Class / Patent application number | Description | Number of patent applications / Date published |
051296000 | PORE FORMING | 40 |
20090165394 | METHOD OF MAKING ABRASIVE SHARDS, SHAPED ABRASIVE PARTICLES WITH AN OPENING, OR DISH-SHAPED ABRASIVE PARTICLES - By controlling the process parameters and by using a polymeric production tooling having a plurality of mold cavities, different types of shaped abrasive particles selected from the group consisting of abrasive shards, dish-shaped abrasive particles, and shaped abrasive particles with an opening can be produced from the exact same mold. In one embodiment, the mold comprised a plurality of equilateral triangles and fractured precursor abrasive particles, dish-shaped precursor abrasive particles, or precursor shaped abrasive particles with an opening were produced from the same mold. | 07-02-2009 |
20090313906 | High porosity vitrified superabrasive products and method of preparation - A vitrified superabrasive product includes a superabrasive component and a vitrified bond component in which the superabrasive component is dispersed, wherein the vitrified bond component defines pores occupying greater than about 50% of the total volume of the vitrified superabrasive product. The vitrified superabrasive product can be in the form of a grinding tool, such as a grinding wheel. A superabrasive mixture includes a glass powder, a superabrasive grit, a binder and a silicon carbide. The mixture can be in the form of a green body, which is fired under an atmosphere and pressure, and at a temperature sufficient to form a porous vitrified superabrasive product. | 12-24-2009 |
20100000159 | Abrasive Slicing Tool for Electronics Industry - A bond matrix for metal bonded abrasive tools includes a metal bond system, porosity and an optional filler. Tools according to embodiments of the invention exhibit long tool life, produce an acceptable quality of cut and can have self-dressing properties. The bond matrix can be used, for example, in abrasives tools configured for the electronics industry, such as 1A8 wheels for slicing ball grid arrays (BGAs) and other such slicing operations. | 01-07-2010 |
20100018126 | High porosity superabrasive resin products and method of manufacture - A superabrasive product, such as a superabrasive tool, includes a superabrasive grain component and a porous continuous phase that includes a thermoplastic polymer component in which the superabrasive grain component is distributed. A superabrasive product precursor to the superabrasive product includes a superabrasive grain component, a bond component and a polymer blowing agent of encapsulated gas. A method of forming a superabrasive product includes combining a superabrasive, a bond component and a polymer blowing agent of encapsulated gas to form, for example, a superabrasive product precursor. The combined superabrasive, bond component and polymer blowing agent of encapsulated gas are heated to a temperature and for a period of time that causes release of at least a portion of the gas from encapsulation within the blowing agent. | 01-28-2010 |
20100139173 | VITRIFIED BONDED GRINDSTONE - In a vitrified bonded grinding wheel that is formed so that superabrasives formed of cubic boron nitride (CBN) grains or diamond grains are bonded and held with a vitrified binder, the vitrified binder is formed of oxide particles and amorphous glass, and the vitrified binder has no open pore that is in fluid communication with outside air. | 06-10-2010 |
20100146863 | POLISHING PAD HAVING INSULATION LAYER AND METHOD FOR MAKING THE SAME - The present invention relates to a polishing pad having an insulation layer and a method for making the same. The polishing pad includes a bottom layer, an insulation layer, and an abrasive layer. The bottom layer includes a fabric layer wrapped in a high polymer. The insulation layer is disposed on the bottom layer. The abrasive layer is disposed on the insulation layer. The abrasive layer is a high polymeric elastomer and has a plurality of columnar-like cells. The insulation layer can prevent the slurry from infiltrating into the bottom layer during the polishing processs to improve the polishing effect and quality. | 06-17-2010 |
