| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 118058000 | WITH HEAT EXCHANGE, DRYING, OR NON-COATING GAS OR VAPOR TREATMENT OF WORK | 59 |
| 20100018457 | FILM FORMING APPARATUS AND METHOD OF MANUFACTURING LIGHT EMITTING DEVICE - The problem regarding volatileness of a solvent in an EL forming material, which occurs in adopting printing, are solved. An EL layer is formed in a pixel, portion of a light emitting device by printing. Upon formation of the EL layer, a printing chamber is pressurized to reach a pressure equal to or higher than the atmospheric pressure, and the printing chamber is filled with inert gas or set to a solvent atmosphere. Thus the difficulty in forming an EL layer by printing is eliminated. | 01-28-2010 |
| 20090050053 | CRUCIBLE HEATING APPARATUS AND DEPOSITION APPARATUS INCLUDING THE SAME - A crucible heating apparatus and a deposition apparatus including the same. The crucible heating apparatus includes: a crucible including a main body to house a deposition material, and a cover disposed on the main body, having a nozzle; a band coupled to the crucible, through contact parts; a thermocouple coupled to the band; a housing to house the crucible and the band; and a heater disposed inside the housing, to heat the deposition material. | 02-26-2009 |
| 20130081568 | APPARATUS FOR MANUFACTURING FLEXIBLE PRINTED WIRING BOARD, APPARATUS FOR MANUFACTURING WIRING BOARD, AND APPLYING DEVICE - According to one embodiment, an apparatus includes: a device configured to partially provide a second conductor layer on a surface of a first conductor layer; a device configured to partially provide a first insulating layer on the surface of the first conductor layer; a device configured to integrate the first conductor layer, the second conductor layer, the first insulating layer, and a third conductor layer, in a state in which the second conductor layer and the first insulating layer provided on the surface of the first conductor layer are covered with the third conductor layer from a side opposite the first conductor layer; a device configured to form a conductor pattern by partially removing at least one of the first conductor layer and the third conductor layer in a structure obtained by the integrating; and a device configured to cover both sides of the structure. | 04-04-2013 |
| 20090255461 | Apparatus for Simultaneous Roll-to-Roll Wet Processing of Two Workpieces Disposed Within a Single Chamber - A system is described to deposit a buffer layer onto exposed surfaces of two different solar cell absorber layers of two different flexible workpieces from a process solution including all chemical components of the buffer layer material. The buffer layer is deposited from the process or deposition solution while the flexible workpieces are simultaneously heated and processed within a chamber in a face to face manner as the process solution is flown through a process gap formed between the exposed surfaces of the two solar cell absorber layers. | 10-15-2009 |
| 20120097094 | System for Coating a Stent - A system for forming a coating on a stent has a hub for holding a plurality of cartridges. Each cartridge has a plurality of mandrels, each mandrel capable of supporting a stent. A chamber has a drying section and a spray coating section, and is configured to receive a cartridge from the hub. An arm moves a cartridge from the hub to the chamber. A spray applicator applies a coating composition to a stent in the spray coating section. | 04-26-2012 |
| 20110220015 | SEAMLESS CAPSULE MANUFACTURING APPARATUS - A seamless capsule manufacturing apparatus ( | 09-15-2011 |
| 20090320748 | APPARATUSES AND METHODS FOR DECORATING OBJECTS - Apparatus for decorating objects including a heating device for heating an object wrapped in a transferring support bearing a sublimable image and a conveying device for conveying the object into, and removing the object from, the heating device the conveying device being mainly movable in a substantially vertical direction. The conveying device is provided with a supporting element such as to convey one object at a time to the heating device via inlet and outlet openings on the same side of the heating device. | 12-31-2009 |
| 20120103252 | CONVEYANCE DEVICE FOR BASE MATERIAL HAVING BOTH SURFACES COATED WITH COATING SOLUTION - A double-sided coated substrate transport device ( | 05-03-2012 |
| 20100242838 | COATING APPARATUS - There is provided a coating apparatus capable of continuously producing coated rice having powdered coating material adhered to the grains and including a drying process to prevent the grains from being bonded to one another and make the grain surfaces smoother upon drying of the grains. The coating apparatus comprising a binder coating unit for applying liquid binder to the grains being conveyed through a coating and stirring chamber to coat the grain surfaces with the binder; a adhering unit for adding powder material to the grains conveyed through a adhering and stirring chamber to adhere the powdered material to the grain surface by the binder; and a drying unit including a drying and stirring chamber through which the grains are conveyed while being stirred, a blow passage for blowing hot air into the drying chamber to dry the grains, and an exhaust passage for exhausting the hot air from the drying chamber. | 09-30-2010 |
