Class / Patent application number | Description | Number of patent applications / Date published |
134950100 | Means for sequentially applying different fluids | 59 |
20090020144 | METHOD AND APPARATUS FOR CLEANING A SUBSTRATE - An apparatus for wet processing individual substrates comprising; a means for holding the substrate; a means for providing acoustic energy to a non-device side of the substrate; and a means for flowing a fluid onto a device side of the substrate. | 01-22-2009 |
20090044838 | OZONATION FOR ELIMINATION OF BACTERIA FOR WET PROCESSING SYSTEMS - In a first aspect, an apparatus adapted to clean a semiconductor device manufacturing component is provided. The apparatus includes an ozone module adapted to (1) obtain Ozone; (2) combine the Ozone with a fluid to generate ozonated fluid; and (3) deliver the ozonated fluid to the semiconductor device manufacturing component so as to clean the semiconductor device manufacturing component. Numerous other aspects are provided. | 02-19-2009 |
20100037922 | APPARATUS FOR SUBSTANTIALLY UNIFORM FLUID FLOW RATES RELATIVE TO A PROXIMITY HEAD IN PROCESSING OF A WAFER SURFACE BY A MENISCUS - Conditioning fluid flow into a proximity head is provided for fluid delivery to a wafer surface. An upper plenum connected to a plurality of down flow bores is supplied by a main bore. The down flow bores provide fluid into the upper plenum, and a resistor bore is connected to the upper plenum. The resistor bore receives a resistor having a shape so as to limit flow of the fluid through the resistor bore. A lower plenum connected to the resistor bore is configured to receive fluid from the resistor bore as limited by the resistor for flow to a plurality of outlet ports extending between the lower plenum and surfaces of the head surface. Fluid flowing through the upper plenum, the resistor bore with the resistor and the lower plenum is substantially conditioned to define a substantially uniform fluid outflow from the plurality of outlet ports, across the width of the proximity head. | 02-18-2010 |
20100071730 | METHODS FOR ATOMIC LAYER DEPOSITION (ALD) USING A PROXIMITY MENISCUS - Provided are methods for processing a substrate using a proximity system defined by one or more meniscus windows on one or more proximity heads. One method includes applying a first fluid meniscus to a surface of the substrate to apply a chemical precursor to the surface of the substrate. The first fluid meniscus is applied to first proximity meniscus window. Then, applying a second fluid meniscus to the surface of the substrate to leave an atomic layer of the chemical precursor on the surface of the substrate, through a second proximity meniscus window. A third fluid meniscus is applied to the surface of the substrate to apply a chemical reactant configured to react with the atomic layer of the chemical precursor to generate a layer of a material, through a third proximity meniscus window. The first, second and third proximity meniscus windows are arranged to apply the first fluid meniscus, the second fluid meniscus and the third fluid meniscus one after the other to a same location of the surface of the substrate during movement of the substrate through the proximity system. | 03-25-2010 |
20100108106 | SUBSTRATE CLEANING APPARATUS - A chemical solution is mixed to deionized water from a chemical cartridge | 05-06-2010 |
20100212701 | Substrate Processing Apparatus, Substrate Processing Method, and Drain Cup Cleaning Method - A substrate processing apparatus includes a substrate holding member configured to rotate along with a wafer (W) held thereon and a drain cup ( | 08-26-2010 |
20140048109 | LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM - Disclosed is a liquid processing method, apparatus, and storage device for cleaning a member disposed at holding part-side of a substrate, such as a lift pin plate (including a lift pin) or a holding plate, with a rinsing liquid, thereby preventing a chemical liquid adhered to such a member from having a bad influence on the wafer. The liquid processing method includes holding the substrate by a holding part, rotating the substrate held by the holding part through a rotation driving part, and supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply part. After the supply of the chemical liquid, rinsing liquid droplets are generated and supplied to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply part. After the supply of the rinsing liquid droplets, a rinsing liquid is additionally supplied to the holding part-side surface of the substrate through the rinsing liquid supply part. | 02-20-2014 |
