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WITH MEANS TO APPLY ELECTRICAL AND/OR RADIANT ENERGY TO WORK AND/OR COATING MATERIAL

Subclass of:

118 - Coating apparatus

Patent class list (only not empty are listed)

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Class / Patent application numberDescriptionNumber of patent applications / Date published
118621000 Electrostatic and/or electromagnetic attraction or projection of coating material to work 32
118641000 Radiant heating 19
118640000 With means to orient coating particles 1
20090308312Devices for positioning carbon nanoparticles, and systems for controlling placement of nanoparticles - The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a plurality of funnels in the substrate, wherein each of the funnels comprises an inlet opening and an elongated, rectangular shaped outlet opening. In one illustrative embodiment, the method includes creating a dusty plasma comprising a plurality of carbon nanotubes, positioning a mask between the dusty plasma and a desired target for the carbon nanotubes, the mask having a plurality of openings extending therethrough, and extinguishing the dusty plasma to thereby allow at least some of the carbon nanotubes in the dusty plasma to pass through at least some of the plurality of openings in the mask and land on the target.12-17-2009
Entries
DocumentTitleDate
20100050937Method and device for hot dip coating metal strip, especially metal strip - A method for hot dip coating metal strip includes guiding the strip obliquely or vertically through a molten coating metal. The coating thickness is controlled after the strip has emerged from the coating bath, and thin metal strip, which has a tendency to vibrate, is sealed towards the bottom by an electromagnetic traveling field that acts as a sealing field while the coating is laterally guided to compensate for ferromagnetic attraction. The electromagnetic field of one or more main coils in each inductor generates the electromagnetic traveling field as a blocking field or as a pump field, and several correction fields are arranged within the magnet yoke surface. The correction fields are individually determined according to width levels of the metal strip and are distributed according to a production program, and the correction fields are activated by separate pieces of power supply equipment.03-04-2010
20130032089METHOD AND DEVICE FOR ELECTROSTATICALLY SEPARATING OVERSPRAY WITH AN ABSORPTION AGENT - A method for separating overspray from the cabin exhaust air of coating systems, in particular of painting systems, which is laden with overspray, the overspray is taken up by an air flow and conveyed to an electrostatically operating separating device. There, the bulk at least of the solids is separated from the overspray at at least one separating surface. An electrically conductive material or material mixture is used as a separating agent, which is applied to the at least one separating surface of the separating device and at the operating temperature of the separating device has a wax-like consistency. Also a separating device with such a wax-like material and a system for coating articles.02-07-2013
20130032088METHOD AND DEVICE FOR THE ELECTROSTATIC SEPARATION OF OVERSPRAY - A method and device for separating overspray from the cabin exhaust air of coating systems which is laden with overspray, wherein the overspray is taken up by an air flow and conveyed to an electrostatically operating separating device. There, the bulk at least of the solids is separated from the overspray at a separating area of at least one separating surface. A cohesive material web is used as a separating agent, which is disposed at least partly along the separating area of the at least one separating surface and during operation of the separating device is electrically conductive at least in the separating area of the at least one separating surface.02-07-2013
20100043702SEMICONDUCTOR THIN FILM, THIN FILM TRANSISTOR, METHOD FOR MANUFACTURING SAME, AND MANUFACTURING EQUIPMENT OF SEMICONDUCTOR THIN FILM - A method for manufacturing a semiconductor thin film is provided which can form its crystal grains having a uniform direction of crystal growth and being large in size and a manufacturing equipment using the above method, and a method for manufacturing a thin film transistor. In the above method, by applying an energy beam partially intercepted by a light shielding element, melt and re-crystallization occur with a light-shielded region as a starting point. The irradiation of the beam gives energy to the light-shielded region of the silicon thin film so that melt and re-crystallization occur with the light-shielded region as the starting point and so that a local temperature gradient in the light-shielded region is made to be 1200° C./μm or more. In the manufacturing method, a resolution of an optical system used to apply the energy beam is preferably 4 μm or less.02-25-2010
