Entries |
Document | Title | Date |
20080197291 | OPTICAL RADIATION SENSOR SYSTEM - There is disclosed an optical radiation sensor system for detecting radiation from a radiation source. The system comprises: a housing having a distal portion for receiving radiation from the radiation source and a proximal portion; a sensor element in communication with the proximal portion, the sensor element configured to detect and respond to incident radiation received from the radiation source; and motive means configured to move the housing with respect to the sensor element between at least a first position and a second position. A radiation pathway is defined between the radiation source and the sensor element when the housing is in at least one of the first position and the second position. Movement of the housing with respect to the sensor element causes a modification of intensity of radiation impinging on the sensor element. In its highly preferred embodiment, the radiation sensor system is of a modular design rendering the sensor system appropriate for use with one or more of various radiation sources, fluid thickness layers and/or in UVT conditions. In this highly preferred form, the sensor system may have built-in diagnostics for parameters such as sensor operation, radiation source output, fluid (e.g., water) UVT, radiation source fouling (e.g., fouling of the protective sleeves surrounding the radiation source) and the like. Other advantages of the present radiation sensor system include: incorporation of an integrated reference sensor, safe and ready reference sensor testing, UVT measurement capability and/or relatively low cost and ease of manufacture. | 08-21-2008 |
20080203314 | Prism spectrometer - An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer. | 08-28-2008 |
20080203315 | Apparatus having an input device and a display, method of controlling apparatus and computer-readable recording medium - According to an aspect of an embodiment, an apparatus having an input device for inputting information and a display for displaying information comprises, a storage for storing information corresponding to an ultra violet ray intensity in association with location information and time information and a processor for obtaining information of an ultra violet ray intensity on the basis of location information and time information inputted by the input device in reference to the information stored in the storage, and for displaying the obtained information of the ultra violet ray intensity on the display. | 08-28-2008 |
20080224059 | Method for Determining an Integral Sun Protection Factor Encompassing Uva and Uvb Radiation - The invention relates to a method for determining an integral sun protection factor (∫SPF or iSPF) which encompasses both UVA and UVB radiation and can be used for classifying cosmetic and dermatological sunscreens. The method comprises the steps of applying a defined amount of the sunscreen onto a defined area of a skin substrate impregnated with a spin trap, exposing the skin substrate to a defined amount of UVA- and UVB rays by a sun simulator, subjecting the skin substrate exposed to radiation to an electron spin resonance (ESR) measurement, recording the number of free radicals trapped as a real number×10 | 09-18-2008 |
20080251731 | METHOD AND APPARATUS FOR PULSED UV MEASUREMENT - A detector receives energy pulses and a lossy integration circuit generates a lossy integration that, for each pulse, increases over the pulse duration to a maximum value and then decays. The lossy integration is sampled, with a sampling rate and decay rate such that the sample is within a given acceptable error of the maximum value. The sample represents the pulse total energy, within the given acceptable error. An optional circuit and processing function calculates a total accumulated energy over a plurality of pulses. | 10-16-2008 |
20080258069 | Exposure device - The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements. | 10-23-2008 |
20080258070 | EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE - The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor. | 10-23-2008 |
20080265170 | UV detection devices and methods - A portable UV detection apparatus is disclosed. In one embodiment, the UV detection apparatus includes a UV detection device integrated with a skin type measuring device. A controller can be included in the apparatus that is in communication with the skin type measuring device and the UV detection device. The controller can provide information to the user regarding the amount of ultraviolet radiation present in the environment. In an alternative embodiment, the UV detection apparatus includes a UV detection device in conjunction with a light sensor. The light sensor can be configured to activate the UV detection device should light at a particular intensity be present in the environment. The UV detection device as described above can be configured to measure UVA radiation, UVB radiation, and/or UVC radiation. | 10-30-2008 |
20080308740 | Method of Measuring The Colour of Printed Samples Containing Brighteners - To measure the colour of samples printed on a substrate containing brightener, a first spectral proportion of the total spectral reflection factor of the sample is measured by illuminating the sample with light having no UV element. From this first spectral proportion, a spectral correction factor is calculated making allowance for the characterisation data of the brightened substrate and the spectral properties of a selected type of illuminating light. The spectral correction factor is added to the first spectral proportion in order to obtain the total spectral reflection factor of the measured sample. The total spectral reflection factor is then evaluated for measuring and control purposes, in particular for calculating colour values of the sample. The characterising data of the substrate is determined on the basis of measurements taken with illuminating light with no UV element and with UV light only on a limited set of measurement samples, especially on the non-printed substrate only (paper whiteness). The measuring method has the advantages of a double measurement, which it requires physically but on a significantly reduced sample set only, which speeds up the measuring procedure considerably. The measurements needed for characterising the substrate may also be run with a separate measuring device, so that the measuring method can easily be implemented in existing colour measuring devices with interchangeable measuring filters or different light sources. | 12-18-2008 |
20090078880 | Ultraviolet sensor - An ultraviolet sensor has an ultraviolet detection diode having a depletion region | 03-26-2009 |
20090101829 | SENSOR, SYSTEM, AND METHOD FOR AN ULTRAVIOLET LAMP SYSTEM - A light sensor for an ultraviolet lamp system of the type having an electrodeless lamp excited by microwave energy includes a detector configured to detect light generated by the electrodeless lamp. An elongated channel is configured to be interposed between the detector and the electrodeless lamp. The elongated channel has a first aperture and a second aperture defined at opposing ends thereof. The first aperture is configured to receive light generated by the electrodeless lamp. The second aperture is positioned proximate the detector to transmit at least a portion of light received in the first aperture to the detector. | 04-23-2009 |
20090159808 | EUV light source components and methods for producing, using and refurbishing same - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material. | 06-25-2009 |
20090184254 | ULTRAVIOLET SENSOR AND METHOD OF MANUFACTURING ULTRAVIOLET SENSOR - An ultraviolet sensor capable of separately detecting amount of ultraviolet irradiation of two wavelength range of a UV-A wave and a UV-B wave is provided. The ultraviolet sensor includes: a pair of photodiodes in which a high concentration P-type diffusion layer formed by diffusing a P-type impurity with a high concentration and a high concentration N-type diffusion layer formed by diffusing an N-type impurity with a high concentration, which are formed in a first silicon semiconductor layer on an insulation layer, are opposed to each other with a low concentration diffusion layer, which is formed in a second silicon semiconductor layer thinner than the first silicon semiconductor layer by diffusing one of the P-type impurity or the N-type impurity with a low concentration, interposed therebetween; an interlayer insulation film which is formed on the first and second silicon semiconductor layers; a filter film which is formed on the interlayer insulation layer of one of the photodiodes and formed of a silicon nitride film transmitting rays of a wavelength range of the UV-A wave or a longer wave; and a sealing layer which covers the interlayer insulation film of the other of the photodiodes and the filter film and transmits rays of the wavelength range of the UV-B wave or a longer wave. | 07-23-2009 |
20090212227 | Activation Device for Activatable Indicators Used in Product Labelling - The invention relates to an activation device for temperature-sensitive and/or time-sensitive indicators for product labelling, said indicators being activated by UV light and said device comprising a UV light source. The device is equipped with a controller/regulator, which can be used to control and/or regulate the irradiation period and/or the irradiation intensity of the UV light source. | 08-27-2009 |
20090218504 | RADIOMETER WITH SPECTRAL RESPONSE EQUIVALENT TO THE ERYTHEMA ACTION CURVE CIE, FOR MEASURING THE TOTAL EFFECTIVE IRRADIANCE - A radiometer for measuring the total effective UV radiance of the type comprising, in an optical pathway sequence, a diffuser, an interference filter and a detector. Said interference filter comprises a plurality of alternating layers of magnesium fluoride and zirconium oxide, where the diffuser/interference filter/detector system has a spectral response equivalent to the erythema action curve CIE. | 09-03-2009 |
20090218505 | EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING MULTILAYER FILM, EXPOSURE APPARATUS HAVING THE MULTILAYER FILM, AND DEVICE FABRICATION METHOD - A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference. | 09-03-2009 |
20090230313 | LIGHT QUANTITY MEASURING DEVICE AND METHOD FOR MEASURING LIGHT QUANTITY - A light quantity measuring device includes a first light reception element, a second light, reception element, an identification circuit, and a selection circuit. The first light reception element receives a predetermined incident light at a first light reception surface. The second light reception element receives the incident light at a second light reception surface, which is oriented in the same direction as the first light reception surface. The identification circuit identifies an incident angle of the incident light with respect to the first light reception surface. The selection circuit, when the incident angle differs from a desired incident angle, selectively electrically connects an output portion of the second light reception element to an output portion of the first light reception element. | 09-17-2009 |
20090294684 | ULTRAVIOLET INTENSITY DETECTING METHOD, FABRICATING DISPLAY APPARATUS METHOD AND DISPLAY APPARATUS USING THE SAME - A display apparatus is provided. The display apparatus is used for detecting an ultraviolet (UV) intensity. The display apparatus includes a lower-substrate, an upper-substrate and a processing unit. The lower-substrate includes a first, a second and a third photo sensors for detecting an intensity of the light in a first, a second and a third bands and converting the intensity of the light in the first, the second and the third bands into a first, a second and a third currents respectively, wherein the ranges of the second and the third bands are comprised within the range of the first band. The upper-substrate is disposed opposite to the lower-substrate. The processing unit is coupled to the first, the second and the third photo sensors, for receiving and processing the first, the second and the third currents so as to obtain the UV intensity. | 12-03-2009 |