20140053881 | WAREWASH MACHINE CHEMICAL SENSOR AND RELATED SYSTEM AND METHOD - A flow through chemical sensor includes a housing having a through passage along which chemical can flow, a sidewall of the housing having first and second openings that communicate with the through passage. A first electrode is mounted on the housing and aligned with the first opening, the first electrode of a plate configuration with a unitary depression that extends through the first opening and to a peripheral edge of the through passage. A second electrode is mounted on the housing and aligned with the second opening, the second electrode of a plate configuration with a unitary depression that extends through the second opening and to the peripheral edge of the through passage. A method of detecting presence or absence of chemical is also provided. | 02-27-2014 |
20140190529 | APPARATUS AND METHOD FOR EDGE BEVEL REMOVAL OF COPPER FROM SILICON WAFERS - Chemical etching methods and associated modules for performing the removal of metal from the edge bevel region of a semiconductor wafer are described. The methods and systems provide the thin layer of pre-rinsing liquid before applying etchant at the edge bevel region of the wafer. The etchant is less diluted and diffuses faster through a thinned layer of rinsing liquid. An edge bevel removal embodiment involving that is particularly effective at reducing process time, narrowing the metal taper and allowing for subsequent chemical mechanical polishing, is disclosed. | 07-10-2014 |
20140326281 | SUBSTRATE TREATMENT APPARATUS - A substrate treatment apparatus for treating a substrate with a chemical liquid in a treatment chamber. The apparatus includes a higher temperature chemical liquid supplying unit, and a rinse liquid supplying unit for rinsing away the higher temperature chemical liquid. A control unit controls a rotation unit for rotating the substrate, as well as the chemical liquid supplying unit and the rinse liquid supplying unit. The higher temperature chemical liquid is supplied while rotating the substrate at a first speed; the rinse liquid is supplied to a center portion of the substrate while rotating the substrate at a lower speed, so that the rinse liquid remains in said center portion; and then the substrate is rotated at a higher speed to spread the rinse liquid over the entire substrate while supplying the rinse liquid onto said center portion. | 11-06-2014 |
134950200 | With drying means | 37 |
20080202564 | PROCESSING SYSTEM WITH IN-SITU CHEMICAL SOLUTION GENERATION - A system for processing a workpiece includes a dry process chamber, such as a plasma etching chamber, and a wet process chamber, such as a spin/spray chamber. Gas supply lines supply gases to the dry process chamber, and to a chemical solution generator. A liquid supply line supplies a liquid, such as de-ionized water, to the chemical solution generator. The chemical solution generator manufactures liquid chemical solutions in situ, for point of use in the wet process chamber. The system allows for both wet and dry processing with few or no separate liquid chemical supply lines. | 08-28-2008 |
20080210268 | Shopping Cart Washer and Sanitizer - A shopping cart washer and sanitizer includes an enclosure fitted with components that facilitate the entry and exit of rolling shopping carts. Within the apparatus, the carts are washed, rinsed, disinfected and dried. The apparatus is primarily for use inside retail establishments and is intended to provide each shopper a clean and sanitary shopping cart. A shopping basket washer is also disclosed. | 09-04-2008 |
20080230097 | Methods for Processing Wafer Surfaces Using Thin, High Velocity Fluid Layer - Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the head to the surface while the head is in proximity to the surface of the substrate to define the fluid layer, and removing the fluid from the surface through the proximity head by a vacuum. The fluid travels along the fluid layer between the head and the substrate at a velocity that increases as the head is in closer proximity to the surface. | 09-25-2008 |
20080264455 | HUMIDITY REDUCING EXHAUST DUCT FOR DISHWASHER - A vent system for a dishwasher provides a mixing chamber receiving high humidity air from a downdraft dishwasher vent system or the like and mixes this air with dry air before discharging it from the dishwasher to reduce the humidity of the discharged air moderating condensation problems | 10-30-2008 |
