Class / Patent application number | Description | Number of patent applications / Date published |
134036000 | Plural, separately fed, and either simultaneously applied or admixed, treating fluids | 48 |
20080230092 | METHOD AND APPARATUS FOR SINGLE-SUBSTRATE CLEANING - A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially uniform static liquid layer over a substrate surface by atomizing the viscous liquid with an inert gas in a two-phase nozzle. In another embodiment of the present invention, after a layer of the cleaning solution is formed over the substrate to be cleaned, acoustic energy is applied to the substrate to improve the cleaning efficiency. In a further embodiment, cleaning solution precipitates are avoided by dispensing de-ionized water with a spray nozzle to gradually dilute the cleaning solution prior to dispensing de-ionized water with a stream nozzle. | 09-25-2008 |
20080308132 | SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED CLEANING LIQUID - A method has been disclosed which cleans a semiconductor substrate using a cleaning liquid produced by mixing bubbles of a gas into an acid solution in which the gas has been dissolved to the saturated concentration and which brings the zeta potentials of the semiconductor substrate and adsorbed particles into the negative region by the introduction of an interfacial active agent. Alternatively, a semiconductor substrate is cleaned using a cleaning liquid produced by mixing bubbles of a gas into an alkaline solution in which the gas has been dissolved to the saturated concentration and whose pH is 9 or more. | 12-18-2008 |
20080314418 | Method and System for Furnace Cleaning - The present invention provides a method and a system for cleaning furnace, including the steps of introducing a nitrogen gas flow into a cleaning agent tank to carry the cleaning agent, introducing the nitrogen gas carrying the cleaning agent into the furnace via a pipeline to clean the furnace; and generating a steam by mixing and igniting a hydrogen gas flow and an oxygen gas flow, and then introducing the steam into the furnace to clean the furnace. The method for cleaning furnace according to the invention can effectively remove metal and non-metal impurities deposits in a furnace of semiconductor oxidation furnace equipment. | 12-25-2008 |
20080314419 | EQUIPMENT FOR CLEANING CYCLES OR MOTORCYCLES - An equipment ( | 12-25-2008 |
20090120466 | Washing Device and Washing Method - A cleaning apparatus includes a cleaning tank ( | 05-14-2009 |
20100043841 | METHOD FOR SUPPLYING A CLEANING MEDIUM AND METHOD AND CLEANING DEVICE FOR CLEANING A WORKPIECE - In order to improve the efficiency of a method for supplying a cleaning medium, it is suggested that a cleaning gas, in particular, air be introduced into a reservoir ( | 02-25-2010 |
20100051065 | PROCESS FOR WATER STRIPPING OF PHOTORECEPTORS - The presently disclosed embodiments relate generally to methods for the removal of coatings from an imaging member for use in electrostatographic, including digital, apparatuses. More particularly, the embodiments pertain to a method for removing at least one electrophotographic imaging layer from an electrophotographic imaging member using ultra-high pressure water. | 03-04-2010 |
20100108104 | JETSPRAY NOZZLE AND METHOD FOR CLEANING PHOTO MASKS AND SEMICONDUCTOR WAFERS - A jetspray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jetspray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jetspray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jetspray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jetspray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. In one embodiment, the water may be deionized water and the gas may be nitrogen. In another embodiment, the jetspray nozzle further includes a second row of gas injection nozzles spaced above or below the first row of gas injection nozzles that communicate with the gas supply inlet. | 05-06-2010 |
20100139712 | Dosing System For A Concentrated Laundry Composition - A laundry detergent system comprising a highly concentrated liquid laundry detergent and a device connected to a water supply feed, that provides the injection pressure of the detergent composition being greater than water flow pressure at the junction of the detergent composition and the water flow and water flow rate at the junction of greater than 0.25 m/sec; wherein the flow rate ratio of the detergent composition to the water flow is in the range of from about 0.0001 to about 0.5. | 06-10-2010 |
20100307541 | PROCESS AND A DEVICE TO CLEAN SUBSTRATES - In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90% volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device. | 12-09-2010 |