20120111267Crystallization apparatus using sequential lateral solidification - A crystallization apparatus that performs crystallization on a substrate using sequential lateral solidification (SLS) includes a laser generating device for emitting a laser beam, a first telescope lens module and a second telescope lens module at one side of the laser generating device for minimizing a divergent angle of a laser beam emitted by the laser generating device; and a main optical system at one side of the second telescope lens module for uniformizing and amplifying a laser beam transmitted through the second telescope lens module. The main optical system is rotatably formed with respect to the laser generating device.05-10-2012
20080302301Device for the Hot-Dip Coating of a Metal Strip - The invention relates to a device for the hot-dip coating of a metal strip (12-11-2008
20100018460METHOD FOR FORMING SILICON-CONTAINING MATERIALS DURING A PHOTOEXCITATION DEPOSITION PROCESS - Embodiments of the invention generally provide a method for depositing films or layers using a UV source during a photoexcitation process. The films are deposited on a substrate and usually contain a material, such as silicon (e.g., epitaxy, crystalline, microcrystalline, polysilicon, or amorphous), silicon oxide, silicon nitride, silicon oxynitride, or other silicon-containing materials. The photoexcitation process may expose the substrate and/or gases to an energy beam or flux prior to, during, or subsequent a deposition process. Therefore, the photoexcitation process may be used to pre-treat or post-treat the substrate or material, to deposit the silicon-containing material, and to enhance chamber cleaning processes. Attributes of the method that are enhanced by the UV photoexcitation process include removing native oxides prior to deposition, removing volatiles from deposited films, increasing surface energy of the deposited films, increasing the excitation energy of precursors, reducing deposition time, and reducing deposition temperature.01-28-2010
20100000467Liquid crystal drop apparatus and method for dropping liquid crystal using the same - A liquid crystal drop apparatus for dropping liquid crystal on a substrate includes a liquid crystal container filled with liquid crystal, a nozzle formed at an lower end of the liquid crystal container for dropping the liquid crystal of the liquid crystal container, and a control unit for controlling the nozzle when the nozzle drops the liquid crystal.01-07-2010
20100031882Apparatus for producing a laminated object - An apparatus for producing a laminated object, includes a powder layer forming unit for forming a powder layer of a powdery material, a material supply unit for feeding the powdery material to the powder layer forming unit; and a solidified layer forming unit for forming a solidified layer by irradiating a light beam on a specified portion of the powder layer and sintering or melting the specified portion of the powder layer. The apparatus is configured to produce an integrally laminated three-dimensional object by repeating formation of the powder layer and formation of the solidified layer. The material supply unit includes a cartridge unit charged with the powdery material, the cartridge unit being configured to allow the powdery material to drop downwards.02-11-2010
20110168091Device of Generatively Manufacturing Three-Dimensional Objects with Insulated Building Field - The present invention relates to a device for generatively manufacturing a three-dimensional object (07-14-2011
20110168089CNT-INFUSED CARBON FIBER MATERIALS AND PROCESS THEREFOR - A composition includes a carbon nanotube (CNT)-infused carbon fiber material that includes a carbon fiber material of spoolable dimensions and carbon nanotubes (CNTs) infused to the carbon fiber material. The infused CNTs are uniform in length and uniform in distribution. The CNT infused carbon fiber material also includes a barrier coating conformally disposed about the carbon fiber material, while the CNTs are substantially free of the barrier coating. A continuous CNT infusion process includes: (a) functionalizing a carbon fiber material; (b) disposing a barrier coating on the functionalized carbon fiber material (c) disposing a carbon nanotube (CNT)-forming catalyst on the functionalized carbon fiber material; and (d) synthesizing carbon nanotubes, thereby forming a carbon nanotube-infused carbon fiber material.07-14-2011
