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Including application of electrical radiant or wave energy to work

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134 - Cleaning and liquid contact with solids

134000000 - PROCESSES

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Class / Patent application numberDescriptionNumber of patent applications / Date published
134100100 Plasma cleaning 158
134100300 Semiconductor cleaning 60
Entries
DocumentTitleDate
20080283084METHOD FOR THE REMOVAL OF SEDIMENTS, FOULING AGENTS AND THE LIKE FROM DUCTS AND TANKS, AND APPARATUS ADAPTED TO PERFORM THE SAID METHOD - Taught herein are a method and apparatus for removing sediments, fouling agents and the like from fluid, in particular liquid, ducts and/or tanks, characterized in that the method comprises applying an ultrasound vibration to a plurality of points of the structure, duct or tank to be treated, said ultrasound vibration being continuously applied outside the structure at a given frequency and power.11-20-2008
20100154819Method and Apparatus for Treating Limescale Deposits within Water Heaters Inside Beverage Dispensing Machines - The present invention relates to a method and an apparatus for removing, or substantially reducing, the limescale deposits within a water heater of a beverage dispensing machine, by inducing ultrasonic vibrations through an ultrasonic generator. Advantageously the step of inducing ultrasonic vibrations is implemented discontinuously at high energy levels.06-24-2010
20100071718Method for Removing a Hardened Photoresist - A method for removing a hardened photoresist from a semiconductor substrate. An example method for removing a hardened photoresist layer from a substrate comprising a low-κ dielectric material preserving the characteristics of the low-k dielectric material includes: a)—providing a substrate comprising a hardened photoresist layer and a low-κ dielectric material at least partially exposed; b)—forming C═C double bonds in the hardened photoresist by exposing the hardened photoresist to UV radiation having a wavelength between 200 nm and 300 nm in vacuum or in an inert atmosphere; c)—breaking the C═C double bonds formed in step b) by reacting the hardened photoresist with ozone (O03-25-2010
20100071717METHOD AND APPARATUS FOR CLEANING VEHICLES - A method and apparatus for cleaning vehicles. The method of cleaning a vehicle can include irradiating an exterior surface of the vehicle with artificial electromagnetic radiation. The exterior surface of the vehicle can have soil deposited thereon, which can include a plurality of PAHs. At least some of the plurality of PAHs can be bonded together via a chemical bond having a bond energy. The method can further include breaking the chemical bond with the artificial electromagnetic radiation. The artificial electromagnetic radiation can have a predetermined wavelength that corresponds to the energy required to break the chemical bond. The method can further include cleaning the vehicle.03-25-2010
20130206163Methods and Systems For Removing Contaminants From A Wire Of A Saw - A system for ultrasonically cleaning one or more wires of a wire saw for slicing semiconductor or solar material into wafers. The system includes an ultrasonic transducer connected to a sonotrode. The system also includes a sonotrode plate adjacent to one or more of the wires. The sonotrode plate has an opening that exposes the sonotrode to one or more of the wires. The system further includes a tank for delivering a flow of liquid to contact the sonotrode and one or more of the wires. The tank is positioned on the same side of the wires as the sonotrode plate. The ultrasonic transducer is configured to vibrate and form cavitations in the liquid for the removal of contaminants from a surface of one or more of the wires.08-15-2013
20120174943MEGASONIC CLEANING WITH CONTROLLED BOUNDARY LAYER THICKNESS AND ASSOCIATED SYSTEMS AND METHODS - Megasonic cleaning systems and methods of using megasonic pressure waves to impart cavitation energy proximate a surface of a microelectronic substrate are disclosed herein. In one embodiment, a megasonic cleaning system includes a process tank for containing a liquid, a support element for carrying a substrate submerged in the liquid, and first and second transducers positioned in the tank. The first transducer is further positioned and/or operated to initiate cavitation events in a bulk portion of the liquid proximate a surface of the substrate. The second transducer is further positioned and/or operated to control an interface of fluid friction between the substrate and the bulk portion of the liquid.07-12-2012
20130081650METHOD AND SYSTEMS FOR ACOUSTIC CLEANING - A method and system for a tone generator assembly are provided. The tone generator assembly includes a resonance chamber that includes a first end and a second end and a body extending therebetween. The body surrounds a cavity therein, wherein the first end includes a resonance chamber opening in flow communication with the cavity. The tone generator assembly also includes a nozzle having a bore therethrough. The bore includes an inlet opening configured to receive a flow of relatively high pressure fluid and an outlet opening coupled in flow communication with the inlet opening and configured to discharge an underexpanded jet of fluid when the flow of relatively high pressure fluid is received at the inlet opening. The resonance chamber and the nozzle are positioned relatively and sized to facilitate emitting a tone from the tone generator assembly having a frequency less than two kilohertz.04-04-2013
20090159095Procedure for the preparation and cleaning of tools used for manufacturing composite material components, and the corresponding device - The procedure includes: a first phase of blowing and suction; a second phase of cleaning by laser where the tool (06-25-2009
20100108092Ultrasonic powered sugarbeet and cut sugar cane cleaning method using a stainless steel flume - An improved method of cleaning topped/scalped sugar beets and field chopped sugar cane cuttings using ultrasonic energy by the utilization of water used to transport and clean the topped/scalped sugar beets, beet pieces, beet slices, beet noodles, and chopped sugar cane using a plurality of ultrasonic emitters lining the walls and floor of its entire length for its entire length.05-06-2010
20130037047Method for machine cleaning and disinfecting objects - The invention concerns a method for machine cleaning and disinfecting objects, in particular medical and/or dental instruments and/or work equipment. According to the invention, the objects are ultrasonically cleaned in water in a working area of a cleaning and disinfection system, wherein after cleaning of the objects the water is removed from the working area up to a defined residual volume, The residual volume of water remaining in the working area is subsequently converted into water vapour by means of a heating element arranged in the working area (02-14-2013
20090293906Ultrasonic Cleaning of Engine Components - A method of cleaning an engine component, including: arranging a cap to provide a fluid seal with the engine component, wherein the cap includes an ultrasonic transducer and extends around a volume that is adjacent an exterior surface of the engine component; directing a cleaning fluid to contact the engine component via a supply conduit, wherein the directing involves the supply of cleaning fluid to said volume so as to contact said exterior surface; agitating the cleaning fluid by means of the ultrasonic transducer; and directing the cleaning fluid away from the component via a waste conduit.12-03-2009
20130068247METHODS AND APPARATUS FOR CLEANING SURGICAL INSTRUMENTS - Methods and apparatus for cleaning a surgical instrument during a surgical procedure insert at least the portion of the surgical instrument that is to be cleaned into a vessel containing a liquid and applying ultrasonic vibrations to the liquid within the vessel to generate cavitation bubbles in the liquid. The bubbles formed by cavitation of the liquid are very effective at removing debris from the surgical instrument, particularly from crevices and difficult-to-reach areas of the surgical instrument. The liquid also can be heated by a heating element of the vessel or by activating a heat-generating transducer of the surgical instrument being cleaned, or both.03-21-2013
20090044829ULTRASONIC-WAVE WASHING UNIT, ULTRASONIC-WAVE WASHING APPARATUS, ULTRASONIC-WAVE WASHING METHOD, METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING A LIQUID CRYSTAL DISPLAY - An ultrasonic-wave washing unit comprising an ultrasonic-wave vibrating plate to which an ultrasonic-wave vibrator is fixed by adhesive bonding, an ultrasonic-wave transmission plate opposed to the vibrating plate, a liquid supply means which supplies a liquid to a space defined between the vibrating plate and the transmission plate, and a liquid discharge means for discharging the liquid from the space.02-19-2009
20090044828Methods and Systems for Debonding an Undesirable Material from a Device Using Ultrasonic Energy and Liquid Nitrogen - An undesirable material is at least partially debonded from a surface of a device at least partially immersed in a vessel containing subcooled liquid nitrogen by applying ultrasound energy with a sonicating member to the device via the subcooled liquid nitrogen.02-19-2009
20100326465METHOD FOR THE REMOVAL OF SEDIMENTS, FOULING AGENTS AND THE LIKE FROM DUCTS AND TANKS, AND APPARATUS ADAPTED TO PERFORM THE SAID METHOD - Taught herein are a method and apparatus for removing sediments, fouling agents and the like from fluid, in particular liquid, ducts and/or tanks, characterized in that the method comprises applying an ultrasound vibration to a plurality of points of the structure, duct or tank to be treated, said ultrasound vibration being continuously applied outside the structure at a given frequency and power.12-30-2010
20130048013ULTRASONIC CLEANING METHOD FOR GENERATING ULTRASONIC VIBRATIONS BY A FREQUENCY MODULATED SIGNAL - An ultrasonic cleaning method of using ultrasonic vibrations to clean an object that is immersed in a cleaning liquid in a cleaning tank is provided. The method includes generating a frequency modulated signal including at least two frequency modulated portions having modulation widths different from each other with a single frequency as a center frequency, such that among the at least two frequency modulated portions a frequency modulated portion having a smaller modulation width is generated at a timing when a frequency modulated portion having a larger modulation width reaches the center frequency. The method further includes generating the ultrasonic vibrations based on the frequency modulated signal and transferring the ultrasonic vibrations to the cleaning tank to clean the object.02-28-2013
20130087166In-Situ Reactor Cleaning in High Productivity Combinatorial System - The present invention discloses a cleaning process, utilizing a gas flow to an interior of a hollow object in a fluid ambient. After capping the object to seal off the interior volume, gas is introduced to the object interior. The pressure is built up within the object interior, loosening the seal. The gas pressure is released, and the seal returns. The vibration caused by the cycling of gas pressure can be used to perform cleaning of particles adhering to the object. The cleaning process can be used in a combinatorial processing system, enabling in-situ cleaning of process reactor assemblies.04-11-2013
20130087167TUNABLE SURFACTANTS IN DAMPENING FLUIDS FOR DIGITAL OFFSET INK PRINTING APPLICATIONS - A dampening fluid useful in offset ink printing applications contains water and a surfactant whose structure can be altered. The alteration in structure aids in reducing accumulation of the surfactant on the surface of an imaging member. The surfactant can be decomposed, switched between cis-trans states, or polymerizable with ink that is subsequently placed on the surface.04-11-2013
20090301516SUBSTRATE TRANSFER DEVICE AND CLEANING METHOD THEREOF AND SUBSTRATE PROCESSING SYSTEM AND CLEANING METHOD THEREOF - A substrate transfer device includes an accommodating chamber for accommodating a substrate; a substrate transfer unit installed in the accommodating chamber for transferring the substrate; a gas exhaust unit for exhausting the accommodating chamber; and a gas introducing unit for introducing a gas into the accommodating chamber. The substrate transfer unit has a mounting subunit for mounting the substrate thereon, an arm subunit one end of which is connected to the mounting subunit to move the mounting subunit, and an electrode installed in the mounting subunit to which a voltage is applied, and a high voltage is applied to the electrode while the gas is being introduced into the accommodating chamber and the accommodating chamber is being exhausted.12-10-2009
20090301515MICROWAVE ASSISTED CHEMICAL STRIPPING OF COATINGS - A method for chemically stripping a metallic coating from a substrate is described. The coating is treated in the presence of microwave energy with a solution containing at least one acid known to dissolve the coating. The application of microwave energy accelerates the dissolution and allows for the use of diluted solutions. Coatings of interest include diffusion aluminides on superalloy substrates.12-10-2009
20120216828SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD - Disclosed is a substrate cleaning device provided with: a generation unit that generates ozone micro-nanobubble water; a nozzle header unit provided with a plurality of spray nozzles that spray the ozone micro-nanobubble water; and a substrate support unit that supports a substrate to be treated. The surface of the substrate supported by the substrate support unit is cleaned by spraying the ozone micro-nanobubble water from the plurality of spray nozzles onto the substrate.08-30-2012
20120216827METHOD FOR DETECTING TIN - A method for the detection of tin is presented. A specimen is first contacted with a ruthenium-containing species to create a contacted region of the specimen. At least a portion of the contacted region is then irradiated by an excitation radiation and monitored for a relaxation radiation emitted in response to the excitation radiation.08-30-2012
20130056021ANTIFOULING DEVICE FOR DUCTS - An antifouling device (03-07-2013
20090272401SYSTEMS AND METHODS FOR CHARGING A CLEANING SOLUTION USED FOR CLEANING INTEGRATED CIRCUIT SUBSTRATES - Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate.11-05-2009
20090056742Process for Decontaminating an Organic Solid Substrate Contaminated by Solid Radioactive Particulate Inorganic Contaminants, Using Dense Pressurized CO2 - Process for decontaminating, cleaning a solid organic substrate contaminated by solid radioactive particulate inorganic contaminants, in which: 03-05-2009
20090056741Cleaning apparatus, cleaning method, pattern formation apparatus, and pattern formation method - A pattern formation apparatus has a drum-like intaglio rolling along a transferred medium. After the intaglio is charged by a charger, a pattern of toner particles is formed by supplying a liquid developer of each color to the intaglio via a developing machine and an electric field is formed between the intaglio and the transferred medium by rolling the intaglio along the transferred medium to transfer charged toner particles to the transferred medium. A cleaning apparatus which cleans the intaglio after the pattern in each color being transferred to the transferred medium has nozzles at an angle for blowing a cleaning liquid against recesses and removal rollers for removing toner particles liberated from the recesses together with the cleaning liquid.03-05-2009
20090056740METHOD FOR CLEANING ALUMINUM ARTICLES - A method for cleaning aluminum article includes steps of first water washing for a aluminum article; cleaning the aluminum article with mildly alkaline solution which including phosphate, carbonate and silicate; and second water washing for the aluminum article.03-05-2009
20110011419PHOTOCATALYTIC AUTO-CLEANING PROCESS OF STAINS - The present invention provides a process for photocatalytically treating stains of chilly and turmeric caused on kitchen tiles and platforms by coating a thin film of photocatalyst made of a semiconductor such as titanium dioxide uniformly dispersed in dilute silica sol thereon and using a light source such as a fluorescent lamp to irradiate and photoexcite the photo catalytic thin film by the small amount of UV radiation included in the fluorescent light, resulting in photo decomposition and auto-cleaning of the stains.01-20-2011
