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Ultraviolet or infrared source

Subclass of:

250 - Radiant energy

250493100 - RADIANT ENERGY GENERATION AND SOURCES

250503100 - With radiation modifying member

Patent class list (only not empty are listed)

Deeper subclasses:

Class / Patent application numberDescriptionNumber of patent applications / Date published
250504000 Hand-held 4
20100140511FLAT DISCHARGE LAMP - The present invention relates to a flat discharge lamp (06-10-2010
20100140512EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.06-10-2010
20130075629TERAHERTZ WAVE GENERATOR - A terahertz wave generator includes a femtosecond pulse light source 03-28-2013
20080258085Electro-Less Discharge Extreme Ultraviolet Light Source - An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10-23-2008
20110192995LPP EUV Light Source Drive Laser System - An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.08-11-2011
20100032590Debris protection system having a magnetic field for an EUV light source - Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.02-11-2010
20100078578METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES - The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas (04-01-2010
20100117009EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE05-13-2010
20090267005Drive laser delivery systems for euv light source - An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.10-29-2009
20100072406GLASS COMPOSITION FOR ULTRAVIOLET LIGHT AND OPTICAL DEVICE USING THE SAME - A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Si, and O in an amount of 99.99 weight % or more in total. The glass composition contains Lu in an amount of 26% or more and 39% or less in cation percent and Si in an amount of 61% or more and 74% or less in cation percent.03-25-2010
20130032735LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.02-07-2013
20100044598Terahertz Laser Components And Associated Methods - Systems and methods for generating terahertz radiation include a pair of optical horns, each of which forms a gap at respective vertices thereof. The first horn is ruled such that an electron beam interacting with a grating period produces terahertz radiation. The horns are diametrically opposed to one another such that radiation exiting the first horn enters the second horn through the gaps. Systems and methods for generating terahertz radiation include generating and focusing an electron beam adjacent a vertex of an optical horn that is ruled with a grating period. Interaction between the electron beam and the grating period produces the terahertz radiation. A method of evaluating interaction between a material and terahertz radiation includes passing a sample of the material through the radiation. At least one of an effect of the radiation on the material, and an effect of the material on the radiation, is measured.02-25-2010
20090159819Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method - A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.06-25-2009
20100108918EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.05-06-2010
20100108917Ultraviolet light sanitizing method and apparatus - A unit, system, and method for disinfecting or sterilizing the entire surface area of an item. The system includes at least one ultraviolet light source producing ultraviolet light for disinfecting an item. In addition, the system including a cavity housing the ultraviolet light source, the cavity having a reflective interior for redirecting light produced by the at least one ultraviolet light source. Furthermore, the system including a shelf positioned above a bottom portion of the cavity to support the item, the shelf capable of passing light produced by the at least one ultraviolet light source therethrough to disinfect an entire surface area of the item.05-06-2010
20130026393CHAMBER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR CONTROLLING THE EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.01-31-2013
20080308753FLEXIBLE INFRARED DELIVERY APPARATUS AND METHOD - A flexible infrared delivery apparatus useful for endoscopic infrared coagulating of human or animal blood and tissue or for other uses employs a source of infrared radiation which is not a laser and an elongated flexible fiber optic member which transmits radiation from the source to a contact portion at a distal end of the member and to a material such as human or animal tissue proximate the contact portion. The elongated member has an outer diameter which enables it to be inserted into and through an accessory channel of an endoscope to view the human or animal tissue or material to be treated with infrared radiation. A connector on the proximal end of the member allows the elongated member to be quickly connected to and disconnected from the apparatus where the member is aligned for receiving infrared radiation from the source. The contact portion defines a size, direction and shape of a radiation delivery area from the member to the human or animal tissue or material proximate the contact portion.12-18-2008
20130087723DOWNHOLE SOURCES HAVING ENHANCED IR EMISSION - Light sources are provided with enhanced low-frequency (e.g., near infrared) emission. Some disclosed embodiments include a filament and at least one re-radiator element. The filament heats the re-radiator element to a steady-state temperature that is at least one quarter of the filament's absolute temperature. As disclosed herein, the increased surface area provided by the re-radiator element provides enhanced IR radiation from the light source. Patterning or texturing of the surface can further increase the re-radiator element's surface area. Various shapes such as disks, collars, tubes are illustrated and can be combined to customize the spectral emission profile of the light source. Some specific embodiments employ a coating on the bulb as the re-radiator element. The coating can be positioned to occlude light from the filament or to augment light from the filament, depending on the particular application. The various re-radiator elements can be positioned inside or outside the bulb.04-11-2013
20090045356UV IRRADIATOR - An apparatus having one or more UV bulbs arranged around a structural element and within an outer conductive element. The apparatus also contains an inner conductive element which extends the length of the apparatus. The inner and outer conductive elements are coupled to a microwave source to enable the UV bulbs to be powered.02-19-2009
20100327192Alignment Laser - A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.12-30-2010
20130048886CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.02-28-2013
20130048885LIGHTING MODULE HAVING A COMMON TERMINAL - A lighting module has an electrically conductive heat sink, an array of light-emitting elements mounted on and electrically connected to the conductive heat sink, a flex circuit mounted on the conductive sink, and conductive traces on the flex circuit, the conductive traces connected to the light-emitting elements. A lighting module has a heat sink, an array of light-emitting elements, each element having a cathode terminal and an anode terminal, wherein the heat sink is a common terminal for the elements.02-28-2013
20120217422EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.08-30-2012
20120112101Method and Arrangement for the Stabilization of the Source Location of the Generation of Extreme Ultraviolet (EUV) Radiation Based on a Discharge Plasma - The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit (05-10-2012
20090267004EXCIMER RADIATION LAMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME - There is described an excimer radiation lamp assembly. The lamp assembly comprise a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.10-29-2009
20130062539APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS - An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.03-14-2013
20130062538EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector.03-14-2013
20110037002ENERGY EMITTING TREATMENT DEVICE - In one aspect, the present application is directed to a radiant energy emitting device. The radiant energy emitting device comprises (A) an outer housing including at least one aperture there through, the housing being operationally configured to (1) receive and contain radiant energy therein, and (2) emit radiant energy out through the aperture to a target surface; (B) an energy emission means; and (C) a sensor means disposed about the aperture of the housing, the sensor means being in communication with the energy emission means and operationally configured to detect the spatial relationship between the sensor means and the target surface, said spatial relationship determining activation of the energy emission means.02-17-2011
20130161542RADIATION SOURCE WITH CLEANING APPARATUS - A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H06-27-2013
20130161541TERAHERTZ WAVE GENERATOR AND METHOD OF GENERATING TERAHERTZ WAVE - Disclosed is a terahertz wave generator which includes a first light source outputting a first light having a first frequency; a second light source outputting a second light having a second frequency different from the first frequency; a second harmonic generation unit performing second harmonic conversion on the first and second lights to generate a third light and a fourth light; and a photomixer converting a mixing light of the third and fourth lights into a terahertz wave alternating signal and outputting a terahertz wave.06-27-2013
20130161540EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light (EUV) includes a chamber, a target supply unit, a collector mirror, an exhaust device, a gas supply device and an ultraviolet light source. The target supply unit supplies a target material to a predetermined region inside the chamber. The collector mirror collects EUV light generated from the target material. The exhaust device is connected to the chamber. The gas supply device is connected to the chamber to supply an etchant gas into the chamber. The ultraviolet light source irradiates a reflective surface of the collector mirror with ultraviolet light.06-27-2013
20130068971ELECTROMAGNETIC WAVE EMISSION DEVICE - An electromagnetic wave emission device includes a nonlinear crystal, a prism, and a cylindrical lens. The nonlinear crystal has an optical waveguide, receives exciting light having at least two wavelength components, and outputs an electromagnetic wave having a frequency equal to or more than 0.01 [THz] and equal to or less than 100 [THz] by means of the Cherenkov phase matching. The prism includes an electromagnetic wave input surface receiving the electromagnetic wave from the optical waveguide and an electromagnetic wave transmission surface through which the electromagnetic wave which has entered from the electromagnetic wave input surface passes. The cylindrical lens has two bottom surfaces opposed to each other, a flat surface intersecting with the two bottom surfaces, and a curved surface intersecting with the two bottom surfaces and the flat surface, wherein the flat surface is in contact with the electromagnetic wave transmission surface.03-21-2013
20120235067TUNABLE INFRARED EMITTER - Provided are methods of tuning the emission wavelength from a tunable infrared plasmonic emitting structure, which structure comprises: (a) a perforated or patterned first conductive layer having a plurality of relief features provided in a periodic spatial configuration, wherein the relief features are separated from each other by adjacent recessed features, wherein the distance between features is between 1-15 μm; (b) a dielectric layer underlying the first conductive layer; (c) a second conductive layer underlying the dielectric film; and (d) a substrate underlying the second conductive layer; wherein the emission wavelength is tuned by applying a force in a biaxial direction parallel to the substrate, changing the distance between relief features, or changing the resistivity and dielectric constant of the dielectric layer.09-20-2012
20120235066DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE - An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.09-20-2012
20120223257EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.09-06-2012
20100171050METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE - Method for regenerating a surface of an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range, H (EUV, XUV) in particular with a wavelength in the wavelength range between 10 nm and 15 nm, this radiation source comprising at least a chamber for arranging therein a plasma generating XUV or EUV radiation and the optical element, in particular a collector for bundling XUV or EUV radiation generated by the plasma and causing it to exit the chamber, according to which method a first Si, C or metal compound is arranged in the chamber which reacts in an equilibrium reaction with the material of the surface of the collector to form respectively a second Si, C or metal compound bonded to this surface, and XUV or EUV radiation source adapted for such a method.07-08-2010
20090065716SHOE SANITIZER - Introducing ultraviolet (UV) light (03-12-2009
20100006780Method and Apparatus for Enhanced Terahertz Radiation from High Stacking Fault Density - A method and device for generating terahertz radiation comprising a polar crystal material layer operative to emit terahertz radiation; the polar crystal material layer comprising a plurality of stacking faults; the stacking faults lying substantially perpendicular to the polar axis and forming boundaries at which the internal electric polarization terminates leading to charges accumulating at the boundaries, and creation of internal electric fields oriented along the polar axis; a pulsed radiation source for creating photogenerated carriers in the polar crystal material; whereby the photogenerated carriers accelerate in the internal electric fields associated with the termination of the internal electric polarization by the stacking faults to thereby generate terahertz radiation.01-14-2010
20090206283ELECTRON EMISSION DEVICE OF HIGH CURRENT DENSITY AND HIGH OPERATIONAL FREQUENCY - An electric device operable with a THz-range frequency of the device output is presented. The device comprises a photocathode installed in either one of a diode, triode and tetrode configuration, and is exposed to illumination. In some embodiments of the invention, the device is configured as a diode and photomixing is used for illumination of the photocathode with light in the THz range, the diode converting this input light signal into an electrical output in the THz range, which operates a signal transmitter/receiver. In some other embodiments of the invention, the device is configured as a triode or tetrode, where the electrodes have small dimensions (about 1 micron or less) and are spaced from one another a distance not exceeding 1 micron. The photocathode is kept under certain illumination, and electrical signal applied to one of the electrodes results in the THz output at one of the other electrodes.08-20-2009
20110284775CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.11-24-2011
20110284774TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.11-24-2011
20120104291COMPOSITION FOR PRODUCING A FILTER MATERIAL FOR RADIATION, METHOD FOR PRODUCING A COMPOSITION FOR A FILTER MATERIAL, MATERIAL FOR FILTERING RADIATION, AND AN OPTOELECTRONIC DEVICE COMPRISING THE MATERIAL - Composition for producing a filter material for radiation includes a silicone and at least one dye dispersed in the silicone, wherein the composition has a relative transmission of less than 20% for radiation of the wavelength of 400 nm to 700 nm, and has a relative transmission of greater than 50% for radiation of the wavelength of 850 nm to 1025 nm.05-03-2012
20100090133EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.04-15-2010
20110168925Source-collector module with GIC mirror and LPP EUV light source - A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.07-14-2011
20110297852MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.12-08-2011
20090146085Compact high-power pulsed terahertz source - A sub-mm wave source based on Cherenkov resonant radiation of a microbunched electron beam radiating coherently in a dielectric-loaded pipe. The microbunched electron beam is produced in a pulse photoinjector by illuminating a metal photocathode with sub-ps or multi-ps intensity-modulated laser beam with a beat wave or multiplexing at terahertz frequencies, the photoelectrons generated at the photocathode being accelerated by an electric field and sub-wavelength focused by magnetic field to propagate through a resonant radiator comprising a corrugated wall or smooth-wall metal capillary pipe internally coated with dielectric and attached to an antenna.06-11-2009
20120097869EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 04-26-2012
20100032589SYSTEM AND METHOD FOR GERMICIDAL SANITIZING OF AN ELEVATOR OR OTHER ENCLOSED STRUCTURE - A system for sanitizing an enclosed structure comprises a first sensor, a second sensor, a third sensor, a germicidal ultraviolet light source, a motor, and a controller. The first sensor detects the presence of humans or animals within the enclosed structure. The second sensor detects the position of at least one door of the enclosed structure. The third sensor detects tampering with the system. The ultraviolet light source provides electromagnetic radiation in the ultraviolet range. The motor moves the ultraviolet light source from an inactive position to an active position and from the active position to the inactive position. The controller receives inputs from the first sensor, the second sensor, and the third sensor, and transmits outputs to the ultraviolet light source and the motor. When the controller receives signals that no humans or animals are present in the enclosed structure and that the door is in a closed position, the controller transmits a signal to the motor to move the ultraviolet light source from the inactive position to the active position and a signal to activate the ultraviolet light source. If humans or animals are detected to be present in the enclosed structure or if the door is detected to be open, then the controller deactivates the ultraviolet light source and repositions the ultraviolet light source.02-11-2010
20120286176DROPLET GENERATOR WITH ACTUATOR INDUCED NOZZLE CLEANING - Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.11-15-2012
20090084992METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION AND AN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 1004-02-2009
20090014668Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave - A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO01-15-2009
20120025109EXTREME ULTRAVIOLET LIGHT SOURCE WITH A DEBRIS-MITIGATED AND COOLED COLLECTOR OPTICS - The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (02-02-2012
20090184267IRRADIATION DEVICE - Radiation apparatus for technical use, with a large number of stretched-out radiation sources emitting in or between the UV and IR ranges and a large number of main reflector segments that are bent and/or folded out of metal sheet in a shape adapted to that of the radiation sources, while the main reflector segments are formed as separate main reflectors and are held, singly replaceable and independently of the radiation sources, in a radiation source housing.07-23-2009
20110079737EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE - The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.04-07-2011
20100078577Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.04-01-2010
20100078579EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.04-01-2010
20090090877MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.04-09-2009
20080272317PLASMA-BASED EUV LIGHT SOURCE - Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.11-06-2008
20080210889Extreme ultra violet light source apparatus - An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.09-04-2008
20100090132EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.04-15-2010
20090272919Exreme ultraviolet light source apparatus - An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.11-05-2009
20110198515TERAHERTZ RADIATION DEVICE AND METHOD OF GENERATING TERAHERTZ RADIATION - A method and device for generating terahertz radiation comprising a substrate; a plurality of segments of polar crystal material formed on the substrate, the segments having an internal electric polarization; each segment comprising at least two edges oriented substantially perpendicular to the polar axis such that the electric polarization terminates at the edges and the segment comprises a majority of positive charges on one edge and a majority of negative charges on the opposite edge thereby leading to creation of an internal electric field; whereby when irradiated by a pulsed source of duration less than one picosecond, electron-hole pairs are generated within the segments and the internal electric field separates and accelerates the electron-hole pairs to thereby produce terahertz radiation.08-18-2011
20080277600Irradiation Unit - The invention relates to an irradiation unit for the UV irradiation of particularly web-shaped substrates, comprising a housing (11-13-2008
20090166568Method and Apparatus For Electromagnetic Emission By Reactive Composite Materials - A device and method for emitting electromagnetic radiation utilizing a reactive composite material (RCM) as an emission source. By selective modification of the reactive composite material (RCM), attributes of the emitting device, including the ability to produce specific radiation intensity levels at specific electromagnetic wavelengths, the ability to emit for a specific duration, the avoidance of dangerous reaction products, portability, geometric design flexibility, and simple, safe storage may be selected.07-02-2009
20090261277Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.10-22-2009
20110140009Efficient High-Harmonic-Generation-Based EUV Source Driven by Short Wavelength Light - Extreme ultraviolet radiation is generated based on high-order harmonic generation. First, a driver pulse is generated from a drive laser. Second, the infrared driver pulse is passed through a second harmonic generator with an output wavelength in the range from 400 to 700 nm. Third, the pulse is then passed through a gas medium, which can be inside a resonant cavity, to generate a high-order harmonic in the form of extreme ultraviolet radiation.06-16-2011
20110140008Beam Transport System for Extreme Ultraviolet Light Source - An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.06-16-2011
20110266467EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.11-03-2011
20080283779DEVICE FOR THE GENERATION OF A GAS CURTAIN FOR PLASMA-BASED EUV RADIATION SOURCES - The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.11-20-2008
20080308752UV TRANS-ILLUMINATOR - A UV (Ultra Violet) trans-illuminator includes a UV irradiating unit composed of a plurality of CCFLs (Cold Cathode Fluorescent Lamps) or EEFLs (External Electrode Fluorescent Lamps) arranged at intervals of 1.0 cm to 3.0 cm and having a diameter of 3 mm to 8 mm so as to irradiate UV rays from an upper surface thereof, and a light dispersing unit disposed at a distance of 1 cm to 7 cm from the upper surface of the UV irradiating unit and dispersing the UV rays irradiated from the UV irradiating unit. This UV trans-illuminator has a slim design, excellent uniformity and small elapsed time change.12-18-2008
20130119280BROADBAND INFRARED LIGHT EMITTING DEVICE - [PROBLEM] There is provided a broadband infrared light emitting device that radiates infrared light having a band broader than a conventional broadband infrared light emitting device.05-16-2013
20100264336GAS DISCHARGE SOURCE, IN PARTICULAR FOR EUV-RADIATION - The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (10-21-2010
20110006229LENSES, OPTICAL SOURCES, AND THEIR COUPLINGS - A lens may operate in the mid-IR spectral region and couple highly divergent beams into highly collimated beams. In combination with a light source having a characteristic output beam, the lens may provide highly stable, miniaturized mid-IR sources that deliver optical beams. An advanced mounting system may provide long term sturdy mechanical coupling and alignment to reduce operator maintenance. In addition, devices may also support electrical and thermal subsystems that are delivered via these mounting systems. A mid-IR singlet lens having a numerical aperture greater than about 0.7 and a focal length less than 10 mm may be combined with a quantum well stack semiconductor based light source such that the emission facet of the semiconductor lies in the focus of the lens less than 2 mm away from the lens surface. Together, these systems may provide a package that is highly portable and robust, and easily integrated with external optical systems.01-13-2011
20100140513EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.06-10-2010
