| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 219121540 | Control systems | 29 |
| 20080257869 | RESPONDING TO ARC DISCHARGES - For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed. | 10-23-2008 |
| 20100140231 | ARC RECOVERY WITH OVER-VOLTAGE PROTECTION FOR PLASMA-CHAMBER POWER SUPPLIES - A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time. | 06-10-2010 |
| 20090159576 | Automatic Compressor Adjustment System and Method for a Portable Cutting Torch System - A system is provided that includes a torch power unit that includes a compressor and a controller configured to adjust output of the compressor in response to feedback comprising compressor output, or altitude, or atmospheric pressure, or a combination thereof. A method is provided that includes adjusting operational parameters of a torch power unit to account for environmental conditions affecting performance of the torch power unit. A method of manufacturing a portable cutting torch system is also provided. Another system is provided that includes a plasma cutting circuit, a compressor, a motor coupled to the compressor, an interface, and an environmental feedback controller. | 06-25-2009 |
| 20130087536 | CONTROLLER FOR PROCESSING CORNER PART IN PROCESS PATH - A controller ( | 04-11-2013 |
| 20120234803 | FAILURE EVENT DETECTION IN A PLASMA ARC TORCH - A method of determining a failure event of consumable for a plasma torch is provided. The method includes monitoring at least one of an operating current or an operating voltage during a transfer arc mode of the plasma arc torch. The method also includes determining when at least one parameter associated with the operating current or the operating voltage exceeds a tolerance threshold for a time period indicative of the failure event. The method further includes shutting off at least one of the operating current or the operating voltage of the plasma arc torch when the at least one parameter exceeds the tolerance threshold for the time period. | 09-20-2012 |
| 20110284506 | HEAT TREATMENT APPARATUS - The present invention relates to a heat treatment apparatus that performs activation annealing or defect repair annealing and surface oxidization which succeed impurity doping intended to control the conductive property of a semiconductor substrate. In the present invention, a sample to be heated is placed on a lower electrode in a plasma treatment chamber. A gap between an upper electrode and the lower electrode is filled with a gap whose main raw material is a rare gas (helium, argon, krypton, xenon, or the like) having a pressure close to the atmospheric pressure. A power fed from a high-frequency power supply is applied to the upper electrode in order to induce an atmospheric-pressure glow discharge. Gas heating in the gap between the electrodes, which depends on the glow discharge, is used to heat-treat the sample to be heated. | 11-24-2011 |
| 20110284505 | APPARATUS AND METHOD FOR TEMPERATURE CONTROL OF A SEMICONDUCTOR SUBSTRATE SUPPORT - A recirculation system of a substrate support on which a semiconductor substrate is subjected to a multistep process in a vacuum chamber, the system comprising a substrate support having at least one liquid flow passage in a base plate thereof, an inlet and an outlet in fluid communication with the flow passage, a supply line in fluid communication with the inlet, and a return line in fluid communication with the outlet; a first recirculator providing liquid at temperature T | 11-24-2011 |
| 20090159575 | Plasma Cutter Having Microprocessor Control - A system is provided that includes a torch power unit, wherein the torch power unit includes a motor and a digital device coupled to the motor and configured to control the motor. A method of operation is provided that includes controlling one or more aspects of a torch power unit via a microprocessor, a digital signal processor, or a field programmable gate array, or a combination thereof. In another embodiment, a system is provided that includes a torch power unit that includes a torch, one or more components comprising a generator, a power converter, a compressor, a motor, a wire feeder, or a combination thereof, and a microprocessor configured to control the one or more components. | 06-25-2009 |
| 20100243620 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus performs plasma processing on a processing target in a processing chamber. The apparatus includes: an object to be heated provided near a periphery of a mounting table disposed in the processing chamber; and a heating electrode disposed adjacent to the periphery of the mounting table, for heating the object to be heated. A first coil having a first path and a second coil having a second path are wired close to each other in the heating electrode along the periphery of the mounting table. | 09-30-2010 |
| 20110240610 | METHODS OF AND APPARATUSES FOR MAINTENANCE, DIAGNOSIS, AND OPTIMIZATION OF PROCESSES - A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and may include a transducer coupled to the at least one sensing element. The transducer can be configured to receive a signal from the sensing element and convert the signal into a second signal for input to the information processor. | 10-06-2011 |
| 20090218324 | DIRECT REAL-TIME MONITORING AND FEEDBACK CONTROL OF RF PLASMA OUTPUT FOR WAFER PROCESSING - A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled to a signal generator, which converts the RF input signal to a constant control signal. A controller adjusts power input to the RF generator by comparing the control signal to a reference. | 09-03-2009 |