20130061869USE OF MEGASONIC ENERGY TO ASSIST EDGE BOND REMOVAL IN A ZONAL TEMPORARY BONDING PROCESS - New methods of weakening the bonds between a bonded pair of wafers or substrates are provided. The substrates are preferably bonded at their outer peripheries. When it is desired to separate the substrates, they are contacted with a solvent system suitable for weakening, softening, and/or dissolving the bonding composition at their outer peripheries. Megasonic energy is simultaneously directed at the substrates (and preferably the bonding composition itself), so as to increase solvent penetration into the composition, thus decreasing the time needed for substrate separation and increasing throughput.03-14-2013
20090235952DEVICE AND METHOD FOR WET TREATING PLATE-LIKE SUBSTRATES - Disclosed is a device for wet treatment of plate-like articles including:09-24-2009
20090007931Method And Device For Drying A Flow Of Biomass Particles - A method and a system to be used in the process of manufacturing plates, such as fibreboards, particleboards and the like boards, where the raw material in the form of biomass particles, such as wood fibres or wood particles of various size and shape are dried from its natural moisture content to a moisture content suitable to be applied with a thermosetting binder and be spread onto a movable forming belt to form a mat, and where said mat by means of a hot press is compressed into the desired thickness of the finished plate and the thermosetting binder is hardened. According to the invention, the drying process of the biomass particles is facilitated by the use of ultrasound to remove the sub-layer of air at the surface of the particles and thus to intensify the transport of heat energy into the particles and the transport of moisture from the particles.01-08-2009
20130160791ULTRASONIC CLEANING METHOD - An ultrasonic cleaning method for cleaning an object in a solution having a gas dissolved therein includes irradiating ultrasonic waves to the solution having a first dissolved gas concentration. While the ultrasonic waves are being irradiated to the solution, a dissolved gas concentration in the solution is changed from the first dissolved gas concentration to a second dissolved gas concentration that is lower than the first dissolved gas concentration such that sonoluminescence occurs.06-27-2013
20080308120Substrate cleaning method and substrate cleaning apparatus - The present invention provides a substrate cleaning method capable of reducing non-uniformity of a removal efficiency of particles between lots with a simple procedure. The substrate cleaning method comprises: a step of supplying a gas into a cleaning tank, while an irradiation of ultrasonic waves to the cleaning liquid in the cleaning tank is being stopped, so as to increase a dissolved gas concentration of the gas dissolved in the cleaning liquid in the cleaning tank to a saturated concentration; and a step of irradiating ultrasonic waves to the cleaning liquid in the cleaning tank so as to clean a substrate immersed in the cleaning liquid in the cleaning tank. In the step of increasing the dissolved gas concentration to the saturated concentration, the gas is supplied to the cleaning tank so as to increase the dissolved gas concentration of the cleaning liquid in the cleaning tank to the saturated concentration. In addition, in the step of increasing the dissolved gas concentration to the saturated concentration, the irradiation of the ultrasonic waves to the cleaning liquid in the cleaning tank is stopped.12-18-2008
20080295860Apparatus and Method for Cleaning of Objects, in Particular of Thin Discs - The invention relates to an apparatus for the cleaning of thin wafers (12-04-2008
20130160792COATING REMOVING DEVICE AND COATING REMOVING METHOD - A coating removing device includes a coating thickness gauge configured for detecting a thickness of a coating layer formed on a surface of a article. A controller configured for determining an intensity of a laser beam needed to be emitted according to the thickness of the coating layer detected by the coating thickness gauge. In addition, a laser emitter emits the laser beam to the coating layer to remove the coating layer, the laser beam having the intensity determined according to the thickness of the coating layer. The intensity and energy of the laser beam arrived the surface of the article is changed over the coating thickness on the surface, the coated adhesive layer of the PCB is removed, and the appearance of the PCB will not be damaged.06-27-2013
20110030722CLEANING WATER FOR ELECTRONIC MATERIAL, METHOD FOR CLEANING ELECTRONIC MATERIAL AND SYSTEM FOR SUPPLYING WATER CONTAINING DISSOLVED GAS - Cleaning water for an electronic material which exhibits a remarkably improved cleaning effect in comparison with conventional waters containing dissolved gas is provided. The cleaning water for an electronic material comprises water containing dissolved gas containing oxygen and argon as dissolved gases, and has a concentration of dissolved oxygen being equal to or more than 8 mg/L, and a content of dissolved argon gas being equal to or more than 2 volume % of the total amount of dissolved oxygen gas and dissolved argon gas. A method for cleaning an electronic material with the cleaning water for an electronic material. The cleaning water for an electronic material of the present invention, which comprises water containing dissolved oxygen/argon gas, contains a smaller amount of dissolved gas, can obtain an improved cleaning effect even when a small amount of a chemical is used, and therefore, can be produced safely and easily at a low cost.02-10-2011
20120247503VEHICLE WITH PARTICULATE RESISTANT WINDSHIELD - A vehicle having a particulate resistant windshield comprises a windshield, an ionizer, and a controller. The windshield is disposed in a cab portion of a vehicle. The windshield has a periphery. The ionizer has at least one electrode disposed adjacent the periphery of the windshield. The controller is in electrical communication with the ionizer. The controller generates a signal transmitted to the ionizer to control generation of ions by the ionizer. The ions generated by the ionizer are directed towards at least a portion of the windshield.10-04-2012
20110259361DETERGENT COMPOSITIONS UTILIZING HYDROPHOBICALLY MODIFIED POLYMER - Embodiments of the invention relate to a detergent composition including a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer; and a heavy duty liquid detergent. In addition, embodiments relate to a method of cleaning a substrate, including contacting a substrate with a poly(maleic acid/vinyl octyl ether) (PMAOVE) hydrophobically modified polymer solution.10-27-2011
20130019893ULTRASONIC CLEANING METHOD AND APPARATUS - A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.01-24-2013
20090205675Methods and Systems for Using a Laser to Clean Hydrocarbon Transfer Conduits - An improved method and system for removing blockage from hydrocarbon transfer conduits. An apparatus and methods for cleaning a hydrocarbon transfer conduit is disclosed whereby a laser head is placed in a hydrocarbon transfer conduit to be cleaned and supplied with a laser beam. The laser head applies the laser beam to an area in the hydrocarbon transfer conduit to be cleaned.08-20-2009
20090205676CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS - A cleaning method that can prevent abnormal wear of an O-ring. A cleaning gas containing at least oxygen gas is supplied to the interior of a chamber in which a substrate is accommodated, and radio-frequency voltage is applied to the interior of the chamber to produce oxygen radicals from the cleaning gas. When the amount of deposit produced in the chamber in plasma processing is larger than a predetermined amount, the amount of fluorine radicals in the chamber is increased, and when the amount of the deposit is smaller than the predetermined amount, the amount of fluorine radicals in the chamber is decreased.08-20-2009
20090205677METHOD AND APPARATUS FOR WAFER CLEANING - A single wafer cleaning apparatus that includes a rotatable bracket that can hold a wafer, a rinse fluid having a first surface tension, a second fluid having a second surface tension lower than the first surface tension, a first nozzle capable of applying the rinse fluid at a first location on the wafer positioned in the bracket, second nozzle capable of applying the second fluid at a second location on the wafer where the second location is inboard of the first location, and the first nozzle and the second nozzle are capable of moving across the wafer to translate the first location and the second location from the wafer center to the wafer outer edge.08-20-2009
20110284024ASSISTIVE DEVICE FOR A MICROBIAL SCRUB BRUSH - A system and device for assisting with the cleansing of a medical component with a scrub brush is disclosed. In one embodiment, an assistive device for use with the scrub brush is disclosed. The scrub brush includes an insert disposed therein, the insert including a cleansing substance such as CHG or alcohol. The assistive device comprises a housing, a motor, a head removably supporting the scrub brush, and an interface interconnecting the motor and the head. The interface is a shaft that enables back-and-forth rotation or other movement of the head and scrub brush relative to the medical component so as to cleanse the medical component.11-24-2011
20100170529Acoustic Cleaning Device and Method - An acoustic cleaning device and method for cleaning of the surfaces within a vessel is provided. The device may consist of one acoustic transducer or a series of smaller acoustic transducers mounted inside the vessel in a specific fashion in order to direct acoustic waves throughout the cleaning liquid and onto the interior surfaces of the vessel. An acoustic cavitation is produced by the pressure variations in sound waves moving through the cleaning liquid and a cleaning action is accomplished throughout the entire vessel interior. The acoustic cleaning device may be arranged in a variety of ways to accomplish the cleaning. The acoustic cleaning device may be used with a variety of chemical cleaning solutions and is ideal for particle surface contaminant removal.07-08-2010
20110290276Laser Cleaning Device for Electrode Tab of Battery and Laser Cleaning Method Using the Same - A laser cleaning device, and a laser cleaning method using the same, for removing an electrolyte solution stuck to an electrolyte tab during a process of injecting the electrolyte solution are disclosed. The laser cleaning device for an electrode tab of a battery includes: a cleaning housing, in which a battery case for receiving an electrode group, an electrolyte solution and an electrode tab exposed to the outside are embedded; a laser generator which includes a laser source for generating a laser beam and an output controller for controlling output of the laser beam; a laser transmitter which transmits the laser beam generated by the laser generator; and a laser emitting unit which is installed inside the cleaning housing, and which irradiates the laser beam transmitted by the laser transmitter onto the electrode tab so as to remove liquid pollutants stuck to the electrode tab. The laser cleaning method comprises steps generally corresponding to the latter functions of the laser cleaning device.12-01-2011
20110297182METHOD OF MEGASONIC CLEANING OF AN OBJECT - A megasonic cleaning method and a megasonic cleaning apparatus are provided. Microcavitation bubbles may be formed by applying an electromotive force to a cleaning solution using a megasonic energy in a separate room from an object to be cleaned. The microcavitation bubbles having a stable oscillation among the formed microcavitation bubbles may be moved to the object to be cleaned. A surface of the object to be cleaned may be cleaned using the microcavitation bubbles having the stable oscillation. Particles attached onto the surface of the object to be cleaned may be effectively removed while preventing pattern damage.12-08-2011
20090288679Apparatus and method for cleaning surfaces - The apparatus for cleaning surfaces of the present invention such as for cleaning solar collectors preferably alternates different fluids and gas decompression to create a cleansing fluid evacuation to clean outdoor solid surfaces. The method of the present invention utilizes alternating fluids in order to avoid mineral deposits contaminating the collector. The apparatus of the present invention is a tool to achieve the ends of the method. The apparatus preferably uses copper piping and turbulence to regulate water flow and to create the high velocity fluid evacuation that achieves the ends of the method invention. The use of a constant pressure pump and turbulence inducing fibers allows passive regulation of pressure that is equalized across a plurality of sprayers to deliver an even amount of high velocity fluid from each sprayer. Sonication accelerates cleaning, rinsing or snow/ice removal.11-26-2009
20100031972Ultrasonic vibration system and method for removing/avoiding unwanted build-up on structures - An ultrasonic method for removing and/or avoiding unwanted build-up on structures is provided, wherein the term build-up refers to, but is not limited to, ice, dirt, mud, or other wanted debris or contamination. Deicing or anti-icing structures of interest can include, but are not limited to, helicopter rotor blades, other helicopter blade components, fixed wing aircraft components, windshields in aircraft, automobiles, and other vehicles, ship hulls or other ship components, heat exchangers and other tubing where frost or ice could form, air-conditioning components, head lamp and other light coverings, bridge structures and components, and any structure where anti-icing or deicing would be beneficial. One or more ultrasonic actuators permanently embedded or coupled to the structure may be used accomplish the removal. The technique presented herein could also be utilized for non-destructive evaluation and structural health monitoring applications.02-11-2010
20110214686HANDHELD VACUUM ATTACHMENT WITH ULTRAVIOLET LIGHT - A vacuum cleaner attachment and a method of control of the vacuum cleaner attachment are described. The vacuum cleaner attachment comprises an ultraviolet light source to irradiate and disinfect various cleaning surfaces. Various embodiments of the attachment include one or more safety features concerning activation, enabling, and disabling of the ultraviolet light source based on various parameters such as distance between the attachment and a cleaning surface, time that such a distance is greater than a predetermined time period, and temperature of the ultraviolet light source in order to enable safe and effective operation of the attachment.09-08-2011
20100101601CLEANING EQUIPMENT AND CLEANING METHOD OF DEPOSITION MASK - Equipment is realized which is capable of increasing the frequency of use of a deposition mask of an organic EL element and the recycle of an adhesive agent by efficiently cleaning the deposition mask with little damage and efficiently collecting the adhesive agent. A pulse laser is irradiated to a deposition mask to separate the deposition agent from the deposition mask. The separated deposition agent is sucked by a suction nozzle, and the deposition agent is separated from air by a cyclone and deposited on a bottom of the cyclone. Thereafter, a first valve is opened to collect the deposition agent in a deposition agent collection section. Then a second valve is opened to move the deposition agent to a deposition agent refining section to be refined. A third valve is opened to store the refined deposition agent in a deposition agent storage section. The deposition mask may be cleaned without being damaged to collect the deposition agent with high efficiency.04-29-2010