20110220816EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.09-15-2011
20090294699METHOD FOR INFLUENCING AN ENERGY STATE OF A RADIATION SOURCE - A method is provided for influencing an energy state of a radiation source. In order to provide a method that in a simple manner influences the energy state of a radiation source in a high-pressure metal vapour lamp, for the increase or decrease of the energy of the radiation source at least one energy sink is introduced into the direction of propagation of the electromagnetic radiation the radiation sources.12-03-2009
20090184268DISINFECTING DEVICE UTILIZING ULTRAVIOLET RADIATION - A disinfecting device is presented having a UV light source for radiation of a cleaning medium to eradicate the medium of infestation agents such as molds, viruses, bacteria and dust mites. The device enhances the disinfection of the medium by providing mechanisms for enhanced penetration of the UV light into the cleaning medium. The device also offers enhanced heat dissipation to promote effective use of the device. Also provided are safety mechanisms to promote the safe and advantageous use of the UV device.07-23-2009
20100200777DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT - A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.08-12-2010
20100200776EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material.08-12-2010
20090045357Contamination barrier and lithographic apparatus comprising same - A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.02-19-2009
20090146086SYSTEM AND APPARATUS FOR DERMATOLOGICAL TREATMENT - Exemplary embodiments of system and apparatus can be provided for treating various dermatological and biological conditions using electromagnetic energy in the form of optical radiation. For example, energy can be provided by a chemical reaction, such as by combustion of a fine metallic filament, which can be used to generate a high-intensity pulse of energy without requiring external energy sources. Various parameters of the reactive materials and enclosures can be selected and/or applied to provide a radiation pulse having particular characteristics, including fluence, peak intensity, and radiation wavelength distribution. Various filters may be provided to further modify characteristics of the radiation. Such radiation pulses can be used to irradiate tissue such as skin to obtain various therapeutic or beneficial effects, including improvement in the appearance of pigmented or venous lesions.06-11-2009
20090127480METHODS AND APPARATUS FOR GENERATING ULTRAVIOLET LIGHT - A housing for an elongate electrodeless bulb which is energiseable by an rf field such as a microwave field, preferably at or around 2.45 GHz. The housing is constructed of electrically conductive material and is arranged to have a substantially unobstructed opening through which the bulb is visible from outside the housing, and the housing is arranged to hold the bulb in a position which is recessed into the housing such that in use, the bulb is energized by virtue of its position within the housing and adjacent surrounding conductive parts of the housing substantially attenuate the rf field near the opening so that the rf field strength outside the housing is substantially zero whereby visible light or UV light is freely allowed out through the opening.05-21-2009
20090212241LASER HEATED DISCHARGE PLASMA EUV SOURCE - A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.08-27-2009
20120104290EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.05-03-2012
20120104289DROPLET GENERATION AND DETECTION DEVICE, AND DROPLET CONTROL DEVICE - A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.05-03-2012
20080315132Flat Uv Light Source - A flat UV light source has a tight packing of UV light-emitting diodes (12-25-2008
20080315133Uv Irradiation Unit - The invention relates to a UV irradiation unit comprising a housing (12-25-2008
20090095925LPP EUV light source drive laser system - An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO04-16-2009
20090250641Extreme ultra violet light source apparatus - An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.10-08-2009
20120193554Optical Crystal and Terahertz Wave Generation Device and Method - An optical crystal includes a first non-linear optical crystal that generates terahertz waves corresponding to a difference frequency component in incident light with two different wavelengths by a difference frequency generation, and a second non-linear optical crystal that generates terahertz waves corresponding to a difference frequency component in incident light with two different wavelengths by a difference frequency generation, the second non-linear optical crystal being different in material from the first non-linear optical crystal, and the first non-linear optical crystal and the second non-linear optical crystal being disposed in contact or close together.08-02-2012
20100181504Ultra-Violet Lamp and Reflection/Shield Assembly - An ultra-violet lamp and reflector/shield assembly designed to be mounted in a commercial HVAC, and to other types of A/C units is described herein. The reflector/shield includes a reflective inner surface creating an illumination pattern and an outer surface shielding the UV lamp from the air flow. An orienting and securing assembly for a UV lamp is also described herein.07-22-2010
20090072168Radical cleaning arrangement for a lithographic apparatus - A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.03-19-2009
20090072167EXPOSURE APPARATUS, LIGHT SOURCE APPARATUS AND DEVICE FABRICATION - An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma, an illumination optical system for illuminating the mask using the light condensed by the condenser mirror, a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light, and a changing part for changing a state of the plasma based on a detected result of the detector.03-19-2009
20090072165FLEXIBLE WORK AND UTILITY LAMP - A rope light is provided comprising a plurality of infrared lamps that enable a user to stealthily operate the light under cover of darkness. The method of using the rope light comprises either signaling to an observer or operating on a workpiece. The rope light can be positioned to signal information such as the outlines of a runway or supply drop point. The observer, using appropriate goggles or other visualization devices, can then detect such signals. The rope light provided can also be used to operate on such things as an automobile engine under cover of darkness. The rope light can be flexibly positioned in such things as engine compartments to flood the compartment with infrared light, enabling a person to repair a workpiece such as an engine. Other embodiments use a rope light that radiates light visible to the human eye for both signaling and operating on a workpiece.03-19-2009
20090072166Infra-red lighting system and device - A chemiluminescent system and device is disclosed wherein a first polymeric sheet having a shaped cavity therein is sealed around its periphery to a second polymeric sheet and the cavity contains a cured PVC plastisol having admixed an oxalate solution and finely divided semiconductor laser crystals and a sealed receptacle containing a liquid component of a chemiluminescent activator. Placed over the plastisol or container is a light filter having a dye or dyes, pigment or pigments compounded into the filter, the dyes or pigments are chosen from those that absorb certain parts of the spectrum such that all light emissions up to 1050 nm are absorbed and anything beyond 1050 nm is transmitted. The devices generate a chemiluminescent light at wavelengths chosen to stimulate the semiconductor laser crystals. The semiconductor laser crystals absorb the chemiluminescent light and re-emit energy at wavelengths in the IR. By choosing the proper light absorbing dyes or pigments in the filter element, the emitted wavelength(s) that the activated device emits can be between 1 micron and 2.5 microns but no visible light.03-19-2009
20090314967EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.12-24-2009
20100193712EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF ADJUSTING THE SAME - An extreme ultraviolet light source apparatus includes a main body including a supply section to which an extreme ultraviolet radiation seed is supplied, and an emission part configured to emit extreme ultraviolet, an excitation unit provided in the main body and configured to generate a plasma by exciting the extreme ultraviolet radiation seed, an optical condensing unit provided in the main body and configured to converge extreme ultraviolet, which is radiated from the plasma, at the emission part, a trap provided between the excitation unit and the optical condensing unit, a first positioning mechanism connected to the trap and configured to adjust at least one of a position and an angle of the trap, and a measuring unit configured to measure a far field distribution image of the plasma on the basis of the extreme ultraviolet which is emitted from the emission part, thereby to operate the first positioning mechanism.08-05-2010
20100193709Apparatus and Method for Sanitizing Feet and the External Surfaces of Footwear - A disinfecting device for objects such as shoes or human body parts such as feet. The device employs light radiating from a cavity below a transparent platform, to contact and disinfect surfaces on objects placed on a top surface of the platform. The spectral range of the light is adapted to disinfect the surface with Ultra Violet light being a preferred spectral range. An upper housing may be provided above the platform to protect the user's eyes from UV radiation which is substantially indiscernible to the human eye and as a housing for a reflective means to reflect disinfecting light communicating through the transparent platform, back toward the top surfaces of the object on the platform. A signal component for user safety such as a visible light emitter, an audible alarm, or vibration of the platform may be employed to provide the user a means to ascertain emanating UV light during operation of the device.08-05-2010
20100176312EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field.07-15-2010
20100176313Extreme ultraviolet light source - An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.07-15-2010
20100193710LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.08-05-2010
20100213395EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 08-26-2010
20100148094RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME - There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing coupled to the proximal portion of the elongate radiation source assembly, and (iii) a power supply disposed within the housing, the power supply in electrical communication with the elongate radiation source assembly (in certain embodiments the power supply is optional). The elongate radiation source assembly and the housing are in substantial alignment with respect to a longitudinal axis of the elongate radiation source cartridge.06-17-2010
20100140514Gas management system for a laser-produced-plasma EUV light source - Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.06-10-2010
20100243922EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.09-30-2010
20100078580Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.04-01-2010
20100127191Systems and methods for drive laser beam delivery in an euv light source - An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.05-27-2010
20110057126EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.03-10-2011
20090114854DISINFECTING DEVICE UTILIZING ULTRAVIOLET RADIATION - A disinfecting device is presented having a UV light source for radiation of a cleaning medium to eradicate the medium of infestation agents such as molds, viruses, bacteria and dust mites. The device enhances the disinfection of the medium by providing mechanisms for enhanced penetration of the UV light into the cleaning medium. The device also offers enhanced heat dissipation to promote effective use of the device. Also provided are safety mechanisms to promote the safe and advantageous use of the UV device.05-07-2009
20080230726FOIL TRAP AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE USING THE FOIL TRAP - An extreme ultraviolet (EUV) light source device and foil trap, the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes that heat and excite the EUV radiating species and generate a high-temperature plasma; a collector mirror collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.09-25-2008
20100294958APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS - An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.11-25-2010
20100276612TERAHERTZ EMITTERS - A tunable radiation emitting structure comprising a discontinuous conducting interface having periodic or quasi-periodic features, wherein the structure emits narrowband terahertz radiation when heated is disclosed.11-04-2010
20110127450Laser-Heated Infrared Source - Described are infrared light sources and methods for generating infrared radiation. The infrared light source includes a source of laser radiation, a target and an enclosure. The target is positioned in a path of an output region of the source of laser radiation. The target includes an absorbing material that absorbs radiation at a wavelength within the lasing spectrum of the source of laser radiation and converts the absorbed radiation into thermal energy. The enclosure defines a cavity that includes the target. The enclosure includes an infrared reflecting film on a side that defines the cavity.06-02-2011
20110240890Extreme Ultraviolet Light Source - An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.10-06-2011
20090065715Universal ultraviolet/ IR/ visible light emitting module - A miniature, battery operated plastic module designed to project at least three different frequencies of energy from light emitting diodes is described. A first frequency is between 390 nm-420 nm just above harmful Ultraviolet Frequencies, a second frequency is between 850 nm-1200 nm in the infrared band and a third frequency is for a visible white light. The light emitting module has a base unit, the unit including a pulsed LED that emits an ultraviolet wavelength of light adapted to focus on a surface having phosphorescence means on the surface to activate the phosphorescence. The light emitting module may also have a base unit which includes a pulsed LED that emits an infrared wavelength of light adapted to penetrate a particular atmosphere. The module may also provide optional power for external items in addition to the three frequencies.03-12-2009
20110031417TERAHERTZ WAVE GENERATOR AND METHOD OF GENERATING HIGH-POWER TERAHERTZ WAVES USING THE SAME - The present invention relates to a terahertz wave generator and a method of generating high-power terahertz waves using the terahertz wave generator. The terahertz wave generator includes a hollow spherical body, and a focusing lens installed in a cutout portion of the spherical body or an opening formed in the cutout portion, wherein an inner surface of the spherical body is coated with metal. In the method, frequencies having different levels are incident through the focusing lens or the opening to generate a plurality of air plasmas, and the air plasmas cause continuous focusing the metal-coated inner surface and hollow space of the spherical body, thus generating high-power terahertz waves.02-10-2011
20120228527EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.09-13-2012
20120228525SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.09-13-2012
20130153792DROPLET GENERATOR STEERING SYSTEM - Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.06-20-2013
20100171049Extreme ultraviolet light source apparatus - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.07-08-2010
20100163757Pulse Modifier with Adjustable Etendue - A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.07-01-2010
20100252755Infrared emitter - An infrared emitter for use with self-propelled aerial targets used to simulate jet aircraft for use as a target for anti-aircraft missile systems. The emitter provides an infrared source that simulates the infrared energy produced by an aircraft. The emitter incorporates a network of platinum beads that are arranged along and between a plurality of parallel stainless steel screens. The network is contained in a heating conduit that is secured to a housing. The housing is provided with an opening to allow for attachment to the exhaust ports of a self-propelled aerial target's engine. Combustion gases produced by the aerial target's engine are expelled through the exhaust port and pass through to the emitter. The gases heat the network of beads and screens thereby causing the network to emit an infrared signature such that the heat seeking/sensing mechanisms of anti-aircraft missiles systems are able to locate and direct the missile to the target. The technology is also applicable to surface targets for both marine and land applications.10-07-2010
20100193711EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM - An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.08-05-2010
20110210273UV LAMP - The invention relates to an UV lamp (09-01-2011
20100012862Mechanism of adjusting irradiating angle for a far infrared radiator - A mechanism of adjusting irradiating angle for a far infrared radiator includes an elbow connected between a joint and an irradiating hood and provided with a stage of corrugated flexible tube. The elbow has a combining end portion connected with the flexible tube for combining with the irradiating hood, with a locking slot formed in a surface of the combining end portion for being tightly fitted with a screw. So the corrugated flexible tube can be bent with diverse angles; the irradiating hood can be circularly rotated; and the joint can let the elbow swing up and down. The irradiating hood can be thus adjusted to randomly shift its irradiating angle without difficulty or any dead angle caused01-21-2010
20090218522EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.09-03-2009
20090218521Gaseous neutral density filters and related methods - Gaseous neutral density (ND) filters are disclosed that produce a stream of gas to interact with and thereby attenuate a beam of extreme ultraviolet (EUV) radiation. The gaseous ND filter can be located in a system that receives the beam of EUV radiation from an EUV source and delivers the beam to a downstream EUV optical system, wherein the beam passes through the gaseous ND filter between the source and the optical system. The stream of gas used in the gaseous ND filter can be discharged at a supersonic velocity and the gas can be a single gas or a mixture of gases. An exemplary mixture of gases includes xenon and argon gases.09-03-2009
20120241650TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply unit may include: a target storage unit for storing a target material thereinside; a target output unit having a through-hole formed therein, through which the target material stored inside the target storage unit is outputted; an electrode having a through-hole formed therein arranged to face the target output unit, the electrode being coated with an electrically conductive material at least on a part of a surface facing the target output unit; and a voltage generator for applying a voltage between the target material and the electrode.09-27-2012
20110101252 Method of protection of human (livestock) from bites of blood-sucking insects. - The method of protection of human (livestock) from bites of blood-sucking insects which based on fact, that mosquitoes and other blood-sucking insects have principally infrared vision and actively attack people or animals at night, in twilight or in the shade, that is, in the conditions optimum for detecting infra-red emission of a body of the person and animals. The method consists in creating in protected zones of the thermal hindrances, which deprive blood-sucking insects of ability to define position of people (of animals). The method consists in placing in protected zone of (one or several) sources of the infra-red emission; diagrams of emission and a places of placing of infra-red sources must be organized so that this emission would to hit in eyes of insects (thermal sensors of insects) in the majority of possible points of supervision by them of people (of animals); power of emission must to exceed power output of infra-red emission of vulnerable parts of a body of the person (of animals); infra-red sources can operate constantly, periodically or not periodically, including when operating time and the period of repetition vary by law of random numbers.05-05-2011
20110101251EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CORROSION-RESISTANT MATERIAL - The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.05-05-2011
20110174996EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE - A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.07-21-2011
20120119119UV-CONVERTER, UV LAMP ARRANGEMENT WITH THE UV-CONVERTER, AND A LIGHTING UNIT COMPRISING THE UV LAMP ARRANGEMENT - The invention relates to, UV-converter for transforming radiation of wavelengths above 200 nm to UVA and UVB radiation, having at least a light transmitting sheet (05-17-2012
20120119117Remote Nanoscale Photochemistry Using Guided Emission in Nanowires - A method of fabricating a nanodevice includes providing a nanowire having a first portion and a second portion. The nanowire has a polymer coating. A nanostructure is provided that is proximate to the second portion of the nanowire. Solely the first portion of the nanowire is irradiated with near-infrared radiation, thereby exciting the first portion to generate ultraviolet radiation. The generated ultraviolet radiation is guided from the first portion along the nanowire toward the second portion, so that a region of the polymer coating on the second portion is polymerized and bonds the nanostructure to the nanowire.05-17-2012
20110024651RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER - A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.02-03-2011
20100258748SYSTEM, METHOD AND APPARATUS FOR DROPLET CATCHER FOR PREVENTION OF BACKSPLASH IN A EUV GENERATION CHAMBER - A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.10-14-2010
20090289205MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.11-26-2009
20090127479EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND A METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - High temperature plasma raw material is added drop-wise, for example, and evaporated by irradiation with a laser beam. The laser beam passes through a discharge area between a pair of electrodes and irradiates the high temperature plasma raw material. Pulsed power is applied to the space between the electrodes in such a way that discharge current reaches a specified threshold value at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes, plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap, is collected by EUV radiation collector optics and then extracted. The irradiation of the laser beam allows setting of the space density of the high temperature plasma raw material to a specified distribution and defining of the position of a discharge channel.05-21-2009
20090127478Infrared Source and Method of Manufacturing the Same - There is provided an infrared light source that has a simple structure and radiates infrared rays polarized in a specific direction and having a specific wavelength. The infrared light source (05-21-2009
20090095924ELECTRODE DESIGN FOR EUV DISCHARGE PLASMA SOURCE - An apparatus for producing an extreme ultraviolet (EUV) discharge includes a metal source, a laser that produces a focused laser beam, and electrode operatively coupled to the metal source. The electrode includes a plurality of discrete metal retaining zones that deliver a controlled volume of metal into the focused laser beam to produce an EUV discharge plasma.04-16-2009
20110163247EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.07-07-2011
20080203326Method of reducing radiation-induced damage in fused silica and articles having such reduction - A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV optical system, prisms, filters, photomasks, reflectors, etalon plates, and windows. The distortion is reduced by irradiating the fused silica article with an irradiation source, such as an infrared laser. The radiation causes localized heating which repairs at least a portion of the fused silica lens. A fused silica lens that has been treated by the method and a lithographic system are also described.08-28-2008
20110068282Plasma source of directed beams and application thereof to microlithography - A method for generating radiation in a range of desired wavelengths in a direction of emission is provided. According to the method, initial radiation is produced by a radiation source, the wavelengths thereof including the desired range, and the initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterized in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.03-24-2011
