Entries |
Document | Title | Date |
20080216741 | DYNAMIC FILM THICKNESS CONTROL SYSTEM/METHOD AND ITS UTILIZATION - A dynamic film thickness control system/method and its utilization consisting of a minimum of one mask plate arranged between a substrate and a vapor source. A film thickness control device is utilized for real-time control over deposited film thickness and gradually moves the mask plate according to the film thickness control value acquired by the film thickness control device, enabling the mask plate to mask film zones on the said substrate to achieve the film thickness of a design objective. When the required zones of deposition are masked, the deposition of a particular film layer is completed. | 09-11-2008 |
20080223299 | SYSTEM FOR DETECTING PLASMA REACTION AND METHOD FOR USING THE SAME - A system for detecting a plasma reaction and a method for using the same are provided. When the plasma reaction changes its reaction power, a lightness variation accompanies the power change. The system comprises a sensing device with a resistance that the resistance of the sensing device will be changed in response to the lightness variation; thereby the system can detect the status of the plasma reaction. | 09-18-2008 |
20080245299 | MARKING SYSTEM AND METHOD - A marking system may hold a container from which markers are dispensed and identify a marker characteristic regarding the markers in the container. The marking system may also receive activation of a trigger, dispense a marker from the container when the trigger is activated, and store the marker characteristic and time data when the trigger is activated. | 10-09-2008 |
20080251013 | Resist pipe and resist coating device - A resist pipe and a resist coating device are provided. Support portions are provided at an inner wall of a resist supply portion towards a cross-sectional center of the resist supply portion from three locations. The support portions are provided at equal intervals at the inner wall, and the leading ends thereof extend to positions at which a circular rod-shaped liquid level sensor portion is nipped by a peripheral surface of the liquid level sensor portion. In this manner, the support portions support the liquid level sensor portion from three directions, and gaps are formed between the liquid level sensor portion and the inner wall of the resist supply portion. The liquid level sensor portion inside the resist supply portion is supported by the support portions such that a sensing portion is substantially in the same plane as an inlet aperture of the resist supply portion. | 10-16-2008 |
20080264338 | PARTICLE-MEASURING SYSTEM AND PARTICLE-MEASURING METHOD - The present invention provides a particle measuring system which is provided in a processing system that generates an atmosphere obtained by exhausting air or a gas in a processing chamber by a vacuum pump and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe which connects an exhaust opening of the processing chamber with the vacuum pump, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films. | 10-30-2008 |
20080264339 | Film forming method, film forming system and recording medium - After silicon nitride films have been formed on wafers by a film forming process in a reaction vessel, the reaction vessel is processed by a purging process specified by a purging recipe and compatible with the film forming process to suppress production of gases and particles by removing surface parts of films deposited on the inside surface of the reaction vessel and causative of production of gases and particles. | 10-30-2008 |
20080295771 | POWER-DELIVERY MECHANISM AND APPARATUS OF PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION USING THE SAME - A power-delivery mechanism is provided in the present invention, which utilizes an element with airtight and flexible characteristics coupled to a power-generating unit so as to generate a motion in a specific direction. Besides, an apparatus of plasma -enhanced chemical vapor deposition (PECVD) is also provided in the present invention, which comprises the power-delivery mechanism to load/unload a workpiece onto a stage for processing automatically. Meanwhile, the present invention also provides a height-adjusting unit and a position-indicating unit allowing the operator to adjust the distance between an upper electrode and a lower electrode of the PECVD so that the operator is capable of monitoring and adjusting the distance easily between the upper electrode and the lower electrode outside the chamber of the PECVD. | 12-04-2008 |
20080314316 | MONITORING SYSTEM AND MONITORING METHOD FOR SUBSTRATE PRODUCTION APPARATUS - The substrate production apparatus monitoring system of the present invention comprises a data collection unit, a data storage unit, a control state identification unit, and a data evaluation unit. The data collection unit collects control parameter data from the substrate production apparatus including a subsidiary equipment. The control parameter data collected by the data collection unit are stored in the data storage unit. The control state identification unit identifies the control state of the substrate production apparatus based on the data in the data storage unit. The data evaluation unit evaluates the identified, individual control state as to whether it is abnormal/normal. In this way, any abnormal event in the apparatus even in the idle mode can be detected prior to the substrate processing, preventing reduction in the production yield. | 12-25-2008 |
20090000548 | SUBSTRATE HOLDER AND VACUUM FILM DEPOSITION APPARATUS - A substrate holder includes a holding unit which holds a substrate, a temperature measurement unit which is provided at a surface on a substrate side of the holding unit and is brought into contact with the substrate to measure a temperature of the substrate and a signal output unit which outputs temperature measurement signals from the temperature measurement unit. A vacuum film deposition apparatus has at least one vacuum film deposition unit including the substrate holder a vacuum chamber, a holder support portion provided within the vacuum chamber, connected to a connection portion of the substrate holder and supporting the substrate holder, a film deposition device forming a film by vacuum film deposition on the substrate held in the substrate holder and a signal receiving unit connected to the signal output unit and receiving the temperature measurement signals. | 01-01-2009 |
20090000549 | Substrate processing method and apparatus - There is provided a substrate processing method and apparatus which can measure and monitor thickness and/or properties of a film formed on a substrate as needed, and quickly correct a deviation in process conditions, and which can therefore stably provide a product of constant quality. A substrate processing method for processing a substrate having a metal and an insulating material exposed on its surface in such a manner that a film thickness of the metal, with an exposed surface of the metal as a reference plane, is selectively or preferentially changed, including measuring a change in the film thickness and/or a film property of the metal during and/or immediately after processing, and monitoring processing and adjusting processing conditions based on results of this measurement. | 01-01-2009 |
20090025638 | Apparatus for Forming Layered Object - A layered-object forming apparatus ( | 01-29-2009 |
20090044750 | Apparatus for wafer level arc detection at an electrostatic chuck electrode - Wafer level arc detection is provided in a plasma reactor using an RF transient sensor sensing voltage at an electrostatic chucking electrode, the RF sensor being coupled to a threshold comparator, and a system controller responsive to the threshold comparator. | 02-19-2009 |
20090056627 | METHOD AND APPARATUS FOR MONITORING PLASMA-INDUCED DAMAGE USING DC FLOATING POTENTIAL OF SUBSTRATE - A method for monitoring plasma-induced damage to a substrate while being processed in a plasma CVD apparatus includes: measuring DC floating potential of the substrate using a detection electrode in contact with the substrate while the substrate is processed in the apparatus; and detecting abnormality as plasma-induced damage based on the measured DC floating potential. | 03-05-2009 |
20090078198 | CHAMBER COMPONENTS WITH INCREASED PYROMETRY VISIBILITY - The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises a target component comprises a material with higher emissivity than the one or more substrates. | 03-26-2009 |
20090095220 | TEMPERATURE CONTROLLED SHOWERHEAD - A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger. | 04-16-2009 |
20090107399 | System and Method of Measuring Film Height on a Substrate - A system of film height measurements and method of measuring film height on a substrate are disclosed. A radiation source illuminates a beam of radiation in the optical range onto a substrate being coated with a layer having a nominal film height is provided. Reflected signals are recorded for two positions and a film height difference of the layer is calculated. | 04-30-2009 |
20090114152 | APPARATUS FOR PLASMA TREATMENT - An apparatus for treating with plasma a specimen mounted on a specimen table and a next specimen mounted thereon after the treatment of the specimen is completed in a vacuumed container, comprises, a detector for measuring a temperature of the specimen table, and an adjustor for adjusting the temperature of the specimen table obtained when the next specimen is treated to have a value determined from a predetermined change in temperature of the specimen and one of the temperature of the specimen table measured by the detector and a temperature of returning refrigerant obtained after the treatment of the specimen is started, wherein the adjustor obtains the predetermined change in temperature of the specimen from the temperatures of the specimen measured in respective conditions in each of which conditions the treatment is continued until a changing rate of the temperature of the specimen becomes not more than a predetermined degree. | 05-07-2009 |
20090126630 | Spindle Spray Coating System - A spindle spray coating system including a spindle conveyor system for horizontally transporting parts supported on spindles within the system. A spindle rotation station assembly is also provided for rotating individual spindles supporting parts during spraying. A spray containment closed spray booth for containment of parts supported on spindles during the spray operation by an adjustable spray system to minimize environmental and operator exposure to the coating materials being sprayed. A second spray containment closed spray booth may also be provided for containment of parts supported on spindles during a secondary spray operation by an adjustable secondary spray system. Following the spray operation(s), a vision inspection system is used to inspect the parts that have been coated. An automated defective part rejection assembly is also provided which includes a vertical lifting mechanism, and a gripper mechanism for gripping defective parts, and lifting and rotating the parts through a 180 degree motion using a balanced counterweight, followed by release of the parts from the gripper mechanism for disposal. | 05-21-2009 |
20090133624 | Coating Apparatus - The present invention has as an object to provide a coating apparatus for forming a coating film on each of many lenses in a short time. To attain this object, in the coating apparatus for a lens according to the invention, a lens support portion of a lens centering device, a lens support portion of a lens spinning device, and a lens support portion of a lens drying device are arranged at equal distances. A pair of lens holding portions of a lens transport device are provided at the same distance as the distance between the lens support portions. The first lens holding portion of the lens holding portions transports the lens from the lens support portion of the centering device to the lens support portion of the applicator device, and the second lens holding portion of the lens holding portions simultaneously transports the lens from the lens support portion of the applicator device to the lens support portion of the drying device. | 05-28-2009 |
20090133625 | Coating Apparatus - The present invention provides a coating apparatus which can form a stable photochromic coating film. In the invention, a centering device, a lens height measuring device, a primer fluid applicator device, a primer spinning device, a drying device, a photochromic fluid applicator device, a photochromic spinning device, a UV device and a lens transport means comprising a pair of handling devices are provided to a coating apparatus. In the coating apparatus, it is possible to produce many photochromic lenses more efficiently by arranging devices and the lens transport means in such a manner that lens support portions of the centering device, the lens height measuring device, the primer spinning device, and the lens drying device are disposed inside the track of one handling device of the lens transport means, lens support portions of the UV device are disposed inside the track of the other handling device of the lens transport means, and the lens support portion of the photochromic spinning device is disposed inside both of the tracks. | 05-28-2009 |
20090194024 | CVD APPARATUS - Embodiments of the present invention generally relate to methods and apparatus for chemical vapor deposition (CVD) on a substrate, and, in particular, to a process chamber and components for use in metal organic chemical vapor deposition. The apparatus comprises a chamber body defining a process volume. A showerhead in a first plane defines a top portion of the process volume. A carrier plate extends across the process volume in a second plane forming an upper process volume between the showerhead and the susceptor plate. A transparent material in a third plane defines a bottom portion of the process volume forming a lower process volume between the carrier plate and the transparent material. A plurality of lamps forms one or more zones located below the transparent material. The apparatus provides uniform precursor flow and mixing while maintaining a uniform temperature over larger substrates thus yielding a corresponding increase in throughput. | 08-06-2009 |
20090194025 | APPARATUS TO SENSE TEMPERATURE OF INK-JET HEAD - An apparatus to sense the temperature of an ink-jet head includes at least one or more CMOS (complementary metal oxide semiconductor) lateral BJTs (bipolar junction transistors) to sense the temperature of the ink-jet head, and a current supply unit to supply a current to the CMOS lateral BJTs. Minimum sized CMOS lateral BJTs are applied to an ink-jet printer head so that precise temperature control can be performed in a shuttle or array type ink-jet printer. | 08-06-2009 |
20090255466 | REAGENT DISPENSING APPARATUS AND DELIVERY METHOD - This invention relates to a vapor or liquid phase reagent dispensing apparatus that may be used for dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices. This invention reduces the number of container designs required to support different applications. A standard two port container without a tube can be converted to a container capable of being used in applications which require a tube (i.e., bubbler tube for gas delivery or a dip tube for liquid delivery), by inserting a gasket/tube adapter between one of the ports and the corresponding valve in accordance with this invention. | 10-15-2009 |
20090266298 | PLASMA DOPING APPARATUS - On an upper wall of a vacuum container opposing a sample electrode, a plasma-invasion prevention-and-electron beam introducing hole is installed which is communicated with an electron beam introducing tube, and is used for introducing an electron beam toward a substrate in the vacuum container, as well as for preventing invasion of plasma into the electron beam introducing tube. In this structure, supposing that the Debye length of the plasma is set to λ | 10-29-2009 |
20090288599 | SELF-WELDED METAL-CATALYZED CARBON NANOTUBE BRIDGES AND SOLID ELECTROLYTIC NON-VOLATILE MEMORIES - Systems and methods for simultaneously creating a plurality of carbon nanotubes on substrates and across large wafers via employing vapor deposition of material on the surface of the substrate and fluid flow to aid in and direct the growth of the nanotubes in pre-specified locations and directions. In addition, the nanotubes created can be used as gas and chemical sensors, electronic switches, resonators, and non-volatile memory devices. | 11-26-2009 |
20090308314 | VAPOR DEPOSITION DEVICE - A vapor deposition device includes a connecting member, a support member and an inspecting member. The connecting member has a connecting end. The support member has a bottom portion and a top portion positioned on the connecting end. Receiving holes are defined in the support component between the top portion and the bottom portion and configured to receive workpieces. Several pairs of through holes are defined in the support component adjacent to the bottom portion. Each pair of through holes is substantially coaxial with each other and positioned in a horizontal plane. The inspecting component includes a light emitting member and a light receiving member configured to be aligned with one pair of through holes. | 12-17-2009 |
