Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


In array having structure for use as imager or display, or with transparent electrode

Subclass of:

257 - Active solid-state devices (e.g., transistors, solid-state diodes)

257049000 - NON-SINGLE CRYSTAL, OR RECRYSTALLIZED, SEMICONDUCTOR MATERIAL FORMS PART OF ACTIVE JUNCTION (INCLUDING FIELD-INDUCED ACTIVE JUNCTION)

257052000 - Amorphous semiconductor material

257057000 - Field effect device in amorphous semiconductor material

Patent class list (only not empty are listed)

Deeper subclasses:

Entries
DocumentTitleDate
20110198600METHOD FOR MAKING SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS OBTAINED BY THE METHOD, METHOD FOR MAKING THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR SUBSTRATE OBTAINED BY THE METHOD, AND METHOD FOR MAKING DISPLAY APPARATUS AND DISPLAY APPARATUS OBTAINED BY THE METHOD - A semiconductor apparatus having a substrate and a laminate structure formed on the substrate, the laminate structure including an insulating film made of a metal oxide and a semiconductor thin film, both the insulating film and the semiconductor thin film being crystallized.08-18-2011
20090230399ACTIVE MATRIX SUBSTRATE AND ITS MANUFACTURING METHOD - An active matrix substrate with a high aperture ratio is provided, which is capable of preventing electrical short circuits between pixel electrodes and auxiliary capacitive electrodes. Gate lines and auxiliary capacitive electrodes are formed on an insulated substrate. The auxiliary capacitive electrodes have holes formed therethrough. To cover the gate lines and the auxiliary capacitive electrodes, a first interlayer insulating film is formed, on which source lines, a semiconductor layer, and drain electrodes are formed. Then, a second interlayer insulating film is formed to cover all those layers. In the second interlayer insulating film, contact holes are formed to reach the drain electrodes in areas corresponding to the areas of the holes. Pixel electrodes formed on the second interlayer insulating film are connected to the drain electrodes through the contact holes.09-17-2009
20090230395THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor substrate and a method for manufacturing the same are provided. The thin film transistor substrate has a display area and a pad area defined in the vicinity of the display area, and includes a signal line formed in the display area and a signal pad formed in the pad area, and at least one connecting line which connects the signal line and the signal pad and includes a first line and a second line disposed on the first line. In addition, at least one of the first line and the second line has centrally isolated, spaced apart stepped structures.09-17-2009
20090230398THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF REPAIRING THE SAME - A thin-film transistor substrate includes; gate lines which extend in a first direction, the gate lines including a first gate line and a second gate line, the first gate line disposed adjacent to and previous to the second gate line, data lines which are insulated from the gate lines and extend in a second direction perpendicular to the first direction, a pixel electrode formed in a region where the first gate line and the second gate lines cross the data lines and connected to the second gate line, and a repair pattern which at least partially overlaps the first gate line, the repair pattern comprising a plurality of connection patterns, wherein the connection patterns extend from the pixel electrode in the second direction toward the first gate line, have a predetermined width measured in the first direction, and are arranged at predetermined intervals along the first direction.09-17-2009
20120199836THIN FILM TRANSISTOR AND METHOD FOR PRODUCING THE SAME - The present invention provides a method of manufacturing a thin film transistor of a top-contact structure with suppressed deterioration by a process which is easy and suitable for increase in area without damaging an organic semiconductor pattern. The organic semiconductor pattern is formed on a substrate. An electrode material film is formed on the substrate so as to cover the organic semiconductor pattern. A resist pattern is formed on the electrode material film. By wet etching using the resist pattern as a mask, the electrode material film is patterned. By the process, a source electrode and a drain electrode are formed.08-09-2012
20130043478Display Device and Controlling Method Thereof - A conventional setting voltage was a value with an estimated margin of a characteristic change of a light emitting element. Therefore, a voltage between the source and drain of a driver transistor V02-21-2013
20130043477ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An array substrate for a liquid crystal display device comprises: gate and data lines crossing each other on a substrate to define a pixel region; a common line spaced apart from and parallel with the gate line; a thin film transistor in the pixel region and connected to the gate and data lines; a passivation layer on the thin film transistor; and pixel and common electrodes alternately arranged to produce an in-plane electric field, wherein each of the pixel and common electrodes has a double-layered structure of which the lower layer is formed of reflective conductive material and the upper layer is formed of transparent conductive material.02-21-2013
20130043476THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE COMPRISING THE SAME - The invention provides a thin film transistor substrate and a display device including the same. The thin film transistor substrate includes: a substrate; a gate line, a gate insulating layer and an active layer sequentially formed on the substrate; a source and a drain simultaneously formed on the active layer to from a thin film transistor; an insulation layer formed on the thin film transistor, wherein a via is formed in the insulation layer, and the via is formed on a portion of the drain and a portion of the active layer to expose the portion of the drain and the active layer; and a pixel electrode formed in the via and on the insulation layer, wherein the pixel electrode is electrically connected to the drain through the via.02-21-2013
20130043475TRANSISTORS AND ELECTRONIC DEVICES INCLUDING THE TRANSISTORS - A transistor may include a light-blocking layer that blocks light incident on a channel layer. The light-blocking layer may include a carbon-based material. The carbon-based material may include graphene oxide, graphite oxide, graphene or carbon nanotube (CNT). The light-blocking layer may be between a gate and at least one of the channel layer, a source and a drain.02-21-2013
20130043472THIN FILM TRANSISTOR ARRAY STRUCTURE AND MANUFACTURING METHOD THEREOF - A thin film transistor (TFT) array structure for a liquid crystal display (LCD) includes a panel, a first conductive layer, a middle layer, a second conductive layer, a passivation layer, and a black electrode layer. The first conductive layer is formed on the panel using filming technologies and a first photo-mask process. The middle layer is deposited and formed on the first conductive layer using a second photo-mask process. The second conductive layer is formed on the middle layer using a third photo-mask process and a first etching operation. The passivation layer is deposited and formed on the middle layer and the second conductive layer using a forth photo-mask process and a second etching operation. The black electrode layer formed on the passivation layer. The TFT array structure and the manufacturing method of the present disclosure reduce the consumption of the voltage and improve the display effect of the LCD.02-21-2013
20130043474ACTIVE ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - Disclosed herein is a method for manufacturing an active array substrate. The method includes the steps of: forming a first patterned metal layer on a substrate; sequentially forming a semiconductor layer, an insulating layer and a second metal layer to cover the first patterned metal layer; forming a patterned photoresist layer on the second metal layer; patterning the second metal layer, the insulating layer and the semiconductor layer to form a second patterned metal layer, a patterned insulating layer and a patterned semiconductor layer, and removing a portion of the patterned photoresist layer; heating the remained portion of the patterned photoresist layer such that the remained portion is fluidized and transformed into a protective layer; and forming a pixel electrode.02-21-2013
20130043473DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a data line, a gate line and a fan-out line. The data line is disposed in a display area of a base substrate and transfers a data signal to a switching element electrically connected to a pixel electrode. The gate line is disposed in the display area and transfers a gate signal to the switching element. The fan-out line is disposed in a peripheral area of the base substrate surrounding the display area, electrically connected to at least one of the data line and the gate line, and includes a plurality of conductive layers making contact with each other through a contact hole.02-21-2013
20120161138SEMICONDUCTOR TRANSISTOR MANUFACTURING METHOD, DRIVING CIRCUIT UTILIZING A SEMICONDUCTOR TRANSISTOR MANUFACTURED ACCORDING TO THE SEMICONDUCTOR TRANSISTOR MANUFACTURING METHOD, PIXEL CIRCUIT INCLUDING THE DRIVING CIRCUIT AND A DISPLAY ELEMENT, DISPLAY PANEL HAVING THE PIXEL CIRCUITS DISPOSED IN A MATRIX, DISPLAY APPARATUS PROVIDED WITH THE DISPLAY PANEL - Provided is a manufacturing method for a semiconductor transistor comprising: forming a resist layer containing resist material on a base layer including a substrate; patterning the resist layer to form apertures therein; forming a metal layer by disposing metallic material to cover the resist layer and to fill the apertures formed in the resist layer; removing a metal oxide layer formed by oxidation of a top surface of the metal layer by performing cleaning by using a cleaning liquid; forming the source electrode and the drain electrode by removing the resist layer by using a dissolution liquid different from the cleaning liquid, the source electrode and the drain electrode constituted of the metallic material having been disposed in the apertures; and forming a semiconductor layer so as to cover the source electrode and the drain electrode.06-28-2012
20110204371SEMICONDUCTOR DEVICE - An object of the invention is to improve the accuracy of light detection in a photosensor, and to increase the light-receiving area of the photosensor. The photosensor includes: a light-receiving element which converts light into an electric signal; a first transistor which transfers the electric signal; and a second transistor which amplifies the electric signal. The light-receiving element includes a silicon semiconductor, and the first transistor includes an oxide semiconductor. The light-receiving element is a lateral-junction photodiode, and an n-region or a p-region included in the light-receiving element overlaps with the first transistor.08-25-2011
20100006845LIGHT-EMITTING DEVICE AND ELECTRONIC DEVICE USING THE SAME - A lightweight flexible light-emitting device which is able to possess a curved display portion and display a full color image with high resolution and the manufacturing process thereof are disclosed. The light-emitting device comprises: a plastic substrate; an insulating layer with an adhesive interposed therebetween; a thin film transistor over the insulating layer; a protective insulating film over the thin film transistor; a color filter over the protective insulating film; and a white-emissive light-emitting element formed over and being in contact with the thin film transistor.01-14-2010
20110140111THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel is provided and includes a gate line, a gate insulating layer covering the gate line, a semiconductor layer disposed on the gate insulating layer, and a data line and a drain electrode disposed on the semiconductor layer. The data line and the drain electrode have a dual-layered structure including a lower layer and an upper layer with the lower layer having a first portion protruded outside the upper layer and the semiconductor layer having a second portion protruded outside the edge of the lower layer.06-16-2011
20130134427TRANSISTOR, DISPLAY, AND ELECTRONIC APPARATUS - A transistor includes: a gate electrode; a semiconductor layer facing the gate electrode with an insulating layer in between; a pair of source-drain electrodes electrically connected to the semiconductor layer; and a contact layer provided in a moving path of carriers between each of the pair of source-drain electrodes and the semiconductor layer, the contact layer having end surfaces covered with the source-drain electrode.05-30-2013
20130134425ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A manufacturing method of an array substrate includes the following steps. A gate electrode and a gate insulator layer are successively formed on a substrate. A semiconductor layer, an etching stop layer, a hard mask layer, and a second patterned photoresist are successively formed on the gate insulator layer. The second patterned photoresist is employed for performing an over etching process to the hard mask layer to form a patterned hard mask layer. The second patterned photoresist is employed for performing a first etching process to the etching stop layer. The second patterned photoresist is then employed for performing a second etching process to the semiconductor layer to form a patterned semiconductor layer. The etching stop layer uncovered by the patterned hard mask layer is then removed for forming a patterned etching stop layer.05-30-2013
20130075736THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor array panel includes: an substrate; a gate line and a gate pad portion disposed on the substrate; a gate insulating layer disposed on the gate line and the gate pad portion; a data line and a data pad portion disposed on the gate insulating layer; a gate assistance pad portion disposed at a position corresponding to the gate pad portion; a first insulating layer disposed on the data line and removed at the gate pad portion and the data pad portion; a first field generating electrode disposed on the first insulating layer; a second insulating layer disposed on the first field generating electrode and removed at the gate pad portion and the data pad portion; and a second field generating electrode disposed on the second insulating layer. The assistance gate pad portion and the gate insulating layer include a contact hole exposing the gate pad portion.03-28-2013
20130075738Display Device and Electronic Device Using the Same - A display device with a compensation circuit that applies a fixed potential constantly to a gate electrode of a driving transistor for a certain period is provided. Specifically, each difference voltage value between an anode and a cathode of the light emitting element is utilized in the case where the light emitting element emits light and emits no light. In a case where the light emitting element emits light, a potential of the gate electrode of the driving transistor is to be held; and in a case where the light emitting element emits no light, a potential that certainly turns off the gate electrode of the driving transistor is kept on applying to the gate electrode of the driving transistor.03-28-2013
20080308803Thin film transistor and display panel having the same - A thin film transistor includes a gate part which includes a gate electrode and a light blocking electrode extending from the gate electrode. The light blocking electrode prevents a light provided from beneath the gate electrode from being guided to a semiconductor layer. The light blocking electrode is overlapped by two source electrodes and a drain electrode arranged between the two source electrodes, all of which have an I-shape. The width of the light blocking electrode is selected so that a parasitic capacitance between a source part and the gate part may be controlled. Thus, a photocurrent of the thin film transistor may be reduced, and a kickback voltage difference between pixels in the display panel may also be reduced.12-18-2008
20110193089PIXEL STRUCTURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING ELECTRONIC DEVICE - A pixel structure including a substrate, a gate, an insulation layer, a metal oxide semiconductor (MOS) layer, a source and a drain, at least one film layer, and a first electrode layer is provided. The gate is disposed on the substrate. The insulation layer covers the gate. The MOS layer is disposed on the insulation layer above the gate. The source and the drain are disposed on the MOS layer. The film layer covers the MOS layer and includes a transparent photocatalytic material, wherein the transparent photocatalytic material blocks ultraviolet light from reaching the MOS layer. The first electrode layer is electrically connected to the source or the drain.08-11-2011
20100148177DISPLAY DEVICE - A display device including an inverter circuit and a switch is provided. The inverter circuit includes a first thin film transistor and a second thin film transistor which have the same conductivity type. The first thin film transistor and the second thin film transistor each include: a gate insulating layer in contact with a gate electrode; a microcrystalline semiconductor layer in contact with the gate insulating layer; a mixed layer in contact with the microcrystalline semiconductor layer; a layer which includes an amorphous semiconductor and is in contact with the mixed layer; and a wiring. A conical or pyramidal microcrystalline semiconductor region and an amorphous semiconductor region filling a space except the conical or pyramidal microcrystalline semiconductor region are included in the mixed layer.06-17-2010
20090078939Display device and method for manufacturing the same - To provide a display device which can realize high performance of a field-effect transistor which forms a pixel of the display device and which can achieve improvement in an aperture ratio of a pixel, which has been reduced due to increase in the number of field-effect transistors, and reduction in the area of the field-effect transistor which occupies the pixel, without depending on a microfabrication technique of the field-effect transistor, even when the number of field-effect transistors in the pixel is increased. A display device is provided with a plurality of pixels in which a plurality of field-effect transistors including a semiconductor layer which is separated from a semiconductor substrate and is bonded to a supporting substrate having an insulating surface are stacked with a planarization layer interposed therebetween.03-26-2009
20100163879Array substrate for liquid crystal display device and method of fabricating the same - A method of fabricating a liquid crystal display device includes: a first step of attaching a polarizing plate to an outer surface of a liquid crystal panel; a second step of attaching a tape carrier package (TCP) to the liquid crystal panel; a third step of coating a resin onto a rear surface of the TCP and a connection portion of the liquid crystal panel and the TCP; a fourth step of inspecting the TCP and the liquid crystal display panel; a fifth step of inserting the liquid crystal panel into a transferring means; a sixth step of transferring the transferring means; a seventh step of extracting the liquid crystal panel from the transferring means; a eighth step of attaching the TCP to a printed circuit board (PCB); a ninth step of inspecting the PCB, the TCP and the liquid crystal panel; and a tenth step of assembling the liquid crystal panel and a backlight unit with a plurality of frames.07-01-2010
20130037815SEMICONDUCTOR DEVICE - A semiconductor device (02-14-2013
20130037811TRANSFLECTIVE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a transflective liquid crystal display device includes: a substrate; a gate line and a data line on the substrate, the gate line and the data line crossing each other to define a pixel region including a transmissive area and a reflective area surrounding the transmissive area; a thin film transistor having a gate insulating layer, the thin film transistor electrically connected to the gate line and the data line; a first passivation layer having a drain contact hole exposing a drain electrode of the thin film transistor and a through hole exposing the substrate in the transmissive area; a pixel electrode on the first passivation layer, the pixel electrode contacting the substrate in the transmissive area through the through hole; and a reflective plate on the pixel electrode, the reflective plate being electrically connected to the drain electrode through the drain contact hole and to the pixel electrode.02-14-2013
20130037812THIN-FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY INCLUDING THE SAME AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor array substrate is disclosed. In one embodiment, the transistor includes a capacitor including a lower electrode disposed on the same layer as an active layer and an upper electrode disposed on the same layer as a gate electrode. The transistor may also include a first insulating layer disposed between the active layer and the gate electrode and between the lower and upper electrodes, the first insulating layer not being disposed on a perimeter of the lower electrode. The transistor may further include a second insulating layer between the first insulating layer and the source and drain electrodes, the second insulating layer not being disposed on perimeters of the upper and lower electrodes.02-14-2013
20130037814THIN FILM TRANSISTOR, METHOD FABRICATING THEREOF, LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - A thin-film transistor array substrate and a fabrication method thereof according to an embodiment of the present invention are disclosed to form an interlayer insulating layer, thereby reducing a failure occurred during the process subsequent to a gate electrode. The thin-film transistor disclosed according to the present invention may include a substrate, a gate electrode formed on the substrate, a planarized insulating layer formed at a lateral surface portion of the gate electrode and at an upper portion of the substrate, a gate insulating layer formed on the planarized insulating layer containing an upper portion of the gate electrode, an active layer formed at an upper portion of the planarized insulating layer located at an upper side of the gate electrode, and a source electrode and a drain electrode formed on the active layer and separated from each other based on a channel region.02-14-2013
20130037813CRYSTALLIZATION METHOD OF THIN FILM TRANSISTOR, THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL - Exemplary embodiments of the invention disclose a method of manufacturing a thin film transistor array panel having reduced overall processing time and providing a uniform crystallization. Exemplary embodiments of the invention also disclose a crystallization method of a thin film transistor, including forming on a substrate a semiconductor layer including a first pixel area, a second pixel area, and a third pixel area. The crystallization method includes crystallizing a portion of the semiconductor layer corresponding to a channel region of a thin film transistor using a micro lens array.02-14-2013
20100163875PIXEL PERFORMANCE IMPROVEMENT BY USE OF A FIELD SHIELD - A pixel cell (07-01-2010
20100072478Flat panel display - A flat panel display that can prevent a voltage drop of a driving power and, at the same time, minimizes the characteristic reduction of electronic devices located in a circuit region where various circuit devices are located includes: a substrate; an insulating film arranged on the substrate; a pixel region including at least one light emitting diode, the pixel region arranged on the insulating film and adapted to display an image; a circuit region arranged on the insulating film and including electronic devices adapted to control signals supplied to the pixel region; and a conductive film interposed between the substrate and the insulating film in a region corresponding to the pixel region and electrically connected to one electrode of the light emitting diode.03-25-2010
20100072477Liquid crystal display device - A liquid crystal display device includes a first substrate and a second substrate facing each other having a pixel region; a color filter layer on the first substrate corresponding to the pixel region; a planarization layer on the color filter layer having a groove; a common electrode on the planarization layer; a pixel electrode on the second substrate; and a liquid crystal layer between the common electrode and the pixel electrode.03-25-2010
20100072476PIXEL STRUCTURE, DISPLAY PANEL, PHOTOELECTRIC DEVICE AND MANUFACTURING METHOD THEREOF - A pixel structure includes a substrate, a first and a second patterned conductive layers, and a pixel electrode. The first patterned conductive layer, disposed on the substrate, includes at least one scan line, at least one gate, and at least one common electrode line. The second patterned conductive layer, disposed on the first patterned conductive layer, includes at least one data line, at least one source/drain, and at least one first patterned layer partly disposed on the common electrode line. The pixel electrode, disposed on the second patterned conductive layer, includes at least one first part and one second part. The first part partly covers the first patterned layer and the common electrode line. The second part, connected to the source/drain, covers the other part of the first patterned layer. The first and second patterned layers compose at least one first capacitance.03-25-2010
20100072479LCD Pixel Array Structure - Only five photomasks are used to fabricate a LCD pixel array structure. A gate dielectric layer of the LCD pixel array structure is formed by two deposition steps to increase the storage capacity of the storage capacitor.03-25-2010
20130207116SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention improves the aperture ratio of a pixel of a reflection-type display device or a reflection type display device without increasing the number of masks and without using a blackmask. A pixel electrode (08-15-2013
20090302320Display Device - An object of the present invention is to provide a display device where a semiconductor layer pattern formed between a pair of electrodes can be formed to a predetermined size, even in the case where the distance between the electrodes on top of a semiconductor layer pattern is relatively large in elements formed in accordance with a photoresist reflow technology. The present invention provides a display device where elements are formed on an insulating substrate, characterized in that the above described elements comprise: a semiconductor layer pattern formed on a main surface of the above described insulating substrate or an insulating film layer formed on the main surface; and a number of electrodes provided in parallel at a distance from each other on the above described semiconductor layer pattern, the above described number of electrodes are a first electrode, a second electrode and dummy electrodes located between the first electrode and the second electrode, and the above described number of electrodes are patterned so that a protrusion is formed, in which the above described electrodes are aligned at on least one end side of at least one of the facing sides.12-10-2009
20130032808DISPLAY DEVICE - A display device having a first pixel electrode and a second pixel electrode whose areas are different from each other is provided. In the display device, the first pixel electrode and the second pixel electrode are electrically connected to a first transistor and a second transistor, respectively. Gates of the first transistor and the second transistor are electrically connected to each other. A potential is supplied to the first pixel electrode and the second pixel electrode through a wiring electrically connected to the first transistor and the second transistor.02-07-2013
20130032803ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An OLED device includes an active layer on a substrate; a first insulating layer covering the active layer, and including a first opening and a first insulation island in the first opening, separated from an inner surface of the first opening; a gate electrode on the first insulating layer including gate bottom and top electrodes; a pixel electrode on the first insulation island on the same layer as the gate bottom electrode; source and drain electrodes insulated from the gate electrode and electrically connected to the active layer; a second insulating layer between the gate and the source and drain electrodes, and including a second opening exposing the pixel electrode; a light-reflecting portion in the openings, and surrounding the pixel electrode; an intermediate layer on the pixel electrode and including an organic emissive layer; and an opposite electrode facing the pixel electrode with the intermediate layer interposed between them.02-07-2013
20130032805THIN FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE SAME, AND MANUFACTURING METHOD OF THE THIN FILM TRANSISTOR ARRAY SUBSTRATE - A thin film transistor array substrate includes a thin film transistor on a substrate, the thin film transistor including an active layer, a gate electrode, a source electrode, and a drain electrode; a capacitor including a lower electrode in a same layer as the active layer and an upper electrode in a same layer as the gate electrode; a pixel electrode in a same layer as the gate electrode and the upper electrode; a first insulation layer between the active layer and the gate electrode and between the lower electrode and the upper electrode; a second insulation layer on the first insulation layer, a protection layer extending along side surfaces of the lower electrode, and a third insulation layer on the protection layer and exposing the pixel electrode.02-07-2013
20130032807CIRCUIT BOARD, METHOD OF MANUFACTURING CIRCUIT BOARD, DISPLAY, AND ELECTRONIC UNIT - A circuit board includes: a first wiring layer provided on a substrate; an insulating layer including an opening, the insulating layer being provided on the first wiring layer; a surface-energy control layer provided in a region opposed to the opening of the insulating layer on the first wiring layer, the surface-energy control layer controlling surface energy of the first wiring layer; a semiconductor layer provided in a selective region on the insulating layer; and a second wiring layer on the insulating layer, the second wiring layer being electrically connected to the semiconductor layer, and being electrically connected to the first wiring layer through the opening.02-07-2013
20130032806SEMICONDUCTOR DEVICE - Adverse effects of variation in threshold voltage are reduced. In a semiconductor device, electric charge is accumulated in a capacitor provided between a gate and a source of a transistor, and then, the electric charge accumulated in the capacitor is discharged; thus, the threshold voltage of the transistor is obtained. After that, current flows to a load. In the semiconductor device, the potential of one terminal of the capacitor is set higher than the potential of a source line, and the potential of the source line is set lower than the potential of a power supply line and the cathode side potential of the load.02-07-2013
20130032804THIN-FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY DEVICE COMPRISING THE THIN-FILM TRANSISTOR ARRAY SUBSTRATE, AND METHOD OF MANUFACTURING THE THIN-FILM TRANSISTOR ARRAY SUBSTRATE - A thin-film transistor (TFT) array substrate includes an active layer on a substrate and a lower electrode of a capacitor on the same level as the active layer, a first insulation layer on the active layer and the lower electrode and having a first gap exposing an area of the lower electrode; a gate electrode of the TFT on the first insulation layer, and an upper electrode of the capacitor on the lower electrode and the first insulation layer, the upper electrode having a second gap that exposes the first gap and a portion of the first insulation layer; a second insulation layer disposed between the gate electrode and source electrode and drain electrodes, and not disposed on the upper electrode, in the first gap of the first insulation layer, or in the second gap of the lower electrode.02-07-2013
20130032802THIN-FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY HAVING THE SAME, AND METHOD OF MANUFACTURING THE ORGANIC LIGHT-EMITTING DISPLAY - A thin-film transistor array substrate, an organic light-emitting display having the same, and a method of manufacturing the organic light-emitting display are disclosed. In one embodiment, the thin-film transistor array substrate includes a buffer layer formed on a substrate, a first insulating layer formed on the buffer layer, a pixel electrode formed on the first insulating layer using a transparent conductive material, an intermediate layer that covers an upper side and outer side-surfaces of the pixel electrode and includes a organic light-emitting layer, a gap formed by etching the first insulating layer and the buffer layer at a peripheral of the pixel electrode, and a facing electrode that is formed on an upper side and outer side-surfaces of the pixel electrode to cover the intermediate layer and the gap.02-07-2013
20130082265PIXEL STRUCTURE OF DISPLAY PANEL AND METHOD OF FABRICATING THE SAME - A pixel structure of a display panel includes a substrate, a thin film transistor (TFT), a first transparent connecting pad, a passivation layer and a transparent pixel electrode. The TFT disposed on the substrate includes a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode. The gate insulating layer is disposed on the gate electrode, the semiconductor layer is disposed on the gate insulating layer, and the source electrode and the drain electrode are disposed on the semiconductor layer. The first transparent connecting pad disposed on the drain electrode partially overlaps and is electrically connected to the drain electrode. The passivation layer disposed on the first transparent connecting pad includes at least a contact hole. Furthermore, the transparent pixel electrode disposed on the passivation layer is electrically connected to the first transparent connecting pad through the contact hole of the passivation layer.04-04-2013
20090121228ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A gate line includes a first seed layer formed on a base substrate and a first metal layer formed on the first seed layer. A first insulation layer is formed on the base substrate. A second insulation layer is formed on the base substrate. Here, a line trench is formed through the second insulation layer in a direction crossing the gate line. A data line includes a second seed layer formed below the line trench and a second metal layer formed in the line trench. A pixel electrode is formed in a pixel area of the base substrate. Therefore, a trench of a predetermined depth is formed using an insulation layer and a metal layer is formed through a plating method, so that a metal line having a sufficient thickness may be formed.05-14-2009
20090121229Display device - In a display device which includes: an insulation substrate; thin film transistors which are formed on the insulation substrate; and terminal portions which are configured to supply voltages to the thin film transistors, the thin film transistor includes a gate electrode and a gate line which is formed of a material equal to a material of the gate electrode, a metal line is connected to the terminal portion, a first insulation film and a second insulation film which is made of a material different from a material of the first insulation film are sequentially stacked on the gate line, an opening which exposes the gate line is formed in the first insulation film and the second insulation film, a side wall surface of the opening is sequentially covered with a protective film, a first transparent conductive film and a third insulation film, the first transparent conductive film and a second transparent conductive film are sequentially stacked on an exposed portion of the gate line, and the second transparent conductive film is connected with the metal line.05-14-2009
20090121226ACTIVE-MATRIX DEVICE, ELECTRO-OPTICAL DISPLAY DEVICE, AND ELECTRONIC APPARATUS - An active-matrix device includes a substrate; a plurality of pixel electrodes provided on a first surface of the substrate; a plurality of switching elements provided to correspond to each of the pixel electrodes, each of the switching elements including a fixed electrode connected to the each pixel electrode, a movable electrode mainly made of silicon and displaceably provided so as to contact with and separate from the fixed electrode, and a driving electrode provided to oppose the movable electrode via an electrostatic gap; a first wiring connected to the movable electrode; and a second wiring connected to the driving electrode, wherein a voltage is applied between the movable electrode and the driving electrode to generate an electrostatic attraction between the movable electrode and the driving electrode so as to displace the movable electrode such that the movable electrode contacts with the fixed electrode to electrically connect the first wiring to the pixel electrode.05-14-2009
20090121225Thin film transistor, method for manufacturing the same and display using the same - One embodiment of the present invention is a thin film transistor including a gate electrode formed on an insulating substrate, a gate insulator formed on the gate electrode, a drain electrode and a source electrode formed on the gate insulator, an oxide semiconductor pattern formed between the drain electrode and the source electrode, and a sealing layer formed on the oxide semiconductor pattern.05-14-2009
20130082264PHOTODETECTOR HAVING IMPROVED QUANTUM EFFICIENCY - The present approach involves a radiation detector module with increased quantum efficiency and methods of fabricating the radiation detector module. The module includes a scintillator substrate and a photodetector fabricated on the scintillator substrate. The photodetector includes an anode, active organic elements, and a cathode. The module also includes a pixel element array disposed over the photodetector. During imaging, radiation attenuated by an object to be imaged may propagate through the pixel element array and through the layers of the photodetector to be absorbed by the scintillator which in response emits optical photons. The photodetector may absorb the photons and generate charge with improved quantum efficiency, as the photons may not be obscured by the cathode or other layers of the module. Further, the module may include reflective materials in the cathode and at the pixel element array to direct optical photons towards the active organic elements.04-04-2013
20130207115SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION THEREOF - A semiconductor device (08-15-2013
20130075737Organic Light-Emitting Display Apparatus - An organic light-emitting display apparatus having improved durability and image quality may include a substrate; a first electrode formed on the substrate; a first pixel definition layer formed to cover at least one lateral surface of the first electrode; a second pixel definition layer formed so as to be spaced apart from at least an upper surface of the first pixel definition layer; an intermediate layer formed on the first electrode and including an organic light-emitting layer; and a second electrode formed on the intermediate layer.03-28-2013
20100044714DISPLAY DEVICE - The present invention provides an active matrix type display device having a high aperture ratio and a required auxiliary capacitor. A source line and a gate line are overlapped with part of a pixel electrode. This overlapped region functions to be a black matrix. Further, an electrode pattern made of the same material as the pixel electrode is disposed to form the auxiliary capacitor by utilizing the pixel electrode. It allows a required value of auxiliary capacitor to be obtained without dropping the aperture ratio. Also, it allows the electrode pattern to function as a electrically shielding film for suppressing the cross-talk between the source and gate lines and the pixel electrode.02-25-2010
20100044713LIQUID CRYSTAL DISPLAY DEVICE AND ELECTRONIC DEVICE PROVIDED WITH THE SAME - A liquid crystal display device provided with a thin film transistor with excellent electrical characteristics and reduced off current, for which increase in manufacturing costs can be suppressed while suppressing reduction in yield. A thin film transistor includes a gate electrode provided over a substrate; a gate insulating film provided to cover the substrate and the gate electrode; a first island-shaped semiconductor layer and a second island-shaped semiconductor layer each formed as a stack of a microcrystalline semiconductor layer and a buffer layer with a depression on an upper surface thereof, over the gate electrode with the gate insulating film interposed therebetween; a conductive semiconductor layer; and a conductive layer provided on the conductive semiconductor layer. The conductive semiconductor layer is provided between the first island-shaped semiconductor layer and the second island-shaped semiconductor layer in contact with the gate insulating film.02-25-2010
20100044712THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor substrate includes a gate line, a capacitor dielectric layer, a gate insulation layer, an active pattern, a data line, a protection layer, and a pixel electrode. The gate wiring including a gate electrode, a lower storage electrode, and a gate metal pad is disposed on a substrate. The capacitor dielectric layer is disposed on the lower storage electrode and the gate insulation layer is disposed on the substrate. The active pattern includes an active layer and a dummy active layer disposed on the gate insulation layer in a gate electrode region and a gate metal pad region, respectively. A portion of the upper storage electrode is disposed on the capacitor dielectric layer exposed through a first contact hole in the gate insulation layer.02-25-2010
20100044711THIN FILM TRANSISTOR, ACTIVE MATRIX SUBSTRATE, AND IMAGE PICKUP DEVICE - A thin film transistor including: source and drain electrodes, an active layer that contacts the source and drain electrodes and contains an oxide semiconductor, a gate electrode that controls current flowing between the source and drain electrodes via the active layer, a first insulating film that separates the gate electrode from the source and drain electrodes and the active layer, a bias electrode that is arranged at the opposite side of the active layer from the gate electrode, and has an electric potential fixed independently from the gate electrode, and a second insulating film that separates the bias electrode from the source and drain electrodes and the active layer.02-25-2010
20100044710ACTIVE MATRIX SUBSTRATE - In an active-matrix substrate (02-25-2010
20100044709THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE - A thin film transistor is formed by laminating a gate electrode 02-25-2010
20100044708THIN FILM TRANSISTOR, PIXEL STRUCTURE AND FABRICATION METHODS THEREOF - A fabrication method of a thin film transistor includes providing a substrate at first. Thereafter, a first gate is formed on the substrate. An insulator is then formed to cover the first gate and a portion of the substrate. After that, a channel structure is formed on the insulator above the first gate. In addition, a metal layer is formed to cover the channel structure and a portion of the insulator. Next, the metal layer is patterned, and at least the metal layer on two sidewalls of the channel structure is retained to form a source and a drain, respectively. Moreover, a passivation layer is formed to at least cover the source, the drain and a portion of the insulator.02-25-2010
20100096635THIN FILM TRANSISTOR ARRAY PANEL INCLUDING ASSISTANT LINES - Improved thin film transistor array panels are provided. In one embodiment, a panel includes a plurality of gate lines, data lines, and a plurality of switching elements connected to the gate lines and the data lines. An interlayer insulating layer is formed between the gate lines and the data lines. A passivation layer covering the gate lines, the data lines, and the switching elements is also provided having a plurality of first contact holes exposing portions of the data lines, wherein the switching elements and the pixel electrodes are connected through the first contact holes. A plurality of contact assistants are formed on the passivation layer and are connected to the data lines through a plurality of second contact holes in the passivation layer. A plurality of auxiliary lines are connected to the data lines through a plurality of third contact holes in the interlayer insulating layer.04-22-2010
20080315203THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE - Disclosed herein is a TFT substrate which exhibits good characteristic properties despite the omission of the barrier metal layer to be normally interposed between the source-drain electrodes and the semiconductor layer in the TFT. The TFT substrate permits sure and direct connection with the semiconductor layer of the TFT. The thin film transistor substrate has a substrate, a semiconductor layer and source-drain electrodes. The source-drain electrodes are composed of oxygen-containing layers and thin films of pure copper or a copper alloy. The oxygen-containing layer contains oxygen such that part or all of oxygen combines with silicon in the semiconductor layer. And, the thin films of pure copper or a copper alloy connect with the semiconductor layer of the thin film transistor through the oxygen-containing layers.12-25-2008
20090159890Semiconductor Display Device - A semiconductor display device using a light-emitting element, which can suppress luminance unevenness among pixels due to the potential drop of a wiring, is provided. Power supply lines to which a power supply potential is supplied are electrically connected to each other in a display region where a plurality of pixels are arranged. Further, an interlayer insulating film is formed over a wiring (an auxiliary power supply line) for electrically connecting the power supply lines to each other in the display region and a gate electrode of a transistor included in a pixel; and the power supply lines are formed over the interlayer insulating film which is formed over the auxiliary power supply line and the gate electrode. Furthermore, a wiring (an auxiliary wiring) formed over the interlayer insulating film is electrically or directly connected to the auxiliary power supply line.06-25-2009
20090159889TFT SUBSTRATE, DISPLAY PANEL INCLUDING THE TFT SUBSTRATE, DISPLAY DEVICE INCLUDING THE TFT SUBSTRATE, AND METHOD FOR MANUFACTURING THE TFT SUBSTRATE - The present invention provides a method of manufacturing a TFT substrate, in which method a data signal line is separated into upper and lower regions at a separating point(Q) that is not around above a scan signal line but in a region where an i-layer and an n06-25-2009
20090159888DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel and a manufacturing method thereof which includes forming a color filter on an insulating substrate, forming a plurality of trenches in the color filter, forming a first metal layer in the trenches, forming a second metal layer on the first metal layer to form gate lines, forming a gate insulating layer on the color filter and the gate lines, forming a semiconductor on the gate insulating layer, forming data lines including source electrodes and drain electrodes, and forming pixel electrodes connected to the drain electrodes.06-25-2009
20090159887THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME - A thin film transistor and a method of manufacturing the thin film transistor is disclosed. The thin film transistor includes first and second ohmic contact layers, an activation layer, an insulating layer, a source electrode formed on the insulating layer and connected to the first ohmic contact layer through first contact hole, a drain electrode formed on the insulating layer and connected to the second ohmic contact layer through second contact hole, a gate electrode formed on the insulating layer between the source electrode and the drain electrode and overlapping the activation layer, and a protective layer formed on the source electrode, the drain electrode, and the gate electrode.06-25-2009
20090159886PRINTED TFT ARRAY - An electronic device and/or component is manufactured using additive processing steps, including additive printing steps. A first layer is printed using additive printing techniques wherein a single first material is used to print the first layer in a single processing step. A second layer is printed in more than a single printing step where a first portion of the second layer is printed using a second material and a second portion of the second layer is printed using a third material, and the second and third materials are different from each other.06-25-2009
20100109010DISPLAY DEVICE - A display device having thin film transistors which can efficiently suppress an OFF-leak current while suppressing the decrease of an ON current is provided. The display device includes an insulation substrate, and thin film transistors which are formed on the insulation substrate. Each thin film transistor includes a conductive layer on which a gate electrode is formed, a first insulation layer which is formed on the conductive layer, a semiconductor layer which is formed on the first insulation layer and has a first semiconductor film thereof formed above the gate electrode, the first semiconductor film having a first region and a second region which are spaced apart from each other on an upper surface thereof, a first electrode which is connected to the upper surface of the first semiconductor film via the first region, and a second electrode which is connected to the upper surface of the first semiconductor film via the second region. A portion of the gate electrode which is covered with the first semiconductor film is arranged closer to the first region than the second region.05-06-2010
20100109011THIN FILM TRANSISTOR ARRAY PANEL AND METHOD OF MANUFACTURING THE SAME - A plurality of gate lines having gate electrodes are formed on a substrate and a semiconductor layer is formed on a gate insulating layer covering the gate lines. A plurality of data lines intersecting the gate lines are formed on the gate insulating layer and a plurality of drain electrodes are formed extending parallel with and adjacent to the data lines. Furthermore, a plurality of storage capacitor conductors are formed to be connected to the drain electrodes and to overlap an adjacent gate line. A passivation layer made of an organic material is formed on the above structure and has a contact hole. Furthermore, a plurality of pixel electrodes are formed to be electrically connected to the drain electrodes through the contact hole.05-06-2010
20100109008THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF FABRICATING THE SAME - A thin-film transistor (“TFT”) substrate includes an insulating substrate, a gate line and a data line which are insulated from each other, disposed on the insulating substrate and are arranged in a lattice, and a pixel electrode which is electrically connected to the gate line and the data line by a switching device. The data line includes a lower layer which is formed of a transparent electrode, and an upper layer which is disposed directly on the lower layer.05-06-2010
20100109007THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - The present disclosure relates to a thin film transistor array panel and a manufacturing method thereof. The method comprises: forming a thin film transistor on a substrate; forming a color filter adjacent to the thin film transistor and over the same substrate; depositing a first passivation layer on the color filter; coating a photosensitive film on the first passivation layer and exposing the photosensitive film to light using a first photomask to form a first photosensitive film pattern that comprises a first portion and a second portion that is thicker than the first portion, the first photosensitive film pattern exposing the first passivation layer around a circumference of the second portion; removing the exposed first passivation layer using the first photosensitive film pattern as an etch mask; blanket etching a whole surface of the first photosensitive film pattern until the first portion is removed to form a second photosensitive film pattern; depositing a conductive layer on the second photosensitive film pattern; and removing the second photosensitive film pattern to thereby selectively lift off portions of the conductive layer where a left behind portion forms a pixel electrode.05-06-2010
20100109009DISPLAY DEVICE - Provided is a display device capable of suppressing generation of optical leakage current as well as increase in capacitance in a case where a plurality of thin film transistors (TFTs) including a gate electrode film on a light source side are formed in series. Relative areas of opposing regions between a semiconductor film and the gate electrode film with respect to channel regions are different in at least a part of the plurality of TFTs, to thereby provide a flat panel display having a structure for suppressing increase in capacitance while suppressing generation of optical leakage current.05-06-2010
20130026478DISPLAY UNIT AND SUBSTRATE FOR DISPLAY UNIT - A display unit includes, on a substrate: a plurality of light emitting devices in which a first electrode, an organic layer including a light emitting layer, and a second electrode are respectively and sequentially layered; and a black insulating layer separating the organic layer for the every light emitting device.01-31-2013
20130026477FLAT PANEL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A flat panel display device includes a substrate having an emission area in which an image is displayed and a pad area that is outside of the emission area, a semiconductor layer on the substrate, and the semiconductor layer has crystallization areas and amorphous areas. An electrostatic protecting circuit is on a portion of at least one of the amorphous areas corresponding to the pad area, and a panel circuit unit is on a portion of at least one of the crystallization areas corresponding to the pad area.01-31-2013
20130026476ORGANIC LIGHT EMITTING DISPLAY APPARATUS - An organic light emitting display apparatus includes a substrate on which a display area and a non-display area are defined, a first electrode on the substrate, an intermediate layer on the first electrode, the intermediate layer includes an organic emission layer, a second electrode on the intermediate layer, a plurality of pad units on the non-display area, and an insulating layer on the pad units. The insulating layer includes contact holes overlapping upper surfaces of the pad units and grooves adjacent to the contact holes.01-31-2013
20130026475ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device includes a capacitor lower electrode that includes a semiconductor material doped with ion impurities. A first insulating layer covers an active layer and the capacitor lower electrode. A gate electrode includes a gate lower electrode formed of a transparent conductive material and a gate upper electrode formed of metal. A pixel electrode is electrically connected to the thin film transistor. A capacitor upper electrode is at the same level as the pixel electrode. An etch block layer is formed between the first insulating layer and the capacitor upper electrode. Source and drain electrodes are electrically connected to the active layer. A second insulating layer has an opening completely exposing the capacitor upper electrode. A third insulating layer exposes the pixel electrode. An intermediate layer includes an emissive layer. An opposite electrode faces the pixel electrode.01-31-2013
20130026474STORAGE CAPACITOR ARCHITECTURE FOR PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A storage capacitor architecture for pixel structure and manufacturing method thereof are described. The storage capacitor architecture includes a substrate, a first electrode, an insulating layer and a second electrode. The first electrode has a first concave and convex structure. The insulating layer is disposed on the first concave and convex structure of the first electrode. The second electrode is disposed on the insulating layer and has a second concave and convex structure. The first concave and convex structure and the second concave and convex structure form an interdigitated space and the insulating layer is disposed in the interdigitated space to solve the problem of decreased aperture ratio of the LCD panel.01-31-2013
20090134393THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE - A thin-film transistor substrate in which an aluminum alloy film composing a source/drain wiring is directly connected with a transparent electrode. The thin-film transistor substrate includes a gate wiring, and source wiring and drain wiring, the gate wiring and the source and drain wiring being arranged orthogonally to each other. The single-layer aluminum alloy film composing the gate wiring and the single-layer aluminum alloy film composing the source wiring and the drain wiring are the same in composition. Furthermore, display devices can be mounted with the above thin-film transistor substrates.05-28-2009
20100006843Polysilsesquioxane copolymer, polysilsesquioxane copolymer thin film including the same, organic light emitting diode display device including the same, and associated methods - A polysilsesquioxane copolymer, a polysilsesquioxane copolymer including the same, an organic light emitting diode display including the same, and associated methods, the polysilsesquioxane copolymer including a copolymer including repeating units derived from a first monomer selected from the group consisting of alkoxyphenyltrialkoxysilane, alkoxyphenylalkyltrialkoxysilane, alkoxycarbonylphenyltrialkoxysilane, and alkoxycarbonylphenylalkyltrialkoxysilane, and repeating units derived from a second monomer including an α,ω-bis(trialkoxysilyl) compound monomer.01-14-2010
20130082266Display Device And Driving Method Thereof - A display device in which not only a variation in a current value due to a threshold voltage but also a variation in a current value due to mobility are prevented from influencing luminance with respect to all the levels of grayscale to be displayed. After applying an initial potential for correction to a gate and a drain of a driving transistor, the gate and the drain of the driving transistor is kept connected in a floating state, and a voltage is held in a capacitor before a voltage between the gate and a source of the driving transistor becomes equal to a threshold voltage. When a voltage obtained by subtracting the voltage held in the capacitor from a voltage of a video signal is applied to the gate and the source of the driving transistor, a current is supplied to a light-emitting element. A value of an initial voltage for correction differs in accordance with the voltage of the video signal.04-04-2013
20130082267SEMICONDUCTOR DEVICE AND DISPLAY DEVICE EQUIPPED WITH SAME - Disclosed is a semiconductor device 04-04-2013
20090173942PIXEL STRUCTURE - A pixel structure formed on a substrate and electrically connected with a scan line and a data line, and including a semiconductor pattern and a pixel electrode is provided. The semiconductor pattern includes at least two channel areas, at least one doping area, a source area, and a drain area. The channel areas are located below the scan line and have different aspect ratios. The doping area is connected between the channel areas. The pixel electrode electrically connects the drain area, the source area is connected between one of the channel areas and the data line, and the drain area is connected between the other channel area and the pixel electrode. The scan line has different widths above different channel areas, and a length of each channel area is substantially equal to the width of the scan line.07-09-2009
20130087796Light-Emitting Device and Electric Appliance - An inexpensive light emitting device capable of displaying a bright image and an electric appliance using the light emitting device. In the light emitting device having a pixel portion and a driver circuit formed on one insulating member, all of semiconductor elements for the pixel portion and the driver circuit are formed by n-channel semiconductor elements, thereby enabling the manufacturing process to be simplified. Each of light-emitting elements provided in the pixel portion emits light in such a direction that most of the light travels away from the insulating member, so that substantially the whole of the pixel-forming segment electrode (corresponding to a cathode of an EL element) is formed as an effective light-emitting area. Therefore, a low-priced light-emitting device capable of displaying a bright image can be obtained.04-11-2013
20130087795DISPLAY DEVICE, METHOD OF MANUFACTURING THE SAME, AND ELECTRONIC UNIT - A display device includes: a thin film transistor; and a wiring layer; the thin film transistor including a control electrode, a semiconductor layer facing the control electrode, a first electrode made of a light transmissive material and electrically connected to the semiconductor layer, and a second electrode including a metal film having resistance lower than that of the light transmissive material, the second electrode being electrically connected to each of the semiconductor layer and the wiring layer, wherein a difference in ionization tendency between a material configuring the metal film and a conductive material configuring a part or whole of the wiring layer is smaller than a difference in ionization tendency between the light transmissive material and the conductive material.04-11-2013
20130087794Thin Film Transistor Substrate and Method of Fabricating the Same - Disclosed are a thin film transistor substrate and a method of fabricating the same in which the number of processes is reduced. The method includes forming a first conductive pattern including gate electrodes and gate lines on a substrate through a first mask process, depositing a gate insulating film and forming a second conductive pattern including a semiconductor pattern, source and drain electrodes and data lines through a second mask process, depositing first and second passivation films and forming pixel contact holes passing through the first and second passivation films and exposing the drain electrodes through a third mask process, and forming a third conductive pattern including a common electrode and a common line and forming a third passivation film formed in an undercut structure with the common electrode through a fourth mask process, simultaneously, and forming a fourth conductive pattern including pixel electrodes through a lift-off process.04-11-2013
20130087797HIGH LIGHT TRANSMITTANCE IN-PLANE SWITCHING LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present disclosure relates to a high light transmittance in-plan switching liquid crystal display device and a method for manufacturing the same. The liquid crystal display device includes: a substrate; a gate line disposed in horizontal direction on the substrate; a gate insulating layer covering the gate line; a data line disposed in vertical direction on the gate insulating layer; an additional insulating layer on the data line having same size and shape with the data line; a passivation layer covering the additional insulating layer; and a common electrode overlapping with the data line on the passivation layer. According to the present disclosure, the failure due to the parasitic capacitance and the load for driving the display panel are reduced and it is possible to make large and high definition display panel.04-11-2013
20130087798SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION THEREOF - The TFT substrate (04-11-2013
20130087791DISPLAY DEVICES AND FABRICATION METHODS THEREOF - A display device and a fabrication method thereof are provided. The display device includes a first metal layer disposed on a display area and a peripheral area. An insulating layer covers the first metal layer. A patterned semiconductor layer is disposed on the insulating layer at the display area. A second metal layer is disposed on the patterned semiconductor layer and the insulating layer at the peripheral area. A transparent conductive layer directly covers the second metal layer. A protective layer completely covers the second metal layer, the patterned semiconductor layer and the transparent conductive layer. The protective layer includes a first portion, a second portion and a through hole, wherein the first portion has a height which is higher than a height of the second portion.04-11-2013
20130087792PIXEL STRUCTURE OF REFLECTIVE TYPE ELECTROPHORETIC DISPLAY DEVICE AND METHOD OF MAKING THE SAME - The present invention provides a method of making a pixel structure of a reflective type electrophoretic display device. First, a first metal pattern layer, an insulating layer, a semiconductor pattern layer and a second metal pattern layer are formed sequentially on a substrate. Next, a passivation layer is formed on the substrate, the semiconductor pattern layer and the second metal pattern layer, and an organic photoresist layer is formed on the passivation layer, wherein the organic photoresist layer has a first contact hole exposing the passivation layer. Then, the organic photoresist layer is utilized as a mask to remove the exposed passivation layer and to form a second contact hole in the passivation layer to expose the second metal pattern layer. Subsequently, a third metal pattern layer and a transparent conductive pattern are formed sequentially on the organic photoresist pattern layer and the exposed second metal pattern layer.04-11-2013
20130087793ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - An array substrate includes a base substrate and a contact part. The contact part is disposed on the base substrate. The contact part includes a first metal pattern, a disconnection control pattern and a connecting pattern. The second metal pattern is disposed on a layer different from the first metal pattern, the disconnection control pattern overlaps a side surface of the second metal pattern and a connecting pattern is formed on the first and second metal patterns and the disconnection control pattern and connects the first metal pattern with the second metal pattern.04-11-2013
20120181542Thin Film Transistor Array Substrate - A thin film transistor (TFT) array substrate includes a stack structure disposed to raise an extended electrode of a drain electrode of a thin film transistor. Therefore, a contact hole does need to be very deep to expose the extended electrode of the drain electrode.07-19-2012
20120181541Thin Film Transistor Array Substrate - A thin film transistor (TFT) array substrate includes a stack structure disposed to raise an extended electrode of a drain electrode of a thin film transistor. Therefore, a contact hole does need to be very deep to expose the extended electrode of the drain electrode.07-19-2012
20120181540Light Emitting Device - The present invention provides a TFT that has a channel length particularly longer than that of an existing one, specifically, several tens to several hundreds times longer than that of the existing one, and thereby allowing turning to an on-state at a gate voltage particularly higher than the existing one and driving, and allowing having a low channel conductance gd. According to the present invention, not only the simple dispersion of on-current but also the normalized dispersion thereof can be reduced, and other than the reduction of the dispersion between the individual TFTs, the dispersion of the OLEDs themselves and the dispersion due to the deterioration of the OLED can be reduced.07-19-2012
20120181539THIN FILM TRANSISTOR ARRAY PANEL - The present invention relates to a thin film transistor array panel including: a substrate; gate lines formed on the substrate; and a gate driver formed on the substrate to apply gate signals to the gate lines. The gate driver includes a first wire and a second wire to transmit different signals, and at least one of the first wire and the second wire includes a static electricity preventing structure to prevent static electricity from accumulating between the first wire and the second wire.07-19-2012
20090045404Semiconductor device and display device - A semiconductor device can easily reduce a leak current which flows when a reversely-staggered-type TFT element in which an active layer is made of polycrystalline semiconductor is turned off. The semiconductor device includes a reversely-staggered-type TFT element in which a semiconductor layer, a source electrode and a drain electrode are arranged on a surface of an insulation film, and a portion of the source electrode and a portion of the drain electrode respectively get over the semiconductor layer. The active layer of the semiconductor layer is mainly made of polycrystalline semiconductor constituted of strip-shaped crystals elongated in the channel length direction of the TFT element, and is configured in a plan view such that the source electrode and the drain electrode are respectively pulled out from positions above the active layer in the channel width direction of the TFT element and in the directions opposite to each other, and the source electrode intersects with only one side out of two sides of the active layer which extend in the channel length direction, and the drain electrode intersects with only another side out of two sides of the active layer which extend in the channel length direction.02-19-2009
20090045402TFT array substrate and manufacturing method the same - A method of manufacturing TFT array substrate uses only four photolithography processes without any special photo-mask. Pixel electrodes and gate electrodes are made on an upper surface of a substrate in a first photolithography. After that, gate insulating layers, active regions, source and drain doped regions, source and drain electrodes and a passivation layer are sequentially made in second to fourth photolithography processes to complete the TFT array substrate. Therefore, the TFT array substrate is manufactured by four photolithography processes without any special photo-mask, so the processes of the manufacturing process is simplified and the cost is decreased.02-19-2009
20130048995Light-Emitting Module, Light-Emitting Device, Method of Manufacturing the Light-Emitting Module, and Method of Manufacturing the Light-Emitting Device - A highly reliable light-emitting module including an organic EL element or a light-emitting device using a highly reliable light-emitting module including an organic EL element is provided. Alternatively, a method of manufacturing a highly reliable light-emitting module including an organic EL element, or a method of manufacturing a light-emitting device using a highly reliable light-emitting module including an organic EL element is provided. The light-emitting module has a structure in which a light-emitting element formed over a first substrate and a viscous material layer are sealed in a space between the first substrate and a second substrate which face each other, with a sealing material surrounding the light-emitting element. The viscous material layer is provided between the light-emitting element and the second substrate and includes a non-solid material and a drying agent which reacts with or adsorbs an impurity.02-28-2013
20130048992TRANSISTOR AND METHOD OF PRODUCING SAME, AND DISPLAY - A transistor includes: a control electrode; an active layer facing the control electrode; a first electrode and a second electrode electrically connected to the active layer; and an insulating layer provided between the control electrode and the active layer, the insulating layer containing diallyl isophthalate resin.02-28-2013
20130048991DISPLAY AND METHOD OF MANUFACTURING THE SAME - A display, a method of manufacturing the display, and an electronic apparatus are provided. The display includes a resin, a transistor; and a light shielding material positioned between the resin and the transistor. The light shielding material is configured to suppress an incidence of light on the transistor. Light is prevented from entering an oxide semiconductor layer to be used as an active layer so as to suppress deterioration of transistor characteristics.02-28-2013
20130048990THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A substrate includes an active layer, a gate electrode, source and drain electrodes, first and second insulating layers, a first line and a second line on a same layer as the gate electrode, the first line and the second line include a same material as the gate electrode and are aligned in a first direction, a third line crosses the first line, the third line is on a same layer as the source and drain electrodes, includes a same material as the source and drain electrodes, and is aligned in a second direction, a repair line on a same layer as the active layer, the repair line includes a same material as the active layer, a pixel electrode in the pixel region, and the pixel electrode is on a same layer as a lower electrode of the gate electrode and includes a same material as the lower electrode.02-28-2013
20110001139ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An organic light emitting diode (OLED) display device and a method of fabricating the same. The OLED display device includes a substrate including an emission region and a non-emission region, a buffer layer arranged on the substrate, a semiconductor layer arranged in the non-emission region on the buffer layer, a gate insulating layer arranged on an entire surface of the substrate, a first electrode arranged in the emission region on the gate insulating layer, a gate electrode arranged in the non-emission region on the gate insulating layer, an interlayer insulating layer arranged on the entire surface of the substrate and partially exposing the first electrode, source and drain electrodes arranged on the interlayer insulating layer and electrically connected to the semiconductor layer and the first electrode, a protection layer arranged on the entire surface of the substrate and partially exposing the first electrode, an organic layer arranged on the first electrode and a second electrode arranged on the entire surface of the substrate.01-06-2011
20130048999SEMICONDUCTOR DEVICE, ACTIVE MATRIX SUBSTRATE, AND DISPLAY DEVICE - A semiconductor device (02-28-2013
20130048996DISPLAY DEVICE AND MANUFACTURING PROCESS OF DISPLAY DEVICE - Provided a display device including a thin film transistor. The thin film transistor includes a gate electrode, a gate insulating layer which covers the gate electrode, an oxide semiconductor film above the gate insulating layer, a source electrode and a drain electrode which are respectively provided in contact with a first region and a second region, which are provided in the upper surface of the oxide semiconductor film, and a channel protective film which is provided in contact with a third region between the first region and the second region. In plan view, a region of the oxide semiconductor film, which overlaps with the gate electrode, is smaller than the third region, and a portion of the oxide semiconductor film except for a portion which overlaps with the gate electrode has a resistance lower than the portion.02-28-2013
20100133539THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME - Provided is a thin-film transistor (TFT) substrate. The TFT substrate includes: an insulating substrate; a semiconductor pattern which is formed on the insulating substrate, the semiconductor pattern having a top surface and a bottom surface; a source electrode and a drain electrode which are disposed on the top and bottom surfaces of the semiconductor pattern, respectively; a gate electrode which is disposed alongside the semiconductor pattern with a gate insulating film interposed therebetween; a data line which is connected to the source electrode and extends in a first direction; a gate line which is connected to the gate electrode and extends in a second direction; and a pixel electrode which is connected to the drain electrode and is formed in a pixel region.06-03-2010
20100133543Methods of Making Semiconductor-Based Electronic Devices on a Wire and Articles That Can Be Made Thereby - Strands of active electronic devices (AEDs), such as field-effect transistors, are made by processing a semiconductor substrate so that it yields a number of elongate semiconductor members liberated from the starting substrate. The elongate semiconductor members are secured to wires or wire-like structures so as to form semiconductor-member-on-a-wire composites upon which the AEDs are formed using various deposition and etching techniques. The AED strands have many uses, including the creating of electronic components, including flexible, conformal, rigid and foldable electronics, such as displays and sensors.06-03-2010
20100133541THIN FILM TRANSISTOR ARRAY SUBSTRATE, ITS MANUFACTURING METHOD, AND LIQUID CRYSTAL DISPLAY DEVICE - In accordance with an exemplary aspect of the present invention, a thin film transistor array substrate includes a transparent insulating substrate, and a thin film transistor for pixel switching and a thin film transistor for a drive circuit formed on the transparent insulating substrate, wherein the thin film transistor for a drive circuit includes an amorphous silicon film formed on the transparent insulating film, a microcrystalline silicon film formed on the amorphous silicon film, a first source electrode and a first drain electrode formed on the microcrystalline silicon film, the first source electrode and the first drain electrode being opposed with a first channel area interposed therebetween, a protective insulating film that covers the first source electrode and the first drain electrode, and an upper gate electrode formed so as to be opposed to the first channel area with the protective insulating film interposed therebetween.06-03-2010
20100133540GLASS SUBSTRATE, DISPLAY DEVICE HAVING THE SAME, AND METHOD OF MANUFACTURING THE DISPLAY DEVICE - A glass substrate includes at least one surface including an uneven surface having a difference of less than about 0.003 micrometers between a highest point and a lowest point in a section of the glass substrate, the section having a width of about 10 millimeters to about 30 millimeters, and the uneven surfaces being defined by continuously supplying molten glass onto molten metal and cooling the molten glass which floats on the molten metal.06-03-2010
20100133538THIN FILM TRANSISTOR DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME - A thin film transistor array panel according to an exemplary embodiment includes a first colored member overlapping a thin film transistor and a plurality of second colored members simultaneously formed on the first colored member. Accordingly, it is possible to prevent light leakage current of the thin film transistor, to easily repair deterioration of the thin film transistor, to prevent light leakage of a peripheral area and between color filters, and to form stable patterns.06-03-2010
20090289257EXPOSURE MASK USING GRAY-TONE PATTERN, MANUFACTURING METHOD OF TFT SUBSTRATE USING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE TFT SUBSTRATE - Disclosed are an exposure mask capable of improving uniformity of a resist film thickness of a half film thickness part and reducing a display defect to increase a manufacturing yield, a method of manufacturing a TFT substrate using the exposure mask and a liquid crystal display comprising the TFT substrate manufactured by the method and having no display defect. The exposure mask includes a light-shielding pattern on a transparent substrate in which a gray-tone area is provided to at least a part of the light-shielding pattern, the gray-tone area having an oblong light-shielding pattern having a width of a submarginal resolution of an exposure apparatus and sandwiched between oblong slit-type transmissive patterns having a width of the submarginal resolution, and a light-shielding rate of the gray-tone area is gradually reduced toward a center of the oblong light-shielding pattern from longitudinal ends thereof.11-26-2009
20090108261ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - The present invention provides an array substrate and a method for manufacturing the same. The array substrate comprises a substrate and a plurality of gate lines parallel to each other and a plurality of data lines parallel to each other formed on the substrate, the gate lines intersecting the data lines to define a plurality of pixel region arranged in a matrix, each pixel region comprising a thin film transistor, a pixel electrode and a thin film diode. With respect to each pixel region in a row, the pixel electrode is connected with the gate line in the present row through the thin film transistor and is connected with the gate line in a previous row through the thin film diode.04-30-2009
20100270556TFT LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A TFT LCD array substrate and a manufacturing method thereof. The TFT LCD array substrate comprises a substrate. A gate line and a gate electrode that is formed integrally with the gate line are formed on the substrate. A first insulating layer and a semiconductor layer are formed sequentially on the gate line and the gate electrode. A second insulting layer covers sidewalls of the gate line and the gate electrode, the first insulating layer, and the semiconductor layer. An etching stop layer is formed on the semiconductor layer and exposes a part of the semiconductor layer on both sides of the etching stop layer. The TFT LCD of the present invention can be manufactured with a four-mask process.10-28-2010
20090302319ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD FOR MANUFACTURING THE SAME - An organic light emitting device and a manufacturing method thereof, including a first signal line and a second signal line intersecting each other on an insulating substrate, a switching thin film transistor connected to the first signal line and the second signal line, a driving thin film transistor connected to the switching thin film transistor, and a light emitting diode (“LD”) connected to the driving thin film transistor. The driving thin film transistor includes a driving control electrode and a driving semiconductor overlapping the driving control electrode, crystallized silicon having a doped region and a non-doped region, a driving gate insulating layer disposed between the driving control electrode and the driving semiconductor, and a driving input electrode and a driving output electrode opposite to each other on the driving semiconductor, wherein the interface between the driving gate insulating layer and the driving semiconductor includes nitrogen gas.12-10-2009
20120217501Peeling Method and Method of Manufacturing Semiconductor Device - There is provided a peeling method capable of preventing a damage to a layer to be peeled. Thus, not only a layer to be peeled having a small area but also a layer to be peeled having a large area can be peeled over the entire surface at a high yield. Processing for partially reducing contact property between a first material layer (08-30-2012
20130056739TFT ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A TFT array substrate and a manufacturing method thereof, where the TFT array substrate includes a substrate; a gate line and a gate electrode integrated therewith, which are covered by a gate insulating layer, a semiconductor layer, and a ohmic contact layer sequentially. An insulating layer is formed on the resulting substrate and on both sides of the gate line and the gate electrode, the gate insulating layer, the semiconductor layer, and the ohmic contact layer. A trench is then formed in the ohmic contact layer to divide the ohmic contact layer over the semiconductor layer. A data line and first and second source/drain electrodes are then formed on the insulating layer and the ohmic contact layer.03-07-2013
20130056734TFT SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor (TFT) substrate and a manufacturing method thereof are disclosed. The manufacturing method comprises: after a first metallic layer is formed on the TFT substrate, annealing the TFT substrate so that lattices of the first metallic layer are re-arranged to prevent occurrences of grain boundary defects in the first metallic layer. According to the present disclosure, after the first metallic layer is formed on the TFT substrate, the TFT substrate is annealed in sequence to re-arrange lattices of the first metallic layer. This effectively prevents occurrences of grain boundary defects and, consequently, metal protrusions in the first metallic layer.03-07-2013
20130056740THIN FILM TRANSISTOR ARRAY PANEL INCLUDING LAYERED LINE STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a thin film transistor array panel comprising an insulating substrate; a gate line formed on the insulating substrate; a gate insulating layer formed on the gate line; a drain electrode and a data line having a source electrode formed on the gate insulating layer, the drain electrode being adjacent to the source electrode with a gap therebetween; and a pixel electrode coupled to the drain electrode, wherein at least one of the gate line, the data line, and the drain electrode comprises a first conductive layer comprising a conductive oxide and a second conductive layer comprising copper (Cu).03-07-2013
20130056741DISPLAY PANEL AND THIN FILM TRANSISTOR SUBSTRATE - A display panel (03-07-2013
20130056738Method for Manufacturing Thin Film Transistor, Thin Film Transistor and Image Display Apparatus - A method for manufacturing a thin film transistor includes a first process of forming a gate electrode on a substrate; a second process of forming a gate insulation film so as to cover the gate electrode; a third process of forming a source electrode and a drain electrode on the gate insulation film; a fourth process of forming a semiconductor layer connected to the source electrode and the drain electrode; a fifth process of forming a protection film so as to overlap a portion of the source electrode and the drain electrode immediately above the semiconductor layer; and a sixth process of patterning the semiconductor layer using the protection film as a mask.03-07-2013
20130056736GATE DRIVING CIRCUIT, DISPLAY SUBSTRATE HAVING THE SAME AND METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE - A gate driving circuit includes a plurality of stages outputting gate signals to a plurality of gate lines. Each of the stages includes a circuit transistor, a capacitor part, a first connecting electrode and a second connecting electrode. The circuit transistor outputs the gate signal to an output electrode in response to a control signal inputted to a control electrode. The capacitor part is disposed adjacent to the circuit transistor, and includes a first electrode, a second electrode disposed over the first electrode, a third electrode disposed over the second electrode and a fourth electrode disposed over the third electrode. The first connecting electrode electrically connects the control electrode to the first and third electrodes. The second connecting electrode electrically connects the output electrode to the second and fourth electrodes.03-07-2013
20130056737WIRING FILM AND ACTIVE MATRIX SUBSTRATE USING THE SAME, AND METHOD FOR MANUFACTURING WIRING FILM - An Al wiring film having a tapered shape is obtained easily and in a stable manner. An Al wiring film has a double-layer structure including a first Al alloy layer made of Al or an Al alloy, and a second Al alloy layer laid on the first Al alloy layer and having a composition different from a composition of the first Al alloy layer by containing at least one element of Ni, Pd, and Pt. The second Al alloy layer is etched by an alkaline chemical solution used in a developing process of a photoresist, and an end portion of the second Al alloy layer recedes from an end portion of the photoresist. Thereafter, by performing wet etching using the photoresist as a mask, a cross section of the Al wiring film becomes a tapered shape.03-07-2013
20130056735ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus includes a thin film transistor on a display region of a substrate, the thin film transistor faces an encapsulation member, an organic light-emitting device on the display region that includes an intermediate layer having an organic emission layer, a sealing member that is between the substrate and the encapsulation member and that surrounds the display region, an internal circuit unit between the display region and the sealing member, a passivation layer that extends to cover the internal circuit unit, a pixel defining layer on the passivation layer, and a getter between the substrate and the encapsulation member, and the getter at least partially overlaps the internal circuit unit.03-07-2013
20100102320DISPLAY DEVICE - A display device is provided. The display device includes a substrate, a light blocking member formed on the substrate as a plurality of light blocking portions separated from each other, a thin film transistor including a gate line, a data line, and a semiconductor layer formed on the light blocking member, a plurality of color filters formed on the gate line, the data line, and the thin film transistor, a pixel electrode formed on the color filters and connected to the thin film transistor, and a light blocking filter covering a portion of a separation region separating the light blocking portions.04-29-2010
20120112195ARRAY SUBSTRATE AND MANUFACTURUING METHOD THEREOF, ACTIVE DISPLAY - A manufacturing method for an array substrate comprising: sequentially forming a gate metal film, a gate insulating layer and an active layer film; applying photoresist, and patterning the photoresist; etching the stacked layers corresponding to a photoresist-completely-removed region; ashing to remove the photoresist in a photoresist-partially-remained region and remain a part of photoresist in a photoresist-completely-remained region, etching the gate insulating layer and the active layer film in the photoresist-partially-remained region; forming an insulating layer film; lifting off the photoresist and the insulating layer film thereon; forming a conductive film, and patterning the conductive film to from a source electrode, a drain electrode, a data line, a pixel electrode and an active layer channel.05-10-2012
20120112194SEMICONDUCTOR DEVICE AND DISPLAY DEVICE - It is an object to provide a technique to improve electric characteristics after a high-temperature treatment even when a high melting point metal barrier layer is not formed. A semiconductor device includes a gate electrode formed on a transparent insulation substrate, a semiconductor layer having a Si semiconductor active film and an ohmic low resistance Si film having an n-type conductivity, being formed in this order on the gate electrode with a gate insulation film interposed between the gate electrode and the semiconductor layer, and the source and drain electrodes directly connected to the semiconductor layer and containing at least aluminum (Al). At least nitrogen (N) is contained in a first region that is in the vicinity of an interface between a side surface of the SI semiconductor active film and the source and drain electrodes.05-10-2012
20120112193TRANSISTOR ARRAY SUBSTRATE - A transistor array substrate includes a substrate, a plurality of scan lines, a plurality of data lines, and a plurality of pixel units. The scan lines, the data lines, and the pixel units are all disposed on the substrate. Each pixel unit includes a first transistor, a second transistor, a first pixel electrode, a second pixel electrode, a first storage capacitor, and a second storage capacitor. The second transistor and the first transistor are electrically connected with the same scan line and the same data line. The second transistor and the first transistor are connected in series. The first pixel electrode is electrically connected with the first transistor, and the second pixel electrode is electrically connected with the second transistor. The first storage capacitor is electrically connected with the first transistor and the second transistor, and the second storage capacitor is electrically connected with the second transistor.05-10-2012
20100084658DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate having a low-resistance metallic layer and a method of manufacturing the display substrate. The gate conductors are extended in a first direction. The source conductors are extended in a second direction crossing the first direction including a lower layer of molybdenum or a molybdenum alloy, and an upper layer of aluminum or an aluminum alloy. The pixel areas are defined by the gate conductors and the source conductors. A switching element is formed in each of the pixel areas and includes a gate electrode extended from the gate conductor and a source electrode extended from the source conductor. The pixel electrode includes a transparent conductive material, and is electrically connected to a drain electrode of the switching element.04-08-2010
20100127266THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SAME, DISPLAY DEVICE, AND METHOD FOR MANUFACTURING SAME - A thin film transistor includes: an insulating layer; a gate electrode provided on the insulating layer; a gate insulating film provided on the gate electrode; a semiconductor layer provided on the gate insulating film, the semiconductor layer being formed of oxide; a source electrode and a drain electrode provided on the semiconductor layer; and a channel protecting layer provided between the source and drain electrodes and the semiconductor layer. The source electrode is opposed to one end of the gate electrode. The drain electrode is opposed to another end of the gate electrode. The another end is opposite to the one end. The drain electrode is apart from the source electrode. The channel protecting layer covers at least a part of a side face of a part of the semiconductor layer. The part of the semiconductor layer is not covered with the source electrode and the drain electrode above the gate electrode.05-27-2010
20090078937PRODUCTION METHODS OF PATTERN THIN FILMS, SEMICONDUCTOR ELEMENT, AND CIRCUIT SUBSTRATE, AND RESIST MATERIAL, SEMICONDUCTOR ELEMENT, AND CIRCUIT SUBSTRATE - The present invention provides production methods of a pattern thin film, a semiconductor element and a circuit substrate, capable of eliminating the number of photolithography processes needed for patterning; and a semiconductor element, a circuit substrate, and an electron device obtained by the production methods. The production method of the pattern thin film of the present invention is a production method of a pattern thin film, comprising the steps of: forming a first resist pattern film on a thin film formed on a substrate; forming a second resist pattern film; patterning the thin film using at least the second resist pattern film, wherein in the step of forming the second resist pattern film, a fluid resist material or an organic solvent is applied on a groove of a bank pattern formed using the first resist pattern film.03-26-2009
20090267073Semiconductor Device and Method of Manufacturing the Same - The present invention improves the aperture ratio of a pixel of a reflection-type display device or a reflection type display device without increasing the number of masks and without using a blackmask. A pixel electrode (10-29-2009
20090267070Multilayer image sensor structure for reducing crosstalk - An image sensor pixel includes a substrate, an epitaxial layer, and a light collection region. The substrate is doped to have a first conductivity type. The epitaxial layer is disposed over the substrate and doped to have a second conductivity type opposite of the first conductivity type. The light collection region is disposed within the epitaxial layer for collecting photo-generated charge carriers. The light collection region is doped to have the first conductivity type as well.10-29-2009
20130062607SEMICONDUCTOR DEVICE - A protection circuit for efficiently reducing the influence of ESD and a semiconductor device in which the influence of ESD is efficiently reduced are provided. The protection circuit includes at least two protection diodes. Each protection diode is a transistor including two gates facing each other with a semiconductor layer in which a channel is formed sandwiched between the gates. A fixed potential is applied to one of the gates of the transistor.03-14-2013
20110012123THIN FILM TRANSISTOR SUBSTRATE AND FABRICATING METHOD THEREOF - A thin film transistor substrate and fabricating method thereof by which the size of the thin film transistor substrate is reduced by constructing data signal supply lines, each of which supplies a pixel data voltage to a data line, with different metal lines, respectively includes gate and data lines crossing each other on a substrate, with a gate insulating layer disposed therebetween, a thin film transistor formed on each intersection between the gate and data lines, a display area on which a pixel electrode connected to the thin film transistor is formed, a first data signal supply line comprising a first conductive layer connected to the data line in a non-display area located at a periphery of the display area, and a second data signal supply line alternating with the first data signal supply line, with the gate insulating layer disposed therebetween, the second data signal supply line comprising a second conductive layer connected to the data line.01-20-2011
20110012122ELECTRO-OPTICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME - Using thin film transistors (TFTs), an active matrix circuit, a driver circuit for driving the active matrix circuit or the like are formed on one substrate. Circuits such as a central processing unit (CPU) and a memory, necessary to drive an electric device, are formed using single crystalline semiconductor integrated circuit chips. After the semiconductor integrated circuit chips are adhered to the substrate, the chips are connected with wirings formed on the substrate by a chip on glass (COG) method, a wire bonding method or the like, to manufacture the electric device having a liquid crystal display (LCD) on one substrate.01-20-2011
20110012121THIN FILM TRANSISTOR IN WHICH AN INTERLAYER INSULATING FILM COMPRISES TWO DISTINCT LAYERS OF INSULATING MATERIAL - A display apparatus including a TFT array substrate on which TFTs are formed in an array, a counter substrate disposed so as to face the TFT array substrate, and a sealing pattern for adhering the TFT array substrate and the counter substrate to each other, wherein the counter substrate has a counter electrode, and the TFT array substrate has a first conductive layer, a first insulating film formed on the first conductive layer, a second conductive layer disposed so as to intersect the first conductive layer via the first insulating film, a second insulating film formed on the second conductive layer and having at least two layers, and common electrode wiring provided below the sealing pattern and electrically connected to the counter electrode by the sealing pattern, and the sealing pattern overlaps the second conductive layer via the second insulating film.01-20-2011
20110012120ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATION METHOD THEREOF - Provided is a liquid crystal display (LCD) device and a fabrication method thereof. An array substrate for the LCD includes a gate line formed on a substrate, and a gate electrode extending from the gate line; a data line intersected with the gate line, wherein the data line is configured with a gate insulating layer, a semiconductor layer and a data metal layer; a pixel electrode formed of a first transparent metal layer at a pixel which is defined by an intersection of the gate line and the data line; a source electrode extending from the data line, and a drain electrode spaced apart from the source electrode by a predetermined distance to expose a channel; and a second transparent metal layer pattern formed on the data line, the source electrode and the drain electrode, wherein the second transparent metal layer connects the drain electrode and the pixel electrode to each other.01-20-2011
20110012119Semiconductor Device and Method for Fabricating the Same - The invention primarily provides gate electrodes and gate wirings permitting large-sized screens for active matrix-type display devices, wherein, in order to achieve this object, the construction of the invention is a semiconductor device having, on the same substrate, a pixel TFT provided in a display region and a driver circuit TFT provided around the display region, wherein the gate electrodes of the pixel TFT and the driver circuit TFT are formed from a first conductive layer, the gate electrodes are in electrical contact through connectors with gate wirings formed from a second conductive layer, and the connectors are provided outside the channel-forming regions of the pixel TFT and the driver circuit01-20-2011
20110012118SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - An object is to improve the aperture ratio of a semiconductor device. The semiconductor device includes a driver circuit portion and a display portion (also referred to as a pixel portion) over the same substrate. The driver circuit includes a channel-etched thin film transistor for driver circuit and a driver circuit wiring formed using metal. Source and drain electrodes of the thin film transistor for the driver circuit are formed using a metal. A channel layer of the thin film transistor for the driver circuit is formed using an oxide semiconductor. The display portion includes a bottom-contact thin film transistor for a pixel and a display portion wiring formed using an oxide conductor. Source and drain electrode layers of the thin film transistor for the pixel are formed using an oxide conductor. A semiconductor layer of the thin film transistor for the pixel is formed using an oxide semiconductor.01-20-2011
20110012117SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - An object is to reduce the manufacturing cost of a semiconductor device. An object is to improve the aperture ratio of a semiconductor device. An object is to make a display portion of a semiconductor device display a higher-definition image. An object is to provide a semiconductor device which can be operated at high speed. The semiconductor device includes a driver circuit portion and a display portion over one substrate. The driver circuit portion includes: a driver circuit TFT in which source and drain electrodes are formed using a metal and a channel layer is formed using an oxide semiconductor; and a driver circuit wiring formed using a metal. The display portion includes: a pixel TFT in which source and drain electrodes are formed using an oxide conductor and a semiconductor layer is formed using an oxide semiconductor; and a display wiring formed using an oxide conductor.01-20-2011
20110012116SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A highly reliable display device which has high aperture ratio and includes a transistor with stable electrical characteristics is manufactured. The display device includes a driver circuit portion and a display portion over the same substrate. The driver circuit portion includes a driver circuit transistor and a driver circuit wiring. A source electrode and a drain electrode of the driver circuit transistor are formed using a metal. A channel layer of the driver circuit transistor is formed using an oxide semiconductor. The driver circuit wiring is formed using a metal. The display portion includes a pixel transistor and a display portion wiring. A source electrode and a drain electrode of the pixel transistor are formed using a transparent oxide conductor. A semiconductor layer of the pixel transistor is formed using the oxide semiconductor. The display portion wiring is formed using a transparent oxide conductor.01-20-2011
20110012115DISPLAY DEVICE WITH IMPROVED SENSING MECHANISM - A display panel that includes: a substrate, a sensing transistor disposed on the substrate, and a readout transistor connected to the sensing transistor and transmitting a detecting signal is presented. The sensing transistor includes a semiconductor layer disposed on the upper substrate, a source electrode and a drain electrode disposed on the semiconductor layer, and a gate electrode overlapping the semiconductor layer on the source electrode and the drain electrode. Accordingly, in a display device and a manufacturing method thereof, an infrared sensing transistor, a visible light sensing transistor, and a readout transistor are simultaneously formed with a top gate structure such that the number of manufacturing processes and the manufacturing cost may be reduced.01-20-2011
20130214277DISPLAY DEVICE HAVING ELECTROSTATIC DISCHARGE PROTECTION CIRCUIT AND MANUFACTURING METHOD THEREOF - A method of manufacturing a display device including an electrostatic discharge protection circuit, the method including: forming an amorphous silicon layer on a substrate; crystallizing a partial region of the amorphous silicon layer into a polycrystalline silicon layer; and forming at least one transistor on the amorphous silicon layer that was not crystallized into the polycrystalline layer, wherein the electrostatic discharge protection circuit comprises the at least one transistor.08-22-2013
20100123137ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - An array substrate includes; a substrate, a gate line and a data line disposed on the substrate, a thin film transistor (“TFT”) electrically connected to the gate line and the data line, a light blocking member disposed on the substrate and a first color filter and a second color filter disposed on the substrate. The light blocking member covers a portion of the first color filter and the second color filter covers a portion of the light blocking member.05-20-2010
20090242889THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY - Disclosed is a thin film transistor which is characterized by including a gate electrode 10-01-2009
20090242887Display Substrate Having a Transparent Conductive Layer Made of Zinc Oxide and Manufacturing Method Thereof - A display substrate is disclosed comprising: a supporting substrate; an organic resin layer formed on the supporting substrate; and a transparent electrode formed on the organic resin layer, wherein the transparent electrode includes: a first layer containing a zinc oxide and formed in close contact with the organic resin layer; and a second layer containing a zinc oxide and which has a thickness thicker than a thickness of the first layer and is formed on the first layer, wherein the first layer is deposited by either one of a DC sputtering and a DC magnetron sputtering, and the second layer is deposited by any one of a radio frequency sputtering, a radio frequency magnetron sputtering, a radio frequency superimposing a DC sputtering, and a radio frequency superimposing a DC magnetron sputtering, and the display substrate is available, for example, as the substrate having a transparent electrode for counter electrode of liquid crystal display device.10-01-2009
20090242886THIN FILM TRANSISTOR SUBSTRATE - In forming a thin film transistor using multi-tone exposure, a wiring width of a foundational wiring is 40 μm or less, and a ratio of a wiring width of a foundational wiring in a dense case to a space between adjacent wirings is 1.7, preferably 1.0 or less.10-01-2009
20090242884Method of producing display device, display device, method of producing thin-film transistor substrate, and thin-film transistor substrate - A method of producing a display device includes the steps of forming gate electrodes on a substrate so that an arrangement of a source and a drain, in a pixel row direction, of a thin-film transistor formed in each of pixels on the substrate is reversed every pixel row; forming a gate insulating film and an amorphous semiconductor thin film on the substrate in that order so as to cover the gate electrodes; crystallizing the semiconductor thin film by irradiating the semiconductor thin film with an energy beam so that a scanning direction of the energy beam is the same with respect to the arrangement of the source and the drain in the pixel row direction; and forming a light-emitting element connected to the thin-film transistor.10-01-2009