20100282987ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES - The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (11-11-2010
20100258749SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR - A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.10-14-2010
20100181503EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.07-22-2010
20100181502SELF-SHADING ELECTRODES FOR DEBRIS SUPPRESSION IN AN EUV SOURCE - A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.07-22-2010
20120145930LLP EUV LIGHT SOURCE AND METHOD FOR PRODUCING THE SAME - An LPP EUV light source includes a vacuum chamber 06-14-2012
20110073784APPARATUS AND METHOD FOR GENERATING HIGH-INTENSITY OPTICAL PULSES WITH AN ENHANCEMENT CAVITY - An enhancement cavity includes a plurality of focusing mirrors, at least one of which defines a central aperture having a diameter greater than 1 mm. The mirrors are configured to form an optical pathway for closed reflection and transmission of the optical pulse within the enhancement cavity. Ring-shaped optical pulses having a peak intensity at a radius greater than 0.5 mm from a central axis are directed into the enhancement cavity. Accordingly, the peak intensity of the optical pulse is distributed so as to circumscribe the central apertures in the apertured mirrors, and the mirrors are structured to focus the pulse about the aperture toward a central spot area where the pulse is focused to a high intensity.03-31-2011
20100282986METHOD OF INCREASING THE OPERATION LIFETIME OF A COLLECTOR OPTICS ARRANGED IN AN IRRADIATION DEVICE AND CORRESPONDING IRRADIATION DEVICE - The present invention relates to a method of increasing the operation lifetime of an optical collector unit (11-11-2010
20090309048Radiation System and Lithographic Apparatus Comprising the Same - An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.12-17-2009
20110147621TERAHERTZ WAVE GENERATION DEVICE AND METHOD FOR GENERATING TERAHERTZ WAVE - A terahertz wave generation device is provided with an ultra-short pulse laser light source (06-23-2011
20100025600Systems and methods for heating an EUV collector mirror - As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.02-04-2010
20080290301Portable Wavelength Transforming Converter for UV LEDs - This invention provides a small form factor apparatus for selectively producing one or more of a plurality of wavelength distributions of radiation, comprising a UV Light Emitting Diode (LED) as the primary UV LED radiation source and one or more wavelength transforming (WT) materials separated from the primary UV LED radiation source, that in response to irradiation by the primary UV LED radiation source, produce transformed radiation having a wavelength distribution that is different from the wavelength distribution of the primary UV LED radiation source. None, one, or more than one of the various WT materials may be selected by the user, to allow either the primary UV radiation, or the transformed radiation, or both simultaneously, to be to be emitted from the apparatus in a preferred direction.11-27-2008
20080315134OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS - An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.12-25-2008
20090173896METHOD AND APPARATUS FOR OPERATING AN ELECTRICL DISCHARGE DEVICE - The present invention relates to a method of operating an electrical discharge device (07-09-2009
20110073785Radiation Collector - The invention relates to a radiation collector (10) designed to concentrate part of the radiation produced by a source on a spot (100). The collector includes a primary concave mirror (1) and a secondary convex mirror (2), each being rotationally symmetrical about an optical axis (X-X) of the collector. The primary mirror is configured to reflect the radiation collected with an angle of incidence (i) that is substantially constant between different points on said main mirror. Such a collector is particularly suitable for use with a discharge produced plasma source.03-31-2011
20120305811EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.12-06-2012
20120305810Laser-Produced-Plasma EUV Light Source - Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.12-06-2012
20120305809APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection.12-06-2012
20120001098EXCIMER RADIATION LAMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME - An excimer radiation lamp assembly. The lamp assembly comprises a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.01-05-2012
20100258750SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT - An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material and logic for adjusting the target material dispenser outlet to output a subsequent one of the plurality of portions of target material to a waist of the focused drive laser. A method for generating an extreme ultraviolet light is also disclosed. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.10-14-2010
20120056112Infrared Radiator Arrangement for a Gas Analysis Device - A method and device for measuring the soot load in the exhaust gas systems of diesel engines using a sensor which is mounted downstream of a particulate filter and comprises a sensor element, to measure the operability of the particulate filter. According to the method, the soot load of the sensor element is measured resistively or capacitively using electrodes. The measuring voltage of the sensor element is controlled depending on at least one actual operating parameter of the diesel engine.03-08-2012
20120119118EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM - An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.05-17-2012
20120205559TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device is configured for supplying a target material for generating an extreme ultraviolet (EUV) light. The target supply device comprises a target storage unit for storing at least the target material, and a target discharge unit comprising a surface having an opening from which a through-hole extends to communicate with the target storage unit. The target material is discharged through the opening for generating the EUV light. The surface at least around the opening is formed of a material so that the target material has a contact angle greater than 90 degrees with the surface.08-16-2012
20120012762LASER DEVICE, LASER SYSTEM, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A laser device may include: a diffraction grating; and a plurality of semiconductor lasers disposed such that laser beams outputted therefrom are incident on the diffraction grating and at least one of diffraction beams of each laser beam travels in a predetermined direction.01-19-2012
20120205558Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination - Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further include exposing the optically reflective surface to EUV radiation thereby generating electrons. The method may also include applying an electromagnetic field to the optically reflective surface, the electromagnetic field configured to reduce reactions initiated by the electrons on the optically reflective surface. The applied electromagnetic field may be constant or varied and also may have different biases.08-16-2012
20120153191Vivarium06-21-2012
20110079736Laser produced plasma EUV light source - An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.04-07-2011
20110089347ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE - There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.04-21-2011
20120161040EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.06-28-2012
20120119116EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.05-17-2012
20110006228Sterra-Sponge - A cleaning and sterilizing device to clean and sterilize a work surface may include a top member and a bottom member to cooperate with the top member to provide a container for a sterilizing light device to provide sterilizing light for the work surface. The top member may include includes a first enclosure and the bottom member includes a second enclosure to cooperate with the first enclosure to substantially cover a light bulb to generate a sterilizing light for the work surface and a cleaning apparatus may be detachably connected to the bottom member to simultaneously clean the work surface as the sterilizing light is sterilizing the work surface. The sterilizing light may be an ultraviolet light, and the cleaning apparatus may include a sponge detachably connected to the bottom member. The sponge may be connected to the bottom member with a Velcro hooks and loops, and the sponge may be connected to the bottom surface of the bottom member. The bottom member may include a dividing wall to separate the sponge from the sterilizing light.01-13-2011
20120126148Device for Generating a Secondary Source by Laser-Material Interaction Comprising an Optical Device for Controlling the Orientation and the Position of a Surface in Movement - A device for generating a secondary source from a primary optical source emitting a first optical beam focused onto a surface in movement, with which said first beam interacts so as to generate a secondary beam, includes an optical device for controlling the orientation and position of said surface to determine the orientation and position of the emission point of said secondary source on said surface. The device comprises: a control laser beam split into two branches, a fixed reference beam and a mobile analysis beam reflected by the surface in movement; means for making said reference and analysis beams interfere to generate interference fringes; means for imaging the interference fringes carrying information about the orientation and position of said surface; means for analyzing said interference images; and means for generating a feedback loop for controlling the orientation and position of said surface in movement based on the analysis.05-24-2012
20120248342MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.10-04-2012
20120168648ELLIPTICAL LIGHT SOURCE FOR ULTRAVIOLET (UV) CURING LAMP ASSEMBLIES - A light source having a substantially elliptical cross-section for UV curing lamp assemblies is disclosed. The light source has a pair of end sections and a central section of smaller diameter than the end sections. The end sections are each connected to the central section by a tapered section the diameter of each of which decreases from an end that mates with an end section toward an end that mates with the central section. Each of the end sections has a substantially elliptical cross-section. The central section and the tapered sections may have a substantially elliptical cross-section. The aspect ratio of the elliptical cross-section of the end sections and the central section of the light source is preferably about 2:1.07-05-2012
20110180734EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.07-28-2011
20110180733TERAHERTZ RADIATION DEVICE USING POLAR SEMICONDUCTOR MATERIALS AND METHOD OF GENERATING TERAHERTZ RADIATION - A method and device for generating terahertz radiation comprising a plurality of layers of polar crystal material operative to emit terahertz radiation; the plurality of layers comprising transport layers and divider layers, the plane of the layers being not parallel to the polar axis, the interface between the transport layers and divider layers forming boundaries at which the internal electric polarization terminates leading to charges accumulating at the boundaries, and creation of internal electric fields oriented along the polar axis; whereby when irradiated by a pulsed source of duration less than one picosecond, a time-varying and spatially nonuniform distribution of carriers is created in the growth direction of the polar crystal material thereby generating a first time-varying current due to diffusion of the carriers; the internal electric fields accelerating the carriers generated by the pulsed radiation source operating to produce a second time-varying current that is additive with the first time-varying current, thereby enhancing the generation of terahertz radiation.07-28-2011
20120132832PASSIVE TERAHERTZ RADIATION SOURCE - The invention concerns a passive terahertz radiation source configured to emit electromagnetic radiation having frequency in the range of 10 GHz to 50 THz and a method for generating a terahertz radiation. The passive terahertz radiation source comprises: a source of a pulsed excitation light; an emitter comprising one or more emitter elements, each emitter element comprising a semiconductor layer being arranged such that at least a portion of a first major surface of said semiconductor layer is exposed to the excitation light, wherein each emitter element is configured such that upon exposure to the excitation light, a gradient of the charge carrier density is generated in the semiconductor layer in the area of transition between a first area of the semiconductor layer and a second area of the semiconductor layer, the gradient being substantially parallel to the first major surface of the semiconductor layer.05-31-2012
20100258747Systems and methods for protecting an EUV light source chamber from high pressure source material leaks - A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.10-14-2010
20120313016SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE - An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.12-13-2012
20120211678Method and apparatus for countermeasuring an infrared seeking missile utilizing a multispectral emissive film - An electronic countermeasures product includes flexible packaging of diodes that operate in the infrared portion of the electromagnetic spectrum to replace flares, lamps and directed lasers with an inexpensive easily deployed countermeasure systems.08-23-2012
20090057579SPINNING INFRARED EMITTER - A spinning infrared emitter is disclosed which has a light source that in one aspect emits infrared and/or near-infrared light and a controller that spins the light. Also disclosed are methods of using the light produced by the spinning infrared emitter. The light produced by the spinning infrared emitter is generally useful for speeding chemical reactions. More particularly, the light produced by the spinning infrared emitter is useful for enhancing photosynthesis and carbon dioxide fixation by green plants.03-05-2009
20100051832EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.03-04-2010
20100051831LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA - A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).03-04-2010
20120175533EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, AND RECORDING MEDIUM WITH PROGRAM RECORDED THEREON - An extreme ultraviolet light source apparatus, in which a target material is irradiated with a laser beam from a laser apparatus and the target material is turned into plasma, thereby emitting extreme ultraviolet light, may include a burst control unit configured to control irradiation of the target material is irradiated with the laser beam outputted successively in pulses from the laser apparatus when the extreme ultraviolet light is emitted successively in pulses. The target material is prevented from being turned into plasma by the laser beam while the laser beam is outputted successively in pulses from the laser apparatus when the successive pulsed emission is paused.07-12-2012
20120223256SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE - An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.09-06-2012
20120228526LASER PRODUCED PLASMA EUV LIGHT SOURCE - Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.09-13-2012
20120228528LED ORAL ILLUMINATOR USING A BITE BLOCK - Disclosed herein are intraoral illumination devices. More specifically, the LED intraoral illumination device in accordance with the present invention has an improved battery for providing power supply and structure of a bit block for opening a mouth using the bit block.09-13-2012
20120261596EXTREME ULTRA VIOLET LIGHT SOURCE DEVICE - An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.10-18-2012
20120267553EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.10-25-2012
20120298889Systems, Methods, and Apparatus for Generating Terahertz Electromagnetic Radiation - Certain embodiments of the invention may include systems, methods, and apparatus for generating terahertz electromagnetic radiation. According to an example embodiment of the invention, a method is provided for generating terahertz electromagnetic radiation. The method includes: coupling a terahertz resonator with an optical resonator, wherein the optical resonator comprises non-linear optical material; directing laser light through the optical resonator to generate terahertz radiation by parametric interaction of the laser light with the optical resonator and the terahertz resonator; and directing the terahertz radiation from the terahertz resonator to an output.11-29-2012
20120319015GLASS COMPOSITION AND OPTICAL DEVICE - There is provided a glass composition containing an oxide containing Lu, Si, and Al, in which the composition of the glass composition lies within a compositional region of a ternary composition diagram of Lu, Si, and Al in terms of cation percent, the compositional region being defined by the following six points: 12-20-2012
20120080619Method and Apparatus for the Generation of EUV Radiation from a Gas Discharge Plasma - The invention relates to a method and an apparatus for generating EUV radiation from a gas discharge plasma. The object of the invention, to generate EUV radiation from a gas discharge plasma by with is optimized conversion efficiency of the EUV emission while locally limiting the electric discharge channel, is met in that a channel-generating beam of pulsed high-energy radiation is supplied in at least two partial beams which are focused in a pulse-synchronized manner into a superposition region along a spacing axis between the electrodes, and an electrically conductive discharge channel is generated along the superposition region due to an ionization at least of a buffer gas present in the discharge space, wherein the pulsed high-energy radiation of the channel-generating beam is triggered in such a way that the discharge channel is generated before a discharge current pulse has reached its maximum value.04-05-2012
20110266468EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.11-03-2011
20120319014EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.12-20-2012
20120326058COLLECTOR MIRROR ASSEMBLY AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE USING SAID COLLECTOR MIRROR ASSEMBLY - A deterioration of the collector performance in an extreme ultraviolet light source device due to a heat deformation of the collector mirror assembly is to be prevented. The collector mirror assembly used in the extreme ultraviolet light source device comprises a plurality of reflective shells 12-27-2012
20130009076EXTREME ULTRAVIOLET LIGHT SOURCE AND POSITIONING METHOD OF LIGHT FOCUSING OPTICAL MEANS - In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.01-10-2013
20130015375GENERATION OF TERAHERTZ ELECTROMAGNETIC WAVES IN GRAPHENE BY COHERENT PHOTON-MIXINGAANM AVOURIS; PHAEDONAACI Yorktown HeightsAAST NYAACO USAAGP AVOURIS; PHAEDON Yorktown Heights NY USAANM Sung; Chun-YungAACI PoughkeepsieAAST NYAACO USAAGP Sung; Chun-Yung Poughkeepsie NY USAANM Valdes Garcia; AlbertoAACI HartsdaleAAST NYAACO USAAGP Valdes Garcia; Alberto Hartsdale NY USAANM Xia; FengnianAACI PlainsboroAAST NJAACO USAAGP Xia; Fengnian Plainsboro NJ US - An electromagnetic device and method for fabrication includes a substrate and a layer of graphene formed on the substrate. A metallization layer is patterned on the graphene. The metallization layer forms electrodes such that when the graphene is excited by light, terahertz frequency radiation is generated.01-17-2013
20130020511MIRROR, MIRROR DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base.01-24-2013
20120241651DEEP-ULTRAVIOLET LIGHT SOURCE CAPABLE OF STOPPING LEAKAGE OF HARMFUL X-RAYS - In a deep-ultraviolet tight source includes sapphire substrate, a wide band gap semiconductor layer having a wavelength smaller than 300 nm, formed on the sapphire substrate, and en electron beam source for irradiating the wide band gap semiconductor layer with an electron beam. The wide band gap semiconductor layer is configured to be irradiated with the electron beam to emit deep-ultraviolet light through the sapphire substrate. A thickness t09-27-2012
20120241649EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD - An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis.09-27-2012
20080251738Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element - A method and apparatus is disclosed that may comprise an ultraviolet light source; an optical element within an optical path of the light source mounted on an optical element mount; a vibration damping mechanism operatively connected to the optical element or to the mount which may comprise a wire mesh pad. The optical element may comprise a center wavelength selection optical element, which may comprise a grating, a mirror, or a prism. The vibration damping mechanism may comprise the wire mesh pad comprising an elastic interface between a driving mechanism lever arm operable to move the optical element or the mount and a driving lever arm actuator. The vibration damping mechanism may comprise a mass damping mechanism comprising a mounting plate connected to the optical element or to the mount; a damping mass; the wire mesh pad comprising an elastic interface between the mounting plate and the damping mass.10-16-2008
20080237501EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND EXTREME ULTRAVIOLET RADIATION GENERATING METHOD - High temperature plasma raw material (10-02-2008
20090101850ARRANGEMENT FOR GENERATING EUV RADIATION - The invention is directed to an arrangement for generating EUV radiation particularly for source modules in exposure installations for EUV lithography for semiconductor chip fabrication. The object of the invention, to find a novel possibility for realizing an EUV source module which appreciably improves the ratio of resources to results in the transfer of radiation from the primary source location (plasma 04-23-2009
20130175460COMPOSITIONS AND METHODS FOR UV STERILIZATION - Provided herein are systems, ultraviolet (UV) devices, and methods for UV disinfection and sterilization, more specifically, systems, devices, and methods for UV disinfection and sterilization of a container, room, space or defined environment. The systems, UV devices, and methods are particularly useful for the UV disinfection and sterilization of a container used in the food and dairy industry and for containers used in the process of fermentation for an alcoholic beverage. Provided are also systems, UV devices, and methods for inhibiting the growth of one or more species of microorganisms present in a container, room, space or defined environment preferably for inhibiting the growth of one or more species of microorganisms present on an interior surface of a container, room, space or defined environment.07-11-2013
20120248344EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.10-04-2012
20120248343CHAMBER APPARATUS - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.10-04-2012
20120248341SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LIGHT SOURCE - A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output of the light system is measured at sample intervals as a proxy for the laser power. The thermal load on the focusing lens is estimated from the measured EUV power, the expected change in the focal length of the lens for the thermal load is calculated, and the lens position is adjusted to compensate for the calculated focal length change. The actual position of the lens may be determined and compared to its desired position, and adjusted to insure that it remains in the desired position.10-04-2012
20130126761CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.05-23-2013
20130134330HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.05-30-2013
20130092849LASER DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser device having master oscillators that output seed beams is provided. The seed beams are guided from the master oscillators to a regenerative amplifier such that at least one of the seed beams enters the regenerative amplifier at an angle that differs from an angle at which another seed beam enters the regenerative amplifier. A laser apparatus and an extreme ultraviolet light generation system using the laser device are also provided.04-18-2013
20130092848LAMP SYSTEMS AND METHODS FOR GENERATING ULTRAVIOLET LIGHT - Apparatus for generating ultraviolet light and methods of operating an ultraviolet light source. The apparatus may include a microwave chamber (04-18-2013
