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ION GENERATION

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250 - Radiant energy

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Class / Patent application numberDescriptionNumber of patent applications / Date published
250424000 Methods 63
250426000 Arc type 9
250427000 Electron bombardment type 9
250423000 Photoionization type 8
250423000 Field ionization type 7
250425000 With sample vaporizing means 5
20110012024Method for Preparing Ion Source From Nanoparticles - A method for preparing an ion source from nanoparticles is provided. The method includes the steps of: providing nanoparticles, vaporizing the nanoparticles from a solid state to a gaseous state, and ionizing the gas to form the ion source. The ion source is prepared by placing solid nanoparticles in a stainless tube, heating and vaporizing the solid nanoparticles into a gaseous state, and ionizing the gas. The gas can be formed at a lower heating temperature than when solid lumps are used because solid nanoparticles have a lower melting point than solid lumps. Thus, the heating temperature is lowered, and the preparing time of the ion source is shortened. Besides, under the same temperature, an ion source prepared from nanoparticles provides higher vapor pressure and allows a higher implantation dose than when the ion source is prepared from solid lumps, thus expanding the applicability of ion implantation technology.01-20-2011
20080290289MASS SPECTROSCOPIC REACTION-MONITORING METHOD - A mass spectroscopic reaction-monitoring method including: forcing charge-laden liquid drops to move along a traveling path; exposing to a laser beam a region to be formed of a liquid sample surface, the laser beam having an irradiation energy sufficient to cause analytes present behind the liquid sample surface to be desorbed to fly along a flying path; introducing to the region at successive points of time a liquid sample containing one reactant that undergoes an ongoing chemical reaction as a first analyte to form one product as a second analyte, and positioning the liquid sample surface relative to the laser beam at each point of time such that the flying path intersects the traveling path for enabling occlusion of at least one of the first and second analytes in at least one charge-laden liquid drop to thereby form at least a corresponding one of first and second ionized analytes.11-27-2008
20100148089ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD - An ion source is disclosed incorporating various aspects of the invention including i) a vaporizer, ii) a vaporizer valve, iii) a gas feed, iv) an ionization chamber, v) an electron gun, vi) a cooled mounting frame, and vii) an ion exit aperture. The ion source includes means for introducing gaseous feed material into the ionization chamber, means for vaporizing solid feed materials and introducing their vapors into the ionization chamber, means for ionizing the introduced gaseous feed materials within the ionization chamber, and means for extracting the ions thus produced from an ion exit aperture adjacent to the ionization region. In addition, means for accelerating and focusing the exiting ions are provided. The vaporizer, vaporizer valve, gas feed, ionization chamber, electron gun, cooled mounting frame, and ion exit aperture are all integrated into a single assembly in preferred embodiments of the novel ion source.06-17-2010
20090039283IONIZATION OF DESORBED MOLECULES - An ion source generates ions from analyte molecules which are desorbed from a sample on the surface of a sample support in a pressure range of approximately 30 to 300 pascal. Reactant ions are generated in a separate ion source and guided by ion guides to the point in front of the sample or to a reaction chamber in which the desorbed molecules are located. The reactant ions ionize the desorbed molecules to form analyte ions. The analyte molecules can be mixed in matrix material or adsorbed on the sample support surface without additives. The desorption can be continuous or pulsed, for example by light from lasers or diodes.02-12-2009
20100059689IONIZATION EMITTER, IONIZATION APPARATUS, AND METHOD FOR MANUFACTURING IONIZATION EMITTER - Provided is an ionization emitter which can reduce a dead volume without deteriorating separating capacity. An ionization emitter (03-11-2010
Entries
DocumentTitleDate
20090194704METHOD AND DEVICE OF ION SOURCE GENERATION - An implanter is equipped with an ion beam current detector, a temperature sensor, a temperature controller and a cooling system to increase the ratio of a specific ion cluster in the ion source chamber of the implanter. Therefore, the implanting efficiency for a shallow ion implantation is increased consequently.08-06-2009
20100084569ION DEPOSITION APPARATUS - This invention relates to a broad beam ion deposition apparatus (04-08-2010
20100044579APPARATUS - An apparatus for accelerating an ion beam, comprising at least one electrode mounted in a moveable mount.02-25-2010
20130082189PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE - A pre-aligned multi-output nozzle/skimmer (PMNS) module includes a pre-aligned nozzle assembly having at least two nozzles and a pre-aligned skimmer subassembly. The PMNS module can be pre-aligned to more accurately position a Multi-Beam Gas Cluster Ion Beam (MBGCIB), and to more accurately control the formation of the multi-beam gas clusters of a pre-aligned MBGCIB.04-04-2013
20100108905PLASMA SOURCES - This invention relates to a plasma source in the form of plasma generator (05-06-2010
20090309041TECHNIQUES FOR PROVIDING A MULTIMODE ION SOURCE - Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode.12-17-2009
20090032727ELEVATED TEMPERATURE RF ION SOURCE - An elevated temperature RF ion source system, comprising an ion source body, an RF antenna coil external to the ion source body, a vacuum enclosure surrounding both the outside surface of the ion source body and the RF antenna coil, at least one power supply, a gas delivery system operatively coupled to the ion source body, a vacuum condition between the outside surface of the ion source body and the RF antenna coil, the RF antenna coil operatively coupled to the at least one power supply, and a water cooling system operatively coupled to the RF antenna coil and the vacuum enclosure.02-05-2009
