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PROGRAM, CYCLIC, OR TIME CONTROL

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118 - Coating apparatus

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Class / Patent application numberDescriptionNumber of patent applications / Date published
118697000 Having prerecorded program medium 18
118699000 Having timer 13
118706000 Cyclic operation of singular element 8
118704000 Sequential energization of plural operations 7
118698000 Having selection means for alternate operational sequences 2
20090044749Substrate processing apparatus - To automatically purge a transfer chamber by means of inert gas. There is provided a substrate processing apparatus including a controller that performs control so that a transfer chamber 02-19-2009
20090114151Apparatuses and Methods for Maskless Mesoscale Material Deposition - Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment. Deposition of and subsequent laser post processing produces linewidths as low as 1 micron, with sub-micron edge definition. The apparatus nozzle has a large working distance—the orifice to substrate distance may be several millimeters—and direct write onto non-planar surfaces is possible.05-07-2009
Entries
DocumentTitleDate
20100154707PROCESS CHAMBER CLEANING METHOD IN SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a gas containing nitrogen within the process chamber.06-24-2010
20130036972PIXEL OBSERVATION SYSTEM AND DRAWING SYSTEM - A pixel observation system includes a memory unit, a coordinate generation unit, and an observation unit. The memory unit is configured to store at least nozzle information indicative of discharge states of a liquid material in a plurality of nozzles and arrangement information indicative of an arrangement of each of the nozzles with respect to each of a plurality of pixel regions in relative movement of the nozzles and a substrate. The coordinate generation unit is configured to generate observation coordinates of observation regions on the substrate based on the nozzle information and the arrangement information, and to include coordinates of at least some of the pixel regions over which the nozzles scan through one cycle of the relative movement in the observation coordinates. The observation unit is configured and arranged to observe the pixel regions positioned at the observation coordinates generated by the coordinate generation unit.02-14-2013
20100006028Apparatus and Method for Conditioning a Bowling Lane Using Precision Delivery Injectors - The invention relates generally to the conditioning of bowling lanes, and, more particularly to an apparatus and method for automatically applying a predetermined pattern of dressing fluid along the transverse and longitudinal dimensions of a bowling lane.01-14-2010
20090235865Substrate processing apparatus and substrate processing system - To provide a substrate processing system which can cause different display portions to output different displays, and cause different operations to be carried out from different operation screens. A substrate processing system, on login information of a user being input from a main display device, refers to the login information, a user group parameter, with which is set a group to which the user belongs, and an authority parameter, which sets an authority of the group, and causes the main display device to display a main operation screen corresponding to the user, while it, on login information of a user being input from an external operating apparatus, causes an external display device to display an external parameter setting screen for setting an authority parameter of a group to which the user belongs, or to display an external operation screen corresponding to the group to which the user belongs.09-24-2009
20130160708Combinatorial High Power Coaxial Switching Matrix - A system and method for combinatorial processing of substrates in a processing chamber. The system includes a plurality of generators for supplying power into the processing chamber. A plurality of sputter guns provides power to different regions of a substrate. A switchbox switches power from a generator to a sputter gun via a plurality of coaxial switches. A controller positioned within the switchbox automatically distributes power from a specific generator to a specific sputter gun under programmable logic control.06-27-2013
20120266815Powder Spreader - Powder spreaders suitable for use with layered manufacturing processes are disclosed in which a strip of flexible material of a width which spans the powder bed is used to spread, level, and, optionally, compact deposited powder to form a layer of the powder bed. The strip surface moves relative to the deposited powder it is spreading as the working portion of the strip, i.e., the portion of the strip that is in contact with the powder, traverses across the powder bed so that it can provide lift to the powder in front of it and, optionally, compaction to the powder below it. The working portion of the strip can be configured to have its leading and trailing surface contours to be different from one another, and, optionally, to have these contours and its bottom edge contour be independently adjustable. Layered manufacturing systems comprising such powder spreaders are also disclosed.10-25-2012
