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WITH CHARGED PARTICLE BEAM DEFLECTION OR FOCUSSING

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250 - Radiant energy

Patent class list (only not empty are listed)

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Class / Patent application numberDescriptionNumber of patent applications / Date published
250396000 Magnetic lens 85
250397000 With detector 55
250398000 With target means 52
Entries
DocumentTitleDate
20110180721SYSTEM, METHOD AND APPARATUS FOR MULTI-BEAM LITHOGRAPHY INCLUDING A DISPENSER CATHODE FOR HOMOGENEOUS ELECTRON EMISSION - A dispenser cathode which comprises an emission surface, a reservoir for material releasing, when heated, work-function-lowering particles, and at least one passage for allowing diffusion of work-function-lowering particles from said reservoir to said emission surface, said emission surface comprising at least one emission area and at least one non-emission area covered with emission-suppressing material and surrounding each emission area, said non-emission area comprising at least one passage connecting said reservoir with said non-emission area and debouching within a diffusion length distance from an emission area for allowing diffusion of work-function-lowering particles from said reservoir to said emission area.07-28-2011
20120161029Efficient Atmospheric Pressure Interface for Mass Spectrometers and Method - An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 06-28-2012
20100059686TANDEM ACCELERATOR METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a tandem accelerator method and apparatus, which is part of an ion beam injection system used in conjunction with multi-axis charged particle radiation therapy of cancerous tumors. The negative ion beam source includes an injection system vacuum system and a synchrotron vacuum system separated by a foil, where negative ions are converted to positive ions. The foil is sealed to the edges of the vacuum tube providing for a higher partial pressure in the injection system vacuum chamber and a lower pressure in the synchrotron vacuum system. Having the foil physically separating the vacuum chamber into two pressure regions allows for fewer and/or smaller pumps to maintain the lower pressure system in the synchrotron as the inlet hydrogen gas is extracted in a separate contained and isolated space by the injection partial vacuum system.03-11-2010
20130075622PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM THERAPY SYSTEM - The particle beam irradiation apparatus irradiates a charged particle beam accelerated by a accelerator onto an irradiation subject; the particle beam irradiation apparatus includes a scanning electromagnet that scans the charged particle beam, and a scanning electromagnet moving apparatus that moves the scanning electromagnet in such a way as to change the distance between the scanning electromagnet and the irradiation subject in the beam axis direction of the charged particle beam.03-28-2013
20080258074BEAM PROCESSING APPARATUS - In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.10-23-2008
20110192986ELECTRON BEAM STERILIZING DEVICE - An electron beam sterilizing device comprises an electron-generating filament, a grid connected to a voltage source, a beam shaper, and an output window. A high voltage source generates a high voltage potential between the electron-generating filament and the output window, for acceleration of electrons. The usability of the device is enhanced in that the electron-generating filament and/or the grid electrode comprises at least two operational portions for variation of the current and form of an output electron beam.08-11-2011
20100148087Arrangement for the Illumination of a Substrate with a Plurality of Individually Shaped Particle Beams for High-Resolution Lithography of Structure Patterns - The invention is directed to an arrangement for the illumination of a substrate with a plurality of individually shaped, controllable particle beams, particularly for electron beam lithography in the semiconductor industry. It is the object of the invention to find a novel possibility for illuminating a substrate (06-17-2010
20100072390CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD - The present invention provides a charged particle beam writing apparatus and a charged particle beam writing method capable of shortening the time necessary to generate shot data and improving writing throughput.03-25-2010
20100072389Charged particle beam irradiating apparatus - The present invention provides a charged particle beam irradiating apparatus capable of simply preventing unevenness or reduction in a peripheral portion of the dose distribution of a charged particle beam.03-25-2010
20100072388Particle beam and crabbing and deflecting structure - A new type of structure for the deflection and crabbing of particle bunches in particle accelerators comprising a number of parallel transverse electromagnetic (TEM)-resonant) lines operating in opposite phase from each other. Such a structure is significantly more compact than conventional crabbing cavities operating the transverse magnetic TM mode, thus allowing low frequency designs.03-25-2010
20130032731PRODUCTION OF MEV MICRO BEAMS OF PROTONS FOR MEDICAL APPLICATIONS - A proton beam guidance apparatus and a method of providing proton beams having sub-micron beam width and MeV energies. The apparatus is a structure having an enclosed channel that can reflect or guide protons by grazing incidence interactions. The enclosed channel is in some embodiments an annular channel. The enclosed channel is shaped to provide a helical path for each proton in the beam. Protons are provided to an input port of the channel, and after multiple grazing incidence interactions with the walls of the channel, are provided as an output beam having dimensions comparable to the cross sectional dimensions of the channel. The channels can have cross sectional dimensions of tens of nanometers or less. No externally applied electromagnetic fields are needed to guide the proton beam. Contemplated applications include use of the exit proton beams to provide medical treatment to patients.02-07-2013
20090121150ELECTROSTATIC DEFLECTION CONTROL CIRCUIT AND METHOD OF ELECTRONIC BEAM MEASURING APPARATUS - An electrostatic deflection circuit and method of an electronic beam measuring apparatus which can achieve the high precision of the electronic beam measuring and contribute to the simplification of the structure of the apparatus is provided. In an analog arithmetic circuit included in an analog operation part constituting an electrostatic deflection circuit, output voltages of multipliers are added and output by an adder. When the magnification is low, as the side of an ordinarily closed contact is closed driven by a relay driving circuit, the output of the adder is amplified by a high gain amplifier with a high amplification factor and applied to an electrostatic deflecting board. When the magnification is high, the side of an ordinarily open contact is closed and it is amplified by a low gain amplifier with a low amplification factor and applied to the electrostatic deflecting board in the same way.05-14-2009
20090121148High Brightness Solid State Ion Beam Generator, its use, and Method for Making such a Generator - Ion sources or generators for focused ion beam emission (FIB) applications emitting ion beams into vacuum or a gas are used in industry and research for the characterization and processing of surfaces. With appropriate focusing, such ion beams can be confined to diameters of a few nanometers. The tip of technical FIB generators for producing such focused beams consists of a liquid metal, gallium in general, which tends to fluctuate during operation. This has a negative influence on the stability of the emission current and the focus definition. It is also possible to generate an FIB with solid tips, consisting of a solid metal, but such tips deteriorate rapidly during operation due to erosion of material from the tip apex. The present invention concerns a novel FIB source generating free space ion beams from a solid source but does not exhibit the above-mentioned erosion effect at the apex. The novel FIB generator consists of a combination of two essentially unitary bodies, a solid electrolyte body with a sharp tip and a solid ion reservoir body, both bodies having close contact with each other. The reservoir is made of or contains the same material, in general a metal as the mobile ions. Loss of ions from the electrolyte body due to emission is compensated by an inflow of ions from the reservoir body during operation. This practically preserves electro-neutrality which is a precondition for continuous mode operation. Erosion of the tip of the electrolyte body does not occur since the counter ions form a solid matrix and the emitted ions are replenished during operation.05-14-2009
20100102245PHOTOCATHODE WITH NANOMEMBRANE - Optical beam modulation is accomplished with the aid of a semiconductive nanomembrane, such as a silicon nanomembrane. A photocathode modulates a beam of charged particles that flow between the carbon nanotube emitter and the anode. A light source, or other source of electromagnetic radiation, supplies electromagnetic radiation that modulates the beam of charged particles. The beam of charged particles may be electrons, ions, or other charged particles. The electromagnetic radiation penetrates a silicon dioxide layer to reach the nanomembrane and varies the amount of available charge carriers within the nanomembrane, thereby changing the resistance of the nanomembrane. As the resistance of the nanomembrane changes, the amount of current flowing through the beam may also change.04-29-2010
20090159811LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES - A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.06-25-2009
20100108903DETERMINATION OF CONTROL PARAMETERS FOR IRRADIATION OF A MOVING TARGET VOLUME IN A BODY - Abstract: A control parameter is determined for a system (05-06-2010
20100108902DUAL MODE GAS FIELD ION SOURCE - A focused ion beam device is provided, including: an ion beam column adapted to house a gas field ion source emitter with an emitter tip and an emitter area for generating ions, a heating means adapted to heat the emitter tip, one or more gas inlets adapted to introduce a first gas and at least one second gas to the emitter area, an objective lens adapted to focus the ion beam generated from the first gas or the second gas, and a controller adapted to switch between a first emitter tip temperature and a second emitter tip temperature for generating an ion beam of ions of the first gas or an ion beam of ions of the at least one second gas.05-06-2010
20130026387SYSTEM AND METHOD FOR TRAPPING AND MEASURING A CHARGED PARTICLE IN A LIQUID - A system and method for trapping a charged particle is disclosed. A time-varying periodic multipole electric potential is generated in a trapping volume. A charged particle under the influence of the multipole electric field is confined to the trapping volume. A three electrode configuration giving rise to a 3D Paul trap and a four planar electrode configuration giving rise to a 2D Paul trap are disclosed.01-31-2013
20130026386ELECTROLYTIC PLATING METHOD AND ELECTROSTATIC DEFLECTING DEVICE - Disclosed is an electrolytic plating method which includes forming plating films 01-31-2013
20090134338Electron Beam Irradiation Method, Electron Beam Irradiation Apparatus, and Electron Beam Irradiation Apparatus for Open-Mouthed Container - There are provided an electron beam application method and an electron beam application device capable of uniformly applying electron beams to an object even if the electron beams have a low energy. For this, electron beams (EB) are applied to a beverage container (05-28-2009
20090078883TECHNIQUES FOR OPTICAL ION BEAM METROLOGY - Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.03-26-2009
20100065752Radially inwardly directed electron beam source and window assembly for electron beam source or other source of electromagnetic radiation - A system and method to provide uniform, high intensity radially inwardly directed electron beams to the interior of a cylindrical volume for the purpose of destroying toxic, hazardous, or noxious organic and/or inorganic compounds contained in air or other media flowing through a cylindrical region; or to destroy or inactivate bacteria, viruses, fungi, or mold spores in such flowing media; to sterilize contents of flowing media; to treat fluidized grains, herbs, or other products; or to destroy chemical warfare agents. A window assembly to transmit electromagnetic radiation, for example, an electron beam, x-rays, or other high energy electromagnetic radiation, is also disclosed.03-18-2010
20130087717ELECTROSTATIC LENS - An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.04-11-2013
20120181444High-Vacuum Variable Aperture Mechanism And Method Of Using Same - A novel technique is disclosed for varying a size of an aperture within a vacuum chamber. A drive mechanism within the vacuum chamber is used to adjust a partial horizontal overlap between at least two blades, wherein a perimeter of the aperture opening is defined by edges of said blades. In one embodiment, a variable aperture mechanism includes first and second blades attached to a first support, and third and fourth blades attached to a second support. The first blade is spaced vertically above the second blade on the first support; a second support, and the fourth blade is spaced vertically above the third blade on the second support. There is a partial horizontal overlap between the first and third blades and between the fourth and second blades, and the aperture opening has a perimeter defined by edges of the four blades. Other embodiments are also disclosed.07-19-2012
20100006770CHARGED PARTICLE BEAM ACCELERATION AND EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam acceleration and optional extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, concentrating magnetic field magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.01-14-2010
20100327179CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME - A charged particle beam column includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.12-30-2010
20100133444CHARGED PARTICLE CANCER THERAPY PATIENT POSITIONING METHOD AND APPARATUS - The invention comprises a patient positioning method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The patient positioning system is used to translate the patient and/or rotate the patient into a zone where the proton beam can scan the tumor using a targeting system. The patient positioning system is optionally used in conjunction with systems used to constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems.06-03-2010
20090302233CHARGED PARTICLE BEAM APPARATUS - A charged particle beam apparatus is provided which can apply a charged particle beam onto a sample with aberration reduced and can apply a charged particle beam with no likelihood of occurrence of discharge even the case of introducing a gas into the sample surface.12-10-2009
20110006214ACCELERATOR SYSTEM AND METHOD FOR SETTING PARTICLE ENERGY - An accelerator system includes an accelerator unit for accelerating particles and a beam transport section that guides the particles from the accelerator unit to a location that is remote from the accelerator unit. An RF cavity generates an electromagnetic RF field that interacts with the particles guided in the beam transport section is disposed along the beam transport section. A phase and a frequency of the RF field are set such that a variation in the energy of the particles interacting with the RF field is generated.01-13-2011
20130056645MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD - In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a writing processing control unit configured to control writing processing so that a plurality of beams having passed through different openings among the plurality of openings are arranged to align on the target object; and a shot interval adjusting unit configured to adjust shot intervals among beams so that a maximum shot interval among beams being a control grid interval defined by a predetermined quantization size or a size which is prescribed within a predetermined range from the predetermined quantization size, or less when the shot intervals among beams which are arranged to align on the target object are different depending on a place.03-07-2013
20120112090Charged Particle Source with Integrated Electrostatic Energy Filter - A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion.05-10-2012
20120112089Aperture unit for a particle beam device - An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.05-10-2012
20130056646MULTI-LEAF COLLIMATOR, PARTICLE BEAM THERAPY SYSTEM, AND TREATMENT PLANNING APPARATUS - There are provided a leaf row (03-07-2013
20090242786ABERRATION CORRECTOR FOR TRANSMISSION ELECTRON MICROSCOPE - To provide an aberration corrector that guarantees freedom in designing a coma-free plane transfer portion even when the mechanical configuration of the aberration corrector is already decided, and has a flexible adjustment margin regarding the corrector exterior. The aberration corrector causes an electron beam trajectory emanating from a specimen plane (physical surface of objective lens) to be incident in parallel with a multipole lens (HEX10-01-2009
20090266997ION SOURCE WITH ADJUSTABLE APERTURE - An ion implanter system including an ion source for use in creating a stream or beam of ions. The ion source has an ion source chamber housing that at least partially bounds an ionization region for creating a high density concentration of ions within the chamber housing. An ion extraction aperture of desired characteristics covers an ionization region of the chamber. In one embodiment, a movable ion extraction aperture plate is moved with respect to the housing for modifying an ion beam profile. One embodiment includes an aperture plate having at least elongated apertures and is moved between at least first and second positions that define different ion beam profiles. A drive or actuator coupled to the aperture plate moves the aperture plate between the first and second positions. An alternate embodiment has two moving plate portions that bound an adjustable aperture.10-29-2009
20120223247PARTICLE BEAM IRRADIATION SYSTEM - A particle beam irradiation system comprises deflection electromagnets which scan by deflecting the particle beam in two dimensions in the lateral direction which is perpendicular to an irradiation direction of the particle beam, and an energy width expanding device through which the particle beam passes so as to expand an energy width of the particle beam and form a SOBP in a depth direction of the irradiation target, that is, in an irradiation direction of the particle beam, wherein the energy width expanding device is configured to form the SOBP in the depth direction along whole irradiation area in the depth direction of the irradiation target, and the deflection electromagnets are controlled so as for an irradiation spot which is formed in the irradiation target by the particle beam to move stepwise along whole irradiation area in the lateral direction of the irradiation target.09-06-2012
20120223246SYSTEM AND METHOD FOR AUTOMATED CYCLOTRON PROCEDURES - Systems and methods are provided to perform efficient, automatic cyclotron initialization, calibration, and beam adjustment. A process is provided that allows the automation of the initialization of a cyclotron after overnight or maintenance imposed shutdown. In one embodiment, five independent cyclotron system states are defined and the transition between one state to another may be automated, e.g., by the control system of the cyclotron. According to these embodiments, it is thereby possible to achieve beam operation after shutdown with minimal manual input. By applying an automatic procedure, all active devices of the cyclotron (e.g., RF system, extraction deflectors, ion source) are respectively ramped to predefined parameters.09-06-2012
20130161529SWITCHING MICRO-RESONANT STRUCTURES BY MODULATING A BEAM OF CHARGED PARTICLES - When using micro-resonant structures, a resonant structure may be turned on or off (e.g., when a display element is turned on or off in response to a changing image or when a communications switch is turned on or off to send data different data bits). Rather than turning the charged particle beam on and off, the beam may be moved to a position that does not excite the resonant structure, thereby turning off the resonant structure without having to turn off the charged particle beam. In one such embodiment, at least one deflector is placed between a source of charged particles and the resonant structure(s) to be excited. When the resonant structure is to be turned on (i.e., excited), the at least one deflector allows the beam to pass by undeflected. When the resonant structure is to be turned off, the at least one deflector deflects the beam away from the resonant structure by an amount sufficient to prevent the resonant structure from becoming excited.06-27-2013
20130214172ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD - An electron beam writing apparatus comprising a XY stage that a sample is placed on, an electron optical column, an electron gun emitting an electron beam disposed in the optical column, an electrostatic lens provided with electrodes aligned in an axial direction of the electron beam disposed in the optical column, wherein a shield plate is disposed between the XY stage and the electron optical column to block reflected electrons or secondary electrons generated by irradiation to the sample with the electron beam. The electrostatic lens is disposed immediately above the shield plate to change a focal position of the electron beam. A voltage supply device applies a negative voltage constantly to the electrostatic lens.08-22-2013
20090026384ELECTROSTATIC LENS ASSEMBLY - A lens assembly having an electrostatic lens component for a charged particle beam system is provided. The assembly includes: a first electrode having a conically shaped portion, a second electrode having a conically shaped portion, and a first insulator having a conically shaped portion, wherein the first insulator comprises two extending portions towards each of its ends, and wherein the two extending portions are formed to generate a gap between the insulator and each of the adjacent electrodes.01-29-2009
20090008568CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD THEREOF - A charged particle beam writing apparatus includes a unit emitting a charged particle beam, a stage on which a target workpiece to be written is placed, a unit correcting a reference position of a small region in a writing region, based on a pattern distortion obtained from positions of figures spread over substantially all writing region of a dummy target workpiece and written without correcting, a first deflector deflecting the beam, based on a corrected reference position obtained by correcting the reference position, a correction unit correcting a relative distance from the corrected reference position to an arbitrary position in the small region, based on a pattern distortion of the dummy, by using the reference position and a coefficient of a correction equation for correcting the reference position, and a second deflector further deflecting the beam from a position deflected by the first deflector, based on the relative distance corrected.01-08-2009
20100276606Charged particle optical system comprising an electrostatic deflector - A charged particle optical system comprising a beamlet generator for generating a plurality of beamlets of charged particles and an electrostatic deflector for deflecting the beamlets. The electrostatic deflector comprises first and second electrodes adapted for connection to a voltage for generating an electric field between the electrodes for deflection of the beamlets, the electrodes being at least partially freestanding in an active area of the electrostatic deflector. The electrodes define at least one passing window for passage of at least a portion of the beamlets between the electrodes, the passing window having a length in a first direction and a width in a transverse direction. The system is adapted to arrange the beamlets in at least one row and to direct a single row of the beamlets through the passing window of the electrostatic deflector, the beamlets of the row extending in the first direction. A substantial part of the electrostatic deflector extends beyond the passing window in the first direction.11-04-2010
20100171042TECHNIQUES FOR INDEPENDENTLY CONTROLLING DEFLECTION, DECELERATION AND FOCUS OF AN ION BEAM - Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.07-08-2010