20100154315 | BONDED ABRASIVE ARTICLES AND METHODS OF FORMING - A method of forming an abrasive article includes forming a mixture comprising a liquid carrier and a glass precursor material, wherein the glass precursor material comprises a material selected from the group of materials consisting of a hydrated metal compound, an organic silicate compound, or a combination thereof. The method further includes providing abrasive grains within the mixture, forming the mixture into a green ceramic body, and heating the green ceramic body to form a bonded abrasive article comprising the abrasive grains contained within a bond matrix, wherein the bond matrix comprises an amorphous phase formed from the glass precursor material. | 06-24-2010 |
20100192471 | FROTH AND METHOD OF PRODUCING FROTH - Foam for making pads and belts with controlled, reproducible microcellular structure and method of making such foam in a fast and efficient manner. Under constant pressure and temperature, a prepolymer is mixed with the nucleation surfactant in a tank in the presence of a frothing agent metered into the tank by way of a dip tube or sparge. The nitrogen gas is sheared into small bubbles and is drawn off from the headspace of the tank creating a continuous flow of nitrogen. The pressure of the tank may vary from any absolute pressure down to near complete vacuum, thereby all but eliminating the pressure requirement. The froth of the present invention has a more consistent cell structure and increased cell count. | 08-05-2010 |
20120073211 | CUBIC BORON NITRIDE GRINDING WHEEL - It is an object of the present invention to provide a cubic boron nitride grinding wheel especially suitable for a rough grinding. | 03-29-2012 |
20120079773 | METHOD OF FABRICATING A POLISHING PAD WITH AN END-POINT DETECTION REGION FOR EDDY CURRENT END-POINT DETECTION - Methods of fabricating polishing pads with end-point detection regions for polishing semiconductor substrates using eddy current end-point detection are described. | 04-05-2012 |
20120085038 | METHOD FOR MANUFACTURING POROUS SHEET AND POROUS SHEET MANUFACTURED BY THE METHOD - The present invention provides a method for producing a porous sheet, including the steps of a) producing a polymer resin sheet containing an object to be processed by supercritical fluid extraction which is dissolved in supercritical fluid; and b) injecting the supercritical fluid into the polymer resin sheet to extract the object to be processed by supercritical fluid extraction that is contained in the polymer resin sheet, thereby forming pores in the polymer resin sheet, and a porous sheet produced by the same. | 04-12-2012 |
20120180400 | METHOD OF MAKING POLYURETHANE FOAM - Herein are disclosed an apparatus and method for reaction injection molding of polyurethane foam. In the method, a recirculation loop containing polyols along with an effective amount of water, and a recirculation loop containing isocyanates, are each partially evacuated. | 07-19-2012 |
20120222363 | METHODS OF FORMING POLYCRYSTALLINE TABLES AND POLYCRYSTALLINE ELEMENTS AND RELATED STRUCTURES - Methods of forming a polycrystalline table comprise disposing a plurality of particles comprising a superabrasive material, a substrate comprising a hard material, and a catalyst material in a mold. The plurality of particles is partially sintered in the presence of the catalyst material to form a brown polycrystalline table having a first permeability attached to an end of the substrate. The substrate is removed from the brown polycrystalline table and catalyst material is removed from the brown polycrystalline table. The brown polycrystalline table is then fully sintered to form a polycrystalline table having a reduced, second permeability. Intermediate structures formed during a process of attaching a polycrystalline table to a substrate comprising a substantially fully leached brown polycrystalline table. The substantially fully leached brown polycrystalline table comprises a plurality of interbonded grains of a superabrasive material. | 09-06-2012 |
20120222364 | POLYCRYSTALLINE TABLES, POLYCRYSTALLINE ELEMENTS, AND RELATED METHODS - Polycrystalline elements comprise a substrate and a polycrystalline table attached to an end of the substrate. The polycrystalline table comprises a first region of superabrasive material having a first permeability and at least a second region of superabrasive material having a second, lesser permeability, the at least second region being interposed between the substrate and the first region. Methods of forming a polycrystalline element comprise attaching a polycrystalline table comprising a first region of superabrasive material having a first permeability and at least a second region of superabrasive material having a second, lesser permeability to an end of a substrate, the at least a second region being interposed between the first region and the substrate. Catalyst material is removed from at least the first region of the polycrystalline table. | 09-06-2012 |