20080282974Liquid curing apparatus for liquid transfer device - A liquid curing apparatus for a liquid transfer device includes a liquid transfer unit and a plurality of ultraviolet-emitting diodes. The liquid transfer unit transfers an ultraviolet curing liquid to a transfer target body. The plurality of ultraviolet-emitting diodes are arranged to oppose the transfer target body and emit only ultraviolet-wavelength light to irradiate the transfer target body to which the liquid has been transferred by the liquid transfer unit, thereby curing the transferred liquid.11-20-2008
20090314202Method and apparatus for microplasma spray coating a portion of a turbine vane in a gas turbine engine - A method and apparatus for microplasma spray coating a portion of a turbine vane without masking any portions thereof. The apparatus includes a microplasma gun with an anode, cathode, and an arc generator for generating an electric arc between the anode and cathode. An arc gas emitter injects gas through the electric arc. The electric arc is operable for ionizing the gas to create a plasma gas stream. A powder injector injects powdered material into a plasma stream. A localized area of the turbine vane is coated with the powdered material without having to mask the turbine vane.12-24-2009
20120060757UV CURING APPARATUS UTILIZING A COLD CATHODE FLORESCENT LAMP - The present invention is related to an UV curing apparatus, and more particularly, to an UV CCFL curing apparatus utilizing UV CCFL as light source. In order to provide an curing apparatus capable of generating UV light of high intensity and uniform lighting with great electrical safety and reliability, the UV CCFL curing apparatus of the present invention comprises a detachable UV CCFL light source that is designed and built to operate at high voltage, in a range greater than or equal to one thousand volts, with dielectric plugs and installation guides, and it may preferably include a light-transmissive protective cover to further protect users from direct contact with the UV CCFL light source during the curing operation in the curing chamber of the apparatus and to offer as a further protection to the fragileness of the UV CCFL thin glass tubes, which may too further filter certain wavelength of the UV light, such UVC. The UV CCFL curing apparatus of the present invention is preferably provided for curing UV hardening gel applied onto the nails of multiple fingers or toes all at once. Furthermore, the outer casing of the apparatus is detachably attached to the inner casing to allow a greater user interaction for decorative and entertainment purposes in addition to its protection to the apparatus as a whole.03-15-2012
20100258051COATING DEVICE COMPRISING FLOWING COATING MATERIAL FOR SMOOTH OR STRUCTURED SURFACES - The invention relates to a device for coating plates (10-14-2010
20100218720Moving module of a wafer ion-implanting machine - A moving module of a wafer ion-implanting machine includes a wafer carrier, a moving shaft, a base, a pair of first magnets, a fixture body, and a plurality of second magnets. One end of the wafer carrier is pivotally connected to a wafer tray; and the other end is fixed onto one end of the moving shaft. The base is fixed to the other end of the moving shaft. The moving shaft drives the wafer carrier and the base to move lengthwise. The pair of first magnets is fixed to the base. The fixture body is located between the pair of first magnets. The second magnets are fixed onto the fixture body and one of them forms compelling magnetic force between one of the first magnets. Thereby, the friction generated by contacting any of the first magnets with the fixture body can be prevented, thus increasing the production yield.09-02-2010
20100300353COATING AND DEVELOPING APPARATUS - Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.12-02-2010
20110174218IN-MOULD COATING DEVICE - An in-mould coating device comprises a fixed insert, a light generator, a camera, a light sensor, a bolster, a moving insert, the fixed insert is disposed in a fixed plate, the light generator, camera and light sensor are disposed in the fixed insert and equipped with on-off and control wires, the bolster is attached to a bottom of the fixed insert to fix the fixed insert, the camera and light sensor; the fixed inserted is made of transparent material selected from the group consisting of quartz, glass, crystal and coated with a reflective layer on an outer surface thereof, light generated from the light generator is reflected by the reflective layer, photo-curing coating materials are injected into a clearance between the fixed insert and the moving insert and irradiated by the light directly generated from the light generator and multidirectional light reflected by the reflective layer.07-21-2011