20090236600THIN FILM TRANSISTOR AND DISPLAY DEVICE - A thin film transistor is provided, which includes a gate insulating layer covering a gate electrode, a microcrystalline semiconductor layer provided over the gate insulating layer, an amorphous semiconductor layer overlapping the microcrystalline semiconductor layer and the gate insulating layer, and a pair of impurity semiconductor layers which are provided over the amorphous semiconductor layer and to which an impurity element imparting one conductivity type is added to form a source region and a drain region. The gate insulating layer has a step adjacent to a portion in contact with an end portion of the microcrystalline semiconductor layer. A second thickness of the gate insulating layer in a portion outside the microcrystalline semiconductor layer is smaller than a first thickness thereof in a portion in contact with the microcrystalline semiconductor layer.09-24-2009
20130069069THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes a gate line and the driver connection line formed with the same layer material, a data line and a driving pad formed with the same layer material, a first field generating electrode and a connecting member formed with the same layer material, and a second field generating electrode and a dummy electrode layer formed with the same layer material.03-21-2013
20130069068SEMICONDUCTOR DEVICE, LIGHT-EMITTING DEVICE, AND ELECTRONIC DEVICE - An object is to prevent an operation defect and to reduce an influence of fluctuation in threshold voltage of a field-effect transistor. A field-effect transistor, a switch, and a capacitor are provided. The field-effect transistor includes a first gate and a second gate which overlap with each other with a channel formation region therebetween, and the threshold voltage of the field-effect transistor varies depending on the potential of the second gate. The switch has a function of determining whether electrical connection between one of a source and a drain of the field-effect transistor and the second gate of the field-effect transistor is established. The capacitor has a function of holding a voltage between the second gate of the field-effect transistor and the other of the source and the drain of the field-effect transistor.03-21-2013
20130069067ORGANIC LIGHT EMITTING DIODE (OLED) DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention relates to an organic light emitting diode (OLED) display device and a manufacturing method thereof. An object of the present invention is to provide an organic light emitting diode (OLED) display device and a manufacturing method thereof, in which an auxiliary electrode is formed between a substrate and a second electrode of an OLED cell so as to be connected with the second electrode, thereby improving the luminance uniformity of a large-area the OLED display device, and enabling the quality improvement and economic manufacture of products adopting the OLED display device.03-21-2013
20090026449PIXEL STRUCTURE AND METHOD OF FABRICATING THE SAME - A method for fabricating pixel structures is disclosed. Specifically, the present invention deposits a conductive layer, a gate dielectric layer, and an aluminum layer on a gate dielectric layer, and performs an isotropic etching process to evenly etch a portion of the aluminum layer in the horizontal and vertical direction. By following this process, the number of photomasks used before the formation of the source/drain region can be reduced, and the conductive layer and the aluminum layer disposed on the capacitor electrode in the capacitor region can be used to increase the capacitance of the capacitor.01-29-2009
20090008645Light-emitting device - A method of manufacturing, with high mass productivity, light-emitting devices having highly reliable thin film transistors with excellent electric characteristics is provided. In a light-emitting device having an inverted staggered thin film transistor, the inverted staggered thin film transistor is formed as follows: a gate insulating film is formed over a gate electrode; a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film; a buffer layer is formed over the microcrystalline semiconductor film; a pair of source and drain regions are formed over the buffer layer; and a pair of source and drain electrodes are formed in contact with the source and drain regions so as to expose a part of the source and drain regions.01-08-2009
20090008644THIN FILM TRANSISTOR SUBSTRATE AND LIQUID CRYSTAL DISPLAY - A TFT substrate comprises a substrate, a gate electrode and a lower electrode of a capacitor formed thereon, a first insulating layer formed thereon, a channel layer above the gate electrode and a lower layer of an upper electrode of the capacitor, a channel protection layer formed on an intermediate part of said channel layer and a capacitor protection layer formed on a connection region of the lower layer, source/drain electrodes formed on said channel layer and an upper layer of the upper electrode of the capacitor formed on the lower layer and covering the capacitor protection layer, a second insulating layer covering them, a first connection hole exposing the source electrode and a second connection hole exposing a connection region of said upper layer, which are penetrating the second insulating layer, and a pixel electrode formed thereon.01-08-2009
20090008646Display substrate, method of manufacturing the same, and display device having the same - A display substrate includes a switching member, a color filter layer, an inorganic insulation layer and a pixel electrode. The switching member includes a gate line, a data line crossing the gate line, and a thin-film transistor (TFT) electrically connected to the gate line and the data line. The color filter layer is formed on the switching member. The inorganic insulation layer is formed on the color filter layer. The inorganic insulation layer has a hole formed thereon, which exposes a portion of the color filter layer in correspondence with the TFT The pixel electrode is formed on the inorganic insulation layer.01-08-2009
20100051951THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD OF THE SAME - A thin film transistor (“TFT”) array panel includes; an insulation substrate, a TFT disposed on the insulation substrate and including a drain electrode, a passivation layer covering the TFT and including a contact portion disposed therein corresponding to the drain electrode, a partition comprising an organic material disposed on the passivation layer, and including a transverse portion, a longitudinal portion, and a contact portion disposed on the drain electrode, a color filter disposed on the passivation layer and disposed in a region defined by the partition, an organic capping layer disposed on the partition and the color filter, and a pixel electrode disposed on the organic capping layer, and connected to the drain electrode through the contact portion of the passivation layer and the contact portion of the partition, wherein a contact hole is formed in the organic capping layer corresponding to the contact portion of the passivation layer.03-04-2010
20130134424THIN FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT EMITTING DISPLAY DEVICE COMPRISING THE SAME, AND METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE - A thin film transistor array substrate may include a thin film transistor including an active layer, a gate electrode, source and drain electrodes, a first insulation layer arranged between the active layer and the gate electrode, and a second insulation layer arranged between the gate electrode and the source and drain electrodes, a pixel electrode arranged on the first insulation layer and comprising the same material as the gate electrode, a capacitor comprising a first electrode arranged on the same layer as the active layer and a second electrode arranged on the same layer as the gate electrode, a pad electrode arranged on the second insulation layer and comprising the same material as the source and drain electrodes, a protection layer formed on the pad electrode, and a third insulation layer formed on the protection layer and exposing the pixel electrode.05-30-2013
20080296577Camera module package - There is provided a camera module package including: a substrate having an image sensor disposed on one surface thereof and a pad electrically connected to the image sensor; a protective cap adhered onto the substrate by an adhesive surrounding the image sensor to seal the image sensor, the protective cap transmitting light; and a supporting part surrounding the protective cap, the supporting part adhering and supporting at least one lens formed corresponding to the image sensor. The camera module package is reduced in thickness and size, and minimized in an error of a focal length between the lens and the image sensor, thereby achieving accuracy and high reliability.12-04-2008
20120235149ACTIVE MATRIX SUBSTRATE, PRODUCTION METHOD, AND DISPLAY DEVICE - Disclosed is an active matrix substrate (09-20-2012
20120235148PHOTO-CROSSLINKABLE MATERIAL FOR ORGANIC THIN FILM TRANSISTOR INSULATING LAYER - A problem of the present invention is to provide an organic thin film transistor insulating layer material which is capable of forming a cross-linked structure without conducting a treatment at higher temperature, and which enables an organic thin film transistor to have a small absolute value of threshold voltage (Vth) when it is used for the formation of a gate insulating layer. The means for solving the problem is an organic thin film transistor insulating layer material including a macromolecular compound that has a repeating unit having a group containing a fluorine atom and a repeating unit having a photodimerization-reactive group.09-20-2012
20120235147ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device includes an organic light-emitting device, a thin film transistor (TFT) electrically connected to the organic light-emitting device, and a capacitor electrically connected to the organic light-emitting device, the capacitor including a first electrode layer and a second electrode layer opposite to each other, and a first insulating layer interposed as a single layer between the first electrode layer and the second electrode layer.09-20-2012
20120235146Organic Light-Emitting Display Device and Method of Manufacturing the Same - An organic light-emitting display device comprises: a lower substrate; an upper substrate facing the lower substrate; and a spacer formed in a sealed space between the lower substrate and the upper substrate and dividing the space into two or more sections; wherein air holes are formed in the spacer and allow air to flow between the sections of the space.09-20-2012
20130161624DISPLAY DEVICE - The present invention relates to a display device, which includes a substrate; a first conductive layer disposed on the substrate and including a first terminal; a first insulating layer disposed on the first conductive layer; a second conductive layer disposed on the first insulating layer and including a second terminal; a second insulating layer disposed on the second conductive layer; a profile relieving member disposed on the second insulating layer; and a contact assistant disposed on the profile relieving member, in which the profile relieving member covers a portion of an edge of at least one of the first terminal and the second terminal.06-27-2013
20130161625ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A manufacturing method of an array substrate includes the following steps. A first conductive layer, a gate insulating layer, a semiconductor layer, an etching stop layer, and a first patterned photoresist are successively formed on a substrate. The etching stop layer and the semiconductor layer uncovered by the first patterned photoresist are then removed by a first etching process. A patterned gate insulating layer and a patterned etching stop layer are then formed through a second etching process. The first conductive layer uncovered by the patterned gate insulating layer is then removed to form a gate electrode. The semiconductor layer uncovered by the patterned etching stop layer is then removed to form a patterned semiconductor layer and partially expose the patterned gate insulating layer.06-27-2013
20130161626ARRAY SUBSTRATE FOR FLAT DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - Embodiments relate to an array substrate for a flat display device and a method of fabricating the same for reducing an over etch at a portion of the substrate where a data line is applied in a diagonal shape during the etching of the data line. As a result, disconnection of the data line may be reduced, which in turn reduces the failure rate of the flat display devices and enhances process yield.06-27-2013
20130161627PHOTOELECTRIC CONVERSION APPARATUS, IMAGING APPARATUS USING THE SAME, AND MANUFACTURING METHOD THEREOF - A photoelectric conversion apparatus includes: an active matrix-type TFT array substrate on which photoelectric conversion elements and thin film transistors are arranged in a matrix shape, wherein the photoelectric conversion element connects with a drain electrode via a contact hole opened through a first interlayer insulation film provided above the thin film transistor, wherein a data line and a bias line are connected with the source electrode and the photoelectric conversion element via respective contact holes opened through the second interlayer insulation, and wherein at least a part of the photoelectric conversion element is fixed to have a shape different from a normal pixel between pixels adjacent to each other in an extending direction of the gate line, and an electrical connection between the photoelectric conversion element and the data line is cut off in the transistor of the pixel having the different shape.06-27-2013
20130161628FLEXIBLE SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME, IMAGE DISPLAY DEVICE USING THE SAME AND METHOD FOR MANUFACTURING THE IMAGE DISPLAY DEVICE - There is provided a method for manufacturing a flexible semiconductor device. The manufacturing method of the flexible semiconductor device of the present invention comprising the steps of: forming a gate electrode; forming a gate insulating film so that the gate insulating film contacts with the gate electrode; forming a semiconductor layer on the gate insulating film such that the semiconductor layer is opposed to the gate electrode; forming source and drain electrodes so that the source and drain electrodes contact with the semiconductor layer; forming a flexible film layer so that the flexible film layer covers the semiconductor layer and the source and drain electrodes; forming vias in the flexible film layer; forming a first metal layer by disposing a metal foil onto the flexible film layer, and thereby a semiconductor device precursor is provided; and subjecting the first metal layer to a processing treatment to form a wiring from a part of the first metal layer, wherein, in the step of the processing treatment of the first metal layer, the wiring is formed in a predetermined position by using at least one of the vias as an alignment marker.06-27-2013
20110017994PIXEL ARRAY - A pixel array includes scan lines, data lines, and pixels. Each pixel arranged in the n01-27-2011
20110017996LIGHT-EMITTING DEVICE - An Object of the Present Invention is to provide a new light-emitting device with the use of an amorphous oxide. The light-emitting device has a light-emitting layer existing between first and second electrodes and a field effect transistor, of which the active layer is an amorphous.01-27-2011
20130207114ACTIVE MATRIX SUBSTRATE AND DISPLAY PANEL - An active matrix substrate (08-15-2013
20110001140SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME - A semiconductor device with high reliability and operation performance is manufactured without increasing the number of manufacture steps. A gate electrode has a laminate structure. A TFT having a low concentration impurity region that overlaps the gate electrode or a TFT having a low concentration impurity region that does not overlap the gate electrode is chosen for a circuit in accordance with the function of the circuit.01-06-2011
20120161135PIXEL STRUCTURE - A pixel structure having an SMII (semiconductor-metal-insulator-ITO) capacitor is provided. Specifically, a partial region of a transparent electrode layer corresponding to a semiconductor layer is removed, so as to eliminate parasitic capacitance between the transparent electrode layer and the semiconductor layer, prevent defects (e.g., waterfall, image sticking, etc.) from occurring on the display frame, and improve the display quality.06-28-2012
20120168763Semiconductor Device and Method for Fabricating the Same - The invention primarily provides gate electrodes and gate wirings permitting large-sized screens for active matrix-type display devices, wherein, in order to achieve this object, the construction of the invention is a semiconductor device having, on the same substrate, a pixel TFT provided in a display region and a driver circuit TFT provided around the display region, wherein the gate electrodes of the pixel TFT and the driver circuit TFT are formed from a first conductive layer, the gate electrodes are in electrical contact through connectors with gate wirings formed from a second conductive layer, and the connectors are provided outside the channel-forming regions of the pixel TFT and the driver circuit TFT.07-05-2012
20110278579DISPLAY DEVICE AND CONTROLLING METHOD THEREOF - A conventional setting voltage was a value with an estimated margin of a characteristic change of a light emitting element. Therefore, a voltage between the source and drain of a driver transistor V11-17-2011
20110278578DISPLAY DEVICE - A display device according to the present invention includes: a planarization layer for insulating between a gate electrode etc. and a data wiring, a drain electrode, or the like of the transistor; and a barrier layer that is formed on an upper surface or lower surface of the planarization layer and at the same time, adapted to suppress diffusion of moisture or degassing components from the planarization layer. The display device adopts a device structure effective in reducing the plasma damage on the planarization layer by devising a positional relationship between the planarization layer and the barrier layer. Also, in combination with a novel structure as a structure for a pixel electrode, effects such as an increase in luminance can be provided as well.11-17-2011
20110278577LIGHT-EMITTING DEVICE - It is an object to provide a light-emitting device including a thin film transistor with high electric characteristics and high reliability, and a method for manufacturing the light-emitting device with high productivity. As for a light-emitting device including an inverted staggered thin film transistor of a channel stop type, the inverted staggered thin film transistor includes a gate electrode, a gate insulating film over the gate electrode, a microcrystalline semiconductor film including a channel formation region over the gate insulating film, a buffer layer over the microcrystalline semiconductor film, a channel protective layer which is provided over the buffer layer so as to overlap with the channel formation region of the microcrystalline semiconductor film, a source region and a drain region over the channel protective layer and the buffer layer, and a source electrode and a drain electrode over the source region and the drain region.11-17-2011
20110278575Organic Light-Emitting Display Device and Method of Manufacturing the Same - An organic light-emitting display device preventing edge defects between a pixel define layer and a pixel electrode, and a method of manufacturing the same. The organic light-emitting display device, comprises: a substrate; a pixel electrode disposed on the substrate and comprising a first pattern unit and a second pattern unit which are electrically disconnected; a pixel define unit disposed on the substrate and exposing the pixel electrode; an intermediate layer disposed on the pixel electrode and emitting light; and a counter electrode disposed on the intermediate layer and the pixel define layer.11-17-2011
20110278576ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An array substrate comprises: a base substrate; a display area comprising gate lines and data lines formed on the base substrate, wherein a pixel electrode and a first thin film transistor are formed in each of pixel units defined by the gate lines and the data lines which are crossed with each other, and the gate lines comprises a first gate line and a second gate line; and a dummy area which is at the periphery of the display area, which comprises a second thin film transistor and a connecting structure for each gate line, wherein the first gate line and the second gate line are connected with each other through the second thin film transistor and the connecting structure for the first gate line.11-17-2011
20110278574ACTIVE DEVICE ARRAY SUBSTRATE AND REPAIRING METHOD THEREOF - An active device array substrate including a substrate, a plurality of pixels, a plurality of signal lines, and a repairing structure is provided. The substrate has a display region and a periphery region. The pixels are arranged on the display region of the substrate as an array. The signal lines are electrically connected to the pixels and are respectively extended from the display region to the periphery region. The repairing structure is disposed at the periphery region, and which includes a first repairing line, a second repairing line, an electrostatic discharge (ESD) releasing line, and an ESD protector. The first repairing line is intersected with one ends of the signal lines and is electrically floated. The ESD protector is connected between the second repairing line and the ESD releasing line, and the ESD protector is overlapped with and electrically insulated from the first repairing line.11-17-2011
20120097954ORGANIC LIGHT EMITTING DISPLAY DEVICE - The present invention further relates to an OLED device, including R, G, B, and W subpixels. Specifically, the OLED device comprises a substrate; a thin film transistor (TFT) active layer disposed on the substrate, comprising a gate electrode, a gate insulating layer, an active layer, an interlayer insulating layer, a source electrode, and a drain electrode; an overcoat layer disposed over the thin film transistor; and a passivation layer disposed between the thin film transistor and the overcoat layer, wherein the passivation layer is absent in a path of a light or wherein the passivation layer is disposed in the path of the light as a single layer comprising silicon nitride.04-26-2012
20120097953DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A display apparatus includes a thin film transistor provided on a substrate and a pixel electrically coupled to the thin film transistor. The thin film transistor includes a semiconductor layer on the substrate, a first insulating layer on the semiconductor layer and having a first contact hole and a second contact hole, a source electrode on the first insulating layer and making contact with the semiconductor layer through the first contact hole, a drain electrode on the first insulating layer and making contact with the semiconductor layer through the second contact hole, a gate electrode between the source electrode and the drain electrode and having a stacked structure including a first conductive layer and a second conductive layer, and a second insulating layer between the source electrode and the drain electrode and covering the gate electrode.04-26-2012
20090146147Digital x-ray detector and fabrication method thereof - A digital x-ray detector and its fabrication method are disclosed to strengthen an electrical connection between an upper electrode and a lower by employing a multi-contact hole structure and obtaining reliability of a contact hole by electrically connecting the side of the lower line and the upper electrode. A semiconductor layer is inserted at a lower portion of the contact hole to prevent damage of a gate insulating layer possibly caused by an overetch to thus reduce a defective contact.06-11-2009
20120138941LIQUID CRYSTAL PANEL AND METHODS FOR FABRICATING LIQUID CRYSTAL PANEL, ARRAY SUBSTRATE, AND COLOR FILTER SUBSTRATE - A liquid crystal display panel according to an embodiment of the disclosure comprises an array substrate and a color filter substrate, and primary spacers and protrusions are formed on the array substrate and the color filter substrate and contact each other, the protrusions corresponding to at least one of gate lines and data lines on the array substrate. Also, a method for manufacturing a liquid crystal display panel is provided.06-07-2012
20100171121THIN FILM ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film array panel is provided, which includes: a plurality of signal lines including contact parts for contact with an external device; a plurality of thin film transistors connected to the signal lines; an insulating layer formed on the signal lines and the thin film transistors; and a plurality of pixel electrodes formed on the insulating layer and connected to the thin film transistors, wherein the insulating layer includes a contact portion disposed on the contact parts of the signal lines and having a thickness smaller than other portions and the contact portion of the insulating layer includes an inclined portion having an inclination angle smaller than about 45 degrees.07-08-2010
20110284853DISPLAY SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME - A display substrate, a display device having the same and a method of manufacturing the display substrate are provided. The display substrate includes a base substrate having a pixels-populated area (PA) and a surrounding area (SA) outside the PA, a first contact pad portion formed in the surrounding area, a second contact pad portion formed in the surrounding area formed to be spaced apart from the first contact pad portion with a spacing region provided therebetween, an insulating layer formed in the spacing region between the first and second contact pad portions and having a thickness smaller than or equal to a thickness of each of the first and second contact pad portions, and a first conductive film formed on the first and second pad portions.11-24-2011
20110284851SYSTEM FOR DISPLAYING IMAGES - A system for displaying images includes a multi-gate thin film transistor (TFT) device including an active layer, first and second gate structures, and first and second light-shielding layers. The active layer is disposed on a substrate in a pixel region. The first and second gate structures are disposed on the active layer. The first and second light-shielding layers are disposed between the substrate and the active layer. The active layer includes first and second source/drain regions and first and second channel regions. The first light-shielding layer corresponds to a first lightly doped region and laterally extends under at least a portion of the first channel region. The second light-shielding layer corresponds to the second lightly doped region and laterally extends under at least a portion of the second channel region.11-24-2011
20110284856SEMICONDUCTOR DEVICE - An object is to reduce off-current of a thin film transistor. Another object is to improve electric characteristics of a thin film transistor. Further, it is still another object to improve image quality of a display device using the thin film transistor. An aspect of the present invention is a thin film transistor including a semiconductor film formed over a gate electrode and in an inner region of the gate electrode which does not reach an end portion of the gate electrode, with a gate insulating film interposed therebetween, a film covering at least a side surface of the semiconductor film, and a pair of wirings over the film covering the side surface of the semiconductor film; in which an impurity element serving as a donor is added to the semiconductor film.11-24-2011
20110284855RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME - The resin composition of the present invention is a resin composition characterized by including (a) a polyimide, a polybenzoxazole, a polyimide precursor or a polybenzoxazole precursor, (b) 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 1,7-dihydroxynaphthalene, or 2,3-dihydroxynaphthalene, and (c) a thermal cross-linking agent having a specific structure. By the use of the resin composition of the present invention, it is possible to reduce the transmittance in the visible region of a cured film while maintaining the transmittance of a resin film before curing.11-24-2011
20110284857THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor array panel is provided, which includes a substrate, a plurality of gate line formed on the substrate, a plurality of common electrodes having a transparent conductive layer on the substrate, a gate insulating layer covering the gate lines and the common electrodes, a plurality of semiconductor layers formed on the gate insulating layer, a plurality of data lines including a plurality of source electrodes and formed on the semiconductor layer and the gate insulating layer, a plurality of drain electrodes formed on the semiconductor layer and the gate insulating layer, and a plurality of pixel electrodes overlapping the common electrodes and connected to the drain electrodes. Because the common electrodes are made of ITON, IZON, or a-ITON, or a double layer of ITO/ITON, IZO/IZON, or a-a-ITO/a-ITON, when H2 or SiH4 are injected to form a silicon nitride (SiNX) layer on the common electrodes, the opaque metal Sn or Zn in which the rmetal component is reduced in the IZO, ITO, or a-ITO is not produced on the surfaces of the common electrode.11-24-2011
20110284854SEMICONDUCTOR DEVICE - In a transistor having a top-gate structure in which a gate electrode layer overlaps with an oxide semiconductor layer which forms a channel region with a gate insulating layer interposed therebetween, when a large amount of hydrogen is contained in the insulating layer, hydrogen is diffused into the oxide semiconductor layer because the insulating layer is in contact with the oxide semiconductor layer; thus, electric characteristics of the transistor are degraded. An object is to provide a semiconductor device having favorable electric characteristics. An insulating layer in which the concentration of hydrogen is less than 6×1011-24-2011
20110284852THIN-FILM TRANSISTOR, ARRAY SUBSTRATE HAVING THE SAME AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor includes a semiconductor pattern, a first gate electrode, a source electrode, a drain electrode and a second gate electrode. The semiconductor pattern is formed on a substrate. A first conductive layer has a pattern that includes the first gate electrode which is electrically insulated from the semiconductor pattern. A second conductive layer has a pattern that includes a source electrode electrically connected to the semiconductor pattern, a drain electrode spaced apart from the source electrode, and a second gate electrode electrically connected to the first gate electrode. The second gate electrode is electrically insulated from the semiconductor pattern, the source electrode and the drain electrode.11-24-2011
20120187404DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - Provided is a display device that includes: a gate line disposed on a substrate, the gate line including a protruding gate electrode; a data line extending across the gate line, the data line having first and second segments spaced apart from each other; a semiconductor pattern overlapping with the gate electrode; a drain electrode that contacts a drain region of the semiconductor pattern and connects the first and second segments; a source electrode that contacts a source region of the semiconductor pattern; and a storage electrode overlapping with the data line.07-26-2012
20090206340Thin Film Transistor Array Panel - A thin film transistor array panel is provided according to one or more embodiments. In an embodiment, the thin film transistor array panel includes: a base substrate that has a display area and a peripheral area; a plurality of thin film transistors that are formed in the display area; a plurality of signal input pads that are formed in the peripheral area and that are formed long in a first direction; and a plurality of signal lines that are connected to the thin film transistors and the signal input pads, wherein at least a part of each of the plurality of signal input pads is arranged in a line along the first direction.08-20-2009
20090206338ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY MODULE INCLUDING THE ARRAY SUBSTRATE AND METHOD OF FABRICATING THE ARRAY SUBSTRATE - An array substrate for a liquid crystal display device includes a gate line and a gate electrode on a substrate, the gate electrode connected to the gate line; a gate insulating layer on the gate line and the gate electrode; an active layer of intrinsic amorphous silicon on the gate insulating layer and corresponding to the gate electrode; an ohmic contact layer of impurity-doped amorphous silicon on the active layer; a data line crossing the gate line; a source electrode on the ohmic contact layer and connected to the data line; a drain electrode on the ohmic contact layer and spaced apart from the source electrode; a passivation layer on the source and drain electrodes and including a drain contact hole exposing a portion of the drain electrode; and a pixel electrode on the passivation layer and connected to the drain electrode through the drain contact hole, wherein the ohmic contact layer covers the active layer in a space between the source and drain electrodes.08-20-2009
20090278130ARRAY SUBSTRATE, LIQUID CRYSTAL DISPLAY PANEL HAVING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME - In an array substrate, an LCD panel having the same and an LCD device having the same, the array substrate may include an insulating substrate, a switching element (e.g., a transistor such as a TFT), a main pixel portion, a coupling capacitor and a sub-pixel portion. The switching element may be formed on the insulating substrate in a pixel region defined by gate and data lines adjacent to each other. The gate and data lines may be formed on the insulating substrate. The main pixel portion is on a first (e.g., central) portion of the pixel region. The coupling capacitor is electrically connected to the switching element. The coupling capacitor is on the insulating substrate. The sub-pixel portion is electrically connected to the coupling capacitor. The sub-pixel portion is on a second (e.g., peripheral) portion of the pixel region. Therefore, an image display quality is improved.11-12-2009
20090045403Contact structure and semiconductor device - To improve the reliability of contact with an anisotropic conductive film in a semiconductor device such as a liquid crystal display panel, a terminal portion (02-19-2009
20110297947PIXEL STRUCTURE - A pixel structure having the following structure is provided. A light-shielding layer with a flat layer covering thereon is disposed on a substrate. A channel layer, a data line and a first pad are disposed on the flat layer. A source and a drain partially cover two sides of the channel layer. A gate dielectric layer with a gate, a scan line and a second pad disposed thereon covering the channel layer, the source and the data line exposes the drain and the first pad. A protection layer covering the gate and the scan line exposes the drain, the first and second pads. A patterned transparent conductive layer includes a pixel electrode disposed on the protection layer, a first retain portion disposed on the first pad and a second retain portion disposed on the second pad.12-08-2011
20110297946THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor array substrate includes a gate line disposed on a substrate, the gate line comprising a gate electrode including a lower film and an upper film thicker than the lower film, a gate insulating layer formed on the gate line, a semiconductor layer formed on the gate insulating layer, an ohmic contact layer formed on the semiconductor layer, a data line electrically connected to a source electrode and a drain electrode formed on the ohmic contact layer, the lower film of the gate line is in contact with the gate insulating layer at a crossing portion of the gate line and the data line and the heights of the source electrode and the drain electrode are substantially the same as or less than a height of the semiconductor layer.12-08-2011
20110297945FLAT PANEL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a flat panel display device includes: forming a semiconductor layer of a thin film transistor (TFT) on a substrate; forming a gate electrode on the semiconductor layer with a gate insulating layer between the gate electrode and the semiconductor layer, and doping source and drain regions of the semiconductor layer with ion impurities; sequentially forming a first conductive layer, a first insulating layer, and a second conductive layer, and forming a capacitor at a distance away from the TFT by patterning the first conductive layer, the first insulating layer, and the second conductive layer; forming a second insulating layer, and forming contact holes passing through the second insulating layer, the contact holes exposing portions of the source and drain regions and the second conductive layer; and forming source and drain electrodes that respectively contact the source and drain regions and the second conductive layer through the contact holes.12-08-2011
20110297943ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device including an insulating layer having an uneven portion formed in an emission area so as to reduce changes in color characteristics due to a viewing angle, and a method of manufacturing the same. The organic light-emitting display device includes: a substrate including an emission area and a circuit area including at least one thin film transistor (TFT); an insulating layer having a contact hole located at the circuit area, and including an uneven portion located at the emission area, the contact hole exposing the at least one TFT; a first electrode located on the uneven portion and coupled to the at least one TFT through the contact hole; an organic layer located on the first electrode; and a second electrode located on the organic layer.12-08-2011
20110297942ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device and a method of manufacturing the same are disclosed. The organic light-emitting display device includes: a lower substrate including a display area and a non-display area, the lower substrate further including a power supply wiring unit disposed in the non-display area, the power supply wiring unit including at least one power supply wiring extending along an edge of the display area; an encapsulation substrate having an outer surface and an inner surface facing the lower substrate; a cavity formed into the inner surface of the encapsulation substrate in a region over the power supply wiring unit such that the cavity overlaps at least part of the power supply wiring when viewed in a direction perpendicular to the outer surface of the encapsulation substrate; and a polarizing plate disposed on the outer surface of the encapsulation substrate.12-08-2011
20110291095DISPLAY DEVICE - A display device including a display panel including a first pixel area and a second pixel area adjacent to the first pixel area; and a barrier positioned on a surface of the display panel, the barrier including: a first sub-barrier; and a second sub-barrier, wherein the first sub-barrier and the second sub-barrier are disposed between the first pixel area and the second pixel area to respectively cover an end of the first pixel area and an end of the second pixel area, in which the first pixel area and the second pixel area display a same first image, or the first pixel area displays any one of a first left-eye image and a first right-eye image and the second pixel area displays the other one of the first left-eye image and the first right-eye image.12-01-2011
20120012851SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME - A pixel TFT formed in a pixel region is formed on a first substrate by a channel etch type reverse stagger type TFT, and patterning of a source region and a drain region, and patterning of a pixel electrode are performed by the same photomask. A driver circuit formed by using TFTs having a crystalline semiconductor layer, and an input-output terminal dependent on the driver circuit, are taken as one unit. A plurality of units are formed on a third substrate, and afterward the third substrate is partitioned into individual units, and the obtained stick drivers are mounted on the first substrate.01-19-2012
20120012847DISPLAY DEVICE AND ELECTRONIC DEVICE INCLUDING THE SAME - One embodiment of the present invention provides a highly reliably display device in which a high mobility is achieved in an oxide semiconductor. A first oxide component is formed over a base component. Crystal growth proceeds from a surface toward an inside of the first oxide component by a first heat treatment, so that a first oxide crystal component is formed in contact with at least part of the base component. A second oxide component is formed over the first oxide crystal component. Crystal growth is performed by a second heat treatment using the first oxide crystal component as a seed, so that a second oxide crystal component is formed. Thus, a stacked oxide material is formed. A transistor with a high mobility is formed using the stacked oxide material and a driver circuit is formed using the transistor.01-19-2012
20110291099DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A three mask process for forming an LCD substrate includes, depositing in sequence on a base substrate a gate metallic layer, a gate insulation layer and a channel layer. A first photoresist pattern is used to form a gate electrode of a switching device, a channel pattern and a gate line on the gate electrode. A transparent conductive layer and a source metallic layer are deposited in sequence on the base substrate having the channel pattern. A source electrode and a drain electrode of the switching device, a pixel electrode and a source line electronically connected to the drain electrode, are formed by a second photoresist pattern. A first protective insulation layer is formed, and the first protective insulation layer on the pixel electrode is removed by a third photoresist pattern. Therefore, by the three masks process yields a simplified manufacturing process in which the lower portion of the source metallic pattern is not formed and display quality is improved.12-01-2011
20110291098ORGANIC EL DISPLAY DEVICE, MOTHER SUBSTRATE OF ORGANIC EL DISPLAY DEVICE, AND METHOD OF TESTING ORGANIC EL DISPLAY DEVICE - A first resistance element (R12-01-2011
20110291096ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME - A method of fabricating an array substrate and a display device including the array substrate are discussed. According to an embodiment, the method includes forming a gate electrode on a substrate, forming a gate insulating layer on the gate electrode, forming an oxide semiconductor layer and an etch prevention layer on the gate insulating layer using a single mask, forming source and drain electrodes on the etch prevention layer, and forming a passivation layer including a contact hole on the source and drain electrodes and on the gate insulating layer, and forming a pixel electrode on the passivation layer and through the contact hole.12-01-2011
20110291094DISPLAY PANEL - A display panel including a first substrate, a second substrate opposite to the first substrate and a display medium between the first substrate and the second substrate is provided. The first substrate has a scan line, a data line and an active device electrically connected to the scan line and the data line. The second substrate has a common electrode layer, an insulting layer covering the common electrode layer, a pixel electrode on the insulating layer and a contact structure on the insulating layer. More specifically, the contact structure is electrically connected to the pixel structure and electrically connected to the active device on the first substrate.12-01-2011
20100193793CIRCUIT BOARD AND DISPLAY DEVICE - The present invention provides a circuit board having a reduced wiring area in a circuit portion and therefore suitably used for reduction in a display region of a display device, and further provides a display device including such a circuit board. The present invention is a circuit board including: 08-05-2010
20110297944ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus and a method of manufacturing the same are disclosed. The organic light-emitting display apparatus includes: an active layer formed on a substrate, a gate electrode including: a first gate electrode layer insulated from the active layer and including a semi-transmissive conductive material, a second gate electrode layer formed on the first gate electrode layer configured to protect the first gate electrode layer, a third gate electrode layer formed on the second gate electrode layer and including a transparent conductive material, and a fourth gate electrode layer formed on the third gate electrode layer and including a conductive material, a pixel electrode including: a first electrode layer formed in the same layer level as the first gate electrode layer and including a semi-transmissive conductive material, a second electrode layer formed on the first electrode layer configured to protect the first electrode layer, a third electrode layer formed on the second electrode layer and including a transparent conductive material, and a fourth electrode layer formed on the third electrode layer and including a conductive material, source and drain electrodes insulated from the gate electrode and electrically connected to the active layer and the pixel electrode, an intermediate layer formed on the pixel electrode and including an organic light-emitting layer, and an opposite electrode formed on the intermediate layer.12-08-2011
20090121230LIGHT EMITTING DEVICE - A light emitting device is disclosed. The light emitting device includes a substrate including a thin film transistor, an insulating film disposed over the thin film transistor, a first electrode disposed over the thin film transistor and connected to the thin film transistor, a function layer including at least one of a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an electron injection layer, which are sequentially disposed over the first electrode, and a second electrode disposed on the function layer. A thickness of the first electrode is substantially 0.29 to 0.35 times a thickness of the function layer. A thickness of the second electrode is substantially 0.29 to 0.69 times the thickness of the function layer.05-14-2009
20080290343ORGANIC LIGHT-EMITTING DISPLAY DEVICE - An organic light-emitting display device. The organic light-emitting display device according to an embodiment of the present invention utilizes an N-type driving transistor, and therefore it has a drain electrode of a driving transistor electrically connected to a cathode electrode of an organic light-emitting diode, wherein the organic light-emitting display device includes a thin metal film between the cathode electrode and the organic light-emitting layer.11-27-2008
20120097960SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device having high operating performance and reliability, and a manufacturing method thereof are provided. An LDD region 04-26-2012
20120097959Thin Film Transistor Array, Method for Manufacturing the Same, and Active Matrix Type Display Using the Same - One embodiment of the present invention is a thin film transistor array, having an insulating substrate and a stripe-shaped semiconductor layer for a plurality of transistors, the layer extending over the plurality of transistors. Another embodiment of the present invention is an active matrix type display, having the thin film transistor array of the one embodiment and an image display means.04-26-2012
20120097957ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device includes: a buffer layer including sequentially stacked materials having different refractive indexes on a substrate; source and drain electrodes on the buffer layer; a first active layer of a thin film transistor between the source and drain electrodes, and a second active layer spaced from the first active layer at a same layer as and including a same material as the first active layer; a first insulation layer on the buffer layer, the source and drain electrodes, the first and second active layers, and including sequentially stacked materials having different refractive indexes; a first gate electrode corresponding to a center region of the first and second active layers with the first insulation layer therebetween, and a pixel electrode at a same layer as and comprising a same material as the first gate electrode; and a second gate electrode on the first gate electrode.04-26-2012
20120097955THIN FILM TRANSISTOR AND PIXEL STRUCTURE HAVING THE THIN FILM TRANSISTOR - A thin film transistor (TFT) and a pixel structure having the TFT are provided. The TFT is configured on a substrate. Besides, the TFT includes a gate, a gate insulation layer, a source, a channel layer, and a drain. The gate insulation layer covers the gate and the substrate. The source is configured on a portion of the gate insulation layer. The channel layer is configured on the gate insulation layer and covers a portion of the source located above the gate. The drain is configured on and electrically connected to the channel layer.04-26-2012
20090152557ELECTRO-LUMINESCENCE DEVICE INCLUDING A THIN FILM TRANSISTOR AND METHOD OF FABRICATING AN ELECTRO-LUMINESCENCE DEVICE - An electro-luminescence device including an electro-luminescence element and a thin film transistor electrically connected to the electro-luminescence element. The thin film transistor includes a gate electrode formed over a substrate, an insulating layer formed over the gate electrode, and a first semiconductor pattern formed over the insulating layer. An etch stop layer is formed over the first semiconductor layer. A second semiconductor pattern is formed over the etch stop layer at one side of the etch stop layer, and a third semiconductor pattern is formed over the etch stop layer at another side of the etch stop layer. A source electrode is formed over the second semiconductor pattern, and a drain electrode is formed over the third semiconductor pattern.06-18-2009
20120097951ORGANIC LIGHT EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - An organic light-emitting display device includes a substrate including a rectangular light-emitting area and a circuit area, the circuit area including a thin film transistor, the light-emitting area including an electroluminescent layer produced by a solution deposition process, the light-emitting area being bounded by a first major side, a second major side, a first minor side and a second minor side, the first major side being opposite from and parallel to a second major side, each of these sides having wiring or dummies arranged thereat, and a pixel defining layer arranged on the wirings and on the dummies. In order to produce a uniform thickness electroluminescent layer via a solution deposition process, top surfaces of the pixel defining layer on each of the wirings and dummies that border the light emitting area are arranged in a same plane that is parallel to the substrate.04-26-2012
20090127556SEMICONDUCTOR DEVICE HAVING LIGHT EMITTING ELEMENT, INTEGRATED CIRCUIT AND ADHESIVE LAYER (AS AMENDED) - To realize a high-performance liquid crystal display device or light-emitting element using a plastic film. A CPU is formed over a first glass substrate and then, separated from the first substrate. A pixel portion having a light-emitting element is formed over a second glass substrate, and then, separated from the second substrate. The both are bonded to each other. Therefore, high integration can be achieved. Further, in this case, the separated layer including the CPU serves also as a sealing layer of the light-emitting element.05-21-2009
20090072236PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A pixel structure and a manufacturing method thereof is provided, the pixel structure including a thin film transistor (TFT), a pixel electrode, a common line, a first dielectric layer and a second dielectric layer. Both of the TFT and the pixel electrode are disposed on the substrate and electrically coupled to each other. The common line is disposed on the substrate under the pixel electrode, while the first dielectric layer is extended from the TFT to under the pixel electrode to cover the common line. The second dielectric layer covers the TFT and is extended from the TFT to under the pixel electrode. The pixel electrode and the common line form a storage capacitor, and the shortest distance between the pixel electrode and the common line is smaller than the sum of the thickness of the first dielectric layer and the thickness of the second dielectric layer in the TFT.03-19-2009
20100038643Organic light emitting display and manufacturing method of the same - Provided are an organic light emitting display device and a method for manufacturing the same. The organic light emitting display device comprises a transistor on a substrate, a cathode on the transistor and connected to a source or a drain of the transistor, a bank layer on the cathode and having an opening, a metal buffer layer on the cathode, an organic light emitting layer on the metal buffer layer, and an anode on the organic light emitting layer.02-18-2010
20090294772Thin film transistor, method of manufacturing the same and flat panel display device having the same - A thin film transistor is provided having an oxide semiconductor as an active layer, a method of manufacturing the thin film transistor and a flat panel display device having the thin film transistor. The thin film transistor includes: a gate electrode formed on a substrate; an oxide semiconductor layer isolated from the gate electrode by a gate insulating layer and including channel, source and drain regions; source and drain electrodes coupled to the source and drain regions, respectively; and an ohmic contact layer interposed between the source and drain regions and the source and drain electrodes. In the TFT, the ohmic contact layer is formed with the oxide semiconductor layer having a carrier concentration higher than those of the source and drain regions.12-03-2009
20090101900Optical Sensor with Photo TFT - An optical sensor is disclosed. Each sensor pixel circuit of the optical sensor includes a first readout TFT for reading out voltage of a charge node, a second readout TFT for controllably resetting the charge node to a first reset voltage, and a photo TFT for discharging the voltage at the charge node to a second reset voltage in absence of an object(s).04-23-2009
20100032673LIQUID CRYSTAL DISPLAY DEVICE - A liquid crystal display device includes a semiconductor layer which is formed of a poly-Si layer and an a-Si layer and formed above a gate electrode with a gate insulating film interposed therebetween. A source electrode or a drain electrode is formed above the semiconductor layer. An n+Si layer is formed between the source electrode or the drain electrode and the semiconductor layer. Since ends of the source electrode or the drain electrode are formed inside ends of the semiconductor layer, leak current at the ends of the semiconductor layer can be reduced.02-11-2010
20090315033THIN FILM TRANSISTOR ARRAY PANEL AND A METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel includes a substrate; a plurality of gate lines that are formed on the substrate; a plurality of data lines that intersect the gate lines; a plurality of thin film transistors that are connected to the gate lines and the data lines; a plurality of color filters that are formed on upper parts of the gate lines, the data lines, and the thin film transistors; a common electrode that is formed on the color filters and that includes a transparent conductor; a passivation layer that is formed on an upper part of the common electrode; and a plurality of pixel electrodes that are formed on an upper part of the passivation layer and that are connected to a drain electrode of each of the thin film transistors.12-24-2009
20110260166ORGANIC LIGHT EMITTING DIODE DISPLAY - An organic light emitting diode display includes a substrate including a display area and a non-display area, subpixels arranged in the display area in a matrix form, a contact electrode that is formed in the non-display area, transfers a power received from the outside, and includes at least one of electrodes included in each subpixel, and a contact unit that includes at least one of insulating layers included in each subpixel and exposes a portion of the contact electrode. An upper electrode included in each subpixel is formed in the display area and the non-display area and is electrically connected to the contact electrode through the contact unit.10-27-2011
20090200555Thin film transistor substrate, defect repairing method therefor, and display device - A thin film transistor substrate includes: a substrate; a thin film transistor and a capacitor formed on the substrate; and a protective film for protecting an electrode on a back surface side of the capacitor when an electrode on a front surface side of the capacitor is cut by irradiation with laser light, the protective film being disposed at such a position as to enclose a corner part of the electrode on the front surface side between the electrode on the front surface side and the electrode on the back surface side of the capacitor.08-13-2009
20120025193Semiconductor Device and Driving Method Thereof - A voltage equal to the threshold value of a TFT (02-02-2012
20120025192Organic electroluminescence display and method for manufacturing the same - One embodiment of the present invention is an organic electroluminescence display, including: a substrate with a partition wall between adjacent organic electroluminescence elements; a first electrode layer formed on the substrate; a hole transport layer formed on both the first electrode layer and the partition wall; an underlayer formed on the hole transport layer; a first light emitting layer formed on the underlayer, emitted light from the first light emitting layer having a first wavelength; a second light emitting layer formed so as to partially overlap the first light emitting layer, emitted light from the second light emitting layer having a second wavelength, and the second wavelength being longer than the first wavelength; and a second electrode layer, wherein overlapping point of the first light emitting layer and the second light emitting layer is above the partition wall.02-02-2012
20090315031LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention relates to a liquid crystal display and a method of manufacturing the same. A liquid crystal display according to an exemplary embodiment of the present invention includes: a first substrate, a first conductor arranged on the first substrate, a first insulating layer arranged on the first substrate and the first conductor, a second insulating layer arranged on the first insulating layer, a semiconductor layer arranged on the second insulating layer, and a second conductor arranged on the semiconductor layer and the second insulating layer. The semiconductor layer is made of an oxide semiconductor, and the second conductor includes a source electrode, a drain electrode, and a storage electrode line.12-24-2009
20090315032DISPLAY DEVICE - A display device according to the present invention includes: a planarization layer for insulating between a gate electrode etc. and a data wiring, a drain electrode, or the like of the transistor; and a barrier layer that is formed on an upper surface or lower surface of the planarization layer and at the same time, adapted to suppress diffusion of moisture or degassing components from the planarization layer. The display device adopts a device structure effective in reducing the plasma damage on the planarization layer by devising a positional relationship between the planarization layer and the barrier layer. Also, in combination with a novel structure as a structure for a pixel electrode, effects such as an increase in luminance can be provided as well.12-24-2009
20090057673Pixel structure of solid-state image sensor - To eliminate uneven distribution of electrons caused by variation in threshold voltages of gates for distributing electrons and to have sensitivity in a long wavelength in a pixel structure of a solid-state image sensor of a charge sorting method, the structure has: a photodiode that generates electrons by photoelectric conversion; a plurality of charge-storage sections that store electrons generated in the photodiode; and a gate structure that is arranged between the photodiode and the charge-storage sections and controls transfer of electrons generated in the photodiode to the plurality of charge-storage sections, in which the gate structure is made up of plural stages of gates, and the plural stages of gates at least have: a front stage gate that is arranged adjacent to the photodiode and controls readout of electrons generated in the photodiode; and a rear stage gate that is arranged adjacent to the plurality of charge-storage sections on the rear stage of the front stage gate and performs control of distributing electrons read out by readout control of the front stage gate to the plurality of charge-storage sections.03-05-2009
20090121227METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE AND DISPLAY DEVICE - A method of manufacturing a thin film transistor array substrate according to the present invention includes: forming a pattern made of a first conductive film; stacking a gate insulating film, a semiconductor layer, and a resist in the stated order; forming a resist pattern having a step structure in a thickness direction; forming an exposed area of the first conductive film and a pattern of the semiconductor layer by using the resist pattern; forming a pattern made of a second conductive film in contact with the first conductive film in the exposed area of the first conductive film; and forming a pattern made of a third conductive film. The first conductive film forms a gate electrode, and the second conductive film forms each of a source electrode and a drain electrode. The third conductive film forms a pixel electrode, and the second conductive film is coated with an upper-layer film.05-14-2009
20090101901Semiconductor device and manufacturing method thereof - By providing appropriate TFT structures arranged in various circuits of the semiconductor device in response to the functions required by the circuits, it is made possible to improve the operating performances and the reliability of a semiconductor device, reduce power consumption as well as realizing reduced manufacturing cost and increase in yield by lessening the number of processing steps. An LDD region of a TFT is formed to have a concentration gradient of an impurity element for controlling conductivity which becomes higher as the distance from a drain region decreases. In order to form such an LDD region having a concentration gradient of an impurity element, the present invention uses a method in which a gate electrode having a taper portion is provided to thereby dope an ionized impurity element for controlling conductivity accelerated in the electric field so that it penetrates through the gate electrode and a gate insulating film into a semiconductor layer.04-23-2009
20110169000DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a first light blocking pattern formed on a base substrate, a first switching element, a second light blocking pattern formed on the base substrate, and a first sensing element. The first light blocking pattern is configured to block visible light and transmit infrared light. The first switching element includes a first semiconductor pattern, a first source electrode, a first drain electrode, and a first gate electrode. The second light blocking pattern is configured to block the visible light and transmit the infrared light. The first sensing element is configured to detect the infrared light, and includes a second semiconductor pattern, a second source electrode, a second drain electrode, and a second gate electrode.07-14-2011
20110266543CIRCUIT BOARD AND DISPLAY DEVICE - The present invention provides a circuit board that includes top gate TFTs and bottom gate TFTs formed on the same substrate and that can improve reliability of these TFTs. The present invention is a circuit board including a bottom gate thin film transistor and a top gate thin film transistor on a substrate, 11-03-2011
20090146149SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD THEREOF - In a display device such as a liquid crystal display device, a large-sized display screen is realized under low power consumption. A surface of a source wiring line of a pixel portion employed in an active matrix type liquid crystal display device is processed by way of a plating process operation so as to lower a resistance value of this source wiring line. The source wiring line of the pixel portion is manufactured at a step different from a step for manufacturing a source wiring line of a drive circuit portion. Further, electrodes of a terminal portion are processed by a plating process operation so as to reduce a resistance value thereof.06-11-2009
20090146151THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A method for manufacturing a TFT-array substrate includes forming a first conductive pattern layer including a gate line, a gate electrode, and a lower gate pad electrode using a first mask, forming a channel and a second conductive pattern layer including a source electrode, a drain electrode, a data line, a data pad electrode, and a middle gate pad electrode using a second mask, and forming a third conductive pattern layer including a pixel electrode, an upper gate pad electrode, and an upper data pad electrode using a third mask. A TFT-array substrate includes crossing gate lines and data lines, TFTs formed at the crossings of gate lines and data lines, pixel electrodes formed in regions defined by the crossing gate lines and data lines, data pad electrodes connected to the data lines, and gate pad electrodes connected to the gate lines.06-11-2009
20090146150Display Device and Method for Manufacturing the Same - A display device having the high aperture ratio and a storage capacitor with high capacitance is to be obtained. The present invention relates to a display device and a manufacturing method thereof. The display device includes a thin film transistor which includes a gate electrode, a gate insulating film, a first semiconductor layer, a channel protective film, a second semiconductor having conductivity which is divided into a source region and a drain region, and a source electrode and a drain electrode; a third insulating layer formed over the second conductive film; a pixel electrode formed over the third insulating layer, which is connected to one of the source electrode and the drain electrode; and a storage capacitor formed in a region where a capacitor wiring over the first insulating layer and the pixel electrode are overlapped with the third insulating layer over the capacitor wiring interposed therebetween.06-11-2009
20080237598THIN FILM FIELD EFFECT TRANSISTOR AND DISPLAY - A thin film field effect transistor including, on a substrate, at least a gate electrode, a gate insulating layer, an active layer, a source electrode and a drain electrode, wherein an electric resistance layer is provided in electric connection between the active layer and at least one of the source electrode or the drain electrode.10-02-2008
20080237597THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A TFT array panel includes: first and second gate members connected to each other; a gate insulating layer formed on the first and the second gate members; first and second semiconductor members formed on the gate insulating layer opposite the first and the second gate members, respectively; first and second source members connected to each other and located near the first and the second semiconductor members, respectively; first and second drain members located near the first and the second semiconductor members, respectively, and located opposite the first and the second source members with respect to the first and the second gate members, respectively; and a pixel electrode connected to the first and the second drain members. The first gate, semiconductor, source, and drain members form a first TFT, and the second gate, semiconductor, source, and drain members form a second TFT.10-02-2008
20110147752SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.06-23-2011
20110147753DISPLAY DEVICE, COPPER ALLOY FILM FOR USE THEREIN, AND COPPER ALLOY SPUTTERING TARGET - Disclosed is a Cu alloy film for a display device that has high adhesion to a glass substrate while maintaining a low electric resistance characteristic of Cu-based materials. The Cu alloy film is wiring in direct contact with a glass substrate on a board and contains 0.1 to 10.0 atomic % in total of one or more elements selected from the group consisting of Ti, Al, and Mg. Also disclosed is a display device comprising a thin-film transistor that comprises the Cu alloy film. In a preferred embodiment of the display device, the thin-film transistor has a bottom gate-type structure, and a gate electrode and scanning lines in the thin-film transistor comprise the Cu alloy film and are in direct contact with the glass substrate.06-23-2011
20100264417THIN-FILM TREANSISTOR ARRAY PANEL AND METHOD OF FABRICATING THE SAME - A thin-film transistor array panel and a manufacturing method thereof are provided for one or more embodiments. The thin-film transistor array panel may include: a substrate; a gate electrode formed on the substrate; a gate insulating layer formed on the gate electrode; a source electrode and a drain electrode formed on the gate insulating layer; and a flatness layer formed on the source electrode and the drain electrode, wherein the drain electrode has a higher height than the flatness layer.10-21-2010
20090057668Display Element and Method of Manufacturing the Same - A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.03-05-2009
20100078642LAYERED STRUCTURE AND ELECTRON DEVICE THAT USES SUCH A LAYERED STRUCTURE, FABRICATION PROCESS THEREOF, ELECTRON DEVICE ARRAY AND DISPLAY APPARATUS - A layered structure comprises a variable wettability layer including a material that changes a critical surface tension in response to energy provided thereto, the wettability changing layer including at least a high surface energy part of large critical surface tension and a low surface energy part of low critical surface tension, a conductive layer formed on the variable wettability layer at the high surface energy tension part, and a semiconductor layer formed on the variable wettability layer at the low surface energy part.04-01-2010
20090309101THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor array substrate and its manufacturing method are disclosed. A thin film transistor (TFT) includes a gate electrode formed on a substrate, and source and drain electrodes formed on the gate electrode and separated from each other. A common line made of the same material as the gate electrode is formed on the substrate. A storage capacitor includes a storage electrode connected with a storage electrode line and a pixel electrode formed on the storage electrode. The storage electrode and the pixel electrode are formed by patterning a transparent conductive film, and accordingly, light can be transmitted through the region where the storage capacitor is formed to thus increase an aperture ratio.12-17-2009
20090309099DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The present invention relates to a display device and a manufacturing method thereof. The display device includes a substrate, a first conductor disposed on the substrate, a first insulating layer disposed on the first conductor, a second insulating layer disposed on the first insulating layer, a semiconductor disposed on the second insulating layer, and a second conductor disposed on the semiconductor. A thickness of the first insulating layer is greater than a thickness of the first conductor, and the first insulating layer includes a first opening exposing the first conductor.12-17-2009
20090267072ELECTRO-OPTICAL DEVICE AND METHOD FOR MANUFACTURING THE SAME - Using thin film transistors (TFTs), an active matrix circuit, a driver circuit for driving the active matrix circuit or the like are formed on one substrate. Circuits such as a central processing unit (CPU) and a memory, necessary to drive an electric device, are formed using single crystalline semiconductor integrated circuit chips. After the semiconductor integrated circuit chips are adhered to the substrate, the chips are connected with wirings formed on the substrate by a chip on glass (COG) method, a wire bonding method or the like, to manufacture the electric device having a liquid crystal display (LCD) on one substrate.10-29-2009
20090267071PIXEL LAYOUT STRUCTURE FOR RAISING CAPABILITY OF DETECTING AMORPHOUS SILICON RESIDUE DEFECTS AND METHOD FOR MANUFACTURING THE SAME - Disclosed is a pixel layout structure capable of increasing the capability of detecting amorphous silicon (a-Si) residue defects and a method for manufacturing the same. Wherein, an a-Si dummy layer is disposed on either one side or both sides of each data line. The design of such an a-Si dummy layer is utilized, so that in an existing testing conditions (by making use of an existing automatic array tester in carrying out the test), in case that there exists an a-Si residue in a pixel, the pixel having defects can be detected through an enhanced capacitance coupling effect and an electron conduction effect. Therefore, through the application of the above-mentioned design, the capability of an automatic array tester can effectively be increased in detecting a defective pixel having a-Si residues.10-29-2009
20100127264ORGANIC LIGHT EMITTING DISPLAY AND METHOD OF MANUFACTURING THE SAME - A top emission organic light emitting display and a method of manufacturing the same. The organic light emitting display includes a substrate, a plurality of thin film transistors (TFT) on the substrate, a plurality of first electrodes coupled to the plurality of TFTs, auxiliary electrodes having a mesh structure defining areas where the plurality of first electrodes are located, a pixel defining layer on a substantially entire area of the substrate and patterned to expose the first electrodes and the auxiliary electrodes, an organic light emission layer on the substantially entire area of the substrate including the exposed first electrodes and auxiliary electrodes, and second electrodes on the organic light emission layer. Steps are formed at lower parts of the auxiliary electrodes, and the second electrodes are coupled to the auxiliary electrodes through contact regions in which the auxiliary electrodes are exposed due to the steps.05-27-2010
20100084659GATE DRIVER-ON-ARRAY STRUCTURE AND DISPLAY PANEL - A gate driver-on-array structure for using in a display panel including first conductive patterns, semiconductor patterns, second conductive patterns, third conductive patterns, first electrode line, and first connectors is provided. The first conductive patterns, the second conductive patterns, the semiconductor patterns and the third conductive patterns together form a plurality of thin film transistors. The first electrode line is located at a side of the first conductive patterns and spaced from the first conductive patterns by a first distance. The first connectors are connected to the corresponding first conductive patterns and the first electrode line.04-08-2010
20100084660Semiconductor Structures - A semiconductor structure is provided. The semiconductor structure includes a substrate, a gate disposed thereon, an insulation layer disposed on the substrate and overlying the gate, a patterned semiconductor layer disposed on the insulation layer, a source and a drain disposed on the patterned semiconductor layer, a protective layer overlying the insulation layer, the source and the boundary of the drain to expose a portion of the drain, and a pixel electrode disposed on the substrate, overlying the protective layer overlying the boundary of the drain, electrically connected to the exposed drain.04-08-2010
20100078643DISPLAY DEVICE - In view of the problem that a reduced thickness of an EL film causes a short circuit between an anode and a cathode and malfunction of a transistor, the invention provides a display device that has a light emitting element including an electrode and an electroluminescent layer, a wire electrically connected to the electrode of the light emitting element, a transistor provided with an active layer including a source, a drain and a channel forming region, and a power supply line electrically connected to one of the source and the drain of the transistor, wherein the wire is electrically connected to the other of the source and the drain of the transistor, and the width of a part of the electrode in the vicinity of a portion where the electrode is electrically connected to the wire is smaller than that of the electrode in the other portion.04-01-2010
20090283769METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY PANEL FOR A LIQUID CRYSTAL DISPLAY AND A PHOTOLITHOGRAPHY METHOD FOR FABRICATING THIN FILMS - A gate wire including a plurality of gate lines and gate electrodes in the display area, and gate pads in the peripheral area is formed on a substrate having a display area and a peripheral area. A gate insulating layer, a semiconductor layer, an ohmic contact layer and a conductor layer are sequentially deposited, and the conductor layer and the ohmic contact are patterned to form a data wire including a plurality of data lines, a source electrode and a drain electrode of the display area and data pads of the peripheral area, and an ohmic contact layer pattern thereunder. A passivation layer is deposited and a positive photoresist layer is coated thereon. The photoresist layer is exposed to light through one or more masks having different transmittance between the display area and the peripheral area. The photoresist layer is developed to form a photoresist pattern having the thickness that varies depending on the position. At this time, a thin portion and a thick portion of the photoresist pattern are provided for the display area, and a thick portion and a zero thickness portion for the peripheral area. In the peripheral area, the portions of the passivation layer, the semiconductor layer and the gate insulating layer on the gate pads, and the portions of the passivation layer on the data pads, under the zero thickness portion, are removed. In the display area, the thin portion of the photoresist pattern, and the portions of the passivation layer and the semiconductor layer thereunder are removed but the portions of the passivation layer under the thick portions of the photoresist pattern is not removed. Then, a plurality of pixel electrodes, redundant gate pads and redundant data pads are formed.11-19-2009
20110062445DISPLAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A method of forming a display substrate includes forming an array layer on a substrate, forming a passivation layer on the array layer, forming a photoresist pattern on the passivation layer corresponding to a gate line, a source line and a thin-film transistor of the array layer, etching the passivation layer using the photoresist pattern as a mask, Non-uniformly surface treating a surface of the photoresist pattern, forming a transparent electrode layer on the substrate having the surface-treated photoresist pattern formed thereon and forming a pixel electrode. The forming a pixel electrode includes removing the photoresist pattern and the transparent electrode layer, such as by infiltrating a strip solution into the surface-treated photoresist pattern.03-17-2011
20110062444FLEXIBLE SUBSTRATE AND METHOD FOR FABRICATING FLEXIBLE DISPLAY DEVICVE HAVING THE SAME - A method for fabricating a flexible display device including the steps of preparing a glass substrate, forming a flexible substrate on the glass substrate, the flexible substrate being formed by forming a semiconductor layer on the glass substrate, forming a first flexible layer on the semiconductor layer, forming an adhesive layer on the first flexible layer, and forming a second flexible layer on the adhesive layer, forming a thin film array on the flexible substrate, forming a display device on the thin film array, and separating the glass substrate from the semiconductor layer of the flexible substrate.03-17-2011
20110193090THIN-FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY PANEL HAVING THE SAME - A thin-film transistor (TFT) substrate includes a gate electrode, a gate insulation pattern, a channel pattern, a first organic insulation pattern, a source electrode and a drain electrode. The gate electrode is formed on a base substrate. The gate insulation pattern is formed on the gate electrode and is smaller than the gate electrode. The channel pattern is formed on the gate insulation pattern and the channel pattern is smaller than the gate electrode. The first organic insulation pattern is formed on the base substrate to cover the channel pattern, the gate insulation pattern and the gate electrode.08-11-2011
20100090221DISTORTION TOLERANT PROCESSING - A method of manufacturing an integrated circuit (IC) for driving a flexible display includes depositing a pattern of spatially non-repetitive features in a first layer on a flexible substrate, said pattern of spatially non-repetitive features not substantially regularly repeating in both of two orthogonal directions (x,y) in the plane of the substrate; depositing a pattern of spatially repetitive features in a second layer on said first layer; aligning said second layer and said first layer so as to allow electrical coupling between said non-repetitive features and said repetitive features, wherein distortion compensation is applied during deposition of said repetitive features to enable said alignment.04-15-2010
20100006842ACTIVE MATRIX SUBSTRATE, METHOD FOR MANUFACTURE OF ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL DISPLAY DEVICE, AND ELECTRONIC APPARATUS - An active matrix substrate (01-14-2010
20100006846LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a display device and a manufacturing method thereof that can simplify manufacturing steps and enhance efficiency in the use of materials, and further, a manufacturing method that can enhance adhesiveness of a pattern. One feature of the invention is that at least one or more patterns needed for manufacturing a display panel, such as a conductive layer forming a wiring or an electrode or a mask for forming a desired pattern is/are formed by a method capable of selectively forming a pattern, thereby manufacturing a display panel.01-14-2010
20100006844THIN-FILM TRANSISTOR ARRAY PANEL AND METHOD OF FABRICATING THE SAME - A thin-film transistor (“TFT”) array and a method of fabricating the TFT array panel include: an insulating substrate; a gate line and a data line which are insulated from each other on the insulating substrate and are arranged in a lattice; common wiring extended parallel to the gate line on the insulating substrate; a gate insulating film disposed on the gate line and the common wiring; a semiconductor layer disposed on the gate insulating film; contact holes which penetrate through the gate insulating film and the semiconductor layer disposed on the common wiring; a plurality of common electrodes connected to the common wiring by the contact holes and arranged parallel to each other; and a plurality of pixel electrodes arranged parallel to the plurality of common electrodes.01-14-2010
20090272977PIXEL STRUCTURE OF A THIN FILM TRANSISTOR LIQUID CRYSTAL DISPLAY AND FABRICATING METHOD THEREOF - A method of fabricating a pixel structure of a thin film transistor liquid crystal display is provided. A transparent conductive layer and a first metallic layer are sequentially formed over a substrate. The first metallic layer and the transparent conductive layer are patterned to form a gate pattern and a pixel electrode pattern. A gate insulating layer and a semiconductor layer are sequentially formed over the substrate. A patterning process is performed to remove the first metallic layer in the pixel electrode pattern while remaining the gate insulating layer and the semiconductor layer over the gate pattern. A second metallic layer is formed over the substrate. The second metallic layer is patterned to form a source/drain pattern over the semiconductor layer. A passivation layer is formed over the substrate and then the passivation layer is patterned to expose the transparent conductive layer in the pixel electrode pattern.11-05-2009
20110198598ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display apparatus includes a substrate, a thin film transistor (TFT) on the substrate, a first electrode on the TFT in each of a plurality of pixels, a first pixel define layer covering edges of the first electrode, the first pixel define layer including at least two layers, a second pixel define layer on the first pixel define layer, an organic emission layer on the first electrode, and a second electrode disposed to face the first electrode.08-18-2011
20110198597ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE - An organic light emitting display device includes at least one thin film transistor (TFT) on a substrate, the at least one TFT including a semiconductor active layer, a gate electrode insulated from the semiconductor active layer, and source and drain electrodes contacting the semiconductor active layer, a plurality of first electrodes electrically connected to the at least one TFT, a plurality of banks between the plurality of first electrodes, a plurality of organic layers on respective first electrodes, a plurality of second electrodes on respective organic layers, the second electrodes being separated from each other, and a connection electrode on the plurality of banks and the plurality of second electrodes, the connection electrode being electrically connected to the plurality of the second electrodes.08-18-2011
20110198596ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device including a pixel-defining layer and a spacer, and a method of manufacturing the same. The method includes: forming an organic insulating material layer on a pixel electrode; placing a half-tone mask including a light-blocking portion, a partial-transmitting portion, and a light-transmitting portion on the organic insulating material layer and performing an exposure process so that the pixel electrode corresponds to the light-transmitting portion, a pixel-defining layer at least partially surrounding the pixel electrode corresponds to the partial-transmitting portion, and a spacer adjacent to the pixel-defining layer corresponds to the light-blocking portion; and etching a portion of the organic insulating material layer that is exposed so that a pixel area on the pixel electrode is at least partially surrounded by the pixel-defining layer and the spacer. A taper angle of the pixel-defining layer is between about 15 degrees to about 30 degrees.08-18-2011
20090045405THIN FILM TRANSISTOR ARRAY - A thin film transistor array includes a substrate, scan lines, data lines, thin film transistors, upper electrodes and pixel electrodes. The scan lines and the data lines are disposed on the substrate to define pixel areas on the substrate. The thin film transistors are disposed inside corresponding pixel areas and are driven through corresponding scan line and data lines. The upper electrodes are disposed within various pixel areas above the scan lines. The upper electrode has a protrusion protruding beyond the edge of a corresponding scan line. The pixel electrode is disposed within a corresponding pixel area and electrically connected to a corresponding thin film transistor and upper electrode, wherein each pixel electrode has at least a slit formed therein, the slit has an end portion near the corresponding scan line, and the end portion is completely shielded by the protrusion of the corresponding upper electrode.02-19-2009
20090090911Manufacturing thin film transistor array panels for flat panel displays - A thin film transistor array panel for a flat panel display includes a substrate, a first signal line formed on the substrate, a second signal line intersecting and insulated from the first signal line, a switching element having a first terminal connected to the first signal line, a second terminal connected to the second signal line, and a third terminal, a pixel electrode connected to the third terminal of the switching element, and first and second light blocking members extending parallel to the second signal line, each being disposed on an opposite side of and partially overlapping an respective edge of the second signal line, an interval between the first and second light blocking members being in a range of from more than 1.5 μm to less than 4 μm. The array panel prevents light leakage from the display and improves its transmittance, aperture ratio and color reproducibility.04-09-2009
20090283767SUBSTRATE FOR A DISPLAY PANEL, A DISPLAY PANEL HAVING THE SUBSTRATE, A METHOD OF PRODUCING THE SUBSTRATE, AND A METHOD OF PRODUCING THE DISPLAY PANEL - A substrate for a display panel by which a boundary position of divided exposure regions of elements formed by divisional exposure can be easily identified and process management and evaluation can be easily performed, a display panel having the substrate, a method of producing the substrate, and a method of producing the display panel. A substrate 11-19-2009
20110169005SEMICONDUCTOR DEVICE07-14-2011
20110169004DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR - An active matrix substrate of a display device of the present invention comprises a glass substrate, a plurality of connection terminals (07-14-2011
20110169003CONTACT STRUCTURE AND SEMICONDUCTOR DEVICE - To improve the reliability of contact with an anisotropic conductive film in a semiconductor device such as a liquid crystal display panel, a terminal portion (07-14-2011
20110168999Semiconductor wire grid, display apparatus having the same, and method of manufacturing the display apparatus - A semiconductor wire grid may include a plurality of wires arranged separately on a substrate, formed of a semiconductor, and including a groove therebetween, wherein conductivity of the semiconductor wire grid varies according to an applied voltage such that a polarization rate of the semiconductor wire grid is controlled.07-14-2011
20120091460Display Device and Method for Manufacturing the Same - A display device includes a substrate; a gate wire including a gate electrode and a first capacitor electrode formed on the substrate; a gate insulating layer formed on the gate wire; a semiconductor layer pattern formed on the gate insulating layer, and including an active region overlapping at least a part of the gate electrode and a capacitor region overlapping at least a part of the first capacitor electrode; an etching preventing layer formed on a part of the active region of the semiconductor layer pattern; and a data wire including a source electrode and a drain electrode formed over the active region of the semiconductor layer from over the etching preventing layer, and separated with the etching preventing layer therebetween, and a second capacitor electrode formed on the capacitor region of the semiconductor layer.04-19-2012
20080210943THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor array panel is provided, which includes: a substrate; a first signal line formed on the substrate; a second signal line formed on the substrate and intersecting the first signal line; a thin film transistor including a gate electrode connected to the first signal line and having an edge substantially parallel to the first signal line, a source electrode connected to the second signal line, and a drain electrode overlapping the edge of the gate electrode; and a pixel electrode connected to the drain electrode.09-04-2008
20080210940THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE THEREFOR - The invention relates to a thin film transistor substrate and a display device including the same, and provides a thin film transistor substrate and a display device including the same, which can prevent damage of elements due to static electricity by forming, in each unit pixel region where a pair of first and second pixel electrodes, a pair of first and second drain electrode plates that are connected to the first and second pixel electrodes and to connected to drain terminals of thin film transistors, and can obtain a dot inversion driving effect through line inversion driving by connecting the first drain electrode in one pixel region to the first drain electrode plate, connecting the second drain electrode in the one unit pixel region to the second drain electrode plate, connecting a first drain electrode in another unit pixel region neighboring the one unit pixel region to the second drain electrode plate, and connecting a second drain electrode in another unit pixel region to the first drain electrode plate.09-04-2008
20090278129LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A liquid crystal display device includes a gate line and a data line crossing each other to define a pixel region on a substrate, a gate electrode connected to the gate line, a gate insulating layer on the gate electrode, an active layer on the gate insulating layer, source and drain electrodes on the active layer, spaced apart from each other and each having inner sides that face each other, wherein the source electrode is connected to the data line, ohmic contact layers between the active layer and each of the source and drain electrodes, a shielding pattern over the active layer and having outer sides, wherein at least one of the outer sides faces at least one of the inner sides of the source and drain electrodes, and a pixel electrode in the pixel region and connected to the drain electrode.11-12-2009
20090278128THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD OF THE SAME - A thin film transistor array panel includes a substrate; a gate electrode formed on the substrate; a data line formed on the substrate; a gate insulating layer formed on the data line and the gate electrode, and having a first contact hole exposing the gate electrode, and a second contact hole exposing the data line; a gate line intersecting the data line, and connected to the gate electrode through the first contact hole; a semiconductor formed the gate insulating layer, and including a channel of a thin film transistor; a source electrode connected to the data line through the second contact hole; a drain electrode opposite to the source electrode with respect to the channel on the semiconductor; a passivation layer having a third contact hole exposing the drain electrode; and a pixel electrode connected to the drain electrode through the third contact hole are included.11-12-2009
20090278127THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME - In one embodiment, a thin-film transistor (TFT) includes a gate electrode, a semiconductor pattern, first and second electrodes and a protective layer. The semiconductor pattern is formed on the gate electrode, and includes a first semiconductor layer deposited at a first deposition speed and a second semiconductor layer deposited at a second deposition speed faster than the first deposition speed. The first and second electrodes are spaced apart from each other on the semiconductor pattern. The protective layer is formed on the semiconductor pattern to cover the first and second electrodes, and makes contact with a channel region of the first semiconductor layer to form an interface with the first semiconductor layer. Thus, electrical characteristics of the TFT may be improved.11-12-2009
20090166633ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - In an array substrate capable of improving the quality of displayed images and a method for manufacturing the array substrate, the array substrate includes a base substrate, a first conductive pattern including a gate line and a first light-blocking pattern, a semiconductor layer overlapping the light-blocking pattern, a second conductive pattern including a data line and a storage line overlapping the first light-blocking pattern, and a pixel electrode overlapping the storage line to form a storage capacitor. The first conductive pattern may further include a second light-blocking pattern overlapping the semiconductor layer which is formed under the data line. The first and second light-blocking patterns block light proceeding toward the semiconductor layer formed under the storage line and under the data line, respectively, so that the semiconductor layer may be prevented from being excited by light energy.07-02-2009
20110198602ALUMINUM ALLOY FILM FOR DISPLAY DEVICE, DISPLAY DEVICE, AND SPUTTERING TARGET - Disclosed is an Al alloy film which can be in direct contact with a transparent pixel electrode in a wiring structure of a thin film transistor substrate that is used in a display device, and which has improved corrosion resistance against an amine remover liquid that is used during the production process of the thin film transistor. Also disclosed is a display device using the Al alloy film. Specifically disclosed is an Al alloy film for a display device, said Al alloy film being directly connected with a transparent conductive film on a substrate of a display device, and containing 0.05-2.0 atom % of Ge, at least one element selected from among element group X (Ni, Ag, Co, Zn and Cu), and 0.02-2 atom % of at least one element selected from among element group Q consisting of the rare earth elements. A Ge-containing deposit and/or a Ge-concentrated part is present in the Al alloy film for a display device. Also specifically disclosed is a display device comprising the Al alloy film.08-18-2011
20110198599Semiconductor Device and Display Device Utilizing the Same - A source-drain voltage of one of two transistors connected in series becomes quite small in a set operation (write signal), thus the set operation is performed to the other transistor. In an output operation, two transistors operate as a multi-gate transistor, therefore, a current value can be small in the output operation. In other words, a current can be large in the set operation. Therefore, the set operation can be performed rapidly without being easily influenced by an intersection capacitance and a wiring resistance which are parasitic on a wiring and the like. Further, an influence of variations between adjacent ones can be small as one same transistor is used in the set operation and the output operation.08-18-2011
20090283768ARRAY SUBSTRATE OF TFT-LCD AND A METHOD FOR MANUFACTURING THE SAME - The present invention relates to an array substrate of TFT-LCD and Method for manufacturing the same. The array substrate includes: gate lines, data lines, pixel electrodes and TFTs formed on a substrate; and a grid graph formed on each of the pixel electrode to make each of the pixel electrodes be simultaneously a built-in polarizer and change natural lights into linear polarized lights. The method for manufacturing an array substrate includes: forming a graph including gate electrodes and gate lines on a substrate; depositing continuously a gate insulating layer, a semiconductor layer and a doped semiconductor layer, and forming graphs of semiconductor layers and doped semiconductor layers above the gate electrodes; forming graphs of source electrodes, drain electrodes, data lines and pixel electrodes, in which a grid graph formed on each of the pixel electrode to make each of the pixel electrodes be simultaneously a built-in polarizer and change natural lights into linear polarized lights. In the present invention, there is no need to attach polarizer of absorption type to the array substrate after being disposed with the color filter substrate as a cell, thereby reducing the production cost of the TFT-LCD, and which is propitious to reduce the thickness of the TFT-LCD and increase the power utilization efficiency greatly of LCD.11-19-2009
20090289256THIN FILM TRANSISTOR AND DISPLAY DEVICE INCLUDING THIN FILM TRANSISTOR - A thin film transistor with favorable electric characteristics is provided, which includes a gate electrode layer; a first insulating layer covering the gate electrode layer; a pair of impurity semiconductor layers forming source and drain regions, which are provided with a distance therebetween and at least partly overlap with the gate electrode layer; a microcrystalline semiconductor layer which is provided over the first insulating layer in part of a channel formation region, and at least partly overlaps with the gate electrode layer and does not overlap with at least one of the pair of impurity semiconductor layers; a second insulating layer between and in contact with the first insulating layer and the microcrystalline semiconductor layer; and an amorphous semiconductor layer over the first insulating layer, covering the second insulating layer and the microcrystalline semiconductor layer. The first insulating layer is a silicon nitride layer and the second insulating layer is a silicon oxynitride layer.11-26-2009
20090289255FLEXIBLE DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A flexible display device adapted to prevent a disconnection of pad electrode and a line short-circuit is disclosed. The flexible display device and the manufacturing method thereof according to the present embodiments forms only the barrier film or no layer on the mother substrate in the vicinity of the cut line which divides the mother substrate into the TFT substrate. Even when the mother substrate is pressed using a press machine, cracks or lifts of layers are not generated in the TFT substrate unlike the conventional technology so that a disconnection is not generated in the gate pad electrode or the data pad electrode. Thus, line short-circuits generated as the layers are separated and attached to the TFT substrate can be prevented.11-26-2009
20110169001DISPLAY DEVICE, SWITCHING CIRCUIT AND FIELD EFFECT TRANSISTOR - A this film transistor is provided. The thin film transistor includes a semiconductor layer including a source region, a drain region, and a channel region, wherein the channel region is provided between the source region and the drain region; and a gate electrode overlapping with the channel region, wherein the channel region includes at least a portion of a channel width that is configured to at least one of continuously decrease and continuously increase in a lengthwise direction.07-14-2011
20090294771THIN FILM TRANSISTOR ARRAY PANEL HAVING A MEANS FOR ARRAY TEST - A substrate for a display panel includes a base substrate, a plurality of signal lines, a plurality of signal pads corresponding to first end portions of the signal lines, a shorting bar corresponding to second end portions of the signal lines, a plurality of bridge lines on the base substrate disposed between the signal line and the shorting bar which electrically connects the signal line and the shorting bar. A color filter array panel opposite a TFT LCD panel substrate includes a medium dam layer which fully overlaps the bridge lines of the TFT LCD panel substrate. A data TFT for inspection having a source electrode coupled to the signal line, a drain electrode coupled to any one of the shorting bars, and a gate electrode coupled to a data TFT driving signal line ensures the normal operation of the display panel after the array test.12-03-2009
20110169002PIXEL STRUCTURE - A pixel structure includes a substrate, a gate and a pixel electrode that are disposed on the substrate, a patterned dielectric layer and a patterned semiconductor layer disposed on the gate, a source and a drain disposed on two sides of the patterned semiconductor layer respectively, and a passivation layer disposed on the source, the drain and the semiconductor layer. The sidewall surfaces of the source and the drain are completely covered with the passivation layer, but a part of the pixel electrode is exposed by the passivation layer.07-14-2011
20110204368TRANSISTOR AND DISPLAY DEVICE USING THE SAME - The band tail state and defects in the band gap are reduced as much as possible, whereby optical absorption of energy which is in the vicinity of the band gap or less than or equal to the band gap is reduced. In that case, not by merely optimizing conditions of manufacturing an oxide semiconductor film, but by making an oxide semiconductor to be a substantially intrinsic semiconductor or extremely close to an intrinsic semiconductor, defects on which irradiation light acts are reduced and the effect of light irradiation is reduced essentially. That is, even in the case where light with a wavelength of 350 nm is delivered at 1×1008-25-2011
20110204373TFT-LCD PIXEL UNIT AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor liquid crystal display (TFT-LCD) pixel unit and a method for manufacturing the same. The pixel unit comprises a gate line and a gate electrode formed on a substrate and a first gate insulating layer, an active layer, and a doped layer that are sequentially formed on the gate line and the gate electrode. An intercepting trench is formed on the gate line to cut off the doped layer and the active layer on the gate line. A second insulating layer covers the intercepting trench and the substrate where the gate line and the gate electrode are not formed. A pixel electrode is formed on the second insulating layer and a part of the pixel electrode overlaps one of a source and drain electrodes.08-25-2011
20090008643Light Emitting Device, Method of Manufacturing the Same, and Manufacturing Apparatus Therefor - A light emitting device having high definition, a high aperture ratio, and high reliability is provided. The present invention achieves high definition and a high aperture ratio with a full color flat panel display using red, green, and blue color emission light by intentionally forming laminate portions, wherein portions of different organic compound layers of adjacent light emitting elements overlap with each other, without depending upon the method of forming the organic compound layers or the film formation precision.01-08-2009
20090008642DISPLAY DEVICE - A display device is disclosed. The display device includes a substrate, a display area on the substrate, the display area including a plurality of subpixels, a pad area on the substrate, the pad area including a pad electrode, a conductive adhesive layer on the pad electrode, and a driver on the conductive adhesive layer, the driver being attached to the pad electrode using the conductive adhesive layer. One surface of the conductive adhesive layer includes one surface of the driver. A vertical distance ranging from a shorter side of one surface of the driver to a shorter side of one surface of the conductive adhesive layer lies substantially in a range between 0.2 mm and 4 mm.01-08-2009
20090261335Pixel Unit Structure of Self-Illumination Display with Low-Reflection - A self-illumination display is provided, including a first substrate, a light-absorbing structure, a filter layer, a driving circuit unit, and a self-illumination unit. The light-absorbing structure and the filter layer are juxtaposedly disposed over the first substrate. The driving circuit unit is disposed over and shielded by the light-absorbing structure. The self-illumination unit is disposed over the filter layer, including a light-transmissible electrode, a light emitting layer, and a black electrode. The self-illumination unit is disposed over the filter layer, including a light-transmissible electrode, a light emitting layer, and a black electrode. The light-transmissible electrode is disposed over the filter layer while the light emitting layer and the black electrode are sequentially tiered on the light-transmissible electrode. The light-absorbing structure, the filter layer and the black electrode together reduce the reflection of the ambient light and enhance the image contrast.10-22-2009
20090261334Liquid crystal display device - A thin film transistor substrate of fringe field switching type and a fabricating method thereof for simplifying a process are disclosed. In the thin film transistor substrate of fringe field switching type, a gate line has a multiple-layer structure and includes a transparent conductive layer. A data line crosses the gate line to define a pixel area. A thin film transistor is connected to the gate line and the data line. A common line is provided in a multiple-layer structure and in parallel to the gate line. A common electrode is formed by an extension of a transparent conductive layer of the common line at said pixel area. A pixel electrode is connected to the thin film transistor to form a fringe field with the common electrode in the pixel area.10-22-2009
20090261333DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a signal line, a thin-film transistor (“TFT”), a key pattern, a light-blocking pattern, a color filter, a pixel electrode and an alignment key. The signal line and the key pattern are formed on a substrate. The TFT is electrically connected to the signal line. The light-blocking pattern is formed on the substrate and covers the signal line, the TFT and the key pattern. The color filter is formed in a unit pixel area of the substrate. The pixel electrode is formed on the color filter and is electrically connected to the TFT. The alignment key is formed on the light-blocking pattern, and a position of the alignment key on the substrate corresponds to a position of the key pattern on the substrate.10-22-2009
