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WORK HOLDERS, OR HANDLING DEVICES

Subclass of:

118 - Coating apparatus

Patent class list (only not empty are listed)

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Class / Patent application numberDescriptionNumber of patent applications / Date published
118503000 Gripper or clamped work type 9
118502000 Impaling type 2
20100162950Stent Mandrel Fixture and Method for Selectively Coating Surfaces of a Stent - A stent mandrel fixture for supporting a stent during the application of a coating substance is provided. A method supporting a stent during the application of a coating substance is also provided.07-01-2010
20100101491WAFER LIFT PINS SUSPENDED AND SUPPORTED AT UNDERSIDE OF SUSCEPTOR - A wafer lift pin structure for lifting a semiconductor wafer includes: a through-hole penetrating through a susceptor; an upper guide fixedly fitted inside the through-hole, a lift pin constituted by an upper part, a middle part, and a lower part and inserted in the upper guide; and a lower guide attached to the underside surface of the susceptor, wherein the lift pin is suspended from the lower guide at the middle part of the lift pin at the lower position. The middle part has a diameter greater than that of the upper part and that of the lower part, and has a weight heavier than that of the upper part and that of the lower part.04-29-2010
118501000 Combined with drip pans or surplus collection 1
20090188429Ring for holding a lens for dip treatment thereof - The ring comprises a hoop (07-30-2009
Entries
DocumentTitleDate
20130042807Media Conveyance Device, Printing Device, and Media Conveyance Method - A conveyance device holds a sheet medium in a roll and includes a drive roller that feeds the sheet medium from the roll to a conveyance path; and a roll rotating unit that rotates the roll forward to convey the sheet medium toward the drive roller and in reverse to rewind the sheet medium and that has multiple drive modes with different speeds of rotation. A control unit controls driving the drive roller and the roll rotating unit, such that, when starting a reverse conveyance operation that rewinds the sheet medium, the control unit selects the drive mode to be used in the reverse conveyance operation based on a first conveyance distance, which is the distance the sheet medium is to be conveyed in the reverse conveyance operation, and the diameter of the roll stored as roll diameter information and as calculated after an immediately previous reverse conveyance operation.02-21-2013
20090194022Semiconductor processing - Semiconductor processing and equipment are disclosed. The semiconductor equipment and processing provide semiconductor wafers with reduced defects.08-06-2009
20080257259Method and Device for Coating the Junction Area Between at Least Two Elongated Elements, in Particular Between Electric Cables - A method of coating the junction area between elongated elements, in particular between electric cables. This method includes the steps of: arranging a rigid tubular support having two axially separable tubular halves; mounting an elastic tubular sleeve in an elastically radially expanded condition on an outer surface of the support; interposing a lubricating material between the support and sleeve; arranging a circumferentially continuous sealing element between the halves to prevent the lubricant from percolating between the halves; positioning the support around the junction area; and moving the halves apart from each other to enable the sleeve to collapse on the junction area. A device for coating the junction area between elongated elements and a method of making the device and a joint for electric cables.10-23-2008
20100116203Mechanical device for transmitting torque to generate multi-degree-of-freedom rotation - A mechanical device for transmitting a torque to generate a multi-degree-of-freedom rotation is provided. The mechanical device is used for clipping the object body during a vacuum sputtering process. The effect of homogeneous film coating is achievable by multi-degree-of-freedom rotation of the specimen when performing a surface treatment, particularly for a cylinder specimen.05-13-2010
20130074767THIN FILM FORMING APPARATUS - Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions.03-28-2013
20100071618FILM COATING HOLDER AND FILM COATING DEVICE USING SAME - A film coating device for coating a flexible substrate includes a housing and a film coating holder for holding the flexible substrate. The housing defines a chamber, and the film coating holder is received in the chamber. The film coating holder includes a motor, a driving roller, and a driven roller. The driving roller is rotatable by a motor relative to the housing. The driven roller is substantially parallel to the driving roller. The driven roller is rotatable together with the driving roller by transmission of the flexible substrate.03-25-2010
20130036970Substrate Processing Apparatus - A substrate processing apparatus for deposition on a water seated therein is disclosed. The substrate processing apparatus includes a chamber having a reaction space, a lid provided on the chamber to selectively open or close the reaction space, a main disc accommodated in the chamber, on which at least one wafer is placed, and a drive device including a drive shaft to selectively rotate the main disc and a drive unit to drive the drive shaft. The drive shaft is separably coupled to the main disc to transmit drive force. When the lid is opened to expose the reaction space, the main disc is separated from the drive shaft and is discharged to the outside of the chamber in a state in which the wafer is placed thereon.02-14-2013
20100107976Holder for Large Components with Improved Spray Protection - A holder for a component providing spray protection is provided. The insertion of a rod in the side face of the component, the side face is arranged within a housing of the holder, has the additional effect of providing spray protection. The rod rests on an inner face of the holder in one aspect.05-06-2010
20100107975APPARATUS FOR TRANSFERRING WAFER CARRIER AND SYSTEM FOR FABRICATING SEMICONDUCTOR HAVING THE SAME - Provided are a wafer carrier transferring apparatus and a semiconductor conductor fabricating system having the wafer carrier transferring apparatus. The wafer carrier transferring apparatus comprises an arm pocket portion supporting a wafer carrier and a pocket end portion detachably coupled to opposite ends of the arm pocket portion.05-06-2010