| 20100139556 | PURGE GAS ASSEMBLY - In a purge gas assembly provided: in an outer circumference portion of a substrate stage, with a shoulder portion offset downward below a substrate mounting surface on an upper end of the substrate stage; a purge ring enclosing a stepped circumferential surface between the substrate mounting surface and the shoulder portion; and an annular gas ejection passage for ejecting the purge gas, the gas ejecting passage being defined between the stepped circumferential surface and an inner circumferential surface of the purge ring, an arrangement is made such that the purge gas can be ejected uniformly from the gas ejection passage over the entire circumference thereof and that the deposition of a film on an upper surface of the purge ring can also be restricted, and further that the construction is simplified. The purge ring has formed therein an annular groove which recesses from a lower surface thereof upward. | 06-10-2010 |
| 20100300351 | APPARATUS FOR PRODUCTION OF COMPOSITE MATERIAL SHEET - An apparatus for production of a composite material sheet is provided that can achieve a thinner composite material sheet, effectively prevent occurrence of curling, perform continuous production, and produce a high-quality composite material sheet having excellent heat resistance, weather resistance, flexibility, shape retention, peel strength, and the like. | 12-02-2010 |
| 20110023775 | APPARATUS FOR ATOMIC LAYER DEPOSITION - An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Z | 02-03-2011 |
| 20110011335 | Electroless Plating Method and Apparatus - An electroless plating system is provided. The system includes a first vacuum chuck supporting a first wafer and a second vacuum chuck supporting a second wafer such that a top surface of the second wafer is opposing a top surface of the first wafer. The system also includes a fluid delivery system configured to deliver a plating solution to the top surface of the first wafer, wherein in response to delivery of the plating solution, the top surface of the second wafer is brought proximate to the top surface of the first wafer so that the plating solution contacts both top surfaces. A method for applying an electroless plating solution to a substrate is also provided. | 01-20-2011 |
| 20100101488 | Method and Apparatus for Improving Corrosion Resistance of Chrome Plated Material - A method and apparatus for improving the corrosion resistance of chrome plated materials. After the materials to be chrome plated are mechanically abrasively polished, but before they are reverse etched, they are power washed with a high-pressure liquid. A sprayer with nozzles directed inwardly towards the materials directs water onto the material at pressures in the range of 1000 or 2500 to 3000 psi. After the materials are chrome plated, they are heated above the melting point of a buffing compound, and then the heated materials with the buffing compound applied are buffed. An induction heater is used, before or after the buffing compound is applied. Computer controls, responsive to operator input of the cross-sectional size, composition and/or speed of movement of the chrome plated materials, to in turn regulate the power to an induction coil heater. | 04-29-2010 |
| 20100218718 | IMAGE FORMING APPARATUS AND APPARATUS FOR COATING FOAM ON COATING TARGET MEMBER - An image forming apparatus includes a generating mechanism to generate foam from a liquid or gel which may take a foam state, a coating roller having a peripheral surface supplied with the foam to coat the foam on the peripheral surface onto a surface of a recording medium, and a transport passage to transport the foam from the generating mechanism to the coating roller by an accumulation force of the foam. | 09-02-2010 |
| 20090320749 | APPARATUS FOR INTEGRATED SURFACE TREATMENT AND DEPOSITION FOR COPPER INTERCONNECT - An integrated system for depositing films on a substrate for copper interconnect is provided. The system includes a processing chamber with a plurality of proximity heads, and a vacuum transfer module coupled to the processing chamber. Selected ones of the proximity heads are used for surface treatments and atomic layer depositions (ALDs). The system further includes a processing module for copper seed layer deposition, which is integrated with a rinse/dryer to enable dry-in/dry-out process capability and is filled with an inert gas to limit the exposure of the substrate to oxygen. Additionally, the system includes a controlled-ambient transfer module coupled to the processing module for copper seed layer deposition. Further, the system includes a loadlock coupled to the vacuum transfer module and to the controlled-ambient transfer module. The integrated system enables controlled-ambient transitions within the system to limit exposure of the substrate to uncontrolled ambient conditions outside of the system. | 12-31-2009 |