20120024313GIGASONIC BRUSH FOR CLEANING SURFACES - An apparatus, system, and method for a Gigasonic Brush for cleaning surfaces is presented. One embodiment of the system includes an array of acoustic transducers coupled to a substrate where the individual acoustic transducers have sizes in the range of 9 um2 to 250,000 um2. The system may include a positioning mechanism coupled to at least one of a target surface or the array of acoustic transducers, and configured to position the array of acoustic transducers within 1 millimeter of a target surface. The system may also include a cleaning liquid supply arranged to provide cleaning liquid for coupling the array of acoustic transducers to the target surface. The system may further include a controller coupled to the array of acoustic transducers and configured to activate the array of acoustic transducers.02-02-2012
20100078039METHOD AND APPRATUS FOR MASK PELLICLE ADHESIVE RESIDUE CLEANING - Aspects of the invention generally provide methods and apparatus for cleaning adhesive residual on a photomask substrate. In one embodiment, the apparatus includes a processing cell, a support assembly configured to receive a photomask substrate disposed thereon disposed in the processing cell, a protection head assembly disposed above and facing the support assembly, and a head actuator configured to control the elevation of the protection head assembly relative to an upper surface of the support assembly. A cleaning device is provided and positioned to interact with the photomask substrate disposed on the support assembly. In another embodiment, a method of cleaning a periphery region of a photomask substrate includes providing a photomask substrate having a periphery portion and a center portion disposed on a support assembly in a processing cell, lowering a protection cover disposed in the processing cell to cover the center portion of the photomask substrate, providing a brush in the processing cell to clean the periphery portion of the photomask substrate.04-01-2010
20100122710FILM DEPOSITION APPARATUS, CLEANING METHOD FOR THE SAME, AND COMPUTER STORAGE MEDIUM STORING PROGRAM - A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.05-20-2010
20090120456CLEANING METHOD AND A VACUUM PROCESSING APPARATUS - To provide a technique which cleans an attracting face of a mechanism for electrostatically attracting an object to be processed inside a vacuum processing apparatus and keeps its attracting force constant. The method of the present invention is for cleaning an attracting face of a hot plate which holds the object to be processed inside a vacuum processing chamber through electrostatic attraction. The invention method includes a step of cleaning the attracting face of the hot plate by applying a high-frequency electric power of 13.56 MHz to a metallic base arranged under and near the hot plate in a state in which a cleaning gas is introduced into the vacuum processing chamber.05-14-2009
20090090381Frontside structure damage protected megasonics clean - An apparatus and method for removing contaminants from a workpiece is described. Embodiments of the invention describe placing a workpiece on a holding bracket within a process chamber to hold and rotate the workpiece to be cleaned. A first cleaning fluid is provided to the workpiece non-device side, while a degasified liquid is provided to the workpiece device side during megasonic cleaning. The degasified liquid inhibits cavitation from occurring on and damaging the device side of the workpiece during megasonic cleaning.04-09-2009
20080210256Method of and Device for Cleaning a Metal Sheet - The invention relates to a method of a cleaning a metal strip (09-04-2008
20090277471Apparatus and Method of Cleaning Substrate - A substrate cleaning apparatus includes a supporting plate supporting a substrate and a shielding unit that is disposed above the substrate to protect the substrate. A portion of the shielding unit, which is adjacent to a focal point where light for generating shock waves is focused, is switched. Therefore, the substrate cleaning apparatus prevents the concentration of plumes and residence beams, which are generated together with the shock waves, on a specific region of the shielding unit and further prevents the recontamination of the substrate by the damage of the shielding unit.11-12-2009
20090283109Methods for Cleaning and Curing Solid Freeform Fabrication Parts - A post-processing system is provided for cleaning and/or curing a part produced by solid freeform fabrication (SFF). The post-processing systems include a housing, a part retaining device to retain the part within the housing, and an actinic radiation source to cure the part with actinic radiation. The systems also include a fluid circulation device adapted to expose the part to cleaning fluid and/or to allow the cleaning fluid to absorb actinic radiation to permit filtration of removed build material to allow extended use of the cleaning fluid. Certain systems include a first rotating portion that can rotate the retained part about a first axis, and further systems include a second rotating portion that can rotate the retained part about a second axis. The systems also include additional features to provide safe and efficient cleaning and/or curing of parts produced by SFF.11-19-2009
20090288678METHOD FOR MANUFACTURING DISK - A disk manufacturing method that includes: processing a surface of a disk while rotating the disk; cleaning the surface of the disk after the processing to remove a processing residue from the disk; drying the disk after the cleaning; and end-face cleaning that cleans an end-face of the disk while rotating the disk, the end-face cleaning being performed concurrently with at least one of the processing and the cleaning.11-26-2009
20120167914DEVICE AND METHOD FOR WET TREATING DISC-LIKE SUBSTRATES - A method for wet treatment of wafers includes a first plate and a second plate substantially parallel to the first plate, and a wafer is held between the first and the second plate substantially parallel. A first dispenser introduces fluid into a first gap between the first plate and the wafer when being treated, and a second dispenser introduces fluid into a second gap between the second plate and the wafer when being treated. At least one vibrating element is acoustically coupled to at least the second plate, and a holder and the second plate are rotated relative to each other about an axis substantially perpendicular to the second plate.07-05-2012
20090007933Methods for stripping and modifying surfaces with laser-induced ablation - A coating removal apparatus removes a coating from a surface. The apparatus has a movable scanning head and scanning optics. The scanning head is movable in one dimension, and the scanning optics adjust in two dimensions to compensate for movement of the scanning head to implement long range scanning with a uniform scanning pattern. Further, a surface roughness is determined by measuring specular and scattered reflections at various angles. For composite surfaces, the apparatus utilizes UV laser radiation and a controlled atmosphere to remove coating and alter the chemical characteristics at the surface.01-08-2009
20090007932AQUEOUS COMPOSITION CONTAINING A SEMICONDUCTOR - The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.01-08-2009
20080245388METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES - To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.10-09-2008
20080245387METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES - To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.10-09-2008
20120291799REMOVAL OF RESIDUAL PARTICULATE MATTER FROM FILTER MEDIA - A method for removing residual filter cakes that remain adhered to a filter after typical particulate removal methodologies have been employed, such as pulse-jet filter element cleaning, for all cleanable filters used for air pollution control, dust control, or powder control.11-22-2012
20100275949ULTRASONIC COATING REMOVAL METHOD - A method for removing a coating layer from a substrate structure. The method includes the steps of positioning a sheet of interface material on the substrate structure with a first, inner face of the interface material in engagement with a predetermined area of the coating layer, and exciting a second, outer face of the interface material with an ultrasonic frequency kinetic energy. The ultrasonic energy causes the predetermined area of the coating layer in contact with the inner face of the interface Material to be substantially completely removed.11-04-2010
20080283085Concrete load cleaning apparatus and method - A device and method are provided to allow the removal of unset or generally plastic concrete from the surfaces of mixing and transportation devices by the application of vibrational energy with a liquid to mix and achieve solubilization of the generally plastic concrete into a solution.11-20-2008
20080289649APPARATUS AND METHOD FOR SANITIZATION OF PORTABLE DEVICES - A system and method are provided for sanitizing portable devices (11-27-2008
20130118522METHOD OF CLEANING MULTILAYER COPPER WIRINGS IN ULTRA LARGE SCALE INTEGRATED CIRCUITS AFTER CHEMICAL-MECHANICAL POLISHING - A method of cleaning multilayer copper wirings in ultra large scale integrated circuits after chemical-mechanical polishing, the method including: a) preparing a cleaning solution, the cleaning solution including between 0.1 and 5 wt. % of a nonionic surfactant, between 0.1 and 7 wt. % of a corrosion inhibitor, and between 0.1 and 0.6 wt. % of a chelating agent in deionized water; b) adjusting the pH value of the cleaning solution to between 7 and 8 using triethanolamine; c) during the production of ULSI, after the chemical-mechanical polishing step, washing the multilayer copper wirings with the cleaning solution at a flow rate of between 500 and 5000 mL/min for between 0.5 and 1 min; d) ultrasonic washing in the presence of deionized water under following conditions: 60 Hz frequency of ultrasound, 50° C. temperature, and between 0.5 and 1 min ultrasonic time; and e) drying the multilayer copper wirings.05-16-2013
20130213433Method to Improve the Performance of a Leached Cutter - A cleaned component having a polycrystalline structure, a method and apparatus for cleaning a leached component to form the cleaned component, and a method for determining the effectiveness of cleaning the leached component. The cleaned component includes a leached layer that has at least a portion of by-product materials removed. The by-product materials were deposited into the leached layer during a leaching process that formed the leached layer. The apparatus and method for cleaning includes a tank, a cleaning fluid placed within the tank, and at least a portion of the leached layer immersed into the cleaning fluid. Optionally, a transducer emits ultrasonic waves into the leached layer. The method for determining the effectiveness of cleaning includes cleaning the leached component to form the cleaned component, measuring one or more capacitance values of the cleaned component, repeating the cleaning and the measuring until achieving a stable lower limit capacitance value.08-22-2013
20080271747Cleaning device and a lithographic apparatus cleaning method - A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.11-06-2008
20080251100METHOD FOR CLEANING PHOTO MASK - The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the production cost. The method for cleaning a photo mask with a pellicle mounted, in which the pellicle frame has a gas introducing hole and a gas discharging hole, comprises: a step of introducing a gaseous substituting substance from the gas introducing hole in a pellicle inner space surrounded by the photo mask and the pellicle, substituting foreign substances on the photo mask, and discharging the foreign substances from the gas discharging hole; and a step of irradiating an ultraviolet ray to the photo mask, while an air or a nitrogen gas or a rare gas is introduced from the gas introducing hole, for degrading the substituted substituting substance so as to be gaseous, and discharging the same from the gas discharging hole.10-16-2008
20100139690CLEANING APPLIANCE COMPRISING A MICROWAVE DRYING SYSTEM - A cleaning appliance is provided for cleaning objects to be cleaned. The cleaning appliance comprises at least one cleaning zone for cleaning the object to be cleaned using a cleaning liquid. The cleaning appliance further comprising a microwave drying device which can be used for at least partially drying the object to be cleaned.06-10-2010
20110214685Cleaning Agent For Silicon Wafer - A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved.09-08-2011
20120138084Cleaning device using UV-ozone and cleaning method using the device - A contaminant cleaning device includes a stage configured to house a substrate; an imaging means configured to obtain an image of a contaminant on the substrate; a control means configured to recognize the image and configured to generate a control signal in accordance with the recognized image; a UV generating means; an irradiation shape forming unit configured to selectively block a passage of UV radiated from the UV generating means to make a UV irradiated shape correspond to a shape of the image recognized in the control means; and an interrupter configured to receive a control signal from the control means to block or allow passage of UV from the UV generating means, wherein the stage is configured to move in accordance with a control signal from the control means to enable a contaminant on the substrate to be positioned in the area to which UV is irradiated.06-07-2012
20110139174METHOD OF CLEANING SHOWERHEAD - A showerhead cleaning rack is disclosed. The showerhead cleaning rack includes a frame and a support body, wherein the support body is located and connected with the frame. The support body has a plurality of positioning parts. The positioning parts are used for holding the showerhead. The showerhead cleaning rack is used in an ultrasonic cleaning trough. By utilizing the oscillation of the ultrasonic wave generated in the ultrasonic cleaning trough, the pollutants on the showerhead is cleaned. An ultrasonic cleaning method with the showerhead cleaning rack is also provided.06-16-2011
20090050174CART AND BASKET WASHER AND METHOD - According to embodiments, a cart or shopping basket washer is configured to wash one or more carts or shopping baskets. The cart or shopping basket washer may include self-propelled apparatuses to treat a substantially stationary cart or shopping basket, or may include a conveying mechanism to propel a cart or shopping basket through one or more substantially stationary washing stations. The cart or shopping basket washer may include provisions from accepting commands from non-trained persons, for receiving payment, and for receiving indication of a loyalty relationship. The cart or shopping basket washer may include sensors and logic to ensure the safety of people and property.02-26-2009
20090050175SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - At a vibration applying position, ultrasonic vibration is applied upon a liquid film which is on a surface of a substrate. Concurrently with this, at a drop arrival position which is different from the vibration applying position, drops of a cleaning liquid are supplied to the liquid film, whereby wave-generating vibration which is different from the ultrasonic vibration is applied upon the liquid film. This dramatically improves removal of particles adhering to the surface of the substrate as compared with mere application of ultrasonic vibration. Hence, even when the output, the frequency and the like of the ultrasonic vibration are set to such an extent not damaging the substrate, it is possible to effectively remove particles with the wave-generating vibration and favorably clean the surface of the substrate.02-26-2009
20090050173APPARATUS FOR CLEANING SUBSTRATE AND METHOD FOR CLEANING SUBSTRATE - Provided is an apparatus for cleaning a substrate. The apparatus includes a stage on which a substrate is loaded, a cleaning liquid supply unit supplying a cleaning liquid to the substrate, an oscillator transmitting sound waves to the substrate for cleaning the substrate, and at least two piezoelectric members disposed on an end portion of the oscillator at a predetermined distance apart from each other so as to generate the sound waves.02-26-2009