20100107973SELF-CENTERING SUSCEPTOR RING ASSEMBLY - A self-centering susceptor ring assembly is provided. The susceptor ring assembly includes a susceptor ring support member and a susceptor ring supported on the susceptor ring support member. The susceptor ring support member includes at least three pins extending upwardly relative to the lower inner surface of the reaction chamber. The susceptor ring includes at least three detents formed in a bottom surface to receive the pins from the susceptor ring support member. The detents are configured to allow the pins to slide therewithin while the susceptor ring thermally expands and contracts, wherein the detents are sized and shaped such that as the susceptor ring thermally expands and contracts the gap between the susceptor ring and the susceptor located within the aperture of the susceptor ring remains substantially uniform about the entire circumference of the susceptor, and thereby maintains the same center axis.05-06-2010
20100107974SUBSTRATE HOLDER WITH VARYING DENSITY - A substrate support system comprises a substrate holder for supporting a substrate. The substrate holder comprises an interior portion sized and shaped to extend beneath most or all of a substrate supported on the substrate holder. The substrate holder has mass density that varies, preferably in order to compensate for variations in substrate temperature owing to surface geometry variations of the interior portion, so as to provide a more uniform thermal coupling between the substrate and substrate holder. The substrate holder is preferably configured to be spaced further apart from a substrate at the center than at the outer perimeter.05-06-2010
20090120360Plating Jig - A plating jig can perform the processing of plating wherein a thickness of a plating film formed on each object to be plated becomes even when a plurality of objects to be plated are plated at a time. The plating jig is horizontally disposed, immersed in plating solution, and rotated about a rotational axis. The plating jig includes a plurality of supporting rods and a pair of end plates which support both ends of the supporting rods. The supporting rods are disposed on the circumference of the end plates. A plurality of notches are formed on the supporting rod at regular intervals along the rotational axis.05-14-2009
20100024723SUBSTRATE ALIGNMENT APPARATUS AND SUBSTRATE PROCESSING APPARATUS - A substrate alignment apparatus for aligning a substrate with a reference point, comprises a plurality of columns configured to rotate about rotation axes parallel to respective axial directions thereof, a driving mechanism configured to synchronously rotate the plurality of columns through an identical angle in an identical direction, a detector configured to detect an amount of positional deviation of the substrate from the reference point, and support pins which are located on upper surfaces of the plurality of columns while being spaced apart from respective rotation axes of the plurality of columns, and are configured to support the substrate, wherein the substrate is aligned by synchronously rotating the plurality of columns through the identical angle in the identical direction by the driving mechanism based on the amount of positional deviation detected by the detector.02-04-2010
20090199765HIGH EFFICIENCY ELECTRO-STATIC CHUCKS FOR SEMICONDUCTOR WAFER PROCESSING - The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-purity, thermoplastic member may include a high-purity, polyaryletherketone having an extremely low level of metallic ions present therein. The high-purity, polyaryletherketone has excellent wear resistance, high temperature resistance, plasma resistance, corrosive chemical resistance, electrical stability, and strength as compared to polyimide films used in electrostatic chucks. The present invention also provides a simplified method of manufacturing the high efficiency electrostatic chuck.08-13-2009
20090301394FILM COATING HOLDER - A film coating holder includes a rotating shaft having a first portion and a second portion, a plurality of connecting devices, and a plurality of workpiece holders mounted around the rotating shaft. Each of the workpiece holders includes a relative big-end and a relative small-end. The relative small-end of each workpiece holder is pivotally connected to the first portion of the rotating shaft. The relative big-end of each workpiece holder is pivotally connected to the second portion of the rotating shaft via respective connecting devices.12-10-2009
20120216746System for Treating and Conveying Objects - A system for treating objects transported by at least one transport carriage and immersed into at least one treatment container, in which a treatment medium can be applied. The transport carriage comprises at least one swivel arm connected to the chassis in an articulated manner, on which swivel arm the object can be fastened. A hydraulically operating piston-cylinder unit having a first working chamber is provided to drive the swivel arm and provide weight balancing. The first working chamber is made smaller during the downward motion of the swivel arm and is connected to a first pressure accumulator. The second working chamber of the piston-cylinder unit, made larger during the downward motion of the swivel arm, is connected to a source for pressurized hydraulic fluid and can be drained during the downward motion of the swivel arm. The pressure of the fluid in the accumulator is swivels the swivel arm and object upward if the pressure in the second working chamber is sufficiently low.08-30-2012
20120216745SPIN CHUCK AND APPARATUS HAVING SPIN CHUCK FOR MANUFACTURING PIEZOELECTRIC RESONATOR PIECE - A spin chuck rotating a substrate utilizing a centrifugal force while holding one surface of the substrate with a substrate holding section to apply a film material to another surface of the substrate. The substrate holding section includes a tapered peripheral part having a peripheral edge where a substrate holding surface and a back surface thereof are connected. The other surface of the substrate and the back surface of the substrate holding section smoothly continue with each other with the holding surface of the substrate holding section kept in contact with the other surface of the substrate.08-30-2012
20100089314SUBSTRATE SUPPORT SYSTEM FOR REDUCED AUTODOPING AND BACKSIDE DEPOSITION - A substrate support system comprises a substrate holder having a plurality of passages extending between top and bottom surfaces thereof. The substrate holder supports a peripheral portion of the substrate backside so that a thin gap is formed between the substrate and the substrate holder. A hollow support member provides support to an underside of, and is configured to convey gas upward into one or more of the passages of, the substrate holder. The upwardly conveyed gas flows into the gap between the substrate and the substrate holder. Depending upon the embodiment, the gas then flows either outward and upward around the substrate edge (to inhibit backside deposition of reactant gases above the substrate) or downward through passages of the substrate holder, if any, that do not lead back into the hollow support member (to inhibit autodoping by sweeping out-diffused dopant atoms away from the substrate backside).04-15-2010
