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Ultraviolet light responsive means

Subclass of:

250 - Radiant energy

250336100 - INVISIBLE RADIANT ENERGY RESPONSIVE ELECTRIC SIGNALLING

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Class / Patent application numberDescriptionNumber of patent applications / Date published
250373000 With means to transmission-test contained fluent material 14
Entries
DocumentTitleDate
20090159808EUV light source components and methods for producing, using and refurbishing same - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.06-25-2009
20130043401Energy Sensors for Light Beam Alignment - An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.02-21-2013
20080258070EUV ILLUMINATION SYSTEM WITH A SYSTEM FOR MEASURING FLUCTUATIONS OF THE LIGHT SOURCE - The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.10-23-2008
20110192985EUV LIGHT SOURCE COMPONENTS AND METHODS FOR PRODUCING, USING AND REFURBISHING SAME - A method is disclosed for in-situ monitoring of an EUV mirror to determine a degree of optical degradation. The method may comprise the steps/acts of irradiating at least a portion of the mirror with light having a wavelength outside the EUV spectrum, measuring at least a portion of the light after the light has reflected from the mirror, and using the measurement and a pre-determined relationship between mirror degradation and light reflectivity to estimate a degree of multi-layer mirror degradation. Also disclosed is a method for preparing a near-normal incidence, EUV mirror which may comprise the steps/acts of providing a metallic substrate, diamond turning a surface of the substrate, depositing at least one intermediate material overlying the surface using a physical vapor deposition technique, and depositing a multi-layer mirror coating overlying the intermediate material.08-11-2011
20100163743PARTIAL DISCHARGE MEASURING APPARATUS USING UV SENSOR ARRAY AND METHOD THEREOF - Disclosed herein is a method and apparatus for measuring partial discharge using a UV sensor array. The apparatus includes a UV sensor array including plural sensors detecting UV rays from an analyzing target of a power facility at a location separated a predetermined distance from the target and converting the UV rays into discharge current, an image measurement unit measuring the distance between the sensor array and the target and supplying an actual image of the target, a UV intensity detection unit measuring intensity of the discharge current converted from the UV rays detected by the sensor array, and a UV location detection unit analyzing and outputting a UV emitting location obtained by matching the discharge current intensity measured by the UV intensity detection unit to combined data of the actual image of the target supplied from the image measurement unit and sensor locations of the sensor array.07-01-2010
20130026382PHOTOVOLTAIC UV DETECTOR - A photovoltaic UV detector configured to generate an electrical output under UV irradiation. The photovoltaic UV detector comprises a first layer comprising an electrically polarized dielectric thin layer configured to generate a first electrical output under the UV irradiation; and a second, layer configured to form an electrical energy barrier at an interface between the second layer and the first layer so as to generate a second electrical output under the UV irradiation, the second electrical output having a same polarity as the first electrical output, the electrical output of the photovoltaic UV detector being a sum of at least the first electrical output and the second electrical output. The electrically polarized dielectric thin layer may be a ferroelectric thin film, which may comprise PZT or PZLT. The second layer may be a metal and the electrical energy barrier may be a Schottky barrier.01-31-2013
20130026381DYNAMIC, REAL TIME ULTRAVIOLET RADIATION INTENSITY MONITOR - An apparatus and method for detecting an intensity of radiation in a process chamber, such as an ultraviolet curing process chamber, is disclosed. An exemplary apparatus includes a process chamber having a radiation source therein, wherein the radiation source is configured to emit radiation within the process chamber; a radiation sensor attached to the process chamber; and an optical fiber coupled with the radiation source and the radiation sensor, wherein the optical fiber is configured to transmit a portion of the emitted radiation to the radiation sensor, and the radiation sensor is configured to detect an intensity of the portion of the emitted radiation via the optical fiber.01-31-2013
20130056642METHOD AND APPARATUS FOR MEASURING AERIAL IMAGE OF EUV MASK - An aerial image measuring apparatus includes an extreme ultra-violet (EUV) light generation unit configured to generate EUV light, a moving unit configured to mount an EUV mask and to move the EUV mask in x and y axis directions, a primary reduction optics configured to primarily reduce a divergence of the EUV light generated by the EUV light generation unit, a secondary reduction optics configured to secondarily reduce the divergence of the primarily reduced EUV light, and a detection unit configured to sense energy information from the secondarily reduced EUV light reflected from the plurality of regions on the EUV mask, the secondarily reduced EUV light being incident on and reflected from a plurality of regions on the EUV mask.03-07-2013
20120112085EXPOSURE AMOUNT EVALUATION METHOD AND PHOTOMASK - According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate.05-10-2012
20130062530BIOCHEMICAL MATERIAL DETECTION SYSTEM - A biochemical material detection system is provided, which is used to detect biochemical materials. A material to be detected is placed above a sensor module in the system. A light source is guided in by a light emitting device to measure a refractive index of the material to be detected or other parameters related to the material to be detected. Furthermore, a heat source generated by the light emitting device in the system is further isolated outside the sensor module, thereby preventing the heat source from influencing a sensed result to improve the accuracy of the sensed result.03-14-2013