20130099141ULTRAVIOLET LIGHT EMITTING DEVICE INCORPORTING OPTICALLY ABSORBING LAYERS - A light emitting device includes a p-side, an n-side, and an active layer between the p-side and the n-side. The p-side includes a p-side contact, an electron blocking layer, a p-side separate confinement heterostructure (p-SCH), and a p-cladding/current spreading region disposed between the p-SCH and the p-side contact. The n-side includes an n-side contact, and an n-side separate confinement heterostructure (n-SCH). The active layer is configured to emit light in a wavelength range, wherein the p-side and the n-side have asymmetrical optical transmission properties with respect to the wavelength range emitted by the active layer.04-25-2013
20130112896PLATINUM-BASED INFRARED LIGHT SOURCE FOR GAS DETECTION - An infrared radiation source for gas detection, with a thin layer infrared radiator that is arranged in the interior chamber of a protective housing that includes a support surface for the thin layer infrared radiator and an exit window for the infrared radiation arranged at a distance opposite the support surface. The thin layer infrared radiator includes a platinum layer and at least one structurally defined de-gassing canal with an entry opening and an exit opening that leads from the interior chamber of the protective housing to the outside. For non-critical applications, the de-gassing canal is not sealed. For critical applications, it may be sealed by a sealing membrane that is water impermeable, water vapor permeable and open for gas diffusion, with the sealing membrane preferably being semi-permeable.05-09-2013
20130126762EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.05-23-2013
20080197300Method of calibrating light delivery systems, light delivery systems and radiometer for use therewith - In a method of calibrating a light delivery device (08-21-2008
20080197299Extreme ultra violet light source apparatus - An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.08-21-2008
20080197298Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light.08-21-2008
20080197297High repetition rate laser produced plasma EUV light source - An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.08-21-2008
20110220815LIGHT SOURCE APPARATUS - The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source 09-15-2011
20110248192METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS WITH ENHANCED EFFICIENCY - The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (10-13-2011
20110248191SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE - A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.10-13-2011
20110253913CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus and a focusing optical system for focusing a laser beam outputted from the laser apparatus may include: a chamber provided with an inlet through which the laser beam is introduced into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; and a collection unit provided in the chamber for collecting a charged particle generated when the target material is irradiated with the laser beam in the chamber.10-20-2011
20130153794EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus uses first and second laser beams from a laser apparatus to generate extreme ultraviolet light. The apparatus may include a chamber provided with at least one inlet through which at least one of first and second laser beams outputted from the laser apparatus travels into the chamber. A beam shaping unit is provided on a beam path of the first laser beam for transforming the first laser beam into a hollow laser beam. A first focusing optical element is provided downstream of the beam shaping unit for focusing the hollow laser beam in a first location inside the chamber.06-20-2013
20130153793ELECTROMAGNETIC RADIATION GENERATING ELEMENT, ELECTROMAGNETIC RADIATION GENERATING DEVICE, AND METHOD OF GENERATING ELECTROMAGNETIC RADIATION - An electromagnetic radiation generating device is a device that generates electromagnetic wave pulses from a plane surface. The electromagnetic radiation generating device includes an electromagnetic radiation generating element, a light irradiating unit. The electromagnetic radiation generating element includes: a depletion layer forming body formed by stacking a p-type silicon layer and an n-type silicon layer in a planar pattern; a light receiving surface electrode formed on one surface of the depletion layer forming body, the light receiving surface electrode including a plurality of parallel electrode parts that are equally spaced while a forming distance is maintained between the parallel electrode parts, the forming distance corresponding to the wavelength of the electromagnetic wave pulses generated from the depletion layer forming body; and a rear surface electrode formed on the opposite surface of the depletion layer forming body.06-20-2013
20130181146ELECTROMAGNETIC WAVE EMISSION DEVICE - An electromagnetic wave emission device includes a nonlinear crystal which receives exciting light Lp having two wavelength components λ07-18-2013
20110309271SPECTRAL PURITY FILTER AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS PROVIDED WITH THE SPECTRAL PURITY FILTER - A spectral purity filter may include: a plurality of segments that each includes a mesh in which an array of apertures of an aperture size at or below a predetermined size is formed and which has electroconductivity; and a frame that supports the plurality of the segments at least at a periphery thereof.12-22-2011
20110309270LASER DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE, AND METHOD FOR MAINTAINING THE DEVICES - Provided is a laser device which is installed within a predetermined space and on a predetermined floor area, the laser device may includes: a master oscillator; at least one amplifier unit that amplifies a laser beam outputted from the master oscillator; at least one power source unit that supplies excitation energy to the at least one amplifier unit; and a movement mechanism which enables at least one among the at least one amplifier unit and the at least one power source unit to be moved in a direction parallel with a floor surface.12-22-2011
20130187066Infrared emitter - A single-ended infrared emitter may be provided, having at least one glass tube, in which a heating element is accommodated, wherein at least one insulated current return line is arranged spaced apart from the glass tube.07-25-2013
20130187065EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.07-25-2013
20120068091EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD FOR CONTROLLING SATURABLE ABSORBER USED IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.03-22-2012
20130207004Source-collector modules for EUV lithography employing a GIC mirror and a LPP source - Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.08-15-2013
20090314966IRRADIATION SOURCES AND METHODS - Irradiating assemblies can have a housing with a reflector extending linearly parallel to a lamp. Radiation can be emitted from one opening, for example in a bottom portion of the housing, as well as from another opening, for example a side opening in the housing. Irradiating assemblies can also have first and second reflector portions at angles with respect to each other wherein radiation is reflected out of a housing that does not have an end reflector. Irradiating assemblies can be configured to have cooling flow openings in side walls so that cooling fluid such as air can flow between the side walls and adjacent surfaces of a reflector. Irradiating assemblies can incorporate lamps having first and second electrodes wherein the first and second electrodes are oriented at an angle with respect to each other. Methods of irradiating material may include irradiating a surface with emissions from a first portion of an assembly and irradiating a surface with emissions from a second portion of an assembly different from the first portion.12-24-2009
20110127449ELECTRONIC DEVICE WITH REMOTE CONTROL CAPABILITY - An electronic device includes a housing, a PCB, a LED mounted to the PCB, and a support member. The housing defines a cavity, and a through hole communicating with the cavity. The PCB is received in the cavity. The LED includes a lens received in the through hole. The support member, which is fixed to the housing to provide support for the lens, includes an elastic latch arm extending close to the through hole to form an angle with a surface of the lens. An end of the elastic latch arm contacts the surface of the lens to prevent the lens from being detached from the through hole.06-02-2011
20100320405HANDHELD PORTABLE MULTI PURPOSE STERILIZING WAVELENGTH TRANSFORMING CONVERTER - An apparatus and a method, in a handheld portable multi purpose device, for producing multiple and variable wavelength distributions of UV radiation, or visible radiation, comprising a primary UV radiation source, and a system of wavelength transforming (WT) materials that allows selecting at will between UV A, UV B, UV C radiation (individual selections or various combinations,) and visible radiation, whereby the apparatus provides for UV sterilization of food, fluid, air, fluids, and surfaces; while also providing a means to emit visible light. Additionally, an apparatus and method, in a handheld portable multi purpose device, for enabling production and emission of UV radiation selectable between UV A, UV B, UV C radiation (individual selections or various combinations,) and visible radiation in a small form factor device embodied in a handheld portable flashlight, or lamp, type device.12-23-2010
20120161039HAND CARRY TYPE PORTABLE CURING APPARATUS USING LONG-ARC UV LAMP - A hand carry type portable curing apparatus using a long-arc UltraViolet (UV) lamp for concentrating the external air on the long-arc UV lamp and enhancing cooling efficiency by disposing a fan at a tilt angle and in addition installing a means for forcibly inducing a flow of air inside is provided. The apparatus includes a housing having an accepting part therein, the long-arc UV lamp installed in the accepting part of the housing, and a fan installed in the housing and cooling the long-arc UV lamp. The fan is installed on the slant to tilt toward the front in a front surface of the housing.06-28-2012
Entries
DocumentTitleDate
20100140511FLAT DISCHARGE LAMP - The present invention relates to a flat discharge lamp (06-10-2010
20100140512EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element.06-10-2010
20130075629TERAHERTZ WAVE GENERATOR - A terahertz wave generator includes a femtosecond pulse light source 03-28-2013
20080258085Electro-Less Discharge Extreme Ultraviolet Light Source - An electrode-less discharge source of extreme ultraviolet (EUV) radiation (10-23-2008
20110192995LPP EUV Light Source Drive Laser System - An apparatus and method is disclosed which includes or employs an EUV light source comprising a laser device outputting a laser beam, a beam delivery system directing the laser beam to an irradiation site, and a material for interaction with the laser beam at the irradiation site to create an EUV light emitting plasma for use in processing substrates.08-11-2011
20100032590Debris protection system having a magnetic field for an EUV light source - Devices are disclosed herein which may comprise a vessel; a material disposed in the vessel for creating an EUV light emitting plasma at a plasma site, the plasma generating debris; a near normal incidence EUV reflective optic disposed in the vessel; and a source of a magnetic field for deflecting debris in the vessel to protect the optic, the source positioned to interpose the optic between the source and the plasma site.02-11-2010
20100078578METHOD AND ARRANGEMENT FOR THE OPERATION OF PLASMA-BASED SHORT-WAVELENGTH RADIATION SOURCES - The invention is directed to a method for operating plasma-based short-wavelength radiation sources, particularly EUV radiation sources, having a long lifetime and to an arrangement for generating plasma-based short-wavelength radiation. It is the object of the invention to find a novel possibility for operating plasma-based short-wavelength radiation sources with a long lifetime which permits extensive debris mitigation without the main process of radiation generation being severely impaired through the use of buffer gas and without the need for substantial additional expenditure for generating partial pressure in a spatially narrowly limited manner. According to the invention, this object is met in that hydrogen gas as buffer gas (04-01-2010
20100117009EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE05-13-2010
20090267005Drive laser delivery systems for euv light source - An LPP EUV light source is disclosed having an optic positioned in the plasma chamber for reflecting EUV light generated therein and a laser input window. For this aspect, the EUV light source may be configured to expose the optic to a gaseous etchant pressure for optic cleaning while the window is exposed to a lower gaseous etchant pressure to avoid window coating deterioration. In another aspect, an EUV light source may comprise a target material positionable along a beam path to participate in a first interaction with light on the beam path; an optical amplifier; and at least one optic directing photons scattered from the first interaction into the optical amplifier to produce a laser beam on the beam path for a subsequent interaction with the target material to produce an EUV light emitting plasma.10-29-2009
20100072406GLASS COMPOSITION FOR ULTRAVIOLET LIGHT AND OPTICAL DEVICE USING THE SAME - A glass composition for ultraviolet light is provided. The glass composition for ultraviolet light contains Lu, Si, and O in an amount of 99.99 weight % or more in total. The glass composition contains Lu in an amount of 26% or more and 39% or less in cation percent and Si in an amount of 61% or more and 74% or less in cation percent.03-25-2010
20130032735LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS - A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.02-07-2013
20100044598Terahertz Laser Components And Associated Methods - Systems and methods for generating terahertz radiation include a pair of optical horns, each of which forms a gap at respective vertices thereof. The first horn is ruled such that an electron beam interacting with a grating period produces terahertz radiation. The horns are diametrically opposed to one another such that radiation exiting the first horn enters the second horn through the gaps. Systems and methods for generating terahertz radiation include generating and focusing an electron beam adjacent a vertex of an optical horn that is ruled with a grating period. Interaction between the electron beam and the grating period produces the terahertz radiation. A method of evaluating interaction between a material and terahertz radiation includes passing a sample of the material through the radiation. At least one of an effect of the radiation on the material, and an effect of the material on the radiation, is measured.02-25-2010
20090159819Pulse Modifier, Lithographic Apparatus and Device Manufacturing Method - A pulse modifier, and associated lithographic apparatus and a method for manufacturing a device, is disclosed. The pulse modifier is configured to receive an input pulse of radiation and further configured to emit a plurality of corresponding output pulse portions of radiation, wherein the respective pulse portions are respectively mirrored about an axis transverse to the optical axis and mirrored about a point of the optical axis of the pulse portions.06-25-2009
20100108918EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.05-06-2010
20100108917Ultraviolet light sanitizing method and apparatus - A unit, system, and method for disinfecting or sterilizing the entire surface area of an item. The system includes at least one ultraviolet light source producing ultraviolet light for disinfecting an item. In addition, the system including a cavity housing the ultraviolet light source, the cavity having a reflective interior for redirecting light produced by the at least one ultraviolet light source. Furthermore, the system including a shelf positioned above a bottom portion of the cavity to support the item, the shelf capable of passing light produced by the at least one ultraviolet light source therethrough to disinfect an entire surface area of the item.05-06-2010
20130026393CHAMBER APPARATUS, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR CONTROLLING THE EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a first optical system and a second optical system. The chamber has an inlet for introducing a laser beam thereinto. The target supply unit supplies a target material to a region inside the chamber. The first optical system focuses the laser beam in the region. The guide beam output device outputs a guide beam. The second optical system directs the guide beam such that an axis of a beam path of the guide beam substantially coincides with an axis of a beam path of the laser beam and such that the guide beam enters the focusing optical system through the region.01-31-2013
20080308753FLEXIBLE INFRARED DELIVERY APPARATUS AND METHOD - A flexible infrared delivery apparatus useful for endoscopic infrared coagulating of human or animal blood and tissue or for other uses employs a source of infrared radiation which is not a laser and an elongated flexible fiber optic member which transmits radiation from the source to a contact portion at a distal end of the member and to a material such as human or animal tissue proximate the contact portion. The elongated member has an outer diameter which enables it to be inserted into and through an accessory channel of an endoscope to view the human or animal tissue or material to be treated with infrared radiation. A connector on the proximal end of the member allows the elongated member to be quickly connected to and disconnected from the apparatus where the member is aligned for receiving infrared radiation from the source. The contact portion defines a size, direction and shape of a radiation delivery area from the member to the human or animal tissue or material proximate the contact portion.12-18-2008
20130087723DOWNHOLE SOURCES HAVING ENHANCED IR EMISSION - Light sources are provided with enhanced low-frequency (e.g., near infrared) emission. Some disclosed embodiments include a filament and at least one re-radiator element. The filament heats the re-radiator element to a steady-state temperature that is at least one quarter of the filament's absolute temperature. As disclosed herein, the increased surface area provided by the re-radiator element provides enhanced IR radiation from the light source. Patterning or texturing of the surface can further increase the re-radiator element's surface area. Various shapes such as disks, collars, tubes are illustrated and can be combined to customize the spectral emission profile of the light source. Some specific embodiments employ a coating on the bulb as the re-radiator element. The coating can be positioned to occlude light from the filament or to augment light from the filament, depending on the particular application. The various re-radiator elements can be positioned inside or outside the bulb.04-11-2013
20090045356UV IRRADIATOR - An apparatus having one or more UV bulbs arranged around a structural element and within an outer conductive element. The apparatus also contains an inner conductive element which extends the length of the apparatus. The inner and outer conductive elements are coupled to a microwave source to enable the UV bulbs to be powered.02-19-2009
20100327192Alignment Laser - A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.12-30-2010
20130048886CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.02-28-2013
20130048885LIGHTING MODULE HAVING A COMMON TERMINAL - A lighting module has an electrically conductive heat sink, an array of light-emitting elements mounted on and electrically connected to the conductive heat sink, a flex circuit mounted on the conductive sink, and conductive traces on the flex circuit, the conductive traces connected to the light-emitting elements. A lighting module has a heat sink, an array of light-emitting elements, each element having a cathode terminal and an anode terminal, wherein the heat sink is a common terminal for the elements.02-28-2013
20120217422EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.08-30-2012
20120112101Method and Arrangement for the Stabilization of the Source Location of the Generation of Extreme Ultraviolet (EUV) Radiation Based on a Discharge Plasma - The invention is directed to a method and an apparatus for stabilizing the source location during the generation of EUV radiation based on a discharge plasma. The object of finding a novel possibility for stabilizing the source location during the generation of EUV radiation which allows changes in position of the source location to be compensated in a simple manner during the operation of the radiation source is met according to the invention in that a first beam aligning unit (05-10-2012
20090267004EXCIMER RADIATION LAMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME - There is described an excimer radiation lamp assembly. The lamp assembly comprise a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.10-29-2009
20130062539APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS - An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.03-14-2013
20130062538EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus used with an external laser apparatus for generating extreme ultraviolet light includes a target storage unit for storing a target material, a nozzle unit having a through-hole in communication with the interior of the storage unit through which the target material is outputted, an electrode having a through-hole facing the nozzle unit, and a target detector for detecting a target formed of the target material and outputting a detection signal. A direct current voltage adjuster applies and adjusts a direct current between the target material and the electrode, a pressure adjuster applies and adjusts a pressure to the target material through gas, and a controller controls at least one of the direct current voltage adjuster and the pressure adjuster based on the detection signal from the target detector.03-14-2013
20110037002ENERGY EMITTING TREATMENT DEVICE - In one aspect, the present application is directed to a radiant energy emitting device. The radiant energy emitting device comprises (A) an outer housing including at least one aperture there through, the housing being operationally configured to (1) receive and contain radiant energy therein, and (2) emit radiant energy out through the aperture to a target surface; (B) an energy emission means; and (C) a sensor means disposed about the aperture of the housing, the sensor means being in communication with the energy emission means and operationally configured to detect the spatial relationship between the sensor means and the target surface, said spatial relationship determining activation of the energy emission means.02-17-2011
20130161542RADIATION SOURCE WITH CLEANING APPARATUS - A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H06-27-2013
20130161541TERAHERTZ WAVE GENERATOR AND METHOD OF GENERATING TERAHERTZ WAVE - Disclosed is a terahertz wave generator which includes a first light source outputting a first light having a first frequency; a second light source outputting a second light having a second frequency different from the first frequency; a second harmonic generation unit performing second harmonic conversion on the first and second lights to generate a third light and a fourth light; and a photomixer converting a mixing light of the third and fourth lights into a terahertz wave alternating signal and outputting a terahertz wave.06-27-2013
20130161540EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light (EUV) includes a chamber, a target supply unit, a collector mirror, an exhaust device, a gas supply device and an ultraviolet light source. The target supply unit supplies a target material to a predetermined region inside the chamber. The collector mirror collects EUV light generated from the target material. The exhaust device is connected to the chamber. The gas supply device is connected to the chamber to supply an etchant gas into the chamber. The ultraviolet light source irradiates a reflective surface of the collector mirror with ultraviolet light.06-27-2013
20130068971ELECTROMAGNETIC WAVE EMISSION DEVICE - An electromagnetic wave emission device includes a nonlinear crystal, a prism, and a cylindrical lens. The nonlinear crystal has an optical waveguide, receives exciting light having at least two wavelength components, and outputs an electromagnetic wave having a frequency equal to or more than 0.01 [THz] and equal to or less than 100 [THz] by means of the Cherenkov phase matching. The prism includes an electromagnetic wave input surface receiving the electromagnetic wave from the optical waveguide and an electromagnetic wave transmission surface through which the electromagnetic wave which has entered from the electromagnetic wave input surface passes. The cylindrical lens has two bottom surfaces opposed to each other, a flat surface intersecting with the two bottom surfaces, and a curved surface intersecting with the two bottom surfaces and the flat surface, wherein the flat surface is in contact with the electromagnetic wave transmission surface.03-21-2013