| 20090008369 | PROCESSING DEVICE - In a processing apparatus for performing a specified process on a target object at a predetermined process pressure, the apparatus includes an evacuable processing chamber having a gas exhaust port formed in a bottom portion thereof; a mounting table provided within the processing chamber for holding the target object; a pressure control valve connected to the gas exhaust port, the pressure control valve including a slide-type valve body for changing an area of an opening region of a valve port; and a gas exhaust system connected to the pressure control valve. The pressure control valve is eccentrically arranged such that a center axis of the mounting table lies within an opening region of the pressure control valve formed over a practical use region of a valve opening degree of the pressure control valve. | 01-08-2009 |
| 20100025384 | FIELD ENHANCED INDUCTIVELY COUPLED PLASMA (FE-ICP) REACTOR - Embodiments of field enhanced inductively coupled plasma reactors and methods of use of same are provided herein. In some embodiments, a field enhanced inductively coupled plasma processing system may include a process chamber having a dielectric lid and a plasma source assembly disposed above the dielectric lid. The plasma source assembly includes one or more coils configured to inductively couple RF energy into the process chamber to form and maintain a plasma therein, one or more electrodes configured to capacitively couple RF energy into the process chamber to form the plasma therein, wherein the one or more electrodes are electrically coupled to one of the one or more coils, and an RF generator coupled to the one or more inductive coils and the one or more electrodes. In some embodiments, a heater element may be disposed between the dielectric lid and the plasma source assembly. | 02-04-2010 |
| 20090230098 | METHOD FOR DETECTING CURRENT TRANSFER IN A PLASMA ARC - Methods and systems for transferring a plasma arc from between an electrode and a tip to between an electrode and a workpiece and back as dictated by the conditions at the cutting arc are provided. The present disclosure allows for arc transfer detection without use of a current sensor at the workpiece or knowledge of a precise pilot circuit limit value through a novel plasma arc control circuit. In one embodiment, the plasma arc control circuit provides a programmable current source and a current sink configured to limit current in a pilot arc control circuit. The pilot arc circuit may be configured to signal its limiting status to a controller, which may switch the pilot arc control circuit in or out of the current path. Certain embodiments may include a pulse width modulation control in the pilot arc control circuit for controlling current flow through the pilot arc circuit. | 09-17-2009 |
| 20090294414 | METHOD OF PLASMA LOAD IMPEDANCE TUNING FOR ENGINEERED TRANSIENTS BY SYNCHRONIZED MODULATION OF A SOURCE POWER OR BIAS POWER RF GERERATOR - A method processing a workpiece in a plasma reactor chamber in which a first one of plural applied RF plasma powers is modulated in accordance with a time-varying modulation control signal corresponding to a desired process transient cycle. The method achieves a reduction in reflected power by modulating a second one of the plural plasma powers in response to the time-varying modulation control signal. | 12-03-2009 |
| 20110155703 | UNIVERSAL INPUT POWER SUPPLY UTILIZING PARALLEL POWER MODULES - A universal power supply for use in a plasma arc system is disclosed. The power supply can include a plurality of power modules for providing a DC output from an AC input. Each of the power modules can include a rectifier, a converter, an inverter, an isolation transformer and an output rectifier. The power modules can include a power module controller configured to control at least one of the rectifier, the converter, or the inverter such that a DC output can be obtained from a wide variety of AC inputs. The power modules can be connected in parallel to provide a wide range of DC output currents for the power supply. The universal power supply can include a master controller coupled to each of the individual power module controllers to regulate the DC output current of the power supply by controlling the individual power module controllers. | 06-30-2011 |
| 20090026181 | RADIO FREQUENCY POWER SUPPLY - A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply. | 01-29-2009 |
| 20100051593 | DEVICE FOR MACHINING WORKPIECES - The invention relates to a device for machining, particularly for cutting, of electrically conductive workpieces using a machining tool ( | 03-04-2010 |
| 20120285935 | HEAT TREATMENT APPARATUS - Provided is a heat treatment apparatus in which a heat treatment apparatus in which the thermal efficiency is high, the maintenance expense is low, the throughput is high, the surface roughness of a sample can be reduced, and the discharge uniformity is excellent, although the heat treatment is performed at | 11-15-2012 |
| 219121550 | Gas supply | 6 |
| 20090159577 | Multi-Stage Compressor in a Plasma Cutter - Systems and methods are provided for a torch power system using a multi-stage compressor. In one embodiment, a system includes a torch power unit that includes a compressor having multiple compression stages. A method of operation is provided that includes compressing a gas via a multi-stage compressor in a torch power unit. A method of manufacturing a torch power unit is provided that includes providing a multi-stage compressor for a torch power unit and mounting the multi-stage compressor inside an enclosure of the torch power unit. Another system is provided that includes a plasma cutting circuit, a multi-stage compressor, a motor coupled to the compressor, and a compressor controller. | 06-25-2009 |