20090025759 | WASHING APPARATUS FOR BASKETS, ESPECIALLY HANDHELD SHOPPING BASKETS AND THE LIKE - Washing apparatus is provided for handheld baskets, particularly shopping baskets, wherein a washing tunnel has an entrance end and an exit end and conveyor means for supporting baskets and conveying them from the entrance end to the exit end. A series of spray nozzles are arranged within the tunnel and connected to a source of cleaning liquid that is operatively under pressure. The conveyor means comprises a pair of laterally spaced conveyors arranged to move in unison whilst operatively supporting two opposite peripheral edges of a shopping basket in an inverted orientation as the basket is conveyed from the entrance end to the exit end. Retaining means such as a longitudinally extending skid or the like are provided over at least a part of the length of the tunnel to inhibit lifting of shopping baskets off the conveyors. | 01-29-2009 |
20090044839 | SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE - In one aspect, a substrate processing apparatus is provided. The apparatus comprises a mechanism for forming a meniscus on a surface of a substrate by moving the substrate through a fluid; an air knife apparatus positioned to apply an air knife to shorten the meniscus formed on the surface of the substrate; and a drying vapor nozzle positioned to direct a drying vapor to the meniscus shortened by the air knife. Numerous other aspects are provided. | 02-19-2009 |
20090056767 | Surface treatment apparatus - A surface treating jig of the present invention includes a treatment solution collecting section having (i) a ring-like groove formed on a surface (a) facing to a surface (a) to be treated of a semiconductor wafer and (ii) a through hole for collecting the treatment solution, the through hole formed so as to be continuous with the ring-like groove. With this arrangement, the present invention provides a surface treatment apparatus that prevents the treatment solution from spattering to a surface other than the surface (a) to be treated, and thereby, treatment with the treatment solution can be performed only with respect to the target surface. | 03-05-2009 |
20090078292 | SINGLE WAFER METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING AN INERT GAS AIR-KNIFE - In one aspect, an apparatus is provided. The apparatus comprises a chamber; a plurality of rollers adapted to support a wafer in a vertical orientation within a chamber; a pair of brushes adapted to scrub a first and a second side of the wafer respectively; a first spray bar adapted to spray a liquid on the wafer to form a meniscus on the wafer as the wafer is lifted out of the chamber; and a second spray bar adapted to direct a vapor to the meniscus, the vapor being adapted to lower a surface tension of the liquid at the meniscus to perform Marangoni drying of the wafer as the wafer is lifted out of the chamber. Numerous other aspects are provided. | 03-26-2009 |
20090084416 | BOX CLEANER FOR CLEANING WAFER SHIPPING BOX - The present invention relates to a box cleaner including an ultrasonic cleaning bath having a receiving space to be filled with DIW and an ultrasonic wave generator arranged at a bottom thereof; a tray for loading a wafer shipping box thereon; a lift for providing a driving force to put the tray into the ultrasonic cleaning bath and take the tray out of the ultrasonic cleaning bath; and a drying system for drying the cleaned shipping box, wherein a gas sprayer is installed in the ultrasonic cleaning bath for spraying gas into the cleaned shipping box to push the DIW out of the shipping box, thereby draining the DIW. | 04-02-2009 |
20090095330 | DISH WASHER/DRYER - A dish washer/dryer includes a washing tub for accommodating an object to be washed, a washing section for washing the object to be washed, a heater for heating washing water, an exhaust port for discharging moisture inside the washing tub, an air blower for blowing outside-air, a mixing section disposed at an upstream side of the exhaust port and mixing the outside-air with washing-tub-inside-air, and an air volume distribution section for changing the feeding ratio of outside-air into the washing tub and the mixing section. This configuration provides a dish washer/dryer, in which a sufficient amount of outside-air is mixed with exhaust air in the washing tub so as to promote the temperature reduction of the exhaust air and the reduction of the moisture content in the exhaust air during drying operation, thereby enhancing the comfort of the exhaust air. | 04-16-2009 |
20090145466 | ANTIGEN EXPOSURE CHAMBER AND METHOD OF CLEANING AND DRYING THE SAME - An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles | 06-11-2009 |
