Class / Patent application number | Description | Number of patent applications / Date published |
134147000 | With movable work support and separate movable means to cause fluid motion (e.g., pump, splasher, agitator) | 6 |
20120174952 | Mask Cleaning Apparatus - A mask cleaning apparatus comprises: a bath containing a cleaning liquid; an ultrasonic wave generation unit for generating and applying ultrasonic waves to the cleaning liquid; a supporting member for supporting the mask; and a driving unit formed to rotate the mask in the bath. As a result, the mask cleaning apparatus achieves an improved mask cleaning capability. | 07-12-2012 |
20120204913 | EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, CLEANING APPARATUS, CLEANING METHOD, AND EXPOSURE METHOD - An exposure apparatus exposes a substrate with an exposure light through an exposure liquid. The exposure apparatus includes an optical element from which the exposure light exits; a stage which is movable on the light-exit side of the optical element; a certain member which is provided on the stage; and a vibration generator which vibrates the certain member to apply vibration to the liquid in the liquid immersion space formed on the certain member. It is possible to suppress the deterioration of the performance which would be otherwise caused by any contamination. | 08-16-2012 |
20130008476 | METHOD OF MEGASONIC CLEANING OF AN OBJECT - A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage. | 01-10-2013 |
20130139858 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus includes a transport section that transports a substrate in a predetermined direction, and an ultrasonic oscillation section that can clean the front surface side of the substrate by applying ultrasonic waves to the back surface of the substrate which is transported in the predetermined direction by the transport section. The ultrasonic oscillation section includes a liquid supply section that brings liquid into contact with the back surface of the substrate by surface tension, and a vibrator that applies ultrasonic vibrations to the liquid. | 06-06-2013 |
20140069471 | ROOT CROP WASHER - A root crop washer has a rotatable washing drum which is partially immersed in a water trough, and a stone separator mounted before an inlet of the drum. A loading hopper is provided for delivering a root crop to the stone separator. An elevator is mounted at an outlet of the washing drum for discharge of cleaned produce from an outlet of the washing drum. Rotating paddles within the stone separator impart a swirling motion about a vertical axis to water in the stone separator. The root crop is supported by the water and moved around an inner sidewall of the stone separator between an inlet and an outlet of the stone separator. At the same time unwanted heavier material such as stones and clay falls downwardly through the stone separator for discharge through a waste outlet at a bottom of the stone separator. | 03-13-2014 |
134148000 | And spray or jet applying conduit or nozzle | 1 |
20150360261 | SYSTEM AND METHOD FOR THE SONIC-ASSISTED CLEANING OF SUBSTRATES UTILIZING A SONIC-TREATED LIQUID - The present invention is directed to sonic-assisted systems mid methods of processing of substrates utilizing a sonic-treated liquid. In one embodiment, the sonic-treated liquid can be created by subjecting a desired processing liquid to sonic energy generated by a first sonic energy source prior to being applied So the substrate, The sonic-treated liquid is applied to the substrate where a second source of sonic energy applies sonic energy to the substrate. The sonic-treated liquid can be used as the coupling fluid between the second source of sonic energy and the substrate. | 12-17-2015 |