20110146569Apparatus for Deposition of Lacquer Overspray - An apparatus for deposition of lacquer overspray from the used cabin air of painting facilities laden with overspray comprises electrode apparatus and/or several regions of an electrode apparatus allocated to several different deposition surfaces. The several electrode apparatus and/or regions of one and the same electrode apparatus can be charged with high voltage independently of each other. This achieves not only an energy savings but also fault locating in the high voltage range is simplified and emergency operation in case of a breakdown in the high-voltage range is made possible.06-23-2011
20080230004Apparatus for manufacturing a color conversion filter - An apparatus for manufacturing a color conversion filter, having a color filter layer on a transparent substrate. A coloring matter layer containing color conversion coloring matter and an optical radical generating agent are formed on the substrate and the filter layer. The coloring matter layer is exposed to coloring matter decomposition light applied through the substrate and the filter layer. The coloring matter layer also is exposed to auxiliary ultraviolet light applied from the side of the coloring matter layer. This forms a color conversion layer at a position corresponding to the filter layer. The optical radical generating agent is heat vaporized. The color conversion coloring matter is decomposed by light whose wavelength is outside a range that the color filter layer transmits. The coloring matter decomposition light includes a wavelength component that decomposes the color conversion coloring matter. The color conversion layer emits, through wavelength profile conversion, light that the color filter layer transmits.09-25-2008
20090126627Laser assisted nano deposition - An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto the deposited nano particles on the substrate. The apparatus and method is suitable for fabricating patterned conductors, semiconductors and insulators on semiconductor wafers of a nano scale line width by direct nanoscale deposition of materials.05-21-2009
20100282162Roll-to-roll patterning apparatus and patterning system having the same - Disclosed herein is a roll-to-roll patterning apparatus and a patterning system using the same. The patterning system may include a supply roll to supply a film member, a recovery roll to recover the film member, and a roll-to-roll patterning apparatus forming a coating on the film member. The roll-to-roll patterning apparatus may include a pattern roller, a plurality of press rollers, and an alignment roller. The pattern roller may include an outer peripheral surface with a first pattern. The plurality of press rollers may press a film member against the pattern roller to form a second pattern on the film member. The alignment roller may be spaced apart from the pattern roller and may be arranged at an upstream position in a movement direction of the film member. The alignment roller may align the film member entering a region between the pattern roller and the plurality of press rollers.11-11-2010
20110114018PARTICULATE MATERIAL APPLICATOR AND PUMP - A nozzle assembly for a material application device includes an expansion chamber for slowing down the velocity of powder fed to the nozzle from a dense phase pump. The nozzle assembly includes a nozzle insert that forms the expansion chamber and provides air assist function. The nozzle includes an integral deflector, and further includes a passageway for a charging electrode so that the electrical path is routed away from the powder path, while permitting the electrode tip to be centered in the powder spray pattern from the nozzle. The nozzle also includes air wash for the electrode. The nozzle outlet orifice has a cross-sectional area that is equal to or greater than the inlet cross-sectional area so that a slow moving dense phase powder cloud is produced by the nozzle.05-19-2011
20110132259ELECTROSTATIC CHUCK AND VACUUM PROCESSING APPARATUS - An electrostatic chuck is provided which is arranged that, at the time of performing processing treatments of irradiating light to a to-be-processed substrate while holding the translucent to-be-processed substrate, the to-be-processed substrate can surely be held even in case the attraction force lowers due to photoelectric effect. An electrostatic chuck has a chuck plate made of a dielectric material, and a first electrode and a second electrode, both electrodes being disposed in the chuck plate. A voltage is applied between the first and the second electrodes to thereby attract the to-be-processed substrate S to the surface of the chuck plate. The electrostatic chuck has, on part of the surface of the chuck plate, a substrate holding section 06-09-2011