20090151756 | Liquid treating apparatus - A liquid treating apparatus comprising a holding device ( | 06-18-2009 |
20100043842 | Dishwasher with sorption stretched device in substructure group - In a dishwasher (GS) with at least one washing compartment (SB) and at least one drying device (TE) for drying cleaned dishes, which has at least one sorption container (SOR) for holding reversibly dehydratable sorption material, especially zeolite (ZEO), and with at least one connecting air duct (VK) for conducting air being connected to the washing compartment (SB) for creating an exchange of air between the washing compartment (SB) and the sorption container (BEH), reversibly dehydratable sorption material for absorbing an amount of moisture transported by the exchange of air is provided in the sorption container (BEH). The sorption container (BEH) is accommodated in an underfloor module (BG) below the floor of the washing compartment (SB). | 02-25-2010 |
20100051068 | PROCESSING APPARATUS FLUID-PROCESSING A PROCESS TARGET BODY - The present invention relates to a processing apparatus for fluid-processing a process target body. The processing apparatus is configured to have: supply means for supplying a fluid; process target body processing means for processing the process target body by causing a fluid supplied from the supply means to come into contact with a process target body while preventing the fluid from being scattered; recovery means for recovering the fluid supplied to the process target body processing means; and support means for supporting the process target body processing means so as to not come into contact with the process target body. | 03-04-2010 |
20100083991 | DRYING SYSTEM FOR A DISHWASHER - The present invention describes a drying system for a dishwasher having a washing tub ( | 04-08-2010 |
20100288314 | EVAPORATION MATERIAL CLEANING APPARATUS - An apparatus capable of cleaning a material includes pipes arranged in a first barrel; and through holes defined in a second barrel. The second barrel is received in the first barrel. The apparatus Further includes a driver comprising a drive shaft, the drive shaft extending through the first barrel and being connected to the second barrel. A fluid container is included store fluid, an air controller is provided air-dry the material. Before washing the material, the second barrel is driven by the driver to cause each of the through holes to disengage from a corresponding pipe. After washing the material, the second barrel is driven by the driver to cause each of the through holes to engage with the corresponding pipe. | 11-18-2010 |
20110253178 | Glass sheet washing machine - In a washing machine, a glass sheet arranged on a resting plane is washed and then dried by means of at least one upper drying blowing unit, which is arranged over the sheet, is movable from and to the resting plane, and is connected by means of a tube f variable length to a ventilating unit arranged either over or under the same resting plane. | 10-20-2011 |
20120080061 | Apparatus For Drying Substrate - Example embodiments relate to an apparatus for drying a substrate. The apparatus may include a housing including first barrier walls having a first height, a rotary chuck that is disposed within the housing and configured to rotate the substrate, a nozzle system that is disposed above the rotary chuck and configured to supply a fluid onto the substrate, a cleaning liquid supply unit supplying a cleaning liquid for cleaning the substrate to the nozzle system, and a drying liquid supply unit supplying a drying liquid for drying the substrate to the nozzle system. | 04-05-2012 |
20130008474 | DRYING SYSTEM FOR A DISHWASHER - A drying system for a dishwasher including a passive vent assembly mounted to a top portion of the dishwasher. The passive vent assembly includes a passive vent structure having a series of air vents defined therein and through which drying air flows are drawn into the wash chamber of the dishwasher, a diffuser mounted over the air vents and including a series of fins for spreading the drying air flows across the wash chamber, and a moisture trap hood mounted over an upper surface of the passive vent structure. | 01-10-2013 |
20130056040 | DISH WASHER - Provided is a dish washer. The dish washer includes a tub configured to accommodate dishes, a sump configured to supply water to the tub, and a water supply device configured to supply water received from an outer source to the sump or the tub. The water supply device includes a body and a plurality of discharge parts. The body includes a water supply passage along which water supplied from an outer source flows and a water chamber in which water supplied through the water supply passage is stored. Water is discharged from the water supply passage to the water chamber through the discharge parts. | 03-07-2013 |