20120235067TUNABLE INFRARED EMITTER - Provided are methods of tuning the emission wavelength from a tunable infrared plasmonic emitting structure, which structure comprises: (a) a perforated or patterned first conductive layer having a plurality of relief features provided in a periodic spatial configuration, wherein the relief features are separated from each other by adjacent recessed features, wherein the distance between features is between 1-15 μm; (b) a dielectric layer underlying the first conductive layer; (c) a second conductive layer underlying the dielectric film; and (d) a substrate underlying the second conductive layer; wherein the emission wavelength is tuned by applying a force in a biaxial direction parallel to the substrate, changing the distance between relief features, or changing the resistivity and dielectric constant of the dielectric layer.09-20-2012
20120235066DRIVE LASER DELIVERY SYSTEMS FOR EUV LIGHT SOURCE - An EUV light source is disclosed herein which may comprise a droplet generator producing a stream of target material droplets, a first optical gain medium amplifying light on a first beam path without a seed laser providing a seed laser output to the first beam path, a second optical gain medium amplifying light on a second beam path without a seed laser providing a seed laser output to the second beam path, and a beam combiner combining light from the first beam path and the second beam path for interaction with a target material droplet to produce EUV light emitting plasma.09-20-2012
20120223257EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.09-06-2012
20100171050METHOD FOR REGENERATING A SURFACE OF AN OPTICAL ELEMENT IN AN XUV RADIATION SOURCE, AND XUV RADIATION SOURCE - Method for regenerating a surface of an optical element in a radiation source for electromagnetic radiation with a wavelength in the extreme ultraviolet wavelength range, H (EUV, XUV) in particular with a wavelength in the wavelength range between 10 nm and 15 nm, this radiation source comprising at least a chamber for arranging therein a plasma generating XUV or EUV radiation and the optical element, in particular a collector for bundling XUV or EUV radiation generated by the plasma and causing it to exit the chamber, according to which method a first Si, C or metal compound is arranged in the chamber which reacts in an equilibrium reaction with the material of the surface of the collector to form respectively a second Si, C or metal compound bonded to this surface, and XUV or EUV radiation source adapted for such a method.07-08-2010
20090065716SHOE SANITIZER - Introducing ultraviolet (UV) light (03-12-2009
20100006780Method and Apparatus for Enhanced Terahertz Radiation from High Stacking Fault Density - A method and device for generating terahertz radiation comprising a polar crystal material layer operative to emit terahertz radiation; the polar crystal material layer comprising a plurality of stacking faults; the stacking faults lying substantially perpendicular to the polar axis and forming boundaries at which the internal electric polarization terminates leading to charges accumulating at the boundaries, and creation of internal electric fields oriented along the polar axis; a pulsed radiation source for creating photogenerated carriers in the polar crystal material; whereby the photogenerated carriers accelerate in the internal electric fields associated with the termination of the internal electric polarization by the stacking faults to thereby generate terahertz radiation.01-14-2010
20090206283ELECTRON EMISSION DEVICE OF HIGH CURRENT DENSITY AND HIGH OPERATIONAL FREQUENCY - An electric device operable with a THz-range frequency of the device output is presented. The device comprises a photocathode installed in either one of a diode, triode and tetrode configuration, and is exposed to illumination. In some embodiments of the invention, the device is configured as a diode and photomixing is used for illumination of the photocathode with light in the THz range, the diode converting this input light signal into an electrical output in the THz range, which operates a signal transmitter/receiver. In some other embodiments of the invention, the device is configured as a triode or tetrode, where the electrodes have small dimensions (about 1 micron or less) and are spaced from one another a distance not exceeding 1 micron. The photocathode is kept under certain illumination, and electrical signal applied to one of the electrodes results in the THz output at one of the other electrodes.08-20-2009
20110284775CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.11-24-2011
20110284774TARGET OUTPUT DEVICE AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - A target output device may include: a main body for storing a target material; a nozzle unit, connected to the main body, for outputting the target material as a target; an electrode unit provided so as to face the nozzle unit; a voltage control unit that applies predetermined voltage between the electrode unit and the target material to generate electrostatic force therebetween for pulling out the target material through the nozzle unit; a pressure control unit that applies predetermined pressure to the target material; and an output control unit that causes the target to be outputted through the nozzle unit by controlling signal output timing of each of a first timing signal and a second timing signal, the first timing signal causing the voltage control unit to apply the predetermined voltage between the target material and the electrode unit at first timing, and the second timing signal causing the pressure control unit to apply the predetermined pressure to the target material at second timing.11-24-2011
20120104291COMPOSITION FOR PRODUCING A FILTER MATERIAL FOR RADIATION, METHOD FOR PRODUCING A COMPOSITION FOR A FILTER MATERIAL, MATERIAL FOR FILTERING RADIATION, AND AN OPTOELECTRONIC DEVICE COMPRISING THE MATERIAL - Composition for producing a filter material for radiation includes a silicone and at least one dye dispersed in the silicone, wherein the composition has a relative transmission of less than 20% for radiation of the wavelength of 400 nm to 700 nm, and has a relative transmission of greater than 50% for radiation of the wavelength of 850 nm to 1025 nm.05-03-2012
20100090133EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.04-15-2010
20110168925Source-collector module with GIC mirror and LPP EUV light source - A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.07-14-2011
20110297852MIRROR AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.12-08-2011
20090146085Compact high-power pulsed terahertz source - A sub-mm wave source based on Cherenkov resonant radiation of a microbunched electron beam radiating coherently in a dielectric-loaded pipe. The microbunched electron beam is produced in a pulse photoinjector by illuminating a metal photocathode with sub-ps or multi-ps intensity-modulated laser beam with a beat wave or multiplexing at terahertz frequencies, the photoelectrons generated at the photocathode being accelerated by an electric field and sub-wavelength focused by magnetic field to propagate through a resonant radiator comprising a corrugated wall or smooth-wall metal capillary pipe internally coated with dielectric and attached to an antenna.06-11-2009
20120097869EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 04-26-2012
20100032589SYSTEM AND METHOD FOR GERMICIDAL SANITIZING OF AN ELEVATOR OR OTHER ENCLOSED STRUCTURE - A system for sanitizing an enclosed structure comprises a first sensor, a second sensor, a third sensor, a germicidal ultraviolet light source, a motor, and a controller. The first sensor detects the presence of humans or animals within the enclosed structure. The second sensor detects the position of at least one door of the enclosed structure. The third sensor detects tampering with the system. The ultraviolet light source provides electromagnetic radiation in the ultraviolet range. The motor moves the ultraviolet light source from an inactive position to an active position and from the active position to the inactive position. The controller receives inputs from the first sensor, the second sensor, and the third sensor, and transmits outputs to the ultraviolet light source and the motor. When the controller receives signals that no humans or animals are present in the enclosed structure and that the door is in a closed position, the controller transmits a signal to the motor to move the ultraviolet light source from the inactive position to the active position and a signal to activate the ultraviolet light source. If humans or animals are detected to be present in the enclosed structure or if the door is detected to be open, then the controller deactivates the ultraviolet light source and repositions the ultraviolet light source.02-11-2010
20120286176DROPLET GENERATOR WITH ACTUATOR INDUCED NOZZLE CLEANING - Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.11-15-2012
20090084992METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION AND AN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 1004-02-2009
20090014668Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave - A plasma generating system is disclosed having a source of target material droplets, e.g. tin droplets, and a laser, e.g. a pulsed CO01-15-2009
20120025109EXTREME ULTRAVIOLET LIGHT SOURCE WITH A DEBRIS-MITIGATED AND COOLED COLLECTOR OPTICS - The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (02-02-2012
20090184267IRRADIATION DEVICE - Radiation apparatus for technical use, with a large number of stretched-out radiation sources emitting in or between the UV and IR ranges and a large number of main reflector segments that are bent and/or folded out of metal sheet in a shape adapted to that of the radiation sources, while the main reflector segments are formed as separate main reflectors and are held, singly replaceable and independently of the radiation sources, in a radiation source housing.07-23-2009
20110079737EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE - The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.04-07-2011
20100078577Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method of adjusting laser light source device for extreme ultraviolet light source device - An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.04-01-2010
20100078579EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.04-01-2010
20090090877MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.04-09-2009
20080272317PLASMA-BASED EUV LIGHT SOURCE - Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.11-06-2008
20080210889Extreme ultra violet light source apparatus - An EUV light source apparatus capable of preventing deterioration and/or breakage of a filter for filtering EUV light. The EUV light source apparatus includes an EUV generation chamber in which EUV light is generated; a target material supply unit for supplying a target material into the EUV light generation chamber; a laser source for applying a laser beam to the target material supplied into the EUV light generation chamber to generate plasma; collection optics for collecting EUV light radiated from the plasma; a filter for filtering the EUV light collected by the collection optics; and a filter protecting member provided between the plasma and the filter, for protecting the filter by blocking flying matter flying from the plasma toward the filter.09-04-2008
20100090132EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.04-15-2010
20090272919Exreme ultraviolet light source apparatus - An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.11-05-2009
20110198515TERAHERTZ RADIATION DEVICE AND METHOD OF GENERATING TERAHERTZ RADIATION - A method and device for generating terahertz radiation comprising a substrate; a plurality of segments of polar crystal material formed on the substrate, the segments having an internal electric polarization; each segment comprising at least two edges oriented substantially perpendicular to the polar axis such that the electric polarization terminates at the edges and the segment comprises a majority of positive charges on one edge and a majority of negative charges on the opposite edge thereby leading to creation of an internal electric field; whereby when irradiated by a pulsed source of duration less than one picosecond, electron-hole pairs are generated within the segments and the internal electric field separates and accelerates the electron-hole pairs to thereby produce terahertz radiation.08-18-2011
20080277600Irradiation Unit - The invention relates to an irradiation unit for the UV irradiation of particularly web-shaped substrates, comprising a housing (11-13-2008
20090166568Method and Apparatus For Electromagnetic Emission By Reactive Composite Materials - A device and method for emitting electromagnetic radiation utilizing a reactive composite material (RCM) as an emission source. By selective modification of the reactive composite material (RCM), attributes of the emitting device, including the ability to produce specific radiation intensity levels at specific electromagnetic wavelengths, the ability to emit for a specific duration, the avoidance of dangerous reaction products, portability, geometric design flexibility, and simple, safe storage may be selected.07-02-2009
20090261277Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.10-22-2009
20110140009Efficient High-Harmonic-Generation-Based EUV Source Driven by Short Wavelength Light - Extreme ultraviolet radiation is generated based on high-order harmonic generation. First, a driver pulse is generated from a drive laser. Second, the infrared driver pulse is passed through a second harmonic generator with an output wavelength in the range from 400 to 700 nm. Third, the pulse is then passed through a gas medium, which can be inside a resonant cavity, to generate a high-order harmonic in the form of extreme ultraviolet radiation.06-16-2011
20110140008Beam Transport System for Extreme Ultraviolet Light Source - An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.06-16-2011
20110266467EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.11-03-2011
20080283779DEVICE FOR THE GENERATION OF A GAS CURTAIN FOR PLASMA-BASED EUV RADIATION SOURCES - The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.11-20-2008
20080308752UV TRANS-ILLUMINATOR - A UV (Ultra Violet) trans-illuminator includes a UV irradiating unit composed of a plurality of CCFLs (Cold Cathode Fluorescent Lamps) or EEFLs (External Electrode Fluorescent Lamps) arranged at intervals of 1.0 cm to 3.0 cm and having a diameter of 3 mm to 8 mm so as to irradiate UV rays from an upper surface thereof, and a light dispersing unit disposed at a distance of 1 cm to 7 cm from the upper surface of the UV irradiating unit and dispersing the UV rays irradiated from the UV irradiating unit. This UV trans-illuminator has a slim design, excellent uniformity and small elapsed time change.12-18-2008
20130119280BROADBAND INFRARED LIGHT EMITTING DEVICE - [PROBLEM] There is provided a broadband infrared light emitting device that radiates infrared light having a band broader than a conventional broadband infrared light emitting device.05-16-2013
20100264336GAS DISCHARGE SOURCE, IN PARTICULAR FOR EUV-RADIATION - The present invention relates to a gas discharge source, for generating EUV radiation and/or soft X-radiation, comprising at least two electrode bodies (10-21-2010
20110006229LENSES, OPTICAL SOURCES, AND THEIR COUPLINGS - A lens may operate in the mid-IR spectral region and couple highly divergent beams into highly collimated beams. In combination with a light source having a characteristic output beam, the lens may provide highly stable, miniaturized mid-IR sources that deliver optical beams. An advanced mounting system may provide long term sturdy mechanical coupling and alignment to reduce operator maintenance. In addition, devices may also support electrical and thermal subsystems that are delivered via these mounting systems. A mid-IR singlet lens having a numerical aperture greater than about 0.7 and a focal length less than 10 mm may be combined with a quantum well stack semiconductor based light source such that the emission facet of the semiconductor lies in the focus of the lens less than 2 mm away from the lens surface. Together, these systems may provide a package that is highly portable and robust, and easily integrated with external optical systems.01-13-2011
20100140513EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus has a magnetic field generator which generates a magnetic field region around a direction of the magnetic field passing through a plasma region in which a plasma is to be generated and converges charged particles including ion emitted from the plasma region toward the direction of the magnetic field, a first charged particle collector (receiver) mounted at both sides of an axis of the magnetic field in the magnetic field region in order to collect (receive) the charged particles converged by the magnetic field, a target supply unit supplying a target from a nozzle located outside a converging region in which the charged particles are to be converged inside the magnetic field region in an extreme ultraviolet light generating chamber, and a target collector located at a position opposite to the nozzle, the target retrieval portion retrieving a residual target which does not contribute to generation of the plasma.06-10-2010
20110220816EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.09-15-2011
20090294699METHOD FOR INFLUENCING AN ENERGY STATE OF A RADIATION SOURCE - A method is provided for influencing an energy state of a radiation source. In order to provide a method that in a simple manner influences the energy state of a radiation source in a high-pressure metal vapour lamp, for the increase or decrease of the energy of the radiation source at least one energy sink is introduced into the direction of propagation of the electromagnetic radiation the radiation sources.12-03-2009
20090184268DISINFECTING DEVICE UTILIZING ULTRAVIOLET RADIATION - A disinfecting device is presented having a UV light source for radiation of a cleaning medium to eradicate the medium of infestation agents such as molds, viruses, bacteria and dust mites. The device enhances the disinfection of the medium by providing mechanisms for enhanced penetration of the UV light into the cleaning medium. The device also offers enhanced heat dissipation to promote effective use of the device. Also provided are safety mechanisms to promote the safe and advantageous use of the UV device.07-23-2009
20100200777DEVICE FOR CONTROLLING TEMPERATURE OF AN OPTICAL ELEMENT - A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling part. Further, the device comprises a heating part for heating the optical element. The heating part is connected to the controller for controlling the temperature of the heating part. The resulting device for controlling temperature in particular can be used with an optical element in a EUV microlithography tool leading to a stable performance of its optics.08-12-2010
20100200776EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material.08-12-2010
20090045357Contamination barrier and lithographic apparatus comprising same - A rotatable contamination barrier is disclosed that has a plurality of closely packed blades configured to trap contaminant material coming from a radiation source. The blades are radially oriented relative to a central rotation axis of the contamination barrier. The blades comprise a metal compound having crystals oriented generally radially relative to the central rotation axis.02-19-2009
20090146086SYSTEM AND APPARATUS FOR DERMATOLOGICAL TREATMENT - Exemplary embodiments of system and apparatus can be provided for treating various dermatological and biological conditions using electromagnetic energy in the form of optical radiation. For example, energy can be provided by a chemical reaction, such as by combustion of a fine metallic filament, which can be used to generate a high-intensity pulse of energy without requiring external energy sources. Various parameters of the reactive materials and enclosures can be selected and/or applied to provide a radiation pulse having particular characteristics, including fluence, peak intensity, and radiation wavelength distribution. Various filters may be provided to further modify characteristics of the radiation. Such radiation pulses can be used to irradiate tissue such as skin to obtain various therapeutic or beneficial effects, including improvement in the appearance of pigmented or venous lesions.06-11-2009
20090127480METHODS AND APPARATUS FOR GENERATING ULTRAVIOLET LIGHT - A housing for an elongate electrodeless bulb which is energiseable by an rf field such as a microwave field, preferably at or around 2.45 GHz. The housing is constructed of electrically conductive material and is arranged to have a substantially unobstructed opening through which the bulb is visible from outside the housing, and the housing is arranged to hold the bulb in a position which is recessed into the housing such that in use, the bulb is energized by virtue of its position within the housing and adjacent surrounding conductive parts of the housing substantially attenuate the rf field near the opening so that the rf field strength outside the housing is substantially zero whereby visible light or UV light is freely allowed out through the opening.05-21-2009
20090212241LASER HEATED DISCHARGE PLASMA EUV SOURCE - A self-magnetically confined lithium plasma which also may have an applied axial magnetic field is irradiated at sub-critical density by a carbon dioxide laser to generate extreme ultraviolet photons at the wavelength of 13.5 nm with high efficiency, high power and small source size.08-27-2009
20120104290EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.05-03-2012
20120104289DROPLET GENERATION AND DETECTION DEVICE, AND DROPLET CONTROL DEVICE - A droplet generation and detection device may include: a droplet generation unit for outputting a charged droplet; at least one droplet sensor including a magnetic circuit including a coil configured of an electrically conductive material, the magnetic circuit being disposed such that the charged droplet passes around the magnetic circuit, and a current detection unit for detecting current flowing in the coil and outputting a detection signal; and a signal processing circuit for detecting the charged droplet based on the detection signal.05-03-2012
20080315132Flat Uv Light Source - A flat UV light source has a tight packing of UV light-emitting diodes (12-25-2008
20080315133Uv Irradiation Unit - The invention relates to a UV irradiation unit comprising a housing (12-25-2008
20090095925LPP EUV light source drive laser system - An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy is not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO04-16-2009
20090250641Extreme ultra violet light source apparatus - An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.10-08-2009
20120193554Optical Crystal and Terahertz Wave Generation Device and Method - An optical crystal includes a first non-linear optical crystal that generates terahertz waves corresponding to a difference frequency component in incident light with two different wavelengths by a difference frequency generation, and a second non-linear optical crystal that generates terahertz waves corresponding to a difference frequency component in incident light with two different wavelengths by a difference frequency generation, the second non-linear optical crystal being different in material from the first non-linear optical crystal, and the first non-linear optical crystal and the second non-linear optical crystal being disposed in contact or close together.08-02-2012
20100181504Ultra-Violet Lamp and Reflection/Shield Assembly - An ultra-violet lamp and reflector/shield assembly designed to be mounted in a commercial HVAC, and to other types of A/C units is described herein. The reflector/shield includes a reflective inner surface creating an illumination pattern and an outer surface shielding the UV lamp from the air flow. An orienting and securing assembly for a UV lamp is also described herein.07-22-2010