20090294685 | SYSTEM FOR OVERLAY MEASUREMENT IN SEMICONDUCTOR MANUFACTURING - Provided is a system for overlay measurement in semiconductor manufacturing that includes a generator for exposing an overlay target to radiation and a detector for detecting reflected beams of the overlay target. The reflected beams are for overlay measurement and include at least two different beams. | 12-03-2009 |
20090309037 | Systems and Methods for Simulating a Vehicle Exhaust Plume - A light emission system that comprises a light source that comprises at least one light emitting diode (LED) that provides ultraviolet light. The system also comprises a controller that controls the intensity of the ultraviolet light provided by the light source such that the ultraviolet light provided by the light source simulates a vehicle exhaust plume. | 12-17-2009 |
20100001199 | METHOD OF MEASURING PHASE OF PHASE SHIFT MASK - In a method of measuring a phase of a phase shift mask, initial extreme ultraviolet (EUV) light is divided into secondary EUV light portions. The secondary EUV light portions are irradiated onto the phase shift mask as incident EUV light portions, and the phase of the phase shift mask is measured from reflected incident EUV light portions. | 01-07-2010 |
20100012849 | DETECTOR FOR DUAL BAND ULTRAVIOLET DETECTION - The invention concerns a single detector with two designable wavelengths and bandwidths for ultraviolet detection based on n | 01-21-2010 |
20100012850 | ULTRAVIOLET RADIATION DETECTOR AND APPARATUS FOR EVALUATING ULTRAVIOLET RADIATION PROTECTION EFFECT - An ultraviolet radiation detector | 01-21-2010 |
20100051822 | Broad band referencing reflectometer - A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions. | 03-04-2010 |
20100096559 | ULTRAVIOLET DETECTOR AND DOSIMETER - A UV light detector is disclosed that has a UV sensing element comprising a substrate and a thin film layer formed on the substrate. The thin film layer is for receiving and converting UV light into electricity for a photovoltaic output. First and second electrodes are formed on one surface of the thin film layer and are configured to form an electric polarization in the thin film layer between the first and second electrodes and to collect the photovoltaic output. There is also an amplifier and an output display. The UV sensing element is configured to collect the photovoltaic output, the amplifier being configured to receive the photovoltaic output from the UV sensing element, the output display being configured to provide a display when UV light is received at the one surface, the display being derived from the photovoltaic output. A UV dosimeter is also disclosed. | 04-22-2010 |
20100148083 | SPECTROPHOTOMETER AND METHOD - A spectrophotometer includes a plurality of LEDs arranged in a circular array, each having a calibrated power input determined by the use of pulse width modulation and each having a unique wavelength band determined by the utilization of a unique fluorescent phosphor coating or lens. At least one of the LEDs comprising a phosphor-free high energy UV LED. Light reflected to the spectrophotometer is divided into predetermined wavelength ranges through the utilization of a linear variable filter and photo detectors wherein the analog signal from a photo detector is converted to a digital value through the use of auto-ranging gain technique. | 06-17-2010 |
20100163743 | PARTIAL DISCHARGE MEASURING APPARATUS USING UV SENSOR ARRAY AND METHOD THEREOF - Disclosed herein is a method and apparatus for measuring partial discharge using a UV sensor array. The apparatus includes a UV sensor array including plural sensors detecting UV rays from an analyzing target of a power facility at a location separated a predetermined distance from the target and converting the UV rays into discharge current, an image measurement unit measuring the distance between the sensor array and the target and supplying an actual image of the target, a UV intensity detection unit measuring intensity of the discharge current converted from the UV rays detected by the sensor array, and a UV location detection unit analyzing and outputting a UV emitting location obtained by matching the discharge current intensity measured by the UV intensity detection unit to combined data of the actual image of the target supplied from the image measurement unit and sensor locations of the sensor array. | 07-01-2010 |
20100171040 | OPTICAL RADIATION SENSOR SYSTEM - An optical radiation sensor system having: a housing having a distal portion for receiving radiation from the radiation source and a proximal portion; a sensor element in communication with the proximal portion, the sensor element configured to detect and respond to incident radiation received from the radiation source; and motive structure configured to move the housing with respect to the sensor element between at least a first position and a second position. A radiation pathway is defined between the radiation source and the sensor element when the housing is in at least one of the first position and the second position. Movement of the housing with respect to the sensor element causes a modification of intensity of radiation impinging on the sensor element. | 07-08-2010 |
20100176304 | INCIDENCE SURFACES AND OPTICAL WINDOWS THAT ARE SOLVOPHOBIC TO IMMERSION LIQUIDS - Optical windows are provided that transmit light such as deep-UV (DUV) light. An exemplary window includes a window substrate that is transmissive to at least one wavelength of the light. The window substrate has an incidence surface decorated with sub-wavelength asperities arranged so as to render the incidence surface solvophobic to the light-transmissive liquid. The arrangement of sub-wavelength asperities can be configured to render the incidence surface super-solvophobic to the liquid. The sub-wavelength asperities can have any of various shapes and combinations thereof, and can be regularly or irregularly arranged. | 07-15-2010 |
20100181490 | OPTICAL METHOD AND SYSTEM UTILIZING OPERATING WITH DEEP OR VACUUM UV SPECTRA - An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment. | 07-22-2010 |
20100252745 | GENERATION AND DETECTION OF FREQUENCY ENTANGLED PHOTONS - An ultraviolet laser generates a coherent beam, which is downconverted to produce pairs of frequency-entangled photons. For each entangled pair, a first photon is sent along a first path and a second photon is sent along a second path. A first detector detects those photons sent along the first path, and a second detector detects those photons sent along the second path. The detection is performed in a single photon regime. Coincidence counting is performed on outputs of the detectors, including comparing leading edges on outputs of the first and second detectors within a time window. | 10-07-2010 |
20100288937 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside. | 11-18-2010 |
20100301225 | Method and Apparatus for Accurate Calibration of VUV Reflectometer - A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region. | 12-02-2010 |
20100308232 | STERILIZATION DEVICE AND LAMP HOLDER THEREFOR - A device for subjecting air to UV(C) radiation comprises a UV(C) treatment chamber comprising a UV(C) source, a measuring device comprising one or more of a temperature sensor which measures the temperature on the wall of the UV(C) source; two temperature sensors downstream and upstream of the UV(C) source; and a UV(C) sensor for determining the intensity of the UV(C) radiation. The UV(C) source comprises at least one UV(C) lamp which is held by a lamp holder. The lamp holder comprises positioning elements for holding the measuring device and the lamp(s) in a fixed position. Electrical supply wires and signal wires are arranged such that they are shielded from the radiation from the UV(C) lamp(s). | 12-09-2010 |
20110057113 | DETECTING DEVICE AND OPTICAL APPARATUS INCLUDING THE DETECTING DEVICE - A detecting device includes a wavelength dispersion element for dispersing light into wavelengths and for emitting dispersed light, a photodetector for detecting the dispersed light, and a wavelength restriction element, which is arranged between the wavelength dispersion element and the photodetector and has an optical characteristic dependent on a wavelength, for restricting an incidence of light having a particular wavelength to the photodetector. Light that is part of the dispersed light and includes the light having has the particular wavelength is incident to the wavelength restriction element. | 03-10-2011 |
20110095196 | Sensor system for constantly monitoring an irradiance level of a UV lamp and for being operated by power from a sensor thereof - A sensor system that constantly monitors an irradiance level of a UV lamp and is operated by power from a sensor thereof, wherein the UV lamp is powered by a ballast. The sensor system includes a current sensor, a UV sensor, a voltage comparator, and a display. The current sensor is disposed in the electronic assembly and picks-up current from the ballast, and in response thereto, powers the voltage comparator. The UV sensor is disposed externally to the assembly and picks-up the irradiance from the UV lamp. The voltage comparator is disposed in the electronic assembly, is in electronic communication with the current sensor and the UV sensor, is powered by the current sensor, and compares voltage from the UV sensor to a predetermined value. The display is visible from the electronic assembly, is in electronic communication with the voltage comparator, and indicates result of comparison of the voltage comparator to thereby determine status of the UV lamp. | 04-28-2011 |
20110121193 | INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL - A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator. | 05-26-2011 |
20110127442 | METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS - The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma ( | 06-02-2011 |
20110192985 | EUV LIGHT SOURCE COMPONENTS AND METHODS FOR PRODUCING, USING AND REFURBISHING SAME - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material. | 08-11-2011 |
20110198509 | ULTRAVIOLET LIGHT EXPOSURE CHAMBER FOR PHOTOVOLTAIC MODULES - An apparatus for performing UV light exposure testing of solar panels, also known as PV modules, with superior exposure uniformity, equipment throughput, and floor space requirements, consisting of a chamber including a plurality of UV lamps in a lamp array, at least one target plane, and reflective panels positioned within the chamber to redirect UV light to the target plane(s). | 08-18-2011 |
20110204249 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber. | 08-25-2011 |
20110220806 | Radiation Detector - A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target. | 09-15-2011 |
20110240871 | FLAME SENSOR - A flame sensor is provided with a focusing member. Ultraviolet light emitted from a tight source is reflected by an inner surface of the focusing member to be focused on an electrode of an electrode pair, to increase the sensitivity. | 10-06-2011 |
20110278467 | WATER PURIFIER - The disclosed water purifier comprises an outer wall, a RAW water inflow section that allows inflow of RAW water from outside said outer wall, a purifying section, an ultraviolet ray sterilizing section that has an ultraviolet ray source, a purified water outflow section that allows purified water that has been purified in said purifying section and sterilized in said ultraviolet ray sterilizing section to flow to the outside of said outer wall, a condition-detecting unit, and a control unit that controls generation of ultraviolet rays from said ultraviolet ray source according to the detection by said condition-detecting unit. | 11-17-2011 |
