Class / Patent application number | Description | Number of patent applications / Date published |
250400000 | With means to convey or guide the target | 27 |
20090032725 | APPARATUS AND METHODS FOR TREATING A WORKPIECE USING A GAS CLUSTER ION BEAM - Embodiments of an apparatus and methods of forming isolated islands of modified material with a gas cluster ion beam are generally described herein. Other embodiments may be described and claimed. | 02-05-2009 |
20090032726 | ION IMPLANTER HAVING COMBINED HYBRID AND DOUBLE MECHANICAL SCAN ARCHITECTURE - A system and method are provided for implanting ions into a workpiece in a plurality of operating ranges. A desired dosage of ions is provided, and a spot ion beam is formed from an ion source and mass analyzed by a mass analyzer. Ions are implanted into the workpiece in one of a first mode and a second mode based on the desired dosage of ions, where in the first mode, the ion beam is scanned by a beam scanning system positioned downstream of the mass analyzer and parallelized by a parallelizer positioned downstream of the beam scanning system. In the first mode, the workpiece is scanned through the scanned ion beam in at least one dimension by a workpiece scanning system. In the second mode, the ion beam is passed through the beam scanning system and parallelizer un-scanned, and the workpiece is two-dimensionally scanned through the spot ion beam. | 02-05-2009 |
20100213385 | DEVICE AND METHOD FOR ADMINISTERING PARTICLE BEAM THERAPY - A device for circumscribing a target site with a beam. The target site is located within a target body. The path of the beam is varied rotationally so as to form a cone with an isocenter at the cone's apex. The isocenter is fixed on the approximate center of the target site. The target body is rotated about a vertical axis passing approximately through the center of the target site, and the rates of rotation of the beam path and body, respectively correspond so that the beam intersects an axis passing through the target site at an approximately constant angle. | 08-26-2010 |
20100213386 | FOCUSED ION BEAM SYSTEM AND SAMPLE PROCESSING METHOD USING THE SAME - A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers. | 08-26-2010 |
20100224790 | Global Point Spreading Function in Multi-Beam Patterning - In a particle multi-beam structuring apparatus for forming a pattern on a target's surface using a beam of electrically charged particles, during exposure steps the particle beam is produced, directed through a pattern definition means producing a patterned particle beam composed of multiple beamlets, and projected by an optical column including a controllable deflection means onto the target surface to form, at a nominal location on the target, a beam image comprising the image of defining structures in the pattern definition means. The beam image's nominal location relative to the target is changed between exposure steps. The actual location of the beam image is varied within each exposure step around the nominal location, through a set of locations realizing a distribution of locations within the image plane around a mean location coinciding with the nominal location, thus introducing an additional blur which is homogenous over the entire beam image. | 09-09-2010 |
20100237253 | CHARGED PARTICLE BEAM DRAWING METHOD AND APPARATUS - A charged particle beam drawing apparatus includes a charged particle beam gun, a first forming aperture member having an opening, wherein a charged particle beam emitted from the charged particle beam gun is passed through the opening of the first forming aperture member, a second forming aperture member having an opening, wherein the charged particle beam passed through the first forming aperture member is passed through the opening of the second forming aperture member, a movable stage for supporting a workpiece, wherein patterns corresponding to figures in a drawing data are drawn on the workpiece by the charged particle beam passed through the second forming aperture member, and a drawing data correcting process portion for moving the figures in the drawing data on the basis of positions in the opening of the second forming aperture, where the charged particle beam for drawing the patterns is passed through. | 09-23-2010 |
20100243911 | CHARGED PARTICLE IRRADIATION SYSTEM AND IRRADIATION PLANNING EQUIPMENT - In a charged particle irradiation system, forming a uniform dose distribution is required by irradiating a moving irradiation object through beam scanning and energy stacking. The charged particle irradiation system includes an ion beam generator | 09-30-2010 |
20110001059 | Use of Beam Scanning to Improve Uniformity and Productivity of a 2D Mechanical Scan Implantation System - An ion implantation system includes a beamline configured to direct an ion beam toward an end station configured to hold or support a workpiece, and a scanning system. The scanning system is configured to scan the end station past the ion beam in a two-dimensional fashion comprising a first scan axis along a first direction and a second scan axis along a second direction that is different than the first direction. The system further includes a supplemental scanning component operably associated with the scanning system, and configured to effectuate a scanning of the ion beam with respect to the end station along a third scan axis having a third direction that is different than the first direction. | 01-06-2011 |