20090072168Radical cleaning arrangement for a lithographic apparatus - A cleaning arrangement is configured to clean an EUV optic of an EUV lithographic apparatus. The partial radical pressure ranges between 0.1-10 Pa. The cleaning arrangement can be configured inside a cleaning cocoon of the lithographic apparatus for offline cleaning. It can also be configured at particular positions inside the apparatus to clean nearby optics during production. In the pressure range of 0.1-10 Pa the penetration of atomic hydrogen into the optical devices is high, while the recombination to molecular hydrogen and hydrogen consumption is limited.03-19-2009
20090072167EXPOSURE APPARATUS, LIGHT SOURCE APPARATUS AND DEVICE FABRICATION - An exposure apparatus for exposing a pattern of a mask onto an object, said exposure apparatus includes a light source for generating a plasma, said light source including a condenser mirror that condenses a light irradiated from the plasma, an illumination optical system for illuminating the mask using the light condensed by the condenser mirror, a detector that is provided between the condenser mirror and the illumination optical system, said detector detecting a property of the light, and a changing part for changing a state of the plasma based on a detected result of the detector.03-19-2009
20090072165FLEXIBLE WORK AND UTILITY LAMP - A rope light is provided comprising a plurality of infrared lamps that enable a user to stealthily operate the light under cover of darkness. The method of using the rope light comprises either signaling to an observer or operating on a workpiece. The rope light can be positioned to signal information such as the outlines of a runway or supply drop point. The observer, using appropriate goggles or other visualization devices, can then detect such signals. The rope light provided can also be used to operate on such things as an automobile engine under cover of darkness. The rope light can be flexibly positioned in such things as engine compartments to flood the compartment with infrared light, enabling a person to repair a workpiece such as an engine. Other embodiments use a rope light that radiates light visible to the human eye for both signaling and operating on a workpiece.03-19-2009
20090072166Infra-red lighting system and device - A chemiluminescent system and device is disclosed wherein a first polymeric sheet having a shaped cavity therein is sealed around its periphery to a second polymeric sheet and the cavity contains a cured PVC plastisol having admixed an oxalate solution and finely divided semiconductor laser crystals and a sealed receptacle containing a liquid component of a chemiluminescent activator. Placed over the plastisol or container is a light filter having a dye or dyes, pigment or pigments compounded into the filter, the dyes or pigments are chosen from those that absorb certain parts of the spectrum such that all light emissions up to 1050 nm are absorbed and anything beyond 1050 nm is transmitted. The devices generate a chemiluminescent light at wavelengths chosen to stimulate the semiconductor laser crystals. The semiconductor laser crystals absorb the chemiluminescent light and re-emit energy at wavelengths in the IR. By choosing the proper light absorbing dyes or pigments in the filter element, the emitted wavelength(s) that the activated device emits can be between 1 micron and 2.5 microns but no visible light.03-19-2009
20090314967EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.12-24-2009
20100193712EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF ADJUSTING THE SAME - An extreme ultraviolet light source apparatus includes a main body including a supply section to which an extreme ultraviolet radiation seed is supplied, and an emission part configured to emit extreme ultraviolet, an excitation unit provided in the main body and configured to generate a plasma by exciting the extreme ultraviolet radiation seed, an optical condensing unit provided in the main body and configured to converge extreme ultraviolet, which is radiated from the plasma, at the emission part, a trap provided between the excitation unit and the optical condensing unit, a first positioning mechanism connected to the trap and configured to adjust at least one of a position and an angle of the trap, and a measuring unit configured to measure a far field distribution image of the plasma on the basis of the extreme ultraviolet which is emitted from the emission part, thereby to operate the first positioning mechanism.08-05-2010
20100193709Apparatus and Method for Sanitizing Feet and the External Surfaces of Footwear - A disinfecting device for objects such as shoes or human body parts such as feet. The device employs light radiating from a cavity below a transparent platform, to contact and disinfect surfaces on objects placed on a top surface of the platform. The spectral range of the light is adapted to disinfect the surface with Ultra Violet light being a preferred spectral range. An upper housing may be provided above the platform to protect the user's eyes from UV radiation which is substantially indiscernible to the human eye and as a housing for a reflective means to reflect disinfecting light communicating through the transparent platform, back toward the top surfaces of the object on the platform. A signal component for user safety such as a visible light emitter, an audible alarm, or vibration of the platform may be employed to provide the user a means to ascertain emanating UV light during operation of the device.08-05-2010
20100176312EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In a laser produced plasma type extreme ultra violet light source apparatus, charged particles such as ions emitted from plasma can be efficiently ejected by the action of a magnetic field and secondary production of contaminants can be suppressed. The extreme ultra violet light source apparatus includes: a target nozzle for supplying a target material; a laser oscillator for applying a laser beam to the target material supplied by the target nozzle to generate plasma; an EUV collector mirror for collecting extreme ultra violet light radiated from the plasma; and an electromagnet for forming a magnetic field in a position where the laser beam is applied to the target material, wherein an aperture of the electromagnet is formed according to a shape of lines of magnetic flux of the magnetic field.07-15-2010
20100176313Extreme ultraviolet light source - An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.07-15-2010
20100193710LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a laser apparatus having a master oscillator outputting one or more longitudinal-mode-laser lights, an amplifier with a molecular gas as an amplifying agency amplifying a longitudinal-mode laser light of which wavelength is included in one of amplifiable lines, and a controller adjusting the master oscillator so that the wavelength of the longitudinal-mode laser light outputted from the master oscillator is included in one of the amplifiable lines, the laser apparatus being used as a driver laser, wherein the laser apparatus irradiates a target material with a laser light for generating plasma, and the extreme ultraviolet light is emitted from the plasma and outputted from the extreme ultraviolet light source apparatus.08-05-2010
20100213395EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an extreme ultraviolet light source apparatus generating an extreme ultraviolet light from a plasma generated by irradiating a target, which is a droplet D of molten Sn, with a laser light, and controlling the flow direction of ion generated at the generation of the extreme ultraviolet light by a magnetic field or an electric field, an ion collection cylinder 08-26-2010
20100148094RADIATION SOURCE CARTRIDGE AND MODULE CONTAINING SAME - There is disclosed an elongate radiation source cartridge. The cartridge comprises: (i) an elongate radiation source assembly having a proximal portion and distal portion, the distal portion of the elongate radiation source assembly being unsupported, (ii) a housing coupled to the proximal portion of the elongate radiation source assembly, and (iii) a power supply disposed within the housing, the power supply in electrical communication with the elongate radiation source assembly (in certain embodiments the power supply is optional). The elongate radiation source assembly and the housing are in substantial alignment with respect to a longitudinal axis of the elongate radiation source cartridge.06-17-2010
20100140514Gas management system for a laser-produced-plasma EUV light source - Devices and corresponding methods of use are described herein which may comprise an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.06-10-2010
20100243922EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus generating an extreme ultraviolet light from plasma generated by irradiating a target material with a laser light within a chamber, and controlling a flow of ions generated together with the extreme ultraviolet light using a magnetic field or an electric field, the extreme ultraviolet light source apparatus comprises an ion collector device collecting the ion via an aperture arranged at a side of the chamber, and an interrupting mechanism interrupting movement of a sputtered particle in a direction toward the aperture, the sputtered particle generated at an ion collision surface collided with the ion in the ion collector device.09-30-2010
20100078580Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.04-01-2010
20100127191Systems and methods for drive laser beam delivery in an euv light source - An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.05-27-2010
20110057126EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.03-10-2011
20090114854DISINFECTING DEVICE UTILIZING ULTRAVIOLET RADIATION - A disinfecting device is presented having a UV light source for radiation of a cleaning medium to eradicate the medium of infestation agents such as molds, viruses, bacteria and dust mites. The device enhances the disinfection of the medium by providing mechanisms for enhanced penetration of the UV light into the cleaning medium. The device also offers enhanced heat dissipation to promote effective use of the device. Also provided are safety mechanisms to promote the safe and advantageous use of the UV device.05-07-2009
20080230726FOIL TRAP AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE USING THE FOIL TRAP - An extreme ultraviolet (EUV) light source device and foil trap, the device including a vessel; an EUV radiating species supply means that feeds an extreme ultraviolet radiating species into the vessel; a discharge part with discharge electrodes that heat and excite the EUV radiating species and generate a high-temperature plasma; a collector mirror collecting EUV radiation emitted from the plasma; the foil trap installed between the discharge part and the mirror; an extractor part extracting the collected radiation; and an evacuation means exhausting and regulating pressure within the vessel. The foil trap includes foils extending radially from a main axis thereof to capture debris from the light source, while allowing the emitted radiation to pass through a region thereof to the mirror. A length of at least part of the foils in directions parallel to the main axis is shorter in positions close to the main axis than distant therefrom.09-25-2008
20100294958APPARATUS AND METHOD FOR MEASURING AND CONTROLLING TARGET TRAJECTORY IN CHAMBER APPARATUS - An apparatus for measuring and controlling a target trajectory within a chamber apparatus for generating extreme ultraviolet light from plasma generated by irradiating a droplet target supplied from a target injection nozzle with a driver laser beam from an external driver laser. The apparatus includes: a nozzle adjustment mechanism for adjusting at least one of a position and an angle of the target injection nozzle; a target trajectory measuring unit for measuring a target trajectory to obtain trajectory information on the target trajectory; a target trajectory angle detecting unit for obtaining a value related to an angle deviation between the target trajectory represented by the trajectory information and a predetermined target trajectory; and a nozzle adjustment controller for controlling the nozzle adjustment mechanism based on the value related to the angle deviation such that the droplet target passes through a predetermined laser beam irradiation position.11-25-2010
20100276612TERAHERTZ EMITTERS - A tunable radiation emitting structure comprising a discontinuous conducting interface having periodic or quasi-periodic features, wherein the structure emits narrowband terahertz radiation when heated is disclosed.11-04-2010
20110127450Laser-Heated Infrared Source - Described are infrared light sources and methods for generating infrared radiation. The infrared light source includes a source of laser radiation, a target and an enclosure. The target is positioned in a path of an output region of the source of laser radiation. The target includes an absorbing material that absorbs radiation at a wavelength within the lasing spectrum of the source of laser radiation and converts the absorbed radiation into thermal energy. The enclosure defines a cavity that includes the target. The enclosure includes an infrared reflecting film on a side that defines the cavity.06-02-2011
20110240890Extreme Ultraviolet Light Source - An apparatus includes a light source having a gain medium for producing an amplified light beam of a source wavelength along a beam path to irradiate a target material in a chamber and to generate extreme ultraviolet light; and a subsystem overlying at least a portion of an internal surface of the chamber and configured to reduce a flow of light at the source wavelength from the internal surface back along the beam path.10-06-2011
20090065715Universal ultraviolet/ IR/ visible light emitting module - A miniature, battery operated plastic module designed to project at least three different frequencies of energy from light emitting diodes is described. A first frequency is between 390 nm-420 nm just above harmful Ultraviolet Frequencies, a second frequency is between 850 nm-1200 nm in the infrared band and a third frequency is for a visible white light. The light emitting module has a base unit, the unit including a pulsed LED that emits an ultraviolet wavelength of light adapted to focus on a surface having phosphorescence means on the surface to activate the phosphorescence. The light emitting module may also have a base unit which includes a pulsed LED that emits an infrared wavelength of light adapted to penetrate a particular atmosphere. The module may also provide optional power for external items in addition to the three frequencies.03-12-2009
20110031417TERAHERTZ WAVE GENERATOR AND METHOD OF GENERATING HIGH-POWER TERAHERTZ WAVES USING THE SAME - The present invention relates to a terahertz wave generator and a method of generating high-power terahertz waves using the terahertz wave generator. The terahertz wave generator includes a hollow spherical body, and a focusing lens installed in a cutout portion of the spherical body or an opening formed in the cutout portion, wherein an inner surface of the spherical body is coated with metal. In the method, frequencies having different levels are incident through the focusing lens or the opening to generate a plurality of air plasmas, and the air plasmas cause continuous focusing the metal-coated inner surface and hollow space of the spherical body, thus generating high-power terahertz waves.02-10-2011
20120228527EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.09-13-2012
20120228525SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result.09-13-2012
20130153792DROPLET GENERATOR STEERING SYSTEM - Steering system for a droplet generator in a EUV system. The steering system permits controlled positioning of a droplet release point of the droplet generator. A movable member holding the droplet generator is coupled to stationary elements of the EUV system through a coupling system having a first subsystem that constrains lateral translation of the movable member, and a second subsystem that controls a relative inclination of the movable member. The first and second subsystems preferably include one or a combination of flexures that permit highly precise and repeatable positioning.06-20-2013
20100171049Extreme ultraviolet light source apparatus - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.07-08-2010
20100163757Pulse Modifier with Adjustable Etendue - A beam modifying unit increases both temporal pulse length and Etendue of an illumination beam. The pulse modifying unit receives an input pulse of radiation and emits one or more corresponding output pulses of radiation. A beam splitter divides the incoming pulse into a first and a second pulse portion, and directs the first pulse portion along a second optical path and the second portion along a first optical path as a portion of an output beam. The second optical path includes a divergence optical element. A first and a second mirror, each with a radius of curvature, are disposed facing each other with a predetermined separation, and receive the second pulse portion to redirect the second portion, such that the optical path of the second portion through the pulse modifier is longer than that of the first portion, and the separation is less than radius of curvature.07-01-2010
20100252755Infrared emitter - An infrared emitter for use with self-propelled aerial targets used to simulate jet aircraft for use as a target for anti-aircraft missile systems. The emitter provides an infrared source that simulates the infrared energy produced by an aircraft. The emitter incorporates a network of platinum beads that are arranged along and between a plurality of parallel stainless steel screens. The network is contained in a heating conduit that is secured to a housing. The housing is provided with an opening to allow for attachment to the exhaust ports of a self-propelled aerial target's engine. Combustion gases produced by the aerial target's engine are expelled through the exhaust port and pass through to the emitter. The gases heat the network of beads and screens thereby causing the network to emit an infrared signature such that the heat seeking/sensing mechanisms of anti-aircraft missiles systems are able to locate and direct the missile to the target. The technology is also applicable to surface targets for both marine and land applications.10-07-2010
20100193711EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM - An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.08-05-2010
20110210273UV LAMP - The invention relates to an UV lamp (09-01-2011
20100012862Mechanism of adjusting irradiating angle for a far infrared radiator - A mechanism of adjusting irradiating angle for a far infrared radiator includes an elbow connected between a joint and an irradiating hood and provided with a stage of corrugated flexible tube. The elbow has a combining end portion connected with the flexible tube for combining with the irradiating hood, with a locking slot formed in a surface of the combining end portion for being tightly fitted with a screw. So the corrugated flexible tube can be bent with diverse angles; the irradiating hood can be circularly rotated; and the joint can let the elbow swing up and down. The irradiating hood can be thus adjusted to randomly shift its irradiating angle without difficulty or any dead angle caused01-21-2010
20090218522EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.09-03-2009
20090218521Gaseous neutral density filters and related methods - Gaseous neutral density (ND) filters are disclosed that produce a stream of gas to interact with and thereby attenuate a beam of extreme ultraviolet (EUV) radiation. The gaseous ND filter can be located in a system that receives the beam of EUV radiation from an EUV source and delivers the beam to a downstream EUV optical system, wherein the beam passes through the gaseous ND filter between the source and the optical system. The stream of gas used in the gaseous ND filter can be discharged at a supersonic velocity and the gas can be a single gas or a mixture of gases. An exemplary mixture of gases includes xenon and argon gases.09-03-2009
20120241650TARGET SUPPLY UNIT AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply unit may include: a target storage unit for storing a target material thereinside; a target output unit having a through-hole formed therein, through which the target material stored inside the target storage unit is outputted; an electrode having a through-hole formed therein arranged to face the target output unit, the electrode being coated with an electrically conductive material at least on a part of a surface facing the target output unit; and a voltage generator for applying a voltage between the target material and the electrode.09-27-2012
20110101252 Method of protection of human (livestock) from bites of blood-sucking insects. - The method of protection of human (livestock) from bites of blood-sucking insects which based on fact, that mosquitoes and other blood-sucking insects have principally infrared vision and actively attack people or animals at night, in twilight or in the shade, that is, in the conditions optimum for detecting infra-red emission of a body of the person and animals. The method consists in creating in protected zones of the thermal hindrances, which deprive blood-sucking insects of ability to define position of people (of animals). The method consists in placing in protected zone of (one or several) sources of the infra-red emission; diagrams of emission and a places of placing of infra-red sources must be organized so that this emission would to hit in eyes of insects (thermal sensors of insects) in the majority of possible points of supervision by them of people (of animals); power of emission must to exceed power output of infra-red emission of vulnerable parts of a body of the person (of animals); infra-red sources can operate constantly, periodically or not periodically, including when operating time and the period of repetition vary by law of random numbers.05-05-2011
20110101251EXTREME UV RADIATION GENERATING DEVICE COMPRISING A CORROSION-RESISTANT MATERIAL - The invention relates to an improved EUV generating device having coated supply pipes for the liquid tin, in order to provide an extreme UV radiation generating device which is capable of providing a less contaminated flow of tin to and from a plasma generating part.05-05-2011
20110174996EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE - A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.07-21-2011
20120119119UV-CONVERTER, UV LAMP ARRANGEMENT WITH THE UV-CONVERTER, AND A LIGHTING UNIT COMPRISING THE UV LAMP ARRANGEMENT - The invention relates to, UV-converter for transforming radiation of wavelengths above 200 nm to UVA and UVB radiation, having at least a light transmitting sheet (05-17-2012
20120119117Remote Nanoscale Photochemistry Using Guided Emission in Nanowires - A method of fabricating a nanodevice includes providing a nanowire having a first portion and a second portion. The nanowire has a polymer coating. A nanostructure is provided that is proximate to the second portion of the nanowire. Solely the first portion of the nanowire is irradiated with near-infrared radiation, thereby exciting the first portion to generate ultraviolet radiation. The generated ultraviolet radiation is guided from the first portion along the nanowire toward the second portion, so that a region of the polymer coating on the second portion is polymerized and bonds the nanostructure to the nanowire.05-17-2012
20110024651RADIATION SYSTEM AND METHOD, AND A SPECTRAL PURITY FILTER - A radiation system configured to generate a radiation beam, the radiation system including a chamber including: a radiation source configured to generate radiation; a radiation beam emission aperture; a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture; and a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture, wherein the spectral purity filter is configured to divide the chamber into a high pressure region and a low pressure region.02-03-2011
20100258748SYSTEM, METHOD AND APPARATUS FOR DROPLET CATCHER FOR PREVENTION OF BACKSPLASH IN A EUV GENERATION CHAMBER - A system and method generating an extreme ultraviolet light in an extreme ultraviolet light chamber including a collector mirror, a droplet generation system having a droplet outlet aligned to output a plurality of droplets along a target material path and a first catch including a first open end substantially aligned to the target material path and at least one internal surface oriented toward a second end of the first catch, the second end being opposite from the first open end.10-14-2010