20110277687Process and Apparatus for Forming a Tubular Article - An apparatus and process are provided for forming a tubular article. A tube holder is mounted to a support stand via an automatic alignment device. A tubular metal sleeve is placed in the tube holder. A coating material is provided. A bullet-shaped or spherical element is passed through the metal sleeve such that the element runs along an inner circumferential surface of the metal sleeve. The automatic alignment device allows the metal sleeve and the tube holder to level themselves such that the element is substantially aligned with the metal sleeve as the element moves through the metal sleeve. The element spreads the coating material generally evenly along the inner circumferential surface of the metal sleeve as the element passes through the metal sleeve.11-17-2011
20110100294SYSTEM AND METHOD FOR COATING MEDICAL DEVICES - A system and method for photo-grafting a coating polymer onto the surface of a medical device are provided. The system comprises a plurality of stations including a novel grafting station. The system and method of the invention are both time- and resource-efficient. The system includes several stations, each station including a dipping tank. The system allows for the automated, semi-automated, or manual dipping of medical devices into the dipping tanks in a specified order, as desired, wherein at least one of the stations is a grafting station for photo-grafting the coating polymer onto the surface of the medical device. The system is modular, which allows for modification of the process as required, depending on the needs of the user. The system may comprise stations for incorporating an antimicrobial agent into the coating, and/or for rendering the coating lubricious.05-05-2011
20090277385METHOD AND APPARATUS FOR COATING INTERIOR SURFACES OF MEDICAL DEVICES - A coating can be applied to an endolumenal wall of a medical device by positioning an optical fiber within the lumen, providing a photo-activated chemical to contact the endolumenal wall, supplying the optical fiber with radiation capable of activating the chemical within the lumen, and withdrawing the optical fiber from the lumen at a controlled rate while the radiation is being emitted from the optical fiber to activate the chemical in close proximity to the endolumenal wall.11-12-2009
20110197812APPARATUS AND METHOD FOR FABRICATING A PHASE-CHANGE MATERIAL LAYER - Apparatus for fabricating a phase-change material layer include a process chamber. A first source supplier including a liquid delivery system (LDS) structure is coupled between a tellurium (Te) source container and the process chamber. A second source supplier including a bubbler method structure is coupled between at least one metal organic (MO) source container and the process chamber. Methods are also provided.08-18-2011
20080282976Film formation apparatus and method for using the same - A method for using a film formation apparatus for a semiconductor process includes setting an idling state where a reaction chamber of the film formation apparatus accommodates no product target substrate therein, and then, performing a purging process of removing a contaminant present in an inner surface of the reaction chamber by causing radicals to act on the inner surface of the reaction chamber. The radicals are generated by activating a purging process gas containing oxygen and hydrogen as elements.11-20-2008
20080295769THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD - A second plate is disposed opposing to a first plate. The second plate is supported by three supporting members which are disposed in a circle about a central axis. The supporting members are provided with extensible portions, respectively and are arranged to be able to extend and contract in a moving direction. A control unit drives to extend and to contract the extensible portions independently to displace the second plate in the moving direction at the supporting portion at which the supporting members support the second plate. Hence, the relative tilt of the second plate relative to the first plate is corrected.12-04-2008
20080216740Resist coating method and apparatus - A resist coating method includes a dummy dispensation step for discharging a resist onto a semiconductor substrate in response to a dummy discharge signal, a pre-wet step for applying and then drying a pre-wet solvent on the semiconductor substrate, and a resist coating step for applying the resist onto the semiconductor substrate in response to a resist discharge signal. The resist discharge signal is output at a timing that precedes a predetermined dry time being elapsed by a delay time, which is calculated between the timing for outputting the dummy discharge signal and the timing for actually discharging the resist, thus normally maintaining the predetermined dry time constant. This makes it possible to stably produce pre-wet effects, to improve the uniformity regarding the thickness of a resist film formed on the semiconductor substrate, and to reduce dispersion regarding pre-wet effects between resist coating apparatuses.09-11-2008