20090261332THIN FILM TRANSISTOR ARRAY PANEL, FABRICATING METHOD THEREOF AND FLAT PANEL DISPLAY HAVING THE SAME - A thin film transistor array panel includes a substrate, a gate line disposed on the substrate and having a gate electrode, a gate insulating layer disposed on the gate line, a data line disposed on the gate insulating layer and crossing the gate line, a source electrode connected to the data line, a drain electrode spaced apart from the source electrode, a semiconductor layer connected to the source and drain electrodes to form a channel, a light blocking layer disposed on the semiconductor layer to block light incident to the semiconductor layer, and a pixel electrode contacting the drain electrode.10-22-2009
20120292625ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An embodiment of the disclosed technology provides a method of manufacturing an array substrate, comprising: a first mask process of forming an inorganic material protrusion on a base substrate; a second mask process of forming a reflective region pattern, a gate line, a gate electrode branched from the gate line, and a common electrode; a third mask process of forming an active island and a data line formed and forming a source electrode connected to the data line and a drain electrode on the active island and a channel; a fourth mask process of forming an insulation material layer, treating the insulation material layer to form a planarization layer, and forming a through hole above the drain electrode; and a fifth mask process of forming a pixel electrode and connected to the drain electrode via the through hole in a reflective region.11-22-2012
20120292626OPTICAL AND THERMAL ENERGY CROSS-LINKABLE INSULATING LAYER MATERIAL FOR ORGANIC THIN FILM TRANSISTOR - The problem of the present invention is to provide an organic thin film transistor insulating layer material capable of producing an organic thin film transistor having a small absolute value of threshold voltage and small hysteresis. The means for solving the problem is an organic thin film transistor insulating layer material comprising a macromolecular compound (A) containing repeating units having a fluorine atom-containing group, repeating units having a photodimerizable group and repeating units having a first functional group that generates a second functional group which reacts with active hydrogen by the action of electromagnetic waves or heat, and an active hydrogen compound (B).11-22-2012
20120292622PIXEL STRUCTURE AND ELECTRICAL BRIDGING STRUCTURE - A pixel structure includes a thin film transistor device, an insulating layer disposed on the thin film transistor device, and a pixel electrode disposed on the insulating layer. The thin film transistor device includes a floating conductive pad disposed at one side of a semiconductor layer, and electrically connected to a source/drain electrode. The insulating layer has a first contact hole partially exposing the floating conductive pad. The pixel electrode is electrically connected to the floating conductive pad via the first contact hole.11-22-2012
20120292627PHOTOSENSOR ELEMENT, PHOTOSENSOR CIRCUIT, THIN-FILM TRANSISTOR SUBSTRATE, AND DISPLAY PANEL - Disclosed is a photosensor element that is provided with a gate electrode (11-22-2012
20120292623Thin-Film Semiconductor Device And Display Equipped With Same - The invention provides a thin-film semiconductor device, which is equipped with a gate electrode, a source electrode, a drain electrode, an oxide semiconductor film, and an oxygen release insulator film. The oxygen release insulator film is in contact with at least a part of the oxide semiconductor film.11-22-2012
20120292621Organic Light-Emitting Display Apparatus and Method of Manufacturing the Same - An organic light-emitting display apparatus may include: a planarization layer disposed on a substrate and covering a plurality of thin film transistors; pixel electrodes, each comprising a light emission portion and anon-light emission portion, the light emission portion being arranged on the planarization layer in a first grid pattern; via-holes, each connecting one thin film transistor and one pixel electrode through the planarization layer, and arranged in a second grid pattern offset from the first grid pattern; dummy via-holes spaced apart from the via-holes; a pixel-defining layer (PDL) disposed on the planarization layer and covering the via-holes, the dummy via-holes, and the non-light emission portion of the pixel electrodes; an organic layer disposed on the light emission portion and comprising an emissive layer; and an opposite electrode disposed on the organic layer.11-22-2012
20120292624ARRAY SUBSTRATE, METHOD FOR FABRICATING THE SAME AND LIQUID CRYSTAL DISPLAY DEVICE - The disclosed technology is directed to an array substrate, a method for fabricating the same and a liquid crystal display device. The array substrate comprises an electro-static discharge (ESD) circuit region and a pixel region. The method comprises: adjusting the amount of light for exposing so that the amount of light for exposing corresponding to the pixel region is identical to that corresponding to the ESD circuit region; and forming a channel of a thin film transistor (TFT) in the ESD circuit region and a channel of a TFT in the pixel region by a pattering process, wherein the channel of the TFT in the ESD circuit region comprises a plurality of sub-channels arranged in parallel, and each of the sub-channels of the TFT in the ESD circuit region has the same length as the length of the channel of the TFT in the pixel region.11-22-2012
20080315202DISPLAY DEVICE - A resin material having a small relative dielectric constant is used as a layer insulation film 12-25-2008
20110266547THIN FILM TRANSISTOR ARRAY PANEL AND DISPLAY DEVICE - A display device includes a first display panel including a common electrode disposed thereon, and a second display panel including; thin film transistors (“TFTs”) each including a gate electrode, a source electrode, and a drain electrode, a first passivation layer disposed on the source and drain electrodes, a second passivation layer disposed on the first passivation layer and including at least one sensing protrusion, pixel electrodes disposed on the second passivation layer and connected with the drain electrode, and at least one conductive member disposed on the sensing protrusion.11-03-2011
20110266546DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A display device and a manufacturing method thereof are disclosed. In one embodiment, the display device includes 1) a substrate having a pixel region, a transistor region, and a capacitor region and 2) a transistor formed in the transistor region, wherein the transistor comprises i) an active layer formed over the substrate, ii) a gate insulating layer formed on the active layer, iii) a gate electrode formed on the gate insulating layer, and iv) a first interlayer insulating layer covering the gate electrode and formed on the gate insulating layer, v) a second interlayer insulating layer formed on the first interlayer insulating layer and vi) a source electrode and a drain electrode electrically connected to the active layer. The display device further includes a capacitor formed in the capacitor region, wherein the capacitor comprises i) a lower electrode formed on the gate insulating layer and ii) an upper electrode formed on the first interlayer insulating layer, wherein the upper electrode is formed substantially directly above the lower electrode, and wherein the surface area of the lower electrode is less than the surface area of the upper electrode.11-03-2011
20100102322DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The display device having a thin film transistor formed on a substrate including a display portion is provided. The thin film transistor including: a gate electrode; a gate insulating film formed so as to cover the gate electrode; a semiconductor laminated film formed on top the gate insulating film so as to extend over the gate electrode, the semiconductor laminated film being formed by laminating at least a polycrystalline semiconductor film and an amorphous semiconductor film, a first electrode and a second electrode disposed on top of the semiconductor laminated film so as to be opposed to each other across a region superposing the gate electrode. In the display device, the semiconductor laminated film is formed immediately below a wiring extending from the first electrode and immediately below a wiring extending from the second electrode.04-29-2010
20100102321RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM - The present invention provides a photosensitive resin composition comprising a component (a): a siloxane resin obtained by hydrolyzing and condensing a silane compound comprising a compound represented by the general formula (1) shown below, a component (b): a solvent dissolving the component (a) therein, and a component (c): a quinonediazide sulfonic acid ester.04-29-2010
20080246034THIN FILM TRANSISTOR FOR FLAT PANEL DISPLAY AND METHOD OF FABRICATING THE SAME - A thin film transistor for a flat panel display, and more particularly to a thin film transistor for a flat panel display having a protrusion in a part of a gate electrode includes a substrate on which an insulating layer is deposited, a semiconductor layer, which is a layer having predetermined width and length on the insulating layer, provided with doping regions in a letter U shape and a channel region between the doping regions; a gate insulating layer formed on the semiconductor layer; a gate electrode formed on the gate insulating layer to traverse the doping region; and a protrusion, which is a part of the gate electrode, formed on the gate insulating layer to be opposed to the channel region.10-09-2008
20110204367SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME AND IMAGE DISPLAY - A semiconductor device having a semiconductor elements formed with higher density is provided. Furthermore an image display device using the semiconductor device is also provided.08-25-2011
20080251789PIXEL STRUCTURE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a pixel structure includes providing a substrate having a pixel area. A first metal layer, a gate insulator and a semiconductor layer are formed on the substrate and patterned by using a first half-tone mask or a gray-tone mask to form a transistor pattern, a lower capacitance pattern and a lower circuit pattern. Next, a dielectric layer and an electrode layer both covering the three patterns are sequentially formed and patterned to expose a part of the lower circuit pattern, a part of the lower capacitance pattern and a source/drain region of the transistor pattern. A second metal layer formed on the electrode layer and the electrode layer are patterned by using a second half-tone mask or the gray-tone mask to form an upper circuit pattern, a source/drain pattern and an upper capacitance pattern. A portion of the electrode layer constructs a pixel electrode.10-16-2008
20100096633FLEXIBLE LIGHT-EMITTING DEVICE, ELECTRONIC DEVICE, AND METHOD FOR MANUFACTURING FLEXIBLE-LIGHT EMITTING DEVICE - It is an object to provide a flexible light-emitting device with long lifetime in a simple way and to provide an inexpensive electronic device with long lifetime using the flexible light-emitting device. A flexible light-emitting device is provided, which includes a substrate having flexibility and a light-transmitting property with respect to visible light; a first adhesive layer over the substrate; an insulating film containing nitrogen and silicon over the first adhesive layer; a light-emitting element including a first electrode, a second electrode facing the first electrode, and an EL layer between the first electrode and the second electrode; a second adhesive layer over the second electrode; and a metal substrate over the second adhesive layer, wherein the thickness of the metal substrate is 10 μm to 200 μm inclusive. Further, an electronic device using the flexible light-emitting device is provided.04-22-2010
20100096632DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A second insulation layer which is formed by stacking a plurality of layers made of different materials in a mutually contact manner is formed such that the second insulation layer covers a source region and a drain region and also covers a gate electrode from above. A first contact hole which reaches one of the source region and the drain region and a recessed portion which is arranged above the gate electrode but is not communicated with the gate electrode are simultaneously formed on the second insulation layer by dry etching. A first line layer is formed so as to cover the first contact hole. After forming the first line layer, a bottom surface of the recessed portion is etched by dry etching thus forming a second contact hole which reaches the gate electrode in the first and second insulation layers. A second line layer is formed on the second contact hole.04-22-2010
20110198601METHOD OF MANUFACTURING DISPLAY DEVICE - To provide a method of manufacturing a display device having an excellent impact resistance property with high yield, in particular, a method of manufacturing a display device having an optical film that is formed using a plastic substrate. The method of manufacturing a display device includes the steps of: laminating a metal film, an oxide film, and an optical filter on a first substrate; separating the optical filter from the first substrate; attaching the optical filter to a second substrate; forming a layer including a pixel on a third substrate; and attaching the layer including the pixel to the optical filter.08-18-2011
20090166634PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A pixel structure including a gate, a gate dielectric layer, a patterned semiconductor layer having a channel area disposed above the gate, a patterned dielectric layer having an etching-stop layer disposed above the gate and a number of bumps, a patterned metal layer having a reflective pixel electrode, a source and a drain, an overcoat dielectric layer, and a transparent pixel electrode sequentially disposed on a substrate is provided. The source and the drain respectively cover portions of the channel area. The reflective pixel electrode connects the drain and covers the bumps to form an uneven surface. The overcoat dielectric layer disposed on a transistor constituted by the gate, the gate dielectric layer, the patterned semiconductor layer, the source and the drain has a contact opening exposing a portion of the reflective pixel electrode. The transparent pixel electrode is electrically connected to the reflective pixel electrode through the contact opening.07-02-2009
20090166632GATE DRIVER-ON-ARRAY STRUCTURE AND DISPLAY PANEL - A gate driver-on-array structure integrated in a display panel includes a bar-like conductive layer, a semiconductor layer, first conductive patterns, second conductive patterns, a first electrode line and a second electrode line. The bar-like conductive layer has a plurality of regions. The semiconductor layer is disposed within the regions of the bar-like conductive layer. The first conductive patterns and the second conductive patterns are disposed on the semiconductor layer and located within the regions. The bar-like conductive layer is located between the first electrode line and the second electrode line. The first electrode line and the second electrode line are respectively spaced from the bar-like conductive layer by a first distance and a second distance. The GOA structure has first connectors connected to the corresponding first conductive patterns and the first electrode line, and second connectors connected to the second conductive patterns and the second electrode line.07-02-2009
20130214278ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An array substrate for a display device and manufacturing method thereof is disclosed. The device comprises: a substrate; a gate line formed on the substrate along a first direction; a data line formed over the substrate along a second direction, wherein the data line and the gate line cross each other to define a pixel region; a thin film transistor formed in the pixel region, and having a gate electrode connected to the gate line, a source electrode connected to the data line, and a drain electrode; a pixel electrode formed in the pixel region and connected to the drain electrode; a first auxiliary gate pattern formed over the gate line and contacting the gate line; and a first auxiliary data pattern formed over the data line and contacting the data line.08-22-2013
20080283835SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - To reduce variation among TFTs in manufacture of a semiconductor device including n-type thin film transistors and p-type thin film transistors. Further, another object of the present invention is to reduce the number of masks and manufacturing steps, and manufacturing time. A method of manufacturing a semiconductor device includes forming an island-shaped semiconductor layer of a first thin film transistor, then, forming an island-shaped semiconductor layer of the second thin film transistor. In the formation of the island-shaped semiconductor layer of the second thin film transistor, a gate insulating film in contact with the island-shaped semiconductor layer of the second thin film transistor is used as a protection film (an etching stopper film) for the island-shaped semiconductor layer of the first thin film transistor.11-20-2008
20080283838SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device packaged in three dimensions comprises a first thin film device, a second thin film device, and a third thin film device, each of the first, second, and third thin film devices comprising a first insulating film, a first electrode formed over the first insulating film, a second insulating film formed over the first electrode, first and second thin film transistors formed over the second insulating film, wherein the first thin film transistor is connected to the first electrode through a first contact hole, a third insulating film formed over the first and second thin film transistor, a second electrode formed over the third insulating film, wherein the second electrode is connected to the second thin film transistor through a second contact hole, and a fourth insulating film formed over the third insulating film and the second electrode.11-20-2008
20080283836LIGHT EMITTING DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - Disclosed are a light emitting display and a method for fabricating the same. The light emitting display includes a substrate. A thin film transistor is formed on a first region of the substrate, and includes a semiconductor layer, a gate electrode, and source/drain electrodes. An organic light emitting diode is electrically coupled to the thin film transistor and includes a first electrode, an emission layer, and a second electrode. A dummy pixel, formed in s second region of the substrate, includes at least one dummy pattern. The dummy pattern is formed of the same material as that of one of the semiconductor layer, the gate electrode, the source/drain electrodes, and the first electrode.11-20-2008
20080283833Thin Film Transistor Array Panel and Manufacturing Method Thereof - The present invention provides a thin film transistor comprising: a substrate (11-20-2008
20080303025Thin Film Transistor Array Panel - A thin film transistor array panel according to an embodiment of the present invention includes: a gate electrode; a semiconductor layer; a gate insulating layer disposed between the gate electrode and the semiconductor layer; a source electrode connected to the semiconductor layer; and a drain electrode connected to the semiconductor layer, spaced apart from the source electrode, and including two branches overlapping the gate electrode, wherein the two branches of the drain electrode are spaced apart from each other and lie on a straight line or on two parallel straight lines.12-11-2008
20080303023ORGANIC LIGHT-EMITTING DISPLAY APPARATUS - An organic light-emitting display apparatus includes a plurality of pixels arranged on a substrate, each pixel includes: a display region including at least one pixel thin film transistor and an organic light-emitting device electrically connected to the pixel thin film transistor; and a sensor region electrically connected to the display region to affect an image display of the display region.12-11-2008
20080303024Array substrate for fringe field switching mode liquid crystal display device and method of fabricating the same - An array substrate for a fringe field switching mode liquid crystal display device comprises a gate line on a substrate; a gate electrode connected to the gate line; a gate insulating layer on the gate line and the gate electrode; a semiconductor layer on the gate insulating layer and corresponding to the gate electrode; source and drain electrodes on the semiconductor layer and spaced apart from each other, the source electrode having first and second sub-source layers, the drain electrode having first and second sub-drain layers. Also disclosed in a method of fabricating a fringe field switching mode liquid crystal display device.12-11-2008
20080308806Semiconductor Device and Manufacturing Method Thereof - An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.12-18-2008
20080308807Display device and manufacturing method thereof - It is an object to provide a manufacturing method by which display devices can be manufactured in quantity without degrading the characteristics of thin film transistors. In a display device including a thin film transistor in which a microcrystalline semiconductor film, a gate insulating film in contact with the microcrystalline semiconductor film, and a gate electrode overlap with each other, an antioxidant film is formed on a surface of the microcrystalline semiconductor film. The antioxidant film on the surface of the microcrystalline semiconductor film can prevent a surface of a microcrystal grain from being oxidized, thereby preventing the mobility of the thin film transistor from decreasing.12-18-2008
20080308805Semiconductor Device and Manufacturing Method Thereof - An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.12-18-2008
20080308804Semiconductor Device and Manufacturing Method Thereof - An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.12-18-2008
20110204370Thin-Film Transistor Substrate, Method of Manufacturing the Same, and Display Device Including the Same - Provided are a thin-film transistor (TFT) substrate, a method of manufacturing the same, and a display device including the same. The TFT substrate includes a gate electrode formed on a substrate, a gate insulating layer formed on the gate electrode, an oxide semiconductor pattern formed on the gate insulating layer, a source electrode formed on the oxide semiconductor pattern, a drain electrode formed on the oxide semiconductor pattern to face the source electrode, and a pixel electrode formed on the gate insulating layer.08-25-2011
20110204366SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME AND IMAGE DISPLAY - A semiconductor device having a semiconductor elements formed with higher density is provided. Furthermore an image display device using the semiconductor device is also provided.08-25-2011
20080210941Dispaly device - The present invention provides a display device which can obviate the occurrence of a leak current in a thin film transistor. In a display device including a substrate, and gate signal lines, an insulation film, semiconductor layers and conductor layers which are sequentially stacked on the substrate, the conductor layer forms at least a drain electrode which is connected to a drain signal line and a source electrode which is connected to a pixel electrode, and the semiconductor layer is formed in a pattern in which the semiconductor layer has a protruding portion which protrudes outwardly from the conductor layer at a portion thereof except for a distal end of the drain electrode as viewed in a plan view.09-04-2008
20120032177Display Device and Method for Manufacturing the Same - A display device having the high aperture ratio and a storage capacitor with high capacitance is to be obtained. The present invention relates to a display device and a manufacturing method thereof. The display device includes a thin film transistor which includes a gate electrode, a gate insulating film, a first semiconductor layer, a channel protective film, a second semiconductor having conductivity which is divided into a source region and a drain region, and a source electrode and a drain electrode; a third insulating layer formed over the second conductive film; a pixel electrode formed over the third insulating layer, which is connected to one of the source electrode and the drain electrode; and a storage capacitor formed in a region where a capacitor wiring over the first insulating layer and the pixel electrode are overlapped with the third insulating layer over the capacitor wiring interposed therebetween.02-09-2012
20080217618Thin Film Circuits - A thin film circuit comprises a plurality of thin film transistors, each having a light shield portion (09-11-2008
20100127267ALTERNATIVE THIN FILM TRANSISTORS FOR LIQUID CRYSTAL DISPLAYS - Alternative thin film transistors for liquid crystal displays are disclosed. The alternative transistors can be used for panels of displays such as liquid crystal displays (LCDs), especially those having alternative pixel arrangements. These transistors can be oriented on a panel of an LCD using different, non-traditional configurations, while addressing misalignment and parasitic capacitance.05-27-2010
20090014724Semiconductor Device and Fabrication Method Thereof - This invention provides a semiconductor device having high operation performance and high reliability. An LDD region 01-15-2009
20090014723Thin film transistor array of horizontal electronic field applying type and method for fabricating the same - A thin film transistor array of a horizontal electronic field applying type enhances brightness. The thin film transistor array includes a gate line and common line separated from the gate line; a data line crossing with the gate line to define pixel region and insulated from the gate line by a gate insulating film; a TFT connected to the gate line and the data line in the pixel region; a pixel electrode on a passivation film overlapping with the common line in the pixel region and connected to the TFT; and a common electrode on the passivation film opposed to the pixel electrode in the pixel region and connected to the common line, wherein the width of the pixel electrode at the overlapping portion between the common line and the pixel electrode is narrower than the width of the common line, and the edge of one side of the pixel electrode adjacent to the common electrode is formed on the inside of the edge of one side of the common line adjacent to the common electrode.01-15-2009
20090014721THIN FILM TRANSISTOR AND MANUFACTURING METHOD OF THE SAME - To achieve TFT having a high light-resistance characteristic with a suppressed light leak current at low cost by simplifying the manufacturing processes. The TFT basically includes a light-shielding film formed on a glass substrate that serves as an insulating substrate; an insulating film formed on the light-shielding film; a semiconductor film formed on the insulating film; and a gate insulating film formed on the semiconductor film. Each layer of a laminate that is configured with three layers of the light-shielding film, the insulating film, and the semiconductor film is patterned simultaneously. Further, each layer of the laminate is configured with silicon or a material containing silicon.01-15-2009
20080210944Ejecting method and ejecting apparatus - In an ink jet apparatus for manufacturing a color filter 09-04-2008
20080277664DISPLAY APPARATUS AND METHOD THEREOF - A display apparatus includes pixel electrodes disposed on a first base substrate, a second base substrate which faces the first base substrate, color pixels disposed on the second base substrate, the color pixels correspond to the pixel electrodes in a one-to-one correspondence, each color pixel partially covers the corresponding pixel electrode, a common electrode disposed on the second base substrate to cover the pixel electrodes and an electrophoretic layer including a plurality of electrophoretic particles, the electrophoretic layer being interposed between the pixel electrodes and the common electrode.11-13-2008
20120043548THIN FILM TRANSISTOR AND DISPLAY UNIT - A thin film transistor with which oxygen is easily supplied to an oxide semiconductor layer and favorable transistor characteristics are able to be restored and a display unit including the same. The thin film transistor includes, sequentially over a substrate, a gate electrode, a gate insulting film, an oxide semiconductor layer including a channel region, and a channel protective layer covering the channel region A source electrode and a drain electrode are formed on the oxide semiconductor layer located on both sides of the channel protective layer, and at least one of the source electrode and the drain electrode has an aperture to expose the oxide semiconductor layer.02-23-2012
20130119386PIXEL STRUCTURE AND FABRICATION METHOD OF PIXEL STRUCTURE - A pixel structure and its fabrication method are provided. The pixel structure includes a channel layer, a first patterned metal layer, a first insulation layer, a second patterned metal layer, a second insulation layer, and a pixel electrode. The first patterned metal layer includes a data line, a source, and a drain. The first insulation layer has a first opening exposing the drain. The second patterned metal layer includes a scan line and a capacitor electrode. The capacitor electrode has at least one first portion overlapping the data line. The second insulation layer has a second opening communicating with the first opening to expose the drain. The pixel electrode is connected to the drain through the first opening and the second opening and at least overlaps the first portion of the capacitor electrode.05-16-2013
20130119388ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An OLED device includes: a TFT including an active layer, gate, source and drain electrodes, a first insulating layer between the active layer and the gate electrode, and a second insulating layer between the source and drain electrodes, a pixel electrode on the first and second insulating layers, connected to one of the source and drain electrodes, a capacitor including a first electrode on the same layer as the active layer, a second electrode on the same layer as the gate electrode, and a third electrode formed of the same material as the pixel electrode, a third insulating layer between the second insulating layer and the pixel electrode and between the second and third electrodes, a fourth insulating layer covering the source, drain and third electrodes, exposing a portion of the pixel electrode, an organic light-emitting layer on the pixel electrode, and a counter electrode on the organic light-emitting layer.05-16-2013
20130119389Semiconductor Device and Method of Manufacturing Same - A FET is formed on a semiconductor substrate, a curved surface having a radius of curvature is formed on an upper end of an insulation, a portion of a first electrode is exposed corresponding to the curved surface to form an inclined surface, and a region defining a luminescent region is subjected to etching to expose the first electrode. Luminescence emitted from an organic chemical compound layer is reflected by the inclined surface of the first electrode to increase a total quantity of luminescence taken out in a certain direction.05-16-2013
20130119390THIN FILM TRANSISTOR SUBSTRATE - A thin film transistor substrate including a thin film transistor having a drain electrode with an electrode portion, which overlaps with a semiconductor layer, and an extended portion, which extends from the electrode portion and has a portion overlapping with a storage electrode or storage electrode line. A passivation layer is arranged on the drain electrode, and it has a contact hole that partially exposes the extended portion of the drain electrode without exposing a step in the extended portion caused by the storage electrode or storage electrode line. A pixel electrode is arranged on the passivation layer and is electrically connected with the extended portion of the drain electrode through the contact hole.05-16-2013
20080283837SEMICONDUCTOR DEVICE - An object is to provide a structure for forming a circuit for which high-speed operation and low-voltage operation are required and a circuit for which sufficient reliability is required at the time of high voltage application in a circuit group provided over one substrate in a semiconductor device, and a manufacturing method thereof. A semiconductor device is provided with a plurality of kinds of transistors which include single-crystal semiconductor layers with different thicknesses, which are separated from a single-crystal semiconductor substrate and bonded, over one substrate. The single-crystal semiconductor layer of a transistor for which high-speed operation is required is formed thinner than that of a transistor for which high resistance to a voltage is required, so that the thickness of the single-crystal semiconductor layer is made to be thin.11-20-2008
20080265254THIN FILM TRANSISTOR ARRAY SUBSTRATE, METHOD OF MANUFACTURING SAME, AND DISPLAY DEVICE - A thin film transistor array substrate in accordance with the present invention comprising a semiconductor layer formed over the substrate and having source/drain regions, a gate insulating film, a gate electrode, an interlayer insulating film, wiring electrodes connected to the source/drain regions, a protective film, a pixel electrode connected to the wiring electrode, a lower capacitor electrode formed with and extending from the semiconductor layer, a common line electrode formed from the same layer as the gate electrode and arranged in the opposed position to the lower capacitor electrode with the gate insulating film interposed therebetween, and an upper capacitor electrode arranged in the opposed position to the common line electrode with a dielectric film (protective film) having film thickness thinner than the interlayer insulating film interposed therebetween.10-30-2008
20080265253THIN FILM TRANSISTOR DISPLAY PANEL, MANUFACTURING METHOD AND DETECTION METHOD THEREOF - A thin film transistor (TFT) display panel as well as a manufacturing method and a detection method thereof are provided. The TFT display panel comprises at least two display regions and a detection region, wherein a gate detection line is correspondingly connected at least with all the gate lines from one of the display regions in the detection region. The embodiments of the present invention improve the safety of the circuits in the detection region, and simplify the mask process of the TFT display panel and the detection process for the display region, which in turn increases the production efficiency of the TFT and reduces the production cost.10-30-2008
20110006305INFORMATION DEVICE - Problems exist in areas such as image visibility, endurance of the device, precision, miniaturization, and electric power consumption in an information device having a conventional resistive film method or optical method pen input function. Both EL elements and photoelectric conversion elements are arranged in each pixel of a display device in an information device of the present invention having a pen input function. Information input is performed by the input of light to the photoelectric conversion elements in accordance with a pen that reflects light by a pen tip. An information device with a pen input function, capable of displaying a clear image without loss of brightness in the displayed image, having superior endurance, capable of being miniaturized, and having good precision can thus be obtained.01-13-2011
20090152555THIN FILM TRANSISTOR DISPLAY SUBSTRATE AND METHOD OF THE FABRICATING THE SAME - A thin film transistor display substrate comprises a base substrate on which a pixel area including a first reflection area and a second reflection area is defined. A gate line formed on the base substrate and a data line formed on the base substrate. The data line is insulated from and intersected with the gate line to define the pixel area. A thin film transistor is formed in the pixel area and connected to the gate line and the data line. A first reflection layer is formed on the base substrate and corresponds to the first reflection area. A color filter is formed on the first reflection layer and corresponds to the pixel area. A second reflection layer is formed on the color filter and corresponds to the second reflection area. A pixel electrode is formed on the color filter and is electrically connected to the thin film transistor.06-18-2009
20090050890CONTACT STRUCTURE - There is disclosed a contact structure for electrically connecting conducting lines formed on a first substrate of an electrooptical device such as a liquid crystal display with conducting lines formed on a second substrate via conducting spacers while assuring a uniform cell gap among different cells if the interlayer dielectric film thickness is nonuniform across the cell or among different cells. A first conducting film and a dielectric film are deposited on the first substrate. Openings are formed in the dielectric film. A second conducting film covers the dielectric film left and the openings. The conducting spacers electrically connect the second conducting film over the first substrate with a third conducting film on the second substrate. The cell gap depends only on the size of the spacers, which maintain the cell gap.02-26-2009
20090179202THIN FILM TRANSISTOR ARRAY PANEL FOR A LIQUID CRYSTAL DISPLAY AND A METHOD FOR MANUFACTURING THE SAME - Simplified method of manufacturing liquid crystal displays. A gate wire including a gate line, a gate pad and a gate electrode is formed on the substrate by using the first mask. A gate insulating layer, a semiconductor layer, a ohmic contact layer and a metal layer are sequentially deposited to make a quadruple layers, and patterned by a dry etch of using the second mask. At this time, the quadruple layers is patterned to have a matrix of net shape layout and covering the gate wire. An opening exposing the substrate is formed in the display area and a contact hole exposing the gate pad is formed in the peripheral area. Next, ITO is deposited and a photoresist layer coated on the ITO. Then, the ITO layer is patterned by using the third mask and a dry etch, and the data conductor layer and the ohmic contact layer not covered by the ITO layer is dry etched. After depositing a passivation layer, a opening is formed by using the fourth mask and the exposed semiconductor layer through the opening is etched to separate the semiconductor layer under the adjacent data line.07-16-2009
20080246033THIN FILM TRANSISTOR, ORGANIC LIGHT EMITTING DEVICE INCLUDING THIN FILM TRANSISTOR, AND MANUFACTURING METHOD THEREOF - The present invention relates to a thin film transistor, a method thereof and an organic light emitting device including the thin film transistor. According to an embodiment of the present invention, the thin film transistor includes a substrate, a control electrode, an insulating layer, a first electrode and a second electrode, a first ohmic contact layer and a second ohmic contact layer, and a semiconductor layer. The control electrode is formed on the substrate, and the insulating layer is formed on the control electrode. The first and the second electrodes are formed on the insulating layer. The first ohmic contact layer and the second ohmic contact layer are formed on the first electrode and the second electrode. The semiconductor layer is formed on the first ohmic contact layer and the second ohmic contact layer to fill between the first and the second electrodes.10-09-2008
20110204372DISPLAY DEVICE - Provided is a display device including first and second gate interconnections; a first pixel circuit disposed at one side of the first gate interconnection, the first pixel circuit including a first transistor, a gate electrode of the first transistor electrically connected to the first gate interconnection, a source electrode of the first transistor formed in a source layer, the source electrode including a first source electrode facing portion overlapping with the gate electrode; and a second pixel circuit disposed at the other side of the second gate interconnection, the second pixel circuit including a second transistor, a gate electrode of the second transistor electrically connected to the second gate interconnection, a source electrode of the second transistor formed in the source layer, the source electrode including a second source electrode facing portion overlapping with the gate electrode and stretched along the first source electrode facing portion.08-25-2011
20110204369Organic Light-Emitting Display Device - An organic light-emitting display device which is transparent by improving a transmittance in transmitting regions and which reduces a voltage drop in an opposite electrode comprises: a substrate having a transmitting region and pixel regions separated from each other by the transmitting region; thin film transistors positioned on the substrate and disposed in the pixel regions, respectively; a passivation layer covering the thin film transistors, formed in the transmitting region and the pixel regions, and having a first opening formed in a location corresponding to at least a portion of the transmitting region; pixel electrodes formed on the passivation layer so as to be electrically connected to the thin film transistors, respectively, located in the pixel regions, and disposed so as to overlap and cover the thin film transistors, respectively; an opposite electrode facing the pixel electrodes, formed so as to be able to transmit light, and located in the transmitting region and the pixel regions; an organic emission layer interposed between the pixel electrodes and the opposite electrode so as to emit light; and a conduction unit formed of a conductive material, disposed so as to overlap with the first opening, and contacting the opposite electrode.08-25-2011
20090057667Display device and method for fabricating the same - Provided are a display device and a fabricating method thereof. The display device includes a substrate, a gate line, a common line, common electrodes, an insulating layer, a data line, a drain electrode, and pixel electrodes. The gate line is disposed in a first direction. The common line is disposed substantially parallel to the gate line. The common electrodes branch from the common line. The insulating layer covers the gate line, the common line, and the common electrodes. The channel patterns are disposed on the insulating layer to correspond to the gate electrode. The data line is disposed in a second direction. The drain electrode is electrically connected with the channel pattern. The pixel electrodes are formed of an opaque metal. Thus, the display device may improve contrast ratio.03-05-2009
20100270553LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a thin film transistor having high performance in a liquid crystal display, and a manufacturing method of a liquid crystal display according to an exemplary embodiment of the present invention that includes: forming a gate line including a gate electrode on a substrate; forming a gate insulating layer on the gate line; forming a data line including a source electrode and a drain electrode facing the source electrode on the gate insulating layer; forming a partition defining a pixel area and having an opening region exposing the gate insulating layer on the gate electrode, the source electrode and the drain electrode on the gate line, and the data line and the drain electrode; forming a semiconductor in the opening region; forming a color filter in the pixel area defined by the partition; and forming a pixel electrode connected to the drain electrode on the color filter.10-28-2010
20100270551BOTTOM GATE THIN FILM TRANSISTOR AND ACTIVE ARRAY SUBSTRATE - A bottom gate thin film transistor and an active array substrate are provided. The bottom gate thin film transistor includes a gate, a gate insulation layer, a semiconductor layer, a plurality of sources and a plurality of drains. The gate insulation layer is disposed on the gate. The semiconductor layer is disposed on the gate insulation layer and located above the gate. An area ratio of the semiconductor layer and the gate is about 0.001 to 0.9. The sources are electrically connected with each other, and the drains are electrically connected with each other.10-28-2010
20090127559ORGANIC LUMINESCENT DISPLAY DEVICE HAVING A SEMICONDUCTOR WITH AN AMORPHOUS SILICON LAYER - A display device includes a plurality of light emitting elements arranged in a matrix. A scan signal is made to flow into a gate signal line and a data signal is made to flow into a source signal line so that the data signal is applied to a source electrode and the scan signal is supplied to a gate electrode of a control TFT arranged at a portion where the both signal lines intersect when viewed from above. Thus, when the control TFT is turned ON, a drive TFT having a gate electrode connected to the drain electrode is turned ON, so that current is supplied from a power supply line via the source electrode and the drain electrode of the drive TFT to an organic EL element and the organic EL element emits light. A holding capacity is present between the control TFT and the drive TFT. Even when the scan signal becomes LOW level and the control TFT turns OFF, the gate potential of the drive TFT is held for a predetermined period of time by the holding capacity and the organic EL element continues to emit light.05-21-2009
20090090912STRUCTURE OF THIN FILM TRANSISTOR ARRAY - A substrate having a gate electrode layer, a gate insulating layer, and a silicon layer thereon is provided. These layers are patterned into a gate area, a gate line and a gate line wiring area. A passivation layer is formed on the entire substrate and patterned to form two contact holes in the passivation layer on the silicon layer at the gate area, and partions of the passivation layer at the gate line and at the gate line wiring areas are removed. An ion implanting layer and a metal layer are formed on the substrate and patterned to form a source region, a drain region, a data line, a data line wiring area and a second layer of the gate line wiring area. A pixel electrode is formed on the passivation layer and electrically coupled to the drain region. Therefore, the TFT array can be fabricated by only four masks.04-09-2009
20090085034THIN FILM TRANSISTOR ARRAY SUBSTRATE - The present invention relates to a thin film transistor array substrate comprising a gate line and a data line that are separated by an insulting layer and intersecting each other to define a pixel, wherein a data auxiliary line is disposed adjacent to an intersection portion between the data line and the gate line, and both ends of the data auxiliary line are on two sides of the intersection portion and connected with the data lines, respectively.04-02-2009
20090152556Liquid crystal display panel and fabricating method thereof - A liquid crystal display panel includes: a thin film transistor array substrate having a gate line and a data line provided on the substrate; a gate insulating film between the gate line and the data line; a thin film transistor having a source electrode, a drain electrode and a gate electrode; a pixel electrode; a protective film for protecting the thin film transistor; a plurality of pads; a transparent electrode pattern formed on the data line, source electrode and drain electrode; and a color filter array substrate joined to the thin film transistor array substrate so that the color filter substrate does not overlap the pad area of the thin film transistor array substrate, wherein at least one of the gate insulating film and protective film in the pad area is etched using the color filter array substrate as a mask to expose at least one of the plurality of pads.06-18-2009
20090152552PIXEL STRUCTURE AND REPAIRING METHOD THEREOF - A pixel structure disposed on a substrate and including a common line, a reserved line, a dielectric layer, two repair lines, an active device, and a pixel electrode is provided. The reserved line and the common line are disposed on the substrate and are covered by the dielectric layer. The repair lines are disposed on the dielectric layer, and each repair line has a first repairing region overlapped with the common line and a second repairing region overlapped with the reserved line. When the common line is open, the repair lines in the first and second repairing regions are connected with the common line and the reserved line, such that the common line, the repair lines, and the reserved line are electrically connected. After the common line, the repair lines, and the reserved line are connected, the above-mentioned pixel structure is effectively repaired.06-18-2009
20090152551Semiconductor device and manufacturing method thereof - A means of forming unevenness for preventing specular reflection of a pixel electrode, without increasing the number of process steps, is provided. In a method of manufacturing a reflecting type liquid crystal display device, the formation of unevenness (having a radius of curvature r in a convex portion) in the surface of a pixel electrode is performed by the same photomask as that used for forming a channel etch type TFT, in which the convex portion is formed in order to provide unevenness to the surface of the pixel electrode and give light scattering characteristics.06-18-2009
20090085032PIXEL STRUCTURE AND FABRICATING METHOD THEREOF - A method of fabricating a pixel structure is provided. First, a semiconductor material layer and a first conductive layer are sequentially formed on a substrate. Next, a first patterned photoresist layer with a fillister is formed on the first conductive layer by a first mask. A semiconductor layer, a drain, and a source are formed by the first patterned photoresist layer. After removing the first patterned photoresist layer, a dielectric material layer covering the source, the drain, and the semiconductor layer is formed. A second conductive layer is formed on the dielectric material layer. Then, a second patterned photoresist layer with a salient is formed on the second conductive layer by a second mask. A gate and a dielectric layer are formed by the second patterned photoresist layer. After removing the second patterned photoresist layer, a pixel electrode electrically connected to the drain is formed above the substrate.04-02-2009
20130214280DISPLAY DEVICE AND SEMICONDUCTOR DEVICE - An object is to provide a display device with a high aperture ratio or a semiconductor device in which the area of an element is large. A channel formation region of a TFT with a multi-gate structure is provided under a wiring that is provided between adjacent pixel electrodes (or electrodes of an element). In addition, a channel width direction of each of a plurality of channel formation regions is parallel to a longitudinal direction of the pixel electrode. In addition, when a channel width is longer than a channel length, the area of the channel formation region can be increased.08-22-2013
20110266545ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME - An array substrate includes an active layer including a channel region, a gate electrode positioned corresponding to the channel region, and a gate insulating film between the active layer and the gate electrode. The gate electrode includes a transparent conductive film and an opaque conductive film, and the transparent conductive film is between the channel region and the opaque conductive film.11-03-2011
20110266544ORGANIC LIGHT EMITTING DIODE DISPLAY AND MANUFACTURING METHOD THEREOF - An organic light emitting diode display, which can obtain a resonance effect by its metal mirror, and a manufacturing method thereof. The display includes a semiconductor layer, a dummy pattern layer, a gate insulating film, a pixel electrode, and a gate electrode. The semiconductor layer is formed of polysilicon on a base substrate. The dummy pattern layer is formed of polysilicon at a same layer level as the semiconductor layer and surrounds a light emitting region. The gate insulating film is on the base substrate while covering the semiconductor layer and the dummy pattern layer, and has recess portions corresponding to the light emitting region. The pixel electrode is filled in the recess portions, and is formed of a metal mirror multilayer including a transmissive conductive film and a reflective conductive film. The gate electrode is on the gate insulating film at a distance from the pixel electrode.11-03-2011
20110266548LIGHT EMITTING DEVICE, METHOD OF MANUFACTURING THE SAME, AND MANUFACTURING APPARATUS THEREFOR - A light emitting device having high definition, a high aperture ratio, and high reliability is provided. The present invention achieves high definition and a high aperture ratio with a full color flat panel display using red, green, and blue color emission light by intentionally forming laminate portions, wherein portions of different organic compound layers of adjacent light emitting elements overlap with each other, without depending upon the method of forming the organic compound layers or the film formation precision.11-03-2011
20090090910THIN-FILM ELEMENT, DISPLAY DEVICE AND MEMORY CELL USING THE THIN-FILM ELEMENT, AND THEIR FABRICATION METHODS - Pixel auxiliary capacitors (04-09-2009
20090127557METHOD FOR FORMING A POLYSILICON THIN FILM LAYER - This invention provides a method for fabricating a polysilicon thin film layer, which performs a gas plasma treatment on channel regions defined in the polysilicon thin film layer after the polysilicon thin film layer is formed on a substrate. Threshold voltages for polysilicon thin film transistors formed subsequently are thus adjusted by the gas plasma treatment. A gate insulating layer is formed on the polysilicon thin film layer after the gas plasma treatment.05-21-2009
20110220903REFLECTIVE ANODE AND WIRING FILM FOR ORGANIC EL DISPLAY DEVICE - To avoid a phenomenon of deterioration which is characteristic to an organic EL display device, such as a dark spot, without forming a pin hole in an organic material used for forming an organic EL layer. A reflective anode for an organic EL display device includes: an Ag-based alloy film (09-15-2011
20090184318THIN FILM TRANSISTOR ARRAY PANEL, DISPLAY DEVICE INCLUDING THE SAME, AND METHOD THEREOF - A thin film transistor (“TFT”) array panel according to an exemplary embodiment of the present invention includes a substrate, a first storage electrode formed on the substrate, a first TFT formed on the substrate and separated from the first storage electrode, a first insulating layer formed on the first storage electrode and the first TFT and having a first opening disposed on the first storage electrode, a pixel electrode connected to the first TFT and overlapping the first storage electrode in the first opening, and a second insulating layer disposed between the first storage electrode and the pixel electrode in the first opening, wherein at least a portion of the boundary of the pixel electrode overlaps the first storage electrode and is disposed in the first opening. Accordingly, storage appropriate capacitance is ensured and a reduction of the aperture ratio may be decreased.07-23-2009
20090026457Active matrix substrate, method of making the substrate, and display device - An active matrix substrate includes base substrate, gate lines, data lines, thin-film transistors and pixel electrodes. The gate lines are formed on the base substrate. The data lines are formed over the gate lines. Each of the data lines crosses all of the gate lines with an insulating film interposed therebetween. The thin-film transistors are formed over the base substrate. Each of the thin-film transistors is associated with one of the gate lines and operates responsive to a signal on the associated gate line. Each of the pixel electrodes is associated with one of the data lines and one of the thin-film transistors and is electrically connectable to the associated data line by way of the associated thin-film transistor. Each of the pixel electrodes and the associated thin-film transistor are connected together by way of a conductive member. Each of the pixel electrodes crosses one of the gate lines, while the conductive member for the pixel electrode crosses another one of the gate lines that is adjacent to the former gate line.01-29-2009
20090026456TRANSISTOR ARRAY PANEL, LIQUID CRYSTAL DISPLAY PANEL, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL - A transistor array panel includes switching elements provided in intersecting portions between gate and data lines, and display electrodes connected to the switching elements. A conductive film pattern is provided to be electrically insulated from the gate and data lines, and display electrodes, and to be overlapped on the display electrodes, thereby forming a storage capacitance between each of the display electrodes and the conductive film pattern. A protection circuit is electrically connected to the gate and data lines, and disposed in an outer peripheral portion of a display region in which the switching elements and the display electrodes are formed on the one side of the substrate. A common line is insulated from the protection circuit, connected to the conductive film pattern, and provided to be insulated from the protection circuit and to be at least partially overlapped on the protection circuit, in the outer peripheral portion of the display region.01-29-2009
20090026452Liquid crystal display device and electronic device provided with the same - A liquid crystal display device provided with a thin film transistor with excellent electrical characteristics and reduced off current, for which increase in manufacturing costs can be suppressed while suppressing reduction in yield. A thin film transistor includes a gate electrode provided over a substrate; a gate insulating film provided to cover the substrate and the gate electrode; a first island-shaped semiconductor layer and a second island-shaped semiconductor layer each formed as a stack of a microcrystalline semiconductor layer and a buffer layer with a depression on an upper surface thereof, over the gate electrode with the gate insulating film interposed therebetween; a conductive semiconductor layer; and a conductive layer provided on the conductive semiconductor layer. The conductive semiconductor layer is provided between the first island-shaped semiconductor layer and the second island-shaped semiconductor layer in contact with the gate insulating film.01-29-2009
20090026450THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor array substrate comprising a base substrate, a first wire on the base substrate, a first insulating layer on the base substrate to cover the first wire, a semiconductor layer on the first insulating layer, a second insulating layer on the first insulating layer on which the semiconductor layer is formed, and a second wire on the second insulating layer on the second insulating layer is provided, and a portion of the second wire makes contact with the semiconductor layer through the contact hole.01-29-2009
20100051950THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD OF FABRICATING THEREOF - A thin film transistor array substrate includes a substrate, a plurality of poly-silicon islands and a plurality of gates. The substrate has a display region, a gate driver region and a source driver region. Each poly-silicon island disposed on the substrate has a source region, a drain region and a channel region disposed therebetween. The poly-silicon islands include several first poly-silicon islands and several second poly-silicon islands. The first poly-silicon islands having main grain boundaries and sub grain boundaries are only disposed within the display region and the gate driver region. The main grain boundaries of the first poly-silicon islands are only disposed within the source regions and/or the drain regions. The second poly-silicon islands are disposed in the source driver region. Grain sizes of the first poly-silicon islands are substantially different from those of the second poly-silicon islands. Gates corresponding to the channel regions are disposed on the substrate.03-04-2010
20100200859THIN FILM TRANSISTOR ARRAY PANEL FOR X-RAY DETECTOR - A thin film transistor array panel for an X-ray detector includes a dummy pixel including a photo diode and a TFT for detecting leakage current. The photo diode includes first and second electrodes (08-12-2010
20100200858DISPLAY DEVICE - A display device includes a plurality of thin-film transistors formed on a substrate on which a display area is formed. At least one of the plurality of thin-film transistors includes a gate electrode, agate insulating film formed to cover the gate electrode, an interlayer insulating film formed on an upper surface of the gate insulating film and having an opening formed in an area where the gate electrode is formed in plan view, a pair of heavily-doped semiconductor films arranged on an upper surface of the interlayer insulating film with the opening interposed therebetween, a polycrystalline semiconductor film formed across the opening and formed in the area, the polycrystalline semiconductor film being electrically connected to the pair of heavily-doped semiconductor films, and a pair of electrodes formed to overlap the pair of heavily-doped semiconductor films, respectively, without overlapping the polycrystalline semiconductor film.08-12-2010
20100200857OXIDE SEMICONDUCTOR THIN-FILM TRANSISTOR - A transistor includes a gate electrode, a gate insulating layer, a semiconductor layer including an amorphous oxide, source-drain electrodes, and a protective layer on a substrate. The semiconductor layer includes a first region corresponding to a region in which the source-drain electrodes are formed, and a second region not corresponding to the region in which the source-drain electrodes are formed. At least the first region includes a crystalline component having a composition different from the composition of the amorphous oxide in the second region.08-12-2010
20100200856METHOD FOR MANUFACTURING E-JPAPER ARRAY SUBSTRATE AND E-PAPER ARRAY SUBSTRATE - A method for manufacturing E-paper array substrate and an E-paper array substrate are provided. The method for manufacturing E-paper array substrate uses two masks. Steps on a surface of the array substrate structure are eliminated, so as to facilitate a subsequent coating process of E-ink and enable a uniform distribution of a drain electric field. An E-paper array substrate is further provided.08-12-2010
20120138932PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A pixel structure and a manufacturing method thereof are provided. In the pixel structure, an electrode of a storage capacitor is formed when an active layer is formed, and the electrode and the active layer are made of the same material. The material of the electrode and the active layer can be an oxide semiconductor with high transmittance. Therefore, a stable display frame of the pixel structure can be provided by the storage capacitor, an aperture ratio of the pixel structure can be improved, and power consumption can be further reduced.06-07-2012
20090184319DISPLAY SUBSTRATE AND A METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE - A method of manufacturing a display substrate is described. In the method, a gate line and a gate electrode are formed on a base substrate. A source metal layer is formed on the base substrate having the gate line and the gate electrode. A data line, a source electrode and a drain electrode are formed by etching the source metal layer by using an etching gas. An additive gas is provided to the base substrate having the drain electrode so that the additive gas reacts with an etching component of the etching gas to remove a by-product formed at an exposed portion of the data line, the source electrode and drain electrode. Thus, corrosion of the fine pattern due to an etching gas may be prevented and/or reduced.07-23-2009
20120138936ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - In an organic light-emitting display device and a method of manufacturing the same, the organic light-emitting display device comprises: a substrate in which a light-emitting region and a thin-film transistor (TFT) region are defined; and a plurality of insulating films formed on the substrate. A refractive index changes at only one of the interfaces between insulating films, which correspond to the light-emitting region and are formed between the substrate and a first electrode of an organic electroluminescence display element, and a refractive index changes at two or more of the interfaces between insulating films which correspond to the TFT region.06-07-2012
20090140253TFT ARRANGEMENT FOR DISPLAY DEVICE - A new TFT arrangement is demonstrated, which enables prevention of TFT to be formed over a joint portion between the adjacent SOI layers prepared by the process including the separation of a thin single crystal semiconductor layer from a semiconductor wafer. The TFT arrangement is characterized by the structure where a plurality of TFTs each belonging to different pixels is gathered and arranged close to an intersection portion of a scanning line and a signal line. This structure allows the distance between regions, which are provided with the plurality of TFTs, to be extremely large compared with the distance between adjacent TFTs in the conventional TFT arrangement in which all TFTs are arranged in at a regular interval. The formation of a TFT over the joint portion can be avoided by the present arrangement, which leads to the formation of a display device with a negligible amount of display defects.06-04-2009
20090140254THIN FILM TRANSISTOR AND FLAT PANEL DISPLAY DEVICE INCLUDING THE SAME - A flat panel display device is disclosed. In one embodiment, the flat panel display device includes i) a semiconductor layer including a channel region and a groove, wherein the channel region electrically connects a source electrode and a drain electrode, and the groove is configured to separate the channel region from adjacent thin film transistors and ii) a stop layer formed below at least a portion of the semiconductor layer. According to one embodiment of the invention, a semiconductor layer can be easily patterned without using a dry or wet etching technique such as photolithography.06-04-2009
20090140252IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SENSOR - An image sensor and a method of manufacturing the sensor. A method of manufacturing an image sensor may include at least one of: Forming a gate over a semiconductor substrate. Sequentially depositing a plurality of insulating films over the semiconductor substrate and the gate. Removing an upper-most insulating film of the plurality of insulating films by dry etching, thus forming a spacer at sides of the gate. Removing other insulating films by wet etching, while maintaining a bottom-most insulating film of the plurality of insulating films over the semiconductor substrate. Attacks may be prevented on a surface of a semiconductor substrate, making it possible to reduce generation of a dark signal, prevent plasma damage by controlling the thickness of a remaining oxide film with ease, and making it possible to improve yield and resolution of an image.06-04-2009
20080315204Thin Film Transistor, and Active Matrix Substrate and Display Device Provided with Such Thin Film Transistor - Improves the electric current driving capability of a thin film transistor without the yield being decreased due to a defective leak between a source electrode/drain electrode and a gate electrode or due to a decrease in an off-characteristic.12-25-2008
20090014722ACTIVE-MATRIX-DRIVE DISPLAY UNIT INCLUDING TFT - An active-matrix-drive LCD includes a TFT substrate, on which a TFT is formed. The TFT includes a gate electrode layer, a gate insulating film, a patterned semiconductor layer, and a source/drain electrode layer, which are consecutively formed on an insulating substrate of the TFT substrate. The gate electrode layer has a thickness smaller than a thickness of the gate insulating film.01-15-2009
20110220901Organic light-emitting display device - An organic light-emitting display device includes a first substrate having transmitting regions and pixel regions separated from each other by the transmitting regions, a plurality of thin film transistors on the first substrate in the pixel regions, a passivation layer covering the plurality of thin film transistors, a plurality of pixel electrodes on the passivation layer and electrically connected to the thin film transistors, the pixel electrodes being in the pixel regions and overlapping the thin film transistors, an opposite electrode in the transmitting regions and the pixel regions, the opposite electrode facing the plurality of pixel electrodes and being configured to transmit light, an organic emission layer interposed between the pixel electrodes and the opposite electrode, and a color filter in corresponding pixel regions.09-15-2011
20120068181INTEGRATED CIRCUIT DEVICE AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICE - An object of the present invention is to provide a structure of a thin film circuit portion and a method for manufacturing a thin film circuit portion by which an electrode for connecting to an external portion can be easily formed under a thin film circuit. A stacked body including a first insulating film, a thin film circuit formed over one surface of the first insulating film, a second insulating film formed over the thin film circuit, an electrode formed over the second insulating film, and a resin film formed over the electrode, is formed. A conductive film is formed adjacent to the other surface of the first insulating film of the stacked body to be overlapped with the electrode. The conductive film is irradiated with a laser.03-22-2012
20090206339Flat display device and method for manufacturing the same - A flat display device is provided. The flat display device a substrate divided into an active region for displaying an image and a peripheral region that does not display the image, and includes: a gate line that crosses a data line to define a pixel region in the active region; a thin film transistor in a region near a crossing of the gate line and the data line; a first common electrode in the pixel region; a storage electrode on the first common electrode to provide storage capacitance; a pixel electrode electrically connected with the storage electrode and overlapping the pixel region, the data line, and the gate line; and an ink film covering the active region and the peripheral region, and having microcapsules including charged particles.08-20-2009
20090321738Display apparatus using oxide diode - Provided may be a display apparatus that uses oxide diodes having a nano rod structure, for example, nano-rod diodes formed of a ZnO group material. The display apparatus may include a substrate, a thin film transistor layer on the substrate, and a light emitting layer on the thin film transistor layer, wherein the light emitting layer may include a plug metal layer on the thin film transistor layer, a plurality of nano-rod diodes vertically formed on the plug metal layer, and a transparent electrode on the nano-rod diodes.12-31-2009
20110220900ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus includes a substrate, a plurality of pixel electrodes formed on the substrate, a counter electrode formed to cover all of the plurality of pixel electrodes, organic light emitting layers disposed between the plurality of pixel electrodes and the counter electrode, an encapsulation substrate disposed above the substrate to cover the counter electrode, a sealant formed along edges of the substrate and the encapsulation substrate to seal a space formed between the substrate and the encapsulation substrate, a filler filled in the space formed between the substrate and the encapsulation substrate, and bus electrodes disposed on an inner surface of the encapsulation substrate facing the counter electrode. Each of the bus electrodes includes projecting portions and a base portion connecting the projecting portions to each other. The projecting portions are connected to the counter electrode, and a connection portion of the each of the projecting portions to the counter electrode is disposed between the organic light-emitting layers.09-15-2011
20110220897ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY AND FABRICATION METHOD THEREOF - An array substrate of a liquid crystal display and a method of fabrication for the same are disclosed. The method of fabrication includes: forming a gate electrode on a first region of a substrate, where the substrate is divided into first and second regions, forming a lower storage electrode, including a transparent conductive material, on the second region of the substrate, and forming a gate insulating layer on the substrate, where the gate insulating layer includes first, second and third gate insulating sub-layers.09-15-2011
20090050889Repairable capacitor for liquid crystal display - A thin film transistor array substrate, which can repair a current-leakage defect of a storage capacitor, is disclosed. The thin film transistor array substrate of the present invention comprises: a substrate, a plurality of data lines, and a plurality of scan lines, wherein the data lines and the scan lines divide the substrate into a plurality of display units, i.e. pixels. Each of these display units comprises: a thin film transistor, a lower electrode of a storage capacitor, a first dielectric layer covering the lower electrode of a storage capacitor, an upper electrode of the storage capacitor formed on the first dielectric layer, a second dielectric layer covering the upper electrode of a storage capacitor and the thin film transistor, a plurality of openings formed in the second dielectric layer, and a pixel electrode formed on the second dielectric layer. Besides, the lower electrode of the storage capacitor is further divided into a first portion and a second portion, wherein the first portion and the second portion are separate, but are electrically connected with each other.02-26-2009
20090072235ELECTRONIC DEVICE HAVING LIQUID CRYSTAL DISPLAY DEVICE - A display device of the present invention includes a first substrate and a second substrate opposed to each other, a liquid crystal interposed between the first substrate and the second substrate, an active matrix circuit and a driving circuit each comprising a thin film transistor formed over the first substrate, a resin layer formed over the active matrix circuit and the driving circuit, a spacer formed over the active matrix circuit, a sealing material formed over the driving circuit, and a filler included in the sealing material and in contact with the resin layer.03-19-2009
20090085033THIN FILM TRANSISTOR, PIXEL STRUCTURE AND FABRICATION METHODS THEREOF - A thin film transistor including a gate, a gate insulator layer, a doped semiconductor layer, a channel layer, a source, and a drain is provided. The gate is disposed on a substrate, and the gate insulator layer is disposed on the substrate and covers the gate. The doped semiconductor layer is disposed on the gate insulator layer above the gate. Furthermore, the channel layer is disposed on the doped semiconductor layer. The source and the drain are disposed separately on two sides of the channel layer.04-02-2009
20090127558DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device, and method for making the same, comprising a thin film transistor formed on a first insulating substrate, a pixel electrode electrically connected to the thin film transistor, an organic layer formed on the pixel electrode, a common electrode formed on the organic layer, a conductive layer formed on the common electrode, a transparent electrode layer formed on the conductive layer, the transparent electrode being applied with a common voltage, and a second insulating substrate located on the transparent electrode layer. Thus, the present invention provides a display device to which common voltage is applied effectively.05-21-2009
20110140117DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a base substrate, a signal line, a pad electrode, an organic layer, and a conductive member. The signal line is formed in a display area of the display substrate. The pad electrode extends from the signal line in a peripheral area of the display substrate. The organic layer is formed on the base substrate on which the signal line and the pad electrode are formed with a contact hole formed in correspondence with the pad electrode. The contact hole exposes a portion of the pad electrode. The conductive member includes conductive balls disposed in the contact hole and electrically connects the pad electrode with a connection terminal of a driving part providing a driving signal with the signal lines.06-16-2011
20110140114ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display apparatus and a method of manufacturing the same wherein in the organic light emitting device, each of the first to third sub pixels includes: a thin film transistor; a pixel electrode electrically connected to the thin film transistor; and an organic light emitting layer electrically connected to the pixel electrode; and an opposite electrode formed on each of the organic light emitting layers. A pad part is disposed on the non-display region, the pad part including at least one side exposed. The first sub pixel includes a first transmissive conductive layer and a second transmissive conductive layer sequentially stacked between the pixel electrode of the first sub pixel and the organic light emitting layer. The second sub pixel includes the first transmissive conductive layer between the pixel electrode of the first sub pixel and the organic light emitting layer.06-16-2011
20110140113ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - An organic electroluminescent display and a method for fabricating the same are disclosed. An organic electroluminescent display device includes at least one switching transistor and driving transistor formed on a array substrate, wherein the array substrate includes a gate pad and a date pad formed thereon; a passivation layer having a plurality of a first contact holes to expose a portion of a drain electrode of the driving transistor, a gate pad bottom electrode of the gate pad and a date pad bottom electrode of the data pad respectively; a contact electrode, a gate pad top electrode of the gate pad and a data pad top electrode of the data pad formed on the passivation layer, the contact electrode, a top gate pad electrode and a top data pad electrode electrically connected to the exposed portion of the drain electrode of the driving transistor, the gate pad bottom electrode and the date pad bottom electrode respectively, a planarization layer formed on the passivation layer, the planarization layer including a plurality of a second contact holes to expose a portion of the contact electrode, the gate pad top electrode and the data pad top electrode respectively; a light-emitting cell including a cathode electrode, an anode electrode and an organic layer interposed therebetween formed on the planarization layer; wherein the cathode electrode is electrically connected to the contact electrode via one of the contact hole; wherein the contact electrode has acid-resistance with respect to an etchant used in patterning the cathode electrode.06-16-2011
20090101907IMAGE DETECTOR - An image detector which includes an active matrix substrate and a protection substrate bonded to the active matrix substrate by an insulating bonding member, in which the insulating bonding member is bonded to the active matrix substrate through an inorganic insulating film disposed in an area around the periphery of the semiconductor layer.04-23-2009
20090101903Thin film transistor and method for manufaturing thereof - A thin-film transistor (TFT) includes a gate electrode, a gate dielectric layer, a semiconductor layer, source/drain electrodes, a passivation layer and a protection layer. The gate electrode is disposed on a substrate. The gate dielectric layer covers the gate electrode and the substrate. The semiconductor layer is disposed on the gate dielectric layer and above the gate electrode. The semiconductor layer has a channel region disposed above the gate electrode and source/drain regions disposed at both sides of the channel region. The source/drain electrodes are disposed on the source/drain regions of the semiconductor layer and each has a barrier layer disposed on the source/drain regions of the semiconductor layer and a conductive layer disposed on the barrier layer. The passivation layer is disposed over the surface of the source/drain electrodes. The protection layer is disposed over the substrate, the passivation layer, and the channel region of the semiconductor layer.04-23-2009
20090101904DISPLAY DEVICE - Disclosed herein is a display device including: a support substrate; a drive circuit provided on the support substrate; an interlayer insulating film which covers the drive circuit; organic field light-emitting elements arranged in a display region on the interlayer insulating film; and a lead-out wiring extended from the organic field light-emitting elements to a peripheral region around the display region, wherein the interlayer insulating film includes a laminated film made up of an inorganic insulating film and organic insulating film stacked in this order, the organic insulating film has an isolation trench which surrounds the display region, the isolation trench being devoid of the organic insulating film and having the inorganic insulating film at its bottom, and the drive circuit and lead-out wiring are insulated from each other by the inorganic insulating film where the lead-out wiring crosses the isolation trench.04-23-2009
20090101908Liquid crystal display device and method of fabricating the same - A method of fabricating an LCD device includes forming a gate line, a gate electrode, a gate pad electrode at an end of the gate line, and a common line on a substrate; forming a gate insulating layer on the gate electrode; forming an active layer on the gate insulating layer; forming an etch stopper on the active layer; forming first and second ohmic contact layers spaced apart from each other on the active layer and an impurity-doped amorphous silicon pattern contacting the gate insulating layer therebelow, outer sides of the first and second ohmic contact layers being outside the active layer; forming a data line crossing the gate line to define a pixel region, a data pad electrode at an end of the data line, and source and drain electrodes on the first and second ohmic contact layers, respectively; forming a pixel electrode and a common electrode in the pixel region to induce an in-plane electric field; and forming a gate pad terminal electrode on the gate pad electrode. At least one of the data line, the pixel electrode and the common electrode contacts the impurity-doped amorphous silicon pattern therebelow.04-23-2009
20090101906SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A first resist pattern is formed by exposure using a first multi-tone photomask, and a first conductive layer, a first insulating layer, a first semiconductor layer, and a second semiconductor layer are etched, so that an island-shaped single layer and an island-shaped stack are formed. Here, sidewalls are formed on side surfaces of the island-shaped single layer and the island-shaped stack. Further, a second resist pattern is formed by exposure using a second multi-tone photomask, and a second conductive layer and the second semiconductor layer are etched, so that a thin film transistor, a pixel electrode, and a connection terminal are formed. After that, a third resist pattern is formed by exposure from a rear side using metal layers of the first conductive layer and the second conductive layer as masks, and the third insulating layer are etched, so that a protective insulating layer is formed.04-23-2009
20090101905DISPLAY UNIT AND METHOD OF MANUFACTURING THE SAME - A display unit includes, on an insulating substrate, a plurality of wirings formed to extend in different directions, a thin-film transistor, and a display element. At least one of the plurality of wirings is a divided wiring having a crossing portion formed at an intersection with the other of the plurality of wirings, and a main portion which is formed in a layer same as the other of the plurality of wirings with an insulating film in between and which is electrically connected to the crossing portion via an conductive connection provided in the insulating film. At least one of the main portion and the crossing portion includes a first layer and a second layer stacked in order from the insulating substrate side, the second layer being in direct contact with the first layer and made of a material of a higher melting point than the first layer.04-23-2009
20090101902Display device and method of manufacturing the same - A substrate comprising a thin-film-transistor (TFT) region, a pixel region, a gate-line region and a data-line region is provided. A transparent conductive layer and a first metal layer are orderly formed on the substrate. A conductive stack layer is formed within each of the TFT/pixel/gate-line regions and the end of the data-line region. Next, a first insulating layer and a semiconductor layer are orderly formed, and a patterned first insulating layer and a patterned semiconductor layer are formed above the conductive stack layer within the TFT region. Then, a second metal layer and a first photoresist layer are respectively formed. Afterwards, the second and the first metal layers are patterned by using the first photoresist layer as a photomask. Finally, the first photoresist layer is reflowed by heat, and part of the reflowed first photoresist layer covers a channel formed within the TFT region.04-23-2009
20110220899ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display device having high transmittance with respect to external light and a method of manufacturing the same. The organic light emitting display device includes a substrate; a plurality of pixels formed on the substrate, each of the pixels including a first region that emits light and a second region that transmits external light; a plurality of thin film transistors disposed in the first region of each pixel; a plurality of first electrodes disposed in the first region of each pixel and electrically connected to the thin film transistors, respectively; a second electrode formed opposite to the plurality of first electrodes and comprising a plurality of transmission windows corresponding to the second regions; and an organic layer formed between the first electrodes and the second electrode. The transmission windows can be formed in the second electrode, that is, a cathode.09-15-2011
20110227085SUBSTRATE FOR USE IN DISPLAY PANEL, AND DISPLAY PANEL INCLUDING SAME - The present invention is a substrate for use in a display panel. According to the substrate, lines (09-22-2011
20110227084METHOD OF MANUFACTURING A FLEXIBLE ELECTRONIC DEVICE AND FLEXIBLE DEVICE - An electrical element, such as a thin-film transistor, is defined on a flexible substrate, in that the substrate is attached to a carrier by an adhesive layer, and is delaminated after definition of the transistor. This is for instance due to illumination by UV-radiation. An opaque coating is provided to protect any semiconductor material. A heat treatment is preferably given before application of the layers of the transistor to reduce stress in the adhesive layer.09-22-2011
20110227083Manufacturing method of liquid crystal display device - The present invention provides a liquid crystal display device having a large holding capacitance in the inside of a pixel. A liquid crystal display device includes a first substrate, a second substrate arranged to face the first substrate in an opposed manner, and liquid crystal sandwiched between the first substrate and the second substrate. The first substrate includes a video signal line, a pixel electrode, a thin film transistor having a first electrode thereof connected to the video signal line and a second electrode thereof connected to the pixel electrode, a first silicon nitride film formed above the second electrode, an organic insulation film formed above the first silicon nitride film, a capacitance electrode formed above the organic insulation film, and a second silicon nitride film formed above the capacitance electrode and below the pixel electrode. The second silicon nitride film is a film which is formed at a temperature lower than a forming temperature of the first silicon nitride film. The first silicon nitride film and the second silicon nitride film form a contact hole therein by etching both of the first silicon nitride film and the second silicon nitride film collectively by dry etching. The second electrode and the pixel electrode are connected to each other via the contact hole. A potential different from a potential applied to the pixel electrode is applied to the capacitance electrode, and a holding capacitance is formed by the pixel electrode, the second silicon nitride film and the capacitance electrode.09-22-2011
20090152553THIN-FILM TRANSISTOR, SUBSTRATE AND DISPLAY DEVICE EACH HAVING THE THIN-FILM TRANSISTOR, AND METHOD OF MANUFACTURING THE THIN-FILM TRANSISTOR - A thin-film transistor (TFT) includes a gate electrode, a semiconductor pattern, a source electrode, and a drain electrode. The semiconductor pattern includes an active layer being overlapped with the gate electrode and a low band gap portion having a lower energy band gap than the active layer. The source and drain electrodes are spaced apart from each other to be overlapped with the semiconductor pattern. Therefore, the semiconductor pattern includes a low band gap portion having a lower energy band gap than the active layer, so that electron mobility may be increased in a channel formed along the low band gap portion so that electric characteristics of the TFT may be enhanced.06-18-2009
20120104401LIGHT-EMITTING DEVICE AND ELECTRONIC APPARATUS - A light-emitting device includes a drive transistor for controlling the quantity of current supplied to a light-emitting element, a capacitor element electrically connected to a gate electrode of the drive transistor, and an electrical continuity portion for electrically connecting the drive transistor and the light-emitting element, these elements being disposed on a substrate. The electrical continuity portion is disposed on the side opposite to the capacitor element with the drive transistor disposed therebetween.05-03-2012
20120104399ARRAY SUBSTRATE FOR ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A method of fabricating an array substrate for an organic electroluminescent display device includes forming a semiconductor layer, a semiconductor dummy pattern, a first storage electrode and a first gate insulating layer on a substrate; forming a second gate insulating layer on the semiconductor layer and the first storage electrode; forming a gate electrode and a second storage electrode on the second gate insulating layer; forming ohmic contact layers by doping impurities into both sides of the semiconductor layer; forming an inter insulating layer on the gate electrode and the second storage electrode; forming source and drain electrodes and a third storage electrode on the inter insulating layer; forming a passivation layer on the source and drain electrodes and the third storage electrode; forming a first electrode and a fourth storage electrode on the passivation layer; and forming a spacer and a bank on the first electrode.05-03-2012
20120104398TFT-LCD, DRIVING DEVICE AND MANUFACTURING METHOD THEREOF - An embodiment of the disclosed technology provides a driving device for a thin film transistor liquid crystal display (TFT-LCD) and a method for manufacturing the same. The driving device comprises at least one first TFT and at least one second TFT formed a base substrate, wherein load of the first TFT is larger than load of the second TFT, the first TFT is of a top-gate configuration, and the second TFT is of a bottom-gate configuration.05-03-2012
20120104397ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided are an organic light emitting display device and a method of manufacturing the same. The organic light emitting display device includes a thin-film transistor (TFT), which includes an active layer, a gate electrode, and source/drain electrodes; an organic electroluminescent device electrically connected to the TFT and includes a pixel electrode formed on the same layer as the gate electrode, an intermediate layer including an organic light emitting layer, and a counter electrode that are stacked in the order stated; and a capacitor, which includes a bottom electrode, which is formed on the same layer and of the same material as the active layer and is doped with an impurity; a top electrode formed on the same layer as the gate electrode; and a metal diffusion medium layer formed on the same layer as the source/drain electrodes and is connected to the bottom electrode.05-03-2012
20120104396Organic Light Emitting Display Apparatus and Method of Manufacturing the Same - An organic light emitting display apparatus comprises an active layer, a gate electrode, a pixel electrode, source and drain electrodes, an intermediate layer, and an opposite electrode. The gate electrode includes: a first insulating layer; first, second and third conductive layers; a fourth conductive layer protecting the third conductive layer; and a fifth conductive layer. The pixel electrode includes a first electrode layer formed on the first insulating layer, a second and a third electrode layer, a fourth electrode layer protecting the third electrode layer, and a fifth electrode layer. A second insulating layer is disposed between the source and drain electrodes. The intermediate layer is disposed between the opposite electrode and the pixel electrode, and prevents damage to the pixel electrode during the manufacturing process.05-03-2012
20120104395ORGANINC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display device and method of manufacturing the same are provided. The organic light emitting display device includes: a thin film transistor (TFT) comprising an active layer, a gate electrode, a source electrode, and a drain electrode; an organic light emitting device including a pixel electrode electrically connected to the TFT and formed of the same material and on a same layer as the gate electrode, an emission layer, and an opposing electrode; and a pad electrode formed of the same material and on same layer as the gate electrode. The pad electrode has openings formed therein.05-03-2012
20120104394DISPLAY DEVICE - A display device in which various embodiments can prevent a vertically-striped blur is disclosed. In one aspect, the display device includes first gate lines, second gate lines, data lines, dummy data lines, and a plurality of pixels. The first and second gate lines are extended in a first direction. The data lines and the dummy data lines are extended in a second direction intersecting the first direction. The pixels are defined by the intersection of a first gate line of the first gate lines and a first data line of the data lines.05-03-2012
20120104393Organic light emitting diode display device and manufacturing method thereof - An OLED display includes a first polysilicon layer pattern on a substrate having a first gate electrode, a second gate electrode, and a first capacitor electrode, a gate insulating layer pattern, a second polysilicon layer pattern including a first active layer, a second active layer, and a capacitor polycrystalline dummy layer, a third amorphous silicon layer pattern including first source and drain resistant contact layers on a predetermined region of the first active layer, second source and drain resistant contact layers on a predetermined region of the second active layer, and a capacitor amorphous dummy layer on the capacitor polycrystalline dummy layer, and a data metal layer pattern including first source/drain electrodes, second source/drain electrodes, and a second capacitor electrode.05-03-2012
20120104392THIN FILM TRANSISTOR ARRAY PANEL AND THE METHOD FOR MANUFACTURING THEREOF - Provided is a thin film transistor array panel that includes: a substrate; a gate line and a data line formed on the substrate and at least partially defining a pixel area; a thin film transistor connected to the gate line and the data line; a pixel electrode connected to the thin film transistor and formed in the pixel area; a first common electrode formed under the pixel electrode; a second common electrode formed on the pixel electrode. The pixel area includes an upper pixel area and a lower pixel area, the first common electrode is formed in the upper pixel area, and the second common electrode is formed in the lower pixel area. The pixel electrode includes an upper pixel electrode formed in the upper pixel area and a lower pixel electrode formed in the lower pixel area.05-03-2012
20120104391TRANSISTOR ARRAY SUBSTRATE - A transistor array substrate includes a substrate, a pixel array, a plurality of resistors, and a plurality of semiconductor transistors. The pixel array, the resistors, and the semiconductor transistors are all disposed on the substrate. The pixel array includes a plurality of scan lines. Each resistor is electrically connected to one of the scan lines, and each semiconductor transistor is electrically connected to one of the scan lines and one of the resistors. The scan lines can receive a first voltage and a second voltage. The second voltage is higher than the first voltage.05-03-2012
20090200554DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The display device includes a substrate, a thin film transistor (TFT), which includes a gate electrode, a semiconductor layer, and source and drain electrodes, on the substrate member, a passivation layer on the TFT and having an opening to expose a portion of the drain electrode, and a pixel electrode directly on the drain electrode and only within the opening.08-13-2009
20110227079THIN FILM TRANSISTOR, DISPLAY DEVICE THEREOF, AND MANUFACTURING METHOD THEREOF - A thin film transistor including: an active layer formed on a substrate; a gate insulating layer pattern formed on a predetermined region of the active layer; a gate electrode formed on a predetermined region of the gate insulating layer pattern; an etching preventing layer pattern covering the gate insulating layer pattern and the gate electrode; and a source member and a drain member formed on the active layer and the etching preventing layer pattern.09-22-2011
20090212291Transparent Thin Film Transistor and Image Display Unit - An embodiment of the present invention is an transparent thin film transistor which has an substantially transparent substrate, a gate line made of a thin film of a substantially transparent conductive material, a substantially transparent gate insulating film, a substantially transparent semiconductor active layer, a source line made of a thin film of a metal material and a drain electrode made of a thin film of a substantially transparent conductive material. In addition, the source line and the drain electrode are formed apart from each other and sandwich the substantially transparent semiconductor active layer. Moreover, at least any one of the thin film of the gate line and the thin film of the source line is stacked with a thin film of a metal material.08-27-2009
20090212290DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel includes; a lower gate line, a lower data line disposed substantially perpendicular to the lower gate line, a thin film transistor (“TFT”) connected to the lower gate line and the lower data line, an insulating layer disposed on the lower gate line, the lower data line, and the TFT and having a plurality of trenches exposing the lower gate line and the lower data line, an upper gate line disposed in the trench on the lower gate line, an upper data line disposed in the trench on the lower data line, and a pixel electrode connected to the TFT.08-27-2009
20090242883Thin film transistor, active array substrate and method for manufacturing the same - A thin film transistor, an active array substrate having the same and methods for manufacturing the same are provided. The thin film transistor includes a base having a concave; a gate disposed in the concave; a gate insulator covering the gate and a portion of the gate insulator is in the concave; a channel layer disposed on the gate insulator; and a source and a drain are disposed on the channel layer and located in response to two sides of the gate.10-01-2009
20090242885MANUFACTURING PROCESS OF LIQUID CRYSTAL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE - A manufacturing process of an LCD de vice of the invention includes forming a first substrate provided with a pixel part with thin film transistors and a seal portion arranged around the pixel part, forming a second substrate opposed to the first substrate, filling a liquid crystal layer between the first substrate and the second substrate, and adhering the first substrate to the second substrate with a sealant provided for the seal portion, wherein the forming the first substrate includes forming a semiconductor layer composing the thin film transistor, forming in the seal portion a semiconductor connection layer made of a same material as the semiconductor layer, and forming an organic interlayer insulating film, wherein the forming the semiconductor layer and the forming the semiconductor connection layer are performed in the same step.10-01-2009
20090095957Display device and method of manufacturing display device - To provide a display device, including a polysilicon thin film transistor, which achieves a reduction of an off current with a simple configuration and with only a slight increase in a number of processes. A display device includes: an insulating substrate, and a thin film transistor formed on the insulating substrate, wherein a semiconductor layer of the thin film transistor has a polysilicon layer, a first amorphous silicon layer formed above the polysilicon layer, and a second amorphous silicon layer formed above the first amorphous silicon layer.04-16-2009
20110140116THIN FILM TRANSISTOR, DISPLAY DEVICE, AND ELECTRONIC DEVICE - The present invention provides a thin film transistor using an oxide semiconductor as a channel, controlling threshold voltage to a positive direction, and realizing improved reliability. The thin film transistor includes: a gate electrode; a pair of source/drain electrodes; an oxide semiconductor layer provided between the gate electrode and the pair of source/drain electrodes and forming a channel; a first insulating film as a gate insulating film provided on the gate electrode side of the oxide semiconductor layer; and a second insulating film provided on the pair of source/drain electrodes side of the oxide semiconductor layer. The first insulating film and/or the second insulating film contain/contains fluorine.06-16-2011
20110140115ORGANIC LIGHT-EMITTING DISPLAY AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display (OLED) device is disclosed. The OLED device includes a thin-film transistor (TFT), which includes a gate electrode; an active layer insulated from the gate electrode; source and drain electrodes insulated from the gate electrode and contacting the active layer; and an insulation layer interposed between the source and drain electrodes and the active layer; and an organic light-emitting element electrically connected to the TFT, wherein the insulation layer includes a first insulation sub-layer contacting the active layer; and a second insulation sub-layer formed on the first insulation sub-layer.06-16-2011
20090242888Display Device and Method for Manufacturing the Same - In a pixel portion, a scan signal line and an auxiliary capacitor line are formed using a second conductive film, and a data signal line is formed using a first conductive film. In a TFT portion, a gate electrode is formed using the first conductive film and electrically connected to the scan signal line formed using the second conductive film through an opening in a gate insulating film. Further, a source electrode and a drain electrode are formed using the second conductive film. In the auxiliary capacitor portion, the auxiliary capacitor line formed using the second conductive film serves as a lower electrode, the pixel electrode serves as an upper electrode, and the passivation film used as a dielectric film is interposed between the capacitor electrodes.10-01-2009
20090256151DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate comprises a substrate; a source electrode arranged on the substrate; a drain electrode arranged on the substrate and spaced from the source electrode; a semiconductor layer arranged on the source electrode and the drain electrode; an insulating layer arranged on the semiconductor layer; and a gate electrode arranged on the insulating layer, wherein the semiconductor layer comprises: a first ohmic contact region that overlays an upper surface and a side surface of the source electrode; a second ohmic contact region that overlays an upper surface and a side surface of the drain electrode; and a channel region that is spaced from the source and drain electrodes and interconnects the first ohmic contact region and the second ohmic contact region.10-15-2009
20090256153THIN FILM TRANSISTOR MATRIX DEVICE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a thin film transistor matrix device which includes forming a transparent insulating substrate, arranging a plurality of thin film transistors on the substrate in a matrix, arranging a plurality of picture element electrodes on the substrate in a matrix and connecting the picture element electrodes to sources of the thin film transistors. The method also includes forming a plurality of bus lines for commonly connecting gates or drains of the thin film transistors, forming a plurality of bus line terminals on the ends of the bus lines, respectively, with each bus line terminal being provided for each bus line, and forming one connection line on the substrate in a region outer of plurality of the bus line terminals and commonly connecting the plurality of bus lines. The method further includes the step of electrically disconnecting the bus lines from the connection line by laser melting.10-15-2009
20090256152PIXEL STRUCTURE FOR TRANSFLECTIVE LCD PANEL - A pixel structure for a transflective LCD having a transparent region and a reflective region is provided. The pixel structure includes a transparent substrate, a TFT, at least one reflective structure, a passivation layer, a pixel electrode and a reflective layer. The TFT is disposed in a reflective region of the transparent substrate. The reflective structure is configured at one side of the TFT, and located in the reflective region of the transparent substrate. The passivation layer is disposed over the transparent substrate and covers the TFT and the reflective structure. The pixel electrode is disposed above the TFT and the reflective structure, and is at least located in a transparent region. The pixel electrode is electrically connected to the TFT. The reflective layer is disposed above the TFT and the reflective structure, and is located in the reflective region.10-15-2009
20120193629ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - An array substrate and method for manufacturing the same is provided, wherein a data line is composed of first and second segments connected by a contact pad. First and second insulation layers are disposed between the first segment of the data line and a shielding electrode. In addition, the first insulation layer is disposed between the second segment of the data line and a gate line in their overlapping area. Accordingly, the coupling effect between the conductive layers can be reduced. For example, the RC delay problem due to parasitic capacitance between the shielding electrode and the data line is solved. As a result of the design of the two insulator layers between the first segment of the data line and the shielding electrode, the shorting between the conductive layers can also be simultaneously solved and the product yield can be increased.08-02-2012
20120193627Organic Light-emitting Display Apparatus - An organic light-emitting display apparatus with improved electric properties comprises: a substrate; an insulation layer which is formed on the substrate, and which includes a penetration hole; a first electrode which is formed on the insulation layer; an intermediate layer which is formed on the first electrode, and which includes an organic light-emitting layer; a second electrode which is formed on the intermediate layer; and a fixing member which is formed in the penetration hole, and which contacts the first electrode.08-02-2012
