Entries |
Document | Title | Date |
20080196747 | Molecular bonding method with cleaning with hydrofluoric acid in vapor phase and rinsing with deionized water - Adhesion by molecular bonding of two free surfaces of first and second substrates, for example formed by monocrystalline silicon wafers, comprises at least successively:
| 08-21-2008 |
20080210263 | METHOD AND APPARATUS FOR WASHING AND RINSING GLASSWARE - A warewashing apparatus includes a chamber for holding items to be cleaned, a wash system including a plurality of wash nozzles for spraying wash liquid and a rinse system including a plurality of rinse nozzles for spraying rinse liquid. A controller is programmed to carry out a cleaning cycle during which: wash liquid is sprayed onto items in the chamber during a wash step; subsequent to the wash step, hot rinse liquid is sprayed onto the items during a primary rinse step; and subsequent to the primary rinse step, cool rinse liquid is sprayed onto the items during a secondary rinse step. | 09-04-2008 |
20080236631 | WASHER AND DECONTAMINATOR WITH LID CONTROL - A method and apparatus provide for automatically cleaning and decontaminating medical instruments. The method comprising the steps of: a) placing the medical instruments into a container after their use in a medical procedure; b) closing the container to seal the instruments inside whereby to prevent personnel contact with the instruments and any contaminants which might be thereon; c) inserting the sealed container into a washer/decontaminator and sealing the washer/decontaminator; d) the washer/decontaminator automatically opening the container and applying a washing fluid thereto to wash the instruments within the container; and e) the washer/decontaminator automatically applying a disinfectant to the container to disinfect the instruments whereby to allow safe handling thereof by personnel. | 10-02-2008 |
20080257386 | Water-Based Cleaning - A method of cleaning a surface, comprising applying de-gassed water (containing no more than 1 ppm gas) to the surface to disperse or dissolve dirt on the surface in the water. The method may also comprise dissolving hydrophobic dirt on the surface using a non-aqueous solvent, and dispersing the non-aqueous solvent and dissolved hydrophobic dirt in the de-gassed water. The non-aqueous solvent may itself contain low levels of dissolved gas, for example no more than 10 ppm. Apparatus for cleaning a surface is also disclosed. | 10-23-2008 |
20080257387 | Method and apparatus for cleaning ophthalmic lenses - The present invention relates to a method and a device for cleaning ophthalmic lenses, particularly contact lenses. The method and the device are suitable for integration into an automated production of ophthalmic lenses, particularly contact lenses. | 10-23-2008 |
20080314415 | Cleaning Contaminated Materials - Oil contaminated drill cuttings are contacted with an oil soluble surfactant with agitation which causes the hydrophobic moiety of the surfactant to interact with the oil. Next, an aqueous polymer formulation comprising a polymer having polar and/or ionic functionality is added and mixed. Then, an excess volume of water is added with gentle agitation and the mixture is allowed to settle, whereupon the cuttings sediment to the bottom of the receptacle in which the process is undertaken and the supernatant contains a colloidal suspension of particles which comprise oil, surfactant and polymer. The drill cuttings may then be separated from the supernatant by filtration. The supernatant may be treated with a flocculating agent to cause the colloidal particles to sediment. They too may then be separated. | 12-25-2008 |
20090032067 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - After the rinsing processing is completed, the rotation speed of the substrate is reduced from 600 rpm to 10 rpm to form a puddle-like DIW liquid film. After the supply of DIW is stopped, the control unit waits for a predetermined time (0.5 seconds) so that the film thickness t | 02-05-2009 |
20090084412 | NOZZLE ARRAY CONFIGURATION TO FACILITATE DEFLUX PROCESS IMPROVEMENT IN CHIP ATTACH PROCESS - Systems and methods for treating workpieces are described. One embodiment relates to a deflux system including at least one array of nozzles, the nozzles adapted to transmit a fluid outward therefrom. The nozzles are moveable relative to one another, so that a distance between adjacent nozzles can be varied. The nozzles are individually adjustable with respect to an angle of spray emitted therefrom during operation. The system also includes a controller adapted to send a signal to each of the nozzles to transmit the fluid therethrough at a desired angle at a desired time. Other embodiments are described and claimed. | 04-02-2009 |
20090095326 | Apparatus and method for treating substrate - Provided are an apparatus for cleaning a substrate by dipping the substrate in a treating bath filled with a treating solution and a method for cleaning a substrate using the apparatus. A boat provided to each of the treating baths supports the substrate by being in contact with a different point of a substrate during a process. Contact points of the substrate which each of the boats supports are made different at every treating bath, so that contact points of a substrate which are not cleaned in any treating bath can be cleaned in different treating baths. Therefore, an efficiency of a cleaning process is improved. | 04-16-2009 |
20090139548 | Apparatus and method of rinsing and drying semiconductor wafers - An apparatus for rinsing and drying semiconductor wafers includes a rinsing bath, a drying bath and a drying chamber. The rinsing bath and drying bath are connected by a tunnel unit which prevents semiconductor wafers from being exposed to air while being transferred from the rinsing bath to the drying bath. Thus watermarks are prevented from being formed on the semiconductor wafers. A method for rinsing and drying semiconductor wafers includes rinsing the wafers in a rinsing bath, transferring the wafers to a drying bath through a tunnel unit that prevents the semiconductor wafers from the being exposed to air, and after processing the wafers in the drying bath, transferring the wafers to a drying chamber. | 06-04-2009 |
20090151754 | Method and Apparatus for Removing Contaminants from Substrate - A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled velocity to effect removal of the cleaning material and contaminants entrapped within the cleaning material from the surface of the substrate. The controlled velocity of the rinsing fluid is set to cause the cleaning material to behave in an elastic manner when impacted by the rinsing fluid, thereby improving contaminant removal from the surface of the substrate. | 06-18-2009 |
20090211610 | METHOD FOR TREATING A SUBSTRATE - Disclosed herein is a method for treating a substrate wherein a chemical is fed to a surface of the substrate, the method including the steps of: initially feeding a liquid whose electric conductivity is lower than the chemical to a surface of the substrate so as to wet at least a region where the chemical is to be discharged, and discharging the chemical to the region to treat the surface of the substrate with the discharged chemical. | 08-27-2009 |
20090301527 | Mechanized Disinfection of Articles - The invention relates to the use of a cleaning agent which comprises at least two different surfactants, selected from the group including cationic, nonionic and amphoteric surfactants, and which has, when diluted in an aqueous solution and ready for use, a pH of at least 10.5. The cleaning agent is used for killing/inactivating microorganisms which are selected from the group including bacteria, viruses and fungi, during mechanized disinfection of articles. | 12-10-2009 |
20100012156 | Booster tank - A dishwashing machine includes a tub having an interior that holds a first liquid and a booster tank that includes a housing and at least one heater disposed within the housing. The booster tank is at least partially disposed within the interior of the tub such that at least a portion of the booster tank is at least partially submerged within the first liquid, whereby the first liquid is heated by the booster tank. A dishwashing machine includes a tub containing a liquid therein and a wash pump assembly that includes a pump housing; an inlet in the pump housing; an outlet in the pump housing; and a pump having a motor that pumps the liquid from the tub through the pump housing via the inlet to a device that sprays the liquid within a dishwasher via the outlet. The liquid is heated by means of a heater which is disposed either in proximity to the inlet, in proximity to the outlet, and/or in the spray device before the liquid is pumped out of the spray device. | 01-21-2010 |
20100043835 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRAM, AND STORAGE MEDIUM - A second line | 02-25-2010 |
20100071727 | METHOD, APPARATUS, AND SYSTEM FOR BI-SOLVENT BASED CLEANING OF PRECISION COMPONENT - A bi-solvent cleaning system for cleaning precision components without the use of VOC solvents. The bi-solvent cleaning system provides for is a two mode operation for cleaning and rinsing precision components using VOC exempt solvents that is as effective as prior art VOC solvent based systems while subsequently allowing for recovery and reuse of a VOC exempt solvent. | 03-25-2010 |
20100095987 | STREPTOMYCES PROTEASE - Certain aspects of this disclosure relate to an isolated protease, and cleaning compositions containing the same. In some embodiments, the protease may comprise an amino acid sequence that is at least 80% identical to the wild type | 04-22-2010 |
20100095988 | MULTIPLE ENZYME CLEANER FOR SURGICAL INSTRUMENTS AND ENDOSCOPES - The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration shows low foaming and gives a cleaning solution which is not cloudy at least at a temperature in the range from 16° C. to 40° C. In addition, the composition has good cleaning efficacy over a broad temperature range (20 to 55° C.) and shows good material compatibility. | 04-22-2010 |
20100108103 | CLEANING APPARATUS, CLEANING METHOD AND RECORDING MEDIUM - Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a rinsing treatment, and a drying treatment with IPA, in order, on a wafer W while rotating wafer W, and includes a cleaning liquid supply device for supplying a cleaning liquid for cleaning the drain cup and the drain tube to the drain cup in a state where the cleaning liquid is not supplied to the wafer. Also, the apparatus further includes a control unit for controlling respective components of the cleaning apparatus. The control unit, after the cleaning treatment and then the rinsing treatment of wafer W, at the time when the drying treatment is performed by IPA, controls the cleaning liquid to be supplied to the drain cup. | 05-06-2010 |
20100116297 | SYSTEM AND METHOD FOR COMPONENT RECOVERY - A component recovery system, configured to refurbish components, includes a fluid feed tank, a refurbishment compartment having a fluid delivery element, a waste tank, fluid lines connecting the fluid feed tank to the fluid delivery element and the refurbishment compartment to the waste tank, and pumps for delivering fluid through the fluid lines. The component recovery system removes field contaminants, coatings and bonding compounds from components. | 05-13-2010 |
20100122713 | WASHING METHOD AND APPARATUS FOR USE THEREIN - A method of washing an object to be processed, using water containing at least either one selected from a hydrogen radical and a carbon radical, and a novel method capable of exerting sufficient washing effect without using chemicals, by a washing apparatus having a processing bath for washing an object to be processed, and a means for supplying the processing bath with water containing at least either one selected from a hydrogen radical and a carbon radical, and an apparatus for the novel method are provided. | 05-20-2010 |
20100126531 | METHOD AND APPARATUS FOR CLEANING SEMICONDUCTOR DEVICE FABRICATION EQUIPMENT USING SUPERCRITICAL FLUIDS - A process of cleaning a semiconductor device fabrication equipment is provided. In one embodiment, the semiconductor device fabrication equipment is placed in a chamber; a fluid is introduced into the chamber; a pressure and temperature of the fluid is controlled to bring the fluid to a supercritical state; the semiconductor device fabrication equipment is cleaned by having the supercritical fluid contact the semiconductor device fabrication equipment; the supercritical fluid is removed from the chamber; and the semiconductor device fabrication equipment is removed from the chamber. | 05-27-2010 |
20100126532 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A processing solution supply nozzle is moved relatively from one end to the opposite end of a semiconductor wafer having undergone a developing operation while discharging an anti-static processing solution in a discharge width equal to or greater than the width of the semiconductor wafer. The anti-static processing solution is thereby supplied onto the semiconductor wafer. The prevention of charging of the substrate avoids the occurrence of defects. The processing solution supplied almost uniformly on the entire surface of the substrate also avoids the occurrence of defects. | 05-27-2010 |
20100139702 | LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM - Disclosed is a liquid processing method, apparatus, and storage device for cleaning a member disposed at holding part-side of a substrate, such as a lift pin plate (including a lift pin) or a holding plate, with a rinsing liquid, thereby preventing a chemical liquid adhered to such a member from having a bad influence on the wafer. The liquid processing method includes holding the substrate by a holding part, rotating the substrate held by the holding part through a rotation driving part, and supplying a chemical liquid to a holding part-side surface of the substrate by a chemical liquid supply part. After the supply of the chemical liquid, rinsing liquid droplets are generated and supplied to the holding part-side surface of the substrate by supplying gas toward the holding part-side surface of the substrate through a gas supply part and supplying a rinsing liquid toward the holding part-side surface of the substrate through a rinsing liquid supply part. After the supply of the rinsing liquid droplets, a rinsing liquid is additionally supplied to the holding part-side surface of the substrate through the rinsing liquid supply part. | 06-10-2010 |
20100139703 | LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS, AND STORAGE MEDIUM - Disclosed is a liquid processing method. The liquid processing method can completely clean an inside of a multi-valve for a short time and process a wafer with high throughput. The liquid processing method supply a chemical liquid and a rinsing liquid to the substrate so as to process the substrate through a multi-valve and a cleaning-liquid supply pipe connected to the multi-valve. The multi-valve includes a chemical-liquid supply valve, a rinsing-liquid supply valve, and a discharge valve. The cleaning-liquid supply pipe guides the chemical liquid and rinsing liquid from the multi-valve toward the substrate. The liquid processing method includes supplying the chemical liquid to the substrate by opening the chemical-liquid supply valve, and supplying a portion of the rinsing liquid supplied from a rinsing-liquid supply part to the substrate and flowing the residue of the rinsing liquid toward the discharge path within the multi-valve by opening both the rinsing-liquid supply valve and the discharge valve after supplying the chemical liquid. | 06-10-2010 |