| 20090044746 | VERTICAL HEAT TREATMENT APPARATUS - A vertical heat treatment apparatus enabling the insertion of a temperature sensor in the reaction tube without disassembling the apparatus is disclosed. The vertical heat treatment apparatus includes a reaction tube; a heating section; a wafer holding section; a supporting section movably provided in the vertical direction so as to seal the reaction tube while the wafer holding section is in the reaction tube; a temperature sensor insertion section provided in the supporting section and having a through hole for guiding a temperature sensor so that the temperature sensor can be inserted into the reaction tube; and a cap section for opening and closing the through hole of the temperature sensor insertion section while the wafer holding section is on the supporting section. | 02-19-2009 |
| 20100251961 | SHAPED METAL DEPOSITION APPARATUS - Shaped metal deposition apparatus comprises a mounting head for mounting a shaped metal deposition device, an inert gas shield for providing an inert atmosphere around shaped metal deposited in use by the shaped metal deposition device, and a rotatable coupling between the mounting head and the inert gas shield to permit relative rotation therebetween. | 10-07-2010 |
| 20090000543 | SUBSTRATE TREATING APPARATUS - A substrate treating apparatus includes a plurality of substrate treatment lines arranged vertically. Each substrate treatment line has a plurality of main transport mechanisms arranged horizontally, and a plurality of treating units provided for each main transport mechanism for treating substrates. A series of treatments is carried out for the substrates, with each main transport mechanism transporting the substrates to the treating units associated therewith, and transferring the substrates to the other main transport mechanism horizontally adjacent thereto. The substrate treating apparatus realizes increased processing capabilities by treating the substrates in parallel through the substrate treatment lines. | 01-01-2009 |
| 20110162576 | PAINT SHOP FOR PAINTING OBJECTS TO BE PAINTED - To provide a paint shop for painting objects to be painted in the form of vehicle bodies and/or parts of vehicle bodies, there is proposed a paint shop for painting objects to be painted in the form of vehicle bodies and/or parts of vehicle bodies which comprises the following: a building shell, which encloses a building interior, in which are arranged at least one dip tank and at least one open treatment area, which is open in relation to the building interior; a first transport level, on which objects to be painted can be transported through at least one open treatment area; a second transport level, from which objects to be painted can be dipped into at least one dip tank; and at least one intermediate storage unit, wherein at least one object to be painted can be transported from one transport level of the paint shop into the intermediate storage unit and later can be transported out of the intermediate storage unit into another transport level of the paint shop. | 07-07-2011 |
| 20080196658 | SUBSTRATE PROCESSING APPARATUS INCLUDING A SUBSTRATE REVERSING REGION - A substrate processing apparatus that is arranged adjacent to an exposure device includes a processing section including a first processing unit and a second processing unit. The first processing unit includes a development region, a first cleaning region, and a first transport region. The development region and the first cleaning region are arranged opposite to each other with the first transport region interposed therebetween. The second processing unit includes a reversing region, a second cleaning region, and a second transport region. The reversing region and the second cleaning region are arranged opposite to each other with the second transport region interposed therebetween. The second processing unit is arranged between the first processing unit and the exposure device. The substrate processing apparatus also includes a transfer section coupled to the processing section and an interface configured to receive and transfer the substrate between the processing section and the exposure device. | 08-21-2008 |
| 20120145073 | SUBSTRATE TREATING APPARATUS - A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism disposed in a transporting space for transporting the substrates to the treating units. The treating units include solution treating units and heat-treating units. The solution treating units are arranged at one side of the transporting space, the heat-treating units are arranged at the other side of the transporting space, and the main transport mechanism and the treating units are in substantially the same layout in plan view for the respective cells. The solution treating units are in substantially the same layout in side view for the respective cells, the heat-treating units are in substantially the same layout in side view for the respective cells, and treatments of the substrates carried out in the respective cells are the same. | 06-14-2012 |