20130061888 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - A particle level varied depending on a drying processing condition can be suppressed to be stably lowered. A batch type substrate processing apparatus include a cleaning processing unit | 03-14-2013 |
20130125931 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - Disclosed is a liquid processing apparatus capable of performing a liquid processing and a drying processing in a position each having a different height. The liquid processing apparatus includes: a substrate holding unit configured to hold a substrate; a rotation driving unit configured to rotate the substrate holding unit; a substrate holding unit elevating member configured to lift and lower the substrate holding unit; a processing liquid supply unit configured to supply a processing liquid to the substrate; a liquid receiving cup configured to surround the substrate when the processing liquid is being supplied to the substrate; a drying cup located above the substrate and the liquid receiving cup when the processing liquid is being supplied to the substrate. The drying cup surrounds the substrate and located above the liquid receiving cup when the substrate is being dried. | 05-23-2013 |
20130125932 | DEVICE FOR CLEANING AND DRYING ROLL STANDS - Equipment ( | 05-23-2013 |
20130199580 | DRYING APPARATUS WITH EXHAUST CONTROL CAP FOR SEMICONDUCTOR WAFERS AND ASSOCIATED METHODS - A drying apparatus for drying a semiconductor wafer includes a processing chamber including a rinsing section and a drying section adjacent thereto. The rinsing section has a chamber loading slot associated therewith for receiving the semiconductor wafer. The drying section has a chamber unloading slot associated therewith for outputting the semiconductor wafer. An exhaust control cap is carried by the processing chamber and includes a bottom wall, a top wall, at least one intermediate wall between the bottom and top walls, and a side wall coupled to the top, bottom and the at least one intermediate wall to define stacked exhaust sections. The exhaust control cap has a cap loading slot aligned with the chamber loading slot, a cap unloading slot aligned with the chamber unloading slot, and at least one exhaust port configured to be coupled to a vacuum source. | 08-08-2013 |
20130306116 | SUBSTRATE CLEANING APPARATUS - A substrate cleaning apparatus cleans a surface of a substrate such as a semiconductor wafer and dries the substrate. The substrate cleaning apparatus includes a process chamber having a substrate conveying unit configured to hold a substrate horizontally with its upper surface facing upwardly and to convey the substrate in one direction, and a cleaning unit configured to clean the surface of the substrate in non-contact state by supplying a cleaning liquid to the surface of the substrate which is moving in the process chamber. The substrate apparatus has an inert gas blowing unit configured to blow an inert gas toward the front and reverse surfaces of the substrate which has been cleaned in the cleaning unit to produce an inert gas atmosphere in the process chamber while drying the substrate with the inert gas. | 11-21-2013 |
20130319480 | CLEANING DEVICE - A cleaning device comprises a cleaning mechanism, a drying mechanism, and a transferring mechanism. The cleaning mechanism comprises a first receiving case, at least one cleaning tank received in the first receiving case, a transferring assembly, and a plurality of pipes. The transferring assembly is positioned on the first receiving case and located above the cleaning tank. The pipes communicate with the cleaning tanks. The drying mechanism comprises a second receiving case, a transporting member, and a plurality of air blower. The second receiving case is located besides the first receiving case, and parallel to the first receiving case. The transporting member is mounted on the second receiving case. The air blower are mounted on the second receiving case, and communicate with the second receiving case. The transferring mechanism is positioned at an end of the first receiving case and the second receiving case, respectively. | 12-05-2013 |