20100139704 | COMPOSITION CONTAINING SUPERABSORBENT POLYMERS - Composition in the form of a gel containing at least 35% by weight of water, at least one foaming surfactant chosen from nonionic or amphoteric surfactants, and at least one superabsorbent polymer. The superabsorbent polymer helps to thicken the composition without affecting its cosmetic properties. | 06-10-2010 |
20100147334 | Coated-type silicon-containing film stripping process - There is disclosed a coated-type silicon-containing film stripping process for stripping off to remove a coated-type silicon-containing film obtained by coating a silicon-containing film composition used in a lithography on a substrate, comprising, at least: a first step of treating the silicon-containing film with an acidic stripping solution containing sulphate ion and/or fluoride ion; and a second step of treating the silicon-containing film with an alkaline stripping solution containing a nitrogen compound. There can be provided a process for allowing a silicon-containing film, which has not been conventionally removed unless dry stripping is adopted, to be removed by a stripping process based on a stripping solution (wet stripping). | 06-17-2010 |
20100154833 | Resist film removing apparatus, resist film removing method, organic matter removing apparatus and organic matter removing method - A sheetfed resist removing apparatus having a substrate ( | 06-24-2010 |
20100154834 | CLEANING APPARATUS, COATING AND DEVELOPING APPARATUS, AND CLEANING METHOD - A wafer W is held in a horizontal attitude within an airtight container | 06-24-2010 |
20100192985 | COMPOSITIONS AND METHODS COMPRISING SERINE PROTEASE VARIANTS - The present invention provides methods for protein engineering and serine protease variants produced there from. Specifically, the present invention provides serine protease variants having one or more substitutions as compared to a reference serine protease. In addition, the present invention provides compositions comprising these serine protease variants. In some embodiments, the present invention provides cleaning compositions comprising at least one of these serine protease variants. | 08-05-2010 |
20100218790 | DEVICE FOR CLEANING OPTICAL MEASUREMENT BODIES THAT HAVE AN AREA FOR CONTACT WITH THE SURFACE OF THE EYE - A device for cleaning optic gauges ( | 09-02-2010 |
20100229897 | USE OF HYDROXYCARBOXYLATES FOR WATER HARDNESS CONTROL - The present invention relates to compositions including threshold agents, and methods of use thereof. The threshold agents can include hydroxycarboxylate compounds present at an amount sufficient to control water hardness. The threshold agents are present in the wash solution at a molar amount less than the molar amount of water hardness ions present. | 09-16-2010 |
20100236579 | SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD - A substrate processing apparatus and a substrate processing method are capable of restraining or preventing the generation of streaky particles on a substrate surface by excellent removal of a rinsing liquid therefrom. The substrate processing apparatus has a substrate inclining mechanism for inclining a substrate held by a substrate holding mechanism. After a rinsing liquid has been supplied onto a substrate to form a liquid mass, the substrate is inclined at a small angle by the substrate inclining mechanism. Then, the liquid mass is downwardly moved without being fragmented and then falls down without leaving minute droplets on the substrate top. Thereafter, the substrate is returned to a horizontal posture and then dried. | 09-23-2010 |
20100236580 | METHOD AND SYSTEM FOR REMOVING PCBs FROM SYNTHETIC RESIN MATERIALS - A system that removes PCBs from synthetic resins in an environmentally safe and economical manner. The system includes a solvent wash subsystem ( | 09-23-2010 |
20100236581 | METHODS FOR CLEANING INDUSTRIAL EQUIPMENT WITH PRE-TREATMENT - A method of cleaning equipment such as heat exchangers, evaporators, tanks and other industrial equipment using clean-in-place procedures and a pre-treatment solution prior to the conventional CIP cleaning process. The pre-treatment step improves the degree of softening of the soil, and thus facilitates its removal. The pre-treatment solution can be a strong acidic solution, a strong alkaline solution, or comprise a penetrant. A preferred strong acidic solution is an acid peroxide solution. In some embodiments, the pre-treatment may include no strong alkali or acid ingredient; rather, the penetrant provides acceptable levels of pre-treatment. | 09-23-2010 |
20100236582 | Cleaning compositions for hard to remove organic material - An oxidizing cleaning composition comprises a low concentration of aqueous hydrogen peroxide that is environmentally friendly and has good stability in strong alkaline solutions. The aqueous hydrogen peroxide composition contains a synergistic combination of one or more hydrophilic surfactants having an HLB of 10 or greater, one or more hydrotropes, one or more UV-analyzable surfactants having an aromatic detectable functional group, and optionally a surfactant having an HLB of less than 10. The cleaning composition when mixed with an alkaline compound is very effective in removing dried or baked residues of polymers, modified or natural celluloses starches, natural gels, and the like at low concentrations and temperatures. | 09-23-2010 |
20100282278 | EXPOSURE APPARATUS, CLEANING METHOD, AND DEVICE MANUFACTURING METHOD - The exposure apparatus of the present invention includes a cleaning nozzle that discharges a cleaning liquid or a rinsing liquid so as to clean a member that forms a space between a end surface of the projection optical system and a surface of the substrate stage facing the end surface and clean a member that is present in the space, a cleaning liquid supply unit configured to supply the cleaning liquid to the cleaning nozzle, a rinsing liquid supply unit configured to supply the rinsing liquid to the cleaning nozzle, and a control unit configured to control the supply from the cleaning liquid supply unit and the rinsing liquid supply unit. The control unit carries out control such that the rinsing liquid is supplied successively with the discharge of the cleaning liquid before and after the discharge of the cleaning liquid from the cleaning nozzle. | 11-11-2010 |
20100282279 | AUTOMATIC SANITATION SYSTEM - A cover for a pedicure spa containing an automatic sanitation apparatus is disclosed. When activated, the cover automatically sprays disinfectant in a circular motion from a nozzle on the bottom of the cover. The interior surfaces of the pedicure basin are treated with the disinfectant solution. The pedicure basin is thereby efficiently and thoroughly sanitized. | 11-11-2010 |
20100288311 | Multi-Stage Substrate Cleaning Method and Apparatus - A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. | 11-18-2010 |
20100300492 | Method and Apparatus for Physical Confinement of a Liquid Meniscus over a Semiconductor Wafer - Apparatus, methods and systems for physically confining a liquid medium applied over a semiconductor wafer include a first and a second chemical head that are disposed to cover at least a portion of a top and an underside surface of the semiconductor wafer. Each of the first and the second chemical heads include an angled inlet conduit at a leading edge of the respective chemical heads to deliver liquid chemistry into a pocket of meniscus in a single phase. The pocket of meniscus is defined over the portion of the top and underside surface of the semiconductor wafer covered by the chemical heads and is configured to receive and contain the liquid chemistry applied to the surface of the semiconductor wafer as a meniscus. A step is formed at a leading edge of the first and second chemical heads along an outer periphery of the pocket of meniscus to substantially confine the meniscus of the liquid chemistry within the pocket of meniscus. The step covers at least a portion of the pocket of meniscus and the step's height is sufficient to preserve confinement characteristic of the meniscus. An inner return conduit is defined within the pocket of meniscus at a trailing edge of the respective chemical heads and is used to remove the liquid chemistry from the surface of the semiconductor wafer in a single phase after the cleaning process. | 12-02-2010 |
20100300493 | POT AND PAN SOAKING COMPOSITION - A soaking composition including an alkalinity source, a metal protector, a surfactant, water, a threshold agent, a binding agent, and a polymer blend that functions as a binding agent and a hard water modifier. The polymer blend includes a polymaleic acid, a polycarboxylic acid and a sodium polyacrylate. | 12-02-2010 |
20100319734 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND STORAGE MEDIUM - In a liquid processing apparatus configured to remove, from a substrate including a first film and a second film formed above the first film, the first film and the second film, a first chemical-liquid supply part supplies, to a substrate W, a first liquid for dissolving the first film, a second chemical-liquid supply part supplies a second chemical liquid for weakening the second film, and a fluid supply part serving also as an impact giving part gives a physical impact to the second film so as to break the second film and supplies a fluid for washing away debris of the broken second film. A control device controls the respective parts such that, after the second liquid has been supplied and then the fluid has been supplied from the fluid supply part, the first chemical liquid is supplied. | 12-23-2010 |
20100326476 | METHOD FOR PROCESSING A SUBSTRATE AND APPARATUS FOR PERFORMING THE SAME - An apparatus for processing substrate includes a spin chuck, a first nozzle and a second nozzle. The spin chuck fixes and spins the substrate on which a photoresist layer is formed. The first nozzle is disposed over the spin chuck and provides a treatment liquid on the substrate so as to remove the photoresist layer. The second nozzle is disposed over the spin chuck and provides a mist including deionized water or hydrogen peroxide on the substrate to make contact with the treatment liquid so as to increase a temperature of the treatment liquid. Therefore, efficiency of removing the photoresist layer may be improved. | 12-30-2010 |
20110000511 | DEEP CLEAN CYCLE - A dishwasher includes a housing, a wash chamber in the housing that receives kitchenware therein, a detergent dispenser for introducing a detergent into the wash chamber, and a heater for raising temperature in the wash chamber. The dishwasher further includes a controller for selectively controlling water supply to and from the dish chamber. The controller establishes a temperature of the wash fluid circulating in the wash chamber during the first period in a range from about 115° F. (46° C.) to about 135° F. (58° C.) to enhance the wash performance of enzyme-based detergents and establishes a temperature of the wash fluid during a second period in the range from about 150° F. (65° C.) to about 160° F. (72° C.) to enhance wash performance of a chlorine-based detergent. A method of washing kitchenware contained in the dishwasher comprises (i) removing loose soil on the kitchenware in at least one pre-wash cycle, (ii) washing the kitchenware in a main wash cycle, and (iii) rinsing the kitchenware in at least one rinse cycle. The main wash cycle comprises the actions of (i) washing the kitchenware in a first temperature range for enzyme-based detergent for a first period and (ii) washing the kitchenware in a second temperature range for chlorine-based detergent for a second period. | 01-06-2011 |
20110030735 | CLEANING METHOD OF USED PAPER RECYCLING APPARATUS, CLEANING SYSTEM, AND USED PAPER RECYCLING APPARATUS - The present invention presents a cleaning technology in a used paper recycling apparatus capable of assuring a stable used paper recycling operation all the time, by removing and cleaning securely the used paper pulp remaining in the parts of the apparatus components of a used paper recycling apparatus of furniture size. The cleaning method of the cleaning system includes a white water cleaning process of circulating white water dewatered and collected in the paper making unit for manufacturing regenerated paper from used paper pulp in a pulp making unit and a pulp concentration adjusting unit of apparatus components for composing the used paper recycling apparatus by a white water cleaning unit, and cleaning the pulp making unit and the pulp concentration adjusting unit, and clean water cleaning processes of cleaning the paper making unit by clean water by a clean water cleaning unit. As a result, the used paper pulp remaining in the parts of the apparatus components can be securely cleaned and removed, and a stable used paper recycling operation can be assured all the time. | 02-10-2011 |
20110048466 | METHOD AND EQUIPMENT FOR THE WASHING AGAINST CURRENT, FOR THE TRANSPORTATION AND THE PHYSICAL/CHEMICAL TREATMENT OF VEGETABLES AND FRUITS, IN A RESTRICTED ENVIRONMENT, WITH HIGH WATER AND ENERGY EFFICIENCY - The technology of washing and treatment MWU (modular washing unit) is conceived to wash and treat fruits and vegetables in a confined environment, with progressively more and more clean water (counter-current) and with an optimal ratio between the quantities of water used and processed products. The system allows important savings of water, chemicals and energy. The technology of washing and treatment MWU (modular washing unit) is conceived to allow the transport and the treatment of the product in confined environment, with clean water (counter-current) In the MWU the product is submitted to sequence of filling and emptying with appropriated solutions, progressively cleaner, prior to subsequent discretionary treatments. A treatment plant can be equipped with a variable number of MWUs, with additional remote MWUs to meet the desired production capacity. Each MWU consists of a vertical watertight cylinder containing a concetric basket; on the top it is connected to the main product manifold and to the vacuum collector, and at the bottom it is connected to the product drain collector, to the load/unload manifold and to the fluids recycling manifolds. Each MWU is connected to the other MWU of the plant, and to the external tank, through independent manifolds, by appropriate valves, to prevent the mixing of fluids and the cross-contamination. | 03-03-2011 |
20110048467 | Apparatus and System for Cleaning Substrate - An upper processing head includes a topside module defined to apply a cleaning material to a top surface of a substrate and then expose the substrate to a topside rinsing meniscus. The topside module is defined to flow a rinsing material through the topside rinsing meniscus in a substantially uni-directional manner towards the cleaning material and opposite a direction of movement of the substrate. A lower processing head includes a bottomside module defined to apply a bottomside rinsing meniscus to the substrate so as to balance a force applied to the substrate by the topside rinsing meniscus. The bottomside module is defined to provide a drain channel for collecting and draining the cleaning material dispensed from the upper processing head when the substrate is not present between the upper and lower processing heads. The upper and lower processing heads can include multiple instantiations of the topside and bottomside modules, respectively. | 03-03-2011 |
20110061685 | METHOD AND APPARATUS FOR SHOWERHEAD CLEANING - Embodiments of the present invention generally relate to a method and apparatus for ex-situ cleaning of a chamber component part. In one embodiment, a system for cleaning component parts in a cleaning chemistry is provided. The system comprises a wet bench set-up comprising a cleaning vessel assembly for holding one or more component parts to be cleaned during a cleaning process and a detachable cleaning cart detachably coupled with the cleaning vessel assembly for supplying one or more cleaning chemistries to the cleaning vessel assembly during the cleaning process. | 03-17-2011 |