20090206272VARIABLE-RATIO DOUBLE-DEFLECTION BEAM BLANKER - The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second deflector and a blanking aperture, the first deflector being positioned between a gun lens and a main lens, the second deflector being positioned between the first deflector and the main lens, the blanking aperture being positioned between the second deflector and the main lens, and the first deflector, the second deflector and the blanking aperture being aligned on the optical axis of the column. A method according to the invention comprises the steps of: configuring electron optical elements of said charged particle column to form a beam in the column either with or without a crossover; configuring the main lens to focus the beam formed by the gun lens onto a substrate plane; deflecting the beam with a first deflector in a first direction; and deflecting the beam with a second deflector in a second direction onto the blanking aperture, wherein the first direction is parallel or anti-parallel to the second direction; and wherein the image at the substrate plane does not move during blanking.08-20-2009
20090206271FOCUSSING MASK - A mask suitable for use with a particle beam source such as ion or electron source for forming features and structures and writing on surfaces of materials. The mask comprising an aperture plate, having a plurality of apertures, and focusing means disposed to underlie the aperture plate. The plurality of apertures forming an array whereby each plate aperture is adapted to receive a portion of a particle beam incident on the aperture plate. Each portion of particle beam then passes through focusing means through which the portion of beam is focused onto the surface. The mask thereby forming a plurality of high resolution simultaneously operable focused particle beams.08-20-2009
20110284763Charged Particle Source with Integrated Energy Filter - A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided.11-24-2011
20110284761SYNCHROTRON POWER SUPPLY APPARATUS AND METHOD OF USE THEREOF - The invention comprises a charged particle cancer therapy system or synchrotron system using a single power supply electrically connected to a plurality of magnet sections to provide a uniform current to a plurality of magnets at a given period in time. Optionally, one or more switches introduce a corresponding one or more resistors into a circuit linking the power supply to a magnet or an inductor during an applied power recovery phase between acceleration cycles of the synchrotron, which reduces time of reduction in power from an active applied power to a power suitable for use with a subsequent injection of charged particles into the synchrotron.11-24-2011
20110284760SYNCHROTRON POWER CYCLING APPARATUS AND METHOD OF USE THEREOF - The invention comprises a charged particle cancer therapy system or synchrotron system using one or more switches to introduce a corresponding one or more resistors into a circuit linking a power supply to a magnet or an inductor during an applied power recovery phase between acceleration cycles of the synchrotron, which reduces time of reduction in power from an active applied power to a power suitable for use with a subsequent injection of charged particles into the synchrotron.11-24-2011
20110284762CHARGED PARTICLE EXTRACTION APPARATUS AND METHOD OF USE THEREOF - The invention comprises a charged particle beam extraction method and apparatus optionally used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a radio-frequency (RF) cavity system to induce oscillation of a charged particle stream. Sufficient amplitude modulation of the charged particle stream causes the charged particle stream to hit a material, such as a foil element of a set of foils. The foil decreases the energy of the charged particle stream, which decreases a radius of curvature of the charged particle stream in the synchrotron sufficiently to allow a physical separation of the reduced energy charged particle stream from the original charged particle stream where thickness of a selected foil is a function of energy of circulating charged particles. The physically separated charged particle stream is then removed from the system by use of an applied field and deflector.11-24-2011
20090140160Charged particle beam exposure system and beam manipulating arrangement - A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.06-04-2009
20090140163ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.06-04-2009
20090166553ELECTRON BEAM DRAWING METHOD - According to one embodiment, an electron beam drawing method includes placing a substrate, on which a photosensitive resin film is coated, on a stage, applying an electron beam to the photosensitive resin film while the substrate on the stage is rotated and moved to the horizontal direction, and drawing a pattern extending to a radial direction, in which the electron beam is deflected to a direction parallel with a rotational direction of the substrate such that a relative movement speed of an electron-beam applied position on the substrate in the direction parallel with the rotational direction of the substrate becomes slower than a linear velocity of the substrate, viewed from a drawing start position in a circulation for drawing the pattern.07-02-2009
20120025095CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME - A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.02-02-2012
20090146074HIGH RESOLUTION GAS FIELD ION COLUMN WITH REDUCED SAMPLE LOAD - A method of operating a focused ion beam device having a gas field ion source is described. According to some embodiments, the method includes emitting an ion beam from a gas field ion source, providing an ion beam column ion beam energy in the ion beam column which is higher than the final beam energy, decelerating the ion beam for providing a final beam energy on impingement of the ion beam on the specimen of 1 keV to 4 keV, and imaging the specimen.06-11-2009
20090121149TECHNIQUES FOR SHAPING AN ION BEAM - Techniques for shaping an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for shaping an ion beam. The apparatus may comprise an entrance electrode biased at a first voltage potential, wherein an ion beam enters the entrance electrode, an exit electrode biased at a second voltage potential, wherein the ion beam exits the exit electrode, and a first suppression electrode and a second suppression electrode positioned between the entrance electrode and the exit electrode, wherein the first suppression electrode and the second suppression electrode are independently biased to variably focus the ion beam.05-14-2009
20110079731MULTIPOLE LENS FOR ELECTRON COLUMN - The present invention relates to an electron lens for use in an microcolumn, and more particularly to a multipole electron lens wherein the electron lens includes two or more electrode layers, each of the electrode layers has a slit aperture extending across a central optical axis along which an electron beam passes, and the two electrode layers are aligned on an electron optical axis such that the slit apertures are staggered with each other. Further, the present invention relates to a microcolumn using the multipole lens. The multipole lens according to the present invention can be manufactured and controlled in a simple fashion, reduces the defocusing of the microcolumn, and increases an active deflection area.04-07-2011
20110079730IMAGING SYSTEM - A charged particle multi-beamlet system for exposing a target (04-07-2011
20100117002Irradiation System and Irradiation Method - The system for irradiating patients with charged particles includes a raster scanning irradiation unit with a particle accelerator, a beam guide unit, and a 3D scanning system. It also contains a therapy planning system for generating therapy planning data, which include the energy and number of charged particles per raster point in each layer as derived from the derived dose distribution; a therapy control system, which converts the planning data generated by the therapy planning system into irradiation data and irradiation commands for the particle accelerator, the beam guide unit, and the 3D scanning system. The system further has a plurality of safety devices for ensuring that the therapy planning data have been converted correctly and for verifying the functionality of the system. The plurality of safety devices includes an evaluation unit, which checks the irradiation data and irradiation commands supplied by the therapy control system to the 3D scanning system to verify their therapy-specific plausibility.05-13-2010
20090309039APPLICATION SPECIFIC IMPLANT SYSTEM AND METHOD FOR USE IN SOLAR CELL FABRICATIONS - Solar cells and other semiconductor devices are fabricated more efficiently and for less cost using an implanted doping fabrication system. A system for implanting a semiconductor substrate includes an ion source (such as a single-species delivery module), an accelerator to generate from the ion source an ion beam having an energy of no more than 150 kV, and a beam director to expose the substrate to the beam. In one embodiment, the ion source is single-species delivery module that includes a single-gas delivery element and a single-ion source. Alternatively, the ion source is a plasma source used to generate a plasma beam. The system is used to fabricate solar cells having lightly doped photo-receptive regions and more highly doped grid lines. This structure reduces the formation of “dead layers” and improves the contact resistance, thereby increasing the efficiency of a solar cell.12-17-2009
20090309038CHARGED PARTICLE BEAM EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a radio-frequency (RF) cavity system to induce betatron oscillation of a charged particle stream. Sufficient amplitude modulation of the charged particle stream causes the charged particle stream to hit a material, such as a foil. The foil decreases the energy of the charged particle stream, which decreases a radius of curvature of the charged particle stream in the synchrotron sufficiently to allow a physical separation of the reduced energy charged particle stream from the original charged particle stream. The physically separated charged particle stream is then removed from the system by use of an applied field and deflector.12-17-2009
20100123087METHOD AND APPARATUS FOR PRODUCTION AND MAINTENANCE OF ELECTRON BEAM SPACE-CHARGE NEUTRALIZATION - An electron beam production and control assembly includes a vacuum chamber, a beam source, and a target. The target has an active section and an inactive section. The active section is adapted to generate x-rays when the beam impinges on the x-ray producing section. The electron beam production and control assembly also includes a focusing unit positioned along the chamber at a location intermediate the rearward end and the forward end. The focusing unit directs the beam towards the target in a converging manner to impinge on the target. The focusing unit sweeps the beam along a scanning path over the active section of the target. The focusing unit moves the beam to a retrace path on the inactive section of the target between sweeps of the scanning path to maintain ion accumulation in the beam between sweeps over the active section.05-20-2010
20090166552E-Beam Exposure Apparatus - An e-beam exposure apparatus includes an electron gun provide an e-beam for exposure to a resist layer formed on a substrate; an e-beam column part inducing the path of the e-beam generated from the electron gun; and an electron collecting part disposed at the periphery of the path of the e-beam projected from the e-beam column part on the resist layer to absorb scattered electrons resulting from emission of the incident e-beam from the resist layer.07-02-2009
20090090871Radiation treatment system with a beam control magnet - A radiation treatment system with a beam control magnet for deflecting a beam of electrically charged particles along a curved particle path. The beam control magnet is subdivided along a parting plane perpendicular to the direction of the particle path into a first region and a second region. The quadrupole moments of the beam control magnet have different signs in the first region and the second region.04-09-2009
20080283766Autofocus Method for Scanning Charged-Particle Beam Instrument - An autofocus method for bringing an electron beam into focus on a specimen. Characteristics of the brightness at plural kinds of focus values are found for sets of data. The characteristics are accumulated creating a focus function. The focus function is approximated by a quadratic curve. The focus value at the peak point is found from the quadratic curve. Based on the focus value, the focal condition of the beam is set.11-20-2008
20110168910MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM - The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.07-14-2011
20080315111PARTICLE THERAPY SYSTEM - A particle therapy system is provided. The particle therapy system includes a rotatable gantry with a gantry wall that surrounds an interior. A small irradiation chamber, with an irradiation chamber wall, is located inside the interior. The irradiation chamber wall is spaced apart from the gantry wall, and a deflection chamber is embodied between the two walls. The irradiation chamber wall includes a plurality of wall elements, which to enlarge the irradiation chamber are adjustable in the direction of the deflection chamber, for example, when positioning a treatment table in the small irradiation chamber, such that an opening in the irradiation chamber wall is created.12-25-2008
20110198511Plasma Igniter for an Inductively Coupled Plasma Ion Source - A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.08-18-2011
20090289196Deflection Signal Compensation for Charged Particle Beam - Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirected particles during a pixel change is reduced.11-26-2009
20090289195Charged Particle Source with Integrated Energy Filter - The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles 11-26-2009
20090289193ION IMPLANTING APPARATUS AND ION BEAM DEFLECTION ANGLE CORRECTING METHOD - To increase a transport efficiency of an ion beam by correcting Y-direction diffusion caused by the space charge effect of the ion beam between an ion beam deflector, which separates the ion beam and neutrons from each other, and a target. An ion implantation apparatus has a beam paralleling device that bends an ion beam scanned in an X direction by magnetic field to be parallel and draws a ribbon-shaped ion beam. The beam paralleling device serves also as an ion beam deflector that deflects the ion beam by magnetic field to separates neutrons from the ion beam. In the vicinity of an outlet of the beam paralleling device, there is provided an electric field lens having a plurality of electrodes opposed to each other in a Y direction with a space for passing the ion beam and narrowing the ion beam in the Y direction.11-26-2009
20090289191ULTRA HIGH PRECISION MEASUREMENT TOOL WITH CONTROL LOOP - A focused ion beam device is described comprising a gas field ion source with an emitter emitting an ion beam including ions of gas, an ion beam column and a beam current control loop comprising a beam current measurement device. Furthermore, the focused ion beam device may have a sample charge control comprising measuring the sample charge. A method of operating a focused ion beam device is provided comprising applying a voltage between an emitter an electrode, applying gas to the emitter, emitting ions of a gas from the emitter and controlling a beam current by measuring the beam current with a beam current measurement device.11-26-2009
20110204253PATTERN DEFINITION DEVICE WITH MULTIPLE MULTIBEAM ARRAY - A multi-beam pattern definition device (08-25-2011
20090261267PROJECTION LENS ARRANGEMENT - A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses. The projection lens systems are arranged at a pitch in the range of about 1 to 3 times the diameter of the plate apertures, and each projection lens system is for demagnifying and focusing one or more of the charged particle beamlets on to the target plane, each projection lens system has an effective focal length in the range of about 1 to 5 times the pitch, and demagnifies the charged particle beamlets by at least 25 times.10-22-2009
20110266456Magnetic Scanning System with Improved Efficiency - Some aspects of the present invention facilitate ion implantation by using a magnetic beam scanner that includes first and second magnetic elements having a beam path region therebetween. One or more magnetic flux compression elements are disposed proximate to the beam path region and between the first and second magnetic elements. During operation, the first and magnetic elements cooperatively generate an oscillatory time-varying magnetic field in the beam path region to scan an ion beam back and forth in time. The one or more magnetic flux compression elements compress the magnetic flux provided by the first and second magnetic elements, thereby reducing the amount of power required to magnetically scan the beam back and forth (relative to previous implementations). Other scanners, systems, and methods are also disclosed.11-03-2011
20120261587Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation - An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.10-18-2012
20120261586Beam Blanker for Interrupting a Beam of Charged Particles - The invention relates to an electrostatic beam blanker for a particle-optical apparatus, in which the blanker is used to generate a train of pulses with a fixed repetition rate. Such pulse trains with a sub-picosecond pulse length are for example used in the study of chemistry in the femtosecond scale.10-18-2012
20120032092Plasma Igniter for an Inductively Coupled Plasma Ion Source - A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection.02-09-2012
20090114839Electron Beam RF Amplifier And Emitter - RF field is sensed to produce an incoming voltage that drives a microarray of electron guns in a sweep pattern towards a detector array. The electron guns emit a beam current that may amplify the incoming voltage signal, and the detector material may be selected to amplify the beam current at the detector, for example, by avalanche and/or cascade in a Schottky material, to provide a low current, high gain amplification. The microarrays may be arranged in various combinations to produce successive amplifications, frequency multipliers, transmit-receive amplifiers, crossbar switches, mixers, beamformers, and selective polarization devices, among other such devices.05-07-2009
20100032580Compact Accelerator For Medical Therapy - A compact accelerator system having an integrated particle generator-linear accelerator with a compact, small-scale construction capable of producing an energetic (˜70-250 MeV) proton beam or other nuclei and transporting the beam direction to a medical therapy patient without the need for bending magnets or other hardware often required for remote beam transport. The integrated particle generator-accelerator is actuable as a unitary body on a support structure to enable scanning of a particle beam by direction actuation of the particle generator-accelerator.02-11-2010
20110204251Electron Reflector With Multiple Reflective Modes - One embodiment relates to a method of controllably reflecting electrons from an array of electron reflectors. An incident electron beam is formed from an electron source, and the incident beam is directed to the array of electron reflectors. A first plurality of the reflectors is configured to reflect electrons in a first reflective mode such that the reflected electrons exiting the reflector form a focused beam. A second plurality of the reflectors is configured to reflect electrons in a second reflective mode such that the reflected electrons exiting the reflector are defocused. Another embodiment relates to an apparatus of a dynamic pattern generator for reflection electron beam lithography. Other embodiments, aspects and features are also disclosed.08-25-2011
20090032722CORRECTOR FOR CHARGED-PARTICLE BEAM ABERRATION AND CHARGED-PARTICLE BEAM APPARATUS - In a charged-particle beam apparatus having a high-accuracy and high-resolution focusing optical system for charged-particle beam, a group of coils are arranged along a beam emission axis to extend through the contour of radial planes each radiating from the beam emission axis representing a rotary axis and each having a circular arc which subtends a divisional angle resulting from division of a circumferential plane by a natural number larger than 2 so that a superposed magnetic field may be generated on the incident axis of the charged-particle beam and the trajectory of the charged-particle beam may be controlled by the superposed magnetic field.02-05-2009
20110001056COMPONENT FOR MANIPULATING A STREAM OF CHARGED PARTICLES - An apparatus for manipulating the trajectories of moving charged particles. The apparatus includes a grid of laterally spaced side by side elongate elements and means defining a path for charged particles to traverse the grid. The grid is supported and configured for application of a voltage gradient between and/or along the elongate elements, whereby to manipulate the trajectories of charged particles that traverse the grid. A method of manipulating the trajectories of moving charged particles is also disclosed.01-06-2011
20080283767PATTERN DEFINITION DEVICE HAVING DISTINCT COUNTER-ELECTRODE ARRAY PLATE - A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is set up to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming beamlets, which are imaged onto a target. A deflection array has a plurality of electrostatic deflector electrodes for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes are electrically connected to a counter potential independently of the deflection array through a counter-electrode array. The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode, each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode.11-20-2008
20100264327ARRANGEMENT FOR EXPANDING THE PARTICLE ENERGY DISTRIBUTION OF A PARTICLE BEAM - An arrangement for expanding the particle energy distribution of a particle beam is provided. The arrangement includes at least two ripple filters, which are arranged in series such that one ripple filter is behind another ripple filter in a radiation direction.10-21-2010
20080265173Microfabricated miniature grids - A grid structure and method for manufacturing the same. The grid is used for gating a stream of charged particles in certain types of particle measurement instruments, such as ion mobility spectrometers and the like. The methods include various microfabrication techniques for etching and/or depositing grid structure materials on a silicon substrate.10-30-2008
20110204252Focused ion beam apparatus - A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit that supplies gas to the tip, and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample. An aperture member has an opening that passes therethrough a part of the ion beam ejected from the ion gun unit, and a lens system focuses the ion beam onto the sample.08-25-2011
20120061582PARTICLE BEAM THERAPY SYSTEM - There are provided with a respiration induction apparatus that induces respiration, based on a desired respiration waveform; a switching device that switches the orbit of a particle beam; and an irradiation apparatus that controls irradiation, in synchronization with the desired respiration waveform. A controller, which performs synchronization control of the switching device and the respiration induction apparatuses in a plurality of treatment rooms, adjusts the periods and the phases of the desired respiration waveforms of the respiration induction apparatuses in the treatment rooms so that the irradiation times synchronized with the desired respiration waveforms in the treatment rooms do not overlap with one another, and controls the switching device so as to switch the orbits of the particle beam, in accordance with the respective irradiation times of the treatment rooms.03-15-2012
20100140493METHOD AND APPARATUS FOR COLLECTOR SWEEPING CONTROL OF AN ELECTRON BEAM - A collector sweeping method for controlling an electron beam (06-10-2010
20090140162ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When writing a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate such that each element of the fine pattern is completely filled by the electron beam, the rotational speed of the rotation stage is controlled so as to be fast in writing on an inner circumferential track and slow in writing on an outer circumferential track in inversely proportional to the radius of the writing position. A write control signal of the electron beam is generated based on a writing clock signal generated in association with the rotation of the rotation stage, and the number of clocks of the writing clock signal in one rotation of the rotation stage is maintained at a constant value for each track irrespective of the radius of the writing position.06-04-2009