20100313917 | METHOD OF PARTICLE CONTAMINANT REMOVAL - Apparatus and methods for removing particle contaminants from a solid surface includes providing a layer of a viscoelastic material on the solid surface. The viscoelastic material is applied as a thin film and exhibits substantial liquid-like characteristics. The viscoelastic material at least partially binds with the particle contaminants. A high velocity liquid is applied to the viscoelastic material, such that the viscoelastic material exhibits solid-like behavior. The viscoelastic material is thus dislodged from the solid surface along with the particle contaminants, thereby cleaning the solid surface of the particle contaminants. | 12-16-2010 |
20110088731 | SEMICONDUCTOR SUBSTRATE CLEANING METHOD USING BUBBLE/CHEMICAL MIXED CLEANING LIQUID - A method has been disclosed which cleans a semiconductor substrate using a cleaning liquid produced by mixing bubbles of a gas into an acid solution in which the gas has been dissolved to the saturated concentration and which brings the zeta potentials of the semiconductor substrate and adsorbed particles into the negative region by the introduction of an interfacial active agent. Alternatively, a semiconductor substrate is cleaned using a cleaning liquid produced by mixing bubbles of a gas into an alkaline solution in which the gas has been dissolved to the saturated concentration and whose pH is 9 or more. | 04-21-2011 |
20110120505 | APPARATUS AND METHOD FOR FRONT SIDE PROTECTION DURING BACKSIDE CLEANING - Embodiments of the present invention provide apparatus and method for front side protection while processing side and backside of a substrate. One embodiment of the present invention provides a showerhead configured to provide a purge gas to a front side of a substrate during a backside etch processing. The showerhead comprises a body configured to be disposed over the front side of the substrate. The body has a process surface configured to face the front side of the substrate. The process surface has an outer circular region, a central region, a middle region between the outer central region and the central region. The first plurality of holes are distributed in the outer circular region and configured to direct the purge gas towards an edge area of the front side of the substrate. No gas delivery hole is distributed within a substantial portion of the middle region. | 05-26-2011 |
20110180114 | LIQUID AEROSOL PARTICLE REMOVAL METHOD - Particles are removed from a surface of a substrate by a method comprising causing liquid aerosol droplets comprising water and a tensioactive compound to contact the surface with sufficient force to remove particles from the surface. | 07-28-2011 |
20110220157 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM STORING A COMPUTER PROGRAM FOR PERFORMING SUBSTRATE PROCESSING METHOD - A substrate processing apparatus according to the present invention comprises: a processing part configured to process a substrate; a chemical-liquid storing container configured to store a chemical liquid; a chemical-liquid supply driving part configured to supply the chemical liquid from the chemical-liquid storing container into the processing part; a circulation line configured to circulate the chemical liquid stored in the chemical-liquid storing container; and a mixture generating part provided on the circulation line. An inert-gas supply source is configured to supply an inert gas into the mixture generating part. The mixture generating part is configured to mix the chemical liquid supplied from the chemical-liquid storing container and the inert gas supplied from the inert-gas supply source with each other so as to generate a gas-liquid mixture. | 09-15-2011 |
20120037192 | JETSPRAY NOZZLE AND METHOD FOR CLEANING PHOTO MASKS AND SEMICONDUCTOR WAFERS - A jetspray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jetspray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a jetspray nozzle outlet, and a flow mixing baffle disposed in the cavity. The mixing baffle preferably is configured and arranged to combine gas and water in the jetspray nozzle for delivering a concentrated stream of gas with a cluster of micro water droplets entrained in the gas for removing contaminant particles from the mask. The jetspray nozzle is capable of cleaning photo masks or wafers without the use of chemicals. | 02-16-2012 |
20120067380 | CLEANING LIQUID, CLEANING METHOD, LIQUID GENERATING APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATING METHOD - An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the cleaning liquid, a prescribed gas of an amount that is greater than or equal to the saturation concentration is dissolved. | 03-22-2012 |