20110061686 | MULTIPLE ENZYME CLEANER FOR SURGICAL INSTRUMENTS AND ENDOSCOPES - The liquid composition is based on surfactants and enzymes, and is particularly useful for manual cleaning of instruments. In manual and ultrasonic application the composition in use concentration shows low foaming and gives a cleaning solution which is not cloudy at least at a temperature in the range from 16° C. to 40° C. In addition, the composition has good cleaning efficacy over a broad temperature range (20 to 55° C.) and shows good material compatibility. | 03-17-2011 |
20110061687 | Apparatus for Contained Chemical Surface Treatment - Apparatuses for preparing a surface of a substrate using a proximity head includes a carrier to hold and move the substrate along an axis and a proximity head having a head surface with a plurality of outlet ports defined thereon. The proximity head is defined to be positioned proximate and over the carrier and the surface of the substrate. A length of the head surface of the proximity head is defined to be greater than a diameter of the substrate and at least partially overlapping over the carrier when the substrate is present. The proximity head includes a first set of outlet ports in a first region defining a first applicator that is configured to apply a non-Newtonian fluid between a surface of the carrier and the head surface of the proximity head. A second set of outlet ports in a second region of the proximity head defines a second applicator that is configured to apply a first chemistry to the surface of the substrate when present. The second region is adjacent to the first region. A third set of outlet ports in a third region of the proximity head defines a third applicator that is configured to apply the non-Newtonian fluid between the head surface of the proximity head and the surface of the substrate when present. The third region is defined adjacent to the second region. A fourth set of outlet ports is defined in the second region of the proximity head to substantially remove the first chemistry from the surface of the substrate when present. | 03-17-2011 |
20110067734 | APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE - A method of cleaning a semiconductor substrate includes cleaning a semiconductor substrate with a cleaning liquid, rinsing the semiconductor substrate with rinse water after the semiconductor substrate has been cleaned, and drying the semiconductor substrate after the semiconductor substrate has been rinsed. A temperature of the rinse water is set to 70° C. or above in the rinsing, and the rinse water is set so as to be acidic. | 03-24-2011 |
20110067735 | ACTIVE CONTAINING DELIVERY PARTICLE - The present invention relates to non-surfactant active containing delivery particles, cleaning compositions comprising said particles, and processes for making and using the aforementioned particles and cleaning compositions. When employed in cleaning compositions, such particles provide more uniform active delivery. Thus, resulting in improved cleaning performance without the increased cleaning negatives that may be associated with higher levels of certain active levels. | 03-24-2011 |
20110073138 | CLEANING SYSTEM UTILIZING AN ORGANIC CLEANING SOLVENT AND A PRESSURIZED FLUID SOLVENT - A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After an organic solvent cleaning cycle, the solvent is extracted from the textiles at high speed in a rotating drum in the same way conventional solvents are extracted from textiles in conventional evaporative hot air dry cleaning machines. Instead of proceeding to a conventional drying cycle, the extracted textiles are then immersed in pressurized fluid solvent to extract the residual organic solvent from the textiles. This is possible because the organic solvent is soluble in pressurized fluid solvent. After the textiles are immersed in pressurized fluid solvent, pressurized fluid solvent is pumped from the drum. Finally, the drum is de-pressurized to atmospheric pressure to evaporate any remaining pressurized fluid solvent, yielding clean, solvent free textiles. The organic solvent is preferably selected from terpenes, halohydrocarbons, certain glycol ethers, polyols, ethers, esters of glycol ethers, esters of fatty acids and other long chain carboxylic acids, fatty alcohols and other long-chain alcohols, short-chain alcohols, polar aprotic solvents, siloxanes, hydrofluoroethers, dibasic esters, and aliphatic hydrocarbons solvents or similar solvents or mixtures of such solvents and the pressurized fluid solvent is preferably densified carbon dioxide. | 03-31-2011 |
20110088728 | Auto-emulsifying cleaning systems and methods for use - An auto-emulsifying cleaning composition capable of emulsifying upon contact with water, the composition in one typical embodiment comprising, based on the total weight of the composition, (a) from about 1% to about 99% by weight a blend of dibasic esters; (b) from about 1% to about 40% by weight of a blend of surfactants consisting of an organic anion neutralized with an organic cation, where either or both of the anion and the cation have surfactant properties, and the complex of which is soluble in the dibasic ester solvent blend. The blend of surfactants is typically a cationic surfactant and an anionic surfactant, which may or may not be used in conjunction with non-ionic surfactants. The dibasic esters are be derived from a blend of adipic, glutaric, and succinic diacids, and, in one particular embodiment, the blend comprises dialkyl adipate, dialkyl methylglutarate and dialkyl ethylsuccinate, wherein the alkyl groups individually comprise a C | 04-21-2011 |
20110108069 | METHOD AND COMPOSITION FOR REMOVING CONTAMINATION FROM SURFACES IN CONTACT WITH WATER - A composition and method for the removal of biological fouling from wetted surfaces intermittently or continuously in contact with water is disclosed. The method includes the steps of preparing a cleaning composition of basic pH from a strong base and an active oxygen donor component, applying the composition to the surface to be cleaned, and after a selected residence time, removing any unreacted cleaning composition and all removed fouling by rinsing or flushing with water. | 05-12-2011 |
20110114135 | DEVICE FOR CLEANING A COMPONENT, IN PARTICULAR AN EVAPORATOR OF A CONDENSER DEVICE - A device that has a component within a process air circuit of a washer dryer or tumble dryer; a condensate water trough in which condensate water is collected that is formed in the process air circuit as a result of drying damp laundry; and a first lever arm rotatably fastened to a rinse tank above the component. The component is to be cleaned and the condensate water is conducted from the condensate water trough to the rinse tank. Further, the condensate water is dispensed from an outlet opening of the rinse tank to the component. The rinse tank has a closure to selectively open and close the outlet opening and an actuator to actuate the closure. Also, the closure has a sealing head that is connected to the first lever arm and that closes the outlet opening. | 05-19-2011 |
20110120502 | Substrate Washing Apparatus and Methods of Use - Embodiments of the invention generally relate to apparatus and methods for washing substrates. In particular, apparatus and methods for washing solar cell substrates are described, the apparatus including a detergent mixing circuit to control detergent concentration during washing. | 05-26-2011 |
20110120503 | RINSING/SANITIZING SYSTEM FOR A WASHING MACHINE - A rinsing and/or sanitizing system for a washing machine, such as a pot and pan washing machine, is provided. In one embodiment, the system includes two sections of conduit with fluid-dispensing openings or nozzles and a third section of conduit connecting the other two sections. The nozzles spray fluid into the space between the conduits, creating a curtain of fluid, in a common plane. In a preferred embodiment, the fluid sprayed is water to rinse items. In another preferred embodiment, the fluid sprayed is a sanitizing agent to sanitize items. In still another embodiment, the system sprays both water and a sanitizing agent. Another aspect of the invention is a method of rinsing and/or sanitizing an item by moving the item through the curtain of fluid of the rinse system. | 05-26-2011 |
20110139188 | WAFER CLEANING DEVCIE AND METHOD THEREOF - A wafer cleaning device comprising a wafer stage for holding a wafer having a surface to be washed, a first nozzle positioned above the wafer, a second nozzle positioned above the wafer. A first height is between the first nozzle and the surface and a second height is between the second nozzle and the surface, wherein the first height is shorter than the second height. | 06-16-2011 |
20110139189 | Device and Method for the Regeneration of Biosensors - A device for the regeneration of a biosensor, having an immobilized and biologically active material applied to the surface of a carrier that is suitable for interacting with a substance to be analyzed. The device comprises at least one injector through which, by means of a pump, at least one solution can be applied to the surface of the carrier for the purposes of rinsing the biologically active material. | 06-16-2011 |
20110146724 | PHOTORESIST STRIPPING SOLUTIONS - The present invention discloses a photoresist stripper for removing positive and negative tone photoresist, bonding adhesive, ink mark and post etch residue etc. from semiconductor substrates. The photoresist stripper comprises:
| 06-23-2011 |
20110146725 | Hard Surface Cleaning Composition Having A Malodor Control Component And Methods Of Cleaning Hard Surfaces - A hard surface cleaning composition comprising a malodor control component, and methods of cleaning hard surfaces are provided. In some embodiments, the hard surface cleaning composition comprises at least one volatile aldehyde and an acid catalyst. | 06-23-2011 |
20110162680 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step. | 07-07-2011 |
20110168211 | SEMICONDUCTOR WAFER CLEANING SYSTEM AND METHOD - A method of and system for cleaning semiconductor wafers minimizes the exposure of the wafers to the air by washing, rinsing and drying the wafers in one cleaning chamber. The system includes a wafer support by which a plurality of wafers can be supported in the cleaning chamber as oriented vertically and spaced from each other, and tubular de-ionized water supply nozzles extending longitudinally in the direction in which the wafers are spaced from each other as disposed to the sides of the wafers. Each de-ionized water supply nozzle has an inner nozzle passageway, and a plurality of sets of nozzle holes extending radially through the main body of the nozzle from the inner nozzle passageway. Each such set of nozzle holes subtends an angle of 80˜100° in a vertical plane and is directed towards a surface of a respective wafer W. During a primary rinse procedure, the de-ionized water is supplied to the de-ionized water spray nozzles, and the liquid in the cleaning chamber is simultaneously discharged from a lower part of the chamber and by being allowed to overflow the chamber. The supplying of the de-ionized water to the de-ionized water spray nozzles and the discharging of the cleaning chamber are carried out in proportions that minimize differences in the etching rate of a wafer across the surface thereof. | 07-14-2011 |
20110174340 | LOW AND HIGH TEMPERATURE ENZYMATIC SYSTEM - An enzymatic system includes a first pH neutral composition and a second pH neutral composition. The first pH neutral composition includes a low temperature enzyme effective at removing blood and hemoglobin. The second pH neutral composition includes a high temperature enzyme effective at removing mucous, fibrin and fat. In one embodiment, the low temperature enzyme has an activation temperature of about 50 degrees to about 120 degrees Fahrenheit and the high temperature enzyme has an activation temperature of about 140 to about 180 degrees Fahrenheit. | 07-21-2011 |
20110180112 | METHOD OF REMOVING/PREVENTING REDEPOSITION OF PROTEIN SOILS - A method and composition is provided for removing protein soil and preventing redeposition of soils onto a surface. The method includes introducing a protein-removing/anti-redeposition agent during a washing step of a wash cycle, introducing a cleaning composition during the washing step of the wash cycle, washing the surface of the substrate with the protein-removing/anti-redeposition agent and the cleaning composition during the wash cycle, and subsequently rinsing the surface of the substrate with a rinse aid. The protein-removing/anti-redeposition agent includes a poly sugar and the cleaning composition includes an alkalinity source and a surfactant component. The composition is substantially free of phosphorus-containing compounds and includes less than about 0.05% by weight alkali earth metal. | 07-28-2011 |
20110186086 | OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES - An oxidizing aqueous cleaning composition and process for cleaning post-plasma etch residue and/or hardmask material from a microelectronic device having said residue thereon. The oxidizing aqueous cleaning composition includes at least one oxidizing agent, at least one oxidizing agent stabilizer comprising an amine species selected from the group consisting of primary amines, secondary amines, tertiary amines and amine-N-oxides, optionally at least one co-solvent, optionally at least one metal-chelating agent, optionally at least one buffering species, and water. The composition achieves highly efficacious cleaning of the residue material from the microelectronic device while simultaneously not damaging the interlevel dielectric and metal interconnect material also present thereon. | 08-04-2011 |
20110192428 | WASTEWATER TANK STORAGE TREATMENT - A method and composition for treating a wastewater storage tank during non-use. The method comprises adding a storage deodorant composition to a wastewater storage tank, the storage deodorant composition comprising an odor control agent, a detergent, a surface active agent, and a lubricant; and leaving the storage composition in the wastewater storage tank for a period of 1 day to 12 months. | 08-11-2011 |
20110197928 | Carrier for Reducing Entrance and/or Exit Marks Left by a Substrate-Processing Meniscus - A carrier for supporting a substrate during processing by a meniscus formed by upper and lower proximity heads is described. The carrier includes a frame having an opening sized for receiving a substrate and a plurality of support pins for supporting the substrate within the opening. The opening is slightly larger than the substrate such that a gap exists between the substrate and the opening. Means for reducing a size and frequency of entrance and/or exit marks on substrates is provided, the means aiding and encouraging liquid from the meniscus to evacuate the gap. A method for reducing the size and frequency of entrance and exit marks is also provided. | 08-18-2011 |
20110220152 | SUPERCRITICAL DRYING METHOD AND SUPERCRITICAL DRYING APPARATUS - According to one embodiment, a substrate having a plurality of adjacent patterns on one surface thereof is cleaned by cleaning liquid. Subsequently, after the cleaning liquid is displaced with pure water, the pure water is displaced with displacement liquid. Under a condition that the displacement liquid among the patterns does not vaporize, the displacement liquid not contributing to prevention of collapse of the patterns is removed. After the displacement liquid is removed, the substrate is held in supercritical fluid and the displacement liquid among the patterns is displaced with the supercritical fluid. After the displacement liquid among the patterns is displaced with the supercritical fluid, the supercritical fluid adhering to the substrate is vaporized. | 09-15-2011 |
