory cells in an intersecting plane share the first gate electrode. | 11-10-2011 |
20110298010 | Cell Library, Integrated Circuit, and Methods of Making Same - A cell library intended to be used to form an integrated circuit, this library defining a first cell including a first MOS transistor of minimum dimensions, and a second cell including a second MOS transistor of lower leakage current, wherein the second cell takes up the same surface area as the first cell, and the second MOS transistor has a gate of same length as the gate of the first MOS transistor across at least a first width in its central portion, and of greater length across at least a second width on either side of the central portion. | 12-08-2011 |
20110298011 | Semiconductor Memory Device And System Having Stacked Semiconductor Layers - Example embodiments relate to a semiconductor memory device and a system in which a plurality of semiconductor layers are stacked on each other. A 3-dimensional (3D) semiconductor memory device may include a plurality of semiconductor layers that are stacked on each other. The plurality of semiconductor layers may have the same memory cell structure. The 3D semiconductor memory device may include a first memory region including at least one semiconductor layer for storing system data and a second memory region including at least one semiconductor layer for storing data aside from the system data. The system data may include at least one piece of data selected from the group consisting of a booting code, a system code, and application software. | 12-08-2011 |
20110298012 | SEMICONDUCTOR INTEGRATED CIRCUIT - A semiconductor integrated circuit according to one aspect of the present invention may includes a plurality of driving circuits to drive a respective plurality of word lines with either a first voltage supplied from a first power supply or a second voltage supplied from a second power supply in accordance with a control signal, and a plurality of gate transistors in each of which a gate is connected to one of the plurality of word lines, and a connection state between a storage node and a bit line is changed based on the voltage provided to the word line connected to the gate. In the semiconductor integrated circuit, a gate oxide film of each of the plurality of gate transistors is thinner than a gate oxide film of each of transistors constituting the plurality of driving circuits. | 12-08-2011 |
20110316052 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - In addition to a memory macro region and functional circuit regions on a substrate, a semiconductor integrated circuit device includes a dummy pattern region | 12-29-2011 |
20120012895 | SYSTEM COMPRISING A SEMICONDUCTOR DEVICE AND STRUCTURE - A system includes a semiconductor device. The semiconductor device includes a first semiconductor layer comprising first transistors, wherein the first transistors are interconnected by at least one metal layer comprising aluminum or copper. The second mono-crystallized semiconductor layer includes second transistors and is overlaying the at least one metal layer, wherein the second mono-crystallized semiconductor layer is less than 150 nm in thickness, and at least one of the second transistors is an N-type transistor and at least one of the second transistors is a P-type transistor. | 01-19-2012 |
20120061731 | NONVOLATILE PROGRAMMABLE LOGIC SWITCHES AND SEMICONDUCTOR INTEGRATED CIRCUIT - A nonvolatile programmable logic switch according to an embodiment includes: a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type; a memory cell transistor including a first insulating film formed on the first semiconductor region, a charge storage film formed on the first insulating film, a second insulating film formed on the charge storage film, and a control gate formed on the second insulating film; a pass transistor including a third insulating film formed on the second semiconductor region, and a gate electrode formed on the third insulating film and electrically connected to the first drain region; a first electrode applying a substrate bias to the first semiconductor region, the first electrode being formed in the first semiconductor region; and a second electrode applying a substrate bias to the second semiconductor region, the second electrode being formed in the second semiconductor region. | 03-15-2012 |
20120074466 | 3D MEMORY ARRAY WITH VERTICAL TRANSISTOR - A memory array includes a base circuitry layer and a plurality of memory array layers stacked sequentially to form the memory array. Each memory array layer is electrically coupled to the base circuitry layer. Each memory array layer includes a plurality of memory units. Each memory unit includes a vertical pillar transistor electrically coupled to a memory cell. | 03-29-2012 |
20120168824 | NON-VOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME - A non-volatile memory device including a memory string including a plurality of memory cells coupled in series. The non-volatile memory device includes the memory string including a first semiconductor layer and a second conductive layer with a memory gate insulation layer therebetween, a first selection transistor comprising a second semiconductor layer coupled with one end of the first semiconductor layer, a second selection transistor comprising a third semiconductor layer coupled with the other end of the first semiconductor layer, and a fourth semiconductor layer contacting the first semiconductor layer in a region where the second conductive layer is not disposed. | 07-05-2012 |
20120205719 | DOUBLE GATED 4F2 DRAM CHC CELL AND METHODS OF FABRICATING THE SAME - A semiconductor device is provided that includes a fin having a first gate and a second gate formed on a first sidewall of the fin in a first trench, wherein the first gate is formed above the second gate. The device includes a third gate and a fourth gate formed on a second sidewall of the fin in a second trench, wherein the third gate is formed above the fourth gate. Methods of manufacturing and operating the device are also included. A method of operation may include biasing the first gate and the fourth gate to create a current path across the fin. | 08-16-2012 |