20090314204 | LEAKAGE DETECTION DEVICE FOR COATING MATERIAL AND COATING MATERIAL FILING SYSTEM - It is a subject to provide a coating material leakage detection device capable of finding contamination of a hydraulic fluid at an early stage and capable of preventing the degradation of a coating quality of a work. For this purpose, coating material leakage from a coating material chamber to a hydraulic fluid chamber in a coating material cartridge is detected by a coating material leakage detection device. The coating material cartridge is attached detachably to a coating material filling device, and the coating material chamber and the hydraulic fluid chamber are partitioned from each other by way of a deformable partition body. Further, the coating material leakage detection device has a contaminant detection means for detecting the contaminant in the hydraulic fluid attributable to the coating material leakage. Accordingly, contamination of the hydraulic fluid can be found at an early stage. | 12-24-2009 |
20100006029 | Apparatus for aligning dispenser system, and dispenser alignment system - An apparatus for aligning a dispenser includes a table having a first alignment mark, an alignment plate provided along at least one side of the table, at least one syringe supplying a dispensing material to the alignment plate through a nozzle provided at one end portion thereof to form a second alignment mark, a first image camera provided along a side of the syringe and detecting an image of the second alignment mark, a second image camera detecting an image of the first alignment mark, and an alignment control unit aligning the image of the second alignment mark and a first reference position, and aligning an image of the first alignment mark and a second reference position. | 01-14-2010 |
20100012031 | Method and apparatus for optically characterizing the doping of a substrate - The invention relates to a method of optical characterization, comprising a step of evaluating the doping of a substrate (SUB) using a reflected beam emanating from a light source, said method being carried out using apparatus comprising: said light source (LAS) to produce an incident beam (I) in an axis of incidence; a first detector (DET | 01-21-2010 |
20100031884 | SUSCEPTOR RING - A one-piece susceptor ring for housing at least one temperature measuring device is provided. The susceptor ring includes a plate having an aperture formed therethrough and a pair of side ribs integrally connected to a lower surface of the plate. The side ribs are located on opposing sides of the aperture. The susceptor ring further includes a bore formed in each of the pair of side ribs. Each bore is configured to receive a temperature measuring device therein. | 02-11-2010 |
20100043706 | Apparatus and method for measuring optical characteristics of an object - Optical characteristic measuring systems and methods such as for determining the color or other optical characteristics of teeth are disclosed. Perimeter receiver fiber optics preferably are spaced apart from a source fiber optic and receive light from the surface of the object/tooth being measured. Light from the perimeter fiber optics pass to a variety of filters. The system utilizes the perimeter receiver fiber optics to determine information regarding the height and angle of the probe with respect to the object/tooth being measured. Under processor control, the optical characteristics measurement may be made at a predetermined height and angle. Various color spectral photometer arrangements are disclosed. Translucency, fluorescence, gloss and/or surface texture data also may be obtained. Audio feedback may be provided to guide operator use of the system. The probe may have a removable or shielded tip for contamination prevention. A method of producing dental prostheses based on measured data also is disclosed. Measured data also may be stored and/or organized as part of a patient data base. Such methods and implements may be desirably utilized for purposes of detecting and preventing counterfeiting or the like. Low cost and small form factor spectrometers, and methods for manufacturing the same, also are disclosed. Spectrometers and spectrophotometers embedded in printing and scanning and other type devices, as well as computer companion devices, scope-type devices and the like, also are disclosed. Data encoding based on such devices also may be implemented. | 02-25-2010 |
20100050939 | METHOD FOR DETERMINING THE PERFORMANCE OF IMPLANTING APPARATUS - A method for determining the performance of an implanting apparatus comprises the steps of forming a dopant barrier layer on a substrate, forming a target layer on the dopant barrier layer, performing an implanting process by using the implanting apparatus to implant dopants into the target layer such that the target layer becomes conductive, measuring at least one electrical property of the target layer, and determining the performance of the implanting apparatus by taking the electrical property into consideration. In one embodiment of the present invention, the dopant barrier layer is silicon nitride layer, the target layer is a polysilicon layer, and the electrical property is the sheet resistance of the conductive polysilicon layer. | 03-04-2010 |
20100050940 | SUBSTRATE PROCESSING SYSTEM, CARRYING DEVICE AND COATING DEVICE - A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state. | 03-04-2010 |
20100058983 | Methods, Systems, and Products for Marking Concealed Objects - Methods, systems, apparatuses, and products are disclosed for locating concealed objects by discharging the contents of an aerosol container. A housing encloses an inner volume, and a hollow conduit extends along the housing. An elongate rod slides within the conduit. An actuator of the aerosol container is engaged between a discharge position and a non-discharge position by movement of the elongate rod. | 03-11-2010 |
20100089317 | APPARATUS FOR COATING LENSES - [Problem] To provide a coating apparatus capable of automatically executing a series of steps of measuring the shape of a lens and applying a primer solution thereon, drying the primer solution and applying a photochromic coating solution thereon, and curing the coated solutions by the UV irradiation, liberating the operator from the work of setting the lenses piece by piece. | 04-15-2010 |
20100107978 | DEPOSITION FROM LIQUID SOURCES - A liquid injector is used to vaporize and inject a silicon precursor into a process chamber to form silicon-containing layers during a semiconductor fabrication process. The injector is connected to a source of silicon precursor, which preferably comprises liquid trisilane in a mixture with one or more dopant precursors. The mixture is metered as a liquid and delivered to the injector, where it is then vaporized and injected into the process chamber. | 05-06-2010 |
20100122656 | PARTICULATE MATERIAL METERING AND VAPORIZATION - Apparatus for metering and vaporizing a particulate material, includes a metering device for metering particulate material including: a reservoir for receiving particulate material; a housing having an internal volume and having first and second openings; a rotatable shaft disposed in the internal volume, the shaft having a smooth surface and a circumferential groove; a structure disposed in the reservoir for delivery and cooperating with the rotating shaft for fluidizing particulate material and transporting it from the reservoir into the groove; the shaft and internal volume cooperating such that particulate material is transported by the groove; a scraper cooperates with the groove to dislodge particulate material retained therein and fluidize the scraped particulate material, and deliver metered amounts of particulate material through the second opening; and a flash evaporator that receives and flash vaporizes the metered particulate material. | 05-20-2010 |
20100186667 | VERTICAL HEAT PROCESSING APPARATUS AND COMPONENT FOR SAME, FOR FORMING HIGH DIELECTRIC CONSTANT FILM - A vertical heat processing apparatus for forming a high dielectric constant film of a metal oxide by deposition includes a reaction container configured to accommodate a plurality of target substrates at intervals in a vertical direction; a support member configured to support the target substrates inside the reaction container; a heater configured to heat the target substrates inside the reaction container; an exhaust system configured to exhaust gas from inside the reaction container; and a gas supply system configured to supply a metal source gas and an oxidizing gas into the reaction container, wherein the gas supply system includes a gas nozzle disposed inside the reaction container, and the gas nozzle is made of a metal consisting mainly of titanium. | 07-29-2010 |
20100206228 | Chemical Mechanical Vapor Deposition Device for Production of Bone Substitute Material - A method for fabricating a substitute component for bone, including the processes of: provision of a chemical spray including at least three of calcium chloride, hydrogen phosphate, hydrogen carbonate and water to form a combined solution; reaction and precipitation of the combined solution onto a substrate; allowing the precipitated particles to form a porous structure on the substrate; applying substantially isostatic pressure to the porous structure to form a compressed structure; and (optional) providing one or more through-holes in the compressed structure to promote osteoinduction. | 08-19-2010 |
20100212590 | APPARATUS FOR MANUFACTURING MOLTEN ZINC COATED STEEL SHEET - An apparatus for manufacturing a molten zinc coated steel sheet includes a molten zinc coating device, a temper rolling mill, an acid solution contacting device, and a cleaning device connected in tandem, wherein the acid solution contacting device and the cleaning device are separated from each other with a region therebetween and an absolute humidity controller is disposed in the region between the acid solution contacting device and the cleaning device. | 08-26-2010 |
20100251964 | SYSTEM AND METHOD FOR GLAZING - A system for glazing a sash is disclosed. The system comprises at least two position assemblies, a back bedding glazing compound applicator assembly, and a stabilizer assembly. The position assemblies each include a position member defining a distal end and a housing. Each position member is selectively slidable between a stored position and an extended position; wherein the distal end of the positioner member is extend outwardly from the housing and contacts a glazing leg of the sash when the positioner member is moved into the extended position. The back bedding glazing compound applicator assembly is configured to move from a stored position to a dispensing position, wherein the back bedding glazing compound applicator assembly includes a nozzle head that is configured to fit within a gap defined between an interior surface of the sash and an outer edge of a viewing element disposed within an opening of the sash when the back bedding glazing compound applicator assembly is in the dispensing position and wherein the back bedding glazing compound applicator assembly is fluidly connected to a back bedding glazing compound supply source. The stabilizer assembly is configured to retain the viewing element in a fixed position with respect to the sash while back bedding glazing compound is being dispensed by nozzle head. | 10-07-2010 |
20100288195 | PLASMA PROCESSING METHOD AND APPARATUS - Plasma processing of plural substrates is performed in a plasma processing apparatus, which is provided with a plasma processing chamber having an antenna electrode and a lower electrode for placing and retaining the plural substrates in turn within the plasma processing chamber, a gas feeder for feeding processing gas into the processing chamber, a vacuum pump for discharging gas from the processing chamber via a vacuum valve, and a solenoid coil for forming a magnetic field within the processing chamber. At least one of the plural substrates is placed on the lower electrode, and the processing gas is fed into the processing chamber. RF power is fed to the antenna electrode via a matching network to produce a plasma within the processing chamber in which a magnetic field has been formed by the solenoid coil. This placing of at least one substrate and this feeding of the processing gas are then repeated until the plasma processing of all of the plural substrates is completed. An end of seasoning is determined when a parameter including an internal pressure of the processing chamber has become stable to a steady value with plasma processing time. | 11-18-2010 |
20100307414 | Take-Up Type Vacuum Deposition Apparatus - [Object] To provide a take-up type vacuum deposition apparatus capable of preventing a thermal deformation of a base material due to charged particles leaked from a neutralization unit without an increase in size of the apparatus. | 12-09-2010 |
20100326354 | SUBSTRATE PROCESSING SYSTEM, CARRYING DEVICE, AND COATING DEVICE - A substrate processing system includes a processing unit, a substrate loading unit, a substrate unloading unit, and a carrying unit. A carrying device has a constitution in which a suction portion suctioning and holding a substrate is rotatable about an arm portion provided in a base portion and the substrate is rotated in the state where the substrate is held by a holding portion. A coating device has a constitution in which a liquid material is ejected from a nozzle to both surfaces of the substrate rotating in an upright state. | 12-30-2010 |
20100326355 | SEMICONDUCTOR PROCESSING PARTS HAVING APERTURES WITH DEPOSITED COATINGS AND METHODS FOR FORMING THE SAME - Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such as by chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions. In some embodiments, the aspect ratios of the one or more other portions are about 15:1 or less, or about 7:1 or less, and have a cylindrical or conical cross-sectional shape. The holes are coated with a protective coating, such as a silicon carbide coating, by chemical vapor deposition, including chemical vapor deposition at atmospheric pressure. | 12-30-2010 |
20110005460 | VACUUM VAPOR DEPOSITION APPARATUS - Provided is a vacuum vapor deposition apparatus in which a crucible as a container for vaporizing a vapor deposition material is placed inside a vacuum chamber and a film is formed on a substrate by use of the vapor deposition material vaporized in the crucible. The apparatus includes measuring means for measuring a bulk of the vapor deposition material in the crucible from an outside of the vacuum chamber. | 01-13-2011 |
20110048325 | Gas Distribution Apparatus and Substrate Processing Apparatus Having the Same - Provided are a gas distribution apparatus and a substrate treating apparatus including the same. The substrate treating apparatus includes a chamber comprising a reaction space, a substrate seat unit disposed in the reaction space of the chamber to radially seat a plurality of substrates with respect to a center thereof, and a gas distribution device comprising a first gas distribution part configured to eject at least two source materials onto a substrate through routes different from each other and a second gas distribution part configured to eject a source material having a decomposition temperature greater than an average of decomposition temperatures of the at least two source materials onto the substrate. The first gas distribution part is divided into at least two sections and disposed such that the second gas distribution part is positioned therebetween; and couplable and separable to/from one another. | 03-03-2011 |
20110079178 | THICKNESS MEASURING DEVICE, COATING INSTALLATION, METHOD OF MEASURING THE THICKNESS OF A LAYER, AND USE OF A THICKNESS MEASURING DEVICE - A thickness measuring device for measuring the thickness of a layer on a substrate surface of a substrate is provided, including multiple piezoelectric crystal elements, which are arranged in an array corresponding to multiple positions on the substrate surface and which are adapted to monitor the deposition rate of a vapor to be deposited on the substrate surface. | 04-07-2011 |
20110088620 | DRUM COATER HAVING A NIR MEASURING UNIT - The film coating device having a perforated drum is provided with a stationary NIR measuring unit on the outside of the rotating drum wall. The measurement is made through the drum wall. | 04-21-2011 |
20110120372 | PLASMA DEPOSITION APPARATUS AND DEPOSITION METHOD UTILIZING SAME - A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ | 05-26-2011 |
20110139071 | Method for fabricating copper-containing ternary and quaternary chalcogenide thin films - An apparatus for depositing a solid film onto a substrate from a reagent solution includes reservoirs of reagent solutions maintained at a sufficiently low temperature to inhibit homogeneous reactions within the reagent solutions. The chilled solutions are dispensed through showerheads, one at a time, onto a substrate. One of the showerheads includes a nebulizer so that the reagent solution is delivered as a fine mist, whereas the other showerhead delivers reagent as a flowing stream. A heater disposed beneath the substrate maintains the substrate at an elevated temperature at which the deposition of a desired solid phase from the reagent solutions may be initiated. Each reagent solution contains at least one metal and either S or Se, or both. At least one of the reagent solutions contains Cu. The apparatus and its associated method of use are particularly suited to forming films of Cu-containing compound semiconductors. | 06-16-2011 |
