Class / Patent application number | Description | Number of patent applications / Date published |
118070000 | WITH CLEANING OR RECONDITIONING WORK SUPPORT OR CONVEYER | 7 |
20080236482 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING - Methods and apparatus for cleaning undesired substances from a surface in a semiconductor processing chamber. A gas mixture containing a fluorine source and an oxygen source is pre-treated to contain active fluorine species. The pre-treated mixture is stored for a time in a gas storage device, and then introduced to a semiconductor processing chamber. Prior to introduction of the pre-treated gas, the temperature in the chamber is lowered to a temperature equal to or lower than the normal operating temperature. Undesired substances are removed or cleaned through chemical reaction with the pre-treated gas mixture, without the generation of a plasma or a high temperature condition in the chamber. | 10-02-2008 |
20080236483 | METHOD FOR LOW TEMPERATURE THERMAL CLEANING - Methods and apparatus for cleaning undesired substances from a surface in a semiconductor processing chamber. A gas mixture containing a fluorine source and an oxygen source is pre-treated to contain active fluorine species. The pre-treated mixture is stored for a time in a gas storage device, and then introduced to a semiconductor processing chamber. Prior to introduction of the pre-treated gas, the temperature in the chamber is lowered to a temperature equal to or lower than the normal operating temperature. Undesired substances are removed or cleaned through chemical reaction with the pre-treated gas mixture, without the generation of a plasma or a high temperature condition in the chamber. | 10-02-2008 |
20110011336 | TREATMENT SYSTEM AND METHOD FOR THE SURFACE TREATMENT OF WORKPIECES, PARTICULARLY VEHICLE BODIES - A treatment system for the surface treatment of workpieces, particularly vehicle bodies, includes a plurality of transport devices, on which at least one workpiece to be treated can be attached in a releasable manner. A conveying device moves the transport devices through the treatment system. At least one treatment bath is disposed in a first conveying plane of the treatment system and the transport devices with the workpieces arranged thereon are introduced into the treatment bath. At least one cleaning device, which is suitable and designed for cleaning the transport devices after the surface treatment of the workpieces, is disposed in a second conveying plane of the treatment system. The second conveying plane is offset in the vertical direction relative to the first conveying plane. | 01-20-2011 |
20120304922 | Semiconductor Equipment - Semiconductor equipment is disclosed in this invention. The semiconductor equipment includes a reaction chamber, a wafer susceptor, and a liner device. The reaction chamber includes an opening and a circular inner wall. The wafer susceptor is capable of carrying at least one wafer. The liner device is disposed between the wafer susceptor and the circular inner wall of the reaction chamber. The liner device is capable of moving vertically between a first position and a second position. The liner device includes at least one venting opening, wherein the venting opening is connected with a venting device. Particles which are accumulated within the liner device can be removed by the venting device. | 12-06-2012 |
20140041576 | CARTRIDGE FILTER ASSEMBLY - The fluidized bed processor of the present invention includes an internal filter assembly with a rack and a cartridge-type filter supported at the lower end by a bracket. The rack includes an elongated rod extending through the filter. An end cap is provided on the lower end of the rod for normal sealing engagement with the filter bracket. During normal operation of the processor, the upper and lower ends of the filter are sealed. During or after cleaning of the filter, the rack is lowered, and a spring separates the filter and support bracket from the end cap so as to create a gap for drainage of cleaning fluid. | 02-13-2014 |
20140158043 | PROTECTIVE DUST SUPPRESSION COATING SYSTEMS FOR PAINT BOOTHS - In various embodiments multi-component systems for the protection of spray booth surfaces and the suppression of dust are provided. In certain embodiments the multi-component system for the temporary protection of a paint spray booth and the suppression of dust comprises a first component comprising a liquid that when applied to a surface of said paint booth dries to form a peelable film; and a second component comprising a liquid that when applied to a surface of said paint booth or to said film, forms a tacky coating that adheres dust particles. In certain embodiments the system further comprises a third component comprising a liquid that when applied to a surface of said paint booth or to said film, forms a tacky coating that adheres dust particles, wherein the composition of said third component is different than the composition of said second component. In certain embodiments the system further comprises a non-woven material configured for application to a floor of a spray booth. | 06-12-2014 |
20140190405 | SELF-CLEANING SHUTTER FOR CVD REACTOR - A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior, a shutter mounted to the chamber, and one or more cleaning elements mounted within the chamber. The shutter can be movable between (i) a run position in which the cleaning elements are remote from the exhaust channel and (ii) a cleaning position in which the one or more cleaning elements engage with the shutter so that the cleaning elements remove deposited particles from the shutter upon movement of the shutter to the cleaning position. | 07-10-2014 |