20120266543 | VITRIOUS BONDED ABBRASIVE - A vitrified superabrasive product includes a superabrasive component and a vitrified bond component in which the superabrasive component is dispersed. The vitrified bond includes an oxide of a lanthanoid. Additionally, the vitrified bond component defines pores that can be essentially all less than 800 μm in diameter. Seventy percent of the pores are in a range of between about 40 μm and about 500 μm and have an average aspect ratio less than about 2. The porosity is in a range of between about 50% and about 90% of the total volume of the superabrasive product. | 10-25-2012 |
20120279138 | POLISHING PAD AND A METHOD FOR MANUFACTURING THE SAME - A polishing pad of excellent durability and adhesion between the polishing layer and the base material layer includes a polishing layer arranged on a base material layer, wherein the polishing layer includes a thermosetting polyurethane foam having roughly spherical interconnected cells having an average cell diameter of 20 to 300 μm The polyurethane foam includes an isocyanate component and an active hydrogen-containing compound as starting material components, and the active hydrogen-containing compound includes 30 to 85% by weight of a high-molecular-weight polyol having 2 to 4 functional groups and a hydroxyl value of 20 to 100 mg KOH/g. | 11-08-2012 |
20130008091 | High Porosity Vitrified Superabrasive Products and Method of Preparation - A vitrified superabrasive product includes a superabrasive component and a vitrified bond component in which the superabrasive component is dispersed, wherein the vitrified bond component defines pores occupying greater than about 50% of the total volume of the vitrified superabrasive product. The vitrified superabrasive product can be in the form of a grinding tool, such as a grinding wheel. A superabrasive mixture includes a glass powder, a superabrasive grit, a binder and a silicon carbide. The mixture can be in the form of a green body, which is fired under an atmosphere and pressure, and at a temperature sufficient to form a porous vitrified superabrasive product. | 01-10-2013 |
20130081334 | BONDED ABRASIVES FORMED BY UNIAXIAL HOT PRESSING - A particular method includes uniaxially hot pressing a preform that includes abrasive particles in a bonding material to form a bonded abrasive body. | 04-04-2013 |
20130125473 | POLYURETHANE COMPOSITION FOR CMP PADS AND METHOD OF MANUFACTURING SAME - Polyurethane composition based on a certain polyether and polyester prepolymer reaction mixture, wherein the composition is utilized in manufacturing chemical mechanical polishing/planarizing (CMP) pads. The CMP pads have low rebound and can dissipate irregular energy as well as stabilize polishing to yield improved uniformity and less dishing of the substrate. | 05-23-2013 |
20130212951 | POLISHING PAD AND METHOD OF MANUFACTURING THE SAME - Polishing pad and method of manufacturing the same, the method including: (a) mixing materials for forming a polishing layer; (b) mixing at least two from among inert gas, a capsule type foaming agent, a chemical foaming agent, and liquid microelements that are capable of controlling sizes of pores, with the mixture in (a) so as to form two or more types of pores; (c) performing gelling and hardening of the mixture generated in (b) so as to form a polishing layer including the two or more types of pores; and (d) processing the polishing layer so as to distribute micropores defined by opening the two or more types of pores on a surface of the polishing layer. | 08-22-2013 |
20130340351 | METHOD FOR MANUFACTURING POLISHING PAD - A method for manufacturing a polishing pad, which may be laminated, with a small number of manufacturing steps, high productivity and no peeling between a polishing layer and a cushion layer includes preparing a cell-dispersed urethane composition by a mechanical foaming method; continuously discharging the cell-dispersed urethane composition onto a face material, while feeding the face material; laminating another face material on the cell-dispersed urethane composition; curing the cell-dispersed urethane composition, while controlling its thickness to be uniform, so that a polishing layer including a polyurethane foam is formed; cutting the polishing layer parallel to the face into two pieces so that two long polishing layers each including the polishing layer and the face material are simultaneously formed; and cutting the long polishing layers to produce the polishing pad. | 12-26-2013 |