20090314201ACCURATE CONVEYANCE SYSTEM USEFUL FOR SCREEN PRINTING - The present invention(s) provide an apparatus and method for processing substrates in a screen printing chamber that can deliver a repeatable and accurate screen printed pattern on one or more processed substrates. In one embodiment, the screen printing chamber is adapted to perform a screen printing process within a portion of a crystalline silicon solar cell production line in which a substrate is patterned with a desired material. In one embodiment, the screen printing chamber is a processing chamber positioned within the Rotary line tool or Softline™ tool available from Baccini S.p.A., which is owned by Applied Materials, Inc. of Santa Clara, Calif.12-24-2009
20110271904ROTATABLE SUPPORT ELEMENTS FOR STENTS - Various embodiments of methods and devices for coating stents are described herein.11-10-2011
20090283035SYSTEM AND METHOD FOR SUPPORTING AN OBJECT DURING APPLICATION OF SURFACE COATING - A system is provided that is capable of supporting an object during application of surface coating that would enable access to multiple surfaces of the object while minimizing the impact on any surface that has not dried. The system provides stable support for the object during the application process and allows the coatings of all surfaces to dry with minimal effect on the coated surface. The system comprises a plurality of support units. Each support unit comprises a base portion and a contact portion. Each base portion is adapted to rest stably upon a work platform and contact portion is adapted to contact an underside of the object during application of surface coating. The plurality of support units together supports the object above the work platform.11-19-2009
20110259267FILM COATING HOLDER - A film coating holder includes a top cover, a plurality of annular parts, and a plurality of connecting pieces. The top cover defines a plurality of first holes for receiving workpieces therein. The plurality of annular parts is stacked on each other with progressively increasing radiuses. Each of the plurality of annular parts defines a plurality of second holes for receiving the workpieces, and the top cover is positioned on the annular part with a minimum radius. The plurality of connecting pieces connects the annular part with the minimum radius to the top cover and connects each two adjacent annular parts together.10-27-2011
20100101490Frame for a device for manufacturing a three-dimensional object and device for manufacturing a three-dimensional object by such a frame - The present invention relates to a frame (04-29-2010
20100116202Modular Chambers for Manufacturing Magnetic Disks - A modular chamber design for manufacturing magnetic disks is provided. The modular chambers are linearly aligned, have a trapezoidal shape, and are inversely oriented. In this inverse orientation, a chamber can be exchanged and/or removed without first having to laterally move the other chambers to create space on each side of the chamber being moved. Because the modular chamber design decreases the amount of time and labor required to exchange or replace chambers in a disk processing line, disk throughput is increased. Thus, the modular chamber design facilitates faster and more efficient chamber exchange/removal.05-13-2010
20090272318Device for supporting a substrate, as well as a method for manufacturing such a device - The invention to a device (11-05-2009
20110168086SUBSTRATE HOLDER MOUNTING DEVICE AND SUBSTRATE HOLDER CONTAINER CHAMBER - A substrate holder mounting device is provided that is compact and has a simple structure. The substrate holder mounting device according to the present invention is provided with: a first and a second mounting mechanisms (07-14-2011
20090277381FILM COATING HOLDER - An exemplary film coating holder includes a main body, a plurality of workpiece holders, and a driving module. The main body includes a plurality of through holes defined therein and a central axis. The main body is capable of rotating around the central axis. Each workpiece holder is arranged in each through hole and pivotally connected with the main body by an axle. A rotating guide groove is defined around each axle. The driving module includes a control unit and a shaft. The control unit inserts the shaft in the rotating guide groove of the workpiece holder. When the main body is rotating around the central axis, the shaft can drive the workpiece holder to turn over by the guiding of the rotating guide groove.11-12-2009
20090283036SHADOW FRAME HAVING ALIGNMENT INSERTS - The present invention generally includes a shadow frame with alignment inserts that may permit the shadow frame to be properly aligned on the susceptor. The shadow frame may have one or more alignment inserts. The alignment inserts may be coupled to a cavity formed in the bottom surface of the shadow frame. The alignment inserts may be shaped to receive an alignment button that may be present on the susceptor. Thus, as the susceptor raises to the processing position and retrieves the shadow frame, the shadow frame may align properly on the susceptor.11-19-2009
20090288596SLIDE DOOR TEMPORARY SETTING JIG FOR VEHICLE PAINTWORK OR INTERIOR WORK - A vehicle slide door temporary setting jig (11-26-2009
20110203520PAN COATING APPARATUS - In a pan coating apparatus (08-25-2011
20080251011Device for Coating, in Particular for Painting Objects, in Particular Vehicle Bodies - The invention relates to a device for coating, in particular, for painting objects, in particular, vehicle bodies, comprising a multi-axis robot supporting an application device. Said robot is secured to a carriage which can be guided in an essentially linear manner along the guide structure. The guide structure comprises a carrier element which extends over the displacement path of the robot and which receives the force. A guide rail is arranged on the top side of the carrier element, said guide rail co-operating with a complementary linear guide of the carriage. A support rail which is arranged on a lateral surface of the carrier element tilts, whereon at least one guide roller of the carriage unrolls. Said support element is embodied as a hollow profile which is strengthened on at least one side by means of a plurality of reinforcing ribs in order to reduce the costs and the weight of the carrier element.10-16-2008
20080276866Support Assembly for Stent Coating - A support assembly for a stent and a method of using the same to coat a stent are provided. The support assembly provides for minimum contact between the stent and the support assembly so as to reduce or eliminate coating defects.11-13-2008