20110147609 | ION BEAM DEVICE - An ion beam device according to the present invention includes a gas field ion source ( | 06-23-2011 |
20110168911 | DEMAGNIFICATION MEASUREMENT METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, STAGE PHASE MEASUREMENT METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, CONTROL METHOD FOR CHARGED PARTICLE BEAM EXPOSURE APPARATUS, AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS - A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions. | 07-14-2011 |
20110174985 | LITHOGRAPHY SYSTEM WITH LENS ROTATION - The invention relates to a charged particle based lithography system for projecting an image on a target using a plurality of charged particle beamlets for transferring said image to said target, said system comprising a charged particle column comprising: | 07-21-2011 |
20110186748 | Systems And Methods For Scanning A Beam Of Charged Particles - Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle. | 08-04-2011 |
20110220810 | ION DOPING APPARATUS AND DOPING METHOD THEREOF - An ion doping apparatus and a doping method are disclosed. In one embodiment, the apparatus includes a chamber, and a substrate driving unit configured to support and move a substrate in the chamber, wherein the substrate has a plurality of long sides and a plurality of short sides. The apparatus further includes an ion beam generator configured to generate and provide an ion beam having a width smaller than the length of the short sides of the substrate, wherein the substrate driving unit is further configured to move the substrate substantially perpendicular to the width direction of the ion beam. | 09-15-2011 |
20120056100 | CHARGED PARTICLE BEAM LITHOGRAPHY SYSTEM AND TARGET POSITIONING DEVICE - The invention relates to a charged particle beam lithography system comprising: | 03-08-2012 |
20120273692 | METHOD AND APPARATUS FOR PROCESSING A MICROSAMPLE - An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage. | 11-01-2012 |
20130056647 | MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD - In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a plurality of blankers configured to perform blanking-deflect regarding beams corresponding to the multi-beams; a writing processing control unit configured to control writing processing with a plurality of beams having passed through different openings among the plurality of openings being irradiated on the target object at a predetermined control grid interval; and a dose controlling unit configured to variably control a dose of a beam associated with deviation according to a deviation amount when an interval between the plurality of beams irradiated is deviated from the control grid interval. | 03-07-2013 |
20130068962 | DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD - A drawing apparatus include: a charged particle optical system configured to generate M×N charged particle beams; a limiting device configured to limit number of charged particle beams that the charged particle optical system emits toward a substrate; and a controller configured, if an abnormal beam that does not satisfy a use condition is present among the M×N charged particle beams, to control the limiting device such that only m rows, each of the m rows including n charged particle beams that are successive without intervention of the abnormal beam. | 03-21-2013 |
20140048718 | CHARGED PARTICLE BEAM IRRADIATION APPARATUS - A charged particle beam irradiation apparatus includes: a transport line configured to transport a charged particle beam; and a rotating gantry rotatable around a rotation axis, wherein the transport line has an inclined section configured to make the charged particle beam advancing in a direction of the rotation axis advance to be inclined so as to become more distant from the rotation axis, and is formed so as to turn the charged particle beam advanced in the inclined section to a rotational direction of the rotation axis and bend the charged particle beam turned to the rotational direction to the rotation axis side, the rotating gantry is formed of a tubular body which can accommodate an irradiated body and supports the transport line, and the inclined section is disposed to pass through the inside of the tubular body of the rotating gantry. | 02-20-2014 |
20140054469 | METHOD FOR ACQUIRING SETTLING TIME - A method for acquiring a settling time according to an embodiment, includes writing a plurality of first patterns, arranged in positions apart from each other by a deflection movement amount, by using a DAC amplifier in which a settling time of the DAC amplifier is set to a first time to be a sufficient settling time; writing a plurality of second patterns, in a manner where corresponding first and second patterns are in a position adjacent, for each second time of different second times containing the sufficient settling time set as variable; measuring a width dimension of each of a plurality of combined patterns after adjacent first and second patterns are combined for the each second time set as variable; and acquiring the settling time of the DAC amplifier needed for deflection by the deflection movement amount, using the width dimensions. | 02-27-2014 |