20110220153 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - There is provided a substrate processing method including cleaning a substrate by immersing the substrate in a cleaning solution in a longitudinal direction while the cleaning solution is supplied to a cleaning tank; transferring the substrate picked up from the cleaning tank to a drying chamber while holding the substrate in a longitudinal direction; and drying the substrate in the drying chamber communicating with an upper area of the cleaning tank by alternately supplying a first drying gas containing vapor of a solvent for removing a liquid and a second drying gas without containing the vapor of the solvent for removing the liquid to an area where the substrate is exposed between the upper area of the cleaning tank and the drying chamber after an upper end of the cleaned substrate is picked up from a liquid surface of the cleaning solution. | 09-15-2011 |
20110220154 | Dental Appliance Cleanser - This disclosure relates to a persulfate-free dental appliance cleanser containing a low-concentration of chlorhexidine, or a pharmaceutically acceptable salt thereof. | 09-15-2011 |
20110232693 | METALLIC SOLDERABILITY PRESERVATION COATING ON METAL PART OF SEMICONDUCTOR PACKAGE TO PREVENT OXIDE - Embodiments of the present invention are directed to metallic solderability preservation coating on connectors of semiconductor package to prevent oxide. Singulated semiconductor packages can have contaminants, such as oxides, on exposed metal areas of the connectors. Oxidation typically occurs on the exposed metal areas when the semiconductor packages are not stored in appropriate environments. Copper oxides prevent the connectors from soldering well. An anti-tarnish solution of the present invention is used to coat the connectors during sawing, after sawing, or both of a semiconductor array to preserve metallic solderability. The anti-tarnish solution is a metallic solution, which advantageously allows the semiconductor packages to not need be assembled immediately after fabrication. | 09-29-2011 |
20110240064 | Polymeric Coatings Incorporating Bioactive Enzymes for Cleaning a Surface - Disclosed herein are a materials such as a coating, such as an architectural coating or a CARC coating, comprising a lipolytic enzyme or organophosphorous compound degrading enzyme. Also disclosed herein are methods of decontaminating a surface comprising such a material from a chemical substrate of an enzyme such as a lipid or an organophosphorus compound. | 10-06-2011 |
20110240065 | CARE POLYMERS - The present application relates to care agents, for example care polymers, and compositions such as consumer products comprising such care agents, as well as processes for making and using such care agents and such compositions. The performance of the care polymers that Applicants teach, can be further increased by following the emulsification teaching of the present specification and/or combining such care polymers with silicone materials. | 10-06-2011 |
20110240066 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - Disclosed is a substrate processing apparatus capable of drying a substrate to be processed while suppressing a pattern collapse or occurrence of contamination. In a processing vessel, a substrate is immersed in a liquid in the longitudinal direction, and the liquid is pushed out by a substitution fluid of a supercritical state to be discharged from the processing vessel. Thereafter, the substitution fluid subjected to the substitution with the liquid is discharged from the processing vessel to depressurize the processing vessel, and the substitution fluid is changed from the supercritical state to a gaseous state to dry the substrate. | 10-06-2011 |
20110247660 | PHOTORESIST STRIPPING SOLUTION - The present invention discloses a method of making a photoresist stripper for removing a positive or negative tone photoresist, bonding adhesive, ink mark, and/or post etch residue from a semiconductor substrate, comprising a) an organic sulfonic acid, (b) a halogen-free organic solvent, and (c) an alkanolamine and (d) amine sulfonate or amine sulfonamide or mixtures thereof from semiconductor substrates. | 10-13-2011 |
20110253176 | METHOD AND APPARATUS FOR WASHING SUBSTRATE - A substrate washing method for supplying a process liquid onto a substrate to wash the substrate includes the steps of (a) supplying a first process liquid of a first temperature onto the substrate having a resist pattern, to cover a surface of the substrate with the first process liquid, and (b) supplying a second process liquid onto the surface of the substrate covered with the first process liquid, to cover the surface of the substrate with the second process liquid of a second temperature higher than the first temperature, thereby removing the resist pattern. | 10-20-2011 |
20110259372 | SYSTEMS, METHODS AND COMPOSITIONS RELATING TO COMBUSTIBLE BIOMATERIALS - A method for washing biomass is described. The method includes: (i) receiving a first discrete amount of biomass; (ii) receiving a second discrete amount of biomass; (iii) washing the first discrete amount of biomass with solvent to produce a first effluent stream enriched with inorganic material; and (iv) washing the second discrete amount of biomass with the first effluent stream to produce a second effluent solvent stream. | 10-27-2011 |
20110265830 | Cleaning compositions for removing organic deposits on surfaces and method of use - The present invention is improved cleaning method and composition for cleaning headlight lens using a composition having water, at least one ketone and a surfactant where the ratio of ketone to surfactant is between 1:0.02-1.0. | 11-03-2011 |
20110271985 | Surface Cleaning with Concurrently Usable Prespray and Rinse Units - A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas. The system includes a prespray unit having a proportional pump driven by water from a water service line. The pump mixes the water with prespray and feeds the diluted prespray to a spray gun. The system also includes a rinse unit having a triplex pump that receives water from the water service line, increases the water's pressure, and feeds the pressurized water to an injector. The injector mixes the water with a rinse agent and feeds the diluted rinse agent to a nozzle arrangement on an extraction wand. In use, areas of the soiled surface are first pre sprayed with the diluted prespray. The diluted prespray is allowed to dwell on the pre sprayed areas. After the dwell time of the diluted prespray on a pre sprayed area has elapsed, the pre sprayed area is rinsed and extracted with the extraction wand. This system allows the prespray unit to continue pre spraying soiled areas at the same time as the rinse unit is rinsing and extracting pre sprayed areas having elapsed dwell times. | 11-10-2011 |
20110277796 | METHOD OF CLEANSING SKIN HAVING AN IMPAIRED BARRIER - This invention relates to a method of cleansing skin having an impaired barrier function. The method of this invention utilizes cleansing compositions that have the characteristic of minimally perturbing or interacting with the skin barrier by applying to the skin a cleansing composition comprising (i) at least one low molecular weight, non-cross-linked, linear acrylic copolymer and (ii) at least one surfactant selected from the group consisting of anionic surfactants, amphoteric surfactants, and combinations of two or more thereof, the cleansing composition having a ΔST(65) of greater than about 2 mN/m. | 11-17-2011 |
20110308554 | Liquid Processing Apparatus, Liquid Processing Method, and Storage Medium Having Computer Program Recorded Therein - Provided is a liquid processing apparatus in which a target substrate is horizontally held on a substrate holding unit and rotated around a vertical shaft, and the chemicals are supplied from a chemical supplying unit to the bottom surface of the target substrate that is rotating. In particular, the liquid processing apparatus performs a first step in which the chemicals are supplied to the target substrate while rotating the target substrate at a first rotation speed, a second step in which the supply of the chemicals is halted and the chemicals are thrown off by rotating the target substrate at a second rotation speed higher than the first rotation speed, and a third step in which the rinse liquid is supplied to the target substrate while rotating the target substrate at a third rotation speed equal to or lower than the first rotation speed. | 12-22-2011 |
20110308555 | PERFUME SYSTEMS - The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles. | 12-22-2011 |
20110308556 | PERFUME SYSTEMS - The present application relates to perfume raw materials, perfume delivery systems and consumer products comprising such perfume raw materials and/or such perfume delivery systems, as well as processes for making and using such perfume raw materials, perfume delivery systems and consumer products. Such perfume raw materials and compositions, including the delivery systems, disclosed herein expand the perfume communities' options as such perfume raw materials can provide variations on character and such compositions can provide desired odor profiles. | 12-22-2011 |
20110315168 | Acid Compositions for Removing Oxalates - The present invention relates to the field of cleaning in general, and in particular that of industrial cleaning and of domestic cleaning. More specifically, the invention aims to remove scale, oxalate scale, comprising salts of oxalic acid, and mainly mineral salts of oxalic acid, by means of a mixture of acids comprising at least one alkanesulphonic acid and at least one other mineral acid. | 12-29-2011 |
20120000492 | SYSTEM FOR TREATING AND/OR PROCESSING LIQUID PRODUCTS AND METHOD FOR CLEANING COMPONENTS OF SUCH SYSTEMS - System for treating and/or processing liquid products, in particular beverages, having at least two system components, having a cleaning and rinsing system for cleaning and rinsing of at least product-carrying regions of the system components with at least one liquid cleaning and rinsing medium, and having at least one source for providing the cleaning and rinsing medium. | 01-05-2012 |
20120017945 | Wash Element, Wash Station and Process for Washing Reusable Fluid Manipulators - A wash element for washing one or more reusable fluid manipulators is provided comprising at least one nozzle for connection to a fluid pump to generate a fluid jet and at least one deflector surface positioned to deflect the fluid jet towards a washing zone for receiving at least a portion of the fluid manipulator. The deflector surface is being shaped to broaden the fluid jet. The invention further relates to a wash station having a cavity provided with one or more wash elements. The invention yet further relates to an automated system for manipulating fluids comprising at least one wash station and a controller set up to control washing the fluid manipulator. In a process for washing the reusable fluid manipulator at least a portion of the fluid manipulator is moved in a washing zone, a fluid jet of washing fluid is generated and directed onto a deflector surface shaped to broaden and deflect the fluid jet towards the washing zone. | 01-26-2012 |
20120017946 | CLEANING AND DRYING METHOD AND APPARATUS - A cleaning liquid is pressurized and superheated to a condition, in which temperature of the cleaning liquid is above an atmospheric boiling point. A product to be cleaned is interposed between a pair of liquid holding blocks, so that gaps are respectively formed between side surfaces of the product and the liquid holding blocks. The pressurized and superheated liquid is injected to the product so that layers of condensate of vapor of injected cleaning liquid are formed in the gaps. Contamination on the surface of the product is removed by the cleaning liquid and the surface is dried by latent heat of the condensate of the vapor of the cleaning liquid. | 01-26-2012 |
20120017947 | DELIVERY PARTICLE - The present application relates to delivery particles comprising benefit agents, and products comprising such delivery particles, as well as processes for making and using such delivery particles and products comprising such delivery particles. The process of making such particles does not unduly degrade the benefit agent and when such particles are employed in a product, they are stable, yet they release the desired amount of benefit agent when such product is used as intended. | 01-26-2012 |
20120060869 | SINGLE WORKPIECE PROCESSING CHAMBER - A process chamber for processing semi-conductor wafers. The chamber includes at least one rotor within the process chamber. The rotor is adapted to receive and/or process semi-conductor wafers. The top of the process chamber also includes a tiltable rim. This rim tilts from a non-inclined position to an inclined position. The wafers may be loaded into and unloaded from the process chamber when the rim is in its inclined position. | 03-15-2012 |
20120067379 | METHOD FOR WASHING DEVICE SUBSTRATE - The present invention provides a washing method for a device substrate, capable of sufficiently removing a resist attached to a device substrate, particularly a resist attached to fine pore portions of a pattern having a large aspect ratio. | 03-22-2012 |
20120073609 | SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD - A substrate treatment apparatus includes: a nozzle having an opposing surface to be opposed to and spaced from a front surface of a substrate rotated by a substrate rotating unit, the nozzle further having an outlet port provided in the opposing surface to be opposed to a rotation center of the substrate; a second liquid supply control unit which controls the second liquid supplying unit to fill a space defined between the front surface and the opposing surface with the second liquid in a liquid filled state, and then stop supplying the second liquid to form a liquid puddle in the space; and a first liquid supply control unit which controls a first liquid supplying unit to spout a first liquid from the outlet port after the formation of the liquid puddle. | 03-29-2012 |
20120073610 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATE, CLEANING METHOD USING THE CLEANING AGENT, AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT - A cleaning agent for a semiconductor substrate, which is capable of exerting cleaning power equivalent to that of an SPM cleaning agent, greatly improving damage of a semiconductor substrate by the SPM cleaning agent, and efficiently stripping and removing impurities adhered to the surface of the semiconductor substrate, particularly attached substances such as an ion-implanted resist, a cleaning method using the cleaning agent, and a method for producing a semiconductor element are provided. The cleaning agent for a semiconductor substrate comprises sulfuric acid, hydrogen peroxide and an alkylene carbonate. The method for cleaning a semiconductor substrate comprises cleaning the semiconductor substrate with sulfuric acid, hydrogen peroxide and an alkylene carbonate in combination. | 03-29-2012 |
20120085371 | METHOD AND COMPOSITION FOR CLEANING OBJECTS - A method for cleaning objects made of organic or inorganic materials, wherein the relevant material is brought into contact with a composition in the form of a fluid nanophase system, comprising a) at least one water-insoluble substance having a water solubility of less than 4 grams per liter, b) at least one amphiphilic substance (NP-MCA) which has no surfactant structure, is not structure-forming on its own, the solubility of which in water or oil ranges between 4 g and 1000 g per liter and which does not preferably accumulate at the oil-water interface, c) at least one anionic, cationic, amphoteric and/or non-ionic surfactant, d) at least one polar protic solvent, in particular having hydroxy functionality, e) if necessary one or more auxiliary substance. | 04-12-2012 |
