Class / Patent application number | Description | Number of patent applications / Date published |
118075000 | COMBINED | 12 |
20080314312 | METHOD AND APPARATUS FOR EXTRUDING A COATING UPON A SUBSTRATE SURFACE - A coating apparatus and method are disclosed that applies a coating to a product in a uniform and controlled manner. The coating apparatus comprises a feeding stage, an optional pre-treatment stage, at least one coating stage and a finishing stage. The coating stage(s) comprise a coating material feeder and a coating device. The coating device includes an aperture conforming to the perimeter of a substrate to be coated in a first and second dimension. As the substrate passes through the aperture, coating material is applied in a uniform and consistent layer ranging from 0.001 inches to 0.250 inches. The coating material also back fills minor surface imperfections and blemishes on the substrate to achieve a consistent finish across the whole area where coating material is applied. The coating device includes first and second shell portions. The first shell portion has a concave surface surrounding the aperture portion. The concave surface allows for coating material to collect prior to deposition upon the surface of the substrate. The second shell has a substantially flat face and a mirror aperture that aligns with the aperture of the first shell. A groove is formed along the perimeter of the aperture to collect coating material for coating the object as it passes through the apertures of both shells. | 12-25-2008 |
20090000544 | Rotatable Device for Holding a Substrate - The invention provides a rotatable and optionally heatable device for holding a flat substrate. The device comprises a supporting means for placing and holding the substrate on a supporting surface, optionally a heater, a means for rotating the supporting means and a means for applying a fluid, e.g. a solvent, onto the side of the substrate facing the supporting surface. The fluid is applied when the supporting device for supporting and holding the substrate is caused to rotate. | 01-01-2009 |
20090165706 | METHOD FOR FORMING A PLURALITY OF METAL LINES IN A SEMICONDUCTOR DEVICE USING DUAL INSULATING LAYER - A method for forming a plurality of metal lines in a semiconductor device including forming first insulating layer patterns on a semiconductor substrate, the first insulating patterns being spaced from each other; depositing a metal layer on and between the first insulating layer patterns; planarizing the metal layer; patterning the planarized metal layer to form the plurality of metal lines between the first insulating layer patterns; and forming a second insulating layer on and between the metal lines. | 07-02-2009 |
20110290178 | COATING DEVICE - Provided is a coating device including: a substrate carrying unit which rotatably holds a substrate while the substrate is upright and is able to dispose the held substrate at a first position and a second position; an application unit which includes a liquid material nozzle ejecting a liquid material to each of first and second surfaces of the substrate disposed at the first position; and a removal unit which includes an accommodation mechanism accommodating a part of the peripheral edge portion of the substrate disposed at the second position and a cleaning liquid ejection mechanism ejecting a cleaning liquid to the peripheral edge portion and removes the liquid material of the peripheral edge portion. | 12-01-2011 |
20120266810 | PLANARIZATION SYSTEM FOR HIGH WAFER TOPOGRAPHY - A system for planarizing a semiconductor device includes a holder component for holding the substrate. The substrate has at least one opening therein, and each opening defines a lower portion and an upper portion. A resist applicator applies a layer of resist over the substrate, such that the resist layer covers the lower and upper portions. An etching component etches back the resist layer to expose the upper portion of the at least one opening. The resist applicator and the etching component repeat the steps of applying and etching, respectively, to remove a predetermined amount below the upper portion. A deposition component deposits an insulating layer over the substrate. A planarizing component planarizes the insulating layer until the upper portion of the at least one opening is exposed. | 10-25-2012 |
20120318191 | LABEL PRINTER - A label printer comprising: a conveyance unit configured to convey a label paper on which label is attached; a printing unit configured to print on the label attached on the label paper; a peeling unit configured to include one pair of members separated in a direction orthogonal to the conveyance direction of the label paper, and to peel the label from a backing paper through a structure that the distance between a plane forming the convey path and a surfaces of the members, which are opposite to a convey path, increase gradually along the direction from the center to the side ends of the label paper; a backing paper conveyance unit configured to convey the backing paper that the labels are peeled; and a moving unit configured to move the peeling members towards a direction orthogonal to the conveyance direction of the backing paper. | 12-20-2012 |