20110146573 | MASK ASSEMBLY FOR THIN FILM DEPOSITION OF FLAT PANEL DISPLAY - A described technology relates generally to a thin-film deposition mask assembly of a flat panel display for correcting form distortion caused by tension of a division mask. The thin-film deposition mask assembly includes: a frame for forming a penetrated opening; a first change compensating member and a second change compensating member disposed across the opening, fixed to a free end member formed by partially cutting the frame from the opening, and arranged as a pair; and a plurality of division masks being disposed to cross the first change compensating member and the second change compensating member on top sides of the first change compensating member and the second change compensating member, being fixed to both sides of the opening to receive tension in a length direction, being fixed to the first change compensating member and the second change compensating member to receive tension in a width direction, and forming a pattern opening. | 06-23-2011 |
20110146574 | INKJET ULTRASONIC CLEANING STATION - A microdeposition system includes a printhead carriage that includes N rows of nozzles and that moves along a first axis; a stage that holds a substrate; and a maintenance station located at a position along the first axis that is past an edge of the substrate. The N rows of nozzles selectively deposit droplets of fluid manufacturing material onto the substrate. The maintenance station includes a capping station and an ultrasonic cleaning station located in a middle of the capping station. N is an integer greater than one. | 06-23-2011 |
20110185971 | Laser doping - The disclosed apparatus and method provides substrate impurity doping wherein a laser rapidly scans a substrate while simultaneously a uniform laminar flow of reactive gas is injected, the interaction of the laser radiation and the dopant results in a uniform diffusion of the dopant species in all planes (X,Y,Z) of the substrate. Laser energy density, wavelength, and pulse geometry are adjustable, in a simple system for volume manufacturing, to provide depth and dose control of the dopant. The system optics can be focused to form a high resolution laser beam to directly write the doping area pattern geometry. Alternatively the laser beam can be optically expanded to form a large diameter beam for large area diffusion of the dopant through a patterned mask. | 08-04-2011 |
20110247554 | SYSTEM AND APPARATUS FOR PREPPING A SURFACE USING A COATING PARTICLE ENTRAINED IN A CONTINUOUS OR PULSED WATERJET OR AIRJET - Prepping a surface entails entraining a coating particle into a fluid stream, directing the fluid stream containing the coating particle at the surface to be prepped to thereby prep the surface using the coating particle. The prepped surface can then be coated using the same or substantially similar coating particle. This technique can be used with a continuous airjet, a forced pulsed airjet, a continuous waterjet or a forced pulsed waterjet as the carrier stream. This invention solves the problem of foreign blasting particles becoming embedded in the atomic matrix of the surface to be prepped, which can result in unpredictable behaviour of the surface properties and even catastrophic failure. | 10-13-2011 |
20110247555 | DEVICE FOR CREATING AND CONVEYING A GAS-POWDER MIXTURE - The invention relates to a device for creating and conveying a gas-powder mixture having a powder receiving space ( | 10-13-2011 |
20120000421 | CONTROL APPARATUS FOR PLASMA IMMERSION ION IMPLANTATION OF A DIELECTRIC SUBSTRATE - A control apparatus for plasma immersion ion implantation of a dielectric substrate which includes an electrode disposed above a generated plasma in a plasma chamber. The electrode is biased with negative voltage pulses at a potential that is higher than a potential of a substrate or cathode configured to receive ion implantation. The electrode is more negative to give the electrons generated as secondary electrons from the electrode sufficient energy to overcome the negative voltage of the high voltage sheath around the substrate thereby reaching the substrate. These electrons are accelerated toward the substrate to neutralize charge build-up on the substrate. | 01-05-2012 |
20120006263 | FILM DEPOSITION APPARATUS - When a film is to be deposited on a semiconductor substrate or the like in a heating ambient, the semiconductor substrate is caused to warp (curve) to a considerable extent merely due to an increased temperature. The warpage leads to problems such as degradation of the homogeneity of the quality of the film deposited on the substrate and a high possibility of generation of a crack in the substrate. Accordingly, a film deposition apparatus of the present invention heats the substrate both from above and from below a main surface of the substrate so that a temperature gradient (temperature difference) between the upper side and the lower side of the main surface is reduced and the warpage of the substrate is suppressed. More preferably a measurement unit for measuring the curvature or warpage of the substrate is included. | 01-12-2012 |
20120031331 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING APPARATUS - In a manufacturing process of a semiconductor device by forming a structure film on a substrate in a reaction chamber of a manufacturing apparatus, cleaning inside the reaction chamber is performed. That is, a precoat film made of a silicon nitride film containing boron is deposited on an inner wall of the reaction chamber, a silicon nitride film not containing boron is formed as the structure film on the substrate in the reaction chamber, and the inner wall of the reaction chamber is dry etched to be cleaned. At this time, the dry etching is terminated after boron is detected in a gas exhausted from the reaction chamber. | 02-09-2012 |
20120037076 | MULTI-ENVIRONMENT COATING DEVICE - A coating device includes a main body defining a first and a second receiving rooms, a base received in the first receiving room for supporting work-pieces, a cleaning device opposing the first receiving room, a spraying device positioned on the top of the first receiving room for spraying coating materials to the work-pieces, a rotary drum device received in the first receiving room for uniformly coating the coating materials on the work-pieces, a heating device opposing the first receiving room for heating the coating materials to form a first film, a drive device for rotating, raising and lowering the base, a transportation device positioned in the second receiving room for transporting the base from the first receiving room to the second receiving room, a vacuum coating device opposing the second receiving room for coating a second film on the work-pieces after completing coating the first film on the work-pieces. | 02-16-2012 |
20120090542 | REACTOR DEVICE WITH REMOVABLE DEPOSITION MONITOR - A reactor apparatus includes a first chamber coupled to a first source of vacuum, a monitor chamber isolated from the first chamber and coupled to a second source of vacuum, and at least one removable deposition monitor disposed in the monitor chamber. | 04-19-2012 |
20120137972 | FILM FORMING APPARATUS - A film forming apparatus which forms a film on a long substrate includes a film forming unit, a transport unit which transports the long substrate, a supply portion which supplies an inspection substrate onto the long substrate, and a substrate recovery portion which recovers the inspection substrate that was placed on the long substrate and that has a film formed thereon by the film forming unit. | 06-07-2012 |
20120145077 | ORGANIC LAYER DEPOSITION APPARATUS - An organic layer deposition apparatus for forming an organic layer while a substrate is being moved, in which an interval between the substrate and the organic layer deposition apparatus can be measured at a vacuum condition. | 06-14-2012 |
20120152167 | Wallpaper Border Sizing Sealant Applicator Tool & Paint Trim Guide - A wallpaper border sealant applicator tool includes a cross-beam member having slide block members attached to each end thereof with a through opening in each slide block member. A column member is mounted in each of the through openings for sliding engagement of the cross-beam member with respect to the column members. Each end of a guide bar member is attached to the column members such that a wallpaper border width can be set between the cross-beam member and the guide bar member to provide a tool for applying sealant to the wall for the subsequent attachment of a wallpaper border. | 06-21-2012 |
20120180722 | ROTARY ATOMIZER AND METHOD FOR THE CONTROL OF THE SPRAYING BODY OF SAID ROTARY ATOMIZER - Exemplary illustrations of a bell cup for a rotary atomizer and method of using the same are disclosed. The exemplary illustrations are generally directed to the control of the rotating bell plate of a rotary atomizer used for the serial coating of work pieces. An air flow component may be created by the structural design of the bell plate and/or of an element of the rotary atomizer and by the rotation of the bell plate. The air flow component may correspond to the bell plate design, and the element may be adjacent to the bell plate and stationary relative to same. The air flow component may be measured and compared to a predefined reference value. | 07-19-2012 |
20120180723 | METHOD FOR CONTROLLING THE FUNCTION OF A ROTARY ATOMIZER AND CORRESPONDING COATING INSTALLATION - Exemplary illustrations of a rotary atomizer and methods of using the same are disclosed. An exemplary illustration is directed to the function control of a rotary atomizer used for the serial coating of work pieces. This is achieved in that pressure values, which result within or outside of the directing air flow of the atomizer, may be measured and compared to predefined reference values for error-free atomizer functions. | 07-19-2012 |
20120180724 | LIQUID VAPORIZATION SYSTEM - Provided is a liquid vaporization system capable of promoting vaporization of a liquid material while solving a problem of residual liquid material. A liquid vaporization system has a liquid vaporization apparatus having a pump and a vaporizer. The vaporizer has a case, a heater provided inside the case, a heat storage plate heated by the heater, and a mesh. The mesh is formed by interweaving wires and has an overall flat plate shape. By overlapping the mesh on an upper surface of the heat storage plate, minute irregularities are formed on the heat storage plate by the mesh. A nozzle is provided above the mesh, whereby the liquid material is dropped from the nozzle onto the heat storage plate. The liquid material spreads over the heat storage plate in a thin film and is heated and vaporized on the upper surface of the heat storage plate. | 07-19-2012 |
20120186519 | PLASMA DOPING METHOD AND APPARATUS - A plasma doping method and apparatus in which a prescribed gas is introduced into a vacuum container while being exhausted by a turbomolecular pump as an exhaust apparatus. The pressure in the vacuum container is kept at a prescribed value by a pressure regulating valve. High-frequency electric power of 13.56 MHz is supplied to a coil disposed close to a dielectric window which is opposed to a sample electrode, whereby induction-coupled plasma is generated in the vacuum container. Every time a prescribed number of samples have been processed, a dummy sample is subjected to plasma doping and then to heating. The conditions for processing of a sample are controlled so that the measurement value of the surface sheet resistance becomes equal to a prescribed value, whereby the controllability of the impurity concentration can be increased. | 07-26-2012 |
20120192789 | DEPOSITION SYSTEMS AND PROCESSES - This disclosure enables gas recovery and utilization for use in deposition systems and processes. The system includes a thin-film semiconductor layer deposition system comprising a deposition reactor, precursor gas feeds, and a gas recovery system. | 08-02-2012 |
20120210935 | APPLICATION AND INSPECTION SYSTEM - An application and inspection system comprises an application system for applying sealing compound to an edge region of a can end ( | 08-23-2012 |
20120216747 | CHEMICAL VAPOR DEPOSITION DEVICE AND TEMPERATURE CONTROL METHOD OF CHEMICAL VAPOR DEPOSITION DEVICE - A method capable of perceiving a temperature difference between a susceptor surface and a wafer surface even without special complicated or high-priced equipment is needed. To accomplish such a purpose, the present invention provides a chemical vapor deposition device that comprises: a chamber; a susceptor which is positioned on the inner side of the chamber to allow rotation therein, wherein a wafer is stacked on an upper side; a gas supplier which is disposed on the inner side of the chamber, and sprays gas toward the wafer; a heater which is disposed on the inner side of the susceptor, and heats the wafer; a temperature sensor which is positioned in the chamber, and measures the temperature of the susceptor; a rotation recognition mark which is equipped at the position in which the mark is integrally rotated with the susceptor; a rotation recognition sensor which is positioned in the chamber in order to determine the rotated state of the susceptor, and detects the rotation recognition mark; and a controller which calculates the temperature distribution of the upper side of the susceptor by using the rotation recognition sensor and the temperature sensor, and controls the heater on the basis of the temperature distribution. | 08-30-2012 |
20120234238 | INTEGRATED METROLOGY FOR WAFER SCREENING - Integrated wafer or substrate bow measurement modules are described. For example, a multi-chamber system includes a chamber housing a bow measurement module. In another example, a method of pre-screening a wafer includes inserting a wafer or a substrate into a multi-chamber system. A bow parameter of the wafer or the substrate is measured in a bow measurement module housed in a chamber of the multi-chamber system. | 09-20-2012 |
20120234239 | COATING APPARATUS - A measuring unit | 09-20-2012 |
20120255491 | SYSTEM AND METHOD FOR PLASMA MONITORING USING MICROWAVES - A plasma detector system may include a high frequency generator arranged to send incident electromagnetic radiation through a plasma chamber of a plasma system; and a high frequency detection system arranged to detect signal intensity of high frequency radiation sent from the high frequency generator and transmitted through the plasma chamber. | 10-11-2012 |
20120266818 | ATMOSPHERIC FILM-COATING DEVICE AND FILM-MANUFACTURING APPARATUS - An atmospheric film-coating device and a film-manufacturing apparatus are described. The atmospheric film-coating device includes a delivery device and a nebulization device. The delivery device is suitable for delivering at least one substrate. The nebulization device is used to gasify a film coating solution toward a direction indirectly to the at least one substrate into a plurality of film coating vapor molecules to deposit on a surface of the at least one substrate. | 10-25-2012 |
20120272899 | SYSTEM FOR APPLYING HOT MELT ADHESIVE POWDER ONTO A NON-METALLIC OBJECT SURFACE - A system for applying hot melt adhesive powder onto a non-metallic object surface comprises a convey belt, a radiation chamber, a spraying chamber and a heating chamber. The convey belt is used to deliver a non-metallic object treated by a cleaning agent and a conductive liquid through the radiation chamber where the surface of the non-metallic objected is radiated by ultraviolet rays and ozone and then through the spraying chamber where the surface of the non-metallic object is sprayed with charged hot melt adhesive powder, and finally into the heating chamber where the hot melt adhesive powder attached onto the non-metallic object will be melted into a liquid adhesive film ready to be bonded. | 11-01-2012 |
20120279447 | COATING APPARATUS AND METHOD FOR REAL-TIMELY MONITORING THICKNESS CHANGE OF COATING FILM - A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change. | 11-08-2012 |
20120285379 | Manufacturing Apparatus and Manufacturing Method of Light-Emitting Device - Demands such as higher definition, higher opening aperture, and higher reliability on a full-color flat panel display have been increased. Such demands are big objects in advancing higher definition (increase in the number of pixels) of a light-emitting device and miniaturization of each display pixel pitch with reduction in size of the light-emitting device. An organic compound-containing layer is selectively deposited using a laser beam which passes through openings of a mask. An irradiated substrate provided with a light absorption layer and a material layer containing an organic compound and a deposition substrate provided with first electrodes are placed so as to face each other. The light absorption layer is heated by a laser beam which has passed through the openings of the mask, and the organic compound at a position overlapping with the heated region is vaporized, and accordingly the organic compound is selectively deposited over the deposition substrate. | 11-15-2012 |
20120291704 | ELECTRODE MANUFACTURING APPARATUS - Provided is an electrode manufacturing apparatus having a manufacturing unit mixing a plurality of materials and manufacturing an electrode slurry, a reservoir tank connected to the manufacturing unit and storing the manufactured electrode slurry that is manufactured, a coarse particle removal filter connected to the reservoir tank and removing coarse particles in a stored electrode slurry, a defoamer connected to the coarse particle removal filter and removing bubbles in the electrode slurry from which the coarse particles are removed and then returning the electrode slurry, from which the bubbles are removed, to a position below a liquid level of the electrode slurry stored in the reservoir tank, and a coating unit connected to the reservoir tank and coating the stored electrode slurry to a base material. | 11-22-2012 |