20130214173ION GENERATING DEVICE - To prevent a reduction in an amount of an ion emission while preventing generation of electromagnetic noise. A high-voltage generating circuit section that supplies a high voltage to an ion generating element that generates ions is housed in a housing, and sealed with filled resin. An emission port for emitting the generated ions is formed in the housing, and an outer surface of the housing except the emission port is covered with a shield case. A passage port communicating with the emission port is formed in the shield case. A periphery of the passage port of the shield case is covered with an electrically insulating covering sheet so that emitted ions do not adhere to the shield case. The ions emitted from the emission port do not adhere to the shield case covered with the covering sheet.08-22-2013
20120235056Multi-Needle Multi-Parallel Nanospray Ionization Source for Mass Spectrometry - An electrospray ion source for a mass spectrometer for generating ions of an analyte from a sample comprising the analyte dissolved in a liquid solvent comprises: an electrode receiving the sample and comprising at least a first plurality of protrusions protruding from a base, each protrusion of the at least a first plurality of protrusions having a respective tip; and a voltage source, wherein, in operation of the electrospray ion source, the sample is caused to move, in the presence of a gas or air, from the base to each protrusion tip along a respective protrusion exterior so as to form a respective stream of charged particles emitted towards an ion inlet aperture of the mass spectrometer under application of voltage applied to the electrode from the voltage source.09-20-2012
20090283694DOUBLE-FACED ION SOURCE - Disclosed is an ion source comprising a plate-shaped source body which has radioactivity on its both sides and allows positive and negative ions to penetrate through the source body. The present invention gives beneficial effects. First, the ion source structure can improve the ionization efficiency of sample molecules, and the generated sample ions have a centralized distribution within a flat space on both sides of the source body. Such distribution of ion cloud facilitates to improve the IMS sensitivity. Meanwhile, the source body of the present invention has a transmittance in itself. Thus, positive and negative ions generated on both sides of the source body can penetrate through the source body and be separated to the both sides of the source body. In this way, it is possible to improve the utilization efficiency of ions.11-19-2009
20090309042ION SOURCES - This invention relates to an Ion gun (12-17-2009
20090206274MULTI-ELECTRODE NEGATIVE ION GENERATOR - A negative ion generator includes a multi-electrode device with an emitter for generating a current. A first counter electrode includes an aperture therein with a distal end of said emitter being operatively positioned within said first counter electrode. A second cylindrical electrode includes an aperture therein with the second counter electrode being spaced a predetermined distance from the first counter electrode and being operatively positioned relative to the emitter for increasing the through-put of the negative ion generator by reducing the total emitted current while maintaining a fairly constant level of available negative ion current.08-20-2009
20090189083Ion-beam source - An ion-beam source comprising: a plasma-generation unit for generating plasma and an ion-extraction unit for extraction and acceleration of ions from the aforementioned plasma, where the ion-extraction unit is made in the form of at least one grid under a negative potential. The plasma generating unit consists of a working chamber having a deeply immersed antenna cell. The cell contains a ferromagnetic core, a heat conductor with a heat sink, at least one inductive coil wound onto the ferromagnetic core, and a cap made from a dielectric material that sealingly covers the ferromagnetic core and the inductive coil.07-30-2009
20080245969Method and Apparatus for Creating a Plasma - An apparatus is provided for producing a plasma for a work surface, for example to deposit material thereon. The apparatus comprises an enclosure which contains an ionizable gas, a plurality of plasma excitation devices each of which is arranged to enable microwaves to travel from a first end thereof to a second end and radiate therefrom into the gas, and means for generating a magnetic field in the gas. A source of microwaves feeds microwaves to the first ends of the excitation devices. In use, regions exist within the said gas where the direction of the electric vector of the microwaves is non-parallel to the lines of the magnetic field, and the magnetic field has value B, and the microwaves have a frequency f such as to substantially satisfy the relationship: B=πmf D e where m and e are the mass and charge respectively of an electron.10-09-2008
20120292526Ionization apparatus and ionization analysis apparatus - A sampling nozzle 11-22-2012
20120292525Atmospheric Pressure Ionization Inlet for Mass Spectrometers - Methods and systems for mass spectrometry and more particularly to an interface providing charged particles to a mass spectrometer are described herein.11-22-2012
20080277593Ion source - A cathode holder of a tubular shape is inserted into an opening for a cathode of a plasma generating chamber, the cathode holder positioned such that a surface thereof opposes or surrounds a side surface of a cathode. The cathode is held in the cathode holder so that a front surface of the cathode will be positioned on the same plane as, outward from, or inward from the inner wall surface. In the cathode holder is provided a tubular first heat shield surrounding the cathode with a space provided between the first heat shield and the cathode, a surface of the first heat shield positioned to oppose or surround the side surface of the cathode. At a rear end of the cathode is provided a filament. The gap between the cathode holder and the plasma generating chamber is filled with an electrical insulating material.11-13-2008