20110284756 | DETECTOR FOR DUAL BAND ULTRAVIOLET DETECTION - The invention concerns a single detector with two designable wavelengths and bandwidths for ultraviolet detection based on n | 11-24-2011 |
20110309260 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus. | 12-22-2011 |
20120061579 | Inline Sensor Light Source with Solid State UV Emitter - Light source for an inline sensor having one or more solid state UV emitters for emitting light at single wavelengths in the range of 240 to 400 nm. The light emitted by each of the emitters has a bandwidth on the order of 10-20 nm and is directed toward a measurement detector in the inline sensor. The UV emitters are enclosed in a housing which can be attached to the inline sensor, with a reference detector and a regulator for the UV emitters also within the housing, and an aperture through which the light passes from the emitters to the measurement detector. | 03-15-2012 |
20120091355 | SELECTIVE DETECTION OF AROMATIC ALPHA-AMINO ACIDS AND DERIVATIVES THEREOF - Provided here are complexes useful in the detection of aromatic alpha-amino acids and peptides incorporating aromatic alpha-amino acids, and methods for detecting aromatic alpha-amino acids and peptides incorporating aromatic alpha-amino acids. Accordingly, provided herein are complexes comprising a compound of Formula I: | 04-19-2012 |
20120112085 | EXPOSURE AMOUNT EVALUATION METHOD AND PHOTOMASK - According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate. | 05-10-2012 |
20120126134 | DISINFECTION DEVICE AND METHOD - An ultraviolet area sterilizer or disinfector is incorporated into a building structure where concern exists regarding the presence of pathogenic bacteria on environmental surfaces. Ultraviolet C (UV-C) generators generate UV-C that is directed to architectural partitions of an enclosed area. The architectural partitions reflect UV-C to kill pathogens in the enclosed area. The device transmits a calculated dose of UV-C from a fixture mounted to an architectural partition in the enclosed area. Once an effective cumulative dose of UV-C has been reflected to radiation sensors, as measured by the sensors, the device shuts down. The device allocates power to specific UV-C emitters so as to direct UV-C radiation more uniformly throughout the area, as measured by the sensors. | 05-24-2012 |
20120138809 | Apparatus and method for detecting the presence of a flame - Apparatus for detecting the presence of a flame using a UV tube which can be supplied with a DC voltage via an operating resistor, at least two UV tubes which are arranged in this manner and have substantially the same field of vision being provided, and the two UV tubes being able to be switched on and off in succession with a gap of a predefined time within a predetermined interval of time via a controller, with the result that the UV tubes are switched on for a predeterminable period of time, the number of pulses obtained from each UV tube being able to be recorded and compared with one another, the anode of the respective UV tube being able to be connected to earth potential between the operations of switching the UV tubes off and on in order to draw ionization in the discharge area. | 06-07-2012 |
20120153179 | PRODUCT EFFECTIVENESS MONITORING DEVICE - A monitoring device ( | 06-21-2012 |
20120161021 | MEASURING IN-SITU UV INTENSITY IN UV CURE TOOL - Provided are improved apparatus and methods for radiative treatment. In some embodiments, a semiconductor processing apparatus for radiative cure includes a process chamber and a radiation assembly external to the process chamber. The radiation assembly transmits radiation into the chamber on a substrate holder through a chamber window. A radiation detector measures radiation intensity from time to time. The assembly includes a gas inlet and exhaust operable to flow a radiation-activatable cooling gas through the radiation assembly. | 06-28-2012 |
20120161022 | APPARATUS FOR CONTINUOUS IN SITU MONITORING OF ELEMENTAL MERCURY VAPOUR, AND METHOD OF USING SAME - An apparatus and method operable for the continuous monitoring of a gas stream including an optical sensor operable to monitor and/or measure Hg concentrations in a flue gas by calculating the absorbance of the ultraviolet light thereby at a range of wavelength 253.7 nm+/−0.05 nm. The apparatus therefore provides as a spectrally narrow UV light source, a mercury lamp. The spectrally broad UV light source includes a UV LED. A 2×2 coupler is provided to mix the narrow and broad UV light energy which is propagated through the gas stream. The invention recognizes that measurement of radiation absorption at the 254 nm+/−1.5 nm range will result in not only from Hg | 06-28-2012 |
20120168634 | Device And Method For Determining The Properties Of Aerosol Formulations | 07-05-2012 |
20120175524 | SENSING UV DOSAGE OF A FLUID STREAM - Devices and Methods for sensing UV dosage of a fluid stream are described. In a first aspect, a device | 07-12-2012 |
20120193547 | LASER PRODUCED PLASMA EUV LIGHT SOURCE - An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose. | 08-02-2012 |
20120205546 | OPTICAL IMAGING SYSTEM WITH LASER DROPLET PLASMA ILLUMINATOR - A wafer inspection system includes a laser droplet plasma (LDP) light source that generates light with sufficient radiance to enable bright field inspection at wavelengths down to 40 nanometers. Light generated by the LDP source is directed to the wafer and light from the illuminated wafer is collected by a high NA objective with all reflective elements. A detector detects the collected light for further image processing. The LDP source includes a droplet generator that dispenses droplets of a feed material. An excitation light generated by a laser is focused on a droplet of the feed material. The interaction of the excitation light with the droplet generates a plasma that emits illumination light with a radiance of at least 10 W/mm | 08-16-2012 |
20120211664 | RADIATION FAILURE INSPECTING METHOD AND RADIATION FAILURE INSPECTING APPARATUS - A radiation failure inspecting method includes acquiring read data when a scanner reads a radiation surface of a radiation unit in a state where a reading surface of the scanner faces the radiation surface of the radiation unit and the radiation unit emits light; acquiring a value corresponding to a radiation energy of the light from the radiation unit by integrating the read data in a direction corresponding to a predetermined direction on the read data; and determining that a radiation failure occurs in the radiation unit when the value corresponding to the radiation energy of the light is equal to or less than a threshold value. | 08-23-2012 |
20120235048 | FLAT PANEL DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A flat panel display apparatus includes a panel including an image region on which an image is realized, a window covering the panel, a black matrix formed in the window along a side edge of the image region, and a resin layer that is ultraviolet (UV) curable and that bonds the panel and the window. The black matrix includes a black ink part for blocking UV rays, and a diffusion ink part for transmitting UV rays. In the flat panel display apparatus, the resin layer for window bonding is sufficiently cured in all regions, including a region thereof under the black matrix, so that a bonding defect in the window due to insufficient curing of the resin layer is significantly decreased. | 09-20-2012 |
20120235049 | EUV ACTINIC RETICLE INSPECTION SYSTEM USING IMAGING SENSOR WITH THIN FILM SPECTRAL PURITY FILTER COATING - An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si/Zr) in a thickness between 10 nm and 100 nm. | 09-20-2012 |
20120256096 | METHOD AND DEVICE FOR MONITORING MOVING OBJECTS - A method and a device for monitoring objects moving along a trajectory. The objects include a section that is transparent or translucent. The objects subsequently cross a light beam at the section. The presence or absence of an object is determined during a transitional time period during which substantially no light or light within a wavelength range substantially untransmittable through the section is detected. A monitoring device generates an output signal based on the light detection indicating the presence or absence of an object. | 10-11-2012 |
20120280134 | MONITORING OF THE PRESENCE OF TWO FLAMES IN A FUEL COMBUSTION DEVICE - A monitoring device has a first flame detector, to receive a first batch of radiation, which is emitted by the first flame, a second flame detector, to receive a second batch of radiation, which is emitted by the second flame, a voltage supplying device to apply an alternating voltage with a first half wave and a second half wave to the two flame detectors and an evaluation circuit that is connected to the two flame detectors via a signal input. A first measurement signal that is present at the common signal input during the first half wave is indicative of the intensity of the first batch of radiation. A second measurement signal that is present at the common signal input during the second half wave is indicative of the intensity of the second batch of radiation. The evaluation circuit independently evaluates the first measurement signal and the second measurement signal. | 11-08-2012 |
20120292521 | TWO-DIMENSIONAL SOLID-STATE IMAGING DEVICE - A camera system with a two-dimensional solid-state imaging device having pixel regions arranged in a two-dimensional matrix, wherein each pixel region has a plurality of subpixel regions, a metal layer with an opening of an opening size smaller than the wavelength of an incoming electromagnetic wave and a photoelectric conversion element are arranged with an insulating film interposed therebetween, at least one photoelectric conversion element is arranged in the opening provided at a portion of the metal layer in each subpixel region, a projection image of the opening is included in a light receiving region of the photoelectric conversion element, the opening is arrayed so as to cause a resonance state based on surface plasmon polariton excited by the incoming electromagnetic wave, and near-field light generated near the opening in the resonance state is converted to an electrical signal by the photoelectric conversion element. | 11-22-2012 |
20120292522 | METHOD FOR DETERMINING THE CONCENTRATION OF NITRIC ACID - The present invention relates to the field of wet chemical treatment of silicon substrates. The invention particularly relates to a method for the determination of the concentration of nitric acid in aqueous process solutions as being used for the treatment of substrates such as those made from silicon. The method is based on the determination of nitrate by means of UV spectroscopy/photometry with the aid of eliminating agents which effectively remove disturbing absorptions caused by other substances. Therein, the concentration of nitrate corresponds to that of nitric acid. | 11-22-2012 |
20120305787 | Apparatus and Method for Area Disinfection Using Ultraviolet Light - A surface disinfection system comprising a plurality of independently placeable and controllable portable ultraviolet light emitting assemblies (ULAs), and a control station for remotely controlling the plurality of light assemblies. A cart housing the control station includes a dock for storing and transporting the assemblies. Each assembly includes a tubular UV-C lamp mounted on a portable base unit that includes electronic components for generating power to the lamp, detecting motion within the room being sterilized, detecting fluence levels and for audible alarm, and for wireless communication with the control station which is located outside the room during operation of the system. Using a plurality of ULAs permits strategic placement of the radiation sources to minimize shadows and thereby provides a thorough degree of disinfection. Independent control of the ULAs permits shutting down any unit to minimize the exposure to which UV-degradable materials are subject by repeated disinfections over time. | 12-06-2012 |