20080276864APPARATUS AND METHOD FOR SUPPORTING, POSITIONING AND ROTATING A SUBSTRATE IN A PROCESSING CHAMBER - An apparatus and method for supporting, positioning and rotating a substrate are provided. In one embodiment, a support assembly for supporting a substrate includes an upper base plate and a lower base plate. The substrate is floated on a thin layer of air over the upper base plate. A positioning assembly includes a plurality of air bearing edge rollers or air flow pockets used to position the substrate in a desired orientation inside above the upper base plate. A plurality of slanted apertures or air flow pockets are configured in the upper base plate for flowing gas therethrough to rotate the substrate to ensure uniform heating during processing.11-13-2008
20080210161GUARD WAFER FOR SEMICONDUCTOR STRUCTURE FABRICATION - An apparatus which allows tightly coupling of the device wafer to the electrostatic chuck of the process chamber after the process chamber is conditioned. The apparatus includes (a) a process chamber; (b) a chuck in the process chamber; (c) a guard wafer placed on and in direct physical contact with the chuck; and (d) a particle restraining layer on essentially all surfaces that are exposed to the ambient inside the process chamber. The particle restraining layer has a thickness in a first direction of at least 500 nm. The first direction is essentially perpendicular to an interfacing surface between the particle restraining layer and the chuck. The guard wafer comprises a material selected from the group consisting of a metal and a semiconductor oxide.09-04-2008
20100126415CONVEYOR AND DEPOSITION APPARATUS, AND MAINTENANCE METHOD THEREOF - A conveyor and a deposition apparatus, and a maintenance method thereof are disclosed. The conveyor includes a frame; a lower support mechanism for supporting a carrier on which is longitudinally mounted a substrate and for transferring the carrier; and an upper support mechanism for supporting the carrier, in which the frame comprises a lower frame and an upper frame, and in which the lower support mechanism is provided on the lower frame and the upper support mechanism is provided on the upper frame, the upper frame and the lower frame being configured to be separately movable. Therefore, with the rotational movement of the upper frame, it is possible to arrange a cathode member in a space formed above the lower frame. This can make the spacing between the deposition treatment passage and the carrier transfer passage small. As a result, it is possible to make an inner court of the deposition apparatus narrow. Therefore, in the conveyor capable of transferring a carrier and in the deposition apparatus including the conveyor and further including a vacuum treatment apparatus and a transfer system, it is possible to make the installation area thereof small and narrow.05-27-2010
20100269751COATING ABLUMINAL SURFACES OF STENTS AND OTHER IMPLANTABLE MEDICAL DEVICES - A sleeve is positioned over a radially-expandable rod assembly and a stent is positioned over the sleeve. A mandrel is inserted into the rod assembly to thereby press the sleeve against the inner surface of the stent and expand the stent. A coating (such as a solvent, a polymer and/or a therapeutic substance) is then applied to the outer (abluminal) surfaces of the stent, by spraying, for example. The sleeve advantageously prevents the coating material from being applied to inner (luminal) surfaces of the stent and also allows the coating material to be efficiently applied to the abluminal surfaces.10-28-2010
20090095215TRANSPORT APPARATUS FOR ELONGATE SUBSTRATES - In a transport device for elongated substrates, especially in hot processes, which includes an essentially rectangular frame, formed by longitudinal and transverse spars connected to each other, in which at least three transverse spars are provided between two longitudinal spars, at least one transverse spar is made from a material, whose heat expansion coefficient differs from the heat expansion coefficient of the material of the other transverse spars or/and at least one transverse spar is connected force-free to at least one transverse support or/and at least one transverse spar is formed from an open profile.04-16-2009
20090025636HIGH PROFILE MINIMUM CONTACT PROCESS KIT FOR HDP-CVD APPLICATION - A process kit cover for chemical vapor deposition processes is disclosed according to one embodiment of the invention. The process kit cover may include a protrusion from the top surface of the process kit cover. The protrusion is adjacent to a wafer facing surface. The protrusion decreases oxide buildup on the process kit cover and the wafer facing surface during repeated deposition processes. The process kit cover may also be in minimal thermal contact at the interface with a lower support structure, such as a ceramic collar or pedestal, according to another embodiment of the invention. Minimal thermal contact may be achieved by placing an insulator between the process kit cover and the lower support structure or by creating a gap or gaps between the process kit cover and the lower support structure. Ambient atmosphere may provide thermal insulating within the gap or gaps.01-29-2009
20080276865Electrostatic Chuck, Manufacturing method thereof and substrate treating apparatus - An electrostatic chuck includes: a mounting surface on which a workpiece is to be mounted, the mounting surface including a polycrystalline structure formed by aerosol deposition, the polycrystalline structure having a protrusion on its surface. At least the protrusion contains yttria (Y11-13-2008
20120067279CONVEYING DEVICE AND DEPOSITION DEVICE USING SAME - A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.03-22-2012
20120103254THIN-FILM FORMATION SYSTEM AND ORGANIC EL DEVICE MANUFACTURING SYSTEM - Provided is thin-film formation system including: a first conveying mechanism to convey a substrate and a deposition mask to a substrate carry-in position; a second conveying mechanism to convey the substrate and the deposition mask aligned by an alignment mechanism placed at the substrate carry-in position; a film formation mechanism to laminate a layer of organic material on the substrate in a film formation interval of the second conveying mechanism; and a third conveying mechanism to convey the substrate and the deposition mask which have passed the film formation interval from a carry-out position, in which at least one of the first conveying mechanism and the third conveying mechanism is placed parallel to the second conveying mechanism.05-03-2012
20110174217SHADOW MASK HELD MAGNETICALLY ON A SUBSTRATE SUPPORT - The invention relates to a device for depositing laterally structured layers on a substrate (07-21-2011