20120235049EUV ACTINIC RETICLE INSPECTION SYSTEM USING IMAGING SENSOR WITH THIN FILM SPECTRAL PURITY FILTER COATING - An extreme ultraviolet (EUV) actinic reticle imaging system suitable for discharge produced plasma (DPP) or laser produced plasma (LPP) reticle imaging systems using a thin film coating spectral purity filter (SPF) positioned on or proximate to the EUV imaging sensor; an EUV imaging sensor carrying this SPF; and methods for making and using the SPF for reticle inspection. The coating may be applied to the imaging sensor in any manner suitable for the particular coating selected. The coating may be composed of a single layer or multiple layers. Typical SPF coating materials include zirconium (Zr) and silicon-zirconium (Si/Zr) in a thickness between 10 nm and 100 nm.09-20-2012
20120235048FLAT PANEL DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME - A flat panel display apparatus includes a panel including an image region on which an image is realized, a window covering the panel, a black matrix formed in the window along a side edge of the image region, and a resin layer that is ultraviolet (UV) curable and that bonds the panel and the window. The black matrix includes a black ink part for blocking UV rays, and a diffusion ink part for transmitting UV rays. In the flat panel display apparatus, the resin layer for window bonding is sufficiently cured in all regions, including a region thereof under the black matrix, so that a bonding defect in the window due to insufficient curing of the resin layer is significantly decreased.09-20-2012
20120211664RADIATION FAILURE INSPECTING METHOD AND RADIATION FAILURE INSPECTING APPARATUS - A radiation failure inspecting method includes acquiring read data when a scanner reads a radiation surface of a radiation unit in a state where a reading surface of the scanner faces the radiation surface of the radiation unit and the radiation unit emits light; acquiring a value corresponding to a radiation energy of the light from the radiation unit by integrating the read data in a direction corresponding to a predetermined direction on the read data; and determining that a radiation failure occurs in the radiation unit when the value corresponding to the radiation energy of the light is equal to or less than a threshold value.08-23-2012
20100171040OPTICAL RADIATION SENSOR SYSTEM - An optical radiation sensor system having: a housing having a distal portion for receiving radiation from the radiation source and a proximal portion; a sensor element in communication with the proximal portion, the sensor element configured to detect and respond to incident radiation received from the radiation source; and motive structure configured to move the housing with respect to the sensor element between at least a first position and a second position. A radiation pathway is defined between the radiation source and the sensor element when the housing is in at least one of the first position and the second position. Movement of the housing with respect to the sensor element causes a modification of intensity of radiation impinging on the sensor element.07-08-2010
20110284756DETECTOR FOR DUAL BAND ULTRAVIOLET DETECTION - The invention concerns a single detector with two designable wavelengths and bandwidths for ultraviolet detection based on n11-24-2011
20090294684ULTRAVIOLET INTENSITY DETECTING METHOD, FABRICATING DISPLAY APPARATUS METHOD AND DISPLAY APPARATUS USING THE SAME - A display apparatus is provided. The display apparatus is used for detecting an ultraviolet (UV) intensity. The display apparatus includes a lower-substrate, an upper-substrate and a processing unit. The lower-substrate includes a first, a second and a third photo sensors for detecting an intensity of the light in a first, a second and a third bands and converting the intensity of the light in the first, the second and the third bands into a first, a second and a third currents respectively, wherein the ranges of the second and the third bands are comprised within the range of the first band. The upper-substrate is disposed opposite to the lower-substrate. The processing unit is coupled to the first, the second and the third photo sensors, for receiving and processing the first, the second and the third currents so as to obtain the UV intensity.12-03-2009
20120292521TWO-DIMENSIONAL SOLID-STATE IMAGING DEVICE - A camera system with a two-dimensional solid-state imaging device having pixel regions arranged in a two-dimensional matrix, wherein each pixel region has a plurality of subpixel regions, a metal layer with an opening of an opening size smaller than the wavelength of an incoming electromagnetic wave and a photoelectric conversion element are arranged with an insulating film interposed therebetween, at least one photoelectric conversion element is arranged in the opening provided at a portion of the metal layer in each subpixel region, a projection image of the opening is included in a light receiving region of the photoelectric conversion element, the opening is arrayed so as to cause a resonance state based on surface plasmon polariton excited by the incoming electromagnetic wave, and near-field light generated near the opening in the resonance state is converted to an electrical signal by the photoelectric conversion element.11-22-2012
20090309037Systems and Methods for Simulating a Vehicle Exhaust Plume - A light emission system that comprises a light source that comprises at least one light emitting diode (LED) that provides ultraviolet light. The system also comprises a controller that controls the intensity of the ultraviolet light provided by the light source such that the ultraviolet light provided by the light source simulates a vehicle exhaust plume.12-17-2009
20110198509ULTRAVIOLET LIGHT EXPOSURE CHAMBER FOR PHOTOVOLTAIC MODULES - An apparatus for performing UV light exposure testing of solar panels, also known as PV modules, with superior exposure uniformity, equipment throughput, and floor space requirements, consisting of a chamber including a plurality of UV lamps in a lamp array, at least one target plane, and reflective panels positioned within the chamber to redirect UV light to the target plane(s).08-18-2011