20110139173METHOD OF AND APPARATUS FOR MEASURING STRENGTH OF ULTRASONIC WAVES - A method of and an apparatus for measuring the strength of ultrasonic waves are provided. They are capable of measuring the strength of ultrasonic waves easily and at low cost without using a sound pressure meter. The ultrasonic wave strength measuring apparatus has a particle source soaked in a cleaning liquid, an oscillator to generate the ultrasonic waves whose strength is going to be measured to vibrate the particle source so that particles are eluted from the particle source into the cleaning liquid, a counter to count the number of particles in the cleaning liquid, and an operation unit to find the strength of the applied ultrasonic waves based on the counted number of particles.06-16-2011
20090211595Rheological fluids for particle removal - Methods and apparatus for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing electrorheological (ER) and magnetorheological (MR) fluids to remove contaminant residual particles from the substrate surface are provided.08-27-2009
20090020136System and method for cleaning a diesel particulate filter using acoustic waves - A method for cleaning a diesel particulate filter includes a step of coupling an acoustic generator directly to the diesel particulate filter via a support fixture. Ash deposited within the diesel particulate filter is dislodged with acoustic energy deposited by the acoustic generator. The ash may fall clear of the diesel particulate filter under the action of gravity and/or via pressurized air flow.01-22-2009
20090241986Ultrasound system - An ultrasound system for providing megasonics and ultrasonics to a liquid at different frequencies and/or sweeping frequencies with associated generators, transducers, operations between resonance and anti-resonance, non-resistive output with phase shift, multiple/sweep/single frequency modes, individually controlled sections, gate drive power control, variable inductive compensation for temperature changes, parallel inductor matching, stacked ceramics and non-volatile memory storage of fault, error and failure history.10-01-2009
20090255555Advanced cleaning process using integrated momentum transfer and controlled cavitation - A method and apparatus for cleaning a workpiece are disclosed. A gas and cleaning solution are supplied to an atomizing nozzle which atomizes the cleaning solution and sprays the top surface of a workpiece with an atomized spray. A liquid having a controlled gas content is flowed to the top surface of the workpiece from a rinse nozzle. Megasonic energy is applied from the backside of the workpiece.10-15-2009
20090241987ENDOSCOPE CLEANER AND CLEANING METHOD - An endoscope cleaner includes a cleaning chamber for containing an endoscope. A vibration plate is disposed in a lower portion of the cleaning chamber. A basket portion is disposed substantially at a center of the vibration plate, for containing small parts removed from the endoscope. A nozzle opening supplies cleaning fluid into the cleaning chamber through the basket portion. Plural ultrasonic vibrators include at least one disposed under the basket portion, for vibrating the vibration plate. Furthermore, a drain port drains the cleaning fluid. A circulation line circulates the cleaning fluid from the cleaning chamber by use of the nozzle opening and the drain port. A disinfectant nozzle ejects disinfectant to disinfect the endoscope and the small parts. The basket portion has an upwards open shape, and prevents the small parts from scattering in vibration. The small parts are plural button parts or cap parts.10-01-2009
20090133713Multilayer structural body and method for cleaning the same - It has been difficult to provide a large-sized ceramic member quickly and economically. A multilayer structure is produced by forming a ceramic film on a base which is made of a material that can be shaped comparatively easily. The ceramic film is formed by a plasma spraying method, CVD method, PVD method, sol-gel method or the like. Alternatively, the ceramic film may be formed by a method combined with a spray deposit film.05-28-2009
20100147327FOREIGN SUBSTANCE REMOVING APPARATUS, FOREIGN SUBSTANCE REMOVING METHOD, AND STORAGE MEDIUM - A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.06-17-2010
20100175712SHOWERHEAD CLEANING RACK AND AN ULTRASONICCLEANING METHOD THEREFOR - A showerhead cleaning rack is disclosed. The showerhead cleaning rack includes a frame and a support body, wherein the support body is located and connected with the frame. The support body has a plurality of positioning parts. The positioning parts are used for holding the showerhead. The showerhead cleaning rack is used in an ultrasonic cleaning trough. By utilizing the oscillation of the ultrasonic wave generated in the ultrasonic cleaning trough, the pollutants on the showerhead is cleaned. An ultrasonic cleaning method with the showerhead cleaning rack is also provided.07-15-2010
20100175711Method of cleaning contact lenses via sonication - A process for cleaning all types of contact lenses by placing each contact lens in individual compartments of a liquid impermeable lens storage container filled with an aqueous medium such as sterile saline or sterile lens cleaning solution, floating the liquid impermeable storage container in an ultrasonic device operating at a frequency of 50-60 Hz and a wattage of 20-117 watts.07-15-2010
20100154820Cleaning System for an Image Plate Readout Device - The invention relates to a cleaning system for a set of instruments associated or in contact with an image plate readout device, as well as to a readout device comprising the cleaning system. The cleaning system comprises a disinfecting element, which emits electromagnetic radiation and/or ultrasonic radiation capable of destroying disease carriers, and which is adapted to emit said radiation towards an image plate conveyor mechanism encompassed by the image plate readout device.06-24-2010
20090038637APPARATUS AND METHOD FOR INDIRECT SURFACE CLEANING - A method for laser surface cleaning of a target surface that has limited or no access to the environment directly above the surface to be cleaned. The method includes the ability to clean the surface with a reduced risk of substrate damage. The method includes direct laser excitation of a contaminated substrate surface and thermal transfer from the substrate to the contaminating particulate or contamination layer. The method also includes producing a thermally based removal and reducing a risk of substrate damage by keeping the temperature required to produce surface cleaning below the thermal damage level of the substrate material. In addition, the method includes reducing the risk of substrate damage by utilizing relatively long pulse-widths, providing for improved removal of small contaminants/particles, and directing the beam through a material disposed relative to the surface that is part of the substrates environmental enclosure.02-12-2009
20090314308Germicidal Floor, Germicidal Foot, And Hand Cleaning System - A device for simultaneously cleaning hands and feet comprises a first housing and a second housing connected by a pole. An ultraviolet light source and a light reflector is disposed within each of the first and second housings. The ultraviolet light sources and light reflectors are adapted to direct ultraviolet light waves onto the hands and feet of an individual user of the device. The light waves kill or deactivate harmful germs or transmissible diseases disposed on the hands and/or carried by the feet or the socks of the individual, thereby preventing the harmful germs or transmissible diseases from spreading and causing harm to other individuals or animals.12-24-2009
20100224214ULTRASONIC CLEANING METHOD, AND ULTRASONIC CLEANING APPARATUS - The frequency and power of ultrasonic waves is adjusted to materialize the relation 0.04f−20.0≦P≦0.09f−7.5, wherein f (kHz) is the frequency of the ultrasonic waves and P (W/L) is the power per unit fluid volume obtained by dividing the power (W) of the ultrasonic waves by the volume (L) of a cleaning fluid. The discharge condition of the cleaning fluid by a pump is adjusted such that the proportion (C5) of the brightness of the fluid when 5 seconds has passed since the state wherein both an ultrasonic wave irradiation means and a bubble supply means are concurrently operating to the brightness of the fluid when no bubbles exist in the fluid is 0.75 or less. The coalition and crush of bubbles due to the irradiation of ultrasonic waves are suppressed, and the both actions can be utilized for a long period.09-09-2010
20100242988METHOD AND APPARATUS FOR CLEANING A COMPONENT USING MICROWAVE RADIATION - A method for cleaning a component having an undesired substance thereon includes exposing the component to a cleaning solution and irradiating the component with microwave radiation to assist in removing the undesired substance.09-30-2010
20100218784COPPER DEPOSITION CHAMBER HAVING INTEGRATED BEVEL CLEAN WITH EDGE BEVEL REMOVAL DETECTION - Embodiments of the invention generally provide apparatus and method for detecting and controlling edge bevel removal of a semiconductor substrate. One embodiment of the present invention provides an apparatus for inspecting a rotating substrate. The apparatus comprises a substrate support configured to support the rotating substrate on a back side and rotate the substrate about a central axis, and a sensor positioned above the substrate support, the sensor being configured to inspect a front side of the rotating substrate while moving simultaneously radially across the substrate.09-02-2010
20110056512ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STORAGE MEDIUM STORING COMPUTER PROGRAM FOR EXECUTING ULTRASONIC CLEANING METHOD - An ultrasonic cleaning apparatus according to the present invention comprises: a plurality of cleaning tanks configured to store a cleaning liquid; an object-to-be-processed holder capable of being inserted into each cleaning tank, the object-to-be-processed holder being configured to hold an object to be processed and to immerse the object to be processed into the cleaning liquid; a vibrator disposed on each cleaning tank; a single ultrasonic oscillator configured to make each vibrator ultrasonically vibrate; an output switch interposed between the ultrasonic oscillator and the vibrator of each respective cleaning tank, the output switch being configured to switch the vibrator that is connected to the ultrasonic oscillator; and a control device configured to control the ultrasonic oscillator and the output switch; wherein the control device controls the ultrasonic oscillator and the output switch such that a timing at which the vibrator of one of the cleaning tanks is made to ultrasonically vibrate, and a timing at which the vibrator of another cleaning tank is made to ultrasonically vibrate, are not overlapped with each other.03-10-2011
20110056511Cleaning liquid and a cleaning method - Problem: To provide a cleaning liquid and a cleaning method having excellent leaning capability. In a process of liquid immersion lithography, they can preventing the damage to be caused by the component released from the photoresist to photoexposure devices; the waste treatment is easy; the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the production cost is reduced not detracting from the throughput in semiconductor production.03-10-2011
20110100394SUPERIMPOSITION OF RAPID PERIODIC AND EXTENSIVE POST MULTIPLE SUBSTRATE UV-OZONE CLEAN SEQUENCES FOR HIGH THROUGHPUT AND STABLE SUBSTRATE TO SUBSTRATE PERFORMANCE - A method for cleaning a substrate processing chamber, including processing a batch of substrates within a processing chamber defining one or more processing regions. Processing the batch of substrates may be executed in a sub-routine having various sub-steps including processing a substrate from the batch within the processing chamber, removing the substrate from the processing chamber, introducing ozone into the processing chamber, and exposing the chamber to ultraviolet light for less than one minute. The substrate batch processing sub-steps may be repeated until the last substrate in the batch is processed. After processing the last substrate in the batch, the method includes removing the last substrate from the processing chamber, introducing ozone into the processing chamber; and exposing the processing chamber to ultraviolet light for three to fifteen minutes.05-05-2011
20090071504APPARATUS AND METHOD OF GENERATING ULTRASONIC VIBRATION AND APPARATUS AND METHOD OF CLEANING A WAFER USING THE SAME - In an apparatus and method of generating an ultrasonic vibration, an ultrasonic vibration generated in an ultrasonic vibration generator is transmitted through a material layer to control the intensity and the direction of the ultrasonic vibration. In an apparatus and method of cleaning a wafer, a cleaning solution supplier supplies a cleaning solution for cleaning the wafer onto the wafer. An ultrasonic vibration generator generates an ultrasonic vibration. The ultrasonic vibration is transmitted through a material layer of a transmission member to control the intensity and the direction of the ultrasonic vibration. The ultrasonic vibration is applied to the cleaning solution.03-19-2009
20090071503METHOD AND DEVICE FOR TREATING SUBSTRATES AND NOZZLE UNIT THEREFOR - A method and device for treating substrates, and a nozzle unit therefore. A liquid film is formed on a local surface area of a substrate that is to be treated by means of a nozzle unit comprised of at least on elongated nozzle arrangement and an ultrasonic or megasonic transducer arrangement disposed adjacent to the nozzle arrangement. The transducer arrangement is composed of a plurality of transducers having different resonant frequencies. At least a portion of the transducer arrangement is brought into contact with the liquid film, and ultrasound or megasound is introduced into the liquid film by the transducer arrangement. The transducers are excited individually and/or in groups with different intensities and/or frequencies,03-19-2009
20110232677Method for cleaning low-k dielectrics - A method and system for treating a substrate and, in particular, a method and system for cleaning a low dielectric constant (low-k) dielectric film to remove, among other things, undesired residue is described. The method includes irradiating a region on a substrate containing one or more layers or structures with infrared (IR) radiation and optionally ultraviolet (UV) radiation to remove material or undesired residues from the one or more layers or structures. Furthermore, the method may optionally include exposing at least a portion of the region to a gas or vapor jet emanating from a gas nozzle along a jet axis in a direction towards the substrate.09-29-2011
20100294304Aqueous composition containing a semiconductor - The use of an aqueous composition comprising a semiconductor as cleaning agent for surfaces in the outdoors field and indoors field is proposed.11-25-2010
20100294305ULTRASONIC CLEANING APPARATUS AND ULTRASONIC CLEANING METHOD - An ultrasonic cleaning apparatus having at least a cleaning an ultrasonic wave transmitting tank a vibrating plate placed at a bottom portion of the ultrasonic wave transmitting tank, the vibrating plate superposing the ultrasonic waves on the transmitting water with a transducer; and a holding jig for holding the object to be cleaned in the cleaning tank, the apparatus in which the object to be cleaned is ultrasonically cleaned by immersing the object to be cleaned held with the holding jig in the cleaning liquid accommodated in the cleaning tank, putting the cleaning tank into the transmitting water accommodated in the ultrasonic wave transmitting tank, and transmitting the ultrasonic waves superposed with the vibrating plate to the cleaning tank through the transmitting water, the apparatus comprising a transmitting tank oscillating mechanism for oscillating the ultrasonic wave transmitting tank in a horizontal plane.11-25-2010
20100186767METHOD FOR REMOVING OIL FROM OIL-CONTAMINATED MATERIAL - A method for removing oil from oil-contaminated material comprising the steps of: a) reducing the particle size of oil-contaminated material using shearing means (07-29-2010
20120145184SELF-CLEANING CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CLEANING METHOD THEREOF - A self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. Conductors supply a constant current to a catalytic body within a reaction chamber from a heating power supply. Terminals of the heating power supply are electrically insulated from the reaction chamber. A cleaning gas containing halogen elements is introduced into the evacuated reaction chamber. The catalytic body is heated by the heating power supply. An active species generated by this heating reacts with an adhering film adhered to the interior of the reaction chamber, which is removed. During this removal, a DC bias voltage with appropriate polarity and appropriate value is applied from a constant-voltage power supply to the conductor of the heating power supply.06-14-2012