20120085372 | METHOD FOR DRYING A SEMICONDUCTOR WAFER - Disclosed is a method for drying a plate-like article; the method including rinsing with an aqueous rinsing liquid with subsequent rinsing with an organic solvent, | 04-12-2012 |
20120090646 | CLEANING AGENT FOR REMOVAL OF, REMOVAL METHOD FOR, AND CLEANING METHOD FOR WATER-SOLUBLE, LEAD-FREE SOLDER FLUX - An object of this invention is to provide a cleaner for the removal of water-soluble, lead-free soldering flux, the cleaner capable of cleaning off, in a short period of time, water-soluble flux residues generated during soldering with lead-free solder using water-soluble flux, the cleaner further having excellent dissolution property as well as excellent narrow gap cleaning property. The cleaner for removing water-soluble, lead-free soldering flux of the present invention comprises 5 to 100 parts by weight of a glycol ether compound (A) per 100 parts by weight of water. | 04-19-2012 |
20120097194 | Polymeric Coatings Incorporating Bioactive Enzymes for Catalytic Function - Disclosed herein are materials including a polymeric materials such as a coating, a plastic, a laminate, a composite, an elastomer, an adhesive, or a sealant; a surface treatment such as a coating, a textile finish or a wax; a filler for such a polymeric material or a surface treatment, which includes an enzyme such as an esterase (e.g., a lipolytic enzyme, an organophosphorus compound degradation enzyme), wherein the enzyme decontaminates a chemical from the surface of the material. Also disclosed herein are methods of cleaning a surface of a material that comprises an enzyme. | 04-26-2012 |
20120103371 | METHOD AND APPARATUS FOR DRYING A SEMICONDUCTOR WAFER - A method and apparatus for drying semiconductor wafers uses hot isopropyl alcohol in liquid form at temperatures above 60° C. and below 82° C. The use of hot IPA better avoids pattern collapse and permits reduced consumption of IPA. The wafer temperature can be maintained by applying hot deionized water to the opposite wafer side and by evaporating the hot IPA from the wafer surface using heated nitrogen gas. | 05-03-2012 |
20120118331 | SYSTEM AND METHOD FOR CLEANING SUBSTRATE - A substrate cleaning system including a carrying unit having a plurality of rollers for carrying a substrate, wherein each of the rollers includes a roller shaft and a plurality of division rollers coupled to the roller shaft, and wherein a gap between adjacent ones of the roller shafts is larger than a radius of each of the division rollers; a first rinse unit located along the carrying unit and configured to apply a first cleaning liquid onto the substrate; and a cleaning unit comprising a slit nozzle and configured to apply a second cleaning liquid to the substrate after it encounters the first rinse unit. | 05-17-2012 |
20120125375 | Method and Apparatus for Removing Contaminants from Substrate - A cleaning material is applied to a surface of a substrate. The cleaning material includes one or more polymeric materials for entrapping contaminants present on the surface of the substrate. A rinsing fluid is applied to the surface of the substrate at a controlled velocity to effect removal of the cleaning material and contaminants entrapped within the cleaning material from the surface of the substrate. The controlled velocity of the rinsing fluid is set to cause the cleaning material to behave in an elastic manner when impacted by the rinsing fluid, thereby improving contaminant removal from the surface of the substrate. | 05-24-2012 |
20120152286 | CLEANING AGENT FOR REMOVAL OF SOLDERING FLUX - A composition effective for removing solder fluxes either as a concentrated material or when diluted with water. The composition is effective in removing all types of solder fluxes including rosin type, resin type, no-clean, low residue, lead-free, organic acid and water soluble soldering fluxes. The composition comprises tripropylene glycol butyl ether and an alkali and has a pH of greater than 7.5. The composition may contain additional optional solvents and additives to enhance cleaning of articles or to impart other properties to the composition. The composition can be contacted with a surface to be cleaned in a number of ways and under a number of conditions depending on the manufacturing or processing variables present. | 06-21-2012 |
20120160272 | CLEANING METHOD OF SEMICONDUCTOR PROCESS - The present invention is to provide a cleaning method to a process for fabricating a semiconductor. The method comprises steps as follows: A semiconductor substrate is first provided. An atomized spray are then continually supplied for a first time interval to clean the semiconductor substrate; and a water film is formed on the surface of the semiconductor substrate at or before a start point of the first time interval to buffer the impact imposed by the atomized spray, wherein the water film is preserved for a second time interval at least partially overlaps the first time interval. | 06-28-2012 |
20120160273 | Liquid Processing Method, Liquid Processing Apparatus and Recording Medium - Disclosed are a liquid processing method, a liquid processing apparatus, and a recording medium that can prevent convex portions of a target substrate from collapsing when a rinsing liquid is dried. A base surface of a target substrate is hydrophilized and the surfaces of convex portions are water-repellentized by surface-processing the target substrate which includes a main body, a plurality of convex portions protruding from the main body, and a base surface formed between the convex portions on the substrate main body. Next, a rinsing liquid is supplied to the target substrate which has been subjected to the surface processing. Thereafter, the rinsing liquid is removed from the target substrate. | 06-28-2012 |
20120160274 | Liquid Processing Apparatus, Liquid Processing Method, and Recording Medium Having Program for Executing Liquid Processing Method Recorded Therein - Disclosed is a liquid processing apparatus that processes a substrate with a processing liquid. The processing apparatus includes: a substrate holder configured to hold the substrate; a processing liquid supply unit configured to supply the processing liquid to the substrate held by the substrate holder; a rinsing liquid supply unit configured to supply a rinsing liquid to the substrate; and a light emitting element configured to emit light of a wavelength range, which is absorbed only by the substrate, and irradiate the emitted light to the substrate. | 06-28-2012 |
20120160275 | LIQUID TREATMENT APPARATUS AND METHOD - Disclosed is a liquid treatment apparatus including a nozzle positioned below the substrate retained by a substrate retaining unit. The nozzle is capable of ejecting two fluids of a mixture of a liquid and a gas. The nozzle includes a plurality of liquid-ejecting passages for ejecting a liquid and a plurality of gas-ejecting passages for ejecting a gas, and also includes a plurality of liquid-ejecting ports each corresponding to one of the liquid-ejecting passages. The liquid-ejecting ports are arrayed on a horizontal line extending inwardly from a position below a peripheral portion of the substrate. The liquid-ejecting ports are configured to eject the liquid towards the lower surface of the substrate in an ejecting direction, and the ejecting direction is inclined at an inclination angle in a rotating direction of the substrate rotated by rotational driving unit with respect to a plane including the lower surface of the substrate. | 06-28-2012 |
20120186606 | Cleaning of Nozzle Plate - A method of cleaning an outer surface of a fluid ejector includes dispensing a cleaning fluid onto the outer surface of the fluid ejector, drying a region of the outer surface of the fluid ejector, and moving the region in a path across the outer surface of the fluid ejector to cause evaporation of the cleaning fluid along a front that moves across the outer surface of the fluid ejector A method of cleaning a surface of a fluid ejector includes dispensing a cleaning fluid onto the outer surface of the fluid ejector, the cleaning fluid including a solvent and carrier liquid that is more wettable to residue of fluid ejected from nozzles of the fluid ejector than the solvent and having a higher vapor pressure than the solvent, and evaporating the carrier liquid such that a concentration of solvent on the surface of the fluid ejector increases. | 07-26-2012 |
20120234360 | Method and Apparatus for Washing Rock Samples - A method and an associated apparatus for washing rock samples, which is particularly suited to the washing and preparation of rock samples obtained from oil and gas wells. In one embodiment there is provided a method of washing rock samples involving a plurality of discrete rock samples; providing a plurality of sequentially arranged discrete washers each of which is spaced from a respective washing position and configured to direct a washing flow of water towards said washing position; and automatically conveying said samples relative to said washers so that each sample moves in succession through said washing positions for sequential washing by each said washer. | 09-20-2012 |
20120247515 | METHOD FOR THE DISSOLUTION OF AMORPHOUS DITHIAZINE - A method for the dissolution of amorphous dithiazine buildup on a surface is presented. The method consists of treating the dithiazine buildup with a solution of hydrogen peroxide, which reacts and breaks apart the buildup for easy removal. | 10-04-2012 |
20120247516 | SUPERCRITICAL DRYING METHOD AND APPARATUS FOR SEMICONDUCTOR SUBSTRATES - According to one embodiment, a supercritical drying method comprises cleaning a semiconductor substrate with a chemical solution, rinsing the semiconductor substrate with pure water after the cleaning, changing a liquid covering a surface of the semiconductor substrate from the pure water to alcohol by supplying the alcohol to the surface after the rinsing, guiding the semiconductor substrate having the surface wetted with the alcohol into a chamber, discharging oxygen from the chamber by supplying an inert gas into the chamber, putting the alcohol into a supercritical state by increasing temperature in the chamber to a critical temperature of the alcohol or higher after the discharge of the oxygen, and discharging the alcohol from the chamber by lowering pressure in the chamber and changing the alcohol from the supercritical state to a gaseous state. The chamber contains SUS. An inner wall face of the chamber is subjected to electrolytic polishing. | 10-04-2012 |
20120260951 | SOLUTIONS, METHODS AND KITS FOR DEACTIVATING NUCLEIC ACIDS - The present invention relates to reagents for use in deactivating nucleic acids and methods of making and using the same. | 10-18-2012 |
20120273010 | Composition and Method to Remove Excess Material During Manufacturing of Semiconductor Devices - A composition of matter and method to remove excess material during the manufacturing of semiconductor devices includes providing a substrate; applying a metal chelator mixture to the substrate, where the metal chelator mixture comprising a metal chelator and a solvent, where the metal chelator binds to the platinum residue, to render the platinum residue soluble; and rinsing the metal chelator mixture from the substrate to remove the platinum residue from the silicide. | 11-01-2012 |
20120279524 | APPARATUS AND METHOD FOR DE-INKING PRINTED SURFACES - Apparatus and method for removing an ink image from a plastic substrate, particularly a plastic container such as a cup, are provided. A solvent capable of solvating the ink image is utilized in order to de-ink articles so that they can be recycled and re-imprinted thereby reducing waste associated with printing line start up. As the articles may be intended for use with food and beverage products, a safe and non-toxic solvent may be selected. However, to ensure that the article is not contaminated with foreign materials prior to human use, the de-inked article may undergo a rinse and drying operation to remove solvent residues and UV light treatment to eliminate any harmful microorganisms that may be present on the article's surfaces. | 11-08-2012 |
20120291817 | SHAKABLE CLEANING BAG - The present invention is a shakable cleaning bag to clean a plurality of objects that includes a base cleaning bag, a cleaning pouch disposed in the base cleaning bag that receives the objects to be cleaned and a perforated cut line disposed on the top portion of the base cleaning bag that is cut when the base cleaning bag is ready to be used. A fastener disposed below the perforated cut line that runs across the base cleaning bag allowing access to the cleaning pouch and an abrasive or non-abrasive alcohol cleaning solution that is contained in the base cleaning bag that has direct contact with the objects that are placed in the base cleaning bag to be cleaned by the alcohol cleaning solution. There is also a two pouch base cleaning bag with a rinsing pouch and rinse solution and a method of use. | 11-22-2012 |
20120318301 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contaminants attached to a nozzle supporting arm. The liquid processing apparatus includes a processing chamber in which a substrate holder holding a substrate and a cup disposed around the substrate holder are provided; a nozzle configured to supply a fluid to the substrate held by the substrate holder; and a nozzle supporting arm configured to support the nozzle. A gas ejection mechanism is installed at the nozzle supporting arm to eject a gas toward a front end surface of the nozzle supporting arm. | 12-20-2012 |
20120318302 | Instrument and Method for Clinical Examinations and Cleaning Method Therefor - An automated clinical analyzer and method is offered which can clean the nozzles of a reaction cuvette wash unit. A first detergent is put in first reagent containers located on a first reagent turntable. A computer controller drives a first reagent pipette to aspirate the detergent from the first reagent containers and to deliver the detergent into reaction cuvettes. The controller drives a reaction turntable to bring each reaction cuvette holding the detergent therein to the reaction cuvette wash unit. The controller drives the reaction cuvette wash unit to aspirate the detergent from inside the reaction cuvettes using reaction cuvette wash nozzles to thereby clean the wash nozzles. A second detergent is then used to clean the nozzles. | 12-20-2012 |
20130025633 | In-Situ Reclaim of Volatile Components - Apparatus and methods are provided for efficiently reclaiming solvents used to clean surfaces of semiconductor wafers, etc. More particularly, embodiments of the present invention provide an in-situ reclaim approach that utilizes condensing mechanisms to reclaim evaporated solvent components. In these embodiments, the condensing can occur within a proximity head itself and/or along a vacuum line running from the proximity head to a vacuum tank. Other embodiments of the present invention provide an in-situ reclaim approach that prevents the evaporation of solvents at the onset by maintaining appropriate equilibrium gas phase concentrations between the liquid chemistries and gases used to process wafer surfaces. | 01-31-2013 |
20130061881 | Method of Improving Purity and Yield of Chemical Product in Automatic Radioactive Medicine Synthesis System - The present invention increases a number of target reaction containers from one into many. Coordinated with increased reaction times, total reaction volume is increased. By modifying an affinitive column of an automatic synthesis system, a production in a single batch is increased. The products obtained can be conformed to quality check specifications with cost saved. | 03-14-2013 |