| 20090008370 | AUTOMATIC CONSUMABLE AND TORCH LENGTH DETECTION VIA PRESSURE DECAY - A system and method for a plasma system includes a plasma torch actuated by a trigger, a consumable installed in the plasma torch, and a gas flow system constructed to receive pressurized gas and provide a gas flow to the plasma torch. A gas flow regulating system is included and configured to regulate the gas flow, and a sensing device is included and configured to monitor a gas pressure in the plasma torch. The plasma system also includes a controller configured to receive a signal from the sensing device and to determine one of a length parameter of the plasma torch and a type of the consumable therefrom. | 01-08-2009 |
| 20090294415 | SYSTEM AND METHOD FOR START FLOW APPROACH CONTROL FOR A PROPORTIONAL VALVE IN A PLASMA CUTTER - A system and method for start flow approach control for a proportional valve in a plasma cutter is provided that includes a controller configured to determine a target gas pressure set point for a plasma cutting operation and determine a ramp pressure set point offset from the target gas pressure set point. The controller is also configured to apply a full-open drive signal to an air pressure-closing proportional valve and monitor a pressure of gas flow output from the air pressure-closing proportional valve via a sensing device. The controller is further configured to apply a ramping drive signal to the air pressure-closing proportional valve after the pressure of the gas flow has reached the ramp pressure set point and apply a target-pressure drive signal to the air pressure-closing proportional valve after the pressure of the gas flow has reached the target gas pressure set point. | 12-03-2009 |
| 20120012567 | Electronic Pressure Regulator - A system and method for regulating a gas flow of a plasma arc system. The system having a gas regulator that control gas flow from a gas source to the plasma torch system, a pilot input valve to fill a pilot chamber and a pilot dump valve to evacuate the pilot chamber, the pilot chamber mechanically coupled to the gas regulator through a pressure actuator, such that the gas flow pressure through the regulator is controlled using the pressure actuator and based on the pressure in the pilot chamber. | 01-19-2012 |
| 20100326966 | Multi-Gas Mixer and Device for Supplying Gas Mixture to Plasma Torch - A multi-gas mixer for supplying a gas mixture that can uniformly mix a plurality of gases according to the proportional percentages determined by the mass flow rate of each gas is disclosed. The multi-gas mixer comprises a mixer chamber, a plurality of gas inlets, a gas mixture outlet, and at least one gas rotating and mixing unit. The present invention also provides a method for controlling the percentage of each gas to be mixed by use of a plurality of mass flow rate controllers to control the gas flow to produce a gas mixture according to a predetermined proportionality. When the multi-gas mixer delivers a gas mixture to a high-speed plasma torch, the torch can be stably operated under a high voltage (>85V) and a medium current (<650 A) so that a long-arc, high-temperature and high-speed plasma flame can be generated. | 12-30-2010 |
| 20080210670 | METHOD AND APPARATUS FOR AUTOMATIC GAS CONTROL FOR A PLASMA ARCH TORCH - A method and apparatus for controlling a gas supply to a plasma arc torch uses a proportional control solenoid valve positioned adjacent the torch to manipulate the gas flow to the torch, thereby extending electrode life during arc transfer and shutdown. Swirl ring design can be simplified and gas supply and distribution systems become less complicated. The invention also allows manipulation of shield gas flow to reduce divot formation when making interior cuts. The system can be controlled with a digital signal processor utilizing a feedback loop from a sensor. | 09-04-2008 |
| 219121560 | Arc positioning | 1 |
| 20130087537 | TRANSLATIONAL TORCH HEIGHT CONTROLLER FOR A PLASMA ARC TORCH - A plasma arc torch is provided that includes a torch body and a torch height controller. The torch height controller includes a movable part mounted to the torch body and a fixed part connected to a robotic arm. The movable part and the torch body are biased toward a workpiece and are translational relative to the fixed part. | 04-11-2013 |
| 219121570 | Arc ignition | 3 |
| 20080203070 | ARC RECOVERY WITHOUT OVER-VOLTAGE FOR PLASMA CHAMBER POWER SUPPLIES USING A SHUNT SWITCH - A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc. | 08-28-2008 |
| 20090078686 | PLASMA ARC IGNITION USING A UNIPOLAR PULSE - A starting circuit for use with a plasma torch is provided including circuitry for initiating a pilot arc using a unipolar voltage impulse. A transformer is selectively coupled to a DC source so that an impulse is introduced using the same DC source used to maintain an established pilot arc. A method is provided wherein an arc can be initiated while at the same time the DC source is pre-loaded so that surge injection circuitry is not needed to sustain the arc while ramping to the full pilot arc current level. | 03-26-2009 |
| 20120298635 | PLASMA ARC TORCH WITH SECONDARY STARTING CIRCUIT AND ELECTRODE - A plasma arc torch includes an electrode, a tip, a third element, and a secondary power circuit. The electrode is disposed within the plasma arc torch and adapted for electrical connection to a cathodic side of a power supply. The tip is positioned distally from the electrode and adapted for electrical connection to an anodic side of the power supply during piloting. A plasma chamber is formed between the electrode and the tip. The third element is disposed near a proximal end of the plasma chamber. The secondary power circuit is disposed proximate the plasma arc torch and in electrical communication with the third element. The secondary power circuit is configured to generate a high voltage pulse on the third element using input to secondary power circuit to initiate a first arc to start the plasma arc torch. | 11-29-2012 |