20140102488 | Method and System for Improving Performance and Preventing Corrosion in Multi-Module Cleaning Chamber - A method and system for cleaning a substrate in a multi-module cleaning assembly is provided. The method begins by receiving the substrate into the cleaning module. A cleaning chemistry, at a temperature elevated from an ambient temperature, is applied onto a top surface of the substrate. Concurrent with application of the cleaning chemistry, vapors are exhausted from the cleaning chemistry through a port located below a bottom surface of the substrate with the vapor exhaustion providing a negative pressure relative to a pressure external to the cleaning module. The application of the cleaning chemistry is terminated, followed by termination of the exhausting of the vapors. The substrate is dried after the flowing of inert gas is terminated. | 04-17-2014 |
20140116476 | Systems for Surface Treatment of Semiconductor Substrates using Sequential Chemical Applications - Systems for removing post etch polymer residue from etched surface includes a first proximity head to introduce a first cleaning chemistry as a first meniscus to a portion of the surface of the substrate so as to cover a length that extends to at least a diameter of the substrate and a first width that is less than the diameter of the substrate. A second proximity head is configured to introduce a second cleaning chemistry as a second meniscus to the portion so as to cover the length that extends to the diameter and a second width that is less than the diameter of the substrate. A substrate supporting device equipped with a motor coupled to a computing system is used to move the substrate supporting device under the first proximity head at a first linear speed and under the second proximity head at a second linear speed. | 05-01-2014 |
20140137902 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a rotary cup that is provided at a substrate holding unit to surround a substrate held thereon and to be rotated along with the substrate holding unit, and configured to guide a processing liquid dispersed from the substrate; and an outer cup that is provided around the rotary cup with a gap therebetween and configured to collect the guided processing liquid by the rotary cup. Further, a height of an upper end of the rotary cup is higher than that of the outer cup. Furthermore, an outward protrusion protruded outwards in a radial direction thereof and extended along a circumference thereof is provided at an upper end portion of an outer surface of the rotary cup, and the outward protrusion blocks mist of the processing liquid dispersed from the gap between the rotary cup and the outer cup toward a space above the substrate. | 05-22-2014 |
20140338707 | Cleaning Device - A cleaning device for a laboratory fermenter for growing microorganisms is provided. The laboratory fermenter to be cleaned has a gas supply connection connected to a line reaching into the fermenter's nutrient solution, an exhaust connection to the gas space over the nutrient solution, and a withdrawal connection leading to the fermenters deepest point. The cleaning device includes three cleaning connections, an immersion pipe connection and two gas connections. Flow in each gas connection is controlled via intermediate switch valves having a cleaning start position and a cleaning end position. The cleaning connections are connected via hose lines to hose pinch control valves, a hose pinch pump, at least one filter. A cleaning control manages the cleaning process by controlling flow from and/or to an air connection, a water connection and a waste water connection. The cleaning controller may also control introduction of acids and/or bases. | 11-20-2014 |
20150027503 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded. | 01-29-2015 |
20150034132 | Misting Chamber - The invention proposes a domestic appliance having a drying apparatus, such as a dishwasher, a tumble dryer, a washing machine or the like, wherein the drying apparatus ( | 02-05-2015 |
20160082932 | VEHICLE WASHING INSTALLATION - A vehicle washing installation is provided including first and second supports on which a horizontal roof wash brush and a roof drying unit are held for movement between an upper and a lower end position, and a splash guard element arranged between the roof wash brush and the roof drying unit at the upper end position. The splash guard element has a recess extending in the area between a lateral edge and a lower edge of the splash guard element and into which a part of the roof drying unit in its upper end position extends, wherein the lower edge has a drain channel extending over the width of the splash guard element, the drain channel having an end section movable between a first position where it extends over the entire width of a recess and engages under the recess and a second position where it releases the recess. | 03-24-2016 |