20090294685SYSTEM FOR OVERLAY MEASUREMENT IN SEMICONDUCTOR MANUFACTURING - Provided is a system for overlay measurement in semiconductor manufacturing that includes a generator for exposing an overlay target to radiation and a detector for detecting reflected beams of the overlay target. The reflected beams are for overlay measurement and include at least two different beams.12-03-2009
20120091355SELECTIVE DETECTION OF AROMATIC ALPHA-AMINO ACIDS AND DERIVATIVES THEREOF - Provided here are complexes useful in the detection of aromatic alpha-amino acids and peptides incorporating aromatic alpha-amino acids, and methods for detecting aromatic alpha-amino acids and peptides incorporating aromatic alpha-amino acids. Accordingly, provided herein are complexes comprising a compound of Formula I:04-19-2012
20080251731METHOD AND APPARATUS FOR PULSED UV MEASUREMENT - A detector receives energy pulses and a lossy integration circuit generates a lossy integration that, for each pulse, increases over the pulse duration to a maximum value and then decays. The lossy integration is sampled, with a sampling rate and decay rate such that the sample is within a given acceptable error of the maximum value. The sample represents the pulse total energy, within the given acceptable error. An optional circuit and processing function calculates a total accumulated energy over a plurality of pulses.10-16-2008
20120292522METHOD FOR DETERMINING THE CONCENTRATION OF NITRIC ACID - The present invention relates to the field of wet chemical treatment of silicon substrates. The invention particularly relates to a method for the determination of the concentration of nitric acid in aqueous process solutions as being used for the treatment of substrates such as those made from silicon. The method is based on the determination of nitrate by means of UV spectroscopy/photometry with the aid of eliminating agents which effectively remove disturbing absorptions caused by other substances. Therein, the concentration of nitrate corresponds to that of nitric acid.11-22-2012
20110204249EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.08-25-2011
20080308740Method of Measuring The Colour of Printed Samples Containing Brighteners - To measure the colour of samples printed on a substrate containing brightener, a first spectral proportion of the total spectral reflection factor of the sample is measured by illuminating the sample with light having no UV element. From this first spectral proportion, a spectral correction factor is calculated making allowance for the characterisation data of the brightened substrate and the spectral properties of a selected type of illuminating light. The spectral correction factor is added to the first spectral proportion in order to obtain the total spectral reflection factor of the measured sample. The total spectral reflection factor is then evaluated for measuring and control purposes, in particular for calculating colour values of the sample. The characterising data of the substrate is determined on the basis of measurements taken with illuminating light with no UV element and with UV light only on a limited set of measurement samples, especially on the non-printed substrate only (paper whiteness). The measuring method has the advantages of a double measurement, which it requires physically but on a significantly reduced sample set only, which speeds up the measuring procedure considerably. The measurements needed for characterising the substrate may also be run with a separate measuring device, so that the measuring method can easily be implemented in existing colour measuring devices with interchangeable measuring filters or different light sources.12-18-2008
20080258069Exposure device - The present invention relates to an exposure device for forming predetermined patterns onto an object. The exposure device includes an optical source for emitting a ray, an aperture member including first and second opening windows and a detection window, first and second reflective optical elements for reflecting the first and second light beams that have passed through the first and second opening windows, respectively, and an optical sensor for detecting intensity of the ray from the optical source which has passed through the detection window, the optical sensor being placed close to an area between the first and second reflective optical elements.10-23-2008
20080265170UV detection devices and methods - A portable UV detection apparatus is disclosed. In one embodiment, the UV detection apparatus includes a UV detection device integrated with a skin type measuring device. A controller can be included in the apparatus that is in communication with the skin type measuring device and the UV detection device. The controller can provide information to the user regarding the amount of ultraviolet radiation present in the environment. In an alternative embodiment, the UV detection apparatus includes a UV detection device in conjunction with a light sensor. The light sensor can be configured to activate the UV detection device should light at a particular intensity be present in the environment. The UV detection device as described above can be configured to measure UVA radiation, UVB radiation, and/or UVC radiation.10-30-2008
20090184254ULTRAVIOLET SENSOR AND METHOD OF MANUFACTURING ULTRAVIOLET SENSOR - An ultraviolet sensor capable of separately detecting amount of ultraviolet irradiation of two wavelength range of a UV-A wave and a UV-B wave is provided. The ultraviolet sensor includes: a pair of photodiodes in which a high concentration P-type diffusion layer formed by diffusing a P-type impurity with a high concentration and a high concentration N-type diffusion layer formed by diffusing an N-type impurity with a high concentration, which are formed in a first silicon semiconductor layer on an insulation layer, are opposed to each other with a low concentration diffusion layer, which is formed in a second silicon semiconductor layer thinner than the first silicon semiconductor layer by diffusing one of the P-type impurity or the N-type impurity with a low concentration, interposed therebetween; an interlayer insulation film which is formed on the first and second silicon semiconductor layers; a filter film which is formed on the interlayer insulation layer of one of the photodiodes and formed of a silicon nitride film transmitting rays of a wavelength range of the UV-A wave or a longer wave; and a sealing layer which covers the interlayer insulation film of the other of the photodiodes and the filter film and transmits rays of the wavelength range of the UV-B wave or a longer wave.07-23-2009