20140061499 | CHARGED PARTICLE BEAM PATTERN WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS - A charged particle beam pattern writing method according to an embodiment, includes measuring a position displacement amount of a stage above which a target object is placed, in a rotation direction; and writing a pattern of a beam image on the target object above the stage while the beam image is rotated, by using a plurality of electrostatic lenses at least one of which is arranged in a magnetic field of each of the plurality of electromagnetic lenses whose magnetic fields are in opposite directions, to avoid a focus displacement of a charged particle beam passing through the plurality of electromagnetic lenses and to correct the position displacement amount measured, in the rotation direction of the stage. | 03-06-2014 |
20140110597 | Configurable Charged-Particle Apparatus - The invention relates to a charged-particle apparatus having
| 04-24-2014 |
20150303029 | MULTI CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI CHARGED PARTICLE BEAM WRITING METHOD - A multi charged particle beam writing apparatus includes a dose calculation unit to calculate a first dose resolving the resist of the target object, for a first beam of the multiple beams, corresponding to a pattern forming region, in which a pattern is arranged; and to calculate a second dose not resolving the resist, for a second beam of the multiple beams, corresponding to a no-pattern forming region, which surrounds the whole perimeter of the pattern and in which no pattern is arranged, and a deflection control unit to control a plural blankers so that a dose of the first beam is to be the first dose calculated and a dose of the second beam is to be the second dose calculated. | 10-22-2015 |
20150340196 | MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS - A multi charged particle beam writing method includes, shifting a writing position of each corresponding beam to a next writing position by performing another beam deflection of multi charged particle beams, in addition to the beam deflection for a tracking control, while continuing the beam deflection for the tracking control after the maximum writing time has passed; emitting the each corresponding beam in the “on” state to the next writing position having been shifted of the each corresponding beam, during a corresponding writing time while continuing the tracking control; and returning a tracking position such that a next tracking start position is a former tracking start position where the tracking control was started, by resetting the beam deflection for the tracking control after emitting the each corresponding beam to the next writing position having been shifted at least once of the each corresponding beam while continuing the tracking control. | 11-26-2015 |
20150348741 | MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS - A multi charged particle beam writing method includes emitting each corresponding beam in an “on” state while starting and continuing tracking control, shifting a writing position by beam deflection of the multi beams, in addition to tracking control, while continuing tracking control, emitting each corresponding beam in the next “on” state to the next writing position having been shifted while continuing tracking control, and returning the tracking position by resetting tracking control, after emitting each next corresponding beam to the next writing position having been shifted at least once, wherein writing of a predetermined region is completed by repeating the number of preset times a group of performing emitting, shifting, emitting, and returning, wherein the tracking time from start to reset of tracking control in at least one of the repeated groups is longer than the others. | 12-03-2015 |
20150371813 | SURFACE PROCESSING APPARATUS - A surface processing apparatus is an apparatus which performs surface processing on an inspection object | 12-24-2015 |
20160086764 | METHOD OF MEASURING BEAM POSITION OF MULTI CHARGED PARTICLE BEAM, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS - A method of measuring beam positions of multi charged particle beams includes acquiring the number of beams of multi charged particle beams, needed for the measurement reproducibility of a current amount to be within the range of an allowable value, setting a plurality of measurement points depending on a desired dimensional accuracy value, in an irradiation region irradiated by the whole of the multi charged particle beams, setting, for each of a plurality of measurement points, a beam region, including a measurement point of a plurality of measurement points, irradiated by a plurality of beams whose number is the number of beams needed for the measurement reproducibility in the multi charged particle beams, and measuring, for each of a plurality of measurement points, the position of a measurement point concerned in a plurality of measurement points by using a plurality of beams of a corresponding beam region. | 03-24-2016 |
20160155604 | MULTI CHARGED PARTICLE BEAM WRITING METHOD, AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS | 06-02-2016 |