20110108056CLEANING METHOD FOR TRANSFER ARM, CLEANING METHOD FOR SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS - There is provided a substrate processing apparatus cleaning method for removing contaminants adhered on a transfer arm. The cleaning method for the transfer arm that transfers a substrate and has an electrostatic chuck includes a voltage applying process for applying, when electrically charged contaminants are adhered on the transfer arm and the substrate is not mounted on the transfer arm, a voltage of the same polarity as that of the electrically charged contaminants to each electrode of the electrostatic chuck, to thereby remove the contaminants adhered on the transfer arm.05-12-2011
20090139539METHOD AND APPARATUS FOR CLEANING - A method and apparatus for cleaning have been disclosed.06-04-2009
20090065024Apparatus and Method for Indirect Surface Cleaning - Methods for cleaning a surface of a substrate and for increasing the useable lifetime of a photomask substrate are provided. In one method, a substrate has at least one radiation-produced particle disposed thereon, and a laser that has a wavelength that substantially coincides with a high absorption coefficient of the substrate is directed towards the substrate. A thermal increase is generated in the substrate, and the radiation-produced particle is removed from the substrate by transferring thermal energy from the substrate to the radiation-produced particle until the radiation-produced particle decomposes.03-12-2009
20090065023Microwave assisted post-FPI cleaning method - A method for cleaning a gas turbine engine component following a fluorescent penetrant inspection process comprises immersing the component in a cleaning solution and heating the component in a microwave oven while immersed in the cleaning solution for a period of time.03-12-2009
20100132735CLEANING APPLIANCE WITH SYSTEM FOR GERM REDUCTION USING MICROWAVES - A cleaning appliance for cleaning objects to be cleaned is provided. The cleaning appliance comprises a cleaning region for cleaning the object to be cleaned using a cleaning liquid. The cleaning appliance also comprises a microwave disinfecting device having a microwave source for generating microwave radiation. The microwave disinfecting device is used to sanitize objects, which are received in the cleaning appliance in order to be cleaned.06-03-2010
20110079240ULTRASONIC CLEANING APPARATUS, ULTRASONIC CLEANING METHOD, AND STORAGE MEDIUM STORING COMPUTER PROGRAM FOR EXECUTING ULTRASONIC CLEANING METHOD - An ultrasonic cleaning apparatus including: a cleaning tank for storing a cleaning liquid; an object-to-be-processed holder for insertion into the cleaning tank, the holder holding an object to be processed and immersing the object into the cleaning liquid; a vibrator disposed on a bottom part of the cleaning tank; and an ultrasonic oscillator configured to make the vibrator ultrasonically vibrate. In the cleaning tank, a lateral holding member configured to hold the object is disposed. The holder is configured to be laterally moved by a driving apparatus. The control device is configured to control the driving apparatus such that the holder is laterally moved after the object has been held by the lateral holding member, and the control device is configured to control the ultrasonic oscillator such that the vibrator is made to ultrasonically vibrate so that the ultrasonic vibration from the vibrator is propagated to the object.04-07-2011
20110209724METHOD AND DEVICE FOR TREATING CONTAINERS - The invention relates to a method and to a device for treating containers relating especially to cleaning plastic bottles (09-01-2011
20090038636Cleaning method - A method of cleaning an imprint template is disclosed. The method includes exposing the imprint template to a reductive fluid.02-12-2009
20100059083Reticle Cleaning Device - A reticle cleaning device, comprising: a chamber body having a sealed chamber, within which is a reticle stage for carrying a reticle, wherein a frame attached with a protective membrane is included on the reticle; an optical component, for transmitting a light beam to the protective membrane on the reticle and receiving light beam reflected from the protective membrane and outputting a signal to indicate the upward and downward expansion change of protective membrane on the reticle; a pump, for exhausting the air inside the sealed chamber of chamber body to form negative pressure in the sealed chamber for separating contaminants or chemical contaminants on the reticle; and a controller, for receiving the signal from the optical component, wherein when the upward and downward expansion change of the protective membrane on the reticle indicated by the signal exceeds a pre-set value, the controller outputs another signal to terminate the operation of the pump.03-11-2010
20110073134PROCESS FOR REMOVING INK FROM PRINTED SUBSTRATE - A process for removing ink from a printed media substrate. Such process includes the step of providing a media substrate including an ink printed image wherein the ink composition or the media substrate contains photolabile entities. Then the process includes the step of applying UV light on the printed substrate wherein the emitted UV light has a wavelength value which is below the threshold wavelength of the photolabile entities.03-31-2011
20120240956PICKLING METHOD AND PICKLING SYSTEM OF STEEL PLATE - The present invention is a method of pickling of steel plate which contains silicon comprising applying ultrasonic waves of at least two types of frequencies of 28.0 kHz or more to less than 1.0 MHz to an acidic cleaning solution which contains microbubbles and, in that state, dipping the steel plate which contains silicon in that cleaning solution. The present invention is a continuous pickling system of steel plate which contains silicon which is provided with at least a support part which supports the steel plate, a conveyor which makes the steel plate move, and a pickling tank which pickles the steel plate, wherein the pickling tank has means for feeding microbubbles and means for applying ultrasonic waves of at least two types of frequencies of 28.0 kHz or more to less than 1.0 MHz.09-27-2012
20090025749METHOD FOR VERTICAL TRANSFER OF SEMICONDUCTOR SUBSTRATES IN A CLEANING MODULE - A substrate handler is provided. In one embodiment, the substrate handler includes a first and second carriage coupled to a rail. A first robot having at least two grippers is attached to the first carrier. A second robot having at least one gripper is coupled to the second carriage. The first carriage is independently positionable along the rail relative to the second carriage. As each carriage has a separate actuator, the movements of the first and second robot are decoupled, thereby allowing increased throughput. The substrate handler is particularly suitable for using in a planarization system having an integrated substrate cleaner.01-29-2009
20110067726NARROWBAND DE-ICING AND ICE RELEASE SYSTEM AND METHOD - A way of using narrowband irradiation to de-ice or release ice from a surface is provided. The methodology can be applied to a range of different types of de-icing from windshield de-icing to aircraft wing de-icing to releasing ice from the ice tray of an ice making machine. While there are many different specific applications, the concept and methodologies taught remain similar across all of them.03-24-2011
20110061677PRODUCTION METHOD OF HOT-ROLLED STEEL SHEET - The present invention is a method of descaling a steel material which removes scale formed at the time of hot rolling a steel material by spraying jets of high pressure water from a plurality of nozzles on to the surface of the steel material, the method of descaling a steel material comprising giving pulsation of a frequency of 3.0 kHz to 200 kHz by direct vibration by a vibrator or vibration due to resonance to the high pressure water and setting a distance from each nozzle to the steel slab at 50 to 700 mm in range. Due to this, there is provided a method of producing a hot rolled steel material of a sufficiently good quality removing scale from a difficult-to-descale steel slab such as high Si steel without requiring high pressure water of an extremely high discharge pressure and while easing temperature restrictions on the heating furnace.03-17-2011
20120266912Method and Apparatus for Cleaning Semiconductor Substrates - The present invention is related to a method and apparatus for cleaning a substrate, in particular a semiconductor substrate such as a silicon wafer. The substrate is placed in a tank containing a cleaning liquid, at an angle with respect to acoustic waves produced in said liquid. The angle corresponds to the angle of transmission, i.e. the angle at which waves are not reflected off the substrate surface. A damping material is provided in the tank, arranged to absorb substantially all waves thus transmitted through the substrate. A significant improvement in terms of cleaning efficiency is obtained by the method of the invention.10-25-2012
20110048452METHOD AND DEVICE FOR CLEANING AT LEAST ONE OPTICAL COMPONENT - A method of cleaning at least one optical component of at least one irradiation device is described, which device comprises at least one radiation source in a vacuum chamber, which source generates in particular extreme ultraviolet and/or soft X-ray radiation whose rays are guided via the optical component onto a workpiece to be treated, during which said optical component is at least partly polluted because of an inorganic substance introduced by the radiation source.03-03-2011
20110000503ACOUSTIC CLEANING SYSTEM FOR ELECTRONIC COMPONENTS - An apparatus for cleaning electronic packages comprises a tank containing cleaning fluid and a holder above the tank that supports the electronic packages above a top surface of the cleaning fluid with the electronic packages facing the cleaning fluid. Acoustic energy generators are immersed in the cleaning fluid for generating and propagating acoustic energy towards the top surface of the cleaning fluid to create streaming fluid jets projecting upwardly at the top surface to contact and clean the electronic packages supported on the holder.01-06-2011
20100018548SUPERIMPOSITION OF RAPID PERIODIC AND EXTENSIVE POST MULTIPLE SUBSTRATE UV-OZONE CLEAN SEQUENCES FOR HIGH THROUGHPUT AND STABLE SUBSTRATE TO SUBSTRATE PERFORMANCE - A method for cleaning a substrate processing chamber, including processing a batch of substrates within a processing chamber defining one or more processing regions. Processing the batch of substrates may be executed in a sub-routine having various sub-steps including processing a substrate from the batch within the processing chamber, removing the substrate from the processing chamber, introducing ozone into the processing chamber, and exposing the chamber to ultraviolet light for less than one minute. The substrate batch processing sub-steps may be repeated until the last substrate in the batch is processed. After processing the last substrate in the batch, the method includes removing the last substrate from the processing chamber, introducing ozone into the processing chamber; and exposing the processing chamber to ultraviolet light for three to fifteen minutes.01-28-2010
20090250077Apparatus for removing foreign material from substrate and method for removing foreign material from substrate - Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks (10-08-2009
20080295861METHOD AND APPARATUS FOR REDUCING DEPOSITS IN PETROLEUM PIPES - An embodiment of an apparatus for removing deposits from a petroleum flow line may include a pipe capable of being attached to a petroleum flow line. The pipe may have a pipe axis that defines a direction for fluid flow in the petroleum flow line. The apparatus may also include a first and a second field winding circumferentially disposed around the pipe, and an electric wave generator adapted to electrically communicate an electric wave to the first field winding and the second field winding. In response to the electric wave, the first field winding is adapted to produce a first magnetic field having a first magnetic axis and the second field winding is adapted to produce a second magnetic field having a second magnetic axis. The first magnetic axis may be noncollinear with respect to the second magnetic axis, and at least the first magnetic axis may be noncollinear with respect to the pipe axis.12-04-2008
20090126760SYSTEM FOR CLEANING A SURFACE USING CROGENIC AEROSOL AND FLUID REACTANT - An apparatus and method are provided to treat for example a semiconductor wafer substrate wherein a delivery means for heat, a cryogen, and a fluid chemical reactant, is disposed in a chamber in which the substrate is disposed for at least one surface of the substrate to be cleaned in the chamber. The chamber may also consist of a plurality of stations for chemically treating, providing cryogen to the substrate to effect such cleaning and heating. Air is provided in the chamber in a laminar flow substantially parallel to the surface being treated to remove displaced material from the surface and prevent redeposition of the material on the substrate surface.05-21-2009
20080314407Method of Cleaning an Optical Face of a Refractive Element for a Near Field Optical Scanning Apparatus and a Cleaning Device for Cleaning an Optical Face of a Refractive Element for a Near Field Optical Scanning Apparatus - The invention provides a method and a device for cleaning of the optical face of a refractive element for a near field optical scanning apparatus. A magnetically susceptible cleaning material is used to facilitate effective cleaning of the refractive element without damage to the element. The method according to the invention can be combined with known cleaning methods if desired.12-25-2008
20110041871SYSTEM AND METHOD FOR THE SONIC-ASSISTED CLEANING OF SUBSTRATES UTILIZING A SONIC-TREATED LIQUID - The present invention is directed to sonic-assisted systems mid methods of processing of substrates utilizing a sonic-treated liquid. In one embodiment, the sonic-treated liquid can be created by subjecting a desired processing liquid to sonic energy generated by a first sonic energy source prior to being applied So the substrate, The sonic-treated liquid is applied to the substrate where a second source of sonic energy applies sonic energy to the substrate. The sonic-treated liquid can be used as the coupling fluid between the second source of sonic energy and the substrate.02-24-2011
20080210257Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device - In an ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, the ultrasonic wave is applied to the cleaning fluid in such a manner that the ultrasonic wave is turned on and off repeatedly at specific time intervals.09-04-2008
20100319726SUBSTRATE PREPARATION USING MEGASONIC COUPLING FLUID MENISCUS - A method for cleaning a substrate is provided. The method includes receiving the substrate using a carrier that forms a circular opening, the substrate being positioned in the circular opening of the carrier. The holding of the substrate enables exposure of both a first side and a second side of the substrate at a same time. Then, moving the substrate along a direction, and while moving the substrate: (i) applying a chemistry onto the first side of the substrate, where the first side of the substrate having material to be removed; (ii) forming a fluid meniscus against the second side of the substrate at a location that is opposite a location onto which the chemistry is applied; and (iii) applying megasonic energy to the fluid meniscus while the fluid meniscus is applied against the second side. The megasonic energy increases mass transport of the chemistry to enhance removal of the material to be removed from the first side.12-23-2010
20100319725SYSTEMS, METHODS, AND COMPOSITIONS FOR SANITIZING FOOD PRODUCTS - Inventive methods, systems and compositions for sanitizing food products are described. A method for sanitizing food products includes: (a) activating a solution, which includes a solute and a solvent, by using acoustic energy to form a coherent solution including solute clusters, in which each solute cluster is organized such that at least one solute molecule is surrounded by many solvent molecules; and (b) submerging the food products into a tank containing the coherent solution to sanitize the food products.12-23-2010