20090289194PARTICLE BEAM THERAPY SYSTEM - A particle beam therapy system that is capable of irradiating a target area with an irradiation beam suitable for a particle beam therapy using a spot scanning method includes a synchrotron, a beam transport system and an irradiation device. The beam transport system is provided with a beam interrupting device adapted to block supply of a charged particle beam to the irradiation device. The beam interrupting device has a beam shielding magnet, an exciting power supply for the beam shielding magnet and a beam dump. The beam transport system has a bending magnet. The beam shielding magnet is provided on an inlet side of the bending magnet. The beam dump is provided on an outlet side of the bending magnet. A controller controls the exciting power supply to control the timing of an operation of the beam shielding magnet.11-26-2009
20090140161Electrostatic deflector - An electrostatic deflector that can be manufactured easily and very accurately without using a member for positioning is provided. After multiple slits 06-04-2009
20090184256CHARGED PARTICLE BEAM APPARATUS - Disclosed herein is a scanning electron microscope having a function for positioning an object point of an objective lens at a defined position even under an electronic optical condition in which it is difficult to accurately control the position of the object point of the objective lens. A deflector is provided to deflect an electron beam in order to detect the object point and located at a desired position of the object point of the objective lens. The deflector is not used to scan a sample with the electron beam. The scanning electron microscope has a function for automatically adjusting the position of the object point to ensure that the object point of the objective lens is located at the position of the object point detection deflector by using a characteristic in which a displacement of an image by the deflector is minimal when the object point is located at the position of the deflector.07-23-2009
20090184255INSPECTION METHOD AND INSPECTION SYSTEM USING CHARGED PARTICLE BEAM - In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an E×B deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.07-23-2009
20090014663CHARGED-PARTICLE BEAM WRITING METHOD - The present invention provides an electron beam writing method capable of suppressing a variation in position to be irradiated with an electron beam due to its drift and writing a predetermined pattern.01-15-2009
20100200766ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME - The present invention relates to an electron emitter having a nanostructure tip and an electron column using the same, and, more particularly, to an electron emitter which includes a nanostructure tip which can easily emit electrons, composed of carbon nanotube (CNT), zinc oxide nanotube (ZnO nanotube), zinc oxide nanorod, zinc oxide nanopillar, zinc oxide nanowire, zinc oxide nanoparticle or the like, and an electron column using the same.08-12-2010
20090200483Inner Gantry - A system includes a patient support and an outer gantry on which an accelerator is mounted to enable the accelerator to move through a range of positions around a patient on the patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach a target in the patient. An inner gantry includes an aperture for directing the proton or ion beam towards the target.08-13-2009
20090309040CHARGED PARTICLE BEAM ACCELERATION AND EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam acceleration and/or extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.12-17-2009
20110220809ACCELERATED PARTICLE IRRADIATION EQUIPMENT - Accelerated particle irradiation equipment is installed in a building having a multi-story structure. The accelerated particle irradiation equipment includes a particle accelerator and an irradiation device. The particle accelerator generates accelerated particles. The irradiation device performs irradiation of the accelerated particles generated by the particle accelerator, and is installed on at least one of the floor above and the floor below the floor on which the particle accelerator is installed.09-15-2011
20090050820Ion implantation apparatus - Aimed at providing an ion implantation apparatus elongated in period over which failure of a target work, due to deposition and release of ion species typically to and from the inner surface of a through-hole shaping a beam shape of ion beam, may be avoidable, reduced in frequency of exchange of an aperture component, and consequently improved in productivity, an aperture component shaping a beam shape has a taper opposed to the ion beam, in at least a part of inner surface of at least the through-hole, and has a thick thermal-sprayed film formed so as to cover the inner surface and therearound of the through-hole.02-26-2009
20090200484DUAL MODE GAS FIELD ION SOURCE - A focused ion beam device is described. The focused ion beam device includes an ion beam column including an enclosure for housing a gas field ion source emitter with an emitter area for generating ions, an electrode for extracting ions from the gas field ion source emitter, one or more gas inlets adapted to introduce a first gas and a second gas to the emitter area, an objective lens for focusing the ion beam generated from the first gas or the second gas, a voltage supply for providing a voltage between the electrode and the gas field ion source emitter, and a controller for switching between a first voltage and a second voltage of the voltage supply for generating an ion beam of ions of the first gas or an ion beam of ions of the second gas.08-13-2009
20090200482Method for Focusing Electron Beam in Electron Column - The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.08-13-2009
20090230316Method of Suppressing Beam Position Drift, Method of Suppressing Beam Dimension Drift, and Charged-Particle Beam Lithography System - A lithography method and system have means for determining a convergence value d09-17-2009
20090212231HEAVY ION RADIATION THERAPY SYSTEM WITH STAIR-STEP MODULATION - A system for modulating a fan beam for radiation treatment employs shutters that may move rapidly into and out of different beamlets of a fan beam, the shutters having a systematic weighting so that a limited number of shutters may obtain a far greater number of regularly spaced energy reductions.08-27-2009
20090212228CHARGED PARTICLE BEAM APPARATUS INCLUDING ABERRATION CORRECTOR - A focused charged particle beam apparatus including an aberration corrector, capable of finding the absolute value of the aberration coefficient at high speed, and capable of making high-accuracy adjustments at high speed. A deflection coil tilts the input beam relative to the object point, and measures the defocus data and aberration quantity at high speed while the beam is tilted from one image, and perform least squares fitting on these results to find the absolute value of the aberration coefficient prior to tilting the beam, and to adjust the aberration corrector.08-27-2009
20090242787CHARGED-PARTICLE BEAM WRITING METHOD AND CHARGED-PARTICLE BEAM WRITING APPARATUS - A pattern density distribution and a dose distribution calculated using the pattern density distribution are multiplied by each other to calculate an exposure distribution. A fogging electron amount distribution is calculated using the exposure distribution and a function descriptive of a fogging spread distribution. Charge amount distributions in irradiation and non-irradiation regions are calculated using the exposure distribution and the fogging electron amount distribution. A position displacement amount distribution is calculated using the charge amount distributions and a response function for converting a charge amount to a position displacement error.10-01-2009
20120104272CHARGED PARTICLE GUN AND CHARGED PARTICLE BEAM DEVICE - The present invention provides a charged particle gun including: a charged particle source (05-03-2012
20090095916Ion beam guide tube - A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.04-16-2009
20090242789CHARGED PARTICLE BEAM IRRADIATING APPARATUS - The present invention provides a charged particle beam irradiating apparatus capable of irradiating a charged particle beam using both a wobbler method and a scanning method.10-01-2009
20090256082ION IMPLANTING APPARATUS - An ion implanting apparatus is provided. The ion implanting apparatus includes a beam scanner, a beam collimator and a unipotential lens which is disposed between said beam scanner and said beam collimator, and which includes first, second, third, and fourth electrodes arranged in an ion beam traveling direction while forming first, second, and third gaps, said first and fourth electrodes being electrically grounded, wherein positions of centers of curvature of said first and third gaps of said unipotential lens coincide with a position of a scan center of said beam scanner, and wherein a position of a center of curvature of said second gap of said unipotential lens is shifted from the position of the scan center of said beam scanner toward a downstream or upstream side in the ion beam traveling direction.10-15-2009
20090256081FOCUSED ION BEAM APPARATUS - An object of the present invention is to provide a focused ion beam apparatus that is capable of obtaining a much larger beam current and forming a focused ion beam with smaller aberration than a conventional focused ion beam apparatus no matter whether the level of acceleration is high or low. The focused ion beam apparatus according to the present invention includes a liquid metal ion source, an extraction electrode for extracting an ion beam from the liquid metal ion source, an acceleration (ground) electrode for accelerating an ion beam, and an electrostatic lens for converging an ion beam. When the acceleration voltage applied to the liquid metal ion source is lower than an emission threshold voltage of the liquid metal ion source, the voltage of the extraction electrode is at a lower potential than the voltage of the acceleration (ground) electrode. The polarity of a voltage applied to the electrostatic lens changes in accordance with the polarity of a voltage applied to the extraction electrode. The present invention makes it possible to exercise a deceleration mode focusing method at a high acceleration voltage from the dielectric strength voltage of an electrostatic lens and exercise an acceleration mode focusing method at a low acceleration voltage with an electrostatic lens having the same focal length as for the deceleration mode focusing method.10-15-2009
20100148086MAGNETIC DEFLECTOR FOR AN ELECTRON COLUMN - The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (06-17-2010
20100181493IONIC EMISSION MICRONIC SOURCE - The present invention relates to an ion emitter device comprising an emitter member including an insulating hollow needle (07-22-2010
20100187433IMPROVED PARTICLE BEAM GENERATOR - A particle beam generator comprising particle extraction means disposed adjacent a particle source and operable to extract particles from such a source into an extraction aperture of the extraction means to form a particle beam, particle accelerating means operable to accelerate the extracted particles to increase the energy of the beam, and focussing means operable to focus the particle beam, each of said extraction means, accelerating means and focussing means being arranged in sequence and having apertures therethrough and in alignment to define a passageway through which the particles are constrained to move, characterised in that the extraction means comprises a lens structure comprising at least a pair of electrodes separated by a layer of insulating material allowing the application of different potentials to each of the lens structure electrodes, one of said electrodes comprising an extraction plate having an extraction aperture formed therein, by means of which extraction plate particles may be drawn from the particle source and through the extraction aperture by means of a potential difference between the source and said extraction plate.07-29-2010
20120267544ENERGY DEGRADER AND CHARGED PARTICLE IRRADIATION SYSTEM INCLUDING THE SAME - An energy degrader includes: an attenuation member that attenuates energy of entering charged particles to a different amount of energy according to an incident position of the charged particles; an energy adjustment drive unit that drives the attenuation member in a first axial direction in order to change the incident position of the charged particles; and a beam diameter adjustment drive unit that drives the attenuation member in a second axial direction different from the first axial direction in order to adjust the beam diameter of the charged particles.10-25-2012
20120138814PARTICLE BEAM DEVICE WITH DEFLECTION SYSTEM - A particle beam device includes a particle beam generator, an objective lens, and first and second deflection systems for deflecting the particle beam in an object plane defined by the objective lens. In a first operating mode, the first deflection system generates a first deflection field and the second deflection system generates a second deflection field. In a second operating mode, the first deflection system generates a third deflection field and the second deflection system generates a fourth deflection field.06-07-2012
20090114838FOCUSED ION BEAM FIELD SOURCE - An apparatus for producing ions can include an emitter having a first end and a second end. The emitter can be coated with an ionic liquid room-temperature molten salt. The apparatus can also include a power supply and a first electrode disposed downstream relative to the first end of the emitter and electrically connected to a first lead of the power supply. The apparatus can also include a second electrode disposed downstream relative to the second end of the emitter and electrically connected to a second lead of the power supply.05-07-2009
20120193550CHARGED PARTICLE RADIATION DEVICE - Provided is a charged particle radiation device enabling suppression of both inclination and vertical vibration of a charged particle optical lens barrel, with a simple configuration. A charged particle radiation device according to the present invention includes a vibration damping member (08-02-2012
20100252746END TERMINATIONS FOR ELECTRODES USED IN ION IMPLANTATION SYSTEMS - An ion implantation system includes an electrostatic lens. The electrostatic lens includes a terminal electrode, a ground electrode and a suppression electrode disposed therebetween. An ion beam enters the electrostatic lens through the terminal electrode and exits through the ground electrode. The electrodes have associated electrostatic equipotentials. An end plate is disposed between a top and bottom portion of the suppression electrode and/or the top and bottom portion of the ground electrode. The respective end plate has a shape which corresponds to the electrostatic equipotential associated with the particular electrode in order to maintain uniformity of the beam as it passes through the electrostatic lens.10-07-2010
20110057114Electron beam lithography apparatus and electron beam lithography method - An electron beam lithography apparatus includes an electron gun emitting an electron beam, a deflector deflecting the electron beam, a focus corrector correcting a focus of the electron beam, a storage unit storing exposure data, and a controller correcting the exposure data based on a constant correction coefficient independent of time passage and a fluctuating correction coefficient changing with time, calculates a deflection efficiency indicating a relation between an input signal to the deflector and an amount of beam deflection, and a correction intensity indicating a relation between an input signal to the focus corrector and a beam focus, and writes the electron beam on a sample according to the deflection efficiency and the correction intensity.03-10-2011
20090289192SCANNING APERTURE ION BEAM MODULATOR - A modulator for ions such as protons employs multiple shutter pairs to create independently movable apertures effecting a multiple pencil beam treatment of the patient thereby increasing treatment speed by eliminating the need for a custom compensator.11-26-2009
20080308741FOCUSED ION BEAM APPARATUS - A focused ion beam apparatus includes a plasma generator having a plasma torch therein, which lets plasma flow out while being kept inside, a differential exhaust chamber that is connected to the plasma torch via the torch orifice to cause adiabatic expansion of the plasma flowing out of the plasma torch to form a supersonic flow of the plasma, a drawing orifice provided at the differential exhaust chamber at a position facing the torch orifice to draw ions from the supersonic flow of the plasma, a drawing electrode that electrostatically accelerates ions having passed through the drawing orifice to further draw ions, and an ion optical system that focuses the ions drawn from the drawing electrode and causing the ions to enter the sample by optically manipulating the ions.12-18-2008
20090114837Dynamic pattern generator with cup-shaped structure - One embodiment relates to a dynamic pattern generator for reflection electron beam lithography which includes conductive pixel pads, an insulative border surrounding each conductive pixel pad so as to electrically isolate the conductive pixel pads from each other, and conductive elements coupled to the conductive pixel pads for controllably applying voltages to the conductive pixel pads. The conductive pixel pads are advantageously cup shaped with a bottom portion, a sidewall portion, and an open cavity. Another embodiment relates to a pattern generating apparatus which includes a well structure with sidewalls and a cavity configured above each conductive pixel pad. The sidewalls may include alternating layers of conductive and insulative materials. Other embodiments, aspects and feature are also disclosed.05-07-2009
20090039281ABERRATION CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME - The present invention provides an aberration corrector giving excellent assembly accuracy but having fewer parts and fewer adjustment locations in number. In order to achieve it, a multistage multipole is formed by arranging plural combinations of electrodes around an optical axis using alignment blocks, each combination of electrodes being made by brazing-integrating plural electrodes with a ceramic material interposed therebetween.02-12-2009
20080290287Multichannel Energy Analyzer for Charged Particles - The present invention provides charged particle energy deflectors, analyzers, devices, device components and methods for terminating charged particle systems and electrically isolating device components. One embodiment of the present invention provides a transparent field termination system for a cylindrical charged particle deflector that is capable of providing an electric field that closely approximates the substantially logarithmically varying electric field of the deflector. The present invention also provides multichannel charged particle analyzers and multichannel EEL spectrometers capable of measuring charged particle energy distributions, including electron energy distributions, with enhanced resolution and sensitivity compared to conventional analyzers.11-27-2008
20080230711Charged-Particle Exposure Apparatus With Electrostatic Zone Plate - In a particle-beam projection processing apparatus for irradiating a target by a beam of energetic electrically charged particles, including an illumination system, a pattern definition system for positioning an aperture arrangement composed of apertures transparent to the energetic particles in the path of the illuminating beam, and a projection system to project the beam onto a target, there is provided at least one plate electrode device, which has openings corresponding to the apertures of the pattern definition system and including a composite electrode composed of a number of partial electrodes being arranged non-overlapping and adjoining to each other, the total lateral dimensions of the composite electrode covering the aperture arrangement of the pattern definition system. The partial electrodes can be applied different electrostatic potentials.09-25-2008
20130134323Electron Beam Profile Measurement System and Method with Optional Faraday Cup - Electron beam profile testing and analysis method is introduced using the MOMS apparatus. The MOMS apparatus includes a Faraday Cup with a knife-wires scanning system which together perform simultaneous measurements. The scanning system has a five-dimensional processing mechanism for measuring different cross sections of an e-beam profile in a path of the e-beam. Measurements are conducted using the scanning system by virtually dividing each cross section into a plurality of subsections and measuring independent current values of at least one wire of the scanning system through which the electron beam passes from every pixel in each of the plurality of subsections. By providing relative movement between the scanning system and e-beam, the measured independent current values are analyzed to obtain the functional form of distribution of current density of the cross-section of the e-beam. The Faraday cup enables simultaneous measurement of the total value of the current.05-30-2013
20100301228PARTICLE BEAM THERAPY SYSTEM - There is provided a particle beam therapy system that can rapidly change beam energy without increasing the size of a deflection electromagnet even in the case where the number of required beam-energy changes is large.12-02-2010
20100301227CURVED ION GUIDE WITH VARYING ION DEFLECTING FIELD AND RELATED METHODS - An ion guide includes a plurality of curved electrodes and an ion deflecting device. The electrodes are arranged about and radially spaced from a central curved axis, and circumscribe a curved ion guide region from an ion entrance to an ion exit. The ion deflecting device may include a device for applying a DC electric field to one or more electrodes in a radial direction. The magnitude of the DC electric field, and thus the ion deflecting force, varies along the curved axis. The ion guide may for example operate as a collision cell or like instrument.12-02-2010
20110001058GAS FIELD ION SOURCE WITH COATED TIP - Coated tips, as well as related articles, systems and methods are disclosed.01-06-2011
20110001057COMPONENT FOR MANIPULATING A STREAM OF CHARGED PARTICLES - An apparatus 01-06-2011
20110024645ROTATING IRRADIATION APPARATUS - There is provided a rotating irradiation apparatus that can secure as large an access floor as possible, reduce noise during the formation of an access floor, and stably operate with a simple structure. The rotating irradiation apparatus includes an irradiation device 02-03-2011
20100133445ION BEAM CONTROL APPARATUS AND METHOD - Provided are an ion beam control apparatus and a control method for controlling an ion beam energy expansion level and an ion beam size in a radial direction. An ion beam control apparatus Sa is provided with an ion beam generating unit 06-03-2010
20110017920Method and system for electron beam applications - The present invention relates to methods and systems for use of an electron beam system. The electron beam system may be used within a treatment center with very little radiation shielding. The electron beam system may be used in conjunction with low-z moderators that reduce the energy level of the electron beam without the need for complex or expensive energy control systems. The electron beam system may be used to treat skin cancer and dermatological patients in non-traditional treatment facilities, as well as invasive cancers, either in an unshielded operating room to deliver intraoperative radiation therapy (“IORT”) or in an unshielded room in the oncology department to deliver electron beam radiation treatment (“EB-RT”).01-27-2011
20110127443INTEGRATED BEAM MODIFYING ASSEMBLY FOR USE WITH A PROTON BEAM THERAPY MACHINE - An integrated beam modifying assembly for use with a proton beam therapy machine. Typically the snouts of a proton beam therapy machine are adapted to receive separate apertures and range compensators. Applicants provide an integrated assembly for slotting into the snout of a proton beam therapy machine, which integrated assembly incorporates both aperture material and range compensator material for profiling, shaping, and modulating the beam.06-02-2011
20110114851METHOD AND APPARATUS FOR MODIFYING A RIBBON-SHAPED ION BEAM - A ribbon-shaped ion beam having an elongate cross-section normal to a beam direction is modified by generating, at a predetermined position along the ribbon-shaped beam, a magnetic field extending in an x-direction along an x-axis. The x-direction magnetic field has a non-uniform intensity which is a desired function of x.05-19-2011
20110114852Corrector for Axial Aberrations of a Particle-Optical Lens - Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration C05-19-2011
20120228515APPARATUS AND METHOD FOR MASKLESS PATTERNED IMPLANTION - A method of implanting a workpiece in an ion implantation system. The method may include providing an extraction plate adjacent to a plasma chamber containing a plasma, such that the extraction plate extracts ions from the plasma through at least one aperture that provides an ion beam having ions distributed over a range of an angles of incidence on the workpiece. The method may include scanning the workpiece with respect to the extraction plate and varying a power level of the plasma during the scanning from a first power level to a second power level, wherein at a surface of the workpiece, a first beam width at a first power level is greater than a second beam width at a second power level.09-13-2012