20160089700 | DEVICE FOR CLEANING AND DRYING ROLL STANDS - A system for use in a rolling train includes a roll stand ( | 03-31-2016 |
20160101443 | Separator and Dryer for Ammunition Casings and Cleaning Media - The separator/dryer includes a housing, removable collection trays, a separator assembly, a rinse assembly, and a heater/blower. The separator assembly separates the ammunition casings from the clean media and the rinse waste and includes a rotating separator basket disposed within the housing on a motor driven shaft. The rinse assembly provides a water shower to rinse any cleaning residue, carbon particulate and dust from the ammunition casings and the cleaning media. The heater/blower circulates a stream of hot air into the housing interior to dry ammunition casings and the cleaning media. The removable collection trays are vessels for collecting both the rinsed and dried ammunition casings and the rinsed and dried clean media. | 04-14-2016 |
20160106298 | A DISHWASHER WITH IMPROVED DRYING PERFORMANCE - The present invention relates to a dishwasher ( | 04-21-2016 |
20160192821 | DISHWASHER APPLIANCE HAVING ENERGY RECOVERY FEATURES | 07-07-2016 |
134950300 | Fluid spraying means | 12 |
20080202565 | Dish Washing Machine - To provide a dishwasher for which the washing water distribution pipe provided with the washing nozzles and the rinsing water distribution pipe provided with the rinsing nozzles can be easily installed and removed from the washing chamber. | 08-28-2008 |
20080236634 | SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE CLEANING APPARATUS - A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing. A jetting apparatus jets a cleaning substance in two phases of a gas phase and a liquid phase and a high-temperature gas towards the rear surface or the periphery of the substrate. | 10-02-2008 |
20090038651 | NO CONTACT CARWASH SYSTEM - A no contact carwash system has a plurality of holding tanks which are connected to a dosing pump, one to each product to be mixed. The dosing pumps measuring quantities for each product. Water from a water line along with the products are then sent to a centrifuge pump for admixing into an admixture. Pressurised air is introduced to an air line and air from the air line and the admixture are blended into a lather generator and then fed to a spray line exiting through a spraying gun. | 02-12-2009 |
20090101182 | Dishwasher, in Particular Domestic Dishwasher - A dishwasher is provided that includes a washing space in which the soiled articles can be positioned for cleaning and an operating device that operates during the cleaning operation and is arranged in an opening in a bounding face of the washing space and/or of a container which can be positioned in the washing space. A spray device for spraying cleaning fluid is integrated into the washing space in the operating device. | 04-23-2009 |
20090120467 | Commercial dish washer equipped with an auxiliary rinsing water pipe and rinsing step - A dish washer for commercial use is provided. The dishwasher according to current application is used for restaurants, hospital, school and military camp, etc. The dish washer of the current application has an auxiliary rinsing water pipe that is embedded inside of a washing water pipe. The rinsing water supplied to the washing water pipe drives the remaining soapy washing water out of an upper washing water impellor just after the washing step is finished. In rinsing step, rinsing water is supplied to an upper rinsing impellor via main rinsing water pipe. Rinsing water is sprayed to the bottom of the washing water impellor to remove the residual soapy washing water droplets. The dish washer of the current application removes a chance of contamination of dishes and cups by soapy washing water drops after washing is finished. | 05-14-2009 |
20090205686 | WAFER CLEANING APPARATUS - A wafer cleaning apparatus used for cleaning a first uncleaned surface of a wafer is provided. The wafer cleaning apparatus includes a case, a spin device, a cover, at least one first spray bar, and at least one exhaust device. The spin device is disposed in the case and used for carrying the wafer and spinning perpendicularly to the ground. The cover is disposed in the case and used for covering the spin device. The first spray bar is disposed at one side of the spin device and used for spraying a volatile cleaning solution onto the first uncleaned surface of the wafer, in which the sprayed volatile cleaning solution is of a bar shape. The exhaust device is disposed on the sidewall of the case. | 08-20-2009 |