20130247819 | SYSTEM FOR PAINTING OBJECTS - A system for painting objects, in particular vehicle bodies or add-on parts, comprising a spray booth in which a paint can be applied to the objects. A fluid flow, which receives overspray and possibly solvent arising during the painting process, passes through the spray booth from the top down. A recovery system for recovering the overspray and possibly the solvent comprises at least one substantially vertical pipe, through which the fluid led out of the spray booth and laden with overspray and possibly solvent can flow and the surface of which is provided with elevations and/or recesses in such a way that eddies form in the fluid flowing through the pipe and the paint overspray is deposited onto the circumferential wall and flows downward out of the pipe. | 09-26-2013 |
20140130732 | WAFER HOLDER CLEANING APPARATUS AND FILM DEPOSITION SYSTEM INCLUDING THE SAME - There are provided a wafer holder cleaning apparatus and a film deposition system including the same, the wafer holder cleaning apparatus including a housing part including an entrance into and out of which a wafer holder is carried, a door part selectively opening and closing the entrance, a support part provided within the housing part and having the wafer holder disposed thereon, the wafer holder being carried into the housing part through the entrance, and a cleaning part cleaning a surface of the wafer holder. | 05-15-2014 |
20140230725 | METHOD FOR THE THERMAL CONDITIONING OF AN AUXILIARY MATERIAL AND CONDITIONING FACILITY - In order to provide a method for the thermal conditioning of an auxiliary material, which, to clean a crude gas stream loaded with an organic pollutant, is configured to be introduced into the crude gas stream and together with the organic pollutant forms a stable system of pollutant and auxiliary material, which can be carried out easily and in a resource-saving manner, it is proposed that the method includes the following steps: feeding the system of pollutant and auxiliary material and a carrier gas stream that has been heated in relation to normal conditions into a thermal conditioning device; chemical conversion of at least a part of the organic pollutant to produce a conditioned auxiliary material; separating the conditioned auxiliary material from the auxiliary material loaded with an organic pollutant by transportation by means of a gas flow; and removing the conditioned auxiliary material from the thermal conditioning device. | 08-21-2014 |
20140318446 | METHOD AND DEVICE FOR PROCESSING OF GRANULES - A method for processing of granules, by forming at least one injection zone in a fluidized bed where a feed stream of seed particles is contacted or coated by a liquid product by simultaneous injection of the feed stream of the seed particles and a feed stream of the liquid product, forming at least one granulation zone in the fluidized bed where the contacted or coated seed particles may be at least one of dried, shaped, and cooled to form granules, extracting the granules from the at least one granulation zone and sorting the extracted granules into undersize granules, on-size granules, and oversize granules, passing the on-size granules to post-processing treatment, removing the oversize granules, and passing the undersize granules back into the feed stream of the seed particles, wherein the extracted granules are made to pass through at least one classifier located in the at least one granulation zone. | 10-30-2014 |
20150083040 | LABEL SEPARATOR AND LABEL PRINTER INCORPORATING THE LABEL SEPARATOR - A medium transporting apparatus is used for transporting a label web including a carrier web and labels adhered thereto. A platen roller transports the label web in a transport path. A pressure roller is disposed downstream of the separating member with respect to the transport path, and causes the carrier web to be kinked. The pressure roller urges the carrier web against the platen roller. A support member is mounted on a cover and rotatably supports the pressure roller. The cover is pivoted between an open position and a closed. Immediately after the cover has moved to the closed position, the pressure roller contacts the platen roller and then slides by a predetermined amount on the circumferential surface of the platen roller in a direction away from the separating member. Thus, the carrier web sandwiched between the pressure and platen rollers becomes taut. | 03-26-2015 |
20150290668 | Paint brush Light and Methods - A light device for a paint brush includes an attachment bracket sized and shaped to attach to a ferrule of a paint brush. At least source one light is coupled to the bracket and oriented to project a light onto a surface being painted by the brush. A power source is coupled to the bracket and electrically coupled to the light source. A switch is coupled to the bracket and electrically coupled to the light source and the power source. The switch is configured to switch the light source on and off. | 10-15-2015 |