20110220806Radiation Detector - A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target.09-15-2011
20090101829SENSOR, SYSTEM, AND METHOD FOR AN ULTRAVIOLET LAMP SYSTEM - A light sensor for an ultraviolet lamp system of the type having an electrodeless lamp excited by microwave energy includes a detector configured to detect light generated by the electrodeless lamp. An elongated channel is configured to be interposed between the detector and the electrodeless lamp. The elongated channel has a first aperture and a second aperture defined at opposing ends thereof. The first aperture is configured to receive light generated by the electrodeless lamp. The second aperture is positioned proximate the detector to transmit at least a portion of light received in the first aperture to the detector.04-23-2009
20090212227Activation Device for Activatable Indicators Used in Product Labelling - The invention relates to an activation device for temperature-sensitive and/or time-sensitive indicators for product labelling, said indicators being activated by UV light and said device comprising a UV light source. The device is equipped with a controller/regulator, which can be used to control and/or regulate the irradiation period and/or the irradiation intensity of the UV light source.08-27-2009
20100181490OPTICAL METHOD AND SYSTEM UTILIZING OPERATING WITH DEEP OR VACUUM UV SPECTRA - An apparatus and method are presented for use in optical processing of an article. The apparatus comprises: one or more optical windows for directing predetermined electromagnetic radiation therethrough to illuminate a region of interest and collecting radiation returned from the illuminated region; and two or more ports operable for inputting or discharging one or more gases from the vicinity of the region of interest on the article being processed to create in the vicinity of said region a substantially static state of environment, non-absorbable for said electromagnetic radiation, thereby reducing amount of ambient gas in the vicinity of said region of interest and enabling optical processing of the article while maintaining it in the ambient gas environment.07-22-2010
20090078880Ultraviolet sensor - An ultraviolet sensor has an ultraviolet detection diode having a depletion region 03-26-2009
20100012849DETECTOR FOR DUAL BAND ULTRAVIOLET DETECTION - The invention concerns a single detector with two designable wavelengths and bandwidths for ultraviolet detection based on n01-21-2010
20100176304INCIDENCE SURFACES AND OPTICAL WINDOWS THAT ARE SOLVOPHOBIC TO IMMERSION LIQUIDS - Optical windows are provided that transmit light such as deep-UV (DUV) light. An exemplary window includes a window substrate that is transmissive to at least one wavelength of the light. The window substrate has an incidence surface decorated with sub-wavelength asperities arranged so as to render the incidence surface solvophobic to the light-transmissive liquid. The arrangement of sub-wavelength asperities can be configured to render the incidence surface super-solvophobic to the liquid. The sub-wavelength asperities can have any of various shapes and combinations thereof, and can be regularly or irregularly arranged.07-15-2010
20120138809Apparatus and method for detecting the presence of a flame - Apparatus for detecting the presence of a flame using a UV tube which can be supplied with a DC voltage via an operating resistor, at least two UV tubes which are arranged in this manner and have substantially the same field of vision being provided, and the two UV tubes being able to be switched on and off in succession with a gap of a predefined time within a predetermined interval of time via a controller, with the result that the UV tubes are switched on for a predeterminable period of time, the number of pulses obtained from each UV tube being able to be recorded and compared with one another, the anode of the respective UV tube being able to be connected to earth potential between the operations of switching the UV tubes off and on in order to draw ionization in the discharge area.06-07-2012
20120193547LASER PRODUCED PLASMA EUV LIGHT SOURCE - An EUV light source is disclosed which may comprise a plurality of targets, e.g., tin droplets, and a system generating pre-pulses and main-pulses with the pre-pulses for irradiating targets to produce expanded targets. The system may further comprise a continuously pumped laser device generating the main pulses with the main pulses for irradiating expanded targets to produce a burst of EUV light pulses. The system may also have a controller varying at least one pre-pulse parameter during the burst of EUV light pulses. In addition, the EUV light source may also include an instrument measuring an intensity of at least one EUV light pulse within a burst of EUV light pulses and providing a feedback signal to the controller to vary at least one pre-pulse parameter during the burst of EUV light pulses to produce a burst of EUV pulses having a pre-selected dose.08-02-2012
20100252745GENERATION AND DETECTION OF FREQUENCY ENTANGLED PHOTONS - An ultraviolet laser generates a coherent beam, which is downconverted to produce pairs of frequency-entangled photons. For each entangled pair, a first photon is sent along a first path and a second photon is sent along a second path. A first detector detects those photons sent along the first path, and a second detector detects those photons sent along the second path. The detection is performed in a single photon regime. Coincidence counting is performed on outputs of the detectors, including comparing leading edges on outputs of the first and second detectors within a time window.10-07-2010