20120211033 | ENDOSCOPE PROCESSING APPARATUS AND ENDOSCOPE PROCESSING METHOD - An endoscope processing apparatus of the invention includes: a cleaning tank which can house an endoscope; a liquid drainage port, a liquid inlet port and a discharge port which are opening portions provided to the cleaning tank; a first-liquid introducing section which introduces a first liquid into a multipurpose conduit; a second-liquid introducing section which introduces a second liquid into the multipurpose conduit; a gas-liquid mixing section which mixes a liquid in the multipurpose conduit with gas, to deliver the mixed fluid to the discharge port; a liquid-feeding section which delivers a liquid in the multipurpose conduit to the gas-liquid mixing section; and an opening/closing section which opens and closes a connection between the multipurpose conduit and the gas-liquid mixing section; and a compressor which delivers the gas to the gas-liquid mixing section. | 08-23-2012 |
20120216840 | ELECTRONIC COMPONENT CLEANING DEVICE AND CLEANING METHOD - A plurality of spray units spray a cleaning liquid to a plurality of spray-target regions between which a site to be cleaned is interposed. The plurality of spray-target regions are linearly extending. The plurality of spray-target regions each has a spray pattern characterized in that a spray direction when viewed from a direction where the plurality of spray-target regions are linearly extending is perpendicular to a plane including the spray-target region. The spray units are disposed such that the plurality of spray-target regions are arranged in juxtaposition each other. The cleaning liquid sprayed from the spray units crashes against the plurality of spray-target regions and thereby generates cleaning liquid flows headed for the site to cleaned. | 08-30-2012 |
20120227770 | TWO-FLUID NOZZLE, SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM FOR STORING SUBSTRATE LIQUID PROCESSING METHOD - There are provided a two-fluid nozzle for effectively performing a liquid process on a substrate while suppressing a damage on the substrate, and a substrate liquid processing apparatus, a substrate liquid processing method and a storage medium using the two-fluid nozzle. The two-fluid nozzle includes a first liquid discharge hole for discharging a first liquid and a gas discharge hole for discharging a gas, and discharges, toward a target object, a mixed fluid of the first liquid discharged from the first liquid discharge hole and the gas discharged from the gas discharge hole. The mixed fluid is mixed at an outside of the two-fluid nozzle. The two-fluid nozzle further includes a second liquid discharge hole for supplying a second liquid toward an outer periphery of a target spot on the target object or toward an inner side of the outer periphery of the target spot. | 09-13-2012 |
20120227771 | Apparatus, Systems, And Methods Adapted To Rinse And Dry Clinical Analyzer Sample Probes - A rinsing and drying apparatus of a clinical analyzer probe drain station is provided. The rinsing and drying apparatus has a group of nozzles that are offset from a longitudinal axis of a probe passage and may be inclined and oriented to provide tangentially oriented fluid-jet trajectories exiting into the sample probe passage. The offset nozzles, nozzle orientation, and cavity geometrical features of the device permit the drying capacity of probe-impinging planar air-knife jets to be maximized by stabilizing local internal fluid movement to form a swirling (e.g., helical) gas flow field directed away from a drying region and toward a vacuum exhaust. The rinsing and drying apparatus eliminates rinse water re-circulated entrainment and up-wash (spitting) during the air-knife drying operation. Therefore, the rinsing and drying apparatus significantly reduces water carryout on sampling probes thereby reducing sample/reagent dilution. | 09-13-2012 |
20120255584 | METHOD OF CLEANING CYLINDERS OR ROLLS - A method of cleaning cylinders ( | 10-11-2012 |
20120273012 | System and Method of Cleaning and Sanitizing a Tea Brewing/Dispensing System - A technique for cleaning a tea concentrate brewing mechanism including heat exchanger tubing and concentrate receptacles employs a safe and effective aqueous chlorine dioxide solution. A chemical dispensing unit employs a venturi body that mixes a sodium chlorite sanitizer with a weak-acid activator injected into the water flow. Preset water-flow rate metering regulation draws in equal amounts of sanitizer and activator. The chemicals are made up in respective concentrations so that the same volume is required of each one. The cleansing solution may be flowed through the brewing mechanism or sprayed on surfaces to be cleaned. | 11-01-2012 |