20130061882 | Cleaning Formulations and Method of Using the Cleaning Formulations - A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt. of a corrosion inhibitor; from about 5 to about 45% by wt. of a component selected from the group consisting of: an alkanolamine having a pKa<9.0, a water-miscible solvent, and a mixture thereof. Employment of such composition exhibits efficient cleaning capability for Al substrates, minimal silicon etch while protecting aluminum for substrates comprising both materials. | 03-14-2013 |
20130061883 | ENCAPSULATES - The present application relates to encapsulated, preformed peracids and products comprising such encapsulates, as well as processes for making and using such encapsulates and products comprising such encapsulates. Such products deliver bleaching that results in superior whiteness and stain removal without the stability issues that are normally associated with certain bleaching systems. | 03-14-2013 |
20130061884 | METHOD FOR CLEANING WAFER AFTER CHEMICAL MECHANICAL PLANARIZATION - A method for cleaning wafer after chemical mechanical planarization that includes placing the wafer in the wafer holder and rotating the wafer holder and the wafer simultaneously, cleaning with chemicals by providing the wafer surface with chemical detergent through the detergent supply cantilever that keeps a certain distance away from the wafer surface, cleaning with deionized water by providing the wafer surface with deionized water through the detergent supply cantilever to remove the chemical detergent and cleaning products. The method also includes the second clean for better cleaning effect and drying the wafer out. According to the wafer cleaning method, the non-contact detergent and deionized water supply cantilever used for wafer cleaning reduces or eliminates the possible problems in making macro scratches on wafer surface in the scrubbing process and increases the yield for wafer devices. | 03-14-2013 |
20130068260 | METHOD OF CLEANING ELECTRONIC MATERIAL AND CLEANING SYSTEM - An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical storage tank and an electrolytic reaction apparatus connected to the functional chemical storage tank via a concentrated sulfuric acid electrolysis line. The functional chemical storage tank can supply a functional chemical to the single-wafer cleaning apparatus via a functional chemical supply line. The wet cleaning means comprises a pure water supply line, a nitrogen gas supply line connected to a nitrogen gas source and an internal mixing type two-fluid nozzle connected respectively to the pure water supply line and the nitrogen gas supply line. Droplets generated from a nitrogen gas and ultrapure water can be sprayed from the tip of the two-fluid nozzle. | 03-21-2013 |
20130068261 | MULTI-STAGE SUBSTRATE CLEANING METHOD AND APPARATUS - A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. | 03-21-2013 |
20130092195 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND STORAGE MEDIUM - Disclosed are a liquid processing device, and a liquid processing method. The liquid processing method includes a first process that includes supplying a first processing liquid to the substrate and discharging the first processing liquid within the processing space from a first discharge path, a second process that includes supplying a second processing liquid to the substrate and discharging the second processing liquid within the processing space from the second discharge path, and after stop supplying of the first processing liquid and prior to beginning of the second process, a nozzle switching operation switching from the first nozzle to the second nozzle and a discharge mechanism switching operation switching from the first discharge path to the second discharge path are performed. A longer one of a time to switch the nozzle and a time to switch the discharge mechanism is determined as a maximum preparation time and the switching operations begin at an earlier time than the completion time of the first process by the maximum preparation time or more. | 04-18-2013 |
20130092196 | METHOD FOR STERILIZING AND WASHING A CONTAINER - The purpose of the present invention is to provide a container sterilization method, washing method, and system which retain food hygiene manufacturing standards and a required production line speed, as well as reducing the amount of treatment fluids used such as pharmaceutical fluid, hot water and aseptic water. The container sterilization method and washing method of the present invention is a method in which a container is sterilized/washed using a treatment fluid, and the sterilization step and/or washing step are divided into at least two parts. By storing and pumping upwards the treatment fluid supplied from one part of the divided sterilization or washing step after use, the treatment fluid can be supplied in series to the other part of the same divided sterilization or washing step. | 04-18-2013 |
20130118531 | EMULSIONS CONTAINING POLYMERIC CATIONIC EMULSIFIERS, SUBSTANCE AND PROCESS - The present invention is directed to fabric and/or home care compositions comprising oils and a polymeric cationic emulsifier, the process to obtain said emulsions and the use of said emulsions in fabric and/or home care compositions and the use of said fabric and/or home care compositions. Such fabric and/or home care compositions provide excellent cleaning and/or treatment properties. | 05-16-2013 |
20130118532 | Two-Soak Wash - The present invention relates to a method for cleaning an object comprising the steps: (a) distributing to the object a first soak solution comprising at least one surfactant and at least one enzyme followed by a first soak period wherein the concentrations of the at least one surfactant and the at least one enzyme are higher relative to their concentrations in a subsequent wash solution; (b) adding to the object a second soak solution comprising at least one component that is different from any of the components comprised in the soak solution of (a) followed by a second soak period; (c) furthermore adding to the object water to obtain a wash solution followed by a wash period; and (d) rinsing the object; wherein step (b) is conducted either before or after step (c), and wherein said method has a wash performance corresponding to any of (i) a Relative Wash Performance (RWP) of at least 1; (ii) a Process Related Cleaning Index (PRCI) of more than 1; or (iii) a Relative Wash Performance (RWP) of at least 1 and a Process Related Cleaning Index (PRCI) of more than 1. | 05-16-2013 |
20130118533 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module | 05-16-2013 |
20130146100 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical - A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern. The water repellent protective film forming agent is provided to contain a silicon compound represented by the following general formula [1]: | 06-13-2013 |
20130146101 | DETERGENTS - A machine dishwashing method comprises: dispensing two liquid cleansers or detergents A and B into the interior of a machine dishwasher during the cleaning dishwashing cycle, wherein the liquid detergent A has a pH at 20° C. of 6 to 9 and the liquid detergent B has a pH at 20° C. of 9 to 14 and is dispensed at cleaning cycle time t2; and wherein the liquid cleansers or detergents A and B comprise, respectively: A: 10% to 75% by weight of a detergent builder, 0.1% to 10% by weight of an enzyme, 24.9% to 89.9% by weight of a solvent; and B: 10% to 74.9% by weight of a detergent builder, 25% to 89.9% by weight of a solvent; and wherein neither liquid cleanser or detergent A nor liquid cleanser or detergent B individually comprises more than 2% by weight of a bleaching agent. | 06-13-2013 |
20130152975 | MULTI-ENGINE WASH HARNESS SYSTEMS AND METHODS - A turbine engine cleaning system includes a source of cleaning fluid, a source of rinse fluid, a pump configured to deliver the cleaning fluid and rinse fluid under pressure, and a wash harness. The wash harness is connected in flow communication with a plurality of turbine engines. The wash harness is configured to direct cleaning fluid from the source of cleaning fluid and rinse fluid from the source of rinse fluid from the pump to the turbine engines in sequence. | 06-20-2013 |
20130152976 | SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - Provided is a substrate processing apparatus including a substrate holding unit configured to hold a wafer W horizontally, a rotation driving unit configured to rotate the substrate holding unit, a first chemical liquid nozzle configured to discharge a first chemical liquid to a first chemical liquid supplying position on the peripheral portion of the wafer W, and a second chemical liquid nozzle configured to discharge a second chemical liquid to a second chemical liquid supplying position on the peripheral portion of the wafer W. The rotation driving unit rotates the substrate holding unit in a first rotation direction when the first chemical liquid nozzle discharges the first chemical liquid, and rotates the substrate holding unit in a second rotation direction when the second chemical liquid nozzle discharges the second chemical liquid. | 06-20-2013 |
20130152977 | Method And Device for The Depollution Of A Pelliculated Reticle - The object of the present invention is a device for depolluting a non-sealed, confined environment ( | 06-20-2013 |
20130167877 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, a liquid film of a supercooled liquid of pure water is formed on the upper surface of a substrate and then cooled with cooling gas into a frozen film. The temperature of the liquid film is lower than the freezing point of pure water, and thus the liquid film is in an easy-to-freeze state. Thus, the time required to freeze the liquid film can be shortened. Even if the temperature of the cooling gas is increased, the liquid film can be speedily frozen as compared with the case in which a liquid film is formed of pure water having a temperature higher than its freezing point. Thus, heat insulating facilities such as piping that supply cooling gas can be simplified. This results in a reduction of the cooling cost required to freeze the liquid film. | 07-04-2013 |
20130167878 | Methods and systems for cleaning for cyclic nucleation transport (CNX) - A dynamic cyclic nucleation transport (D-CNX) process is disclosed, including cyclically changing the volume of a process chamber, for example, through a piston or bellows. A D-CNX process and system can include a dynamic chamber volume that can instantly change from vacuum to pressure conditions and eliminates vacuum pumps. | 07-04-2013 |
20130167879 | Methods and systems for cleaning for cyclic nucleation transport (CNX) - Methods are disclosed to create and employ the use of non-vapor, non-condensable gas bubbles inside a process chamber. These non-vapor gas bubbles may be rapidly expanded and compressed in pressure-controlled cycles and can assist in the transport of fluids, particles, and by-products to and from surfaces. The gas bubbles can be generated from dissolved gas to the liquid medium, by mixing two liquids that can react with each other to generate gaseous by-products, or by using a liquid medium that can react with the surface of the object to generate gaseous by-products. The gaseous generation can be used with cyclic nucleation transport (CNX) process, such as vacuum CNX, hyperbaric CNX, or dynamic CNX. | 07-04-2013 |
20130206182 | SUBSTRATE CLEANING TECHNIQUE EMPLOYING MULTI-PHASE SOLUTION - Apparatus, methods, and computer programs for cleaning opposed surfaces of a semiconductor wafer are presented. One apparatus includes first, second, and third valves, and one or more second drains. The first valves are coupled to a supply of rinsing solution and to first throughways that are coupled to an immersion tank above a region in the immersion tank, the region being defined by an area occupied by the substrate when the substrate is disposed vertically on a support within the immersion tank. The second valves are coupled to first drains and to second throughways that are coupled to the immersion tank below the region, and the third valves are coupled to a supply of cleaning solution and to third throughways that are coupled to the immersion tank below the region. Further, the second drains are coupled to fourth throughways that are coupled to the immersion tank above the region. | 08-15-2013 |
20130228200 | LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM HAVING STORED THEREIN A COMPUTER-READABLE PROGRAM - Provided is a liquid processing apparatus that selectively supplies processing liquids with a switching operation to the surface of a substrate to perform a liquid processing. The liquid processing apparatus includes a first processing liquid supply unit including a first nozzle block that selectively supplies an acidic chemical liquid and a rinse liquid, and a second processing liquid supply unit including a second nozzle block that selectively supplies an alkaline chemical liquid and a rinse liquid. When a chemical liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is retreated to a retreat position. When the rinse liquid is supplied to the substrate from one of the first and second nozzle blocks, the other of the first and second nozzle blocks is moved to a processing position. | 09-05-2013 |
20130247941 | DISHWASHING DETERGENT COMPOSITION HAVING A MALODOR CONTROL COMPONENT AND METHODS OF CLEANING DISHWARE - A dishwashing detergent composition comprising a malodor control component, and methods of cleaning dishware are provided. In some embodiments, the dishwashing detergent composition comprises at least one volatile aldehyde and an acid catalyst. | 09-26-2013 |
20130247942 | NOVEL HYDROTROPIC AGENT, USE THEREOF TO MAKE NON-IONIC SURFACTANTS SOLUBLE, AND COMPOSITIONS CONTAINING SAME - A compound having Formula (I), nC | 09-26-2013 |
20130255728 | APPARATUS AND METHOD TREATING SUBSTRATE - A substrate treating apparatus is provided which includes a housing which provides a space in which a process is performed; a spin head which supports and rotates a substrate; and a spray unit which sprays a fluid on the substrate. The spray unit comprises a first nozzle mistily spraying a first fluid; and second nozzle spraying a second fluid. | 10-03-2013 |
20130269732 | SYSTEM FOR DELIVERY OF PURIFIED MULTIPLE PHASES OF CARBON DIOXIDE TO A PROCESS TOOL - A carbon dioxide supply method and system for supplying supercritical and subcritical phases of carbon dioxide on-demand to a substrate to create a novel and improved cleaning sequence for removal of contaminants contained in the substrate. The ability for the supply system to deliver vapor, liquid and supercritical phases of carbon dioxide in a specific sequence at predetermined times during a process cleaning sequence produces an improved removal of contaminants from the substrate compared to conventional carbon dioxide cleaning processes. | 10-17-2013 |
20130269733 | DEVICE FOR WASHING HANDS - The present invention is in the field devices for hand washing, in particular the washing and drying of hands in public bathrooms. Accordingly it is an object of the present invention to provide a device for cleaning hands, especially a device for wetting hands, depositing a cleansing and/or disinfecting composition and rinsing consecutively, using a low amount of water. It has been found that an air-water jet nozzle assembly comprising two nozzles wherein a first nozzle is in fluid communication with a feed liquid source; and a second nozzle connected to a source of compressed air may be used to clean hands using low amounts of water in a short time. | 10-17-2013 |
20130298947 | SUBSTRATE PROCESSING SYSTEM - Disclosed is a substrate processing system, including: | 11-14-2013 |