| 20120145074 | SUBSTRATE TREATING APPARATUS - A substrate treating apparatus includes a treating block including a plurality of cells arranged one over another. Each cell has treating units for treating substrates and a single main transport mechanism for transporting the substrates to the treating units. Each cell also has a blowout unit for supplying a clean gas into a transporting space of the main transport mechanism and an exhaust unit for exhausting gas from the transporting space. The blowout unit and the exhaust unit are arranged one over the other in the transporting space to separate the transporting space of each cell from that of another cell. | 06-14-2012 |
| 20120304921 | HEATING APPARATUS, COATING APPARATUS AND HEATING METHOD - A heating apparatus including: a first heating part and a second heating part between which a substrate having a coating film is disposed at a substrate position in the film thickness direction; and a distance control part which controls at least one of a first distance between the substrate position and the first heating part and a second distance between the substrate position and the second heating part. | 12-06-2012 |
| 20110155052 | FLUIDIZED BED APPARATUS - A fluidized bed apparatus includes: a filter casing unit attached to a support base so as to be vertically movable; and a spray casing unit attached to the support base so as to be swingingly movable. The filter casing unit is, while being inverted, vertically moved under a state in which the spray casing unit is withdrawn sideways, and a filter is replaced at a maintenance position (Y) on a lower side of the apparatus. The filter casing unit is attached to a base plate of a lifting device. When a lift plate ascends while being placed on a screw nut, the filter casing unit also ascends. The filter casing unit is not fixed to the lifting device and is not distorted even when the unit cannot be sandwiched with an equal force. | 06-30-2011 |
| 20120012051 | DRUM COATING DEVICE - A drum coating device for coating work-pieces includes a main body, a support element, a cleaning device, a spraying device, a rotary drum device, a heating device, and a drive device. The main body defines a receiving room. The support element is received in the receiving room and defines slots for receiving the work-pieces. The cleaning device cleans the work-pieces. The spraying device sprays coating materials to the work-pieces. The rotary drum device uniformly coats the coating materials on the work-pieces. The heating device heats the coating materials coated on the work-pieces. The drive device includes a rotating drive rotating the support element and a linear drive raising or lowering the support element in the receiving room. | 01-19-2012 |
| 20110094439 | COLD GAS SPRAYING SYSTEM - A gas heating device is connected to a stagnation chamber having a Laval nozzle discharging a gas stream with incorporated particles at an ultrasonic speed, thus forming a cold gas spraying system capable of coating a surface by the accelerated particles. To achieve an better layer quality, at least one section of the cold gas spraying system, downstream of the gas heating device, is thermally protected by lining or forming the internal wall of the section with a ceramic insulation material having a heat conductivity of less than 20 W/Km to separate the internal wall of the section from the gas stream. A sleeve may be used, a portion of which is cylindrical and another portion which is a truncated conical section; the cylindrical section being inserted into the stagnation chamber and the conical section being inserted into the convergent subsection of the Laval nozzle. | 04-28-2011 |
| 20110088615 | DIP COATING APPARATUS - A dip coating apparatus includes a housing and a workpiece holder movably and rotatably received in the housing. The housing includes an immersing portion configured for carrying out immersion process and a drying portion configured for carrying out drying process. The inner spaces of the immersing portion and the drying portion are communicated with each other. The lifting workpiece holder is configured for fixed workpieces thereon and moving and rotating relative to the immersing portion and the drying portion of the housing. The workpieces is driven by the lifting-rotating to carry out the immersion process and the drying process. | 04-21-2011 |
| 20100050935 | Solution Deposition Assembly - Methods and devices are provided for improved deposition systems. In one embodiment of the present invention, a deposition system is provided for use with a solution and a substrate. The system comprises of a solution deposition apparatus; at least one heating chamber; at least one assembly for holding a solution over the substrate; and a substrate curling apparatus for curling at least one edge of the substrate to define a zone capable of containing a volume of the solution over the substrate. In another embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of at least about 0.5 microns to 10 mm. | 03-04-2010 |
| 20120079982 | MODULE FOR OZONE CURE AND POST-CURE MOISTURE TREATMENT - A substrate processing system that has a plurality of deposition chambers, and one or more robotic arms for moving a substrate between one or more of a deposition chamber, load lock holding area, and a curing and treatment module. The substrate curing and treatment module is attached to the load-lock substrate holding area, and may include: The curing chamber for curing a dielectric layer in an atmosphere comprising ozone, and a treatment chamber for treating the cured dielectric layer in an atmosphere comprising water vapor. The chambers may be vertically aligned, have one or more access doors, and may include a heating system to adjust the curing and/or heating chambers between two or more temperatures respectively. | 04-05-2012 |