20110114853ELECTRON BEAM APPARATUS - An electron beam lithography apparatus includes a beam current detector which detects, during drawing of the drawing data, fluctuation of an irradiation position of the electron beam at non-irradiation on the substrate; a beam position error detector which detects a beam position error of the electron beam based on the fluctuation of the irradiation position; a drive position error detector which detects a drive position error of the stage due to rotation and translation drive during drawing of the drawing data; and a corrector which corrects the irradiation position of the electron beam during the drawing based on the beam position error and the drive position error.05-19-2011
20110114850METHOD AND APPARATUS FOR MODIFYING A RIBBON-SHAPED ION BEAM - A ribbon-shaped ion beam is modified using multiple coil structures on a pair of opposed ferromagnetic bars. The coil structures comprise continuous windings which have predetermined variations along the length of the bar of turns per unit length. In an example, one coil structure may have uniform turns per unit length along the bar, so that energizing the coil structures forms a magnetic field component extending across the gap between the bars with a quadrupole intensity distribution. A second coil structure may have turns per unit length varying to produce a hexapole magnetic field intensity distribution. Further coil structures may be provided to produce octopole and decapole magnetic field distributions. The coil structures may be energized to produce magnetic fields parallel to the bars which vary along the length of the bars, to twist or flatten the ribbon-shaped beam.05-19-2011
20110084215METHOD AND SYSTEM FOR TILTING A SUBSTRATE DURING GAS CLUSTER ION BEAM PROCESSING - A method and system for treating a non-planar structure is described. The method includes forming a non-planar structure on a substrate. Additionally, the method includes generating a gas cluster ion beam (GCIB) formed from a material source for treatment of the non-planar structure, tilting the substrate relative to the GCIB, and irradiating the non-planar structure with the GCIB. The system includes a substrate tilt actuator coupled to a substrate holder and configured to tilt the substrate holder relative to a GCIB.04-14-2011
20100163745Housing for A Micro-Column - Disclosed therein is a housing for micro-column, which can easily align and assemble the micro-column and improve stability of the micro-column. The housing for manufacturing micro-column including an electron emitter, deflectors, and lenses, the housing includes: an electron emitter holder in which the electron emitter is inserted; a holder base in which the electron emitter holder is inserted; and a column base coupled with the holder base, whereby the electron emitter can be aligned and fixed between the electron emitter holder and the holder base in X- and Y-axial directions via bolts and socket set screws inserted into the tap holes.07-01-2010
20100187434METHOD FOR PRODUCING A MULTI-BEAM DEFLECTOR ARRAY DEVICE HAVING ELECTRODES - The disclosure relates to a method for producing a multi-beam deflector array device with a plurality of openings for use in a particle-beam exposure apparatus, in particular a projection lithography system, said method starting from a CMOS wafer and comprising the steps of generating at least one pair of parallel trenches on the first side of the wafer blank at the edges of an area where the circuitry layer below is non-functional, the trenches reaching into the layer of bulk material; passivating the sidewalls and bottom of the trenches; depositing a conducting filling material into the trenches, thus creating columns of filling material serving as electrodes; attaching metallic contact means to the top of the electrodes; structuring of an opening between the electrodes, said opening stretching across abovementioned area so that the columns are arranged opposite of each other on the sidewalls of the opening.07-29-2010
20090218508COLD CATHODE FIELD EMISSION ELECTRON GUN AND ITS APPLICATION TO ELECTRON BEAM INSTRUMENTS - The present invention provides an electron beam instrument in which variation of the trajectory of the electron beams can be suppressed even when the voltage applied to the first extractor electrode is controlled in order to stabilize the emission current amount of the electron beams. The electron beam instrument has a cold cathode field emission electron gun. The cold cathode field emission electron gun has a cold cathode, a first extractor electrode and a second extractor electrode. Distance between the cold cathode and the first extractor electrode is set to be shorter than distance between the first extractor electrode and the second extractor electrode. Voltage applied to the first extractor electrode is increased when current amount of the electron beams emitted from the cold cathode is attenuated.09-03-2009
20090218507CHARGED PARTICLE BEAM DEVICE - The present invention provides a charged particle beam device which can effectively restrain misalignment of an optical axis even if a position of an anode is changed. The present invention is a charged particle beam device comprising a cathode provided with a charged particle source which emits a charged particle, an anode which applies an electric field to the emitted charged particle, a charged particle beam deflector which deflects an orbit of a charged particle beam having passed the anode, and a charged particle beam detector which detects the charged particle beam from a sample to which the charged particle is irradiated, wherein a distance changing mechanism which changes a distance between the cathode and the anode, corresponding to a charged particle amount emitted from the charged particle source and a deflection amount control mechanism which detects a condition of the deflector under which the charged particle dose detected from the sample scanned by deflecting the charged particle beam in the changed distance becomes a desired size and controls deflection of the deflector at sample measurement on the basis of the condition are provided.09-03-2009
20090321655Ion Transfer Tube with Spatially Alternating DC Fields - An ion transfer arrangement for transporting ions between higher and lower pressure regions of a mass spectrometer includes an electrode assembly (12-31-2009
20100127184CHARGED PARTICLE CANCER THERAPY DOSE DISTRIBUTION METHOD AND APPARATUS - The invention relates generally to treatment of solid cancers. More particularly, a method and apparatus for efficient radiation dose delivery to a tumor is described. Preferably, radiation is delivered through an entry point into the tumor and Bragg peak energy is targeted to a distal or far side of the tumor from an ingress point. Delivering Bragg peak energy to the distal side of the tumor from the ingress point is repeated from multiple rotational directions. Beam intensity is proportional to radiation dose delivery efficiency. The multi-field irradiation process with energy levels targeting the far side of the tumor from each irradiation direction provides even and efficient charged particle radiation dose delivery to the tumor. Preferably, the charged particle therapy is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus.05-27-2010
20110068276MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM - The invention relates to a multiple beam charged particle optical system comprising: 03-24-2011
20110068277BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION - A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.03-24-2011
20090001279CHARGED PARTICLE BEAM APPARATUS - A charged particle beam apparatus for measuring and inspecting a sample having some parts in focus and other parts out of focus in an image due to the effect of the roughness of the sample surface is disclosed, in which in order to acquire a clear image of the whole or a predetermined area in the image, the focus adjustment conditions for each point in the area to be scanned by the charged particle beam are determined in advance, and the focus adjustment conditions thus determined are applied selectively to the patterns formed under the same fabrication conditions as the sample for which the focus adjustment conditions are determined.01-01-2009
20090242788ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direction orthogonal to the vibration direction to scan the electron beam so as to completely fill the shapes of the elements, a proximity-effect correction is performed according to the arrangement density of the elements in which the amount of dose is adjusted by setting the deflection speed faster for the writing of an element in a densely arranged region than for the writing of an identical element in a sparsely arranged region.10-01-2009
20080315112CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKING AND STAGE POSITIONAL ERROR SIGNALS - The invention provides a method for patterning a resist coated substrate carried on a stage, where the patterning utilizes a charged particle beam. The method comprises the steps of: moving the stage at a nominally constant velocity in a first direction; while the stage is moving, deflecting the charged particle beam in the first direction to compensate for the movement of the stage, the deflecting including: (a) compensating for an average velocity of the stage; and (b) separately compensating for the difference between an instantaneous position of the stage and a calculated position based on the average velocity. The separately compensating step uses a bandwidth of less than 10 MHz. The invention also provides a deflector control circuit for implementing the separate compensation functions.12-25-2008
20090212229PROJECTION LENS ARRANGEMENT - A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.08-27-2009
20080230712BEAM CONTROL ASSEMBLY FOR RIBBON BEAM OF IONS FOR ION IMPLANTATION - A beam control assembly to shape a ribbon beam of ions for ion implantation includes a first bar, second bar, first coil of windings of electrical wire, second coil of windings of electrical wire, first electrical power supply, and second electrical power supply. The first coil is disposed on the first bar. The first coil is the only coil disposed on the first bar. The second bar is disposed opposite the first bar with a gap defined between the first and second bars. The ribbon beam travels between the gap. The second coil is disposed on the second bar. The second coil is the only coil disposed on the second bar. The first electrical power supply is connected to the first coil without being electrically connected to any other coil. The second electrical power supply is connected to the second coil without being electrically connected to any other coil.09-25-2008
20120199757PARTICLE BEAM IRRADIATION SYSTEM AND PARTICLE BEAM IRRADIATION METHOD - A particle beam irradiation system comprising a first deflector having the maximum deflection amount which enables to move a particle beam in one direction to the maximum width of a target and a second deflector having the maximum deflection amount is less than the maximum deflection amount of the first deflector performs a control in which the particle beam is moved by increasing at least a deflection amount of the second deflector when the particle beam is moved, and performs a deflection substitution control in which a deflection of the second deflector is substituted to a deflection of the first deflector by decreasing the deflection amount of the second deflector and changing a deflection amount of the first deflector so as to make a position of the particle beam in the target dwell when the particle beam dwells.08-09-2012
20080203317MULTI-BEAM DEFLECTOR ARRAY DEVICE FOR MASKLESS PARTICLE-BEAM PROCESSING - The invention relates to a multi-beam deflector array device for use in a particle-beam exposure apparatus employing a beam of charged particles, the multi-beam deflector array device having a plate-like shape with a membrane region, the membrane region including a first side facing towards the incoming beam of particles, an array of apertures, each aperture allowing passage of a corresponding beamlet formed out of the beam of particles, a plurality of depressions, each depression being associated with at least one aperture, and an array of electrodes, each aperture being associated with at least one electrode and each electrode being located in a depression, the electrodes being configured to realize a non-deflecting state, wherein the particles that pass through the apertures are allowed to travel along a desired path, and a deflecting state, wherein the particles are deflected off the desired path.08-28-2008
20110163244MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM - The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.07-07-2011
20120199756Method for Centering an Optical Element in a TEM Comprising a Contrast Enhancing Element - A method for adjusting or aligning one or more optical elements in a Transmission Electron Microscope (TEM) is disclosed. The TEM is equipped with an objective lens for guiding a beam of electrons to a sample, a diffraction plane in which at least a beam of unscattered electrons is focused and a structure to enhance the Contrast Transfer Function (CTF) which is situated in the diffraction plane or an image thereof.08-09-2012
20100181492CHARGED PARTICLE BEAM IMAGING METHOD AND SYSTEM THEREOF - The method includes scanning a sample in at least one first scan line using a first charged particle beam probe; scanning the sample in at least one second scan line using a second charged particle beam probe, and scanning the sample in at least one third scan line using the first charged particle beam probe. The first or second charged particle beam probe is defocused by a control module of the imaging system through adjusting a condenser lens module, an objective lens module, a sample stage of the imaging system, or their combination. An image of the sample is selectively formed from the first, second and third scan lines. The first and the second charged particle beams induce a first charging condition and a second charging condition on the sample surface respectively. The second charging condition can enhance, mitigate, eliminate, reverse or have no effect on the first charging condition.07-22-2010
20110260074PARTICLE BEAM THERAPY SYSTEM - The objective of the present invention is to reduce the effect of the hysteresis of a scanning electromagnet so as to obtain a particle beam therapy system that realizes high-accuracy beam irradiation. There are included an irradiation management apparatus (10-27-2011
20110095198SYSTEM AND METHOD FOR FABRICATING MACROSCOPIC OBJECTS, AND NANO-ASSEMBLED OBJECTS OBTAINED THEREWITH - A method and a system for fabricating a macroscopic object, comprising, in an environment at least one energy source; at least one hollow cathode separated from an anode by a bias potential; and a support; a flow of gas through the hollow cathode generating a hollow cathode discharge, particles emitted by the hollow cathode being assembled on the support under action of energy from the energy source.04-28-2011
20100059687PROTON BEAM POSITIONING VERIFICATION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a proton beam positioning method and apparatus used in conjunction with multi-axis charged particle radiation therapy of cancerous tumors. The proton beam verification system allows for monitoring of the actual proton beam position in real-time without destruction of the proton beam. The system includes a coating or thin layer substantially in contact with a foil covering the end of an exit nozzle or is a layer located after the x- and y-axis proton beam scanning controllers and before the patient. The coating yields a measurable spectroscopic response, spatially viewable by the detector, as a result of transmission by the proton beam. The proton beam position is monitored by the detector and compared to the calibration and/or treatment plan to verify accurate proton delivery to the tumor and/or as a proton beam shutoff safety indicator.03-11-2010
20110186745CHARGED PARTICLE GUN AND FOCUSED ION BEAM APPARATUS USING THE GUN - A charged particle gun includes: a charged particle source 08-04-2011
20110186744CHARGED PARTICLE BEAM APPARATUS AND METHOD - A first aperture 08-04-2011
20110147607MICRO-CONE TARGETS FOR PRODUCING HIGH ENERGY AND LOW DIVERGENCE PARTICLE BEAMS - The present invention relates to micro-cone targets for producing high energy and low divergence particle beams. In one embodiment, the micro-cone target includes a substantially cone-shaped body including an outer surface, an inner surface, a generally flat and round, open-ended base, and a tip defining an apex. The cone-shaped body tapers along its length from the generally flat and round, open-ended base to the tip defining the apex. In addition, the outer surface and the inner surface connect the base to the tip, and the tip curves inwardly to define an outer surface that is concave, which is bounded by a rim formed at a juncture where the outer surface meets the tip.06-23-2011
20110147608CHARGED PARTICLE CANCER THERAPY IMAGING METHOD AND APPARATUS - The invention relates to a method and apparatus for treatment of a solid tumor. More particularly, the invention comprises a multi-axis and/or multi-field charged particle cancer therapy system. In one embodiment, the tumor is imaged from multiple directions in phase with patient respiration. The two-dimensional images are combined to produce a three-dimensional picture of the tumor relative to patient features. The resulting three-dimensional image is used in generation of a radiation treatment plan and subsequent radiation therapy with the radiation beam in terms of control of two-dimensional beam trajectory, delivered beam energy, delivered beam intensity, and/or beam velocity each as a function of patient vertical translation position, patient rotation position, and/or patient respiration.06-23-2011
20110147606Apparatus and method for the deflection of electromagnetic radiation, in particular of a laser beam - The deflection apparatus (06-23-2011
20110147605ELECTROSTATIC CORRECTOR - A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.06-23-2011
20100019167FAN BEAM MODULATOR FOR ION BEAMS PROVIDING CONTINUOUS INTENSITY MODULATION - An intensity modulator for controlling the intensity of ions, such as protons, controllably block a portion of sub-areas of an area beam to control the average intensity within that sub-area. A fan beam is then created by a focusing process that reforms the area beam while blurring intensity variations in each sub-area to a corresponding beamlet in the fan beam of uniform intensity.01-28-2010
20100019166Method for Controlling Electron Beam in Multi-Microcolumn and Multi-Microcolumn Using The Same - Provided is a method for controlling electron beams in a multi-microcolumn, in which unit microcolumns having an electron emitter, a lens, and a deflector are arranged in an n×m matrix. A voltage is uniformly or differentially applied to each electron emitter or extractor. The same control voltage or different voltages are applied to a region at coordinates in a control division area of each extractor to deflect the electron beams. Lens layers not corresponding to the extractors are collectively or individually controlled so as to efficiently control the electron beams of the unit microcolumn. Further, a multi-microcolumn using the method is provided.01-28-2010
20120145915Lithography system and method of refracting - A charged particle lithography system for transferring a pattern onto the surface of a target, such as a wafer, comprising a charged particle source adapted for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam, the converging means comprising a first electrode, and an aperture array element comprising a plurality of apertures, the aperture array element forming a second electrode, wherein the system is adapted for creating an electric field between the first electrode and the second electrode.06-14-2012
20090272911METHOD FOR INSPECTING SETTLING TIME OF DEFLECTION AMPLIFIER, AND METHOD FOR JUDGING FAILURE OF DEFLECTION AMPLIFIER - A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types which are shaped by making a charged particle beam pass through a first and a second apertures while deflecting the charged particle beam by a deflector controlled by an output of a deflection amplifier which is driven based on the settling time having been set, measuring beam currents of the shooting, calculating an integral current of the beam currents measured, and calculating a difference between the integral current calculated and a reference integral current to output the difference.11-05-2009
20090230317Aberration correction apparatus that corrects spherical aberration of charged particle apparatus - To provide an aberration correction configuration that can realize both an aberration correction function for a long focus and an aberration correction function for a short focus. While having a conventional aberration correction apparatus configuration that has two rotationally symmetric lenses arranged between two multiple lenses, three rotationally symmetric lenses are disposed between an objective lens and a multiple lens instead of the conventional arrangement in which two rotationally symmetric lenses are disposed therebetween. When using the objective lens with a long focal length, aberrations are corrected using two rotationally symmetric lenses among three rotationally symmetric lenses disposed between the objective lens and the multiple lens. When using the objective lens with a short focal length, e.g. for high resolution observation, aberrations are corrected using two rotationally symmetric lenses of a different combination to those used for a long focus, among the three rotationally symmetric lenses disposed between the objective lens and the multiple lens.09-17-2009
20120305796PARTICLE BEAM IRRADIATION APPARATUS AND CONTROL METHOD OF THE PARTICLE BEAM IRRADIATION APPARATUS - Provided is a particle beam irradiation apparatus that can measure and display a dose two-dimensional distribution during scan with a simple configuration, while reducing degradation of a particle beam shape. The particle beam irradiation apparatus according to the present invention includes: a beam generation portion that generates a particle beam; a beam emission control portion that controls emission of the particle beam; a beam scanning portion that two-dimensionally scans the particle beam; a sensor portion including a plurality of first linear electrodes arranged in parallel in a first direction and a plurality of second linear electrodes arranged in parallel in a second direction orthogonal to the first direction; a beam shape calculation portion that calculates a center of gravity of the particle beam from a first signal output from each of the first linear electrodes and a second signal output from each of the second linear electrodes and that obtains a two-dimensional beam shape of the particle beam around the center of gravity; a storage portion that accumulates and stores the two-dimensional beam shapes; and a display portion that displays the two-dimensional beam shapes as a two-dimensional distribution of a dose.12-06-2012
20120305795METHODS AND APPARATUS FOR ION SOURCES, ION CONTROL AND ION MEASUREMENT FOR MACROMOLECULES - Disclosed are methods, apparatus, systems, processes and other inventions relating to: ion sources with controlled electro-pneumatic superposition, ion source synchronized to RF multipole, ion source with charge injection, optimized control in active feedback system, radiation supported charge-injection liquid spray, ion source with controlled liquid injection as well as various embodiments and combinations of each of the foregoing.12-06-2012
20130200270DRIFT CONTROL IN A CHARGED PARTICLE BEAM SYSTEM - A method and apparatus for reducing drift in a charged particle beam system. The method includes providing a charged particle beam column including a charged particle beam, a lens system, and a sample chamber; disposing a temperature-controlled device between the lens system and the sample chamber to control heat transfer between the lens system and the sample chamber; and controlling the temperature of the temperature-controlled device to reduce or eliminate the thermal drift of the position of a sample within the sample chamber relative to the position of the charged particle beam.08-08-2013
20100219352ION DEFLECTOR FOR TWO-DIMENSIONAL CONTROL OF ION BEAM CROSS SECTIONAL SPREAD - An ion deflector, for deflecting a beam of charged particles along an arc in a deflection plane, includes a pair of non-spherical deflection electrodes adapted for being charged with different voltages. The pair of deflection electrodes are configured to control, in both the deflection plane and in a direction perpendicular to the deflection plane, a cross sectional spread of charged particles in a deflected beam that exits the ion deflector. In some embodiments, a first electrode has a first height perpendicular to the deflection plane and a second electrode has a different second height.09-02-2010