20130306110 | Light Collector Mirror Cleaning - A collector mirror of an extreme ultraviolet light source is cleaned by removing the collector mirror from a chamber of the extreme ultraviolet light source; mounting the collector mirror to a carrier; inserting the carrier with the collector mirror into a cleaning tank; applying a cleaning agent to a reflective surface of the collector mirror by spraying the cleaning agent through a plurality of nozzles directed toward the collector mirror reflective surface until the collector mirror reflective surface is clean; rinsing the applied cleaning agent from the collector mirror reflective surface; and drying the collector mirror reflective surface. | 11-21-2013 |
20130327363 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus is provided including: a liquid processing unit that processes a substrate with a processing liquid; a carry-in port formed in the liquid processing unit and configured to carry-in the substrate in a dry-state before the substrate is processed with the processing liquid; a carry-out port formed in the liquid processing unit and configured to carry-out the substrate in a wet-state after completing the liquid processing; a supercritical dry processing unit that performs a dry processing for the substrate using a supercritical fluid; a first substrate transport unit that transports the substrate in a dry-state before the substrate is processed with the processing liquid to the carry-out port of the liquid processing unit; and a second substrate transport unit that transports the substrate in a wet-state after completing the liquid processing from the carry-out port of the liquid processing unit to the supercritical dry processing unit. | 12-12-2013 |
20130327364 | Foam Control Composition - A process for washing a substrate. The process involves providing a detergent composition that includes a surfactant and an antifoam. The antifoam comprises a hydrophobic fluid having a surface tension of at least 27 mN/m and less than 40 mN/m and a finely divided solid hydrophobic filler dispersed in the hydrophobic fluid. The process further involves washing the substrate in an aqueous medium with the detergent composition. The antifoam does not affect foaming during the washing step. During the washing step, the detergent composition is applied to the substrate. The process further involves rinsing the substrate with the applied detergent composition with water, whereby foaming during the rinsing step is inhibited. | 12-12-2013 |
20130333730 | MEDICAL INSTRUMENT CLEANING SOLUTION AND METHOD OF CLEANING CONTAMINATED SURFACES - A medical instrument cleaning concentrate and method for cleaning medical equipment. The method includes contacting the equipment with a cleaning concentrate dissolved in water. The cleaning concentrate contains (i) a biofilm permeation agent, (ii) a nonionic alkoxylated alcohol surfactant having an HLB ranging from about 5 to less than 8, wherein a weight ratio of (i) to (ii) in the cleaning concentrate based on 100 wt. % active ingredients ranges from about 0.5:1 to about 1.5:1, and (iii) and an inert diluents. After contacting the equipment with the cleaning concentrate dissolved in water, the contacted surfaces are rinsed to substantially remove detectible traces of the ingredients of the cleaning concentrate from the surfaces. | 12-19-2013 |
20130340795 | TWO STATION SAMPLE AND WASHING SYSTEM - Disclosed is a two station system for a flow cytometer that includes a sample station and a wash station. During washing, the user has access to the sample station to insert a new sample. This increases the efficiency of the workflow process. Rotary clamps are used to automatically clamp the sample station and wash station to the system. A low volume pressurized cavity is used to bring the pressure of the sample to a desired pressure, which further increases productivity of the system. A transparent body is provided in the sample station so a user can view the sample during the sampling process. A backwash process is used to clean the sample injection tube and the sample uptake tube. In addition, the wash station is designed to rinse the outer surface of the sample uptake tube. | 12-26-2013 |
20140000659 | METHOD AND APPARATUS FOR PROCESSING SUBSTRATE | 01-02-2014 |
20140014137 | TREATMENT OF NON-TRANS FATS WITH ACIDIC TETRA SODIUM L-GLUTAMIC ACID, N, N-DIACETIC ACID (GLDA) - The invention relates to methods and compositions for treating non-trans fats with a souring composition that acts as both a souring agent and a chelating agent. The invention also relates to methods for reducing the frequency of laundry fires with acidic GLDA. | 01-16-2014 |
20140020719 | Surface Cleaning with Concurrently Usable Prespray and Rinse units - A soiled surface cleaning system is described for pre spraying soiled surface areas, and for rinsing and extracting the pre sprayed soiled surface areas, wherein the pre spraying of the soiled surface areas does not have to be stopped in order to perform the rinsing and extracting of the pre sprayed soiled surface areas. | 01-23-2014 |
20140034089 | RESIDUE CLEANING COMPOSITION AND METHOD - A medical surface cleaning composition and a method for cleaning waste treatment system components, medical instruments surfaces, and enzyme residue-containing surfaces. The composition includes a residue cleaning agent and a substantially non-water soluble nonionic surfactant having an initial Ross-Miles foam height in an aqueous solution at 25° C. of less than 10 millimeters. A weight ratio of residue cleaning agent to surfactant on 100 wt. % active ingredient basis ranges from about 0.05:1 to about 0.5:1, and wherein the residue cleaning agent and surfactant are biodegradable. | 02-06-2014 |
20140048108 | METHOD OF DIELECTRIC FILM TREATMENT - A method and system for cleaning a surface of a substrate after an etching operation includes determining a plurality of process parameters associated with the surface of the substrate. The process parameters define characteristics related to the surface of the substrate such as characteristics of the substrate surface to be cleaned, contaminants to be removed, features formed on the substrate and chemicals used in the fabrication operations. A plurality of application chemistries are identified based on the process parameters. The plurality of application chemistries includes a first application chemistry as an emulsion having a first immiscible liquid combined with a second immiscible liquid and solid particles distributed within the first immiscible liquid. The plurality of application chemistries including the first application chemistry are applied to the surface of the substrate such that the combined chemistries enhance the cleaning process by substantially removing the particulate and polymer residue contaminants from the surface of the substrate while preserving the characteristics of the features and of the low-k dielectric material through which the features are formed. | 02-20-2014 |
20140116472 | PHOSPHORUS FREE LOW TEMPERATURE WARE WASH DETERGENT FOR REDUCING SCALE BUILD-UP - Phosphorus-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces. The detergent compositions are used with a sanitizer to employ the phosphorus-free detergent compositions for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the phosphorus-free detergent compositions are also provided. | 05-01-2014 |
20140116473 | CAUSTIC FREE LOW TEMPERATURE WARE WASH DETERGENT FOR REDUCING SCALE BUILD-UP - Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces. The detergent compositions are used with a sanitizer to employ the caustic-free detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the caustic-free detergent compositions are also provided. | 05-01-2014 |
20140137899 | PROCESS FOR REMOVING SUBSTANCES FROM SUBSTRATES - Processes are described to remove substances from substrates. In an embodiment, a process may include providing a substrate including a first side and a second side with a substance being disposed on at least a portion of the first side of the substrate. The process may also include contacting the substrate with a solution such that the first side of the substrate is coated with the solution, at least a portion of the second side is free of the solution and at least a portion of the substance is released from the first side of the substrate. Additionally, the process may include rinsing the substrate to remove at least a portion of the substance released from the first side of the substrate. | 05-22-2014 |
20140144473 | Method For In-Situ Cleaning Of Compressor Blades In A Gas Turbine Engine On An Aircraft And Compositions - A method for in-situ cleaning of compressor blades in a gas turbine engine on an aircraft comprises the following sequential steps:
| 05-29-2014 |
20140150827 | WASHER / DISINFECTOR HAVING A WATER INLET DIFFUSER - A washer having a plurality of water inlet diffusers, each diffuser connected to a water inlet line for directing the flow of fluid into the washing chamber. The water is directed, i.e., sprayed against the surfaces of the washing chamber to modify (adjust) the temperature of the washing chamber gradually prior to the start of a particular phase of a washing cycle. | 06-05-2014 |
20140174479 | PARTS WASHER ASSEMBLY WITH CLEAN RINSE MODULE - A parts washer assembly including a reservoir that may have a contaminated fluid solution at a level and a cover with an opening formed therein on an open end of the reservoir. A clean rinse module including a flange, a tank, a first pump and a second pump that may be disposed in the reservoir contiguous with the cover so that the tank and the first and second pumps depend from the flange into the reservoir. The tank may include an opening above the level of the contaminated fluid solution. The first pump may be connected to the flange and in fluid communication with the tank. | 06-26-2014 |
20140174480 | CITRATE SALT BATHROOM CLEANERS - A hard surface cleaning composition, namely a bathroom cleaning composition, using fully neutralized ethanolamine citrate salts is disclosed. The cleaning composition is unexpectedly safe to use, environmentally-friendly and efficacious for removal of soap scum and water hardness stains at mildly acidic and/or alkaline pHs. Methods of using the same are disclosed. | 06-26-2014 |
20140174481 | Processing and Cleaning Substrates - The embodiments describe methods for controlling the particles generated when cleaning and drying a wafer in a spin rinse dryer (SRD) module. In some embodiments, the substrate surface is cooled by dispensing deionized (DI) water across the surface of the substrate, while the substrate rests on the SRD chuck. In addition, a method for controlling the particles generated when sleeves in a processing module or SRD contact a substrate surface during a clamping operation or when the sleeves are removed from the substrate surface is provided. A bottom edge or lip of the sleeves and/or the surface of the wafer contacting the sleeve is wetted during clamping/unclamping operations. Alternatively, the substrate may be wetted prior to clamping/unclamping operations. | 06-26-2014 |
20140190526 | METHODS OF USING ENZYME COMPOSITIONS - The present disclosure relates to compositions and methods for cleaning medical and dental instruments. The disclosed compositions are preferably non-foaming or generate low foam to allow visual inspection of the cleaning process as well as safe handling of the instruments. The disclosed compositions preferably employ select proteases, a carbonate and a nonionic surfactant. | 07-10-2014 |
20140209127 | CLEANING COMPOSITION AND METHODS OF USE THEREOF - Embodiments of the disclosure are directed to a stable cleaning composition comprising: a chelating agent, a low-foaming, temperature- and alkaline-stable surfactant, and water. Other embodiments relate to the methods of preparing the stable cleaning compositions and the methods of their use. The stable cleaning composition described here is a low cost cleaning composition for use either alone or as an additive to a cleaning agent. | 07-31-2014 |
20140216504 | SILICON WAFER CLEANING METHOD - A silicon wafer cleaning method is provided. Firstly, a silicon wafer is provided. Then, a polymer cleaning step is performed to clean a surface of the silicon wafer. After the polymer cleaning step, a deionized water/carbon dioxide gas discharging step is performed, so that the charges accumulated on the surface of the silicon wafer can be instantly removed. After the deionized water/carbon dioxide gas discharging step, two or more particle removing steps are performed. In addition, an air-jet step is performed during the time interval between every two sub-steps of a single particle removing step. Consequently, the cleaning efficiency of removing the particles will be enhanced. | 08-07-2014 |
20140230859 | LOW ALKALINE LOW TEMPERATURE WARE WASH DETERGENT FOR PROTEIN REMOVAL AND REDUCING SCALE BUILD-UP - Caustic-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, non-caustic source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces and enhance protein removal from the treated surfaces. Beneficially the detergent compositions have a concentrate pH less than about 11.5. The detergent compositions are used with a sanitizer to employ the low alkaline detergent compositions are particularly suitable for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the low alkaline detergent compositions are also provided. | 08-21-2014 |
20140261564 | INHIBITING CORROSION OF ALUMINUM ON CONSUMER WARE WASHING PRODUCT USING PHOSPHINOSUCCINIC ACID OLIGOMERS - A dishwashing detergent composition is provided for consumer use for in cleaning of alkaline sensitive metals such as aluminum or aluminum containing alloys. The compositions include alternatives to sodium tripolyphosphate and/or other phosphorus containing raw materials, while retaining cleaning performance and corrosion prevention. According to the invention, a phosphinosuccinic acid oligomer or mixture thereof is used as a corrosion inhibitor and can be included for aluminum protection in a number of different detergent compositions. | 09-18-2014 |
20140261565 | CLEANING COMPOSITIONS AND METHODS - The present invention relates, in part, to cleaning methods and solvent cleaning compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent for use in connection with cleaning of metal parts, and in certain preferred embodiments cleaning metal parts to be used in an aircraft. | 09-18-2014 |
20140261566 | SUBSTRATE PROCESSING DEVICE AND SUBSTRATE PROCESSING METHOD - A substrate processing device | 09-18-2014 |
20140283882 | SUBSTRATE PROCESSING METHOD - A hydrophobizing agent is supplied to a substrate and a surface of the substrate is hydrophobized. Thereafter, the substrate is dried. The substrate to be processed is maintained in a state of not contacting water until it is dried after being hydrophobized. Collapse of a pattern formed on the substrate surface is thereby suppressed or prevented. | 09-25-2014 |
20140290701 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus includes: a storage tank configured to store a liquid; a substrate support unit | 10-02-2014 |
20140311530 | SUBSTRATE PROCESSING METHOD AND TEMPLATE - A substrate processing method of performing a predetermined processing by supplying a processing liquid to a processing region on a surface of a substrate, includes: supplying an alignment liquid to an alignment region on the surface of the substrate formed at a position different from that of the processing region; aligning a template disposed facing the substrate and including a processing liquid passage configured to pass the processing liquid and an alignment liquid passage configured to pass the alignment liquid, with respect to the substrate with the alignment liquid supplied to the alignment region such that the processing liquid passage is positioned above the processing region; and performing the predetermined processing on the substrate by supplying the processing liquid to the processing region through the processing liquid passage. | 10-23-2014 |