20100212585SUBSTRATE PROCESSING APPARATUS - Disclosed is a substrate processing apparatus for rapidly supplying a substrate from a carrier to a processing block. The carrier of which a wafer has been taken out is transferred from a wafer loading-in unit to an arrangement unit for retraction, a new carrier receiving a non-processed wafer is transferred to the wafer loading-in unit, a substrate holding unit for holding one hundred wafers in a shelf form is prepared when the wafer is supplied from the new carrier to a processing block, five wafers are collectively transferred by a second substrate transfer unit from the carrier to the substrate holding unit by a first substrate transfer unit, and then the wafers are transferred from the substrate holding unit to the processing block one by one. Five wafers are transferred to the substrate holding unit at a time, but the wafers are taken out of the substrate holding unit one by one. Accordingly, it is possible to rapidly supply the wafer without interruption in supplying the wafer to the processing block.08-26-2010
20090183675REACTOR TO FORM SOLAR CELL ABSORBERS - A roll-to-roll or reel-to-reel RTP tool including a reactor having a continuous insert placed in a primary gap of the reactor is provided. The primary gap of the reactor is defined by peripheral reactor walls including a top reactor wall, a bottom reactor wall and side reactor walls. The continuous insert includes a continuous process gap through which a continuous workpiece travels between an entry opening and an exit opening of the insert. An inner space exists between at least one of the insert walls and at least a portion of the peripheral reactor walls that make up the primary gap. At least one gas inlet is connected to the inner space, and at least one exhaust opening connects the process gap as well as the inner space to outside the reactor and carries any gaseous products to outside the process gap and the primary gap of the reactor. Sealable doors or web valves seal the entrance and the exit of the process gap when needed before or after the process, especially when the continuous workpiece stops moving.07-23-2009
20090025637SUBSTRATE TREATMENT APPARATUS - A substrate treatment apparatus of the present invention includes: a holding means for rotatably holding a substrate to be treated; a coating solution supply nozzle for supplying a coating solution onto the front surface of the substrate to be treated held on the holding means; a treatment container with an upper surface open for housing them; an exhaust means for exhausting an atmosphere in the treatment container from the bottom; a multiblade centrifugal fan provided on the inner periphery of the treatment container for flowing airflow on a front surface side of the substrate to the exhaust means; and a controller for controlling the number of rotations of the multiblade centrifugal fan corresponding to the number of rotations of the substrate, wherein the number of rotations of the multiblade centrifugal fan is controlled so that turbulent airflow flowing in a circumferential direction on the front surface of the substrate generated due to the rotation of the substrate is corrected to laminar airflow flowing in a radial direction.01-29-2009
20090064929CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE - Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.03-12-2009
20090064928CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE - Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint. In one embodiment, the cluster tool is adapted to perform a track lithography process in which a substrate is coated with a photosensitive material, is then transferred to a stepper/scanner, which exposes the photosensitive material to some form of radiation to form a pattern in the photosensitive material, which is then removed in a developing process completed in the cluster tool. In track lithography type cluster tools, since the chamber processing times tend to be rather short, and the number of processing steps required to complete a typical track system process is large, a significant portion of the time it takes to process a substrate is taken up by the processes of transferring the substrates in a cluster tool between the various processing chambers. In one embodiment of the cluster tool, the cost of ownership, is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput, and reduces the number of moves a robot has to make to transfer a batch of substrates between the processing chambers, thus reducing wear on the robot and increasing system reliability. In one aspect of the invention, the substrate processing sequence and cluster tool are designed so that the substrate transferring steps performed during the processing sequence are only made to chambers that will perform the next processing step in the processing sequence. Embodiments also provide for a method and apparatus that are used to improve the coater chamber, the developer chamber, the post exposure bake chamber, the chill chamber, and the bake chamber process results. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.03-12-2009
20110067628Device For Blocking Workpieces, Particularly Spectacle Lenses, For The Processing And/Or Coating Thereof - A device for blocking workpieces for the processing and/or coating thereof, has a support surface for positioning the workpiece to be blocked, a blocking station in which the workpiece can be blocked on a blocking piece by a temporarily deformable blocking material, and a transport device which has a retaining head for the workpiece and by which a relative movement can be created between the workpiece being retained at the retaining head, and the support surface and the blocking station. The transport device has at least four position-controlled movement axes, by which to position the workpiece in a defined manner in consideration of the orientation and geometric information relative to a blocking piece located in the blocking station, and can be retained in the defined relative position to the blocking piece during blocking while leaving a blocking material accommodation gap between the workpiece and the blocking piece.03-24-2011
20110048323FILM FORMING DEVICE - There is provided a film-forming device capable of advantageously superimposing and securing a substrate, a weight member, and/or a magnetic body while maintaining the precisely aligned substrate and mask in a superimposed state. The film-forming device is provided with a film-forming mask 03-03-2011
20100058982VERTICAL THERMAL PROCESSING APPARATUS AND SUBSTRATE SUPPORTER - A vertical thermal processing apparatus including: a substrate supporter; a transfer mechanism to transfer substrates between the substrate supporter and a container; and a thermal processing furnace to process substrates that have been loaded thereinto with the substrate supporter. The substrate supporter includes: support columns located at intervals therebetween to surround the substrates, supporting parts for substrate and supporting parts for annular plate provided at the support columns in a tier-like manner, for alternately supporting peripheral parts of the substrates and of annular plates at predetermined intervals therebetween, and annular plates to be supported by the supporting parts for annular plate, when seen from a direction in which the substrates are transferred. Each of the annular plates has an intermediate part having a thickness smaller than thicknesses of the peripheral parts thereof to be supported by the support columns.03-11-2010