20120318996 | GAS DISCHARGE LAMP WITH AN AXIALLY EXTENDING STRIP OF GETTER AND METHOD OF MANUFACTURE - A gas discharge lamp, photoionization sensor employing the gas discharge lamp, and method of manufacturing the lamp. The lamp includes a longitudinally extending strip of getter within the housing. | 12-20-2012 |
20120326046 | WEARABLE RADIATION DETECTOR - Provided herein are a wearable radiation detector and a method of controlling thereof, the detector including: the radiation collection unit operable to collect light and output a signal corresponding to the light collected; a memory; a display unit; a processor operable to receive the signal output by the radiation collection unit, to store a value in the memory corresponding to the signal output by the radiation collection unit, to output an output signal based at least on the signal corresponding to the light collected by the radiation collection unit and to control the display unit to display an indication corresponding to the output signal, wherein the determining includes continually calculating the maximum exposure level based on the light being received by the radiation collection unit. | 12-27-2012 |
20130015362 | FLUID PURIFICATION AND SENSOR SYSTEMAANM HOOPER; Stewart EdwardAACI OxfordAACO GBAAGP HOOPER; Stewart Edward Oxford GBAANM SMEETON; Tim MichaelAACI OxfordAACO GBAAGP SMEETON; Tim Michael Oxford GBAANM EVANS; AllanAACI OxfordAACO GBAAGP EVANS; Allan Oxford GB - A system and method are disclosed for the simultaneous optical disinfection and detection of biological particles in a flowing fluid, such as air or water, medium. A light source for irradiating the flowing medium is a dual wavelength laser element simultaneously emitting a visible laser beam and an ultraviolet laser beam. In particular, a laser diode may generate a first visible laser light beam, and a second ultraviolet laser light beam may be generated by passing the first laser light beam through a frequency doubling crystal. Optical detectors measure scattering, fluorescence and/or transmission of the laser light beams from the air or water medium to determine the presence of biological particles in real-time. | 01-17-2013 |
20130020491 | PHOTODETECTOR DEVICE WITH PROTECTIVE AND ANTIREFLECTIVE COVER, AND MANUFACTURING METHOD THEREOF - The photodetector device includes a semiconductor body having a front surface, and an active-area region that extends in the semiconductor body facing the front surface and is configured for receiving a light radiation and generating, in response to the light radiation received, electric charge carriers. A polydimethylsiloxane cover layer extends on the front surface in the active-area region so that the light radiation is received by the active-area region through the cover layer. | 01-24-2013 |
20130026381 | DYNAMIC, REAL TIME ULTRAVIOLET RADIATION INTENSITY MONITOR - An apparatus and method for detecting an intensity of radiation in a process chamber, such as an ultraviolet curing process chamber, is disclosed. An exemplary apparatus includes a process chamber having a radiation source therein, wherein the radiation source is configured to emit radiation within the process chamber; a radiation sensor attached to the process chamber; and an optical fiber coupled with the radiation source and the radiation sensor, wherein the optical fiber is configured to transmit a portion of the emitted radiation to the radiation sensor, and the radiation sensor is configured to detect an intensity of the portion of the emitted radiation via the optical fiber. | 01-31-2013 |
20130026382 | PHOTOVOLTAIC UV DETECTOR - A photovoltaic UV detector configured to generate an electrical output under UV irradiation. The photovoltaic UV detector comprises a first layer comprising an electrically polarized dielectric thin layer configured to generate a first electrical output under the UV irradiation; and a second, layer configured to form an electrical energy barrier at an interface between the second layer and the first layer so as to generate a second electrical output under the UV irradiation, the second electrical output having a same polarity as the first electrical output, the electrical output of the photovoltaic UV detector being a sum of at least the first electrical output and the second electrical output. The electrically polarized dielectric thin layer may be a ferroelectric thin film, which may comprise PZT or PZLT. The second layer may be a metal and the electrical energy barrier may be a Schottky barrier. | 01-31-2013 |
20130043401 | Energy Sensors for Light Beam Alignment - An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy. | 02-21-2013 |
20130056642 | METHOD AND APPARATUS FOR MEASURING AERIAL IMAGE OF EUV MASK - An aerial image measuring apparatus includes an extreme ultra-violet (EUV) light generation unit configured to generate EUV light, a moving unit configured to mount an EUV mask and to move the EUV mask in x and y axis directions, a primary reduction optics configured to primarily reduce a divergence of the EUV light generated by the EUV light generation unit, a secondary reduction optics configured to secondarily reduce the divergence of the primarily reduced EUV light, and a detection unit configured to sense energy information from the secondarily reduced EUV light reflected from the plurality of regions on the EUV mask, the secondarily reduced EUV light being incident on and reflected from a plurality of regions on the EUV mask. | 03-07-2013 |
20130062530 | BIOCHEMICAL MATERIAL DETECTION SYSTEM - A biochemical material detection system is provided, which is used to detect biochemical materials. A material to be detected is placed above a sensor module in the system. A light source is guided in by a light emitting device to measure a refractive index of the material to be detected or other parameters related to the material to be detected. Furthermore, a heat source generated by the light emitting device in the system is further isolated outside the sensor module, thereby preventing the heat source from influencing a sensed result to improve the accuracy of the sensed result. | 03-14-2013 |
20130112887 | Method for Inspecting UV Illuminance in Multi-Level Bake Furnace for TFT-LCD Manufacturing Process and Pickup Assembly Device for Performing the Method - The present invention provides a method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process and a pickup assembly device for performing the method. The method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process includes the following steps: Step | 05-09-2013 |
20130134318 | BEAM LINE FOR A SOURCE OF EXTREME ULTRAVIOLET (EUV) RADIATION - The invention relates to a beam line ( | 05-30-2013 |
20130175452 | METHODS AND SYSTEMS FOR DISINFECTING POTABLE WATER SUPPLIES - The invention described herein contains two aspects, usable together or separately, that address the needs in the art described above, namely a first aspect that relates to the provision of a transportable water purification system that can be contained on a passenger transport vehicle, and that can use, but does not require, continuous, real-time monitoring, and a second aspect that relates to the use of UV purification of the water as it is uploaded to the passenger transport vehicle after a single pass through the UV chamber. | 07-11-2013 |
20130200268 | ELECTRONICS FOR DETECTION OF A PROPERTY OF A SURFACE - Apparatus are provided for monitoring a condition of a surface based on a measurement of a property of the surface using a sensor. In an example, the property is performed using an apparatus disposed above the tissue, where the apparatus includes at least one coil structure formed from a conductive material, at least one other component, and at least one cross-link structure physically coupling a portion of the at least one coil structure to a portion of the at least one other component, the at least one cross-link structure being formed from a flexible material. The at least one other component can be a sensor component or a processor unit. | 08-08-2013 |
20130228695 | DEVICE FOR COLLECTING EXTREME ULTRAVIOLET LIGHT - A device for collecting EUV light from a plasma generation region includes first and second EUV collector mirrors. The first EUV collector mirror has a first spheroidal reflective surface and arranged such that a first focus of the first spheroidal reflective surface lies in the plasma generation region and a second focus of the first spheroidal reflective surface lies in a predetermined intermediate focus region. The second EUV collector mirror has a second spheroidal reflective surface and arranged such that a third focus of the second spheroidal reflective surface lies in the plasma generation region and a fourth focus of the second spheroidal reflective surface lies in the predetermined intermediate focus region. | 09-05-2013 |
20130248728 | BEAM REGULATING APPARATUS FOR AN EUV ILLUMINATION BEAM - A beam regulating apparatus for an EUV illumination beam has a position sensor device and a control/regulating device, which is signal-connected to the position sensor device. Furthermore, at least one beam regulating component which influences the beam path of the illumination beam is signal-connected to the control/regulating device. The position sensor device has at least one diffraction grating for generating at least two reference partial beams from the illumination beam. Furthermore, the position sensor device has a respective position sensor assigned to one of the reference partial beams, for detecting the assigned reference partial beam. This results in a beam regulating apparatus which enables well-controllable illumination in conjunction with a simple construction. | 09-26-2013 |
20130256548 | REFLECTING MEMBER AND FLAME SENSOR - A reflecting member made from a tube-shaped member has an inner peripheral surface that structures a reflecting surface on an axis of the tube-shaped member. A slope, relative to the axis, of a tangent line of the inner peripheral surface in a cross-sectional plane containing the axis changes monotonically along the axis. In relation to a target facing a smaller opening of the tube-shaped member, at a specific distance therefrom, and having a flat region perpendicular to the axis and axially symmetrical relative to the axis, of an electromagnetic radiation incident along the axis from a larger opening of the tube-shaped member, that radiation reflected at a specific location on the larger opening side is incident on one end side of the flat region, and that radiation reflected at a specific location on the smaller opening side is incident on the other end side of the flat region. | 10-03-2013 |
20130270444 | APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A TIME DELAY INTEGRATION CHARGE-COUPLE DEVICE IN A SEMICONDUCTOR INSPECTION TOOL - A method for synchronizing sample stage motion with a time delay integration (TDI) charge-couple device (CCD) in a semiconductor inspection tool, including: measuring a lateral position of a stage holding a sample being inspected; measuring a vertical position of the stage; determining a corrected lateral position of an imaged pixel of the sample based on the measured lateral and vertical positions; and synchronizing charge transfer of the TDI CCD with the corrected lateral position of the imaged pixel. | 10-17-2013 |