20090308311Surface treatment system - A surface treatment system, particularly for painting, coating, drying and the associated preparation of metallic or nonmetallic objects, contains a circuit, in which a liquid is circulated. In order to sterilize the liquid, the invention provides that a device for mechanically/physically opening cell membranes is integrated in the circuit. The germs can be removed while not creating strains resistant to the sterilization.12-17-2009
20120037070DISCHARGE SURFACE TREATMENT ELECTRODE AND METHOD OF MANUFACTURING THE SAME - A discharge surface treatment electrode used in discharge surface treatment for forming a wear-resistant film on a treatment target surface of a workpiece by use of the discharge energy of electric discharges caused between the electrode and the workpiece, the film being made of a material of an electrode or a substance obtained by a reaction of the material of the electrode with the discharge energy. The discharge surface treatment electrode is formed by: compression-molding a mixed powder into a green compact, the mixed powder being formed from a powder of a Stellite alloy with an average particle size of 3 μm or less prepared by use of a jet mill and a powder of a metal with an average particle size of 3 μm or less manufactured through an atomization process or a chemical process; and subjecting the green compact to heat treatment.02-16-2012
20120304925SYSTEM FOR COATING, IN PARTICULAR PAINTING, OBJECTS, IN PARTICULAR VEHICLE BODIES - A system for coating objects, comprising a coating booth and an electrostatically operating deposition unit. A feeding device, by which deposition liquid can be fed to the upper region of each deposition surface, is assigned to each deposition electrode of the deposition unit. The feeding device has a feed channel which can be filled with deposition liquid and which in the lower region thereof is formed by two spring plates. Two slide plates are also seated against the opposite deposition surfaces of the deposition electrode and can be moved back and forth between a position in which the lower edges of said slide plates are located above the lower edges of the spring plates and a position in which the lower edges of said slide plates are located below the lower edges of the spring plates.12-06-2012
20100192851CNT-INFUSED GLASS FIBER MATERIALS AND PROCESS THEREFOR - A composition includes a carbon nanotube (CNT)-infused glass fiber material, which includes a glass fiber material of spoolable dimensions and carbon nanotubes (CNTs) bonded to it. The CNTs are uniform in length and distribution. A continuous CNT infusion process includes: (a) disposing a carbon-nanotube forming catalyst on a surface of a glass fiber material of spoolable dimensions; and (b) synthesizing carbon nanotubes on the glass fiber material, thereby forming a carbon nanotube-infused glass fiber material. The continuous CNT infusion process optionally includes extruding a glass fiber material from a glass melt or removing sizing material from a pre-fabricated glass fiber material.08-05-2010
20120097100Headlight restoration kit - A method and kit for restoration of a plastic headlight surface including the steps of conditioning a headlight surface by wet sanding with 600 grit sandpaper effective to remove a laminate coating, wiping the headlight surface with a lint free towel, cleaning the headlight surface with an alcohol treated towel, coating the headlight surface with an ultra violet light curable restoration formulation comprising aliphatic urethane acrylate in the range of 25% to 60%, a photoinitiator in the range of 1% to 5%, N-butyl acetate in the range of 5% to 25%, Toluene in the range of 3% to 15%, a Methyl isobutyl ketone in the range of 3% to 15%, a light stabilizer in the range of 1% to 5%, and includes a flow agent; and exposing the coated headlight surface to an ultra-violet light for at least 10 minutes. In the preferred embodiment, the formulation includes a hydrocarbon propellant and is applied from a spray can.04-26-2012
20120017828APPARATUS FOR MANUFACTURING TRANSPARENT CONDUCTIVE LAYER - Disclosed herein is an apparatus for manufacturing a transparent conductive layer. The apparatus includes a transparent substrate, a longitudinal direction of which is arranged in an X axis direction. Jetting means jets a conductive polymer solution, containing ions, onto a first surface of the transparent substrate in a Y axis direction. A wire is spaced apart from a second surface of the transparent substrate by a predetermined distance and arranged in a Z axis direction. Voltage application means generates electric attractive force between the wire and the conductive polymer solution by applying a potential having polarity opposite to that of the ions to the wire. The apparatus adds ions to the conductive polymer solution, and employs a wire to which a potential having polarity opposite to that of the ions is applied, thus obtaining the advantage that the target substrate can be uniformly coated with the conductive polymer solution.01-26-2012