20090314952ION SOURCE FOR GENERATING NEGATIVELY CHARGED IONS - An ion source for generating negatively charged ions is presented and described, said ion source having a closure plate which is provided with an outlet opening and which has a wall which surrounds a combustion chamber, wherein the wall has a tubular section, which extends from the outlet opening and is formed from an insulating material, and has a rear wall, wherein the rear wall is arranged at the end of the tubular section which lies opposite the outlet opening and closes off the combustion chamber, having a coupling coil whose windings are arranged around the tubular section of the wall outside the combustion chamber, and having a filter field magnet. The problem of making available an ion source for generating negatively charged ions which has an increased yield and is also suitable for generating ions from substances which are only available in a gaseous form is solved by virtue of the fact that the rear wall is formed from an insulating material and has an inlet opening, and in that the filter field magnet is arranged on that side of the tubular section which faces away from the combustion chamber.12-24-2009
20090314953IONIZATION DEVICE - An ionization device includes an ionization chamber (12-24-2009
20090314951ION SOURCE CLEANING METHOD AND APPARATUS - In a cleaning process for an ion source chamber, an electrode positioned outside of the ion source chamber includes a suppression plug. When the cleaning gas is introduced into the source chamber, the suppression plug may engage an extraction aperture of the source chamber to adjust the gas pressure within the chamber to enhance chamber cleaning via. plasma-enhanced chemical reaction. The gas conductance between the source chamber aperture and the suppression plug can be adjusted during the cleaning process to provide optimum cleaning conditions and to exhaust unwanted deposits.12-24-2009
20080277592COLD-CATHODE-BASED ION SOURCE ELEMENT - An ion source element includes a cold cathode, a grid electrode, and an ion accelerator. The cold cathode, the grid electrode, and the ion accelerator are arranged in that order and are electrically separated from one another. A space between the cold cathode and the grid electrode is essentially smaller than a mean free path of electrons at an operating pressure. The ion source element is thus stable and suitable for various applications.11-13-2008
20130119264Ion Wind Generator and Ion Wind Generating Device - Provided is an ion wind generator capable of diversifying either or both of the amount of wind or wind direction. An ion wind generator is provided with a first electrode, a second electrode having a downstream area which is arranged at a position in a plan view shifted from first electrode towards the positive side in the x direction, and a dielectric between the first electrode and the second electrode. In a plane view, the distance (d) in the x-direction from a downstream side edge of the first electrode to the downstream side edge of the downstream area differs in the y-direction which is perpendicular to the x-direction.05-16-2013
20090039282MATRIX-ASSISTED LASER DESORPTION WITH HIGH IONIZATION YIELD - Analyte ions are generated in an ion source by matrix-assisted laser desorption (MALDI) in which laser light pulses have significantly less than one nanosecond duration, focal diameters of less than twenty micrometers and energy densities such that only about one picogram of sample is desorbed per pulse of laser light and per laser spot. An unexpectedly high degree of ionization of analyte molecules is produced for selected matrix substances. Many laser spots can be generated side-by-side from a single laser light pulse for use with MALDI time-of-flight mass spectrometers. Applying pulses with a repetition rate of around 50 kilohertz and moving the sample or guiding the laser light beam so each laser light pulse impinges on a cool sample spot allows the ion source to be used with spectrometers that require a constant ion current.02-12-2009
20100140495CATHODE HAVING ELECTRON PRODUCTION AND FOCUSING GROVES, ION SOURCE AND RELATED METHOD - A cathode having electron production and focusing grooves for an ion source of an ion implanter system, the ion source and a related method are disclosed. In one embodiment, the cathode includes a working surface having a plurality of electron production and focusing grooves positioned therein. A repeller of the ion source may be similarly structured.06-10-2010
20090152473Photon source comprising an ecr source with pressure gradient - The invention relates to a photon source comprising an electron cyclotron resonance (ECR) multicharged ion plasma source, the multicharged ions corresponding to several charge states of a first constituent (g06-18-2009
20090321657SYSTEM AND METHOD OF CONTROLLING BROAD BEAM UNIFORMITY - An ion beam uniformity control system, wherein the uniformity control system comprising a differential pumping chamber that encloses an array of individually controlled gas jets, wherein the gas pressure of the individually controlled gas jets are powered by a controller to change the fraction of charge exchanged ions, and wherein the charge exchange reactions between the gas and ions change the fraction of the ions with original charge state of a broad ion beam, wherein the charge exchanged portion of the broad ion beam is removed utilizing an deflector that generates a magnetic field, a Faraday cup profiler for measuring the broad ion beam profile; and adjusting the individually controlled gas jets based upon feedback provided to the controller to obtain the desired broad ion beam.12-31-2009
20110139998ION BEAM GENERATOR - [Objective of the Invention] An ion beam generator, a thermal distortion in a grid assembly is reduced.06-16-2011
20090084977METHOD AND DEVICE FOR ADJUSTING A BEAM PROPERTY IN A GAS CLUSTER ION BEAM SYSTEM - A method and device for adjusting a beam property, such as a beam size, a beam shape or a beam divergence angle, in a gas cluster beam prior to ionization of the gas cluster beam is described. A gas cluster ion beam (GCIB) source is provided, comprising a nozzle assembly having a gas source, a stagnation chamber and a nozzle that is configured to introduce under high pressure one or more gases through the nozzle to a vacuum vessel in order to produce a gas cluster beam. Additionally, the GCIB source comprises a gas skimmer positioned downstream from the nozzle assembly that is configured to reduce the number of energetic, smaller particles in the gas cluster beam. Furthermore, the GCIB source comprises a beam adjustment device positioned downstream from the gas skimmer that is configured to adjust at least one beam property of the gas cluster beam, and an ionizer positioned downstream from the beam adjustment device that is configured to ionize the gas cluster beam to produce a GCIB.04-02-2009