20120291818 | NON-PHOSPHATE DETERGENTS AND NON-PHOSPHORIC ACIDS IN AN ALTERNATING ALKALI/ACID SYSTEM FOR WAREWASHING - A method of warewashing for the optimization of cleaning is obtained, excess detergent usage is minimized and further where deposit of film on ware is reduced in an alternating acidic and alkaline cleaning method. According to the invention, the type of acid and alkalinity used, or acid salt formed upon application of the acidic and alkaline washes is important to cleaning performance and phosphate or silicates should be avoided. | 11-22-2012 |
20120291819 | CLEANING APPARATUS AND CLEANING METHOD FOR COATING GUN - A rotary atomizing head ( | 11-22-2012 |
20120312336 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM - There is provided a liquid processing apparatus capable of efficiently processing a pattern formation surface of a wafer, while preventing diffusion of a chemical-liquid atmosphere which might possibly occurs during a chemical-liquid process. | 12-13-2012 |
20130000684 | CLEANING METHOD AND CLEANING APPARATUS - A cleaning method of cleaning a joint surface of a processing target substrate separated from a superposed substrate, while the processing target substrate is placed inside an annular frame and held by a tape bonded to a surface of the frame and a non-joint surface of the processing target substrate, the cleaning method including: a placement step of placing a cleaning jig to face the processing target substrate such that a supply surface of the cleaning jig for supplying a solvent for the adhesive onto the joint surface of the processing target substrate covers the joint surface and a distance between the supply surface and the joint surface is a predetermined distance; and a cleaning step of then supplying the solvent between the supply surface and the joint surface and diffusing the supplied solvent over the joint surface by a surface tension. | 01-03-2013 |
20130074882 | DEVICE FOR CLEANING RESPIRATORS - A cleaning device for cleaning respirators, in particular breathing regulators and/or breathing masks, is proposed. The cleaning device comprises at least one cleaning chamber for receiving at least one respirator. The cleaning device also has at least one fluid device for applying at least one cleaning fluid to the respirator. The cleaning device also has at least one pressure application device with at least one pressure connection. The pressure connection can be connected to at least one gas carrying element of the respirator. The pressure application device is set up for applying pressurized gas to the gas carrying element. | 03-28-2013 |
20130087175 | Aircraft Washing System - A vehicle maintenance system is disclosed having a power unit, a pump, a foam generator, an air compressor, first and second fluid tanks, a hose reel assembly, a wash gun assembly and a support member. | 04-11-2013 |
20130098407 | INSTRUMENT REPROCESSORS, SYSTEMS, AND METHODS - An instrument reprocessor is disclosed. The instrument reprocessor includes a basin having a rim located in an inclined plane forming an acute angle with respect to a horizontal plane. At least one nozzle is disposed in a plane substantially parallel to the inclined plane. The at least one nozzle is configured to discharge a stream into the basin in a direction substantially parallel to the inclined plane. A lid assembly is also disclosed. The lid assembly may cover the basin in a close configuration. | 04-25-2013 |
20130152980 | Apparatus, Process, and System for Cleaning Paint Roller Covers - Apparatuses, systems, and methods to clean a paint roller are disclosed. Such apparatuses and systems include a housing with an outlet; a handle connected to housing; an adapter disposed on an end portion of the handle; a nozzle disposed inside the handle; an idler attached to an inside surface of the housing; and a slot disposed on the housing on a location substantially opposite to the location of the inside surface of the housing where the idler is attached, wherein the idler is configured to support a paint roller cover to be cleaned and the slot is configured to receive a first portion of a paint roller frame configured to support the paint roller cover so as to dispose the paint roller cover substantially in front of the cleaning fluid jet. | 06-20-2013 |
20130186435 | Gas Turbine Compressor Water Wash System - The present application provides a water wash system for use with a compressor of a gas turbine engine. The water wash system may include a number of spray nozzles in communication with the compressor, a heat recovery steam generator, a flow of heating water from the heat recovery steam generator, and a tap off line in communication with the flow of heating water and the spray nozzles so as to deliver the flow of heating water to the compressor. | 07-25-2013 |
