Class / Patent application number | Description | Number of patent applications / Date published |
134990100 |
Plural fluids applying conduits
| 60 |
134950100 |
Means for sequentially applying different fluids
| 59 |
134103200 |
Fluid spraying means
| 8 |
134980100 |
With coordinated or multiple valves
| 7 |
134103100 |
Having means for recirculating or reversing fluid flows | 4 |
20100139713 | Dipper Well System - Embodiments of the invention provide a dipper well to clean smallwares, such as spoons, measuring cups, and ice-cream scoops. The dipper well can include a basin and a recirculation system. The recirculation system can draw a fluid from the basin. The recirculation system can include a filter to reduce contaminants in the fluid before the fluid is recycled back into the basin. | 06-10-2010 |
20100192988 | DEAERATION DEVICE AND ULTRASONIC CLEANING DEVICE USING THE SAME - A deaeration device for bubbling dissolved air in the cleaning liquid by cavitation is connected on a cleaning-liquid circulation path so as to bubble the dissolved air in the cleaning liquid flowing through the cleaning-liquid circulation path by the deaeration device, and the bubbled dissolved air flows back to the cleaning tank together with the cleaning liquid so that the bubbled dissolved air is ejected from the liquid surface of the cleaning tank to the outside of the tank. Moreover, a propeller-type pump is used as the circulating pump, and the dissolved air concentration of the cleaning liquid is controlled within a range of 2.5 to 3.5 mg/l. | 08-05-2010 |
20130319483 | DISHWASHER WITH OVERFLOW CONDUIT - A dishwasher for treating dishes according to at least one cycle of operation and having a tub at least partially defining a treating chamber and defining an access opening, a sprayer providing a spray of liquid into the treating chamber, a liquid recirculation system defining a recirculation flow path for recirculating the sprayed liquid from the treating chamber to the sprayer, and an air supply system having a conduit configured to function as an overflow conduit. | 12-05-2013 |
20140196753 | REGENERATION OF ION EXCHANGE RESIN AND RECOVERY OF REGENERANT SOLUTION - An apparatus and method for regenerating spent ion exchange resin and recovering regenerant fluid is described. A regeneration system has a regeneration vat, a regeneration solution tank, a regenerant recovery tank, a chemical dispenser, a solids separator, a pH adjuster and a pump. The regeneration vat holds the spent resin and is connected to the regeneration solution tank to allow transfer of regenerant solution into the regeneration vat. Spent regenerant fluid travels to the regenerant recovery tank, where it is treated with chemicals provided from the chemical dispenser. The solids separator receives the treated regenerant liquid and separates precipitate flocs from the treated regenerant liquid. The concentration of chloride ions in the separated regenerant solution can be adjusted by the pH adjuster to form fresh regenerant solution. The pump pumps the fresh regenerant solution to the regenerant solution tank to regenerate additional spent cation exchange resin. | 07-17-2014 |
134960100 |
With nonimpelling plural way liquid outlet (e.g., two way valve) or nonimpelling liquid outlet control coordinated with other control control coordinated with other control | 1 |
20090277481 | DISHWASHER - A dishwasher includes a washing container with a washing chamber, a water feed line for filling the washing chamber with liquid, and a water inlet device connected on an inlet side to the water feed line and ends in the washing chamber on an outlet side. The water inlet device includes a steam outlet opening that ducts water vapor out of the washing container, and a steam duct that guides steam to the steam outlet opening. | 11-12-2009 |
Entries |
Document | Title | Date |
20080314422 | System, method and apparatus for maintaining separation of liquids in a controlled meniscus - A system and method of forming and using a proximity head. The proximity head includes a head surface, the head surface including a first zone, a second zone and an inner return zone. The first zone including a first flat surface region and a plurality of first discrete holes. Each one of the plurality of first discrete holes being connected to a corresponding one of a plurality of first conduits. The plurality of first discrete holes residing in the head surface and extending through the first flat surface region. At least a portion of the plurality of first discrete holes are arranged in a first row. The second zone including a second flat region and a plurality of second discrete holes. Each one of the plurality of second discrete holes being connected to a corresponding one of a plurality of second conduits. The plurality of second discrete holes residing in the head surface and extending through the second flat surface region. The inner return zone including a plurality of inner return discrete holes. The inner return zone being disposed between and adjacent to the first zone and the second zone. Each one of the plurality of the inner return discrete holes being connected to a corresponding one of a plurality of inner return conduits. The plurality of inner return discrete holes residing in the head surface and extending through the head surface. At least a portion of the plurality of inner return discrete, holes are arranged in an inner return row. The first row and the inner return row being substantially parallel. A first portion of an edge of each one of the plurality of inner return discrete holes is recessed into the head surface. | 12-25-2008 |