20120298036 | LIQUID DROPLET DISCHARGING DEVICE - A liquid droplet discharging device includes a stage section, a discharge head, a moving section, a maintenance device and a testing device. The stage section is configured and arranged to retain a substrate. The discharge head has a nozzle for discharging a liquid droplet of a liquid onto the substrate. The moving section supports the discharge head to move integrally with the discharge head relative to the stage section. The maintenance device is configured and arranged to perform a predetermined maintenance process on the discharge head. The testing device is configured and arranged to test liquid droplet discharge characteristics of the nozzle. The maintenance device and the testing devices are disposed at opposite sides in a direction of relative movement of the moving section and the stage section, with the stage section being disposed therebetween. | 11-29-2012 |
20120298037 | MICROCHEMICAL NANOFACTORIES - Embodiments of an apparatus, system, and method for chemical synthesis and/or analysis are disclosed. One embodiment of a disclosed apparatus comprises a laminated, microfluidic structure defining a reactor and a separator. Such apparatuses, or portions thereof, generally have dimensions ranging from about 1 micrometer to about 100 micrometers. To implement synthetic processes, disclosed embodiments of the apparatus generally include at least one unit operation, such as a mixer, a valve, a separator, a detector, and combinations thereof. Individual apparatuses may be coupled both in series and in parallel to form a system for making chemical compounds. An individual apparatus or a system also can be used in combination with known devices and processes. | 11-29-2012 |
20120298038 | DESKTOP WORKING APPARATUS - Provided is a full-automatic working apparatus which has a work-object conveying mechanism and can be used on a desk. The desktop working apparatus works a work-object as desired by moving relatively the work-object and a working head. The desktop working apparatus comprises a base desk, a working section placed on the base desk and having a working head and a working-head-driving mechanism, a loader placed integrally at the side portion of the desktop working apparatus, an unloader placed integrally at the side portion of the desktop working apparatus, a conveying section placed on the base desk to convey the work-object fed by the loader to the unloader, and a controlling section; the conveying section having a fixing mechanism for fixing the work-object at the working position, the working section having a working head placed above the working position, the controlling section having a first controller unit placed in the base desk and a second controller unit placed at the side portion or upper portion of the tabletop working apparatus. | 11-29-2012 |
20120304928 | APPARATUS AND METHODS FOR POSITIONING A SUBSTRATE USING CAPACITIVE SENSORS - Embodiments of the present invention provide apparatus and methods for positioning a substrate in a processing chamber using capacitive sensors. One embodiment of the present invention provides an apparatus for processing a substrate. The apparatus includes first and second capacitive sensors disposed in an inner volume. The first capacitive sensor is positioned to detect a location of an edge of the substrate at a first angular location. The second capacitive sensor is positioned to detect a vertical position of the substrate. | 12-06-2012 |
20120304929 | PIEZOELECTRIC DISPENSER WITH A LONGITUDINAL TRANSDUCER AND REPLACEABLE CAPILLARY TUBE - Systems, devices and methods are provided, for acquiring and dispensing predetermined volumes of liquids and, in particular, to a unique piezoelectric dispenser for acquiring and dispensing of small volumes of fluid in an automatic or manual production of DNA arrays and assays, wherein droplets are dispensed in a single drop format with volumes that may range from about a few picoliters to several nanoliters. The dispenser can advantageously utilize a disposable capillary tube assembly while desirably retaining the piezoelectric actuator for subsequent further uses, thereby mitigating the possibility of cross contamination of fluids and providing an economical and cost effective approach with reuse of the piezoelectric actuator for further operation such as with a variety of liquids to be dispensed and transferred. A unique longitudinal transducer can transmit radial tube displacement into controlled axial motion of the tube. | 12-06-2012 |
20120318196 | SYSTEM FOR FORMING SUPERCONDUCTOR MATERIAL ON A TAPE SUBSTRATE - There is disclosed a system for forming a superconductor material on a substrate. The system may comprise a dispensing reel; a spooling reel; and at least two modular reaction chambers, wherein at least one modular reaction chamber is connected to a supply of buffer precursor material and at least one other modular reaction chamber is connected to a supply of superconductor precursor material. The modular reaction chambers may include connections capable of being modified to add or remove adjacent components. It is understood that at least one of the spooling reel and/or the dispensing reel are exposed to normal atmosphere. The deposition chamber may also comprise a distribution head that provides a laminar flow of precursor materials onto the substrate, as well as at least one lamp comprising a reflector that directs UV and/or visible light towards the tape substrate to enhance a growth rate of material. | 12-20-2012 |
20120318197 | SPIRAL COATING APPARATUS AND SPIRAL COATING METHOD - According to one embodiment, a spiral coating apparatus includes a stage, a rotation mechanism, a coating nozzle, a movement mechanical unit, a nozzle position detection unit, and a position adjustment unit. The movement mechanical unit enables the stage and the coating nozzle to relatively move across the rotational direction and in the direction of the axis of the rotation. The nozzle position detection unit is configured to acquire positional data on a bottom surface of the coating nozzle in the direction of the axis of the rotation. The position adjustment unit adjusts the positions of the coating nozzle and the surface in the direction of the axis. | 12-20-2012 |
20120325146 | Plasma Processing Apparatus - Disclosed is a plasma processing apparatus which performs plasma processing under substantially atmospheric pressure to a non-planar subject to be processed. In the plasma processing apparatus, a pair of conductive wires are disposed at an interval of 1 mm or less on a dielectric board that conforms with the shape of the subject, the conductive wires are covered with a dielectric thin film having a thickness of 1 mm or less by, for instance, thermally spraying a dielectric material over the conductive wires, and plasma is generated along the shape of subject by applying high-frequency power to the pair of conductive wires. | 12-27-2012 |
20130000554 | RESIN COATING DEVICE IN LED PACKAGE MANUFACTURING SYSTEM - There are preliminarily prepared element characteristic information | 01-03-2013 |
20130008379 | ORGANIC LAYER DEPOSITION APPARATUS - An organic layer deposition apparatus that may be precisely aligned with a substrate during a deposition process. The apparatus includes: a deposition source; a deposition source nozzle unit; and a patterning slit sheet, which is spaced from and smaller than the substrate, and having a plurality of patterning slits arranged in a second direction perpendicular to the first direction. Deposition is performed while the substrate is moved relative to the deposition apparatus in the first direction. The patterning slit sheet includes first and second alignment marks that are spaced from each other. The substrate includes first and second alignment patterns that are spaced from each other. The deposition apparatus also includes first and second camera assemblies for respectively photographing the first alignment mark/pattern and the second alignment mark/pattern. A moving speed of the substrate is synchronized with shooting speeds of the first and second camera assemblies. | 01-10-2013 |
20130008380 | APPARATUS FOR FABRICATING IB-IIIA-VIA2 COMPOUND SEMICONDUCTOR THIN FILMS - An apparatus for fabricating IB-IIIA-VIA | 01-10-2013 |
20130014697 | Container Having Multiple Compartments Containing Liquid Material for Multiple Wafer-Processing ChambersAANM Kanayama; HirokiAACI Nagaoka-shiAACO JPAAGP Kanayama; Hiroki Nagaoka-shi JP - A container for containing a liquid material for processing a wafer includes: a container body; a divider dividing the interior of the container body and defining compartments fluid-tightly sealed off from each other except for bottom portions of the compartments; gas inlet ports for introducing gas to the respective compartments and gas outlet ports for discharging gas from the respective compartments; and a liquid level sensor provided in one of the compartments for keeping a liquid surface of a liquid material above the bottom portions when the container is in use conditions. | 01-17-2013 |
20130025538 | METHODS AND APPARATUS FOR DEPOSITION PROCESSES - Methods and apparatus for processing a substrate are provided herein. In some embodiments, the apparatus may include a ring to support a substrate in a position for processing, wherein the substrate is supported by a top side of the ring proximate a peripheral edge of the substrate such that a backside of the substrate, when present, is disposed over a central opening of the ring, a substantially planar member disposed below the ring, wherein substantially planar member includes plurality of slots, and a plurality of support arms which support the ring and the substantially planar member, wherein each support arm includes a terminal portion that supports the substantially planar member and extends through a respective one of the plurality of slots to support the ring | 01-31-2013 |
20130032091 | CLEANING METHOD OF FILM FORMING DEVICE AND SEMICONDUCTOR MANUFACTURING APPARATUS - A cleaning method of a film forming device capable of suppressing generation of static electricity is provided. The cleaning method of the film forming device includes the steps of humidifying surroundings of the film forming device; opening said film forming device to an atmosphere; and removing a deposit inside said film forming device. | 02-07-2013 |
20130036973 | Method and apparatus for counting particles in a gas - The present disclosure describes a method and apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector. | 02-14-2013 |
20130042808 | FILM CRACK DETECTION APPARATUS AND FILM FORMING APPARATUS - A film crack detection apparatus for performing a film crack detection operation, which is mounted to a film forming apparatus having a processing vessel for receiving an object to be processed and forming a thin film on a surface of the object to be processed, includes an elastic wave detection unit mounted to the film forming apparatus to detect an elastic wave, and a determination unit to determine whether performing a cleaning process of the processing vessel is necessary based on a detection result of the elastic wave detection unit. | 02-21-2013 |
20130042809 | ION IMPLANTER - The ion implanter includes a deflecting electrode and a shield member. The ion beam has a ribbon shape. The deflecting electrode deflects at least a part of the ion beam in a long side direction toward a short side direction of the ion beam, based on a result measured of a beam current density distribution in the long side direction. The shield member partially shields the ion beam deflected by the deflecting electrode. The deflecting electrode includes a plate electrode and an electrode group including plural electrodes. The electrode group is disposed to face the plate electrode to interpose the ion beam between the plate electrode and the electrode group. The plate electrode is electrically grounded, and the plurality of electrodes are electrically independent from each other. Each of the plurality of electrodes is connected to an independent power source from other power sources to perform a potential setting. | 02-21-2013 |
20130081570 | MICRO BALLPOINT PEN AND PRINTING APPARATUS - Provided are a micro ballpoint pen enabling to print directly straight, oblique, curved, dashed, broken and wavy lines and a printing apparatus including the same. The micro ballpoint pen may include a tip body including a caulking portion, at least one inner protrusion, and at least one expansible or shrinkable elastic portion, a ball provided between the caulking portion and the inner protrusion, the ball contacting and rolling on a target printing object to eject ink onto the target printing object, a supporting bar pressing the ball toward the caulking portion to form an ink outflowing channel between the caulking portion and the ball, and a control part expanding or shrinking the elastic portion to control the ink outflowing channel. | 04-04-2013 |
20130087098 | METHOD AND SYSTEM FOR ENDPOINT DETECTION - A process control system is provided for use with a processing tool for thin film patterning by a material removal processing system. The system includes an optical end-point detector operable within a working area defined by the processing tool when the processing tool is applied to an article, the optical end-point detector performing in-situ measurements of parameters of patterned thin film on the article. An optical integrated monitoring tool is installed with the processing tool and operable outside the working area for measuring parameters of the patterned thin film on the article. A control unit is connected to the end-point detector and to the integrated monitoring tool, and includes processing and computational intelligence responsive to data received from the end-point detector and to the measured data received from the integrated monitoring tool for analyzing data and generating a signal for terminating the patterning of the thin film on the article. | 04-11-2013 |
20130092084 | Systems and Methods for Measuring, Monitoring and Controlling Ozone Concentration - Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of a total mass flow and a corresponding change in a chamber pressure accepting the mixture flow, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to a vacuum processing chamber, enabling precision semiconductor processing. | 04-18-2013 |
20130112140 | APPARATUS FOR GROWTH OF DILUTE-NITRIDE MATERIALS USING AN ISOTOPE FOR ENHANCING THE SENSITIVITY OF RESONANT NUCLEAR REACTION ANALYSIS - In certain desirable embodiments, the present invention relates to the use of | 05-09-2013 |
20130118403 | CHEMICAL BATH DEPOSITION SYSTEM - A chemical bath deposition system is used for forming a buffer layer on a back electrode substrate having a photoelectric transducing layer. The chemical bath deposition system includes a chemical bath tank, a chemical-solution purification device, and a dosing device. The chemical bath tank is used for storing a buffer-layer solution including cation and anion. The cation is adapted to react with the anion to form the buffer layer when the back electrode substrate is immersed in the buffer-layer solution. The chemical-solution purification device is communicated with the chemical bath tank for removing residual cation to obtain a purified solution after the cation reacts with the anion to form the buffer layer. The dosing device is for performing compensation of the cation according to a component ratio of a purified solution. | 05-16-2013 |
20130118404 | Methods and Systems for Forming Thin Films - A method and apparatus for the deposition of thin films is described. In embodiments, systems and methods for epitaxial thin film formation are provided, including systems and methods for forming binary compound epitaxial thin films. Methods and systems of embodiments of the invention may be used to form direct bandgap semiconducting binary compound epitaxial thin films, such as, for example, GaN, InN and AlN, and the mixed alloys of these compounds, e.g., (In, Ga)N, (Al, Ga)N, (In, Ga, Al)N. Methods and apparatuses include a multistage deposition process and system which enables rapid repetition of sub-monolayer deposition of thin films. | 05-16-2013 |
20130125814 | Painting System Operating in Recirculating Air Mode - A painting system operating in recirculating air mode, comprising a spray booth ( | 05-23-2013 |
20130133575 | METHOD AND DEVICE FOR MEASURING THE THICKNESS OF A COATING LAYER ON A RUNNING STRIP - A method and device for measuring the thickness of a coating material layer of a running strip according to which, by means of an eddy current sensor for at least one area of the strip, a quantity is measured, representative of the thickness of the coating layer and the thickness of the coating layer is determined from the measured quantity and from at least one calibration value. The measurement made with an eddy current sensor comprises the measurement of the complex impedance of a coil facing the running strip for a low excitation frequency and a high excitation frequency and the elaboration of a quantity representative of the thickness of the coating layer from said complex impedance measurements. A device for applying the method and a coating installation equipped with the device. | 05-30-2013 |