20130270445 | Ultraviolet-Based Sterilization - A system for sterilizing at least one surface of an object is provided. The system includes a set of ultraviolet radiation sources and a set of wave guiding structures configured to direct ultraviolet radiation having a set of target attributes to a desired location on at least one surface of the object. The set of wave guiding structures can include at least one ultraviolet reflective surface having an ultraviolet reflection coefficient of at least thirty percent. Furthermore, the system can include a computer system for operating the ultraviolet radiation sources to deliver a target dose of ultraviolet radiation to the at least one target surface of the object. | 10-17-2013 |
20130277566 | SELF-REFERENCING RADIATION DETECTOR FOR USE WITH A RADIOPHARMACEUTICAL QUALITY CONTROL TESTING SYSTEM - A self-referencing radiation detector to test the radiochemical purity of a sample radiopharmaceutical solution. In some embodiments, the self-referencing radiation detector measures the radioactivity of a sample radiopharmaceutical solution before the sample radiopharmaceutical solution is passed through a high performance liquid chromatography column. The radiation detector then measures the radioactivity of each separated molecularly distinct species from the high performance liquid chromatography column. The radiochemical purity of the sample radiopharmaceutical solution is calculated by comparing the measured radioactivity of separated molecularly distinct species from said high performance liquid chromatography column to the measured radioactivity of the sample radiopharmaceutical solution before the sample radiopharmaceutical solution is passed through the high performance liquid chromatography column. | 10-24-2013 |
20130313440 | Solid-State Laser And Inspection System Using 193nm Laser - Improved laser systems and associated techniques generate an ultra-violet (UV) wavelength of approximately 193.368 nm from a fundamental vacuum wavelength near 1064 nm. Preferred embodiments separate out an unconsumed portion of an input wavelength to at least one stage and redirect that unconsumed portion for use in another stage. The improved laser systems and associated techniques result in less expensive, longer life lasers than those currently being used in the industry. These laser systems can be constructed with readily-available, relatively inexpensive components. | 11-28-2013 |
20130320223 | QUANTIFYING NUCLEIC ACID IN SAMPLES - A photometric device ( | 12-05-2013 |
20130341523 | EYEGLASS RATING WITH RESPECT TO PROTECTION AGAINST UV HAZARD - An index value is calculated for rating an eyeglass with respect to protection against UV hazard. The index value is based on an integrated UV transmission value through the eyeglass and an integrated UV reflection value related to a back face of the eyeglass. Thus, the index value takes into account actual wearing conditions where UV eye exposure is due either to transmission through the eyeglass or reflection on the eyeglass back face. Respective index values obtained for a set of eyeglasses allow easy sorting of the eyeglasses with respect to UV protection efficiency. | 12-26-2013 |
20140001369 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM | 01-02-2014 |
20140001370 | EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers | 01-02-2014 |
20140008543 | EYEGLASS RATING WITH RESPECT TO PROTECTION AGAINST UV HAZARD - An index value is calculated for rating an eyeglass with respect to protection against UV hazard. The index value is based on an integrated UV transmission value through the eyeglass and an integrated UV reflection value related to a back face of the eyeglass. Thus, the index value takes into account actual wearing conditions where UV eye exposure is due either to transmission through the eyeglass or reflection on the eyeglass back face. Respective index values obtained for a set of eyeglasses allow easy sorting of the eyeglasses with respect to UV protection efficiency. | 01-09-2014 |
20140027649 | SYSTEM AND METHOD FOR THE DETECTION OF SOILING IN BANK NOTES - A method for handling soiled bank notes is disclosed. The method includes directing a bank note to an ultraviolet detector; transmitting an ultraviolet signal from the ultraviolet detector to the bank note; receiving a reflected ultraviolet signal from the bank note at the ultraviolet detector; analyzing the reflected ultraviolet signal; identifying a soiling level for the bank note based on analysis of the reflected ultraviolet signal; and handling the bank note based on the identified soiling level. Analyzing the reflected ultraviolet signal can include comparing a characteristic of the reflected ultraviolet signal with calibration data. The calibration data can be stored in a computer-readable medium. The bank note is identified as a soiled bank note if the identified soiling level exceeds a threshold soiling level. | 01-30-2014 |
20140042332 | Defect Inspection Apparatus And Defect Inspection Method - Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region, In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture. | 02-13-2014 |
20140084176 | MATERIAL AGING TEST APPARATUS AND METHOD THEREOF - A material aging test apparatus and method thereof are provided. The aging apparatus includes a pulsed laser, a beam expansion assembly, a platform, and a spectrum analyzer. The pulsed laser is used for transmitting a first beam. The beam expansion assembly is used for converting the first beam into a second beam and projecting the second beam onto an object. The platform is used for carrying the object. The spectrum analyzer is used for measuring the spectral response which is generated from the object by the projection of the second beam. | 03-27-2014 |
20140097350 | ADHESIVE DETECTION SYSTEM FOR MAILPIECE CREATION SYSTEM - A system and method for detecting adhesive used to produce an envelope in a mailpiece creation system. The system includes a source of ElectroMagnetic (EM) energy in at least the short UV range to illuminate a surface of the substrate material anticipated to have an adhesive deposited thereon in select regions, an EM energy detection device operative to detect energy reflected from the surface of the substrate material in the visible light range and produce a response indicative of the optical absorbance of EM energy in the short UV range; and a processor operative to analyze the response of the EM energy detection device to determine whether light energy in the visible range is below a threshold level to indicate the presence of adhesive deposited on the substrate material. | 04-10-2014 |
20140131586 | Phase Grating For Mask Inspection System - Spectral Purity Filters, or SPFs, are disclosed. Such SPFs are designed to block out the 1030 nm drive laser and other undesired out of band light in a EUV mask inspection system. Different phase grating configurations for near normal incidence and grazing incidence are provided in the present disclosure and are configured specifically for EUV mask inspection. | 05-15-2014 |
20140131587 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside. | 05-15-2014 |
20140158894 | METHOD AND DEVICE USING PHOTOELECTRONS FOR IN-SITU BEAM POWER AND STABILITY MONITORING IN EUV SYSTEMS - The invention presented is a real time EUV illumination metrology device that includes at least one pair of electrodes mounted on an insulator substrate with an aperture defined by the at least one pair of electrodes and/or the insulator substrate. The electrodes of each of the pairs of electrodes are separated by an arc suppression distance. In one alternate embodiment, the metrology device includes four pairs of electrodes. The device may also include a voltage biasing component to divert unwanted electrons that may distort illumination measurement. Also presented is an EUV illumination system incorporating the metrology device. One object of the invention is to provide a system of real time measurement of an EUV illumination beam. | 06-12-2014 |
20140191132 | Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet Light Dosing - Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements. | 07-10-2014 |
20140191133 | Method of Timing Laser Beam Pulses to Regulate Extreme Ultraviolet Light Dosing - Described herein are embodiments of a method to control energy dose output from a laser-produced plasma extreme ultraviolet light system by adjusting timing of fired laser beam pulses. During stroboscopic firing, pulses are timed to lase droplets until a dose target of EUV has been achieved. Once accumulated EUV reaches the dose target, pulses are timed so as to not lase droplets during the remainder of the packet, and thereby prevent additional EUV light generation during those portions of the packet. In a continuous burst mode, pulses are timed to irradiate droplets until accumulated burst error meets or exceeds a threshold burst error. If accumulated burst error meets or exceeds the threshold burst error, a next pulse is timed to not irradiate a next droplet. Thus, the embodiments described herein manipulate pulse timing to obtain a constant desired dose target that can more precisely match downstream dosing requirements. | 07-10-2014 |
20140217298 | SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE INSPECTION SYSTEM - An extreme ultraviolet (EUM) mask inspection system, comprising a light source to project EUV light along an optical axis, an illumination system to receive the EUV light from the source, the illumination system comprising a spectral purity filter (SPF), the SPF transmits a first portion of the EUV light along the optical axis toward a mask and the SPF comprising a plurality of at least partially reflective elements, said elements reflects a second portion of the EUV light off the optical axis, a projection system adapted to receive the first portion of the EUV light after it has illuminated the mask, a first detector array adapted to receive the image, and a second detector array to receive the second portion of the EUV light. The SPF may comprise one or more multilayer interference-type filters. Alternatively, the SPF comprises a thin film filter disposed on a grazing incidence mirror array. | 08-07-2014 |
20140217299 | EUV High Throughput Inspection System For Defect Detection On Patterned EUV Masks, Mask Blanks, And Wafers - Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long. | 08-07-2014 |
20140231659 | METHODS AND APPARATUS FOR USE WITH EXTREME ULTRAVIOLET LIGHT HAVING CONTAMINATION PROTECTION - An apparatus for use with extreme ultraviolet (EUV) light comprising A) a duct having a first end opening, a second end opening and an intermediate opening intermediate the first end opening the second end opening, B) an optical component disposed to receive EUV light from the second end opening or to send light through the second end opening, and C) a source of low pressure gas at a first pressure to flow through the duct, the gas having a high transmission of EUV light, fluidly coupled to the intermediate opening. In addition to or rather than gas flow the apparatus may have A) a low pressure gas with a heat control unit thermally coupled. to at least one of the duct and the optical component and/or B) a voltage device to generate voltage between a first portion and a second portion of the duet with a grounded insulative portion therebetween. | 08-21-2014 |