20090101834Ion beam extraction assembly in an ion implanter - The present invention relates to an ion beam extraction assembly for use in an ion beam generation apparatus such as those used, for example, in an ion implanter. An ion beam extraction assembly is provided for mounting within an ion beam generating apparatus comprising an ion source such that the extraction assembly is operable to extract ions from the ion source as an ion beam. The extraction assembly comprises an electrode assembly separate from the ion source, an electrode of the electrode assembly defining at least partly a path through the extraction assembly for passage of an ion beam. At least a part of the electrode assembly adjacent the path is tungsten and at least a part of the electrode assembly that is remote from the path is formed from a less expensive and/or lighter material.04-23-2009
20090230318TARGET DESIGN FOR HIGH-POWER LASER ACCELERATED IONS - Methods for designing a laser-accelerated ion beam are disclosed. The methods include modeling a system including a heavy ion layer, an electric field, and high energy light positive ions having a maximum light positive ion energy, correlating physical parameters of the heavy ion layer, the electric field, and the maximum light positive ion energy using the model, and varying the parameters of the heavy ion layer to optimize the energy distribution of the high energy light positive ions. One method includes analyzing the acceleration of light positive ions, for example protons, through interaction of a high-power laser pulse with a double-layer target using two-dimensional particle-in-cell (PIC) simulations and a one-dimensional analytical model. The maximum energy acquired by the accelerated light positive ions, e.g., protons, in this model depends on the physical characteristics of the heavy-ion layer—the electron-ion mass ratio and effective charge state of the ions. The hydrodynamic equations for both electron and heavy ion species solved and the test-particle approximation for the protons is applied. It was found that the heavy ion motion modifies the longitudinal electric field distribution, thus changing the acceleration conditions for the light positive ions.09-17-2009
20090212232ION SOURCE AND ION IMPLANTATION APPARATUS - An ion source is to extract a ribbon-shaped ion beam longer in the Y direction in the Z direction and provided with a plasma generating chamber, a plasma electrode which is disposed near the end of the plasma generating chamber in the Z direction and has an ion extracting port extending in the Y direction, a plurality of cathodes for emitting electrons into the plasma generating chamber to generate a plasma and arranged in a plurality of stages along the Y direction, and a magnetic coil which generates magnetic fields along the Z direction in a domain containing the plurality of cathodes inside the plasma generating chamber.08-27-2009
20100243912ISOLATION CIRCUIT FOR TRANSMITTING AC POWER TO A HIGH-VOLTAGE REGION - A sequence of series-connected transformers for transmitting power to high voltages incorporates an applied voltage distribution to maintain each transformer in the sequence below its withstanding voltage.09-30-2010
20100001205ION GENERATING APPARATUS - An ion generating apparatus includes an ion generating element having a positive ion discharger for generating positive ions, and a negative ion discharger for generating negative ions. The positive ion discharger and the negative ion discharger are arranged separately from and independently of each other on a base member with a distance securing insulation between the positive and negative dischargers. The ion generating apparatus also includes a blower for releasing the ions generated by the positive and negative ion dischargers into air and a voltage application circuit. The blower blows wind in a direction parallel to a surface of the base member.01-07-2010
20100200767OPTICAL APPARATUS FOR PLASMA - An optical apparatus for plasma includes a light collection lens provided to receive optical emission spectrum from plasma, a first aperture stop disposed between the light collection lens and the plasma to block out-focused light, a second aperture stop disposed between the light collection lens and an imaging area of the light collection lens to block in-focused light, and a pinhole disposed at the imaging area of the light collection lens to limit depth of focus.08-12-2010
20120068082ION GENERATION APPARATUS AND ELECTRIC EQUIPMENT - An ion generation apparatus includes an opposing electrode, a discharge electrode for generating ions between itself and the opposing electrode, and a slider constructed to be movable between a contact state in which contact with the discharge electrode is established and a non-contact state in which contact is not established in order to clean the discharge electrode. Thus, an ion generation apparatus and electric equipment capable of preventing lowering in ion generation efficiency even in an environment where there is much dust can be obtained.03-22-2012
20110240876APPARATUS FOR CONTROLLING THE TEMPERATURE OF AN RF ION SOURCE WINDOW - An RF ion source utilizing a heating/RF-shielding element for controlling the temperature of an RF window and to act as an RF shielding element for the RF ion source. When the heating/RF shielding element is in a heating mode, it suppresses formation of unwanted deposits on the RF window which negatively impacts the transfer of RF energy from an RF antenna to a plasma chamber. When the heating/RF-shielding element is in a shielding mode, it provides an electrostatic shielding for the RF ion source.10-06-2011