20130133576 | VACUUM PROCESSING DEVICE - An exhaust opening of a process chamber ( | 05-30-2013 |
20130167772 | FILM FORMING APPARATUS - A film forming apparatus includes a substrate holding unit holding substrates at intervals; a reaction chamber accommodating the substrate holding unit; a raw material gas supply pipe supplying a raw material gas of a thin film to the substrate; a support unit supporting the reaction chamber; a heating unit being disposed outside the reaction chamber and heating the substrates; a protection pipe including one end portion fixed to the support unit, being extended along an arrangement direction of the substrates between the substrate holding unit and the reaction chamber, and including a temperature measuring unit inserted therein; and a protrusion portion being provided on at least one of an outer surface of the protection pipe and an inner surface of the reaction chamber, and providing a gap between the outer surface of the protection pipe and the inner surface of the reaction chamber. | 07-04-2013 |
20130186331 | QUALITY INSPECTION OF CONTAINER COATINGS - A method and apparatus are disclosed for testing and inspecting containers coated by means of a plasma treatment, e.g. plastic bottles, which are coated for instance with amorphous silicon oxide or carbon compounds. The containers are tested by a measuring device trace-gas-analytically, e.g. mass-spectrometrically, for undesired foreign substances, such as acetaldehyde and/or antimony, escaping from the container material after a plasma coating treatment. | 07-25-2013 |
20130186332 | PROCESSING APPARATUS AND PROCESS STATUS CHECKING METHOD - A processing apparatus includes a processing chamber, gas supply paths provided in a corresponding relationship with the kinds of process gases supplied into the processing chamber, and valves respectively arranged in the gas supply paths. The apparatus further includes a measuring unit for measuring a physical parameter associated with each of the process gases passing through the gas supply paths, a register unit which stores the physical parameter, and a control unit configured to determine a process status based on the physical parameter stored in the register unit. The register unit is provided in a lower-hierarchy control device connected to the control unit of a higher hierarchy to transmit and receive signals to and from the control unit. The lower-hierarchy control device is configured to control input and output signals between the control unit and end devices under the control of the control unit. | 07-25-2013 |
20130186333 | METHODS AND APPARATUS FOR OVERLAYING ELECTRONIC MARKING INFORMATION ON FACILITIES MAP INFORMATION AND/OR OTHER IMAGE INFORMATION DISPLAYED ON A MARKING DEVICE - A marking device for a marking operation to mark a presence or an absence of one or more underground facilities is configured to access and display facilities map information, and/or other image information, as a visual aid to facilitate the marking operation. In various aspects, methods and apparatus relate to: selection of a “base” facilities map, or information from a database of facilities map data, relating to a given work site/dig area; selection of a pan and/or zoom (resolution) for displaying facilities map information; updating displayed facilities map information while a marking device is used during a marking operation (e.g. changing pan, zoom and/or orientation); overlaying on the displayed facilities map information marking information and/or landmark information relating to the marking operation; and storing locally on the marking device, and/or transmitting from the marking device, facilities map information and/or overlaid marking/landmark information (e.g., for further processing, analysis and/or subsequent display). | 07-25-2013 |
20130199445 | VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND METHOD FOR PRODUCING ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE - A vapor deposition device ( | 08-08-2013 |
20130206063 | ADHESIVE APPLICATION APPARATUS AND METHODS - Adhesive application apparatus and methods are disclosed herein. An example adhesive application apparatus includes a spray assembly to apply a quantity of mixed adhesive to a designated spray area of a panel. The spray assembly has a spray boom to support a spray nozzle and an adhesive mixing chamber. The adhesive mixing chamber is coupled to the spray assembly upstream from the spray nozzle. A first fluid path provides a first adhesive component to the adhesive mixing chamber and a second fluid path provides a second adhesive to the adhesive mixing chamber. | 08-15-2013 |
20130206064 | GLOSS PROCESSING APPARATUS - A sheet of paper is set on a paper-supplying portion of a back surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures a gloss level of a back surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. When this measurement result does not exceed the threshold value, it is determined that the gloss processing has not been performed on the back surface thereof. It is then determined whether or not the presently set operation mode is a top surface gloss processing mode. When determining that the present operation mode is not the top surface gloss processing mode, the operation mode is automatically changed from a presently set back surface gloss processing mode to the top surface gloss processing mode. | 08-15-2013 |
20130206065 | IN SITU SUBSTRATE DETECTION FOR A PROCESSING SYSTEM USING INFRARED DETECTION - Infrared detection is used to monitor the temperature within a vapor transport deposition processing chamber. Changes in temperature that occur when a substrate passes an infrared detector are detected and used to precisely locate a position of the substrate within the chamber. Position correction of the substrate can also be implemented. | 08-15-2013 |
20130213299 | LIQUID TANK AND THIN FILM DEPOSITION APPARATUS USING THE SAME - A liquid tank includes at least one main tank, a supplemental tank and a transmission module. The main tank is supplied with a first liquid. The supplemental tank is supplied with a second liquid. The transmission module is connected between the supplemental tank and the at least one main tank. The transmission module is configured to supply the second liquid into the main tank while the first liquid in the main tank is lowered down to a first position, and to stop supplying the second liquid into the main tank while the first liquid in the main tank is raised up to the first position. A thin film deposition apparatus using the aforementioned liquid tank is also provided. | 08-22-2013 |
20130213300 | SEMICONDUCTOR MANUFACTURING APPARATUS - Disclosed is a semiconductor manufacturing apparatus including at least one pocket on which a passive subject on which deposition will be executed is mounted, and a carrier body having an insertion space to which the at least one pocket is detachably attached. Therefore, the semiconductor manufacturing apparatus shortens process time and reduces process expenses. The semiconductor manufacturing apparatus allows respective pockets to have different structures according to the positions of the pockets on the wafer carrier, and thus achieves uniform growth of a material on the surfaces of wafers regardless of the positions of the pockets. | 08-22-2013 |
20130220221 | METHOD AND APPARATUS FOR PRECURSOR DELIVERY - Methods and apparatus for delivering a gas mixture to a process chamber are provided herein. In some embodiments, a precursor delivery apparatus may include an ampoule having a body with a first volume to hold a liquid precursor, an inlet to receive the liquid precursor and a carrier gas, and an outlet to flow a gas mixture of the liquid precursor and the carrier gas from the ampoule; a first heater disposed proximate to or in the first volume to heat the liquid precursor disposed in the first volume proximate to or at a first location within the first volume where the liquid precursor contacts the carrier gas; and a heat transfer apparatus disposed about the body to at least one of provide heat to or remove heat from the ampoule. | 08-29-2013 |
20130228123 | PAINT-SPRAY LINE - A paint-spray line comprising a number of sprayers which are provided to discharge paint onto an item to be coated and are connected to a paint supply unit via a common main supply line is also suitable, to a particular extent and at an expense kept particularly low, for a need-based provision of individual quantities of paint which are kept at a particular minimum. For this purpose, the conveying device, provided for feeding paint into the main supply line is configured according to the invention as a single-piston pump. | 09-05-2013 |
20130239888 | Apparatus for counting particles in a gas - The present disclosure describes an apparatus for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber with walls that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super-saturated with vapor and causing said super-saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector. | 09-19-2013 |
20130255574 | SENSOR SYSTEM FOR EXPLOSIVE DETECTION AND REMOVAL - A sensor system for detecting one of Improvised Explosive Devices (IEDs), landmines or other buried explosives, the sensor system is mounted in place of a standard backhoe digging bucket of a backhoe vehicle. The sensor system includes a mounting portion having arc swing points for hanging the sensor system on a backhoe arm, and a holding pin opening for receiving a holding pin when positioned in a mounting position on the backhoe arm; and an electronic sensor wand arm assembly mounted to the mounting portion. | 10-03-2013 |
20130263781 | PRECISION SEASONER - A seasoning apparatus and method for evenly and consistently seasoning french fries or other food. The seasoning apparatus may include a hollow hopper for holding and selectively dispensing seasoning therefrom and a plurality of actuatable dispensing elements each translatably attached to the hopper and each having a holding compartment formed therein. The actuatable dispensing elements may receive seasoning in the holding compartment from the hopper. When translated to a dispensing position, the dispensing elements may dispense seasoning from the holding compartment. The seasoning apparatus may also include a seasoning spreader for spreading seasoning dispensed from the actuatable dispensing elements and a food-holding container fixed a distance below the hopper and seasoning spreader. The food-holding container may have a weighing device coupled with a controller for determining an amount of seasoning to dispense from the hopper and actuating the actuatable dispensing elements accordingly. | 10-10-2013 |
20130269607 | PLASMA CVD APPARATUS - The present invention provides a plasma CVD apparatus capable of performing film formation while controlling the temperature of a substrate as well as film properties. A process chamber according to one embodiment of the present invention includes a holder configured to hold a substrate, magnetic-field producing means configured to produce magnetic fields inside the process chamber, shields configured to suppress film deposition on the magnetic-field producing means, heat dissipating sheets configured to suppress heating of the magnetic-field producing means, and moving means configured to move the magnetic-field producing means. The magnetic-field producing means is characterized in being moved in such a direction as to increase or decrease the volume of a space between the magnetic-field producing means and the holder. | 10-17-2013 |
20130284090 | COMPENSATING CONCENTRATION UNCERTAINITY - Methods and apparatus for depositing uniform boron-containing films are disclosed. A first precursor is delivered to a chamber through a first pathway having a first flow controller and a composition sensor. A second precursor is delivered by a second pathway, including a second flow controller, to a mixing point fluidly coupling the first and second pathways. A controller is coupled to the vibration sensor and the first and second flow controllers. The first precursor may be a mixture of diborane and a diluent gas, and the second precursor is typically a diluent gas. The flow rate of the first precursor may be set by determining a concentration of diborane in the first precursor from the composition sensor reading, and setting the flow rate to maintain a desired flow rate of diborane. The flow rate of the second precursor may be set to maintain a desired flow to the chamber. | 10-31-2013 |
20130284091 | Method For Improving Performance Of A Substrate Carrier - A method of modifying a substrate carrier to improve process performance includes depositing material or fabricating devices on a substrate supported by a substrate carrier. A parameter of layers deposited on the substrate is then measured as a function of their corresponding positions on the substrate carrier. The measured parameter of at least some devices fabricated on the substrate or a property of the deposited layers is related to a physical characteristic of substrate carrier to obtain a plurality of physical characteristics of the substrate carrier corresponding to a plurality of positions on the substrate carrier. The physical characteristic of the substrate carrier is then modified at one or more of the plurality of corresponding positions on the substrate carrier to obtain desired parameters of the deposited layers or fabricated devices as a function of position on the substrate carrier. | 10-31-2013 |
20130298828 | THERMAL SPRAY APPARATUS - A thermal spray apparatus ( | 11-14-2013 |
20130312664 | METHOD FOR MANUFACTURING A COMPOUND FILM - A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties. | 11-28-2013 |
20130312665 | METHOD AND APPARATUS - Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors. | 11-28-2013 |
20130319330 | LIQUID FEEDING DEVICE AND RESIST DEVELOPING DEVICE - A liquid feeding device | 12-05-2013 |
20130340677 | CONTROL OF STRAY RADIATION IN A CVD CHAMBER - An apparatus and method for controlling stray radiation within a CVD chamber. A heater array disposed beneath a wafer carrier for radiatively heating of the wafer carrier includes a peripheral or outermost heating element or elements. Scattered radiation originating from a designated segment of the peripheral heating element(s) can be reduced locally by one of several mechanisms, including reducing the emission (e.g., operating temperature) of the designated segment, or capturing or deflecting a portion of the radiation originating from the designated segment. In one embodiment, an electrical connector on a resistance heating element provides the reduced emission from the designated segment. It has been found that radiation thermometers fixed proximate an axis that extends from the center of the wafer carrier and across the designated segment is subject to less stray radiation, thus providing a more reliable temperature reading in the optical wavelengths. | 12-26-2013 |
20130340678 | GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS - Provided is a gas supply apparatus which includes a raw material gas supply system for supplying a raw material gas into a processing container, a tank to store a liquid raw material, a main heating unit for heating the bottom and sides of the tank, a ceiling heating unit for heating a ceiling portion of the tank, a main temperature measurement unit for measuring a temperature of a region of the main heating unit, a ceiling temperature measurement unit for measuring a temperature of the ceiling heating unit, a liquid phase temperature measurement unit for measuring a temperature of the liquid raw material, a vapor phase temperature measurement unit for measuring a temperature of a vapor phase portion in the upper part of the tank, a level measurement unit for measuring a liquid level of the liquid raw material, and a temperature control unit for controlling the heating units. | 12-26-2013 |
20130340679 | VACUUM DEPOSITION DEVICE - The present invention provides a vacuum deposition device that can improve the measurement accuracy of the thickness of the deposition film. The vacuum deposition device includes, in a vacuum chamber, a plurality of evaporation sections, a deposition target, a tubular body surrounding a space between the plurality of evaporation sections and the deposition target, and a film thickness meter. Deposition material vaporized from the plurality of evaporation sections passes through tubular body, reaches a surface of the deposition target, and is deposited on surface. Between film thickness meter and at least one of the evaporation sections, a guide tube is disposed which guides deposition material vaporized from the evaporation section to film thickness meter. An opening surface of the guide tube on the evaporation section side is disposed at substantially the same level as that of the opening surface of the evaporation section or inside the evaporation section. | 12-26-2013 |
20140000515 | MICROWAVE EXCURSION DETECTION FOR SEMICONDUCTOR PROCESSING | 01-02-2014 |
20140000516 | DIGITAL POINT MARKING TRANSFER | 01-02-2014 |
20140000517 | COATING APPARATUS AND NOZZLE | 01-02-2014 |
20140000518 | COATING APPARATUS AND METHOD FOR FILLING COATING LIQUID | 01-02-2014 |
20140000519 | SUBSTRATE PROCESSING APPARATUS | 01-02-2014 |
20140014036 | DEPOSITION PARTICLE EMITTING DEVICE, DEPOSITION PARTICLE EMISSION METHOD, AND DEPOSITION DEVICE - A vapor deposition particle emitting device of the present invention includes: a nozzle section ( | 01-16-2014 |