20140246599 | System and Apparatus to Illuminate Individual Particles - An apparatus for illuminating individual particles comprising a device for moving and directing air containing particles into a system, the system comprising an electrodynamic linear quadrupole section, an ultra-violet electromagnetic radiation source located along the electrodynamic linear quadrupole section, and a collection device for collecting the particles. A method of illuminating individual particles comprising moving and directing air containing particles into a system, controlling the air flow by using an air pump that continuously pulls or pushes air through the system, directing the particles into an electrodynamic linear quadrupole section, confining the particles to the central axis of the electrodynamic linear quadrupole section, illuminating the particles with ultra-violet electromagnetic radiation, interrogating the particles, and collecting the particles. | 09-04-2014 |
20140252242 | SYSTEM AND METHOD FOR QUANTUM EFFICIENCY MEASUREMENT EMPLOYING DIFFUSIVE DEVICE - A system for measuring a characteristic of a solar cell is disclosed and includes a light source irradiating an optical signal having a spectral range from about 100 nm to about 3000 nm, a wavelength selector configured to selectively narrow the spectral range of the optical signal, a beam splitter, a reference detector in optical communication with the beam splitter and configured to measure a characteristic of the optical signal, a specimen irradiated with the optical signal, a reflectance detector in optical communication with the specimen via the beam splitter and configured to measure an optical characteristic of the optical signal reflected by the specimen, a multiplexer in communication with at least one of the reference detector, specimen, and reflectance detector, and a processor in communication with at least one of the reference detector, specimen, and reflectance detector via the multiplexer and configured to calculate at least one characteristic of the specimen. | 09-11-2014 |
20140264051 | SEGMENTED MIRROR APPARATUS FOR IMAGING AND METHOD OF USING THE SAME - An apparatus for inspecting a photomask, comprising an illumination source for generating a light which illuminates a target substrate, objective optics for receiving and projecting the light which is reflected from the target substrate, the objective optics includes a first mirror arranged to receive and reflect the light which is reflected from the target substrate, a second mirror which is arranged to receive and reflect the light which is reflected by the first mirror, a third mirror which is arranged to receive and reflect the light which is reflected by the second mirror, and a segmented mirror which is arranged to receive and reflect the light which is reflected by the third mirror. The segmented mirror includes at least two mirror segments. The apparatus further includes at least one sensor for detecting the light which is projected by the objective optics. | 09-18-2014 |
20140264052 | Apparatus and Method for Monitoring Semiconductor Fabrication Processes Using Polarized Light - The inventive concept provides apparatuses and methods for monitoring semiconductor fabrication processes in real time using polarized light. In some embodiments, the apparatus comprises a light source configured to generate light, a beam splitter configured to reflect the light toward the wafer being processed, an objective polarizer configured to polarize the light reflected toward the wafer and to allow light reflected by the wafer to pass therethrough, a blaze grating configured to separate light reflected by the wafer according to wavelength, an array detector configured to detect the separated light and an analyzer to analyze the three-dimensional profile of the structure/pattern being formed in the wafer. | 09-18-2014 |
20140264053 | Methods And Apparatus For Vacuum Ultraviolet (VUV) Or Shorter Wavelength Circular Dichroism Spectroscopy - A highly efficient vacuum ultraviolet circular dichroism spectrometer is provided; the spectrometer suitable for laboratory use or for integration into a beam line at a synchrotron radiation facility. In one embodiment, a spectroscopic circular dichroism instrument is provided; the instrument configured so as to enable circular dichroism data to be simultaneously obtained for multiple wavelengths of light. The instrument may be further configured to operate in at least a portion of the vacuum ultraviolet wavelength region. | 09-18-2014 |
20140264054 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus and a method to detect a defect or particle on a surface that involves combining an object radiation beam redirected by the surface with a reference radiation beam having a plurality of intensities lower than the object radiation beam, to produce a plurality of patterns detected by a detector in order to detect the defect or particle on the surface from the patterns. | 09-18-2014 |
20140299778 | MEaSURENOW - The need for an instant handheld analysis of cannabis products has been in demand for years from the consumer/dispensary level and grower's quality control. Recent developments in sensitivity and detection devices have transformed the bulky tabletop industry into a personal measurement device. This device consists of a sample cell slot that is an opening used to insert the sealed, extracted, sample cell (see FIG. | 10-09-2014 |
20140299779 | OBLIQUE ILLUMINATOR FOR INSPECTING MANUFACTURED SUBSTRATES - One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed. | 10-09-2014 |
20140312240 | Flame Detector - A system and method are disclosed for detecting open flames in an outdoor environment. Structurally, the outdoor flame detector includes both an ultra-violet (UV) detector and a Radio Frequency (RF) detector. While operating within predetermined parameters, these detectors respectively create an event signal(s) and a cancel signal(s). In detail, the UV detector will output an event signal whenever UV radiation with a fluence above a predetermined value is incident on the UV detector. On the other hand, the RF detector will output a cancel signal whenever it receives an RF component transmitted in an electrical arc discharge having an intensity above a predetermined threshold. The event signal and the cancel signal are then individually and collectively evaluated by a computer to distinguish between an actual open flame and a non-flame event, such as an electric arc discharge (e.g. lightening, electric motors and arc welding). | 10-23-2014 |
20140339434 | SYSTEM FOR AUTHENTICATING UV ABSORBING SECURITY MARK - A system for authenticating a document includes a document having a substrate comprising an optical brightener; printing a background with a ultraviolet (UV) absorbing material on the substrate comprising a first pattern of lines having a first frequency and a first orientation; printing a security mark with the UV material on the substrate comprising a second pattern of lines having a second frequency and a second orientation; a lenticular lens; placing the lenticular lens over the security mark and background; a UV lamp; illuminating the security mark and background through the lenticular lens with UV light; orienting the lenticular lens to match either the first orientation or the second orientation; and authenticating the document if the security mark matches a predetermined security mark. | 11-20-2014 |
20140361185 | EYEWEAR WITH RADIATION DETECTION SYSTEM - Eyewear having radiation monitoring capability is disclosed. Radiation, such as ultraviolet (UV) radiation, infrared (IR) radiation or light, can be measured by a detector. The measured radiation can then be used in providing radiation-related information to a user of the eyewear. Advantageously, the user of the eyewear is able to easily monitor their exposure to radiation. | 12-11-2014 |
20140367579 | MEASURING APPARATUS AND SPECIMEN INFORMATION OBTAINING SYSTEM - A measurement apparatus includes a first light source unit configured to emit a first light having a first wavelength, and a scanning unit configured to move an irradiation position of the first light with respect to a specimen, so as to scan the specimen with the first light. The first light source unit includes a wavelength changing unit configured to change the first wavelength. Movement of the irradiation position is performed by the scanning unit while the wavelength changing unit is changing the first wavelength. A changing cycle of the first wavelength by the wavelength changing unit is shorter than a position moving cycle by the scanning unit. | 12-18-2014 |
20140374611 | Continuous Generation of Extreme Ultraviolet Light - The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material. | 12-25-2014 |
20140374612 | SYSTEMS AND METHODS FOR EMITTING RADIANT ENERGY - Field balancing may be performed with an irradiation system including a plurality of adjustable radiant-energy emitters. The irradiation system powers the radiant-energy emitters from a power source and radiant energy is emitted from the radiant-energy emitters, where an amount of radiant energy emitted from each emitter is capable of being varied based on power received from the power source. A plurality of radiant-energy sensors detects an amount of radiant energy which includes radiant energy created directly by at least one of the radiant-energy emitters. The amount of radiant energy detected at at least two of the radiant-energy sensors is compared, and at least one of the radiant-energy emitters is adjusted by varying the power received from the power source so that the amount of radiant energy detected at each of the radiant-energy sensors tends towards becoming approximately equal. The emitting of radiant energy from each radiant-energy emitter is terminated when a total amount of radiant energy emitted from the plurality of adjustable radiant-energy emitters exceeds a predetermined threshold value, where the threshold value is sufficient to allow the total amount of radiant energy emitted from the plurality of adjustable radiant-energy emitters to sanitize a particular area in which the emitters are located. | 12-25-2014 |
20150021490 | METHOD TO DETERMINE TRACE AMOUNTS OF CRUDE OIL BY SPECTROSCOPIC ABSORPTION - The present invention relates to a method for determining trace amounts of crude oil in water, including the steps of collecting a sample of an oil-containing fluid, adding a toluene extraction volume to the sample, perturbing the sample, dissolving substantially all of the amount of oil in the toluene extraction volume to create a mixed sample, extracting the mixed sample to create an oil-in-toluene layer and an aqueous fluid layer, removing a portion of the oil-in-toluene layer into a dilution container, diluting the portion of the oil-in-toluene layer with a toluene dilution volume to create a dilute sample, measuring an absorption value of the dilute sample using a spectrophotometer, and comparing the absorption value to a calibration curve to quantify the amount of oil in the oil-containing fluid. | 01-22-2015 |
20150021491 | METHOD AND APPARATUS FOR MEASURING CONCENTRATION OF ADVANCED-OXIDATION ACTIVE SPECIES - A method for measuring the concentration of advanced-oxidation active species includes a step of measuring the absorption characteristics of a wavelength region including the wavelength of 195 to 205 nm of a sample and a step of determining the concentration of the advanced-oxidation active species from the aforementioned measured absorption characteristics on the basis of the absorption coefficient of the advanced-oxidation active species in the wavelength region including the wavelength of 195 to 205 nm. The method and the apparatus can measure the concentration of the advanced-oxidation active species directly in line without the need for adding an additive. | 01-22-2015 |
20150041663 | PROTECTIVE PRODUCT REPORTING SYSTEM - A reporting system includes a mobile computing device that wirelessly communicates with one or more sensors to track the use of a protective product. Reports are provided on the mobile computing device to remind and motivate a user of the protective product to use it at times most beneficial for receiving the intended protection from it. | 02-12-2015 |