20130220383 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus for cleaning a substrate is provided. The apparatus includes a cleaning bath in which a substrate holder holding a substrate is disposed in a vertical position, the substrate holder having a sealing member contacting a periphery of a surface of the substrate to seal a gap between the substrate and the substrate holder, and cleaning nozzles each configured to supply a jet of cleaning water to the substrate holder. The cleaning nozzles are disposed in the cleaning bath and arranged concentrically with a contact portion of the substrate surface contacting the sealing member and located at such positions that the jet of cleaning water impinges on the contact portion or its vicinity in an upper half of the substrate. | 08-29-2013 |
20130284213 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - The present disclosure provides a substrate processing method and a substrate processing apparatus. The substrate processing method includes: generating an SPM liquid of a first temperature that contains Caro's acid having a separation effect of a resist film formed on the surface of a substrate by mixing heated sulfuric acid with hydrogen peroxide; cooling the SPM liquid to a second temperature at which a reduction effect of film loss occurs; and applying the SPM liquid of the second temperature to the resist film thereby separating the resist film. | 10-31-2013 |
20130306113 | CLEANING APPARATUS AND METHOD - An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit. A liquid dispensing conduit is connectable to a source of liquid and associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface. | 11-21-2013 |
20140020721 | SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STORAGE MEDIUM - A substrate processing method and apparatus for preventing evaporation of an anti-drying fluorine-containing organic solvent from a substrate during transportation of the substrate into a processing container and can prevent decomposition of a fluorine-containing organic solvent in the processing container. A substrate, the surface of which is covered with a first fluorine-containing organic solvent, is carried into a processing container. The first fluorine-containing organic solvent is removed from the substrate surface by forming a high-pressure fluid atmosphere of a mixture of the first fluorine-containing organic solvent and a second fluorine-containing organic solvent, having a lower boiling point than the first fluorine-containing organic solvent, in the processing container e.g. by supplying a high-pressure fluid of the second fluorine-containing organic solvent into the processing container. Thereafter, a fluid in the state of a high-pressure fluid or a gas is discharged from the processing container to obtain the substrate in the dried state. | 01-23-2014 |
20140060587 | CLEANING METHOD AND CLEANING APPARATUS - The cleaning apparatus includes a reservoir tank for reserving a cleaning fluid, a pressure-feed unit for feeding the cleaning fluid while pressurizing the cleaning fluid above the atmospheric pressure, a heating unit for heating the cleaning fluid pressure-fed from the pressure-feed unit above an atmospheric pressure boiling point of the cleaning fluid, a gas supply unit for supplying a gas and an injection unit connected to the heating unit and the gas supply unit for injecting the cleaning fluid pressurized by the pressure-feeding unit and heated by the heating unit as a pressurized superheated cleaning fluid and the gas supplied from the gas supply unit to the member at the same time. | 03-06-2014 |
20140109939 | NOZZLE APPARATUS AND METHODS FOR TREATING WORKPIECES - Nozzle apparatus and methods for treating workpieces are disclosed. An example apparatus includes a nozzle module and a first nozzle chamber disposed within the nozzle module. The first nozzle chamber has a first nozzle opening and is to deliver a relatively high pressure fluid to the first nozzle opening. The example apparatus also includes a second nozzle chamber disposed within the nozzle module and having a second nozzle opening, the second nozzle chamber to deliver a relatively low pressure fluid to a second nozzle opening. A first flow of the low pressure fluid at least partially contacts a second flow of the high pressure fluid. The second flow is directed onto a workpiece. | 04-24-2014 |
20140137901 | METHODS FOR PROCESSING HETEROGENEOUS MATERIALS - A method of processing a heterogeneous material includes entraining heterogeneous particles into a fluid stream. Each of the heterogeneous particles comprises a liquid portion and a solid portion. The fluid stream is passed through at least one adjustable nozzle, and is impacted to dissociate the liquid from the solid. A method of separating oil from solid particles includes mixing oil-coated solid particles with water to form a slurry, passing a first portion of the slurry through a first nozzle, and passing a second portion of the slurry through a second nozzle such that the second portion of the slurry intersects the first portion of the slurry to separate the oil from the particles. | 05-22-2014 |