20110108057METHOD AND APPARATUS FOR REDUCING DEPOSITS IN FLUID CONDUITS - Methods and apparatus for reducing deposits from a petroleum flow line are disclosed. An embodiment of an apparatus for removing deposits from a petroleum flow line may include a pipe capable of being attached to a petroleum flow line. The pipe may have a pipe axis that defines a direction for fluid flow in the petroleum flow line. The apparatus may also include a first and a second field winding circumferentially disposed around the pipe, and an electric wave generator adapted to electrically communicate an electric wave to the first field winding and the second field winding. In response to the electric wave, the first field winding is adapted to produce a first magnetic field having a first magnetic axis and the second field winding is adapted to produce a second magnetic field having a second magnetic axis. The first magnetic axis may be noncollinear with respect to the second magnetic axis, and at least the first magnetic axis may be noncollinear with respect to the pipe axis.05-12-2011
20120031425MODULES AND PROCESSES FOR METAL PARTICLES REMOVAL - Embodiments of the present invention provide an apparatus and methods for processing solar cell devices. In one embodiment, a method removing particles from edge regions of the solar cell device by a cleaning module with a constant loading applied onto a back surface of the solar cell device, wherein the cleaning modules has two or more roller-type brushes disposed at opposed sides of a rotation table located before and/or after a quality assurance stage configured to measure and correct defects in the solar cell device, and transferring the solar cell device into an edge deletion station in which an electromagnetic radiation energy is used to remove materials from a top surface of the solar cell device. The roller-type brushes include non-abrasive bristles configured to remove unwanted material from the periphery region of the solar cell device prior to transferring into the edge delete station.02-09-2012
20110132394Method and Apparatus for an In-Situ Ultraviolet Cleaning Tool - The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the surface. The apparatus includes a gas feed which introduces a gas to aid the chemical bond. Additionally, the gas feed can introduce a gas to remove the particles from the surface.06-09-2011
20110030723APPARATUS AND METHOD FOR CLEANING WELDING TORCHES - The invention relates to a cleaning apparatus (02-10-2011
20120145182ACOUSTIC CLEANING DEVICE WITH VARIABLE LENGTH TO COMPENSATE APPLICATION TEMPERATURE - An acoustic cleaning system includes an operating device having an interior portion. An acoustic cleaning device provides for the passage of a sound wave into the interior portion of the operating device. The acoustic cleaning device includes a horn section attached to an elongated section having a linear or non-linear shape. Sound waves are configured to pass from the elongated section to the horn section and into the interior portion of the operating device. The elongated section is removable from the horn section such that the elongated section is interchangeable with an elongated section having a different length, such that the sound waves are configured to have a frequency between 55 Hz to 75 Hz depending on a temperature of the operating device.06-14-2012
20110174332APPARATUS, SYSTEMS AND METHODS FOR REMOVING DEBRIS FROM A SURFACE - Exemplary surface debris removal systems and methods are operable to remove debris from a signal transmitting/receiving surface. An embodiment provides power to, and then removes power from, a conductive memory wire that is secured to a moveable portion of a two-position snap spring. In response to providing the power to the conductive memory wire, a length of the conductive memory wire decreases so that the moveable portion of the two-position snap spring is pulled from an extended position to a retracted position. When power is removed from the conductive memory wire, the moveable portion of the two-position snap spring moves from the retracted position to the extended position. In response to the moving of the moveable portion of the two-position snap spring from the retracted position to the extended position, an energy is generated and transferred to the surface that dislodges the debris from the surface.07-21-2011
20100083980Platen Cleaning Method - A method for cleaning a workpiece support that includes using a workpiece that has been coated on its bottom surface with a suitable material is disclosed. This specially coated workpiece is placed on the support, and some time later, it is removed, taking with it particles from the support. In certain embodiments, the workpiece undergoes an ion implantation process to increase its temperature, and to increase the tackiness of the coating on the bottom surface. The material used to coat the bottom can be of variable types, including photoresists, oxides and deposited glasses.04-08-2010
20100282272METHOD FOR TREATING A TRANSPORT SUPPORT FOR THE CONVEYANCE AND ATMOSPHERIC STORAGE OF SEMICONDUCTOR SUBSTRATES, AND TREATMENT STATION FOR THE IMP LEMENTATION OF SUCH A METHOD - The aim of the invention is to provide a method for the treatment of a transport support (11-11-2010
20100282271METHOD AND APPARATUS FOR IN-LINE PROCESSING AND IMMEDIATELY SEQUENTIAL OR SIMULTANEOUS PROCESSING OF FLAT AND FLEXIBLE SUBSTRATES THROUGH VISCOUS SHEAR IN THIN CROSS SECTION GAPS FOR THE MANUFACTURE OF MICRO-ELECTRONIC CIRCUITS OR DISPLAYS - A method and apparatus for cleaning, drying, coating, baking etching and deposition of surfaces on glass substrate as it transitions thru and between small gaps between hydro-static porous media bearings. Due to the non-contact nature of the device extremely high pressures can be induced upon the work piece through various fluids without damage to the substrate, allowing the system to utilize the viscous nature of fluids to accomplish the desired cleaning, drying, coating, etching or baking. The process also allows for simultaneous and immediately sequential ordering of processes.11-11-2010
20080216863METHODS AND APPARATUS FOR MONITORING THE ROTATION OF A SUBSTRATE DURING CLEANING - Systems, methods, and apparatus for monitoring rotation of a substrate during cleaning are disclosed. The invention may include a substrate cleaner adapted to support and clean a substrate; an optical source adapted to provide a light beam having a path within the substrate cleaner; and an optical sensor positioned along the path so as to receive the light beam from the optical source and adapted to detect an orientation feature on the substrate when the orientation feature traverses the path. The optical sensor includes an array of light detectors. Numerous additional aspects are disclosed.09-11-2008
20100242989METHOD AND APPARATUS FOR REDUCING DEPOSITS IN PETROLEUM PIPES - An embodiment of an apparatus for removing deposits from a petroleum flow line may include a pipe capable of being attached to a petroleum flow line. The pipe may have a pipe axis that defines a direction for fluid flow in the petroleum flow line. The apparatus may also include a first and a second field winding circumferentially disposed around the pipe, and an electric wave generator adapted to electrically communicate an electric wave to the first field winding and the second field winding. In response to the electric wave, the first field winding is adapted to produce a first magnetic field having a first magnetic axis and the second field winding is adapted to produce a second magnetic field having a second magnetic axis. The first magnetic axis may be noncollinear with respect to the second magnetic axis, and at least the first magnetic axis may be noncollinear with respect to the pipe axis.09-30-2010
20110017230Method and System for Processing Abrasive Slurry - Systems and methods are provided for processing abrasive slurry used in cutting operations. The slurry is mixed with a first solvent in a tank. The slurry is vibrated and/or ultrasonically agitated such that abrasive grain contained in the slurry separates from the other components of the slurry and the first solvent. After the abrasive grain has settled to a bottom portion of the container, the other components of the slurry and the first solvent are removed from the tank. The abrasive grain may then be washed with a second solvent. The abrasive grain is then heated and is suitable for reuse in an abrasive slurry.01-27-2011
20100252066Method and apparatus for decontamination of sensitive equipment - Ultrasonic solvent cleaning processes can effectively decontaminate sensitive equipment. The disclosed decontamination liquids meet the following criteria: 10-07-2010
20120145183TRANSFER PICK CLEANING METHOD - A transfer pick provided at a leading end of a transfer arm of a transfer device for transferring a substrate includes a substrate support surface for supporting the substrate thereon; a plurality of contact members protruded from the substrate support surface to contact with the substrate; and a voltage applying unit for charging the contact members with electricity. Further, the transfer pick has a self-cleaning function of removing particles adhered to the contact members by using repulsive force of an electric charge. In addition, a computer readable memory medium storing a computer executable control program, wherein the control program controls a substrate processing apparatus to perform the transfer pick cleaning method.06-14-2012
20090173358MEGASONIC CLEANING WITH CONTROLLED BOUNDARY LAYER THICKNESS AND ASSOCIATED SYSTEMS AND METHODS - Megasonic cleaning systems and methods of using megasonic pressure waves to impart cavitation energy proximate a surface of a microelectronic substrate are disclosed herein. In one embodiment, a megasonic cleaning system includes a process tank for containing a liquid, a support element for carrying a substrate submerged in the liquid, and first and second transducers positioned in the tank. The first transducer is further positioned and/or operated to initiate cavitation events in a bulk portion of the liquid proximate a surface of the substrate. The second transducer is further positioned and/or operated to control an interface of fluid friction between the substrate and the bulk portion of the liquid.07-09-2009
20110100393METHOD OF CLEANING MASK AND MASK CLEANING APPARATUS - The method of cleaning a mask of an embodiment includes irradiating a mask film having a mask pattern on a substrate with an energy radiation and heightening a temperature of the mask film than that of the substrate.05-05-2011
20100269851NUCLEAR DECONTAMINATION DEVICE AND A METHOD OF DECONTAMINATING RADIOACTIVE MATERIALS - This is an efficient nuclear decontamination device using the laser light to remove the radioactive substance from the polluted parts of the radioactive object sample in the nuclear devices and facilities. In the nuclear decontamination device, the laser source (10-28-2010
20100059084CLEANING AND TESTING IONIC CLEANLINESS OF ELECTRONIC ASSEMBLIES - Systems, methods and processes for cleaning and testing electronic assemblies are described. A cleaning and testing apparatus may include a cleaning chamber, a solvent input into the cleaning chamber, a resistivity sensor within the cleaning chamber for sensing resistivity of the solvent; and a solvent output for removing the solvent from the cleaning chamber. The cleaning chamber may receive one or more electronic assemblies. A user may initiate a cleaning cycle, a testing cycle or a cleaning cycle followed by a testing cycle. The one or more electronic assemblies may be contacted with a solvent. Resistivity of the solvent after contact with the electronic assemblies may be measured and compared with an original resistivity of the solvent before contact with the electronic assemblies. The amount of ionic residues on the electronic assemblies may be determined based upon the comparing step.03-11-2010
20120037181CLEANING METHODS FOR IMPROVED PHOTOVOLTAIC MODULE EFFICIENCY - Embodiments of the present invention generally relate to methods for cleaning a substrate prior to a deposition process. The methods generally include multiple cleaning solutions for removing contaminants from a surface of a substrate. The multiple solutions generally have different compositions, and each of the solutions contain one or more additives selected to remove a variety of contaminants. Mechanical agitation may also be utilized to remove contaminants from the surface of a substrate. After cleaning a substrate, a material may be deposited on the substrate surface.02-16-2012
20120305024SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - Provided is a substrate processing apparatus. The substrate processing apparatus includes an index part including a port on which a container containing a substrate is placed and an index robot, a processing part for processing the substrate, and a buffer unit disposed between the processing part and the index part to allow the substrate transferred between the processing part and the index part to be temporarily stayed therein. The processing part includes a glue removal processing module, a substrate cooling processing module, a heat processing module, and a functional water processing module which are disposed along a transfer passage for transferring the substrate.12-06-2012
20110061678Cleaning liquid for lithography and a cleaning method using it for photoexposure devices - Problem: To provide a cleaning liquid for lithography and a cleaning method using it for photoexposure devices. In a process of liquid immersion lithography, the cleaning liquid may efficiently clean the photoexposure device site (especially optical lens member) contaminated with the component released from photoresist and remove the contaminant, and in addition, the waste treatment for the cleaning liquid is easy, the efficiency in substitution with the cleaning liquid for the medium for liquid immersion lithography is high, and the cleaning liquid does not detract from the throughput in semiconductor production.03-17-2011
20090241985High power density ultrasonic fuel cleaning with planar transducers - Provided are a range of ultrasonic cleaning assemblies that include radiating surfaces activated by corresponding arrays of planar transducers configured to increase the power applied to a reduced volume of fluid associated with a fuel assembly, thereby increasing that applied power density for improved cleaning. The individual ultrasonic cleaning assemblies may be arranged in a variety of modules that, in turn, may be combined to increase the length of the cleaning zone and provide variations in the power density applied to improve the cleaning uniformity.10-01-2009
20120055506SUBSTRATE CLEANING METHOD - In a substrate cleaning method for cleaning a substrate with fine patterns having grooves or holes whose representative length is 0.1 mm or less, the substrate is arranged in a space which contains water, such that the substrate faces an acute-angled leading end of a discharge electrode which can be cooled, with a predetermined interval therebetween, with a counter electrode being interposed at a predetermined position between the substrate and the discharge electrode. Then, a predetermined voltage is applied between the discharge electrode and the counter electrode while generating dew condensation in the discharge electrode by cooling the discharge electrode. The substrate is cleaned by generating an aerosol containing water particles having sizes of equal to less than 10 nm in the leading end of the discharge electrode and spraying the aerosol on the substrate.03-08-2012
20120055507METHOD FOR REMOVING GASEOUS OR VAPOROUS STERILANTS FROM A SURFACE - The present invention provides a method and apparatus for removing chemical sterilant molecules from a medium, such as a carrier gas. In one embodiment, the apparatus includes a housing that defines an internal cavity. The housing has an inlet and an outlet fluidly communicating with the internal cavity. An electrode is dimensioned to be received in the internal cavity of the housing. The electrode is made of a material that is chemically active with respect to molecules of a chemical sterilant and conductive to electricity. The electrode is connected to a source of an electrical charge such that an electrical field gradient is formed in a region of space surrounding the electrode. The electrical field gradient is operable to force the chemical sterilant molecule toward the electrode.03-08-2012