| 118059000 | With solid heat exchange means contacting work | 2 |
| 20090025634 | HEATING ELEMENT - Embodiments of a heating element of a fluid ejection device are disclosed. | 01-29-2009 |
| 20100206221 | Apparatus For Printing Actives Onto Articles - An apparatus for printing active materials, such as adhesives, onto articles, such as absorbent articles or release paper, using a coater with a multitude of applicators. The applicators coat a surface (roll) with a multitude of beads of the active material. The apparatus also includes a specific coating blade, which contacts the surface with the active material at a certain angle and thereby coats the surface even better. | 08-19-2010 |
| 118061000 | With treatment of waste gases, e.g., solvent recovery | 1 |
| 20100006025 | EXHAUST GAS TRAP FOR SEMICONDUCTOR PROCESSES - An exhaust gas trap for semiconductor processes includes: a trap body having an inlet port and an outlet port; an inlet shut-off valve provided at the inlet port; and an outlet shut-off valve provided at the outlet port. The trap body, inlet and outlet valves are integrated and can be removed together for replacement on refreshing of the trap. | 01-14-2010 |
| 118062000 | To manipulate work by gas blast | 4 |
| 20090114149 | GAS WIPING APPARATUS - A gas wiping apparatus for use in coating a molten metal onto a steel strip. In the apparatus, a chamber, to which a high pressure gas is supplied, defines a multistage uniform pressure space. A lip support unit is associated with a front of the chamber to allow the high pressure gas to flow therethrough, the lip support unit supporting the apparatus against load. Upper and lower lips are associated with a front of the lip support unit to cooperatively define an outlet. The upper lip adjusts a gap of a gas outlet cooperatively with the lower lip, and can be easily installed in a lip support unit while adjusting the gap of the gas outlet stably. Also, edge over coating (EOC) of the steel strip can be prevented without an additional auxiliary nozzle. | 05-07-2009 |
| 20110139066 | Pneumatic nozzle for roller coating - A pneumatic nozzle for roller coating is revealed. A workpiece to be coated is fixed on a rotating power source of a machine. A high-pressure pneumatic nozzle and a material supply nozzle, both corresponding to the workpiece, are arranged at the machine. The workpiece is driven to rotate by the rotating power source while the material supply nozzle applies coating material to the workpiece and the high-pressure pneumatic nozzle releases high pressure gas. The coating material attached on the surface of the workpiece is pushed by the high pressure gas and spread uniformly on the workpiece by rotating workpiece. Thereby the material is coated smoothly in a non-contact way and the thickness of the coating material is controlled in micron scale. This helps following manufacturing of three-dimensional microstructures on rolls for producing roll dies and increases the practical value. | 06-16-2011 |
| 20080202411 | COMPACT GLAZING MACHINE - A glazing machine includes a pressure roller and a printing roller, and the glaze is supplied and fills the gap between the pressure roller and the printing roller. A support roller is located beneath the printing roller and rotates in a direction opposite to a rotation direction of the printing roller. A poster moves through a gap between the printing roller and the support roller so that the glaze is spread on the poster. A blowing unit has a nozzle which blows air flow toward the printing roller to separate the printing roller and the poster. A suction roller is located beside the support roller and sucks the poster after being glazed. A plurality of guide plates are located beside the suction roller such that a front edge of the poster is movably located on the guide plates. | 08-28-2008 |
| 20100282161 | GAS WIPING APPARATUS - In a gas wiping apparatus for blowing a gas on the front side and the back side of a strip, which exits from a hot-dip plating bath and travels upward, from wiping nozzles to adjust the amount of a plating deposit, the wiping nozzles are supported to be linearly movable beyond the width of the nozzles in the plate width direction of the strip. | 11-11-2010 |
| 118063000 | To remove or spread applied coating by gas blast | 6 |
| 20100031879 | GAS WIPING APPARATUS HAVING MULTIPLE NOZZLES - A gas wiping apparatus is a type of equipment for coating a molten metal onto a steel strip, in which the molten metal solution deposited on the steel strip is wiped to adjust a coating thickness. The gas wiping apparatus includes a body containing a high pressure gas and a multiple nozzle unit disposed at the body to eject the high pressure gas onto a surface of a moving coated steel strip. The surface of the coated steel strip passing through a hot dipping bath filled with the molten metal is wiped by a high speed gas jet. Here, the molten metal is prevented from splashing even at a high-speed and the steel strip can be adjusted in the coating thickness stably and uniformly. | 02-11-2010 |