20090101181 | Substrate cleaning apparatus - A substrate cleaning apparatus is used to clean a substrate with a cleaning liquid. The substrate cleaning apparatus includes a substrate holding mechanism configured to hold a substrate horizontally, a rotating mechanism configured to rotate the substrate held by the substrate holding mechanism, a liquid supply nozzle for supplying a cleaning solution to the substrate, and a spin cover provided around the substrate and rotatable at substantially the same speed as the substrate. The spin cover has an inner circumferential surface shaped so as to surround the substrate. The inner circumferential surface is, from a lower end to an upper end thereof, inclined radially inwardly. | 04-23-2009 |
20090159102 | PARTS WASHER - A parts cleaner for use in a process whereby solvent is preferred to always be available and is preferred to be as clean or pure as possible for use, comprising two containers respectively for clean solvent and for capture of used solvent or a single container having separate zones for clean and used solvent, said clean container having an outlet for supplying clean solvent for cleaning. The clean container may have an outlet for supplying clean solvent for cleaning and an inlet for clean recycled solvent, the used solvent container having an inlet for used solvent, an outlet for supplying used solvent for cleaning and an outlet for supplying used solvent for recycling. The used solvent container may have an outlet for supplying used solvent for cleaning and means for automatically switching between the outlets supplying said clean solvent and said used solvent for cleaning. The clean container may have an inlet for clean recycled solvent, the used solvent container having an inlet for used solvent, an outlet for supplying used solvent for cleaning and an outlet for supplying used solvent for recycling, the parts cleaner being adapted to draw first from the clean solvent container and drain into a separate used solvent container and when clean solvent is not available, to draw from the used solvent container, thus ensuring availability of solvent at all times. Also disclosed is a solvent recycler having a distillation chamber and a filling system for the distillation chamber or a distillation zone of the distillation chamber without the use of valves when filling the distillation chamber from a used solvent zone or a container for a batch or continuous system. | 06-25-2009 |
20090308415 | Surface Treatment Apparatus - Inside a single apparatus main body ( | 12-17-2009 |
20100083990 | WATER-CONDUCTING APPLIANCE HAVING A CLEANING AGENT FEEDING DEVICE - A water-conducting domestic appliance including a line system, a detergent feed facility that supplies at least one detergent into the line system, wherein the detergent feed facility includes at least one reservoir configured to be filled with detergent, and a refill fitting having a connection to the at least one reservoir, the refill fitting being arranged on a door of the water-conducting domestic appliance. | 04-08-2010 |
20100154840 | SYSTEM AND METHOD FOR CHEMICAL DECONTAMINATION OF RADIOACTIVE MATERIAL - A system for chemically decontaminating radioactive material. | 06-24-2010 |
20100218792 | Packing Machine - Proposed is a packing machine ( | 09-02-2010 |
20100307543 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS - A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle ( | 12-09-2010 |
20100326478 | DISHWASHER - The present invention relates to a dishwasher. A dishwasher includes a washing tub in which dishes are placed, a steam generator that generates steam and a nozzle part in which a flow direction of the steam is diverted at least one time to allow the steam exhausted to the washing tub. | 12-30-2010 |
20110079252 | SUBSTRATE PROCESSING APPARATUS - Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong. | 04-07-2011 |
20110120507 | CLEANING APPARATUS AND HIGH PRESSURE CLEANER FOR USE THEREIN - A cleaning apparatus in which a cleaning process is simplified, a time required for the cleaning process is reduced and which has an excellent cleaning effect, and a high pressure cleaner for use therein are provided. The cleaning apparatus comprises a liquid carbon dioxide (CO | 05-26-2011 |
20110139192 | SURFACE TREATMENT APPARATUS AND METHOD FOR SEMICONDUCTOR SUBSTRATE - In one embodiment, a surface treatment apparatus for a semiconductor substrate includes a holding unit, a first supply unit, a second supply unit, a third supply unit, a drying treatment unit, and a removal unit. The holding unit holds a semiconductor substrate with a surface having a convex pattern formed thereon. The first supply unit supplies a chemical solution to the surface of the semiconductor substrate, to perform cleaning and oxidation. The second supply unit supplies pure water to the surface of the semiconductor substrate, to rinse the semiconductor substrate. The third supply unit supplies a water repelling agent to the surface of the semiconductor substrate, to form a water repellent protective film on the surface of the convex pattern. The drying treatment unit dries the semiconductor substrate. The removal unit removes the water repellent protective film while making the convex pattern remain. | 06-16-2011 |