20110057113DETECTING DEVICE AND OPTICAL APPARATUS INCLUDING THE DETECTING DEVICE - A detecting device includes a wavelength dispersion element for dispersing light into wavelengths and for emitting dispersed light, a photodetector for detecting the dispersed light, and a wavelength restriction element, which is arranged between the wavelength dispersion element and the photodetector and has an optical characteristic dependent on a wavelength, for restricting an incidence of light having a particular wavelength to the photodetector. Light that is part of the dispersed light and includes the light having has the particular wavelength is incident to the wavelength restriction element.03-10-2011
20110127442METHOD AND DEVICE FOR GENERATING EUV RADIATION OR SOFT X-RAYS - The present invention relates to a method and device for generating optical radiation, in particular EUV radiation or soft x-rays, by means of an electrically operated discharge. A plasma (06-02-2011
20100301225Method and Apparatus for Accurate Calibration of VUV Reflectometer - A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.12-02-2010
20100001199METHOD OF MEASURING PHASE OF PHASE SHIFT MASK - In a method of measuring a phase of a phase shift mask, initial extreme ultraviolet (EUV) light is divided into secondary EUV light portions. The secondary EUV light portions are irradiated onto the phase shift mask as incident EUV light portions, and the phase of the phase shift mask is measured from reflected incident EUV light portions.01-07-2010
20110240871FLAME SENSOR - A flame sensor is provided with a focusing member. Ultraviolet light emitted from a tight source is reflected by an inner surface of the focusing member to be focused on an electrode of an electrode pair, to increase the sensitivity.10-06-2011
20100012850ULTRAVIOLET RADIATION DETECTOR AND APPARATUS FOR EVALUATING ULTRAVIOLET RADIATION PROTECTION EFFECT - An ultraviolet radiation detector 01-21-2010
20090218505EVALUATION METHOD AND FABRICATION METHOD OF OPTICAL ELEMENT HAVING MULTILAYER FILM, EXPOSURE APPARATUS HAVING THE MULTILAYER FILM, AND DEVICE FABRICATION METHOD - A fabrication method of an optical element having a multilayer film includes the steps of forming a multilayer film on a substrate, measuring a secondary radiation radiated from the multilayer film when a light with a wavelength of 2 to 40 nm is irradiated to the multilayer film, determining a phase difference between the light irradiated to the multilayer film and the light reflected from the multilayer film based on a measurement result of the measuring step, and modifying the multilayer film based on the determined phase difference.09-03-2009
20090230313LIGHT QUANTITY MEASURING DEVICE AND METHOD FOR MEASURING LIGHT QUANTITY - A light quantity measuring device includes a first light reception element, a second light, reception element, an identification circuit, and a selection circuit. The first light reception element receives a predetermined incident light at a first light reception surface. The second light reception element receives the incident light at a second light reception surface, which is oriented in the same direction as the first light reception surface. The identification circuit identifies an incident angle of the incident light with respect to the first light reception surface. The selection circuit, when the incident angle differs from a desired incident angle, selectively electrically connects an output portion of the second light reception element to an output portion of the first light reception element.09-17-2009
20080203315Apparatus having an input device and a display, method of controlling apparatus and computer-readable recording medium - According to an aspect of an embodiment, an apparatus having an input device for inputting information and a display for displaying information comprises, a storage for storing information corresponding to an ultra violet ray intensity in association with location information and time information and a processor for obtaining information of an ultra violet ray intensity on the basis of location information and time information inputted by the input device in reference to the information stored in the storage, and for displaying the obtained information of the ultra violet ray intensity on the display.08-28-2008
20080203314Prism spectrometer - An optical spectroscopy tool is provided. In one embodiment a highly efficient means by which moderate resolution spectroscopy may be performed in the vacuum ultraviolet (VUV) is described. In one embodiment the techniques can be used as a high throughput spectrometer to spatially disperse wavelengths in and around the VUV in such a manner as to generate a substantially flat field focal plane, suitable for use in combination with an array detector. Some embodiments utilize prism based spectrometers. Some embodiments utilize detector elements that may be movable and/or located within the spectrometer. In some embodiments, collimated light may be provided as an input to the spectrometer.08-28-2008
20110095196Sensor system for constantly monitoring an irradiance level of a UV lamp and for being operated by power from a sensor thereof - A sensor system that constantly monitors an irradiance level of a UV lamp and is operated by power from a sensor thereof, wherein the UV lamp is powered by a ballast. The sensor system includes a current sensor, a UV sensor, a voltage comparator, and a display. The current sensor is disposed in the electronic assembly and picks-up current from the ballast, and in response thereto, powers the voltage comparator. The UV sensor is disposed externally to the assembly and picks-up the irradiance from the UV lamp. The voltage comparator is disposed in the electronic assembly, is in electronic communication with the current sensor and the UV sensor, is powered by the current sensor, and compares voltage from the UV sensor to a predetermined value. The display is visible from the electronic assembly, is in electronic communication with the voltage comparator, and indicates result of comparison of the voltage comparator to thereby determine status of the UV lamp.04-28-2011