20100193701MULTIPLE NOZZLE GAS CLUSTER ION BEAM SYSTEM - Disclosed is a multi-nozzle and skimmer assembly for introducing a process gas mixture, or multiple process gases mixtures, in a gas cluster ion beam (GCIB) system, and associated methods of operation to grow, modify, deposit, or dope a layer upon a substrate. The multiple nozzle and skimmer assembly includes at least two nozzles arranged in mutual close proximity to at least partially coalesce the gas cluster beams emitted therefrom into a single gas cluster beam and/or angled to converge each beam toward a single intersecting point to form a set of intersecting gas cluster beams, and to direct the single and/or intersecting gas cluster beam into a gas skimmer.08-05-2010
20110210265Method and Apparatus for a Porous Metal Electrospray Emitter - An ionic liquid ion source can include a microfabricated body including a base and a tip. The microfabricated body can be formed of a porous metal compatible (e.g., does not react or result in electrochemical decaying or corrosion) with an ionic liquid or a room-temperature molten salt. The microfabricated body can have a pore size gradient that decreases from the base of the body to the tip of the body, so that the ionic liquid can be transported through capillarity from the base to the tip.09-01-2011
20100038556HOT CATHODE AND ION SOURCE INCLUDING THE SAME - A hot cathode includes: a hollow external conductor; a hollow internal conductor which is placed coaxially inside the external conductor; and a connection conductor which electrically connects tip end portions of the conductors. A heating current is folded back through the connection conductor to flow in opposite directions in the external conductor and the internal conductor.02-18-2010
20110101237CARBON ION GENERATING DEVICE AND TUMOR TREATMENT APPARATUS USING THE SAME - Provided are a carbon ion generating device and a tumor treatment apparatus using the same. The carbon ion generating device includes a carbon nanostructure, a carbon emitting structure, an ionizing structure, and an accelerator. The carbon emitting structure is configured to induce an emission of carbon atoms from one end of the carbon nanostructure. The ionizing structure is configured to ionize the emitted carbon atoms. The accelerator is configured to accelerate the ionized carbon atoms.05-05-2011
20090001280ION GENERATING ELEMENT, CHARGING DEVICE AND IMAGE FORMING APPARATUS - In an ion generating element according to the present invention, a discharge electrode and an inductive electrode are provided to face each other with a dielectric body therebetween, and a heater electrode for producing heat with Joule heat generated by electrification and the inductive electrode are provided independently on the same surface of the dielectric body. Further, the heater electrode and the inductive electrode are connected and positioned such that a heater current does not flow into the inductive electrode. Thereby, it is possible to appropriately set a size or a shape of the inductive electorde according to a condition at low costs, allowing stable and effective discharge.01-01-2009
20110095199METHOD TO MEASURE CURRENT USING PARALLEL PLATE TYPE IONIZATION CHAMBER WITH THE DESIGN OF GUARD ELECTRODE - An ionization chamber includes a chamber, two outer electrode plates and a center electrode plate. The center electrode plate is disposed at the center of the chamber, and signals produced in the chamber can be collected completely by the center electrode plate to avoid signal losses and improve the accuracy of the test result of the ionization chamber. The center electrode plate also can maintain a constant internal volume of the chamber and prevent a change of effective volume within the chamber due to a change of electric field and enhance the stability of the test result of the ionization chamber. A guard electrode is wrapped by an insulation pin of the electrode and the outer insulation ring to form an insulation shield that can greatly reduce current leakage of the protection electrode and improve the accuracy of the test result of the ionization chamber.04-28-2011
20120305799PORTABLE ION GENERATOR - An ion generator is disclosed. The ion generator has improved portability and ion generation efficiency. As is apparent from the above description, the ion generator according to the present invention is configured so that the discharge unit is constituted by the felts, and the piezoelectric element, not the coil type transformer, is used in the high voltage generation unit which generates high voltage. Consequently, the present invention has the effect of improving portability of the ion generator and the present invention has the effect of improving ion generation efficiency although the portability of the ion generator is improved by configuring the ion generator according to the present invention so that the discharge unit is constituted by the felts, and the piezoelectric element, not the coil type transformer, is used in the high voltage generation unit which generates high voltage.12-06-2012
20080210883Liquid metal ion gun - An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion sour source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.09-04-2008
20090140164INDUCTION ELECTRODE, ION GENERATION ELEMENT, ION GENERATION APPARATUS, AND ELECTRIC EQUIPMENT - An ion generation element includes an induction electrode and a plurality of discharge electrodes. The induction electrode is formed of one metal plate. A circumferential portion of a through hole is bent, and a thickness of a wall portion of the through hole is greater than a thickness of a top plate portion . A needle-like tip end of the discharge electrode is located within a range of the thickness of the through hole. Thus, an induction electrode having a structure realizing a small thickness, capable of lessening variation in an amount of ion generation caused by variation in positional relation between the tip end of the discharge electrode and the induction electrode, an ion generation element, an ion generation apparatus, and electric equipment can be obtained.06-04-2009
20100051825ION SOURCE - An ion source includes a plasma generating chamber into which an ionization gas containing fluorine is introduced, a hot cathode provided on one side in the plasma generating chamber, an opposing reflecting electrode which is provided on other side in the plasma generating chamber and reflects electrons when a negative voltage is applied from a bias power supply to the opposing reflecting electrode, and a magnet for generating a magnetic field along a line, which connects the hot cathode and the opposing reflecting electrode, in the plasma generating chamber. The opposing reflecting electrode is formed of an aluminum containing material.03-04-2010