20140182633 | System and Method for CMP Station Cleanliness - System and method for CMP station cleanliness. An embodiment comprises a chemical mechanical polishing (CMP) station comprising a housing unit covering the various components of the CMP station. The CMP station further comprising various surfaces of a slurry arm shield, a slurry spray nozzle, a pad conditioning arm shield, a platen shield, a carrier head; and the interior, vertical surfaces of the housing unit. A cleaning liquid delivery system configured to dose a cleaning liquid on the various surfaces of the CMP station at set intervals. | 07-03-2014 |
20140216505 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - A substrate cleaning apparatus includes: a pure water supply line provided with a pure water flow regulator and a pure water supply valve; chemical supply lines each provided with a chemical flow regulator and a chemical supply valve; a merging line where pure water and a plurality of liquid chemicals meet to form a cleaning liquid; a cleaning liquid supply line configured to supply the cleaning liquid to a substrate; and a controller configured to control the pure water flow regulator, the pure water supply valve, the chemical flow regulators, and the chemical supply valves such that the pure water and the plurality of liquid chemicals are present at a predetermined ratio at a meeting point. | 08-07-2014 |
20140251388 | CLEANING SYSTEM AND METHOD OF CLEANING - A method of supplying oxygenated water is performed on a water tank, in which oxygenated water is received. The method lets the water tank supply a constant amount of the oxygenated water once, and then supply the water tank with water and pure oxygen to recover the dissolution ratio of oxygen of the oxygenated water in the water tank. The method may supply a constant amount of oxygenated water every time for the user to drink it up once. | 09-11-2014 |
20140299165 | SANITIZING AND CLEANING PROCESS AND APPARATUS - A process for spraying water containing ozone and other substances is disclosed. A spray nozzle is configured having an orifice, with a plenum or chamber around the orifice. An open end of a tube terminates immediately adjacent the orifice, and is connected to at least a supply of ozone from an ozone generator so that ozone is inserted into a stream or spray of water from the orifice. A halogen generator may also be provided for generating a halogen sanitizer that may be in the spray of water or combined with ozone. Other substances that may be used are the fluid from the halogen generator, soaps and sanitizing metals. | 10-09-2014 |
20150013727 | FLUID NOZZLE DEVICE AND METHOD FOR CLEANING A SUBSTRATE USING THE SAME - A fluid nozzle device includes: at least one fluid nozzle which includes a nozzle body having a first inner surface, a second inner surface that is opposite to and spaced apart from the first inner surface, an inner bottom surface that interconnects the first and second inner surfaces and that cooperates with the first and second inner surfaces to define a receiving space thereamong; a gas-intake tube disposed on top of the nozzle body; a liquid-intake tube formed with a liquid inlet and having at least one liquid outlet that is distal from the gas-intake tube; and a plurality of ejecting channels spaced apart from each other and disposed in the nozzle body. | 01-15-2015 |
20150314340 | HOLDER PRODUCT RANGE AND CLEANING APPARATUS FOR CLEANING BREATHING APPARATUSES - Proposed is a product range for cleaning breathing apparatuses, including at least two holders, wherein the holders include:
| 11-05-2015 |
20150343497 | CLEANING APPARATUS AND METHOD - An apparatus and method for cleaning a surface comprising a gas dispensing conduit having a first end connectable to a source of pressurized gas and an open second end such that a stream of pressurized gas may be dispensed from the open second end of the gas dispensing conduit. A liquid dispensing conduit is connectable to a source of liquid and associated with the gas dispensing conduit in such a way that liquid is introduced into the stream of pressurized gas wherein the liquid dispensing conduit allows liquid to be introduced into the stream of pressurized gas at a rate that causes the liquid to contact the surface to be cleaned while substantially preventing the liquid from running off the surface. | 12-03-2015 |
20160013080 | APPARATUS AND METHOD FOR TREATING SUBSTRATE | 01-14-2016 |
20160153570 | AUTO-SWITCHING TEE JOINT, DEVICE AND METHOD FOR WASHING AND DRYING CLAMPS | 06-02-2016 |