20100264418CONTROL SUBSTRATE AND CONTROL SUBSTRATE MANUFACTURING METHOD - A control substrate comprising: 10-21-2010
20110127532ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a liquid crystal display device includes a gate line on a substrate; a gate electrode connected to the gate line; a gate insulating layer on the gate line and the gate electrode and including a gate opening; an active layer on the gate insulating layer and overlapping the gate electrode; an ohmic contact layer on the active layer; a source electrode on the ohmic contact layer; a drain electrode on the ohmic contact layer and spaced apart from the source electrode, wherein one end of the drain electrode is disposed in the gate opening; a data line on the gate insulating layer and connected to the source electrode, the data line crossing the gate line; a passivation layer on the data line and the source and drain electrodes and including a pixel opening, wherein the pixel opening exposes the drain electrode in the gate opening and a portion of the gate insulating layer; and a pixel electrode on the gate insulating layer and in the pixel opening, the pixel electrode contacting the one end of the drain electrode in the gate opening.06-02-2011
20100155734ELECTROPHORETIC DISPLAY DEVICE AND METHOD OF MANUFACTURING AND REPAIRING THE SAME - Provided is an electrophoretic display device and a method of manufacturing and repairing the electrophoretic display device. The electrophoretic display device includes: a gate line, a gate electrode, and a common electrode, separated a predetermined distance from the gate line, which are formed on a substrate; a gate insulation layer formed on an overall surface of the substrate including the gate line; a data line configured to define a pixel area by crossing the gate line; a source electrode configured to extend from the data line; a drain electrode separated from a predetermined distance from the source electrode; a protection layer formed on an overall surface of the substrate including the data line, the source electrode, and the drain electrode; a pixel electrode formed on the protection layer and connected to the drain electrode; an electrophoretic film formed on the substrate including the pixel electrode; a common line formed on a boundary portion between the pixel areas and configured to connect the common electrodes formed in the respective pixel areas; and a repair hole formed by removing the protection layer corresponding to the common line to expose the gate insulation layer.06-24-2010
20100148178THIN FILM TRANSISTOR AND DISPLAY DEVICE - A thin film transistor includes: a gate electrode layer; a first semiconductor layer; a second semiconductor layer having lower carrier mobility than the first semiconductor layer, which is provided over and in contact with the first semiconductor layer; a gate insulating layer which is provided between and in contact with the gate electrode layer and the first semiconductor layer; first impurity semiconductor layers which are provided so as to be in contact with the second semiconductor layer; second impurity semiconductor layers which are provided so as to be partially in contact with the first impurity semiconductor layers and the first and second semiconductor layers; and source and drain electrode layers which are provided so as to be in contact with entire surfaces of the second impurity semiconductor layers, in which an entire surface of the first semiconductor layer on the gate electrode layer side overlaps with the gate electrode layer.06-17-2010
20100163876REFLECTIVE TFT SUBSTRATE AND METHOD FOR MANUFACTURING REFLECTIVE TFT SUBSTRATE - A reflective TFT substrate which can be operated for a prolonged period of time due to the presence of a protective insulating film, is free from occurrence of crosstalk, and is capable of significantly reducing manufacturing cost by decreasing the production steps in the production process. A reflective TFT substrate 07-01-2010
20100171120DISPLAY AND METHOD FOR MANUFACTURING DISPLAY - In the case of forming switching elements and light sensor elements over the same substrate, an increase in the film thickness of active layers in an attempt to enhance the sensitivity of the light sensor elements would adversely affect the characteristics of the switching elements (TFTs). In a configuration of a display in which a channel layer 07-08-2010
20100148180THIN FILM TRANSISTOR ARRAY PANEL WITH COMMON BARS OF DIFFERENT WIDTHS - A gate wire and a storage electrode wire extending in a transverse direction are provided, and a data wire extending in a longitudinal direction intersects the gate wire and the storage electrode wire. A plurality of pixel electrodes and a plurality of TFTs are provided on pixel areas defined by the intersections of the data wire and the gate wire. The storage electrode wire is interconnected by a plurality of storage electrodes connections provided on the pixel areas. In this way, a common bar disposed between gate pads and a display area is omitted or has reduced width. Therefore, the fan-out areas becomes to have sufficient size to reduce the resistance difference between the signal lines.06-17-2010
20100148179Semiconductor Device and Method of Manufacturing the Same - A semiconductor device having a semiconductor element (a thin film transistor, a thin film diode, a photoelectric conversion element of silicon PIN junction, or a silicon resistor element) which is light-weight, flexible (bendable), and thin as a whole is provided as well as a method of manufacturing the semiconductor device. In the present invention, the element is not formed on a plastic film. Instead, a flat board such as a substrate is used as a form, the space between the substrate (third substrate (06-17-2010
20100148176THIN FILM TRANSISTOR DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - The present invention relates to a thin film transistor array panel that includes an organic layer formed on a data line and a drain electrode disposed on a color filter. A thickness of a portion of the organic layer around a contact hole exposing a portion of the drain electrode is similar to a thickness of a portion of the organic layer around a contact hole exposing a portion of the data line. Having approximately the same thickness can prevent non-uniform etching of the organic layer around contact holes and deterioration of the thin film transistor array panel.06-17-2010
20110227086ELECTRONIC DEVICES HAVING PLASTIC SUBSTRATES - A method of manufacturing a thin film electronic device comprises applying a first plastic coating (PI-09-22-2011
20100155732Semiconductor Device and Manufacturing Method Thereof - It is an object of the present invention to provide a manufacturing method of semiconductor device whereby the number of processes is decreased due to simultaneously forming a contact hole in a lamination film of different material and film thickness (inorganic insulating film and organic resin film) by conducting etching once. By setting the selective ratio of dry etching (etching rate of organic resin film 503/etching rate of inorganic insulating film 502 containing nitrogen) from 1.6 to 2.9, preferably 1.9, the shape and the size of the contact holes to be formed even in a film of different material and film thickness can be nearly the same in both of the contact holes.06-24-2010
20100155730THIN FILM TRANSISTOR DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - In the manufacturing process of the thin film transistor array panel according to an exemplary embodiment of the present invention using three masks, the metal oxide semiconductor or the transparent conductive oxide is used, thereby executing an efficient lift-off process.06-24-2010
20100187534SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - An object of the present invention to provide a semiconductor device manufactured in short time by performing the step of forming the thin film transistor and the step of forming the photoelectric conversion layer in parallel, and to provide a manufacturing process thereof. According to the present invention, a semiconductor device is manufactured in such a way that a thin film transistor is formed over a first substrate, a photoelectric conversion element is formed over a second substrate, and the thin film transistor and the photoelectric conversion element are connected electrically by sandwiching a conductive layer between the first and second substrates opposed to each other so that the thin film transistor and the photoelectric conversion element are located between the first and second substrates. Thus, a method for manufacturing a semiconductor device which suppresses the increase in the number of steps and which increases the throughput can be provided.07-29-2010
20100258803THIN FILM ACTIVE ELEMENT GROUP, THIN FILM ACTIVE ELEMENT ARRAY, ORGANIC LIGHT EMITTING DEVICE, DISPLAY APPARATUS, AND THIN FILM ACTIVE ELEMENT MANUFACTURING METHOD - The objective is to achieve an organic thin film transistor group that can be manufactured more easily and at a lower cost. Provided is a thin film active element group comprising a drive active element having a semiconductor channel layer formed in a channel region between a source electrode and a drain electrode; and a switch active element having a semiconductor channel layer formed in a channel region between a source electrode and a drain electrode, the switch active element switching the drive active element. The drive active element and the switch active element are formed to be separated from each other in a direction of a channel width such that a straight line associated with the channel region of the drive active element and a straight line associated with the channel region of the switch active element are parallel to each other. The channel region of the drive active element and the channel region of the switch active element may be aligned linearly with each other in the direction of the channel width.10-14-2010
20130214279CIRCUIT BOARD AND DISPLAY DEVICE - A source and drain electrode layer (08-22-2013
20100193792LAMINATED FILM MANUFACTURING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SEMICONDUCTOR DEVICE AND DISPLAY DEVICE - A production method for a semiconductor film according to the present invention includes: step (a) of forming a first film 08-05-2010
20100193791Organic light emitting diode display device and method of fabricating the same - An OLED display device includes a substrate, a TFT on the substrate, the TFT including a semiconductor layer, a gate electrode, and source and drain electrodes, a first electrode electrically connected to one of the source and drain electrodes, a pixel defining layer on the substrate, the pixel defining layer exposing the first electrode and having a reversed trapezoidal shape, an emitting layer on the exposed first electrode, and a second electrode on the emitting layer.08-05-2010
20090078938ELECTROPHORETIC DISPLAY DEVICE AND METHOD FOR MANUFACTURING THEREOF - It is an object to provide an electrophoretic display device having a thin film transistor which has highly reliable electric characteristics, lightweight, and flexibility. A gate insulating film is formed over a gate electrode, a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film, a buffer layer is formed over the microcrystalline semiconductor film, a pair of source and drain regions are formed over the buffer layer, a pair of the source and drain electrodes in contact with the source and drain regions are formed. Then, the inverted-staggered thin film transistor is interposed between the flexible substrates, and the thin film transistor is provided with electrophoretic display element which is electrically connected by the pixel electrode. Then, the electrophoretic display electrode is surrounded by the partition layer so as to cover the end portion of the pixel electrode and provided over the pixel electrode.03-26-2009
20100187533THIN FILM TRANSISTOR ARRAY PANEL FOR A LIQUID CRYSTAL DISPLAY - A plurality of gate lines formed on an insulating substrate, each gate line including a pad for connection to an external device; a plurality of data lines intersecting the gate lines and insulated from the gate lines, each data line including a pad for connection to an external device; and a conductor overlapping at least one of the gate lines and the data lines are included. An overlapping distance of the gate lines or the data lines and a width of the conductor decreases as the length of the gate lines or the data lines increases. Accordingly, the difference in the RC delays due to the difference of the length of the signal lines is compensated to be reduced.07-29-2010
20100258804BACKPLANE STRUCTURES FOR ELECTRONIC DEVICES - There is provided a backplane for an organic electronic device including a TFT substrate having a base substrate, a polysilicon layer, a gate dielectric layer, a gate electrode, an interlayer dielectric, and a data electrode; an insulating layer over the TFT substrate; a multiplicity of first openings in the insulating layer having a depth d10-14-2010
20110042675Display device and manufacturing method thereof - An etching resist including first and second portions, the first portion being thicker than the second portion, is formed on a metallic layer. Through the etching resist, a semiconductor layer and the metallic layer are patterned by etching so as to form a wiring from the metallic layer and leave the semiconductor layer under the wiring. An electrical test is conducted on the wiring. The second portion is removed while the first portion is left unremoved. Selective etching is performed through the first portion so as to leave the semiconductor layer unetched to pattern the wiring to be divided into drain and source electrodes. A substrate is cut. In patterning the wiring, the wiring is etched to be cut at a position closer to a cutting line of the substrate with respect to the drain and source electrodes, while leaving the semiconductor layer unetched.02-24-2011
20120241747SHIFT REGISTER AND DISPLAY APPARATUS - The present invention provides a shift register and a display device, each of which operates stably. The present invention relate to a shift register, comprising a thin-film transistor which includes a source electrode, a drain electrode, and a gate electrode, the thin-film transistor being a bottom gate thin-film transistor which includes a comb-shaped source/drain structure, the gate electrode being provided with at least one of a cut and an opening in at least one of a region overlapping with the source electrode and a region overlapping with the drain electrode.09-27-2012
20100193794ORGANIC LIGHT EMITTING DISPLAY DEVICE - An organic light emitting display device (OLED) including: a substrate including a plurality of pixel units; first electrodes disposed in the pixel units; first subsidiary electrodes completely covering the top surfaces of corresponding ones of the first electrodes; first electrode protection units disposed on edges of the first electrodes on which the first subsidiary electrodes are not disposed; a pixel defining layer disposed on the substrate, having holes to expose the first electrodes; a light emission layer; and a second electrode disposed on the light emission layer. The light emission layer includes organic emission layers (EMLs) disposed on the first electrodes. The light emission layer may include subsidiary hole injection layers disposed on selected ones of the first electrodes, to vary a distance between the first electrodes and portions of the second electrode.08-05-2010
20100181572THIN FILM TRANSISTOR ARRAY PANEL - A data line and an amorphous silicon pattern are formed on a substrate. The first electrode pattern is extended from the data line and overlaps an edge of the amorphous silicon pattern. The second electrode pattern is made of the same metal as the first electrode pattern and overlaps the edge of the amorphous silicon pattern at an opposite side of the first electrode pattern. Edges of the first and the second electrode patterns are sharply formed so that a tunneling effect easily occurs through the amorphous silicon pattern. An indium-tin-oxide pattern for a capacitor is formed at the end of the second electrode pattern. The capacitor is formed between the ITO pattern and a common electrode.07-22-2010
20100176400Display device and electronic apparatus - A display device includes: a pixel array unit having pixels including a circuit configuration, in which a first electrode of an electro-optical element and a source electrode of a driving transistor are connected together, a gate electrode of the driving transistor and a source electrode or a drain electrode of a writing transistor are connected together, a holding capacitor is connected between the gate electrode and the source electrode of the driving transistor, and an auxiliary capacitor is connected between the first electrode and a second electrode of the electro-optical element, disposed on a substrate in a matrix shape, wherein, from one pixel of adjacent pixels to an area of the other pixel, the auxiliary capacitor of the one pixel is set to be disposed, and an electrode of the auxiliary capacitor that is disposed on the electro-optical element side is conductive with the second electrode of the electro-optical element.07-15-2010
20100176401X-RAY DETECTOR AND MANUFACTURING METHOD OF THE SAME - An X-ray detector includes a gate wire formed on a substrate, the gate wire including a gate line, a gate electrode, and a gate pad, a gate insulating layer formed on the gate wire, a data wire formed on the gate insulating layer, the data wire including a data line intersecting the gate line, a source electrode, a drain electrode, and a data pad, a lower storage electrode formed on the gate insulating layer, the lower storage electrode comprising an opaque conductor material, and an upper storage electrode formed on the lower storage electrode, the upper storage electrode connected to the source electrode.07-15-2010
20110175098LIGHT EMITTING ELEMENT AND DISPLAY DEVICE - A light emitting element includes: a first electrode and a second electrode provided as being opposed each other, at least one of the first electrode and the second electrode being transparent or translucent; and a phosphor layer sandwiched between the first electrode and the second electrode, from a direction that is perpendicular to main surfaces of the first and second electrodes. In this structure, the phosphor layer includes: a plurality of phosphor particles that are disposed within a plane of the phosphor layer; and a first and second insulating guides that sandwich two sides of each of the phosphor particles from a direction that is in parallel with the surface of the phosphor layer.07-21-2011
20110175096DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a display device including a gate electrode film, a first electrode film, a second electrode film, and a conductive film connected to the first electrode film and formed of a conductive layer including a first conductive layer and a second conductive layer formed overlapping the first conductive layer. The method includes the steps of forming the first electrode film and the second electrode film, forming the conductive layer such that the conductive layer is connected to the first electrode film and the second electrode film, and forming the conductive film by removing regions other than predetermined regions of the conductive layer, wherein the conductive layer forming step includes the steps of forming the first conductive layer on the respective upper surfaces of the first electrode film and the second electrode film and forming the second conductive layer on the upper surface of the first conductive layer.07-21-2011
20100155733ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - An array substrate for a display device and its fabrication method are disclosed. The array substrate for a display device includes: a gate wiring and a gate electrode connected to the wiring formed on a substrate; a gate insulating layer formed on the gate electrode; an active layer and a barrier metal layer stacked with the gate insulating layer interposed therebetween on the gate electrode; a data wiring formed on the barrier metal layer and source and electrodes connected to the data wiring; a passivation film formed on the source and drain electrodes and the data wiring and having a contact hole exposing a portion of the drain electrode, the barrier metal layer and the active layer; and a pixel electrode formed on the passivation film and being in contact with the drain electrode and the barrier metal layer including the active layer.06-24-2010
20100230682ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - The present invention provides an array substrate comprising: a substrate, having a thin film transistor (TFT) formed thereupon, the TFT having a gate electrode, a source electrode and a drain electrode; a first metal layer, formed on the substrate, and comprising a gate line and the gate electrode of the TFT; a first insulating layer, covering the first metal layer and the substrate; a semiconductor layer, an ohmic contact layer, and a second metal layer, which are sequentially formed on the first insulating layer; a second insulating layer, covering the semiconductor layer, the ohmic contact layer, and the second metal layer; a pixel electrode, provided on the second insulating layer and is connected to the drain electrode. The second metal layer further comprises an etch-blocking pattern in the peripheral area of the pixel electrode within the overlapping region between the pixel electrode and the first metal layer.09-16-2010
20100224880SEMICONDUCTOR DEVICE - It is an object to provide a semiconductor device with low wiring resistance, high transmittance, or a high aperture ratio. A gate electrode, a semiconductor layer, and a source electrode and a drain electrode are formed using a material having a light-transmitting property and a wiring such as a gate wiring or a source wiring is formed using a material whose resistivity is lower than that of the material having a light-transmitting property. Alternatively, the source wiring and/or the gate wiring are/is formed by a stack of a material having a light-transmitting property and a material whose resistivity is lower than that of the material having a light-transmitting property.09-09-2010
20100276692Thin Film Transistor, Method For Manufacturing The Same And Display Using The Same - One embodiment of the present invention is a thin film transistor having a gate electrode formed on an insulating substrate, a gate wire connected to the gate electrode, a capacitor electrode, a capacitor wire connected to the capacitor electrode, a gate insulator formed on the gate electrode, an oxide semiconductor pattern formed on the gate insulator, a sealing layer formed on the oxide semiconductor pattern, a drain electrode and a source electrode formed on the sealing layer, a drain wire connected to the drain electrode and a pixel electrode connected to the source electrode, the drain wire and the pixel electrode being in the same layer as the drain electrode and the source electrode. wherein the gate wire, the capacitor electrode and the capacitor wire are in the same layer as the gate electrode, and wherein the sealing layer does not cover a connection part of the source electrode and a connection part of the drain electrode and wherein the drain electrode and the source electrode are connected to the oxide semiconductor pattern via the connection part of the drain electrode and the connection part of the source electrode,11-04-2010
20100213463THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array substrate and a method for manufacturing the thin film transistor array substrate are disclosed. Specifically, a thin film transistor array may be formed using a reduced number of masks.08-26-2010
20100213464ACTIVE MATRIX ARRAY STRUCTURE - An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.08-26-2010
20110210332SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - It is an object to provide a display device of which image display can be favorably recognized. Another object is to provide a manufacturing method of the display device with high productivity. Over a substrate, a pixel electrode that reflects incident light through a liquid crystal layer, a light-transmitting pixel electrode, and a structure whose side surface is covered with a reflective layer and which is positioned to overlap with the light-transmitting pixel electrode are provided. The structure is formed over a light-transmitting etching-stop layer, and the etching-stop layer remains below the structure as a light-transmitting layer.09-01-2011
20100237348Thin Film Transistor Array Substrate - A thin film transistor (TFT) array substrate includes a stack structure disposed to raise an extended electrode of a drain electrode of a thin film transistor. Therefore, a contact hole does need to be very deep to expose the extended electrode of the drain electrode.09-23-2010
20100155731TOUCHING-TYPE ELECTRONIC PAPER AND METHOD FOR MANUFACTURING THE SAME - The present invention relates to a touching-type electronic paper and method for manufacturing the same. The touching-type electronic paper includes a TFT substrate and a transparent electrode substrate which are disposed as a cell. The transparent electrode substrate includes a common electrode, microcapsule electronic ink and light guiding poles as light transmitting passages, all of which are formed on a first substrate. The TFT substrate comprises displaying electrodes, first TFTs for driving the displaying electrodes, second TFTs for detecting lights transmitting through the light guiding poles and for producing level signals, and third TFTs for reading the level signals and sending the level signals to a back-end processing system, all of which are formed on a second substrate. The light guiding poles are opposite to the second TFTs respectively. The present invention makes the natural lights or other lights outside transmitted to the second TFTs through the light guiding poles by disposing the light guiding poles as light transmitting passages and disposing the second TFTs as light sensor units. The present invention has many advantages such as simple structure, simple manufacturing process and low cost, so as to have a wide application prospect.06-24-2010
20090057670Semiconductor Device and Process for Production Thereof - Disclosed herein is a semiconductor device with high reliability which has TFT of adequate structure arranged according to the circuit performance required. The semiconductor has the driving circuit and the pixel portion on the same substrate. It is characterized in that the storage capacitance is formed between the first electrode formed on the same layer as the light blocking film and the second electrode formed from a semiconductor film of the same composition as the drain region, and the first base insulating film is removed at the part of the storage capacitance so that the second base insulating film is used as the dielectric of the storage capacitance. This structure provides a large storage capacitance in a small area.03-05-2009
20100237350PIXEL STRUCTURE - A pixel structure suitable for being disposed on a substrate includes a thin film transistor (TFT), a first pixel electrode, a second pixel electrode, a scan line and a data line. The TFT disposed on the substrate includes a gate, a source, a first drain and a second drain. A main TFT is formed by the gate, the source and the first drain. A sub-thin film transistor (sub-TFT) is formed by the gate, the first drain and the second drain. The first pixel electrode is electrically connected to the first drain, and a portion of the first drain extends between the second pixel electrode and the substrate to form capacitor-coupling electrode. The second pixel electrode is electrically connected to the second drain of the sub-TFT. The scan line is disposed on the substrate and electrically connected to the gate, and the data line is electrically connected to the source.09-23-2010
20100230679CONTACT PORTION OF WIRE AND MANUFACTURING METHOD THEREOF - A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.09-16-2010
20100237349LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - Disclosed is a thin film transistor substrate for a fringe filed switching type liquid crystal display device, and a fabrication method thereof, that reduces the number of required mask processes, and thus improves fabrication efficiency. The fabrication method involves three mask processes, wherein the masks are partial transmitting masks, and the resulting photo-resist patterns have varying thicknesses. By having photo-resist layers of varying thicknesses, structures can be formed in multiple etching steps using the same photo-resist pattern by incrementally removing the photo-resist according to its thickness. The thin film transistor substrate has a common line, a common electrode, a gate line and a gate electrode formed directly on the substrate. The common electrode overlaps the pixel electrode in the pixel area.09-23-2010
20120138937Light-Scattering Substrate, Method of Manufacturing the Same, Organic Light-Emitting Display Device Including the Same, and Method of Manufacturing the Organic Light-Emitting Display Device - A light-scattering substrate which can be thinned and has improved thermal resistance, a method of manufacturing the same, an organic light-emitting display device including the same, and a method of manufacturing the organic light-emitting display device are disclosed. The light-scattering substrate includes a light-scattering layer composed of a plurality of metal nanoparticles which are attached to at least a surface of a substrate. The metal nanoparticles are formed by agglomeration of a metal on the substrate, and show a surface plasmon phenomenon.06-07-2012
20120138935ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided is an organic light-emitting display device. The organic light-emitting display device includes: a substrate; a buffer layer formed on the substrate; a gate insulating layer formed on the buffer layer; a conductive layer formed on the gate insulating layer; and a pixel defined layer exposing a portion of the conductive layer to form a pad portion connected to bumps of a drive integrated circuit (IC) chip, wherein protrusions and recesses are formed on a surface of the conductive layer.06-07-2012
20100001279ACTIVE MATRIX SUBSTRATE AND DISPLAY DEVICE INCLUDING THE SAME - It is possible to decrease block segmentation and flickering due to separate exposure in an active matrix substrate while avoiding decreased aperture ratio, increased parasitic capacity and complication in manufacturing process. A first pixel circuit and a second pixel circuit including a first-type TFT and a second-type TFT, respectively, are disposed alternately relative to each other in both directions of row and column in an active matrix substrate. In the first-type and the second-type TFTs, a pattern misalignment of the drain electrode with respect to the gate electrode in an up-down direction will increase/decrease a gate-drain parasitic capacity Cgd in reverse ways. By disposing these two types of TFTs in uniform dispersion, the increase/decrease in the parasitic capacity Cgd caused by pattern misalignment occurring at the time of manufacture are averaged.01-07-2010
20100001278THIN FILM TRANSISTOR (TFT) ARRAY SUBSTRATE AND FABRICATING METHOD THEREOF THAT PROTECT THE TFT AND A PIXEL ELECTRODE WITHOUT A PROTECTIVE FILM - A thin film transistor array substrate and a fabricating method thereof are disclosed. The thin film transistor array substrate protects a thin film transistor without a protective film and accordingly reduces the manufacturing cost. In the thin film transistor array substrate, a gate electrode is connected to a gate line. A source electrode is connected to a data line crossing the gate line to define a pixel area. A drain electrode is opposed to the source electrode with a channel therebetween. A semiconductor layer is in the channel. A pixel electrode in the pixel area contacts the drain electrode over substantially the entire overlapping area between the two. A channel protective film is provided on the semiconductor layer corresponding to the channel to protect the semiconductor layer.01-07-2010
20100001277THIN FILM TRANSISTOR ARRAY AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing a thin film transistor array substrate includes: forming a gate pattern on a substrate; forming a first gate insulating film and a second gate insulating film on the substrate; forming a source/drain pattern and a semiconductor pattern on the substrate; forming a passivation film on the substrate; forming a photo-resist pattern on the passivation film; patterning the passivation film using the photo-resist pattern to form a passivation film pattern, the patterning of the passivation film including over-etching the passivation film to form an open region in the passivation film; forming a transparent electrode film on the substrate; removing the photo-resist pattern and a portion of the transparent electrode film on the photo-resist pattern; and forming a pixel electrode on the first gate insulating layer.01-07-2010
20100001276THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD OF THE SAME - A thin film transistor array panel includes an insulating substrate, a gate line and a data line disposed on the insulating substrate and insulated from and intersecting each other, a thin film transistor connected to the gate line and the data line, a partition disposed corresponding to the gate line and the data line and defining a color filter filling region, a color filter disposed in the filling region, a passivation layer disposed on the color filter and the partition, and a pixel electrode disposed on the passivation layer and connected to the thin film transistor through a contact hole disposed through the passivation layer and the color filter. A plane shape of the color filter filling region is substantially a rectangle.01-07-2010
20120193626THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor (TFT) array substrate includes a substrate having a plurality of normal alignment regions, a plurality of abnormal alignment regions, and a device region defined thereon, a plurality of scan lines, a plurality of data lines, a plurality of storage electrode lines, and a plurality of switch devices positioned in the device region, a plurality of alignment structures positioned in the abnormal alignment regions, and an alignment layer formed on the substrate and the alignment structures. The alignment layer further includes a plurality of first alignment slits covering the alignment structures in the abnormal alignment regions and a plurality of second alignment slits in the normal alignment regions. A depth and a width of the second alignment slits are identical to a depth and a width of the first alignment slits.08-02-2012
20100140621LIGHT BLOCKING MEMBER HAVING VARIABE TRANSMITTANCE, DISPLAY PANEL INCLUDING THE SAME, AND MANUFACTURING METHOD THEREOF - A light blocking member having variable transmittance, a display panel including the same, and a manufacturing method thereof. A light blocking member having a variable transmittance according to one exemplary embodiment includes a polymerizable compound, a binder, and a thermochromic material that exhibits a black color at a temperature below a threshold temperature and becomes transparent at a temperature above the threshold temperature.06-10-2010
20100140622THIN FILM TRANSISTOR, FABRICATING METHOD OF THIN FILM TRANSISTOR AND DISPLAY DEVICE USING THE SAME - A thin film transistor comprises: a first transistor region and a second transistor region defined on a substrate; and a first transistor and a second transistor respectively disposed on the first and second transistor regions, the first transistor comprising: a first semiconductor layer having source, channel, and drain regions defined on the substrate; a first insulating film disposed on the first semiconductor layer; a first transparent electrode disposed on the first insulating film and formed corresponding to the channel region of the first semiconductor layer; and a second insulating film disposed on the first transparent electrode, and the second transistor comprising: a second semiconductor layer having source, channel, and drain regions defined on the substrate; the first insulating film disposed on the second semiconductor layer; a second transparent electrode disposed on the first insulating film and formed corresponding to the channel region of the second semiconductor layer; a second gate disposed on the second transparent electrode; and the second insulating film disposed on the second gate.06-10-2010
20120126233THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - Provided is a thin film transistor array panel. A thin film transistor array panel according to an exemplary embodiment includes a gate wire having a first region where the gate line is disposed, and a second region where the gate electrode is disposed, and a thickness of the gate wire formed in the first region is greater than the thickness of the gate wire that is formed in the second region.05-24-2012
20100244035DISPLAY PANEL AND METHOD OF FORMING THEREOF - A panel a gate line on a first substrate, a gate insulating layer covering the gate line, a semiconductor layer on the gate insulating layer, a data line intersecting the gate line and including a source electrode and a drain electrode facing the source electrode on the semiconductor layer, a connection assistant separated from the data line, a passivation layer covering the semiconductor layer and including contact holes exposing the connection assistant and a pixel electrode including a plurality of sub-pixel electrodes and formed on the passivation layer. The sub-pixel electrodes are connected to the connection assistant through the contact holes, are electrically connected to each other through the connection assistant and at least one of the sub-pixel electrodes is electrically connected to the drain electrode.09-30-2010
20100140624Liquid Crystal Display Device - A liquid crystal display device, includes: a gate line (06-10-2010
20100140626THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A method for manufacturing a TFT array panel including forming a gate line having a gate electrode on a insulating layer, a gate insulating layer on the gate line, a semiconductor on the gate insulating layer, an ohmic contact on the semiconductor, a data line having a source electrode and a drain electrode apart form the source electrode on the ohmic contact, a passivation layer having a contact hole to expose the drain electrode, and a pixel electrode connected to the drain electrode through the contact hole. The drain electrode and the source electrode are formed by a photolithography using a negative photoresist pattern. The negative photoresist pattern includes a first portion having a first thickness corresponding to a channel area, a second portion having a second thickness corresponding to a data line area, and a third portion having a third thickness corresponding to another area.06-10-2010
20100163881ARRAY SUBSTRATE FOR ELECTROPHORESIS TYPE DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME, METHOD OF REPAIRING A LINE OF THE SAME - An array substrate for an electrophoresis type display device includes a plurality of gate lines on a substrate; a gate insulating layer on the plurality of gate lines; a plurality of data lines on the gate insulating layer and crossing the plurality of gate lines to define a plurality of pixel regions; a thin film transistor corresponding to each pixel region, the thin film transistor including a gate electrode, a semiconductor layer, and source and drain electrodes; a first passivation layer on the plurality of data lines; a second passivation layer on the first passivation layer, wherein the second passivation layer includes a first hole over the data line, and/or a second hole over the gate line with at least the gate insulating layer therebetween; and a pixel electrode on the second passivation layer and connected to the drain electrode, wherein a portion of the pixel electrode covers the first hole, and another portion of the pixel electrode covers the second hole. A method of manufacturing the same, and a method of repairing a line of the same is also disclosed.07-01-2010
20100163877DISPLAY DEVICE - A display has a glass substrate provided with a transparent conducting film, thin-film transistors, and an aluminum alloy wiring film electrically connecting the thin-film transistors to the transparent conducting film. The aluminum alloy wiring film is a layered structure having a first layer (X) of an aluminum alloy comprising at least one element selected from the specific element group Q including Ni and Ag, and at least one element selected from the specific element group R including rare-earth elements and Mg in a content in the specific range, and a second layer (Y) of an aluminum alloy containing having a resistivity lower than that of the first layer (X). The first layer (X) is in direct contact with the transparent conducting film.07-01-2010
20100163882THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR AN X-RAY DETECTOR AND METHOD OF FABRICATING THE SAME - A thin film transistor (TFT) array substrate for an X-ray detector and a method of fabricating the same are provided. The TFT array substrate includes a substrate, a gate line formed on the substrate, a data line crossing the gate line, a thin film transistor including a gate electrode, a source electrode, and a drain electrode, a first electrode connected to the drain electrode, a passivation layer formed over the gate line, the data line, the thin film transistor and the first electrode, a photoconductor formed over the passivation layer and connected to the first electrode, and a second electrode formed on the photoconductor.07-01-2010
20100289023Array substrate for dislay device and method of fabricating the same - A method of fabricating an array substrate for a display device includes: forming a buffer layer on a substrate having a pixel region; sequentially forming a gate electrode of impurity-doped polycrystalline silicon, a gate insulating layer and an active layer of intrinsic polycrystalline silicon on the buffer layer in the pixel region; forming an interlayer insulating layer of an inorganic insulating material on the active layer; sequentially forming a source barrier pattern, a source ohmic contact layer and a source electrode on the interlayer insulating layer, sequentially forming a drain barrier pattern, a drain ohmic contact layer and a drain electrode on the interlayer insulating layer, and sequentially forming a first dummy pattern, a second dummy pattern and a data line on the interlayer insulating layer; forming a first passivation layer on a surface of the interlayer insulating layer including the source electrode, the drain electrode and the data line formed thereon; forming a gate line on the first passivation layer; forming a second passivation layer on a surface of the first passivation layer including the gate line formed thereon; and forming a pixel electrode on the second passivation layer.11-18-2010
20120241748ACTIVE MATRIX SUBSTRATE AND DISPLAY DEVICE - An active matrix substrate is disclosed, enabling to suppress variation in signal voltages among pixel electrodes. An active matrix substrate includes: an insulating substrate; a plurality of pixel electrodes arranged in a matrix on the insulating substrate; and a source wiring extending in a column direction so as to overlap with two pixel electrodes adjacent to each other in a row direction on the insulating substrate. The pixel electrodes and the source wiring are formed in different layers via an insulating film, the source wiring has a main line portion and extension portions extended from both sides of the main line portion, and the extension portion is formed of a transparent conductive material.09-27-2012
20100127265Thin Film Transistor Array Substrate and Manufacturing Method Thereof - A thin film transistor array substrate includes a gate line disposed on a substrate, the gate line comprising a gate electrode including a lower film and an upper film thicker than the lower film, a gate insulating layer formed on the gate line, a semiconductor layer formed on the gate insulating layer, an ohmic contact layer formed on the semiconductor layer, a data line electrically connected to a source electrode and a drain electrode formed on the ohmic contact layer, the lower film of the gate line is in contact with the gate insulating layer at a crossing portion of the gate line and the data line and the heights of the source electrode and the drain electrode are substantially the same as or less than a height of the semiconductor layer.05-27-2010
20100127263LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A liquid crystal display device includes a gate line and a data line on a substrate crossing each other to define a pixel region; a thin film transistor in the pixel region and connected to the gate line and the data line; a pixel electrode in the pixel region and connected to the thin film transistor; and a gate pad at an end of the gate line and a data pad at an end of the data line, at least one of the gate pad and the data pad including: a pad electrode including at least one pad contact hole therein along with a passivation layer, the passivation layer on the pad electrode, at least one side of the pad contact hole having an uneven shape in plane; and a pad electrode terminal contacting inner side surfaces of the pad electrode surrounding the pad contact hole.05-27-2010
20110057194THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel, in which a middle storage electrode and a storage electrode overlapping a drain electrode of a thin film transistor thereby forming a storage capacitance are formed. Accordingly, sufficient storage capacitance may be formed without a decrease of the aperture ratio and light transmittance of a liquid crystal display. Also, the capacitance may be sufficiently formed through the connecting member connected to a gate metal layer.03-10-2011
20110057193FLAT-PANEL DISPLAY SEMICONDUCTOR PROCESS FOR EFFICIENT MANUFACTURING - An embodiment is a method and apparatus to fabricate a flat panel display. A poly-last structure is formed for a display panel using an amorphous silicon or amorphous silicon compatible process. The poly-last structure has a channel silicon precursor. The display panel is formed from the poly-last structure using a polysilicon specific or polysilicon compatible process.03-10-2011
20110057192ACTIVE MATRIX SUBSTRATE AND DISPLAY UNIT PROVIDED WITH IT - An active matrix substrate includes a substrate; scanning lines formed on the substrate; an insulating film covering the scanning lines; signal lines intersecting the scanning lines via the insulating film; switching elements formed on the substrate, each operating in response to a signal which is applied to the corresponding scanning line; and pixel electrodes each capable of being electrically connected to the corresponding signal line via the switching elements. The insulating film is a multilayer insulating film including a first insulating layer and a second insulating layer. The first insulating layer is formed of an insulating material containing an organic component, and the multilayer insulating film has a low-stack region in at least a portion of a region overlapping each switching element, the first insulating layer not being formed in the low-stack region. The active matrix substrate reduces the capacitance formed at each intersection between a scanning line and a signal line, without causing an increase in the wiring resistance or a degradation of the driving ability of switching elements.03-10-2011
20110057191DISPLAY APPARATUS, MANUFACTURING METHOD THEREOF, AND ELECTRONIC EQUIPMENT - A display apparatus is disclosed. The display apparatus includes a transistor formed on a substrate; an interlayer insulator formed on the transistor; a pixel electrode formed on the interlayer insulator; a first partition located above a contact hole which penetrates the interlayer insulator; and a second partition which intersects with the first partition, or which is located on a straight line intersecting with the first partition, and which brings a width value of the pixel electrode to a predetermined value.03-10-2011
20110057190SEMICONDUCTOR DEVICE AND DISPLAY DEVICE - A semiconductor device including a circuit which does not easily deteriorate is provided. The semiconductor device includes a first transistor, a second transistor, a first switch, a second switch, and a third switch. A first terminal of the first transistor is connected to a first wiring. A second terminal of the first transistor is connected to a second wiring. A gate and a first terminal of the second transistor are connected to the first wiring. A second terminal of the second transistor is connected to a gate of the first transistor. The first switch is connected between the second wiring and a third wiring. The second switch is connected between the second wiring and the third wiring. The third switch is connected between the gate of the first transistor and the third wiring.03-10-2011
20100123136SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - An oxide or nitride semiconductor layer is formed over a substrate. A first conductive layer including a first element and a second element, and a second conductive layer including the second element are formed over the semiconductor layer. The first element is oxidized or nitrogenized near an interface region between the first conductive layer and the oxide or nitride semiconductor layer by heat treatment or laser irradiation. The Gibbs free energy of oxide formation of the first element is lower than those of the second element or any element in the oxide or nitride semiconductor layer.05-20-2010
20080315205Display device and manufacturing method thereof - It is an object of the present invention to prevent an influence of voltage drop due to wiring resistance, trouble in writing of a signal into a pixel and trouble in gray scales, and provide a display device with higher definition, represented by an EL display device and a liquid crystal display device.12-25-2008
20100078641DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS HAVING THE SAME - In a display substrate and a method of the display substrate, a bank pattern provided with openings formed therethrough is formed by an imprint method, and the openings are filled with a conductive material by an inkjet method to form a data line and a pixel electrode, in accordance with one or more embodiments. When the display substrate is manufactured, a patterning process by a photolithography method may be replaced with the patterning process by the imprint method and the inkjet method, which simplifies a manufacturing method of the display substrate. In case that the display substrate includes a plastic substrate, the plastic substrate may be prevented from being deformed during a photolithography process.04-01-2010
20100032674Display Device - An object of the present invention is to provide a display device where small thin film transistors with a lower off current can be formed. The present invention provides a display device where thin film transistors are formed on a substrate, and in the above described thin film transistors, a gate electrode is formed on a semiconductor layer with a gate insulating film in between, the above described thin film transistors are formed of at least a first thin film transistor and a second thin film transistor, and the above described semiconductor layer is divided into individual regions for each film transistor, the above described semiconductor layer is provided with a common region shared either by the drain region of the above described first thin film transistor and the source region of the above described second thin film transistor or by the source region of the above described first thin film transistor and the drain region of the above described second thin film transistor, in the first thin film transistor and the second thin film transistor, the semiconductor layer is provided with LDD regions where the impurity concentration is lower than in the above described drain region and the above described source region, between the channel region and the drain region, as well as between the channel region and the source region, and the above described gate electrode is formed so as to overlap with the above described common region in the above described semiconductor layer and face at least the above described channel region and the above described LDD regions of the above described first thin film transistor and the above described channel region and the above described LDD regions of the above described second thin film transistor.02-11-2010
20090309100SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE - A semiconductor device includes a semiconductor layer having a channel region, an impurity layer having a source region and a drain region, and a gate electrode provided so as to face the semiconductor layer with a gate insulating film interposed therebetween. The semiconductor layer has a layered structure of at least a first amorphous film and a crystalline film including a crystal phase, and the first amorphous film is formed directly on the gate insulating film.12-17-2009
20120193630ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME - An array substrate includes a substrate, a switching element, a pixel electrode, and a common electrode. The substrate includes a plurality of gate lines, data lines insulated from the gate lines, and the data lines extend in a direction crossing the gate lines. The switching element is connected to the gate lines and data lines. The pixel electrode is arranged in a pixel area which is defined on the substrate, and is connected to an output electrode of the switching element. The common electrode corresponds to the pixel area and is insulated from the pixel electrode, and the common electrode has at least one first slit corresponding to the data line.08-02-2012
20120193628SEMICONDUCTOR DEVICE - A highly reliable semiconductor device is manufactured by giving stable electric characteristics to a transistor in which an oxide semiconductor film is used. A p-type oxide semiconductor material is contained in an n-type oxide semiconductor film, whereby carriers which are generated in the oxide semiconductor film without intention can be reduced. This is because electrons generated in the n-type oxide semiconductor film without intention are recombined with holes generated in the p-type oxide semiconductor material to disappear. Accordingly, it is possible to reduce carriers which are generated in the oxide semiconductor film without intention.08-02-2012
20090321739Array substrate for flat display device and method for fabricating the same - The present invention relates to an array substrate for a flat display device and a method for fabricating the same, in which a number of masks is reduced for reducing a cost and improving a device performance. The array substrate includes a gate electrode formed on an insulating substrate, a gate insulating film formed on an entire surface of the insulating substrate including the gate electrode, an active layer formed on the gate insulating film opposite to the gate electrode having a stack of a polysilicon layer and an amorphous silicon layer each having a width greater than the gate electrode, a source electrode and a drain electrode separated from each other at a portion of the active layer and formed over the active layer with an ohmic contact layer disposed therebetween, an interlayer insulating film formed on an entire surface of the insulating substrate having a contact hole to expose a predetermined portion of the drain electrode, and a pixel electrode connected to the drain electrode through the contact hole.12-31-2009
20090321741STORAGE CAPACITOR IN OLED PIXELS AND DRIVING CIRCUITS AND METHOD FOR FORMING THE SAME - An electroluminescence device includes a substrate and a plurality of pixels. Each pixel includes a first area including at least a first capacitor and a second capacitor, the first capacitor including a first conductive layer, a first dielectric layer over the first conductive layer, and a second conductive layer over the first dielectric layer, and the second capacitor including the second conductive layer, a second dielectric layer over the second conductive layer, and a third conductive layer over the second dielectric layer, and a transistor in a second area. The transistor includes a first semiconductor layer formed on the substrate, a first gate oxide layer over the first semiconductor layer, a fourth conductive layer over the first gate oxide layer, and a seventh conductive layer contacting the first semiconductor layer, wherein the seventh conductive layer is formed of the same conductive film as the second conductive layer.12-31-2009
20090200556THIN FILM TRANSISTOR PANEL FOR MULTI-DOMAIN LIQUID CRYSTAL DISPLAY - A thin film transistor array panel is provided, which includes: an insulating substrate; a plurality of first signal lines formed on the insulating substrate; a plurality of second signal lines formed on the insulating substrate and intersecting the first wire in an insulating manner; a pixel electrode formed in a pixel area defined by the intersections of the first signal lines and the second signal lines and including a plurality of subareas partitioned by cutouts and a plurality of bridges connecting the subareas; and a direction control electrode formed in the pixel area and including a portion overlapping at least one of the cutouts, wherein two long edges of each subarea are parallel to each other and the at least one of cutouts overlapping the portion of the direction control electrode defines one of two longest edges of the subarea.08-13-2009
20090166635ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - An array substrate includes a base substrate, a gate line, a gate insulation layer, a data line, a thin-film transistor (“TFT”) and a pixel electrode. The gate line includes a gate covering line formed in a first direction on the base substrate and a gate main line protruded from the gate covering line. The gate insulation layer is formed on the base substrate to cover the gate line. The data line is formed on the gate insulation layer in a second direction crossing the first direction. The TFT is electrically connected to the gate line and the data line. The pixel electrode is electrically connected to the TFT. Therefore, a gate line is thicker than a gate covering line and a gate main line having a low resistance is further formed, so that a gate signal may be quickly transferred along the gate line without a signal delay.07-02-2009
20090114920TFT SUBSTRATE AND LIQUID CYRSTAL DISPLAY DEVICE HAVING THE SAME - An LCD device includes a first substrate having a first base substrate, patterns disposed at different heights with respect to the first base substrate, and an insulation layer formed on the first base substrate and the patterns. The insulation layer has raised portions corresponding to the patterns. A side of the raised portions forms an inclination angle of no more than about 45° when a height of the raised portions is more than about 3000 angstroms, the side of the raised portions forms an inclination angle of no more than about 50° when a height of the raised portions is in a range of about 2000 angstroms to about 3000 angstroms, and the side of the raised portions forms an inclination angle of no more than about 90° when a height of the raised portions is more than about 2000 angstroms. Therefore, light leakage may be minimized.05-07-2009
20090114919SEMICONDUCTOR RANGE-FINDING ELEMENT AND SOLID-STATE IMAGING DEVICE - A semiconductor range-finding element and a solid-state imaging device, which can provide a smaller dark current and a removal of reset noise. With n-type buried charge-generation region, buried charge-transfer regions, buried charge read-out regions buried in a surface of p-type semiconductor layer, an insulating film covering these regions, transfer gate electrodes arranged on the insulating film for transferring the signal charges to the buried charge-transfer regions, read-out gate electrodes arranged on the insulating film for transferring the signal charges to the buried charge read-out regions, after receiving a light pulse by the buried charge-generation region, in the semiconductor layer just under the buried charge-generation region, an optical signal is converted into signal charges, and a distance from a target sample is determined by a distribution ratio of the signal charges accumulated in the buried charge-transfer regions.05-07-2009
20090114918PANEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A panel structure and a manufacturing method thereof are provided. The panel structure is disposed in a display device. The panel structure includes a substrate, several first transistors and second transistors. The substrate has a display circuit and a control circuit. The first transistors are disposed at the display circuit of the substrate. Each of the first transistors has a first active layer. The second transistors are disposed at the control circuit of the substrate. Each of the second transistors has a second active layer. The materials of at least one of the first active layer and the second active layer include ZnO.05-07-2009
20090114917THIN FILM TRANSISTOR AND DISPLAY DEVICE HAVING THE THIN FILM TRANSISTOR - A thin film transistor includes a gate electrode, a gate insulating layer covering the gate electrode, a microcrystalline semiconductor layer over the gate insulating layer, an amorphous semiconductor layer over the microcrystalline semiconductor layer, source and drain regions over the amorphous semiconductor layer, source and drain electrodes in contact with and over the source and drain regions, and a part of the amorphous semiconductor layer overlapping with the source and drain regions is thicker than a part of the amorphous semiconductor layer overlapping with a channel formation region. The side face of the source and drain regions and the side face of the amorphous semiconductor form a tapered shape together with an outmost surface of the amorphous semiconductor layer. The taper angle of the tapered shape is such an angle that decrease electric field concentration around a junction portion between the source and drain regions and the amorphous semiconductor layer.05-07-2009
20090039351Display device and manufacturing method thereof - To provide a display device having a thin film transistor with high electric characteristics and excellent reliability and a manufacturing method thereof. A gate electrode, a gate insulating film provided over the gate electrode, a first semiconductor layer provided over the gate insulating film and having a microcrystalline semiconductor, a second semiconductor layer provided over the first semiconductor layer and having an amorphous semiconductor, and a source region and a drain region provided over the second semiconductor layer are provided. The first semiconductor layer has high crystallinity than the second semiconductor layer. The second semiconductor layer includes an impurity region having a conductivity type different from a conductivity type of the source region and the drain region between the source region and the drain region.02-12-2009
20090039350Display panel and method of manufacturing the same - In a display panel and a method of manufacturing the display panel, a gate line, a data line, and source and drain electrodes including a same material as the data line are formed on a substrate constituting the display panel, and the data line includes an aluminum based alloy containing sufficient nickel to inhibit corrosion during dry etching. The corrosion resistance of the AlNi-containing alloy helps prevent corrosion of the data line, the source electrode, and the drain electrode during selective dry etching that shapes these lines and electrodes.02-12-2009
20090108264LAMINATED CONDUCTIVE FILM, ELECTRO-OPTICAL DISPLAY DEVICE AND PRODUCTION METHOD OF SAME - The present invention provides a laminated conductive film, comprising a transparent conductive film and Al-based film, that is capable of realizing a high-quality film with superior electro-optical properties, without providing a buffer layer or protective layer. A laminated conductive film according to one aspect of the present invention is provided with a transparent conductive film having optical transmissivity, and a metal conductive film laminated directly on the transparent conductive film and electrically connected to the transparent conductive film. The metal conductive film is made of Al or has Al as a main component thereof and contains at least one of nitrogen atom and oxygen atom at least in the vicinity of the interface with the transparent conductive film.04-30-2009
20110101358SEMICONDUCTOR DEVICE AND DISPLAY APPARATUS USING THE SEMICONDUCTOR DEVICE - Disclosed herein is a semiconductor device which employs a thin-film transistor. In addition, the semiconductor device has a gate electrode, a gate insulation film, an organic semiconductor layer, a structure, a source electrode, a drain electrode, and an electrode material layer.05-05-2011
20110108841SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF, AND DISPLAY APPARATUS USING THE SEMICONDUCTOR DEVICE - Provided is a method of promoting a deposition of semiconductor crystal nuclei on an insulating film such as a silicon oxide film even at a low temperature of 450° C. or lower in a reactive thermal CVD method. As one means thereof, a first semiconductor film is formed on an insulating substrate, and then semiconductor crystal nuclei are formed on parts of the first semiconductor film and simultaneously the first semiconductor film other than that in forming regions of the semiconductor crystal nuclei and their peripheries is removed by etching. Thereafter, a second semiconductor film is formed with using the semiconductor crystal nuclei as seeds.05-12-2011
20090108263SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - The invention relates to a semiconductor device including a plurality of thin film transistors provided on a base member having a curved surface. The surface may be bent in either a convex shape or a concave shape. All channel length directions of the plurality of thin film transistors may also be aligned in the same direction. Further, the channel length direction may be different from the direction in which the base member is bent. A pixel portion and a driver circuit portion may also be provided on the base member. The invention also includes a method of manufacturing a semiconductor device including forming a layer to be peeled including an element of a substrate, bonding a support member to the layer to be peeled, and bonding a transfer body to the layer to be peeled.04-30-2009
20090108262DISPLAY DEVICE - A display device includes an insulative array-substrate provided with display areas, composed of a plurality of pixels, formed thereon; an opposite substrate disposed opposite the array substrate; opposite electrodes, each individually corresponding to the pixels, formed on the surface opposite to the array substrate, of the opposite substrate; a black matrix formed between the opposite electrodes; and a projection portion formed on each of the opposite electrodes, for electrically connecting the black matrix with each opposite electrode.04-30-2009
20090108260Pixel structure and method for manufacturing the same - A method for manufacturing a pixel structure is provided. First, a first mask process is performed to form a patterned first metal layer on a substrate, wherein the patterned first metal layer includes a gate. Next, a second mask process is performed to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer. Then, a third mask process is performed to define a thin film transistor (TFT) and a pixel electrode connected thereto and to form a passivation layer to cover the TFT.04-30-2009
20090108259Pixel Structure and Method for Manufacturing the Same - A pixel structure of a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the pixel structure are provided. Compared to the conventional method of using seven photolithography-etching processes for manufacturing a pixel structure, the method of the present invention uses only six photolithography-etching processes that save manufacturing costs and time. Furthermore, the pixel structure thereby only comprises two insulating layers, and thus, the light transmittance thereof can be increased in comparison to the conventional pixel structure comprising three insulating layers.04-30-2009
20100295050THIN FILM TRANSISTOR ARRAY PANEL AND METHODS FOR MANUFACTURING THE SAME - Disclosed is a simplified method for manufacturing a liquid crystal display. A gate wire including a gate line, a gate pad, and a gate electrode are formed on a substrate. A gate insulating layer, a semiconductor layer, and an ohmic contact layer are sequentially deposited, and a photoresist layer is coated thereon. The photoresist layer is exposed to light through a mask and developed to form a photoresist pattern. At this time, a first portion of the photoresist pattern which is located between the source electrode and the drain electrode is thinner than a second portion which is located on the data wire, and the photoresist layer is totally removed on other parts. The thin portion is made by controlling the amount of irradiating light or by a reflow process to form a thin portion, and the amount of light is controlled by using a mask that has a slit, a small pattern smaller than the resolution of the exposure device, or a partially transparent layer. Next, the exposed portions of conductor layer are removed by wet etch or dry etch, and thereby the underlying ohmic contact layer is exposed. Then the exposed ohmic contact layer and the underlying semiconductor layer are removed by dry etching along with the first portion of the photoresist layer. The residue of the photoresist layer is removed by ashing. Source/drain electrodes are separated by removing the portion of the conductor layer at the channel and the underlying ohmic contact layer pattern. Then, the second portion of the photoresist layer is removed, and red, green, and blue color filters, a pixel electrode, a redundant gate pad, and a redundant data pad are formed.11-25-2010
20100295049TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - The embodiment of the invention provides a manufacturing method for a thin film transistor liquid crystal display (TFT-LCD) array substrate, the manufacturing method comprises: step 11-25-2010
20100295048TFT Array Substrate and Method for Forming the Same - A TFT array substrate comprises an insulator base; a first metal layer on the insulator base, a first portion thereof forming a gate electrode of a TFT; a gate insulating layer overlying the first metal layer and the insulator base; an amorphous silicon layer and a first layer of conductive transparent material both on the gate insulating layer; a doped amorphous silicon layer positioned on the amorphous silicon layer; a second metal layer on the doped amorphous silicon layer and the first layer of conductive transparent material, a first portion thereof forming source and drain electrodes of the TFT; a passivation layer on the second metal layer; and a second layer of conductive transparent material on the passivation layer, a first portion thereof forming a pixel electrode, wherein the first layer of conductive transparent material forms a portion of a common electrode of the array substrate.11-25-2010
20100308334ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE ARRAY SUBSTRATE - An array substrate including: a gate electrode and a gate insulation layer disposed on a base substrate, the gate insulation layer having a first thickness in a first region and a second thickness in a second region, the first thickness being greater than the second thickness; a semiconductor pattern disposed on the gate insulation layer in the first region, an end portion of the semiconductor pattern having a stepped portion with respect to the gate insulation layer; an ohmic contact pattern disposed on the semiconductor pattern, an end portion of the ohmic contact pattern opposite to a channel portion being aligned with the end portion of the semiconductor pattern; and source and drain electrodes disposed on the ohmic contact pattern, the source and drain electrodes spaced apart from each other and including first and second thin-film transistor patterns.12-09-2010
20100301342INCREASED GRAIN SIZE IN METAL WIRING STRUCTURES THROUGH FLASH TUBE IRRADIATION - A method for forming a wiring structure includes forming a metal layer on a substrate, and annealing the metal layer by irradiating the metal layer with light emitted from at least one flash tube, thereby growing crystalline grains of the metal layer.12-02-2010
20110248269Organic light emitting diode display and method for manufacturing the same - An organic light emitting diode (OLED) display includes a substrate including a plurality of pixels defined thereon, a thin film transistor (TFT) positioned at each pixel, a negative electrode electrically connected to the TFT, an organic emission layer positioned on the negative electrode, and a positive electrode positioned on the organic emission layer, the positive electrode including an auxiliary layer positioned on the organic emission layer, a conductive layer positioned on the auxiliary layer, and an insulation layer positioned on the conductive layer.10-13-2011
20100301340Thin film transistors and arrays - Thin film transistors and arrays having controlled threshold voltage and improved I12-02-2010
20110127535DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR - An active matrix substrate of a display device of the present invention includes a glass substrate (06-02-2011
20100308333THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL AND A METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR ARRAY SUBSTRATE FOR A DISPLAY PANEL - A method of manufacturing a thin film transistor capable of simplifying a substrate structure and a manufacturing process is disclosed. The method of manufacturing a thin film transistor array substrate comprising a three mask process. The 3 mask process comprising, forming a gate pattern on a substrate, forming a gate insulating film on the substrate, forming a source/drain pattern and a semiconductor pattern on the substrate, forming a first, second, and third passivation film successively on the substrate. Over the above multi-layers of the passivation film forming a first photoresist pattern comprising a first portion formed on part of the drain electrode and on the pixel region, and a second portion wherein, the second portion thicker than the first portion, and then patterning the third passivation film using the first photoresist pattern, forming a second photoresist pattern by removing the first portion of the first photoresist pattern, forming a transparent electrode film on the substrate, removing the second photoresist pattern and the transparent electrode film disposed on the second photoresist pattern; and forming a transparent electrode pattern on the second passivation layer.12-09-2010
20100301341THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - The present invention relates to an OLED display and a manufacturing method thereof, including a substrate, a control electrode formed on the substrate, a polysilicon semiconductor formed on the control electrode, a data line including an input electrode at least partially overlapping the polysilicon semiconductor and an output electrode facing the input electrode, an insulating layer covering the data line and the output electrode and having a contact hole, a gate line connected to the control electrode through the contact hole, and a pixel electrode connected to the output electrode.12-02-2010
20100308336ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - An array substrate for an LCD device and a manufacturing method thereof. The array substrate includes: a gate line, a gate electrode, a gate pad, and a pixel electrode formed on the substrate; a gate insulation layer formed on the substrate to expose the gate line and the pixel electrode; a source electrode connected to a data line crossing the gate line, a drain electrode facing the source electrode with a channel interposed, a data pad formed at one end of the data line, and a capacitor electrode overlapping portions of the pixel electrode and the gate line; a semiconductor layer constituting the channel between the source electrode and the drain electrode; first, second, third, and fourth contact holes formed in the gate pad, the data pad, the capacitor electrode, and the drain electrode, respectively; and first through fourth contact electrodes formed in the first through fourth contact holes, respectively.12-09-2010
20100308335ORGANIC LIGHT EMITTING DIODE DISPLAY AND METHOD OF MANUFACTURING THE SAME - An organic light emitting diode (OLED) display and a method of manufacturing the same, the OLED display including a flexible substrate, a driving circuit unit on the flexible substrate, the driving circuit unit including a thin film transistor (TFT), an organic light emission element on the flexible substrate, the organic light emission element being connected to the driving circuit unit, an encapsulating thin film on the flexible substrate, the encapsulating thin film covering the organic light emission element and the driving circuit unit, a first protection film facing the encapsulating thin film, a second protection film facing the flexible substrate, a first sealant disposed between the encapsulating thin film and the first protection film, and a second sealant disposed between the flexible substrate and the second protection film.12-09-2010
20110127536ACTIVE MATRIX SUBSTRATE, DISPLAY DEVICE, METHOD FOR INSPECTING THE ACTIVE MATRIX SUBSTRATE, AND METHOD FOR INSPECTING THE DISPLAY DEVICE - An active matrix substrate (06-02-2011
20110127533ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device which may be configured to prevent oxygen or water from penetrating from the outside and which may be more easily mass produced is disclosed. A method of manufacturing an organic light-emitting display device is also disclosed. The organic light-emitting display device may include, for example, a thin-film transistor (TFT) with a gate electrode, an active layer electrically insulated from the gate electrode, source and drain electrodes electrically insulated from the gate electrode and contacting the active layer, an organic light-emitting diode electrically connected to the TFT and an insulating layer interposed between the TFT and the organic light-emitting diode. The insulating layer may include, for example, a first insulating layer covering the TFT, a second insulating layer formed of metal oxide and formed on the first insulating layer and a third insulating layer formed of metal oxide or metal nitride and formed on the second insulating layer.06-02-2011
20110127531DISPLAY DEVICE, TFT SUBSTRATE, AND METHOD OF FABRICATING THE TFT SUBSTRATE - Provided are a display device, a thin-film transistor (TFT) substrate, and a method of fabricating the TFT substrate. The method includes: forming a gate electrode on a pixel region of a substrate; forming a gate insulating film on the gate electrode; forming a semiconductor layer on the gate insulating film to overlap the gate electrode; forming a source electrode and a drain electrode to overlap the semiconductor layer and thus form a channel region; and forming a data insulating film on the source electrode and the drain electrode and patterning the data insulating film such that part of a contact hole formed in the data insulating film overlaps the channel region.06-02-2011
20110241003ELECTRO-OPTICAL DEVICE SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS - In an electro-optical device substrate, first and second pixel switching elements each include a gate electrode formed of a first conductive film, a gate insulation film formed of a first insulation film, a semiconductor layer, a source electrode formed of a second conductive film, and a drain electrode formed of the second conductive film. A first storage capacitor includes a first storage capacitor electrode formed of the second conductive film, a protective film formed of a second insulation film so as to over at least the first storage capacitor electrode, and a pixel electrode formed so as to overlap with the first storage capacitor electrode at least partially with the protective film interposed therebetween.10-06-2011
20110127537DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE - A display device comprises: a wiring layer (06-02-2011
20110001138Thin Film Transistor Array and Method for Manufacturing the Same - A thin film transistor (TFT) array includes a substrate, a thin film transistor, a first wall, a transparent electrode and a color resist. The thin film transistor is disposed on the substrate. The first wall is disposed on the substrate and separates a first contact hole from a pixel region on the substrate, wherein the first contact hole exposes a drain electrode of the thin film transistor. The first wall has a first sidewall facing towards the first contact hole and a second sidewall facing towards the pixel region, wherein the slope of the first sidewall is gentler than the slope of the second sidewall. The transparent electrode is electrically connected to the drain electrode of the thin film transistor through the first contact hole. The pixel region is filled with the color resist.01-06-2011
20100327286LIGHT SENSING CIRCUIT, BACKLIGHT CONTROL APPARATUS HAVING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME - A light sensing circuit capable of enhancing a reliability by lowering a dependency on a temperature change without using a resistor, a backlight control apparatus having the same, and an LCD device having the same. The light sensing circuit includes a first MOS-transistor; and a second MOS-transistor serially connected to the first MOS-transistor between a first power terminal and a ground terminal, in which a second power terminal is connected to each gate terminal of the first MOS-transistor and the second MOS-transistor, and an optical amount detecting terminal is connected to a common connection point between a drain terminal of the first MOS-transistor and a source terminal of the second MOS-transistor.12-30-2010
20110024755THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR USED FOR THE SAME - A thin film transistor (TFT) substrate includes first and second TFTs on the same substrate. The first TFT has a feature that a lower conductive layer or a bottom gate electrode layer is provided between the substrate and a first insulating layer while an upper conductive layer or a top gate electrode layer is disposed on a second insulating layer formed on a semiconductor layer which is formed on the first insulating layer. The first conductive layer has first and second areas such that the first area overlaps with the first conductive layer without overlapping with the semiconductor layer while the second area overlaps with the semiconductor layer, and the first area is larger than the second area while the second insulating layer is thinner than the first insulating layer. The second TFT has the same configuration as the first TFT except that the gate electrode layer is eliminated.02-03-2011
20110127534ESD Induced Artifact Reduction Design for a Thin Film Transistor Image Sensor Array - A method is provided for fabricating an image sensor array in a manner that reduces the potential for defects resulting from electrostatic discharge events during fabrication of the image sensor array. The method includes: forming at least one pixel over a substrate, the pixel including a switching transistor and a photo-sensitive cell; and forming a dielectric interlayer over the pixel. A key step in the method of the present invention is depositing a first conductive layer over the dielectric interlayer. After the first conductive layer is formed, the image sensor array is well protected from ESD events because the first conductive layer spreads out any charge induced by tribo-electric charging events that may occur during subsequent fabrication processing steps, thereby reducing the potential for localized damage to the switching transistors upon the occurrence of ESD events.06-02-2011
20100133542PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A method of manufacturing a pixel structure is provided. A first patterned conductive layer including a gate and a data line is formed on a substrate. A gate insulating layer is formed to cover the first patterned conductive layer and a semiconductor channel layer is formed on the gate insulating layer above the gate. A second patterned conductive layer including a scan line, a common line, a source and a drain is formed on the gate insulating layer and the semiconductor channel layer. The scan line is connected to the gate and the common line is located above the data line. The source and drain are located on the semiconductor channel layer, and the source is connected to the data line. A passivation layer is formed on the substrate to cover the second patterned conductive layer. A pixel electrode connected to the drain is formed on the passivation layer.06-03-2010
20110024756ORGANIC LIGHT EMITTING DISPLAY - The general inventive concept relates to an organic light emitting display that has the same area where the upper and lower electrodes of a capacitor are overlapped for adjacent pixels, for respective pixels that constitute the organic light emitting display but implements the sizes of the upper and lower electrodes to be different. This thereby prevents the display quality of horizontal line shaped spot generated due to the effects of a critical dimension (CD) distribution from being degraded.02-03-2011
20110017995SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - An object is to increase the aperture ratio of a semiconductor device. The semiconductor device includes a driver circuit portion and a display portion (also referred to as a pixel portion) over the same substrate. The driver circuit portion includes a channel-etched thin film transistor for a driver circuit, in which a source electrode and a drain electrode are formed using a metal and a channel layer is formed using an oxide semiconductor, and a driver circuit wiring formed using a metal. The display portion includes a channel protection thin film transistor for a pixel, in which a source electrode and a drain electrode are formed using an oxide conductor and a semiconductor layer is formed using an oxide semiconductor, and a display portion wiring formed using an oxide conductor. The thin film transistors provided in the semiconductor device are formed with a resist mask formed using a multi-tone mask.01-27-2011
20110031498SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device includes a pixel portion having a first thin film transistor and a driver circuit having a second thin film transistor. Each of the first thin film transistor and the second thin film transistor includes a gate electrode layer, a gate insulating layer, a semiconductor layer, a source electrode layer, and a drain electrode layer. Each of the layers of the first thin film transistor has a light-transmitting property. Materials of the gate electrode layer, the source electrode layer and the drain electrode layer of the first thin film transistor are different from those of the second transistor, and each of the resistances of the second thin film transistor is lower than that of the first thin film transistor.02-10-2011
20110108840ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An organic light emitting diode (OLED) display device and a method of fabricating the same are disclosed. The OLED display device includes a plurality of scan lines, a plurality of data lines, and a plurality of pixels disposed in a region in which the scan lines cross the data lines, where each pixel of the plurality of pixels includes: a switching transistor including a first gate electrode, a first semiconductor layer disposed over the first gate electrode, a first gate insulating layer interposed between the first gate electrode and the first semiconductor layer, a first source electrode and a first drain electrode, a driving transistor including a second semiconductor layer, a second gate electrode disposed over the second semiconductor layer, a second gate insulating layer interposed between the second gate electrode and the second semiconductor layer, a second source electrode and a second drain electrode, and an organic light emitting diode electrically connected with the second source and second drain electrodes of the driving transistor, where the first and second semiconductor layers are formed of the same material, and from the same processing.05-12-2011
20110108839Thin Film Transistor Substrate and Manufacturing Method Thereof - A thin film transistor array panel according to an exemplary embodiment of the present invention comprises a substrate, a gate line formed on the substrate, a gate insulating layer formed on the gate line, a semiconductor layer formed on the gate insulating layer, and a data line formed on the semiconductor layer, wherein the data line comprises a lower data layer, an upper data layer, a data oxide layer, and a buffer layer, wherein the upper data layer and the buffer layer comprise a same material.05-12-2011
20110108842DISPLAY DEVICE AND ELECTRONIC APPARATUS - A display device in which variations in luminance due to variations in characteristics of transistors are reduced, and image quality degradation due to variations in resistance values is prevented. The invention comprises a transistor whose channel portion is formed of an amorphous semiconductor or an organic semiconductor, a connecting wiring connected to a source electrode or a drain electrode of the transistor, alight emitting element having a laminated structure which includes a pixel electrode, an electro luminescent layer, and a counter electrode, an insulating layer surrounding an end portion of the pixel electrode, and an auxiliary wiring formed in the same layer as a gate electrode of the transistor, a connecting wiring, or the pixel electrode. Further, the connecting wiring is connected to the pixel electrode, and the auxiliary wiring is connected to the counter electrode via an opening portion provided in the insulating layer.05-12-2011
20110024759THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR FORMING METAL WIRE THEREOF - The present invention relates to a thin film transistor substrate and a metal wiring method thereof, more particularly to a thin film transistor substrate comprising self-assembled monolayers between the substrate and the metal wiring, and a metal wiring thereof. Since a thin film transistor substrate of the present invention comprises three-dimensionally cross-linked self-assembled monolayers between the Si surface and the metal wiring, it has good adhesion ability and anti-diffusion ability.02-03-2011
20110024758LIQUID CRYSTAL DISPLAY DEVICE AND SEMICONDUCTOR DEVICE - By increasing an interval between electrodes which drives liquid crystals, a gradient of an electric field applied between the electrodes can be controlled and an optimal electric field can be applied between the electrodes. The invention includes a first electrode formed over a substrate, an insulating film formed over the substrate and the first electrode, a thin film transistor including a semiconductor film in which a source, a channel region, and a drain are formed over the insulating film, a second electrode located over the semiconductor film and the first electrode and including first opening patterns, and liquid crystals provided over the second electrode.02-03-2011
20110024760SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND ELECTRONIC DEVICE - A pixel includes a load, a transistor which controls a current supplied to the load, a storage capacitor, and first to fourth switches. By inputting a potential in accordance with a video signal into the pixel after the threshold voltage of the transistor is held in the storage capacitor, and holding a voltage of the sum of the threshold voltage and the potential, variations of a current value caused by variations of threshold voltage of a transistor can be suppressed. Consequently, a predetermined current can be supplied to the load such as a light-emitting element. Further, by changing the potential of a power supply line, a display device with a high duty ratio can be provided.02-03-2011
20110024757Semiconductor Device and Fabrication Method Thereof - For forming a gate electrode, a conductive film with low resistance including Al or a material containing Al as its main component and a conductive film with low contact resistance for preventing diffusion of Al into a semiconductor layer are laminated, and the gate electrode is fabricated by using an apparatus which is capable of performing etching treatment at high speed.02-03-2011
20110024753PIXEL STRUCTURE AND FABRICATING METHOD THEREOF - A fabricating method of a pixel structure is provided. First, a substrate with a plurality of pixel areas is provided. A common electrode is formed on the substrate to surround each pixel area. Then, a capacitance storage electrode is formed on the common electrode, and a first passivation layer is formed to cover the capacitance storage electrode and the common electrode. Following that, a scan line and a gate electrode are formed within each pixel area. Next, a gate insulation layer and a semiconductor layer are formed. A data line, a source, and a drain are formed within each pixel area. After that, a second passivation layer is formed on the substrate, and a contact window is formed in the second passivation layer above the drain. Moreover, a pixel electrode is formed within each pixel area, and the pixel electrode is electrically connected with the drain through the contact window.02-03-2011
20110024754ACTIVE MATRIX SUBSTRATE, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS - An active matrix substrate including: a substrate; a display section having a pixel circuit formed on the substrate; and a protection circuit connected to an interconnection of the display section. The protection circuit has a diode-connected transistor, an insulating layer provided so as to cover the transistor, and a light-shielding layer provided in a region above the insulating layer so as to face at least a channel region in the transistor and electrically connected to at least any one of a gate electrode and a source electrode of the transistor.02-03-2011
20110024761INTERCONNECTION STRUCTURE, A THIN FILM TRANSISTOR SUBSTRATE, AND A MANUFACTURING METHOD THEREOF, AS WELL AS A DISPLAY DEVICE - Provided is a direct contact technology by which a barrier metal layer between an Al alloy interconnection composed of pure Al or an Al alloy and a semiconductor layer can be eliminated and the Al alloy interconnection can be directly and surely connected to the semiconductor layer within a wide process margin. In an interconnection structure, the semiconductor layer, and the Al alloy film composed of the pure Al or the Al alloy are provided on the substrate in this order from the substrate side. A multilayer structure of an (N, C, F) layer containing at least one type of an element selected from among a group composed of nitrogen, carbon and fluorine, and an Al—Si diffusion layer containing Al and Si is included in this order from the substrate side, between the semiconductor layer and the Al alloy film. At least the one type of the element, i.e., nitrogen, carbon or fluorine contained in the (N, C, F) layer is bonded with Si contained in the semiconductor layer.02-03-2011
20120032173TOP GATE THIN FILM TRANSISTOR AND DISPLAY APPARATUS INCLUDING THE SAME - Provided is a top gate thin film transistor, including on a substrate: a source electrode layer; a drain electrode layer; an oxide semiconductor layer; a gate insulating layer; a gate electrode layer including an amorphous oxide semiconductor containing at least one kind of element selected from among In, Ga, Zn, and Sn; and a protective layer containing hydrogen, in which: the gate insulating layer is formed on a channel region of the oxide semiconductor layer; the gate electrode layer is formed on the gate insulating layer; and the protective layer is formed on the gate electrode layer.02-09-2012
20120032180THIN-FILM TRANSISTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - In the thin-film transistor device: the stacked thickness of either a source electrode or a drain electrode and a corresponding one of silicon layers is the same value or a value close to the same value as the stacked thickness of a first channel layer and a second channel layer; the stacked thickness of the first channel layer and the second channel layer is the same in a region between the source electrode and the drain electrode and above the source electrode and the drain electrode; the first channel layer and the second channel layer are sunken in the region between the source electrode and the drain electrode, following a shape between the source electrode and the drain electrode; and the gate electrode has one region overlapping with the source electrode and an other region overlapping with the drain electrode.02-09-2012
20090065778Active Matrix Substrate, Display Apparatus, and Television Receiver - An active matrix substrate of the present invention is arranged so that each pixel area has a transistor and a capacity electrode which is able to function as an electrode of a capacity. The active matrix substrate includes a conductor which is provided in a layer below the capacity electrode and is able to function as the other electrode of the capacity. The gate electrode of each transistor and a gate insulating film covering the conductor have a thin section with reduced thickness, in an on-conductor area overlapping the conductor. At least a part of the thin section overlaps the capacity electrode. In this way, the active matrix substrate which can reduce inconsistency in capacitance values of capacities (e.g. a storage capacitor, a capacity for controlling an electric potential of a pixel electrode, and a capacity which can function as both of them) provided in the substrate.03-12-2009
20090065777Display Device and Manufacturing Method Therefor - In a display device of the present invention which forms thin film transistors on a substrate, the thin film transistor comprises: a silicon nitride film which is formed on the substrate in a state that the silicon nitride film covers a gate electrode; a silicon oxide film which is selectively formed on the silicon nitride film; a semiconductor layer which is formed at least on an upper surface of the silicon oxide film and includes a pseudo single crystal layer or a polycrystalline layer; and a drain electrode and a source electrode which are formed on an upper surface of the semiconductor layer by way of a contact layer, wherein either one of the pseudo single crystal layer and the poly-crystalline layer is formed by crystallizing the amorphous silicon layer, and a peripheral-side wall surface of the pseudo single crystal layer or the polycrystalline layer is contiguously constituted with a peripheral-side wall surface of the silicon oxide film below the pseudo single crystal layer or the polycrystalline layer without a stepped portion.03-12-2009
20110031499SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - An object is to provide a semiconductor device in which characteristics of a driver circuit portion are improved while the aperture ratio of a pixel portion is increased. Alternatively, it is an object to provide a semiconductor device with low power consumption or to provide a semiconductor device in which the threshold voltage of a transistor can be controlled. The semiconductor device includes a substrate having an insulating surface, a pixel portion provided over the substrate, and at least some of driver circuits for driving the pixel portion. A transistor included in the pixel portion and a transistor included in the driver circuit are top-gate bottom-contact transistors. Electrodes and a semiconductor layer of the transistor in the pixel portion have light-transmitting properties. The resistance of electrodes in the driver circuit is lower than the electrodes included in the transistor in the pixel portion.02-10-2011
20110031501DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE - According to one feature of the present invention, a display device is manufactured according to the steps of forming a semiconductor layer; forming a gate insulating layer over the semiconductor layer; forming a gate electrode layer over the gate insulating layer; forming source and drain electrode layers in contact with the semiconductor layer; forming a first electrode layer electrically connected to the source or drain electrode layer; forming an inorganic insulating layer over part of the first electrode layer, the gate electrode layer, the source electrode layer, and the drain electrode layer; subjecting the inorganic insulating layer and the first electrode layer to plasma treatment; forming an electroluminescent layer over the inorganic insulating layer and the first electrode layer which are subjected to plasma treatment; and forming a second electrode layer over the electroluminescent layer.02-10-2011
20090026454Display device - To provide a display device including a protection circuit having a thin film transistor which has small size and high withstand voltage. In the protection circuit of the display device, a thin film transistor is used in which an amorphous semiconductor layer, a microcrystalline semiconductor layer, a gate insulating layer which is in contact with the microcrystalline semiconductor layer, and a gate electrode layer overlap with each other. Since current drive capability of the microcrystalline semiconductor layer is high, the size of the transistor can be made small. In addition, the amorphous semiconductor layer is included, so that the withstand voltage can be improved. Here, the display device is a liquid crystal display device or a light-emitting device.01-29-2009
20110031497SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - One object of the present invention is to increase an aperture ratio of a semiconductor device. A pixel portion and a driver circuit are provided over one substrate. The first thin film transistor (TFT) in the pixel portion includes: a gate electrode layer over the substrate; a gate insulating layer over the gate electrode layer; an oxide semiconductor layer over the gate insulating layer; source and drain electrode layers over the oxide semiconductor layer; over the gate insulating layer, the oxide semiconductor layer, the source and drain electrode layers, a protective insulating layer which is in contact with part of the oxide semiconductor layer; and a pixel electrode layer over the protective insulating layer. The pixel portion has light-transmitting properties. Further, a material of source and drain electrode layers of a second TFT in the driver circuit is different from a material of those of the first TFT.02-10-2011
20110031496LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF - A light-emitting device in which plural kinds of circuits are formed over one substrate and plural kinds of thin film transistors in accordance with characteristics of the plural kinds of circuits are included. An inverted-coplanar thin film transistor including an oxide semiconductor layer which overlaps a source and drain electrode layers is used as a thin film transistor for a pixel, a channel-stop thin film transistor is used as a thin film transistor for a driver circuit, and a color filter layer is provided between the thin film transistor for a pixel and a light-emitting element so as to overlap the light-emitting element which is electrically connected to the thin film transistor for a pixel.02-10-2011
20110031500ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS - An organic light emitting display apparatus capable of preventing or reducing an IR drop and a decrease in a contrast ratio, and a method of manufacturing the same. The organic light emitting display apparatus includes: a substrate; a plurality of thin film transistors on the substrate; a plurality of organic light emitting diodes, each of the organic light emitting diodes including: a pixel electrode electrically connected to a corresponding one of the thin film transistors, a portion of an opposite electrode, the opposite electrode being above the substrate and covering all of the substrate, and an intermediate layer between the pixel electrode and the opposite electrode and comprising at least an organic light emitting layer; an opposite electrode bus line between adjacent pixel electrodes of the organic light emitting diodes on the opposite electrode of the organic light emitting diodes; and a black matrix surrounding the opposite electrode bus line.02-10-2011
20110057189DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A display device includes a lower panel including a lower substrate and a pixel transistor formed on the lower substrate; and an upper panel facing the lower panel, and including an upper substrate, a sensing transistor formed on the upper substrate, and a readout transistor connected to the sensing transistor and transmitting a signal. The readout transistor includes a first lower gate electrode formed on the upper substrate, a first semiconductor layer formed on the first lower gate electrode and overlaps the first gate electrode, and a first source electrode and a first drain electrode disposed on the first semiconductor layer. The sensing transistor includes a light blocking film disposed on the upper substrate, a second lower gate electrode contacting the light blocking film on the light blocking film, a second semiconductor layer overlapping the light blocking film on the second lower gate electrode, a second source electrode and a second drain electrode formed on the second semiconductor layer, and a second upper gate electrode overlapping the second semiconductor layer on the second source electrode and the second drain electrode.03-10-2011
20110114957THIN FILM TRANSISTOR AND ORGANIC LIGHT EMITTING DISPLAY APPARATUS - A thin film transistor (TFT) and an organic light emitting display apparatus are provided. The TFT includes: a substrate; a gate electrode on the substrate; an active layer insulated from the gate electrode; source/drain electrodes electrically connected to the active layer; a first insulating film on the source/drain electrodes; a light blocking layer on the first insulating film; and a second insulating film on the light blocking layer.05-19-2011
20110114954ORGANIC LIGHT EMITTING DISPLAY APPARATUS - An organic light emitting display apparatus is disclosed. The organic light emitting display apparatus includes: a substrate, a seal facing the substrate, bonded to the substrate, a display area disposed on the substrate configured to produce an image, a pad area disposed on the substrate, present on at least one side of the display area, an insulating layer directly extending from the display area, formed on the pad area, a first adhesive layer surrounding the display area, which bonds the substrate to the seal, and comprising an organic material, and a second adhesive layer insulated from the pad area by the insulating layer, disposed outside the first adhesive layer, which bonds the substrate to the seal.05-19-2011
20130153906THIN FILM TRANSISTOR ARRAY PANEL HAVING IMPROVED STORAGE CAPACITANCE AND MANUFACTURING METHOD THEREOF - A thin film transistor array panel is provided, which includes a gate line, a data line intersecting the gate line, a storage electrode apart from the gate and data lines, a thin film transistor connected to the gate and data lines and having a drain electrode, a pixel electrode connected to the drain electrode, a first insulating layer over the thin film transistor and disposed under the pixel electrode, and a second insulating layer disposed on the first insulating layer and having an opening exposing the first insulating layer on the storage electrode.06-20-2013
20110114955ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a liquid crystal display device includes first and second lines on a substrate and spaced apart from each other, the first and second lines formed of a first metallic material; a gate electrode connected to the first line; a gate insulating layer on the first and second lines and the gate electrode and including a groove, the groove exposing the substrate and positioned between the first and second lines; a semiconductor layer on the gate insulating layer and corresponding to the gate electrode; a data line crossing the first and second lines and on the gate insulating layer; a source electrode on the semiconductor layer and connected to the data line; a drain electrode on the semiconductor layer and spaced apart from the source electrode; a passivation layer on the data line, the source electrode and the drain electrode and including an opening, the opening exposing a portion of the gate insulating layer and an end of the drain electrode; and a pixel electrode positioned on the gate insulating layer and in the opening, the pixel electrode contacting the end of the drain electrode.05-19-2011