20150041664 | UV Irradiance Sensor With Improved Cosine Response - A sensor housing and cosine diffuser are provided for the detection and measurement of ultraviolet (UV) irradiance. The cosine diffuser has a tiered structure to efficiently receive and transmit incident light that passes over and/or through the sensor housing structure. The sensor housing structure can be configured to have an irregular, serrated, castellated, and or repeating prong and/or tooth sequence to form a cutoff comb, through which incident light is attenuated. The attenuation of light in turn reduces measurement error caused when too much or too little incident light, relative to the actual intensity and irradiance of ambient incident light, reaches and transmits through a cosine diffuser due to the variation of the zenith angle of incident light over the course of a day. | 02-12-2015 |
20150060683 | DEVICE FOR MEASURING A POWER DENSITY DISTRIBUTION OF A RADIATION SOURCE - A device and method for measuring a power density distribution of a radiation source is provided. The device includes a radiation source designed to emit a light beam in a radiation direction; a substrate disposed downstream of the radiation source in the radiation direction and having an extent in an x-direction and a y-direction, the substrate having a first region and at least one further second region, and the first region comprises a diffractive structure designed to separate the light beam impinging on the substrate into a zeroth order of diffraction and at least one first order of diffraction; and a detector unit disposed downstream of the substrate in the radiation direction and designed to measure the intensity of the first order of diffraction transmitted through the substrate and to derive a power density distribution therefrom. | 03-05-2015 |
20150069253 | WAVEFRONT ADJUSTMENT IN EXTREME ULTRA-VIOLET (EUV) LITHOGRAPHY - Some embodiments of the present disclosure related to a method to form and operate the reflective surface to compensate for aberration effects on pattern uniformity. In some embodiments, the reflective surface comprises a mirror of within reduction optics of an EUV illumination tool. In some embodiments, the reflective surface comprises a reflective reticle. An EUV reflective surface topography comprising a reflective surface is disposed on a surface of a substrate, and is manipulated by mechanical force or thermal deformation. The substrate includes a plurality of cavities, where each cavity is coupled to a deformation element configured to expand a volume of the cavity and consequently deform a portion of the reflective surface above each cavity, for local control of the reflective surface through thermal deformation of a resistive material subject to an electric current, or mechanical deformation due to pressurized gas within the cavity or a piezoelectric effect. | 03-12-2015 |
20150076359 | System and Method for Generation of Extreme Ultraviolet Light - An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element. | 03-19-2015 |
20150102229 | Defect Inspection Apparatus and Defect Inspection Method - Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region. In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture. | 04-16-2015 |
20150108360 | MEASUREMENT OF SUNSCREEN PROTECTION USING SPIN COATED SUBSTRATES - Methods for spin coating plates for in vitro determination of sunscreen protection factors (SPF) are disclosed. | 04-23-2015 |
20150136993 | SHEET MEASUREMENT - A detector receives optical radiation interacted with the measured sheet and is responsive to a predetermined optical absorption band of lignin, a predetermined optical absorption band of dry matter and two or more separate optical bands. The measuring unit measures a lignin dependent value on the basis of attenuation in the absorption band of lignin, and a dry matter dependent value on the basis of attenuation in the absorption band of the dry matter, and determines a general dependence of attenuation with respect to wavelength by measuring attenuations in the separate optical bands. The measuring unit forms a value representing a dry matter content on the basis of the lignin dependent value, the dry matter dependent value and the general dependence of attenuation. | 05-21-2015 |
20150144798 | CRITICAL DIMENSION UNIFORMITY MONITORING FOR EXTREME ULTRAVIOLET RETICLES - Disclosed are methods and apparatus for facilitating an inspection of a sample using an inspection tool. An inspection tool is used to obtain an image or signal from an EUV reticle that specifies an intensity variation across the EUV reticle, and this intensity variation is converted to a CD variation that removes a flare correction CD variation so as to generate a critical dimension uniformity (CDU) map without the flare correction CD variation. This removed flare correction CD variation originates from design data for fabricating the EUV reticle, and such flare correction CD variation is generally designed to compensate for flare differences that are present across a field of view (FOV) of a photolithography tool during a photolithography process. The CDU map is stored in one or more memory devices and/or displayed on a display device, for example, of the inspection tool or a photolithography system. | 05-28-2015 |
20150297767 | Ultraviolet-Based Sterilization - A system for sterilizing at least one surface of an object is provided. The system includes a set of ultraviolet radiation sources and a set of wave guiding structures configured to direct ultraviolet radiation having a set of target attributes to a desired location on at least one surface of the object. The set of wave guiding structures can include at least one ultraviolet reflective surface having an ultraviolet reflection coefficient of at least thirty percent. Furthermore, the system can include a computer system for operating the ultraviolet radiation sources to deliver a target dose of ultraviolet radiation to the at least one target surface of the object. | 10-22-2015 |
20150308944 | OPTICAL MEASURING APPARATUS AND METHOD FOR THE ANALYSIS OF SAMPLES CONTAINED IN LIQUID DROPS - Optical measuring apparatus configured for analysis of samples contained in liquid drops provided by a liquid handling system that comprises at least one liquid handling tip. The apparatus comprises a light source for irradiating the drop; a detector for measuring sample light; an optics system with first optical elements for transmitting irradiation light, and a processor for accepting and processing measurement signals. The drop is suspended at the liquid handling orifice of the tip in a position where the drop is penetrated by a first optical axis defined by the light source and the first optical elements. The drop is physically touched only by the tip and the liquid sample inside the tip. A robot arm to which the tip is attached is configured as a mechanism for adapting the position of the liquid drop with respect to at least one optical element of the optics system. | 10-29-2015 |
20150308945 | METHOD AND APPARATUS FOR EVALUATING ULTRAVIOLET RADIATION PROTECTION EFFECT, AND RECORDING MEDIUM - An evaluation method for evaluating an ultraviolet radiation protection effect in a measurement sample applied on an application member includes the first step of switching to a first filter for measuring a spectral transmittance before photodeterioration by emission of light from a light source, and measuring the spectral transmittance, the second step of switching to a second filter for ultraviolet irradiation and causing the photodeterioration by the emission of the light after the measurement by the first step, and thereafter, switching to the first filter and measuring the spectral transmittance, and the third step of evaluating the ultraviolet radiation protection effect based on a change over time in the spectral transmittance obtained by the second step. Each of the first and second filters includes multiple light source filters. The first filter includes ND filters switchable in accordance with the light amount of the light source in the light source filters. | 10-29-2015 |
20150330777 | METHOD FOR MEASURING A LITHOGRAPHY MASK OR A MASK BLANK - A method for measuring a substrate in the form of a lithography mask or a mask blank for producing a lithography mask comprises the alignment of a substrate coordinate system (SKS), predetermined by a first marker structure, relative to a position measurement system, a measurement of actual position data (IST) of a second marker structure with predetermined intended position data (POS) in the substrate coordinate system (SKS), and an establishment of a transformation (T) of the substrate coordinate system (SKS) into a transformed substrate coordinate system (tSKS), wherein the transformation (T) is established in such a way that deviations between the actual position data (IST) and the intended position data (POS) of the second marker structure are reduced. | 11-19-2015 |
20150338272 | Methods and Devices For Usage of Sunscreen Lotions - A method for calculating a rate of UV radiation absorbed by a user's skin including: capturing image data of an area of the user's skin; determining a skin tone of the user's skin based on the captured image data; calculating a rate of UV radiation absorption for the determined skin tone; measuring an amount of UV radiation exposed to the user's skin; and calculating a rate of UV radiation that would be absorbed by the user's skin based on the user's skin tone and the amount of UV radiation exposed to the user's skin. The method can further comprise calculating an amount of time that the user can be exposed to the amount of UV radiation exposed to the user's skin based on predetermined criteria. The predetermined criteria can at least include an SPF level of sunscreen applied to the user's skin. | 11-26-2015 |
20150338273 | ULTRAVIOLET SENSOR HAVING FILTER - Techniques are provided to furnish a light sensor that includes a filter positioned over a photodetector to filter visible and infrared wavelengths to permit the sensing of ultraviolet (UV) wavelengths. In one or more implementations, the light sensor comprises a semiconductor device (e.g., a die) that includes a substrate. A photodetector (e.g., photodiode, phototransistor, etc.) is formed in the substrate proximate to the surface of the substrate. In one or more implementations, the substrate comprises a silicon on insulator substrate (SOI). A filter (e.g., absorption filter, interference filter, flat pass filter, McKinlay-Diffey Erythema Action Spectrum-based filter, UVA/UVB filter, and so forth) is disposed over the photodetector. The filter is configured to filter infrared light and visible light from light received by the light sensor to at least substantially block infrared light and visible light from reaching the photodetector. The thickness of the SOI substrate can be tailored to modify received UV/visible wavelength ratios. | 11-26-2015 |
20150346598 | ILLUMINATION OPTICAL UNIT FOR A MASK INSPECTION SYSTEM AND MASK INSPECTION SYSTEM WITH SUCH AN ILLUMINATION OPTICAL UNIT - An illumination optical unit for a mask inspection system is used with EUV illumination light. A hollow waveguide of the illumination optical unit serves for guiding the illumination light. The hollow waveguide has an entry opening for the illumination light and an exit opening for the illumination light. An imaging mirror optical unit, arranged downstream of the hollow waveguide serves to image the exit opening into an illumination field. This results in an illumination optical unit, the throughput of which is optimized for the EUV illumination light. | 12-03-2015 |