20120199063METHOD OF PROCESSING SUBSTRATE HOLDER MATERIAL AS WELL AS SUBSTRATE HOLDER PROCESSED BY SUCH METHOD - A method is provided of processing substrate holder material for a substrate holder on which on a first side of said substrate holder a semiconductor substrate is to be placed for layered deposition of various semiconductor materials on the semiconductor substrate using induction heating. The method includes the operations of determining a first electrical resistivity at at least one measuring position on said substrate holder material, comparing said first electrical resistivity with a second reference electrical resistivity and adapting said substrate holder material in correspondence with said comparison. Also a substrate holder is provided which is processes by such a method.08-09-2012
20110041757Vehicle Collision Repair Zone - Provided is a spray booth that includes a housing and a means for advancing the vehicle through the housing. The means for advancing may include a rail system that extends along the long axis of the housing and is off-set from the center of the short axis of the housing. The spray booth housing includes walls that define an area for locating a vehicle to be painted. The area defined by the walls includes regions for priming a vehicle to be painted, preparing a vehicle to be painted, and distinct painting areas for separately painting the vehicle that is engaged with them means for advancing and for painting parts that are not attached to the vehicle. The spray booth may also include one or more air handling systems for handling air that is flowed through the spray booth during the preparation and paint operations.02-24-2011
20110253042Methods of Processing Semiconductor Substrates, Electrostatic Carriers for Retaining Substrates for Processing, and Assemblies Comprising Electrostatic Carriers Having Substrates Electrostatically Bonded Thereto - A method of processing a substrate includes physically contacting an exposed conductive electrode of an electrostatic carrier with a conductor to electrostatically bond a substrate to the electrostatic carrier. The conductor is removed from physically contacting the exposed conductive electrode. Dielectric material is applied over the conductive electrode. The substrate is treated while it is electrostatically bonded to the electrostatic carrier. In one embodiment, a conductor is forced through dielectric material that is received over a conductive electrode of an electrostatic carrier to physically contact the conductor with the conductive electrode to electrostatically bond a substrate to the electrostatic carrier. After removing the conductor from the dielectric material, the substrate is treated while it is electrostatically bonded to the electrostatic carrier. Electrostatic carriers for retaining substrates for processing, and such assemblies, are also disclosed.10-20-2011
20100251963COATING ZONE WITH INCLINED GUIDE RAILS - In a painting booth (10-07-2010
20110083604WORKPIECE CARRIER - A plurality of discs arranged along a central shaft and having holders uniformly distributed over the circumference, inclined obliquely outwards and intended for workpieces are supported in each case on a ring surrounding the discs. The successive rings form an approximately cylindrical cladding which prevents undesired coating of the discs. The cladding has groups of openings for the holders of a disc which are uniformly distributed over the circumference at the same height and each of which is formed by an upper recess in the ring carrying the disc and an adjacent lower recess of the following ring. Boundary lines between successive rings start in each case somewhat below the narrowest points of the webs separating adjacent openings, so that the lower recesses in each case do not narrow towards the edge of the ring and the upper recesses narrow at most slightly in such a way that the workpiece carrier can be assembled from bottom to top without difficulties.04-14-2011
20110000429FILM COATING APPARATUS - A coating apparatus includes a housing, a number of coating chambers, a first lifting rod, a second lifting rod, and a third lifting rod. The housing includes a bottom wall with an opening defined thereon, a first side wall, and a second side wall opposite to the first side wall. The coating chambers are vertically aligned with each other and received in the housing. Each coating chamber defines an inlet and an outlet at two opposite sides thereof, two inlets of each two adjacent coating chambers faces the first side wall and the second side wall respectively. The first lifting rod and the second lifting rod are disposed adjacent to the second side wall and the first side wall respectively for moving a substrate among the coating chambers. The third lifting rod is disposed between the first lifting rod and the second lifting rod for carrying the substrate into and out of the housing through the opening.01-06-2011
20110179995AUTOMATED FLUID DISPENSER - An automated fluid dispenser for smoothly applying a viscous fluid onto a component is provided. The automated fluid dispenser can have a nozzle with a nozzle tip and a support. The nozzle can be pivotally attached to the support about a pivot axis. In addition, a tension member can be attached to the nozzle, the tension member applying an anti-pivoting force to the nozzle when it pivots about the pivot axis.07-28-2011
20090173278Stage apparatus - To obtain a stage apparatus that can be divided for land transportation and can properly treat a substrate to be treated, the present invention provides a stage apparatus including a substrate holding plane which holds a substrate to be treated W, a pair of guide frames (07-09-2009
20120304924SYSTEM FOR TREATING SURFACES OF OBJECTS - A system for treating surfaces of objects, in particular for painting objects, in particular vehicle body parts, comprising a treatment booth, which defines a treatment space. The objects are conveyed into and back out of the treatment space by means of a conveying device. The conveying device comprises a conveying element, by means of which a first surface having a first retaining device for at least one object and at least one second surface having a second retaining device for at least one object are provided. The first and the second surface are arranged in such a way that the first or the second surface bounds the treatment space at least in some areas depending on the position of the conveying element.12-06-2012
20090283034WAFER HOLDER, MANUFACTURING METHOD THEREOF AND SEMICONDUCTOR MANUFACTURING APPARATUS - A wafer holder is provided that can be used in wafer processes at room temperature or lower and that is particularly suited for use in a CVD apparatus.11-19-2009