20110114956Organic Light Emitting Display Apparatus and Method of Manufacturing the Same - An organic light emitting display apparatus and a method of manufacturing the organic light emitting display apparatus, whereby the manufacturing process is simplified and the electric characteristics of the organic light emitting display apparatus are improved. The organic light emitting display apparatus includes: a gate electrode that includes a first conductive layer including ITO, a second conductive layer on the first conductive layer, a third conductive layer on the second conductive layer and including ITO, and a fourth conductive layer on the third conductive layer and including IZO or AZO; and a pixel electrode formed in the same layer level as the gate electrode and including a first electrode layer that includes ITO, a second electrode layer on the first electrode layer, a third electrode layer on the second electrode layer and including ITO, and a fourth electrode layer on the third electrode layer and including IZO or AZO.05-19-2011
20110114958LIQUID CRYSTAL DISPLAY AND THIN FILM TRANSISTOR ARRAY PANEL USABLE WITH THE LIQUID CRYSTAL DISPLAY - A liquid crystal display with improved viewing angle and uncompromised transmittance is provided, along with a thin film transistor (TFT) array panel usable for such liquid crystal display. The TFT array panel includes a substrate, a plurality of gate lines formed on the substrate, a plurality of data lines formed on the substrate and intersecting the gate lines, and a plurality of thin film transistors. Each of the thin film transistors includes a gate electrode connected to one of the gate lines, a source electrode connected to one of the data lines, and a drain electrode. The TFT array panel also includes a plurality of pixel electrodes, each of the pixel electrodes connected to one of the drain electrodes and having a pair of oblique edges parallel to each other, and covering at least a portion of the drain electrodes.05-19-2011
20110121301ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display device having a uniform thin film in a pixel region, and a method of manufacturing the organic light emitting display device. The organic light emitting display device includes a substrate, a pixel electrode disposed on the substrate, and a pixel define layer disposed on the substrate and having an opening exposing the pixel electrode. The entire top surface of the pixel electrode is exposed through the opening.05-26-2011
20110079782DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE, AND DISPLAY DEVICE HAVING THE DISPLAY SUBSTRATE - A display substrate includes a base substrate, a first dielectric layer, a first lattice pattern, a second lattice pattern, and a second dielectric layer. The first lattice pattern is disposed on the first dielectric layer at a first color pixel region. The first lattice pattern includes a plurality of first nano metal wires. The second lattice pattern is disposed on the first dielectric layer at a second color pixel region. The second lattice pattern includes a plurality of second nano metal wires. The second nano metal wires have different dimensions from the first nano metal wires. The second dielectric layer covers the first nano metal wires and the second nano metal wires.04-07-2011
20110084280THIN FILM TRANSISTOR SUBSTRATE, THIN FILM TRANSISTOR TYPE LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE - There are provided: a thin film transistor substrate provided with an amorphous transparent conductive film in which residue due to etching hardly occurs; a liquid crystal display device which utilizes the thin film transistor substrate; and a method for manufacturing a thin film transistor substrate in which the thin film transistor substrate can be efficiently obtained.04-14-2011
20110084282LIQUID CRYSTAL DISPLAY DEVICE HAVING LIGHT BLOCKING LINE DISPOSED ON SAME LAYER AS GATE LINE - Active matrix display devices having improved opening and contrast ratios utilize light blocking lines to improve display contrast ratios yet position the light blocking lines on the same level of metallization as the gate lines to thereby limit parasitic capacitive coupling between the data lines and the pixel electrodes. The light blocking lines are also positioned on only one side of the data lines so that improvements in the display's opening ratio can also be achieved. The light blocking lines are preferably patterned so that no overlap occurs between a display's data lines and the light blocking lines. The elimination of overlap reduces the step height in the display's pixel electrodes and thereby reduces the extent of disclination of the liquid crystal molecules in the liquid crystal material extending opposite the pixel electrodes. The light blocking lines are also preferably patterned beneath the display's data lines so that parasitic capacitive coupling between the data lines and the pixel electrodes is reduced. The light blocking lines are also preferably formed with beveled edges so that the step height in the display's pixel electrodes can be reduced even further.04-14-2011
20100140623ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a display device includes: a substrate; a gate electrode on the substrate; a gate insulating layer on the gate electrode, the gate insulating layer having an organic-inorganic hybrid material; a semiconductor layer on the gate insulating layer over the gate electrode; source and drain electrodes spaced apart from each other on the semiconductor layer; a passivation layer on the source and drain electrodes, the passivation layer having a drain contact hole exposing the drain electrode; and a pixel electrode on the passivation layer, the pixel electrode connected to the drain electrode through the drain contact hole.06-10-2010
20090032818THIN FILM TRANSISTOR ARRAY PANEL AND LIQUID CRYSTAL DISPLAY INCLUDING THE PANEL - A gate wire including a gate line and a gate electrode is formed on an insulating substrate of a TFT array panel. A semiconductor pattern made of amorphous silicon is formed on the gate insulating layer covering the gate wire. A data wire including a data line, a source electrode, and a drain electrode is formed on the semiconductor pattern or the gate insulating layer covering the gate wire. A part of the semiconductor pattern extends under the data line, and a light blocking member overlapping the semiconductor pattern under the data line is formed using the same layer as the gate wire. The light blocking member is to prevent light incident upon the substrate from a backlight from entering the amorphous silicon layers; therefore, the stripes of different brightness and waterfall phenomenon in which the stripes move up and down can be removed in an LCD using a backlight driven by a rectangular wave of ON/OFF signals outputted from inverter.02-05-2009
20100163883MANUFACTURING METHOD OF ELECTRO LINE FOR LIQUID CRYSTAL DISPLAY DEVICE - A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.07-01-2010
20100163880THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel comprises a repair line disposed in a peripheral area of a display area and being configured to repair when at least one of a gate line and a data line are disconnected, and a detour line disposed in the peripheral area and comprising at least one resistor having higher resistance than a remaining portion of the detour line, wherein both ends of the detour line are connected to the repair line to protect the array panel.07-01-2010
20100163878ACTIVE MATRIX DISPLAYS AND OTHER ELECTRONIC DEVICES HAVING PLASTIC SUBSTRATES - A method of manufacturing a thin film electronic device comprises applying a plastic coating to a rigid carrier substrate using a wet casting process, the plastic coating forming a plastic substrate and comprising a transparent plastic material and a UV absorbing additive. Thin film electronic elements are formed over the plastic substrate, and the rigid carrier substrate is released from the plastic substrate. This invention provides a method of making transparent substrate materials suitable for a laser release process, through doping of the plastic material of the substrate with a UV absorber. This UV absorber absorbs in the wavelength the lift-off laser (for example 308-351 nm, or 355 nm) with a very high absorption.07-01-2010
20100032672BONDING PAD, ACTIVE DEVICE ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL - A bonding pad includes a metal layer, a gate insulting layer, a passivation layer, and a transparent conductive layer. The metal layer has a first metal pattern and a second metal pattern which are separated from each other. The gate insulating layer covers the metal layer, and the passivation layer covers the gate insulating layer. The gate insulating layer and the passivation layer have a first contact opening and a second contact opening respectively exposing a portion of the first metal pattern and a portion of the second metal pattern. The transparent conductive layer covers the passivation layer and fills the first and second contact openings. The transparent conductive layer on the second contact opening serves as a testing-probe contact area. The present invention also provides an active device array substrate having the bonding pad.02-11-2010
20110079785THIN FILM TRANSISTOR SUBSTRATE - A thin film transistor (TFT) substrate includes: a plurality of gate wirings; a plurality of data wirings insulatedly crossing the gate wirings to define a plurality of pixels; a plurality of common voltage lines formed along edges of pixels and mutually connected in an extending direction of the gate wirings; and a plurality of common electrodes formed at the pixel such that the plurality of common electrodes partially overlap with the common voltage line and mutually connected in an extending direction of the data wirings. A uniform common voltage can be stably applied on the entire surface of the TFT substrate.04-07-2011
20100219413METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE - An object is to provide a method for manufacturing a highly-reliable semiconductor device with an improved material use efficiency and with a simplified manufacturing process. The method includes the steps of forming a conductive layer over a substrate, forming a light-transmitting layer over the conductive layer, and selectively removing the conductive layer and the light-transmitting layer by irradiation with a femtosecond laser beam from above the light-transmitting layer. Note that the conductive layer and the light-transmitting layer may be removed so that an end portion of the light-transmitting layer is located on an inner side than an end portion of the conductive layer. Before the irradiation with a femtosecond laser beam, a surface of the light-transmitting layer may be subjected to liquid-repellent treatment.09-02-2010
20100219412DISPLAY DEVICE WITH IMPROVED PIXEL LIGHT EMISSION AND MANUFACTURING METHOD OF THE SAME - A display device with pixels capable of uniform light emission and a method of making the display device are presented. A display device has a plurality of TFTs, a protection layer formed on the TFTs, and a plurality of pixel electrodes formed on the protection layer and electrically connected to the TFTs. A wall is formed around the pixel electrode and at least a portion of the wall is spaced from the pixel electrode. A light emitting layer is formed between the wall and another wall.09-02-2010
20110241008SEMICONDUCTOR DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor display device with an interlayer insulating film in which surface levelness is ensured with a limited film formation time, heat treatment for removing moisture does not take long, and moisture in the interlayer insulating film is prevented from escaping into a film or electrode adjacent to the interlayer insulating film. A TFT is formed and then a nitrogen-containing inorganic insulating film that transmits less moisture compared to organic resin film is formed so as to cover the TFT. Next, organic resin including photosensitive acrylic resin is applied and an opening is formed by partially exposing the organic resin film to light. The organic resin film where the opening is foamed, is then covered with a nitrogen-containing inorganic insulating film which transmits less moisture than organic resin film does. Thereafter, the gate insulating film and the two layers of the nitrogen-containing inorganic insulating films are partially etched away in the opening of the organic resin film to expose the active layer of the TFT.10-06-2011
20110241007LIGHT-EMITTING ELEMENT, DISPLAY DEVICE, AND ELECTRONIC APPLIANCE - The present invention provides a light-emitting element having a structure in which the drive voltage is comparatively low and a light-emitting element in which the increase in the drive voltage over time is small. Further, the present invention provides a display device in which the drive voltage and the increase in the drive voltage over time are small and which can resist long-term use. A layer in contact with an electrode in a light-emitting element is a layer containing a P-type semiconductor or a hole-generating layer such as an organic compound layer containing a material having electron-accepting properties. The light-emitting layer is sandwiched between the hole-generating layers, and an electron-generating layer is sandwiched between the light-emitting layer and the hole-generating layer on a cathode side.10-06-2011
20110241006SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING SAME - Provided is a liquid crystal display device (10-06-2011
20110241004ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS - A semiconductor layer of a TFT is continuously formed from an inside of an open hole portion overlapping with an intersection up to an outside of the open hole portion and includes a first source/drain area electrically connected to a surface portion of the data line exposed to a bottom surface of the open hole portion, a channel area disposed on a side wall of the open hole portion, and a second source/drain area formed outside the open hole portion and electrically connected to the pixel electrode. The gate electrode of the TFT is formed inside the open hole portion so as to overlap with at least the channel area and is electrically connected to a scanning line.10-06-2011
20110241001DISPLAY APPARATUS, METHOD OF MANUFACTURING DISPLAY APPARATUS, AND ELECTRONIC APPARATUS - A display apparatus includes a plurality of pixels each including an electro-optic element, a writing transistor writing a video signal into the pixel, a holding capacitor holding the video signal written by the writing transistor, and a driving transistor driving the electro-optic element based on the video signal held in the holding capacitor. The driving transistor includes a channel region, a gate electrode disposed opposite to the channel region, a first source/drain region closer to a power source, a second source/drain region closer to the electro-optic element, and impurity regions disposed between the channel region and the first and second source/drain regions and having a lower concentration than that of the corresponding source/drain region. The impurity region disposed between the channel region and the first source/drain region is formed in a region other than a region facing the gate electrode.10-06-2011
20100193790FLAT PANEL DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A flat panel display apparatus that can be manufactured with less patterning operations using a mask, and a method of manufacturing the same, the flat panel display apparatus including a substrate; an active layer of a thin film transistor (TFT); a first bottom electrode and a first top electrode of a capacitor; a first insulation layer formed on the substrate; a gate bottom electrode and a gate top electrode corresponding to the channel region; a second bottom electrode and a second top electrode of the capacitor; a pixel bottom electrode and a pixel top electrode; a second insulation layer formed on the gate electrode, the second electrode of the capacitor, and the pixel top electrode; and a source electrode and a drain electrode formed on the second insulation layer.08-05-2010
20110084278THIN FILM TRANSISTOR AND METHOD FOR FABRICATING THE SAME - The present invention relates to a thin-film transistor in a liquid crystal display device and a method of fabricating the same, and the thin-film transistor may be configured by including a first gate electrode formed on an insulating substrate; a first gate insulation film formed on the insulating substrate including the first gate electrode; an active layer formed on the first gate insulation film; source/drain electrodes formed on the active layer and arranged at both sides of the first gate electrode; a second gate insulation film formed on the active layer and the first gate insulation film including the source/drain electrodes and provided with a contact hole for exposing part of the drain electrode; a second gate electrode overlapped with the first gate electrode on the second gate insulation film; and a pixel electrode electrically connected to the drain electrode through the contact hole.04-14-2011
20110084281LIGHT EMITTING DEVICE AND ELECTRONIC EQUIPMENT - A display device capable of keeping the luminance constant irrespective of temperature change is provided as well as a method of driving the display device. A current mirror circuit composed of transistors is placed in each pixel. A first transistor and a second transistor of the current mirror circuit are connected such that the drain current of the first transistor is kept in proportion to the drain current of the second transistor irrespective of the load resistance value. The drain current of the first transistor is controlled by a driving circuit in accordance with a video signal and the drain current of the second transistor is caused to flow into an OLED, thereby controlling the OLED drive current and the luminance of the OLED.04-14-2011
20110210334ELECTRONIC DEVICE, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - The present invention provides a manufacturing process using a droplet-discharging method that is suitable for manufacturing a large substrate in mass production. A photosensitive material solution of a conductive film is selectively discharged by a droplet-discharging method, selectively exposed to laser light, and developed or etched, thereby allowing only the region exposed to laser light to be left and realizing a source wiring and a drain wiring having a more microscopic pattern than the pattern itself formed by discharging. One feature of the source wiring and the drain wiring is that the source wiring and the drain wiring cross an island-like semiconductor layer and overlap it.09-01-2011
20110241002SEMICONDUCTOR DEVICE, LIGHT EMITTING APPARATUS AND ELECTRONIC DEVICE - Disclosed in a semiconductor device including a substrate, a first transistor, a second transistor, and a first source electrode and a first drain electrode of the first transistor are arranged along a first direction and a second source electrode and a second drain electrode of the second transistor are arranged in a reverse order of the first source electrode and the first drain electrode along the first direction, the first source electrode and the second source electrode are connected by a source connecting wiring, the first drain electrode and the second drain electrode are connected by a drain connecting wiring, a first gate electrode and a second gate electrode are connected by a gate connecting wiring and the source connecting wiring and the drain connecting wiring are provided at positions except a region overlapped with the first gate electrode, the second gate electrode and the gate connecting wiring.10-06-2011
20110241000Organic light-emitting display apparatus and method of manufacturing the same - An organic light-emitting display apparatus includes a planarization layer, a plurality of group electrode layers having different numbers of layers on the planarization layer and including a first group electrode layer having a metal layer, a reflective layer, a first transparent conductive layer, a second transparent conductive layer, and a third transparent conductive layer sequentially stacked, a second group electrode layer having the metal layer, the reflective layer, the first transparent conductive layer, and the third transparent conductive layer sequentially stacked, and a third group electrode layer having the metal layer, the reflective layer, and the first transparent conductive layer sequentially stacked, an intermediate layer on the first group electrode layer, the second group electrode layer, and the third group electrode layer, and including at least one organic light-emitting layer, and a second electrode layer on the intermediate layer.10-06-2011
20100012941THIN FILM TRANSISTOR ARRAY PANEL FOR LIQUID CRYSTAL DISPLAY HAVING PIXEL ELECTRODE - A TFT array panel includes an insulating substrate, a gate line and a storage electrode line formed thereon. The gate line and the storage electrode line are covered with a gate insulating layer, and a semiconductor island is formed on the gate insulating layer. A pair of ohmic contacts are formed on the semiconductor island, and a data line and a drain electrode are formed thereon. The data line and the drain electrode are covered with a passivation layer having a contact hole exposing the drain electrode. A pixel electrode is formed on the passivation layer and connected to the drain electrode through the contact hole. The TFT array panel is covered with an alignment layer rubbed approximately in a direction from the upper left corner to the lower right corner of the TFT array panel or the pixel electrodes. The pixel electrode has approximately a rectangular shape and overlaps the gate line and the data line. The pixel electrode has an expansion located near the upper left corner of the pixel electrode to increase the width of the corresponding overlapping area between the pixel electrode and the gate line and/or the data line.01-21-2010
20110147749TRANSFLECTIVE LIQUID CRYSTAL DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - A method for manufacturing a transflective liquid crystal display panel includes providing an array substrate having a plurality of pixel regions, each of the pixel regions includes a device region, a transmission region and a reflection region defined therein; forming a first metal layer on the array substrate; patterning the first metal layer to simultaneously form a gate electrode in the device region and a plurality of metal bumps in the reflection region; forming a first insulating layer having a rough surface and covering the gate electrode and the metal bumps on the array substrate; forming a patterned semiconductor layer on the gate electrode; forming a reflective layer covering the first insulating layer and having a rough surface in the reflection region; and sequentially forming a patterned second insulating layer and a transparent pixel electrode on the array substrate.06-23-2011
20100181569DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - A display device for preventing misalignment of data lines and pixel electrodes, and a manufacturing method of the display device are provided. The display device includes an insulation substrate, line wiring formed on the insulation substrate, an organic insulating pattern covering the top surface and side surfaces of a portion of the line wiring, a first insulating layer formed on the organic insulating pattern and the insulation substrate, and transparent conductive patterns formed on the first insulating layer, wherein boundaries of the transparent conductive patterns are positioned on inclined surfaces of the first insulating layer in a portion thereof corresponding to the organic insulating pattern.07-22-2010
20110084279Organic light emitting diode display - An organic light emitting diode display that includes a first electrode arranged on a substrate, an organic emission layer arranged on the first electrode and a second electrode arranged on the organic emission layer, the first electrode includes a first layer, a second layer and a third layer stacked sequentially on the organic emission layer, the second layer has a lower work function than the third. Here, the second layer has a higher work function than that of the third layer.04-14-2011
20100038646METHOD OF MANUFACTURING THIN FILM TRANSISTOR, THIN FILM TRANSISTOR, AND DISPLAY UNIT - A thin film transistor having a crystalline silicon film that is formed over an insulating substrate with a gate electrode and a gate insulating film in between, and has a channel region in a region corresponding to the gate electrode; an insulating channel protective film that is selectively formed in a region corresponding to the channel region on the crystalline silicon film; an n+ silicon film having a source region and a drain region that sandwich a region corresponding to the channel region on the channel protective film and the crystalline silicon film; and a metal film having a source electrode and a drain electrode that respectively correspond to the source region and the drain region.02-18-2010
20090218569Display device - The present invention realizes a display device with dummy pixel portions and a frame region required for the dummy pixel portions and code notation, in which the frame region is minimized while achieving code notation in required size.09-03-2009
20090218573Electric Device - There is provided an electric device which can prevent a deterioration in a frequency characteristic due to a large electric power external switch connected to an opposite electrode and can prevent a decrease in the number of gradations. The electric device includes a plurality of source signal lines, a plurality of gate signal lines, a plurality of power source supply lines, a plurality of power source control lines, and a plurality of pixels. Each of the plurality of pixels includes a switching TFT, an EL driving TFT, a power source controlling TFT, and an EL element, and the power source controlling TFT controls a potential difference between a cathode and an anode of the EL element.09-03-2009
20090218572THIN-FILM TRANSISTOR AND DISPLAY DEVICE - A thin-film transistor in which problems with ON-state current and OFF-state current are solved, and a thin-film transistor capable of high-speed operation. The thin-film transistor includes a pair of impurity semiconductor layers in which an impurity element imparting one conductivity type is added to form a source and drain regions, provided with a space therebetween so as to be overlapped with a gate electrode with a gate insulating layer interposed between the gate electrode and the impurity semiconductor layers; a pair of semiconductor layers in which an impurity element which serves as an acceptor is added, overlapped over the gate insulating layers with the gate electrode and the impurity semiconductor layers, and disposed with a space therebetween in a channel length direction; and an amorphous semiconductor layer being in contact with the gate insulating layer and the pair of semiconductor layers and extended between the pair of semiconductor layers.09-03-2009
20090218571ACTIVE DEVICE ARRAY SUBSTRATE AND FABRICATION METHOD THEREOF - A fabrication method of an active device array substrate is disclosed. A first metal material layer, a gate insulation material layer, a channel material layer, a second metal material layer, and a first photoresist layer are formed over a substrate sequentially. The first photoresist layer is patterned with a multi-tone mask to form a first patterned photoresist layer with two thicknesses. A first and second removing processes are performed sequentially using the first patterned photoresist layer as a mask to form a gate, a gate insulation layer, a channel layer, and a source/drain. The first patterned photoresist layer is removed. A passivation layer and a second patterned photoresist layer are formed over the substrate. A third removing process is performed to form a plurality of contact holes. A pixel electrode material layer is formed over the substrate. The second patterned photoresist layer is lifted off to form a pixel electrode.09-03-2009
20090218570THIN FILM TRANSISTOR AND FLAT PANEL DISPLAY DEVICE INCLUDING THE SAME - A thin film transistor includes a channel layer including an amorphous 12CaO.7Al09-03-2009
20090039352Display device and electronic device having the display device, and method for manufacturing thereof - To provide a display device including a thin film transistor in which high electric characteristics and reduction in off-current can be achieved. The display device having a thin film transistor includes a substrate, a gate electrode provided over the substrate, a gate insulating film provided over the gate electrode, a microcrystalline semiconductor film provided over the gate electrode with the gate insulating film interposed therebetween, a channel protection layer which is provided over and in contact with the microcrystalline semiconductor film, an amorphous semiconductor film provided over the gate insulating film and on a side surface of the microcrystalline semiconductor film and the channel protection layer, an impurity semiconductor layer provided over the amorphous semiconductor film, and a source electrode and a drain electrode provided over and in contact with the impurity semiconductor layer. The thickness of the amorphous semiconductor film is larger than that of the microcrystalline semiconductor film.02-12-2009
20090039349Manufacturing method of semiconductor device, manufacturing method of display device, semiconductor device, display device, and electronic device - A method for manufacturing a semiconductor device provided with a circuit capable of high speed operation while the manufacturing cost is reduced. A method for manufacturing a semiconductor device which includes forming an ion-doped layer at a predetermined depth from a surface of a single-crystal semiconductor substrate and forming a first insulating layer over the single-crystal semiconductor substrate; forming a second insulating layer over part of an insulating substrate and forming a non-single-crystal semiconductor layer over the second insulating layer; bonding the single-crystal semiconductor substrate to a region of the insulating substrate where the second insulating layer is not formed, with the first insulating layer interposed therebetween; and forming a single-crystal semiconductor layer over the insulating substrate by separating the single-crystal semiconductor substrate at the ion-doped layer which acts as a separation surface so that the ion-doped layer is separated from the insulating substrate.02-12-2009
20090321740TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A TFT-LCD array substrate and a manufacturing method thereof. The array substrate comprises a gate line, a data line, and a pixel electrode, and the pixel electrode is disposed in a pixel region defined by the intersection between the gate line and the data line. In the pixel region, a partition groove for forming a pixel electrode pattern is provided at the periphery of the pixel electrode. This structure is helpful to form a pixel electrode pattern by a lift-off process, which significantly reduces the production cost and improves the production yield.12-31-2009
20100012938Thin film transistor substrate and method for manufacturing same - A thin film transistor (TFT) substrate includes gate lines, data lines intersecting with the gate lines, a plurality of TFTs, pixel electrodes, and a common electrode insulating the gate lines, the data lines, the TFTs, and the pixel electrode. Each pixel electrode is connected to one of the gate lines and one of the data lines via one of the TFTs. A layer stack including an insulating layer and a passivation layer is sandwiched between the pixel electrodes and the common electrode.01-21-2010
20100012937THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a TFT array substrate including the following steps is provided. A substrate having a pixel region and a photosensitive region is provided. A first patterned conductive layer is formed on the substrate, wherein the first patterned conductive layer includes a gate electrode disposed in the pixel region and a first electrode disposed in the photosensitive region, and a photosensitive dielectric layer is formed on the first electrode. A gate insulation layer is formed to cover the gate electrode, the photosensitive dielectric layer and the first electrode. A patterned semiconductor layer is formed on the gate insulation layer above the gate electrode. A source electrode and a drain electrode are formed on the patterned semiconductor layer at two sides of the gate electrode, wherein the gate electrode, the source electrode, and the drain electrode constitute a TFT. A second electrode is formed on the photosensitive dielectric layer.01-21-2010
20100012940Image Display Device and Manufacturing Method for the Same - Provided is an image display device comprising, on a TFT substrate: a plurality of gate lines and a plurality of drain lines which intersect with each other; a pixel TFT provided within a pixel which is enclosed by a pair of adjacent gate lines and a pair of adjacent drain lines; a gate driver TFT which is connected to one of the plurality of gate lines to drive the one of the plurality of gate lines, wherein the pixel TFT and the gate driver TFT each include an amorphous semiconductor film as a channel, wherein the pixel TFT has a bottom gate structure, wherein the gate driver TFT has a dual gate structure, and wherein a mobility on a top surface side of the semiconductor film of the gate driver TFT is higher than a mobility on a top surface side of the semiconductor film of the pixel TFT.01-21-2010
20100012939INTERCONNECTION STRUCTURE BETWEEN SIGNAL LINE AND THIN FILM TRANSISTER - A liquid crystal display device achieving high aperture rate and high definition is disclosed. The liquid crystal display device comprises a plurality of scanning lines 01-21-2010
20100038642THIN FILM TRANSISTOR ARRAY PANEL AND METHOD OF MANUFACTURING THE SAME - A thin film transistor (TFT) array panel includes a substrate, a first signal line disposed on the substrate, a first insulating layer disposed on the first signal line, a second signal line disposed on the first insulating layer, a second insulating layer disposed on the second signal line, the second insulating layer comprising an organic layer, a connection bridge disposed on the second insulating layer, the connection bridge connecting the first signal line with the second signal line, an overcoat disposed on the connection bridge, a first contact hole formed in the first and second insulating layers, the first contact hole exposing a portion of the first signal line, and a second contact hole formed in the second insulating layer, the second contact hole exposing a portion of the second signal line, wherein the connection bridge connects the first and second signal lines through the first and second contact holes.02-18-2010
20100038644THIN FILM TRANSISTOR DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME - A thin film transistor display panel includes an insulating substrate, gate lines and data lines disposed intersecting each other on the insulating substrate so as to be electrically insulated from each other, common lines provided on the insulating substrate in parallel to the gate lines, a gate insulating film disposed on the gate lines and the common lines, contact holes disposed passing through the gate insulating film disposed on the common lines, a plurality of common electrodes electrically connected to the common lines through the contact holes and arranged in parallel to each other, and a plurality of pixel electrodes arranged in parallel to the common electrodes. The thickness of the common electrode and the pixel electrode is smaller than that of the data line.02-18-2010
20100038645Display Element and Method of Manufacturing the Same - A display element and a method of manufacturing the same are provided. The method comprises the following steps: forming a first patterned conducting layer with a gate on a substrate and a dielectric layer thereon; forming a patterned semiconductor layer on the dielectric layer, wherein the patterned semiconductor layer has a channel region, a source and a drain, and wherein the source and the drain lie on the opposite sides of the channel region; selectively depositing a barrier layer, which only wraps the patterned semiconductor layer; forming a second patterned conducting layer on the barrier layer and above the source and the drain. In the display element manufactured by the method, the barrier layer only wraps the patterned semiconductor layer.02-18-2010
20110175094Organic light emitting diode display - An organic light emitting diode display includes a display substrate, a sealing member disposed to face the display substrate, a sealant disposed between the display substrate and the sealing member, the sealant being configured to attach the display substrate and the sealing member to each other, a plurality of conductive wires on the display substrate, the conductive wires overlapping the sealant, and at least one short-circuit blocking layer between the conductive wires.07-21-2011
20120241745DISPLAY DEVICE, MANUFACTURING METHOD OF DISPLAY DEVICE AND ELECTRONIC EQUIPMENT - Disclosed herein is a manufacturing method of a display device including: forming a gate electrode on a substrate; forming a laminated film by photolithography technique. The laminated film is provided above the gate electrode with a gate insulating film sandwiched therebetween and includes a semiconductor layer, at least either a source/drain electrode or a pixel electrode, a planarizing film and a pixel isolation film. The manufacturing method further includes forming a functional layer and a common electrode in this order after the formation of the laminated film. The functional layer includes an organic electric field light-emitting layer. Two or more layers are patterned all together in at least part of the laminated film during the formation of the laminated film.09-27-2012
20100237347Electronic Device Having Electrodes and Organic Active Regions and Processes of Forming the Same - An electronic device can include an electrode and an organic active region. In one aspect, the electronic device can include the electrode having a corresponding pitch and an organic active region adjacent to the electrode, wherein the organic active region has a width greater than the corresponding pitch. In another aspect, an electronic device can include a first set of electrodes oriented substantially along a direction and a second set of electrodes oriented substantially along the direction. The electronic device can also include a space between the first and second sets of the electrodes. The electronic device can still further include an organic active region overlying or underlying the first and second sets of electrodes and the space. In other aspects, processes of forming the electronic devices are also disclosed.09-23-2010
20110079784THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR AND ORGANIC LIGHT EMITTING DISPLAY DEVICE HAVING THIN FILM TRANSISTOR - Embodiments relate to a thin film transistor using an oxide semiconductor as an active layer, a method of manufacturing the thin film transistor, and an organic light emitting display device having the thin film transistor. In one embodiment, the thin film transistor includes a substrate, a first gate electrode formed over the substrate, a gate insulating layer formed over the first gate electrode and substrate and an active layer, comprising an oxide semiconductor, formed on the gate insulating layer. The transistor further includes a passivation layer formed on the active layer, source and drain electrodes formed on the passivation layer and electrically connected to the active layer and a second gate electrode formed on the passivation layer and located between the source electrode and the drain electrode.04-07-2011
20100065847AL ALLOY FILM FOR DISPLAY DEVICE,DISPLAY DEVICE, AND SPUTTERING TARGET - The present invention provides an Al alloy film for a display device, to be directly connected to a conductive oxide film on a substrate, the Al alloy film comprising Ge in an amount of 0.05 to 0.5 at %, and comprising Gd and/or La in a total amount of 0.05 to 0.45 at %, a display device using the same, and a sputtering target for the display device. For the Al alloy film of the present invention, even when a barrier metal is not provided, and a conductive oxide film and the Al alloy film are directly connected, the adhesion between the conductive oxide film and the Al alloy film is high, and the contact resistivity is low, and preferably, the dry etching property is also excellent.03-18-2010
20100065848TFT Substrate and Method of Fabricating the Same - Provided are a thin-film transistor (TFT) substrate which can facilitate the formation of contact holes and has improved reliability and a method of fabricating the TFT substrate. The TFT substrate includes a gate wiring formed on an insulating substrate; a data wiring defining a pixel region by intersecting the gate wiring, the data wiring including a source electrode and a drain electrode; a plurality of black matrix barrier ribs formed along the boundaries of the pixel region; a color filter formed to cover the pixel region; a pixel electrode formed on the color filter; and a plurality of contact holes formed through the color filter near the corners of the pixel region through which the pixel electrode and the drain electrode contact each other.03-18-2010
20120146038SEMICONDUCTOR DEVICE, ACTIVE MATRIX SUBSTRATE, AND DISPLAY DEVICE - Provided are a semiconductor device that can achieve leakage current reduction irrespective of an ambient temperature, an active matrix substrate in which such a semiconductor device is used, and a display device. In a switching portion (semiconductor device) (06-14-2012
20110079781PIXEL STRUCTURE HAVING CAPACITOR COMPENSATION - A pixel structure having capacitor compensation includes a thin-film transistor, and the thin-film transistor includes a source electrode, a drain electrode, a semiconductor layer and a gate electrode. The gate electrode includes a bar-shaped main part, and at least a protrusion part or two indention parts. One of the characteristics of the present invention lies in layout patterns of the drain electrode and gate electrode. An overlapping area between the drain electrode and gate electrode, and the position of the overlapping area can both be kept by virtue of the arrangement of the protrusion part or the indention parts of the gate electrode, even when the alignment between the drain electrode and gate electrode is changed. Therefore, the gate-drain capacitor (Cgd) will not be changed so that the quality of the liquid crystal display will be improved accordingly.04-07-2011
20110079783ARRAY SUBSTRATE FOR ORGANIC ELECTROLUMINESCENT DEVICE - An array substrate for an organic electroluminescent device includes a substrate; first and second gate electrodes; first and second gate insulating layers; first and second active layers; an interlayer insulating layer; first to fourth ohmic contact layers; first and second source electrodes; first and second drain electrodes; a data line connected to the first source electrode; a first power line connected to the second source electrode; a first passivation layer on the first and second source electrodes; a gate line contacting the first gate electrode; a second passivation layer on the gate line; a pixel electrode on the second passivation layer and contacting the second drain electrode; an organic luminescent layer on the pixel electrode; and a reference electrode on the organic luminescent layer, wherein portions of the pixel electrodes respectively contacting the organic luminescent layers in one pixel region and in another one pixel region have different heights from the substrate.04-07-2011
20110101356TRANSISTOR - It is an object to provide a thin film transistor with high speed operation, in which a large amount of current can flow when the thin film transistor is on and off-state current is extremely reduced when the thin film transistor is off. The thin film transistor is a vertical thin film transistor in which a channel formation region is formed using an oxide semiconductor film in which hydrogen is contained in an oxide semiconductor at a concentration of lower than or equal to 5×1005-05-2011
20120146034Capacitor Device and Display Apparatus Having the Same - Present embodiments may be directed to a capacitor device, including a first electrode, which includes a first area and a second area, separated from each other, and a first bridge located between the first area and the second area, the first bridge electrically interconnecting the first area and the second area; a second electrode arranged to face the first electrode; and a dielectric layer between the first electrode and the second electrode.06-14-2012
20120146033ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus that includes a thin film transistor comprising an active layer, a gate electrode, and source and drain electrodes electrically connected to the active layer; a pixel electrode formed on the same layer as the gate electrode; a light-emitting layer formed on the pixel electrode; a passivation layer formed on upper surfaces of the source and drain electrodes and upper surfaces of wirings formed on the same layer as the source and drain electrodes; an organic insulating layer that covers the thin film transistor, comprises an opening that exposes an upper surface of the pixel electrode, and directly contacts the passivation layer; and a facing electrode that is formed on the light-emitting layer, and is formed to directly contact the organic insulating layer to face the pixel electrode.06-14-2012
20110101357DISPLAY DEVICE - A display device which uses a TFT having a gate electrode film thereof arranged on a light source side can also suppress the increase of parasitic capacitance while suppressing the generation of a light leakage current. On at least one end of the TFT, between a high concentration region which constitutes a source region or a drain region and a channel region, a first low concentration region which is arranged on a high concentration region side and exhibits low impurity concentration and a second low concentration region which exhibits impurity concentration even lower than the impurity concentration of the first low concentration region are provided in this order.05-05-2011
20110101361OFF-SET TOP PIXEL ELECTRODE CONFIGURATION - A semiconductor device architecture where the top pixel electrode is deposited in an off-set configuration, such as to overlap the COM electrode, and also the gate electrode of the neighboring device. Such a configuration allows for improved device performance, resulting from features such as a greater storage capacitance.05-05-2011
20110101355NON-LINEAR ELEMENT, DISPLAY DEVICE, AND ELECTRONIC DEVICE - A non-linear element (e.g., a diode) with small reverse saturation current is provided. A non-linear element includes a first electrode provided over a substrate, an oxide semiconductor film provided on and in contact with the first electrode, a second electrode provided on and in contact with the oxide semiconductor film, a gate insulating film covering the first electrode, the oxide semiconductor film, and the second electrode, and a third electrode provided in contact with the gate insulating film and adjacent to a side surface of the oxide semiconductor film with the gate insulating film interposed therebetween or a third electrode provided in contact with the gate insulating film and surrounding the second electrode. The third electrode is connected to the first electrode or the second electrode.05-05-2011
20110101353Display device and method of manufacturing the same - A display device and a method of manufacturing the same, the display device including a substrate, a semiconductor layer on the substrate, a light shielding layer on the substrate, the light shielding layer and the semiconductor layer being positioned directly on a same layer, a gate insulating layer on the substrate covering the semiconductor layer and the light shielding layer, and a gate electrode on the gate insulating layer, the gate electrode corresponding to a channel region of the semiconductor layer.05-05-2011
20110068341TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An embodiment of the invention relates to a TFT-LCD array substrate comprising a substrate, a gate line and a data line formed on the substrate, a pixel electrode and a thin film transistor formed in a pixel region defined by the gate line and the data line, wherein the thin film transistor comprises a gate electrode, a source electrode, and a transparent drain electrode, and the transparent drain electrode is electrically connected with the pixel electrode.03-24-2011
20110068340Thin Film Transistor Array Panel and Method for Manufacturing the Same - A thin film transistor array panel includes an insulating substrate. A gate line is formed on the insulating substrate and has a gate electrode. A gate insulating layer is formed on the gate line. A semiconductor layer is formed on the gate insulating layer and overlaps the gate electrode. Diffusion barriers are formed on the semiconductor layer and contain nitrogen. A data line crosses the gate line and has a source electrode partially contacting the diffusion barriers and a drain electrode partially contacting the diffusion barriers and facing the source electrode. The drain electrode is on the gate electrode. A pixel electrode is electrically connected to the drain electrode.03-24-2011
20120119215Array substrate, method of manufacturing the array substrate, and liquid crystal display device having the array substrate - In an array substrate, a method of manufacturing the array substrate, and a liquid crystal display (LCD) device having the array substrate, a pixel electrode includes an outline portion, connection portions, and slit portions. The outline portion is arranged toward a data line and a gate line thereon, and the connection portions extend in a direction that crosses the data line and the gate line, respectively, to connect to the outline portion. The slit portions protrude from side surfaces of the connection portions to connect to the outline portion. A shielding electrode is arranged toward the outline portion between the data line and the outline portion, and the gate line and the outline portion.05-17-2012
20120119213SEMICONDUCTOR DEVICE AND A METHOD FOR MANUFACTURING THE SAME - A thin film transistor of the present invention has an active layer including at least source, drain and channel regions formed on an insulating surface. A high resistivity region is formed between the channel region and each of the source and drain regions. A film capable of trapping positive charges therein is provided on at least the high resistivity region so that N-type conductivity is induced in the high resistivity region. Accordingly, the reliability of N-channel type TFT against hot electrons can be improved.05-17-2012
20120119214SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - An object is to reduce a capacitance value of parasitic capacitance without decreasing driving capability of a transistor in a semiconductor device such as an active matrix display device. Further, another object is to provide a semiconductor device in which the capacitance value of the parasitic capacitance was reduced, at low cost. An insulating layer other than a gate insulating layer is provided between a wiring which is formed of the same material layer as a gate electrode of the transistor and a wiring which is formed of the same material layer as a source electrode or a drain electrode.05-17-2012
20090026453Display device and manufacturing method thereof - A gate insulating film is formed over a gate electrode; a microcrystalline semiconductor is formed over the gate insulating film; an impurity element for controlling the threshold value is added into the microcrystalline semiconductor film by an ion implantation method; the microcrystalline semiconductor film is irradiated with a laser beam so that the crystallinity of the microcrystalline semiconductor film is improved; and then, a buffer layer is formed over the microcrystalline semiconductor film, whereby a channel-etched thin film transistor is formed. Further, a display device including the thin film transistor is manufactured.01-29-2009
20090026451THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array substrate and a method for manufacturing the same are disclosed. The thin film transistor array substrate includes a plurality of gate lines and a plurality of data lines on a substrate, to define pixel regions crossing each other, thin film transistors, each formed at the intersection of the gate lines and the data lines, and including a gate electrode, a source electrode and a drain electrode, common lines, each including a first pattern formed across the data lines, a second pattern formed adjacent to the data lines on both sides in the pixel region and parallel to the data lines, and a third pattern formed adjacent to the gate lines to connect the second pattern disposed on both the sides in the associated one of the pixel regions, and passing below the drain electrode of the thin film transistors and pixel electrodes formed in the pixel regions.01-29-2009
20090026455LIQUID CRYSTAL DISPLAY DEVICE AND ITS MANUFACTURING METHOD - The occurrence of the poor electric connection between the outer circuit and the liquid crystal display device can be reduced in the manufacturing method of the outer circuit and liquid display device of this invention. The liquid crystal display device has the pixel region 01-29-2009
20110248272ORGANIC EL DISPLAY DEVICE REFLECTIVE ANODE AND METHOD FOR MANUFACTURING THE SAME - Provided is a reflective anode for an organic EL display device having a reflective film made from an Al-based alloy which can realize a low contact resistance with an oxide conductive film and achieve an excellent reflectivity. Provided is also a method for manufacturing the reflective anode for an organic EL display device. The method includes: a step of forming an Al-based alloy film containing 0.1 to 2 atomic % of Ni or Co on a substrate; a step of subjecting the Al-based alloy film to a thermal treatment in a vacuum or an inactive gas atmosphere at the temperature of 150 degrees C. or above; and a step of forming an oxide conductive film so as to be in direct contact with the Al-based alloy film.10-13-2011
20100244033OPTICAL SENSOR, METHOD OF MAKING THE SAME, AND DISPLAY PANEL HAVING OPTICAL SENSOR - An optical sensor, method of making the same, and a display panel having an optical sensor. The optical sensor includes a first electrode, a second electrode, a photosensitive silicon-rich dielectric layer, and a first interfacial silicon-rich dielectric layer. The photosensitive silicon-rich dielectric layer is disposed between the first and second electrodes. The first interfacial silicon-rich dielectric layer is disposed between the first electrode and the photosensitive silicon-rich dielectric layer.09-30-2010
20100264419FIELD-EFFECT TRANSISTOR - A field-effect transistor includes at least a channel layer, a gate insulating layer, a source electrode, a drain electrode, and a gate electrode, which are formed on a substrate. The channel layer is made of an amorphous oxide material that contains at least In and B, and the amorphous oxide material has an element ratio B/(In+B) of 0.05 or higher and 0.29 or lower.10-21-2010
20100258805Thin Film Transistor and Image Display Unit - One embodiment of the present invention is a thin film transistor having a substrate, a gate electrode formed on the substrate, a gate insulating film, a semiconductor layer formed on the gate insulating film, a protective film formed on the semiconductor layer and the gate insulating film and having first and second opening sections which are separately and directly formed on the semiconductor layer, a source electrode formed on the protective film and electrically connected to the semiconductor layer at the first opening section of the protective film, and a drain electrode formed on the protective film and electrically connected to the semiconductor layer at the second opening section of the protective film.10-14-2010
20100244034THIN FILM TRANSISTOR - A thin film transistor includes a gate electrode; a gate insulating layer which is provided to cover the gate electrode; a semiconductor layer which is provided over the gate insulating layer to overlap with the gate electrode; an impurity semiconductor layer which is partly provided over the semiconductor layer and which forms a source region and a drain region; and a wiring layer which is provided over the impurity semiconductor layer, where a width of the source region and the drain region is narrower than a width of the semiconductor layer, and where the width of the semiconductor layer is increased at least in a portion between the source region and the drain region.09-30-2010
20110248270THIN FILM TRANSISTOR, DISPLAY DEVICE, AND ELECTRONIC UNIT - A thin film transistor using oxide semiconductor for a channel, which may be controlled such that threshold voltage is positive and may be improved in reliability is provided. The thin film transistor includes a gate electrode, a pair of source/drain electrodes, an oxide semiconductor layer forming a channel and provided between the gate electrode and the pair of source/drain electrodes, a first insulating film as a gate insulating film provided on the oxide semiconductor layer on a side near the gate electrode, and a second insulating film provided on the oxide semiconductor layer on a side near the pair of source/drain electrodes. One or both of the first insulating film and the second insulating film includes an aluminum oxide having a film density of 2.70 g/cm10-13-2011
20100078640Thin Film Transistor Backplane - A fabrication process for a device such as a backplane for a flat panel display includes depositing thin film layers on a substrate, forming a 3D template overlying the thin film layers, and etching the 3D template and the thin film layers to form gate lines and transistors from the thin film layers. An insulating or passivation layer can then be deposited on the gate lines and the transistors, so that column or data lines can be formed on the insulating layer.04-01-2010
20110248274THIN FILM TRANSISTOR ARRAY PANEL FOR LIQUID CRYSTAL DISPLAY AND METHOD OF MANUFACTURING THE SAME - A method for manufacturing a thin film transistor array panel is disclosed. A gate wiring pattern is formed on an insulating substrate. A gate insulating layer is formed on the gate wiring pattern. A semiconductor pattern is formed on the gate insulating layer. A transparent conductive layer is formed on the gate insulating layer. The transparent conductive layer is patterned to form a pixel electrode. An opening is formed at a circumference of the pixel electrode. The opening minimizes misalignment during the manufacturing process and prevents shorts between a data line and the pixel electrode.10-13-2011
20090001374Tft Substrate, Reflective Tft Substrate and Method for Manufacturing These Substrates - An object of the invention is to propose a TFT substrate and a reflective TFT substrate which can be operated stably for a prolonged period of time, can be prevented from being suffering from crosstalk, and is capable of significantly reducing manufacturing cost by decreasing the number of production steps, as well as to propose the method for producing these substrates.01-01-2009
20090001376Poly crystalline silicon semiconductor device and method of fabricating the same - Provided are a poly crystalline silicon semiconductor device and a method of fabricating the same. Portions of a silicon layer except for gates are removed to reduce a parasitic capacitance caused from the silicon layer existing on gate bus lines. The silicon layer exists under the gates only, thus the parasitic capacitance is reduced and the deterioration and the delay of signals are prevented. Accordingly, the poly crystalline silicon semiconductor device, such as a thin film transistor, has excellent electric characteristics.01-01-2009
20090001375Light-emitting device - In a light-emitting device having an inverted staggered thin film transistor, the inverted staggered thin film transistor is formed as follows: a gate insulating film is formed over a gate electrode; a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film; a buffer layer is formed over the microcrystalline semiconductor film; a pair of source and drain regions are formed over the buffer layer; and a pair of source and drain electrodes are formed in contact with the source and drain regions so as to expose a part of the source and drain regions.01-01-2009
20090230397DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A display device includes a TFT substrate in which a plurality of first TFT elements each having an active layer of an amorphous semiconductor and a plurality of second TFT elements each having an active layer of a polycrystalline semiconductor are disposed on a surface of an insulating substrate, wherein the first TFT element and the second TFT element each have a structure with a gate electrode, a gate insulating film, and the active layer stacked in this order on the surface of the insulating substrate and a source electrode and a drain electrode both connected to the active layer via a contact layer above the active layer, and the active layer of the second TFT element has a thickness of more than 60 nm in a position where the contact layer is stacked.09-17-2009
20090230396THIN-FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE HAVING THE SAME - Provided are a thin-film transistor (TFT) substrate and a display device having the same. In the TFT substrate and the display device having the same, first and second drain electrodes of first and second TFTs connected to first and second pixel electrodes, respectively, are vertically bent a plurality of times. The distance between each of the first and second source electrodes and the first or second drain electrode is maintained at a minimum interline gap to increase the distance between a data line and each of the first and second drain electrodes and minimize the length of a region of each of the first and second drain electrodes adjacent to the data line. Consequently, a coupling capacitance between the data line and each of the first and second drain electrodes can be reduced, and each unit pixel region can have a uniform parasite capacitance within a predetermined range. In addition, the luminance deviation of a display device, which performs inversion driving, can be reduced.09-17-2009
20090230394Image sensor array with conformal color filters - An image sensor pixel includes a photo-sensor region, a microlens, a first color filter layer, and a second color filter layer. The photo-sensor region is disposed within a semiconductor die. The microlens is disposed on the semiconductor die in optical alignment with the photo-sensor region. The first color filter layer is disposed between the photo-sensor region and the microlens. The second color filter layer is disposed on an opposite side of the microlens as the first color filter layer.09-17-2009
20120199834DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - The present invention relates to a display device and a manufacturing method thereof. A display device according to an exemplary embodiment of the present invention includes a substrate including a first surface and a second surface, a first line disposed on the first surface and made of a transparent metal oxide semiconductor, and a first semiconductor disposed on the first surface and made of the transparent metal oxide semiconductor.08-09-2012
20090184320Method of manufacturing an image TFT array for an indirect X-ray sensor and structure thereof - In the image TFT array structure, at least one first line, a lower electrode, a pad electrode, a common electrode and a first electrode connected with the first line are defined simultaneously by etching a first conductive layer. At least one second line intersecting the first line, an upper electrode corresponding to the lower electrode, a second electrode connected with the second line and a third electrode connected with the upper electrode are defined simultaneously by etching a second conductive layer applied to cover the substrate and above the first conductive layer. The lower electrode and the upper electrode of the storage capacitor have an approximately same large area.07-23-2009
20090152554THIN FILM TRANSISTOR, DISPLAY DEVICE INCLUDING THE SAME AND MANUFACTURING METHOD THEREOF - A thin film transistor, a display device, and a manufacturing method thereof. The thin film transistor includes a control electrode, a semiconductor overlapping the control electrode, and an input electrode and an output electrode disposed on or under the semiconductor and opposite to each other. The semiconductor includes a first portion disposed between the input electrode and the output electrode and having a first crystallinity, and a second portion connected with the first portion, which overlaps the input electrode or the output electrode, and having a second crystallinity. The first crystallinity is higher than the second crystallinity.06-18-2009
20080315201Apparatus for Producing Electronic Device Such as Display Device, Method of Producing Electronic Device Such as Display Device, and Electronic Device Such as Display Device - An object of the present invention is to reduce an adverse effect of an atmosphere in a heat treatment device used in production of an electronic device, imparted on characteristics of the produced electronic device. To attain the object, an inner surface of the heat treatment device is covered with an oxide passive-state film and bringing the surface roughness of the inner surface to 1 μm or less in terms of a central mean roughness Ra. According to this type of heat treatment device, in curing a heat curable resin, deterioration in the heat curable resin caused by decomposition or dissociation of the heat curable resin, can be reduced.12-25-2008
20110175097ORGANIC LIGHT EMITTING DISPLAY DEVICE - A transparent organic light emitting display device having an improved transmittance, in which transmittance of external light is increased, the organic light emitting display device including: a substrate having transmitting regions interposed between pixel regions; thin film transistors positioned on a first surface of the substrate and respectively disposed in the pixel regions of the substrate; a passivation layer covering thin film transistors; pixel electrodes formed on the passivation layer and respectively electrically connected to the thin film transistors, the pixel electrodes are respectively located in an area corresponding to the pixel regions, and are disposed to respectively overlap and cover the thin film transistors; an opposite electrode facing the pixel electrodes and formed to be able to transmit light, the opposite electrode is located in the transmitting regions and the pixel regions and includes a first opening formed on a location corresponding to at least a portion of respective ones of the transmitting regions; and an organic emission layer interposed between respective ones of the pixel electrodes and the opposite electrode to emit light.07-21-2011
20110175093PIXEL STRUCTURE AND FABRICATING METHOD THEREOF - In a fabricating method of a pixel structure, a scan line and a gate electrode are formed in each pixel area of a substrate. A gate insulation layer is formed to cover the scan line and gate electrode. A semiconductor layer is formed on the gate insulation layer above the gate electrode. A data line, source and drain are formed in each pixel area. A first passivation layer covers the data line, source and drain. A common line is formed on the first passivation layer and overlaps with at least a portion of the data line. A common electrode is formed on and electrically connected with the common line. A second passivation layer covers the common electrode and common line. A contact window is formed in the second passivation layer above the drain to expose the drain. A pixel electrode is electrically connected with the drain through the contact window.07-21-2011
20080272374SEMICONDUCTOR DISPLAY DEVICE - To provide a semiconductor display device capable of displaying an image having clarity and a desired color, even when the speed of deterioration of an EL layer is influenced by its environment. Display pixels and sensor pixels of an EL display each have an EL element, and the sensor pixels each have a diode. The luminance of the EL elements of each in the display pixels is controlled in accordance with the amount of electric current flowing in each of the diodes.11-06-2008
20100295051ELECTRO-LUMINESCENCE DEVICE INCLUDING A THIN FILM TRANSISTOR AND METHOD OF FABRICATING AN ELECTRO-LUMINESCENCE DEVICE - An electro-luminescence device including an electro-luminescence element and a thin film transistor electrically connected to the electro-luminescence element. The thin film transistor includes a gate electrode formed over a substrate, an insulating layer formed over the gate electrode, and a first semiconductor pattern formed over the insulating layer. An etch stop layer is formed over the first semiconductor layer. A second semiconductor pattern is formed over the etch stop layer at one side of the etch stop layer, and a third semiconductor pattern is formed over the etch stop layer at another side of the etch stop layer. A source electrode is formed over the second semiconductor pattern, and a drain electrode is formed over the third semiconductor pattern.11-25-2010
20110254009Semiconductor Device and the Fabricating Method Thereof - The object is to pattern extremely fine integrated circuits by forming fine contact holes. The dry etching method is employed to form contact holes to pattern a wiring (10-20-2011
20110254008Semiconductor Device and Manufacturing Method Thereof - By providing appropriate TFT structures arranged in various circuits of the semiconductor device in response to the functions required by the circuits, it is made possible to improve the operating performances and the reliability of a semiconductor device, reduce power consumption as well as realizing reduced manufacturing cost and increase in yield by lessening the number of processing steps. An LDD region of a TFT is formed to have a concentration gradient of an impurity element for controlling conductivity which becomes higher as the distance from a drain region decreases. In order to form such an LDD region having a concentration gradient of an impurity element, the present invention uses a method in which a gate electrode having a taper portion is provided to thereby dope an ionized impurity element for controlling conductivity accelerated in the electric field so that it penetrates through the gate electrode and a gate insulating film into a semiconductor layer.10-20-2011
20110254005THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME - In an exemplary embodiment, a thin film transistor array panel includes: a substrate; a gate line on the substrate; a gate driver on a peripheral area of the substrate; a gate pad formed on the substrate and connecting the gate line and the gate driver; a gate insulating layer formed on the gate line and the gate pad; a data line formed on the gate insulating layer and including a source electrode and a facing drain electrode; a height controlling member corresponding to the gate pad and formed on the gate insulating layer; a passivation layer on the gate insulating layer, the data line, the drain electrode, the gate pad, and the height controlling member; an insulating layer on the passivation layer; a pixel electrode formed on the insulating layer and connected to the drain electrode; and contact assistants connected to the gate pad and the height controlling member.10-20-2011
20080251790Pixel, a Storage Capacitor, and a Method for Forming the Same - A pixel, a storage capacitor, and a method for forming the same. The storage capacitor formed on a substrate comprises a semiconductor layer, a first dielectric layer, a first conductive layer, a second dielectric layer and a second conductive layer. The semiconductor layer is formed on the substrate wherein the semiconductor layer and the substrate are covered by the first dielectric layer. The first conductive layer is formed on a part of the first dielectric layer. The second dielectric layer is formed on the first conductive layer, and the lateral side of the stacking structure including the second dielectric layer and the first conductive layer has a taper shaped. The second conductive layer is formed on a part of the second dielectric layer.10-16-2008
20120199837ORGANIC ELECTROLUMINESCENT ELEMENT AND ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE - In an organic EL element (08-09-2012
20080210942Array substrate for liquid crystal display device and method of fabricating the same - An array substrate for a liquid crystal display device includes a gate line on a substrate; a gate insulating layer on the gate line; a data line crossing the gate line; a gate electrode connected to the gate line; an active layer on the gate insulating layer and overlapping the gate electrode; first and second ohmic contact layers on the active layer, the first and second ohmic contact layers spaced apart from each other by a first distance; first and second barrier patterns spaced apart from each other by the first distance and on the first and second ohmic contact layers, respectively. The active layer is exposed through the first and second barrier patterns; source and drain electrodes spaced apart from each other by a second distance greater than the first distance and on the first and second barrier patterns, respectively.09-04-2008
20120032178Display Device and Method for Manufacturing the Same - It is an object of the present invention to provide a display device preventing the external invasion of water and/or oxygen and preventing the deterioration of a luminous element due to these invading substances and to provide a production method including simple production steps for producing the display device. The invention provides a display device having a sealing material on the rim of an exposed interlayer insulator for preventing the invasion of water and/or oxygen from the interlayer insulator. Further, the invention provides a display device having a barrier body on an exposed interlayer insulator for preventing the invasion of water and/or oxygen from the interlayer insulator. Furthermore, the application of droplet discharge technique in production steps for producing the display device can eliminate a photolithography step such as exposing and developing. Thus, a method of producing a display device having an improved yield is provided.02-09-2012
20120032174SEMICONDUCTOR DEVICE, DISPLAY DEVICE AND ELECTRONIC DEVICE - Disclosed herein is a semiconductor device including: a gate electrode on a substrate; a gate insulating film covering said gate electrode; an organic semiconductor layer disposed so as to be superposed above said gate electrode with said gate insulating film interposed between the organic semiconductor layer and the gate electrode within a width of said gate electrode; and a source electrode and a drain electrode having respective end parts disposed so as to be opposed to each other on said organic semiconductor layer in a state of said gate electrode being interposed between the source electrode and the drain electrode in a direction of the width of said gate electrode.02-09-2012
20080203393THIN FILM TRANSISTOR ARRAY PANEL AND FABRICATION - The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas.08-28-2008
20080203392DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME - A display substrate includes a base substrate having a display area and a peripheral area which surrounds the display area, a pixel electrode formed on the display area, a pad part formed on the peripheral area, an adhesion part formed on the peripheral area and having a plurality of holes formed in an area adjacent to the pad part on the peripheral area and a conductive adhesion member formed on the pad part and the adhesion part to make electrical contact with the pad part and a terminal of an integrated circuit.08-28-2008
20080203391ARRAY SUBSTRATE, DISPLAY APPARATUS HAVING THE SAME - An array substrate includes a base substrate which includes a display area and a peripheral area adjacent to the display area, a plurality of fan-out lines arranged in the peripheral area to receive a driving signal from an exterior source, at least one fan-out line among the plurality of fan-out lines arranged on a different layer from a layer on which remaining fan-out lines of the plurality of fan-out lines are arranged, a plurality of signal lines arranged in the display area to receive the driving signal from the plurality of fan-out lines and a pixel array arranged in the display area to receive the driving signal from the plurality of signal lines.08-28-2008
20080203390METHOD FOR MANUFACTURING A SIGNAL LINE, THIN FILM TRANSISTOR PANEL, AND METHOD FOR MANUFACTURING THE THIN FILM TRANSISTOR PANEL - A method for manufacturing a thin film transistor array panel includes forming a gate line on a substrate; sequentially forming a gate insulating layer, a silicon layer, and a conductor layer including a lower layer and an upper layer on the gate line, forming a photoresist film, on the conductor layer, patterning the photoresist film to form a photoresist pattern including a first portion and a second portion having a greater thickness than the first portion, etching the upper layer and the lower layer by using the photoresist pattern as art etch mask, etching the silicon layer by using the photoresist pattern as an etch mask to form a semiconductor, removing the second portion of the photoresist pattern by using an etch back process, selectively wet-etching the upper layer of the conductor layer by using the photoresist pattern as an etch mask, dry-etching the lower layer of the conductor layer by using the photoresist pattern as an etch mask to form a data line and a drain electrode including remaining upper and lower layers, and forming a pixel electrode connected to the drain electrode.08-28-2008
20110163320Semiconductor Device, Driving Method Thereof and Electronic Device - The invention provides a semiconductor device having a current input type pixel in which a signal write speed is increased and an effect of variations between adjacent transistors is reduced. When a set operation is performed (write a signal), a source-drain voltage of one of two transistors connected in series becomes quite low, thus the set operation is performed to the other transistor. In an output operation, the two transistors operate as a multi-gate transistor, therefore, a current value in the output operation can be small. In other words, a current in the set operation can be large. Therefore, an effect of intersection capacitance and wiring resistance which are parasitic on a wiring and the like do not affect much, thereby the set operation can be performed rapidly. As one transistor is used in the set operation and the output operation, an effect of variations between adjacent transistors is lessened.07-07-2011
20110163319ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - Array substrates for liquid crystal display (LCD) devices are formed on a substrate with first and second gate lines crossing a data line to define first and second pixel regions. A thin film transistor includes a source electrode and a drain electrode. A metal pattern overlaps a common line and makes up a portion of the drain electrode. A passivation layer is disposed on the source and drain electrodes and on the metal pattern. A first pixel electrode is connected to the metal pattern and a common electrode is connected to the common line. Various repair patterns are formed to define one or more repairing portions that enable connection of the drain electrode or metal pattern to a second pixel electrode of the second pixel region if the cut line is cut in the event the first pixel electrode fails to display an image.07-07-2011
20110163318DISPLAY DEVICE - A display device includes: i) a substrate member having a transparent area and a plurality of pixel areas, the pixel areas being spaced apart from each other along a first direction and a second direction, the transparent area located between the pixel areas, the second direction being perpendicular to the first direction; and ii) an emission layer located at each of the pixel areas. Among the plurality of pixel areas, a width of the transparent area along the first direction between two pixel areas varies along the second direction. The first direction may be the horizontal direction of a screen realized by the substrate member, the second direction may be a vertical direction, and the emission layer may have a width along the horizontal direction that varies along the vertical direction.07-07-2011
20110163317ELECTROOPTICAL DEVICE SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME, ELECTROOPTICAL DEVICE, AND ELECTRONIC APPARATUS - An electrooptical device substrate, contains: a first insulating film provided on a substrate; two or more pixels; a first concave portion provided in the first insulating film over the two or more pixels; a second concave portion provided on the bottom surface of the first concave portion; a thin film transistor containing an organic semiconductor layer provided in the second concave portion, a gate insulating film provided on the organic semiconductor layer, and a gate electrode provided on the gate insulating film and being matched to one pixel among the two or more pixels; a scanning line which is provided at an upper side with respect to the gate insulating film and provided in the first concave portion over the two or more pixels; and a data line electrically connected to the thin film transistor.07-07-2011
20110133194PIXEL STRUCTURE - A pixel structure includes a scan line, a data line, a gate electrode electrically connected to the scan line, a semiconductor layer disposed on the gate electrode, a drain electrode, an extending electrode, and a pixel electrode. The scan line and the data line cross each other, and are insulated. The drain electrode includes a contact part disposed outside the gate electrode, an electrode part disposed on the semiconductor pattern and a connecting part extending from the contact part along a direction to connect the electrode part, and partially overlapping the gate electrode. The pixel electrode is connected to the contact part. The extending electrode is connected to the scan line. A first end of the extending electrode points to the semiconductor layer along the direction, and overlaps the drain electrode. A first width of the connecting part is equal to the second width of the extending electrode.06-09-2011
20110133193THIN FILM TRANSISTOR SUBSTRATE AND THE METHOD THEREOF - A thin film transistor array panel includes a gate line, a gate insulating layer that covers the gate line, a semiconductor layer that is disposed on the gate insulating layer, a data line and drain electrode that are disposed on the semiconductor layer, a passivation layer that covers the data line and drain electrode and has a contact hole that exposes a portion of the drain electrode, and a pixel electrode that is electrically connected to the drain electrode through the contact hole. The data line and drain electrode each have a double layer that includes a lower layer of titanium and an upper layer of copper, and the lower layer is wider than the upper layer, and the lower layer has a region that is exposed. The gate insulating layer may have a step shape.06-09-2011
20100320469ORGANIC ELECTRO-LUMINESCENCE DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - An organic electro-luminance display device includes a first substrate including a plurality of sub-pixels, a first electrode on the first substrate, a buffer layer on the first electrode of a region that partitions each of the sub-pixels, a spacer on the buffer layer, the buffer layer and the spacer being integrally formed, an organic light-emitting layer on the first electrode that corresponds to each of the sub-pixels and the spacer, and a second electrode on the organic light-emitting layer.12-23-2010
20100320471THIN-FILM TRANSISTOR ARRAY, METHOD OF FABRICATING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE INCLUDING THE SAME - A thin-film transistor array includes an electrically insulating substrate, a plurality of thin-film transistors arranged in a matrix on the substrate, and each including a channel, a source, and a drain each comprised of an oxide-semiconductor film, a pixel electrode integrally formed with the drain, a source signal line through which a source signal is transmitted to a group of thin-film transistors, a gate signal line through which a gate signal is transmitted to a group of thin-film transistors, a source terminal formed at an end of the source signal line, and a gate terminal formed at an end of the gate signal line. The source terminal and the gate terminal are formed in the same layer as a layer in which the channel is formed. The source terminal and the gate terminal have the same electric conductivity as that of the pixel electrode.12-23-2010
20100320472PIXEL ELECTRODE STRUCTURE WITH HIGH DISPLAY QUALITY - A pixel electrode structure includes a transparent substrate, a data line, a common line, a first array pixel, and a second array pixel disposed on the transparent substrate. The first/second array pixels respectively include a thin film transistor, a pixel electrode, and a gate line, and the common line is disposed at a lateral side of the gate line. A first via hole and a second via hole are respectively disposed on common line and in contact with an extending portion of the first thin film transistor and an extending portion of the second thin film transistor. A dummy line is disposed at a side of the data line, and a third via hole is disposed both on the dummy line and on the common line. The present invention can not only increase the aperture ratio of the pixel, but have a better stability of the common voltage signal.12-23-2010
20100320467THIN-FILM TRANSISTOR, MANUFACTURING METHOD THEREFOR, AND ELECTRONIC DEVICE USING A THIN-FILM TRANSISTOR - Disclosed is a method that includes: forming a gate electrode on a substrate, then forming an insulation layer so as to completely cover the gate electrode, thereafter forming a semiconductor layer on the insulation layer, and then forming a crystallization-inducing metal layer on the semiconductor layer; removing the part of at least the crystallization-inducing metal layer that is over a channel region of the semiconductor layer; forming source and drain electrodes at a location which is over source and drain regions respectively located at opposite sides with respect to the channel region of the semiconductor layer and is above the crystallization-inducing metal layer; and heating the crystallization-inducing metal layer so as to form a silicide layer of a crystallization-inducing metal.12-23-2010
20100320468THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - In a portion of a gate signal line and a portion of a common signal line, cutouts which are arranged perpendicular to the extending direction of these lines and open to face each other in an opposed manner are formed. A cruciform shape in appearance is formed by combining a gap defined between the gate signal line and the common signal line extending parallel to each other and the cutouts to each other. The cruciform portion formed in this manner is used as an alignment mark in the exposure of a photolithography step of a layer formed later. Due to such a constitution, in manufacturing a thin film transistor substrate, it is possible to realize the highly accurate alignment without forming a pattern only used for alignment.12-23-2010
20100320470THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel includes a substrate; a first gate line disposed on the substrate and including a gate electrode; a storage electrode disposed in a layer which is the same layer as a layer of the first gate line; a gate insulating layer disposed on the first gate line and the storage electrode; a semiconductor disposed on the gate insulating layer and including a channel portion; a data line disposed on the semiconductor and including a source electrode; a drain electrode disposed on the semiconductor and facing the source electrode; a passivation layer disposed on the gate insulating layer, the data line, and the drain electrode, the passivation layer including a contact hole which exposes a portion of the drain electrode; and a pixel electrode disposed on the passivation layer and electrically connected to the drain electrode through the contact hole, wherein the gate insulating layer and the passivation layer are interposed between the pixel electrode and the substrate except for a region corresponding to the contact hole, and wherein the pixel electrode overlaps the storage electrode via the gate insulating layer and the passivation layer.12-23-2010
20100320466THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor array substrate and a manufacturing method thereof are provided. In the manufacturing method, a first patterned conductive layer including a plurality of scan lines and a plurality of gates connected with the scan lines is formed on a substrate. A patterned gate insulating layer having a plurality of openings is then formed on the substrate to cover at least a portion of the first patterned conductive layer, and a plurality of dielectric patterns are formed in the openings. A plurality of semiconductor patterns are formed on the patterned gate insulating layer. A second patterned conductive layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A passivation layer is formed on the semiconductor patterns, the patterned gate insulating layer, and the dielectric patterns. A plurality of pixel electrodes are formed on the passivation layer.12-23-2010
20120199835THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - The present invention relates to a thin film transistor array panel and a manufacturing method thereof, and a thin film transistor array panel according to an exemplary embodiment of the present invention includes: a substrate; a first conductive layer disposed on the substrate; a second conductive layer overlapping at least a portion of the edge of the first conductive layer on the first conductive layer and including a first portion overlapping the first conductive layer and a second portion not overlapping the first conductive layer; a first insulating layer disposed on the second conductive layer and having a contact hole exposing at least a portion of a boundary between the first portion and the second portion; and a third conductive layer disposed on the first insulating layer and simultaneously contacting the first portion and the second portion that are exposed through the contact hole.08-09-2012
20100283055TFT SUBSTRATE AND TFT SUBSTRATE MANUFACTURING METHOD - An object of the invention is to provide a TFT substrate and a method for producing a TFT substrate which is capable of drastically reducing the production cost by decreasing the number of steps in the production process and improving production yield. A TFT substrate comprises: a substrate; a first oxide layer formed above the substrate; a second oxide layer formed above the first oxide layer with a channel part interposed therebetween; a gate insulating film formed above the substrate, the first oxide layer and the second oxide layer; a gate electrode and a gate wire formed above the gate insulating film.11-11-2010
20100283058ARRAY SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE WITH THIN FILM TRANSISTOR HAVING TWO DRAIN ELECTRODE PATTERNS AND MANUFACTURING METHOD OF THE SAME - An array substrate for a liquid crystal display device includes gate and data lines crossing on a substrate, common lines parallel to and between the gate lines, thin film transistors at crossing portions of the gate and data lines, and a pixel electrode. The common lines define pixel regions, which are each divided into first and second regions by the corresponding gate line. The thin film transistors each include a gate electrode in a first direction, a semiconductor layer on the gate electrode, and source and drain electrodes on the semiconductor layer in a second direction. The source and drain electrodes cross the gate electrode in each of the first and second regions. The pixel electrode is connected to the drain electrode.11-11-2010
20100283057PIXEL STRUCTURE - A pixel structure is provided. A data line and a scan line are disposed over a substrate. A first, a second, and a third thin film transistors (TFT) are electrically connected with the data line and the scan line respectively. A first width-to-length ratio, a second width-to-length ratio and a third width-to-length ratio of the first, second and third TFTs are the same. An impedance layer and the first TFT are connected in series. A first, a second, and a third pixel electrodes are electrically connected with the first, the second and the third TFTs respectively. A first, a second, and a third common line are disposed below the first, second and third pixel electrodes respectively. The first and second common lines are electrically connected to a first voltage and the third common line is electrically connected to a second voltage.11-11-2010
20110254006DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A display device in which a plurality of gate wires and a plurality of drain wires that intersect the gate wires are provided, and thin film transistors connected to the gate wires and the drain wires are formed for respective pixel regions. At least one of the gate wires, the drain wires, and lead wires drawn from the gate wires or the drain wires is formed of a light-transmitting patterned conductive film. The light-transmitting patterned conductive film is formed of at least a first light-transmitting patterned conductive film, and a second light-transmitting patterned conductive film laminated on the first light-transmitting patterned conductive film. The second light-transmitting patterned conductive film is formed of a conductive film for coating only the surface of the first light-transmitting patterned conductive film including its side wall surface.10-20-2011
20100181571LAMINATE STRUCTURE, ELECTRONIC DEVICE, AND DISPLAY DEVICE - A laminate structure is disclosed that has a region having high surface free energy and a region having low surface free energy that are well separated, has high adhesiveness between an underlying layer and a conductive layer, and can be formed easily with low cost. The laminate structure includes a wettability-variable layer including a first surface free energy region of a first film thickness and a second surface free energy region of a second film thickness, and a conductive layer formed on the second surface free energy region of the wettability-variable layer. The second film thickness is less than the first film thickness and the surface free energy of the second surface free energy region is made higher than the surface free energy of the first surface free energy region by applying a predetermined amount of energy on the second surface free energy region.07-22-2010
20100181570DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - An active matrix substrate in which variations in output characteristics of photodiodes are reduced, and a display device using this active matrix substrate, are provided. An active matrix substrate (07-22-2010
20110089423THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel can include: a substrate; a gate line formed on the substrate; a gate pad formed at an end of the gate line; a gate identification member corresponding to the gate pad and formed in the same layer as the gate pad; a gate insulating layer covering the gate line and the gate identification member; a data line formed on the gate insulating layer; a passivation layer formed on the gate insulating layer and the data line; a gate contact assistant formed on the passivation layer; and a gate driving chip electrically connected to the gate contact assistant, wherein the gate contact assistant at least partially overlaps the gate identification member. The gate identification member is formed without producing a step in the gate contact assistant, reducing the risk of defects when wires or other objects are pressed onto the gate pad.04-21-2011
20100117088THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor (TFT) substrate having an improved wire structure without an under-cut phenomenon that may occur during formation of a gate wire having a double-layered structure and a method of manufacturing the same are provided, where the method includes forming a first metal layer made of at least one low resistance material selected from the group consisting of Al, AlNd, Cu, and Ag, forming a second metal layer made of at least one heat-resistant, etch-resistant material selected from the group consisting of Cr, CrNx, Ti, Mo, and MoW on the first metal layer, forming an etch mask on the second metal layer, sequentially etching the second metal layer and the first metal layer using the etch mask, and forming a second metal layer pattern and a first metal layer pattern, respectively, and selectively re-etching the second metal layer pattern using the etch mask to make a width of the second metal layer pattern smaller than or substantially equal to a width of the first metal layer pattern, and completing a gate wire.05-13-2010
20100117087THIN FILM TRANSISTOR MATRIX DEVICE AND METHOD FOR FABRICATING THE SAME - A method for fabricating a thin film transistor matrix device which includes forming a transparent insulating substrate, arranging a plurality of thin film transistors on the substrate in a matrix, arranging a plurality of picture element electrodes on the substrate in a matrix and connecting the picture element electrodes to sources of the thin film transistors. The method also includes forming a plurality of bus lines for commonly connecting gates or drains of the thin film transistors, forming a plurality of bus line terminals on the ends of the bus lines, respectively, with each bus line terminal being provided for each bus line, and forming one connection line on the substrate in a region outer of plurality of the bus line terminals and commonly connecting the plurality of bus lines. The method further includes the step of electrically disconnecting the bus lines from the connection line by laser melting.05-13-2010
20110260167Actively driven organic el device and manufacturing method thereof - The present invention is a active-driving organic EL light emission device comprising an organic EL element comprising an organic luminous medium between an upper electrode and a lower electrode, and a thin film transistor for driving this organic EL element, wherein light emitted from the organic EL element is taken out from the side of the upper electrode, and the upper electrode comprises a main electrode formed of transparent conductive material, and an auxiliary electrode formed of a low-resistance material. According to the active-driving organic EL light emission device of this structure, the numerical aperture can be made large. Additionally, the sheet resistivity of the upper electrode can be made low even if luminescence is taken out from the side of the upper electrode. Thus, it is possible to provide an active-driving organic EL light emission device making it possible to display images having a high brightness and a homogenous brightness; and a method for manufacturing the same.10-27-2011
20110260168IMAGE DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - Provided is an image display device including thin film transistors on a substrate, including: gate lines and drain lines intersecting the gate lines, each thin film transistor having, in a channel region, a laminate structure in which a gate electrode, a gate insulating film, and a semiconductor layer are laminated in the stated order from the substrate side; and a pair of removal regions in which parts of the gate insulating film are removed, which are formed on both sides of the gate electrode and formed in a channel width direction of the channel region, in which when W represents a width of the gate electrode in the channel width direction of the channel region, and R represents a width of the gate insulating film in the channel width direction, which is sandwiched between the pair of removal regions, R≧W is satisfied.10-27-2011
20110186849TFT SUBSTRATE FOR DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - Disclosed is a TFT substrate for a display apparatus comprising a gate wiring including a gate electrode, a data wiring including a data line, a source electrode connected to the data line, and a drain electrode connected to a pixel electrode, and a semiconductor layer disposed between the gate wiring and the data wiring, wherein the semiconductor layer under the drain electrode is disposed within an area overlapping the gate electrode and the semiconductor layer under the source electrode extends outward to an area not overlapping the gate electrode. Advantageously, the present disclosure provides a TFT substrate for a display apparatus having a high aperture ratio and causing less afterimaging, and a manufacturing method of the same.08-04-2011
20120146037THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME - Provided is a thin film transistor, wherein the on-off ratio thereof is increased by decreasing the OFF current thereof. A bottom-gate TFT (06-14-2012
20120146032ORGANIC LIGHT EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD FOR THE SAME - An organic light emitting display device includes a substrate, a thin film transistor formed on the substrate and including an active layer, a gate electrode including a gate lower electrode and a gate upper electrode, a source electrode, and a drain electrode, an organic light emitting device electrically connected to the thin film transistor, wherein a pixel electrode formed of the same material as at least a part of the gate electrode in the same layer, an intermediate layer including a light emitting layer, and an opposed electrode arranged to face the pixel electrode are sequentially deposited.06-14-2012
20120146031Organic Light-Emitting Display Device and Method of Manufacturing the Same - An organic light-emitting display device in which a pixel electrode is formed by extending from source and drain electrodes, a capacitor including a thin upper capacitor electrode formed below the pixel electrode and constituting a metal-insulator-metal (MIM) CAP structure, thereby simplifying manufacturing processes, increasing an aperture ratio, and improving a voltage design margin.06-14-2012
20120146030Organic Light-Emitting Display Device and Method of Manufacturing the Same - An organic light-emitting display device is manufactured via a simple process and has an improved aperture ratio. The organic light-emitting display device comprising: a substrate; an auxiliary electrode formed on the substrate; a thin film transistor (TFT) formed on the auxiliary electrode, the TFT comprising an active layer, a gate electrode, a source electrode and a drain electrode; an organic electroluminescent (EL) device electrically connected to the TFT and formed by sequentially stacking a pixel electrode formed on the same layer by using the same material as portions of the source and drain electrodes, an intermediate layer comprising an organic light emission layer (EML), and an opposite electrode disposed to face the pixel electrode; and a contact electrode formed on the same layer by a predetermined distance by using the same material as the source and drain electrodes, and electrically connecting the auxiliary electrode and the opposite electrode.06-14-2012
20120146039THIN FILM TRANSISTOR AND DISPLAY - A thin film transistor capable of reliably preventing the entry of light into an active layer, and a display including the thin film transistor are provided. A thin film transistor includes: a gate electrode; an active layer; and a gate insulating film arranged between the gate electrode and the active layer, the gate insulating film including a first insulating film, a first light-absorbing layer and a second insulating film, the first insulating film arranged in contact with the gate electrode, the first light-absorbing layer arranged in contact with the first insulating film and made of a material absorbing light of 420 nm or less, the second insulating film arranged between the first light-absorbing layer and the active layer.06-14-2012
20110095297DISPLAY DEVICE AND SEMICONDUCTOR DEVICE - An object is to provide a display device with a high aperture ratio or a semiconductor device in which the area of an element is large. A channel formation region of a TFT with a multi-gate structure is provided under a wiring that is provided between adjacent pixel electrodes (or electrodes of an element). In addition, a channel width direction of each of a plurality of channel formation regions is parallel to a longitudinal direction of the pixel electrode. In addition, when a channel width is longer than a channel length, the area of the channel formation region can be increased.04-28-2011
20110095296THIN FILM TRANSISTOR AND ORGANIC LIGHT EMITTING DISPLAY DEVICE HAVING THE SAME - A thin film transistor (TFT) and an organic light emitting display device having the same are disclosed. In one embodiment, a TFT includes a gate electrode formed on a substrate. A gate insulating layer is formed on the substrate having the gate electrode. An active layer is formed on the gate insulating layer. A source electrode is formed over the active layer. A drain electrode is formed to substantially surround at least three surfaces of the source electrode on the active layer.04-28-2011
20110095295Thin Film Transistor Substrate And Method For Fabricating The Same - The present invention relates to a thin film transistor substrate and method for fabricating the same which can secure an alignment margin and reduce the number of mask steps. A thin transistor substrate according to the present invention includes a gate line and a data line crossing each other to define a pixel, a gate metal pattern under the data line, a thin film transistor having a gate electrode, a source electrode and a drain electrode in the pixel, and a pixel electrode connected to the drain electrode of the thin film transistor by a connection electrode, wherein the data line has a plurality of first slits to disconnect the gate metal pattern from the gate line.04-28-2011
20110095294THIN FILM TRANSISTOR ARRAY PANEL AND METHOD OF MANUFACTURING THE SAME - A thin film transistor array panel includes: an insulation substrate; a gate line disposed on the insulation substrate and including a compensation pattern protruding from the gate line; a first data line and a second data line both intersecting the gate line; a first thin film transistor connected to the gate line and the first data line; a second thin film transistor connected to the gate line and the second data line; and a first pixel electrode and a second pixel electrode connected to the first thin film transistor and the second thin film transistor, respectively. The first pixel electrode and the second pixel electrode share the compensation pattern.04-28-2011
20110095293THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes: a substrate, a gate line disposed on the substrate, a data line intersecting the gate line, a drain electrode separated from the data line a first insulating layer covering the data line, a color filter disposed on the first insulating layer, a second insulating layer disposed on the color filter and having a contact hole exposing the drain electrode and the color filter and a pixel electrode disposed on the second insulating layer and connected to the drain electrode through the contact hole. The contact hole partially exposes the color filter near a portion where the drain electrode and the pixel electrode are connected to each other, and the pixel electrode covers the color filter exposed through the contact hole.04-28-2011
20110101360SEMICONDUCTOR DEVICE AND A METHOD FOR MANUFACTURING THE SAME - A thin film transistor of the present invention has an active layer including at least source, drain and channel regions formed on an insulating surface. A high resistivity region is formed between the channel region and each of the source and drain regions. A film capable of trapping positive charges therein is provided on at least the high resistivity region so that N-type conductivity is induced in the high resistivity region. Accordingly, the reliability of N-channel type TFT against hot electrons can be improved.05-05-2011