20120055400GATE VALVE AND SUBSTRATE PROCESSING APPARATUS EQUIPPED WITH THE SAME - Agate valve apparatus is disclosed. The gate valve apparatus is provided with a valve casing that includes a first valve seat and a second valve seat, and in which an opening portion is formed; and a closure element that includes a sealing member that contacts the first valve seat to seal the opening portion. In addition, the gate valve apparatus is provided with a shutoff member that contacts the second valve seat to thereby be deformed, so that a space between the opening portion and a sealing member is shut off by the shutoff member when the closure element closes the opening portion. The shutoff member is deformed and continues to contact the second valve seat under normal and high temperature environments when the closure element closes the opening portion.03-08-2012
20110168090SPRAY NOZZLE - A spray nozzle 07-14-2011
20100206224DEVICE FOR THE DEPOSITION OF LAYERS - A device for the deposition of layers, includes a frame (08-19-2010
20100000466P-Type Semiconductor Zinc Oxide Films Process for Preparation Thereof, and Pulsed Laser Deposition Method Using Transparent Substrates - A p-type semiconductor zinc oxide (ZnO) film and a process for preparing the film are disclosed. The film is co-doped with phosphorous (P) and lithium (Li). A pulsed laser deposition scheme is described for use in growing the film. Further described is a process of pulsed laser deposition using transparent substrates which includes a pulsed laser source, a substrate that is transparent at the wavelength of the pulsed laser, and a multi-target system. The optical path of the pulsed laser is arranged in such a way that the pulsed laser is incident from the back of the substrate, passes through the substrate, and then focuses on the target. By translating the substrate towards the target, this geometric arrangement enables deposition of small features utilizing the root of the ablation plume, which can exist in a one-dimensional transition stage along the target surface normal, before the angular width of the plume is broadened by three-dimensional adiabatic expansion. This can provide small deposition feature sizes, which can be similar in size to the laser focal spot, and provides a novel method for direct deposition of patterned materials.01-07-2010
20100326353COATING AND DEVELOPING APPARATUS - Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.12-30-2010
20120318195COATING DEVICE - A coating device includes a main body and at least one ionic-wind generating device. The main body includes a first surface, a second surface opposite to the first surface, and a plurality of receiving holes passing through the first surface and the second surface. Each receiving hole is used for receiving an element which needs to be coated and includes an inlet for letting the element to enter the receiving hole. The inlet is positioned on the first surface. The at least one ionic-wind generating device is positioned on one side of the main body, and is used for blowing ionic-wind towards a direction opposite to the second surface, thus blowing ionic-wind towards the element before the element enters the inlet.12-20-2012
20120266814LASER BEAM INTENSITY DISTRIBUTION - A heat source for a material processing operation, such as direct laser deposition, comprises a source of laser light, an optical element to modulate the laser light to provide a beam and means for traversing the beam over the substrate in use in a predetermined direction. The beam has a predetermined intensity distribution over its cross-sectional area so as to regulate the temperature distribution in the material resulting from the absorption of laser energy by the material.10-25-2012
20110048324IMAGE RECORDING APPARATUS - An image recording apparatus includes: a curable solution layer forming device that forms a curable solution layer by supplying a curable solution to a recording member or an intermediate member, the curable solution including at least a curable material to be cured by an external stimulus, and a water-absorbing component; an ink applying device that applies an ink to the curable solution layer; a stimulus supplying device that supplies the stimulus for curing the curable solution layer, to the curable solution layer; and a water-absorption controlling component-contact device that brings a liquid, including a component that controls water-absorption by the water-absorbing component, into contact with the curable solution layer, before or after the ink is applied to the curable solution layer by the ink applying device.03-03-2011