20090050056SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD THEREOF - A substrate processing apparatus and a substrate manufacturing method using the substrate processing apparatus which manufactures, with a high production efficiency, a semiconductor having superior electric characteristics in the nitridation process of a gate insulating film are disclosed. The substrate processing apparatus for the substrate manufacturing method includes a processing chamber which processes the substrate, a processing chamber which generates the plasma, a heating unit which heats the substrate, a gas supply source, and a control unit which executes a first process which converts a nitrogen-containing gas supplied to the processing chamber into the plasma by the processing chamber and heats the substrate by the heating unit, and a second process which stops the plasma generation and heating the substrate further at the temperature of not lower than 450° C. by the heating unit.02-26-2009
20120103256VERTICAL HEAT TREATMENT APPARATUS - Provided is a vertical heat treatment apparatus which performs a film-forming process for substrates by supplying a film-forming gas to a plurality of substrates loaded onto a substrate supporter. The substrate supporter is rotated around an inclination axis, and the apparatus includes: a plurality of main holders which are provided at every reception position of the substrates in the substrate supporter and respectively supports the peripheries of the substrates at positions separated from each other in the circumferential direction; and first and second auxiliary holders which are located to be separated from the main holders in the circumferential direction and whose tops are lower than those of the main holders. Each substrate alternates between a position supported by the first auxiliary holder and the main holders and a position supported by the second auxiliary holder and the main holders every rotation of the substrate supporter.05-03-2012
20100192855Manufacturing method of a semiconductor device, and substrate processing apparatus - An object of this invention is to make it possible to suppress early-stage oxidation of a substrate surface prior to oxidation processing, and to remove a natural oxidation film. For this reason, a method is provided comprising the steps of loading a substrate into a processing chamber, supplying a hydrogen-containing gas and an oxygen-containing gas into the processing chamber, and subjecting a surface of the substrate to oxidation processing, and unloading the substrate subjected to oxidation processing from the processing chamber. In the oxidation processing step, the hydrogen-containing gas is introduced in advance into the processing chamber, with the pressure inside the processing chamber set at a pressure that is less than atmospheric pressure, and the oxygen-containing gas is then introduced in the state in which the introduction of the hydrogen-containing gas is continued.08-05-2010
20100132612APPLICATOR FOR APPLYING FLUID TO A SUBSTRATE, COMPRISING VALVE MECHANISMS, METHOD FOR CLEANING SAID APPLICATOR, AND VALVE MECHANISMS FOR SAID APPLICATOR - Disclosed is an applicator (06-03-2010
20110100293SYSTEM AND METHOD FOR COATING MEDICAL DEVICES - A system and method for photo-grafting a coating polymer onto the surface of a medical device are provided. The system comprises a plurality of stations including a novel grafting station. The system and method of the invention are both time- and resource-efficient. The system includes several stations, each station including a dipping tank. The system allows for the automated, semi-automated, or manual dipping of medical devices into the dipping tanks in a specified order, as desired, wherein at least one of the stations is a grafting station for photo-grafting the coating polymer onto the surface of the medical device. The system is modular, which allows for modification of the process as required, depending on the needs of the user. The system may comprise stations for incorporating an antimicrobial agent into the coating, and/or for rendering the coating lubricious.05-05-2011
20090114150Substrate processing apparatus - To simultaneously display a transfer state of substrates (wafers) held on a substrate holding tool and detail-information thereof on the same screen. In a substrate processing apparatus that loads a substrate holding tool, on which a plurality of substrates are placed, into a furnace, and applies prescribed processing thereto, a whole body of boats, as a boat image view of transfer information regarding the substrates on the substrate holding tool, is displayed in an operation screen, and detail-information of a substrate of each area is displayed in the operation screen, with the whole body of the boats divided into a plurality of areas.05-07-2009