20110101359ORGANIC ELECTRO-LUMINESCENT DISPLAY DEVICE - An organic electro-luminescent display device includes a substrate, a pixel electrode on the substrate, and a pixel define layer covering edges of the pixel electrode and having an opening to expose the pixel electrode, a surface of the pixel define layer facing the opening being bent at a predetermined curvature.05-05-2011
20110175095ORGANIC LIGHT-EMITTING DIODE DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - Provided are an organic light-emitting diode (OLED) display apparatus and a method of manufacturing the OLED display apparatus. Pixel-defining layers (PDLs) are formed of inorganic and organic insulating layers to minimize non-uniformities of the thicknesses of organic emission layers (OEMLs) and planarize lower thin film transistors (TFTs). Therefore, a lifespan of the OLED display apparatus is improved.07-21-2011
20100258807DISPLAY DEVICE - The present invention provides a display device where thin film transistors are formed on a substrate on which an image display portion is formed, wherein the thin film transistors comprise: a gate electrode; a gate insulating film formed so as to cover the gate electrode; a semiconductor layer in island form which is formed on the gate insulating film so as to overlap with the gate electrode; and a pair of electrodes formed on the semiconductor layer so as to face each other, and the semiconductor layer is provided within a region where the gate electrode is formed as viewed in a plane, and formed of a crystal semiconductor layer and an amorphous semiconductor layer, which are layered in sequence on the gate electrode side, characterized in that the gate electrode is formed so as to have such a film thickness that the light transmittance is 0.3% or less at least in the region facing the semiconductor layer.10-14-2010
20110260170SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND ELECTRONIC DEVICE - A pixel includes a load, a transistor which controls a current supplied to the load, a storage capacitor, and first to fourth switches. By inputting a potential in accordance with a video signal into the pixel after the threshold voltage of the transistor is held in the storage capacitor, and holding a voltage of the sum of the threshold voltage and the potential, variations of a current value caused by variations of threshold voltage of a transistor can be suppressed. Consequently, a predetermined current can be supplied to the load such as a light-emitting element. Further, by changing the potential of a power supply line, a display device with a high duty ratio can be provided.10-27-2011
20110260169DISPLAY DEVICE AND ELECTRONIC DEVICE - An object of the invention is to provide a circuit technique which enables reduction in power consumption and high definition of a display device. A switch controlled by a start signal is provided to a gate electrode of a transistor, which is connected to a gate electrode of a bootstrap transistor. When the start signal is input, a potential is supplied to the gate electrode of the transistor through the switch, and the transistor is turned off. The transistor is turned off, so that leakage of a charge from the gate electrode of the bootstrap transistor can be prevented. Accordingly, time for storing a charge in the gate electrode of the bootstrap transistor can be shortened, and high-speed operation can be performed.10-27-2011
20100059752DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME - A method of manufacturing a display substrate and a display substrate manufactured by the same that are capable of improving display quality are presented. The method includes forming a gate wiring, a data wiring, a thin film transistor connected to the gate wiring and the data wiring respectively, and a protective insulating layer covering the gate wiring, the data wiring and the thin film transistor; forming a first black matrix pattern on the protective insulating layer; forming a protective insulating layer pattern by etching a part of the protective insulating layer by using the first black matrix pattern as an etching mask; forming a second black matrix pattern exposing at least one pixel region by removing a part of the first black matrix pattern; forming a color filter on the pixel region; and forming a pixel electrode electrically connected to the thin film transistor on at least a part of the color filter.03-11-2010
20100059755IMPROVED OXIDE-BASED FIELD-EFFECT TRANSISTORS - A field-effect transistor includes a source region; a drain region; a semiconductor layer disposed between the source and drain regions; a gate region; and a dielectric region disposed between the semiconductor layer and the gate region. The semiconductor layer comprises a titanium dioxide film. The transistor may be light sending, gas- or bio-sensing, or used in a visual display or in electronic circuits. The transistor is formed by forming a dielectric layer adjacent a gate region; forming a source region and a drain region; and forming a semiconductor layer on the dielectric layer, the semiconductor layer comprising titanium dioxide. The titanium dioxide semiconductor layer may be deposited by spray pyrolysis, or alternatively mesoporous TiO03-11-2010
20100059754ORGANIC LIGHT EMITTING DEVICE AND A MANUFACTURING METHOD THEREOF - An organic light emitting device, wherein a color filter is formed in a display device displaying a color by using a micro-cavity effect, and grooves with a concave lens shape are formed In the surface of the color filter. As a result, the amount of emitted light is increased and the viewing angle is improved due to the grooves with the concave lens shape.03-11-2010
20080217620THIN FILM TRANSISTOR, METHOD OF FABRICATING THE SAME, AND ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE INCLUDING THE SAME - A thin film transistor includes: a substrate; a semiconductor layer disposed on the substrate, and including a channel region, source and drain regions, and edge regions having a first impurity formed at edges of the source and drain regions, and optionally, in the channel region; a gate insulating layer insulating the semiconductor layer; a gate electrode insulated from the semiconductor layer by the gate insulating layer; and source and drain electrodes electrically connected to the semiconductor layer.09-11-2008
20110186848Semiconductor device and display device - A semiconductor device can easily reduce a leak current which flows when a reversely-staggered-type TFT element in which an active layer is made of polycrystalline semiconductor is turned off. The semiconductor device includes a reversely-staggered-type TFT element in which a semiconductor layer, a source electrode and a drain electrode are arranged on a surface of an insulation film, and a portion of the source electrode and a portion of the drain electrode respectively get over the semiconductor layer. The active layer of the semiconductor layer is mainly made of polycrystalline semiconductor constituted of strip-shaped crystals elongated in the channel length direction of the TFT element, and is configured in a plan view such that the source electrode and the drain electrode are respectively pulled out from positions above the active layer in the channel width direction of the TFT element and in the directions opposite to each other, and the source electrode intersects with only one side out of two sides of the active layer which extend in the channel length direction, and the drain electrode intersects with only another side out of two sides of the active layer which extend in the channel length direction.08-04-2011
20110186846Organic Light Emitting Display Device - A transparent organic light emitting display device having improved transmittance comprises: a first substrate having a transmitting region and a plurality of pixel regions separated from each other by the transmitting region; thin film transistors positioned on a first surface of the first substrate and disposed in the pixel regions of the substrate; a passivation layer covering the thin film transistors; a plurality of pixel electrodes, formed on the passivation layer so as to be electrically connected to the thin film transistors, located in the pixel regions, and overlapping and covering the thin film transistors; an opposite electrode facing the pixel electrodes, formed to be able to transmit light, and located in the transmitting region and the pixel regions; an organic emission layer interposed between the pixel electrode and the opposite electrode to emit light; a second substrate facing the opposite electrode and bonded to the first substrate; and a conduction unit interposed between the second substrate and the opposite electrode, and having both ends contacting the second substrate and the opposite electrode.08-04-2011
20110186850LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME, AND LIQUID CRYSTAL TELEVISION RECEIVER - At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.08-04-2011
20110186847ORGANIC LIGHT EMITTING DIODE DISPLAY AND FABRICATING METHOD OF THE SAME - An organic light emitting diode display and a fabricating method of the same are disclosed. In one embodiment, the display includes i) a substrate having a thin film transistor region and a pixel region, ii) a semiconductor layer formed in the thin film transistor region, iii) a gate insulating layer formed on the substrate and the semiconductor layer and vi) a lower electrode formed on the gate insulating layer, wherein the lower electrode is formed in the pixel region. The display further includes i) a gate electrode formed on the gate insulating layer, wherein the gate electrode is formed substantially directly above the semiconductor layer, ii) an interlayer insulating layer formed on the gate insulating layer, the lower electrode and the gate electrode and iii) source and drain electrodes formed on the interlayer insulating layer and electrically connected with the semiconductor layer. Each of the lower electrode and the gate electrode is formed of a first conductive layer and a second conductive layer formed on the first conductive layer. The second conductive layer and the source/drain electrodes are formed of the same material.08-04-2011
20110147751DISPLAY PANEL SUBSTRATE, DISPLAY PANEL, METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE, AND METHOD FOR MANUFACTURING DISPLAY PANEL - A display panel substrate in which the width of a trace can be reduced without impairing a signal transfer capability of the trace. A display panel substrate (06-23-2011
20110147748DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - A display device and a fabricating method of the same are disclosed. The display device includes a first substrate comprising a display region defined in a center thereof and a non-display region defined in an outer area thereof, the display region comprising a thin film layer transistor array and the non-display region comprising a pad electrode; an IC substrate opposed to a predetermined area of the non-display region; a circuit pad electrode formed on the IC substrate; a step pattern formed on the circuit pad electrode, the step pattern made of an organic dielectric layer; a circuit pad contact hole formed in the step pattern the to partially expose the circuit pad electrode; a transparent circuit pad electrode formed on the step pattern including the circuit pad contact hole; and a conductive adhesive formed between the first substrate and the IC substrate, the conductive adhesive comprising conductive balls to electrically connect the transparent circuit pad electrode and the pad electrode with each other.06-23-2011
20110147747Display Device and Method of Manufacturing the Same - A display device includes a flexible panel and a cover member. The flexible panel includes a first substrate and a second substrate. The first substrate includes a first support layer in which an organic insulation layer and an inorganic insulation layer are stacked thereon, and a thin-film transistor and a pixel electrode disposed on the first support layer. The second substrate is opposite to the first substrate. The second substrate includes an organic insulation layer and a second support layer on which the inorganic insulation layer is deposited. The cover member covers an outer surface of the flexible panel. Thus, a display device is manufactured by using a support layer on which an organic insulation layer and an inorganic insulation layer are coated as a base substrate, so that defects generated in a manufacturing process may be prevented.06-23-2011
20110186845CRYSTALLIZATION METHOD OF AMORPHOUS SEMICONDUCTOR FILM, THIN FILM TRANSISTOR, AND MANUFACTURING METHOD OF THIN FILM TRANSISTOR - Provided is a thin film transistor that includes a gate electrode formed in one major plane of a substrate, a gate insulating film covering the gate electrode, a semiconductor film formed opposite to the gate electrode with the gate insulating film interposed and including a first amorphous region to serve as a source region, a second amorphous region to serve as a drain region, and a crystalline region to serve as a channel region disposed between the first amorphous region and the second amorphous region, and a source electrode and a drain electrode formed above the semiconductor film without direct contact with the crystalline region and electrically connected to the source region and the drain region, respectively.08-04-2011
20110186844DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a substrate, a pixel electrode and a dummy pattern part. The substrate includes a display area and a peripheral area surrounding the display area. The pixel electrode is disposed in the display area and electrically connected to gate and data lines. The dummy pattern part is disposed in the peripheral area and includes a plurality of first dummy electrodes connected to each other in a network form through connection electrodes and a plurality of second dummy electrodes respectively disposed over the first dummy electrodes.08-04-2011
20100025687IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME - An image sensor and a method for manufacturing the same are provided. The image sensor comprises a readout circuitry, a first interlayer dielectric with an interconnection therein, a second interlayer dielectric, an image sensing device, and a contact plug. The readout circuitry is formed in a first substrate. The first interlayer dielectric is formed over the first substrate. The interconnection is electrically connected to the readout circuitry. The second interlayer dielectric is formed over the first interlayer dielectric. The image sensing device comprises a first laser annealed trench and is disposed over the second interlayer dielectric. The contact plug penetrates the first laser annealed trench and the second interlayer dielectric and electrically connects the image sensing device and the interconnection.02-04-2010
20100025689THIN FILM TRANSISITOR ARRAY PANEL AND MANUFACTURING TMETHOD THEREOF - A thin film transistor array panel according to an embodiment includes: a substrate; a plurality of gate line formed on the substrate; a plurality of first capacitor electrodes formed on the substrate and separated from the gate lines; a plurality of data line intersecting the gate lines; a plurality of thin film transistor connected to the gate lines and the data lines; a plurality of second capacitor electrodes disposed on the first electrode; a plurality of interconnections connected to the second capacitor electrodes and the thin film transistor and disposed symmetrical to the data lines; and a plurality of pixel electrode, each pixel electrode including a first subpixel electrode connected to one of the thin film transistors and a second subpixel electrode connected to one of the first capacitor electrodes.02-04-2010
20100025688SEMICONDUCTOR ELEMENT AND DISPLAY DEVICE USING THE SAME - Provided is a semiconductor element including: a semiconductor having an active layer; a gate insulating film which is in contact with the semiconductor; a gate electrode opposite to the active layer through the gate insulating film; a first nitride insulating film formed over the active layer, a photosensitive organic resin film formed on the first nitride insulating film; a second nitride insulating film formed on the photosensitive organic resin film; and a wiring provided on the second nitride insulating film, in which a first opening portion is provided in the photosensitive organic resin film, an inner wall surface of the first opening portion is covered with the second nitride insulating film, a second opening portion is provided in a laminate including the gate insulating film, the first nitride insulating film, and the second nitride insulating film inside the first opening portion, and the semiconductor is connected with the wiring through the first opening portion and the second opening portion.02-04-2010
20110215329ORGANIC LIGHT-EMITTING DISPLAY DEVICE - An organic light-emitting display device, formed to be transparent, includes a substrate; a plurality of thin film transistors disposed on the substrate; a passivation layer covering the plurality of thin film transistors; a plurality of pixel electrodes disposed on the passivation layer and connected electrically to the plurality of thin film transistors, and overlapping and covering the plurality of thin film transistors; a first conductive unit disposed on the passivation layer to be disconnected electrically from the pixel electrodes; a pixel defining layer formed on the passivation layer to cover edges of the pixel electrodes; an opposite electrode facing the plurality of pixel electrodes, and covering at least part of the first conductive unit; an organic layer, including an emission layer, disposed between the pixel electrodes and the opposite electrode; and a second conductive unit connected electrically to a portion of the opposite electrode and the first conductive unit.09-08-2011
20100019245LIGHT EMITTING DEVICE - The invention provides a light emitting device which is capable of displaying on both sides, has a small volume, and is capable of being used as a module. A light emitting element represented by an EL element and the like is used in a pixel portion, and two pixel portions are provided in one light emitting device. A first pixel portion has a structure to emit light only from a counter electrode side of the light emitting element. A second pixel portion has a structure to emit light only from a pixel electrode side of the light emitting element. That is, in the first pixel portion and the second pixel portion, directions of light emission are reverse in front and back.01-28-2010
20100019244METHOD FOR FABRICATING THIN FILM PATTERN, LIQUID CRYSTAL DISPLAY PANEL AND METHOD FOR FABRICATING THEREOF USING THE SAME - A method of fabricating a thin film pattern according to an embodiment of the present invention comprises forming an organic material pattern on a substrate, forming a metal material of liquid phase on a substrate provided with the organic material pattern, hardening the metal material of liquid phase, and removing the metal material located on the organic material pattern, allowing some metal material to be left at an area non-overlapped with the organic material pattern.01-28-2010
20100019243THIN FILM TRANSISTOR SUBSTRATE, ELECTRONIC APPARATUS, AND METHODS FOR FABRICATING THE SAME - A TFT substrate includes a substrate and at least a TFT disposed thereon. The TFT includes a semiconductor island and at least a gate. The semiconductor island has a source region, a drain region, and a channel region interposed therebetween. The semiconductor island has sub-grain boundaries. The gate corresponds to the channel region. A first included angle between an extending direction of the gate and a line connecting the centroid of the source region with the centroid of the drain region is not substantially equal to 90 degrees. A second included angle between the sub-grain boundaries in the channel region and the line connecting the centroid of the source region with the centroid of the drain region is not substantially equal to 0 degree or 90 degrees. Additionally, a method of fabricating a TFT substrate, an electronic apparatus, and a method of fabricating the electronic apparatus are also provided.01-28-2010
20120146029THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes an insulating substrate, a gate line disposed on the insulating substrate having a gate electrode, a first gate insulating layer disposed on the gate line and made of silicon nitride, a second gate insulating layer disposed on the first gate insulating layer and made of silicon oxide, an oxide semiconductor disposed on the second gate insulating layer, a data line disposed on the oxide semiconductor and having a source electrode, a drain electrode disposed on the oxide semiconductor and facing the source electrode, and a pixel electrode that is connected to the drain electrode. A thickness of the second gate insulating layer may range from 200 Å to less than 500 Å.06-14-2012
20100320473THIN FILM TRANSISTOR STRUCTURE OF PIXEL - A thin film transistor structure of a pixel is provided. In the present invention, a first metal layer serves as a gate electrode, and the gate electrode includes an extending gate electrode portion. A second metal layer includes a drain electrode partially and respectively overlapping the gate electrode and the gate electrode portion with the amorphous silicon layer interposed therebetween so as to form a first parasitic capacitor and a second parasitic capacitor. The total capacitance of the first parasitic capacitor and the second parasitic capacitor is invariable to withstand deviation caused by vibration of the machine in the photolithographic process, so that undesired effects in the liquid crystal display panel such as mura and flicker can be reduced.12-23-2010
20100258806ELECTRONIC DEVICE, METHOD OF PRODUCING THE SAME, AND DISPLAY DEVICE - An electronic device includes: a substrate; a lower electrode which is provided on the substrate and has an edge portion cross-section having a taper angle of 60° or less; a SiO10-14-2010
20090173943ACTIVE MATRIX ARRAY STRUCTURE AND MANUFACTURING MEHTOD THEREOF - An active matrix array structure, disposed on a substrate, includes a first patterned conductive layer, a patterned gate insulating layer, a patterned semiconductor layer, a second patterned conductive layer, a patterned overcoat layer and a transparent conductive layer. The patterned gate insulating layer has first openings that expose a part of the first patterned conductive layer. The patterned semiconductor layer is disposed on the patterned gate insulating layer. The second patterned conductive layer is disposed on the patterned semiconductor layer. The patterned overcoat layer has second openings that expose a part of the first patterned conductive layer and a part of the second patterned conductive layer. The transparent conductive layer is completely disposed on the substrate. The transparent conductive layer disposed in the first openings and the second openings is broken off at a position that is in between the substrate and the patterned overcoat layer.07-09-2009
20090146148Backside illuminated image sensor - A backside illuminated image sensor includes a light receiving element disposed in a first substrate, an interlayer insulation layer disposed on the first substrate having the light receiving element, an align key spaced apart from the light receiving element and passing through the interlayer insulation layer and the first substrate, a plurality of interconnection layers disposed on the interlayer insulation layer in a multi-layered structure, wherein the backside of the lowermost interconnection layer is connected to the align key, a passivation layer covering the interconnection layers, a pad locally disposed on the backside of the first substrate and connected to the backside of the align key, a light anti-scattering layer disposed on the backside of the substrate having the pad, and a color filter and a microlens disposed on the light anti-scattering layer to face the light receiving element.06-11-2009
20110073865Display Device and Manufacturing Method Thereof - Conventionally, photolithography and anisotropic etching are performed to form a plug between an electrode and a wiring, etc., thereby increasing the number of steps, getting the throughput worse, and producing unnecessary materials. To solve the problems, the present invention provides a method for manufacturing a display device, including the formation steps of a conductive layer or wirings, and a contact plug that can treat a larger substrate. In the case of forming a plug for electrically connecting conductive patterns comprising plural layers, a pillar made of a conductor is formed over a base conductive layer pattern, and then, after an insulating film is formed over the entire surface, the insulating film is etched back to expose the conductor pillar, and a conductive pattern in an upper layer is formed by ink jetting. In this case, when the conductor pillar is processed, a resist to be a mask can be formed in itself by ink jetting.03-31-2011
20110073864ARRAY SUBSTRATE AND MANUFACTURING METHOD - A method of manufacturing an array substrate comprising: forming a data line and a gate line which are crossed with each other and a gate electrode on a base substrate, and the data line is discontinuously disposed so as to be separated from the gate line or the gate line is discontinuously disposed so as to be separated from the data line; forming an active layer and a gate insulating layer including bridge via holes and a source electrode via hole on the base substrate, and the bridge via holes are located at positions respectively corresponding to adjacent discontinuous sections of the data line or adjacent discontinuous sections of the gate line, and the source electrode via hole is located at a position corresponding to the data line; and forming a pixel electrode, a source electrode, a drain electrode and a bridge line on the base substrate, and the pixel electrode and the drain electrode are formed integrally, and the source electrode is connected to the data line through the source electrode via hole, and the bridge line connects the adjacent discontinuous sections of the data line or the adjacent discontinuous sections of the gate line through the bridge via holes.03-31-2011
20110073863Organic light emitting diode display - An organic light emitting diode display includes a thin film transistor on a substrate (03-31-2011
20110073862ARRAY STRUCTURE AND FABRICATING METHOD THEREOF - An array structure, which includes a TFT, a passivation layer, a pixel electrode, a first connecting layer and a first spacer is provided. The TFT includes a gate, a source and a drain. The passivation layer overlays the TFT. The pixel electrode is located on the passivation layer. The first connecting layer is located on the pixel electrode and electrically connected to the pixel electrode and the drain. The first spacer is located on the first connecting layer.03-31-2011
20110133195Thin film transistor, display device including the same, and method of manufacturing the display device - A thin film transistor, a display device including the same, and a method of manufacturing the display device, the thin film transistor including a substrate; a gate electrode on the substrate; a gate insulating layer on the gate electrode; a semiconductor layer on the gate insulating layer; and source/drain electrodes electrically connected with the semiconductor layer, wherein the gate electrode has a thickness of about 500 Å to about 1500 Å and the gate insulating layer has a thickness of about 1600 Å to about 2500 Å.06-09-2011
20110147750DISPLAY DEVICE - A resin material having a small relative dielectric constant is used as a layer insulation film 06-23-2011
20120097952Organic Light-Emitting Display Apparatus - An organic light-emitting display apparatus comprises: a substrate in which a pixel region is defined; a thin film transistor (TFT) disposed on the substrate and spaced apart from the pixel region; a planarization pattern covering the TFT and spaced apart from the pixel region; a first electrode electrically connected to the TFT and formed so as to correspond to at least the pixel region; a pixel-defining layer formed on the first electrode so as to expose a predetermined region of the first electrode; an intermediate layer connected to the exposed region of the first electrode, including an organic emission layer, and formed to correspond to at least the pixel region; and a second electrode electrically connected to the intermediate layer.04-26-2012
20120032176Electronic Paper Device And Manufacturing Method Thereof - This present invention provides an electronic paper display device. The electronic paper display device includes a thin film transistor array substrate and a display panel disposed on one side of the thin film transistor array substrate. The thin film transistor array substrate comprises a first substrate, a first metal layer, a dielectric layer, a second metal layer, a channel layer, a pixel electrode layer, a protection layer, a first resin layer and a second resin layer. The display panel includes a second substrate, a transparent electrode layer disposed on the second substrate, and an electronic ink material layer between the transparent electrode layer and the thin film transistor array substrate.02-09-2012
20120032179THIN-FILM TRANSISTOR ARRAY DEVICE, ORGANIC EL DISPLAY DEVICE, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR ARRAY DEVICE - A thin-film transistor array device includes: a driving TFT including a first crystalline semiconductor film including crystal grains having a first average grain size; and a switching TFT including a second crystalline semiconductor film including crystal grains having a second average grain size that is smaller than the first average grain size. The first crystalline semiconductor film and the second crystalline semiconductor film are formed at the same time by irradiating a noncrystalline semiconductor film using a laser beam having a Gaussian light intensity distribution such that a temperature of the noncrystalline semiconductor film is within a range of 600° C. to 1100° C., and the first crystalline semiconductor film is formed such that the temperature of the noncrystalline semiconductor film is within a temperature range of 1100° C. to 1414° C. due to latent heat generated by the laser irradiation.02-09-2012
20120032175DISPLAY STRUCTURE - A display structure includes a first transparent substrate, a second transparent substrate opposite the first transparent substrate, a display medium interposed between the first transparent substrate and the second transparent substrate, at least one first thin film transistor formed on the first transparent substrate, a first insulation layer formed on the first transparent substrate, a first electrode layer formed on the first insulation layer, an organic light-emitting layer formed on the first electrode layer and in a region not overlapping the first thin film transistor, a cathode layer formed on the organic light-emitting layer, and a second electrode layer formed on the second transparent substrate.02-09-2012
20130168679SEMICONDUCTOR DISPLAY DEVICE HAVING PATTERNED PADS AND IN CONTACT WITH A CIRCUIT BOARD BY THEMAL ADHESIVE RESIN MATERIAL - A display device includes a substrate comprising a display unit for displaying an image, a non-display unit around the display unit, and at least one first pad for sending an electrical signal to the display unit, a circuit board on the substrate and comprising at least one circuit terminal, and a conductive film between the substrate and the circuit board and including a plurality of conductive particles for electrically connecting the first pad and the circuit terminal, and an insulating resin surrounding the conductive particles, wherein the first pad includes a plurality of fine pad lines, and a region into which the insulating resin is dispersed during a thermal compressing operation located between adjacent ones of the fine pad lines.07-04-2013
20110140112ORGANIC LIGHT EMITTING DISPLAY AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display and a method of manufacturing the same are disclosed. In one embodiment, the display includes a gate electrode formed over a substrate and an active layer electrically insulated from the gate electrode, wherein the gate electrode is closer to the substrate than the active layer. The display further includes i) a first gate insulating layer and a second gate insulating layer formed between the gate electrode and active layer so as to electrically insulate the active layer from the gate electrode and ii) source and drain electrodes each contacting the active layer.06-16-2011
20100059753MATRIX ELECTRONIC DEVICES USING OPAQUE SUBSTRATES AND FABRICATION METHOD THEREFOR - A fabrication method is described for forming an electronic circuit on a flexible substrate consisting of plastic and opaque foils. Corresponding circuit structures are also described herein. The opaque substrate can be selected from a set of polymers which have the appropriate thermo-mechanical properties. The foil geometry of the opaque substrate can be selected to maximize the structural integrity on the display in the planar directions but have excellent mechanical stress distribution when bent or flexed.03-11-2010
20120305927DISPLAY DEVICE - The present invention provides an active matrix type display device having a high aperture ratio and a required auxiliary capacitor. A source line and a gate line are overlapped with part of a pixel electrode. This overlapped region functions to be a black matrix. Further, an electrode pattern made of the same material as the pixel electrode is disposed to form the auxiliary capacitor by utilizing the pixel electrode. It allows a required value of auxiliary capacitor to be obtained without dropping the aperture ratio. Also, it allows the o electrode pattern to function as a electrically shielding film for suppressing the cross-talk between the source and gate lines and the pixel electrode.12-06-2012
20120305925THIN-FILM TRANSISTOR SUBSTRATE - Gate electrodes, a gate insulating layer, and an oxide semiconductor layer are simultaneously formed to form a multilayer structure, so that an SOG film serves as an etching stopper on channel regions in forming source electrodes and drain electrodes. In the SOG film, channel isolation holes are formed in positions each of which is located between adjacent two of TFTs connected to a common one of the gate lines, and corresponds to the common gate line. The oxide semiconductor layer of the adjacent TFTs is divided in each channel isolation hole. Terminal sections of the gate lines are exposed in the terminal section exposing holes formed in positions each corresponding to a gate line end portion. The pixel electrode is made of a film identical to a film forming one layer included in the drain electrode.12-06-2012
20120305924SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THEREOF - To provide a liquid crystal display device having high quality display by obtaining a high aperture ratio while securing a sufficient storage capacitor (Cs), and at the same time, by dispersing a load (a pixel writing-in electric current) of a capacitor wiring in a timely manner to effectively reduce the load. A scanning line is formed on a different layer from a gate electrode and the capacitor wiring is arranged so as to be parallel with a signal line. Each pixel is connected to the individually independent capacitor wiring via a dielectric. Therefore, variations in the electric potential of the capacitor wiring caused by a writing-in electric current of a neighboring pixel can be avoided, whereby obtaining satisfactory display images.12-06-2012
20120305926SOLID-STATE IMAGING DEVICE, PROCESS OF MAKING SOLID STATE IMAGING DEVICE, DIGITAL STILL CAMERA, DIGITAL VIDEO CAMERA, MOBILE PHONE, AND ENDOSCOPE - A solid-state imaging device includes an array of pixels, each pixel includes: a pixel electrode; an organic layer; a counter electrode; a sealing layer; a color filter; a readout circuit; and a light-collecting unit as defined herein, the photoelectric layer contains an organic p type semiconductor and an organic n type semiconductor, the organic layer further includes a charge blocking layer as defined herein, an ionization potential of the charge blocking layer and an electron affinity of the organic n type semiconductor in the photoelectric layer has a difference of at least 1 eV, and the sealing layer includes a first sealing sublayer formed by atomic layer deposition and a second sealing sublayer formed by physical vapor deposition and containing one of a metal oxide, a metal nitride, and a metal oxynitride.12-06-2012
20120305923DISPLAY DEVICE - The inventors found out that in the case of performing a low gray scale display in which a very small amount of current is supplied to a light emitting element, variations in threshold voltages of driving transistors become notable since the gate-source voltage is low. In view of this, the invention provides a display device in which variations in the threshold voltages of the driving transistors are reduced even in the low gray scale display, and a driving method thereof. According to the invention, a gate-source voltage of the driving transistor is set higher in the low gray scale display than that in the high gray scale display. As one mode to achieve this, different power source lines are provided for the low gray scale display and the high gray scale display and their potentials are set to be different.12-06-2012
20120305921THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THIN FILM TRANSISTOR, AND ORGANIC LIGHT EMITTING DIODE DISPLAY INCLUDING THE SAME - A thin film transistor may include a substrate, a buffer layer on the substrate, a semiconductor layer formed on the buffer layer, a gate insulating pattern on the semiconductor layer, a gate electrode on the gate insulating pattern, an interlayer insulating layer covering the gate electrode and the gate insulating pattern, the interlayer insulating layer having a contact hole and an opening extending therethrough, the contact hole exposing a source area and a drain area of the semiconductor layer, and the opening exposing a channel area of the semiconductor layer, and a source electrode and a drain electrode formed on the interlayer insulating layer, the source electrode being connected with the source area and the drain electrode being connected with the drain area of the semiconductor layer.12-06-2012
20120037912VISIBLE SENSING TRANSISTOR, DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - A display device includes an infrared sensing transistor and a visible sensing transistor. The visible sensing transistor includes a semiconductor on a substrate; an ohmic contact on the semiconductor; an etch stopping layer on the ohmic contact; a source electrode and a drain electrode on the etch stopping layer; a passivation layer on the source electrode and the drain electrode; and a gate electrode on the passivation layer. The etch stopping layer may be composed of the same material as the source electrode and the drain electrode. The infrared sensing transistor is similar to the visible sensing transistor except the etch stopping layer is absent.02-16-2012
20120037911DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a gate wire formed on an insulating substrate, a semiconductor pattern formed on the gate wire and containing a metal oxynitride compound, and a data wire formed on the semiconductor pattern to cross the gate wire. The semiconductor pattern has a carrier number density ranging from 1002-16-2012
20120037910DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes; a gate pattern including a gate electrode disposed on a substrate, a gate insulation layer disposed on the substrate and the gate pattern, an insulation pattern including; a first thickness part disposed on a first area of the gate insulation layer overlapping the gate electrode and a second thickness part disposed on a second area of the gate insulation layer adjacent to the first area, an oxide semiconductor pattern disposed on the first thickness part of the first area, an etch stopper disposed on the oxide semiconductor pattern, a source pattern including a source electrode and a drain electrode which contact the oxide semiconductor pattern, and a pixel electrode which contacts the drain electrode.02-16-2012
20120037909THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor array panel includes: a gate line and a storage electrode on a substrate and separated from each other; a gate insulating layer covering the gate line and the storage electrode; a data line crossing the gate line and being on the gate insulating layer; a thin film transistor formed at a crossing region of the gate line and the data line, and including a gate electrode, a source electrode, and a drain electrode; a passivation layer exposing a portion of the drain electrode and formed on the thin film transistor and the data line; and a pixel electrode contacting the drain electrode and overlapping the storage electrode with the gate insulating layer interposed therebetween.02-16-2012
20120037908THIN FILM TRANSISTOR, METHOD OF FABRICATING THIN FILM TRANSISTOR AND PIXEL STRUCTURE - A method of fabricating a TFT includes providing a substrate where a gate, an insulating layer, and a channel layer are formed. A conductive layer is formed on the substrate to cover the channel layer and the insulating layer. A photoresist layer is formed on the conductive layer. A photo mask is placed above the photoresist layer and has a data line pattern, a source pattern, and a drain pattern. A first width (W02-16-2012
20120097958ACTIVE-MATRIX FIELD EMISSION PIXEL - A field emission pixel includes a cathode on which a field emitter emitting electrons is formed, an anode on which a phosphor absorbing electrons from the field emitter is formed, and a thin film transistor (TFT) having a source connected to a current source in response to a scan signal, a gate receiving a data signal, and a drain connected to the field emitter. The field emitter is made of carbon material such as diamond, diamond like carbon, carbon nanotube or carbon nanofiber. The cathode may include multiple field emitters, and the TFT may include multiple transistors having gates to which the same signal is applied, sources to which the same signal is applied, and drains respectively connected to the field emitters. An active layer of the TFT is made of a semiconductor film such as amorphous silicon, micro-crystalline silicon, polycrystalline silicon, wide-band gap material like ZnO, or an organic semiconductor.04-26-2012
20120097956ORGANIC LIGHT EMITTING DISPLAY DEVICE - An organic light emitting display device includes a substrate; a first electrode layer formed on the substrate; an emission structure layer formed on the first electrode layer; an electron injection layer (EIL) formed immediately on the emission structure layer and comprising a composite layer of LiF:Yb; and a second electrode layer formed on the EIL.04-26-2012
20130009154ARRAY SUBSTRATE FOR ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for an organic electroluminescent display device includes a substrate including a display area and a non-display area; a gate line and a data line; a thin film transistor including a semiconductor layer of polycrystalline silicon, a gate insulating layer, a gate electrode, an inter insulating layer, a source electrode, and a drain electrode; auxiliary lines formed of a same material and on a same layer as the data line; a passivation layer of organic insulating material and including a drain contact hole exposing the drain electrode, and an auxiliary line contact hole exposing one of the auxiliary lines; and a first electrode and a line connection pattern on the passivation layer, wherein the first electrode contacts the drain electrode and the line connection pattern contacts the one of the first auxiliary pattern.01-10-2013
20120112197ACTIVE MATRIX SUBSTRATE AND ACTIVE MATRIX DISPLAY DEVICE - A stem wiring (05-10-2012
20120112196THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF - The present invention provides a structure of the TFT in which a current-voltage characteristic can be improved. The present invention refers to a thin film transistor comprising a lamination layer wherein a first conductive film, a first insulating film and a second conductive film are sequentially laminated, a semiconductor film formed so as to be in contact with the side surface of the lamination layer, and a third conductive film covering the semiconductor film through a second insulating film. The first conductive film and the second conductive film are a source electrode and a drain electrode, and a region which is in contact with the first insulating film and the third conductive film is a channel forming region in semiconductor film, and the third conductive film is a gate electrode.05-10-2012
20120043547THIN FILM CHARGED BODY SENSOR - A thin film charged body sensor for sensing a contact and/or non-contact movement of a charged body based on an electric field of the charged body. The thin film charged body sensor may include a substrate, a first thin film transistor unit on the substrate, and including a gate layer, an active layer insulated from the gate layer, and source/drain layers insulated from the gate layer and connected to the active layer; and a thin film antenna unit on the substrate, and including a first film including a conductive material electrically connected to the gate layer, the thin film antenna unit adapted to generate an input current in response to an electric field of a charged body.02-23-2012
20120043546ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - Disclosed is a method of manufacturing an organic light-emitting display device capable of improving efficiency of a laser generator used for crystallization of amorphous silicon. The method crystallizes amorphous silicon selectively to provide an organic light-emitting display device that includes channel area of a pixel contains polycrystalline silicon and storage area of the pixel contains amorphous silicon.02-23-2012
20120001187Electronic Device - There is provided an electronic device in which the deterioration of the device is prevented and an aperture ratio is improved without using a black mask and without increasing the number of masks. In the electronic device, a first electrode (01-05-2012
20120001185Organic Light Emitting Diode Display and Manufacturing Method Thereof - An organic light emitting diode display includes: a substrate having first and second regions; a first thin film transistor (TFT) including source and drain electrodes at the first region; a second TFT including source and drain electrodes at the second region; a protective layer on the first and second TFTs; a planarization layer pattern on the protective layer; a first pixel electrode electrically connected to the source electrode or the drain electrode of the first TFT through a first via contact hole through the protective layer; and a second pixel electrode electrically connected to the source electrode or the drain electrode of the second TFT through a second via contact hole formed through the protective layer and the planarization layer pattern, the planarization layer pattern corresponding to a shape of the second pixel electrode and located between the protective layer and the second pixel electrode.01-05-2012
20120001189THIN-FILM TRANSISTOR ARRAY AND IMAGE DISPLAY DEVICE IN WHICH THIN-FILM TRANSISTOR ARRAY IS USED - In a thin-film transistor array according to an embodiment of the present invention, thin-film transistors are disposed in a matrix array, the thin-film transistor including a gate electrode that is formed on a substrate, a gate insulating layer that is formed on the gate electrode, a source electrode that is formed on the gate insulating layer, a pixel electrode that is formed on the gate insulating layer, a drain electrode that is connected to the pixel electrode, and a semiconductor layer that is formed between the source electrode and the drain electrode, the gate electrode is connected to a gate line while the source electrode is connected to a source line, the thin-film transistor is formed in a range of the source line and the thin-film transistor array includes a stripe insulating film such that the source line and the semiconductor layer are covered with the stripe insulating film.01-05-2012
20120001182ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device that may be easily manufactured and has an excellent display quality, the organic light-emitting display device including: an active layer of a thin-film transistor (TFT) formed on a substrate and including a semiconductor material; a lower electrode of a capacitor formed on the substrate and including a semiconductor material in which impurity ions are doped; a first insulating layer formed on the substrate so as to cover the active layer and the lower electrode; a gate electrode of the TFT formed on the first insulating layer and including a first gate electrode including silver (Ag) or an Ag alloy, a second gate electrode including a transparent conductive material, and a third gate electrode including metal that are sequentially stacked in the order stated; a plurality of pixel electrodes formed on the first insulating layer and including a first pixel electrode including Ag or an Ag alloy and a second pixel electrode including a transparent conductive material that are sequentially stacked in the order stated; an upper electrode of the capacitor formed on the first insulating layer and including a first upper electrode including Ag or an Ag alloy and a second upper electrode including a transparent conductive material that are sequentially stacked in the order stated; source and drain electrodes of the TFT electrically connected to the active layer; an organic layer disposed on the pixel electrode and including an organic emission layer; and an opposite electrode disposed facing each of the pixel electrodes while the organic layer is interposed between the opposite electrode and each of the pixel electrodes, and a method of manufacturing the organic light-emitting display device.01-05-2012
20120001184ORGANIC LIGHT-EMITTING DISPLAY DEVICE - A transparent organic light-emitting display device has an improved transmittance and a reduced voltage drop in an opposite electrode. The organic light-emitting display device includes: a first substrate having a transmitting region and a plurality of pixel regions separated from each other by the transmitting region interposed between the pixel regions; a plurality of pixel electrodes being located at the pixel regions, respectively; an opposite electrode facing the pixel electrodes and being at the transmitting region and the pixel regions; a second substrate facing the opposite electrode and being bonded to the first substrate; a first conductive unit being between the second substrate and the opposite electrode, opposite ends of the first conductive unit contacting the second substrate and the opposite electrode, respectively; and a second conductive unit facing the first conductive unit and contacting the opposite electrode that is between the first conductive unit and the second conductive unit.01-05-2012
20120001188TRANSFLECTIVE TYPE LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A method of manufacturing a transflective type liquid crystal display device includes forming an organic film having different film thicknesses on a passivation film covering a TFT, etching the passivation film to form a contact hole, etching a reflective electrode and a transmissive electrode formed on the organic film by using a resist pattern having different film thicknesses, removing, by ashing, a thin film portion of the resist pattern, and a thin film portion of the organic film exposed from the transmissive electrode to form an opening, etching the reflective electrode by using the resist pattern left after the removal of the thin film portion, and bonding substrates in such a manner that a sealing material in a shape of a frame is arranged in the opening of the organic film.01-05-2012
20120001186ORGANIC EL DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME - A display panel and method of manufacturering a display panel. A plurality of contact holes penetrate through an interlayer insulation film and have wiring lines connecting first electrode plates and second electrode plates with a thin-film transistor layer. The first electrode plates and the second electrode plates each include at least one concavity. The at least one concavity included in each of the first and second electrode plates coincide with the plurality of contact holes. A total volume of the at least one concavity in any of the first electrode plates is larger than a total volume of the at least one concavity in any of the second electrode plates, while a volume of a portion of the first organic functional layer corresponding to any of the first electrode plates at least approximates a volume of the second organic functional layer corresponding to any of the second electrode plates. A portion of the first organic functional layer entered into the at least one concavity in any of the first electrode plates is larger than a portion of the second organic functional layer entered into the at least one concavity in any of the second electrode plates, so that in locations other than the at least one concavity in the first electrode plates and the second electrode plates, the first organic functional layer is thinner than the second organic functional layer.01-05-2012
20120001183Method of producing display device, display device, method of producing thin-film transistor substrate, and thin-film transistor substrate - A method of producing a display device includes the steps of forming gate electrodes on a substrate so that an arrangement of a source and a drain, in a pixel row direction, of a thin-film transistor formed in each of pixels on the substrate is reversed every pixel row; forming a gate insulating film and an amorphous semiconductor thin film on the substrate in that order so as to cover the gate electrodes; crystallizing the semiconductor thin film by irradiating the semiconductor thin film with an energy beam so that a scanning direction of the energy beam is the same with respect to the arrangement of the source and the drain in the pixel row direction; and forming a light-emitting element connected to the thin-film transistor.01-05-2012
20110156042THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF - A thin film transistor is provided with a high crystallized region in a channel formation region and a high resistance region between a source and a drain, and thus has a high electric effect mobility and a large on current. The thin film transistor includes an “impurity which suppresses generation of crystal nuclei” contained in the base layer or located on its surface, a first wiring layer over a base layer, an impurity semiconductor layer over the first wiring, a semiconductor layer over the impurity semiconductor layer, the semiconductor layer comprises a crystalline region and a region containing an amorphous phase which is formed adjacent to the base layer.06-30-2011
20110156041POLYMER SUBSTRATE AND METHOD OF FORMING THE SAME AND DISPLAY DEVICE INCLUDING THE POLYMER SUBSTRATE AND METHOD OF MANUFACTURING THE DISPLAY DEVICE - A polymer substrate having a weight loss of less than about 1% based on an initial weight at a temperature ranging from about 420° C. to about 600° C., a method for forming the polymer substrate, a display device including the polymer substrate, and a method for manufacturing the display device. The method for forming the polymer substrate includes preparing the polymer layer and performing an annealing process to the polymer layer at a temperature greater than about 350° C.06-30-2011
20110156040THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE SAME - A thin film transistor array substrate including a substrate, a gate line intersecting a data line to define a pixel region on the substrate, a switching element disposed at an intersection of the gate line and the data line, a plurality of pixel electrodes and a plurality of first common electrodes alternately arranged in the pixel region, a second common electrode overlapping the data line and interposed between a gate insulation film and a protective film, a first storage electrode on the substrate, a second storage electrode overlapping the first storage electrode, and an organic insulation film on the switching element, the second storage electrode, the data line, a gate pad, and a data pad, wherein the second common electrode covers the data line, the protective film, the organic insulation film, and the gate insulation film, and has inclined surfaces connected to the surface of the substrate.06-30-2011
20110156039DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE SAME - A display apparatus includes a display substrate and a counter substrate. The display substrate includes a first substrate and a plurality of pixel electrodes formed on the first substrate. The counter substrate includes a second substrate facing the first substrate, a common electrode formed on the second substrate, a first spacer formed on the common electrode and making contact with the display substrate, a second spacer having a first gap with the display substrate, a third spacer having a second gap larger than the first gap with the display substrate, and a fourth spacer having a third gap larger than the second gap with the display substrate.06-30-2011
20110156038ACTIVE DEVICE ARRAY SUBSTRATE - An active device array substrate including a substrate, scan lines, data lines, active devices, a first dielectric layer, a common line, a second dielectric layer, a patterned conductive layer, a third dielectric layer, and pixel electrodes is provided. At least a part of the active devices are electrically connected to the scan lines and the data lines. The first dielectric layer covers the scan lines, the data lines and the active devices. The common line is disposed on the first dielectric layer. The second dielectric layer covers the common line and the first dielectric layer. The patterned conductive layer is disposed on the second dielectric layer. The third dielectric layer covers the patterned conductive layer and the second dielectric layer. The pixel electrodes are disposed on the third dielectric layer and electrically connected to the patterned conductive layer and the active devices.06-30-2011
20120043545THIN FILM TRANSISTOR DISPLAY PANEL AND MANUFACTURING METHOD THEREOF - A thin film transistor display panel includes a substrate, a gate wire on the substrate and including a gate line and a gate electrode; a gate insulating layer on the gate wire; a semiconductor layer on the gate insulating layer; a data wire including a source electrode on the semiconductor layer, a drain electrode opposing the source electrode with respect to the gate electrode, and a data line; a passivation layer on the data wire having a contact hole exposing the drain electrode; and a pixel electrode on the passivation layer and connected to the drain electrode through the contact hole. The gate wire has a first region and second region where the gate line and the gate electrode are positioned, respectively. The thickness of the gate wire in the first region is greater than the thickness of the gate wire in the second region.02-23-2012
20120056186ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL, AND TESTING METHOD FOR ACTIVE MATRIX SUBSTRATE AND DISPLAY PANEL - An active matrix substrate including: gate lines; source lines arranged in a direction orthogonal to each of the gate lines; a gate short-circuit line to short-circuit the gate lines; a source short-circuit line to short-circuit the source lines; gate line thin film transistors each having a drain electrode being connected to the corresponding one of the gate lines, and a source electrode being connected to the gate short-circuit line; and source line thin film transistors each having a drain electrode being connected to the corresponding one of the source lines, and a source electrode being connected to the source short-circuit line, in which the gate line thin film transistors and the source line thin film transistors are of depletion-mode, and the gate electrode of each of the source line thin film transistors is connected to the gate short-circuit line.03-08-2012
20120056184Organic light-emitting display apparatus and method of manufacturing the same - An organic light-emitting display apparatus includes a light-shielding layer formed on a pixel defining layer to prevent external light or internal light from entering an active layer of a thin-film transistor (TFT), thus improving the stability of the active layer, and a method of manufacturing the organic light-emitting display apparatus.03-08-2012
20120056185LIQUID CRYSTAL DISPLAY DEVICE - In an IPS type liquid crystal display device having a reduced number of layers and formed through a reduced number of photolithography steps, an off current of a TFT is prevented from increasing due to photocurrent. A drain line, a TFT drain electrode, and a source electrode each have a multilayer structure including metal and a semiconductor layer. The drain line and the semiconductor layer formed thereunder are separated from the drain electrode and the semiconductor layer formed thereunder with the drain line and the drain electrode connected by a blocking conductive film formed of ITO of which the pixel electrode is also formed. Photocurrent generated by backlight is blocked by the blocking conductive film without flowing into the TFT. Therefore, the number of photomasks required in the production process can be decreased without an increase of causing the off current of the TFT.03-08-2012
20120061673METHOD FOR MANUFACTURING LIGHT-EMITTING DISPLAY DEVICE - It is an object of one embodiment of the present invention to manufacture a light-emitting display device by simplifying a manufacturing process of a transistor, without an increase in the number of steps as well as the number of photomasks as compared to those in the conventional case. A step for processing a semiconductor layer into an island shape is omitted by using a high-resistance oxide semiconductor which is intrinsic or substantially intrinsic for the semiconductor layer, used to form transistors. Formation of an opening in the semiconductor layer or an insulating layer formed over the semiconductor layer and etching of an unnecessary portion of the semiconductor layer are performed at the same time; thus, the number of photolithography steps is reduced.03-15-2012
20120007089ARRAY SUBSTRATE AND DISPLAY DEVICE - In the array substrate where the display region has the non-quadrangle shape, a sub-capacitance line which forms a sub-capacitance is disposed at the pixel, a intersection region of the scanning lead-out line and a signal lead-out line is located at the frame region on the outside of the display region, a common lead-out line which connects the sub-capacitance line in common is disposed at the frame region side where the scanning lead-out line is disposed, the common lead-out line is not disposed in the intersection region, but disposed in a region between a region of the scanning lead-out line and a region of the signal lead-out line while intersecting any one of the scanning lead-out line and the signal lead-out line.01-12-2012
20120007090Area Sensor and Display Apparatus Provided With An Area Sensor - An area sensor of the present invention has a function of displaying an image in a sensor portion by using light-emitting elements and a reading function using photoelectric conversion devices. Therefore, an image read in the sensor portion can be displayed thereon without separately providing an electronic display on the area sensor. Furthermore, a photoelectric conversion layer of a photodiode according to the present invention is made of an amorphous silicon film and an N-type semiconductor layer and a P-type semiconductor layer are made of a polycrystalline silicon film. The amorphous silicon film is formed to be thicker than the polycrystalline silicon film. As a result, the photodiode according to the present invention can receive more light.01-12-2012
20120007088THIN FILM TRANSISTOR ARRAY PANEL AND A METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel includes a substrate; a plurality of gate lines that are formed on the substrate; a plurality of data lines that intersect the gate lines; a plurality of thin film transistors that are connected to the gate lines and the data lines; a plurality of color filters that are formed on upper parts of the gate lines, the data lines, and the thin film transistors; a common electrode that is formed on the color filters and that includes a transparent conductor; a passivation layer that is formed on an upper part of the common electrode; and a plurality of pixel electrodes that are formed on an upper part of the passivation layer and that are connected to a drain electrode of each of the thin film transistors.01-12-2012
20120007087METHOD FOR MANUFACTURING DISPLAY DEVICE - A first conductive film, a first insulating film, a semiconductor film, an impurity semiconductor film, a second conductive film, and a first resist mask are formed; first etching is performed to expose at least a surface of the first conductive film; second etching accompanied by side etching is performed on part of the first conductive film to form a gate electrode layer; a second resist mask is formed; third etching is performed to form a source and drain electrode layers, a source and drain regions, and a semiconductor layer; a second insulating film is formed; an opening portion is formed in the second insulating film to partially expose the source or drain electrode layer; a pixel electrode is selectively formed in the opening portion and over the second insulating film; and a supporting portion formed using the gate electrode layer is formed in a region overlapping with the opening portion.01-12-2012
20120007086THIN FILM TRANSISTOR SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME - A thin film transistor substrate with an adhesive strength between a semiconductor layer and a source electrode, and between a semiconductor layer and a drain electrode; and an LCD device using the thin film transistor substrate. The thin film transistor substrate includes a substrate, a gate electrode on the substrate, a gate insulating film on the gate electrode, an active layer on the gate insulating film, an ohmic contact layer on the active layer, a barrier layer on the ohmic contact layer. The barrier layer is formed of a material layer containing Ge. A source electrode and a drain electrode are on the barrier layer. The source and drain electrodes are provided at a predetermined interval from each other.01-12-2012
20120007082THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes an insulating substrate, a plurality of pixel electrodes arranged on the insulating substrate in rows and columns, a plurality of thin film transistors connected with the plurality of pixel electrodes, respectively, and a plurality of gate lines and a plurality of data lines connected with the plurality of thin film transistors. When one data line and one pixel electrode which are connected with a single thin film transistor are referred to as a connected data line and a connected pixel electrode, respectively, the plurality of thin film transistors are positioned on a same side of the connected data line in two adjacent rows, and on alternating sides of the connected data line in every other two adjacent rows. Two boundary lines of the connected pixel electrode are overlapped with the connected data line.01-12-2012
20120007080PIXEL STRUCTURE AND PIXEL STRUCTURE OF ORGANIC LIGHT EMITTING DEVICE - A pixel structure including a first scan line, a second scan line, a data line and a power line substantially perpendicular to the first scan line and the second scan line, a reference signal line and an emission signal line substantially parallel with the first scan line and the second scan line, a common thin film transistor (C-TFT), a first pixel unit, and a second pixel unit is provided. The common thin film transistor has a common gate electrode, a common source electrode and a common drain electrode. The common gate electrode is electrically connected to the first scan line, the common drain electrode is electrically connected to the reference signal line. The first and the second pixel units respectively have a first TFT, a second TFT, a third TFT, a fourth TFT, a fifth TFT, a sixth TFT, a capacitor, and an emission device.01-12-2012
20120007084DOUBLE GATE THIN-FILM TRANSISTOR AND OLED DISPLAY APPARATUS INCLUDING THE SAME - A double gate thin-film transistor (TFT), and an organic light-emitting diode (OLED) display apparatus including the double gate TFT, includes a double gate thin-film transistor (TFT) including: a first gate electrode on a substrate; an active layer on the first gate electrode; source and drain electrodes on the active layer; a planarization layer on the substrate and the source and drain electrodes, and having an opening corresponding to the active layer; and a second gate electrode in the opening.01-12-2012
20120007083ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - An organic light-emitting display device and a method of manufacturing the organic light-emitting display device. A metal layer separated from a pixel electrode is formed without increasing the number of masks, thereby simplifying the pixel electrode and obtaining etching characteristics of a gate electrode.01-12-2012
20120119216Semiconductor Device, Method of Manufacturing A Semiconductor Device, and Display Device - A semiconductor device comprises a gate electrode that is provided on a substrate and contains Al or an Al alloy; a gate insulating film that is so formed as to cover at least the upper surface of the gate electrode and contains an anodic oxide film that is obtained by anodizing the Al or Al alloy of the gate electrode; and an insulator layer that is so formed on the substrate as to surround the gate electrode and has a thickness that is substantially equal to a total of the thickness of the gate electrode and the thickness of the gate insulating film formed on the upper surface of the gate electrode.05-17-2012
20120007085ELECTRONIC DEVICE, METHOD OF ISOLATING ELEMENTS OF ELECTRONIC DEVICE, METHOD OF PRODUCING ELECTRONIC DEVICE, AND DISPLAY APPARATUS INCLUDING ELECTRONIC DEVICE - An electronic device includes: multiple electronic elements each including a semiconductor film; and an element isolation region provided between adjacent ones of the multiple electronic elements, the element isolation region including a semiconductor film having a bandgap of 1.95 eV or more, an insulating film, and an element isolation electrode, the element isolation electrode being an electrode which is separated from the semiconductor film of the element isolation region by the insulating film and is applied with a voltage so as to increase a resistance of the semiconductor film of the element isolation region, to thereby electrically isolate the multiple electronic elements from one another.01-12-2012
20120012849ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display device capable of preventing outgassing from a pixel defining layer (PDL) or a planarization layer and method of manufacturing the same.01-19-2012
20120205657METHOD FOR MAKING SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS OBTAINED BY THE METHOD, METHOD FOR MAKING THIN FILM TRANSISTOR SUBSTRATE AND THIN FILM TRANSISTOR SUBSTRATE OBTAINED BY THE METHOD, AND METHOD FOR MAKING DISPLAY APPARATUS AND DISPLAY APPARATUS OBTAINED BY THE METHOD - A semiconductor apparatus having a substrate and a laminate structure formed on the substrate, the laminate structure including an insulating film made of a metal oxide and a semiconductor thin film, both the insulating film and the semiconductor thin film being crystallized.08-16-2012
20110049519Thin Film Transistor Array Panel and Method of Manufacturing the Same - A thin film transistor array panel includes an insulation substrate. A signal line is formed on the insulation substrate. A thin film transistor is connected to the signal line. A color filter is formed on the substrate. An organic insulator is formed on the color filter and includes a first portion and a second portion having different thicknesses. A light blocking member is formed on the second portion of the organic insulator. A difference between the surface height of the first portion of the organic insulator and the surface height of the second portion of the organic insulator is in the range of about 2.0 μm to 3.0 μm.03-03-2011
20120153290FLAT DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - A flat display device is provided. The flat display device a substrate divided into an active region for displaying an image and a peripheral region that does not display the image, and includes: a gate line that crosses a data line to define a pixel region in the active region; a thin film transistor in a region near a crossing of the gate line and the data line; a first common electrode in the pixel region; a storage electrode on the first common electrode to provide storage capacitance; a pixel electrode electrically connected with the storage electrode and overlapping the pixel region, the data line, and the gate line; and an ink film covering the active region and the peripheral region, and having microcapsules including charged particles.06-21-2012
20120153289SEMICONDUCTOR DEVICE, ACTIVE MATRIX SUBSTRATE, AND DISPLAY DEVICE - A semiconductor device which can achieve an increase in ON current and which can also achieve a reduction in leak current and an active matrix substrate and a display device using such a semiconductor device are provided. In a switching element (semiconductor device) (06-21-2012
20120153288THIN FILM TRANSISTOR DEVICE AND MANUFACTURING METHOD THEREOF - An embodiment of the disclosed technology provides a thin film transistor device comprising a source electrode, a drain electrode, a gate electrode, an active layer corresponding to the gate electrode, and a gate insulation layer formed between the gate electrode and the active layer; a concave region corresponding to the gate electrode is provided in the gate insulation layer.06-21-2012
20120153287ETCHANT, DISPLAY DEVICE AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING THE SAME - An etchant includes: 5 to 20 wt % of persulfate, 1 to 10 wt % of at least one compound of an inorganic acid, an inorganic acid salt, or a mixture thereof, 0.3 to 5 wt % of a cyclic amine compound, 1 to 10 wt % of at least one compound of an organic acid, an organic acid salt, or a mixture thereof, 0.1 to 5 wt % of p-toluenesulfonic acid, and water, based on the total weight of the etchant. A copper-titanium etchant further includes 0.01 to 2 wt % of a fluoride-containing compound. A method of forming a display device using the etchant, and a display device, are also disclosed.06-21-2012
20120104400LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A lower substrate for a liquid crystal display device and the method of making the same are disclosed. The method includes steps of: (a) providing a substrate; (b) forming a patterned transparent layer having plural recess on the substrate; (c) forming a first barrier layer on the surface of the recess; (d) coating a first metal layer on the first barrier layer and making the surfaces of the first metal layer and the transparent layer in substantially the same plane; and (e) forming a first insulated layer and a semi-conductive layer in sequence. The method further can optionally comprise the steps of: (f) forming a patterned second metal layer, wherein part of the semi-conductive layer is exposed, thus forming the source electrode and the drain electrode; and (g) forming a transparent electrode layer on part of the transparent layer and part of the second metal layer.05-03-2012
20120061675TRANSISTOR STRUCTURE, MANUFACTURING METHOD OF TRANSISTOR STRUCTURE, AND LIGHT EMITTING APPARATUS - Disclosed is a transistor structure including: a first thin film transistor including, a first gate electrode; a first insulating film; a first semiconductor film; and a first light blocking film, and a second thin film transistor including, a second semiconductor film; the second insulating film; a second gate electrode; and a second light blocking film, wherein the first semiconductor film and the second semiconductor film include a first region and a second region along a thickness direction from the first insulating film side; and degree of crystallization of silicon of one of the first region or the second region is higher than the degree of crystallization of silicon of the other of the first region or the second region.03-15-2012
20120061674Electric Device - There is provided an electric device which can prevent a deterioration in a frequency characteristic due to a large electric power external switch connected to an opposite electrode and can prevent a decrease in the number of gradations. The electric device includes a plurality of source signal lines, a plurality of gate signal lines, a plurality of power source supply lines, a plurality of power source control lines, and a plurality of pixels. Each of the plurality of pixels includes a switching TFT, an EL driving TFT, a power source controlling TFT, and an EL element, and the power source controlling TFT controls a potential difference between a cathode and an anode of the EL element.03-15-2012
20120305922DISPLAY DEVICE, ELECTRONIC APPARATUS, AND METHOD OF FABRICATING THE DISPLAY DEVICE - It is an object of the invention to provide a technique to manufacture a display device with high image quality and high reliability at low cost with high yield. The invention has spacers over a pixel electrode layer in a pixel region and over an insulating layer functioning as a partition which covers the periphery of the pixel electrode layer. When forming a light emitting material over a pixel electrode layer, a mask for selective formation is supported by the spacers, thereby preventing the mask from contacting the pixel electrode layer due to a twist and deflection thereof. Accordingly, such damage as a crack by the mask does not occur in the pixel electrode layer. Thus, the pixel electrode layer does not have a defect in shapes, thereby a display device which performs a high resolution display with high reliability can be manufactured.12-06-2012
20120153286ORGANIC LIGHT EMITTING DISPLAY DEVICE - An organic light emitting display device has high transmittancy to external light. The organic light emitting display device includes a substrate; a first wiring formed on the substrate in a first direction; second and third wirings formed on the substrate in a second direction; a first thin film transistor connected to the first and second wirings; a second thin film transistor connected to the first thin film transistor and the third wiring; and an organic light emitting display panel (OLED) connected to the second thin film transistor, wherein the second and third wirings are formed of graphene.06-21-2012
20110095298Electronic Paper - An object of the present invention is to increase the resistance of electronic paper to external stress. The resistance to external stress is increased by providing an element formation layer, which includes an integrated circuit portion, a first electrode, a second electrode, and a charged particle-containing layer, between a first insulating film including a first structure body in which a first fibrous body is impregnated with a first organic resin, and a second insulating film including a second structure body in which a second fibrous body is impregnated with a second organic resin.04-28-2011
20120068182SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, AND DISPLAY DEVICE - A semiconductor device of the present invention is a semiconductor device including a thin film transistor and a thin film diode. A semiconductor layer (03-22-2012
20110042677FLEXIBLE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - There is provided a flexible semiconductor device. The flexible semiconductor device of the present invention comprises a metal layer comprising a gate electrode, a source electrode and a drain electrode; a metal oxide film made from a metal which constitutes the metal layer and formed over a surface region of the metal layer; and a semiconductor layer formed above the gate electrode via the metal oxide film. In the flexible semiconductor device, uncovered portions, each of which is not covered with the metal oxide film, are locally formed in the surface region of the metal layer; and also electrical connections are formed between the source electrode and the semiconductor layer and between the drain electrode and the semiconductor layer via the uncovered portions.02-24-2011
20110042676TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor liquid crystal display (TFT-LCD) array substrate and a method of manufacturing a TFT-LCD array substrate are provided in the invention. The TFT-LCD array substrate comprises a plurality of gate lines and a plurality of data lines formed on a substrate. A plurality of pixel regions are defined by the gate lines and the data lines. A pixel electrode, a first thin film transistor for controlling the charge of the pixel electrode and a second thin film transistor for controlling the pre-charge of the pixel electrode are formed in each pixel region.02-24-2011
20100096634Panel structure, display device including same, and methods of manufacturing panel structure and display device - Provided may be a panel structure, a display device including the panel structure, and methods of manufacturing the panel structure and the display device. Via holes for connecting elements of the panel structure may be formed by performing one process. For example, via holes for connecting a transistor and a conductive layer spaced apart from the transistor may be formed by performing only one process.04-22-2010
20100096636THIN FILM TRANSISTOR ARRAY HAVING STORAGE CAPACITOR - A thin film transistor array comprising a substrate, a plurality of scan lines, a plurality of data lines, a plurality of thin film transistors, a plurality of common lines, a plurality of top electrodes, a plurality of connection lines and a plurality of pixel electrodes is provided. Wherein, each thin film transistor is disposed in one of the pixel areas and driven through the corresponding scan line and data line. Each thin film transistor includes a gate, a source and a drain. The drain of the thin film transistor is electrically connected to the corresponding top electrode by the corresponding connection line. Besides, the drain of the thin film transistor is electrically connected to the pixel electrode, and a portion of the connection line is not covered by the pixel electrode.04-22-2010
20090001373ELECTRODE OF ALUMINUM-ALLOY FILM WITH LOW CONTACT RESISTANCE, METHOD FOR PRODUCTION THEREOF, AND DISPLAY UNIT - Disclosed herein are an electrode of aluminum alloy film, a method for production thereof, and a display unit provided therewith, said electrode exhibiting a low electric resistance when in contact with a transparent oxide conductive film even though the aluminum alloy contains a less amount of alloying element than usual. The electrode of low contact resistance type is an aluminum alloy film in direct contact with a transparent oxide electrode, wherein said aluminum alloy film contains 0.1-1.0 atom % of metal nobler than aluminum and is in direct contact with a transparent oxide electrode through a surface having surface roughness no smaller than 5 nm in terms of maximum height Rz.01-01-2009
20090134392Organic light emitting device - An organic light emitting device includes a transistor having gate, source, and drain electrodes, and first electrode connected to one of the source or drain electrodes. The device also includes an emitting layer positioned on the first electrode and a second electrode positioned on the emitting layer. Each of the source and drain electrodes includes first, second, and third layers having different tapered angles. The first electrode may include a metallic layer and a conductive layer, with a tapered angle of the metallic layer being different from a tapered angle of the conductive layer.05-28-2009
20110089424DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS HAVING THE SAME - A display substrate includes a pixel electrode, an m-th data line (‘m’ is a natural number), a floating electrode, a (m+1)-th data line and a storage electrode. The pixel electrode is disposed in a pixel area of the substrate. The m-th data line is disposed at a first side of the pixel electrode and electrically connected to the pixel electrode. The floating electrode partially overlaps with the m-th data line. The (m+1)-th data line is disposed at a second side of the pixel electrode. The storage electrode is spaced apart from the (m+1)-th data line.04-21-2011
20110089422THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor (TFT) array panel includes: first and second pixel electrodes neighboring each other; a data line extending between the first and the second pixel electrodes; first and second gate lines extending perpendicularly to the data line; a first TFT including a first gate electrode connected to the first gate line, a first source electrode connected to the data line, and a first drain electrode facing the first source electrode and connected to the first pixel electrode; and a second TFT including a second gate electrode connected to the second gate line, a second source electrode connected to the data line, and a second drain electrode facing the second source electrode and connected to the second pixel electrode. The first source electrode has the same relative position with respect to the first drain electrode as the second source electrode with respect to the second drain electrode.04-21-2011
20110089421THIN FILM TRANSISTOR ARRAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel includes: a substrate; a signal line disposed on the substrate and including copper (Cu); a passivation layer disposed on the signal line and having a contact hole exposing a portion of the signal line; and a conductive layer disposed on the passivation layer and connected to the portion of the signal line through the contact hole, wherein the passivation layer includes an organic passivation layer including an organic insulator that does not include sulfur, and a method of manufacturing the thin film transistor prevents formation of foreign particles on the signal line.04-21-2011
20130015450Organic Light Emitting Display DeviceAANM Kim; Shin-HanAACI Gyeonggi-DoAACO KRAAGP Kim; Shin-Han Gyeonggi-Do KRAANM Ahn; Byung-ChulAACI SeoulAACO KRAAGP Ahn; Byung-Chul Seoul KRAANM Tak; Yoon-HeungAACI Gyeonggi-DoAACO KRAAGP Tak; Yoon-Heung Gyeonggi-Do KRAANM Han; Chang-WookAACI SeoulAACO KRAAGP Han; Chang-Wook Seoul KRAANM Kim; Do-HyungAACI SeoulAACO KRAAGP Kim; Do-Hyung Seoul KRAANM Lee; Jae-ManAACI SeoulAACO KRAAGP Lee; Jae-Man Seoul KRAANM Choi; Hong-SeokAACI SeoulAACO KRAAGP Choi; Hong-Seok Seoul KRAANM Bae; Sung-JoonAACI Gyeonggi-DoAACO KRAAGP Bae; Sung-Joon Gyeonggi-Do KRAANM Joung; Seung-RyongAACI Gyeonggi-DoAACO KRAAGP Joung; Seung-Ryong Gyeonggi-Do KR - An organic light emitting display device is provided to avoid color change due to a viewing direction. The organic light emitting display includes a light compensation layer having a refractive index different than that of an insulating layer. The organic light emitting display may be disposed at the side to which light emitted from an organic light emitting layer is entered to change the path and phase of light, thereby coinciding cavity peak phases for each wavelength of white light emitted from an organic light emitting unit.01-17-2013
20130015451THIN FILM TRANSISTOR MATRIX DEVICE AND METHOD FOR FABRICATING THE SAME - A thin film transistor matrix device including an insulating substrate; a plurality of lines arranged on the substrate, with the lines being defined as odd-number-th lines alternating with even-number-th lines; a first connection line extending in a direction transverse to the plurality of lines, where the first connection line and the odd-number-th lines are configured and arranged to be electrically connected/disconnected to/from each other; and a second connection line extending in a direction transverse to the plurality of lines, where the second connection line and the ven-number-th lines are configured and arranged to be electrically connected/disconnected to/from each other.01-17-2013
20120161143CRYSTAL SILICON FILM FORMING METHOD, THIN-FILM TRANSISTOR AND DISPLAY DEVICE USING THE CRYSTAL SILICON FILM - A crystal silicon film forming method according to the present invention includes: forming a metal film; forming an insulating film on the metal film, and forming a crystal silicon film made of polycrystal Si on the insulating film. In the forming of an insulating film, the insulating film is formed within a film thickness range of 160 nm to 190 nm. The forming of a crystal silicon film includes forming an amorphous silicon film made of a-Si on the insulating film, within a film thickness range of 30 nm to 45 nm, and forming the crystal silicon film from the amorphous silicon film by irradiating the amorphous silicon film with a light of a green laser.06-28-2012
20120161141White Organic Light Emitting Diode Display Device and Method of Fabricating the Same - According to the present invention, there is provided a white organic light emitting diode (W-OLED) display device for effectively blocking outgas generated from a color filter using silicon nitride having a low water vapor transmission rate as a passivation layer instead of a planarization layer which is an organic insulating layer, and a method of fabricating the same.06-28-2012
20120161140TFT ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - An thin film transistor array and a manufacturing method thereof are provided. A thin film transistor (TFT) array substrate comprises a base substrate, horizontal gate lines, reticulated storage capacitor electrode (Vcom) lines, longitudinal data lines defining pixel units with the horizontal gate lines. The Vcom lines corresponding to the pixel units in each row of the reticulated Vcom line are connected with each other, and the reticulated Vcom lines are connected with an integrated-circuit (IC) element through Vcom line IC terminals; if the number of the data lines is N, the number of the Vcom line IC terminals is more than 0 and less than N+1; and at least one Vcom line longitudinal electric connection section is provided between the Vcom lines in two adjacent rows.06-28-2012
20120161139SEMICONDUCTOR CIRCUIT, METHOD FOR DRIVING THE SAME, STORAGE DEVICE, REGISTER CIRCUIT, DISPLAY DEVICE, AND ELECTRONIC DEVICE - A semiconductor circuit capable of controlling and holding the threshold voltage of a transistor at an optimal level and a driving method thereof are disclosed. A storage device, a display device, or an electronic device including the semiconductor circuit is also provided. The semiconductor circuit comprises a diode and a first capacitor provided in a node to which a transistor to be controlled is connected through its back gate. This structure allows the application of desired voltage to the back gate so that the threshold voltage of the transistor is controlled at an optimal level and can be held for a long time. A second capacitor connected in parallel with the diode is optionally provided so that the voltage of the node can be changed temporarily.06-28-2012
20120161137ARRAY SUBSTRATE FOR IN-PLANE SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF - An array for an in-plane switching (IPS) mode liquid crystal display device includes a gate line formed on a substrate to extend in a first direction, a common line formed on the substrate to extend in the first direction, a data line formed to extend in a second direction, a thin film transistor formed at an intersection between the gate line and the data line, wherein the thin film transistor includes a gate line, a gate insulating layer, an active layer, a source electrode, and a drain electrode, a passivation film formed on the substrate including the thin film transistor, a pixel electrode formed on the passivation film located on a pixel region defined by the gate line and the data line, the pixel electrode being electrically connected to the drain electrode, a common electrode formed on the passivation film, and a common electrode connection line connected to the common electrode and the common line, wherein the common electrode connection line overlaps with the common line and the drain electrode.06-28-2012
20120161136THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor (TFT) array substrate with few processing steps and simple structure is provided, wherein merely two patterned metal layers are required and a patterned planarization layer is adopted to separate the two patterned metal layers from each other and thereby reduce power loading. In addition, the patterned planarization layer has slots to form height differences so as to separate scan lines from common electrodes to further reduce the power loading.06-28-2012
20120161134Thin film transistor and flat display device - A thin film transistor (TFT) includes a scan line on a substrate, the scan line including a straight portion extending along a first direction, an active layer including an oxide semiconductor and overlapping the straight portion of the scan line, the active layer having a first region, a second region, and a third region that are linearly and sequentially aligned along the first direction, a first insulating layer between the active layer and the scan line, a first electrode connected to the first region of the active layer, and a second electrode connected to the third region of the active layer.06-28-2012
20120161142ARRAY SUBSTRATE OF TFT-LCD AND MANUFACTURING METHOD THEREOF - An array substrate of a TFT-LCD, comprising: a base substrate; gate lines and data lines formed on the substrate, the gate lines and the data lines crossing with each other to define a plurality of pixel units each of which comprises a thin film transistor, a first electrode layer and a second electrode layer, wherein the first electrode layer is separated from the second electrode layer through an insulation layer; the first electrode layer comprises a plurality of first electrodes separated by openings; the second electrode layer comprises a plurality of second electrodes separated by openings; the second electrodes comprise overlapping electrodes each of which completely overlaps with the first electrodes and non-overlapping electrodes whose edges are completely located within an region corresponding to the openings in the first electrode layer.06-28-2012
20120211755THIN FILM TRANSISTOR, MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND DISPLAY - Disclosed herein is a manufacturing method of a thin film transistor including: forming a channel layer made of an oxide semiconductor above a gate electrode with a gate insulating film provided therebetween, forming a channel protection film made of a conductive material adapted to cover the channel layer and forming a pair of source and drain electrodes in such a manner as to be in contact with the channel protection film; and removing the region of the channel protection film between the source/drain electrodes by etching relying on selectivity between the conductive material and crystalline oxide semiconductor.08-23-2012
20120211757SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device includes TFTs designed in accordance with characteristics of circuits. In a first structure of the invention, the TFT is formed by using a crystalline silicon film made of a unique crystal structure body. The crystal structure body has a structure in which rod-like or flattened rod-like crystals grow in a direction parallel to each other. In a second structure of the invention, growth distances of lateral growth regions are made different from each other in accordance with channel lengths, of the TFTs. By this, characteristics of TFTs formed in one lateral growth region can be made as uniform as possible.08-23-2012
20120211756ARRAY SUBSTRATE AND DISPLAY DEVICE - An array substrate includes: a plurality of display areas, an outer area of the display area, in which a common wiring and an external connection terminal, which is connected to one of the scanning wiring, the signal wiring, and the common wiring, are provided; a connection wiring, which connects the external connection terminal with the common wiring of an adjacent display panel; and a connection part, which has a contact hole provided at the common wiring of the adjacent display panel, wherein the connection wiring is disposed across the cutting position of the insulation substrate and is connected to the contact hole at the connection part, and wherein the connection part is disposed at an area, at which a sealing member to bond an opposite substrate disposed to face the display area, or the inner side of the sealing member, which is the display area side.08-23-2012
20120211754ORGANIC LIGHT-EMITTING DISPLAY AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display includes a substrate including a pixel region and a transistor region; a first transparent electrode and a second transparent electrode formed over the pixel region and the transistor region of the substrate, respectively; a gate electrode formed over the second transparent electrode; a gate insulating film formed over the gate electrode; a semiconductor layer formed over the gate insulating film; a source and drain electrode having an end connected to the semiconductor layer and the other end connected to the first transparent electrode; a pixel defining layer disposed over the source and drain electrode to cover the source and drain electrode and having an opening disposed over the first transparent electrode; a light-blocking layer formed over the pixel defining layer; and an organic light-emitting layer formed over the first transparent electrode.08-23-2012
20120211753DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE DISPLAY SUBSTRATE - In a display substrate and a method of manufacturing the display substrate, the display substrate includes a data line, a channel pattern, an insulating pattern and a pixel electrode. The data line extends in a direction on a base substrate. The channel pattern is disposed in a separate region between an input electrode connected to the data line and an output electrode spaced apart from the input electrode. The channel pattern makes contact with the input electrode and the output electrode on the input and output electrodes. The insulating pattern is spaced apart from the channel pattern on the base substrate and includes a contact hole exposing the output electrode. The pixel electrode is formed on the insulating pattern to make contact with the output electrode through the contact hole. Thus, a damage of the oxide semiconductor layer may be minimized and a manufacturing process may be simplified.08-23-2012
20120211752ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE - An organic electroluminescent display device including a plurality of scan lines and a plurality of data lines crossing the scan lines, a plurality of pixels at regions defined by the scan lines and the data lines, and one or more thin-film transistors (TFTs) for selectively applying voltages to each of the pixels, wherein the data lines are successively located at a side of the pixels, and a first TFT of the TFTs is located at least partially between an area corresponding to an n08-23-2012
20120211751Display Apparatus and Method of Manufacturing the Same - A display apparatus includes a substrate and a plurality of pixels disposed on the substrate. Each pixel includes a gate electrode disposed on the substrate, a gate dielectric layer disposed on the substrate and the gate electrode, an oxide semiconductor pattern disposed on the gate dielectric layer, a first insulating pattern disposed on the oxide semiconductor pattern that overlaps the gate electrode, a second insulating pattern disposed on the oxide semiconductor pattern and spaced apart from the first insulating pattern, source and drain electrodes spaced apart from each other on the oxide semiconductor pattern, a pixel electrode pattern disposed on the second insulating pattern to make contact with the source electrode, and a channel area defined where the oxide semiconductor pattern overlaps the gate electrode. A high carrier mobility channel is formed in the channel area when a turn-on voltage is applied to the gate electrode.08-23-2012
20120313100PIXEL STRUCTURE - A pixel structure including a semiconductor layer having at least one source region and at least one drain region; a first insulating layer covering the semiconductor layer; a first conductive layer on the first insulating layer and including at least one gate; a second insulating layer covering the first conductive layer; a second conductive layer on the second insulating layer and including at least one source electrode, at least one drain electrode and at least one bottom electrode, the source region, the source electrode, the drain region, the drain electrode and the gate forming at least one thin film transistor; a third insulating layer covering the second conductive layer; a third conductive layer on the third insulating layer and including at least one top electrode, the top electrode and the bottom electrode forming at least one capacitor; and a pixel electrode electrically connected to the thin film transistor.12-13-2012
20100289026Method for Manufacturing Display Device - When a conductive layer is formed, a first liquid composition containing a conductive material is applied on an outer side of a pattern that is desired to be formed (corresponding to a contour or an edge portion of a pattern), and a first conductive layer (insulating layer) having a frame-shape is formed. A second liquid composition containing a conductive material is applied so as to fill a space inside the first conductive layer having a frame-shape, whereby a second conductive layer is formed. The first conductive layer and the second conductive layer are formed so as to be in contact with each other, and the first conductive layer is formed so as to surround the second conductive layer. Therefore, the first conductive layer and the second conductive layer can be used as one continuous conductive layer.11-18-2010
20100289025THIN FILM TRANSISTOR ARRAY SUBSTRATE, DISPLAY PANEL COMPRISING THE SAME, AND METHOD FOR MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE11-18-2010
20100289024Insulating Thin Film, Formation Solution For Insulating Thin Film, Field-Effect Transistor, Method For Manufacturing The Same And Image Display Unit - One embodiment of the present invention is an insulating thin film having a polymer compound, a metallic atom bonded to the polymer compound through an oxide atom and selected from a group 4 element, a group 5 element, a group 6 element, a group 13 element, zinc or tin, and an organic molecule bonded to the metallic atom through the oxide atom or a nitrogen atom.11-18-2010
20100289027ELECTRONIC DEVICE, DISPLAY DEVICE, INTERFACE CIRCUIT AND DIFFERENTIAL AMPLIFICATION DEVICE, WHICH ARE CONSTITUTED BY USING THIN-FILM TRANSISTORS - An integrated circuit, which is configured such that a MOS transistor and a bipolar transistor are integrated at the same time, is formed on an insulating substrate which includes a display device. An electronic device or a display includes a plurality of semiconductor devices which are formed by using a semiconductor thin film and are formed in the semiconductor thin film that is provided on an insulating substrate and is crystallized in a predetermined direction. The plurality of semiconductor devices include a MOS transistor and at least either one of a lateral bipolar thin-film transistor and a MOS-bipolar hybrid thin film transistor.11-18-2010
20120126234Semiconductor Apparatus and Fabrication Method of the Same - It is an object of the present invention to provide a semiconductor device capable of preventing deterioration due to penetration of moisture or oxygen, for example, a light-emitting apparatus having an organic light-emitting device that is formed over a plastic substrate, and a liquid crystal display apparatus using a plastic substrate. According to the present invention, devices formed on a glass substrate or a quartz substrate (a TFT, a light-emitting device having an organic compound, a liquid crystal device, a memory device, a thin-film diode, a pin-junction silicon photoelectric converter, a silicon resistance element, or the like) are separated from the substrate, and transferred to a plastic substrate having high thermal conductivity.05-24-2012
20120126236ARRAY SUBSTRATE, METHOD FOR MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY DEVICE - The present invention provides an array substrate, a method for manufacturing an array substrate, and a display device which are such that reflow failure of a resist mask does not occur readily at the time of manufacture of the array substrate, so the array substrate can be manufactured reliably. At the time of forming a TFT, third wiring 05-24-2012
20120126235APPARATUS AND METHOD FOR REDUCING PHOTO LEAKAGE CURRENT FOR TFT LCD - In one aspect of the invention, the method of forming a TFT array panel includes forming a patterned first conductive layer on a substrate, forming a gate insulating layer on the patterned first conductive layer and the substrate, forming a patterned semiconductor layer on the gate insulating layer, forming a patterned second conductive layer, forming a patterned passivation layer on the patterned second conductive layer and the substrate, and forming a patterned transparent conductive layer on the patterned passivation layer.05-24-2012
20120248450ACTIVE MATRIX SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention provides an active matrix substrate that is capable of reliably connecting a plurality of conductive layers that are arranged with an insulating layer therebetween. The active matrix substrate of the present invention has a first conductive layer (CS) and a second conductive layer (10-04-2012
20120248451FIELD-EFFECT TRANSISTOR, SEMICONDUCTOR MEMORY DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM - A field-effect transistor includes a substrate; a source electrode, a drain electrode, and a gate electrode that are formed on the substrate; a semiconductor layer by which a channel is formed between the source electrode and the drain electrode when a predetermined voltage is applied to the gate electrode; and a gate insulating layer provided between the gate electrode and the semiconductor layer. The gate insulating layer is formed of an amorphous composite metal oxide insulating film including one or two or more alkaline-earth metal elements and one or two or more elements selected from a group consisting of Ga, Sc, Y, and lanthanoid except Ce.10-04-2012
20120248444THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD OF THE SAME - According to this disclosure of a thin film transistor array panel and the manufacturing method thereof, dams have a function of forming a light blocking member by an inkjet printing method and are formed along with color filters. Spacers are formed by the inkjet printing method along with the light blocking member and color filters. Advantages of this panel and its manufacturing method are a reduction in an alignment error of the light blocking member and the color filters, reduced manufacturing cost, and a simplified manufacturing.10-04-2012
20100207121THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE - A substrate supporting thin film transistors thereon, each including a semiconductor layer and source-drain electrodes, wherein the source-drain electrodes are formed from a nitrogen-containing layer or oxygen/nitrogen-containing layer and a thin film of pure copper or copper alloy. The nitrogen-containing layer or oxygen/nitrogen-containing layer has respectively part or all of its nitrogen or part or all of its oxygen or nitrogen connected to silicon in the semiconductor layer of the thin film transistor, and the thin film of pure copper or copper alloy is connected to the semiconductor layer of said thin film transistor through the nitrogen-containing layer or oxygen/nitrogen-containing layer.08-19-2010
20100207122Thin film transistor array substrate and manufacturing method thereof - A thin film transistor array substrate is disclosed. The thin film transistor array substrate includes: gate lines and data lines formed to cross each other in the center of a gate insulation film on a substrate and to define pixel regions; a thin film transistor formed at each intersection of the gate and data lines; a passivation film formed on the thin film transistors; a pixel electrode formed on each of the pixel regions and connected to the thin film transistor through the passivation film; a gate pad connected to each of the gate lines through a gate linker; and a data pad connected to each of the data lines through a data linker. The data pad is formed of a gate pattern, and the data line is formed of a data pattern. The data linker is configured to connect the data pad formed of the gate pattern with the data line formed of the data pattern using a connection wiring. Also, the data linker includes the gate pattern connected to the data pad, the data pattern formed opposite to the gate pattern in the center of the gate insulation film, and the connection wiring configured to connect the gate pattern with the data pattern through a first contact hole which exposes the data pattern and the gate pattern by penetrating through the passivation film and the gate insulation film.08-19-2010