20110155922ION DETECTING APPARATUS AND ION GENERATING APPARATUS - An air blower including a motor 06-30-2011
20100243913PRE-ALIGNED NOZZLE/SKIMMER - The pre-aligned nozzle/skimmer module includes an internal pre-aligned nozzle assembly and internal pre-aligned skimmer cartridge assembly to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module can be pre-aligned to more accurately position the GCIB. The pre-aligned nozzle/skimmer module more accurately controls the formation of the gas clusters of a pre-aligned Gas Cluster Ion Beam (GCIB).09-30-2010
20110049383ION IMPLANTER AND ION IMPLANT METHOD THEREOF - An ion implanter and an ion implant method for achieving a two-dimensional implantation on a wafer are disclosed. The ion implanter includes an ion source, a mass analyzer, a wafer driving mechanism, an aperture mechanism, and an aperture driving mechanism. The ion source and the mass analyzer are capable of providing an ion beam. The wafer driving mechanism is configured to drive a wafer along only a first direction. The aperture mechanism has an aperture for filtering the ion beam before the wafer is implanted. The aperture driving mechanism is configured to drive the aperture along a second direction intersecting the first direction. By moving the wafer and the aperture along different directions separately, the projection of the ion beam can achieve a two-dimensional implantation on the wafer. Here, at least one of the directions is optionally parallel to the longer dimension of the two-dimensional cross-section of the ion beam.03-03-2011
20120175526IONIZATION GENERATING TUBE AND AN IONIZATION GENERATING DEVICE COMPRISING THE SAME - This invention relates to an ionization tube and an ionization device including the same. The ionization tube according to one aspect of this invention has a hollow structure, and the tube is formed using a mixture of a ceramic and a radioactive material, and the radioactive material is distributed along the entire length of the tube. Consequently, the ionization tube according to this invention can enhance ionization efficiency because the surface area over which alpha particles are emitted can be increased.07-12-2012
20110089335Stripping Member, A Stripping Assembly And A Method For Extracting A Particle Beam From A Cyclotron - The present invention relates to a strip-ping member for stripping electrons off a negatively charged particle beam at the periphery of a cyclotron for extracting a particle beam out of said cyclotron, said stripping member comprising a first stripper foil adapted for being located at the periphery of said cyclotron so that said particle beam passes through said first stripper foil, characterized in that it comprises a second stripper foil adapted for being located side-by-side with the first foil at the periphery of said cyclotron at a more peripheral radius than said first stripper foil so that said negatively charged particle beam passes through said second stripper foil when said first stripper foil is damaged.04-21-2011
20080296510Ion Implantation System and Ion Implantation System - It is devised to transport plasma including charged particles made of containment target atom ions and charged particles of a polarity opposite to that of the containment target atom ions, up to an empty fullerene film on a deposition-assistance substrate by a uniform magnetic field, and to give acceleration energies to the containment target atoms by a bias voltage applied to the deposition-assistance substrate, thereby implanting the containment target atoms into the fullerene film. Since attractive forces act between the charged particles constituting the plasma so that the plasma is not diverged, it becomes possible to achieve a high density ion implantation to improve a yield of containing-fullerene even in ion implantation with a low energy.12-04-2008
20110036990PLATEN TO CONTROL CHARGE ACCUMULATION - An embossed platen to control charge accumulation includes a dielectric layer, a plurality of embossments on a surface of the dielectric layer to support a workpiece, each of a first plurality of the plurality of embossments having a conductive portion to contact a backside of the workpiece when the workpiece is in a clamped position, and a conductor to electrically couple the conductive portion of the first plurality of embossments to ground. An ion implanter having such an embossed platen is also provided.02-17-2011
20120267546Vacuum System Cold Trap Filter - A cold trap filter and method is provided for filtering chemical species from a vacuum system of an ion implantation system. A canister is in fluid communication with an exhaust of a high vacuum pump and an intake of a roughing pump used for evacuating an ion source chamber. One or more paddles are positioned within the canister, wherein each paddle has a cooling line in fluid communication with a coolant source. The coolant source passes a coolant through the cooling line, thus cooling the one or more paddles to a predetermined temperature associated with a condensation or deposition point of the chemical species, therein condensing or depositing the chemical species on the paddles while not interfering with a vacuum capacity of the high vacuum and roughing pumps. The paddles can also be electrically biased to electrostatically attract the chemical species to the paddles in one or more biasing steps.10-25-2012
20120319003ION BEAM DEVICE - Provided is an ion beam device provided with a gas electric field ionization ion source which can prevent an emitter tip from vibrating in a non-contact manner. The gas electric field ionization ion source is comprised of an emitter tip (12-20-2012
20120280139Method of Anion Production from Atoms and Molecules - Ion sources are described for producing negative ion beams with low mass bias in which a neutral vapor of an electropositive element ionizes neutral atoms or molecules.11-08-2012
20130020497ELECTROSTATIC ATOMIZING DEVICE - An electrostatic atomizing device comprises an electrostatic atomizing part (01-24-2013
20130020496PARTICLE SOURCES AND APPARATUSES USING THE SAME - The present disclosure provides a particle source comprising a base having a gently-shaped top, and a tip formed as a tiny protrusion on the top of the base.01-24-2013