20100300355PRINTING MATERIAL PROFILES ONTO SUBSTRATES - A printing apparatus configured to print a material profile onto a substrate is provided. The printing apparatus includes a container, a nozzle, a positive displacement mechanism, and one or more regulators. The container is adapted to hold a precursor material. The container has a first end and a second end, with the nozzle connected to the first end of the container. The nozzle has an orifice configured to deposit the precursor material over the substrate. The positive displacement mechanism is configured to push the precursor material through the orifice of the nozzle over the substrate. The regulator is configured to deposit the precursor material in accordance with pre-determined parameters governing width and cross-sectional area of the precursor material deposited over the substrate, such that the precursor material deposited over the substrate has a pre-determined width and a pre-determined cross-sectional area.12-02-2010
20110061593DUAL MODE PUMP CONTROL - A fluid pump control that allows for both flow control and pressure control to allow greater flexibility in applying architectural coatings.03-17-2011
20090000547Semiconductor device fabrication method and fabrication apparatus - According to the present invention, there is provided a semiconductor device fabrication method comprising:01-01-2009
20100282164METHODS AND SYSTEMS FOR CONTROLLING TEMPERATURE DURING MICROFEATURE WORKPIECE PROCESSING, E.G., CVD DEPOSITION - The present disclosure provides methods and systems for controlling temperature. The method has particular utility in connection with controlling temperature in a deposition process, e.g., in depositing a heat-reflective material via CVD. One exemplary embodiment provides a method that involves monitoring a first temperature outside the deposition chamber and a second temperature inside the deposition chamber. An internal temperature in the deposition chamber can be increased in accordance with a ramp profile by (a) comparing a control temperature to a target temperature, and (b) selectively delivering heat to the deposition chamber in response to a result of the comparison. The target temperature may be determined in accordance with the ramp profile, but the control temperature in one implementation alternates between the first temperature and the second temperature.11-11-2010
20090308313NON-VOLATILE RESISTANCE SWITCHING MEMORY - A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.12-17-2009
20130008377RESIN COATING DEVICE IN LED PACKAGE MANUFACTURING SYSTEM - There are preliminarily prepared element characteristic information 01-10-2013
20120097101Modularly Integrated Coating Systems - Modularly integrated coating systems for coating a plurality of parts include a part handling system that transports parts between one or more modular ovens configured to modularly connect to one another to form a single curing station of selectable size for curing the plurality of parts, wherein the one or more modular ovens comprise a gas burner and a circulating fan, one or more modular support equipment platforms configured to stackably support the one or more modular ovens in the modularly integrated coating system, wherein the one or more modular support equipment platforms comprises, a water treatment system, a water heat generation system, an integrated lab kit module, and an integrated process control system, and a part coating system operationally integrated with the one or more modular ovens and the one or more modular support equipment platforms, wherein the part coating system coats the plurality of parts.04-26-2012
20120037074Automated Thermal Spray Apparatus - An automated thermal spraying apparatus for the automated and uniform application of a thermal spray to the surface of a substrate through regulation of vertical and horizontal components of motion and the rate of the thermal spray.02-16-2012
20120037075COATING APPRATUS HAVING CONCENTRATION SENSOR - A coating apparatus includes an atomization chamber, a reaction chamber having an opening, an outputting chamber successively connected with each other. The coating apparatus also includes a gate, a concentration sensor and a control device. The atomization chamber atomizes a precursor. The reaction chamber receives a reactive gas for reacting with the atomized precursor. The gate is movable between a first position where the opening is closed by the gate and a second position where the opening is disengaged from the gate. The concentration sensor is located in the reaction chamber and senses a concentration of a product obtained in the reaction chamber. The control device is electrically connected with the concentration sensor, configured for comparing the concentration sensed by the concentration sensor with a prestored concentration value, and controlling the gate to move to the second position if the sensed product concentration is equal to the prestored concentration value.02-16-2012
20120037073ASSEMBLY AND PROCESS INCORPORATING A CONVEYED TEMPLATE SURFACE FOR RECEIVING A SPRAYABLE POWDERIZED FOAM IN ORDER TO CREATE A PLURALITY OF FLEXIBLE PARTS - An assembly for creating a part from a spray powder foam and which includes either an overhead suspended or floor supported conveyor, from which are supported or suspended a plurality of spaced apart bodies. Each of the bodies exhibits a template surface corresponding to a part to be produced. One or more spray applicators are arranged in either fixed or numerically operated and movable fashion proximate the conveyor. Upon a selected body advancing to a specified location along the conveyor, the applicator issues a powder foam spray across the template surface. The template surface can be pre-heated to facilitate curing or the body can be advanced following spray application into an oven to facilitate part formation and setting.02-16-2012