20120061583PROJECTION LENS ARRANGEMENT - The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.03-15-2012
20120001087DECELERATION LENS - A system and method are disclosed for controlling an ion beam. A deceleration lens is disclosed for use in an ion implanter. The lens may include a suppression electrode, first and second focus electrodes, and first and second shields. The shields may be positioned between upper and lower portions of the suppression electrode. The first and second shields are positioned between the first focus electrode and an end station of the ion implanter. Thus positioned, the first and second shields protect support surfaces of said first and second focus electrodes from deposition of back-streaming particles generated from said ion beam. In some embodiments, the first and second focus electrodes may be adjustable to enable the electrode surfaces to be adjusted with respect to a direction of the ion beam. By adjusting the angle of the focus electrodes, parallelism of the ion beam can be controlled. Other embodiments are described and claimed.01-05-2012
20110155921SYSTEM AND METHOD FOR CONTROLLING DEFLECTION OF A CHARGED PARTICLE BEAM WITHIN A GRADED ELECTROSTATIC LENS - A method and apparatus for controlling deflection, deceleration, and focus of an ion beam are disclosed. The apparatus may include a graded deflection/deceleration lens including a plurality of upper and lower electrodes disposed on opposite sides of an ion beam, as well as a control system for adjusting the voltages applied to the electrodes. The difference in potential between pairs of upper and lower electrodes are varied using a set of “virtual knobs” that are operable to independently control deflection and deceleration of the ion beam. The virtual knobs include control of beam focus and residual energy contamination, control of upstream electron suppression, control of beam deflection, and fine tuning of the final deflection angle of the beam while constraining the beam's position at the exit of the lens. In one embodiment, this is done by fine tuning beam deflection while constraining the beam position at the exit of the VEEF. In another embodiment, this is done by fine tuning beam deflection while measuring the beam position and angle at the wafer plane. In a further embodiment, this is done by tuning a deflection factor to achieve a centered beam at the wafer plane.06-30-2011
20120056099SYSTEM AND METHOD FOR LAYER-WISE PROTON BEAM CURRENT VARIATION - Systems and methods are provided to perform efficient, automatic adjustment of cyclotron beam currents within a wide range for multiple treatment layers within the same patient and treatment session. In one embodiment, efficient adjustment is achieved by using beam current attenuation by an electrostatic vertical deflector installed in the inner center of the cyclotron. The beam current may, for example, be adjusted by the high voltage applied to the electrostatic vertical deflector. In front of each treatment the attenuation curve of the vertical deflector is recorded. Based on this attenuation curve, the vertical deflector voltage for the needed beam current of each irradiation layer is interpolated. With this procedure the beam current could be automatically adjusted in minimal time over a wide range while maintaining a high level of precision.03-08-2012
20120056098PARTICLE BEAM IRRADIATION SYSTEM AND METHOD FOR CONTROLLING THE PARTICLE BEAM IRRADIATION SYSTEM - There is provided a particle beam irradiation system so as to provide the dose distribution having more accuracy. An irradiation control part comprises an energy setting controller that sets the energy of a charged particle beam, a beam scanning controller that controls a beam scanner, and a beam diameter changer to control a beam diameter changer, wherein the irradiation control part sets a beam diameter of the charged particle beam to be a first beam diameter by the beam diameter changer, the charged particle beam is scanned step-wise by the beam scanning controller so as to irradiate the charged particle beam on a predetermined region of the irradiation target, after that, the beam diameter of the charged particle beam is set by the beam diameter controller to be a second beam diameter that is different from the first beam diameter, and the charged particle beam is scanned step-wise by the beam scan controller so as to control the charged particle beam to irradiate on a region that is overlapped with at least a part of the predetermined part of the irradiation target.03-08-2012
20090212230ELECTRON BEAM WRITING METHOD, FINE PATTERN WRITING SYSTEM, METHOD FOR MANUFACTURING UNEVEN PATTERN CARRYING SUBSTRATE, AND METHOD FOR MANUFACTURING MAGNETIC DISK MEDIUM - When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.08-27-2009
20110084214GAS CLUSTER ION BEAM PROCESSING METHOD FOR PREPARING AN ISOLATION LAYER IN NON-PLANAR GATE STRUCTURES - A gas cluster ion beam (GCIB) processing method for preparing an isolation layer in a non-planar gate structure is described. The method forms a non-planar gate structure on a substrate. Additionally, the GCIB processing method includes generating a GCIB formed from a material source for forming an isolation layer for the non-planar gate structure. Additionally yet, the GCIB processing method includes selecting a beam energy, a beam energy distribution, a beam focus, and a beam dose to achieve a desired thickness of the isolation layer, accelerating the GCIB to achieve the beam energy, focusing the GCIB to achieve the beam focus, and irradiating at least a portion of the substrate with the accelerated GCIB according to the beam dose. The GCIB processing method forms the isolation layer at a base surface adjacent a base of the non-planar gate structure using the GCIB to achieve the desired thickness.04-14-2011
20110049382PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING - An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.03-03-2011
20120205551METHOD AND APPARATUS FOR INTENSITY CONTROL OF A CHARGED PARTICLE BEAM EXTRACTED FROM A SYNCHROTRON - The invention comprises intensity control of a charged particle beam acceleration, extraction, and/or targeting method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Particularly, intensity of a charged particle stream of a synchrotron is described. Intensity control is described in combination with turning magnets, edge focusing magnets, concentrating magnetic field magnets, winding and control coils, and extraction elements of the synchrotron. The system reduces the overall size of the synchrotron, provides a tightly controlled proton beam, directly reduces the size of required magnetic fields, directly reduces required operating power, and allows continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.08-16-2012
20090134339ELECTRON-OPTICAL CORRECTOR FOR APLANATIC IMAGING SYSTEMS - A particle-optical corrector for eliminating both the third-order aperture aberration and the third-order extra-axial coma, using circular lenses and hexapole fields, includes three coaxially arranged hexapole fields, at least one circular lens doublet being arranged between adjacent hexapole fields and adjusted so that the center hexapole field is imaged on the hexapole fields. Between the hexapole fields, an intermediate plane prevails and the intermediate planes are conjugated with one another. The three hexapole fields are identically oriented in the Larmor reference system with the intensities of the three fields being chosen so that the image aberration coefficient of the astigmatism with three-fold symmetry becomes 0. The corrective contains two hexapole fields, in which the fields of the hexapole field pair are excited anti-symmetrically to one another, and the pairs are in each case arranged around the two intermediate planes. The orientation of the hexapole field pairs is rotated with respect to the orientation defined by the hexapole fields by a sufficient angle so that the extra-axial third order coma is corrected.05-28-2009
20110089333ASSEMBLIES FOR ION AND ELECTRON SOURCES AND METHODS OF USE - Certain embodiments described herein are directed to devices that can be used to align the components of a source assembly in a source housing. In some examples, a terminal lens configured to couple to the housing through respective alignment features can be used to retain the source components in a source housing to provide a source assembly.04-21-2011
20100288938MULTI-BEAM DEFLECTOR ARRAY MEANS WITH BONDED ELECTRODES - The invention relates to a multi-beam deflector array means for use in a particle-beam exposure apparatus employing a beam of charged particles, said multi-beam deflector array means having an overall plate-like shape with a membrane region and a buried CMOS-layer, said membrane region comprising a first side facing towards the incoming beam of particles and a second side opposite to the first side, an array of apertures, each aperture allowing passage of a corresponding beam element formed out of said beam of particles, and an array of electrodes, each aperture being associated with at least one of said electrodes and the electrodes being controlled via said CMOS layer, wherein the electrodes are pillared, standing proud of the main body of the multi-beam deflector array means, the electrodes being connected to one side of the main body of the multi-beam deflector array means by means of bonding connections.11-18-2010
20120126136CHARGED-PARTICLE BEAM EXPOSURE APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A charged-particle beam exposure apparatus which includes a deflector that deflects a charged-particle beam, and a stage mechanism that drives a substrate, and draws a pattern on the substrate while scanning the charged-particle beam in a main-scanning direction by the deflector and scanning the substrate in a sub-scanning direction by the stage mechanism. The apparatus includes a blanker unit configured to control irradiation and unirradiation of the substrate with the charged-particle beam, and a controller configured to control the deflector to deflect the charged-particle beam in the sub-scanning direction by an amount of driving of the substrate in the sub-scanning direction by the stage mechanism during a period of time from stop of drawing on the substrate until restart thereof when the drawing on the substrate is stopped and then restarted while the substrate is driven in the sub-scanning direction by the stage mechanism.05-24-2012
20120168639HIGH GRADIENT LENS FOR CHARGED PARTICLE BEAM - Methods and devices enable shaping of a charged particle beam. A dynamically adjustable electric lens includes a series of alternating a series of alternating layers of insulators and conductors with a hollow center. The series of alternating layers when stacked together form a high gradient insulator (HGI) tube to allow propagation of the charged particle beam through the hollow center of the HGI tube. A plurality of transmission lines are connected to a plurality of sections of the HGI tube, and one or more voltage sources are provided to supply an adjustable voltage value to each transmission line of the plurality of transmission lines. By changing the voltage values supplied to each section of the HGI tube, any desired electric field can be established across the HGI tube. This way various functionalities including focusing, defocusing, acceleration, deceleration, intensity modulation and others can be effectuated on a time varying basis.07-05-2012
20120168638Charged Particle Source with Multiple Selectable Particle Emitters - A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.07-05-2012
20120168637METHOD AND APPARATUS FOR CONTROLLING AN ELECTROSTATIC LENS ABOUT A CENTRAL RAY TRAJECTORY OF AN ION BEAM - A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.07-05-2012
20120248326Uniformity of a Scanned Ion Beam - One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.10-04-2012
20120211668Beam Current Controller for Laser Ion Source - The present invention relates to the design and use of an ion source with a rapid beam current controller for experimental and medicinal purposes. More particularly, the present invention relates to the design and use of a laser ion source with a magnetic field applied to confine a plasma flux caused by laser ablation.08-23-2012
20090127473Electron Beam Irradiation Device - An electron beam irradiation device of the present invention includes: a projector 05-21-2009
20120313004Mass Spectrometry for a Gas Analysis with a Two-Stage Charged Particle Deflector Lens Between a Charged Particle Source and a Charged Particle Analyzer both Offset from a Central Axis of the Deflector Lens - Apparatus, methods and systems are provided to inhibit a sightline from a charged particle source to an analyzer and for changing a baseline offset of an output spectrum of an analyzer. A supply of charged particles is directed through a hollow body of a deflector lens that is positioned relative to a charged particle source and an analyzer. A flow path along a preferred flow path through a deflector lens permits passage of the ions from the source to the detector while inhibiting a sightline from the detector to the source in a direction parallel to the central longitudinal axis of the deflector lens.12-13-2012
20100270474Particle-Optical System - The present invention relates to a multi-beamlet multi-column particle-optical system comprising a plurality of columns which are disposed in an array for simultaneously exposing a substrate, each column having an optical axis and comprising: a beamlet generating arrangement comprising at least one multi-aperture plate for generating a pattern of multiple beamlets of charged particles, and an electrostatic lens arrangement comprising at least one electrode element; the at least one electrode element having an aperture defined by an inner peripheral edge facing the optical axis, the aperture having a center and a predetermined shape in a plane orthogonal to the optical axis; wherein in at least one of the plurality of columns, the predetermined shape of the aperture is a non-circular shape with at least one of a protrusion and an indentation from an ideal circle about the center of the aperture.10-28-2010
20100001202SPHERICAL ABERRATION CORRECTION DECELERATING LENS, SPHERICAL ABERRATION CORRECTION LENS SYSTEM, ELECTRON SPECTROMETER, AND PHOTOELECTRON MICROSCOPE - A spherical aberration correction decelerating lens corrects a spherical aberration occurring in an electron beam or an ion beam (hereinafter, referred to as “beam”) emitted from a predetermined object plane position with a certain divergence angle, and said spherical aberration correction decelerating lens comprises at least two electrodes, each of which is constituted of a surface of a solid of revolution whose central axis coincides with an optical axis and each of which receives an intentionally set voltage applied by an external power supply, wherein at least one of the electrodes includes one or more meshes (M) which has a concaved shape opposite to an object plane (P01-07-2010
20120223245ELECTRON BEAM SOURCE SYSTEM AND METHOD - An embodiment includes an electron beam source system having a first electron beam source unit with a substrate having a substrate-top end and a substrate-bottom end; and a first lens coupled to the substrate-bottom end defining a first aperture and having a lens-top end and a lens-bottom end. Further embodiments comprise an electron-emission region at the substrate-bottom end and aligned with the first aperture, the electron-emission region being operable to emit one or more electrons due to one or more photons contacting the electron-emission region, which may include passing through the substrate and into the electron-emission region, wherein the electron-emission region comprises a first doped portion of the substrate.09-06-2012
20120256098Ion Beam System and Method of Operating Ion Beam System - An ion beam system comprises a voltage supply system 10-11-2012
20100327180BEAM QUALITY IN FIB SYSTEMS - Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without significantly reducing processing time. A preferred embodiment includes within an ion beam column a filter that removes the low energy ions from the beam.12-30-2010
20120298879APPARATUS AND METHODS FOR FORMING AN ELECTRICAL CONDUCTION PATH THROUGH AN INSULATING LAYER - One embodiment disclosed relates to an apparatus forming an electrical conduction path through an insulating layer on a surface of a substrate. A first radiation source is configured to emit radiation to a first region of the insulating layer, and a first electrical contact is configured to apply a first bias voltage to the first region. A second radiation source is configured to emit radiation to a second region of the insulating layer, and a second electrical contact is configured to apply a second bias voltage to the second region. The conductivities of the regions are increased by the radiation such that conductive paths are formed through the insulating layer at those regions. In one implementation, the apparatus may be used in an electron beam instrument. Another embodiment relates to a method of forming an electrical conduction path through an insulating layer. Other embodiments, aspects and features are also disclosed.11-29-2012
20120267543SYNCHROTRON AND PARTICLE THERAPY SYSTEM USING THE SAME - Disclosed herein are provided an arrangement of devices suitable to downsize a synchrotron, a synchrotron using such an arrangement, and a particle therapy system using the synchrotron. In the synchrotron, a plurality of deflection magnets and a single defocusing quadrupole magnet are arranged between a first extraction deflector and a second extraction deflector. The defocusing quadrupole magnet is arranged between deflection magnets among the plurality of deflection magnets, a focusing quadrupole magnet is arranged on the side of an inlet of the first extraction deflector, and a focusing quadrupole magnet is arranged on the side of an outlet of the second extraction deflector.10-25-2012
20110215256Focused ion beam apparatus - A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit including an ion source gas nozzle configured to supply gas to the tip and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample, and a gun alignment electrode positioned on the side of the sample with respect to the ion gun unit and adjusts the direction of irradiation of the ion beam ejected from the ion gun unit. A lens system includes a focusing lens electrode and an objective lens electrode to focus the ion beam onto the sample.09-08-2011
20120319000MAGNETICALLY ENHANCED, INDUCTIVELY COUPLED PLASMA SOURCE FOR A FOCUSED ION BEAM SYSTEM - The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.12-20-2012
20120080609GRID PROVIDING BEAMLET STEERING - A grid assembly coupled to a discharge chamber of an ion beam source is configured for steering ion beamlets emitted from the discharge chamber at circularly asymmetrically determined steering angles. The grid assembly includes at least first and a second grid with a substantially circular pattern of holes, wherein each grid comprises holes positioned adjacent to one another. A plurality of the holes of the second grid is positioned with offsets relative to corresponding holes in the first grid. Due to the offsets in the holes in the second grid, ions passing through the offset holes are electrostatically attracted towards the closest circumferential portion of the downstream offset holes. Thus, the trajectories of ions passing through the offset holes are altered. The beamlet is steered by predetermined asymmetric angles. The predetermined steering angles are dependent upon the hole offsets, voltage applied to the grids, and the distance between the grids.04-05-2012
20120319001CHARGED PARTICLE BEAM LENS - An electrostatic charged particle beam lens in a charged particle beam exposure apparatus includes a first electrode having at least one aperture; a second electrode having at least one aperture; and a supporting body disposed between the first electrode and the second electrode, the supporting body being configured to support the first electrode and the second electrode such that the first electrode and the second electrode are electrically separated from each other. The supporting body is made of alkali-free glass or low-alkali glass.12-20-2012
20120280136Plasma Source for Charged Particle Beam System - An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.11-08-2012
20120091360CHARGED PARTICLE BEAM SYSTEM HAVING MULTIPLE USER-SELECTABLE OPERATING MODES - A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled.04-19-2012
20120091359SIMPLIFIED PARTICLE EMITTER AND METHOD OF OPERATING THEREOF - An emitter assembly for emitting a charged particle beam along an optical axis is described. The emitter assembly being housed in a gun chamber and includes an emitter having an emitter tip, wherein the emitter tip is positioned at a first plane perpendicular to the optical axis and wherein the emitter is configured to be biased to a first potential, an extractor having an opening, wherein the opening is positioned at a second plane perpendicular to the optical axis and wherein the extractor is configured to be biased to a second potential, wherein the second plane has a first distance from the first plane of 2.25 mm and above.04-19-2012
20120091358PROJECTION LENS ARRANGEMENT - The invention relates to a charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system has a charged particle source, an aperture array, a beamlet manipulator, a beamlet blanker, and an array of projection lens systems. The charged particle source is configured to generate a charged particle beam. The aperture array is configured to define separate beamlets from the generated beam. The beamlet manipulator is configured to converge groups of the beamlets towards a common point of convergence for each group. The beamlet blanker is configured to controllably blank beamlets in the groups of beamlets. Finally, the array of projection lens systems is configured to project unblanked beamlets of the groups of beamlets on to the surface of the target. The beamlet manipulator is further adapted to converge each of the groups of beamlets towards a point corresponding to one of the projection lens systems.04-19-2012
20120286169METHOD OF GENERATING A TWO-LEVEL PATTERN FOR LITHOGRAPHIC PROCESSING AND PATTERN GENERATOR USING THE SAME - The invention relates to a method of generating a two-level pattern for lithographic processing by multiple beamlets. In the method, first a pattern in vector format is provided. The vector format pattern is then converted into a pattern in pixmap format. Finally, a two-level pattern is formed by application of error diffusion on the pixmap format pattern.11-15-2012
20120286168DATA PATH FOR LITHOGRAPHY APPARATUS - A maskless charged particle lithography system comprises an electron-optical column and a data path. The column includes a blanker array including blanker elements. The data path comprises a preprocessing system, transmission channels, and a pattern streaming system. The lithography system is configured for exposing a target field in two passes by allocating a first beamlet subset for exposing a first field subset during a first pass and a second beamlet subset for exposing a second field subset during a second pass. A first beam selector selects a first pattern data subset containing exposure data for the first beamlet subset and a second pattern data subset containing exposure data for the second beamlet subset. Second beam selectors connect transmission channels assigned for transmitting the first pattern data subset to a first blanker elements subset, and transmission channels assigned for transmitting the second pattern data subset to a second blanker elements subset.11-15-2012
20090242785SUPER CONDUCTING BEAM GUIDANCE MAGNET, WHICH CAN ROTATE AND HAS A SOLID-STATE CRYOGENIC THERMAL BUS - The beam guidance magnet for deflection of a beam of electrically charged particles can rotate about an axis located outside the magnet, and free of ferromagnetic material influencing the beam guidance. The beam guidance magnet contains a system of at least four curved superconducting individual coils which extend in the guidance direction of the particle beam and are arranged in pairs, in the mirror-image form with respect to a beam guidance plane which is predetermined by the curved particle path. The beam guidance magnet also contains a cooling apparatus having at least one heat sink and at least one solid-state cryogenic thermal bus, with super convecting individual coils being thermally coupled to the at least one heat sink via the solid-state cryogenic thermal bus.10-01-2009