20110107964Object Holding Apparatus - An object holding apparatus for holding an object, a portion of which is supposed to be surface treated, the object holding apparatus including: a body to which the object is fixed; a mask for covering a non-treatment portion of the object; and a magnetic fixing member for bringing the mask into close contact with the object by magnetic force. The body includes an engagement member for engaging with the object, thereby positioning the object.05-12-2011
20120042823SUSCEPTOR SUPPORT SYSTEM - The present disclosure is directed to a susceptor support that includes a hub and a plurality of arms extending radially from the hub, where each arm has a terminal end positioned away from the hub. The susceptor support also includes a plurality of elongated rectangular tips formed at the terminal end of each arm, each tip having a length and a width, wherein the length is greater than the width.02-23-2012
20120204791APPARATUS FOR TRANSPORTING STRIP-LIKE MATERIAL - An apparatus for transporting strip-like material, has a treatment roller and at least one transporting or strip-gliding roller. The at least one transporting or strip-guiding roller is arranged upstream or downstream of the treatment roller, and comprises a twisting roller having an axis of rotation which encloses an angle other than 0° in relation to an axis of rotation of the treatment roller. The twisting roller rotates the course taken by the strip-like material in relation to the course defined by the surface of the treatment roller.08-16-2012
20120012053ROTATABLE SUPPORT ELEMENTS FOR STENTS - Various embodiments of methods and devices for coating stents are described herein.01-19-2012
20120055399Paint cart with rotating part support - A paint cart for transporting at least one component, the paint cart has a frame assembly, and at least one support extending upward from the frame assembly; the support is operable for supporting the component. The paint cart also includes a rotary device mounted to the frame assembly, the rotary device is operable for rotating the support and the component as the paint cart moves along a cart path. The paint cart moves through a paint booth located on the cart path, and there is a paint applicator inside the paint booth used for applying primer or paint to the component mounted to the support. The rotary device rotates the component as the paint cart moves along the cart path through the paint booth.03-08-2012
20110017133Automatic Dispensing Machine - An automatic dispensing machine adapted for dosing adhesive to a product includes a base frame having a flat operating platform, at least two positioning apparatuses disposed on the operating platform for securing the product respectively, a sliding support slidably mounted onto the base frame and capable of being driven to slide above the positioning apparatuses, and a storage container vertically slidably mounted onto the sliding support by means of a container stand for storing the adhesive and capable of being driven by the sliding support to suspend over another one of the positioning apparatuses from one of the positioning apparatuses for dosing the adhesive to the product. During the automatic dispensing machine processing the product positioned in the another one positioning apparatus, the former processed product secured on the one positioning apparatus can be simultaneously disassembled therefrom and another product is repositioned to the one positioning apparatus.01-27-2011
20120160162COATING DEVICE - A coating device includes a shell, a plurality of shaft groups, a plurality of first bases, a second base, and a driving device. The shell defines a coating chamber. The shaft groups are parallelly arranged in a first circle and housed in the coating chamber. Each shaft group includes a plurality of holding shafts parallelly arranged in a second circle and configured for holding workpieces. The first bases are housed in the coating chamber and surround the shaft groups. The second base is housed in the coating chamber and surrounded by the shaft groups. The first and second bases are configured for receiving targets. The driving device is configured for driving each holding shaft to spin.06-28-2012
20100050936COATER PLATTER HOMING TOOL - An alignment tool is used to ensure proper alignment of a component on a rotating gear relative to a non-rotating platter. The alignment tool includes a first arm member coupled to a locating feature on the gear, and a second arm member that is coupled to the first arm member such that the second arm member is movable relative to the first arm member. When the first arm member is coupled to the locating feature, the second arm member locates off the platter to verify proper alignment. The second arm member is cannot be fitted to the platter when there is improper alignment.03-04-2010
20120073498METHOD AND DEVICE FOR COATING THE JUNCTION AREA BETWEEN AT LEAST TWO ELONGATED ELEMENTS, IN PARTICULAR BETWEEN ELECTRIC CABLES - A method of coating the junction area between elongated elements, in particular between electric cables. This method includes the steps of: arranging a rigid tubular support having two axially separable tubular halves; mounting an elastic tubular sleeve in an elastically radially expanded condition on an outer surface of the support; interposing a lubricating material between the support and sleeve; arranging a circumferentially continuous sealing element between the halves to prevent the lubricant from percolating between the halves; positioning the support around the junction area; and moving the halves apart from each other to enable the sleeve to collapse on the junction area. A device for coating the junction area between elongated elements and a method of making the device and a joint for electric cables.03-29-2012
20120186517THIN FILM DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THIN FILM DEPOSITION APPARATUS - A thin film deposition apparatus to remove static electricity generated between a substrate and a mask, and a method of manufacturing an organic light-emitting display device using the thin film deposition apparatus.07-26-2012
20120186516ROTARY PAN - Described is a rotary pan (07-26-2012
20120260854COATING SYSTEM - A coating system is provided with a coating robot (10-18-2012
20080302300JIG FOR SURFACE-TREATMENT OF THREAD PORTION OF NUT - Provided is a jig which is used! to perform surface-treatment, for example, such as plating or coating of only a thread portion formed in the inside of at least one nut. The jig includes: two multi-hole plates having one or more nut insertion holes which are penetratively formed therein, wherein a stepped portion is formed at the end of one side of each nut insertion hole, and wherein the two multi-hole plates symmetrically contact each other so that the respective stepped portions of the nut insertion holes are outwardly positioned in the nut insertion holes; an O-ring which is! inserted into each nut insertion hole so as to be stopped by the stepped portion; and coupling units which make the two multi-hole plates contact and fixed to each other.12-11-2008