20120304926HEATED WAFER CARRIER PROFILING - An apparatus includes a carrier rotatable about an axis of rotation where the carrier has a top surface adapted to hold at least one semiconductor wafer and a surface characterization tool which is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation. The surface characterization tool is operative to move over a plurality of positions relative to the top surface of the carrier and/or the wafer transverse to the axis of rotation and is further adapted to produce characterization signals over the plurality of positions on at least a portion of the carrier and/or on at least a portion of said major surface of the wafer as the carrier rotates.12-06-2012
20120204793LED PACKAGE MANUFACTURING SYSTEM - There are preliminarily prepared element characteristic information 08-16-2012
20120204792CABLE INSCRIPTION DEVICE AND METHOD FOR INSCRIBING CABLES - An apparatus (08-16-2012
20120060758DYNAMIC SYSTEM FOR VARIABLE HEATING OR COOLING OF LINEARLY CONVEYED SUBSTRATES - A system is provided for heating or cooling discrete, linearly conveyed substrates having a gap between a trailing edge of a first substrate and a leading edge of a following substrate in a conveyance direction. The system includes a chamber, and a conveyor operably configured within the chamber to move the substrates through at a conveyance rate. A plurality of individually controlled temperature control units, for example heating or cooling units, are disposed linearly within the chamber along the conveyance direction. A controller is in communication with each of the temperature control units to sequentially cycle output of the units from a steady-state temperature output along the conveyance direction as a function of position of the leading and trailing edges of the substrates within the chamber relative to the temperature control units so as to reduce edge-induced temperature variances in the substrates.03-15-2012
20110088619Unrolling Device for a Material Web - A towel dispenser which sprays portions of a material web pulled off from a supply roll with a disinfectant. A disinfectant supply bottle is arranged partially inside a core of the supply roll, and its liquid outlet is connected to the inlet of a diaphragm pump, which feeds into a nozzle pipe. To measure the residual material web remaining on the supply roll, an angular velocity transmitter is used which comprises a stationary reflective light barrier and a line pattern applied to the inside of the core of the supply roller.04-21-2011
20120118231SUBSTRATE PROCESSING METHOD, STORAGE MEDIUM, AND SUBSTRATE PROCESSING APPARATUS - A method of processing a substrate by a substrate processing apparatus is disclosed. The substrate processing apparatus includes a processing container including a first space where a first processing gas or a second processing gas is supplied onto the substrate and a second space formed around the first space; a first exhaust unit configured to evacuate the first space; and a second exhaust unit configured to evacuate the second space. The method includes a first step of supplying the first processing gas into the first space; a second step of discharging the first processing gas from the first space; a third step of supplying the second processing gas into the first space; and a fourth step of discharging the second processing gas from the first space; wherein the pressure in the second space is adjusted by a pressure-adjusting gas supplied into the second space.05-17-2012
20100206227METHOD AND APPARATUS FOR APPLYING ELECTRONIC CIRCUITS TO CURVED SURFACES - An electric circuit is applied to an object having a curved surface. The curved surface of the object is divided into sections, and the circuit is applied one section at a time. The circuit is formed between layers of dielectric material. The dielectric is applied by a computer-controlled device, which controls the position of a spray head and the rotation of the object, such that the spray head is held substantially perpendicular to the surface of the object at all times, and such that a controlled thickness of dielectric material can be deposited. The fine-featured circuits formed by the invention are rugged, and can be used on objects intended to be exposed to harsh environments.08-19-2010
20120160163ROBOT ARM AND ROBOT USING THE SAME - A robot arm includes a support, a wrist joint rotatably connected to the support, a distal joint rotatably connected to the wrist joint, a first driving mechanism driving the wrist joint, and a second driving mechanism driving the distal joint. The first driving mechanism comprises a first input shaft connected to the wrist joint via two bevel gears, and the first driving mechanism drives the wrist joint to rotate relative to the support. The second driving mechanism comprises a second input shaft connected to the distal joint via at least four bevel gears, and the second driving mechanism drives the distal joint to rotate relative to the wrist joint. The robot arm is sealed and defines a conduit for allowing a plurality of pipes and cables to pass through.06-28-2012