20130009070ELECTROSTATIC LENS FOR CHARGED PARTICLE RADIATION - Provided is an electrostatic lens for charged particle radiation with a lens performance relatively comparable to that of a magnetic type lens. A plurality of electrodes arranged on the incident side of charged particles form a first electric field area, wherein orbit radii of the charged particles are reduced without exceeding, on the way, the initial orbit radii that are orbit radii at the incident time, and a second electric field area, wherein force in the direction advancing in parallel with a central axis is applied to the charged particles that have passed through the first electric field area. A plurality of electrodes arranged on the projection side form a third electric field area, wherein the orbit radii of the charged particles do not exceed the initial orbit radii on the way and are curved to intersect with a central axis at angles larger than orbit angles defined with respect to the central axis of when the charged particles are projected from the second electric field area.01-10-2013
20120145916PROJECTION LENS ARRANGEMENT - The invention relates to a charged particle multi-beamlet lithographic system for exposing a target using a plurality of beamlets. The system comprises a beamlet generator for generating a plurality of beamlets, a beamlet blanker for controllably blanking beamlets, and an array of projection lens systems for projecting unblanked beamlets on to the surface of the target. The beamlet generator comprises at least one charged particle source for generating a charged particle beam, a sub-beam generator for defining a plurality of sub-beams from the charged particle beam, a sub-beam manipulator array for influencing the sub-beams, and an aperture array for defining beamlets from the sub-beams.06-14-2012
20130020495Compact High Precision Adjustable Beam Defining Aperture - The present invention provides an adjustable aperture for limiting the dimension of a beam of energy. In an exemplary embodiment, the aperture includes (1) at least one piezoelectric bender, where a fixed end of the bender is attached to a common support structure via a first attachment and where a movable end of the bender is movable in response to an actuating voltage applied to the bender and (2) at least one blade attached to the movable end of the bender via a second attachment such that the blade is capable of impinging upon the beam. In an exemplary embodiment, the beam of energy is electromagnetic radiation. In an exemplary embodiment, the beam of energy is X-rays.01-24-2013
20120241641DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE - A drawing apparatus performs drawing on a substrate with charged particle beams. The drawing apparatus includes an irradiation optical system including a collimator lens; an aperture array configured to split the charged particle beam into a plurality of charged particle beams; a converging lens array configured to form a plurality of crossovers of the plurality of charged particle beams; and a projection optical system including an element in which a plurality of apertures corresponding to the plurality of crossovers are formed, and a plurality of projection lenses corresponding to the apertures. The converging lens array includes converging lenses disposed such that each of the plurality of crossovers, which are formed by the converging lenses from the charged particle beam incident on the aperture array at incidence angles associated with aberration of the irradiation optical system, is aligned with corresponding one of the apertures in the element.09-27-2012
20120241640ION SOURCES, SYSTEMS AND METHODS - Ion sources, systems and methods are disclosed. In some embodiments, the ion sources, systems and methods can exhibit relatively little undesired vibration and/or can sufficiently dampen undesired vibration. This can enhance performance (e.g., increase reliability, stability and the like).09-27-2012
20080237483Carbon nanotube electron gun - An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are disclosed. Embodiments provide an electron source utilizing a carbon nanotube (CNT) bonded to a substrate for increased stability, reliability, and durability. An extractor with an aperture in a conductive material is used to extract electrons from the electron source, where the aperture may substantially align with the CNT of the electron source when the extractor and electron source are mated to form the electron gun. The electron source and extractor may have alignment features for aligning the electron source and the extractor, thereby bringing the aperture and CNT into substantial alignment when assembled. The alignment features may provide and maintain this alignment during operation to improve the field emission characteristics and overall system stability of the electron gun.10-02-2008
20130168571PARTICLE BEAM IRRADIATION SYSTEM AND PARTICLE BEAM THERAPY SYSTEM - The objective is to eliminate the effect of the hysteresis of a scanning electromagnet so that there is obtained a particle beam irradiation system that realizes high-accuracy beam irradiation. There are provided a magnetic-field sensor that measures the magnetic field of a scanning electromagnet and an irradiation control apparatus that controls the scanning electromagnet based on a measurement magnetic field measured by the magnetic-field sensor and target irradiation position coordinates of a charged particle beam. The irradiation control apparatus is provided with an inverse map means that calculates a target magnetic field, based on the target irradiation position coordinates of the charged particle beam; and a compensator that outputs a control input, to the scanning electromagnet, for controlling the magnetic-field error between the target magnetic field and the measurement magnetic field to be the same as or smaller than a predetermined threshold value.07-04-2013
20080224064Charged particle accelerator - A charged particle accelerator in which discharge is less likely to occur between a charged particle source, and an extraction electrode, and an acceleration electrode without the need for increasing the capacity of a high voltage power supply for extraction. The charged particle accelerator includes a charged particle source which emits charged particles, an extraction electrode which extracts the charged particles from the charge particle source and an acceleration electrode which accelerates the extracted charged particles. A surge absorber is electrically connected between at least two of the charged particle source, the extraction electrode, and the acceleration electrode.09-18-2008
20080224063CHARGED PARTICLE OPTICS WITH AZIMUTHALLY-VARYING THIRD-ORDER ABERRATIONS FOR GENERATION OF SHAPED BEAMS - A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate. The 8N-pole element can be magnetic or electrostatic.09-18-2008
20130140468CHARGED PARTICLE BEAM SCANNING USING DEFORMED HIGH GRADIENT INSULATOR - Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.06-06-2013
20130175453DRAWING APPARATUS, METHOD OF MANUFACTURING ARTICLE, AND INFORMATION PROCESSING APPARATUS - The present invention provides a drawing apparatus including a plurality of drawing units each of which is configured to perform drawing on a substrate with a charged particle beam, a plurality of first processors configured to be selectively connectable to each of the plurality of drawing units, an information processor configured to determine, from the plurality of first processors, a first processor to be connected to a first drawing unit among the plurality of drawing units, based on drawing data, and a connection unit configured to connect the determined first processor to the first drawing unit.07-11-2013
20080217553FOCUSING METHOD OF CHARGED PARTICLE BEAM AND ASTIGMATISM ADJUSTING METHOD OF CHARGED PARTICLE - A focusing method of a charged particle beam includes measuring a first set value to focus a beam on a position of a reference plane by using a lens coil, acquiring a first factor to change a set value of an electrostatic lens depending on a distance and a second factor to change a set value of the coil depending on a distance, measuring a level distribution of a target plane, correcting the first set value by using the second factor to correct a focal point position of the beam in the coil from the position of the reference plane to an intermediate level position of the level distribution of the target plane, and correcting a second set value of the lens depending on a level position of the target plane by using the first factor to correct a focal point position of the beam by the lens.09-11-2008
20130112890CHARGED PARTICLE ENERGY FILTER - A multi-element electrostatic chicane energy filter, with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements. A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.05-09-2013
20130099132OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE - To prevent reflective optical elements (04-25-2013
20130099131METHOD AND APPARATUS FOR IMPROVED UNIFORMITY CONTROL WITH DYNAMIC BEAM SHAPING - The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.04-25-2013
20130112891CHARGED PARTICLE OPTICAL SYSTEM AND SCRIBING APPARATUS - A charged particle optical system includes: a member 05-09-2013
20130140469Ion Guide Array - An ion guide array is disclosed comprising a first ion guide section and a second ion guide section. Each ion guide section may comprise a plurality of electrodes having an aperture through which ions are transmitted in use. A transfer section is arranged at the exit of the first ion guide section and ions are transmitted radially from the first ion guide section into the second ion guide section. Electrodes in the transfer section may have a radial aperture enabling ions to be transmitted radially from the first ion guide section to the second ion guide section.06-06-2013
20110220808ION IMPLANTER PROVIDED WITH BEAM DEFLECTOR AND ASYMMETRICAL EINZEL LENS - An ion implanter has a beam deflector having a pair of magnetic poles facing each other in a z direction, insulating members provided on the respective magnetic poles, at least one pair of electrodes provided on the insulating members so as to face each other across a space through which the ion beam passes in the z direction, and at least one power source configured to apply a voltage to the pair of electrodes. The beam deflector is configured to deflect, by a magnetic field, an overall shape of the ion beam so as to be substantially parallel to the x direction. The pair of electrodes have a dimension longer than the dimension of the ion beam in the y direction, and constitute an asymmetrical einzel lens in the direction of travel of the central orbit of the ion beam.09-15-2011
20110248180PROJECTED ARTIFICIAL MAGNETIC MIRROR WAVEGUIDE - A projected artificial magnetic mirror (PAMM) waveguide includes a substrate, metal patches, a metal backing, multiple dielectric materials, and a waveguide area. The metal patches are on a first layer of a substrate and the metal backing is on a second layer of the substrate. The first dielectric material is between the first and second layers of the substrate. The metal patches are electrically coupled to the metal backing to form an inductive-capacitive network that substantially reduces surface waves along a surface of the substrate within a given frequency band. The second dielectric material juxtaposed to the metal patches, where the waveguide area is between the second and third dielectric materials and includes the surface of the substrate. The inductive-capacitive network, the second dielectric material, and/or the third dielectric material facilitate confining an electromagnetic signal within the waveguide area.10-13-2011
20120273691CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE - The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.11-01-2012
20120273690CHARGED PARTICLE SYSTEM COMPRISING A MANIPULATOR DEVICE FOR MANIPULATION OF ONE OR MORE CHARGED PARTICLE BEAMS - The invention relates to a charged particle system such as a multi beam lithography system, comprising a manipulator device for manipulation of one or more charged particle beams, wherein the manipulator device comprises at least one through opening in the plane of the planar substrate for passing at least one charged particle beam there through. Each through opening is provided with electrodes arranged in a first set of multiple first electrodes along a first part of a perimeter of said through opening and in a second set of multiple second electrodes along a second part of said perimeter. An electronic control circuit is arranged for providing voltage differences the electrodes in dependence of a position of the first and second electrode along the perimeter of the through opening.11-01-2012
20110272592Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation - An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.11-10-2011
20130181139BEAM LINE DESIGN TO REDUCE ENERGY CONTAMINATION - Methods and apparatus for reducing energy contamination can be provided to a beam line assembly for ion implantation. Protrusions comprising surface areas and grooves therebetween can face neutral trajectories within a line of sight view from the workpiece within the beam line assembly. The protrusions can alter the course of the neutral trajectories away from the workpiece or cause alternate trajectories for further impacting before hitting a workpiece, and thereby, further reduce energy contamination for more sensitive implants.07-18-2013
20130181140Charged Particle Beam System Aperture - An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.07-18-2013
20110297843ION IMPLANTING APPARATUS AND DEFLECTING ELECTRODE - An ion implanting apparatus includes: an electrostatic accelerating tube for causing an ion beam extracted from an ion source to have a desirable energy, and deflecting the ion beam to be incident on a target, the electrostatic accelerating tube including deflecting electrodes provided to interpose the ion beam therebetween. The deflecting electrodes include a first deflecting electrode and a second deflecting electrode to which different electric potentials from each other are set. The second deflecting electrode is provided on a side where the ion beam is to be deflected and includes an upstream electrode provided on an upstream side of the ion beam and a downstream electrode provided apart from the upstream electrode toward a downstream side. An electric potential of the upstream electrode and an electric potential of the downstream electrode are independently set from each other.12-08-2011
20130187060Compact gantry for particle therapy - The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a compact isocentric gantry for delivering particle beams perpendicularly to a rotation axis of the gantry . The gantry comprises three dipole magnets. The angle of the last dipole magnet is smaller than 90° and a most preferred bending angle for this last dipole magnet is 60°.07-25-2013
20120001086Charged particle beam apparatus and sample processing method - A charged particle beam apparatus includes an ion beam column having an ion source for generating an ion beam, a first objective lens electrode which forms a first objective lens for focusing the ion beam on a sample, and a second objective lens electrode which is disposed at a position closer to the sample than the first objective lens electrode and forms a second objective lens for focusing an ion beam accelerated with a lower acceleration voltage on the sample.01-05-2012
20130193340ELECTRON BEAM FOCUSING ELECTRODE AND ELECTRON GUN USING THE SAME - An electron beam focusing electrode and an electron gun using the same may include a plate having a polygonal through-hole; at least a projecting portion formed on at least one side of the through-hole. By using the electron beam focusing electrode, a spreading phenomenon of an electron beam having a rectangular cross section may be reduced. Further, the output of the electron gun may be increased, and electron beams may be easily focused.08-01-2013
20130193341METHODS, DEVICES, AND SYSTEMS FOR MANIPULATING CHARGED PARTICLE STREAMS - A multiple-deflection blanker for charged particle beam lithography includes a support structure, a first pair of electrodes mounted to the support structure and providing a first electric field, a second pair of electrodes mounted to the support structure and providing a second electric field, at least a third pair of electrodes mounted to the support structure and providing a third electric field, and a surface, such as, an aperture or knife edge, positioned to obstruct a charged particle beam passed through the electric fields. The blanker may include at least a fourth pair of electrodes providing a fourth electric field and apparatus for regulating the time of the excitation of the electric fields. Methods for exposing media to charged particles and aperture holders are also provided.08-01-2013
20120018648DEVICE FOR GENERATING AN ION BEAM WITH MAGNETIC FILTER - This device (01-26-2012
20120025094CHARGED PARTICLE BEAM SYSTEM - A charged particle beam system for performing precession diffraction includes a lens 02-02-2012
20120025093Particle Beam System - A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates 02-02-2012
20120085920PARTICLE BEAM INJECTOR SYSTEM AND METHOD - Methods and devices enable coupling of a charged particle beam to a radio frequency quadrupole accelerator. Coupling of the charged particle beam is accomplished, at least inpart, by relying on of sensitivity of the input phase space acceptance of the radio frequency quadrupole to the angle of the input charged particle beam. A first electric field across a beam deflector deflects the particle beam at an angle that is beyond the acceptance angle of the radio frequency quadrupole. By momentarily reversing or reducing the established electric field, a narrow portion of the charged particle beam is deflected at an angle within the acceptance angle of the radio frequency quadrupole. In another configuration, beam is directed at an angle within the acceptance angle of the radio frequency quadrupole by the first electric field and is deflected beyond the acceptance angle of the radio frequency quadrupole due to the second electric field.04-12-2012
20120085919APPARATUS AND METHODS FOR PATTERN GENERATION - One embodiment relates to an apparatus for writing a pattern on a target substrate. The apparatus includes a plurality of arrays of pixel elements, each array being offset from the other arrays. In addition, the apparatus includes a source and lenses for generating an incident beam that is focused onto the plurality of arrays, and circuitry to control the pixel elements of each array to selectively reflect pixel portions of the incident beam to form a patterned beam. The apparatus further includes a projector for projecting the patterned beam onto the target substrate. Other features, aspects and embodiments are also disclosed.04-12-2012
20130206999CHARGED PARTICLE BEAM LENS AND CHARGED PARTICLE BEAM EXPOSURE APPARATUS - Provided is a charged particle beam lens, including: a first electrode on a downstream side and a second electrode on an upstream side in a travelling direction of a charged particle beam; a distance defining member provided between the first electrode and the second electrode such that the first electrode and the second electrode are placed away from each other; and a gap surrounded by the first electrode, the second electrode, and the distance defining member, in which: each of the first electrode and the second electrode has a first through hole formed therein, through which the charged particle beam passes; the second electrode further has a second through hole formed therein, through which the charged particle beam does not pass; and both the first through hole and the second through hole communicate to the gap.08-15-2013
20130207000Laser-Ablation Ion Source with Ion Funnel - A laser-ablation ion source for generating a low energy ion beam having low longitudinal and transverse emittance, including a supersonic nozzle, followed by an RF ion funnel. A laser source generates a laser beam which is focused by a lens to an ablation site. The ablation site is located upstream of the nozzle, at a distance of less than 10 mm from the nozzle aperture. The laser irradiates the ablation site through the nozzle aperture to generate the ions.08-15-2013
20130043403SYSTEM, APPARATUS AND METHOD FOR DEFLECTING A PARTICLE BEAM - A variety of systems, apparatus and methods for deflecting a particle beam are described. An apparatus comprises at least six electromagnetic portions disposed on a plane. Each of the at least six electromagnetic portions is aligned with a radius emanating from an axis normal to the plane and is distanced from the axis to form a volume about the axis. At least six coils are configured for affecting a dipole magnetic field in the volume in response to electrical currents applied to physically opposing coils where a particle beam entering the volume is deflected. Each of the at least six coils is disposed about a one of the at least six electromagnetic portions. A yoke structure is configured for returning a generated magnetic flux.02-21-2013
20080258073Method and apparatus for simultaneously depositing and observing materials on a target - A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.10-23-2008
20100102244Methods and Systems for Treating Cancer Using External Beam Radiation - A radiation system employs magnetic field to move particle beams and radiation sources. The radiation system includes a source operable to produce a particle beam, a scanning magnet operable to scan the particle beam, and a target configured to be impinged by at least a portion of the scanned particle beam to produce radiation.04-29-2010
20090159810Particle-Optical Component - An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.06-25-2009
20130026385SHIELDING MEMBER HAVING A CHARGE CONTROL ELECTRODE, AND A CHARGED PARTICLE BEAM APPARATUS - A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 1001-31-2013
20090206270ION BEAM APPARATUS AND METHOD FOR ION IMPLANTATION - A multipurpose ion implanter beam line configuration constructed for enabling implantation of common monatomic dopant ion species and cluster ions, the beam line configuration having a mass analyzer magnet defining a pole gap of substantial width between ferromagnetic poles of the magnet and a mass selection aperture, the analyzer magnet sized to accept art ion beam from a slot-form ion source extraction aperture of at least about 80 mm height and at least about 7 mm width, and to produce dispersion at the mass selection aperture in a plane corresponding to the width of the beam, the mass selection aperture capable of being set to a mass-selection width sized to select a beam of the cluster ions of the same dopant species but incrementally differing molecular weights, the mass selection aperture also capable of being set to a substantially narrower mass-selection width and the analyzer magnet having a resolution at the mass selection aperture sufficient to enable selection of a beam of monatomic dopant ions of substantially a single atomic or molecular weight.08-20-2009
20130082187MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM WRITING METHOD - A multi charged particle beam writing apparatus according to one aspect of the present invention includes a first aperture member to form multiple beams, a blanker array provided with a plurality of blankers which respectively perform blanking deflection of a corresponding beam in the multiple beams, a first electromagnetic lens and a second electromagnetic lens arranged between the first aperture member and the blanker array, a second aperture member arranged between the first electromagnetic lens and the second electromagnetic lens and at a position of a convergence point of the multiple beams and configured to restrict passage of charged particles deviated from the convergence point, and a third aperture member to block each beam which was deflected to be in a beam off state by the plurality of blankers.04-04-2013
20130087716CHARGED PARTICLE SOURCE - A charged particle source comprises at least one gas inlet configured to supply gas particles, at least one tip having a tip apex being biased to provide an electrical field for generating charged particles, and at least one ionization area to which gas particles are supplied. The gas particles are ionized in the ionization area due to the electrical field. Additionally, the charged particle source comprises at least one first electrode configured to accelerate charged particles and at least one light emitting device providing a light beam. The light beam is focused to a focus point in the ionization area, specifically, to a focus volume such that the ionization area is at least partly positioned in the focus volume. The ionization area is arranged between the tip apex and the first electrode. The distance between the ionization area and the tip apex may be from 0.1 nm to 1 nm.04-11-2013