20110226179PROCESS AND APPARATUS FOR DRYING & CURING A CONTAINER COATING AND CONTAINERS PRODUCED THEREFROM - The present invention generally relates to apparatus and methods of coating glass containers and the containers produced therefrom. In particular, embodiments of the invention provide a method of coating glass containers by at least partially drying and/or curing one or more organic coatings on a glass container using accelerated drying.09-22-2011
20100236476Substrate Support Structure, Clamp Preparation Unit, and Lithography System - A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer.09-23-2010
20120325144Electronic Device Having an Electrode with Enhanced Injection Properties - An electronic device having an electrode with enhanced injection properties comprising a first electrode and a first layer of cross-linked molecular charge transfer material on the first electrode. The cross-linked molecular charge transfer material may be an acceptor, which may consist of at least one of: TNF, TN9(CN)2F, TeNF, TCNB, DCNQ, and TCAQ. The cross-linked molecular charge transfer material may also be a donor, which may consist of at least one of: Terpy, Ru(terpy)2 TTN, and crystal violet.12-27-2012
20080223297METHOD AND APPARATUS OF FORMING ALIGNMENT FILM - In a method of manufacturing an LCD device, an atomic beam is irradiated onto a thin film including a carbon-carbon double bond to form a polarized functional group by transforming the carbon-carbon double bond into a carbon-carbon single bond and a radical state. Then, a polarity preserving material is combined with the polarized functional group so as to preserve a polarity of the polarized functional group. According to the present invention, the alignment film is formed on the thin film transistor unit cell and on the color filter unit cell by a non-contact method. Therefore, time of forming the alignment film is reduced and alignment of the liquid crystal molecules is improved.09-18-2008
20080223296Paint Booth For Plants For Painting Products - A paint booth for plants for painting products comprising: a supporting structure (09-18-2008
20110265717COATED COATING MACHINE COMPONENT, PARTICULARLY BELL PLATE,AND CORRESPONDING PRODUCTION METHOD - A coating machine component, e.g., a bell plate for a rotary atomizer, and corresponding production methods are disclosed. An exemplary coating machine component includes a molded base body and a functional element for providing at least one of mechanical stiffening, chemical and/or electrical functionalizing of the coating machine component. The functional element may be made from a material having a greater mass density than the base body. An exemplary functional element may be a coating that is at least partially applied to the base body.11-03-2011
20120255489QUARTZ TUBE LEVELING APPARATUS AND SYSTEMS FOR SIMULTANEOUS LEVELING AND PINNING OF RADIATION CURABLE INKS - Systems for leveling UV-curable gel ink include a leveling member having a conformable surface. The leveling member is a quartz tube rotatable about a longitudinal axis, and connected to a mandrel, with conformable VITON O-rings interposing the mandrel and the quartz tube. A UV source is disposed within the quartz tube, and configured to emit light through the quartz tube and the conformable surface onto a surface of a substrate passing through a leveling or pressure nip defined by the quartz tube and a backing member or pressure belt.10-11-2012
20120272896APPARATUS TO CAPTURE AEROSOLS, FLUID JETTING APPARATUS, AND AEROSOL DIVERTERS - Apparatus to capture aerosols, fluid jetting apparatus, and aerosol diverters are disclosed. An example aerosol capture apparatus includes a corona wire to generate ions, and a reference plate positioned below the corona wire and above a substrate on which a fluid is to be deposited, the reference plate to provide a reference potential to direct the ions toward the reference plate to force aerosol particles associated with the fluid toward the reference plate.11-01-2012
20120017829REDUCTION OF STRAY LIGHT DURING SINTERINIG - A conductive particle sintering system has light blocking coating, aperture, or shutter to allow energy from a radiant source, such as a flash lamp, to reach a desired portion of a workpiece to be sintered, while blocking stray light from reaching other workpieces and/or other portions of a workpiece being processed to prevent stray light from partially sintering the other workpieces and/or other portions of a workpiece.01-26-2012

Patent applications in class WITH MEANS TO APPLY ELECTRICAL AND/OR RADIANT ENERGY TO WORK AND/OR COATING MATERIAL

Patent applications in all subclasses WITH MEANS TO APPLY ELECTRICAL AND/OR RADIANT ENERGY TO WORK AND/OR COATING MATERIAL