20120073500SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING APPARATUS - Provided is a semiconductor device manufacturing method and a substrate processing apparatus. The method comprise: a first process of forming a film containing a predetermined element on a substrate by supplying a source gas containing the predetermined element to a substrate processing chamber in which the substrate is accommodated; a second process of removing the source gas remaining in the substrate processing chamber by supplying an inert gas to the substrate processing chamber; a third process of modifying the predetermined element-containing film formed in the first process by supplying a modification gas that reacts with the predetermined element to the substrate processing chamber; a fourth process of removing the modification gas remaining in the substrate processing chamber by supplying an inert gas to the substrate processing chamber; and a filling process of filling an inert gas in a gas tank connected to the substrate processing chamber.03-29-2012
20120298035FLUID DISPENSING SYSTEM AND METHOD - A system for dispensing fluid comprises a first pumping device in communication with, and for supplying a first fluid to, a first pump outlet, a first fluid communication dispensing line for communicating the first fluid from the first pump outlet to a dispensing device, a second pumping device in communication with, and for supplying a second fluid to, a second pump outlet, and a second fluid communication dispensing line for communicating the second fluid from the second outlet to a second dispensing device. A supply sub-system causes the first pumping device to supply the first fluid to the first pump outlet and the second pumping device to supply the second fluid to the second pump outlet. The first and second pumping devices are mechanically coupled such that, when one of the pumping device supplies fluid to a pump outlet, fluid is drawn into the other pumping device through an inlet.11-29-2012
20110079177SUBSTRATE PROCESSING SYSTEM, GROUP MANAGING APPARATUS, AND METHOD OF ANALYZING ABNORMAL STATE - A maintenance engineer can analyze an abnormal state with less difficulty in a rapid and correct manner independent of his/her skill. A substrate processing system comprises: a substrate processing apparatus configured to operate according to a recipe defining a process sequence and process conditions, and a group managing apparatus connected to the substrate processing apparatus. The group managing apparatus comprises an analysis support unit. The analysis support unit is configured to extract check item information relating to both abnormal state information for identifying an abnormal state occurring when the recipe is executed and apparatus type information for identifying the type of the substrate processing apparatus at which the abnormal state occurs, and to prepare a check item table comprising the extracted check item information.04-07-2011
20120260855DEPOSITING APPARATUS FOR FORMING THIN FILM - A depositing apparatus for forming a thin film includes a source container in which a source material to be deposited on a substrate is accommodated in a solid or liquid state; an evaporation chamber which couples and communicates with the source container above the source container, and through which an evaporated source material from the source container passes; a spraying hole which is formed on a top of the evaporation chamber, and sprays upward the evaporated source material passed through the evaporation chamber; a first heater which is provided above the source material inside the evaporation chamber or the source container, and supplies heat to the source material to evaporate the source material accommodated in the source container; and a block plate is provided above the first heater inside the evaporation chamber.10-18-2012
20110239937APPARATUS AND METHOD FOR TREATING SUBSTRATE - A substrate treating apparatus and method include a load lock chamber providing a space where a process is performed. While a boat supporting the substrate is positioned in the load lock chamber, a cooling member cools an inside of the load lock chamber at different temperatures according to area or region in a vertical direction of the load lock chamber.10-06-2011
20100132611Substrate Processing System - A substrate processing system is provided, in which collection data transmitted from a substrate processing apparatus can be easily used. A substrate processing system includes a substrate processing apparatus, and a group control apparatus connected to the substrate processing apparatus, wherein the group control apparatus comprises accumulation means for accumulating collection data transmitted from the substrate processing apparatus, storage part for correlating hardware information of components configuring the substrate processing apparatus with previously set element name information and then storing such correlated information, and a memory for correlating the hardware information with the collection data transmitted from the substrate processing apparatus and then memorizing such correlated information.06-03-2010