20120298034LOADING DEVICE FOR COATING PROCESS - A loading device which is used in coating processes includes a base, a loading plate, and a reversing assembly. The base includes an outer frame and a ring-shaped inner frame rotatably positioned on the outer frame. The loading plate defines a number of holes for loading components. The reversing assembly connects the inner frame to the loading plate. The reversing assembly includes two reversing motors and two shafts. The reversing motors are opposite to each other and fixed on the inner frame. The reversing shafts are opposite to each other and positioned in a straight line. One end of each reversing shaft is coupled with a corresponding reversing motor, the other end of each reversing shaft is fixed on the loading plate. The reversing shafts are driven by the reversing motors to reverse the loading plate relative to the inner frame.11-29-2012
20120279443SUBSTRATE SUPPORT - A substrate support for receiving substrates or wafers to be processed and for transporting said substrates or wafers in or through processing installations has universal application, is easily adaptable for specific tasks and is economical in use of material. Within a frame made of longitudinal and transverse supports, a plurality of longitudinal and transverse members are arranged intersecting in a grid-like manner, such that a base grid for directly or indirectly receiving substrates is formed. Both the longitudinal and transverse supports and the longitudinal and transverse members are positively connected to one another.11-08-2012
20120285377PRINTED CIRCUIT BOARD PRODUCTION APPARATUS AND PRINTING MACHINE - Disclosed is a printed circuit board production apparatus which comprises a first working unit, a second working unit, and a control section. The first working unit includes a board conveying section, and a working mechanism section for subjecting the board conveyed to a given working process, wherein the board conveying section and the working mechanism section are configured to be relatively displaceable between a machine-setup position where a gap defined between the board conveying section and the working mechanism section and leading to the second working unit becomes equal to or less than a given value, and a position where the gap becomes greater than the given value. The board conveying section and the working mechanism section are arranged in the machine-setup position by the control section when machine setup for the first working unit is performed during operation of the second working unit.11-15-2012
20120090541WORKPIECE CARRIER AND DEPOSITION DEVICE HAVING SAME - A workpiece carrier includes a first carrier and a second carrier. The first carrier includes a plurality of first posts substantially parallel to each other. Each of the first posts is rotatable about a central axis thereof. The second carrier includes a plurality of second posts substantially parallel to each other. Each of the second posts is rotatable about a central axis thereof. The first carrier surrounds the second carrier therein. The workpiece carrier further includes at least one connecting arm interconnected between the first carrier and the second carrier, such that the first carrier and the second carrier are jointly rotatable about a rotation axis.04-19-2012
20120137970SURFACE TREATMENT DEVICE FOR CYLINDER BARREL - Provided is a device for treating the inner surface of a cylinder barrel. A cover member (06-07-2012
20120240849Painting stand for vehicle body panels - A painting stand for supporting vehicle body panels during the painting operation includes a base moveable upon a plurality of rolling casters and having a vertically extending upright member which in turn supports a generally T-shaped member. The T-shaped member is pivotally joined to the upper end of the vertical upright member and includes a plurality of horizontally disposed telescoping sliders and attachment arms. The upwardly extending portion of the T-shaped member includes a moveable sleeve supporting a further attachment arm. The attachment arms engage the vehicle body panel.09-27-2012
20080196662Film guide for an embossing device - A device for transferring an image-forming layer from a transfer film to a printing sheet, including an applicator unit for applying a coating of glue in the form of an image to the printing sheet; and a coating unit including an impression cylinder for guiding the printed sheet with the coating of glue facing away from the impression cylinder, and a pressure roller for guiding the transfer film with the image-forming layer facing away from the pressure roller. The impression cylinder and the pressure roller form a transfer gap therebetween so that the transfer film and the printing sheet are pressed against each other when guided through the transfer gap so that the image-forming layer remains adhered to the printing sheet in the area of the coating of glue and is lifted off from the transfer film after leaving the transfer gap. A process is also disclosed.08-21-2008
20080196661PLASMA SPRAYED DEPOSITION RING ISOLATOR - A substrate processing chamber component including a deposition ring for protecting exposed portions of a substrate support pedestal, wherein the deposition ring includes a metal portion and a ceramic isolator portion. The ceramic isolator portion may be a plasma coated ceramic isolator coating, and the metal portion may be made of stainless steel. The ceramic isolator portion may be made of a ceramic such as alumina, yttria, aluminum nitride, titania, zirconia, and combinations thereof.08-21-2008
20100307410CHEMICAL LIQUID RECOVERY CUP AND CHEMICAL LIQUID COATING DEVICE - In the present invention, at a coater cup 12-09-2010
20120272895BANDOLEER OF ARTICLE CARRIERS - A bandoleer of article carriers includes a carrier band, and a plurality of carrier racks connected with a bottom edge of the carrier band each by means of a connecting plate and arranged at regular intervals. Each carrier rack shows a substantially inverted-V shape and has a pair of elastic arms extending downward from two ends of a bottom edge of the connecting plate and gradually inclined away from each other. Two distal ends of the elastic arms protrude oppositely to each other to form a pair of hook portions. Upper portions of two opposite side edges of the connecting plate oppositely protrude sideward to form two blocking portions. Lower portions of the two opposite side edges of the connecting plate oppositely protrude sideward and then are bent towards two opposite directions perpendicular to the plane of the connecting plate to form two lying-L shaped resisting portions.11-01-2012
20130199442APPARATUS FOR FLEXIBLE SUBSTRATE POSITION CONTROL - An apparatus (08-08-2013

Patent applications in class WORK HOLDERS, OR HANDLING DEVICES

Patent applications in all subclasses WORK HOLDERS, OR HANDLING DEVICES