20110168213 | DEVICE AND METHOD FOR REMOVING LIQUID FROM A SURFACE OF A DISC-LIKE ARTICLE - A method for removing liquid from a surface of a disc includes, rotating the disc article about an axis perpendicular to the disc's main surface, supplying liquid from a supply port, moved across the substrate towards the edge of the disc, onto the rotated disc, supplying a first gas flow through a first gas supply port onto the disc article to an area whose centre has a distance to the centre of rotational movement of not more than 20 mm, the area being covered with a liquid layer thereby opening the liquid layer at a discrete area, and supplying a second gas flow through a second gas supply port moved across the substrate towards the edge of the substrate onto the rotated disc wherein the distance of the second gas supply port to the centre is lower than the distance of the liquid supply port to the centre. | 07-14-2011 |
20110180115 | AUXILIARY RINSE PHASE IN A WASH MACHINE - A system and method are disclosed for cleaning articles within a chamber of a warewash machine. The warewash machine has a rinse sump for collecting a rinse agent dispensed into the chamber and a wash sump for collecting a wash agent dispensed into the chamber. The method includes a wash phase during which the wash agent is dispensed into the chamber during and an auxiliary rinse phase during which the rinse agent is dispensed into the chamber. The wash machine includes a controllable deflector for directing the wash agent to the wash sump during the wash phase and the rinse agent to the rinse sump during the auxiliary rinse phase. The method also includes a final rinse phase during which water from an external source is dispensed into the chamber. The controllable deflector direct the water dispensed during the final rinse phase to the rinse sump such that the water combines with the rinse agent therein. The rinse agent is re-used during at least one subsequent auxiliary rinse phase. | 07-28-2011 |
20110259376 | WET PROCESSING OF MICROELECTRONIC SUBSTRATES WITH CONTROLLED MIXING OF FLUIDS PROXIMAL TO SUBSTRATE SURFACES - The present invention provides methods and apparatuses for controlling the transition between first and second treatment fluids during processing of microelectronic devices using spray processor tools | 10-27-2011 |
20110297192 | SUBSTRATE LIQUID PROCESSING APPARATUS - A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying a plurality of types of process-liquids to the substrate held by a substrate holding table, first and second guide cups which are disposed in this order from the top and are configured to respectively guide downward the process-liquid scattering from the rotating substrate while being held by the substrate holding table; and a position adjustment mechanism adjusting a positional relationship between the first and second guide cups and the substrate holding table. A first process-liquid recovery tank is provided at a lower area of the first and second guide cups and recovers the process-liquid guided by the first guide cup. A second process-liquid recovery tank is provided at the inner peripheral side of the first process-liquid recovery tank and recovers the process-liquid guided by the second guide cup. | 12-08-2011 |
20120132233 | Animal Waste Removal Device - A pet waste removal device including an elongated hand held boom having an open bottom shield disposed at a bottom end of the boom for positioning over a pile of animal waste. A motor driven agitator is disposed within the shield and driven by a motor to rotate between a counterclockwise and a clockwise rotation to mechanically break up pet waste. Fluid jet nozzles are supplied water via a garden hose connection and are arranged to direct water jets into the shield to wash away the pet waste as it is broken up by the agitator. A chemical dispenser for dispensing a chemical solution can also be provided. | 05-31-2012 |
20120145202 | Cleaning Compound and Method and System for Using the Cleaning Compound - A cleaning compound is provided. The cleaning compound includes about 0.1 weight percent to about 10 weight percent of a fatty acid dispersed in water. The cleaning compound includes an amount of a base sufficient to bring a pH of the fatty acid water solution to about a level where above about 50% of the dispersed fatty acid is ionized. A method for cleaning a substrate, a system for cleaning a substrate, and a cleaning solution prepared by a process are also provided. | 06-14-2012 |
20120255586 | APPARATUS AND METHODS FOR CLEANING AND DRYING OF WAFERS - An first example method and apparatus for etching and cleaning a substrate comprises device with a first manifold and a second manifold. The first manifold has a plurality of nozzles for dispensing chemicals onto the substrate. The second manifold is attached to a vacuum source and/or a dry air/gas source. A second example embodiment is a wafer cleaning device and method that uses a manifold with capillary jet nozzles and a liquid capillary jet stream to clean substrates. | 10-11-2012 |