20120132918Display Device and Manufacturing Method of the Same - A display device free of contact resistance between a drain electrode (or a source electrode) and a pixel electrode. The display device includes a gate electrode, a gate insulating layer covering the gate electrode, a semiconductor layer formed over the gate insulating layer, and a source electrode and a drain electrode separated from each other and in partial-contact with and over the semiconductor layer, and one of the source electrode and the drain electrode also serves as a pixel electrode, the other of the source electrode and the drain electrode also serves as a signal line, and a low resistant conductive layer is preferably formed over the other of the source electrode and the drain electrode. The low resistant conductive layer can be formed by an electroplating method or the like.05-31-2012
20120132916ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus includes: an active layer formed on the substrate; a gate electrode, in which a first insulation layer formed on the active layer, a first conductive layer formed on the first insulation layer and comprising a transparent conductive material, and a second conductive layer comprising a metal are sequentially stacked; a pixel electrode, in which a first electrode layer formed on the first insulation layer to be spaced apart from the gate electrode and comprising a transparent conductive material, a second electrode layer formed of a semi-permeable metal and comprising pores, and a third electrode layer comprising a metal are sequentially stacked; source/drain electrodes electrically connected to the active layer with a second insulation layer covering the gate electrode and the pixel electrode interposed therebetween; an electro-luminescence (EL) layer formed on the pixel electrode; and an opposite electrode formed on the EL layer to face the pixel electrode, wherein the second electrode layer comprises nano-sized silver (Ag) particles.05-31-2012
20120132917DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate having a low resistance signal line and a method of manufacturing the display substrate are provided. The display substrate includes an insulation substrate, a gate line, a data line and a pixel electrode. The gate line gate line is formed through a sub-trench and an opening portion. The sub-trench is formed in the insulation substrate and the opening portion is formed through a planarization layer on the insulation substrate at a position corresponding to the position of the sub-trench. The data line crosses the gate line. The pixel electrode is electrically connected to the gate line and the data line through a switching element. Thus, a signal line is formed through a trench formed by using a planarization layer and an insulation substrate, so that a resistance of the signal line may be reduced.05-31-2012
20120168762ACTIVE MATRIX SUBSTRATE AND ACTIVE MATRIX DISPLAY DEVICE - A second stem wires (07-05-2012
20120168761ACTIVE MATRIX ORGANIC LIGHT EMITTING DIODE AND METHOD FOR MANUFACTURING THE SAME - Disclosed are an active matrix organic light emitting diode and a method for manufacturing the same. The active matrix organic light emitting diode includes: a substrate; a black matrix formed above a part of the substrate; at least one thin film transistor formed above the black matrix; a passivation film formed to entirely cover the at least one thin film transistor; a planarizing layer formed above the passivation film; a color filter formed above an upper part of the planarizing layer opposite to the position where the at least one thin film transistor is formed; and an organic light emitting diode formed above the color filter.07-05-2012
20120168756Transistor, Method Of Manufacturing The Same, And Electronic Device Including The Transistor - Transistors, methods of manufacturing the same, and electronic devices including the transistors. The transistor may include a light blocking member which surrounds at least a portion of the channel layer. The light blocking member may be designed to block light laterally incident from a side of the transistor toward the channel layer (that is, laterally incident light). The light blocking member may be disposed in a portion of a gate insulation layer outside the channel layer. The light blocking member may be connected to a source and a drain or may be connected to a gate. The light blocking member may be separated from the source, the drain and the gate. The light blocking member may completely surround the channel layer.07-05-2012
20120168755Transparent Electrode and Organic Light Emitting Diode Device Including the Transparent Electrode and Method of Manufacturing the Same - Disclosed are a transparent electrode including a first light-transmission layer, a metal layer, and a second light-transmission layer sequentially formed, an organic light emitting device including the transparent electrode, and a method of manufacturing the same. The second light-transmission layer includes a conductive oxide and a metal catalyst.07-05-2012
20110180798DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a transistor, a black matrix and a color spacer. The transistor is connected to a gate line, and a data line crossing the gate line. The black matrix includes a first light-blocking portion covering the gate line and the data line, and a second light-blocking portion covering a channel of the transistor. The second light-blocking portion has a thickness which is smaller than a thickness of the first light-blocking portion. The color spacer is disposed on the second light-blocking portion.07-28-2011
20110180802THIN FILM TRANSISTOR AND DISPLAY DEVICE - Provided are a thin film transistor that is capable of suppressing desorption of oxygen and others from an oxide semiconductor layer, and reducing the time to be taken for film formation, and a display device provided therewith. A gate insulation film 07-28-2011
20110180801LIGHT EMITTING APPARATUS AND METHOD FOR MANUFACTURING THE SAME - The purpose of the invention is to improve reliability of a light emitting apparatus comprising TFTs and organic light emitting elements. The light emitting apparatus according to the invention having thin film transistors and light emitting elements, comprises; a second inorganic insulation layer on a gate electrode, a first organic insulation layer on the second inorganic insulation layer, a third inorganic insulation layer on the first organic insulation layer, an anode layer formed on the third inorganic insulation layer, a second organic insulation layer overlapping with the end of the anode layer and having an inclination angle of 35 to 45 degrees, a fourth inorganic insulation layer formed on the upper surface and side surface of the second organic insulation layer and having an opening over the anode layer, an organic compound layer formed in contact with the anode layer and the fourth inorganic insulation layer and containing light emitting material, and a cathode layer formed in contact with the organic compound layer containing the light emitting material, wherein the third inorganic insulation layer and the fourth inorganic insulation layer are formed with silicon nitride or aluminum nitride.07-28-2011
20110180800LIQUID CRYSTAL DISPLAY PANEL AND FABRICATING METHOD THEREOF - A liquid crystal display panel includes: a thin film transistor array substrate having a gate line and a data line provided on the substrate; a gate insulating film between the gate line and the data line; a thin film transistor having a source electrode, a drain electrode and a gate electrode; a pixel electrode; a protective film for protecting the thin film transistor; a plurality of pads; a transparent electrode pattern formed on the data line, source electrode and drain electrode; and a color filter array substrate joined to the thin film transistor array substrate so that the color filter substrate does not overlap the pad area of the thin film transistor array substrate, wherein at least one of the gate insulating film and protective film in the pad area is etched using the color filter array substrate as a mask to expose at least one of the plurality of pads.07-28-2011
20110180799ELECTRONIC DEVICE COMPRISING STATIC INDUCTION TRANSISTOR AND THIN FILM TRANSISTOR, METHOD OF MANUFACTURING AN ELECTRONIC DEVICE AND DISPLAY PANEL - An electronic device comprises at least one static induction transistor (07-28-2011
20120248449THIN FILM TRANSISTOR AND METHOD OF FABRICATING THE SAME - A thin film transistor includes a multi-coaxial silicon nanowire unit including a plurality of coaxial silicon nanowires on a substrate, the multi-coaxial silicon nanowire unit including a central portion and end portions of the central portion; a gate electrode on the central portion; and a source electrode and a drain electrode on the respective end portions, respectively, so as to electrically connect to the multi-coaxial silicon nanowire unit.10-04-2012
20120248448SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME - An insulating film provided between adjacent pixels is referred to as a bank, a partition, a barrier, an embankment or the like, and is provided above a source wiring or a drain wiring for a thin film transistor, or a power supply line. In particular, at an intersection portion of these wirings provided in different layers, a larger step is formed there than in other portions. Even in a case that the insulating film provided between adjacent pixels is formed by a coating method, there is a problem that thin portions are partially formed due to this step and the withstand pressure is reduced. In the present invention, a dummy material is arranged near the large step portion, particularly, around the intersection portion of wirings, so as to alleviate unevenness formed thereover. The upper wring and the lower wiring are arranged in a misaligned manner so as not to align the end portions.10-04-2012
20090057676THIN FILM SEMICONDUCTOR DEVICE - A thin film semiconductor device is provided which includes an insulating substrate, a Si thin film formed over the insulating substrate, and a transistor with the Si thin film as a channel thereof. The Si thin film includes a polycrystal where a plurality of narrow, rectangular crystal grains are arranged. A surface of the polycrystal is flat at grain boundaries thereof. Also, an average film thickness of the boundaries of crystals of the Si thin film ranges from 90 to 100% of an intra-grain average film thickness.03-05-2009
20090057675Display device and electronic appliance including the display device - To provide a display device which has a narrower frame region and which includes a driver circuit not affected by variation in transistor characteristics. A base substrate having an insulating surface to which a single-crystal semiconductor layer is attached is divided into strips and is used for a driver circuit of a display device. Alternatively, a base substrate having an insulating surface to which a plurality of single-crystal semiconductor layers is attached is divided into strips and is used for a driver circuit of a display device. Accordingly, a driver circuit corresponding to a size of a display device can be used for the display device, and a display device which has a narrower frame region and which includes a driver circuit not affected by variation in transistor characteristics can be provided.03-05-2009
20090057674Thin film transistor, light-emitting display device having the same and associated methods - A thin film transistor (TFT) includes an N-type oxide semiconductor layer on a substrate, a gate electrode spaced apart from the N-type oxide semiconductor layer by a gate dielectric layer, a source electrode contacting a first portion of the N-type oxide semiconductor layer, and a drain electrode contacting a second portion of the N-type oxide semiconductor layer. The first and second portions each have a doped region containing ions of at least one Group 1 element, and the ions of the at least one Group 1 element in the doped region may have a work function that is less than that of an N-type oxide semiconductor material included in the semiconductor layer.03-05-2009
20090057672DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - A display device including a thin film transistor with high electric characteristics and high reliability, and a method for manufacturing the display device with high mass-productivity. In a display device including an inverted-staggered channel-stop-type thin film transistor, the inverted-staggered channel-stop-type thin film transistor includes a microcrystalline semiconductor film including a channel formation region, and an impurity region containing an impurity element of one conductivity type is selectively provided in a region which is not overlapped with source and drain electrodes, in the channel formation region of the microcrystalline semiconductor film.03-05-2009
20090057671THIN-FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING SAME AND DISPLAY APPARATUS HAVING SAME - Contamination is blocked from material of a color filter layer provided on a thin-film transistors (TFT) supporting substrate by sealing over the color filter layer with an inorganic insulating layer. During mass production manufacture, a plasma surface cleaning step is employed after the color filter layer is deposited but before the inorganic insulating layer is deposited. A low temperature CVD process is used to deposit the inorganic insulating layer with a substantially uniform thickness conformably over the color filter layer including conformably into openings provided through the color filter layer.03-05-2009
20090057669Electro-Optical Device and Electronic Apparatus - An electro-optical device includes a switching element with a gate electrode provided opposite to the channel region. The gate electrode has a ring-shaped structure that surrounds a junction region between the channel region and a source/drain region.03-05-2009
20090057666PIXEL STRUCTURE AND FABRICATING METHOD THEREOF - A pixel structure and a fabrication method thereof are provided. A substrate with a light-shielding layer and a flat layer formed thereon is provided. A first photomask process is conducted to pattern a first metal layer and a semiconductor layer for forming a source, a drain, a channel layer, a data line and a first pad. A second photomask process is conducted to pattern the protection layer, the second metal layer and the gate dielectric layer for forming a gate, a scan line and a second pad, and a part of the drain is exposed. A third photomask process is conducted to pattern a transparent conductive layer for forming a pixel electrode.03-05-2009
20120168760TRANSFLECTIVE TFT-LCD AND METHOD FOR MANUFACTURING THE SAME - Embodiments of the disclosed technology provide a transflective transistor thin film array substrate and a method for manufacturing the same. The transflective thin film transistor array substrate, comprising pixel units defined by gate lines and data lines, and each pixel unit comprises a thin film transistor and a common electrode and is divided into a reflective region and a transmissive region. The reflective region comprises a reflective electrode and a second pixel electrode of the reflective region, the transmissive region comprises first and second pixel electrodes of the transmissive region, and the second pixel electrode of the reflective region and the first and second pixel electrodes of the transmissive region are provided in one pixel electrode layer.07-05-2012
20120168759X-RAY DETECTION DEVICE - An X-ray detection device includes a gate electrode and a lower electrode on a substrate and laterally spaced from each other, a dielectric layer covering the gate electrode and the lower electrode, and a conductive pattern on the dielectric layer at a side of the gate electrode adjacent to the lower electrode and overlapping the lower electrode. The device also includes a source electrode spaced apart from the conductive pattern that is on the dielectric layer at the other side of the gate electrode, and an interlayer insulation layer covering the conductive pattern and the source electrode. A collector electrode, a photoelectric conversion layer, and a bias electrode are sequentially stacked on the interlayer insulation layer.07-05-2012
20120168758ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE ORGANIC LIGHT EMITTING DISPLAY APPARATUS - An organic light emitting display apparatus includes a substrate; a thin film transistor which is disposed over the substrate; a first electrode which is disposed over the substrate and electrically connected to the thin film transistor; a passivation layer which covers the thin film transistor and contacts a predetermined region of an upper surface of the first electrode; an intermediate layer which is disposed over the first electrode, includes an organic emission layer, and contacts a predetermined region of the passivation layer; and a second electrode which is disposed over the intermediate layer.07-05-2012
20120168757Transistors, Methods Of Manufacturing The Same And Electronic Devices Including Transistors - A transistor includes a channel layer disposed above a gate and including an oxide semiconductor. A source electrode contacts a first end portion of the channel layer, and a drain electrode contacts a second end portion of the channel layer. The channel layer further includes a fluorine-containing region formed in an upper portion of the channel layer between the source electrode and the drain electrode.07-05-2012
20120248447ELECTRONIC PANEL - An electronic panel includes insulation films that cover metal wirings and have plated through holes which expose parts of the respective metal wirings, oxide semiconductor films that electrically conducted with the metal wirings via the plated through holes formed on the insulation films, and an electrical component that includes electrodes which are electrically connected to the oxide semiconductor films. The oxide semiconductor film includes first and second portions in which the widths thereof are different from each other. The width of the first portion is wider than the width of the second portion. A portion faces a part of the metal wiring which is exposed from the plated through hole, and the portion is electrically connected to the part of the metal wiring. At least a part of the second portion faces the electrode of the electrical component and is electrically connected to the electrode.10-04-2012
20100051952THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin film transistor substrate capable of appropriately maintaining driving performance even when there is a difference between manufacturing processes and a method of manufacturing the same. The thin film transistor substrate includes: a gate electrode formed on an insulating substrate; a semiconductor layer formed on the gate electrode; and a plurality of thin film transistors each having a source electrode and a drain electrode that are formed on the gate electrode and the semiconductor layer so as to be spaced apart from each other. At least one of the plurality of thin film transistors is a dummy thin film transistor that does not have the semiconductor layer between the source electrode and the drain electrode.03-04-2010
20100051955THIN FILM TRANSISTOR ARRAY SUBSTRATE - A thin film transistor array substrate including a substrate, scan lines, data lines, thin film transistors, pixel electrodes, common lines and a patterned upper electrode is provided. The scan lines and the data lines are disposed over the substrate to define pixel areas. Each thin film transistor is disposed within one of the pixel areas and is driven by one of the scan lines and data lines. Each pixel electrode is disposed within one of the pixel areas and is electrically connected to one of the thin film transistors. Common lines are disposed over the substrate such that a portion area of each pixel electrode is located above one of the common lines. The pattern upper electrode includes sub-upper electrodes disposed between the pixel electrode and the common line. The sub-upper electrodes are electrically connected to the pixel electrodes for coupling with the common lines to form a storage capacitor.03-04-2010
20100051954Pixel structure and method for manufacturing the same - A method for manufacturing a pixel structure is provided. First, a first mask process is performed to form a patterned first metal layer on a substrate, wherein the patterned first metal layer includes a gate. Next, a second mask process is performed to form a patterned insulating layer and a patterned semiconductor layer over the gate, wherein the patterned insulating layer is disposed on the patterned first metal layer, and the patterned semiconductor layer is disposed on the patterned insulating layer. Then, a third mask process is performed to define a thin film transistor (TFT) and a pixel electrode connected thereto and to form a passivation layer to cover the TFT.03-04-2010
20100051953Liquid crystal display device and method of fabricating the same - A display device includes a substrate having a display region and a driver region; a gate line and a data line crossing each other to define a pixel region in the display region, the pixel region having a pixel electrode; an insulation layer between the gate line and the data line; a first thin film transistor in the display region; and a second thin film transistor having a first polarity and a third thin film transistor having a second polarity in the driver region, wherein the pixel electrode, the gate line and the gate electrodes of the first to third thin film transistors have a double-layer structure in which a metal layer is formed on a transparent conductive layer, and the transparent conductive layer of the pixel electrode is exposed through a transmission hole passing through the insulation layer and the metal layer in the pixel region.03-04-2010
20120313101THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - The present disclosure discloses a method for manufacturing a TFT array substrate, comprising: depositing a gate metal layer, a gate insulating layer, a semiconductor layer and a source-drain electrode layer in this order on a base substrate, performing a first photolithograph process to form a common electrode line, a gate line, a gate electrode, a source electrode, a drain electrode and a channel defined between the source electrode and the drain electrode; depositing a passivation layer, performing a second photolithograph process to form a first via hole and a second via hole in the passivation layer; and depositing a pixel electrode layer and a data line layer in this order, perform a third photolithograph process to form a data line connected to the source electrode through the first via hole and a pixel electrode connected to the drain electrode through the second via hole.12-13-2012
20120175620Light-Emitting Device and Method of Manufacturing the Same, and Method of Operating Manufacturing Apparatus - The inventors have anticipated that there is no problem in employing electron gun deposition as a method of forming a metallic layer on an EL layer of an active matrix light-emitting device because the TFT of the active matrix light-emitting device is disposed below the EL layer. However, since the TFT is extremely sensitive to ionized evaporated particles, the secondary electron, the reflecting electron, and so on generated by the electron gun, while little damage is observed on the EL layer, significant damage is found on the TFT when electron gun deposition is employed. The invention provides an active matrix light-emitting device having superior TFT characteristics (ON current, OFF to current, Vth, S-value, and so on), in which an organic compound layer and a metallic layer (cathode or anode) are formed by means of resistive heating having least influence to the TFT.07-12-2012
20120256183THIN FILM TRANSISTOR ARRAY SUBSTRATE, COLOR FILTER SUBSTRATE AND DISPLAY DEVICE - Embodiments of the disclosed technology provide to a thin film transistor array substrate comprising a first base substrate; a gate line formed on the first base substrate; and two data lines separately formed on the first base substrate; wherein the two data lines are located on both sides of the gate line respectively in the direction of data signal transmission but do not overlap with the gate line. The two data lines can be electrically connected through conductive elements for transmitting data signals.10-11-2012
20120313098Organic Light-Emitting Display Apparatus - An organic light-emitting display apparatus may include a substrate; a thin-film transistor (TFT) disposed on the substrate, and having an active layer, a gate electrode, a source electrode and a drain electrode; a signal line formed on the same layer as the source electrode and the drain electrode; a first insulating layer covers the signal line, the source electrode, and the drain electrode; a pixel electrode formed on the first insulating layer, and electrically connected to the TFT; a pixel-defining layer formed on the first insulating layer, includes an opening exposing the pixel electrode; an intermediate layer formed on the pixel electrode, and includes a light-emitting layer; and an opposite electrode formed on the intermediate layer. The intermediate layer is formed on the pixel-defining layer so as to overlap with the signal line.12-13-2012
20120175619DISPLAY DEVICE - A structure for preventing deteriorations of a light-emitting device and retaining sufficient capacitor elements (condenser) required by each pixel is provided. A first passivation film, a second metal layer, a flattening film, a barrier film, and a third metal layer are stacked in this order over a transistor. A side face of a first opening provided with the flattening film is covered by the barrier film, a second opening is formed inside the first opening, and a third metal layer is connected to a semiconductor via the first opening and the second opening. A capacitor element that is formed of a lamination of a semiconductor of a transistor, a gate insulating film, a gate electrode, the first passivation film, and the second metal layer is provided.07-12-2012
20120175618RADIATION IMAGING DEVICE, RADIATION IMAGING DISPLAY SYSTEM, AND TRANSISTOR - There are provided a transistor and a radiation imaging device in which a shift in a threshold voltage due to radiation exposure may be suppressed. The transistor includes a first gate electrode, a first gate insulator, a semiconductor layer, a second gate insulator, and a second gate electrode in this order on a substrate. Each of the first and second gate insulators includes one or a plurality of silicon compound films having oxygen, and a total sum of thicknesses of the silicon compound films is 65 nm or less.07-12-2012
20120175617Organic Light-Emitting Display Device and Method of Manufacturing the Same - In an organic light-emitting display device and a method of manufacturing the same, the organic light-emitting display device comprises: a substrate including a transistor region; a buffer layer and a semiconductor layer sequentially formed on the substrate; a gate electrode formed on the semiconductor layer; an interlayer insulating film formed on the gate electrode; source and drain electrodes, each formed on the interlayer insulating film and having a portion penetrating the interlayer insulating film so as to contact the semiconductor layer; a mask pattern formed on each of the source and drain electrodes; and a pixel defined layer formed on the mask pattern.07-12-2012
20100270552THIN FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A protrusion of dry-etched pattern of a thin film transistor substrate generated due to a difference between isotropy of wet etching and anisotropy of dry etching is removed by forming a plating part on a surface of the wet etched pattern through an electroless plating method. If the plating part is formed on a data pattern layer of the substrate, the width or the thickness of the data pattern layer may be increased without loss of aperture ratio, the channel length of the semiconductor layer may be reduced under the limit according to the stepper resolution and the protrusion part of the semiconductor layer may be removed. As a result, the aperture ratio may be increased, the resistance may be reduced, and the driving margin may be increased due to rising of the ion current. Furthermore, the so-called water-fall noise phenomenon may be eliminated.10-28-2010
20100270555THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes: first and second gate lines disposed on a substrate and separated from each other; a data line intersecting the first and second gate lines; first and second thin film transistors connected to the first gate line and the data line; a third thin film transistor connected to the second gate line and having a drain electrode; and a pixel electrode including a first subpixel electrode and a second subpixel electrode, wherein the first subpixel electrode is connected to the first and third thin film transistor, the second subpixel electrode is connected to the second thin film transistor and includes a projection overlapping the drain electrode, and the projection has a first pair of edge portions that meet a first edge of the drain electrode and are substantially parallel to each other.10-28-2010
20100270554METHOD OF REFORMING A METAL PATTERN, ARRAY SUBSTRATE, AND METHOD OF MANUFACTURING THE ARRAY SUBSTRATE - A method of reforming a metal pattern for improving the productivity and reliability of a manufacturing process, an array substrate and a method of manufacturing the array substrate are disclosed. In the method, a first wiring pattern is formed on an insulation substrate. The first wiring pattern is removed. A second wiring pattern is formed on an embossed pattern by using the embossed pattern as an alignment mask. The embossed pattern is defined by a recess formed on a surface of the insulation substrate. Accordingly, the insulation substrate having the recess formed thereon may not be discarded, and may be reused in forming the first wiring pattern. In addition, the embossed pattern defined by the recess is used as an alignment mask, so that the alignment reliability of a metal pattern may be improved.10-28-2010
20100270550Pixel Structure and the Method of Forming the Same - A pixel structure includes a drain shielding extension portion disposed on a floating semiconductor layer, wherein the floating semiconductor layer is formed together with a thin-film transistor channel layer. Therefore, the total thickness of the floating semiconductor layer and the drain shielding extension portion is increased, such that the distance between the gate line and the drain shielding extension portion is enlarged, and the coupling capacitance between the gate line and the drain shielding extension portion can be lowered. Therefore, the display panel with the pixel structure of the present invention can have low coupling capacitance so as to improve the flicker phenomena obviously.10-28-2010
20120217500WIRING, THIN FILM TRANSISTOR, THIN FILM TRANSISTOR PANEL AND METHODS FOR MANUFACTURING THE SAME - A thin film transistor includes a gate electrode, a gate insulating layer on the gate electrode, a semiconductor on the gate insulating layer, and a drain electrode and a source electrode on the semiconductor and spaced apart from each other. Each of the drain electrode and the source electrode includes a first metal diffusion preventing layer which prevents diffusion of metal atoms, and a second metal diffusion preventing layer on the first metal diffusion preventing layer. At least one of the first and second metal diffusion preventing layers includes grains in a columnar structure, which are in a direction substantially perpendicular to a lower layer. First grain boundaries of the first metal diffusion preventing layer and second grain boundaries of the second metal diffusion preventing layer are substantially discontinuous in a direction perpendicular to the semiconductor.08-30-2012
20120074415LIQUID CRYSTAL DISPLAY DEVICE - Provided is a liquid crystal display device, in which: the gate lines include a first gate line and a second gate line for respectively outputting the scanning signals at two different scanning timings for each of scanning lines; and a unit pixel for color display, constituted by three pixels corresponding to a red (R) pixel, a green (G) pixel, and a blue (B) pixel arranged side by side, is formed in a region surrounded by the first gate line, the second gate line, and the drain lines, and the three pixels corresponding to the red (R) pixel, the green (G) pixel, and the blue (B) pixel are arranged in matrix for the each unit pixel.03-29-2012
20120074414ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light emitting diode display device and a method of manufacturing the same are disclosed. The organic light emitting diode display device comprises: a substrate; an active layer disposed on the substrate; a first insulating layer disposed on the active layer; a gate electrode disposed on the first insulating layer; a pixel electrode disposed on the first insulating layer; source and drain electrodes electrically insulated from the gate electrode and electrically connected to the active layer; an intermediate layer disposed on the pixel electrode, wherein the intermediate layer comprises an organic emission layer; and an opposite electrode disposed on the intermediate layer, wherein the pixel electrode is connected to the source electrode or the drain electrode, wherein the gate electrode comprises a first conductive layer, a second conductive layer, a third conductive layer, and a fourth conductive layer that are sequentially stacked, and wherein the second and third conductive layers comprises a first oxidation-reduction potential difference therebetween, and the first and third conductive layers comprises a second oxidation-reduction potential difference therebetween, and the first oxidation-reduction potential difference is less than the second oxidation-reduction potential difference.03-29-2012
20120074413ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display device includes an active layer of a thin film transistor (TFT) formed on a substrate; a gate electrode of the TFT, wherein a first gate electrode including a transparent conductive material, a first insulating layer, and a second gate electrode are sequentially stacked; a pixel electrode disposed on the first insulating layer and including the transparent conductive material; a source electrode and a drain electrode of the TFT, a second insulating layer disposed between the source electrode and the drain electrode; a light reflector including the same material as the source electrode and the drain electrode, and disposed on the pixel electrode; an emission layer disposed on top of the pixel electrode and surrounded by an inner side of the light reflector; and a counter electrode facing towards the pixel electrode, wherein the emission layer is disposed between the pixel electrode and the counter electrode.03-29-2012
20120074412Organic Light-Emitting Display Device and Method of Manufacturing the Same - In an organic light-emitting display device and a method of manufacturing the same, the organic light-emitting display device comprises: an active layer of a thin film transistor which includes a semiconductor material, and which is formed on a substrate; a lower electrode of a capacitor which includes a semiconductor material doped with ion impurities, and which is formed on the substrate; a first insulating layer formed on the substrate so as to cover the active layer and the lower electrode; a first gate electrode which is a transparent conductive material, and which is formed on the first insulating layer; a second gate electrode which is a metal, and which is formed on the first gate electrode; an upper electrode of a capacitor which is formed on the first insulating layer and includes a transparent conductive material; source and drain electrodes of a thin film transistor which are electrically connected to the active layer; a pixel electrode formed on the first insulating layer, which is a semi-permeable metal electrically connected to one of the source and drain electrodes; an intermediate layer formed on the pixel electrode and including an organic emission layer; and an opposite electrode facing the pixel electrode with the intermediate layer therebetween.03-29-2012
20120074411Organic light emitting diode display and manufacturing method thereof - Making an OLED display, includes forming a first storage plate and a gate insulating layer covering the first storage plate on a substrate; sequentially forming a second storage plate covering the first storage plate and a capacitor intermediate in the gate insulating layer; forming a first doping region by injecting an impurity to a part that is not covered by the capacitor intermediate in the first storage plate; forming an interlayer insulating layer having a capacitor opening exposing the capacitor intermediate, and a plurality of erosion preventing layers on an edge of the capacitor intermediate toward the first doping region in the capacitor opening; removing the capacitor intermediate including the erosion preventing layer and a lower region of the erosion preventing layer, and injecting an impurity in the first storage plate through the second storage plate to form a second doping region contacting the first doping region.03-29-2012
20100283056DISPLAY APPARATUS, LIQUID CRYSTAL DISPLAY APPARATUS, ORGANIC EL DISPLAY APPARATUS, THIN-FILM SUBSTRATE, AND METHOD FOR MANUFACTURING DISPLAY APPARATUS - A liquid crystal display apparatus (11-11-2010
20120313099ORGANIC LIGHT EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - The organic light emitting display device includes a substrate, a thin film transistor (TFT) formed on the substrate, a first insulating layer covering the TFT, a first electrode formed on the first insulating layer and electrically connected to the TFT, a second insulating layer formed on the first insulating layer to cover the first electrode and has an opening to expose a portion of the first electrode, an organic layer formed on a portion of the second insulating layer and the first electrode, a second electrode formed on the second insulating layer and the organic layer includes a first region and a second region, a capping layer formed on a first region of the second electrode and having first edges, and a third electrode formed on a second region of the second electrode and having second edges whose side surfaces contact side surfaces of the first edges.12-13-2012
20120313102ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE HAVING THE SAME - An array substrate and a liquid crystal display (LCD) device having the array substrate are provided. The array substrate may include a pixel electrode, a coupling electrode and an opposite electrode. The pixel electrode may include a first sub-electrode having first electrode bars receiving a first voltage and a second sub-electrode having second electrode bars. The first electrode bars and the second electrode bars may be spaced apart from each other. The coupling electrode may be electrically connected to a portion of the first electrode bars, may have a opposite electrode bars and may overlap a portion of the second electrode bars to form coupling capacitor. The opposite electrode may be disposed between the first electrode bars and the second electrode bars to receive a second voltage different from the first voltage.12-13-2012
20120223313THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR MANUFACTURING SAME - Disclosed is a thin film transistor substrate which is provided with: a plurality of source lines 09-06-2012
20120223312Semiconductor Structure of a Display Device and Method for Fabricating the Same - A semiconductor structure of a display device and the method for fabricating the same are provided. The semiconductor structure is formed on a substrate having a TFT region and a pixel capacitor region thereon. A TFT, including a gate electrode, a source electrode, a drain electrode, a channel layer, and a gate insulating layer, is formed on the TFT region of the substrate. A pixel capacitor is formed on the pixel capacitor region, wherein the pixel capacitor comprises a bottom electrode formed on a bottom dielectric layer, an interlayer dielectric layer formed on the bottom electrode, a top electrode formed on the interlayer dielectric layer, a contact plug passing through the interlayer dielectric layer and electrically connected to the top and bottom electrodes, a capacitor dielectric layer formed on the top electrode, a transparent electrode formed on the capacitor dielectric layer and electrically connected to the drain electrode.09-06-2012
20120187405THIN FILM TRANSISTOR ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, AND LIQUID CRYSTAL DISPLAY DEVICE - A TFT array substrate includes a plurality of pixels arranged in a matrix, in which the pixel includes a thin film transistor, a pixel electrode conductively connected to a drain electrode, and a common electrode that is formed opposite the pixel electrode with an insulation film interposed therebetween. In the TFT array substrate, when one of the pixels is focused, the pixel electrode is divided into a plurality of divided pixel electrodes and includes a plurality of branch conductive parts that conductively connect each of the drain electrode and the plurality of divided pixel electrodes, and in plane view, the common electrode is not formed in at least a part of a formation region of the plurality of branch conductive parts.07-26-2012
20110101354SEMICONDUCTOR ELEMENT AND METHOD FOR MANUFACTURING THE SAME - A semiconductor device 05-05-2011
20120138934DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line.06-07-2012
20120256185SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION THEREOF, AND DISPLAY DEVICE - The semiconductor device (10-11-2012
20120256184SEMICONDUCTOR DEVICE, ACTIVE MATRIX SUBSTRATE AND DISPLAY DEVICE - A switching element (a semiconductor device) (10-11-2012
20120187406THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY APPARATUS USING THE SAME AND MANUFACTURING METHOD THEREOF - A thin film transistor substrate, a display apparatus using the same and a manufacturing method thereof are provided. The display apparatus includes a thin film transistor substrate, a top substrate and a display medium layer. The thin film transistor substrate includes a composite plate and several thin film transistors. The composite plate includes a core material structure and two insulation structures. The core material structure includes a metal layer. The two insulation structures are respectively disposed at two sides of the core material structure so as to sandwich the core material structure therebetween. The thin film transistors are disposed on the composite plate. The display medium layer is disposed between the thin film transistor substrate and the top substrate.07-26-2012
20090020758Display substrate and method of manufacturing the same - A display substrate includes a base substrate, a first metal pattern, a second metal pattern, a first transparent conductive layer and a second transparent conductive layer. The first metal pattern is formed on the base substrate, and includes a gate line and a gate electrode connected to the gate line. The second metal pattern includes a data line crossing the gate line, a source electrode connected to the data line and a drain electrode being spaced apart from the source electrode. The first transparent conductive layer includes a capping layer capping the second metal pattern and a common electrode formed in a pixel area. The second transparent conductive layer includes a pixel electrode having a plurality of openings, contacting the capping layer capping the drain electrode, and facing the common electrode.01-22-2009
20090020759Light-emitting device - It is an object to provide a light-emitting device including a thin film transistor with high electric characteristics and high reliability, and a method for manufacturing the light-emitting device with high productivity. As for a light-emitting device including an inverted staggered thin film transistor of a channel stop type, the inverted staggered thin film transistor includes a gate electrode, a gate insulating film over the gate electrode, a microcrystalline semiconductor film including a channel formation region over the gate insulating film, a buffer layer over the microcrystalline semiconductor film, a channel protective layer which is provided over the buffer layer so as to overlap with the channel formation region of the microcrystalline semiconductor film, a source region and a drain region over the channel protective layer and the buffer layer, and a source electrode and a drain electrode over the source region and the drain region.01-22-2009
20100314623TFT ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE SAME - A four-mask process thin film transistor (TFT) array substrate and a method for fabricating the same is disclosed, which prevents a semiconductor tail from being formed. An open area is thus obtained and wavy noise is prevented from occurring. The method of fabricating a TFT array substrate comprises: forming a gate line, a gate electrode and a pad electrode on a substrate; sequentially depositing a gate insulation layer, a silicon layer and a metal layer on an entire surface of the substrate including the gate line; forming an open area in the pad electrode; forming a semiconductor layer, data line and source/drain electrodes by patterning the silicon layer and the metal layer; and forming a pixel electrode connected with the drain electrode and a transparent conductive layer connected with the pad electrode by depositing and patterning a transparent conductive material on the entire surface of the substrate including the data line, and simultaneously defining a channel region by separating the source and drain electrodes from each other.12-16-2010
20120261667DISPLAY DEVICE - A display device according to the present invention includes a barrier layer formed over the transistor and a planarization layer formed over the barrier layer. The planarization layer has an opening and an edge portion of the planarization layer formed at the opening of the planarization layer is rounded. Further, a resin film is formed over the planarization layer and in the opening of the planarization layer, and the resin film also has an opening and an edge portion of the resin film formed at the opening of the resin film is rounded. A light emitting member is formed over the resin film.10-18-2012
20120261666METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE AND STRUCTURE THEREOF - A method of manufacturing a thin film transistor array substrate and a structure of the same are disclosed. The manufacturing method merely requires two steps of mask fabrication to accomplish the manufacture of thin film transistor array, in which the manufacturing method utilizes a first mask fabrication step to define a pattern of a source electrode and a drain electrode of the thin film transistor, and a partially-exposed dielectric layer, and utilizes a second mask fabrication step to define an arrangement of a transparent conductive layer. The manufacturing method and structure can dramatically reduce the manufacturing cost of masks and simplify the whole manufacturing process.10-18-2012
20120138933THIN-FILM TRANSISTOR AND ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE SAME - A thin-film transistor includes a structure for protecting an active layer, and an organic light-emitting display device including the thin-film transistor. The thin-film transistor includes: a gate electrode disposed on a substrate; a first insulating layer disposed on the gate electrode; an active layer disposed on the first insulating layer, and corresponding to the gate electrode; a second insulating layer disposed on the first insulating layer and covering the active layer, the second insulating layer including first and second openings exposing first and second portions of the active layer, respectively; a source electrode disposed on the second insulating layer and connected to the first portion of the active layer via the first opening of the second insulating layer; a drain electrode disposed on the second insulating layer and connected to the second portion of the active layer via the second opening of the second insulating layer; and a dummy member disposed on the second insulating layer and corresponding to at least a third portion of the active layer between the first and second portions of the active layer.06-07-2012
20120228618Thin Film Transistor Structure - A thin film transistor (TFT) structure is provided. The TFT comprises a gate, a first electrode, a second electrode, a dielectric layer, and a channel layer. By overlapping the area between the first electrode and the gate, the TFT structure acquires a parasitic capacitor that is unaffected by manufacture deviations. Therefore, the TFT needs no compensation capacitor, thereby, increasing the aperture ratio of the TFT.09-13-2012
20120228619DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel includes; a lower gate line, a lower data line disposed substantially perpendicular to the lower gate line, a thin film transistor (“TFT”) connected to the lower gate line and the lower data line, an insulating layer disposed on the lower gate line, the lower data line, and the TFT and having a plurality of trenches exposing the lower gate line and the lower data line, an upper gate line disposed in the trench on the lower gate line, an upper data line disposed in the trench on the lower data line, and a pixel electrode connected to the TFT.09-13-2012
20120228621METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE - An object of this invention is to provide a semiconductor device in which TFTs with high mobility are arranged in both of display and peripheral circuit areas. A semiconductor device fabricating method according to the present invention includes the steps of: irradiating an amorphous silicon layer (09-13-2012
20120228620THIN FILM TRANSISTOR ARRAY PANEL FOR A LIQUID CRYSTAL DISPLAY - A plurality of gate lines formed on an insulating substrate, each gate line including a pad for connection to an external device; a plurality of data lines intersecting the gate lines and insulated from the gate lines, each data line including a pad for connection to an external device; and a conductor overlapping at least one of the gate lines and the data lines are included. An overlapping distance of the gate lines or the data lines and a width of the conductor decreases as the length of the gate lines or the data lines increases. Accordingly, the difference in the RC delays due to the difference of the length of the signal lines is compensated to be reduced.09-13-2012
20120228617FLEXIBLE DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A method for manufacturing a flexible display device includes forming a heat generator on a carrier substrate, forming a flexible substrate on the heat generator, forming a thin film transistor on the flexible substrate, forming a light emitting element connected to the thin film transistor, and separating the flexible substrate from the heat generator by application of heat to the flexible substrate, the application of heat including generation of heat by the heat generator.09-13-2012
20110121304DISPLAY DEVICE AND MANUFACTURING METHOD THEREFOR - An active matrix substrate of a display device of the present invention includes a glass substrate (05-26-2011
20110121303THIN FILM TRANSISTOR AND LIQUID CRYSTAL DISPLAY HAVING THE SAME - A thin film transistor (TFT) substrate includes: a plurality of gate lines extending in one direction, a plurality of data lines extending in a direction intersecting the gate lines, a pixel electrode formed in a pixel region defined by an intersection of the gate line and the data line, and with one side of the pixel electrode overlapping a portion of one data line and another side of the pixel electrode overlapping a portion of another data line. The TFT further includes a storage electrode line having a storage electrode disposed in a central portion of the pixel region.05-26-2011
20110121302ORGANIC LIGHT EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light emitting display device with a simplified manufacturing process and improved electrical characteristics, along with a method of manufacturing the device, are disclosed. The device includes: a substrate having a display area and a non-display area; a thin film transistor (TFT) in the display area; a wiring portion in the non-display area; an intermediate layer electrically connected to the TFT and including an organic light emitting layer; and a counter electrode on the intermediate layer. The TFT includes an active layer, a gate electrode, and source/drain electrodes electrically connected to the active layer. The source/drain electrodes include a first conductive layer, a second conductive layer, and a third conductive layer that are sequentially stacked. The wiring portion includes the same material as the first conductive layer. One of the source/drain electrodes is longer than the other, to function as a pixel electrode, and is electrically connected to the intermediate layer.05-26-2011
20110121300DISPLAY DEVICE - An object is to provide a display device whose frame can be narrowed and whose display characteristics are excellent. The display device includes a driver circuit and a pixel portion. The driver circuit and the pixel portion are formed using a dual-gate thin film transistor and a single-gate thin film transistor, respectively. In the dual-gate thin film transistor in the display device, a semiconductor layer is formed using a microcrystalline semiconductor region and a pair of amorphous semiconductor regions, and a gate insulating layer and an insulating layer are in contact with the microcrystalline semiconductor region of the semiconductor layer.05-26-2011
20110121299ORGANIC LIGHT-EMITTING DISPLAY - An organic light-emitting display apparatus including a thin-film transistor (TFT) is disclosed. In one embodiment, the organic light-emitting display apparatus includes a thin-film transistor (TFT) and an organic light-emitting device electrically connected to the TFT. The apparatus further includes a light blocking portion formed directly above at least a portion of the TFT and configured to prevent light, emitted from the organic light-emitting device, from entering the portion of the TFT.05-26-2011
20080296574Pixel Structure of LCD and Fabrication Method Thereof - In this pixel structure, a metal layer/a dielectric layer/a heavily doped silicon layer constitutes a bottom electrode/a capacitor dielectric layer/a top electrode of a storage capacitor. At the same time, a metal shielding layer is formed under the thin film transistor to decrease photo-leakage-current.12-04-2008
20080296578Wiring Material and a Semiconductor Device Having a Wiring Using the Material, and the Manufacturing Method Thereof - An object of the present invention is to realize a semiconductor device having a high TFT characteristic. In manufacturing an active matrix display device, electric resistivity of the electrode material is kept low by preventing penetration of oxygen ion into the electrode in doping of an impurity ion. A display device having a low electric resistivity can be obtained.12-04-2008
20080296576Display Device - To provide a display device capable of reliably forming a resistive element formed on a substrate including pixels. A display device including at least a thin-film transistor and a resistive element on a substrate has a gate electrode, an insulating film, a semiconductor layer and a conductive layer which are sequentially stacked on the substrate, in which the resistive element is formed by using the semiconductor layer formed between end portions of wiring made of the conductive layer as a resistive body, and at least one conductive layer apart from the end portions is formed on the semiconductor layer between the end portions of wiring.12-04-2008
20080296575THIN FILM TRANSISTOR, ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - A thin film transistor for a thin film transistor liquid crystal display (TFT-LCD), an array substrate and manufacturing method thereof are provided. The thin film transistor comprises a source, a drain, and a channel region between the source and drain. A source extension region is connected with the source, a drain expanded region is connected with the drain, and the source extension region is disposed opposite to the drain extension region to form a channel extension region therebetween.12-04-2008
20100327287Display Device And Manufacturing Method Of The Same - A display device includes a sequentially stacked body formed of a gate signal line, an insulation film, a semiconductor layer and a conductor layer on a substrate. The conductive layer forms a drain electrode and a source electrode of a thin film transistor which are arranged with a channel region of the semiconductor layer therebetween, and one of the drain and source electrode is formed in an approximately U shape having an open-ended one end side and a connecting portion on another end side so that the one electrode surrounds a distal end portion of another electrode as viewed in a plan view, and a projecting portion is formed on a side of the connecting portion opposite to the another electrode.12-30-2010
20100327285SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE - Disclosed is a method of manufacturing a semiconductor device including: forming a photothermal conversion layer in a second area where a semiconductor layer is formed other than a first area where line is formed; and heating the semiconductor layer with the photothermal conversion layer by irradiating light on the first area and the second area.12-30-2010
20100327284ACTIVE DEVICE ARRAY SUBSTRATE - An active device array substrate including a first patterned conductive layer, a dielectric layer, a second patterned conductive layer, a passivation layer and pixel electrodes is provided. The first patterned conductive layer includes scan lines, common lines, gates and strip floating shielding patterns. The dielectric layer covering the first patterned conductive layer has first contact holes which expose a portion of the common lines, respectively. The second patterned conductive layer includes data lines, sources, drains and strip capacitance electrodes. Each strip capacitance electrode is electrically connected to one of the common lines through one of the first contact holes. A gap is formed between each data line and one strip capacitance electrode, and the strip floating shielding patterns are disposed under the data lines, the gap and the strip capacitance electrodes. Each pixel electrode is electrically connected to one of the drains through one of the second contact holes.12-30-2010
20120261668DISPLAY DEVICE - A display device for improving an aperture ratio of the pixel is provided. In the display device, a transparent oxide layer, an insulating film, and a conductive layer are sequentially stacked on a pixel region on a substrate, the conductive layer has a gate electrode of a thin film transistor connected to a gate signal line, and a region of the transparent oxide layer other than at least a channel region portion directly below the gate electrode is converted into an electrically conductive region, and a source signal line, a source region portion of the thin film transistor connected to the source signal line, a pixel electrode, and a drain region portion of the thin film transistor connected to the pixel electrode are formed from the conductive region.10-18-2012
20120319119DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate in accordance with one or more embodiments includes a first line pattern, a first insulation layer, a second line pattern, a color filter layer and a pixel electrode, which are formed on a substrate. The first line pattern includes a gate line and a light-blocking layer. The light-blocking layer has a first opening portion formed in a storage capacitor region. The first insulation layer is formed on the substrate having the first line pattern. The second line pattern is formed on the first insulation layer. The color filter layer is formed on the substrate having the second line pattern, and has a second opening portion overlapping with the storage electrode. The pixel electrode is formed on the substrate having the color filter layer. Thus, short circuits between the storage electrode and the pixel electrode may be prevented.12-20-2012
20120319116SEMICONDUCTOR ELEMENT, METHOD FOR MANUFACTURING SAME, DISPLAY DEVICE, AND ELECTRONIC DEVICE - A semiconductor element includes: an organic semiconductor layer; an electrode disposed on the organic semiconductor layer so as to be in contact with the organic semiconductor layer; and a wiring layer formed separately from the electrode and electrically connected to the electrode.12-20-2012
20120319117EL DISPLAY PANEL, EL DISPLAY APPARATUS, AND METHOD OF MANUFACTURING EL DISPLAY PANEL - A light-emitting panel includes a thin film semiconductor that includes a thin film transistor. The thin film transistor includes a gate electrode, a semiconductor layer above the gate electrode, a gate insulating film between the gate electrode and the semiconductor layer, a first electrode electrically connected to the semiconductor layer, and a second electrode. A first interlayer insulating film is above the thin film semiconductor. A gate line and an auxiliary line are above the first interlayer insulating film and between the first interlayer insulating film and a second interlayer insulating film. The gate line is electrically connected to the gate electrode. An electroluminescence emitter includes two electrodes and a light-emitting layer between the two electrodes. One of the two electrodes is connected to the auxiliary line.12-20-2012
20120319118DISPLAY DEVICE - One object is to provide a transistor including an oxide semiconductor film which is used for the pixel portion of a display device and has high reliability. A display device has a first gate electrode; a first gate insulating film over the first gate electrode; an oxide semiconductor film over the first gate insulating film; a source electrode and a drain electrode over the oxide semiconductor film; a second gate insulating film over the source electrode, the drain electrode and the oxide semiconductor film; a second gate electrode over the second gate insulating film; an organic resin film having flatness over the second gate insulating film; a pixel electrode over the organic resin film having flatness, wherein the concentration of hydrogen atoms contained in the oxide semiconductor film and measured by secondary ion mass spectrometry is less than 1×1012-20-2012
20120319115ORGANIC LIGHT-EMITTING DISPLAY DEVICE - An organic light-emitting display device including a substrate; a thin film transistor on the substrate, the thin film transistor including an active layer, a gate electrode, and source and drain electrodes that are electrically connected to the active layer; a first resonance layer at the same layer level as the gate electrode; a second resonance layer on the first resonance layer, the second resonance layer being at the same layer level as the source and drain electrodes, and electrically connected to the source and drain electrodes; an insulating layer between the second resonance layer and the first resonance layer; an intermediate layer on the second resonance layer, the intermediate layer including a light-emitting layer; and an opposite electrode on the intermediate layer.12-20-2012
20100252833THIN FILM TRANSISTOR DEVICES HAVING TRANSISTORS WITH DIFFERENT ELECTRICAL CHARACTERISTICS AND METHOD FOR FABRICATING THE SAME - A system for displaying images is provided. The system includes a thin film transistor (TFT) device comprising a substrate having a pixel region, a driving thin film transistor and a switching thin film transistor. The driving thin film transistor and the switching thin film transistor are disposed on the substrate and in the pixel region. The driving thin film transistor includes a polysilicon active layer and the switching thin film transistor includes an amorphous silicon active layer. A method for fabricating the system for displaying images including the TFT device is also disclosed.10-07-2010
20110037072MULTILAYER WIRING, SEMICONDUCTOR DEVICE, SUBSTRATE FOR DISPLAY AND DISPLAY DEVICE - The present invention provides a multilayer wiring capable of reducing the area of the wiring layer while preventing the property deterioration due to the parasitic capacitance, a semiconductor device, a substrate for display device, and a display device. The multilayer wiring of the present invention includes: a first conductor; a second conductor; and a third conductor. The first conductor is positioned in a (n+1)th conductive layer. The second conductor is positioned in a (n+2)th conductive layer, is electrically connected to a conductor in a layer below the (n+1)th conductive layer through at least a first connection hole in a (n+1)th insulating layer directly below the (n+2)th conductive layer, and is positioned so as not to overlap with the first conductor in a plan view of the main face of the substrate. The third conductor is positioned in a (n+3)th conductive layer, is electrically connected to a second conductor through a second connection hole in a (n+2)th insulating layer directly below the (n+3)th conductive layer, and is positioned on the second connection hole toward the first conductor. The second connection hole overlaps with the first connection hole in a plan view of the main face of the substrate.02-17-2011
20110037071DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device includes: a pixel including a plurality of light emitting elements each formed by sequentially stacking a first electrode layer, an organic layer, and a second electrode layer, spaced apart from each other in a first direction orthogonal to the stacking direction thereof, and emitting light emission colors different from each other; and an auxiliary wiring layer electrically connected to the second electrode layer. A plurality of the pixels are aligned in the first direction so as to include a gap which is larger than a gap between the light emitting elements adjacent to each other, and the auxiliary wiring layer is provided between the pixels adjacent to each other.02-17-2011
20120299004ACTIVE DEVICE ARRAY SUBSTRATE - An active device array substrate including a first patterned conductive layer, a dielectric layer, a second patterned conductive layer, a passivation layer and pixel electrodes is provided. The first patterned conductive layer includes scan lines, common lines, gates and strip floating shielding patterns. The dielectric layer covering the first patterned conductive layer has first contact holes which expose a portion of the common lines, respectively. The second patterned conductive layer includes data lines, sources, drains and strip capacitance electrodes. Each strip capacitance electrode is electrically connected to one of the common lines through one of the first contact holes. A gap is formed between each data line and one strip capacitance electrode, and the strip floating shielding patterns are disposed under the data lines, the gap and the strip capacitance electrodes. Each pixel electrode is electrically connected to one of the drains through one of the second contact holes.11-29-2012
20120299003ANALOG CIRCUIT AND SEMICONDUCTOR DEVICE - An object is to obtain a semiconductor device having a high sensitivity in detecting signals and a wide dynamic range, using a thin film transistor in which an oxide semiconductor layer is used. An analog circuit is formed with the use of a thin film transistor including an oxide semiconductor which has a function as a channel formation layer, has a hydrogen concentration of 5×1011-29-2012
20120299002COLOR DISPLAY DEVICE HAVING WHITE SUB-PIXELS AND EMBEDDED LIGHT REFLECTIVE LAYERS - Disclosed is a color display device containing plural pixels on a substrate, each pixel is composed of plural sub-pixels which emit lights different in wavelength in the visible range and a white sub-pixel, the plural sub-pixels and the white sub-pixel each have a white organic electroluminescence layer interposed between an optically semitransparent reflection layer and a light reflection layer, the optical distance between the optically semitransparent reflection layer and the light reflection layer in each of the plural sub-pixels forms a resonator having a distance for resonating emitted light, and the optical distance between the optically semitransparent reflection layer and the light reflection layer in the white sub-pixel is longer than the maximum optical distance between the optically semitransparent reflection layer and the light reflection layer in each of the plural sub-pixels.11-29-2012
20120299001SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - [Problem]A TFT is manufactured using at least five photomasks in a conventional liquid crystal display device, and therefore the manufacturing cost is high.11-29-2012
20120267630THIN FILM TRANSISTOR ARRAY PANEL AND METHOD OF MANUFACTURING THE SAME - A thin film transistor (“TFT”) array panel is provided. The TFT array panel includes an insulation substrate, a gate line formed on the insulation substrate and including a gate electrode, a data line insulated from and intersecting the gate line, and including a source electrode, a drain electrode opposite to the source electrode on the gate line, and a semiconductor formed in a layer between the data line and the gate line, and having a protruding portion extending below the drain electrode, wherein a portion of the semiconductor extending towards the drain electrode, from an area occupied by the data line, is positioned within an occupying area of the gate line including the gate electrode.10-25-2012
20120267631ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - An array substrate for a display device and its fabrication method are disclosed. The array substrate for a display device includes: a gate wiring and a gate electrode connected to the wiring formed on a substrate; a gate insulating layer formed on the gate electrode; an active layer and a barrier metal layer stacked with the gate insulating layer interposed therebetween on the gate electrode; a data wiring formed on the barrier metal layer and source and electrodes connected to the data wiring; a passivation film formed on the source and drain electrodes and the data wiring and having a contact hole exposing a portion of the drain electrode, the barrier metal layer and the active layer; and a pixel electrode formed on the passivation film and being in contact with the drain electrode and the barrier metal layer including the active layer.10-25-2012
20120267629Organic Light-Emitting Display Apparatus and Method of Manufacturing the Same - In an organic light-emitting display apparatus for improving image quality and a method of manufacturing the same, the organic light-emitting display apparatus comprises a substrate, a first electrode disposed on the substrate, an intermediate layer disposed on the first electrode and including an organic emission layer, a second electrode disposed on the intermediate layer, and a reflective unit disposed near the intermediate layer and reflecting visible light emitted from the intermediate layer.10-25-2012
20100140625THIN FILM TRANSISTOR ARRAY SUBSTRATE STRUCTURES AND FABRICATION METHOD THEREOF - A thin film transistor array substrate structure. The array substrate structure includes a thin film transistor array substrate, an organic material layer formed thereon, and a plurality of black matrices and color filter patterns disposed on the organic material layer. The invention also provides a method of fabricating the thin film transistor array substrate.06-10-2010
20110215330ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An organic light-emitting display device and a method of fabricating the same. The organic light-emitting display device includes: a substrate; a first electrode including a first metal layer disposed on the substrate and formed of titanium (Ti), aluminum (Al), a titanium or aluminum alloy, a second metal layer disposed on the first metal layer, and a transparent conductive layer disposed on the second metal layer; an organic layer disposed on the first electrode and including at least one organic emission layer; and a second electrode disposed on the organic layer. The method includes: forming a first electrode including a first metal layer formed of Ti, Al, or a titanium or aluminum alloy, a second metal layer, and a transparent conductive layer, on a substrate ; forming an organic layer including at least one organic emission layer on the first electrode; and forming a second electrode on the organic layer.09-08-2011
20120273789LIQUID CRYSTAL DISPLAY AND ARRAY SUBSTRATE - An embodiment of the disclosed technology discloses an array substrate comprising: a base substrate; a first layer transparent common electrode formed on the base substrate; a gate metal common electrode formed on the first layer transparent common electrode; an insulation layer formed on the gate metal common electrode, with via holes being formed in the insulation layer; and a second layer transparent common electrode formed on the insulation layer. A side portion of via holes is in contact with the gate metal common electrode, another side portion is in contact with the first layer transparent common electrode, such that the second layer transparent common electrode is connected electrically with the first layer transparent common electrode and the gate metal common electrode in the via holes.11-01-2012
20110210333Semiconductor Device - To realize a semiconductor device including a capacitor element capable of obtaining a sufficient capacitor without reducing an opening ratio, in which a pixel electrode is flattened in order to control a defect in orientation of liquid crystal. A semiconductor device of the present invention includes a light-shielding film formed on the thin film transistor, a capacitor insulating film formed on the light-shielding film, a conductive layer formed on the capacitor insulating film, and a pixel electrode that is formed so as to be electrically connected to the conductive layer, in which a storage capacitor element comprises the light-shielding film, the capacitor insulating film, and the conductive layer, whereby an area of a region serving as the capacitor element can be increased.09-01-2011
20110210331DRIVING TRANSISTOR OF ORGANIC LIGHT-EMITTING, METHOD FOR FABRICATING THE TRANSISTOR, AND ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE TRANSISTOR - A driving TFT for an organic light-emitting display device includes a gate electrode on a portion of a substrate, a gate insulation layer on an entire surface of the substrate including the gate electrode, a semiconductor layer on the gate insulation layer and covering the gate electrode, the semiconductor layer including an n-type impurity layer, and source and drain electrodes overlapping portions of the semiconductor layer at respective sides thereof.09-01-2011
20110220902Transflective Liquid Crystal Display Device and Method of Fabricating the Same - An array substrate for a transflective liquid crystal display device includes: a substrate; a gate line and a data line on the substrate, the gate line and the data line crossing each other to define a pixel region including a transmissive area and a reflective area surrounding the transmissive area; a thin film transistor having a gate insulating layer, the thin film transistor electrically connected to the gate line and the data line; a first passivation layer having a drain contact hole exposing a drain electrode of the thin film transistor and a through hole exposing the substrate in the transmissive area; a pixel electrode on the first passivation layer, the pixel electrode contacting the substrate in the transmissive area through the through hole; and a reflective plate on the pixel electrode, the reflective plate being electrically connected to the drain electrode through the drain contact hole and to the pixel electrode.09-15-2011
20110227082SEMICONDUCTOR DEVICE - An oxide semiconductor layer in which “safe” traps exist exhibits two kinds of modes in photoresponse characteristics. By using the oxide semiconductor layer, a transistor in which light deterioration is suppressed to the minimum and the electric characteristics are stable can be achieved. The oxide semiconductor layer exhibiting two kinds of modes in photoresponse characteristics has a photoelectric current value of 1 pA to 10 nA inclusive. When the average time τ09-22-2011
20110227080FLAT PANEL DISPLAY - A flat panel display includes; a first substrate, a white reflective layer disposed on the first substrate, a pixel electrode disposed on the white reflective, a second substrate disposed facing the first substrate, a common electrode disposed on the second substrate, and an electrooptic layer disposed between the pixel electrode and the common electrode, wherein the white reflective layer includes at least one of TiO09-22-2011
20110227078DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device including: a substrate; a first semiconductor layer disposed on the substrate; a second semiconductor layer disposed on the substrate and adjacent to the first semiconductor layer; a first insulation layer disposed on both the first semiconductor layer and the second semiconductor layer, the first insulation layer including a first opening forming a space between the first semiconductor layer and the second semiconductor layer; and a second insulation layer disposed on the first insulation layer and that fills the first opening.09-22-2011
20110227077REPAIR METHOD AND ACTIVE DEVICE ARRAY SUBSTRATE - A repair method for repairing an active device array substrate is provided. The active device array substrate includes a substrate, scan lines, data lines, active devices, pixel electrodes, and common lines. At least one of the scan line has an open defect. The scan lines and the data lines are intersected to define sub-pixel regions. The active devices are electrically connected with the scan lines and the data lines correspondingly. Each pixel electrode is disposed in one of the sub-pixel regions and electrically connected with one of the active devices. The repair method includes cutting one of the common lines neighboring to the open defect to form a cutting block that is electrically insulated from the common lines; and welding the cutting block, the scan line having the open defect and two active devices located at two opposite sides of the open defect.09-22-2011
20100187532THIN-FILM TRANSISTOR ARRAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE - A thin-film transistor array substrate includes a source line that is formed above a gate insulating layer covering a gate line, a semiconductor layer that is formed on the gate insulating layer and placed in a substantially whole area below a drain electrode, in a substantially whole area below a source electrode, in a substantially whole area below the source line and in a position opposite to the gate electrode, a pixel electrode that is formed directly on the drain electrode, a transparent conductive pattern that is formed directly on the source electrode and the source line in the same layer as the pixel electrode, and a counter electrode that is formed on an interlayer insulating layer covering the pixel electrode and the transparent conductive pattern and generates a fringe electric field with the pixel electrode.07-29-2010
20120080683THIN FILM TRANSITOR, DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE - A thin film transistor, a display device and a liquid crystal display device are provided. The thin film transistor includes a gate electrode film onto which light from a light source is irradiated, a semiconductor film formed on the gate electrode film and on an opposite side to the light source side through an insulating film, first and second electrode films formed to be in electrical contact with the semiconductor film, and a first shielding film formed in a same layer as the gate electrode film and electrically isolated from the gate electrode film, wherein the first shielding film overlaps a part of the semiconductor film as seen from the light irradiation direction and also overlaps at least a part of the first electrode film as seen from the light irradiation direction.04-05-2012
20120080682METHOD FOR PRODUCING DISPLAY DEVICE - In a liquid crystal display device, a first substrate includes electrical wirings and a semiconductor integrated circuit which has TFTs and is connected electrically to the electrical wirings, and a second substrate includes a transparent conductive film on a surface thereof. A surface of the first substrate that the electrical wirings are formed is opposite to the transparent conductive film on the second substrate. Also, in a liquid crystal display device, a first substrate includes a matrix circuit and a peripheral driver circuit, and a second substrate is opposite to the first substrate. Spacers are provided between the first and second substrates. A seal material is formed outside the matrix circuits and the peripheral driver circuits in the first and second substrates. A protective film is formed on the peripheral driver circuit has substantially a thickness equivalent to an interval between the substrates which is formed by the spacers.04-05-2012
20120080681THIN FILM TRANSISTOR AND ORGANIC LIGHT-EMITTING DISPLAY - A thin film transistor including: a substrate; an active layer formed over the substrate; a gate insulating layer formed over the active layer; a gate electrode formed over the gate insulating layer; an interlayer insulating layer formed over the gate electrode; and source and drain electrodes that contact the active layer via the interlayer insulating layer. The source and drain electrodes may have a structure including an aluminum (Al) layer, an aluminum-nickel alloy (AlNiX) layer, and an indium tin oxide (ITO) layer, which are sequentially stacked.04-05-2012
20120080680Organic light emitting display device - An organic light emitting display device includes a substrate, a plurality of unit pixels on the substrate, each unit pixel including a first region that emits light and a second region that transmits external light, thin film transistors (TFTs) disposed in the first region of each unit pixel, first electrodes disposed in the first region of each unit pixel, each first electrode being electrically connected to one of the TFTs, a second electrode facing the first electrodes, and commonly disposed in the unit pixels, and an organic layer interposed between the first electrodes and the second electrode, and including an emissive layer. With respect to two adjacent pixels of the plurality of unit pixels, the first region and the second region in one unit pixel are symmetrical with the first region and the second region in another adjacent unit pixel, and the second regions are connected to each other.04-05-2012
20110241005DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device capable of implementing the light shielding effect and process simplification, and a method of manufacturing the display device. The display device includes a transistor formed in a first region on a substrate, a pixel electrode formed in a second region on the substrate, a buffer layer formed beneath the transistor in the first region, and a light shielding layer formed between the buffer layer and the substrate in the first region. In the display device, the light shielding layer may include a semiconductor material.10-06-2011
20100230683THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF, DISPLAY DEVICE, AND MANUFACTURING METHOD THEREOF - Disclosed is a manufacturing method of a thin film transistor, which enables the formation of a thin film transistor by using only one photomask. The method includes: over a substrate sequentially forming a first insulating film, a first conductive film, a second insulating film, a semiconductor film, an impurity semiconductor film, and a second conductive film; forming a resist mask thereover using a first photomask; performing a first etching to allow the side surface of the layers including an upper portion of the first insulating film, the first conductive film, the second insulating film, the semiconductor film, the impurity semiconductor film, and the second conductive film to be coplanar to a side surface of the resist mask; and performing a second etching to selectively etch the first conductive film to allow the side surface of the first conductive film is located inside the side surface of the layers.09-16-2010
20100230681Display unit - A display unit with which lowering of long-term reliability of a transistor is decreased is provided. The display unit includes a display section having a plurality of organic EL devices with light emitting color different from each other and a plurality of pixel circuits that are singly provided for every said organic EL device for every pixel. The pixel circuit has a first transistor for writing a video signal, a second transistor for driving the organic EL device based on the video signal written by the first transistor, and a retentive capacity, and out of the first transistor and the second transistor, a third transistor provided correspondingly to a second organic EL device adjacent to a first organic EL device is arranged farther from the first organic EL device than a first retentive capacity provided correspondingly to the second organic EL device out of the retentive capacity.09-16-2010
20100230680LIQUID CRYSTAL DISPLAY DEVICE INCLUDING COMMON ELECTRODE AND REFERENCE ELECTRODE - A liquid crystal display includes; a first substrate, a gate line disposed on the first substrate, a data line intersecting the gate line, a thin film transistor connected to the gate line and the data line, a pixel electrode connected to the thin film transistor, an interlayer insulating layer disposed on the pixel electrode, a common electrode disposed on the interlayer insulating layer and including a plurality of electrically connected common electrode lines extending substantially parallel to each other, a second substrate disposed substantially opposite to the first substrate, a reference electrode disposed on substantially an entire surface of the second substrate, and a liquid crystal layer disposed between the first substrate and the second substrate, and having negative dielectric anisotropy.09-16-2010
20120280236DISPLAY DEVICES AND METHODS OF MANUFACTURING THE DISPLAY DEVICES - A display device includes a switching device, a first pixel electrode, a dielectric layer and a second pixel electrode. The switching device is provided on the lower substrate. The organic layer pattern is disposed on the lower substrate. The organic layer pattern includes a plurality of stepped portions in a pixel region. The first pixel electrode is disposed on the organic layer pattern in the pixel region. The dielectric layer is disposed on the first pixel electrode. A plurality of the second pixel electrodes is disposed on the dielectric layer. The second pixel electrodes are partially superimposed over the first pixel electrode. Non-uniform vertical fields may be minimized by the morphology of the first pixel electrode, so that the display device may have excellent brightness and transmittance.11-08-2012
20120280237Thin Film Transistor Substrate and Method for Fabricating the Same - The present invention relates to a thin film transistor substrate and a method for fabricating the same which can reduce a number of steps. The method for fabricating a thin film transistor substrate includes the steps of a first mask step forming a first conductive pattern on a substrate to include a gate electrode and a gate line, a second mask step depositing a gate insulating film on the substrate having the first conductive pattern formed thereon and forming a second conductive pattern on the gate insulating film to include a semiconductor pattern, source and drain electrodes and data line, a third mask step depositing a first protective film on the substrate having the second conductive pattern formed thereon and forming a pixel contact hole for exposing the drain electrode passed through the first protective film, a fourth mask step forming a third conductive pattern on the first protective films to have a common electrode and a common line and a second protective film to form an undercut with the common electrode and to include a pixel contact hole which exposes the drain electrode on the common electrode, and a fifth mask step forming a fourth conductive pattern to include a pixel electrode spaced from the common electrode by a space provided by the undercut.11-08-2012
20120280240LIQUID CRYSTAL DISPLAY DEVICE HAVING FIRST, SECOND, AND THIRD TRANSPARENT ELECTRODES WHEREIN A SECOND REGION OF THE SECOND ELECTRODE PROTRUDES FROM A FIRST REGION - To form a sufficiently large storage capacitor, a liquid crystal display device includes a liquid crystal display panel having a first substrate, a second substrate, and a liquid crystal held between the first substrate and the second substrate, the liquid crystal display panel having multiple pixels arranged in matrix. The first substrate has, in a transmissive display area provided in each of the pixels, a laminated structure containing a first transparent electrode, a first insulating film, a second transparent electrode, a second insulating film, and a third transparent electrode which are laminated in this order. The first transparent electrode and the second transparent electrode are electrically insulated from each other and together form a first storage capacitor through the first insulating film, and the second transparent electrode and the third transparent electrode are electrically insulated from each other and together form a second storage capacitor through the second insulating film.11-08-2012
20120280241THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE - A thin film transistor substrate with reduced interlayer short-circuit defects in a capacitor, and a display device having the thin film transistor substrate. The thin film transistor substrate includes: a substrate; a thin film transistor having, over the substrate, a gate electrode, a gate insulating film, an oxide semiconductor layer, and a source-drain electrode in order; and a capacitor having, over the substrate, a bottom electrode, a capacitor insulating film, and a top electrode made of oxide semiconductor in order.11-08-2012
20120280239THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR FABRICATING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE - The present disclosed technology is related to a TFT array substrate and a method for fabricating the TFT array substrate. The method may comprise: depositing a transparent conductive film layer and a source-drain metal layer in this order on a base substrate, and forming source electrodes, drain electrodes, data scan lines and transparent pixel electrodes by a first pattering process, with the transparent conductive film layer being left under the source electrodes, the drain electrodes and the data scan lines; on the resultant substrate, depositing a semiconductor layer and forming a patterned semiconductor layer by a second pattering process; and on the resultant substrate, depositing a gate insulator and a gate metal film in this order, and forming gate electrodes and gate scan lines by a third pattering process, the gate electrodes being located over the patterned semiconductor layer.11-08-2012
20110291097TFT ARRAY SUBSTRATE, AND LIQUID CRYSTAL DISPLAY PANEL - An embodiment of the present invention provides a TFT array substrate, in which TFT elements and pixel electrodes being correspondingly connected with the TFT elements are arrayed in matrix on an insulating substrate, the TFT array substrate including: gate bus lines made from a first metal material; source bus lines made from a second metal material; pixel electrodes made from a third metal material; a clock wiring made from the first metal material; a branch wiring made from the second metal material; and a connection conductor made from the third metal material, the connection conductor connecting the clock wiring and the branch wiring at a connection part in a periphery area, the connection part having a branch-wiring via hole, which exposes the branch wiring which is covered with the connection conductor, and overlaps the clock wiring at least partly in a plane view.12-01-2011
20110297941FLAT PANEL DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A flat panel display device having increased capacitance and a method of manufacturing the flat panel display device are provided. A flat panel display device includes: a plurality of pixel areas, each located at a crossing region of a gate line, a data line, and a common voltage line; a thin film transistor (TFT) located at a region where the gate line and the data line cross each other, the TFT including a gate electrode, a source electrode, and a drain electrode; and a storage capacitor located at a region where the common voltage line and the drain electrode cross each other, the storage capacitor including first, second, and a third storage electrodes.12-08-2011
20120326154MANUFACTURING METHOD OF THIN FILM TRANSISTOR AND THIN FILM TRANSISTOR, AND DISPLAY - A method of making a thin film transistor made of a stack of an organic semiconductor layer, a gate insulating film and a gate electrode in this order on a substrate, which includes the steps of pattern coating a gate electrode material on the gate insulating film by printing; and carrying out a heat treatment to form the gate electrode resulting from drying for solidification of the pattern coated gate electrode material.12-27-2012
20120326153THIN FILM TRANSISTOR ARRAY PANEL WITH OVERLAPPING FLOATING ELECTRODES AND PIXEL ELECTRODES - According to an embodiment of the present invention, a thin film transistor array panel includes a gate line and a data line insulated from each other an insulating substrate where the gate line and the data line cross each other to define a pixel region, a thin film transistor (TFT) disposed at an intersection of the gate line and the data line, a floating electrode where at least a portion of the floating electrode overlaps the data line, and a pixel electrode disposed at the pixel region where the pixel electrode is connected to the TFT and overlaps the at least a portion of the floating electrode.12-27-2012
20120326152THIN FILM TRANSISTOR SUBSTRATE, DISPLAY PANEL HAVING THE SAME AND METHOD OF MANUFACTURING - A thin film transistor substrate includes a base substrate; a first insulating layer disposed on the base electrode; source and drain electrodes disposed on the first insulating layer to be spaced apart from each other; a semiconductor layer disposed on the source electrode, the drain electrode, and the first insulating layer; a second insulating layer disposed on the semiconductor layer; and a gate electrode disposed on the second insulating layer to overlap with the source electrode and the drain electrode.12-27-2012
20120326151DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device includes: an insulating substrate comprising a first region and a second region; a thin-film transistor (TFT) formed on the first region comprising a gate electrode, a source electrode, and a drain electrode; and a storage capacitor formed on the second region, wherein the storage capacitor comprises a first electrode, a second electrode and a first interlayer insulating film, where the first and second electrodes face each other and are made of a transparent conductive material, wherein the interlayer insulating film is interposed between the first electrode and the second electrode, and wherein the first electrode is formed on the entire surface of the first substrate as one body and receives a common voltage, and the second electrode is electrically connected to the drain electrode.12-27-2012
20120326150Organic light emitting display device and method for manufacturing the same - An exemplary embodiment may include a substrate, an insulating layer on the substrate, and a pixel electrode including a transparent conductive layer on the insulating layer. A portion of a surface of the insulating layer contacting the transparent conductive layer has a plurality of recessed holes formed by etching with an etchant into an interface between the transparent conductive layer of the pixel electrode and the insulating layer.12-27-2012
20120091459Organic Light Emitting Display Device and Manufacturing Method Thereof - An organic light emitting diode display comprises: a substrate; an active layer formed with a semiconductor material on the substrate; a first insulation layer formed on the semiconductor layer; a pixel electrode formed on the first insulation layer and generated by alternately stacking a plurality of pixel metal layers and a plurality of pixel transparent conductive layers; a gate electrode formed on the first insulation layer and formed in a configuration different from that of the pixel electrode; a second insulation layer formed on the first insulation layer so as to cover the gate electrode with an insulation layer opening for revealing the pixel electrode; a source electrode and a drain electrode respectively formed on the second insulation layer and electrically connected to the active layer; an organic emission layer formed on the pixel electrode; and a common electrode formed on the organic emission layer.04-19-2012
20120286277PIXEL STRUCTURE AND DISPLAY PANEL - A pixel structure and a manufacturing method thereof and a display panel are provided. An electrode material layer, a shielding material layer, an inter-layer dielectric material layer, a semiconductor material layer and a photoresist-layer are sequentially formed on a substrate. The semiconductor material layer, the inter-layer dielectric material layer, the shielding material layer and the electrode material layer are patterned using the photoresist-layer as a mask to form a semiconductor pattern, an inter-layer dielectric pattern, a shielding pattern and a pixel electrode. A source/drain electrically connected to the pixel electrode and covering a portion of the semiconductor pattern is formed on the pixel electrode. A channel is another portion of the semiconductor uncovered by the source/drain. A dielectric layer covering the source/drain, the semiconductor pattern, the inter-layer dielectric pattern, the shielding pattern and the pixel electrode and a gate disposed on the dielectric layer above the channel are formed.11-15-2012
20120286275DISPLAY DEVICE AND ELECTRONIC APPARATUS - A display device has pixels including electro-optical elements and transistors. Each pixel has a metal layer of a gate electrode of the transistor, a semiconductor layer in which a source region and a drain region of the transistor are formed, and a capacitance element formed between the same metal layer as the metal layer of the gate electrode and the semiconductor layer upon application of a voltage to the metal layer.11-15-2012
20120286276Semiconductor Device and Manufacturing Method Thereof - A p channel IFT of a driving circuit has a single drain structure and its n channel TFT, a GOLD structure or an LDD structure. A pixel TFT has the LDD structure. A pixel electrode disposed in a pixel portion is connected to the pixel TFT through a hole bored in at least a protective insulation film formed of an inorganic insulating material and formed above a gate electrode of the pixel TFT, and in an interlayer insulating film disposed on the insulation film in close contact therewith. These process steps use 6 to 8 photo-masks.11-15-2012
20120286274DISPLAY SUBSTRATE INCLUDING AN AUXILIARY ELECTRODE - A display substrate includes a data line, a main gate line, and a first sub-pixel electrode formed on a base substrate. The display substrate further includes a first switching element connected to the data line. The display substrate further includes a second switching element connected to the data line, the main gate line, and a second sub-pixel electrode spaced apart from the first sub-pixel electrode. The display substrate further includes a third switching element connected to the data line and a secondary gate line adjacent to the main gate line. The display substrate further includes a shielding line spaced apart from the first and second sub-pixel electrodes, the shielding line overlapping the data line and receiving a reference voltage. The display substrate further includes an auxiliary electrode extending from the shielding line and overlapping an end electrode connected to the third switching element.11-15-2012
20120138938DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A display apparatus includes a first insulating substrate on which pixels are arranged and a second insulating substrate facing the first insulating substrate. Each pixel includes a gate electrode disposed on the first insulating substrate, a gate insulating layer disposed on the first insulating substrate to cover the gate electrode, a semiconductor pattern disposed on the gate insulating layer to overlap with the gate electrode, a source electrode and a drain electrode disposed on the semiconductor pattern, a transparent pixel electrode disposed on the gate insulating layer and partially making contact with the drain electrode, a protective layer disposed on the pixel electrode, and a common electrode disposed on the first insulating substrate or the second insulating substrate to form an electric field together with the pixel electrode.06-07-2012
20120138943LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE - At least one of a drain electrode, a source electrode and a gate electrode includes an aluminum alloy material film. The aluminum alloy material film includes aluminum as a base material, an alloy component containing at least one type of element selected from the group consisting of cobalt, rhodium, nickel, palladium, carbon, silicon, germanium, and tin, and another component containing an element different from aluminum and each element listed above, in which the total number of types of the elements of the alloy component and another component is three or more.06-07-2012
20120138942LIGHT-EMITTING DISPLAY DEVICE AND MANUFACTURING METHOD FOR LIGHT-EMITTING DISPLAY DEVICE - In the light-emitting display device according to the present invention, a side-contact structure is adopted in order to secure a TFT characteristic in a linear region (on-current). In a TFT configuring a switching transistor, a thickness of a semiconductor layer (channel layer) in a region corresponding to the source/drain electrodes is increased. In contrast, in a TFT configuring a driving transistor, in order to maintain an on current, a thickness of a semiconductor layer (channel layer) in a region corresponding to the source/drain electrodes is reduced. This configuration is manufactured using a half-tone mask. With this, it is possible to suppress the off-current in the switching transistor, while securing the on-current in the driving transistor.06-07-2012
20120138940THIN-FILM TRANSISTOR FORMING SUBSTRATE, SEMICONDUCTOR DEVICE, AND ELECTRIC APPARATUS - There is provided a thin-film transistor forming substrate in which at least one of a source electrode, a drain electrode, and a gate electrode, which are constituent elements of a thin film transistor, or a first electrode is included on a face of a substrate main body that is located on any one side in a thickness direction. An embedded wiring that is connected to one of the source electrode, the drain electrode, the gate electrode, and the first electrode is buried inside the substrate main body.06-07-2012
20120138939DISPLAY PANEL, METHOD OF MANUFACTURING DISPLAY PANEL, DISPLAY DEVICE, AND ELECTRONIC APPARATUS - A display panel includes: gate lines disposed on a first substrate; signal lines extending across the gate lines and including portions, other than portions thereof that extend across the gate lines, disposed on the same surface as the gate lines, the portions that extend across the gate lines being disposed in positions facing the gate lines with an insulating film interposed therebetween; transistors having gate electrodes connected to the gate lines, source electrodes connected to the signal lines and disposed on the insulating film, and drain electrodes disposed on the insulating film; pixel electrodes connected to the drain electrode and disposed on the insulating film; a protective film covering the transistors and the pixel electrodes; and a common electrode disposed on the protective film.06-07-2012
20130009157THIN FILM TRANSISTOR ARRAY PANEL AND A METHOD FOR MANUFACTURING THE SAME - A thin film transistor array panel includes a substrate; a plurality of gate lines that are formed on the substrate; a plurality of data lines that intersect the gate lines; a plurality of thin film transistors that are connected to the gate lines and the data lines; a plurality of color filters that are formed on upper parts of the gate lines, the data lines, and the thin film transistors; a common electrode that is formed on the color filters and that includes a transparent conductor; a passivation layer that is formed on an upper part of the common electrode; and a plurality of pixel electrodes that are formed on an upper part of the passivation layer and that are connected to a drain electrode of each of the thin film transistors.01-10-2013
20130009159LIQUID CRYSTAL DISPLAY AND THIN FILM TRANSISTOR ARRAY PANEL USABLE WITH THE LIQUID CRYSTAL DISPLAY - A liquid crystal display with improved viewing angle and uncompromised transmittance is provided, along with a thin film transistor (TFT) array panel usable for such liquid crystal display. The TFT array panel includes a substrate, a plurality of gate lines formed on the substrate, a plurality of data lines formed on the substrate and intersecting the gate lines, and a plurality of thin film transistors. Each of the thin film transistors includes a gate electrode connected to one of the gate lines, a source electrode connected to one of the data lines, and a drain electrode. The TFT array panel also includes a plurality of pixel electrodes, each of the pixel electrodes connected to one of the drain electrodes and having a pair of oblique edges parallel to each other, and covering at least a portion of the drain electrodes.01-10-2013
20130009158PIXEL STRUCTURE - A pixel structure disposed on a substrate having an array of pixel areas is provided. The common electrode wire is positioned only in a portion of the pixel area. A first capacitance storage electrode is disposed in each of the pixel areas and electrically connected between two adjacent common electrode wires. A gate insulation layer covers the scan line, the gate electrode, the common electrode wire and the first capacitance storage electrode. A semiconductor layer is disposed on the gate insulation layer above the gate electrode. The source and the drain are disposed on two sides of the semiconductor layer. A passivation layer is disposed on the substrate to cover the data line, the source and the drain. The passivation layer above the drain has a contact window. A pixel electrode is electrically connected with the drain through the contact window.01-10-2013
20130009160ACTIVE MATRIX SUBSTRATE - Disposed on an insulating substrate (01-10-2013
20130009156THIN FILM TRANSISTOR ARRAY SUBSTRATE AND LIQUID CRYSTAL DISPLAY PANEL HAVING THE SAME - A TFT array is disclosed that includes a substrate, a gate line, a data line and a pixel, wherein the pixel comprises a first pixel electrode portion comprising a plurality of spaced apart first electrode lines, the first pixel electrode portion having an associated TFT coupled to the first electrode portion, a second pixel electrode portion comprising a plurality of spaced apart second electrode lines, the second pixel electrode portion capacitively coupled with the first pixel electrode portion, wherein a width of each of the first electrode lines of the first pixel electrode portion is narrower than a width of each of the second electrode lines of the second pixel electrode portion, and an interval between adjacent first electrode lines of the first pixel electrode portion is smaller than an interval between adjacent second electrode lines of the second pixel electrode portion.01-10-2013