20120205720 | TANTALUM SILICON OXYNITRIDE HIGH-K DIELECTRICS AND METAL GATES - Electronic apparatus and methods of forming the electronic apparatus include a tantalum silicon oxynitride film on a substrate for use in a variety of electronic systems. The tantalum silicon oxynitride film may be structured as one or more monolayers. The tantalum silicon oxynitride film may be formed using a monolayer or partial monolayer sequencing process. Metal electrodes may be disposed on a dielectric containing a tantalum silicon oxynitride film. | 08-16-2012 |
20120217549 | ASYMMETRIC SEMICONDUCTOR MEMORY DEVICE HAVING ELECTRICALLY FLOATING BODY TRANSISTOR - Asymmetric, semiconductor memory cells, arrays, devices and methods are described. Among these, an asymmetric, bi-stable semiconductor memory cell is described that includes: a floating body region configured to be charged to a level indicative of a state of the memory cell; a first region in electrical contact with the floating body region; a second region in electrical contact with the floating body region and spaced apart from the first region; and a gate positioned between the first and second regions, such that the first region is on a first side of the memory cell relative to the gate and the second region is on a second side of the memory cell relative to the gate; wherein performance characteristics of the first side are different from performance characteristics of the second side. | 08-30-2012 |
20120313147 | Semiconductor Device and Method of Forming a Power MOSFET With Interconnect Structure Silicide Layer and Low Profile Bump - A semiconductor device has a substrate with a source region and a drain region formed on the substrate. A silicide layer is disposed over the source region and drain region. A first interconnect layer is formed over the silicide layer and includes a first runner connected to the source region and second runner connected to the drain region. A second interconnect layer is formed over the first interconnect layer and includes a third runner connected to the first runner and a fourth runner connected to the second runner. An under bump metallization (UBM) is formed over and electrically connected to the second interconnect layer. A mask is disposed over the substrate with an opening in the mask aligned over the UBM. A conductive bump material is deposited within the opening in the mask. The mask is removed and the conductive bump material is reflowed to form a bump. | 12-13-2012 |
20120319172 | CHARGE-TRAP BASED MEMORY - Methods of fabricating 3D charge-trap memory cells are described, along with apparatus and systems that include them. In a planar stack formed by alternate layers of electrically conductive and insulating material, a substantially vertical opening may be formed. Inside the vertical opening a substantially vertical structure may be formed that comprises a first layer, a charge-trap layer, a tunneling oxide layer, and an epitaxial silicon portion. Additional embodiments are also described. | 12-20-2012 |
20130087834 | GATE ARRAY ARCHITECTURE WITH MULTIPLE PROGRAMMABLE REGIONS - Systems and methods are disclosed for forming a custom integrated circuit (IC) with a first fixed (non-programmable) region on a wafer with non-customizable mask layers, wherein the first fixed region includes multiplicities of transistors and a first interconnect layer and a second interconnect layer above the first interconnect layer which form base cells; and a programmable region above the first fixed region with customizable mask layers, wherein at least one mask layer in the programmable region is coupled to the second interconnect layer which provides electrical access to all transistor nodes of the base cells and wherein the programmable region comprises a third interconnect layer coupled to the customizable mask layers to customize the IC. A second fixed region may be formed above the programmable region to provide multiple fixed regions and reduce the number of required masks in customizing the custom IC. | 04-11-2013 |
20130200436 | Integrated Circuit with Gate Electrode Conductive Structures Having Offset Ends - A first linear-shaped conductive structure (LSCS) forms gate electrodes of a first p-transistor and a first n-transistor. A second LSCS forms a gate electrode of a second p-transistor. A third LSCS forms a gate electrode of a second n-transistor, and is separated from the second LSCS by a first end-to-end spacing (EES). A fourth LSCS forms a gate electrode of a third p-transistor. A fifth LSCS forms a gate electrode of a third n-transistor, and is separated from the fourth LSCS by a second EES. A sixth LSCS forms gate electrodes of a fourth p-transistor and a fourth n-transistor. An end of the second LSCS adjacent to the first EES is offset from an end of the fourth LSCS adjacent to the second EES, and/or an end of the third LSCS adjacent to the first EES is offset from an end of the fifth LSCS adjacent to the second EES. | 08-08-2013 |
20130248936 | Programmable substrate and applications thereof - An integrated circuit die includes a semiconductor substrate and a plurality of electronic circuits on the semiconductor substrate. The semiconductor substrate is divided into a plurality of regions. A first region of the substrate supports a first type of electronic circuit and has first permittivity, permeability, and conductivity characteristics. A second region of the substrate supports a second type of electronic circuit and has second permittivity, permeability, and conductivity characteristics. | 09-26-2013 |