20100148083SPECTROPHOTOMETER AND METHOD - A spectrophotometer includes a plurality of LEDs arranged in a circular array, each having a calibrated power input determined by the use of pulse width modulation and each having a unique wavelength band determined by the utilization of a unique fluorescent phosphor coating or lens. At least one of the LEDs comprising a phosphor-free high energy UV LED. Light reflected to the spectrophotometer is divided into predetermined wavelength ranges through the utilization of a linear variable filter and photo detectors wherein the analog signal from a photo detector is converted to a digital value through the use of auto-ranging gain technique.06-17-2010
20120305787Apparatus and Method for Area Disinfection Using Ultraviolet Light - A surface disinfection system comprising a plurality of independently placeable and controllable portable ultraviolet light emitting assemblies (ULAs), and a control station for remotely controlling the plurality of light assemblies. A cart housing the control station includes a dock for storing and transporting the assemblies. Each assembly includes a tubular UV-C lamp mounted on a portable base unit that includes electronic components for generating power to the lamp, detecting motion within the room being sterilized, detecting fluence levels and for audible alarm, and for wireless communication with the control station which is located outside the room during operation of the system. Using a plurality of ULAs permits strategic placement of the radiation sources to minimize shadows and thereby provides a thorough degree of disinfection. Independent control of the ULAs permits shutting down any unit to minimize the exposure to which UV-degradable materials are subject by repeated disinfections over time.12-06-2012
20120061579Inline Sensor Light Source with Solid State UV Emitter - Light source for an inline sensor having one or more solid state UV emitters for emitting light at single wavelengths in the range of 240 to 400 nm. The light emitted by each of the emitters has a bandwidth on the order of 10-20 nm and is directed toward a measurement detector in the inline sensor. The UV emitters are enclosed in a housing which can be attached to the inline sensor, with a reference detector and a regulator for the UV emitters also within the housing, and an aperture through which the light passes from the emitters to the measurement detector.03-15-2012
20120205546OPTICAL IMAGING SYSTEM WITH LASER DROPLET PLASMA ILLUMINATOR - A wafer inspection system includes a laser droplet plasma (LDP) light source that generates light with sufficient radiance to enable bright field inspection at wavelengths down to 40 nanometers. Light generated by the LDP source is directed to the wafer and light from the illuminated wafer is collected by a high NA objective with all reflective elements. A detector detects the collected light for further image processing. The LDP source includes a droplet generator that dispenses droplets of a feed material. An excitation light generated by a laser is focused on a droplet of the feed material. The interaction of the excitation light with the droplet generates a plasma that emits illumination light with a radiance of at least 10 W/mm08-16-2012
20100096559ULTRAVIOLET DETECTOR AND DOSIMETER - A UV light detector is disclosed that has a UV sensing element comprising a substrate and a thin film layer formed on the substrate. The thin film layer is for receiving and converting UV light into electricity for a photovoltaic output. First and second electrodes are formed on one surface of the thin film layer and are configured to form an electric polarization in the thin film layer between the first and second electrodes and to collect the photovoltaic output. There is also an amplifier and an output display. The UV sensing element is configured to collect the photovoltaic output, the amplifier being configured to receive the photovoltaic output from the UV sensing element, the output display being configured to provide a display when UV light is received at the one surface, the display being derived from the photovoltaic output. A UV dosimeter is also disclosed.04-22-2010
20120153179PRODUCT EFFECTIVENESS MONITORING DEVICE - A monitoring device (06-21-2012
20120161022APPARATUS FOR CONTINUOUS IN SITU MONITORING OF ELEMENTAL MERCURY VAPOUR, AND METHOD OF USING SAME - An apparatus and method operable for the continuous monitoring of a gas stream including an optical sensor operable to monitor and/or measure Hg concentrations in a flue gas by calculating the absorbance of the ultraviolet light thereby at a range of wavelength 253.7 nm+/−0.05 nm. The apparatus therefore provides as a spectrally narrow UV light source, a mercury lamp. The spectrally broad UV light source includes a UV LED. A 2×2 coupler is provided to mix the narrow and broad UV light energy which is propagated through the gas stream. The invention recognizes that measurement of radiation absorption at the 254 nm+/−1.5 nm range will result in not only from Hg06-28-2012
20120161021MEASURING IN-SITU UV INTENSITY IN UV CURE TOOL - Provided are improved apparatus and methods for radiative treatment. In some embodiments, a semiconductor processing apparatus for radiative cure includes a process chamber and a radiation assembly external to the process chamber. The radiation assembly transmits radiation into the chamber on a substrate holder through a chamber window. A radiation detector measures radiation intensity from time to time. The assembly includes a gas inlet and exhaust operable to flow a radiation-activatable cooling gas through the radiation assembly.06-28-2012
20100288937EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.11-18-2010
20120126134DISINFECTION DEVICE AND METHOD - An ultraviolet area sterilizer or disinfector is incorporated into a building structure where concern exists regarding the presence of pathogenic bacteria on environmental surfaces. Ultraviolet C (UV-C) generators generate UV-C that is directed to architectural partitions of an enclosed area. The architectural partitions reflect UV-C to kill pathogens in the enclosed area. The device transmits a calculated dose of UV-C from a fixture mounted to an architectural partition in the enclosed area. Once an effective cumulative dose of UV-C has been reflected to radiation sensors, as measured by the sensors, the device shuts down. The device allocates power to specific UV-C emitters so as to direct UV-C radiation more uniformly throughout the area, as measured by the sensors.05-24-2012