| 20120006258 | HYDROGEN RADICAL GENERATOR - A method of reducing contamination generated by a hydrogen radical generator and deposited on an optical element of a lithographic apparatus includes passing molecular hydrogen over a first part of a metal filament of the hydrogen radical generator, the first part including a metal-oxide, when the temperature of the first part of the metal filament is at a reduction temperature less than or equal to an evaporation temperature of the metal-oxide. | 01-12-2012 |
| 20100024720 | COATING APPARATUS FOR COATING A BUILDING BOARD - A coating apparatus for coating an entire surface of a building board without forming uncoated area, while conveying the building board, having: an application device for applying a coating material to the surface of the building board; a removal device for removing an excess coating material applied to the surface of the building board and forming a coating liquid film; and a pressure device for blowing air to the coating liquid film on the surface of the building board, wherein the pressure device is provided in a step posterior to a step that uses the removal device and has an air outlet which is wider than the building board and which covers the surface of the building board, and wherein the surface of the building board is applied with pressure of the atmospheric pressure or higher, while the building board is conveyed from the removable device to the pressure device. | 02-04-2010 |
| 20100224121 | APPARATUS FOR THE COATING OF A SUBSTRATE - The invention relates to an apparatus for the coating of a substrate, in particular of a circuit board, with a material application device for applying a coating material and with a gas supplying device for the supply of a gaseous medium, the material application device having an inner tubular element, the gas supply device having an outer tubular element which is arranged coaxially to the inner tubular element and surrounds the latter, so as to form between the outer and the inner tubular element a gas supply duct which has an annular orifice at one end, the supply duct being configured so that the gaseous medium flows out, parallel to the coating material, through the annular orifice, in order, when it impinges on the substrate, to displace the applied coating material and thereby distribute it over the area. The apparatus is distinguished in that the material application device has a jet valve which, in a first operating mode, carries out a jetted supply of material into the inner tubular element. | 09-09-2010 |
| 20100224120 | GAS WIPING APPARATUS - In a gas wiping apparatus which blows gas through a wiping nozzle onto front and rear surfaces of a steel plate going out from a molten metal coating pot and running upward and which thereby controls a deposit mass, the wiping nozzle is separated into upper and lower lips, blocking faces partially closing a gas supply channel are formed in the upper and lower lips at vertically different positions on the opposite sides from each other in a gas outlet width direction, and the upper and lower lips are provided in such a manner as to be movable in a width direction of the steel plate. | 09-09-2010 |
| 20100175615 | APPARATUS FOR PRODUCING HOT-DIP METAL COATED STEEL STRIP - An apparatus for producing a hot-dip metal coated steel strip configured to control the thickness of a coating metal by blowing a gas from wiping nozzles to a steel strip continuously drawn from a coating bath, the wiping nozzles being arranged above the coating bath and facing the respective surfaces of the steel strip, and including rectifying plates arranged on the respective sides of the steel strip located above submersed support rolls and below the surface of a molten metal while not being in contact with the steel strip and the submersed support rolls, each of the rectifying plates having a roll-covering portion and a steel-strip-facing portion, each of the roll-covering portions being arranged to cover ΒΌ or more of the periphery of a corresponding one of the submersed support rolls near to the molten metal surface, each of the steel-strip-facing portions arranged above a corresponding one of the submersed support rolls and facing the steel strip, and the steel-strip-facing portions of the rectifying plates being connected to the respective steel-strip-side ends of the roll-covering portions. | 07-15-2010 |
| 118064000 | With housing surrounding or engaging coating means | 3 |
| 20110000427 | Removing A Solvent From A Drug-Eluting Coating - A coating device for coating a medical device with a drug-eluting material uses an in-process drying station between coats to improve a drug release profile. The drying station includes a heat nozzle configured for applying a uniform drying gas. | 01-06-2011 |
| 20080264333 | Rotary Pan - Described is a rotary pan ( | 10-30-2008 |