20110232567METHOD OF CLEANING THE FILAMENT AND REACTOR'S INTERIOR IN FACVD - A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film forming material. The method also includes cleaning the heater assembly, or an interior surface of the reactor, or both. During the cleaning, an alternating current is supplied to the heater assembly to energize a cleaning media into a plasma.09-29-2011
20130098291SUBSTRATE TREATMENT EQUIPMENT AND MANUFACTURING METHOD OF SUBSTRATE - The invention aims to provide substrate treatment equipment that can automatically collect a substrate in a normal condition without needing manual operation. The equipment includes a substrate holder 04-25-2013
20110209661Automated Pizza Assembly System - An apparatus is provided for assembling a pizza, including a pizza sauce spreading station, a cheese spreading station and a pepperoni applying station. A robot including a stationary base and an articulating arm having a gripper attached to the end is operable to grip a pizza pan having pizza dough therein to allow said robot to move the pan throughout the pizza sauce spreading station, and to a rotary dial system including the cheese spreading station and the pepperoni applying station. The robot arm manipulates the pizza pan in the sauce spreading station and the rotary dial system manipulates the pizza pan in the cheese station and the pepperoni applying station to properly distribute the cheese and pepperoni on the pizza.09-01-2011
20130145987Ammonia Gas Detection Apparatus and a Semiconductor Fabrication Line Including the Same - An ammonia gas detection apparatus includes an ammonia sensor that is configured to detect an ammonia gas in a gas stream and to generate a first output signal when the ammonia gas is detected in the gas stream. The ammonia sensor does not detect the ammonia gas in the gas stream when the gas stream further includes an interference gas that disrupts operation of the ammonia sensor. A discoloration gauge includes a reaction solution that changes from a first color to a second color responsive to exposure to the ammonia gas in the gas stream, regardless of the presence of the interference gas, and a detector that generates a second output signal responsive to the reaction solution changing from the first color to the second color. A communication interface outputs the first and second output signal to a host computer that detects presence of the ammonia gas.06-13-2013
20130180448SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING SYSTEM - A substrate transfer device includes a pick which has positioning pins to position a substrate and holds a positioned substrate; a drive unit which drives the pick such that the substrate is loaded/unloaded to/from a vacuum processing unit by using a pick; and a transfer control unit which controls a transfer operation of the substrate using the pick. The transfer control unit obtains in advance information on a reference position of the substrate at room temperature when the substrate is loaded into the vacuum processing unit, calculates a positional deviation from the reference position of the substrate when the substrate is loaded into the vacuum processing unit in actual processing, and controls a drive unit such that the substrate is loaded into the vacuum processing unit by correcting the positional deviation.07-18-2013
20130180449Apparatus and Method for Applying a Product to Skin - An apparatus (07-18-2013
20110308452ANALYTIC SUBSTRATE COATING APPARATUS AND METHOD - An apparatus and method for producing a coated analytic substrate using a compact and portable automated instrument located in the laboratory setting at the point of use which can consistently produce one or a plurality of coated analytic substrates “on demand” for using the analytic substrate immediately after coating, preferably without a step of rinsing the coated analytic substrate before use. The apparatus preferably uses applicator cartridges having a reservoir containing the coating compositions used to form the coatings. Preferably the cartridges are removable and interchangeable to facilitate the production of individual analytic substrates having different coatings or different coating patterns. These coated analytic substrates have superior specimen adhesion characteristics due to the improved quality of the coatings applied by the coating apparatus and due to the quickness with which the coated analytic substrates can be used in the lab after production.12-22-2011
20130192523Systems and methods for printing electronic device assembly - The present invention discloses systems and methods for printing functional blocks from a plurality of printheads to a target substrate. In exemplary embodiments, the printing system comprises a main printhead for the majority of printing process, and a secondary printhead for supplemental printing. The system further comprises a controller, utilizing a positioning intelligence system to distribute the printing of the functional blocks between the main printhead and the secondary printhead, to minimize the motions of the printheads while maximize the printing speed.08-01-2013

Patent applications in class PROGRAM, CYCLIC, OR TIME CONTROL

Patent applications in all subclasses PROGRAM, CYCLIC, OR TIME CONTROL