20140020626 | FILM CRACK DETECTING APPARATUS AND FILM FORMING APPARATUS - Provided is a film crack detecting apparatus capable of recognizing a possibility of occurrence of particles in real time by detecting film cracks of an unnecessary film adhered to a probe unit provided in a processing container. The film crack detecting apparatus is provided in a film forming apparatus, which includes a processing container configured to accommodate an object to be processed and forms a thin film on a surface of the object, to perform a film crack detection operation. The film crack detecting apparatus includes a probe unit installed within the processing container, an elastic wave detecting unit attached to an end of the probe unit to detect an elastic wave, and a determination unit configured to determine whether the maintenance of the processing container is necessary based on a detection result of the elastic wave detecting unit. | 01-23-2014 |
20140026812 | TICKET PRINTER - In a ticket printer, an end of a paper sensor has an optic emitter and receiver arranged one after the other in the paper advancement direction and operationally connected together via a signal guide. The emitter and the receiver are arranged on one side of the path of the paper whereas the signal guide is arranged on the opposite side. | 01-30-2014 |
20140053775 | Chemical-Vapor-Deposition Repair Apparatus - Embodiments of the present invention provide a CVD repair apparatus, in which an auxiliary gas is ejected from a gas-storage module, impinging upon a substrate, and bounced back to a pressure-sensitive sensor provided on a lower surface of a gas-ejection device, so that the gas pressure is detected, and based on the detected gas pressure, the distance between the substrate and the gas-ejection device is determined; when the distance between the substrate and the gas-ejection device is less than a preset lower-limit value, by increasing the auxiliary-gas amount ejected from the gas-storage module to lift up the gas-ejection device, or by preventing the gas-ejection device from moving parallel to the substrate, the substrate is avoided an inadvertent scratch during the movement of the gas-ejection device. | 02-27-2014 |
20140060431 | Atomic Layer Deposition System with Multiple Flows - An atomic layer deposition system with multiple flows comprises: a square vacuum chamber, which internally has four pairs of intakes and vents to control the flowing in-and-out of precursors and improve the quality of coating and the coating uniformity of an asymmetrical testing member; plural gas detection sensors, which monitor the states of the exhausting of the precursors in the chamber and automatically controls and alarms for the amount of the induction of the precursors to prevent the obstruction of the vents; and a discrete pyramidal cover, which has a precursor intake in the top of the cover, the pipelines of the induction of the precursors and the pipelines of the four pairs of the intakes and the vents are integrated in order to cooperate with the cover while coating a three-dimensional element, a vertical flow field of the precursors is then produced from top to bottom in the cover. | 03-06-2014 |
20140060432 | PRINTING DEVICE - A printing device includes a print head configured to execute printing on one surface of a long-size medium to be printed, on the other surface of which a plurality of oblique lines of the same angle of obliquity are formed at regular intervals, a conveying section configured to convey the medium to be printed, a sensor configured to detect the oblique lines, and a control section configured to control the print head to execute printing while changing a position of printing on the medium to be printed in accordance with an interval between the oblique lines in a conveying direction of the medium to be printed detected by the sensor. | 03-06-2014 |
20140076232 | DEPOSITION APPARATUS - A deposition apparatus includes a plurality of deposition sources that provides different deposition materials to a substrate, a sensor assembly that senses a deposition thickness of the deposition materials evaporated from the deposition sources, and a main controller that controls the sensor assembly. The sensor assembly includes a plurality of sensor groups each including a plurality of sensors and respectively corresponding to the deposition sources, and each of the sensor groups senses the deposition thickness of the deposition material evaporated from a corresponding deposition source of the deposition sources to the substrate in response to a control of the main controller. | 03-20-2014 |
20140076233 | INTEGRATED COATING SYSTEM - Provided is an integrated coating system. An integrated coating system according to an exemplary embodiment of the present invention includes: a unwinding means provided with a roll to supply a web; a worktable roll configured to support the web supplied from the unwinding means; a plurality of printing means configured to perform printing or coating on the web supplied from the unwinding means; a plurality of curing means each of which is modulated to cure a printing material on the web passing through at least one printing means; and a winding means around which the web, of which printing or coating work is completed by passing through the curing means, is wound in a roll shape. | 03-20-2014 |
20140102364 | COATING APPARATUS - A coating apparatus for applying a film to a substrate is provided. The coating apparatus includes a coating chamber, a filament fixture having a filament array, a tensioning device to maintain tension on the filament array to maintain filaments in a planar array during the application or removal of current or heat to the filaments, and a movable stage arranged to hold the substrate to be treated in the coating apparatus in proximity to the filament array so as to maintain a constant thermal gradient across the substrates being treated in the apparatus. An apparatus for applying nanocrystalline diamond to a substrate is also provided. | 04-17-2014 |
20140109829 | LINEAR EVAPORATION SOURCE AND VACUUM DEPOSITION APPARATUS INCLUDING THE SAME - A linear evaporation source is disclosed. In one aspect, the source includes a crucible storing an evaporated material, a heater unit surrounding the crucible and heating the crucible, and a plurality of lateral reflectors surrounding a lateral surface of the heater unit. Each of the lateral reflectors includes a first reflector combined with the heater unit while being spaced apart from the heater unit and having a plurality of first openings and a second reflector movably combined with the first reflector and having a second opening. Open ratios of the lateral reflectors are independently adjusted to control a temperature of the crucible according to areas of the crucible. Thus, deposition uniformity of the linear evaporation source is enhanced. | 04-24-2014 |
20140109830 | PAINTING DEVICE AND ASSOCIATED METHOD - Exemplary painting devices for painting components, e.g., motor vehicle bodies or parts thereof may include a multi-axis painting robot positioning an atomizer, a robot controller for controlling the painting robot, and a controls enclosure comprising the robot controller. An exemplary controls enclosure may be a load-bearing column that mechanically supports the painting robot. | 04-24-2014 |
20140109831 | VAPOR DEPOSITION METHOD AND VAPOR DEPOSITION APPARATUS - According to one embodiment, a vapor deposition method is disclosed for forming a nitride semiconductor layer on a substrate by supplying a group III source-material gas and a group V source-material gas. The method can deposit a first semiconductor layer including a nitride semiconductor having a compositional proportion of Al in group III elements of not less than 10 atomic percent by supplying the group III source-material gas from a first outlet and by supplying the group V source-material gas from a second outlet. The method can deposit a second semiconductor layer including a nitride semiconductor having a compositional proportion of Al in group III elements of less than 10 atomic percent by mixing the group III and group V source-material gases and supplying the mixed group III and group V source-material gases from at least one of the first outlet and the second outlet. | 04-24-2014 |
20140123896 | PROBE ASSEMBLY FOR A FLUID BED REACTOR - Embodiments of a probe assembly for a fluid bed reactor are disclosed. The probe assembly includes a fluid bed reactor (FBR) member, and a pressure tap comprising a wall defining a passageway within which the FBR member is located. Exemplary FBR members include, but are not limited to, a thermocouple, a seed pipe, a particle sampling line, a gas sampling line, a gas feed line, a heater, a second pressure tap, or a combination thereof. Disclosed embodiments of the probe assembly reduce or eliminate the need for support rods and rings within the fluid bed reactor, reduce component fouling within the reactor, and/or reduce product contamination. | 05-08-2014 |
20140130738 | FLUX SPRAY MACHINE - A flux spray machine for spraying flux to printed circuit board assembly (PCBA) is provided, which comprising: a PCBA transfer track to transferring the PCBA for spraying flux, comprising an active beam and a fixed beam; a spray mechanism, a X-Y table of vertical spray mechanism comprising a longitudinal beam, a crossbeam movable on and perpendicular to the longitudinal beam, and a flux nozzle for spraying flux movably provided on the crossbeam; and a flow-controlling mechanism, comprising origin sensors and limit sensors for two different flows in two longitudinal directions of the PCBA transfer track. | 05-15-2014 |
20140144380 | GAS SUPPLY PIPES AND CHEMICAL VAPOR DEPOSITION APPARATUS - A gas supply pipe and a chemical vapor deposition (CVD) apparatus including the gas supply pipe. The gas supply pipe includes: a first pipe connected to a gas storage apparatus via a gas supply line to supply a reacting gas into a reacting furnace; and a second pipe thermally contacting the first pipe to cool the first pipe, wherein a first end of the second pipe is connected to a cooling medium supplying unit via a cooling medium line such that a cooling medium circulates inside the second pipe, and a second, opposite end of the second pipe is connected to a cooling medium collecting unit. | 05-29-2014 |
20140150722 | COATING MACHINE - A coating machine for applying a coating to screws is described. The coating machine has an operating space along which the screws to be coated are fed. A fixed surface is defined, which is fixed relative to the frame of the machine and is designed for abutment and positioning of the screws in the section upstream from said operating space and in said operating space. | 06-05-2014 |
20140174350 | VAPOR DEPOSITION APPARATUS - There is provided a vapor phase deposition apparatus including: a reaction chamber having a susceptor with a wafer mounted thereon and depositing and growing an epitaxial thin film on the wafer; a housing having the reaction chamber disposed therein and having a window opened and closed to allow the wafer to be loaded into or unloaded from the wafer reaction chamber; and an exhaust unit discharging gas from within the housing to the outside to adjust internal pressure of the housing. | 06-26-2014 |
20140182514 | DISPLAY PANEL MANUFACTURING DEVICE - A display panel manufacturing device including a stage slider, a first stage configured to slide on the stage slider and to receive a test substrate, a second stage on the stage slider and configured to receive a main substrate, and a patterning unit located at a distance from the stage slider and configured to discharge organic drops onto the test substrate, configured to analyze patterns of the organic drops, configured to modify the patterns of the discharged organic drops according to an analysis of the patterns of the organic drops, and configured to discharge the organic drops onto the main substrate. | 07-03-2014 |
20140190408 | Catheter Tip Coating System - A catheter tip coating assembly includes a housing defining a fluid reservoir and having a fluid outlet configured to dispense fluid to an end of a piece of tubing. The catheter tip coating assembly includes a valve assembly carried by the housing and at least partly disposed in fluid communication with the fluid reservoir. The valve assembly is configured to receive the piece of tubing and configured to move between a first position to limit fluid communication between the fluid reservoir and the fluid outlet and a second position to provide fluid communication between the fluid reservoir and the fluid outlet to dispense fluid to the end of the piece of tubing. The assembly provides for careful control over the amount of liquid that is applied and the depth of the wetting. | 07-10-2014 |
20140196663 | ALIGNMENT DEVICE AND SUBSTRATE PROCESSING APPARATUS - An aligner includes a plurality of substrate rotators and a shaft member. Each substrate rotator includes a holder, a notch detector, an electromagnetic clutch and a driving belt. Each holder sucks the back surface of the substrate under vacuum and horizontally holds the substrate. Each notch detector detects a notch formed at the substrate, and supplies a detection result to the corresponding electromagnetic clutch as a detection signal. One end of the shaft member is connected to a motor. The shaft member is continuously rotated by the motor. Each electromagnetic clutch switches to a connection state in which rotational force of an inner periphery is transmitted to an outer periphery and a disconnection state in which rotational force of the inner periphery is transmitted to the outer periphery according to a detection signal supplied from the notch detector. | 07-17-2014 |
20140196664 | SYSTEM AND METHOD FOR TUNGSTEN HEXAFLUORIDE RECOVERY AND REUSE - Condensable materials, such as but not limited to tungsten fluoride (WF | 07-17-2014 |
20140202384 | GLUE SPREADING SYSTEM - A glue spreading system includes a spreading unit and a control unit. The spreading unit includes a primary pressing roller and a spreading roller. The spreading roller is adjacent to the primary pressing roller. A thin film transports between the primary pressing roller and the spreading roller. The spreading roller is configured for spreading a glue layer on the thin film. An actual thickness of the glue layer is decided by a pressure of the primary pressing roller applied on the spreading roller. The control unit is configured for detecting the actual thickness of the glue layer, and compares the actual thickness with a preset thickness. The control unit controls the pressure of the primary pressing roller applying on the spreading roller according to thickness differences between the actual thickness and the preset thickness. | 07-24-2014 |
20140209020 | MOBILE PRINTING APPARATUS AND PRINTED REFERENCE MARKS - A mobile printing apparatus includes a chassis; a first wheel rotatably mounted on the chassis; a second wheel rotatably mounted on the chassis; a motor for rotating the first wheel; an encoder for monitoring an amount of rotation; a first photosensor array; and an array of marking elements disposed proximate the first photosensor array. | 07-31-2014 |
20140209021 | RAW MATERIAL GAS SUPPLY DEVICE, FILM FORMING APPARATUS, FLOW RATE MEASURING METHOD, AND NON-TRANSITORY STORAGE MEDIUM - Provided is a raw material gas supply device which includes: a raw material container; a carrier gas supply unit configured to supply a carrier gas into the container via a carrier gas flow path; a first flow rate measurement unit configured to measure a flow rate of the carrier gas flowing therethrough and output the same as a first flow rate measurement value; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material into a film forming apparatus; a second flow rate measurement unit configured to measure a flow rate of the raw material gas flowing therethrough and output the same as a second flow rate measurement value; and a flow rate calculation unit configured to calculate a difference between the first and second flow rate measurement values and to convert the difference into a vaporization flow rate of the raw material. | 07-31-2014 |
20140209022 | RAW MATERIAL GAS SUPPLY DEVICE, FILM FORMING APPARATUS, RAW MATERIAL GAS SUPPLY METHOD, AND NON-TRANSITORY STORAGE MEDIUM - Provided is a raw material gas supply device for use in a film forming apparatus, which includes: a raw material container configured to accommodate a solid raw material; a carrier gas supply unit configured to supply a carrier gas to the container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material; a pressure control unit configured to control an internal pressure of the container; and a control unit configured to control the pressure control unit to increase the internal pressure of the container when the measured flow rate of the vaporized raw material is higher than a predetermined target value, and to decrease the internal pressure when the measured flow rate is lower than the target value. | 07-31-2014 |
20140216338 | DEVICE FOR PROPERLY APPLYING CONDUCTIVE GLUE ON PHOTOELECTRIC ELEMENT - A device to apply and confirm the proper dispensation of conductive glue includes a nozzle vacuum-lifting a photoelectric element having a bonding surface, a base defining a receiving recess, a conductive glue received in the recess, a driver, and a controller controlling the driver to drive the nozzle to dip the photoelectric element into the conductive glue. A first camera module positioned on the base and aimed at the bonding surface takes images of the bonding surface. The controller is in communication with the first camera module and processes the images to determine if the amount of conductive glue and the spread area on the bonding surface are correct and, if yes, control the driver to pass on the photoelectric element, or if no, control the driver to reject the photoelectric element. | 08-07-2014 |