| 20120132134 | APPARATUS FOR CHEMICAL BATH DEPOSITION - The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space. | 05-31-2012 |
| 118066000 | Plural treatments | 3 |
| 20130074764 | FILM-FORMING APPARATUS AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE - According to one embodiment, a film-forming apparatus includes a coating unit which introduces a liquid material to a substrate with a groove and fills the liquid material into the groove, thereby forming a liquid layer, a drying unit which solidifies the liquid layer by drying, and a vapor supply unit which applies a vapor to a surface of the liquid layer during the drying | 03-28-2013 |
| 20100199911 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus including: a heating part for heating a wafer; a transport part through which a wafer is transported; a first transfer arm that receives a wafer from the heating part and places the wafer on the transport part; and a second transfer arm including a pair of plate-like tweezers that receives the wafer placed on the transport part from the transport part and transfers the wafer. The transport part includes a cooling plate having a cooling surface on which a wafer is placed. The cooling plate includes a temperature-adjusting channel through which a temperature-adjusting water is circulated for cooling the cooling plate to a temperature lower than a temperature of the heating process of the heating part. The cooling surface is provided with a recess that is similar in shape to and slightly larger than a planar shape of the pair of tweezers. | 08-12-2010 |
| 118067000 | Running length work | 1 |
| 20100139557 | REACTOR TO FORM SOLAR CELL ABSORBERS IN ROLL-TO-ROLL FASHION - A reactor to anneal a workpiece including a precursor material deposited over a flexible substrate is provided. The anneal process transforms the precursor material into a solar cell absorber when the workpiece is advanced through a process gap of the reactor. The process gap is defined by a peripheral wall including a top wall, a bottom wall and side walls. An exhaust opening located between the entrance and exit openings to remove gases from the continuous process gap. At least one roller having a rotational axis that is substantially transverse to the process direction and which has an outer roller surface disposed at least partially below the top wall of the continuous process gap forms a reduced gap between the outer surface of the roller and the bottom wall. The reduced gap is smaller than the process gap and the at least one roller is configured such that the workpiece travels through the reduced gap with the precursor material facing the at least one roller as the workpiece is moved between the entrance opening and the exit opening in a process direction. | 06-10-2010 |
| 118068000 | Running length work | 3 |
| 20100043700 | CURTAIN COATER - A machine including at least one curtain applicator device which coats onto one application segment of the material web path further includes a segment in the web path immediately following a turning arrangement of the coating application segment which directs the material web downward which is a drying section where the material web passes through at least one non-contact drying device which subjects the coating medium to the effects of heat. Alternatively or in addition, the material web after turning of its path and/or at the end of the coating application segment is supplied to the drying device of a drying section in such a way that the heat effect of the drying device upon the coating medium begins at a lower level relative to the coating application segment. | 02-25-2010 |
| 20080264334 | DEVICE FOR APPLYING COATINGS TO LENGTHY PRODUCTS - The inventions refer to method of product surface treatment, technological line and device for hot applying the coating on lengthy products. Line for applying the coating on lengthy product comprising supplying device, product surface preparing unit, devise for continuous applying the coating, cooling camera and final product acceptance unit. Device for applying the coating comprises camera ( | 10-30-2008 |
| 20110139067 | ARRANGEMENT FOR COATING TAPE-SHAPED FILM SUBSTRATES - An arrangement for coating of sheet-like foil substrates having an unwinding roll and a winding roll between which the foil substrate is guided under sheet tension and a coating station arranged in between the rolls, permits vacuum coating of foil substrates in which surpassing of the maximum substrate temperature is prevented and high quality substrate transport is made possible. The coating station has at least two coating sources arranged in the direction of the sheet run one behind the other opposite the coating site of the foil substrate, and a support element that generates a support force resulting from the sheet tension on the back of the foil substrate as force component. The support element is arranged between two adjacent coating sources on the back of the substrate opposite the coating side and the foil substrate is freely tightened between two support elements. | 06-16-2011 |
| 118069000 | Cooling | 7 |