20140332033 | Flux Residue Cleaning System and Method - A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first chemical. The first spray chamber removes the outer region of the flux residue when the wafer is impinged upon by a first chemical spray in order to expose an inner region of the flux residue. The second immersion chamber softens the inner region of the flux residue when the wafer is immersed in a second chemical. The second spray chamber removes the inner region of the flux residue when the wafer is impinged upon by a second chemical spray in order to clean the wafer to a predetermined standard. The drying chamber dries the wafer. | 11-13-2014 |
20140352735 | ZERO LAG DISPENSE APPARATUS - A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower than the first. | 12-04-2014 |
20140352736 | CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM - A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion. | 12-04-2014 |
20140366920 | USE OF IRON(III) HYDROXYMONOCARBOXYLATE COMPLEXES TO ENHANCE LOWER TEMPERATURE CLEANING IN ALKALINE PEROXIDE CLEANING SYSTEMS - The present invention relates to an aqueous composition for removing soil at low temperatures from a surface to be cleaned, comprising a source of alkalinity, a surfactant, an iron(III) activator complex and a source of peroxide. The composition can be used for removing soil from a surface to be cleaned, preferably in a clean-out-of-place systems (COP) or in a clean-in-place system (CIP). | 12-18-2014 |
20140373877 | LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD - Disclosed are a liquid processing apparatus and a liquid processing method in which a substrate is processed by a processing liquid in the form of liquid droplets. The liquid processing apparatus includes: a first processing liquid ejecting unit configured to eject a first processing liquid in a form of liquid droplets which contains pure water toward the surface of the substrate; and a second processing liquid ejecting unit configured to eject a second processing liquid as a continuous liquid stream toward the surface of the substrate processed by the first processing liquid in the form of the liquid droplets. The second processing liquid inverts a zeta potential on the surface of the substrate into a negative zeta potential. | 12-25-2014 |
20150034129 | DEWAXING DEVICE AND METHOD OF DEWAXING USING THE DEWAXING DEVICE - A dewaxing device and a method of dewaxing using the dewaxing device are shown. The dewaxing device includes a dewaxing system including a rinsing device and a storage device, and a recycling system connected with the storage device. The storage device includes a first solvent trough and a second solvent trough of which each is connected with the rinsing device and is equipped with a heating equipment. When the first solvent trough is connected with the rinsing device, the second solvent trough is disconnected with the rinsing device; when the second solvent trough is connected with the rinsing device, the first solvent trough is disconnected with the rinsing device. So, the dewaxing device can provide two dewaxing processes and effectively reduce recycling frequency because the recycling process is done after soluble wax quantity of bromopropane solvent reaches the maximum value 16%. The production cost is accordingly reduced. | 02-05-2015 |
20150034130 | METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE AND APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATE - A method of cleaning a semiconductor substrate includes forming a water repellant protection film using a chemical liquid including a silane coupling agent on a surface of the semiconductor substrate; substituting the chemical liquid including the silane coupling agent with an alcohol; substituting the alcohol with a diluted alcohol; and substituting the diluted alcohol with pure water. | 02-05-2015 |
20150040951 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD FOR PERFORMING CLEANING TREATMENT ON SUBSTRATE - A special mode has a second rinsing process which supplies a rinsing liquid to a substrate while holding and rotating the substrate with a spin chuck under operating conditions different from those in a first rinsing process in a normal mode. In the second rinsing process, a processing cup is cleaned with the rinsing liquid flown off from the rotating substrate. In the second rinsing process in which the substrate is held by the spin chuck, the rinsing liquid flown off from the substrate is less prone to collide with chuck members. The provision of a mechanism designed specifically for the cleaning of the cup is not required in the special mode. The special mode is a mode executable when a substrate is present inside a chamber, and can be executed in the middle of lot processing. | 02-12-2015 |
20150059811 | MULTIPLE-STAGE PROCESSING DEVICES - A multiple stage processing device having a plurality of radial stages, each individual radial stage is positioned between adjacent dividing walls and indexable though a plurality of processing stations. A plurality of fixture mount assemblies are positioned on an actuation surface of the rotatable indexing assembly, each individual fixture mount assembly is associated with and mechanically coupled to an individual radial stage. One or more slotted drive hubs communicatively coupled to independently operable drive motors are positioned adjacent to the actuation surface of the rotatable indexing assembly and are engageable with the plurality of fixture mount assemblies. When an individual fixture mount assembly is engaged with an individual slotted drive hub, an individual independently operable drive motor can independently control the individual fixture mount assembly such that the individual radial stage mechanically coupled to the individual fixture mount assembly is moveably coupled to the independently operable drive motor. | 03-05-2015 |
20150083167 | SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS - A substrate treatment method is provided, which includes a rinsing step of supplying a rinse liquid to a front surface of a rotating substrate after a chemical liquid step. The rinsing step includes a higher-speed rinsing step and a deceleration rinsing step to be performed after the higher-speed rinsing step. The deceleration rinsing step includes a liquid puddling step of reducing the rotation speed of the substrate within a rotation speed range lower than a rotation speed employed in the higher-speed rinsing step and supplying the rinse liquid to the front surface of the substrate at a flow rate higher than a maximum supply flow rate employed in the higher-speed rinsing step, whereby a puddle-like rinse liquid film is formed on the front surface of the substrate. | 03-26-2015 |
20150090302 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus includes a substrate holder, and a discharge head for peripheral area from which a fluid is discharge toward a surface peripheral area of the substrate held on the substrate holder. The discharge head for peripheral area includes multiple nozzles, and a support part that supports the nozzles integrally. The nozzles include a processing liquid nozzle from which a processing liquid is discharged toward the surface peripheral area, and a gas nozzle from which gas is discharged toward the surface peripheral area. The gas nozzle is placed upstream of a rotative direction of the substrate relative to the processing liquid nozzle. | 04-02-2015 |
20150101643 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 04-16-2015 |
20150107631 | LIQUID PROCESSING METHOD - A liquid processing method is provided for performing a liquid process on a front surface of a substrate by using a processing solution and then performing a rinse process on the front surface of the substrate by using a rinse solution having a temperature lower than a temperature of the processing solution. The method includes performing an intermediate process between the liquid process and the rinse process, for adjusting a temperature of the front surface of the substrate to a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution. In the intermediate process, an intermediate processing solution having a temperature higher than the temperature of the rinse solution and lower than the temperature of the processing solution is supplied only to a rear surface of the substrate. | 04-23-2015 |
20150332939 | MULTIPLE SWIVEL ARM DESIGN IN HYBRID BONDER - An apparatus for cleaning a wafer includes a wafer station configured to hold the wafer, and a first and a second dispensing system. The first dispensing system includes a first swivel arm, and a first nozzle on the first swivel arm, wherein the first swivel arm is configured to move the first nozzle over and aside of the wafer. The first dispensing system includes first storage tank connected to the first nozzle, with the first nozzle configured to dispense a solution in the first storage tank. The second dispensing system includes a second swivel arm, and a second nozzle on the second swivel arm, wherein the second swivel arm is configured to move the second nozzle over and aside of the wafer. The second dispensing system includes a second storage tank connected to the second nozzle, with the second nozzle configured to dispense a solution in the second storage tank. | 11-19-2015 |
20150361378 | CLEANING SOLUTION, CLEANING TOOL, AND CLEANING KIT - A cleaning solution is used, in a transparent antireflective structure that has, on one surface thereof, a plurality of convexities formed at a period equal to or shorter than wavelength in a visible light range, and that prevents, at the one surface, reflection of light entering the one surface, to clean a concavity defining a region between adjacent two of the plural convexities, the cleaning solution having a pH of 10.00 or more. | 12-17-2015 |
20150368593 | CLEANING COMPOSITION HAVING IMPROVED VERTICAL CLING - This disclosure provides cleaning compositions having improved vertical cling. In particular, this disclosure relates to sprayable cleaning compositions containing at least one polysaccharide that are useful for cleaning vertical or inclined surfaces. This disclosure provides cleaning compositions that contain a rheology modifier in an amount of about 0.1 weight percent to about 1 weight percent (i.e., a polysaccharide), an alkalinity source (e.g., chelating agent) in an amount of about 1 weight percent to about 8 weight percent, a surfactant in an amount of about 0.3 weight percent to about 5 weight percent, and water in an amount of about 80 weight percent to about 98 weight percent. The cleaning compositions have a viscosity from about 200 cps to about 1000 cps and exhibit a Vertical Cling time of greater than about 5 minutes. The cleaning compositions effectively remove organic and inorganic soils from wheel, tire and automotive surfaces. | 12-24-2015 |
20160001335 | SYSTEMS AND METHODS FOR TREATING WORKPIECES - Example systems and methods for treating workpieces are disclosed. In some examples, the system includes a treatment station positioned in a process chamber for treating the workpiece with fluid. The example system includes a handling device positioned in the process chamber. The example handling device includes a base positioned in the process chamber, a supporting arm coupled to the base and pivotable relative to the base about a first pivot axis, a pivoting arm coupled to the supporting arm and pivotable relative to the supporting arm about a second pivot axis, and a receptacle coupled to the pivoting arm and including a workpiece holder capable of picking up the workpiece from a workpiece feeder positioned outside of the process chamber. The example handling device is capable of moving the workpiece through an opening of the process chamber and into a treatment position at the treatment station. | 01-07-2016 |
20160045938 | SUBSTRATE TREATMENT APPARATUS, AND SUBSTRATE TREATMENT METHOD - The inventive substrate treatment apparatus includes: a rotative treatment control unit which controls a first chemical liquid supplying unit and a second chemical liquid supplying unit to perform a first chemical liquid supplying step of supplying a first chemical liquid to a substrate rotated by a substrate holding and rotating mechanism and a second chemical liquid supplying step of supplying a second chemical liquid to the substrate rotated by the substrate holding and rotating mechanism after the first chemical liquid supplying step; and a cleaning control unit which controls the cleaning liquid supplying unit to spout the cleaning liquid from the cleaning liquid outlet port to supply the cleaning liquid to the cup inner wall and/or the base wall surface before start of the second chemical liquid supplying step after end of the first chemical liquid supplying step, and/or during and/or after the second chemical liquid supplying step. | 02-18-2016 |
20160086793 | METHOD AND A PROCESSING DEVICE FOR PROCESSING AT LEAST ONE CARRIER - According to various embodiments, a method may include: filling a chamber and a tube coupled to the chamber with a first liquid, the tube extending upwards from the chamber; introducing a portion of a second liquid into the first liquid in the tube; and at least partially removing the first liquid from the chamber to empty the tube into the chamber so that a continuous surface layer from the introduced second liquid is provided on the first liquid in the chamber. | 03-24-2016 |
20160122688 | HARD SURFACE CLEANERS COMPRISING ETHOXYLATED ALKOXYLATED NONIONIC SURFACTANTS - The need for a liquid hard surface cleaning composition which provides improved shine, reduced slipperiness during drying, and also improved drying times is met formulating the composition using a ethoxylated alkoxylated nonionic surfactant, in combination with a detersive surfactant. | 05-05-2016 |
20160145761 | AUTOMATED CLEANING OF WAFER PLATING ASSEMBLY - Disclosed herein are cleaning discs for cleaning one or more elements of a semiconductor processing apparatus. In some embodiments, the disc may have a substantially circular upper surface, a substantially circular lower surface, a substantially circular edge joining the upper and lower surfaces, and a plurality of pores opening at the edge and having an interior extending into the interior of the disc. In some embodiments, the pores are dimensioned such that a cleaning agent may be retained in the interior of the pores by an adhesive force between the cleaning agent and the interior surface of the pores. Also disclosed herein are cleaning methods involving loading a cleaning agent into a plurality of pores of a cleaning disc, positioning the cleaning disc within a semiconductor processing apparatus, and releasing cleaning agent from the plurality of pores such that elements of the apparatus are contacted by the released cleaning agent. | 05-26-2016 |
20160184870 | SUBSTRATE PROCESSING METHOD - A substrate processing method includes a substrate holding step of holding a substrate horizontally, a liquid droplet discharging step of making liquid droplets of an organic solvent, formed by mixing the organic solvent and a gas, be discharged from a double-fluid nozzle toward a predetermined discharge region within an upper surface of the substrate, and a liquid film forming step, executed before the liquid droplet discharging step, of supplying the organic solvent to the double fluid nozzle without supplying the gas to discharge the organic solvent in a continuous stream mode from the double-fluid nozzle to form a liquid film of the organic solvent covering the discharge region on the upper surface of the substrate. | 06-30-2016 |
20180025922 | SUBSTRATE PROCESSING APPARATUS AND PROCESSING CUP CLEANING METHOD | 01-25-2018 |