20140013671 | CUTTING ELEMENTS, METHODS FOR MANUFACTURING SUCH CUTTING ELEMENTS, AND TOOLS INCORPORATING SUCH CUTTING ELEMENTS - The present disclosure relates to cutting elements incorporating polycrystalline diamond bodies used for subterranean drilling applications, and more particularly, to polycrystalline diamond bodies having a high diamond content which are configured to provide improved properties of thermal stability and wear resistance, while maintaining a desired degree of impact resistance, when compared to prior polycrystalline diamond bodies. In various embodiments disclosed herein, a cutting element with high diamond content includes a modified PCD structure and/or a modified interface (between the PCD body and a substrate), to provide superior performance. | 01-16-2014 |
20140033615 | POLISHING PAD AND MANUFACTURING METHOD THEREFOR - Provided are a polishing pad which remedies the problem of scratches occurring when a conventional hard (dry) polishing pad is used, which is excellent in polishing rate and polishing uniformity, and which can be used for not only primary polishing but also finish polishing, and a manufacturing method therefor. The polishing pad is a polishing pad for polishing a semiconductor device, comprising a polishing layer having a polyurethane-polyurea resin foam containing substantially spherical cells, wherein the polyurethane-polyurea resin foam has a hard segment content (HSC) in a range from 26 to 34%, and has a density D in a range from 0.30 to 0.60 g/cm | 02-06-2014 |
20140090305 | HAND-HELD CONFORMABLE SANDING BLOCK - An elastomeric sanding block conformable to curved or flat surfaces includes a Shore A hardness ranging from about 30 to about 90, and is made from ethylene-vinyl acetate copolymer, low-density polyethylene or an admixture thereof. The polymer or admixture ranges from about 35 to about 70 percent of the sanding block composition by weight. A blowing agent is present in an amount that ranges from about 1.5 to about 4.5 percent of the composition by weight. The elastomeric sanding block may be formed by combining the polymer or admixture and other components under heat to yield a feedstock, thermoforming the feedstock in a mold to yield a foamed material sheet, and cutting the foamed material sheet. | 04-03-2014 |
20140102010 | Polishing Pad for Eddy Current End-Point Detection - Polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described. | 04-17-2014 |
20140123563 | HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION - Homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described. | 05-08-2014 |
20140245667 | HARDFACING MATERIALS INCLUDING PCD PARTICLES, EARTH-BORING TOOLS COMPRISING CRUSHED POLYCRYSTALLINE DIAMOND MATERIAL, AND RELATED METHODS - A hardfacing material includes a metal matrix material and particles of crushed polycrystalline diamond material embedded within the metal matrix material. An earth-boring tool includes a body comprising particles of fragmented polycrystalline diamond material embedded within a metal matrix material. The particles of fragmented polycrystalline diamond material include a plurality of inter-bonded diamond grains. A method includes forming an earth-boring tool including a metal matrix material and particles of crushed polycrystalline diamond material. | 09-04-2014 |
20140311043 | MULTI-LAYERED CHEMICAL-MECHANICAL PLANARIZATION PAD - The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component. | 10-23-2014 |
20150052821 | ABRASIVE SLICING TOOL FOR ELECTRONICS INDUSTRY - A bond matrix for metal bonded abrasive tools includes a metal bond system, porosity and an optional filler. Tools according to embodiments of the invention exhibit long tool life, produce an acceptable quality of cut and can have self-dressing properties. The bond matrix can be used, for example, in abrasives tools configured for the electronics industry, such as 1A8 wheels for slicing ball grid arrays (BGAs) and other such slicing operations. | 02-26-2015 |
20150059253 | POLISHING PAD - A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (a), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (a) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices. | 03-05-2015 |