20120152275LASER PROBE TIP FIBER CAP CLEANING - In a method of cleaning a fiber cap of a laser probe tip, a glass fiber comprising a cap body having an internal cavity and an opening to the cavity at a proximal end is provided. A particulate collecting member is also provided. An electrical charge is applied to the particulate collecting member. A distal end of the particulate collecting member is then inserted through the opening and into the cavity of the fiber cap. Particles located within the cavity are attracted to the particulate collecting member. The attracted particles attach to the particulate collecting member. The particulate collecting member is then removed from the cavity.06-21-2012
20090133712METHODS FOR CLEANING GENERATOR COILS - A method for cleaning a generator coil, the method including the step of cleaning the generator coil with a vibratory tank cleaning system. The vibratory tank cleaning system may include means for inducing vibrations through a particulate medium. The vibratory tank cleaning system may include a vibratory tank that holds the particulate medium. The means for inducing vibrations through the particulate medium may be an actuator. In addition to the particulate medium, the vibratory tank also may hold water. In other embodiments, the vibratory tank may hold an acidic aqueous solution or a caustic aqueous solution.05-28-2009
20120160264Wet Processing Tool with Site Isolation - Embodiments of the current invention describe a megasonic processing tool. A substrate support is positioned within a housing and is configured to support a substrate. A first liquid container is moveably coupled to the housing within the testing chamber to be positioned on a first location on the substrate and configured to hold a first body of liquid adjacent to the first location on the substrate. A second liquid container is moveably coupled to the housing within the testing chamber to be positioned on a second location on the substrate and configured to hold a second body of liquid adjacent to the second location on the substrate. The second body of liquid is isolated from the first body of liquid. At least one megasonic transducer is coupled to the housing and configured to perform at least one megasonic process on the first body of liquid and the second body of liquid.06-28-2012
20100288301REMOVING CONTAMINANTS FROM AN ELECTROLESS NICKEL PLATED SURFACE - Removing contaminants from an electroless nickel (EN) plated surface. A surface of an EN plated object is washed in a first deionized water to remove a first portion of surface contaminants. The surface is immersed into a chemical solution wash for a pre-determined duration to remove nickel phosphate particles from the surface, wherein the chemical solution wash comprises at least one type of chelating agent dissolved in a solvent. The chemically washed surface is then washed in a second deionized water to remove a second portion of the surface contaminants.11-18-2010
20120167915METHOD FOR REMOVING MICRO-DEBRIS AND DEVICE OF THE SAME - The present invention provides a method for removing micro-debris generated in a laser machining process operated on machined object and device of the same. The machined object is placed on a movable machining platform within a machining range and machined at a particular machining location. By disposing an acoustic wave generator and a reflector part, or by disposing a plurality of acoustic wave generators, at least two standing waves extending across the machining range and two standing wave nodes are generated. The micro-debris generated from the laser machining process is moved away by the standing waves to concentrate at the standing wave nodes, and subsequently removed from the standing wave nodes.07-05-2012
20120247502METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES - To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.10-04-2012
20100012147ARTICLE PROCESSING APPARATUS AND RELATED METHOD - The present invention relates generally to systems and methods of disinfecting and/or decontaminating articles, and more specifically to a system and method of efficiently disinfecting and/or decontaminating articles such as pieces of mail that may have been exposed to diverse biological and/or chemical contaminants.01-21-2010
20100012148MEGASONIC PROCESSING APPARATUS WITH FREQUENCY SWEEPING OF THICKNESS MODE TRANSDUCERS - A megasonic processing apparatus and method has one or more piezoelectric transducers operating in thickness mode at fundamental resonant frequencies of at least 300 KHz. A generator powers the transducers with a variable-frequency driving signal that varies or sweeps throughout a predetermined sweep frequency range. The generator repeatedly vanes or sweeps the frequency of the driving signal through a sweep frequency range that includes the resonant frequencies of all the transducers.01-21-2010
20100269852At-home integrated cleaning and disinfection system and method for dental hardware - An at-home integrated cleaning and disinfection system for dental hardware, for consumer use includes a compact and portable base unit sized for at-home use by a consumer, the base unit including a holding frame and an ultraviolet lamp. The system also includes a cleaning chamber within which dental hardware and a cleaning solution that includes hydrogen peroxide are receivable. The cleaning chamber fits within the holding frame in a manner such that contents of the cleaning chamber are exposed to light emitted by the ultraviolet lamp. A vibration mechanism is positioned so as to cause the cleaning chamber to vibrate while the cleaning chamber is fitted within the holding frame. To clean and disinfect dental hardware, the consumer places dental hardware in the cleaning chamber, fills the cleaning chamber with the cleaning solution, and inserts the cleaning chamber into the holding frame. The vibration mechanism is activated, so as to cause the cleaning chamber to vibrate while the cleaning chamber is fitted within the holding frame, and the ultraviolet lamp is activated, so as to expose contents of the cleaning chamber to light emitted by the ultraviolet lamp.10-28-2010
20120073598METHOD FOR CLEANING THE U-TUBE OF THE MEASUREMENT CELL OF A DENSIMETER - A method for cleaning the U-tube of the measurement cell of a densimeter, the measurement cell including an isothermic enclosure defining a measurement chamber closed by a stopper surrounded by a resilient seal, a U-tube extending inside the measurement chamber for containing a sample, the U-tube secured to the stopper at a base of the U-tube which includes free ends projecting outwardly from the measurement chamber to permit injection of the sample via an injection opening and evacuation of the sample via an evacuation opening, and means for causing the U-tube to vibrate. The method comprises, following a step of analyzing a sample, injecting a rinsing solvent into the injection opening of the U-tube, and subjecting the stopper to ultrasonic waves.03-29-2012
20120073596ULTRASONIC CLEANING METHOD AND APPARATUS - A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.03-29-2012
20090145456Ultrasonic Bubble Reduction System - An inspection system includes an inspection station configured to receive a plurality of ophthalmic devices, and a fluid supply fluidly connected to the inspection station. The fluid supply contains a working fluid. The system also includes an ultrasonic degassing assembly configured to remove at least one bubble carried by the plurality of ophthalmic devices upstream of a packaging station.06-11-2009
20120255575Dissolving Microwave Cleaner - A product and process for cleaning the interior surfaces of a microwave oven. Specifically, using a phosphate free dissolving tablet as an efficient and effective product for the removal of debris, dirt, film, and/or buildup from surfaces within the interior of the microwave oven10-11-2012
20090020135COMBINED CLEANER APPARATUS, SYSTEM, AND METHOD OF USE THEREOF - The present invention relates to a combined cleaner apparatus, a combined cleaner method, and a cleaner system. The combined cleaner apparatus includes a housing element, said housing element having a first housing element portion; a material sprayer and a material dispenser, wherein the material sprayer and the material dispenser are communicably associated to said first housing element portion; at least one material providing body, wherein the at least one of the material sprayer and the material dispenser is in communication with the at least one material providing body.01-22-2009
20120227761CLEANING APPARATUS AND METHOD, AND MONITORING THEREOF - An apparatus for cleaning a surface, the apparatus including a body defining a chamber, an inlet for liquid flow into the chamber, an outlet for liquid flow from the chamber, a nozzle connected to the outlet for generating an output flow of liquid for cleaning a surface, an acoustic transducer associated with the body to introduce acoustic energy into the liquid within the chamber whereby the acoustic energy is present in the liquid flowing out of the nozzle, and a gas bubble generator for generating gas bubbles within the liquid flowing out of the nozzle.09-13-2012
20100326464ACOUSTIC ENERGY SYSTEM, METHOD AND APPARATUS FOR PROCESSING FLAT ARTICLES - A system, apparatus and method for processing flat articles with acoustical energy. The inventive system, apparatus and method can remove particles from both sides of a wafer more efficiently and effectively. In one aspect, the invention is a system and/or method for processing flat articles wherein a liquid is applied to both major surfaces of the flat article. A first transducer assembly is positioned adjacent to a first of the major surfaces of the flat article and a second member is positioned adjacent to a second of the major surfaces. The first transducer assembly generates and transmits acoustical energy to the first major surface of the flat article while the second member either: (1) reflects the acoustical energy generated by the first transducer assembly back to the second major surface of the flat article; and/or (2) generates and transmits acoustical energy to the second major surface of the flat article.12-30-2010
20110120494DUST REMOVING DEVICE AND DUST REMOVING METHOD - In a piezoelectric device, a first electrode and a second electrode are disposed to be opposed to each other on plate surfaces of the piezoelectric device, a first electrode plane of the piezoelectric device is fixedly bonded to a plate surface of a vibrating plate, a piezoelectric material forming the piezoelectric device is polarized in a direction parallel to the first electrode plane, the piezoelectric device is fixed to a base through a second electrode plane of the piezoelectric device, and the piezoelectric device generates a thickness-shear vibration with the fixed second electrode plane being a reference plane. The piezoelectric vibration generated by the piezoelectric device generates a flexural vibration in the vibrating plate, to thereby remove dust adhering to a surface of the vibrating plate.05-26-2011
20120260937METHOD AND DEVICE FOR CLEANING A SURFACE - A device for cleaning a surface of a component includes a high voltage source having a cathode configured to be electrically connected with the surface of the component. An ionization electrode includes at least one individual electrode configured to be electrically connected with an anode of the high voltage source. A movable carriage moves the ionization electrode relative to the surface of the component so that an electric field generated between the ionization electrode and the surface of the component is also moved relative to the surface of the component.10-18-2012
20120260936OXIDATIVE CLEANING METHOD AND APPARATUS FOR ELECTRON MICROSCOPES USING UV EXCITATION IN AN OXYGEN RADICAL SOURCE - An improved method and apparatus for the production of oxygen radicals that may be used for cleaning portions high vacuum instruments. The apparatus comprises a VUV vacuum ultraviolet light source or lamp placed in an irradiation chamber for the photo disassociation of oxygen in communication with the main chamber on a specimen chamber port or inside the specimen chamber. Air or other oxygen-containing gas is admitted to the irradiation chamber for photo disassociation. The VUV source radiates UV wavelengths below 193 nm that are used to disassociate oxygen in the gas to create the oxygen radicals and the pressure is held high enough for complete absorption of the light. The oxygen radicals are differentially pumped into main chamber at pressure below 100 milliTorr to prevent recombination to clean hydrocarbons from the surfaces instrument by oxidation to volatile oxide gases. The oxide gases are then removed by the vacuum pump.10-18-2012
20120080051Particle Removal Method Using An Aqueous Polyphosphate Solution - A method and cleaning solution for cleaning electronic substrates, such as a semiconductor wafers, hard disks, photomasks or imprint molds. The method comprises the steps of contacting a surface of the substrate with a cleaning solution comprised of a polyphosphate, and then removing the cleaning solution from the surface. Additional optional steps include applying acoustic energy to the cleaning solution while the cleaning solution is in contact with the surface, and removing the cleaning solution from the surface by rinsing the surface with a rinsing solution with or without the application of acoustic energy. The cleaning solution comprises a polyphosphate, such as any of the water soluble polyphosphates. Depending on the application, the cleaning solution may also comprise a base and/or a quantity of suspended particles. Complexing agents, amines, biocides, surfactants and/or other substances, may also be added to the cleaning solution.04-05-2012
20100229889SYSTEM AND METHOD OF SOLID INK REMOVAL FOR SUBSTRATE RE-USE - A system for removing ink from a substrate. The system includes an ink separator configured to separate the ink from the substrate; and a substrate conveyor configured to provide the substrate to the ink separator. Accordingly, the ink can be removed from the substrate such that the substrate can be re-used.09-16-2010
20110297183ACTIVE BARRIER TO FOREIGN PARTICLE DEPOSITION ON A DEVICE SURFACE VIA VIBRATIONS - To prevent foreign particles from adhering to an external surface of an electronic device and adversely affecting a user's enjoyment of the device, and to remove adhered foreign particles, a source of mechanical waves can be incorporated within the device. The source can provide mechanical waves tuned to prevent foreign particles from adhering, or to remove foreign particles adhered to the external surface of the device, for example by increasing the contact angle between the foreign particles and the outer component. In some cases, the electronic device can dynamically tune, modify, or adjust emitted waves to direct foreign particles towards particular regions of the device, or to provide waves better adapted at removing different types of particles. In some embodiments, the electronic device can include a reservoir for receiving and holding foreign particles until they are removed from the device.12-08-2011
20120298132SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD, AND SUBSTRATE PROCESSING APPARATUS - A substrate cleaning apparatus is capable of cleaning an entire periphery of a substrate end portion at a time by simple control without polishing the end portion and without generating plasma. The substrate cleaning apparatus has a mounting table 11-29-2012
20100206326METHODS FOR REMOVING CONTAMINANT MATTER FROM A POROUS MATERIAL - Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include a radiation device configured to emit electromagnetic radiation toward a surface of a structure, and at least one spray device configured to apply a capture material onto the surface of the structure. Polymer materials that can be used in such methods and systems include polyphosphazine-based polymer materials having polyphosphazine backbone segments and side chain groups that include selected functional groups. The selected functional groups may include iminos, oximes, carboxylates, sulfonates, β-diketones, phosphine sulfides, phosphates, phosphites, phosphonates, phosphinates, phosphine oxides, monothio phosphinic acids, and dithio phosphinic acids.08-19-2010