20120298150 | CLEANING AND DRYING APPARATUS - A cleaning and drying apparatus includes a support frame, a washing and drying cabinet, a blower module, and a water tank. The support frame includes a first frame, a second frame, a number of pillars connected to the first frame and the second frame. The washing and drying cabinet is mounted on the second frame. The blower module is mounted on the first frame, the water tank is mounted on the first frame, and the blower module and the water tank are connected to the washing and drying cabinet. | 11-29-2012 |
20120298151 | Device for Disinfecting, Sterilizing and/or Maintaining Medical, Especially Dental, Instruments - A device for disinfecting, sterilizing and/or maintaining medical, especially dental, instruments comprises a maintenance and leaning chamber for accommodating instruments to be conditioned and means for supplying different cleaning or maintenance media for cleaning, disinfecting or sterilizing and/or maintaining the instruments in subsequent steps. The start times of the conditioning cycles for the different instruments are staggered. | 11-29-2012 |
20120305033 | PARALLEL SINGLE SUBSTRATE MARANGONI MODULE - A substrate drying apparatus for drying a width of a surface of a substrate in a liquid. The substrate drying apparatus has a liquid tank containing the liquid. An injection nozzle is coupled to the liquid tank, the injection nozzle having a continuous knife edge injection surface across the width of the surface of the substrate. A drain is coupled to the injection nozzle, the drain having a continuous drain surface substantially parallel to the continuous knife edge injection surface and across the width of the surface of the substrate. The liquid forms a meniscus between the continuous drain surface and the width of the surface of the substrate. The injection nozzle directs a vapor at the meniscus. | 12-06-2012 |
20130019907 | Dual Phase Cleaning Chambers and Assemblies Comprising The Same - In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset. | 01-24-2013 |
20130056039 | Use of Recycled Wash and Rinse Water for the Pre-Rinse Operation of Dishes - A dishwashing machine is used for pre-rinse operation of soiled dishes. A cavity is configured and arranged to contain the soiled dishes. A nozzle is proximate the cavity and is in fluid communication with the cavity. An accumulator pan accumulates wash and rinse water including cleaning chemicals used in a previous cycle of the dishwashing machine. A fluid passageway interconnects the nozzle and the accumulator pan. A pump directs the accumulated wash and rinse water from the accumulator pan to the nozzle via the fluid passageway for pre-rinse operation of the soiled dishes in the cavity, and the nozzle directs the accumulated wash and rinse water into the cavity with the soiled dishes to assist in removing soil from the soiled dishes prior to a wash cycle of the dishwashing machine. The wash cycle utilizes fresh wash water. | 03-07-2013 |
20130061887 | METHOD FOR REMOVING MATERIAL FROM SEMICONDUCTOR WAFER AND APPARATUS FOR PERFORMING THE SAME - A pressure is maintained within a volume within which a semiconductor wafer resides at a pressure that is sufficient to maintain a liquid state of a precursor fluid to a non-Newtonian fluid. The precursor fluid is disposed proximate to a material to be removed from the semiconductor wafer while maintaining the precursor fluid in the liquid state. The pressure is reduced in the volume within which the semiconductor wafer resides such that the precursor fluid disposed on the wafer within the volume is transformed into the non-Newtonian fluid. An expansion of the precursor fluid and movement of the precursor fluid relative to the wafer during transformation into the non-Newtonian fluid causes the resulting non-Newtonian fluid to remove the material from the semiconductor wafer. | 03-14-2013 |
20130081660 | PEN STERILIZATION DEVICE - A pen sterilization device includes a main body having a first end, a second end and a plurality of opposing sides defining a watertight reservoir for containing a sterilization agent, and a pair of watertight valves for allowing ingress and egress of a pen. | 04-04-2013 |
20130104942 | Mixed Acid Cleaning Assemblies | 05-02-2013 |
20130220384 | Organic Produce Wash System - The present application describes a produce wash system for dispersing carbon dioxide into a liquid medium which includes a container containing carbon dioxide gas which is connected to another container or pipe capable of containing a liquid medium so that the gas from the first container is capable of being dispersed into the liquid medium of the second container or pipe. | 08-29-2013 |
20140373880 | APPARATUS FOR CONTAMINATION REMOVAL USING MAGNETIC PARTICLES - Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from a surface of the substrate. | 12-25-2014 |
20160141153 | DUAL PHASE CLEANING CHAMBERS AND ASSEMBLIES COMPRISING THE SAME - In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset. | 05-19-2016 |