20100327178ION SOURCE ASSEMBLY FOR ION IMPLANTATION APPARATUS AND A METHOD OF GENERATING IONS THEREIN - A hydrogen ion implanter for the exfoliation of silicon from silicon wafers uses a large scan wheel carrying 50+ wafers around its periphery and rotating about an axis. In one embodiment, the axis of rotation of the wheel is fixed and a ribbon beam of hydrogen ions is directed down on a peripheral edge of the wheel. The ribbon beam extends over the full radial width of wafers on the wheel. The beam is generated by an ion source providing an extracted ribbon beam having at least 100 mm major cross-sectional diameter. The ion source may use core-less saddle type coils to provide a uniform field confining the plasma in the ion source. The ribbon beam may be passed through a 90° bending magnet which bends the beam in the plane of the ribbon.12-30-2010
20120217414APPARATUS FOR AND METHOD OF WITHDRAWING IONS IN EUV LIGHT PRODUCTION APPARATUS - An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.08-30-2012
20090065706PARTICLE BEAM THERAPY SYSTEM - A particle beam therapy system using a spot scanning method includes a synchrotron, a beam transport system, an irradiation system, and a controller. A controller is configured to turn on a radio frequency electromagnetic field to be applied to an extraction system when a charged particle beam is to be supplied to the irradiation system, and turn off the radio frequency electromagnetic field to be applied to the extraction system when the supply of the charged particle beam to the irradiation system is to be blocked by means of an electromagnet provided in the beam transport system or in the synchrotron. The controller is also adapted to turn off a radio frequency acceleration voltage to be applied to an acceleration cavity in synchronization with the turning-off of the radio frequency electromagnetic field to be applied to the extraction device.03-12-2009
20120235053Mass analyzer apparatus and systems operative for focusing ribbon ion beams and for separating desired ion species from unwanted ion species in ribbon ion beams - The present invention is an apparatus and multi-unit assembly which is able to achieve two different and highly desirable functions: A focusing of a charged particle beam; and a mass separation of desired ion species from unwanted ion species in traveling ion beams. The apparatus is a simply organized and easily manufactured article; is relatively light-weight and less expensive to make; and is easier to install, align, and operate than conventionally available devices.09-20-2012
20100127183LASER-DRIVEN PARTICLE BEAM IRRADIATION APPARATUS AND METHOD - A laser-driven particle beam irradiation apparatus includes: a particle beam generator irradiating a target with pulsed laser light to emit a laser-driven particle ray; a beam converging unit forming a transportation path which guides the emitted laser-driven particle ray to an object and spatially converging the laser-driven particle ray; an energy selector selecting an energy and an energy width of the laser-driven particle ray; an irradiation port causing the laser-driven particle ray to scan the object to adjust an irradiation position in the object; and an irradiation controller controlling operation of the particle beam generator, the beam converging unit, the energy selector and the irradiation port. The beam converging unit generates a magnetic field on a trajectory of the laser-driven particle ray and converging the laser-driven particle ray by the magnetic field, the magnetic field forcing divergence components of the laser-driven particle ray that go away from a center of the trajectory back to the center of the trajectory.05-27-2010
20110284759METHOD FOR ADJUSTING OPTICAL AXIS OF CHARGED PARTICLE RADIATION AND CHARGED PARTICLE RADIATION DEVICE - Provided are a method for adjusting the optical axis of a charged particle beam and a device therefor, wherein an artificial criterion is quantified, and whether or not the adjustment of the axis of a charged particle beam is necessary is judged on the basis of the quantified criterion. In the method for adjusting the optical axis and the device therefor, the conditions for adjusting an optical element for adjusting a charged particle beam are changed; a plurality of images are captured under the changed conditions; images the qualities of which are allowed or images the qualities of which are not allowed are selected from the captured images; a first image quality evaluation value is obtained on the basis of the selected images; the obtained first image quality evaluation value is compared with a second image quality evaluation value obtained from images obtained by scanning an object using the charged particle beam; and the optical axis is adjusted when the second image quality evaluation value is equal to or below the first image quality evaluation value.11-24-2011
20110284758Spherical Aberration Corrector and Method of Spherical Aberration Correction - A spherical aberration corrector and method is offered, which is easy to design and which can correct spherical aberration and even six-fold astigmatism in a charged particle beam instrument. The corrector has a first pair of multipole elements for producing a first pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out and a second pair of multipole elements for producing a second pair of three-fold symmetric fields in which three-fold astigmatisms produced mutually are canceled out. The second pair of multipole elements produce six-fold astigmatisms angularly spaced by 30° about an optical axis from six-fold astigmatisms produced by the first pair of multipole elements.11-24-2011
20110139997Ion transporter, ion transport method, ion beam irradiator, and medical particle beam irradiator - To obtain high-directivity, stable, and high-intensity ion beam.06-16-2011
20110291021Reflection Electron Beam Projection Lithography Using an ExB Separator - One embodiment disclosed relates to an apparatus for reflection electron beam lithography. The apparatus includes an electron source, a patterned electron reflector generator structure, a stage, a demagnifying electron lens, and an ExB separator. The ExB separator configured to bend a trajectory of the electron beam towards the dynamic pattern generator structure. The patterned electron reflector structure is configured to reflect select portions of the electron beam so as to form a patterned electron beam. The ExB separator is further configured to allow the patterned electron beam to pass straight through towards the demagnifying electron lens. The demagnifying electron lens is configured to demagnify the patterned electron beam and project the demagnified patterned electron beam onto the target substrate. The apparatus disclosed herein has a straight projection axis and substantially reduces the electron beam path by a factor of three-to-one (compared to a prior apparatus which uses a magnetic prism).12-01-2011
20100258738DEVICE FOR DEFLECTING OR GUIDING IN A PARTICLE BEAM - A device for deflecting a particle beam out of a beam axis, or for guiding a particle beam into the beam axis, has a simple design, requires little space, and additionally ensures that no area of an object that is not to be struck is struck by a particle beam. The device may include components in the following sequence along the beam axis: first deflection element, a magnetic apparatus for providing a magnetic field axially to the beam axis, and a second deflection element. A particle beam apparatus may have a device of this type.10-14-2010
20100084566Electron Column Using A Magnetic Lens Layer Having Permanent Magnets - Disclosed herein is an electron column using a magnetic lens layer. The electron column includes a magnetic lens layer for condensing an electron beam using permanent magnets. The magnetic lens layer includes a support plate, an aperture formed through the support plate, and permanent magnets arranged around the aperture and disposed on or inserted into the support plate.04-08-2010
20100090122MULTI-FIELD CHARGED PARTICLE CANCER THERAPY METHOD AND APPARATUS - The invention relates to treatment of solid cancers. More particularly, the invention relates to a combined rotation/raster method, referred to as multi-field charged particle cancer therapy. The system uses a fixed orientation proton source relative to a rotating patient to yield tumor irradiation from multiple directions. The system combines layer-wise tumor irradiation from many directions with controlled energy proton irradiation to deliver peak proton beam energy within a selected tumor volume or irradiated slice. Optionally, the selected tumor volume for irradiation from a given angle is a distal portion of the tumor. In this manner ingress Bragg peak energy is circumferentially spread about the tumor minimizing damage to healthy tissue and peak proton energy is efficiently, accurately, and precisely delivered to the tumor.04-15-2010
20090261266MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS - The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.10-22-2009
20110204250MAGNET FOR ION BEAM IRRADIATION APPARATUS EQUIPPED WITH PROTECTIVE MEMBER THAT COVERS PLURALITY OF MAGNETIC FIELD CONCENTRATING MEMBERS - A magnet used in an ion beam irradiation apparatus includes a pair of magnetic poles arranged facing each other on an inner side of the magnet across an ion beam; a plurality of magnetic field concentrating members that are arranged on each of the opposing surfaces of the magnetic poles and that perform a function of trapping electrons between the magnetic poles; and a protective member that covers opposing surfaces of the magnetic field concentrating members.08-25-2011
20080302972Broad energy-range ribbon ion beam collimation using a variable-gradient dipole - A method and apparatus satisfying growing demands for improving the intensity of implanting ions that impact a semiconductor wafer as it passes under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes for combating the disruptive effects of ion-beam induced space-charge forces. The design of the novel optical elements makes possible: (1) Focusing of a ribbon ion beam as the beam passes through uniform or non-uniform magnetic fields; (2) Reduction of the losses of ions comprising a d.c. ribbon beam to the magnetic poles when a ribbon beam is deflected by a magnetic field.12-11-2008
20090050819Laser-Accelerated Proton Therapy Units And Superconducting Electromagnet Systems For Same - Compact particle selection and collimation devices are disclosed for delivering beams of protons with desired energy spectra. These devices are useful with laser-accelerated proton therapy systems, in which the initial protons have broad energy and angular distributions. Superconducting magnet systems produce a desired magnetic field configuration to spread the protons with different energies and emitting angles for particle selection. The simulation of proton transport in the presence of the magnetic field shows that the selected protons are successfully refocused on the beam axis after passing through the magnetic field with the optimal magnet system. Dose distributions are also provided using Monte Carlo simulations of the laser-accelerated proton beams for radiation therapy applications.02-26-2009
20090321654BEAM GUIDING MAGNET FOR DEFLECTING A PARTICLE BEAM - A beam guiding magnet includes a first and second coil system, which are designed such that the dipole moments of the first and second coil systems point in opposite directions. Since the dipole moments of the first and second coil systems point in opposite directions, the two dipole moments at least partially compensate for one another. The resultant dipole moment of the beam guiding magnet may be reduced. The beam guiding magnet may take into account that the remote field of a beam guiding magnet can be lowered by a reduction in the dipole moment of the beam guiding magnet. The dipole moment decreases with the cube of the distance from the beam guiding magnet. A quadruple moment, which on attenuation of the dipole moment represents the next strongest field component, decreases with the fifth power of that distance.12-31-2009
20090084975Multipole coils - Multipole coils (04-02-2009
20110139996MULTI-AXIS MAGNETIC LENS - The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.06-16-2011
20090200481ION RADIATION THERAPY SYSTEM HAVING MAGNETIC FAN BEAM FORMER - An improved beam forming system for ions used in radiation treatment employs a magnet system of successive quadrupole magnets to convert an ion pencil beam to a fan beam with reduced neutrons production compared with conventional beam spreading techniques using scattering foils.08-13-2009
20100038552Gantry for Medical Particle Therapy Facility - A particle therapy gantry for delivering a particle beam to a patient includes a beam tube having a curvature defining a particle beam path and a plurality of fixed field magnets sequentially arranged along the beam tube for guiding the particle beam along the particle path. In a method for delivering a particle beam to a patient through a gantry, a particle beam is guided by a plurality of fixed field magnets sequentially arranged along a beam tube of the gantry and the beam is alternately focused and defocused with alternately arranged focusing and defocusing fixed field magnets.02-18-2010
20100213384Irradiation Field Forming Device - An irradiation field forming device for forming an irradiation field when a specimen is irradiated with a charged particle beam generated by an accelerator, the irradiation field forming device includes: a range shifter arranged on a beam axis of the charged particle beam for regulating an irradiation depth of the charged particle beam; and two or more than two converging electromagnets arranged in the downstream of the range shifter for regulating a beam diameter of the charged particle beam which is enlarged by the range shifter to a constant value.08-26-2010
20090039280MAGNETIC LENS ASSEMBLY - A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.02-12-2009
20110114849SYSTEM AND METHOD FOR MANIPULATING AN ION BEAM - A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.05-19-2011
20090032721PARTICLE-BEAM EXPOSURE APPARATUS AND PARTICLE-BEAM THERAPEUTIC APPARATUS - A particle-beam exposure apparatus and a particle-beam therapeutic apparatus are obtained, in which, by reducing diameter increase, due to scattering in a range shifter, of a charged particle beam, the charged particle beam whose diameter is so narrow that spatially accurate exposure into the target is possible can be supplied, as well as, by placing the range shifter at a position apart from a patient, intimidation caused by a movement noise, etc. can be prevented. A particle-beam exposure apparatus and a particle-beam therapeutic apparatus include a range shifter 02-05-2009
20110121194CONTROLLED TRANSPORT SYSTEM FOR AN ELLIPTIC CHARGED-PARTICLE BEAM - A charged-particle beam control system includes a plurality of external magnets that generate an axially-varying longitudinal magnetic (AVLM)/axially-varying quadrupole magnetic (AVQM) field. A plurality of external electrode geometries generates an axially-varying longitudinal electrostatic (AVLE)/axially-varying quadrupole electrostatic (AVQE) field. The external electrode geometries and magnets control and confine a charged-particle beam of elliptic cross-section.05-26-2011
20110240874PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM THERAPY SYSTEM - When the IMRT technology for a radiation therapy system utilizing an X-ray or the like is applied as it is to a particle beam therapy system having a conventional wobbler system, there is posed the problem that it is required to utilize two or more boluses. The objective of the present invention is to solve the problem of excess irradiation in IMRT by a particle beam therapy system. More specifically, the problem of excess irradiation in IMRT by a particle beam therapy system is solved by raising the irradiation flexibility in the depth direction, without utilizing a bolus.10-06-2011
20100084567Chromatic Aberration Corrector for Charged-Particle Beam System and Correction Method Therefor - An aberration corrector has two stages of multipole elements each of which has a thickness along the optical axis. Each multipole element produces a static electric or magnetic field of 3-fold symmetry and a static electromagnetic field of 2- or 3-fold symmetry superimposed on the static electric or magnetic field. In each of the multipole elements, the static electromagnetic field is so set that magnetic and electric deflecting forces on an electron beam accelerated by a given accelerating voltage substantially cancel out each other. Thus, chromatic aberration is corrected. Also, spherical aberration is corrected by the static electric or magnetic fields of 3-fold symmetry produced by the multipole elements.04-08-2010
20110210264Distributed Ion Source Acceleration Column - An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source.09-01-2011
20110210263Particle Beam Transport Apparatus And Method Of Transporting A Particle Beam With Small Beam Spot Size - An apparatus for transporting a charged particle beam is provided. The apparatus may include: means for scanning the charged particle beam on a target, a dipole magnet arranged upstream of the means for scanning, at least three quadrupole lenses arranged between the dipole magnet and the means for scanning, and means for adjusting the field strength of at least three quadrupole lenses in function of the scanning angle of the charged particle beam. The apparatus can be made at least single achromatic.09-01-2011
20090218506ELECTRON BEAM APPARATUS - An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (09-03-2009
20100072387Aberration Corrector and Charged-Particle Beam System Equipped Therewith - An aberration corrector has two stages of dodecapole (12-pole) elements each of which has first through twelfth poles arranged in this order. Exciting coils of the (4n+1)th poles and the exciting coils of the (4n+2)th poles are alternately connected in series (where n=0, 1, or 2) to produce magnetic fields which are identical in absolute value but mutually opposite in sense relative to the optical axis within a plane perpendicular to the axis. The exciting coils of the (4n+3)th poles and the exciting coils of the (4n+4)th poles are alternately connected in series to produce magnetic fields which are identical in absolute value but mutually opposite in sense relative to the optical axis within the plane perpendicular to the axis.03-25-2010
20110101236Compact Isocentric Gantry - A gantry for administering proton beam therapy with improvements which reduce the size, weight, costs and radiation beam loss associated with proton beam therapy systems currently commercially available. The gantry utilizes achromatic superconducting multi-function electromagnet systems wherein the magnets can include dipoles and quadrupoles. The achromatic properties of the rampable magnet systems allow for ease of transmission of the beam whose energy is rapidly changed through a large range of different energies without changing of the strength of the magnetic fields or dipole settings. The magnets may be made with either low or high temperature superconductors. The gantry design further integrates beam scanning but keeps the gantry isocentric. A much greater fraction of the beam can be transmitted through the gantry than with current art, thereby reducing radiation shielding requirements and the demand put on the accelerator to produce large quantities of proton beam.05-05-2011
20110101235PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM THERAPY SYSTEM - The objective of the present invention is to eliminate noise caused by driving a ridge filter and to achieve a uniform dose distribution without making a patient sense discomfort or anxiety. There are provided a ridge filter having a thickness distribution in which the energy that a charged particle beam loses differs depending on the position thereon through which the charged particle beam passes, a deflector that deflects the charged particle beam, and a controller that controls the deflector in such a way that the charged particle beam passes through the thickness distribution of the ridge filter.05-05-2011
20120119107Method for Axial Alignment of Charged Particle Beam and Charged Particle Beam System - A method for axial alignment of a charged particle beam relative to at least three stages of multipole elements and a charged particle beam system capable of making the axial alignment. Some parts of the orbit of the beam or the distributions of three astigmatic fields, or both, are simultaneously translated in a direction perpendicular to the optical axis such that astigmatisms of the same order and same type due to axial deviations between successive ones of the astigmatic fields cancel.05-17-2012
20120119106CHARGED PARTICLE BEAM IRRADIATION APPARATUS, CHARGED PARTICLE BEAM IRRADIATING METHOD, AND METHOD OF ATTACHING AND DETACHING TRANSPORT LINE - A charged particle beam irradiation apparatus includes an accelerator that accelerates the charged particle beam; a first transport line that transports the charged particle beam which is delivered from the accelerator; a plurality of second transport lines that may be provided for each of plurality of irradiation chambers and further transports the charged particle beam to be transported by the first transport line to the respective irradiation chambers; and a line switching unit that may be provided between the first transport line and the second transport lines, wherein the plurality of irradiation chambers may be radially disposed around the line switching unit, the line switching unit has an electromagnet that induces the charged particle beam, and a rotating mechanism that rotates the electromagnet, and the second transport lines of the induction place may be switched by rotating the electromagnet.05-17-2012
20120119105BOLUS, BOLUS MANUFACTURING METHOD, PARTICLE BEAM THERAPY SYSTEM, AND TREATMENT PLANNING APPARATUS - The objective is to obtain a bolus, with which there can be formed an irradiation field that is accurately suited to the depth-direction shape of an irradiation subject, and a particle beam therapy system. An irradiation orbit of a particle beam is defined by a first slant with respect to a first axis that starts from a first reference point, that is perpendicular to a beam axis, and that includes the first reference point and by a second slant with respect to a second axis that is perpendicular to the beam axis and the first axis; the shape of a bolus is set in such a way that the path length, of a particle beam, within the bolus in each of the irradiation orbits defined for combinations within a predetermined range among combinations of the first slant and the second slant, compensates the path length from a body surface to a to-be-irradiated portion.05-17-2012
20110163243PARTICLE BEAM IRRADIATION APPARATUS - There is obtained a particle beam irradiation apparatus which does not use any IF sentence (conditional expression for case classification) and can calculate a control command and enhance irradiation position precision. The particle beam irradiation apparatus is provided with inverse mapping means having an inverse mapping mathematical expression model for generating an command value for the scanning electromagnet from a desired irradiation position coordinate of the charged particle beam in an irradiation subject so that irradiation to the irradiation subject is implemented on the basis of the command value concerned, and the scanning electromagnet is controlled on the basis of the command value generated from the desired irradiation position coordinate of the charged particle beam in the irradiation subject by using the inverse mapping mathematical expression model, thereby irradiating the irradiation subject with the charged particle beam while scanning the charged particle beam.07-07-2011
20100282978ISOTOPE PRODUCTION SYSTEM AND CYCLOTRON - A cyclotron that includes a magnet yoke having a yoke body that surrounds an acceleration chamber. The cyclotron also includes a magnet assembly to produce magnetic fields to direct charged particles along a desired path. The magnet assembly is located in the acceleration chamber. The magnetic fields propagate through the acceleration chamber and within the magnet yoke, wherein a portion of the magnetic fields escapes outside of the magnet yoke as stray fields. The cyclotron also includes a vacuum pump that is coupled to the yoke body. The vacuum pump is configured to introduce a vacuum into the acceleration chamber. The magnet yoke is dimensioned such that the vacuum pump does not experience magnetic fields in excess of 75 Gauss.11-11-2010
20110174984CHARGED PARTICLE BEAM EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a radio-frequency (RF) cavity system to induce betatron oscillation of a charged particle stream. Sufficient amplitude modulation of the charged particle stream causes the charged particle stream to hit a material, such as a foil. The foil decreases the energy of the charged particle stream, which decreases a radius of curvature of the charged particle stream in the synchrotron sufficiently to allow a physical separation of the reduced energy charged particle stream from the original charged particle stream. The physically separated charged particle stream is then removed from the system by use of an applied field and deflector.07-21-2011