20080217556ELECTRONIC APPARATUS - An electronic apparatus of the present invention includes an ion generator which generates ions in an atmosphere to remove chemical emission such as VOC and odor. The ion generator is arranged inside the duct which leads the chemical emission generated from the fixing unit to the discharge opening, and also generates positive ions and negative ions in the atmosphere, thereby can efficiently remove the chemical emission. With this arrangement, an electronic apparatus is realized which sufficiently suppresses the chemical emission such as VOC and odor, and is less likely to dirty the surroundings of the electronic apparatus such as the outer surface thereof and the walls surrounding the electronic apparatus.09-11-2008
20130126749ION GENERATOR - A partition is formed between an ion generating unit at the windward side and an ion generating unit at the leeward side, so that the amount of airflow to pass through the ion generating unit at the windward side will become more in comparison to the amount of airflow to pass through the ion generating unit at the leeward side.05-23-2013
20130146781ION GENERATING DEVICE AND ELECTRICAL APPARATUS - An arrangement area of a transformer drive circuit, an arrangement area of a high-voltage transformer, and an arrangement area of an ion generating unit are two-dimensionally divided from each other in a casing. A connection terminal is electrically connected to the transformer drive circuit and is formed of a conductive film arranged to be exposed to the outside of the casing. Accordingly, an ion generating device whose size and thickness can be easily reduced and an electrical apparatus including the ion generating device can be provided.06-13-2013
20110272594GAS CLUSTER ION BEAM SYSTEM WITH RAPID GAS SWITCHING APPARATUS - A processing system is provided for irradiating a substrate with a gas cluster ion beam (GCIB). The system includes a nozzle for forming and emitting gas cluster beams through a nozzle outlet, and a stagnation chamber that is located upstream of and adjacent the nozzle. The stagnation chamber has an inlet, and the nozzle is configured to direct a single gas cluster beam toward the substrate. An ionizer is positioned downstream of the outlet and is configured to ionize the gas cluster beam to form the GCIB. The system also includes a gas supply that is in fluid communication with the inlet of the stagnation chamber, and which includes a gas source and a valve located between the gas source and the nozzle for controlling flow of a gas between the gas source and the nozzle.11-10-2011
20110272593GAS CLUSTER ION BEAM SYSTEM WITH CLEANING APPARATUS - A processing system is provided for irradiating a substrate with a gas cluster ion beam (GCIB). The system includes a vacuum vessel that has an interior and is configured to support the substrate therein, and at least one nozzle for forming and emitting a gas cluster beam. The at least one nozzle is configured to direct the gas cluster beam within the vacuum vessel toward the substrate. An ionizer is positioned to ionize the gas cluster beam to form the GCIB. A main gas supply of the system is in fluid communication with the at least one nozzle for supplying gas to the nozzle. The system also includes a plasma-generating apparatus that communicates with the interior of the vacuum vessel and which is configured to receive a cleaning gas and selectively emit plasma for cleaning the interior of the vacuum vessel.11-10-2011
20120012755ION SOURCE APPARATUS - An ion source apparatus has an ion source assembly and a neutralizer. The ion source assembly has a body, a heat-dissipating device, an anode chunk and a gas distributor. The heat-dissipating device has a thermal transfer plate and a first thermal side sheet. The thermal transfer plate has a top, a protrusion and an annular disrupting recess. The protrusion is formed at the top of the thermal transfer plate. The disrupting recess is radially formed around the protrusion. The first thermal side sheet surrounds the protrusion. The gas distributor is mounted securely in the protrusion. Because the protrusion is located between the gas distributor and the first thermal side sheet and the disrupting recess is radially formed around the protrusion, accumulated ions, molecules and deposition film particles are longitudinally disrupted and do not form a short circuit between the gas distributor and the first thermal side sheet.01-19-2012
20120018649ION SUPPLY DEVICE AND WORKPIECE PROCESSING SYSTEM PROVIDED WITH THE SAME - An ion supply device includes an ion generator for generating ions for removing static electricity, a carrier gas supply unit for supplying to the ion generator a carrier gas for carrying the ions generated in the ion generator, and an ion supply nozzle for blowing the ions and the carrier gas from the ion generator through a blow-off opening toward an electricity removal target from which static electricity is to be removed. A slit is provided at the blow-off opening and has an increased width as the slit gets distant from the electricity removal target. The ion supply nozzle includes an internal flow path and a plurality of internal fins provided at a portion of the internal flow path near the blow-off opening so that the ions and the carrier gas blown from the slit is uniformly distributed along a lengthwise direction of the slit.01-26-2012
20130099133FOCUSED ION BEAM APPARATUS - Provided is a focused ion beam apparatus including a gas field ion source, the gas field ion source including: an emitter (04-25-2013
20090272912ION GENERATOR - An ion generator is capable of efficiently generating ions and includes a case accommodating an ion-generating element that generates ions by discharging electricity from a discharging needle electrode and a cover having openings for ion discharge. Resistive elements are disposed at peripheral portions of the openings, and the resistive elements are grounded. Since the resistive elements are grounded, the peripheral portions of the openings are prevented from being electrostatically charged. As a result, retention of ions at the openings is suppressed, and ions are efficiently generated and discharged.11-05-2009
