| Class / Patent application number | Description | Number of patent applications / Date published |
|---|
| 117004000 | PROCESSES OF GROWTH FROM SOLID OR GEL STATE (E.G., SOLID PHASE RECRYSTALLIZATION) | 12 |
| 117005000 | Organic product | 1 |
| 20110139063 | FORMATION OF A THIN FILM OF MOLECULAR ORGANIC SEMICONDUCTOR MATERIAL - The invention relates to a method for forming a thin film of molecular organic semiconductor material (OSCM), said film being intended to be integrated into a device for applications in electronics or optoelectronics, which includes the following steps: step (c) of supplying a defined quantity of the molecular OSCM in the form of a melt to the surface of a substrate so as to form a thin film; and a step (d) of cooling according to a defined temperature profile in order to solidify the thin film, characterized in that the temperature of the substrate surface is equal to or above the melting point of the molecular OSCM at the moment of implementing step (a) and in that the temperature profile of step (b) comprises: a first part corresponding to a sufficiently slow controlled cooling of the molecular OSCM down to a temperature close to the crystallization temperature of the molecular OSCM, so as to cause only a single seed to appear in the thin film in melt form; and a second part corresponding to controlled cooling so that at least one single-crystal domain grows from this seed, the thin film finally obtained being a single-crystal film. The invention further relates to a method of forming an organic field-effect transistor. | 06-16-2011 |
| 117006000 | At pressure above 1 atmosphere | 1 |
| 20120192785 | Multilayer structure for a diamond growth and a method of providing the same - A multi-layer structure in a reaction cell for a diamond growth is provided. The multi-layer structure includes: a diamond seed; a first metal catalyst layer provided on the diamond seed, the first metal catalyst layer containing a first concentration of carbon; a second metal catalyst layer provided on the first metal layer, the second metal catalyst layer containing a second concentration of carbon that is higher than the first concentration; and a carbon source layer provided on the second metal layer. | 08-02-2012 |
| 117007000 | Using heat (e.g., strain annealing) | 10 |
| 20090120351 | Method for Growing Single Crystals of Metals - A method for growing large single crystals of metals is disclosed. A polycrystalline form of a metal specimen is initially heated in a non-oxidizing environment. A minimum plastic strain is then applied to the heated metal specimen to initiate the growth of a selected grain within the heated metal specimen. Additional plastic strain is subsequently applied to the heated metal specimen to propagate the growth of the selected grain to become a large single crystal. | 05-14-2009 |
| 20090038536 | CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, DEVICE, OPTICAL MODULATION ELEMENT, AND DISPLAY APPARATUS - A first optical modulation element irradiates a non-single-crystal substance with a light beam which is to have a first light intensity distribution on the non-single crystal substance by modulating an intensity of an incident first light beam, thereby melting the substance. A second optical modulation element irradiates the substance with a light beam which is to have a second light intensity distribution on the substance by modulating an intensity of an incident second light beam, thereby melting the substance. An illumination system causes the light beam having the second light intensity distribution to enter the molten part of the substance in a period that the substance is partially molten by irradiation of the light beam having the first light intensity distribution. | 02-12-2009 |
| 20090211514 | Single crystal conversion process - A solid state method for converting polycrystalline alumina components to single crystal or sapphire. The single crystal conversion method includes sintering a pre-fired polycrystalline alumina component doped with a magnesia sintering aid in an atmosphere containing a gas mixture of hydrogen and an inert gas, such as nitrogen in one embodiment. A sintering temperature is selected that preferably depends on the percentage of hydrogen selected. The component is held at the sintering temperature for a time sufficient to convert the polycrystalline component into a component formed of a single crystal. In one embodiment, the sintering temperature may be between at least about 1600° C. and less than 2050° C., and the amount of hydrogen in the sintering atmosphere may be between about 4% to about 10%. The method forms a wetting type intergranular film associated with the nucleation and growth of a single abnormal grain in the polycrystalline alumina component. | 08-27-2009 |
| 20090211515 | METHOD FOR SOLID-STATE SINGLE CRYSTAL GROWTH - By controlling the average size of matrix grains of polycrystalline bodies to more than a critical size at which an abnormal, exaggerated or discontinuous grain growth ends, and less than twice the critical size, large single crystals enough for practical use may be made even without occurring abnormal grain growth in polycrystalline bodies only through a heat treatment process without using a melting process and a special apparatus, thereby allowing the mass production of the large single crystals at low costs with high reproduction possibility. | 08-27-2009 |
| 20120312227 | MULTI-HEATER SYSTEM FOR GROWING HIGH QUALITY DIAMOND AND A METHOD FOR GROWING THE SAME - Disclosed herein is an apparatus and method for growing a diamond. The apparatus for growing a diamond comprises: a reaction cell that is configured to grow the diamond therein; a main heater including a main heating surface that is arranged along a first inner surface of the reaction cell; and a sub-heater including a sub-heating surface that is arranged along a second inner surface of the reaction cell, the second inner surface being non-parallel with the first inner surface. | 12-13-2012 |
| 117008000 | Of amorphous precursor | 2 |
| 20120160152 | METHOD FOR CRYSTALLIZING A LAYER - The transfer of the structure of a crystal ( | 06-28-2012 |
| 20110220011 | MANUFACTURING METHOD OF GALLIUM OXIDE SINGLE CRYSTAL - A method of growing a single crystal of gallium oxide at a lower temperature than the melting point (1900° C.) of gallium oxide is provided. A compound film (hereinafter referred to as “gallium oxide compound film”) containing Ga atoms, O atoms, and atoms or molecules that easily sublimate, is heated to sublimate the atoms or molecules that easily sublimate from inside the gallium oxide compound film, thereby growing a single crystal of gallium oxide with a heat energy that is lower than a binding energy of gallium oxide. | 09-15-2011 |
| 117009000 | Epitaxy formation | 3 |
| 20090007840 | Apparatus and Method for Growing a Crystal and Heating an Annular Channel Circumscribing the Crystal - An apparatus and method is provided for pulling a crystal seed from melt for growing a single crystal. The method includes the steps of providing a crucible and providing within the crucible an outer container, and providing coaxially within the outer container an inner container. A protruding portion of the inner container protrudes downward relative to the outer container for containing melt, the inner and outer containers defining an annular channel therebetween which has a bottom wall and contains introduced charge feed. The method further includes the steps of providing for allowing fluid communication between the annular channel and the inner container, delivering charge feed into the annular channel, and generating heat from within the annular channel for preventing the formation of a condensate of the charge feed within the annular channel. | 01-08-2009 |
| 20090283028 | NITRIDE SEMICONDUCTOR HETEROSTRUCTURES AND RELATED METHODS - Semiconductor structures and devices based thereon include an aluminum nitride single-crystal substrate and at least one layer epitaxially grown thereover. The epitaxial layer may comprise at least one of AlN, GaN, InN, or any binary or tertiary alloy combination thereof, and have an average dislocation density within the semiconductor heterostructure is less than about 10 | 11-19-2009 |
| 20110088612 | METHOD FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL - A method for producing a silicon carbide single crystal including a steps of, loading a sublimation-raw material into a reaction vessel of a production apparatus for a silicon carbide single crystal, and placing a seed crystal for a silicon carbide single crystal in such a manner that the seed crystal substantially faces the sublimation-raw material, and re-crystallizing the sublimation-raw material sublimated by heating on a surface of the seed crystal to grow a silicon carbide single crystal, the method further including applying a thermosetting material containing silicon component to a back surface of the seed crystal before the placing the seed crystal in the reaction vessel of the production apparatus for the silicon carbide single crystal. | 04-21-2011 |