20090289205MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - The EUV light source device eliminates radiation other than EUV radiation from the light which it emits, and supplies only the EUV radiation to an exposure device. A composite layer consisting of a plurality of Mo/Si pair layers is provided upon the front surface of an EUV collector mirror, and blazed grooves are formed in this composite layer. Radiation emitted from a plasma is incident upon this EUV collector mirror, and is reflected or diffracted. The reflected EUV radiation (including diffracted EUV) proceeds towards an intermediate focal point IF. The radiation of other wavelengths proceeds towards some position other than this focal point IF, because its reflection angle or diffraction angle is different. A SPF shield having an aperture portion is provided at the focal point IF. Accordingly, only the EUV radiation passes through the aperture portion and is supplied to the exposure device, while the other radiation is intercepted by the shield.11-26-2009
20090127479EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND A METHOD FOR GENERATING EXTREME ULTRAVIOLET RADIATION - High temperature plasma raw material is added drop-wise, for example, and evaporated by irradiation with a laser beam. The laser beam passes through a discharge area between a pair of electrodes and irradiates the high temperature plasma raw material. Pulsed power is applied to the space between the electrodes in such a way that discharge current reaches a specified threshold value at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes, plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap, is collected by EUV radiation collector optics and then extracted. The irradiation of the laser beam allows setting of the space density of the high temperature plasma raw material to a specified distribution and defining of the position of a discharge channel.05-21-2009
20090127478Infrared Source and Method of Manufacturing the Same - There is provided an infrared light source that has a simple structure and radiates infrared rays polarized in a specific direction and having a specific wavelength. The infrared light source (05-21-2009
20090095924ELECTRODE DESIGN FOR EUV DISCHARGE PLASMA SOURCE - An apparatus for producing an extreme ultraviolet (EUV) discharge includes a metal source, a laser that produces a focused laser beam, and electrode operatively coupled to the metal source. The electrode includes a plurality of discrete metal retaining zones that deliver a controlled volume of metal into the focused laser beam to produce an EUV discharge plasma.04-16-2009
20110163247EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The extreme ultra violet light source apparatus includes a chamber in which extreme ultra violet light is generated, a target supply unit for supplying a target material to a predetermined position within the chamber, a driver laser for applying a laser beam to the target material supplied by the target supply unit to generate plasma, a collector mirror for collecting the extreme ultra violet light radiated from the plasma to output the extreme ultra violet light, a magnetic field forming unit for forming an asymmetric magnetic field in a generation position of the plasma by using a coil, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the coil extend.07-07-2011
20080203326Method of reducing radiation-induced damage in fused silica and articles having such reduction - A method of repairing radiation-induced damage and reducing accumulated laser-induced wavefront distortion and polarization-induced birefringence in a fused silica article, such as a lens in a DUV optical system, prisms, filters, photomasks, reflectors, etalon plates, and windows. The distortion is reduced by irradiating the fused silica article with an irradiation source, such as an infrared laser. The radiation causes localized heating which repairs at least a portion of the fused silica lens. A fused silica lens that has been treated by the method and a lithographic system are also described.08-28-2008
20110068282Plasma source of directed beams and application thereof to microlithography - A method for generating radiation in a range of desired wavelengths in a direction of emission is provided. According to the method, initial radiation is produced by a radiation source, the wavelengths thereof including the desired range, and the initial radiation is filtered in such a way as to substantially eliminate the initial radiation beams having a wavelength outside the desired range. The inventive method is characterized in that the filtering is carried out by setting up a controlled distribution of the refractive index of the beams in a control region through which the initial radiation passes, in such a way as to selectively deviate the beams of the initial radiation according to the wavelength thereof and to recover the beams having desired wavelengths. The invention also relates to an associated device.03-24-2011
20100282987ARRANGEMENT FOR THE CONTINUOUS GENERATION OF LIQUID TIN AS EMITTER MATERIAL IN EUV RADIATION SOURCES - The invention is directed to an arrangement for generating EUV radiation based on a hot plasma using liquid emitter material. The object of the invention is to find a novel possibility for generating EUV radiation which allows a continuous supply of liquid, particularly metal, emitter material (11-11-2010
20100258749SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR - A system and method for an extreme ultraviolet light chamber comprising a collector mirror, a cooling system coupled to a backside of the collector mirror operative to cool a reflective surface of the collector mirror and a buffer gas source coupled to the extreme ultraviolet light chamber.10-14-2010
20100181503EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - In an EUV light source apparatus, a collector mirror is protected from debris damaging a mirror coating. The EUV light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target supply unit for supplying a target material into the chamber; a plasma generation laser unit for irradiating the target material within the chamber with a plasma generation laser beam to generate plasma; an ionization laser unit for irradiating neutral particles produced at plasma generation with an ionization laser beam to convert the neutral particles into ions; a collector mirror for collecting the extreme ultraviolet light radiated from the plasma; and a magnetic field or electric field forming unit for forming a magnetic field or an electric field within the chamber so as to trap the ions.07-22-2010
20100181502SELF-SHADING ELECTRODES FOR DEBRIS SUPPRESSION IN AN EUV SOURCE - A radiation source having self-shading electrodes is disclosed. Debris originating from the electrodes is reduced. The path from the electrodes to the EUV optics is blocked by part of the electrodes themselves (termed self-shading). This may significantly reduce the amount of electrode-generated debris.07-22-2010
20120145930LLP EUV LIGHT SOURCE AND METHOD FOR PRODUCING THE SAME - An LPP EUV light source includes a vacuum chamber 06-14-2012
20110073784APPARATUS AND METHOD FOR GENERATING HIGH-INTENSITY OPTICAL PULSES WITH AN ENHANCEMENT CAVITY - An enhancement cavity includes a plurality of focusing mirrors, at least one of which defines a central aperture having a diameter greater than 1 mm. The mirrors are configured to form an optical pathway for closed reflection and transmission of the optical pulse within the enhancement cavity. Ring-shaped optical pulses having a peak intensity at a radius greater than 0.5 mm from a central axis are directed into the enhancement cavity. Accordingly, the peak intensity of the optical pulse is distributed so as to circumscribe the central apertures in the apertured mirrors, and the mirrors are structured to focus the pulse about the aperture toward a central spot area where the pulse is focused to a high intensity.03-31-2011
20100282986METHOD OF INCREASING THE OPERATION LIFETIME OF A COLLECTOR OPTICS ARRANGED IN AN IRRADIATION DEVICE AND CORRESPONDING IRRADIATION DEVICE - The present invention relates to a method of increasing the operation lifetime of an optical collector unit (11-11-2010
20090309048Radiation System and Lithographic Apparatus Comprising the Same - An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.12-17-2009
20110147621TERAHERTZ WAVE GENERATION DEVICE AND METHOD FOR GENERATING TERAHERTZ WAVE - A terahertz wave generation device is provided with an ultra-short pulse laser light source (06-23-2011
20100025600Systems and methods for heating an EUV collector mirror - As disclosed herein, a device may comprise a substrate made of a material comprising silicon, the substrate having a first side and an opposed second side; an EUV reflective multi-layer coating overlaying at least a portion of the first side; an infrared absorbing coating overlaying at least a portion of the second side; and a system generating infrared radiation to heat the absorbing coating and the substrate.02-04-2010
20080290301Portable Wavelength Transforming Converter for UV LEDs - This invention provides a small form factor apparatus for selectively producing one or more of a plurality of wavelength distributions of radiation, comprising a UV Light Emitting Diode (LED) as the primary UV LED radiation source and one or more wavelength transforming (WT) materials separated from the primary UV LED radiation source, that in response to irradiation by the primary UV LED radiation source, produce transformed radiation having a wavelength distribution that is different from the wavelength distribution of the primary UV LED radiation source. None, one, or more than one of the various WT materials may be selected by the user, to allow either the primary UV radiation, or the transformed radiation, or both simultaneously, to be to be emitted from the apparatus in a preferred direction.11-27-2008
20080315134OPTICAL SYSTEM FOR RADIATION IN THE EUV-WAVELENGTH RANGE AND METHOD FOR MEASURING A CONTAMINATION STATUS OF EUV-REFLECTIVE ELEMENTS - An optical system for radiation in the EUV wavelength range, in particular a projection exposure apparatus, having at least one vacuum vessel, including: at least one EUV-reflective optical element arranged in an optical path, and a holder which includes at least one sample element, the sample element having an optical surface which is exposed to incident EUV-radiation outside of the optical path, the sample element being sensitive to chemical alterations under influence of the incident EUV-radiation which also affect the optical element. The optical system further includes at least one detection unit for online detection of the contamination status of the sample element during exposure of the sample element to the incident EUV-radiation.12-25-2008
20090173896METHOD AND APPARATUS FOR OPERATING AN ELECTRICL DISCHARGE DEVICE - The present invention relates to a method of operating an electrical discharge device (07-09-2009
20110073785Radiation Collector - The invention relates to a radiation collector (10) designed to concentrate part of the radiation produced by a source on a spot (100). The collector includes a primary concave mirror (1) and a secondary convex mirror (2), each being rotationally symmetrical about an optical axis (X-X) of the collector. The primary mirror is configured to reflect the radiation collected with an angle of incidence (i) that is substantially constant between different points on said main mirror. Such a collector is particularly suitable for use with a discharge produced plasma source.03-31-2011
20120305811EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.12-06-2012
20120305810Laser-Produced-Plasma EUV Light Source - Devices and corresponding methods of use are described herein that may include an enclosing structure defining a closed loop flow path and a system generating a plasma at a plasma site, e.g. laser produced plasma system, where the plasma site may be in fluid communication with the flow path. For the device, a gas may be disposed in the enclosing structure which may include an ion-stopping buffer gas and/or an etchant. A pump may be provided to force the gas through the closed loop flow path. One or more heat exchangers removing heat from gas flowing in the flow path may be provided. In some arrangements, a filter may be used to remove at least a portion of a target species from gas flowing in the flow path.12-06-2012
20120305809APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection.12-06-2012
20120001098EXCIMER RADIATION LAMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME - An excimer radiation lamp assembly. The lamp assembly comprises a radiation emitting region and at least one substantially radiation opaque region. The radiation emitting region comprises a pair of dielectric elements disposed in a substantially coaxial arrangement.01-05-2012
20100258750SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT - An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material and logic for adjusting the target material dispenser outlet to output a subsequent one of the plurality of portions of target material to a waist of the focused drive laser. A method for generating an extreme ultraviolet light is also disclosed. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.10-14-2010
20120056112Infrared Radiator Arrangement for a Gas Analysis Device - A method and device for measuring the soot load in the exhaust gas systems of diesel engines using a sensor which is mounted downstream of a particulate filter and comprises a sensor element, to measure the operability of the particulate filter. According to the method, the soot load of the sensor element is measured resistively or capacitively using electrodes. The measuring voltage of the sensor element is controlled depending on at least one actual operating parameter of the diesel engine.03-08-2012
20120119118EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM - An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.05-17-2012
20120205559TARGET SUPPLY DEVICE AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A target supply device is configured for supplying a target material for generating an extreme ultraviolet (EUV) light. The target supply device comprises a target storage unit for storing at least the target material, and a target discharge unit comprising a surface having an opening from which a through-hole extends to communicate with the target storage unit. The target material is discharged through the opening for generating the EUV light. The surface at least around the opening is formed of a material so that the target material has a contact angle greater than 90 degrees with the surface.08-16-2012
20120012762LASER DEVICE, LASER SYSTEM, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A laser device may include: a diffraction grating; and a plurality of semiconductor lasers disposed such that laser beams outputted therefrom are incident on the diffraction grating and at least one of diffraction beams of each laser beam travels in a predetermined direction.01-19-2012
20120205558Tools, Methods and Devices for Mitigating Extreme Ultraviolet Optics Contamination - Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further include exposing the optically reflective surface to EUV radiation thereby generating electrons. The method may also include applying an electromagnetic field to the optically reflective surface, the electromagnetic field configured to reduce reactions initiated by the electrons on the optically reflective surface. The applied electromagnetic field may be constant or varied and also may have different biases.08-16-2012
20120153191Vivarium06-21-2012
20110079736Laser produced plasma EUV light source - An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.04-07-2011
20110089347ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE - There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.04-21-2011
20120161040EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT - An extreme ultraviolet light source apparatus, which is to generate an extreme ultraviolet light by irradiating a target with a main pulse laser light after irradiating the target with a prepulse laser light, the extreme ultraviolet light source apparatus comprises: a prepulse laser light source generating a pre-plasma by irradiating the target with the prepulse laser light while a part of the target remains, the pre-plasma being generated at a different region from a target region, the different region being located on an incident side of the prepulse laser light; and a main pulse laser light source generating the extreme ultraviolet light by irradiating the pre-plasma with the main pulse laser light.06-28-2012
20120119116EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus in which a target material is irradiated with a laser beam and turned into plasma and extreme ultraviolet light is emitted from the plasma may include: a chamber in which the extreme ultraviolet light is generated; an electromagnetic field generation unit for generating at least one of an electric field and a magnetic field inside the chamber; and a cleaning unit for charging and separating debris adhered to an optical element inside the chamber.05-17-2012
20110006228Sterra-Sponge - A cleaning and sterilizing device to clean and sterilize a work surface may include a top member and a bottom member to cooperate with the top member to provide a container for a sterilizing light device to provide sterilizing light for the work surface. The top member may include includes a first enclosure and the bottom member includes a second enclosure to cooperate with the first enclosure to substantially cover a light bulb to generate a sterilizing light for the work surface and a cleaning apparatus may be detachably connected to the bottom member to simultaneously clean the work surface as the sterilizing light is sterilizing the work surface. The sterilizing light may be an ultraviolet light, and the cleaning apparatus may include a sponge detachably connected to the bottom member. The sponge may be connected to the bottom member with a Velcro hooks and loops, and the sponge may be connected to the bottom surface of the bottom member. The bottom member may include a dividing wall to separate the sponge from the sterilizing light.01-13-2011
20120126148Device for Generating a Secondary Source by Laser-Material Interaction Comprising an Optical Device for Controlling the Orientation and the Position of a Surface in Movement - A device for generating a secondary source from a primary optical source emitting a first optical beam focused onto a surface in movement, with which said first beam interacts so as to generate a secondary beam, includes an optical device for controlling the orientation and position of said surface to determine the orientation and position of the emission point of said secondary source on said surface. The device comprises: a control laser beam split into two branches, a fixed reference beam and a mobile analysis beam reflected by the surface in movement; means for making said reference and analysis beams interfere to generate interference fringes; means for imaging the interference fringes carrying information about the orientation and position of said surface; means for analyzing said interference images; and means for generating a feedback loop for controlling the orientation and position of said surface in movement based on the analysis.05-24-2012
20120248342MIRROR FOR EXTREME ULTRA VIOLET, MANUFACTURING METHOD FOR MIRROR FOR EXTREME ULTRA VIOLET, AND FAR ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.10-04-2012
20120168648ELLIPTICAL LIGHT SOURCE FOR ULTRAVIOLET (UV) CURING LAMP ASSEMBLIES - A light source having a substantially elliptical cross-section for UV curing lamp assemblies is disclosed. The light source has a pair of end sections and a central section of smaller diameter than the end sections. The end sections are each connected to the central section by a tapered section the diameter of each of which decreases from an end that mates with an end section toward an end that mates with the central section. Each of the end sections has a substantially elliptical cross-section. The central section and the tapered sections may have a substantially elliptical cross-section. The aspect ratio of the elliptical cross-section of the end sections and the central section of the light source is preferably about 2:1.07-05-2012
20110180734EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.07-28-2011
20110180733TERAHERTZ RADIATION DEVICE USING POLAR SEMICONDUCTOR MATERIALS AND METHOD OF GENERATING TERAHERTZ RADIATION - A method and device for generating terahertz radiation comprising a plurality of layers of polar crystal material operative to emit terahertz radiation; the plurality of layers comprising transport layers and divider layers, the plane of the layers being not parallel to the polar axis, the interface between the transport layers and divider layers forming boundaries at which the internal electric polarization terminates leading to charges accumulating at the boundaries, and creation of internal electric fields oriented along the polar axis; whereby when irradiated by a pulsed source of duration less than one picosecond, a time-varying and spatially nonuniform distribution of carriers is created in the growth direction of the polar crystal material thereby generating a first time-varying current due to diffusion of the carriers; the internal electric fields accelerating the carriers generated by the pulsed radiation source operating to produce a second time-varying current that is additive with the first time-varying current, thereby enhancing the generation of terahertz radiation.07-28-2011
20120132832PASSIVE TERAHERTZ RADIATION SOURCE - The invention concerns a passive terahertz radiation source configured to emit electromagnetic radiation having frequency in the range of 10 GHz to 50 THz and a method for generating a terahertz radiation. The passive terahertz radiation source comprises: a source of a pulsed excitation light; an emitter comprising one or more emitter elements, each emitter element comprising a semiconductor layer being arranged such that at least a portion of a first major surface of said semiconductor layer is exposed to the excitation light, wherein each emitter element is configured such that upon exposure to the excitation light, a gradient of the charge carrier density is generated in the semiconductor layer in the area of transition between a first area of the semiconductor layer and a second area of the semiconductor layer, the gradient being substantially parallel to the first major surface of the semiconductor layer.05-31-2012
20100258747Systems and methods for protecting an EUV light source chamber from high pressure source material leaks - A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.10-14-2010
20120313016SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE - An extreme-ultraviolet (EUV) light source comprising an optic, a target material, and a laser beam passing through said optic along a beam path to irradiate said target material. The EUV light source further includes a system generating a gas flow directed toward said target material along said beam path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas line outputting a gas stream into said volume.12-13-2012
20120211678Method and apparatus for countermeasuring an infrared seeking missile utilizing a multispectral emissive film - An electronic countermeasures product includes flexible packaging of diodes that operate in the infrared portion of the electromagnetic spectrum to replace flares, lamps and directed lasers with an inexpensive easily deployed countermeasure systems.08-23-2012
20090057579SPINNING INFRARED EMITTER - A spinning infrared emitter is disclosed which has a light source that in one aspect emits infrared and/or near-infrared light and a controller that spins the light. Also disclosed are methods of using the light produced by the spinning infrared emitter. The light produced by the spinning infrared emitter is generally useful for speeding chemical reactions. More particularly, the light produced by the spinning infrared emitter is useful for enhancing photosynthesis and carbon dioxide fixation by green plants.03-05-2009
20100051832EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.03-04-2010
20100051831LIGHT SOURCE EMPLOYING LASER-PRODUCED PLASMA - A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).03-04-2010
20120175533EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, METHOD FOR CONTROLLING EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS, AND RECORDING MEDIUM WITH PROGRAM RECORDED THEREON - An extreme ultraviolet light source apparatus, in which a target material is irradiated with a laser beam from a laser apparatus and the target material is turned into plasma, thereby emitting extreme ultraviolet light, may include a burst control unit configured to control irradiation of the target material is irradiated with the laser beam outputted successively in pulses from the laser apparatus when the extreme ultraviolet light is emitted successively in pulses. The target material is prevented from being turned into plasma by the laser beam while the laser beam is outputted successively in pulses from the laser apparatus when the successive pulsed emission is paused.07-12-2012