20140216339 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS - A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control. | 08-07-2014 |
20140216340 | METHOD AND APPARATUS FOR PRODUCING INSULATED WIRE - Disclosed is a method of producing an insulated electric wire, in which a primary coating layer including at least an enamel-baking layer is formed on a metallic conductor to form a primary coated electric wire, and a secondary coating layer is extrusion-formed on the primary coating layer of the primary coated electric wire. The method includes an electric wire pre-heating process where a surface of the primary coating layer is pre-heated using an electric wire pre-heating unit, and a resin extrusion process where a secondary coating layer is extrusion-formed on the pre-heated primary coating layer using a resin extrusion unit. Further disclosed is an apparatus for producing an insulated electric wire. | 08-07-2014 |
20140230727 | AUTOMATED POSITION LOCATOR FOR A HEIGHT SENSOR IN A DISPENSING SYSTEM - Apparatus and methods of determining a position of a height sensor in a dispensing system. The dispensing system includes a dispenser, height sensor, camera, and a calibration device configured to receive a signal from the height sensor. The calibration device may include an optical sensor that generates an alignment signal in response to receiving light from the height sensor and/or a fiducial that causes the height sensor to generate the alignment signal in response to a detected height change. The alignment signal is used to automatically determine the position at which the height sensor is aligned with the calibration device. The position of the height sensor relative to a camera is determined by aligning the camera with the calibration device and recording its position. The recorded coordinates of the camera are compared to the coordinates of the height sensor when the height sensor is automatically aligned with the calibration device. | 08-21-2014 |
20140238299 | ELECTRODE FABRICATING APPARATUS FOR RECHARGEABLE BATTERY - An electrode fabricating apparatus for a rechargeable battery according to the present invention includes: a vacuum chamber having an inner space; and a lithium depositor receiving a lithium source and having an evaporation unit heating and evaporating the lithium source, and a nozzle unit positioned on the evaporation unit and controlling an aperture ratio to control a deposition amount of lithium. | 08-28-2014 |
20140251214 | HEATED SUBSTRATE SUPPORT WITH FLATNESS CONTROL - Embodiments of heated substrate supports are provided herein, In some embodiments, a heated substrate support includes a support plate having a top surface and an opposite bottom surface; and a first heater disposed within the support plate, wherein the first heater is disposed beneath a mid-plane of the support plate, and wherein the first heater is disposed proximate a central zone of the support plate. | 09-11-2014 |
20140261171 | ION BEAM LINE - In some aspects, an ion implantation system is disclosed that includes an ion source for generating a ribbon ion beam and at least one corrector device for adjusting the current density of the ribbon ion beam along its longitudinal dimension to ensure that the current density profile exhibits a desired uniformity. The ion implantation system can further include other components, such as an analyzer magnet, and electrostatic bend and focusing lenses, to shape and steer the ion beam to an end station for impingement on a substrate. In some embodiments, the present teachings allows the generation of a nominally one-dimensional ribbon beam with a longitudinal size greater than the diameter of a substrate in which ions are implanted with a high degree of longitudinal profile uniformity. | 09-18-2014 |
20140261172 | SUBSTRATE LIQUID PROCESSING APPARATUS AND METHOD FOR DETECTING ABNORMALITY OF AIR FLOW - A substrate liquid processing apparatus includes a substrate holding unit configured to hold and rotate a substrate; a processing liquid nozzle configured to supply a processing liquid to the substrate; a cylindrical liquid receiving cup configured to receive and recover the processing liquid scattered from the substrate; a housing configured to accommodate the substrate holding unit and the liquid receiving cup; a cup exhaust path connected to the liquid receiving cup to exhaust atmosphere inside the liquid receiving cup; a cup exhaust path pressure sensor configured to detect pressure in the cup exhaust path; a housing pressure sensor configured to detect pressure in the housing outside the liquid receiving cup; and a control unit configured to alert when a difference between a value detected by the housing pressure sensor and a value detected by the cup exhaust path pressure sensor is a predetermined determination reference value or less. | 09-18-2014 |
20140261173 | ADJUSTABLE MASS RESOLVING APERTURE - Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ions species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (“CPC”) superconductor, or boson energy transmission system. | 09-18-2014 |
20140299056 | Low temperature migration enhanced Si-Ge epitaxy with plasma assisted surface activation - Epitaxial films are grown by alternately exposed to precursor dosing regions, inert gas plasma regions, hydrogen-containing plasma regions, chlorine-containing plasma and metrology regions, or regions where an atomic hydrogen source is located. Alternately, laser irradiation techniques may be substituted for the plasma energy in some of the processing regions. The film growth process can be implemented at substrate temperatures between about 25 C and about 600 C, together with optional exposures to laser irradiation to cause the surface of the film to melt or to experience a near-melt condition. | 10-09-2014 |
20140345523 | SUBSTRATE EJECTION DETECTION DEVICE, METHOD OF DETECTING SUBSTRATE EJECTION AND SUBSTRATE PROCESSING APPARATUS - A substrate ejection detection device is used for substrate processing apparatus configured to process a substrate by continuously rotating a turntable holding the substrate on a concave portion formed in a surface thereof to receive the substrate thereon. In the substrate processing device, the turntable is substantially horizontally provided in a chamber. The substrate ejection detection device includes a substrate ejection determination unit configured to determine whether the substrate is out of the concave portion by determining whether the substrate exists on the concave portion while rotating the turntable. | 11-27-2014 |
20140352615 | HIGH-ENERGY ION IMPLANTER - A high-energy ion implanter includes a high-energy multi-stage linear acceleration unit that accelerates an ion beam so as to generate a high-energy ion beam, a deflection unit that changes the direction of the high-energy ion beam toward a semiconductor wafer, and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The beam transportation unit includes a beam shaper, a high-energy beam scanner, a high-energy electric field type beam collimator, and a high-energy electric field type final energy filter. | 12-04-2014 |
20140366801 | HIGH-ENERGY ION IMPLANTER - A high-energy ion implanter includes: a beam generation unit that includes an ion source and a mass analyzer; a high-energy multi-stage linear acceleration unit that accelerates an ion beam so as to generate a high-energy ion beam; a high-energy beam deflection unit that changes the direction of the high-energy ion beam toward the wafer; and a beam transportation unit that transports the deflected high-energy ion beam to the wafer. The deflection unit is configured by a plurality of deflection electromagnets, and at least a horizontal focusing element is inserted between the plurality of deflection electromagnets. | 12-18-2014 |
20140366802 | GAS NOZZLE FOR CONTROLLING PLATED MEMBRANE THICKNESS AND HOT-DIP APPARATUS USING SAME - The gas nozzle comprises: an outer tube part that is provided in an upright position with respect to the liquid surface of molten metal; an inner tube part provided inside the outer tube part, comprising a cavity inside, through which a wire rod pulled up from the molten metal passes; a void part formed between the outer tube part and the inner tube part; a gas introduction part for introducing gas into the void part; and a jetting port for jetting at least part of the gas introduced by the gas introduction part, via the void part, from one end of the outer tube part towards the liquid surface of the molten metal. | 12-18-2014 |
20150013604 | CHAMBER PRESSURE CONTROL APPARATUS FOR NEAR ATMOSPHERIC EPITAXIAL GROWTH SYSTEM - The embodiments described herein generally relate to devices and systems for increased pressure control of near atmospheric deposition processes. Devices and systems disclosed herein generally include an exhaust apparatus for a processing chamber in connection with an automated valve which is positioned between the exhaust port and the abatement system. The processing chamber can generally be maintained at a pressure above atmospheric pressure while the automated valve controls the flow of gases leaving the chamber to keep the pressure constant in the chamber. | 01-15-2015 |
20150027370 | Electrostatic Coating Cable Maintenance Device - A time period required for replacement work of a divided cable is shortened. An electrostatic coating cable ( | 01-29-2015 |
20150034008 | VAPOR DEPOSITION APPARATUS - Provided is a vapor deposition apparatus including a deposition unit including a plurality of deposition modules disposed parallel to each other and a substrate mounting unit located below the deposition unit, on which a substrate is mounted. In this case, each of the plurality of deposition modules includes a nozzle configured to selectively inject a raw gas and a purge gas toward the substrate mounting unit, and the nozzle injects the raw gas while the substrate mounting unit is being located below the nozzle. | 02-05-2015 |
20150034009 | DRAWING DEVICE - A drawing device includes a drawing device main body which has a cartridge setting unit in which a drawing liquid cartridge is set in a detachable manner, and discharges a supplied drawing liquid from the drawing head to perform a drawing process, a chamber room which accommodates the drawing device main body, a booth opening which is provided in the chamber room and causes a drawing liquid cartridge to be received in the chamber room, a transport unit which transports the drawing liquid cartridge between the receiving area and the relay area, and a transfer unit which transfers the drawing liquid cartridge between the relay area and the cartridge setting unit. | 02-05-2015 |
20150090182 | CONTINUOUS GALVANIZING LINE - A continuous galvanizing line having an annealing furnace of an all radiant tube heating type includes a moisture removal device, dew-point meters, outlets through which the atmospheric gas in the furnace is collected and inlets through which the atmospheric gas from which moisture has been removed with the moisture removal device is fed into the furnace, the dew-point meters and the outlets being placed at least at two points which respectively exist on a side wall in the vicinity of the entrance of the annealing furnace and on a side wall in the vicinity of the furnace top or the furnace bottom at a position where a steel sheet has a maximum end-point temperature, the inlets being placed at two points which respectively exist on side walls on the sides opposite to the sides of the two points for the outlets in the height direction of the furnace, making it possible to steadily control the dew-point of the atmospheric gas to be −45° C. or lower and −80° C. or higher throughout the whole area of the annealing furnace. | 04-02-2015 |
20150101535 | VAPOR DEPOSITION APPARATUS - A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part. | 04-16-2015 |
20150107514 | ROLL-TO-ROLL PRINTING SYSTEMS AND METHODS FOR FABRICATING PRINT ROLLER - A multiple degrees of freedom control apparatus for a roll-to-roll printing system. | 04-23-2015 |
20150122176 | DISPENSING APPARATUS - A dispensing apparatus used to dispense glue on a workpiece includes a first conveyer, a robot arm and a first storing module. The first conveyer has a work region and a storage region. The workpiece is loaded on the first conveyer and transmitted from the work region to the storage region. The robot arm is movably disposed adjacent to the work region and has a dispensing unit and an image identifying unit. The image identifying unit retrieves an image signal of the work region. The robot aim controls the dispensing unit to dispense glue on the workpiece according to the image signal of the work region. The first conveyer transmits the dispensed workpiece from the work region to the storage region. The first storing module, which is disposed adjacent to the storage region, supports the dispensed workpiece and lifts it away from the first conveyer. | 05-07-2015 |
20150128859 | DEPOSITION SYSTEM - A deposition system includes a chamber, an electrical power module, a first detection module and a second detection module. The chamber includes a target, a substrate, and a plasma. The substrate is spaced apart with the target and corresponded to the target. The plasma is generated between the target and the substrate. The target, the substrate and the plasma are in an interior of the chamber. The electrical power module is electrically connected with the target so as to generate a potential difference between the target and the substrate. The first detection module is connected with the interior of the chamber for detecting a composition of the plasma so as to generate a first detection result. The second detection module is connected with the first detection module, and includes an avalanche photodiode detector for analyzing the first detection result so as to generate a second detection result. | 05-14-2015 |
20150128860 | DEPOSITION SYSTEMS HAVING DEPOSITION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY WITH RADIATION DEFLECTION AND RELATED METHODS - Deposition chambers ( | 05-14-2015 |
20150322565 | IMPLANT REGION DEFINITION - Among other things, one or more systems and techniques for defining one or more implant regions or for doping a semiconductor arrangement are provided. A first implant region is defined based upon a first implant mask overlaying a first active region of a semiconductor arrangement. A second implant region is defined based upon the first implant mask and a second implant mask overlaying a second active region of the semiconductor arrangement. A third implant region is defined based upon the second implant mask overlaying a third active region of the semiconductor arrangement. One or more doping processes are performed through the first implant mask and the second implant mask to dope the semiconductor arrangement. Because the first implant mask and the second implant mask overlap the second active region, doping area coverage is improved thus mitigating undesirable voltage threshold variations otherwise resulting from inadequate doping area coverage. | 11-12-2015 |
20150323483 | DETECTION DEVICE - A detection device includes a chamber for vacuum coating, a capacitance measurement device and a baffle mechanism located in the chamber. The baffle mechanism is a closed structure encompassed by a number of baffle walls, wherein at least one baffle wall includes a fixed baffle plate and a moveable baffle plate. The moveable baffle plate is pivotable about the fixed baffle plate. The moveable baffle plate, after pivoting, may get parallel with an adjacent baffle wall. The adjacent baffle wall and the moveable baffle plate are respectively connected to the capacitance measurement device, and the capacitance measurement device is used to measure the capacitance between the adjacent baffle wall and the moveable baffle plate. The detection device may accurately detect the service life of the baffle mechanism and achieve precise management of the apparatus. | 11-12-2015 |
20150328654 | COATING SYSTEM FOR COATING OBJECTS - A coating system for coating objects comprises an application device and a supply system, by means of which at least one liquid material can be fed to the application device via a flow path. A temperature control arrangement is present, by which the temperature of the at least one liquid material can be controlled in the flow path and/or the application device in at least one temperature control region. | 11-19-2015 |
20150333298 | HEATING VESSEL OF DETECTING AND PREVENTING LEAKAGE OF HIGH TEMPERATURE METAL MATERIAL AND MANUFACTURE METHOD THEREOF - The present invention is related with a heating vessel of detecting and preventing leakage of high temperature metal material and a manufacture method thereof. The heating vessel comprises: an internal heating vessel employed for containing metal material, an external heating vessel employed to contain the internal heating vessel and to be heated by a heating apparatus and a detection apparatus; multiple bottom static wires are located between the internal heating vessel and the external heating vessel, where is close to the joint of a lateral side and a bottom of the internal heating vessel, and two ends of each of the bottom static wires are respectively connected to corresponding detection terminals on tops of the internal heating vessel and the external heating vessel, and the detection apparatus detects the material leakage by measuring resistance between the two detection terminals corresponding to the two adjacent ends of the two adjacent bottom static wires. The present invention also provides the manufacture method. The present invention provides a design of a special heating vessel, which is easy to detect whether the material leakage occurs or not and guarantees that the related experiment and production can continue under circumstance that heating vessel is broken. | 11-19-2015 |