20150068129 | POLISHING PAD AND METHOD FOR PRODUCING POLISHING PAD - Provided are a method for producing a finish polishing pad and the polishing pad which allow formation of a stable film and enables polishing with fewer polishing scratches. The method comprises the steps of: dissolving a composition for forming polyurethane resin film containing a polyurethane resin and an additive(s) in a solvent capable of dissolving the resin; removing an insoluble component(s) to make the content of the insoluble component(s) in the solution less than 1% by mass relative to the total mass of the composition; adding a poor solvent to the solution from which the insoluble component(s) has(have) been removed, followed by mixing, the amount of the poor solvent added being calculated according to a defined Formula 1; and forming a film from the mixture solution on the film formation substrate by a wet coagulation method, to thereby form the polyurethane resin film. | 03-12-2015 |
20150298292 | A POLYCRYSTALLINE SUPER HARD CONSTRUCTION AND A METHOD FOR MAKING SAME - A polycrystalline super hard construction comprising a body of polycrystalline diamond (PCD) material and a plurality of interstitial regions between inter-bonded diamond grains forming the polycrystalline diamond material; the body of PCD material comprises a working surface positioned along an outside portion of the body; a first region substantially free of a solvent/catalysing material; a second region remote from the working surface that includes solvent/catalysing material in a plurality of the interstitial regions; and a substrate attached to the second region along an interface. The first region extends a depth from the working surface and the thickness of the second region between the interface with the substrate and an interface with the first region is between around 20 microns to around 200 microns at one or more points along the interface with the substrate. | 10-22-2015 |
20150343604 | POLISHING PAD PRODUCTION METHOD - The present invention includes a polishing pad production method comprising a step of forming one or more grooves in a surface of a polishing layer comprising a flexible polyurethane foam, wherein the flexible polyurethane foam has an Asker D hardness of 30 or less at 25° C., and the step comprises a step 1 of cooling the polishing layer to adjust the Asker D hardness of the flexible polyurethane foam to 35 or more, and a step 2 of forming one or more grooves in the surface of the polishing layer comprising the flexible polyurethane foam, the Asker D hardness of which has been adjusted by the cooling. According to the polishing pad production method of the present invention, it is possible to provide a polishing pad production method capable of performing grooving in a polishing layer with a high precision when the polishing layer comprises a flexible polyurethane foam. | 12-03-2015 |
20150375367 | ABRASIVE ARTICLE INCLUDING A CORE AND A BONDED ABRASIVE BODY - An abrasive article including a core including an organic material and a first bonded abrasive body integrally bonded directly to the core, the first bonded abrasive body having abrasive particles contained within a bond material and the abrasive article having a bonding factor of at least about 60%. | 12-31-2015 |
20160052103 | POLYURETHANE POLISHING PAD - The polishing pad is for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a cast polyurethane polymeric material formed from a prepolymer reaction of H | 02-25-2016 |
20160059378 | POLISHING PAD PRODUCTION METHOD - The present invention is directed to a method for producing a polishing pad having a polishing layer comprising a sheet of a flexible polyurethane resin foam, the flexible polyurethane resin foam having an Asker D hardness of 30 or less at 25° C., and the method comprising: step A of cooling a block comprising the flexible polyurethane resin foam to be adjusted into an Asker D hardness of 35 or more; and step B of slicing the block, the Asker D hardness of which has been adjusted by the cooling, into a predetermined thickness to yield the sheet of the flexible polyurethane resin foam. The method for producing a polishing pad of the present invention makes it possible to slice, with a good precision, a block comprising a flexible polyurethane resin foam. | 03-03-2016 |
20160176012 | HIGH-STABILITY POLYURETHANE POLISHING PAD | 06-23-2016 |
20160176013 | CONTROLLED-EXPANSION CMP PAD CASTING METHOD | 06-23-2016 |
20160176021 | UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE | 06-23-2016 |
20160176022 | CONTROLLED-VISCOSITY CMP CASTING METHOD | 06-23-2016 |