20150351211 | EXTREME ULTRAVIOLET LIGHT GENERATING APPARATUS, METHOD OF GENERATING EXTREME ULTRAVIOLET LIGHT, CONCENTRATED PULSED LASER LIGHT BEAM MEASURING APPARATUS, AND METHOD OF MEASURING CONCENTRATED PULSED LASER LIGHT BEAM - Provided is an extreme ultraviolet light generating apparatus that may include: a chamber containing one or more kinds of gases; a light concentration optical system provided in an optical path of pulsed laser light outputted from a laser unit, and configured to concentrate the pulsed laser light into a concentrated beam; and an image pickup section provided at a position out of the optical path of the pulsed laser light, and configured to pick up a plasma emission image that is an image of plasma emission in the chamber. The plasma emission is caused by application of the concentrated beam to the one or more kinds of gases in the chamber. | 12-03-2015 |
20150377795 | DEFECT DETECTION USING SURFACE ENHANCED ELECTRIC FIELD - A system and method for inspecting a surface of a wafer. The system includes a source generating an optical beam at a deep ultraviolet wavelength; a solid immersion lens, receiving the optical beam, positioned such that the air gap between the lens and the wafer surface is less than the wavelength, an enhanced electric field being generated at the wafer surface, at least one particle on the wafer receiving the enhanced electric field generating scattered light; a detector receiving the scattered light and generating a corresponding electrical signal; and a processor receiving and analyzing the electrical signal. | 12-31-2015 |
20160025558 | ULTRAVIOLET SEMICONDUCTOR SENSOR DEVICE AND METHOD OF MEASURING ULTRAVIOLET RADIATION - A photodiode ( | 01-28-2016 |
20160033326 | METHOD AND SYSTEM FOR MONITORING ULTRAVIOLET LIGHT FOR A FIBER CURE SYSTEM - A system and method for monitoring and operating one or more light emitting devices is disclosed. In one example, light intensity within a dual elliptical reflecting chamber is sensed and operation of a fiber curing system is adjusted in response to an amount of sensed light energy. | 02-04-2016 |
20160061657 | Ultraviolet Monitoring Device - Monitoring a user's exposure to ultraviolet radiation, including determining the amount of radiation to which the user is exposed from different directions, respectively. | 03-03-2016 |
20160091921 | SMART WATCH WITH UV DETECTOR - A smart watch with an ultraviolet (UV) detector includes a base body, a display module, a UV detector module and a processor module. The base body includes a top housing and a watchband. The top housing defines a receiving chamber. At least one lateral face of the top housing is an inclined face. The inclined face is recessed inward and slantwise downward to form a groove. The display module is disposed in the receiving chamber. The UV detector module is disposed in the groove and exposed outward through the groove, wherein in use, the UV detector module is located outward and upward back to a user's body for gaining UV information. The processor module is disposed in the receiving chamber and electrically connected to the display module and the UV detector module. The processor module processes the UV information and then displays processed results on the display module. | 03-31-2016 |
20160094011 | Laser Assembly And Inspection System Using Monolithic Bandwidth Narrowing Apparatus - A pulsed UV laser assembly includes a partial reflector or beam splitter that divides each fundamental pulse into two sub-pulses and directs one sub-pulse to one end of a Bragg grating and the other pulse to the other end of the Bragg grating (or another Bragg grating) such that both sub-pulses are stretched and receive opposing (positive and negative) frequency chirps. The two stretched sub-pulses are combined to generate sum frequency light having a narrower bandwidth than could be obtained by second-harmonic generation directly from the fundamental. UV wavelengths may be generated directly from the sum frequency light or from a harmonic conversion scheme incorporating the sum frequency light. The UV laser may further incorporate other bandwidth reducing schemes. The pulsed UV laser may be used in an inspection or metrology system. | 03-31-2016 |
20160097983 | Inspection Method and Apparatus, Substrates for use Therein and Device Manufacturing Method - A substrate is provided with device structures and metrology structures ( | 04-07-2016 |
20160097984 | Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement - An inspection apparatus ( | 04-07-2016 |
20160109289 | METHOD AND APPARATUS FOR MEASURING ULTRAVIOLET LIGHT EXPOSURE - An electronic device comprising: an ultraviolet (UV) light sensor; and a processor configured to: generate a plurality of initial UV light measurements by using the UV light sensor, wherein each of the plurality of initial UV light measurements is associated with a respective orientation of the electronic device; and select a reference UV light measurement from the plurality. | 04-21-2016 |
20160116332 | LIGHT SOURCE AND PHOTOLITHOGRAPHY APPARATUS CONTAINING THE SAME, CALIBRATING APPARATUS AND METHOD - The present disclosure provides an extreme ultraviolet (EUV) light source. The EUV light source includes a droplet array with a plurality of nozzles arranged along a straight scanning direction, the plurality of nozzle sequentially and intermittently ejecting droplets downward to a radiating position; a laser source configured to generate at least two laser beams and scan the at least two laser beams along the straight scanning direction, the at least two laser beams alternately bombarding droplets arriving at the radiating position to form EUV light; and a condenser with a condenser mirror having a reflective ellipsoidal surface, configured to collect the EUV light and converge collected EUV light at a center of focus. | 04-28-2016 |
20160130159 | SYSTEM FOR DETERMINING UV DOSE IN A REACTOR SYSTEM - The is described a process for determining a validated Reduction Equivalent Dose for reducing the concentration of a target contaminant contained in a fluid in a radiation fluid treatment system. In one embodiment, the process comprises the steps of: (a) determining a short wavelength Reduction Equivalent Dose for the target contaminant or a challenge contaminant in a first region of the electromagnetic spectrum having a wavelength of less than or equal to about 240 nm; (b) determining a long wavelength Reduction Equivalent Dose for the target contaminant or a challenge contaminant in a second region of the electromagnetic spectrum having a wavelength of greater than about 240 nm; and (c) summing the short wavelength Reduction Equivalent Dose and the long wavelength Reduction Equivalent Dose to produce the validated Reduction Equivalent Dose for the target contaminant. In a preferred embodiment, the present invention provides a useful approach for determining the relevant Reduction Equivalent Dose (RED) for | 05-12-2016 |
20160138969 | Method and System for Measuring Radiation and Temperature Exposure of Wafers Along a Fabrication Process Line - A measurement wafer device for measuring radiation intensity and temperature includes a wafer assembly including one or more cavities. The measurement wafer device further includes a detector assembly. The detector assembly is disposed within the one or more cavities of the wafer assembly. The detector assembly includes one or more light sensors. The detector assembly is further configured to perform a direct or indirect measurement of the intensity of ultraviolet light incident on a surface of the wafer assembly. The detector assembly is further configured to determine a temperature of one or more portions of the wafer assembly based on one or more characteristics of the one or more light sensors. | 05-19-2016 |
20160138970 | ULTRAVIOLET INDEX MEASURING METHOD AND APPARATUS - An ultraviolet index measuring method and apparatus includes preparing a first photosensor having spectral response only in a first section of a wavelength between 250 nm and 298 nm, a second photosensor having spectral response only in a second section of a wavelength between 298 nm and 328 nm, and a third photosensor having spectral response only in a third section of a wavelength between 328 nm and 400 nm. An output signal of the first photosensor, an output signal of the second photosensor, and an output signal of the third photosensor are calibrated using spectral irradiance of reference solar light. First photocurrent of the first photosensor, second photocurrent of the second photosensor, and third photocurrent of the third photosensor are measured under a measurement environment. An ultraviolet index is calculated using the first photocurrent, the second photocurrent, and the third photocurrent under the measurement environment. | 05-19-2016 |
20160146664 | TUNABLE PHOTO-DETECTOR DEVICE - A photo-detector device may include a substrate having a bottom surface. The photo-detector device may further include a photocell secured to the bottom surface of the substrate. The photo-detector device may further include a metallic block having a top portion secured to a bottom surface of the substrate to enclose the photocell, wherein an opening is formed within the metallic block that extends from the top portion of the metallic block to a bottom portion of the metallic block to form an aperture for light to travel through the metallic block to the photocell. The photo-detector device may further include a member insertable into the metallic block to vary an open area of the aperture. | 05-26-2016 |
20160154301 | SCANNING COHERENT DIFFRACTIVE IMAGING METHOD AND SYSTEM FOR ACTINIC MASK INSPECTION FOR EUV LITHOGRAPHY | 06-02-2016 |
20160169741 | OPTICAL SYSTEM OF A HIGH-RESOLUTION IMAGING SPECTROGRAPH FOR DEEP UV RAMAN SPECTROSCOPY | 06-16-2016 |
20160174351 | Variable Radius Mirror Dichroic Beam Splitter Module for Extreme Ultraviolet Source | 06-16-2016 |
20160195427 | SYSTEMS AND METHODS FOR MONITORING ULTRAVIOLET LIGHT EXPOSURE IN AN ENVIRONMENT | 07-07-2016 |
20160200119 | PRINT CURING APPARATUS | 07-14-2016 |
20160251238 | SOLAR DISINFECTION OF FLUID | 09-01-2016 |
20160377531 | Vacuum Ultraviolet Absorption Spectroscopy System And Method - An efficient absorption spectroscopy system is provided. The spectroscopy system may be configured to measure solid, liquid or gaseous samples. Vacuum ultra-violet wavelengths may be utilized. Some of the disclosed techniques can be used for detecting the presence of trace concentrations of gaseous species. A preferable gas flow cell is disclosed. Some of the disclosed techniques may be used with a gas chromatography system so as to detect and identify species eluted from the column. Some of the disclosed techniques may be used in conjunction with an electrospray interface and a liquid chromatography system so as to detect and identify gas phase ions of macromolecules produced from solution. Some of the disclosed techniques may be used to characterize chemical reactions. Some of the disclosed techniques may be used in conjunction with an ultra short-path length sample cell to measure liquids. | 12-29-2016 |
20180024002 | METHOD, ELECTRONIC DEVICE AND SYSTEM FOR MONITORING A SKIN SURFACE CONDITION | 01-25-2018 |
20190149705 | ULTRAVIOLET MIRROR DEVICE AND METHOD THEREFOR USING PORTABLE TERMINAL | 05-16-2019 |
20220136964 | ATOMIC ABSORPTION SPECTROMETER - The present disclosure relates to an atomic absorption spectrometer for analyzing a sample, including a radiation source unit for generating a measuring beam, an atomization unit for atomizing the sample such that the atomized sample is located in a beam path of the measuring beam, and a detecting unit for detecting absorption of the measuring beam. The radiation source unit includes at least one light-emitting diode. According to the present disclosure, the detection unit includes a polychromator arrangement, in particular a high-resolution polychromator arrangement, as a spectrometric arrangement. | 05-05-2022 |