20150338279 | Control of Stray Radiation In A CVD Chamber - An apparatus and method for controlling stray radiation within a CVD chamber. A heater array disposed beneath a wafer carrier for radiatively heating of the wafer carrier includes a peripheral or outermost heating element or elements. Scattered radiation originating from a designated segment of the peripheral heating element(s) can be reduced locally by one of several mechanisms, including reducing the emission (e.g., operating temperature) of the designated segment, or capturing or deflecting a portion of the radiation originating from the designated segment. In one embodiment, an electrical connector on a resistance heating element provides the reduced emission from the designated segment. It has been found that radiation thermometers fixed proximate an axis that extends from the center of the wafer carrier and across the designated segment is subject to less stray radiation, thus providing a more reliable temperature reading in the optical wavelengths. | 11-26-2015 |
20150338560 | OPTICAL DEVICE AND METHOD OF IN SITU TREATING AN EUV OPTICAL COMPONENT TO ENHANCE A REDUCED REFLECTIVITY - The present invention relates to an optical device and a method of in situ treating an optical component ( | 11-26-2015 |
20150375255 | METHOD OF COATING A SUBSTRATE WITH A CATALYST COMPONENT - A method of coating a substrate with a liquid comprising a catalyst component, which substrate comprises a plurality of channels, wherein the method comprises:
| 12-31-2015 |
20150376782 | Wafer Placement And Gap Control Optimization Through In Situ Feedback - Apparatus and methods of dimension control and monitoring between a processes fixture and a susceptor, and position determination of wafers are described. | 12-31-2015 |
20160017497 | PECVD PROCESS - A method of processing a substrate according to a PECVD process is described. Temperature profile of the substrate is adjusted to change deposition rate profile across the substrate. Plasma density profile is adjusted to change deposition rate profile across the substrate. Chamber surfaces exposed to the plasma are heated to improve plasma density uniformity and reduce formation of low quality deposits on chamber surfaces. In situ metrology may be used to monitor progress of a deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants. | 01-21-2016 |
20160040292 | ROLL-TO-ROLL ELECTROLESS PLATING SYSTEM WITH LOW DISSOLVED OXYGEN CONTENT - A roll-to-roll electroless plating system including a sump containing a first volume of a plating solution, and a pan containing a second volume of the plating solution, the second volume being less than the first volume. A web advance system advances a web of media though the plating solution in the pan, wherein a plating substance in the plating solution is plated onto predetermined locations on a surface of the web of media. A pan-replenishing pump moves plating solution from the sump to the pan through a pipe. A distribution system injects an inert gas into the plating solution to reduce the amount of dissolved oxygen. | 02-11-2016 |
20160047047 | RAW MATERIAL GAS SUPPLY APPARATUS - A raw material gas supply apparatus is configured to obtain a difference between a set value and a measured value of a vaporized raw material, add the difference as a correction value to the set value of the flow rate of the carrier gas to maintain an amount of the vaporized raw material at the set value, and subtract a difference from a set value of a flow rate of the dilution gas to maintain a total flow rate of the carrier gas and the dilution gas at a constant level. The amount of the vaporized raw material is calculated by subtracting an integration value of a measured value of the flow rate of the inert gas in the supply period of the raw material gas from an integration value of the flow rate of the raw material gas which is measured in the supply period. | 02-18-2016 |
20160052012 | COMBINATION NOZZLE AND DEVICE FOR APPLYING A VISCOUS MATERIAL TO A COMPONENT EDGE - A combination nozzle and a device for applying a viscous material, particularly an adhesive, to a component edge includes two wide-slot nozzles lying close to one another. The first nozzle applies the viscous material and the second nozzle supplies a gas such as air for shaping the applied material bead. A nozzle mount has a guide roller placed on and movable about the edge of the component during application. A connector element via a connecting mechanism allows movement of the nozzle mount parallel to the surface normal on the component edge to press the guide roller against the edge during the application process by a spring mechanism. With the proposed combination nozzle and the proposed device, an optimal wetting of the component edge with the viscous material can be achieved, and additionally the component tolerances are compensated without the necessity of an elaborate sensor system. | 02-25-2016 |
20160060745 | REACTOR DEVICE WITH REMOVABLE DEPOSITION MONITOR - A reactor apparatus includes a first chamber coupled to a first source of vacuum, a monitor chamber isolated from the first chamber and coupled to a second source of vacuum, and at least one removable deposition monitor disposed in the monitor chamber. | 03-03-2016 |
20160062372 | LIQUID FEEDING DEVICE AND SUBSTRATE TREATING DEVICE - A liquid feeding device that feeds a treatment liquid to a treating device and also recovers the treatment liquid for re-feeding, include feeding tanks having an exhaust passage and an overflow line, and can be switched to one of a feeding mode in which the treatment liquid is fed and a standby mode in which the feeding tank is on standby while accommodating the treatment liquid; a feeding mechanism that feeds the treatment liquid to the treating device from the feeding tank in the feeding mode among the plurality of feeding tanks; a recovery mechanism that recovers and returns the treatment liquid excessive in the treatment device to the feeding tank in the feeding mode; and an on-off mechanism provided in each of the plurality of feeding tanks to block the exhaust passage and the overflow line is provided. | 03-03-2016 |
20160064912 | ANTI-ICING COATING FOR POWER TRANSMISSION LINES - Provided are methods and systems for forming piezoelectric coatings on power line cables using sol-gel materials. A cable may be fed through a container with a sol-gel material having a piezoelectric material to form an uncured layer on the surface of the cable. The layer is then cured using, for example, infrared, ultraviolet, and/or other types of radiation. The cable may be suspended in a coating system such that the uncured layer does not touch any components of the system until the layer is adequately cured. Piezoelectric characteristics of the cured layer may be tested in the system to provide a control feedback. The cured layer, which may be referred to as a piezoelectric coating, causes resistive heating at the outer surface of the cable during vibration of the cable due transmission of alternating currents and environmental factors. | 03-03-2016 |
20160068953 | Gas Separation Control in Spatial Atomic Layer Deposition - Apparatus and methods for spatial atomic layer deposition including at least one first exhaust system and at least one second exhaust system. Each exhaust system including a throttle valve and a pressure gauge to control the pressure in the processing region associated with the individual exhaust system. | 03-10-2016 |
20160090651 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus includes a processing chamber configured to accommodate a substrate therein; a first processing gas supply part configured to supply a first processing gas to the substrate, the first processing gas supply part including a vaporizer configured to vaporize a first processing gas precursor into the first processing gas; a second processing gas supply part configured to supply a second processing gas to the substrate; a vaporizer remaining amount measuring part configured to measure a remaining amount of the first processing gas precursor within the vaporizer; and a control part configured to adjust a number of cycles for supplying the first processing gas and the second processing gas based on the remaining amount of the first processing gas precursor. | 03-31-2016 |
20160102400 | CONTROLLED COATING APPARATUS, SYSTEMS, AND METHODS - Apparatus and systems may operate to provide a first reactant as a gas that flows under reduced atmospheric pressure to interact with a surface, such as a tool body surface, the interaction confined to a passage within the tool body, wherein the passage includes the surface and extends without interruption from an entrance end of the passage to an exit end of the passage. Additional activity may include providing a second reactant as a gas under the reduced atmospheric pressure, subsequent to the first reactant, to interact with the surface of the tool body; and repeated provision of the first and second reactants until a selected coating thickness on the surface is formed. Additional apparatus, systems, and methods are disclosed. | 04-14-2016 |
20160107183 | Application of Fluids to Substrates - Various embodiments relate to application of a fluid to a substrate. The fluid is locally heated, for example, to obtain a desired thickness profile. | 04-21-2016 |
20160115583 | DEVICE AND METHOD FOR VACUUM EVAPORATING - A device for vacuum evaporating includes a thermal evaporation module that generates vapor in a vacuum chamber through a circular opening by heating a vapor evaporation material accommodated therein. A moving stage is positioned in an atmospheric area separated from the vacuum chamber and adjusts a position of the thermal evaporation module under the thermal evaporation module. A sealing part is combined with the thermal evaporation module to isolate the vacuum chamber and the atmospheric area from each other and maintain a vacuum state of the vacuum chamber while surrounding the thermal evaporation module and permitting movement of the thermal evaporation module. | 04-28-2016 |
20160122854 | INSTALLATION FOR HOT DIP COATING A METAL STRIP COMPRISING AN ADJUSTABLE CONFINEMENT BOX - An installation for hot dip coating a metal strip is provided. The installation includes a device for moving the metal strip along a path, a pot for containing a melt bath and a wiping system including at least two nozzles placed on either side of the path downstream the pot. The wiping system has a box with a lower confinement part confining an atmosphere around the metal strip upstream of said nozzles and an upper confinement part confining the atmosphere around the metal strip downstream of the nozzles, first moving means for vertically moving the lower confinement part with respect to the pot and second moving means for vertically moving the upper confinement part with respect to both the pot and the lower confinement part. The nozzles are vertically movable relative to the pot. | 05-05-2016 |
20160122903 | DEVICE OF MANUFACTURING SILICON CARBIDE SINGLE CRYSTAL - A device of manufacturing a silicon carbide single crystal includes a crucible, a first resistive heater, a second resistive heater, and a first support portion. The crucible has a top surface, a bottom surface opposite to the top surface, and a tubular side surface located between the top surface and the bottom surface. The first resistive heater is disposed to face the bottom surface. The second resistive heater is provided to surround the side surface. The first support portion supports the crucible such that the bottom surface is separated from the first resistive heater, and the side surface is separated from the second resistive heater. The first support portion is in contact with at least one of the top surface and the side surface. | 05-05-2016 |
20160126123 | Method For Improving Performance Of A Substrate Carrier - A method of modifying a substrate carrier to improve process performance includes depositing material or fabricating devices on a substrate supported by a substrate carrier. A parameter of layers deposited on the substrate is then measured as a function of their corresponding positions on the substrate carrier. The measured parameter of at least some devices fabricated on the substrate or a property of the deposited layers is related to a physical characteristic of substrate carrier to obtain a plurality of physical characteristics of the substrate carrier corresponding to a plurality of positions on the substrate carrier. The physical characteristic of the substrate carrier is then modified at one or more of the plurality of corresponding positions on the substrate carrier to obtain desired parameters of the deposited layers or fabricated devices as a function of position on the substrate carrier. | 05-05-2016 |
20160130698 | NANOWIRE GROWTH SYSTEM HAVING NANOPARTICLES AEROSOL GENERATOR - A nanoparticles aerosol generator is disclosed. The nanoparticles aerosol generator includes an evaporation chamber having a wall, a container containing a source material, and a heating device configured to heat the source material. The nanoparticles aerosol generator also includes a carrier gas source configured to blow a carrier gas toward the source material to generate a nanoparticles aerosol with nanoparticles of the source material suspended therein. The nanoparticles aerosol generator further includes a dilution gas source configured to supply a dilution gas into the chamber to flow substantially along the wall within the chamber and to dilute the nanoparticles aerosol. | 05-12-2016 |
20160136677 | GLUING SYSTEM FOR APPLYING GLUE ON PRODUCTS - A gluing system for applying glue on products is disclosed. The gluing system includes a glue applicator configured to deposit melted glue on products, a glue container configured to contain excess melted glue discharged from the applicator and fresh melted glue, a glue delivering unit configured to deliver glue from the container to the applicator and a glue discharging unit configured to convey excess glue not used by the applicator to the container. The container is divided by a partition into a first chamber, containing the fresh melted glue, and into a second chamber containing the excess melted glue and separated from the first chamber. The partition includes a filter allowing flow of the fresh melted glue and the excess melted glue from both the first and second chambers to the delivering unit. | 05-19-2016 |
20160136678 | DUAL WEB CONVEYANCE - A dual web conveyance system includes a first unwind unit configured to unspool a first web from a first spool, a first rewind unit configured to spool the first web around a second spool, a second unwind unit configured to unspool a second web from a third spool, a second rewind unit configured to spool the second web around a fourth spool, and a control system. The control system includes a first drive control unit configured to control a first unspooling speed of the first unwind unit, a first tension control unit configured to control a first spooling tension of the first rewind unit, a second drive control unit configured to control a second unspooling speed of the second unwind unit, and a second tension control unit configured to control a second spooling tension of the second rewind unit. | 05-19-2016 |
20160163912 | METHODS AND SYSTEMS FOR PRECISION APPLICATION OF CONDUCTIVE ADHESIVE PASTE ON PHOTOVOLTAIC STRUCTURES - One embodiment of the invention provides an apparatus for dispensing conductive paste on photovoltaic structures during manufacturing of a solar panel. The apparatus includes a cartridge for holding the conductive paste, a jet-dispensing module coupled to the cartridge, and a robotic arm coupled to the jet-dispensing module. The jet-dispensing module is configured to dispense a predetermined amount of the conductive paste on busbars of a respective photovoltaic structure in a non-contact manner, and the robotic arm is configured to adjust a position of the jet-dispensing module, thereby facilitating alignments between the jet-dispensing module and the busbars of the photovoltaic structure. | 06-09-2016 |
20160181651 | APPARATUS FOR MANUFACTURING ELECTRODE FOR LITHIUM ION SECONDARY BATTERY | 06-23-2016 |
20160184853 | COATING DEVICE - A coating device comprises a base, a mounting bracket mounted to the base by a driving mechanism, a coating unit which comprises a supporting rack mounted to the mounting bracket and a nozzle mounted to the supporting rack, and the coating device further comprises a detecting device mounted to the supporting rack, which detects information about a distance between the nozzle and a surface of the substrate to be coated and information about an obstacle on a substrate in an advancing direction of the nozzle; a control unit, which controls to keep the distance to be a preset distance based on the detected distance information, and which controls to stop operation of the nozzle where an obstacle is detected on a region on the surface of the substrate between the detecting device and the nozzle. | 06-30-2016 |