20120168634Device And Method For Determining The Properties Of Aerosol Formulations07-05-2012
20100308232STERILIZATION DEVICE AND LAMP HOLDER THEREFOR - A device for subjecting air to UV(C) radiation comprises a UV(C) treatment chamber comprising a UV(C) source, a measuring device comprising one or more of a temperature sensor which measures the temperature on the wall of the UV(C) source; two temperature sensors downstream and upstream of the UV(C) source; and a UV(C) sensor for determining the intensity of the UV(C) radiation. The UV(C) source comprises at least one UV(C) lamp which is held by a lamp holder. The lamp holder comprises positioning elements for holding the measuring device and the lamp(s) in a fixed position. Electrical supply wires and signal wires are arranged such that they are shielded from the radiation from the UV(C) lamp(s).12-09-2010
20100051822Broad band referencing reflectometer - A spectroscopy system is provided which is optimized for operation in the VUV region and capable of performing well in the DUV-NIR region. Additionally, the system incorporates an optical module which presents selectable sources and detectors optimized for use in the VUV and DUV-NIR. As well, the optical module provides common delivery and collection optics to enable measurements in both spectral regions to be collected using similar spot properties. The module also provides a means of quickly referencing measured data so as to ensure that highly repeatable results are achieved. The module further provides a controlled environment between the VUV source, sample chamber and VUV detector which acts to limit in a repeatable manner the absorption of VUV photons. The use of broad band data sets which encompass VUV wavelengths, in addition to the DUV-NIR wavelengths enables a greater variety of materials to be meaningfully characterized. Array based detection instrumentation may be exploited to permit the simultaneous collection of larger wavelength regions.03-04-2010
20120175524SENSING UV DOSAGE OF A FLUID STREAM - Devices and Methods for sensing UV dosage of a fluid stream are described. In a first aspect, a device 07-12-2012
20120256096METHOD AND DEVICE FOR MONITORING MOVING OBJECTS - A method and a device for monitoring objects moving along a trajectory. The objects include a section that is transparent or translucent. The objects subsequently cross a light beam at the section. The presence or absence of an object is determined during a transitional time period during which substantially no light or light within a wavelength range substantially untransmittable through the section is detected. A monitoring device generates an output signal based on the light detection indicating the presence or absence of an object.10-11-2012
20110121193INSPECTION OF EUV MASKS BY A DUV MASK INSPECTION TOOL - A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.05-26-2011
20120318996GAS DISCHARGE LAMP WITH AN AXIALLY EXTENDING STRIP OF GETTER AND METHOD OF MANUFACTURE - A gas discharge lamp, photoionization sensor employing the gas discharge lamp, and method of manufacturing the lamp. The lamp includes a longitudinally extending strip of getter within the housing.12-20-2012
20120326046WEARABLE RADIATION DETECTOR - Provided herein are a wearable radiation detector and a method of controlling thereof, the detector including: the radiation collection unit operable to collect light and output a signal corresponding to the light collected; a memory; a display unit; a processor operable to receive the signal output by the radiation collection unit, to store a value in the memory corresponding to the signal output by the radiation collection unit, to output an output signal based at least on the signal corresponding to the light collected by the radiation collection unit and to control the display unit to display an indication corresponding to the output signal, wherein the determining includes continually calculating the maximum exposure level based on the light being received by the radiation collection unit.12-27-2012
20120280134MONITORING OF THE PRESENCE OF TWO FLAMES IN A FUEL COMBUSTION DEVICE - A monitoring device has a first flame detector, to receive a first batch of radiation, which is emitted by the first flame, a second flame detector, to receive a second batch of radiation, which is emitted by the second flame, a voltage supplying device to apply an alternating voltage with a first half wave and a second half wave to the two flame detectors and an evaluation circuit that is connected to the two flame detectors via a signal input. A first measurement signal that is present at the common signal input during the first half wave is indicative of the intensity of the first batch of radiation. A second measurement signal that is present at the common signal input during the second half wave is indicative of the intensity of the second batch of radiation. The evaluation circuit independently evaluates the first measurement signal and the second measurement signal.11-08-2012
20130015362FLUID PURIFICATION AND SENSOR SYSTEMAANM HOOPER; Stewart EdwardAACI OxfordAACO GBAAGP HOOPER; Stewart Edward Oxford GBAANM SMEETON; Tim MichaelAACI OxfordAACO GBAAGP SMEETON; Tim Michael Oxford GBAANM EVANS; AllanAACI OxfordAACO GBAAGP EVANS; Allan Oxford GB - A system and method are disclosed for the simultaneous optical disinfection and detection of biological particles in a flowing fluid, such as air or water, medium. A light source for irradiating the flowing medium is a dual wavelength laser element simultaneously emitting a visible laser beam and an ultraviolet laser beam. In particular, a laser diode may generate a first visible laser light beam, and a second ultraviolet laser light beam may be generated by passing the first laser light beam through a frequency doubling crystal. Optical detectors measure scattering, fluorescence and/or transmission of the laser light beams from the air or water medium to determine the presence of biological particles in real-time.01-17-2013