20130009155Thin-Film-Transistor Array Substrate and Manufacturing Method Thereof - The present invention discloses a thin-film-transistor array substrate and a manufacturing method thereof. The array substrate includes a thin-film transistor and a compensation electrode. A gate electrode of the thin-film transistor is a portion of a scan-signal line and has an opening, and the opening extends to a side of the scan-signal line. A drain electrode of the thin-film transistor is disposed correspondingly to the opening. A source electrode of the thin-film transistor extends from a side of a data-signal line and surrounds the drain electrode. The compensation electrode extends from another side of the scan-signal line and corresponds to the gate electrode. Therefore, the present invention is capable of reducing parasitic capacitance between the drain electrode and the gate electrode without increasing the resistance value of the scan-signal line.01-10-2013
20130015445Thin Film Transistor and Method for Manufacturing the SameAANM Liao; Chan-ChangAACI New Taipei CityAACO TWAAGP Liao; Chan-Chang New Taipei City TWAANM Chiu; Hsien-KunAACI Taoyuan CityAACO TWAAGP Chiu; Hsien-Kun Taoyuan City TWAANM Yen; Wei-PangAACI Taoyuan CountyAACO TWAAGP Yen; Wei-Pang Taoyuan County TWAANM Hsu; Chao-HuanAACI Taoyuan CountyAACO TWAAGP Hsu; Chao-Huan Taoyuan County TW - A thin film transistor and a method for manufacturing the same are provided. A top-gate thin film transistor is fabricated by a process using two gray-tone photomasks and a lift-off method. Therefore, the method can save cost of photomasks and processes comparing to a conventional fabrication method.01-17-2013
20130015447DEFECT-RESISTANT THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOFAANM JUNG; Sang-HunAACI Asani-siAACO KRAAGP JUNG; Sang-Hun Asani-si KRAANM Seo; Dong-WuukAACI Asani-siAACO KRAAGP Seo; Dong-Wuuk Asani-si KRAANM Lee; Sun-JungAACI Yongin-siAACO KRAAGP Lee; Sun-Jung Yongin-si KR - A thin film transistor array panel according to an exemplary embodiment of the present invention includes a substrate; a gate line disposed on the substrate; a gate insulating layer disposed on the gate line; a semiconductor disposed on the gate insulating layer; a data line disposed on the semiconductor and including a source electrode; a drain electrode disposed on the semiconductor and facing the source electrode; a first electrode disposed on the gate insulating layer; a protection electrode disposed on the data line; a passivation layer disposed on the first electrode and the protection electrode; and a second electrode disposed on the passivation layer, wherein the protection electrode comprises the same material as the first electrode.01-17-2013
20130015449PIXEL STRUCTURE AND METHOD OF FABRICATING THE SAMEAANM Lee; Chien-ChihAACI Hsin-ChuAACO TWAAGP Lee; Chien-Chih Hsin-Chu TWAANM Shen; Pei-YiAACI Hsin-ChuAACO TWAAGP Shen; Pei-Yi Hsin-Chu TWAANM Cheng; Ching-YangAACI Hsin-ChuAACO TWAAGP Cheng; Ching-Yang Hsin-Chu TWAANM Huang; Shu-MingAACI Hsin-ChuAACO TWAAGP Huang; Shu-Ming Hsin-Chu TW - The present invention provides a pixel structure including a substrate, a patterned electrode disposed on the substrate, a first insulating layer disposed on the patterned electrode, a common electrode disposed on the first insulating layer, a second insulating layer disposed on the common electrode, and a drain disposed on the second insulating layer. The first insulating layer has a first through hole, and the second insulating layer has a second through hole. The drain includes a first portion electrically connected to the patterned electrode via the first through hole and the second through hole, and a second portion extending onto the common electrode. The common electrode is coupled with the patterned electrode to form a first storage capacitor and is coupled with the second portion to form a second storage capacitor.01-17-2013
20130015446Thin Film Transistor Manufacturing Method and Thin Film TransistorAANM Qin; ShijianAACI GuangdongAACO CNAAGP Qin; Shijian Guangdong CNAANM He; ChengmingAACI GuangdongAACO CNAAGP He; Chengming Guangdong CN - The present invention provides a thin film transistor (TFT) manufacturing method and a TFT, a source electrode or drain electrode of the TFT is electrically connected to a data line directly during a forming process by providing a through hole in a surface above the data line of the TFT, so as to save the process cost. Further, the source electrode and drain electrode of the TFT are also manufactured with poly-silicon rather than metal material used in prior art, processing steps are simplified, thereby further saving the process cost.01-17-2013
20130015448SEMICONDUCTOR DEVICE AND ELECTROLUMINESCENT DEVICE AND METHOD OF MAKING THE SAMEAANM Yang; Chao-ShunAACI Hsin-ChuAACO TWAAGP Yang; Chao-Shun Hsin-Chu TWAANM Hsieh; Hsing-HungAACI Hsin-ChuAACO TWAAGP Hsieh; Hsing-Hung Hsin-Chu TW - A semiconductor device, disposed on a substrate, includes a first channel layer, a patterned doped layer, a gate insulating layer, a conducting gate electrode, a second channel layer, a first electrode and a second electrode, and a third electrode and a fourth electrode. The first channel layer is disposed on the substrate and in a first region. The patterned doped layer includes a doped gate electrode disposed in a second region, and two contact electrodes electrically connected to two sides of the first channel layer, respectively. The conducting gate electrode is disposed on the gate insulating layer in the first region. The second channel layer is disposed on the gate insulating layer in the second region. The first electrode and the second electrode are electrically connected to the contact electrodes, respectively. The third electrode and the fourth electrode are electrically connected to two sides of the second channel layer, respectively.01-17-2013
20130015452ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE ARRAY SUBSTRATE - An array substrate including: a gate electrode and a gate insulation layer disposed on a base substrate, the gate insulation layer having a first thickness in a first region and a second thickness in a second region, the first thickness being greater than the second thickness; a semiconductor pattern disposed on the gate insulation layer in the first region, an end portion of the semiconductor pattern having a stepped portion with respect to the gate insulation layer; an ohmic contact pattern disposed on the semiconductor pattern, an end portion of the ohmic contact pattern opposite to a channel portion being aligned with the end portion of the semiconductor pattern; and source and drain electrodes disposed on the ohmic contact pattern, the source and drain electrodes spaced apart from each other and including first and second thin-film transistor patterns.01-17-2013
20130015453DISPLAY DEVICE, THIN-FILM TRANSISTOR USED FOR DISPLAY DEVICE, AND METHOD OF MANUFACTURING THIN-FILM TRANSISTOR - A display device including a display element and a thin-film transistor for controlling light emission from the display element. The thin-film transistor includes: a gate electrode formed on an insulating support substrate; a gate insulating film formed on the substrate so as to cover the gate electrode; a channel layer formed on the gate insulating film; a channel protective layer formed on the top surface of the channel layer; a pair of contact layers formed on the top surface of the channel protective layer and connected to the channel layer; and a source electrode and a drain electrode each connected to the pair of contact layers. The pair of contact layers has an interface contacting the side surface of the channel layer.01-17-2013
20130015454PANEL STRUCTURE, DISPLAY DEVICE INCLUDING SAME, AND METHODS OF MANUFACTURING PANEL STRUCTURE AND DISPLAY DEVICE - Via holes for connecting elements of the panel structure may be formed by performing one process. For example, via holes for connecting a transistor and a conductive layer spaced apart from the transistor may be formed by performing only one process.01-17-2013
20120146036Device using oxide semiconductor, display device, and electronic apparatus - Disclosed herein is a device using an oxide semiconductor, the device including a circuit part configured to include a thin film transistor using the oxide semiconductor as a channel material, wherein the circuit part has a lower interconnect, an upper interconnect, and an interlayer insulating film, the interlayer insulating film includes an oxide semiconductor layer and a channel protective layer, and the channel protective layer is interposed between an outer circumferential surface of a rising part of the oxide semiconductor layer corresponding to thickness of the lower interconnect and the upper interconnect.06-14-2012
20120146035DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - A conductive layer to be a gate electrode, an insulating layer to be a gate insulating layer, a semiconductor layer, and an insulating layer to be a channel protective layer, which are each included in a transistor, are successively formed without exposure to the air. A gate electrode (including another electrode or a wiring which is formed in the same layer) and an island-like semiconductor layer are formed through one photolithography step. A display device is manufactured through four photolithography steps including the photolithography step, a photolithography step of forming a contact hole, a photolithography step of forming a source electrode and a drain electrode (including another electrode or a wiring which is formed in the same layer), and a photolithography step of forming a pixel electrode (including another electrode or a wiring which are formed in the same layer).06-14-2012
20110147746TOUCH SCREEN SUBSTRATE, METHOD OF MANUFACTURING THE SAME, AND DISPLAY PANEL INCLUDING THE TOUCH SCREEN SUBSTRATE - A touch screen substrate includes a base substrate, a first switching element and a first sensing element which senses infrared light. The first switching element includes a first switching gate electrode, a first active pattern disposed on the first switching gate electrode, a first switching source electrode disposed on the first active pattern and a first switching drain electrode disposed apart from the first switching source electrode. The first sensing element includes a first sensing drain electrode connected to the first switching source electrode, a first sensing source electrode disposed apart from the first sensing drain electrode, a second active pattern disposed below the first sensing drain electrode and the first sensing source electrode and including a first amorphous layer, a doped amorphous layer and a second amorphous layer, and a first sensing gate electrode disposed on the first sensing drain electrode and the first sensing source electrode.06-23-2011
20130020574DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device includes a display element, a thin-film transistor for controlling light emission from the display element, and a signal line connected to the thin-film transistor. The thin-film transistor includes a gate electrode formed on an insulating substrate, a gate insulating film formed on the substrate so as to cover the gate electrode, a channel layer formed on the gate insulating film, and a source electrode and a drain electrode connected to the channel layer. A mounting terminal part of the signal line is formed by laminating a metal oxide layer on a copper layer; its cross section is trapezoidal; and the side surface and the periphery of the top surface of the mounting terminal part are covered with a protective film.01-24-2013
20130168680STEREOSCOPIC IMAGE DISPLAY SUBSTRATE - A stereoscopic image display substrate includes a base substrate, a data line, a plurality of gate line parts and a pixel electrode part. The data line is disposed on the base substrate. The data line extends in a first direction. The gate line parts are disposed on the base substrate. Each gate line part includes a plurality of gate lines extending in a second direction different from the first direction. The gate lines are adjacent to each other. The pixel electrode part is disposed between the gate line parts. The pixel electrode part includes at least three pixel electrodes connected to the data line.07-04-2013
20120241746ELECTROPHORESIS DISPLAY AND MANUFACTURING METHOD - The disclosed technology is in connection with an electrophoresis display and manufacturing method thereof. The electrophoresis display comprises: a substrate; a gate line metal layer including a gate electrode, formed on the substrate; a gate insulating layer covering the gate line metal layer; a semiconductor active layer formed on the gate insulating layer and located above the gate electrode correspondingly; a data line metal layer including a source electrode and a drain electrode, formed on the gate insulating layer, wherein the source electrode and the drain electrode are located on the semiconductor active layer and separated by a distance; a photoresist resin layer covering the data line metal layer and formed with a via hole above the drain electrode; and a pixel electrode layer formed on the photoresist resin layer and connected to the drain electrode by the via hole.09-27-2012
20120241744DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A display apparatus including: a plurality of thin film transistors; and an interconnect region, wherein each of the thin film transistors includes a first protective film held in contact with a channel layer and disposed remotely from a gate electrode, a second protective film disposed on the first protective film, and a source and drain electrode assembly including a pair of electrodes held in contact with the channel layer, and the interconnect region includes a first interconnect, a second interconnect disposed in alignment with the first interconnect, and an insulating layer interposed between the first interconnect and the second interconnect and having a stacked structure including a first insulating film joined to the gate insulating film and a second insulating film joined to the second protective film.09-27-2012
20080237596Liquid crystal display device and fabrication method thereof - A liquid crystal display (LCD) includes: a first substrate divided into a pixel part and first and second pad parts; a gate electrode and a gate line formed at the pixel part of the first substrate; an active pattern formed as an island on the gate electrode and having a width smaller than the gate electrode; an insulation film formed on the first substrate and having first and second contact holes exposing source and drain regions of the active pattern, respectively; source and drain electrodes formed at the pixel part of the first substrate and electrically connected with the source and drain regions of the active pattern via the first and second contact holes; a data line formed at the pixel part of the first substrate and crossing the gate line to define a pixel region; an etch stopper positioned between the source and drain electrodes and formed as an insulation film; a pixel electrode electrically connected with the drain electrode; and a second substrate attached with the first substrate in a facing manner.10-02-2008
20080230783Image Sensor and Method for Manufacturing the Same - An image sensor and a method for manufacturing the same are provided. The image sensor can include: a semiconductor substrate including a circuit area; a metal interconnection layer including a metal interconnection and a an interlayer dielectric layer on the semiconductor substrate; a first conductive-type pattern on the metal interconnection layer; an intrinsic layer pattern having a dome-like shape on the first conductive-type pattern; and a second conductive-type conductive layer on the metal interconnection layer including the intrinsic layer pattern.09-25-2008
20130140570THIN FILM TRANSISTOR ARRAY PANEL - A thin film transistor array panel includes an insulation substrate; a gate line on the insulation substrate; a gate insulating layer on the gate line; a data line on the gate insulating layer; a first insulating layer on the data line and including a first contact hole which exposes a portion of the data line; a first connection assistant member in the first contact hole; and further including a first field generating electrode on the first insulating layer. The first field generating electrode is in connection with the exposed portion of the data line through the first connection assistant member.06-06-2013
20130140571ARRAY SUBSTRATE FOR FLAT DISPLAY DEVICE AND MANUFACTURING THE SAME - In one embodiment, an array substrate for a flat display device includes a gate line extending in a first direction, a source line extending a in second direction orthogonally crossing the first direction. A switching element includes a semiconductor layer, a gate electrode electrically connected with the gate line, a source electrode electrically connected with the gate line in contact with the semiconductor layer and a drain electrode in contact with the semiconductor layer. An insulating film covers the source line and the switching element, and includes a contact hole exposing the drain electrode. A pixel electrode is formed on the insulating film. An insulating filling component is filled in the contact hole of the insulating film so as to be interposed between the drain electrode and the pixel electrode in a pixel in which the source line is short-circuited with the drain electrode.06-06-2013
20130140572ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - An array substrate having a wiring of a pad region formed without an insulating film or without an insulating film and an organic film to reduce abnormal operations due to an increase in resistance caused by a contact margin at a high temperature, and a method for manufacturing the same are provided. The array substrate includes: an insulating substrate including a pad region and a thin film transistor (TFT) formation region; a first electrode layer formed in the pad region of the substrate; and a second electrode formed on the first electrode layer in an overlapping manner.06-06-2013
20130140573MANUFACTURING METHOD FOR CRYSTALLINE SEMICONDUCTOR FILM, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE - An object is to form a crystalline semiconductor film including a plurality of semiconductor regions with different average grain sizes by a simple manufacturing process.06-06-2013
20130140574THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME AND ELECTRONIC DEVICE - Embodiments of the present invention disclose a thin film transistor array substrate and a method for manufacturing the same and an electronic device. The method for manufacturing the thin film transistor array substrate comprises: a first patterning process, in which a pattern of an active layer which is formed by a semiconductor layer and patterns of a source electrode and a drain electrode, which are separated from each other and are formed by a first metal layer, are formed on a transparent substrate; a second patterning process, in which a pattern of an insulating layer is formed on the transparent substrate subjected to the first patterning process, the pattern of the insulating layer comprising a contact via hole exposing the source electrode; and a third patterning process, in which a pattern of a pixel electrode, which is formed by a transparent conductive layer, and a pattern of a gate electrode, which is formed by a second metal layer, are formed on the transparent substrate subjected to the second patterning process, the pixel electrode being connected to the source electrode through the contact via hole.06-06-2013
20080224144FABRICATION METHOD OF PIXEL STRUCTURE AND THIN FILM TRANSISTOR - A method of fabricating a thin film transistor is disclosed. First, a substrate is provided and a patterned polysilicon layer is formed on the substrate. A metal layer is formed on the patterned polysilicon layer. Then, a portion of the metal layer is removed so that the remaining metal layer beside the patterned polysilicon layer forms a source and a drain. A gate insulation layer is formed on the substrate to cover the source, the drain and the patterned polysilicon layer. A gate is formed on the gate insulation layer over the patterned polysilicon layer.09-18-2008
20080224143THIN FILM TRANSISTOR, ORGANIC LIGHT EMITTING DIODE DISPLAY DEVICE HAVING THE SAME, FLAT PANEL DISPLAY DEVICE, AND SEMICONDUCTOR DEVICE, AND METHODS OF FABRICATING THE SAME - A thin film transistor and a method of fabricating the same include: a semiconductor layer having a grain boundary disposed in a crystal growth direction and having a variation in height of a top surface of 15 nm or less formed by a thin beam directional crystallization method. Also, an organic light emitting diode (OLED) display device comprising the thin film transistor is provided and has excellent characteristics fabricated by a simple process. Also, a flat panel display device and a method of fabricating the same are provided and include: a polycrystalline silicon layer in a pixel region; and a polycrystalline silicon layer in a peripheral region formed by the thin beam directional crystallization method. Also, a semiconductor device and a method of fabricating the same include: an intrinsic region of a semiconductor layer in the photodiode region formed by the thin beam directional crystallization method.09-18-2008
20080224142Semiconductor Structure of Liquid Crystal Display and Manufacturing Method Thereof - A semiconductor structure of a liquid crystal display and the manufacturing method thereof are described. The manufacturing method includes the following steps. A patterned polysilicon layer and a first dielectric layer are formed on a substrate. A first patterned metal layer is formed to construct a gate electrode and a capacitor electrode. An ion implantation is conducted on the polysilicon layer to form drain and source electrodes. A second dielectric layer and a second patterned metal layer are formed thereon. Sequentially, a third dielectric layer is formed thereon. A plurality of via openings are formed by a patterned photoresist layer, and a third metal layer is formed thereon and filled into the via openings. The patterned photoresist layer and the redundant third metal layer are stripped from the substrate to form via plugs in the via openings. A patterned transparent conductive layer is formed thereon to connect the via plugs.09-18-2008
20080224141LIQUID CRYSTAL DISPLAY AND FABRICATION METHOD THEREOF - A method for fabricating an LCD includes: providing a substrate with a thin film transistor (ITT) part defined thereon; forming a metallic film for a gate electrode on the substrate; etching the metallic film through a first printing process to form a gate electrode; sequentially forming a gate insulating layer, a semiconductor layer, and a metallic film for source and drain electrodes on the substrate; selectively etching the metallic film for source and drain electrodes, the semiconductor layer and the gate insulating layer through a second printing process to form a gate insulating layer pattern, a preliminary active pattern and a metallic film pattern which are sequentially stacked such that the gate insulating layer pattern is over-etched from the side of the preliminary active pattern; forming an insulating layer on the substrate with the metallic film pattern; etching the insulating layer to expose the metallic film pattern; forming a transparent conductive film on the metallic film pattern and a remaining insulating film; and selectively etching the transparent conductive film, the metallic film pattern, the preliminary active pattern to form an active pattern, a source electrode, a drain electrode, and a pixel electrode connected with the drain electrode.09-18-2008
20130168681FLEXIBLE SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING THE SAME, IMAGE DISPLAY DEVICE USING THE SAME AND METHOD FOR MANUFACTURING THE IMAGE DISPLAY DEVICE - There is provided a method for manufacturing a flexible semiconductor device. The method of the flexible semiconductor device according to the present invention comprises the steps of: (i) forming an insulating layer on one of principal surfaces of a metal foil; (ii) forming a semiconductor layer on the insulating layer, and then forming source and drain electrodes so that the source and drain electrodes contact with the semiconductor layer; (iii) forming a flexible film layer so that the flexible film layer covers the semiconductor layer and the source and drain electrodes; (iv) forming vias in the flexible film layer, and thereby a semiconductor device precursor is provided; and (v) subjecting the metal foil to a processing treatment, and thereby forming a gate electrode from the metal foil, wherein, in the step (v) of the processing treatment of the metal foil, the gate electrode is formed in a predetermined position by using at least one of the vias of the semiconductor device precursor as an alignment marker.07-04-2013
20090302318METHOD FOR FABRICATING A PIXEL STRUCTURE AND THE PIXEL STRUCTURE - A transparent conductive layer and a first conductive layer are formed. A first photoresist layer having a first part and a second part with different thicknesses is as a mask to remove a portion of the first conductive layers to form a composite gate, and expose the transparent conductive layer of the pixel transmissive area and a portion of the transparent conductive layer in the pixel reflective area. The first photoresist layer is removed. A gate insulating layer and a semiconductor layer are formed. A second photoresist layer having a third part and a fourth part with different thicknesses is taken as a mask to remove a portion of the semiconductor layer and the gate insulating layer to form a contact opening and a channel layer. The second photoresist layer is removed. A patterned second conductive layer comprising a drain, a source and a reflective pattern is formed.12-10-2009
20130181222THIN FILM TRANSISTOR ARRAY BASEPLATE - An embodiment of the present invention provides a TFT array substrate comprising: a base substrate (07-18-2013
20080217621ACTIVE DEVICE ARRAY SUBSTRATE - A method of fabricating an active device array substrate is provided. A substrate having scan lines, data lines and active devices formed thereon is provided. Each of the active devices is electrically connected to the corresponding scan line and data line. An organic material layer is formed over the substrate to cover the scan lines, the data lines and the active devices. Then, a plasma treatment is performed to the surface of the organic material layer to form a number of concave patterns. The dimension of each of the concave patterns is smaller than one micrometer. Afterward, pixel electrodes are formed on the organic material layer and each of the pixel electrodes is electrically connected to one of the corresponding active devices.09-11-2008
20080217619THIN FILM TRANSISTOR AND DISPLAY DEVICE - The fully depleted thin film transistor (TFT) formed on a semiconductor film (09-11-2008
20080217617Thin Film Transistor, Wiring Board and Methods of Manufacturing the Same - A gate electrode or a gate wiring of a thin-film transistor has a four-layer structure including an adhesive base layer, a catalyst layer, a wiring metal layer, and a wiring metal anti-diffusion layer which are laminated in this order. With this structure, adhesion and flatness are improved. In this case, the adhesive base layer is formed by a resin having a structure capable of coordinating to a metal. Hence, adhesion with an insulating substrate can be improved. Further, the wiring metal anti-diffusion layer is formed on the wiring metal layer, so that diffusion of a wiring metal can be inhibited. Thus, characteristics of the thin-film transistor can be improved.09-11-2008
20120248446AMORPHOUS OXIDE THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, AND DISPLAY PANEL - Embodiments of the disclosed technology provide an amorphous oxide thin film transistor (TFT), a method for preparing an amorphous oxide TFT, and a display panel. The amorphous oxide thin film transistor includes: a gate electrode, a gate insulating layer, a semiconductor active layer, a source electrode and a drain electrode. The semiconductor active layer comprises a channel layer and an ohmic contact layer, and the channel layer has a greater content of oxygen than the ohmic contact layer; the channel layer contacts the gate insulating layer, and the ohmic contact layer comprises two separated ohmic contact regions, one of which contacts the source electrode and the other of which contacts the drain electrode.10-04-2012
20120248445AMORPHOUS MULTICOMPONENT DIELECTRIC BASED ON THE MIXTURE OF HIGH BAND GAP AND HIGH K MATERIALS, RESPECTIVE DEVICES AND MANUFACTURE - High performance thin-film, transistors are entirely processed at temperatures not exceeding 150° C., using amorphous multi component dielectrics based on the mixture of high band gap and high dielectric constant (K) materials. The sputtered or ink jet printed mixed dielectric materials such as Ta10-04-2012
20130134428ACTIVE DEVICE ARRAY SUBSTRATE - A repair method for repairing an active device array substrate is provided. The active device array substrate includes a substrate, scan lines, data lines, active devices, pixel electrodes, and common lines. At least one of the scan line has an open defect. The scan lines and the data lines are intersected to define sub-pixel regions. The active devices are electrically connected with the scan lines and the data lines correspondingly. Each pixel electrode is disposed in one of the sub-pixel regions and electrically connected with one of the active devices. The repair method includes cutting one of the common lines neighboring to the open defect to form a cutting block that is electrically insulated from the common lines; and welding the cutting block, the scan line having the open defect and two active devices located at two opposite sides of the open defect.05-30-2013
20130134423ORGANIC LIGHT-EMITTING DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A method of manufacturing an organic light-emitting display device is disclosed. The method includes: uniformly forming an active layer on an entire surface of a substrate on which an organic light-emitting diode, a thin film transistor (TFT), and a capacitor are to be formed; performing a first mask process on the active layer to form a pixel electrode of the organic light-emitting diode, a gate electrode of the TFT, and an upper electrode of the capacitor; performing a second mask process to form an insulating layer having openings that expose the pixel electrode, the upper electrode, and the active layer in a region of the TFT; performing a third mask process to form a source-drain electrode that contacts an exposed portion of the active layer; and performing a fourth mask process to form a pixel-defining layer (PDL) that exposes the pixel electrode and covers the TFT and the capacitor.05-30-2013
20130175532PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A method for manufacturing a pixel structure is provided. A thin film transistor is formed on a substrate and an insulating layer is formed to cover the substrate and the thin film transistor. The insulating layer is patterned by a half-tone mask to form a protruding pattern, a sunken pattern connecting the protruding pattern, and a contact window inside the sunken pattern. A transparent conductive layer is formed to cover the protruding pattern and the sunken pattern, and filled in the contact window. A passivation layer is formed to cover the transparent conductive layer. A pixel electrode pattern is formed from the transparent conductive layer by removing a part of the passivation layer located on the protruding pattern, a part of the transparent conductive layer on the protruding pattern, and a part of the passivation layer located within the contact window. A pixel structure manufactured by the method is provided.07-11-2013
20130092946TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - The present invention provides a TFT-LCD array substrate having a gate-line metal layer, a data-line metal layer crossing the gate-line metal layer and a plurality of layers covering a periphery of the gate-line metal layer and the data-line metal layer; the gate-line metal layer has first gate lines and second gate lines parallel and alternately arranged, the date-line metal layer has first data lines and second data lines parallel and alternately arranged; the first gate line and the second gate line are electrically connected; the first data line and the second data line are electrically connected. The present invention further provides a manufacturing method of the TFT-LCD array substrate. Implementing the TFT-LCD array substrate and the manufacturing method can reduce the occurrence of line-broken in the active array of TFT-LCD, increase the aperture ratio of the product and enhance yield rate of the products.04-18-2013
20130099241ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate includes first and second lines on a substrate and formed of a metallic material; a gate electrode connected to the first line; a gate insulating layer on the first and second lines and the gate electrode and including a groove exposing the substrate and positioned between the first and second lines; a semiconductor layer on the gate insulating layer and corresponding to the gate electrode; a data line crossing the first and second lines and on the gate insulating layer; a source electrode connected to the data line; a drain electrode spaced apart from the source electrode; a passivation layer on the data line, the source electrode and the drain electrode and including an opening, the opening exposing the gate insulating layer and the drain electrode; and a pixel electrode positioned on the gate insulating layer and in the opening and contacting the drain electrode.04-25-2013
20130099240THIN FILM TRANSISTOR, THIN FILM TRANSISTOR PANEL, AND METHOD FOR MANUFACTURING THE SAME - A Thin Film Transistor (TFT) includes a substrate, a semiconductor layer disposed on the substrate a first source electrode and a first drain electrode spaced apart from each other on the semiconductor layer, a channel area disposed in the semiconductor layer between the first source electrode and the first drain electrode, an etching prevention layer disposed on the channel area, the first source electrode, and the first drain electrode and a second source electrode in contact with the first source electrode, and a second drain electrode in contact with the first drain electrode.04-25-2013
20130099239DISPLAY DEVICE - The invention prevents disconnection of data lines that traverse two-layered gate lines via an insulating film.04-25-2013
20130099238LIQUID CRYSTAL DISPLAY HAVING A HIGH APERTURE RATIO - A (liquid crystal display) LCD includes a pixel array and a gate driving circuit. The pixel array includes a plurality of first oxide thin film transistors, a first oxide thin film transistor of the first oxide thin film transistors with a shortest channel length having a first channel length. The gate driving circuit is coupled to the pixel array for driving the pixel array, and includes a plurality of second oxide thin film transistors. The second oxide thin film of the second oxide thin film transistors with a longest channel length has a second channel length. A ratio of the second channel length and the first channel length is greater than 1.5. By limiting the ratio of the second channel length and the first channel length, the aperture ratio of the display panel can be improved without deteriorating the operation stability of the LCD.04-25-2013
20130099242DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate having a low resistance signal line and a method of manufacturing the display substrate are provided. The display substrate includes an insulation substrate, a gate line, a data line and a pixel electrode. The gate line gate line is formed through a sub-trench and an opening portion. The sub-trench is formed in the insulation substrate and the opening portion is formed through a planarization layer on the insulation substrate at a position corresponding to the position of the sub-trench. The data line crosses the gate line. The pixel electrode is electrically connected to the gate line and the data line through a switching element. Thus, a signal line is formed through a trench formed by using a planarization layer and an insulation substrate, so that a resistance of the signal line may be reduced.04-25-2013
20130112981Semiconductor Device, and Method of Forming the Same - In order to realize a semiconductor device of enhanced TFT characteristics, a semiconductor thin film is selectively irradiated with a laser beam at the step of crystallizing the semiconductor thin film by the irradiation with the laser beam. By way of example, only driver regions (05-09-2013
20130112980LIGHT-EMITTING DEVICE AND METHOD OF MANUFACTURING THE SAME - To provide a bright and highly reliable light-emitting device. An anode (05-09-2013
20130112979FRINGE FIELD SWITCHING LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - A fringe field switching (FFS) liquid crystal display (LCD) device which uses an organic insulating layer and consumes less power, in which film quality of an upper layer of a low temperature protective film is changed to improve undercut within a pad portion contact hole, and a method for fabricating the same is provided.05-09-2013
20130112978WIRING STRUCTURE, THIN FILM TRANSISTOR ARRAY SUBSTRATE INCLUDING THE SAME, AND DISPLAY DEVICE - On each of wiring conversion parts connected to a first conductive film and a second conductive film each functioning as a wiring, a first transparent conductive film does not cover an end surface of the second conductive film in proximity to a corner of the first transparent conductive film, and has a portion covering the end surface of the second conductive film on a portion other than the proximity of the corners. A second transparent conductive film as an upper layer of the first transparent conductive film is connected to the first conductive film and the second conductive film, so that the first conductive film and the second conductive film are electrically connected.05-09-2013
20130112977PIXEL STRUCTURE, ARRAY SUBSTRATE AND METHOD OF FABRICATING THE SAME - The present invention provides a pixel structure including a substrate, a first metal pattern layer, an insulating layer, a second metal pattern layer, a passivation layer, and a conductive protection layer. The substrate has at least one pixel region. The first patterned metal layer is disposed on the substrate, and has a top surface. The insulating layer is disposed on the first patterned metal layer and the substrate, and is in contact with the top surface of the first patterned metal layer. The second patterned metal layer is disposed on the insulating layer in the pixel region, and includes a source and a drain. The passivation layer is disposed on the second patterned metal layer and the insulating layer. A top surface of the source is in contact with the passivation layer, and the conductive protection layer is disposed on the drain.05-09-2013
20130112976THIN-FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor array substrate is disclosed. In one embodiment, the substrate includes: i) a thin-film transistor including an active layer, and gate, source and drain electrodes, ii) a lower electrode of a capacitor, iii) an upper electrode of the capacitor formed on the lower electrode iv) a first insulation layer between the lower and upper electrodes, and between the active layer and the gate electrode, and having a gap outside the lower electrode. The substrate may further include i) a second insulation layer formed on the first insulation layer and having the same etching surface as the first insulation layer in the gap, ii) a bridge formed of the same material as the source and drain electrodes, and filling a part of the gap and iii) a third insulation layer covering the source and drain electrodes and exposing a pixel electrode.05-09-2013
20130112975THIN-FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT EMITTING DISPLAY DEVICE INCLUDING THE SAME, AND METHOD OF MANUFACTURING THE SAME - A TFT array substrate including: a thin-film transistor including an active layer, gate, source and drain electrodes, a first insulation layer between the active layer and the gate electrode, and a second insulation layer between the gate and the source and drain electrodes; a pixel electrode on the first and second insulation layers, and connected to one of the source and drain electrodes; a capacitor including a first electrode on the same layer as the gate electrode, a second electrode formed of the same material as the pixel electrode, a first protection layer on the second electrode, and a second protection layer on the first protection layer; a third insulation layer between the second insulation layer and the pixel electrode, and between the first electrode and the second electrode; and a fourth insulation layer covering the source and drain electrodes and the second protection layer, and exposing the pixel electrode.05-09-2013
20130126870Thin Film Transistor, Array Substrate, Device and Manufacturing Method - The present invention discloses a TFT, an array substrate, a device and a manufacturing method. The TFT comprises a conductive metal layer; an insulting oxidizing layer is formed on the surface of the metal layer. In the present invention, because the oxidation treatment is conducted on the surface of the metal layer, the insulating oxidizing layer is formed and can substitute for the silicon nitride as a TFT barrier layer; compared with the preparation of a silicon nitride barrier layer needing the drilling crew and the material cost, the preparation of the oxidizing layer needs cheap equipment without increasing further materials so that the cost is saved; in addition, the oxidizing layer only exists on the surface of the metal layer, and has small obstruction for light and low requirement for the penetration rate; thus, the process control is relatively simple and the cost can be further reduced.05-23-2013
20130134426COMPOSITION OF ORGANIC INSULATING LAYER AND THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE USING THE SAME - Discussed is a composition of an organic insulating layer comprising a photosensitizer, a binder, an additive and a solvent, wherein the photosensitizer includes a photoacid generator (PAG), and a thin film transistor substrate and display device using the same, wherein the composition of the present invention enables to realize a simplified process by omitting an additional entire-surface exposing process for a color change, and a baking process after an exposing process; and to minimize a problem of color-coordinates shift by realizing a good light transmittance.05-30-2013
20130140575DISPLAY APPARATUS AND METHOD OF LAYING OUT PIXEL CIRCUITS - Herein disclosed a display apparatus including: a pixel array having a matrix of pixel circuits each including respective electrooptical elements for determining a display brightness level and respective drive circuits for driving the electrooptical elements; wherein adjacent two of the pixel circuits are paired with each other, and each of the drive circuits of the adjacent two pixel circuits includes at least one transistor having a low-concentration source/drain region or an offset region of an offset gate structure, the electrooptical elements and the drive circuits of the adjacent two pixel circuits being laid out such that a line interconnecting a drain region and a source region of the at least one transistor extends parallel to a direction of pixel columns of the pixel circuits of the pixel array.06-06-2013
20130175533Substrate Including Thin Film Transistors and Organic Light Emitting Display Apparatus Including the Substrate - A substrate includes a thin film transistor (TFT) which includes an active layer, a gate electrode, a source electrode, and a drain electrode; a first insulating layer disposed between the active layer and the gate electrode; a second insulating layer disposed between the gate electrode and the source and drain electrodes; a third insulating layer disposed on the second insulating layer, and including a first region for opening the second insulating layer and a second region for opening one of the source and drain electrodes, the first region and the second region being integrally connected; and a first electrode connected to one of the source and drain electrodes, and disposed so as to cover the first region and the second region.07-11-2013
20130175531PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A pixel structure includes a substrate, a gate line, a data line, a semiconductor pattern, a non-metal source electrode pattern, a non-metal drain electrode pattern, and a pixel electrode. The gate line and the data line are disposed on the substrate. The semiconductor pattern is disposed on the gate line, and the semiconductor pattern overlaps two corresponding edges of the gate line along a vertical projective direction. The non-metal source electrode pattern and the non-metal drain electrode pattern are disposed on the semiconductor pattern. The non-metal source electrode pattern and the non-metal drain electrode pattern are respectively disposed on two corresponding edges of the gate line. The non-metal source electrode pattern is partially disposed between the data line and the gate line. The pixel electrode is electrically connected to the non-metal drain electrode pattern.07-11-2013
20110215328THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR, AND DISPLAY DEVICE - There is provided a thin film transistor, which has a uniform and good electric characteristic and has a simple configuration allowing decrease in number of manufacturing steps, and a method of manufacturing the thin film transistor, and a display device having the thin film transistor. The thin film transistor includes: a gate electrode; an oxide semiconductor film having a multilayer structure of an amorphous film and a crystallized film; and a source electrode and a drain electrode provided to contact the crystallized film.09-08-2011
20130146876THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a thin film transistor array substrate includes the following two steps: depositing a first metal layer on a substrate; and processing the first metal layer through coating photoresist, exposing, developing, etching, and stripping photoresist processes to form a light blocking metal portion and a lower electrode of a first storage capacitor simultaneously. With the manufacturing method of the present disclosure, the light blocking metal portion can protect components of TFTs from being exposed to strong light during the manufacturing process, which can improve a stability of the TFT.06-13-2013
20130146877ORGANIC LIGHT-EMITTING DISPLAY APPARATUS - An organic light-emitting display apparatus including: a substrate; a first electrode on the substrate; a second electrode on the first electrode; an intermediate layer between the first electrode and the second electrode, the intermediate layer being electrically connected with the first electrode and the second electrode, and including an organic emission layer; and a light reflection member overlapping a portion of the intermediate layer, the portion of the intermediate layer being less than an entire region of the intermediate layer.06-13-2013
20130146878ORGANIC LIGHT-EMITTING DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display apparatus includes a buffer layer that is on a substrate and includes nanoparticles including nickel (Ni), a pixel electrode on the buffer layer, an organic emission layer on the pixel electrode, and an opposite electrode on the organic emission layer. A method of manufacturing the organic light-emitting display apparatus is provided.06-13-2013
20130146879SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME - Disclosed is a semiconductor device in which an n-channel type first thin film transistor and a p-channel type second thin film transistor are provided on the same substrate. The first thin film transistor has a first semiconductor layer (06-13-2013
20130146880TFT-LCD ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor liquid crystal display (TFT-LCD) array substrate and a manufacturing method thereof are provided. The TFT-LCD array substrate comprises a gate line and a data line. A pixel electrode and a thin film transistor (TFT) are formed in a pixel region defined by intersecting of the gate line and the data line. A light-blocking layer is formed over a TFT channel region of the thin film transistor.06-13-2013
20130146881AREA SENSOR AND DISPLAY APPARATUS PROVIDED WITH AN AREA SENSOR - An area sensor of the present invention has a function of displaying an image in a sensor portion by using light-emitting elements and a reading function using photoelectric conversion devices. Therefore, an image read in the sensor portion can be displayed thereon without separately providing an electronic display on the area sensor. Furthermore, a photoelectric conversion layer of a photodiode according to the present invention is made of an amorphous silicon film and an N-type semiconductor layer and a P-type semiconductor layer are made of a polycrystalline silicon film. The amorphous silicon film is formed to be thicker than the polycrystalline silicon film. As a result, the photodiode according to the present invention can receive more light.06-13-2013
20130146882SEMICONDUCTOR DEVICE AND ELECTRONIC DEVICE - An object is to improve the drive capability of a semiconductor device. The semiconductor device includes a first transistor and a second transistor. A first terminal of the first transistor is electrically connected to a first wiring. A second terminal of the first transistor is electrically connected to a second wiring. A gate of the second transistor is electrically connected to a third wiring. A first terminal of the second transistor is electrically connected to the third wiring. A second terminal of the second transistor is electrically connected to a gate of the first transistor. A channel region is formed using an oxide semiconductor layer in each of the first transistor and the second transistor. The off-state current of each of the first transistor and the second transistor per channel width of 1 μm is 1 aA or less.06-13-2013
20110210336Semiconductor Device and Fabrication Method Thereof - For forming a gate electrode, a conductive film with low resistance including Al or a material containing Al as its main component and a conductive film with low contact resistance for preventing diffusion of Al into a semiconductor layer are laminated, and the gate electrode is fabricated by using an apparatus which is capable of performing etching treatment at high speed.09-01-2011
20110210335Display Device and Method for Manufacturing the Same - An object of the present invention is to decrease substantial resistance of an electrode such as a transparent electrode or a wiring, and furthermore, to provide a display device for which is possible to apply same voltage to light-emitting elements. In the invention, a auxiliary wiring that is formed in one layer in which a conductive film of a semiconductor element such as an electrode, wiring, a signal line, a scanning line, or a power supply line is connected to an electrode typified by a second electrode, and a wiring. It is preferable that the auxiliary wiring is formed into a conductive film to include low resistive material, especially, formed to include lower resistive material than the resistance of an electrode and a wiring that is required to reduce the resistance.09-01-2011
20080197355ELECTRO-OPTICAL DEVICE SUBSTRATE, METHOD OF MANUFACTURING THE SAME, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS - An electro-optical device that includes a transistor and an insulating film over the semiconductor layer of the transistor. The insulating film has an opening portion that overlaps the channel region. The gate electrode of the transistor includes a body portion arranged in the opening portion of the insulating film and an elongated portion that extends onto the insulating film so as to cover the second junction portion of the transistor. The second junction region is located in an intersection region of a non-aperture region of the display pixel.08-21-2008
20080197354THIN FILM TRANSISTOR, AN ORGANIC LIGHT EMITTING DEVICE INCLUDING THE SAME, AND A MANUFACTURING METHOD THEREOF - A thin film transistor includes first and second ohmic contacts formed on a substrate, wherein each of the first and second ohmic contacts includes polycrystalline silicon; a semiconductor formed on the first and second ohmic contacts and the substrate, the semiconductor including microcrystalline silicon; a blocking member formed on the semiconductor; an input electrode formed on the first ohmic contact; an output electrode formed on the second ohmic contact; an insulating layer formed on the blocking member, the input electrode, and the output electrode; and a control electrode formed on the insulating layer and disposed on the semiconductor.08-21-2008
20110220898ORGANIC LIGHT EMITTING DIODE DISPLAY AND MANUFACTURING METHOD THEREOF - An organic light emitting diode (OLED) display that includes a substrate, a thin film transistor, and a pixel electrode. The thin film transistor is formed on the substrate and includes a semiconductor layer, a gate electrode, a source electrode, and a drain electrode. The pixel electrode is electrically connected to the thin film transistor and is formed on the same layer as the source electrode and the drain electrode. The source electrode and the drain electrode include a first conductive layer, and the pixel electrode includes a first conductive layer and a second conductive layer stacked thereon.09-15-2011
20110220896TRANSISTOR, DISPLAY DEVICE, ELECTRONIC DEVICE, MANUFACTURING METHOD OF TRANSISTOR, AND MANUFACTURING METHOD OF DISPLAY DEVICE - An electric-field blocking film is provided between a BL insulation film and BL insulation film of a transistor, and a blocking film includes those three layers. The electric-field blocking film blocks an electric field produced by a drain electrode, a source electrode, and an n09-15-2011
20110227081PIXEL CIRCUIT SUBSTRATE, DISPLAY DEVICE, ELECTRONIC EQUIPMENT, AND METHOD FOR MANUFACTURING PIXEL CIRCUIT SUBSTRATE - A pixel circuit substrate includes: a pixel electrode; a first drive element connected to one side of the pixel electrode; a second drive element that is connected to the first drive element in parallel and also is connected to the other side opposite to the one side of the pixel electrode.09-22-2011
20110240999DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - A display device and a method of manufacturing the same. In one embodiment, a display device includes a substrate having a pixel region, a transistor region and a capacitor region, a transistor arranged within the transistor region of the substrate and a capacitor arranged within the capacitor region of the substrate, wherein the capacitor includes a lower electrode arranged on the substrate, a gate insulating layer arranged on the lower electrode and an upper electrode arranged on the gate insulating layer and overlapping the lower electrode, the upper electrode includes a first conductive layer and a second conductive layer arranged on the first conductive layer, wherein the first conductive layer is opaque.10-06-2011
20110248273ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL PANEL, LIQUID CRYSTAL DISPLAY UNIT, LIQUID CRYSTAL DISPLAY DEVICE, AND TELEVISION RECEIVER - In each pixel region, (i) a first pixel electrode (10-13-2011
20110248271THIN FILM TRANSISTOR AND DISPLAY DEVICE HAVING THE SAME - The described technology relates generally to a thin film transistor comprising a gate electrode, a semiconductor layer and source/drain electrode, wherein the source/drain electrode is disposed in a range of a region in which the semiconductor layer is formed. Therefore, the present embodiments can provide a thin film transistor in which reliability is excellent because a change amount of threshold voltage is small.10-13-2011
20130126879SEMICONDUCTOR DEVICE, DRIVING METHOD THEREOF AND ELECTRONIC DEVICE - The invention provides a semiconductor device having a current input type pixel in which a signal write speed is increased and an effect of variations between adjacent transistors is reduced. When a set operation is performed (write a signal), a source-drain voltage of one of two transistors connected in series becomes quite low, thus the set operation is performed to the other transistor. In an output operation, the two transistors operate as a multi-gate transistor, therefore, a current value in the output operation can be small. In other words, a current in the set operation can be large. Therefore, an effect of intersection capacitance and wiring resistance which are parasitic on a wiring and the like do not affect much, thereby the set operation can be performed rapidly. As one transistor is used in the set operation and the output operation, an effect of variations between adjacent transistors is lessened.05-23-2013
20130126878DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - With an increase in the definition of a display device, the number of pixels is increased, and thus the numbers of gate lines and signal lines are increased. The increase in the numbers of gate lines and signal lines makes it difficult to mount an IC chip having a driver circuit for driving the gate line and the signal line by bonding or the like, which causes an increase in manufacturing costs. A pixel portion and a driver circuit driving the pixel portion are provided over the same substrate. The pixel portion and at least a part of the driver circuit are formed using thin film transistors in each of which an oxide semiconductor is used. Both the pixel portion and the driver circuit are provided over the same substrate, whereby manufacturing costs are reduced.05-23-2013
20130126877DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME - It is an object of the present invention to provide a method for manufacturing a display device in which unevenness generated under a light-emitting element does not impart an adverse effect on the light-emitting element. It is another object of the invention to provide a method for manufacturing a display device in which penetration of water into the inside of the display device through a film having high moisture permeability can be suppressed without increasing processing steps considerably. A display device of the present invention comprises a thin film transistor and a light-emitting element, the light-emitting element including a light-emitting laminated body interposed between a first electrode and a second electrode; wherein the first electrode is formed over an insulating film formed over the thin film transistor; and wherein a planarizing film is formed in response to the first electrode between the first electrode and the insulating film.05-23-2013
20130126874ORGANIC LIGHT EMITTING DIODE DISPLAY AND MANUFACTURING METHOD THEREOF - An organic light emitting diode (OLED) display comprises: a thin film transistor substrate including an organic light emitting element; and a sealing substrate attached to the thin film transistor substrate, thereby sealing the thin film transistor substrate. The sealing substrate has a folding portion enclosing a side surface and a bottom surface of an edge portion of the thin film transistor substrate.05-23-2013
20130126876ARRAY SUBSTRATE FOR FRINGE FIELD SWITCHING MODE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD FOR FABRICATING THE SAME - The present invention relates to an array substrate for a fringe field switching (FFS) mode liquid crystal display device and a method for fabricating the same. The liquid crystal display device may include a gate line formed on the substrate; a data line crossed with the gate line to define a pixel region; a thin-film transistor (TFT) formed at an intersection of the gate and data line; an organic insulating layer formed to have an opening portion for exposing the TFT; a common electrode having an area formed at an upper portion of the organic insulating layer, and an auxiliary electrode pattern connected to the TFT through the opening portion; a passivation layer formed to expose the auxiliary electrode pattern connected to the TFT; and pixel electrodes electrically connected to the TFT through the exposed auxiliary electrode pattern.05-23-2013
20130126875LIQUID CRYSTAL DISPLAY DEVICE - The liquid crystal display device includes a TFT substrate on which TFT patterns each having a scanning signal line, a data signal line, and a pixel electrode are formed, a color filter substrate arranged to face the TFT substrate, and columnar spacers formed on a surface of the color filter substrate facing the TFT substrate, in which at least a part of the TFT patterns includes a seat that is formed over the scanning signal line or below the pixel electrode, and directly or indirectly supports one of the columnar spacers, and in which an area in which the seat provided in the TFT pattern formed in a center portion of the TFT substrate supports the columnar spacer is larger than an area in which the seat provided in the TFT pattern formed outside of the center portion of the TFT substrate supports the columnar spacer.05-23-2013
20130126873Thin Film Transistor, Fabrication Method Thereof, and Organic Light Emitting Diode Display Having the Same - A thin film transistor (TFT) comprises; an active layer formed on a substrate; a gate insulating layer formed on the active layer; a gate electrode including a first gate region and a second gate region, formed on portions of the gate insulating layer and spaced apart with a separation region interposed therebetween; an interlayer insulating layer formed on the gate insulating layer and the gate electrode, and having an opening formed to expose portions of the gate insulating layer and the gate electrode around the separation region; a gate connection electrode formed on the interlayer insulating layer and connected to the first gate region and the second gate region through the opening; and source and drain electrodes formed on the interlayer insulating layer. The TFT and the OLED display device have excellent driving margin without a spatial loss.05-23-2013
20130126872ORGANIC LIGHT-EMITTING DISPLAY APPARATUS - An organic light-emitting display includes a substrate, a first electrode on the substrate, an intermediate layer on the first electrode, and including an organic light-emitting layer, a second electrode on the intermediate layer, and a reflective member on sides of the intermediate layer to reflect visible light generated by the intermediate layer, the reflective member contacting the second electrode.05-23-2013
20130126871PIXEL STRUCTURE AND MANUFACTURING METHOD THEREOF - A pixel structure includes a first electrode on a substrate, a first insulation layer covering the first electrode, a gate located on the first insulation layer, a second electrode located on the first insulation layer above the first electrode, a second insulation layer covering the gate and the second electrode, a semiconductor layer located on the second insulation layer above the gate, a source and a drain that are located on the semiconductor layer, a third electrode, a third insulation layer, and a pixel electrode. The third electrode is located on the second insulation layer above the second electrode and electrically connected to the first electrode. The third insulation layer covers the source, the drain, and the third electrode. The pixel electrode is located on the third insulation layer and electrically connected to the drain.05-23-2013
20130153908PIXEL STRUCTURE OF ORGANIC LIGHT EMITTING DEVICE - A pixel structure including a first scan line, a second scan line, a data line and a power line substantially perpendicular to the first scan line and the second scan line, a reference signal line and an emission signal line substantially parallel with the first scan line and the second scan line, a common thin film transistor (C-TFT), a first pixel unit, and a second pixel unit is provided. The common thin film transistor has a common gate electrode, a common source electrode and a common drain electrode. The common gate electrode is electrically connected to the first scan line, the common drain electrode is electrically connected to the reference signal line. The first and the second pixel units respectively have a first TFT, a second TFT, a third TFT, a fourth TFT, a fifth TFT, a sixth TFT, a capacitor, and an emission device.06-20-2013
20130153909SEMICONDUCTOR DEVICE AND DRIVING METHOD THEREOF - A voltage equal to the threshold value of a TFT (06-20-2013
20130153910TRANSISTOR AND DISPLAY DEVICE - It is an object to manufacture a highly reliable display device using a thin film transistor having favorable electric characteristics and high reliability as a switching element. In a bottom gate thin film transistor including an amorphous oxide semiconductor, an oxide conductive layer having a crystal region is formed between an oxide semiconductor layer which has been dehydrated or dehydrogenated by heat treatment and each of a source electrode layer and a drain electrode layer which are formed using a metal material. Accordingly, contact resistance between the oxide semiconductor layer and each of the source electrode layer and the drain electrode layer can be reduced; thus, a thin film transistor having favorable electric characteristics and a highly reliable display device using the thin film transistor can be provided.06-20-2013
20100308332DISPLAY DEVICE - A display device is provided with a pair of a first electrode and a second electrode at least one of which is transparent or translucent and a phosphor layer formed so as to be sandwiched between the first electrode and the second electrode, and the phosphor layer has a polycrystal structure made of a first semiconductor substance in which a second semiconductor substance different from the first semiconductor substance is segregated on a grain boundary of the polycrystal structure, and the phosphor layer has a plurality of pixel regions that are selectively allowed to emit light in a predetermined range thereof and non-pixel regions that divide at least one portion of the pixel regions.12-09-2010
20100308331Mother thin film transistor array substrate and thin film transistor array substrate fabricated therefrom - A mother thin film transistor (TFT) array substrate includes an insulating substrate, at least two TFT arrays and printed wirings. The TFT array includes TFTs formed on the insulating substrate. The printed wirings are connected to the TFT arrays. The printed wiring includes a discontinuous metal layer and at least one bridge layer connecting the discontinuous metal layer. The bridge layer is made from corrosion-resistant material.12-09-2010
20130153905Flat Display Panel and Method for Forming the Same - The present invention proposes to a flat display panel and a method for forming the same. The flat display panel includes a plurality of rows of scan lines, a plurality of columns of data lines and a plurality of blocking lines which are parallel and overlapped to the data lines. The plurality of blocking lines are placed at one side of pixel electrodes one on one and made of the same metallic layer with the plurality of scan lines. Each blocking line made of the same metallic layer with the scan line is wider than a corresponding data line, so that light not blocked by the data line is blocked by the wider blocking line.06-20-2013
20120273788PRINTED ELECTRONIC DEVICE - This invention generally relates to a patterned substrate for an electronic device and to electronic devices, device arrays, field effect transistors and transistor arrays comprising the patterned substrate. The invention also relates to a logic circuit, display, memory or sensor device comprising the patterned substrate. Further the invention relates to a method of patterning a substrate for an electronic device. In an embodiment, a patterned substrate for an electronic device comprises: a first body having an edge; a second body comprising an elongate plurality of printed droplets having an edge adjacent to and substantially aligned to said first body edge; and a separation between said first body edge and said second body edge, wherein said elongate plurality of printed droplets is at an angle of about 5 degrees to about 90 degrees to said first body edge.11-01-2012
20120273787THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF - In a thin film transistor array panel according to an exemplary embodiment of the present invention, a plasma process using a mixed gas including hydrogen gas and nitrogen gas with a ratio of a predetermined value is undertaken before depositing a passivation layer. In this manner, performance deterioration of the thin film transistor may be prevented and simultaneously, haze in a transparent electrode may be prevented. Alternatively, a first passivation layer is depsoited, then removed. A passivation layer is again re-deposited, such that little or no haze is present in the resulting passivation layer.11-01-2012
20110233554SEMICONDUCTOR DEVICE, AND METHOD OF FABRICATING THE SAME - A multi-layered gate electrode of a crystalline TFT is constructed as a clad structure formed by deposition of a first gate electrode, a second gate electrode and a third gate electrode, to thereby to enhance the thermal resistance of the gate electrode. Additionally, an n-channel TFT is formed by selective doping to form a low-concentration impunty region which adjoins a channel forming region, and a sub-region overlapped by the gate electrode and a sub-region not overlapped by the gate electrode, to also mitigate a high electric field near the drain of the TFT and to simultaneously prevent the OFF current of the TFT from increasing.09-29-2011
20110233553DISPLAY DEVICE, METHOD FOR MANUFACTURING THE SAME, AND ELECTRONIC DEVICE HAVING THE SAME - In a case where a p-channel thin film transistor is used as a thin film transistor that is electrically connected to a light-emitting element and drives the light-emitting element, a value of cutoff current of the p-channel thin film transistor is made lower than that of a p-channel thin film transistor of a driver circuit. Specifically, channel doping is selectively performed on a semiconductor layer of a thin film transistor included in a pixel.09-29-2011
20110233552TFT BOARD FOR LIQUID CRYSTAL DISPLAY DEVICE AND MANUFACTURING METHOD FOR LIQUID CRYSTAL DISPLAY DEVICE - Provided is a TFT board for a liquid crystal display device including: a circuit layer formed on a substrate, the circuit layer including a thin film transistor including a semiconductor layer, a gate electrode, a drain electrode, and a source electrode; and a color filter layer formed on the circuit layer. The color filter layer has a through hole formed therein above the semiconductor layer in a region between the source electrode and the drain electrode.09-29-2011
20110233551THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF - A method of manufacturing a thin film transistor array panel is provided, which includes: forming a gate line on a substrate; forming a gate insulating layer on the gate line; forming a semiconductor layer on the gate insulating layer; forming an ohmic contact on the semiconductor layer; forming a data line and a drain electrode on the ohmic contact; depositing a passivation layer on the data line and the drain electrode; forming a first photoresist layer on the passivation layer; etching the passivation layer and the gate insulating layer using the first photoresist layer as a mask to expose a portion of the drain electrode and a portion of the substrate; depositing a conductive film; and removing the photoresist layer; to form a pixel electrode on a portion of the drain electrode exposed by the etching of the passivation layer.09-29-2011
20130187164THIN-FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, DISPLAY UNIT, AND ELECTRONIC APPARATUS - There are provided a thin-film transistor suppressing influence of light and having stable characteristics, and a method of manufacturing the thin-film transistor, as well as a display unit and an electronic apparatus. The thin-film transistor includes: a gate electrode; an oxide semiconductor film having a channel region that faces the gate electrode; and a protective film covering at least the channel region and containing an aluminum lower oxide (Al07-25-2013
20130187165Semiconductor Device, and Manufacturing Method Thereof - In a display device such as a liquid crystal display device, a large-sized display screen is realized under low power consumption. A surface of a source wiring line of a pixel portion employed in an active matrix type liquid crystal display device is processed by way of a plating process operation so as to lower a resistance value of this source wiring line. The source wiring line of the pixel portion is manufactured at a step different from a step for manufacturing a source wiring line of a drive circuit portion. Further, electrodes of a terminal portion are processed by a plating process operation so as to reduce a resistance value thereof.07-25-2013
20100314622PIXEL STRUCTURE AND METHOD OF MAKING THE SAME - A pixel structure uses a pixel electrode made of transparent conductive material to electrically connect a data line and a source electrode of a switching element of the adjacent sub-pixel region so that a plurality of sub-pixels can share the same data line. Consequently, the number of data lines can be reduced, and the aperture ratio (AR) can be improved.12-16-2010
20110254007THIN-FILM TRANSISTOR SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY APPARATUS HAVING THE SAME - In a thin-film transistor (TFT) substrate, a gate insulating layer is disposed on a gate electrode electrically connected to a gate line. A semiconductor layer is disposed on the gate insulating layer. A source electrode is electrically connected to a data line that intersects the gate line. A drain electrode faces the source electrode and defines a channel area of a semiconductor layer. An organic layer is disposed on the data line and has a first opening exposing the channel area. An inorganic insulating layer is disposed on the organic layer. A pixel electrode is disposed on the inorganic insulating layer and electrically connected to the drain electrode. The inorganic insulating layer covers the first opening, and thickness of the inorganic insulating layer is substantially uniform.10-20-2011
20110272697ARRAY SUBSTRATE FOR REFLECTIVE TYPE OR TRANSFLECTIVE TYPE LIQUID CRYSTAL DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a liquid crystal display device includes a substrate, a gate line and a data line on the substrate and crossing each other to define a pixel region, a thin film transistor connected to the gate line and the data line, a first passivation layer on the thin film transistor and having a first unevenness structure at its top surface, an auxiliary unevenness layer on the first passivation layer and having a first roughness structure at its top surface, and a reflector on the auxiliary unevenness layer, the reflector having a second unevenness structure due to the first unevenness structure of the first passivation layer and a second roughness structure due to the first roughness structure of the auxiliary unevenness layer, the second roughness structure having smaller patterns than the second unevenness structure.11-10-2011
20110272696THIN FILM TRANSISTOR PANEL AND FABRICATING METHOD THEREOF - A thin film transistor panel includes a substrate, a light blocking layer on the substrate, a first protective film on the light blocking layer, a first electrode and a second electrode on the first protective film, an oxide semiconductor layer on a portion of the first protective film exposed between the first electrode and the second electrode, an insulating layer, a third electrode overlapping with the oxide semiconductor layer and on the insulating layer, and a fourth electrode on the insulating layer. The light blocking layer includes first sidewalls, and the first protective film includes second sidewalls. The first and the second sidewalls are disposed along substantially the same line.11-10-2011
20110272699METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A gate electrode is formed by forming a first conductive layer containing aluminum as its main component over a substrate, forming a second conductive layer made from a material different from that used for forming the first conductive layer over the first conductive layer; and patterning the first conductive layer and the second conductive layer. Further, the first conductive layer includes one or more selected from carbon, chromium, tantalum, tungsten, molybdenum, titanium, silicon, and nickel. And the second conductive layer includes one or more selected from chromium, tantalum, tungsten, molybdenum, titanium, silicon, and nickel, or nitride of these materials.11-10-2011
20110272698THIN FILM TRANSISTOR SUBSTRATE - A thin film transistor array panel comprises a plurality of gate lines formed on an insulating substrate; a repair line formed on the insulating substrate; a gate insulating layer formed on the gate lines and the repair line; a plurality of data lines formed on the gate insulating layer; an electricity dissipation line formed on the gate insulating layer crossing the gate lines and the repair line; and a first diode connecting the repair line and the electricity dissipation line. When static electricity is introduced through the repair lines, the static electricity is transferred to the electricity dissipation line and is dispersed or exhausted before it reaches to the data lines. As a result, the TFTs and wires in the display area are prevented from being destroyed by the static electricity.11-10-2011
20130153907THIN FILM TRANSISTOR ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF - A thin film transistor array substrate is disclosed. The thin film transistor array substrate includes: gate lines and data lines formed to cross each other in the center of a gate insulation film on a substrate and to define pixel regions; a thin film transistor formed at each intersection of the gate and data lines; a passivation film formed on the thin film transistors; a pixel electrode formed on each of the pixel regions and connected to the thin film transistor through the passivation film; a gate pad connected to each of the gate lines through a gate linker; and a data pad connected to each of the data lines through a data linker. The data pad is formed of a gate pattern, and the data line is formed of a data pattern. The data linker is configured to connect the data pad formed of the gate pattern with the data line formed of the data pattern using a connection wiring. Also, the data linker includes the gate pattern connected to the data pad, the data pattern formed opposite to the gate pattern in the center of the gate insulation film, and the connection wiring configured to connect the gate pattern with the data pattern through a first contact hole which exposes the data pattern and the gate pattern by penetrating through the passivation film and the gate insulation film.06-20-2013
20130153911ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE - Embodiments of the present invention provide a method of manufacturing an array substrate, comprising: a step of forming a pixel electrode and a step of forming a common electrode, wherein at least one of the pixel electrode and the common electrode is formed of graphene. The embodiments of the present invention also provide an array substrate manufactured by the above method and a display device comprising the array substrate.06-20-2013
20130153912ACTIVE MATRIX SUBSTRATE, METHOD FOR FABRICATING THE SAME, AND DISPLAY DEVICE - An active matrix substrate includes: an electrode layer formed on the insulating substrate within a display region; a mark disposed on the insulating substrate within a non-display region, and made of a same material as the electrode layer; a first insulating film directly covering each of the electrode layer and the mark; and a second insulating film covering a part of the first insulating film. Within at least a part of the sealing region, the second insulating film is removed from the insulating substrate. The mark is disposed in the at least the part of the sealing region in which the second insulating film is removed, and is provided to overlap at least a part of the sealing region. A protective film is formed on the insulating substrate to cover a side surface and a surface of the first insulating film covering the mark, the surface of the first insulating film being located opposite from the insulating substrate.06-20-2013
20120280238Semiconductor Device and Method for Manufacturing the Same - A semiconductor device includes a pixel electrode and a transistor which includes a first gate electrode, a first insulating layer over the first gate electrode, a semiconductor layer over the first insulating layer, a second insulating layer over the semiconductor layer, and a second gate electrode. The pixel electrode and the second gate electrode are provided over the second insulating layer. The first gate electrode has a region overlapping with the semiconductor layer with the first insulating layer provided therebetween. The second gate electrode has a region overlapping with the semiconductor layer with the second insulating layer provided therebetween. A first region is at least part of a region where the second gate electrode overlaps with the semiconductor layer. A second region is at least part of a region where the pixel electrode is provided. The second insulating layer is thinner in the first region than in the second region.11-08-2012
20110284858SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device having a semiconductor element (a thin film transistor, a thin film diode, a photoelectric conversion element of silicon PIN junction, or a silicon resistor element) which is light-weight, flexible (bendable), and thin as a whole is provided as well as a method of manufacturing the semiconductor device. In the present invention, the element is not formed on a plastic film. Instead, a flat board such as a substrate is used as a form, the space between the substrate (third substrate (11-24-2011
20130119387Organic Light-emitting Display Apparatus and Method of Manufacturing the Same - An organic light-emitting display apparatus includes: a substrate including an emission region and a non-emission region and having a recess formed in at least a portion of the non-emission region; a black matrix disposed in the recess; a thin film transistor disposed on the non-emission region of the substrate and including an active layer, a gate electrode, and source and drain electrodes; a pixel electrode disposed on the emission region of the substrate and electrically connected to one of the source and drain electrodes; an organic emission layer disposed on the pixel electrode; and an opposite electrode disposed on the organic emission layer.05-16-2013
20110303920THIN FILM TRANSISTOR HAVING A COPPER SIGNAL LINE AND METHOD OF MANUFACTURING THE SAME - An array substrate for a liquid crystal display device includes a substrate, a thin film transistor having a signal line of dual layered structure of a copper compound and copper, and a pixel electrode connected to the thin film transistor.12-15-2011
20110303919DISPLAY DEVICE AND ELECTRONIC DEVICE HAVING THE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING THEREOF - To provide a display device including a thin film transistor in which high electric characteristics and reduction in off-current can be achieved. The display device having a thin film transistor includes a substrate, a gate electrode provided over the substrate, a gate insulating film provided over the gate electrode, a microcrystalline semiconductor film provided over the gate electrode with the gate insulating film interposed therebetween, a channel protection layer which is provided over and in contact with the microcrystalline semiconductor film, an amorphous semiconductor film provided over the gate insulating film and on a side surface of the microcrystalline semiconductor film and the channel protection layer, an impurity semiconductor layer provided over the amorphous semiconductor film, and a source electrode and a drain electrode provided over and in contact with the impurity semiconductor layer. The thickness of the amorphous semiconductor film is larger than that of the microcrystalline semiconductor film.12-15-2011
20110303918ORGANIC LIGHT-EMITTING DISPLAY AND METHOD OF MANUFACTURING THE SAME - An organic light-emitting display and a method of manufacturing the display are disclosed. In one embodiment, the organic light-emitting display includes a thin film transistor comprising: i) a gate electrode, ii) an active layer electrically insulated from the gate electrode, iii) a source electrode and a drain electrode electrically insulated from the gate electrode, and contacting the active layer and iv) an insulating layer formed between i) the source and drain electrodes and ii) the active layer. The display further includes an organic light-emitting device electrically connected to the thin film transistor. In one embodiment, the source electrode comprises a first source electrode and a second source electrode that are separated from each other, and a third source electrode electrically connecting the first and second source electrodes. Moreover, the drain electrode comprises a first drain electrode and a second drain electrode that are separated from each other, and a third drain electrode electrically connecting the first and second drain electrodes.12-15-2011
20110303917THIN FILM TRANSISTOR SUBSTRATE, METHOD OF FABRICATING THE SAME AND FLAT DISPLAY HAVING THE SAME - A thin film transistor substrate and a method for fabricating the same are disclosed. A thin film transistor substrate includes a substrate comprising a plurality of grooves having different depths, respectively, to have a multi-step structure; gate and data lines alternatively crossed in the grooves to form a plurality of pixel areas; thin film transistors formed in the grooves of the substrate to be formed in cross portion of the gate and data lines, wherein active layers of the thin transistors are formed along the gate lines and gate electrodes, the active layers separated from active layers of neighboring pixel areas with the data line located there between.12-15-2011
20110309367DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY INCLUDING THE SAME - The present invention relates to a display panel and a liquid crystal display including the same. The display panel includes a pixel electrode, which includes a first subpixel electrode, a second subpixel electrode, and a third subpixel electrode insulated from each other, a first thin film transistor connected to the first subpixel electrode, a second thin film transistor connected to the second subpixel electrode, a third thin film transistor connected to the third subpixel electrode, a gate line connected to the first, second, and third thin film transistors, a data line connected to the first, second, and third thin film transistors, and a voltage differentiating member to change voltages of the first, second, and third subpixel electrodes, the voltages of the first, second, and third subpixel electrodes being different from each other.12-22-2011
20110309366ORGANIC THIN FILM TRANSISTOR SUBSTRATE, ITS MANUFACTURING METHOD, IMAGE DISPLAY PANEL, AND ITS MANUFACTURING METHOD - The present invention is a method for manufacturing an organic thin-film transistor substrate including an organic thin-film transistor as a transistor element, and an object of the invention is to provide a manufacturing method capable of forming a bank in a smaller number of steps. The method for manufacturing the organic thin-film transistor substrate of the present invention, in which an organic thin-film transistor is formed in a first region on a substrate, a second region for forming a light-emitting element in abutment with the first region is included, and a bank part is formed in a peripheral part of the second region, is characterized by including: a first step of forming the organic thin-film transistor in the first region on the substrate and forming at least one of the gate insulation layer and the organic semiconductor layer included by this organic thin-film transistor as far as the second region, thereby forming, in the second region, a bank precursor layer composed of a laminated structure formed on the second region; and a second step of removing the regions of the bank precursor layer other than the peripheral part, thereby forming the bank part made of the remaining bank precursor layer.12-22-2011
20110309365THIN FILM TRANSISTOR BACKPLANE - A fabrication process for a device such as a backplane for a flat panel display includes depositing thin film layers on a substrate, forming a 3D template overlying the thin film layers, and etching the 3D template and the thin film layers to form gate lines and transistors from the thin film layers. An insulating or passivation layer can then be deposited on the gate lines and the transistors, so that column or data lines can be formed on the insulating layer.12-22-2011
20110309364SEMICONDUCTOR DISPLAY DEVICE - It is an object of the present invention to provide a semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can control treatment time of heating treatment with an object of removing moisture, and can prevent moisture in the interlayer insulating film from being discharged to a film or an electrode adjacent to the interlayer insulating film. An inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive acrylic resin is applied to the organic insulating film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the two layer inorganic insulating film containing nitrogen are opened partially by etching to expose an active layer of the TFT.12-22-2011
20110309363ACTIVE MATRIX SUBSTRATE, LIQUID CRYSTAL DISPLAY APPARATUS HAVING THE SAME, AND METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE - A gate electrode is provided on a layered structure formed by successively stacking a conductive layer and an insulating layer. A storage capacitor includes a lower electrode formed in a same layer and made of a same material as the conductive layer, a dielectric layer provided on the lower electrode, formed in a same layer and made of a same material as the insulating layer, and an upper electrode formed in a same layer and made of a same material as the gate electrode to overlap the lower electrode with the dielectric layer sandwiched therebetween. A contact hole for connection to the storage capacitor is continuously formed in the interlayer and gate insulating films. The dielectric layer and the upper electrode are formed to have a lower conductive layer forming the lower electrode partially exposed from the dielectric layer, the upper electrode, and the interlayer and gate insulating films.12-22-2011
20110309362Flat panel display apparatus and method of manufacturing the same - A flat panel display apparatus including a gate electrode on a substrate, a first insulating layer and a semiconductor layer sequentially stacked on the gate electrode and including a transparent conductive oxide, a capacitor first electrode extending on a plane on which the gate electrode extends, and a capacitor second electrode extending on a plane on which the semiconductor layer extends and including a material of the semiconductor layer, wherein the first insulating layer is between the capacitor second electrode and the semiconductor layer, source and drain electrodes that are separated by a second insulating layer and are connected to the semiconductor layer and the capacitor second electrode, a third insulating layer covering the source and drain electrodes, and a pixel electrode electrically connected to the source or drain electrode on the third insulating layer and being electrically connected to one of the source electrode and/or the drain electrode.12-22-2011
20130187163ORGANIC LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF - An organic light emitting diode (OLED) display with an improved light efficiency and a method of manufacturing the OLED display are disclosed. The OLED display includes a substrate, an insulation layer on the substrate and having concave portions, first electrodes on the insulation layer, pixel defining layers (PDLs) on the insulation layer and configured to define the first electrodes into pixels, organic light emitting layers on the first electrodes as defined by the pixels, and a second electrode on the organic light emitting layers. Each of the concave portions includes a bottom surface and inclined parts. Each of the first electrodes is on the bottom surface and the inclined parts of one of the concave portions. Embossings are on a part of a surface of the PDLs.07-25-2013
20110315991ARRAY SUBSTRATE, LIQUID CRYSTAL PANEL, LIQUID CRYSTAL DISPLAY DEVICE, AND TELEVISION RECEIVER - An array substrate disclosed herein includes: scanning signal lines (12-29-2011
20110315990SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND ELECTRONIC APPLIANCE - To provide a semiconductor device in which a channel formation region can be thinned without adversely affecting a source region and a drain region through a simple process and a method for manufacturing the semiconductor device. In the method for manufacturing a semiconductor device, a semiconductor film, having a thickness smaller than a height of a projection of a substrate, is formed over a surface of the substrate having the projections; the semiconductor film is etched to have an island shape with a resist used as a mask; the resist is etched to expose a portion of the semiconductor film which covers a top surface of the projection; and the exposed portion of the semiconductor film is etched to be thin, while the adjacent portions of the semiconductor film on both sides of the projection remain covered with the resist.12-29-2011
20110315989DISPLAY DEVICE, LASER TRANSFER PRINTING METHOD AND LASER TRANSFER COLOR DONOR SHEET - A display device includes a thin film transistor substrate, a display layer, a patterned color resist layer, a patterned UV block layer and a transparent protective layer. The thin film transistor substrate has a substrate and a plurality of thin film transistors. The display layer is disposed on the thin film transistor substrate. The patterned color resist layer is disposed on the display layer. The patterned UV block layer is disposed on the patterned color resist layer. The transparent protective layer is disposed on the patterned UV block layer. The present invention also provides a laser transfer printing method for fabricating the color resist layer and the patterned UV block layer.12-29-2011
20120007081ARRAY SUBSTRATE FOR DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME - An array substrate for a display device includes a substrate; gate and data lines crossing each other on the substrate to define a pixel region; a thin film transistor connected to the gate and data lines and including a gate electrode, a gate insulating layer on the gate electrode, an active layer on the gate insulating layer, an ohmic contact layer on the active layer, and source and drain electrodes on the ohmic contact layer; and a pixel electrode connected to the drain electrode, wherein the source and drain electrodes are separated from each other to define a separate region, wherein the separate region includes first to third regions in different directions, and wherein the active layer is removed in at least one of the first to third regions.01-12-2012
20120012850ORGANIC LIGHT EMITTING DISPLAY APPARATUS - An organic light emitting display apparatus in which image quality can be improved. The organic light emitting display apparatus includes: a substrate; a first electrode disposed on the substrate; a pixel definition layer formed on the first electrode and having an opening portion through which a region of the first electrode is exposed; an intermediate layer connected to the first electrode through the opening portion and including an organic emission layer; a second electrode electrically connected to the intermediate layer; and an inorganic planarization pattern portion disposed between the substrate and the first electrode and formed to at least correspond to the opening portion.01-19-2012
20120012848Organic light-emitting display device and method of manufacturing the same - An organic light-emitting display device and method of manufacturing the same, the device including a first substrate; a second substrate facing the first substrate; an organic light-emitting unit formed by laser-induced thermal imaging, the organic light emitting unit being on the first substrate; a coupling member coupling the first substrate and the second substrate; and a supporting element on the first substrate, the supporting element having a height greater than a height of a thickest portion of the organic light-emitting unit and less than a height of the coupling member.01-19-2012
20130193439SEMICONDUCTOR DEVICE AND FLAT PANEL DISPLAY INCLUDING THE SAME - A semiconductor device includes a semiconductor layer on a substrate, a gate electrode electrically insulated from the semiconductor layer by a gate insulating layer, an insulating layer on the gate insulating layer and on the gate electrode, and a source electrode and a drain electrode on the insulating layer, the source and drain electrode being connected to the semiconductor layer. The source electrode overlaps at least a part of the gate electrode. The source electrode, the insulating layer, and the gate electrode overlap each other so as to provide a capacitor.08-01-2013
20130193440Display Device and Manufacturing Method Thereof - A display device in which a plurality of gate wires and a plurality of drain wires that intersect the gate wires are provided, and thin film transistors connected to the gate wires and the drain wires are formed for respective pixel regions. At least one of the gate wires, the drain wires, and lead wires drawn from the gate wires or the drain wires is formed of a light-transmitting patterned conductive film. The light-transmitting patterned conductive film is formed of at least a first light-transmitting patterned conductive film, and a second light-transmitting patterned conductive film laminated on the first light-transmitting patterned conductive film. The second light-transmitting patterned conductive film is formed of a conductive film for coating only the surface of the first light-transmitting patterned conductive film including its side wall surface.08-01-2013
20120018729SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - To realize a high-performance liquid crystal display device or light-emitting element using a plastic film. A CPU is formed over a first glass substrate and then, separated from the first substrate. A pixel portion having a light-emitting element is formed over a second glass substrate, and then, separated from the second substrate. The both are bonded to each other. Therefore, high integration can be achieved. Further, in this case, the separated layer including the CPU serves also as a sealing layer of the light-emitting element.01-26-2012
20120018728THIN FILM TRANSISTOR, DISPLAY DEVICE USING THE SAME, AND THIN FILM TRANSISTOR MANUFACTURING METHOD - A TFT of the present invention includes: a supporting substrate; a gate electrode formed on the supporting substrate; a gate insulation film formed on the substrate so as to cover the gate electrode; a first semiconductor layer formed across from the gate electrode with respect to the gate insulation film; a second semiconductor layer (i) formed on the first semiconductor layer, and (ii) having a first thickness and a secorrd thickness which is greater than the first thickness; an ohmic contact layer formed on the second semiconductor layer; and a source electrode and a drain electrode formed on the ohmic contact layer, spacing apart with each other.01-26-2012
20130200378METHOD AND APPARATUS FOR FORMING ORGANIC MATERIAL PATTERN, ORGANIC LIGHT EMITTING DISPLAY APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS - A method and an apparatus for forming an organic material pattern in a desired pattern on a substrate to improve device durability and image quality characteristics, an organic light emitting display apparatus, and a method of manufacturing an organic light emitting display apparatus, are provided. The apparatus includes a heater overlapping with a region of the substrate different from another region of the substrate in which the organic material pattern is to be formed, a power source for applying a voltage to the heater, and wiring for electrically connecting the power source with the heater.08-08-2013
20130200379THIN FILM TRANSISTOR ARRAY SUBSTRATE, ORGANIC LIGHT-EMITTING DISPLAY DEVICE INCLUDING THE SAME AND METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR ARRAY SUBSTRATE - A thin film transistor (TFT) array substrate includes a TFT including an active layer, a gate electrode, source and drain electrodes, a first insulating layer between the active layer and the gate electrode, and a second insulating layer and a third insulating layer between the gate electrode and the source and drain electrodes, the first insulating layer and the second insulating layer extending in the TFT, a pixel electrode including a transparent conductive oxide material, the pixel electrode being on the first insulating layer and the second insulating layer and being connected to the source or drain electrodes via an opening in the third insulating layer, a capacitor including a first electrode on a same layer as the gate electrode and a second electrode on a same layer as the pixel electrode; and a fourth insulating layer covering the source and drain electrodes and exposing the pixel electrode via an opening.08-08-2013
20130200380ORGANIC ELECTROLUMINESCENT DISPLAY DEVICE - An organic electroluminescent display device includes a bottom substrate, a covering substrate, a pixel controlling unit, a first organic light emitting unit, and a second organic light emitting unit. The covering substrate is disposed oppositely to the bottom substrate. The pixel controlling unit is disposed between the bottom substrate and the covering substrate. The first organic light emitting unit is disposed between the pixel controlling unit and the covering substrate. The second organic light emitting unit is disposed between the pixel controlling unit and the bottom substrate. The pixel controlling unit is electrically connected to the first organic light emitting unit and the second organic light emitting unit.08-08-2013
20130200381Display Panel Circuit Structure - A display panel circuit structure includes a substrate, a first metal layer, a second metal layer, and a third metal layer. The first metal layer is disposed on the substrate. The second metal layer is disposed on the first metal layer and electrically connected to the first metal layer, in which the second metal layer has a pad area and a trace area connected to the pad area. The line width of the second metal layer in the pad area is greater than the line width of the second metal layer in the trace area. The third metal layer is disposed on the second metal layer, in which the third metal layer does not overlap the second metal layer n the trace area.08-08-2013
20130200382THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE - In a thin-film transistor (“TFT”) substrate and a method of manufacturing a TFT substrate, the TFT substrate includes a base substrate, a gate pattern, a source pattern and a pixel electrode. One of the gate pattern and the source pattern includes a pure copper layer, and a conductive layer under the pure copper layer. The conductive layer includes a copper alloy oxide, a copper alloy nitride or a copper alloy oxynitride.08-08-2013
20130200377THIN FILM TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - The present invention provides a thin film transistor (TFT) array substrate and a method for manufacturing the same. After depositing a first metal layer on a substrate, a first mask is utilized to form gate electrodes. After depositing a gate insulating layer and a semiconductor layer on the substrate, a second mask is utilized to pattern the semiconductor layer, so as to keep portions of the semiconductor layer above the gate electrodes. After depositing a transparent and electrically conductive layer and a second metal layer on the substrate, a multi tone mask is utilized to form source electrodes, drain electrodes, pixel electrodes and common electrodes. The present invention can simplify the manufacturing process thereof.08-08-2013
20120299000THIN FILM TRANSISTOR, METHOD OF MANUFACTURING THE SAME, AND ORGANIC LIGHT EMITTING DISPLAY APPARATUS - A thin film transistor (TFT) having an active layer pattern, the active layer pattern including a first active layer pattern extending in a first direction; a second active layer pattern extending in the first direction and parallel to the first active layer pattern; and a third active layer pattern connecting a first end of the first active layer pattern to a first end of the second active layer pattern.11-29-2012
20120074416LIQUID CRYSTAL DISPLAY AND PANEL THEREFOR - The present invention provides a liquid crystal display having excellent visibility.03-29-2012
20120086012LIQUID CRYSTAL DISPLAY DEVICE - A method of manufacturing, with high mass productivity, liquid crystal display devices having highly reliable thin film transistors with excellent electric characteristics is provided. In a liquid crystal display device having an inverted staggered thin film transistor, the inverted staggered thin film transistor is formed as follows: a gate insulating film is formed over a gate electrode; a microcrystalline semiconductor film which functions as a channel formation region is formed over the gate insulating film; a buffer layer is formed over the microcrystalline semiconductor film; a pair of source and drain regions are formed over the buffer layer; and a pair of source and drain electrodes are formed in contact with the source and drain regions so as to expose a part of the source and drain regions.04-12-2012
20120086011DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel includes a substrate having a display area and a blank area. The blank area includes at least one of a non-metal line region and a metal-line region. The non-metal line region includes a plurality of insulating patterns and a first conductive pattern layer formed on the substrate. The insulating patterns are isolated from each other by the first conductive pattern layer. The metal-line region includes an insulating multilayer formed on the substrate and a conductive pattern layer formed on the insulating multilayer. Several isolated zones are formed by the conductive pattern layer on the surface of the insulating multilayer.04-12-2012
20120086010ELECTRONIC IMAGE DETECTION DEVICE - The instant disclosure relates to an electronic image detection device comprising: a plurality of metal electrodes on a first face of an insulating layer; and amorphous silicon regions extending over the insulating layer between the metal electrodes.04-12-2012
20120086009Array Substrate for Fringe Field Switching Mode Liquid Crystal Display Device and Method of Manufacturing the Same - A method of manufacturing an array substrate for an FFS mode LCD device includes forming a gate line and a gate electrode on a substrate, forming a pixel electrode in the pixel region, forming a gate insulating layer on the gate line, the gate electrode and the pixel electrode, forming a data line, a source electrode, a drain electrode, and a semiconductor layer on the gate insulating layer, the data line crossing the gate line to define the pixel region, the semiconductor layer disposed over the gate electrode, the source electrode and the drain electrode spaced apart from each other over the semiconductor layer, the drain electrode overlapping the pixel electrode, forming a passivation layer on the data line, the source electrode and the drain electrode, the passivation layer including a drain contact hole and a pixel contact hole, and forming a connection pattern and a common electrode on the passivation layer, wherein the common electrode includes bar-shaped first openings in the pixel region, and the connection pattern contacts the drain electrode and the pixel electrode through the drain contact hole and the pixel contact hole, respectively.04-12-2012
20130207113ELECTROSTATIC DISCHARGE PROTECTION STRUCTURE FOR AN ACTIVE ARRAY SUBSTRATE - Disclosed herein is an electrostatic discharge protection structure which includes a signal line, a thin-film transistor and a shunt wire. The thin-film transistor includes a gate electrode, a metal-oxide semiconductor layer, a source electrode and a drain electrode. The first metal-oxide semiconductor layer is disposed above the first gate electrode. The metal-oxide semiconductor layer has a channel region characterized in having a width/length ratio of less than 1. The source electrode is equipotentially connected to the gate electrode. The shunt wire is electrically connected to the drain electrode. When the signal line receives a voltage surge of greater than a predetermined magnitude, the voltage surge is shunted through the thin-film transistor to the shunt wire.08-15-2013