20110186743Systems And Methods For Scanning A Beam Of Charged Particles - Systems and methods of an ion implant apparatus include an ion source for producing an ion beam along an incident beam axis. The ion implant apparatus includes a beam deflecting assembly coupled to a rotation mechanism that rotates the beam deflecting assembly about the incident beam axis and deflects the ion beam. At least one wafer holder holds target wafers and the rotation mechanism operates to direct the ion beam at one of the at least one wafer holders which also rotates to maintain a constant implant angle.08-04-2011
20110147604PARTICLE BEAM IRRADIATION SYSTEM AND PARTICLE BEAM THERAPY SYSTEM - The objective is to eliminate the effect of the hysteresis of a scanning electromagnet so that there is obtained a particle beam irradiation system that realizes high-accuracy beam irradiation. There are provided a magnetic-field sensor that measures the magnetic field of a scanning electromagnet and an irradiation control apparatus that controls the scanning electromagnet based on a measurement magnetic field measured by the magnetic-field sensor and target irradiation position coordinates of a charged particle beam. The irradiation control apparatus is provided with an inverse map means that calculates a target magnetic field, based on the target irradiation position coordinates of the charged particle beam; and a compensator that outputs a control input, to the scanning electromagnet, for controlling the magnetic-field error between the target magnetic field and the measurement magnetic field to be the same as or smaller than a predetermined threshold value.06-23-2011
20120037813MULTI-AXIS LENS, BEAM SYSTEM MAKING USE OF THE COMPOUND LENS, AND METHOD OF MANUFACTURING THE COMPOUND LENS - A lens system for a plurality of charged particle beams comprises a lens body with a first pole piece, a second pole piece and a plurality of lens openings for the respective charged particle beams; a common excitation coil arranged around the plurality of lens openings for providing a respective first magnetic flux to the lens openings; and a compensation coil arranged between the lens openings for providing a respective second magnetic flux to at least some of the lens openings so as to compensate for an asymmetry of the first magnetic flux.02-16-2012
20100282979ISOTOPE PRODUCTION SYSTEM AND CYCLOTRON HAVING A MAGNET YOKE WITH A PUMP ACCEPTANCE CAVITY - A cyclotron that includes a magnet assembly to produce a magnetic field to direct charged particles along a desired path. The cyclotron also includes a magnet yoke that has a yoke body that surrounds an acceleration chamber. The magnet assembly is located in the yoke body. The yoke body forms a pump acceptance (PA) cavity that is fluidicly coupled to the acceleration chamber. The cyclotron also includes a vacuum pump that is configured to introduce a vacuum into the acceleration chamber. The vacuum pump is positioned in the PA cavity.11-11-2010
20120037814ELECTRIC FIELD-GUIDED PARTICLE ACCELERATOR, METHOD, AND APPLICATIONS - A charged particle accelerator having a curvilinear beam trajectory maintained solely by a laterally directed, constant electric field; requiring no magnetic field. A method for controlling the trajectory of a charged particle in an accelerator by applying only a constant electric field for beam trajectory control. Curvilinear steering electrodes held at a constant potential create the beam path. A method for making a chip-scale charged particle accelerator involves integrated circuit-based processes and materials. A particle accelerator that can generate 110 KeV may a footprint less than about 1 cm02-16-2012
20120043472CHARGED PARTICLE BEAM ACCELERATION AND EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam acceleration and/or extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Novel design features of a synchrotron are described. Particularly, turning magnets, edge focusing magnets, and extraction elements are described that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allow continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.02-23-2012
20120001085TREATMENT PLANNING SYSTEM, DEVICE FOR CALCULATING A SCANNING PATH AND PARTICLE THERAPY SYSTEM - In a particle therapy treatment planning system for creating treatment plan data, the movement of a target (patient's affected area) is extracted from plural tomography images of the target, and the direction of scanning is determined by projecting the extracted movement on a scanning plane scanned by scanning magnets. Irradiation positions are arranged on straight lines parallel with the scanning direction making it possible to calculate a scanning path for causing scanning to be made mainly along the direction of movement of the target. The treatment planning system can thereby realize dose distribution with improved uniformity.01-05-2012
20120006997ELECTRON BEAM DEVICE WITH TILTING AND DISPERSION COMPENSATION, AND METHOD OF OPERATING SAME - An electron beam device 01-12-2012
20120205550OBJECTIVE LENS - An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter D08-16-2012
20110180720CHARGED PARTICLE BEAM ACCELERATION METHOD AND APPARATUS AS PART OF A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam acceleration method and apparatus used as part of multi-axis charged particle radiation therapy of cancerous tumors. The accelerator includes a synchrotron having advances in turning magnets, edge focusing magnets, magnetic field concentration magnets, and extraction and intensity control elements that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allows independent energy and intensity control of extracted charged particles from the synchrotron.07-28-2011
20120132826PARTICLE BEAM IRRADIATION APPARATUS AND PARTICLE BEAM THERAPY SYSTEM - There is provided a particle beam irradiation apparatus in which two or more pairs of scanning electromagnets are utilized so that scanning of a charged particle beam can be performed with a high accuracy and with a high flexibility in the speed, from a low speed to a high speed. In a particle beam irradiation apparatus that scans an incident charged particle beam on X-direction and Y-direction (two-direction) desired orbits perpendicular to the travelling direction of the charged particle beam and irradiates the charged particle beam onto an irradiation subject, there are provided two or more pairs of scanning electromagnets that scan a charged particle beam in the two directions; the desired orbit is given by time-series desired orbit data in which desired irradiation positions corresponding to time are determined; and command values for respective scanning electromagnets in the two or more pairs of scanning electromagnets are generated based on plural pieces of data obtained by frequency-separating the time-series desired orbit data.05-31-2012
20120313003Gantry for Medical Particle Therapy Facility - A particle therapy gantry for delivering a particle beam to a patient includes a beam tube having a curvature defining a particle beam path and a plurality of superconducting, variable field magnets sequentially arranged along the beam tube for guiding the particle beam along the particle path. In a method for delivering a particle beam to a patient through a gantry, a particle beam is guided by a plurality of variable field magnets sequentially arranged along a beam tube of the gantry and the beam is alternately focused and defocused with alternately arranged focusing and defocusing variable field magnets.12-13-2012
20120248324Method and Apparatus for Improved Uniformity Control with Dynamic Beam Shaping - The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.10-04-2012
20120211667PARTICLE BEAM THERAPY SYSTEM - The objective is to eliminate the effect of the hysteresis of a scanning electromagnet and resume high-accuracy beam irradiation from an irradiation position where it has been interrupted, even in the case where emergency-stop processing is performed during therapy. There are provided an irradiation management apparatus that controls a scanning electromagnet; and an interlock information inputting device that generates an interlock signal for stopping irradiation of the charged particle beam, when a contingency occurs. When irradiation of the charged particle beam is resumed, the irradiation management apparatus performs idle operation in which the scanning electromagnet is controlled, with the charged particle beam unirradiated, from a start step, which is situated prior to a stop step and is different from the initial step in actual irradiation, to the stop step, and then irradiates the charged particle beam from the desired irradiation position coordinates corresponding to the stop step.08-23-2012
20120223244ELECTROSTATIC LENSES AND SYSTEMS INCLUDING THE SAME - A system includes an electrostatic lens in a path between a charged particle source and a detector. The electrostatic lens includes: a first electrode having a first aperture in the path aligned with a first axis; a second electrode in the path between the first electrode and the detector, having a second aperture in the path and aligned with a second axis that is parallel to the first axis and displaced from the first axis along a first direction; a third electrode in the path between the first electrode and the second electrode; and a potential generator coupled to the electrodes. During operation, the potential generator applies potentials to the first, second and third electrodes so that the electrostatic lens directs a beam of charged particles from the source propagating along the first axis to propagate along the second axis.09-06-2012
20120187306Systems and Methods for Control of Multiple Charged Particle Beams - The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.07-26-2012
20120256097INDIRECTLY HEATED CATHODE CARTRIDGE DESIGN - An apparatus and method for producing electrons in a plasma flood gun is disclosed. The apparatus includes an indirectly heated cathode (IHC) which is contained within a pre-fabricated cartridge. This cartridge can be readily replaced in a plasma flood gun. In addition, the use of an IHC reduces the amount of contaminants that are injected into the workpiece or wafer.10-11-2012
20090020707Particle beam application apparatus, radiation device and method for guiding a particle beam - The present embodiments relate to a particle beam application apparatus for shaping and guiding a particle beam. The particle beam application apparatus comprises a first collimator for shaping a cross-sectional profile of a particle beam entering the collimator, whereby the first collimator has an aperture which is customized to a target volume to be irradiated, and a magnet system for deflecting the particle beam which is arranged in the beam path of the particle beam downstream of the first collimator, whereby the magnet system can be used to generate a magnetic field with which the particle beam can be fanned out spectrally. The invention also relates to a radiation device having such a particle beam application apparatus, and a method for guiding a particle beam in which a particle beam is customized to a target volume by means of a collimator and is then directed by means of a magnet system, as a result of which the particle beam is cleansed of scattered radiation.01-22-2009
20110121195PARTICLE BEAM THERAPY SYSTEM AND ADJUSTMENT METHOD FOR PARTICLE BEAM THERAPY SYSTEM - The objective is to obtain a particle beam therapy system, the irradiation flexibility of which is high and that can reduce the amount of irradiation onto a normal tissue. There are provided a scanning electromagnet that performs scanning and outputting in such a way that a supplied charged particle beam is formed in a three-dimensional irradiation shape based on a treatment plan; and deflection electromagnets that switch the orbits for the charged particle beam in such a way that the charged particle beam with which scanning and outputting are performed by the scanning electromagnet reaches an isocenter through a single beam orbit selected from a plurality of beam orbits established between the isocenter and the scanning electromagnet. The distance between the scanning electromagnet and the isocenter is made long.05-26-2011
20110248179ION SOURCE - An ion source is disclosed which utilizes independently powered electrodes that are isolated with a series of insulators. The ion source comprises an anode electrode with a hollow interior, where the anode is disposed between a cathode and an anti-cathode. A magnet or electro-magnet imposes a magnetic field in an axial direction through the bore of the anode. Gas is introduced into the anode area at a controllable pressure. The ion source includes a first voltage differential between the anode and cathode for the production of plasma and a second voltage differential between the anode and the anti-cathode for extraction of ions from the plasma, forming an ion beam, which is preferably of a narrow diameter at low beam energy. In particular, the voltage differential between the anti-cathode and anode is adjusted to control the initial beam divergence of extracted ions. An optional focus electrode with an independent power supply further focuses the ion beam. A final electrode defines the output boundary of the ion source to provide un-perturbed drift of the ions into the vacuum chamber.10-13-2011
20120326051EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus which forms a pattern on a substrate, the apparatus including an electron optical system configured to guide a charged particle beam onto the substrate, a stage configured to hold the substrate, an electromagnetic actuator configured to drive the stage, a magnetic shield which is placed in the stage so as to surround the electromagnetic actuator, a measurement member configured to measure a position of the stage, a coil member configured to generate a magnetic field on a path of the charged particle beam between the electron optical system and the substrate, and a control member configured to control the coil member so as to reduce a fluctuation of the magnetic field on the path, the magnetic field on the path fluctuating while the stage being driven by the electromagnetic actuator, based on the position of the stage measured by the measurement member.12-27-2012
20090173887CHARGED PARTICLE BEAM TRAJECTORY CORRECTOR AND CHARGED PARTICLE BEAM APPARATUS - The invention relates to a trajectory correction method for a charged particle beam, and provides a low-cost, high accuracy and high-resolution converging optical system for use with a charged particle beam to solve problems with conventional aberration correction systems. To this end, the present invention uses a configuration which forms electromagnetic field which is concentrated towards a center of a beam trajectory axis, causes oblique of the beam to make use of lens effects and bend the trajectory, and consequently, cancels out large external side non-linear effects such a spherical aberration of the electron lens. Specifically, the configuration generates an electric field concentration in a simple manner by providing electrodes above the axis and applying voltages to the electrodes. Further, the above configuration can be realized trough operations using lenses and deflectors with incident axes and image formation positions that are normal.07-09-2009
20130015364SYSTEMS AND METHODS FOR ACHROMATICALLY BENDING A BEAM OF CHARGED PARTICLES BY ABOUT NINETY DEGREE DURING RADIATION TREATMENTAANM MacKinnon; Barry A.AACI SunnyvaleAAST CAAACO USAAGP MacKinnon; Barry A. Sunnyvale CA USAANM Miller; Roger H.AACI Mountain ViewAAST CAAACO USAAGP Miller; Roger H. Mountain View CA US - Embodiments of the invention provide systems and methods for achromatically bending beam of charged particles by about 90° during radiation treatment. A system may include first, second, third, and fourth bending magnets serially arranged along the particle beam path. The first and fourth bending magnets are configured to generate a positive field gradient that defocuses the particle beam in the bend plane. The second and third bending magnets are configured to generate a negative field gradient that focuses the particle beam in the bend plane. The first, second, third, and fourth bending magnets collectively bend the particle beam by about 90°, e.g., by about 22.5° each.01-17-2013
20080251734Ion Implantation Apparatus and Method of Converging/Shaping Ion Beam Used Therefor - An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.10-16-2008
20080224062LENS COIL COOLING OF A MAGNETIC LENS - A magnetic lens for a charged particle beam device and a charged particle beam device are provided. The magnetic lens includes a coil with coil windings to be excited for generation of a magnetic field, a pole piece to guide the magnetic field, a heat shield, which is connected to a cooling system, and a thermal insulation layer provided between the heat shield and the coil.09-18-2008
20120248325CHARGED PARTICLE CANCER THERAPY PATIENT POSITIONING METHOD AND APPARATUS - The invention comprises a patient positioning method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The patient positioning system is used to translate the patient and/or rotate the patient into a zone where the proton beam can scan the tumor using a targeting system. The patient positioning system is optionally used in conjunction with systems used to constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems.10-04-2012
20130112889WIEN FILTER - This invention provides a multi-pole type Wien filter, which acts more purely approaching its fundamentally expected performance. A 12-electrode electric device acts as an electric deflector,or acts as an electric deflector and an electric stigmator together. A cylindrical 4-coil magnetic device with a magnetic core acts as a magnetic deflector. Both can produce a dipole field while only incurring a negligibly-small 3rd order field harmonic. The magnetic core enhances the strength and more preciously regulates the distribution of the magnetic field originally generated by the coils. Then two ways to construct a Wien filter are proposed. One way is based on both of the foregoing electric and magnetic devices, and the other way is based on the foregoing electric device and a conventional magnetic deflector. The astigmatism in each of such Wien filters can be compensated by the electric stigmator of the electric device.05-09-2013
20130119263Ion Implant Apparatus and a Method of Implanting Ions - Ion implant apparatus using a drum-type scan wheel holds wafers with a total cone angle less than 60°. A collimated scanned beam of ions, for example H05-16-2013
20110266455CHARGED PARTICLE BEAM EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM - The invention comprises a charged particle beam extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a radio-frequency cavity system to induce betatron oscillation of a charged particle stream. Sufficient amplitude modulation of the charged particle stream causes the charged particle stream to hit a material, such as a foil. The foil decreases the energy of the charged particle stream, which decreases a radius of curvature of the charged particle stream in the synchrotron sufficiently to allow a physical separation of the reduced energy charged particle stream from the original charged particle stream. The physically separated charged particle stream is then removed from the system by use of an applied field and deflector.11-03-2011
20130134322ELECTRON LENS AND THE ELECTRON BEAM DEVICE - There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 05-30-2013
20080265172Electron-Optical Corrector for an Aplanatic Imaging System - An electron-optical corrector for rendering superfluous both the third-order opening error and the anisotropic part of the extra-axial third-order coma, using round lenses and hexapole fields, the corrector includes at least three coaxially arranged hexapole fields with at least one round lens field is arranged between adjacent hexapole fields, so that the hexapole fields are imaged onto each other in pairs. The intensities of the hexapole fields are selected so that the image error coefficient of the three-fold astigmatism is equal to 0, and at least three hexapole fields in the Larmor reference system are rotated in relation to each other at an angle about the optical axis.10-30-2008
20130181138Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams - A cellular-type PD unit is proposed and a plurality of the cellular-type PD units is used in pairs in a multi-axis magnetic lens for focusing a plurality of charged beams. First type PD units or second type PD units (called as hybrid PD unit as well) can be applied to cellular-type PD units to flexibly construct sub-lenses. Furthermore, magnetic shielding plates with a plurality of through openings can be placed above and/or below the multi-axis magnetic lens to make magnetic flux leaking out of the multi-axis magnetic lens vanish away rapidly outside the magnetic shielding plates.07-18-2013
20110297842ION BEAM IRRADIATION SYSTEM AND ION BEAM IRRADIATION METHOD - An ion beam irradiation method comprises calculating a scan voltage correction function with the maximum beam scan width depending on the measurement result of a beam current measurement device, calculating each of more than one scan voltage correction functions corresponding to each of scheduled beam scan widths depending on the calculated scan voltage correction functions while satisfying dose uniformity in the horizontal direction, measuring a mechanical Y-scan position during the ion implantation, changing the scan voltage correction function as a function of the measured mechanical Y-scan position so that the beam scan area becomes a D-shaped multistage beam scan area corresponding to an outer periphery of a half of the wafer to thereby reduce the beam scan width, and changing a mechanical Y-scan speed depending on the change of the measurement result of a side cup current measurement device to thereby keep the dose uniformity in the vertical direction.12-08-2011
20110297841Generalized Focusing And Deflection Utilizing Deformed Conducting Electrodes - A charged particle focusing and deflection apparatus and system utilizing one or more (i.e. stacked) ring-shaped electrodes which are contorted or deformed to shape a multipole electric field and thereby effect multipole electric focusing and deflection. In particular the ring-shaped electrodes may be used in a high gradient insulator of a particle accelerator, such as a dielectric wall accelerator (DWA).12-08-2011
20110309263Dual Beam System - A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed.12-22-2011
20120085918ION BEAM IRRADIATION DEVICE AND METHOD FOR SUPPRESSING ION BEAM DIVERGENCE - To improve an efficiency of utilizing electrons and efficiently suppress an ion beam spread by a space charge effect while eliminating a need for a special magnetic pole structure by effectively using a space in the vicinity of a magnet, there are provided an ion source, a collimating magnet and a plurality of electron sources, wherein the electron sources are arranged in a magnetic field gradient region formed on an ion beam upstream side or ion beam downstream side of the collimating magnet and arranged outside a region passed by the ion beam, and an irradiation direction of the electrons is directed to supply the electrons to the magnetic field gradient region.04-12-2012
20120085917INDUCTIVELY COUPLED PLASMA FLOOD GUN USING AN IMMERSED LOW INDUCTANCE FR COIL AND MULTICUSP MAGNETIC ARRANGEMENT - A device is disclosed for providing an inductively coupled radio frequency plasma flood gun. In one particular exemplary embodiment, the device is a plasma flood gun in an ion implantation system. The plasma flood gun may comprise a plasma chamber having one or more apertures; a gas source capable of supplying at least one gaseous substance to the plasma chamber; a single-turn coil disposed within the plasma chamber, and a power source coupled to the coil for inductively coupling radio frequency electrical power to excite the at least one gaseous substance in the plasma chamber to generate a plasma. The inner surface of the plasma chamber may be free of metal-containing material and the plasma may not be exposed to any metal-containing component within the plasma chamber. The plasma chamber may include a plurality of magnets for controlling the plasma. An exit aperture may be provided in the plasma chamber to enable negatively charged particles of the resulting plasma to engage an ion beam that is part of the associated ion implantation system. In one embodiment, magnets are disposed on opposite sides of the aperture and are used to manipulate the electrons of the plasma.04-12-2012

Patent applications in class WITH CHARGED PARTICLE BEAM DEFLECTION OR FOCUSSING

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