20100043843 | CLEANING DEVICE - An apparatus to clean a continuously running conveyor belt for a machine to produce or refine paper, cardboard or other layers of fibrous material including a cleaning device and at least one supplementary device. The cleaning device is configured to dispense at least one cleansing stream to the conveyor belt in at least one cleaning stage. The supplementary device is configured to dispense a chemically active medium and/or a physically active medium in a preparation process. The preparation process is configured to support and/or enhance the cleaning effectiveness and conditioning of a surface of the conveyor belt for a cleaning process. | 02-25-2010 |
20100313918 | Apparatus for Cleaning Contaminants from Substrate - A substrate holder is defined to support a substrate. A rotating mechanism is defined to rotate the substrate holder. An applicator is defined to extend over the substrate holder to dispense a cleaning material onto a surface of the substrate when present on the substrate holder. The applicator is defined to apply a downward force to the cleaning material on the surface of the substrate. In one embodiment the cleaning material is gelatinous. | 12-16-2010 |
20120118334 | EXHAUST GAS TREATMENT DEVICE AND METHOD AND SEMICONDUCTOR MANUFACTURING SYSTEM - Certain embodiments provide an exhaust gas treatment device, comprising a scrubber unit having a vessel and a sprayer spraying water into the vessel, a first pipe through which a first gas discharged from an external apparatus and containing a non-water-soluble organic solvent is supplied to the vessel, and a second pipe through which a second gas containing a water-soluble organic solvent is supplied to the vessel through the first pipe or directly. In the vessel, the water-soluble organic solvent and the non-water-soluble organic solvent are adsorbed and removed from a mixed gas composed of the first gas and the second gas by the water sprayed from the sprayer. The mixed gas is discharged from the vessel through a third pipe. | 05-17-2012 |
20140216506 | SUBSTRATE PROCESSING APPARATUS - There is provided a substrate processing apparatus including: a substrate holder configured to hold a substrate on which a resist pattern is formed; a rinse solution supply unit configured to supply a rinse solution onto the substrate held by the substrate holder; a vapor supply unit configured to supply vapor of a first processing solution, which hydrophobicizes the resist pattern, onto the substrate on which the rinse solution is supplied from the rinse solution supply unit; and a rinse solution removing unit configured to remove the rinse solution from the substrate in an atmosphere including the vapor of the first processing solution supplied from the vapor supply unit. | 08-07-2014 |
20150136183 | SYSTEM OF CONTROLLING TREATMENT LIQUID DISPENSE FOR SPINNING SUBSTRATES - Provided is a method for cleaning an ion implanted resist layer or a substrate after an ashing process. A duty cycle for turning on and turning off flows of a treatment liquid in two or more nozzles is generated. The substrate is exposed to the treatment liquid comprising a first treatment chemical, the first treatment chemical with a first film thickness, temperature, total flow rate, and first composition. A portion of a surface of the substrate is concurrently irradiated with UV light while controlling the selected plurality of cleaning operating variables in order to achieve the two or more cleaning objectives. The cleaning operating variables comprise two or more of the first temperature, first composition, first film thickness, UV wavelength, UV power, first process time, first rotation speed, duty cycle, and percentage of residue removal. | 05-21-2015 |
20160059274 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus, having a solidified material forming unit that discharges a solidification liquid in a liquid state from a nozzle and supplies the discharged solidification liquid to a substrate so as to form a solidified material of the solidification liquid on the substrate, and a remover that removes the solidified material of the solidification liquid on the substrate, wherein the solidified material forming unit supplies the solidification liquid having a solidification point higher than normal temperature to a top surface of the substrate, and the solidification liquid is solidified by an external stimulus received in either a process of landing on the substrate after being discharged from the nozzle, or a process of being left on the substrate as it is. | 03-03-2016 |