20080251099METHOD FOR REMOVING SMEAR AND MAGNETIC RECORDING/REPRODUCING APPARATUS WITH FUNCTION OF REMOVING SMEAR - Provided is a smear-removing method that can remove smear of a manufactured thin-film magnetic head. The method is performed to a thin-film magnetic head including an MR effect element for reading data having two electrode layers sandwiching an MR effect multilayer as a magneto-sensitive portion therebetween. The method comprises the step of applying a stress voltage less than a breaking voltage of the MR effect element between the two electrode layers to burn off smear. In the method, it is preferable that the stress voltage is applied while an electric resistance or an output voltage of the MR effect element is measured, and the stress voltage is increased until the value of the electric resistance or the output voltage reaches an upper limit specified value specified from a value of an electric resistance or an output voltage in a normal case where smear is not present.10-16-2008
20080236613APPARATUS AND METHOD FOR REMOVING DUST FROM OPTICAL LENSES - An exemplary dust removing apparatus applicable for removing dust or dirt from a surface of an optical lens is provided. The dust removing apparatus includes an ultrasonic oscillation device, at least a dust removing device, and a tray. The ultrasonic oscillation device is configured for causing an ultrasonic vibration of the optical lens so as to weaken an adhesive force between the optical lens and the dust on the surface thereof. The dust removing device is configured for removing the dust from the surface of the optical lens. The tray is disposed on the ultrasonic oscillation device and located between the ultrasonic oscillation device and the dust removing device. The tray is configured for supporting the optical lens. A dust removing method is also provided.10-02-2008
20080230088 METHOD AND SYSTEM FOR WASHING A SEDIMENTATION DEVICE IN A WATER TREATMENT SYSTEM USING ULTRASONIC - This invention discloses a method and system for washing a sedimentation device in a water treatment system using ultrasonic. The system includes an ultrasonic transmitting device for transmitting the ultrasonic of a predetermined power and transmitting frequency to the sedimentation device. The system may further include a carrying device positioned inside or outside of the water treatment system for moving the ultrasonic transmitting device over the sedimentation device. The carrying device may include an operation track, a moving car body erected over the operation track, a driving device, and a car body position detection and control device. The carrying device drives the ultrasonic transmitting device to perform a reciprocating scanning movement above the sedimentation device so that the ultrasonic is transmitted substantively evenly to the surface of an inclined tube or a corrugated plate. The effects of the invention are greatly better than that of manual washing with high pressure water. The consumption of water, treatment reagents and manpower can be decreased, thereby decreasing effectively the cost of water production.09-25-2008
20080264441METHOD FOR REMOVING RESIDUALS FROM PHOTOMASK - Methods for removing adhesive from a photomask after a pellicle has been removed from the photomask are herein disclosed. In some embodiments, after a pellicle is removed from a photomask, adhesive residue remaining on the photomask is subjected to removal by an energy source, such as an excimer laser. The excimer laser may be in close proximity to a surface of the photomask which contains the adhesive residue. In some embodiments, removal of the photomask may be followed by a physical cleaning process such as megasonic cleaning or jet nozzle cleaning to remove any residual adhesive left behind.10-30-2008
20130133688WAFER DEBONDING AND CLEANING APPARATUS AND METHOD OF USE - This description relates to a wafer debonding and cleaning apparatus including an automatic wafer handling module. The automatic wafer handling module loads a semiconductor wafer into a wafer debonding module for a debonding process. The automatic wafer handling module removes the semiconductor wafer from the debonding module and loads the semiconductor wafer into a wafer cleaning module for a cleaning process.05-30-2013
20130092185VACUUM EXHAUST METHOD AND A SUBSTRATE PROCESSING APPARATUS THEREFOR - A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member.04-18-2013
20080202550Transmission of Ultrasonic Energy into Pressurized Fluids - Ultrasonic probe comprising an elongate body having a first end and a second end, an ultrasonic transducer attached to the probe at or adjacent the first end, and an enlarged support section intermediate the ultrasonic transducer and the second end, wherein the enlarged support section has an equivalent diameter greater than an equivalent diameter of the body at any location between the enlarged support section and the ultrasonic transducer. The probe may be used to introduce ultrasonic energy into ultrasonic cleaning systems.08-28-2008
20110209723Methods Of Treating Clothing And Textiles And Articles Treated Thereby - Articles such as clothing, textiles and accessories are exposed to selected frequencies from a frequency generator for selected periods of time. When the treated articles are worn or otherwise located in close proximity to a person or animal, they have been found to increase performance such as balance, flexibility, strength, endurance and focus, e.g., in workers, athletes, patients, and other types of people.09-01-2011
20130146085GLASS SUBSTRATE CLEANING APPARATUS AND CLEANING METHOD - The invention relates to a glass substrate cleaning apparatus and cleaning method. The glass substrate cleaning apparatus of the present invention includes a cleaning trough and first frequency generators for transmitting ultrasonic waves of a first frequency and second frequency generators for transmitting ultrasonic waves of a second frequency disposed at two sides of the cleaning trough. In the present invention, a cost is reduced and a good cleaning effect is reached by using the ultrasonic waves of different frequencies to clean a glass substrate.06-13-2013
20130146084SYSTEM AND METHOD FOR REMOVING OBJECTS FROM SURFACES - A system for removing objects from a surface is disclosed. The system may include at least one sensor, a controller, and at least one vibration motor. The sensor is configured to detect an object on the surface and to generate a signal indicative of the object characteristics. The controller may be operatively coupled to the sensor. The controller can receive the generated signal indicative of the object characteristics, and then determine a desired frequency and amplitude of vibration to apply to the surface based on the object characteristics. At least one vibration motor may be in communication with the controller and configured to apply the desired frequency and amplitude of vibration to the surface.06-13-2013
20080196741Washing device and its work conveying method - The present invention resides in a washing device constructed by a conveyer of a carrying-in side arranged in a frame, a reservoir lower portion having plural rails for holding the work and an ultrasonic generator arranged in this frame, each reservoir upper portion united with this reservoir lower portion, a raising-lowering device for raising and lowering each reservoir upper portion, an arm mechanism for work conveyance, a moving device for controlling advancing and retreating movements of the arm mechanism, a movable device for controlling a swinging return of the arm mechanism, and a conveyer of a carrying-out side for conveying a processed work. The conveyer and the rail of each reservoir lower portion are approximately arranged on the same face. The work is horizontally moved through this conveyer and the rail and is washed and dried by utilizing the union of each reservoir lower portion and each reservoir upper portion. Accordingly, the work is simplified and made at high speed and is facilitated by performing the washing, the processing and the movement in the horizontal movement. A dividing type using the reservoir lower-upper portion is used, and ultrasonic washing is performed by supplying a fluid to the reservoir and the function of the ultrasonic device is enlarged.08-21-2008
20130133689Side Edge Cleaning Methods and Apparatus for Thin Film Photovoltaic Devices - Methods for cleaning a side edge of a thin film photovoltaic substrate utilizing a laser are provided. The method can include transporting the substrate in a machine direction to move the substrate past a first laser source, and focusing a first laser beam generated by the first laser source onto the side edge of the substrate such that the laser beam removes the thin film present on the side edge of the substrate. An apparatus is also generally provided for cleaning a first side edge and a second side edge of a thin film photovoltaic substrate.05-30-2013
20100313907Method and Apparatus for Contamination Removal Using Magnetic Particles - Methods and apparatus are provided for cleaning a substrate (e.g., wafer) in the fabrication of semiconductor devices utilizing a composition of magnetic particles dispersed within a base fluid to remove contaminants from the surface of the substrate.12-16-2010
20130152964SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND PROGRAM STORAGE MEDIUM - The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in a cleaning tank 06-20-2013
20090000639Method for Energy Coupling Especially Useful for Disinfecting, and Various Systems Using It - Method and system are disclosed for coupling energy from at least on energy source, e.g. UV light source, ultrasonic transducer, or combination thereof, to a target site, e.g. hazardous bacteria, through a streaming liquid, e.g. water. The bacteria toward which energy is to be coupled could be present in the water stream itself and/or on a surface toward which the water stream is to be launched at the end of its flow. Accordingly, in-line aseptic filling is provided, which can fill and simultaneously disinfect a container. According to another embodiment where the water is used for washing, in-line aseptic washing device is provided. A variety of other embodiments is disclosed as well.01-01-2009
20130118523METHODS AND APPARATUSES FOR CLEANING AT LEAST ONE SURFACE OF AN ION SOURCE - The present invention is concerned with methods and apparatus for cleaning the surface of an ion source in a mass spectrometer, for example an electrode of a MALDI ion source. The method includes directing UV light onto the surface to desorb contaminant material. The UV light source can be a laser and a moving reflecting surface can be used to direct the light on to the surface.05-16-2013
20110308543METHOD FOR CLEANING POROUS METALLIC FILTERS USING A STEAM-ULTRASONIC TECHNIQUE - A method of cleaning plugged or dirty porous metallic filter elements to regain filter activity, comprising the steps of: steaming a filter element for a first period of time; submerging the filter element in a first solution; and exposing the first solution to ultrasound waves for a second period of time.12-22-2011
20130186428Method and Apparatus for Cleaning of Laparoscopic Surgical Instruments - The invention is a method and apparatus for cleaning and disinfecting laparoscopic surgical instruments. The method comprises the introduction into the interior channels of the instruments of cleaning fluid heated at a predetermined temperature, and activated of the fluid by the introduction of sonic energy into the fluid at varying frequencies. The apparatus includes a unitary cleaning enclosure containing receptacles for holding the laparoscopic instruments in a bath, and for directing cleaning fluid from the bath through the interior of the instruments while providing a source of ultrasonic mechanical energy to the cleaning fluid both inside and outside the laparoscopic instruments.07-25-2013
20130186429METHOD OF CLEANING MEDICAL INSTRUMENT AND APPARATUS THEREFOR - A method of cleaning a medical instrument, in which a medical instrument to which a body fluid adheres is subjected to ultrasonic cleaning in a cleaning solution in which chlorine dioxide is dissolved, and a cleaning apparatus including a cleaning tank constructed to be capable of ultrasonic cleaning, a mixing portion for generating the cleaning solution in which chlorine dioxide is dissolved, a first pipe for supplying the cleaning solution to the cleaning tank from the mixing portion, and a second pipe for supplying water to the cleaning tank, and constructed to dilute the cleaning solution supplied from the mixing portion through the first pipe with water supplied through the second pipe such that a prescribed concentration of chlorine dioxide dissolved in the cleaning solution is attained in the cleaning tank are provided.07-25-2013
20130192627CLEANING METHOD - A cleaning method for cleaning an object includes preparing a cleaning liquid. A dissolved nitrogen concentration in the cleaning liquid is adjusted based on a size of a foreign substance to be removed from the object with a highest removal efficiency. The object is dipped in the cleaning liquid while irradiating the cleaning liquid with ultrasonic waves.08-01-2013
20130192628CLEANING APPARATUS, EQUIPMENT, AND METHOD - A cleaning apparatus for cleaning an object includes a cleaning tank holding a cleaning liquid, the object being cleanable by the cleaning liquid. A coupling tank holding an intermediate medium is in contact with a portion of the cleaning tank. An ultrasonic wave generation unit is disposed at the coupling tank and configured to ultrasonically vibrate the cleaning liquid via the intermediate medium. A modification unit is configured to modify a difference in sonic velocity between the cleaning liquid and the intermediate medium.08-01-2013
20130192629SUBSTRATE CLEANING CHAMBER AND CLEANING AND CONDITIONING METHODS - A substrate cleaning chamber includes a contoured ceiling electrode having an arcuate surface that faces a substrate support and has a variable cross-sectional thickness to vary the gap size between the arcuate surface and the substrate support to provide a varying plasma density across the substrate support. A dielectric ring for the cleaning chamber comprises a base, a ridge, and a radially inward ledge that covers the peripheral lip of the substrate support. A base shield comprises a circular disc having at least one perimeter wall. Cleaning and conditioning processes for the cleaning chamber are also described.08-01-2013
20120024312Dust Repellent Surface Coating - Provided herein are compositions for coatings that repel dust. The compositions comprise colloidal silica suspended in a low molecular weight alcohol, one or more hard nanoparticles, a fluoride source, and one or more combustible organic compounds. Methods of preparing a coating from the compositions are also provided herein.02-02-2012
20120073597METHOD FOR REMOVING DEPOSITED SLUDGE - Provided is a physical and chemical cleaning method, including introducing nitrogen gas, liquid nitrogen or dry ice into a cleaning solution containing at least one selected from the group consisting of water, monoethanolamine (ETA), dimethylamine (DMA), NH03-29-2012
20130206164DUST REMOVING DEVICE AND DUST REMOVING METHOD - In a piezoelectric device, a first electrode and a second electrode are disposed to be opposed to each other on plate surfaces of the piezoelectric device, a first electrode plane of the piezoelectric device is fixedly bonded to a plate surface of a vibrating plate, a piezoelectric material forming the piezoelectric device is polarized in a direction parallel to the first electrode plane, the piezoelectric device is fixed to a base through a second electrode plane of the piezoelectric device, and the piezoelectric device generates a thickness-shear vibration with the fixed second electrode plane being a reference plane. The piezoelectric vibration generated by the piezoelectric device generates a flexural vibration in the vibrating plate, to thereby remove dust adhering to a surface of the vibrating plate.08-15-2013

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