20130020491PHOTODETECTOR DEVICE WITH PROTECTIVE AND ANTIREFLECTIVE COVER, AND MANUFACTURING METHOD THEREOF - The photodetector device includes a semiconductor body having a front surface, and an active-area region that extends in the semiconductor body facing the front surface and is configured for receiving a light radiation and generating, in response to the light radiation received, electric charge carriers. A polydimethylsiloxane cover layer extends on the front surface in the active-area region so that the light radiation is received by the active-area region through the cover layer.01-24-2013
20080224059Method for Determining an Integral Sun Protection Factor Encompassing Uva and Uvb Radiation - The invention relates to a method for determining an integral sun protection factor (∫SPF or iSPF) which encompasses both UVA and UVB radiation and can be used for classifying cosmetic and dermatological sunscreens. The method comprises the steps of applying a defined amount of the sunscreen onto a defined area of a skin substrate impregnated with a spin trap, exposing the skin substrate to a defined amount of UVA- and UVB rays by a sun simulator, subjecting the skin substrate exposed to radiation to an electron spin resonance (ESR) measurement, recording the number of free radicals trapped as a real number×1009-18-2008
20130200268ELECTRONICS FOR DETECTION OF A PROPERTY OF A SURFACE - Apparatus are provided for monitoring a condition of a surface based on a measurement of a property of the surface using a sensor. In an example, the property is performed using an apparatus disposed above the tissue, where the apparatus includes at least one coil structure formed from a conductive material, at least one other component, and at least one cross-link structure physically coupling a portion of the at least one coil structure to a portion of the at least one other component, the at least one cross-link structure being formed from a flexible material. The at least one other component can be a sensor component or a processor unit.08-08-2013
20130175452METHODS AND SYSTEMS FOR DISINFECTING POTABLE WATER SUPPLIES - The invention described herein contains two aspects, usable together or separately, that address the needs in the art described above, namely a first aspect that relates to the provision of a transportable water purification system that can be contained on a passenger transport vehicle, and that can use, but does not require, continuous, real-time monitoring, and a second aspect that relates to the use of UV purification of the water as it is uploaded to the passenger transport vehicle after a single pass through the UV chamber.07-11-2013
20130134318BEAM LINE FOR A SOURCE OF EXTREME ULTRAVIOLET (EUV) RADIATION - The invention relates to a beam line (05-30-2013
20130112887Method for Inspecting UV Illuminance in Multi-Level Bake Furnace for TFT-LCD Manufacturing Process and Pickup Assembly Device for Performing the Method - The present invention provides a method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process and a pickup assembly device for performing the method. The method for inspecting UV illuminance in multi-level UV bake furnace for TFT-LCD manufacturing process includes the following steps: Step 05-09-2013
20080197291OPTICAL RADIATION SENSOR SYSTEM - There is disclosed an optical radiation sensor system for detecting radiation from a radiation source. The system comprises: a housing having a distal portion for receiving radiation from the radiation source and a proximal portion; a sensor element in communication with the proximal portion, the sensor element configured to detect and respond to incident radiation received from the radiation source; and motive means configured to move the housing with respect to the sensor element between at least a first position and a second position. A radiation pathway is defined between the radiation source and the sensor element when the housing is in at least one of the first position and the second position. Movement of the housing with respect to the sensor element causes a modification of intensity of radiation impinging on the sensor element. In its highly preferred embodiment, the radiation sensor system is of a modular design rendering the sensor system appropriate for use with one or more of various radiation sources, fluid thickness layers and/or in UVT conditions. In this highly preferred form, the sensor system may have built-in diagnostics for parameters such as sensor operation, radiation source output, fluid (e.g., water) UVT, radiation source fouling (e.g., fouling of the protective sleeves surrounding the radiation source) and the like. Other advantages of the present radiation sensor system include: incorporation of an integrated reference sensor, safe and ready reference sensor testing, UVT measurement capability and/or relatively low cost and ease of manufacture.08-21-2008
20090218504RADIOMETER WITH SPECTRAL RESPONSE EQUIVALENT TO THE ERYTHEMA ACTION CURVE CIE, FOR MEASURING THE TOTAL EFFECTIVE IRRADIANCE - A radiometer for measuring the total effective UV radiance of the type comprising, in an optical pathway sequence, a diffuser, an interference filter and a detector. Said interference filter comprises a plurality of alternating layers of magnesium fluoride and zirconium oxide, where the diffuser/interference filter/detector system has a spectral response equivalent to the erythema action curve CIE.09-03-2009
20110278467WATER PURIFIER - The disclosed water purifier comprises an outer wall, a RAW water inflow section that allows inflow of RAW water from outside said outer wall, a purifying section, an ultraviolet ray sterilizing section that has an ultraviolet ray source, a purified water outflow section that allows purified water that has been purified in said purifying section and sterilized in said ultraviolet ray sterilizing section to flow to the outside of said outer wall, a condition-detecting unit, and a control unit that controls generation of ultraviolet rays from said ultraviolet ray source according to the detection by said condition-detecting unit.11-17-2011
20110309260CHAMBER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.12-22-2011

Patent applications in class Ultraviolet light responsive means

Patent applications in all subclasses Ultraviolet light responsive means