| 20120285375 | APPARATUS FOR TREATING THIN FILM LAYERS DURING PHOTOVOLTAIC MODULE MANUFACTURE - Systems and processes for treatment of a cadmium telluride thin film photovoltaic device are generally provided. The systems can include a treatment system and a conveyor system. The treatment system includes a preheating section, a treatment chamber, and an anneal oven that are integrally interconnected within the treatment system. The conveyor system is operably disposed within the treatment system and configured for transporting substrates in a serial arrangement into and through the preheat section, into and through the treatment chamber, and into and through the anneal oven at a controlled speed. The treatment chamber is configured for applying a material to a thin film on a surface of the substrate and the anneal oven is configured to heat the substrate to an annealing temperature as the substrates are continuously conveyed by the conveyor system through the treatment chamber. | 11-15-2012 |
| 20120097095 | Thermal Method to Control Underfill Flow in Semiconductor Devices - Apparatus for assembling a semiconductor device has a plate with body and a surface heatable to a controlled a temperature profile from location to location across the plate. Mesas at same temperature of plate protrude from the surface are configured to support a portion of the substrate. Movable capillaries have openings for blowing cooled gas onto selected locations of the assembly. At least one movable syringe movable has an opening for dispensing a polymer precursor. | 04-26-2012 |
| 20100192844 | Apparatus and method for treating substrate - An apparatus and method for treating a substrate are provided. The apparatus includes a load port, an index module, a first buffer module, a coating/developing module, a second buffer module, a pre/post-exposure treatment module, and an interface module, which are sequentially arranged in a direction. The coating/developing module includes a coating module and a developing module, which are arranged in different layers. The pre/post-exposure treatment module includes a pre-treatment module and a post-treatment module, which are disposed at different layers. The pre-treatment module coats a protective layer on the wafer before an exposure process. The post-treatment module performs a wafer cleaning process and a post-exposure bake process after the exposure process. A robot for transferring the wafer is disposed in each of the pre-treatment and post-treatment modules. | 08-05-2010 |
| 20100122654 | THERMALLY CONTROLLED FLUIDIC SELF-ASSEMBLY - Methods and apparatuses are provided for assembling a structure on a support having a pattern of binding sites. In accordance with the method, a first fluid is provided on the surface of the support with the first fluid being of a type that that increases viscosity when cooled, the first fluid having first micro-components suspended therein each adapted to engage the binding sites. First fluid proximate to selected binding sites is cooled to increase the viscosity of the responsive fluid proximate to the selected binding sites so that the first micro-components suspended in the first fluid are inhibited from engaging the selected binding sites. | 05-20-2010 |
| 20110094440 | APPARATUSES USEFUL IN PRINTING, FIXING DEVICES AND METHODS OF PREHEATING SUBSTRATES IN APPARATUSES USEFUL IN PRINTING - Apparatuses useful in printing, fixing devices and methods of preheating substrates in apparatuses useful in printing are provided. An exemplary embodiment of the apparatuses useful in printing includes a first member including a first surface; a second member including a second surface forming a nip with the first surface; a substrate cooler disposed downstream from the nip to receive a first substrate exiting the nip, the substrate cooler removing heat from the first substrate by conduction; a substrate pre-heater disposed upstream from the nip; and a first heat transfer system for transferring heat from the substrate cooler to the substrate pre-heater. The substrate pre-heater applies the heat to conductively pre-heat a second substrate before the second substrate enters the nip. | 04-28-2011 |
| 20100206222 | Mask adhesion unit and deposition apparatus using the same - A mask adhesion unit for a deposition apparatus includes a magnetic assembly, a cap plate spaced apart from the magnetic assembly, and a magnetic control unit between edges of the magnetic assembly, and the cap plate. A deposition apparatus using the same is capable of adhering a substrate and a mask assembly together using the mask adhesion unit to improve deposition precision, while preventing deformation of a slit of the mask assembly. | 08-19-2010 |
| 20100326351 | APPARATUS AND METHOD FOR HEATING SUBSTRATE AND COATING AND DEVELOPING SYSTEM - A substrate heating apparatus includes a top plate arranged above a hot plate so that a vertical space is formed between the hot plate and the top plate. The top plate has an evacuated internal chamber serving as a vacuum insulating layer that suppresses heat transfer from a first surface of the top plate facing the hot plate to a second surface of the top plate opposite to the first surface. When heating the substrate, a gas flow flowing through the space between the hot plate and the top plate is generated. | 12-30-2010 |
