Class / Patent application number | Description | Number of patent applications / Date published |
134151000 | With spray or jet applying conduits or nozzles | 14 |
20080210274 | Multiple Wash Zone Dishwasher - The present invention relates to a dishwasher, and more particularly to a dishwasher having multiple wash zones. The dishwasher has an interior tub configured to provide an interior wash chamber for washing dishes. It also has a spray arm assembly configured to spray a first flow of wash liquid over a portion of the interior tub thereby providing a first wash zone. A spray manifold fixed adjacent a lower dish rack provided within the wash chamber is configured to provide a second flow of wash liquid toward the lower dish rack, thereby providing a second wash zone. | 09-04-2008 |
20100258147 | FILTER CLEANING APPARATUS AND FILTER CLEANING METHOD - A filter cleaning apparatus | 10-14-2010 |
20110226290 | APPARATUS FOR WET PROCESSING SUBSTRATE - An exemplary apparatus for wet processing a substrate includes a wet processing system and a water supplying system. The wet processing system includes a preliminary rinsing device, a final rinsing device, and a conveyor. The preliminary rinsing device includes a first tank and a first spraying system above the first tank. The final rinsing device includes a second tank and a second spraying system above the second tank. The conveyor is configured for conveying a substrate from the preliminary rinsing device to the final rinsing device. The water supplying system includes a supply pipe configured for supplying water to the second spraying system, a connecting system communicating the second tank and the first spraying system, and a drain pipe communicating with the first tank. | 09-22-2011 |
134152000 | For work having hollows or passages | 1 |
20130104944 | HEIGHT ADJUSTABLE CONDUIT FOR A DISHWASHING APPLIANCE | 05-02-2013 |
134153000 | Rotary, pivoted or swinging work holder | 10 |
20080264457 | Substrate Treatment Apparatus - A substrate treatment apparatus ( | 10-30-2008 |
20090107531 | High-Pressure Water Cleaning System - A high-pressure water cleaning system includes a cleaning main body, a support frame member having a length which is larger than a width of an object, the support frame member being supported at extended end portions thereof at both sides by bearing units and eccentric rotational shafts such that the support frame member is eccentrically rotatable, the eccentric rotatable shafts being configured to rotate to cause the support frame member to perform rotational motion, a plurality of high-pressure water ejecting nozzles which are arranged on the surface of the support frame member to be equally spaced apart from each other and are directed to face the object, and a drive device configured to cause the eccentric rotational shafts to rotate. The high-pressure water ejecting nozzles are supplied with the high-pressure water and eject the high-pressure water to the object being moved at the constant speed while performing the rotational motion. | 04-30-2009 |
20130233360 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus according to the present disclosure includes a substrate holding unit configured to be rotated and hold a substrate from a bottom side thereof with substrate being spaced apart horizontally, a rotation driving unit configured to rotate the substrate holding unit, and an air supply unit provided above the substrate and configured to supply air toward the substrate held by the substrate holding unit. The liquid processing apparatus also includes an air supply path including a suction port that inhales the air supplied from the air supply unit and supplies the air inhaled from the suction port to a space formed between the substrate holding unit and a bottom surface of the substrate held by the substrate holding unit. | 09-12-2013 |
20130233361 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus includes a substrate holding unit and an elevating member provided to ascend/descend with respect to the substrate holding unit. The substrate holding unit includes a holding base, and a first engagement member and a second engagement member which are provided to be movable in the holding base, and moved between an engaging position where the member is engaged with the peripheral edge of the substrate and a releasing position where the member releases the substrate. When the first contact unit connected to the first engagement member is in contact with a first portion to be contacted, the first engagement member is located at the engaging position. When the second contact unit connected to the second engagement member is in contact with a second portion to be contacted at a lower position than the first portion, the second engagement member is located at the engaging position. | 09-12-2013 |
20130263897 | Dielectric Window Cleaning Apparatuses - A dielectric window cleaning apparatus may be used for cleaning a dielectric window of a plasma processing device. The dielectric window cleaning apparatus may comprise a window support base, a fluid containing enclosure, a window rotating mechanism, a spray arm, and multiple fluid spraying nozzles. The fluid containing enclosure may include at least one overflow containment sidewall and may be located at least partially under and at least partially around a portion of the window support base. The window rotating mechanism may be operatively connected to the window support base and may rotate the window support base. The spray arm may be in fluid communication with a fluid source and may include a fluid flow channel. The multiple fluid spraying nozzles may each expel fluid from the fluid flow channel in a window cleansing spray. | 10-10-2013 |
20140090673 | CLEANING APPARATUS - This cleaning apparatus includes a rotation holding unit that holds and rotates an object; a cleaning fluid spray unit that sprays a cleaning fluid onto a spot-like cleaning region on the object, which is held by the rotation holding unit; a cleaning region moving unit that moves at least one of the rotation holding unit and the cleaning fluid spray unit to relatively move the cleaning region from the rotation center of the object toward the outer peripheral side thereof; a layered air current forming unit that forms a layered air current entering the surface of the object so as to cover the periphery of the cleaning region from a backward side in the direction of movement of the cleaning region relative to the rotation center; and a layered air current moving unit that relatively moves the incoming position of the layered air current while following the relative movement of the cleaning region. | 04-03-2014 |
20140116480 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - When a substrate W is processed, a cover member covers a peripheral portion of the upper surface of the substrate held by the substrate holding unit, and a central portion of the substrate located at an inner position than the peripheral portion in a radial direction is exposed without being covered by the cover member. A gap is formed between the lower surface of the cover member and the peripheral portion of the upper surface of the substrate held by the substrate holding unit. When the interior space of the cup is exhausted, a gas present above the interior space of the cup is introduced from a space enclosed by the internal peripheral surface of the cover member through the gap into the interior space of the cup. | 05-01-2014 |
20140299166 | SUBSTRATE GRIPPING DEVICE AND SUBSTRATE PROCESSING APPARATUS - A rotary table; a drive motor M configured to rotate the rotary table; a pin base supported by the rotary table; a pin fixing member configured to move closer to or away from C | 10-09-2014 |
20150090305 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus performs a liquid processing on a rotating substrate by supplying a processing liquid. Surrounding members surround a region including an upper space of a cup body surrounding the rotating substrate and provided with an opening above the substrate. An air flow forming portion forms a descending air flow from an upper side of the cup body. A bottom surface portion blocks between the cup body and the surrounding member along a circumferential direction. An exhaust port is provided above the bottom surface portion and outside the cup body to exhaust an atmosphere in a region surrounded by the surrounding members and the bottom surface portion. | 04-02-2015 |
20150364345 | METHOD AND APPARATUS FOR LIQUID TREATMENT OF WAFER SHAPED ARTICLES - In an apparatus for treating a wafer-shaped article, a spin chuck is provided for holding and rotating a wafer-shaped article. A liquid dispenser comprises a check valve positioned so as to prevent process liquid from dripping out of a discharge nozzle of the liquid dispenser. A valve seat of the check valve is at a distance in a range of 20 mm to 100 mm from an outlet opening of said discharge nozzle. | 12-17-2015 |