20090283692ION-GENERATING DEVICE AND ELECTRICAL APPARATUS - An outer casing is partitioned, in a plan view, into a high-voltage transformer drive circuit block for disposing at least a high-voltage transformer drive circuit, a high-voltage transformer block for disposing at least a secondary side of a high-voltage transformer, and an ion-generating element block for disposing an ion-generating element. It is thereby possible to obtain an ion-generating device suitable for reduction in size and thickness, and an electrical apparatus mounted with the same.11-19-2009
20090283693INTEGRALLY GATED CARBON NANOTUBE IONIZER DEVICE - Described herein is a field ionization and electron impact ionization device consisting of carbon nanotubes with microfabricated integral gates that is capable of producing short pulses of ions.11-19-2009
20090114840Ion sources, systems and methods - Ion sources, systems and methods are disclosed.05-07-2009
20080217555SYSTEMS AND METHODS FOR A GAS FIELD IONIZATION SOURCE - In one aspect the invention provides a gas field ion source assembly that includes an ion source in connection with an optical column such that an ion beam generated at the ion source travels through the optical column. The ion source includes an emitter having a width that tapers to a tip comprising a few atoms. In other aspects, the methods provide for manufacturing, maintaining and enhancing the performance of a gas field ion source including sharpening the tip of the ion source in situ.09-11-2008
20110315890GAS ION SOURCE WITH HIGH MECHANICAL STABILITY - A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.12-29-2011
20090057566GAS ION SOURCE WITH HIGH MECHANICAL STABILITY - A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.03-05-2009
20130161530LASER ION SOURCE - According to one embodiment, a laser ion source is configured to generate ions by application of a laser beam, the laser ion source including a case to be evacuated, an irradiation box disposed in the case and including a target which generates ions by irradiation of laser light, an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam, a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times, and a shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times.06-27-2013
20080272310COLD ELECTRON EMITTER DEVICE FOR DISPLAY - An electron emitter for a display provides an electron source, an electron accelerator, an electron collector disposed between the electron source and the electron accelerator, and one or more electron deflectors to selectively deflect electrons in an electron beam or electron plane towards the electron collector phosphorous coating on a display screen, within a non-metallic vacuum chamber having an adjustable vacuum. Pinhead electrode electron deflectors may each control one color of a pixel, and each set of three adjacent pinhead electrodes may comprise a complete pixel on the display screen.11-06-2008
20100127186Laser produced plasma EUV light source - A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.05-27-2010
20110248181SYSTEM FOR FAST IONS GENERATION AND A METHOD THEREOF - The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.10-13-2011
20120006998CONFIGURATIONS OF USING A POINT LIGHT SOURCE IN THE CONTEXT OF SAMPLE SEPARATION - A sample detection apparatus for detecting a fluidic sample in a flow cell of a sample separation system, the sample detection apparatus comprising an electromagnetic radiation source having a chamber configured for generating a plasma, and an energy source configured for generating and directing an energy beam towards the plasma for heating the plasma so that the plasma emits primary electromagnetic radiation, and a detection path being arranged in a detection direction, wherein the detection direction is arranged angularly displaced with respect to a propagation direction of the energy beam, so that primary electromagnetic radiation propagating in the detection direction enters the detection path, wherein the detection path comprises an electromagnetic radiation detector configured for detecting secondary electromagnetic radiation being characteristic for the fluidic sample and resulting from an interaction between the fluidic sample and the primary electromagnetic radiation propagating in the detection direction or at least a portion thereof.01-12-2012
20120132827ION ACCELERATION METHOD, ION ACCELERATION APPARATUS, ION BEAM IRRADIATION APPARATUS, AND ION BEAM IRRADIATION APPARATUS FOR MEDICAL USE - A laser light is emitted from a laser light source and focused inside a cluster-gas. A nozzle is installed in a vacuum. The nozzle is configured so that a jet of gas can be jetted from its top into the vacuum. The gas is a mixed gas of helium and carbon dioxide. The gas jetted into the vacuum undergoes adiabatic expansion with a steep cooling, which produces the cluster-gas. In the cluster gas, a large number of CO05-31-2012
20120280138FILM MEMBER, FILM TARGET FOR LASER-DRIVEN ION ACCELERATION, AND MANUFACTURING METHODS THEREOF - The present disclosure provides a method of manufacturing film member for laser-driven ion acceleration, a film target, and a method of manufacturing the same, so that only the film member exists at a laser focusing point on the film target, allowing repeated ion acceleration from the film member by focusing high power laser beams thereon. The method includes preparing a film member solution containing a film material to be used for laser-driven ion acceleration; forming a film member on a base substrate by using the film member solution; and separating the film member from the base substrate by dipping the base substrate having the film member formed thereon into a film parting solvent.11-08-2012
20130153783SYSTEM FOR FAST IONS GENERATION AND A METHOD THEREOF - The present invention discloses a system and method for generating a beam of fast ions. The system comprising: a target substrate having a patterned surface, a pattern comprising nanoscale pattern features oriented substantially uniformly along a common axis; and; a beam unit adapted for receiving a high power coherent electromagnetic radiation beam and providing an electromagnetic radiation beam having a main pulse and a pre-pulse and focusing it onto said patterned surface of the target substrate to cause interaction between said radiation beam and said substrate enabling creation of fast ions.06-20-2013

Patent applications in class ION GENERATION

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