20130307028 | NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME - A nonvolatile memory device includes cell strings, each including a plurality of memory cells over a substrate, extending in a direction, channel layers, connected with one sides and the other sides of the cell strings, extending in another direction perpendicular to the substrate, select gate electrodes, located over the cell strings, surrounding side surfaces of the channel layers with a gate dielectric layer interposed therebetween, and conductive lines connected with upper ends of the channel layers. | 11-21-2013 |
20130320405 | SEMICONDUCTOR DEVICE HAVING DECOUPLING CAPACITORS AND DUMMY TRANSISTORS - A semiconductor device includes a logic region disposed in a central region of the semiconductor device, and a peripheral region disposed in an outer region thereof. The logic region includes a line-shaped logic transistor and a box-shaped decoupling capacitor. The peripheral region includes a line-shaped peripheral transistor and a line-shaped peripheral dummy transistor disposed adjacent to the peripheral transistor. | 12-05-2013 |
20130334576 | Gate array architecture with multiple programmable regions - An integrated circuit includes a gate array layer having a two-dimensional array of logic gates, each logic gate including multiple transistors. At least one upper template-based metal layer is coupled to the gate array layer and is configured to define at least one of a power distribution network, a clock network and a global signal network. A configuration of traces attic upper template-based metal layer is at least mainly predetermined prior to design of the integrated circuit. | 12-19-2013 |
20140077269 | COMPACT REGULAR RECONFIGURABLE FABRICS - Described herein are compact regular programmable fabrics for improved logic density, yield, reliability, performance and power consumption compared with existing programmable fabric based VLSI design. Programmable fabrics facilitate technology transition from current silicon lithographic VLSI design to future non-silicon self-assembled nanoscale device based VLSI design. | 03-20-2014 |
20140097474 | SPIN MOSFET AND RECONFIGURABLE LOGIC CIRCUIT - A spin MOSFET includes a first ferromagnetic layer having a fixed magnetization direction, a first tunnel barrier, a second ferromagnetic layer having a variable magnetization direction, and a nonmagnetic semiconductor layer provided in that order on a substrate. The nonmagnetic semiconductor layer has lower and upper faces and a side faces serving as a channel. A third ferromagnetic layer having a fixed magnetization direction is provided on the upper face of the nonmagnetic semiconductor layer, wherein the magnetization direction of each of the first to third ferromagnetic layers is in parallel or antiparallel to a direction from the third ferromagnetic layer to the first ferromagnetic layer. A nonmagnetic layer is provided on the third ferromagnetic layer, and a gate insulating film and gate electrode are provided in that order on the side face of the nonmagnetic semiconductor layer. | 04-10-2014 |
20140197463 | METAL-PROGRAMMABLE INTEGRATED CIRCUITS - A metal-programmable integrated circuit may include an array of metal-programmable cells. Each cell may include multi-gate transistor structures in which multiple surfaces of a gate structure serve to control current flow through at least one channel structure. The multi-gate transistor structures may form one or more fin-shaped field effect transistors. The gate structure may at least partially enclose multiple channel structures. Pairs of source-drain structures may be coupled to the channel structures. The transistor structures of each cell may be formed in a substrate covered with one or more metal interconnect layers. Paths formed in the metal interconnect layers may configure the cells to perform desired logic functions. The paths associated with a given cell may be selectively coupled to transistor structures of the cell to configure the cell for a desired logic function and/or for desired output drive strength. | 07-17-2014 |
20150091064 | 3D SEMICONDUCTOR DEVICE AND 3D LOGIC ARRAY STRUCTURE THEREOF - A 3D semiconductor device and a 3D logic array structure thereof are provided. The 3D semiconductor device includes an array structure, a periphery line structure and a 3D logic array structure. The array structure has Y contacts located at a side of the array structure. Y is within M | 04-02-2015 |
20160163736 | GATE ARRAY FOR HIGH-SPEED CMOS AND HIGH-SPEED CMOS TTL FAMILY - A system for implementing an integrated circuit(IC) is provided. The system includes one or more base layers. By using one or more single base layers integrated circuit can be made for a high-speed CMOS (HC) and high-speed CMOS TTL (transistor-transistor logic) compatible (HCT) families. A base layers may be fixed and just one or more metal patterns may be changed for respective integrated circuit (IC). A wafer bank includes large number of transistors to implement one or more circuits by changing the metal pattern required and can make the required circuit. | 06-09-2016 |
20160190125 | Semiconductor Device Having Switchable Regions with Different Transconductances - A semiconductor device includes a semiconductor substrate having an outer rim, a plurality of switchable cells defining an active area, and an edge termination region arranged between the switchable cells and the outer rim. Each of the switchable cells includes a gate electrode structure. The semiconductor device further includes a gate metallization in contact with the gate electrode structure. The active area includes at least a first switchable region having a first specific transconductance and at least a second switchable region having a second specific transconductance which is different from the first specific transconductance. The second switchable region is arranged between the gate metallization and the first switchable region. A ratio of the area of the second switchable region to the total area of the switchable regions is in a range from 5% to 50%. | 06-30-2016 |
20180024400 | ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, REPAIRING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE | 01-25-2018 |