20120223256SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE - An extreme-ultraviolet (EUV) light source is described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.09-06-2012
20120228526LASER PRODUCED PLASMA EUV LIGHT SOURCE - Methods and apparatus for producing EUV from plasma are disclosed. The apparatus includes a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region. The plasma produces EUV radiation, wherein the droplet source comprises a nozzle having an orifice configured for ejecting a fluid and a sub-system having an electro-actuable element producing a disturbance in the fluid to cause at least some of the droplets to coalesce prior to being irradiated. The electro-actuable element is coupled to nozzle using an adhesive that has a high modulus at the nozzle operating temperature. Improvements also include tuning the nozzle assembly to more closely match the modulation waveform frequency with one of the resonance frequencies of the nozzle assembly by optimizing one of a mass, a shape, or material composition of at least one component in the nozzle assembly.09-13-2012
20120228528LED ORAL ILLUMINATOR USING A BITE BLOCK - Disclosed herein are intraoral illumination devices. More specifically, the LED intraoral illumination device in accordance with the present invention has an improved battery for providing power supply and structure of a bit block for opening a mouth using the bit block.09-13-2012
20120261596EXTREME ULTRA VIOLET LIGHT SOURCE DEVICE - An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.10-18-2012
20120267553EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.10-25-2012
20120298889Systems, Methods, and Apparatus for Generating Terahertz Electromagnetic Radiation - Certain embodiments of the invention may include systems, methods, and apparatus for generating terahertz electromagnetic radiation. According to an example embodiment of the invention, a method is provided for generating terahertz electromagnetic radiation. The method includes: coupling a terahertz resonator with an optical resonator, wherein the optical resonator comprises non-linear optical material; directing laser light through the optical resonator to generate terahertz radiation by parametric interaction of the laser light with the optical resonator and the terahertz resonator; and directing the terahertz radiation from the terahertz resonator to an output.11-29-2012
20120319015GLASS COMPOSITION AND OPTICAL DEVICE - There is provided a glass composition containing an oxide containing Lu, Si, and Al, in which the composition of the glass composition lies within a compositional region of a ternary composition diagram of Lu, Si, and Al in terms of cation percent, the compositional region being defined by the following six points: 12-20-2012
20120080619Method and Apparatus for the Generation of EUV Radiation from a Gas Discharge Plasma - The invention relates to a method and an apparatus for generating EUV radiation from a gas discharge plasma. The object of the invention, to generate EUV radiation from a gas discharge plasma by with is optimized conversion efficiency of the EUV emission while locally limiting the electric discharge channel, is met in that a channel-generating beam of pulsed high-energy radiation is supplied in at least two partial beams which are focused in a pulse-synchronized manner into a superposition region along a spacing axis between the electrodes, and an electrically conductive discharge channel is generated along the superposition region due to an ionization at least of a buffer gas present in the discharge space, wherein the pulsed high-energy radiation of the channel-generating beam is triggered in such a way that the discharge channel is generated before a discharge current pulse has reached its maximum value.04-05-2012
20110266468EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point.11-03-2011
20120319014EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.12-20-2012
20120326058COLLECTOR MIRROR ASSEMBLY AND EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE USING SAID COLLECTOR MIRROR ASSEMBLY - A deterioration of the collector performance in an extreme ultraviolet light source device due to a heat deformation of the collector mirror assembly is to be prevented. The collector mirror assembly used in the extreme ultraviolet light source device comprises a plurality of reflective shells 12-27-2012
20130009076EXTREME ULTRAVIOLET LIGHT SOURCE AND POSITIONING METHOD OF LIGHT FOCUSING OPTICAL MEANS - In an extreme ultraviolet (“EUV”) light source apparatus, uneven angle distribution images of EUV light are detected prior to an adjustment function by a detector, and angle distribution image data is recorded. Movement data corresponding to the recorded angle distribution image data is also recorded. The movement data corresponds to a movement amount and direction that the optical focusing means is moved from a position in which the angle distribution is even to the position in which the corresponding uneven angle distribution image is obtained. For the adjustment, a current angle distribution property image is detected by the detector and is compared with the uneven angle distribution property image data stored, and image data which is most closely matched with the current angle distribution property is selected. The movement data that corresponds to the selected image data is read out, and the light focusing optical means is moved based thereon.01-10-2013
20130015375GENERATION OF TERAHERTZ ELECTROMAGNETIC WAVES IN GRAPHENE BY COHERENT PHOTON-MIXINGAANM AVOURIS; PHAEDONAACI Yorktown HeightsAAST NYAACO USAAGP AVOURIS; PHAEDON Yorktown Heights NY USAANM Sung; Chun-YungAACI PoughkeepsieAAST NYAACO USAAGP Sung; Chun-Yung Poughkeepsie NY USAANM Valdes Garcia; AlbertoAACI HartsdaleAAST NYAACO USAAGP Valdes Garcia; Alberto Hartsdale NY USAANM Xia; FengnianAACI PlainsboroAAST NJAACO USAAGP Xia; Fengnian Plainsboro NJ US - An electromagnetic device and method for fabrication includes a substrate and a layer of graphene formed on the substrate. A metallization layer is patterned on the graphene. The metallization layer forms electrodes such that when the graphene is excited by light, terahertz frequency radiation is generated.01-17-2013
20130020511MIRROR, MIRROR DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base.01-24-2013
20120241651DEEP-ULTRAVIOLET LIGHT SOURCE CAPABLE OF STOPPING LEAKAGE OF HARMFUL X-RAYS - In a deep-ultraviolet tight source includes sapphire substrate, a wide band gap semiconductor layer having a wavelength smaller than 300 nm, formed on the sapphire substrate, and en electron beam source for irradiating the wide band gap semiconductor layer with an electron beam. The wide band gap semiconductor layer is configured to be irradiated with the electron beam to emit deep-ultraviolet light through the sapphire substrate. A thickness t09-27-2012
20120241649EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION METHOD - An EUV light generation method includes: (1) a step of supplying a target material into a chamber; and (b) a step of generating EUV light from plasma generated by irradiating the target material with a laser beam. The spatial light intensity distribution of the laser beam may be arranged so as to provide a low intensity region with a light intensity lower than a light intensity at a position away from the beam axis by a predetermined distance is present within an area extending for the predetermined distance from the beam axis.09-27-2012
20080251738Method and apparatus for vibration reduction in laser system line narrowing unit wavelength selection optical element - A method and apparatus is disclosed that may comprise an ultraviolet light source; an optical element within an optical path of the light source mounted on an optical element mount; a vibration damping mechanism operatively connected to the optical element or to the mount which may comprise a wire mesh pad. The optical element may comprise a center wavelength selection optical element, which may comprise a grating, a mirror, or a prism. The vibration damping mechanism may comprise the wire mesh pad comprising an elastic interface between a driving mechanism lever arm operable to move the optical element or the mount and a driving lever arm actuator. The vibration damping mechanism may comprise a mass damping mechanism comprising a mounting plate connected to the optical element or to the mount; a damping mass; the wire mesh pad comprising an elastic interface between the mounting plate and the damping mass.10-16-2008
20080237501EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND EXTREME ULTRAVIOLET RADIATION GENERATING METHOD - High temperature plasma raw material (10-02-2008
20090101850ARRANGEMENT FOR GENERATING EUV RADIATION - The invention is directed to an arrangement for generating EUV radiation particularly for source modules in exposure installations for EUV lithography for semiconductor chip fabrication. The object of the invention, to find a novel possibility for realizing an EUV source module which appreciably improves the ratio of resources to results in the transfer of radiation from the primary source location (plasma 04-23-2009
20130175460COMPOSITIONS AND METHODS FOR UV STERILIZATION - Provided herein are systems, ultraviolet (UV) devices, and methods for UV disinfection and sterilization, more specifically, systems, devices, and methods for UV disinfection and sterilization of a container, room, space or defined environment. The systems, UV devices, and methods are particularly useful for the UV disinfection and sterilization of a container used in the food and dairy industry and for containers used in the process of fermentation for an alcoholic beverage. Provided are also systems, UV devices, and methods for inhibiting the growth of one or more species of microorganisms present in a container, room, space or defined environment preferably for inhibiting the growth of one or more species of microorganisms present on an interior surface of a container, room, space or defined environment.07-11-2013
20120248344EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.10-04-2012
20120248343CHAMBER APPARATUS - A chamber apparatus for operating with a laser apparatus includes a chamber, a target supply unit, a collection unit and a collection container. The chamber includes an inlet through which a laser beam from the laser apparatus enters the chamber. The target supply unit is configured to supply a target material to a predetermined region inside the chamber. The collection unit includes a debris entering surface so that debris generated when the target material is irradiated with the laser beam enters the debris entering surface. The debris entering surface is inclined with respect to a direction in which the debris enters the debris entering surface. The collection container collects the debris flowing out of the collection unit.10-04-2012
20120248341SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LIGHT SOURCE - A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output of the light system is measured at sample intervals as a proxy for the laser power. The thermal load on the focusing lens is estimated from the measured EUV power, the expected change in the focal length of the lens for the thermal load is calculated, and the lens position is adjusted to compensate for the calculated focal length change. The actual position of the lens may be determined and compared to its desired position, and adjusted to insure that it remains in the desired position.10-04-2012
20130126761CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.05-23-2013
20130134330HOLDER DEVICE, CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A holder device for holding an optical element includes a holder having first and second members to sandwich the optical element therebetween, and a sealing member for creating a seal between the second member and the optical element.05-30-2013
20130092849LASER DEVICE, LASER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser device having master oscillators that output seed beams is provided. The seed beams are guided from the master oscillators to a regenerative amplifier such that at least one of the seed beams enters the regenerative amplifier at an angle that differs from an angle at which another seed beam enters the regenerative amplifier. A laser apparatus and an extreme ultraviolet light generation system using the laser device are also provided.04-18-2013
20130092848LAMP SYSTEMS AND METHODS FOR GENERATING ULTRAVIOLET LIGHT - Apparatus for generating ultraviolet light and methods of operating an ultraviolet light source. The apparatus may include a microwave chamber (04-18-2013
20130099141ULTRAVIOLET LIGHT EMITTING DEVICE INCORPORTING OPTICALLY ABSORBING LAYERS - A light emitting device includes a p-side, an n-side, and an active layer between the p-side and the n-side. The p-side includes a p-side contact, an electron blocking layer, a p-side separate confinement heterostructure (p-SCH), and a p-cladding/current spreading region disposed between the p-SCH and the p-side contact. The n-side includes an n-side contact, and an n-side separate confinement heterostructure (n-SCH). The active layer is configured to emit light in a wavelength range, wherein the p-side and the n-side have asymmetrical optical transmission properties with respect to the wavelength range emitted by the active layer.04-25-2013
20130112896PLATINUM-BASED INFRARED LIGHT SOURCE FOR GAS DETECTION - An infrared radiation source for gas detection, with a thin layer infrared radiator that is arranged in the interior chamber of a protective housing that includes a support surface for the thin layer infrared radiator and an exit window for the infrared radiation arranged at a distance opposite the support surface. The thin layer infrared radiator includes a platinum layer and at least one structurally defined de-gassing canal with an entry opening and an exit opening that leads from the interior chamber of the protective housing to the outside. For non-critical applications, the de-gassing canal is not sealed. For critical applications, it may be sealed by a sealing membrane that is water impermeable, water vapor permeable and open for gas diffusion, with the sealing membrane preferably being semi-permeable.05-09-2013
20130126762EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultra violet light source apparatus in which debris moving within a chamber are prevented from reducing reflectance or transmittance of optical elements of an EUV collector mirror, etc, and extreme ultra violet light can stably be generated in a long period. The apparatus includes: a target supply unit for supplying a target to a predetermined position within a chamber; a driver laser for applying a laser beam to the target to generate first plasma; a collector mirror provided within the chamber, for collecting extreme ultra violet light radiated from the first plasma; a gas supply unit for supplying a gas into the chamber; an excitation unit for exciting the gas to generate second plasma around a region where the first plasma is generated; and an exhaust unit for exhausting the chamber and ejecting debris emitted from the first plasma to outside of the chamber.05-23-2013
20080197300Method of calibrating light delivery systems, light delivery systems and radiometer for use therewith - In a method of calibrating a light delivery device (08-21-2008
20080197299Extreme ultra violet light source apparatus - An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained by using a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.08-21-2008
20080197298Extreme ultra violet light source apparatus - In an extreme ultra violet light source apparatus having a comparatively large output power for exposing, a solid target is supplied fast and continuously while heat dissipation for irradiation of a driver laser light is performed successfully. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target material supplying unit which coats a wire with target material, a wire supplying unit which supplies the wire coated with the target material to a predetermined position within the chamber, a driver laser which applies a laser beam onto the wire coated with the target material to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputting the extreme ultra violet light.08-21-2008
20080197297High repetition rate laser produced plasma EUV light source - An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.08-21-2008
20110220815LIGHT SOURCE APPARATUS - The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source 09-15-2011
20110248192METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS WITH ENHANCED EFFICIENCY - The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (10-13-2011
20110248191SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE - A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.10-13-2011
20110253913CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus and a focusing optical system for focusing a laser beam outputted from the laser apparatus may include: a chamber provided with an inlet through which the laser beam is introduced into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; and a collection unit provided in the chamber for collecting a charged particle generated when the target material is irradiated with the laser beam in the chamber.10-20-2011
20130153794EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An apparatus uses first and second laser beams from a laser apparatus to generate extreme ultraviolet light. The apparatus may include a chamber provided with at least one inlet through which at least one of first and second laser beams outputted from the laser apparatus travels into the chamber. A beam shaping unit is provided on a beam path of the first laser beam for transforming the first laser beam into a hollow laser beam. A first focusing optical element is provided downstream of the beam shaping unit for focusing the hollow laser beam in a first location inside the chamber.06-20-2013
20130153793ELECTROMAGNETIC RADIATION GENERATING ELEMENT, ELECTROMAGNETIC RADIATION GENERATING DEVICE, AND METHOD OF GENERATING ELECTROMAGNETIC RADIATION - An electromagnetic radiation generating device is a device that generates electromagnetic wave pulses from a plane surface. The electromagnetic radiation generating device includes an electromagnetic radiation generating element, a light irradiating unit. The electromagnetic radiation generating element includes: a depletion layer forming body formed by stacking a p-type silicon layer and an n-type silicon layer in a planar pattern; a light receiving surface electrode formed on one surface of the depletion layer forming body, the light receiving surface electrode including a plurality of parallel electrode parts that are equally spaced while a forming distance is maintained between the parallel electrode parts, the forming distance corresponding to the wavelength of the electromagnetic wave pulses generated from the depletion layer forming body; and a rear surface electrode formed on the opposite surface of the depletion layer forming body.06-20-2013
20130181146ELECTROMAGNETIC WAVE EMISSION DEVICE - An electromagnetic wave emission device includes a nonlinear crystal which receives exciting light Lp having two wavelength components λ07-18-2013
20110309271SPECTRAL PURITY FILTER AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS PROVIDED WITH THE SPECTRAL PURITY FILTER - A spectral purity filter may include: a plurality of segments that each includes a mesh in which an array of apertures of an aperture size at or below a predetermined size is formed and which has electroconductivity; and a frame that supports the plurality of the segments at least at a periphery thereof.12-22-2011
20110309270LASER DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION DEVICE, AND METHOD FOR MAINTAINING THE DEVICES - Provided is a laser device which is installed within a predetermined space and on a predetermined floor area, the laser device may includes: a master oscillator; at least one amplifier unit that amplifies a laser beam outputted from the master oscillator; at least one power source unit that supplies excitation energy to the at least one amplifier unit; and a movement mechanism which enables at least one among the at least one amplifier unit and the at least one power source unit to be moved in a direction parallel with a floor surface.12-22-2011
20130187066Infrared emitter - A single-ended infrared emitter may be provided, having at least one glass tube, in which a heating element is accommodated, wherein at least one insulated current return line is arranged spaced apart from the glass tube.07-25-2013
20130187065EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND CONTROL METHOD FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.07-25-2013
20120068091EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD FOR CONTROLLING SATURABLE ABSORBER USED IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE - An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.03-22-2012
20130207004Source-collector modules for EUV lithography employing a GIC mirror and a LPP source - Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.08-15-2013
20090314966IRRADIATION SOURCES AND METHODS - Irradiating assemblies can have a housing with a reflector extending linearly parallel to a lamp. Radiation can be emitted from one opening, for example in a bottom portion of the housing, as well as from another opening, for example a side opening in the housing. Irradiating assemblies can also have first and second reflector portions at angles with respect to each other wherein radiation is reflected out of a housing that does not have an end reflector. Irradiating assemblies can be configured to have cooling flow openings in side walls so that cooling fluid such as air can flow between the side walls and adjacent surfaces of a reflector. Irradiating assemblies can incorporate lamps having first and second electrodes wherein the first and second electrodes are oriented at an angle with respect to each other. Methods of irradiating material may include irradiating a surface with emissions from a first portion of an assembly and irradiating a surface with emissions from a second portion of an assembly different from the first portion.12-24-2009
20110127449ELECTRONIC DEVICE WITH REMOTE CONTROL CAPABILITY - An electronic device includes a housing, a PCB, a LED mounted to the PCB, and a support member. The housing defines a cavity, and a through hole communicating with the cavity. The PCB is received in the cavity. The LED includes a lens received in the through hole. The support member, which is fixed to the housing to provide support for the lens, includes an elastic latch arm extending close to the through hole to form an angle with a surface of the lens. An end of the elastic latch arm contacts the surface of the lens to prevent the lens from being detached from the through hole.06-02-2011
20100320405HANDHELD PORTABLE MULTI PURPOSE STERILIZING WAVELENGTH TRANSFORMING CONVERTER - An apparatus and a method, in a handheld portable multi purpose device, for producing multiple and variable wavelength distributions of UV radiation, or visible radiation, comprising a primary UV radiation source, and a system of wavelength transforming (WT) materials that allows selecting at will between UV A, UV B, UV C radiation (individual selections or various combinations,) and visible radiation, whereby the apparatus provides for UV sterilization of food, fluid, air, fluids, and surfaces; while also providing a means to emit visible light. Additionally, an apparatus and method, in a handheld portable multi purpose device, for enabling production and emission of UV radiation selectable between UV A, UV B, UV C radiation (individual selections or various combinations,) and visible radiation in a small form factor device embodied in a handheld portable flashlight, or lamp, type device.12-23-2010
20120161039HAND CARRY TYPE PORTABLE CURING APPARATUS USING LONG-ARC UV LAMP - A hand carry type portable curing apparatus using a long-arc UltraViolet (UV) lamp for concentrating the external air on the long-arc UV lamp and enhancing cooling efficiency by disposing a fan at a tilt angle and in addition installing a means for forcibly inducing a flow of air inside is provided. The apparatus includes a housing having an accepting part therein, the long-arc UV lamp installed in the accepting part of the housing, and a fan installed in the housing and cooling the long-arc UV lamp. The fan is installed on the slant to tilt toward the front in a front surface of the housing.06-28-2012

Patent applications in class Ultraviolet or infrared source

Patent applications in all subclasses Ultraviolet or infrared source